WO2023092444A1 - 显示基板及显示装置 - Google Patents

显示基板及显示装置 Download PDF

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Publication number
WO2023092444A1
WO2023092444A1 PCT/CN2021/133450 CN2021133450W WO2023092444A1 WO 2023092444 A1 WO2023092444 A1 WO 2023092444A1 CN 2021133450 W CN2021133450 W CN 2021133450W WO 2023092444 A1 WO2023092444 A1 WO 2023092444A1
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WIPO (PCT)
Prior art keywords
boundary line
conductive layer
line
display substrate
layer
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PCT/CN2021/133450
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English (en)
French (fr)
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WO2023092444A9 (zh
Inventor
白露
张波
陈家兴
周洋
初志文
Original Assignee
京东方科技集团股份有限公司
成都京东方光电科技有限公司
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Application filed by 京东方科技集团股份有限公司, 成都京东方光电科技有限公司 filed Critical 京东方科技集团股份有限公司
Priority to US18/267,538 priority Critical patent/US20240057452A1/en
Priority to PCT/CN2021/133450 priority patent/WO2023092444A1/zh
Priority to CN202180003635.5A priority patent/CN117501835A/zh
Publication of WO2023092444A1 publication Critical patent/WO2023092444A1/zh
Publication of WO2023092444A9 publication Critical patent/WO2023092444A9/zh

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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80Constructional details
    • H10K59/87Passivation; Containers; Encapsulations
    • H10K59/873Encapsulations
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10OLED displays
    • H10K59/12Active-matrix OLED [AMOLED] displays
    • H10K59/131Interconnections, e.g. wiring lines or terminals

Definitions

  • the present disclosure belongs to the field of display technology, and in particular relates to a display substrate and a display device.
  • Organic electroluminescent diode Organic Light-Emitting Diode, OLED
  • quantum dot light-emitting diode Quantum Dot Light Emitting Diodes, QLED
  • CVD chemical Vapor Deposition
  • the present disclosure aims to solve at least one of the technical problems existing in the prior art, and provides a display substrate and a display device.
  • an embodiment of the present disclosure provides a display substrate having a display area and a non-display area surrounding the display area, wherein the display substrate includes: a base, located on the base and disposed on the non-display area The barrier structure of the region; the display substrate also includes: a first conductive layer, a second conductive layer, and an anode conductive layer that are located on the base and arranged in sequence along a direction away from the base; the first conductive layer has a first A boundary line; the anode conductive layer has a second boundary line substantially parallel to the extending direction of the first boundary line; the second boundary line is located on a side of the first boundary line away from the display area;
  • the non-display area includes: a fan-out area arranged on one side of the display area and a corner area connected to the fan-out area;
  • the first conductive layer is cut off, and the second conductive layer is continuously arranged;
  • the anode conductive layer is cut off, and the orthographic projection of the blocking structure on the substrate at least partially covers the orthographic projections of the first boundary line and the second boundary line on the substrate.
  • the blocking structure includes: a first blocking dam
  • the orthographic projection of the first barrier dam on the base at least partially covers the orthographic projections of the first boundary line and the second boundary line on the base.
  • the first conductive layer further has a third boundary line substantially parallel to the extension direction of the first boundary line; the third boundary line is located at a side of the first boundary line away from the display area. side;
  • the anode conductive layer also has a fourth boundary line substantially parallel to the extending direction of the second boundary line; the fourth boundary line is located on a side of the second boundary line away from the display area, and the The fourth boundary line is located on a side of the third boundary line away from the display area.
  • the blocking structure further includes: a second blocking dam; the second blocking dam is located on a side of the first blocking dam away from the display area;
  • the orthographic projection of the second barrier dam on the base at least partially covers the orthographic projections of the third boundary line and the fourth boundary line on the base.
  • the first conductive layer also has a first connecting line connecting the first boundary line and the third boundary line;
  • the anode conductive layer also has a connection line connecting the second boundary line and the third boundary line.
  • a second connection line of four boundary lines; the second connection line is located on a side of the first connection line close to the fan-out area;
  • the angle between the extension direction of the first connecting line and the extension directions of the first boundary line and the third boundary line is greater than or equal to 90 degrees
  • An included angle between the extending direction of the second connecting line and the extending directions of the second boundary line and the fourth boundary line is greater than or equal to 90 degrees.
  • the first conductive layer further has a fifth boundary line substantially parallel to the extending direction of the third boundary line; the fifth boundary line is located at a position where the third boundary line is away from the display area. side;
  • the anode conductive layer also has a sixth boundary line whose extension direction is substantially parallel to the fourth boundary line; the sixth boundary line is located on a side of the fourth boundary line away from the display area, and the sixth boundary line The six boundary lines are located on a side of the fifth boundary line away from the display area.
