WO2023199410A1 - Procédé de traitement de gaz d'échappement contenant un composé d'azote, et appareil pour ledit procédé - Google Patents
Procédé de traitement de gaz d'échappement contenant un composé d'azote, et appareil pour ledit procédé Download PDFInfo
- Publication number
- WO2023199410A1 WO2023199410A1 PCT/JP2022/017627 JP2022017627W WO2023199410A1 WO 2023199410 A1 WO2023199410 A1 WO 2023199410A1 JP 2022017627 W JP2022017627 W JP 2022017627W WO 2023199410 A1 WO2023199410 A1 WO 2023199410A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- exhaust gas
- nitrogen compound
- gas treatment
- column member
- treatment device
- Prior art date
Links
- 239000007789 gas Substances 0.000 title claims abstract description 215
- 229910017464 nitrogen compound Inorganic materials 0.000 title claims abstract description 74
- 150000002830 nitrogen compounds Chemical class 0.000 title claims abstract description 74
- 238000000034 method Methods 0.000 title claims abstract description 34
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 28
- 238000001816 cooling Methods 0.000 claims abstract description 18
- 238000005979 thermal decomposition reaction Methods 0.000 claims abstract description 9
- 238000010438 heat treatment Methods 0.000 claims abstract description 4
- 238000000354 decomposition reaction Methods 0.000 claims description 23
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims description 15
- 239000001301 oxygen Substances 0.000 claims description 13
- 229910052760 oxygen Inorganic materials 0.000 claims description 13
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 11
- 239000011236 particulate material Substances 0.000 claims description 8
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 6
- 229910021536 Zeolite Inorganic materials 0.000 claims description 5
- 239000010457 zeolite Substances 0.000 claims description 5
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 claims description 4
- 239000008187 granular material Substances 0.000 abstract description 7
- 239000011369 resultant mixture Substances 0.000 abstract 1
- 239000000126 substance Substances 0.000 description 17
- 239000007788 liquid Substances 0.000 description 11
- 239000007921 spray Substances 0.000 description 11
- 239000000428 dust Substances 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 239000002245 particle Substances 0.000 description 4
- 239000003054 catalyst Substances 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 239000007791 liquid phase Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 238000005192 partition Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 238000001179 sorption measurement Methods 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- GQPLMRYTRLFLPF-UHFFFAOYSA-N Nitrous Oxide Chemical compound [O-][N+]#N GQPLMRYTRLFLPF-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 239000003638 chemical reducing agent Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 2
- 229910010271 silicon carbide Inorganic materials 0.000 description 2
- 238000011144 upstream manufacturing Methods 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- 238000004438 BET method Methods 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 239000013505 freshwater Substances 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- QKCGXXHCELUCKW-UHFFFAOYSA-N n-[4-[4-(dinaphthalen-2-ylamino)phenyl]phenyl]-n-naphthalen-2-ylnaphthalen-2-amine Chemical compound C1=CC=CC2=CC(N(C=3C=CC(=CC=3)C=3C=CC(=CC=3)N(C=3C=C4C=CC=CC4=CC=3)C=3C=C4C=CC=CC4=CC=3)C3=CC4=CC=CC=C4C=C3)=CC=C21 QKCGXXHCELUCKW-UHFFFAOYSA-N 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 239000001272 nitrous oxide Substances 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- -1 polyethylene Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 239000011819 refractory material Substances 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 229910052701 rubidium Inorganic materials 0.000 description 1
- IGLNJRXAVVLDKE-UHFFFAOYSA-N rubidium atom Chemical compound [Rb] IGLNJRXAVVLDKE-UHFFFAOYSA-N 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 229920006337 unsaturated polyester resin Polymers 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
- 238000010792 warming Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000002351 wastewater Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/14—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by absorption
- B01D53/18—Absorbing units; Liquid distributors therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/46—Removing components of defined structure
- B01D53/54—Nitrogen compounds
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/46—Removing components of defined structure
- B01D53/54—Nitrogen compounds
- B01D53/56—Nitrogen oxides
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
- B01D53/77—Liquid phase processes
- B01D53/78—Liquid phase processes with gas-liquid contact
Definitions
- the present invention relates to a treatment method and apparatus suitable for abatement treatment of exhaust gas containing nitrogen compounds such as N 2 O and NF 3 .
