WO2008072392A1 - Procédé de traitement de gaz de refoulement et appareil pour celui-ci - Google Patents

Procédé de traitement de gaz de refoulement et appareil pour celui-ci Download PDF

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Publication number
WO2008072392A1
WO2008072392A1 PCT/JP2007/062397 JP2007062397W WO2008072392A1 WO 2008072392 A1 WO2008072392 A1 WO 2008072392A1 JP 2007062397 W JP2007062397 W JP 2007062397W WO 2008072392 A1 WO2008072392 A1 WO 2008072392A1
Authority
WO
WIPO (PCT)
Prior art keywords
exhaust gas
water
chlorine
sulfur hexafluoride
discharge gas
Prior art date
Application number
PCT/JP2007/062397
Other languages
English (en)
Japanese (ja)
Inventor
Toshiaki Kato
Tatsuro Beppu
Hiroshi Imamura
Original Assignee
Kanken Techno Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kanken Techno Co., Ltd. filed Critical Kanken Techno Co., Ltd.
Priority to JP2008549209A priority Critical patent/JPWO2008072392A1/ja
Publication of WO2008072392A1 publication Critical patent/WO2008072392A1/fr

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
    • B01D53/77—Liquid phase processes
    • B01D53/78—Liquid phase processes with gas-liquid contact
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/46—Removing components of defined structure
    • B01D53/68—Halogens or halogen compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/20—Halogens or halogen compounds
    • B01D2257/206—Organic halogen compounds
    • B01D2257/2064—Chlorine
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/30—Sulfur compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2258/00—Sources of waste gases
    • B01D2258/02—Other waste gases
    • B01D2258/0216—Other waste gases from CVD treatment or semi-conductor manufacturing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02C—CAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
    • Y02C20/00—Capture or disposal of greenhouse gases
    • Y02C20/30—Capture or disposal of greenhouse gases of perfluorocarbons [PFC], hydrofluorocarbons [HFC] or sulfur hexafluoride [SF6]