  • the display substrate further includes: an intercepting structure located on the base and disposed in the non-display area;
  • the blocking structure is farther away from the display area than the second blocking dam.
  • the orthographic projection of the intercepting structure on the base at least partially covers the orthographic projections of the fifth boundary line and the sixth boundary line on the base.
  • the first conductive layer also has a third connecting line connecting the third boundary line and the fifth boundary line;
  • the anode conductive layer also has a connecting line connecting the fourth boundary line and the fifth boundary line.
  • the fourth connection line of the six boundary lines; the fourth connection line is located on the side of the third connection line close to the fan-out area;
  • the angle between the extension direction of the third connecting line and the extension directions of the third boundary line and the fifth boundary line is greater than or equal to 90 degrees
  • An included angle between the extending direction of the fourth connecting line and the extending directions of the fourth boundary line and the sixth boundary line is greater than or equal to 90 degrees.
  • the first conductive layer further has a seventh boundary line substantially parallel to the extension direction of the third boundary line; the seventh boundary line is located between the first boundary line and the third boundary line between;
  • the anode conductive layer also has an eighth boundary line substantially parallel to the extension direction of the fourth boundary line; the eighth boundary line is located between the second boundary line and the fourth boundary line, and the The eighth boundary line is located on a side of the seventh boundary line away from the display area.
  • the first barrier dam includes: a first sub-dam and a second sub-dam; the first sub-dam is closer to the display area than the second sub-dam;
  • an orthographic projection of the first sub-dam on the base at least partially covers an orthographic projection of the first boundary line and the second boundary line on the base;
  • the orthographic projection of the second sub-dam on the base at least partially covers the orthographic projections of the seventh boundary line and the eighth boundary line on the base.
  • the first conductive layer further has a fifth connection line connecting the first boundary line and the seventh boundary line, and a sixth connection line connecting the third boundary line and the seventh boundary line.
  • the anode conductive layer also has a seventh connection line connecting the second boundary line and the eighth boundary line, and an eighth connection line connecting the fourth boundary line and the eighth boundary line ;
  • the seventh connection line is located on a side of the fifth connection line close to the fan-out area, and the eighth connection line is located on a side of the sixth connection line close to the fan-out area;
  • the angle between the extension direction of the fifth connection line and the extension directions of the first boundary line and the seventh boundary line is greater than or equal to 90 degrees; the extension direction of the sixth connection line and the extension direction of the first boundary line
  • the included angle between the three boundary lines and the extension direction of the seventh boundary line is greater than or equal to 90 degrees;
  • the angle between the extension direction of the seventh connection line and the extension directions of the second boundary line and the eighth boundary line is greater than or equal to 90 degrees; the extension direction of the eighth connection line and the extension direction of the first boundary line
  • the included angle between the extending direction of the four boundary lines and the eighth boundary line is greater than or equal to 90 degrees.
  • the first conductive layer further has a ninth boundary line substantially parallel to the extension direction of the third boundary line; the ninth boundary line is located at a position where the third boundary line is away from the display area. side;
  • the anode conductive layer also has a tenth boundary line substantially parallel to the extending direction of the fourth boundary line; the tenth boundary line is located on a side of the fourth boundary line away from the display area, and the The tenth boundary line is located on a side of the ninth boundary line away from the display area.
  • the second barrier dam includes: a third sub-dam and a fourth sub-dam; the third sub-dam is closer to the display area than the fourth sub-dam;
  • the orthographic projection of the third sub-dam on the base at least partially covers the orthographic projections of the third boundary line and the fourth boundary line on the base;
  • the orthographic projection of the fourth sub-dam on the base at least partially covers the orthographic projections of the ninth boundary line and the tenth boundary line on the base.
  • the first conductive layer further has a ninth connection line connecting the third boundary line and the ninth boundary line, and a tenth connection line connecting the fifth boundary line and the ninth boundary line. connecting line;
  • the anode conductive layer also has an eleventh connecting line connecting the fourth boundary line and the tenth boundary line, and a twelfth connecting line connecting the sixth boundary line and the tenth boundary line Connection lines;
  • the eleventh connection line is located on the side of the ninth connection line close to the fan-out area, and the twelfth connection line is located on the side of the tenth connection line close to the fan-out area ;
  • the angle between the extending direction of the ninth connecting line and the extending directions of the third boundary line and the ninth boundary line is greater than or equal to 90 degrees; the extending direction of the tenth connecting line and the extending direction of the first The angle between the extending direction of the fifth boundary line and the ninth boundary line is greater than or equal to 90 degrees;
  • the angle between the extending direction of the eleventh connecting line and the extending directions of the fourth boundary line and the tenth boundary line is greater than or equal to 90 degrees; the extending direction of the twelfth connecting line and the An included angle between the extension directions of the sixth boundary line and the tenth boundary line is greater than or equal to 90 degrees.