- N 2 O nitrogen oxide
- NF 3 nitrogen trifluoride
- the global warming potential (GWP) of nitrogen compounds such as N 2 O and NF 3 is hundreds to tens of thousands of times higher than that of CO 2 , so if they are emitted as is, they will cause great damage to the global environment. It has been known. For this reason, various technologies are being developed to remove used N 2 O, NF 3 and the like from exhaust gas.
- Patent Document 1 Japanese Patent Application Laid-Open No. 8-57262 discloses that ammonia is added as a reducing agent to exhaust gas containing N 2 O.
- a method is disclosed in which N 2 O in exhaust gas is reduced and removed by mixing them and contacting them with a catalyst in which 0.1 to 6 wt% iron is supported on ⁇ -zeolite at a temperature range of 350 to 500°C.
- the above-mentioned conventional technology has the following problems. That is, by adding a reducing agent to exhaust gas containing N 2 O and bringing it into contact with a Fe zeolite catalyst at a predetermined temperature range, N 2 O is directly converted into harmless nitrogen (N 2 ) and water (H 2 O). ), but the removal rate of N 2 O by this method is approximately 60%. For this reason, there is a problem in that it is not suitable for treating exhaust gas, such as exhaust gas from semiconductor manufacturing processes, where a large amount of N 2 O must be reduced below a predetermined TLV value.
- the main purpose of the present invention is to ensure that even if a large amount of nitrogen compounds are contained in the exhaust gas, they can be decomposed and harmed, and that NOx produced by the decomposition can also be reliably removed from the exhaust gas.
- An object of the present invention is to provide a method for treating exhaust gas containing nitrogen compounds and an apparatus therefor.
- the present invention provides a method for eliminating nitrogen compounds in nitrogen compound-containing exhaust gas as follows. That is, the first step is to heat the nitrogen compound-containing exhaust gas E1 to a temperature higher than the thermal decomposition temperature of the nitrogen compound to thermally decompose the nitrogen compound, and to add water to the high temperature treated gas E2 in which the nitrogen compound has been thermally decomposed. and a second step of passing through the column member 18 filled with the porous particulate material. The second step is characterized by cooling so that the temperature of the treated gas E2 at the outlet of the column member 18 is below 100°C, more preferably below 50°C.
- the nitrogen compounds are thermally decomposed in the first step, a large amount of NO is generated, but in the subsequent second step, water is added to the high temperature treated gas E2 containing a large amount of NO.
- NO in the treated gas E2 is converted to NO 2 that is easily soluble in water.
- the temperature of the treated gas E2 at the outlet of the column member 18 is cooled to below 100°C, more preferably below 50°C, thereby converting the NO 2 into the form of HNO 3 or HNO 2 . It is absorbed into the liquid phase and removed from the treated gas E2.
- the porous granular material is zeolite and/or activated carbon.
- the column it is possible to use the column continuously for a long period of time in an environment where the column member 18 is constantly exposed to high temperatures, and the internal specific surface area of the column member 18 is increased to allow the adsorption of NO in the treated gas E2 within the column member 18. Density and adsorption amount can be maximized. Furthermore, various catalytic metals can be supported, and the conversion of NO to NO 2 can be performed even more efficiently.
- the conversion efficiency and conversion rate from NO to NO 2 in the treated gas E2 can be maximized, and the removal rate of nitrogen components (nitrogen compounds) from the treated gas E2 can be further improved. can be improved.
- the apparatus according to the second invention is an apparatus for carrying out the above-mentioned method, and for example, as shown in FIG. 1, the exhaust gas treatment apparatus is configured as follows. That is, the exhaust gas treatment furnace 12 has an exhaust gas decomposition chamber 12a formed therein for thermally decomposing the nitrogen compound-containing exhaust gas E1, and the tip thereof is connected to the exhaust gas treatment furnace 12, and the exhaust gas decomposition chamber 12a contains the nitrogen compound-containing exhaust gas.
- An inflow piping system 14 that supplies exhaust gas E1 is connected at its base end to a gas outlet 12b provided at the bottom of the exhaust gas treatment furnace 12, and discharges the treated gas E2 that has been thermally decomposed in the exhaust gas decomposition chamber 12a.
- a discharge piping system 16 is provided.
- a column member 18 filled with porous particulate material is interposed between the exhaust gas decomposition chamber 12a and the gas outlet 12b, and the column member 18 is gas-permeable.
- a nozzle 20 for supplying water is provided on the inlet side in the flow direction.
- a wet inlet scrubber 22 is preferably attached to the inlet piping system 14, and a wet outlet scrubber 24 is preferably attached to the outlet piping system 16.