Definitions

  • the present invention relates to an exhaust gas treatment method and apparatus for exhausting exhaust gas containing at least one of chlorine and sulfur hexafluoride as a safe gas.
  • Chlorine and sulfur hexafluoride used in the semiconductor manufacturing process are discharged as exhaust gas in a mixed state with other gases (for example, PFCs). Chlorine contained in such exhaust gas is extremely toxic to the human body, and sulfur hexafluoride has low toxicity to the human body, but its global warming potential (GWP) is tens of thousands of times that of CO. In addition to atmospheric life
  • an adsorption fixed type in which a component to be removed is adsorbed on a solid adsorbent a heating decomposition type using a fuel flame, an electric heater, atmospheric pressure plasma, or the like.
  • Many methods are used, such as a reaction decomposition method using a chemical reaction and a wet method using water or a chemical solution.
  • Patent Document 1 Japanese Unexamined Patent Publication No. 2000-157830
  • the main subject of the present invention is a single exhaust gas treatment method capable of efficiently and reliably removing chlorine and sulfur hexafluoride from exhaust gas without using an alkaline chemical as the chemical. And to provide the device.
  • the invention described in claim 1 is an "exhaust gas treatment method for purifying exhaust gas (F) containing at least one of chlorine and sulfur hexafluoride, wherein the exhaust gas (F) is heated at a high temperature. With water vapor Alternatively, after reacting with at least one of oxygen, washing with water, the washed exhaust gas (F) is further brought into gas-liquid contact with the alkaline ionized water (A) ”.
  • the exhaust gas (F) containing at least one of chlorine and sulfur hexafluoride is reacted with at least one of water vapor and oxygen at a high temperature, so that chlorine in the exhaust gas is converted into water. It is easily dissolved in salty hydrogen or chloric acid, and sulfur hexafluoride in the exhaust gas (F) is converted into hydrogen fluoride that is soluble in water and sulfur dioxide that is difficult to dissolve in neutral water. Converted. Therefore, by washing the exhaust gas (F) containing these products with water, 90% or more of hydrogen chloride or chlorine oxide in the exhaust gas (F), most of the hydrogen fluoride, and a part of sulfur dioxide are exhausted. (F) It can be removed from the inside.
  • the invention described in claim 2 relates to an exhaust gas treatment device (10) capable of carrying out the exhaust gas treatment method described in claim 1, wherein "exhaust gas (F) and steam or A reactor (12) for reacting at least one of oxygen at high temperature, a water scrubber (14) for washing exhaust gas (F) treated in the reactor (12), and an electrolysis for producing alkaline ionized water (A) Gas-liquid contact means for bringing the Al-ion reion water (A) produced by the electrolyzed water production device (16) into gas-liquid contact with the water production device (16) and the exhaust gas (F) washed with water scrubber (14) ( 18) ”is an exhaust gas treatment device (10).
  • the invention described in claim 3 is the exhaust gas treatment device (10) according to claim 2, wherein either of "reactor (12) force normal pressure plasma (P) or electric heater” is used.
  • the combustion flame is used as a heat source '', and when either the atmospheric pressure plasma (P) or the electric heater is used as the heat source, only electricity and water are used in the exhaust gas (F). It can reliably remove chlorine and sulfur hexafluoride to a safe level.
  • by-product gases such as sulfur oxides are separated from substances generated by the decomposition of exhaust gas (F) when a combustion flame is generated by burning a fuel such as natural gas. Although this occurs, such a by-product gas can also be absorbed by the alkaline water (A) and removed from the exhaust gas (F).
  • chlorine and sulfur hexafluoride in exhaust gas each of which has been conventionally detoxified by a separate method without using an alkaline chemical solution such as caustic soda, can be reduced to a TLV value or less by a single method. Can be reduced.
  • the exhaust gas is reacted with at least one of water vapor and oxygen at high temperature and then washed with water.
  • most of the chlorine and sulfur hexafluoride in the exhaust gas are converted to substances that are soluble in water and then washed with water.
  • most of the chlorine or sulfur hexafluoride in the exhaust gas is removed. Can be removed. Therefore, the harmful components remaining in the exhaust gas can be almost completely removed from the exhaust gas simply by bringing a small amount of alkaline ionized water into gas-liquid contact with the washed exhaust gas.
  • the amount of alkaline ionized water can be remarkably reduced, and the exhaust gas treatment device (more specifically, the electrolyzed water producing device used for producing alkaline ionized water) can be made compact. In addition, even an exhaust gas containing a high concentration of chlorine or sulfur hexafluoride or a large volume of exhaust gas can be reliably removed.
  • FIG. 1 is a schematic view showing an exhaust gas treatment apparatus according to one embodiment of the present invention.
  • FIG. 2 is a schematic view showing an exhaust gas treatment apparatus according to another embodiment of the present invention.
  • FIG. 1 is a schematic view showing one embodiment of an exhaust gas treatment apparatus (10) for carrying out the exhaust gas treatment method of the present invention.
  • the exhaust gas treatment device (10) of this example is roughly composed of a reactor (12), a water scrubber (14), an electrolyzed water production device (16), and a gas-liquid contact means (18). Has been.
  • the reaction furnace (12) is for reacting the exhaust gas (F) containing at least one of chlorine or sulfur hexafluoride, such as semiconductor manufacturing processes, with water vapor or oxygen at a high temperature. And a reaction tube (12a) and a plasma jet torch (12b).
  • the temperature condition for reacting the exhaust gas (F) with water vapor or oxygen is preferably a high temperature of 1000 ° C or higher. If the temperature conditions are strong, the bond between fluorine and sulfur in sulfur hexafluoride can be reliably broken, and even if the exhaust gas (F) contains other PFCs such as CF,
  • the upper limit of the temperature condition depends on the heat resistance of the material constituting the reactor (12).
  • the reaction cylinder (12a) is a straight pipe member formed of a refractory material such as castable, having an internal space (R), and having both ends open.
  • the reaction cylinder (12a) is erected on a water tank (20) for storing water, and an atmospheric pressure plasma (P) serving as a heat source is placed at the upper end of the reaction cylinder (12a).
  • a plasma jet torch (12b) for generating water is attached so as to close the opening.
  • one end of an exhaust gas supply pipe (24) for supplying exhaust gas (F) and water vapor or oxygen toward the internal space (R) of the reaction cylinder (12a) is connected to the upper part of the reaction cylinder (12a). It has been.
  • the plasma jet torch (12b) is an anode composed of a nozzle and the anode.
  • a plasma jet outlet hole cap at the tip of the anode is provided by applying a discharge voltage between the anode and the force sword and feeding a working gas such as nitrogen into the anode.
  • high temperature atmospheric pressure plasma (P) is ejected.
  • the water scrubber (14) is for washing the exhaust gas (F) treated in the reaction furnace (12) with water, and is provided with an exhaust gas inlet (14a) at the lower end.
  • This water scrubber (14) is also erected on the water tank (20) in the same manner as the reaction tube (12a), so that the water sprayed from the spray nozzle (14c) is sent to the water tank (20). It has become.