  • the display substrate further includes: a pixel defining layer located on the anode conductive layer;
  • the thickness of the pixel defining layer in the fan-out region is greater than that in the corner region.
  • the display substrate further includes: a light-emitting device located in a region defined by the pixel definition layer; the light-emitting device includes: a first electrode and a second electrode oppositely arranged, and a an organic light-emitting layer between the second electrodes;
  • the first electrode is arranged in the same layer as the anode conductive layer.
  • the display substrate further includes: a pixel circuit located between the substrate and the anode conductive layer and disposed in the display area;
  • the pixel circuit includes: a thin film transistor;
  • the thin film transistor includes: An active layer, a gate insulating layer, a gate, an interlayer insulating layer, a source and a drain disposed on the substrate;
  • the first electrode is electrically connected to the source or the drain through a via electrode;
  • the first conductive layer is set on the same layer as the source and the drain;
  • the second conductive layer is disposed on the same layer as the transfer electrode.
  • the display substrate further includes: a power supply voltage line connected to the second electrode;
  • the power supply voltage line includes: a first sub-power supply voltage line and a second sub-power supply voltage line;
  • the first sub-power supply voltage line is set on the same layer as the first conductive layer; the second sub-power supply voltage line is set on the same layer as the second conductive layer.
  • the display substrate further includes: an encapsulation layer located on the pixel defining layer; the encapsulation layer includes: a first inorganic encapsulation layer, an organic encapsulation layer, and a second Inorganic encapsulation layer;
  • the first inorganic encapsulation layer and the second inorganic encapsulation layer cover the barrier structure and are cut off on the side of the barrier structure away from the display area;
  • the organic encapsulation layer is cut off at a side of the barrier structure close to the display area.
  • the display substrate further includes: a first organic insulating layer and a second organic insulating layer;
  • the first organic insulating layer is located between the first conductive layer and the second conductive layer;
  • the second organic insulating layer is located between the second conductive layer and the anode conductive layer.
  • both the first organic insulating layer and the second organic insulating layer are provided with trenches in corresponding regions between the intercepting structure and the blocking structure.
  • the second conductive layer has an eleventh boundary line; in the corner area, the eleventh boundary line is located on a side of the sixth boundary line away from the display area.
  • the first conductive layer also has a twelfth boundary line intersecting with the extending direction of the first boundary line;
  • the anode conductive layer also has a thirteenth boundary line intersecting with the extending direction of the second boundary line Wire;
  • the twelfth boundary line is located in the fan-out area, and the thirteenth boundary line is located in the corner area.
  • At least part of the first conductive layer, the second conductive layer and the anode conductive layer are electrically connected.
  • an embodiment of the present disclosure provides a display device, wherein the display device includes the display substrate as provided above.
  • FIG. 1 is a schematic structural view of an exemplary display substrate
  • FIG. 2 is a schematic diagram of an enlarged structure of a corner area in the display substrate shown in FIG. 1;
  • Fig. 3 is a schematic cross-sectional structure diagram of the display substrate shown in Fig. 2 along the direction A-A';
  • FIG. 4a is a schematic structural diagram of a display substrate provided by an embodiment of the present disclosure.
  • FIG. 4b is a schematic structural diagram of another display substrate provided by an embodiment of the present disclosure.
  • FIG. 4c is a schematic structural diagram of another display substrate provided by an embodiment of the present disclosure.
  • FIG. 4d is a schematic structural diagram of another display substrate provided by an embodiment of the present disclosure.
  • FIG. 5a is a schematic diagram of an enlarged structure of a corner region in the display substrate shown in FIG. 4a;
  • 5b-5e are enlarged structural schematic diagrams of corner regions in the display substrate shown in FIG. 4b;
  • 5f-5g are enlarged structural schematic diagrams of corner regions in the display substrate shown in FIG. 4c;
  • 5h-5i are enlarged structural schematic diagrams of corner regions in the display substrate shown in FIG. 4d;
  • FIG. 5j is a schematic diagram of an enlarged structure of a corner region in the display substrate shown in FIG. 4b;
  • Fig. 6 is a schematic cross-sectional structure diagram of the display substrate shown in Figs. 5a-5i along the B-B' direction;
  • Fig. 7 is a schematic cross-sectional structure diagram of the display substrate shown in Fig. 4a-4d along the C-C' direction;
  • Fig. 8 is a schematic cross-sectional structure diagram of the display substrate shown in Fig. 4b along the D-D' direction.