- the nitrogen compound-containing exhaust gas E1 can be washed with water before being thermally decomposed, and dust and water-soluble substances in the nitrogen compound-containing exhaust gas E1 can be removed in advance. It is possible to prevent problems such as adhesion and accumulation of dust and water-soluble substances, which prevents sufficient thermal decomposition.
- a cooling device 26 for cooling the column member 18 so that the temperature of the treated gas E2 at the outlet of the column member 18 is 50° C. or less. In this case, more nitrogen components (nitrogen compounds) in the treated gas E2 discharged from the exhaust gas treatment furnace 12 can be reliably absorbed into the liquid phase and removed from the treated gas E2.
- the nozzle 20 supplies oxygen and/or hydrogen peroxide in addition to water.
- a method and apparatus for treating nitrogen compound-containing exhaust gas can be provided.
- FIG. 1 is an explanatory diagram showing an overview of an exhaust gas treatment device according to an embodiment of the present invention.
- FIG. 1 is a diagram showing an overview of an embodiment of an exhaust gas treatment apparatus 10 that executes the method for treating nitrogen compound-containing exhaust gas E1 of the present invention.
- the exhaust gas treatment device 10 of the present embodiment is roughly composed of an exhaust gas treatment furnace 12, an inlet piping system 14, an exhaust piping system 16, and the like.
- the exhaust gas treatment furnace 12 is a device that thermally decomposes the nitrogen compound-containing exhaust gas E1 containing nitrogen compounds such as N 2 O and NF 3 to generate a treated gas E2, and has a cylindrical furnace body 12X.
- An exhaust gas decomposition chamber 12a is provided inside the furnace body 12X, and one or more electric heaters 28 are vertically installed in the exhaust gas decomposition chamber 12a.
- the furnace body 12X of the exhaust gas treatment furnace 12 has a cylindrical outer jacket made of steel (not shown), and a lining member made of a refractory material and covering the entire inner circumference of the outer jacket, An exhaust gas decomposition chamber 12a is formed inside the lining member.
- the tip of an inflow piping system 14 made of a metal pipe 30 with excellent heat resistance and corrosion resistance is installed, and an electric heater 28 surrounds the tip. It is arranged like this.
- the tip (downstream end) of the inflow piping system 14 erected in the exhaust gas decomposition chamber 12a from the bottom of the exhaust gas treatment furnace 12 extends to near the ceiling of the exhaust gas treatment furnace 12.
- a gas outlet 12b is provided at the bottom of the exhaust gas treatment furnace 12, and the upstream end of the exhaust piping system 16 is connected to the gas outlet 12b. Then, a column member 18, which will be described later, is attached to a position in the exhaust gas treatment furnace 12 in contact with the gas outlet 12b.
- the electric heater 28 heats the inside of the exhaust gas decomposition chamber 12a to a predetermined temperature that is higher than the thermal decomposition temperature of the components to be removed (nitrogen compounds, etc.) in the nitrogen compound-containing exhaust gas E1 (specifically, about 600°C to 1300°C). It is for thermally decomposing the nitrogen compound-containing exhaust gas E1, and is formed of a solid or hollow rod-shaped heating element made of silicon carbide. Note that the electric heater 28 is not limited to this silicon carbide material, but may be any material that can raise the temperature to the above-mentioned predetermined temperature.
- the column member 18 is a cylindrical member whose interior is filled with porous particulate material and allows gas and liquid to flow through it.
- the column member 18 is a cylindrical metal member with fluid entrances and exits provided at the upper and lower bottom surfaces.
- a container filled with porous granules is used.
- This column member 18 is interposed between the exhaust gas decomposition chamber 12a and the gas outlet 12b so as to communicate the two.
- the porous particles filled inside the column member 18 are preferably those having an average particle diameter of 0.15 mm to 10 mm and a specific surface area of 250 m 2 /g to 2000 m 2 /g (BET method).
- BET method a specific surface area of 250 m 2 /g to 2000 m 2 /g
- the porous particles constituting the column member 18 may have catalyst metals such as platinum, silver, rhodium, iron, and rubidium supported on their
- a nozzle 20 is provided in the exhaust gas treatment furnace 12 for supplying water toward the inlet side of the column member 18 in the gas flow direction.
- the amount of water supplied from the nozzle 20 is appropriately determined depending on the flow rate of the nitrogen compound-containing exhaust gas E1 supplied to the exhaust gas treatment furnace 12, the amount of nitrogen compounds in the exhaust gas E1, and the like.