  • a gas-liquid contact means (18), which will be described later, is attached to the upper part of the scrubber body (14b), and the treated exhaust gas (F) is discharged into the atmosphere at the top outlet of the gas-liquid contact means (18). Connected to the exhaust fan (26) that discharges into the interior.
  • the electrolyzed water production apparatus (16) is an apparatus for producing alkaline ionized water (A) having an alkaline pH of 11 or more and an acid-reduction potential of ⁇ 800 mV or less, and a permselective membrane (for example, a positive permeable membrane). It has a reaction vessel (not shown) in which a positive electrode having Pt (platinum) isotropic force and a negative electrode having Pt isotropic force are opposed to each other via ion permeation). Alkaline ionized water (A) is produced by supplying raw water to this reaction tank and supplying power to each electrode.
  • brine having a pH of about 4 to about LO is used as it is.
  • “boiled water” refers to water that can easily be obtained from the wells such as tap water, well water, and industrial water, and usually contains impurity ions such as sodium and potassium.
  • the exhaust gas treatment device (10) of this example is provided with a water pipe (28) having one end connected to a city water supply such as water supply or well water and the other end connected to a spray nozzle (14c).
  • the brine is supplied to the electrolyzed water production device (16) through the branch water pipe (28a) branched from the water pipe (28).
  • the gas-liquid contact means (18) is provided in the upper part (downstream of the exhaust gas (F) flow direction) in the scrubber body (14b), and is manufactured by the exhaust gas (F) and the electrolyzed water production device (16).
  • Gas and liquid with alkaline ionized water (A) It is for making it contact, and has a porous body filling layer (18a) and an alkali ion water dropping nozzle (18b).
  • the porous material filling layer (18a) is filled with a porous material (30) composed of activated carbon having a fine mesh pores, porous alumina, or hydrophilic sponge having open cells. It is a layer constructed as follows. This porous material packed bed (18a) is attached so that the exhaust gas (F) can be divided through the internal space of the scrubber body (14b), and the alkaline ionized water dripping nozzle (18b) force is also provided. The dropped alkaline ionized water (A) stays in the porous material packed bed (18a) for a certain period.
  • the alkaline ionized water dropping nozzle (18b) is provided above the porous body packed layer (18a) and drops alkaline ionized water (A) so as to face the exhaust gas (F) flow direction.
  • the nozzle body (32) is connected to a supply pipe (34) for supplying alkaline ionized water (A) produced by the electrolyzed water production apparatus (16) to the nozzle body (32).
  • the force shown in the case where the gas-liquid contact means (18) is composed of the porous material packed layer (18a) and the alkali ion water dropping nozzle (18b) is shown in FIG.
  • a porous plate (36a) that divides the internal space of the scrubber body (14b) is attached, and the size of the pores of the porous plate (36a) and the amount of passing air are balanced.
  • a bubbling tank (36) for storing alkali ion water (A) dropped from the alkali ion water dropping nozzle (18b) may be provided on the upper surface of the porous plate (36a).
  • Liquid contact means (18) may be used.
  • the gas-liquid contact means (18) is composed of the porous material packed layer (18a) or the publishing tank (36) and the alkaline ionized water dropping nozzle (18b), so that a small amount of alkaline ionized water is used. (A) Even if the amount used, the exhaust gas (F) and the alkaline ionized water (A) can be reliably brought into gas-liquid contact.
  • the method of adding water vapor or oxygen to the internal space (R) of the reaction tube (12a) together with the exhaust gas (F) is (a) water vapor or oxygen adjusted in a separate line from the exhaust gas (F).
  • the exhaust gas (F) is mixed and supplied to the exhaust gas supply pipe (24).
  • the exhaust gas (F) is washed with a water scrubber (not shown) to remove water-soluble components and dust.
  • water is supplied to the exhaust gas (F) and the exhaust gas (F) containing this water is supplied to the internal space (R) of the reaction tube (12a) (via the exhaust gas supply pipe (24)). It may be a method.
  • the exhaust gas (F) treated in the internal space (R) of the reaction tube (12a) is given to the water scrubber (14) by the negative pressure generated by the operation of the exhaust fan (26).
  • Water is injected into the exhaust gas (F) from the downward spray nozzle (14c).
  • more than 90% of the chlorine-derived components (specifically, salt-hydrogen or chlorate) converted in the reactor (12) and most of the hydrogen fluoride among the components derived from sulfur hexafluoride.
  • a part of sulfur dioxide is absorbed by water and removed from the exhaust gas (F).
  • a plasma jet torch (12b) using a small power source with an output of less than 15 kW is used, and exhaust gas (F) for a total flow rate of 100 liters Z, including 500 cc of chlorine and 500 cc of sulfur hexafluoride.
  • exhaust gas (F) for a total flow rate of 100 liters Z, including 500 cc of chlorine and 500 cc of sulfur hexafluoride.
  • the exhaust gas (F) washed with the water scrubber (14) passes through the porous body packed bed (18a). At that time, it comes into gas-liquid contact with alkaline ionized water (A). Then, chlorine remaining in the exhaust gas (F) or components derived from it (for example, chloric acid) etc. and neutral water, which is difficult to dissolve in neutral water, is absorbed by alkaline ionized water (A), Most of these exhaust gases (F) are removed. Specifically, chlorine that remained at about lOOppm after passing through the water scrubber (14) was reduced to about 0.1 ppm, and that from about 6 litters that remained at about lOOppm after passing through the water scrubber (14) was reduced to 0. It can be reduced to about 2ppm.
  • exhaust gas (F) that has been conventionally detoxified by separate methods without using an alkaline agent such as caustic soda. Chlorine and sulfur hexafluoride can be reduced below the TLV value by a single method.
  • the exhaust gas (F) is reacted with at least one of water vapor or oxygen at a high temperature and then washed with water, that is, the chlorine in the exhaust gas (F). Futsui ⁇ Most of the sulfur can be easily dissolved in water, converted into substances, and then washed with water. At this stage, most of the chlorine or sulfur hexafluoride in the exhaust gas (F) is removed. be able to. Therefore, after that, just by bringing a small amount of alkaline ionized water (A) into gas-liquid contact with the washed exhaust gas (F), harmful components remaining in the exhaust gas (F) can be removed almost completely. it can.
  • the amount of alkali ion water (A) can be significantly reduced, and the exhaust gas treatment device (10) (more specifically, the electrolyzed water production device (16) used for the production of alkali ion water (A)). Can be made compact. Further, even if the exhaust gas (F) containing a high concentration of chlorine or sulfur hexafluoride is a large-capacity exhaust gas (F), the detoxification treatment can be reliably performed.
  • gas-liquid contact means (18) is incorporated in the water scrubber (14) in the present embodiment, the gas-liquid contact means (18) is independent of the water scrubber (14). It may be provided as a separate item.
  • atmospheric pressure plasma (P) is used as a heat source.
  • This heat source may be any type, for example, an electric heater or a combustion flame generated by burning fuel such as natural gas. If atmospheric pressure plasma (P) or an electric heater is used as the heat source, chlorine and sulfur hexafluoride in the exhaust gas (F) can be safely removed using only electricity and water. Can be reliably removed to a certain level.