- the flow rate of water supplied from this nozzle 20 is 5%. It is preferably in the range of ⁇ 50 L/min.
- oxygen and/or hydrogen peroxide can also be supplied from this nozzle 20 as needed.
- the column member 18 is provided with a cooling device 26 as necessary, which cools the column member 18 with cooling water C so that the temperature of the treated gas E2 at the outlet of the column member 18 is 50° C. or less. It will be installed.
- the temperature of the treated gas E2 at the inlet of the column member 18 is 300°C or less, more preferably 200°C or less. It is preferable to provide a cooling means for cooling the processed gas E2.
- the water supplied from the nozzle 20 also functions as this cooling means.
- the exhaust gas treatment furnace 12 configured as described above is equipped with a temperature measuring means such as a thermocouple for detecting the temperature of the exhaust gas decomposition chamber 12a, and the temperature data ( A temperature signal) is supplied to a control means including a CPU (Central Processing Unit), memory, input device, display device, etc. via a signal line.
- a control means including a CPU (Central Processing Unit), memory, input device, display device, etc. via a signal line.
- a power supply unit (not shown) or the like is also connected to this control means.
- the inflow piping system 14 has its tip (downstream end) inserted into the exhaust gas treatment furnace 12 (as described above), and its base end (upstream end) connected to a source of nitrogen compound-containing exhaust gas E1 such as semiconductor manufacturing equipment (not shown).
- a source of nitrogen compound-containing exhaust gas E1 such as semiconductor manufacturing equipment (not shown).
- This is a piping system that introduces the nitrogen compound-containing exhaust gas E1 into the exhaust gas decomposition chamber 12a by connecting it.
- a wet inlet scrubber 22 is provided in the middle of this inflow piping system 14 as required.
- the inlet scrubber 22 is a wet type scrubber that removes dust and water-soluble components contained in the nitrogen compound-containing exhaust gas E1 introduced into the exhaust gas treatment furnace 12.
- the scrubber body 22a includes a spray nozzle 22b that is installed near the top inside the scrubber body 22a and sprays a chemical solution such as water in the form of a spray.
- This inlet scrubber 22 is installed upright on the chemical liquid tank 32 (see FIG. 1), or is installed separately from the chemical liquid tank 32 (not shown), and both are connected by piping so that the waste liquid can be used as a chemical liquid. It is designed to be sent into a tank 32.
- a circulation pump 34 is installed between the spray nozzle 22b and the chemical tank 32, and lifts the stored chemical in the chemical tank 32 to the spray nozzle 22b.
- reference numeral 36 in FIG. 1 is a "partition wall" that partitions the nitrogen compound-containing exhaust gas E1 washed by the inlet scrubber 22 from flowing into the exhaust piping system 16 side without passing through the exhaust gas treatment furnace 12.
- the discharge piping system 16 is a piping system for discharging the treated gas E2 generated in the exhaust gas decomposition chamber 12a into the atmosphere.
- An exhaust fan 38 is installed in the middle of the exhaust piping system 16 to suck the treated gas E2 in the exhaust gas decomposition chamber 12a and release it into the atmosphere.
- a wet outlet scrubber 24 is provided between the two as required.
- the outlet scrubber 24 is a wet-type scrubber that cools the treated gas E2 after thermal decomposition that has passed through the exhaust gas treatment furnace 12, and finally removes dust, water-soluble components, etc. produced by the thermal decomposition from the treated gas E2.
- This is a scrubber.
- the outlet scrubber 24 is connected to the gas outlet of the exhaust gas treatment furnace 12 via "a space surrounded by the liquid level of the chemical tank 32, the ceiling surface, and the partition wall 36," which is a part of the exhaust piping system 16. 12b, and a downward spray nozzle 24b that is installed near the top inside the scrubber body 24a and sprays a chemical solution such as water so as to face the flow direction of the treated gas E2. including.
- the outlet scrubber 24 is erected above the chemical liquid tank 32 so that waste water is sent into the chemical liquid tank 32.
- the spray nozzle 24b is connected to the discharge side of the circulation pump 34 to lift the stored chemical solution in the chemical solution tank 32 to the spray nozzle 24b.
- new chemical solution such as fresh water may be supplied to the spray nozzle 24b.
- other parts of the exhaust gas treatment device 10 of this embodiment other than the exhaust gas treatment furnace 12 contain nitric acid, hydrofluoric acid, etc. contained in the nitrogen compound-containing exhaust gas E1 or generated by thermal decomposition of the nitrogen compound-containing exhaust gas E1.
- a corrosion-resistant lining or coating made of vinyl chloride, polyethylene, unsaturated polyester resin, fluororesin, or the like.
- the exhaust fan 38 is activated. Introduction of the exhaust gas E into the processing device 10 is started. Then, the nitrogen compound-containing exhaust gas E1 passes through the inlet scrubber 22, the exhaust gas treatment furnace 12, and the outlet scrubber 24 in this order, and the components targeted for abatement (i.e., N 2 O, NF 3 , etc.) in the nitrogen compound-containing exhaust gas E1 are removed. be harmed. Further, a control means (not shown) controls the amount of electric power supplied to the electric heater 28 of the exhaust gas treatment furnace 12 so that the temperature in the exhaust gas treatment chamber 12a is maintained at a predetermined temperature.
- a treated gas E2 containing a large amount of NO is generated (in accordance with the treatment method). 1st step).
- NO in the treated gas E2 is removed by a small amount of oxygen radicals contained in the water vapor. It is converted to NO2, which is easily soluble in water.
- the remaining NO is adsorbed in a high density state on the adsorption sites on the surface of the porous granules, and reacts with the O 2 brought in from the exhaust gas E1 and the oxygen radicals or OH radicals contained in the water vapor mentioned above, and is converted to NO 2 . be done.
- NO 2 is absorbed into the liquid phase in the form of HNO 3 or HNO 2 and the treated gas E2 is removed from the inside (second step of the treatment method).
- the treated gas E2 when approximately 70,000 ppm of NOx (NO) is generated in the first step of the above treatment method, if only water is supplied from the nozzle 20 in the second step of the above treatment method, the treated gas E2 The amount of NOx inside can be reduced to approximately 1,500 to 2,000 ppm. Furthermore, when oxygen or hydrogen peroxide is supplied in addition to water from the nozzle 20 in the second step of the above treatment method, the conversion of NO to NO 2 is further accelerated, and the amount of NOx in the treated gas E2 is approximately reduced. It can be reduced to 100-200 ppm.
- the above-mentioned illustrated embodiment shows the case where the exhaust gas treatment device 10 is equipped with both the inlet scrubber 22 and the outlet scrubber 24, for example, when the amount of dust and water-soluble components in the nitrogen compound-containing exhaust gas E1 is small,
- the inlet scrubber 22 may be omitted, and the outlet scrubber 24 may be omitted if the treated gas E2 contains little dust or water-soluble components.
- the case where the temperature of the treated gas E2 at the outlet of the column member 18 is cooled to 50° C. or lower is shown, but for example, If the maximum amount of NO X can be sufficiently removed.
- the cooling means at this time water and hydrogen peroxide solution supplied from the nozzle 20 can be used.
- a case is shown in which a cylindrical metal container with fluid inlets and outlets provided at the upper and lower bottom surfaces and filled with porous granular material is used as the column member 18.
- 18 may be any cylindrical member whose interior is filled with porous particles and allows gas or liquid to flow therethrough; for example, the inner surface of a cylindrical or rectangular honeycomb member. It may also be one in which the above-mentioned porous particulate material is supported on the substrate.
- Exhaust gas treatment device 10: Exhaust gas treatment device, 12: Exhaust gas treatment furnace, 12a: Exhaust gas decomposition chamber, 12b: Gas outlet, 14: Inflow piping system, 16: Discharge piping system, 18: Column member, 20: Nozzle, 22: Inlet scrubber, 24 : Outlet scrubber, 26: Cooling device, E1: Nitrogen compound-containing exhaust gas, E2: Treated gas.