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Biomedical Technology (AREA)
  • Analytical Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Treating Waste Gases (AREA)
  • Gas Separation By Absorption (AREA)
  • Water Treatment By Electricity Or Magnetism (AREA)

Abstract

L'invention concerne un seul procédé de traitement de gaz de refoulement dans lequel du chlore et de l'hexafluorure de soufre peuvent être efficacement éliminés d'un gaz de refoulement sans problème, sans utiliser un agent alcalin liquide; et un appareil pour le procédé. Le procédé de traitement de gaz de refoulement comprend la purification d'un gaz de refoulement (F) contenant au moins du chlore et de l'hexafluorure de soufre, et est caractérisé par le fait que le gaz de refoulement (F) est amené à réagir à une température élevée avec au moins de la vapeur d'eau ou de l'oxygène, puis lavé avec de l'eau, et le gaz de refoulement (F) lavé avec de l'eau est amené en contact avec une eau à ions alcalins (A) par contact gaz/liquide. En raison d'une telle structure, le chlore et l'hexafluorure de soufre contenus dans un gaz de refoulement (F) éliminé de façon classique par des procédés séparés respectifs, peuvent être éliminés par un seul procédé jusqu'à une valeur non supérieure à une TLV sans utilisation d'un agent chimique alcalin tel que de la soude caustique.
PCT/JP2007/062397 2006-12-15 2007-06-20 Procédé de traitement de gaz de refoulement et appareil pour celui-ci WO2008072392A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2008549209A JPWO2008072392A1 (ja) 2006-12-15 2007-06-20 排ガス処理方法およびその装置