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- Chemical & Material Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Analytical Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
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Abstract
La présente invention concerne un procédé de détoxification d'un composé d'azote dans un gaz d'échappement contenant le composé d'azote, le procédé comprenant : une première étape consistant à chauffer le gaz d'échappement (E1) contenant le composé d'azote à une température supérieure ou égale à la température de décomposition thermique du composé d'azote pour décomposer thermiquement le composé d'azote ; et une seconde étape consistant à ajouter de l'eau à un gaz traité à haute température (E2) dans lequel le composé d'azote a été décomposé thermiquement puis à permettre au mélange résultant de passer à travers un élément de colonne (18) dans lequel un matériau granulaire poreux est rempli. Le procédé est caractérisé en ce que, dans la seconde étape, le refroidissement est effectué de telle manière que la température du gaz traité (E2) à la sortie de l'élément de colonne (18) devient inférieure à 100° C.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/JP2022/017627 WO2023199410A1 (fr) | 2022-04-12 | 2022-04-12 | Procédé de traitement de gaz d'échappement contenant un composé d'azote, et appareil pour ledit procédé |
TW112101765A TW202400290A (zh) | 2022-04-12 | 2023-01-16 | 含有氮化合物的廢氣之處理方法及其裝置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/JP2022/017627 WO2023199410A1 (fr) | 2022-04-12 | 2022-04-12 | Procédé de traitement de gaz d'échappement contenant un composé d'azote, et appareil pour ledit procédé |
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WO2023199410A1 true WO2023199410A1 (fr) | 2023-10-19 |
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PCT/JP2022/017627 WO2023199410A1 (fr) | 2022-04-12 | 2022-04-12 | Procédé de traitement de gaz d'échappement contenant un composé d'azote, et appareil pour ledit procédé |
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Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
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JPS5027762A (fr) * | 1973-07-12 | 1975-03-22 | ||
JPS5211164A (en) * | 1975-07-17 | 1977-01-27 | Unitika Ltd | Process for removing nitrogen oxides |
JPH11114372A (ja) * | 1997-10-20 | 1999-04-27 | Mitsubishi Kakoki Kaisha Ltd | 湿式脱硝方法 |
JP2002336649A (ja) * | 2001-05-21 | 2002-11-26 | Nec Kyushu Ltd | 除害装置 |
JP2005118681A (ja) * | 2003-10-17 | 2005-05-12 | Taisei Corp | 窒素酸化物除去装置 |
JP2005125285A (ja) * | 2003-10-27 | 2005-05-19 | Kanken Techno Co Ltd | N2o含有排ガスの処理方法およびその装置 |
WO2008072392A1 (fr) * | 2006-12-15 | 2008-06-19 | Kanken Techno Co., Ltd. | Procédé de traitement de gaz de refoulement et appareil pour celui-ci |
CN108826308A (zh) * | 2018-05-24 | 2018-11-16 | 无锡洁安洁通用设备有限公司 | 一种废气处理器 |
GB2571793A (en) * | 2018-03-09 | 2019-09-11 | Edwards Ltd | Abatement |
WO2020095358A1 (fr) * | 2018-11-06 | 2020-05-14 | カンケンテクノ株式会社 | Buse d'introduction de gaz d'échappement, dispositif de traitement d'eau, et dispositif de traitement de gaz d'échappement |
CN112121588A (zh) * | 2020-10-12 | 2020-12-25 | 武汉更日敦科技有限公司 | 一种电加热水洗式废气处理装置 |
-
2022
- 2022-04-12 WO PCT/JP2022/017627 patent/WO2023199410A1/fr unknown
-
2023
- 2023-01-16 TW TW112101765A patent/TW202400290A/zh unknown
Patent Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5027762A (fr) * | 1973-07-12 | 1975-03-22 | ||
JPS5211164A (en) * | 1975-07-17 | 1977-01-27 | Unitika Ltd | Process for removing nitrogen oxides |
JPH11114372A (ja) * | 1997-10-20 | 1999-04-27 | Mitsubishi Kakoki Kaisha Ltd | 湿式脱硝方法 |
JP2002336649A (ja) * | 2001-05-21 | 2002-11-26 | Nec Kyushu Ltd | 除害装置 |
JP2005118681A (ja) * | 2003-10-17 | 2005-05-12 | Taisei Corp | 窒素酸化物除去装置 |
JP2005125285A (ja) * | 2003-10-27 | 2005-05-19 | Kanken Techno Co Ltd | N2o含有排ガスの処理方法およびその装置 |
WO2008072392A1 (fr) * | 2006-12-15 | 2008-06-19 | Kanken Techno Co., Ltd. | Procédé de traitement de gaz de refoulement et appareil pour celui-ci |
GB2571793A (en) * | 2018-03-09 | 2019-09-11 | Edwards Ltd | Abatement |
CN108826308A (zh) * | 2018-05-24 | 2018-11-16 | 无锡洁安洁通用设备有限公司 | 一种废气处理器 |
WO2020095358A1 (fr) * | 2018-11-06 | 2020-05-14 | カンケンテクノ株式会社 | Buse d'introduction de gaz d'échappement, dispositif de traitement d'eau, et dispositif de traitement de gaz d'échappement |
CN112121588A (zh) * | 2020-10-12 | 2020-12-25 | 武汉更日敦科技有限公司 | 一种电加热水洗式废气处理装置 |
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