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JP2006338774 2006-12-15
JP2006-338774 2006-12-15

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Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2324902A1 (fr) * 2008-09-08 2011-05-25 Taiyo Nippon Sanso Corporation Procédé et dispositif pour traiter un gaz d'échappement
JP2011104531A (ja) * 2009-11-18 2011-06-02 Japan Organo Co Ltd 空気の浄化装置
WO2013140653A1 (fr) * 2012-03-23 2013-09-26 Kurushima Takeo Procédé de traitement de gaz de refoulement
CN108579386A (zh) * 2018-05-23 2018-09-28 绍兴市鼎泰节能环保科技有限公司 一种高效化工废气净化系统
CN108607344A (zh) * 2018-05-23 2018-10-02 绍兴市鼎泰节能环保科技有限公司 一种含氯化工废气净化系统
WO2020224572A1 (fr) * 2019-05-06 2020-11-12 (Cnbm) Bengbu Design & Research Institute For Glass Industry Co., Ltd Procédé et dispositif pour produire un semi-conducteur composé contenant du chalcogène
WO2023189306A1 (fr) * 2022-03-30 2023-10-05 栗田工業株式会社 Procédé de nettoyage, liquide de nettoyage, et produit de nettoyage pour installation de traitement de gaz d'échappement
WO2023199410A1 (fr) * 2022-04-12 2023-10-19 カンケンテクノ株式会社 Procédé de traitement de gaz d'échappement contenant un composé d'azote, et appareil pour ledit procédé

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000157830A (ja) * 1998-11-25 2000-06-13 Kashiyama Kogyo Kk 排ガス処理方法および処理装置
JP2003088727A (ja) * 2001-09-20 2003-03-25 Hitachi Ltd 過弗化物処理の処理方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000157830A (ja) * 1998-11-25 2000-06-13 Kashiyama Kogyo Kk 排ガス処理方法および処理装置
JP2003088727A (ja) * 2001-09-20 2003-03-25 Hitachi Ltd 過弗化物処理の処理方法

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2324902A1 (fr) * 2008-09-08 2011-05-25 Taiyo Nippon Sanso Corporation Procédé et dispositif pour traiter un gaz d'échappement
EP2324902A4 (fr) * 2008-09-08 2014-06-04 Taiyo Nippon Sanso Corp Procédé et dispositif pour traiter un gaz d'échappement
JP2011104531A (ja) * 2009-11-18 2011-06-02 Japan Organo Co Ltd 空気の浄化装置
WO2013140653A1 (fr) * 2012-03-23 2013-09-26 Kurushima Takeo Procédé de traitement de gaz de refoulement
JPWO2013140653A1 (ja) * 2012-03-23 2015-08-03 武男 久留嶋 排ガスの処理方法
CN108579386A (zh) * 2018-05-23 2018-09-28 绍兴市鼎泰节能环保科技有限公司 一种高效化工废气净化系统
CN108607344A (zh) * 2018-05-23 2018-10-02 绍兴市鼎泰节能环保科技有限公司 一种含氯化工废气净化系统
WO2020224572A1 (fr) * 2019-05-06 2020-11-12 (Cnbm) Bengbu Design & Research Institute For Glass Industry Co., Ltd Procédé et dispositif pour produire un semi-conducteur composé contenant du chalcogène
US11885010B2 (en) 2019-05-06 2024-01-30 Cnbm Research Institute For Advanced Glass Materials Group Co., Ltd. Process and device for producing a chalcogen-containing compound semiconductor
WO2023189306A1 (fr) * 2022-03-30 2023-10-05 栗田工業株式会社 Procédé de nettoyage, liquide de nettoyage, et produit de nettoyage pour installation de traitement de gaz d'échappement
WO2023199410A1 (fr) * 2022-04-12 2023-10-19 カンケンテクノ株式会社 Procédé de traitement de gaz d'échappement contenant un composé d'azote, et appareil pour ledit procédé

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