  • Fig. 1 is a schematic structural view of an exemplary display substrate
  • Fig. 2 is an enlarged structural schematic view of a corner area in the display substrate shown in Fig. 1, as shown in Fig. 1 and Fig. 2, the display substrate has a display area 10 and surrounding
  • the non-display area 20 of the display area 10 the display substrate includes: a substrate 101, a blocking structure 200 and an intercepting structure 300 located on the base 101 and arranged on the non-display area 20; the blocking structure 200 is closer to the display area 10 than the intercepting structure 300; the display substrate It also includes: a first conductive layer 102 , a second conductive layer 103 and an anode conductive layer 104 located on the substrate 101 and arranged in sequence along a direction away from the substrate 101 .
  • the first conductive layer 102 and the second conductive layer 103 can form the film layers of each thin film transistor device in the display area 10, and can also form signal lines connected with the thin film transistors and light emitting devices in the display area 10.
  • the anode conductive layer 104 Anodes of respective light emitting devices in the display region 10 may be formed.
  • the above-mentioned display substrate and the subsequent descriptions are described using an OLED display substrate as an example.
  • the above-mentioned display substrate can also be a QLED display substrate.
  • the first conductive layer 102 and the second conductive layer 103 can extend from the display area 10 to the non-display area 20, specifically, the first conductive layer 102 and the second conductive layer 103 can be power supply voltage lines, such as low-level power supply voltage line VSS. It can be understood that the first conductive layer 102 and the second conductive layer 103 can also be other types of signal lines, which are not listed here. In the embodiment of the present disclosure and the following descriptions, the low-level signal line VSS will be used Take this as an example. Both the blocking structure 200 and the blocking structure 300 are made of organic materials, specifically, the blocking structure 200 includes a first blocking dam 201 and a second blocking dam 202 .
  • two insulating layers are disposed between the first conductive layer 102 and the second conductive layer 103 , one of which is an organic insulating layer and the other is an inorganic insulating layer.
  • the inorganic insulating layer is often eliminated, that is, only one organic insulating layer is disposed between the first conductive layer 102 and the second conductive layer 103 .
  • the low-level power supply line VSS is generally made of double-layer conductive layers, but since the inorganic insulating layer is canceled, in the fan-out area 20a, if only the first conductive layer is used
  • the layer 102 passes through the barrier structure 200 and the interception structure 300 to connect with the driver chip, and the second conductive layer 103 needs to be cut off in the corner area 20b. Since the first conductive layer 102 and the second conductive layer 103 are made of the same material, the first The exposed conductive layer 102 will be etched away when the second conductive layer 103 is etched, affecting the circuit structure.
  • the second conductive layer 103 is prepared after the first conductive layer 102 , and there are fewer subsequent processes, and the etching depth of the second conductive layer 103 is smaller than that of the first conductive layer 102 . Therefore, only one layer of the second conductive layer 103 must be used to pass through the barrier structure 200 and the interception structure 300 to connect the driving chip.
  • the first conductive layer 102 needs to shrink from the position of the interception structure 300 to the display area 10 to stop at the position of the fan-out area 20a, so that only the second The conductive layer 103 passes through the blocking structure 200 and the intercepting structure 300. Since the first conductive layer 102 is often covered with an organic material layer, the position where the first conductive layer 102 shrinks toward the display area 10, that is, the position 1 and the position 2 At the place, it is easy to form a water vapor channel (marked by the arrow in the figure).
  • the boundary line of the first conductive layer 102 is below the intercepting structure 300, and extends along the intercepting structure 300 to position 1; at position 1, the first conductive layer 102 is shrunk by the intercepting structure 300 to the second barrier dam 202 and extends along the second barrier dam 202 to position 3. At the same time, the anode conductive layer 104 shrinks from the second barrier dam 202 to the side of the first barrier dam 201 near the display area 10 at position 2.
  • the first conductive layer 102 needs to be covered by an organic material layer when passing from the interception structure 300 to the second barrier dam 202; at position 2, the anode conductive layer 104 shrinks from the second barrier dam 202 to the first
  • the inner side of a barrier dam 201 is covered by the pixel definition layer; the first conductive layer 102 is shrunk from the second barrier dam 202 to below the first barrier dam 201, and extends to 3 positions along the first barrier dam 201 to finallyshrinking to the display area 10, at position 3, in order to reduce water vapor passage, the first conductive layer 102 does not cover the organic material layer.
  • the first conductive layer 102 takes the shortest path to shrink both at the 1st position and the 2nd position, forming a water vapor channel between the 1st position and the 2nd position.
  • FIG. 3 is a schematic cross-sectional structure diagram along the AA' direction at position 3 of the display substrate shown in FIG. 2.
  • the second conductive layer 103 is likely to break here, because there is no anode conductive layer 104 covering here, it is easy to form a step difference here, and the encapsulation layer on it is easy to form cracks at the fracture, resulting in encapsulation failure, making Water vapor enters the interior of the display substrate through the water vapor channel, causing the organic light-emitting layer of the light-emitting device to oxidize and fail to perform normal light emission.
  • the embodiments of the present disclosure provide a display substrate and a display device.
  • the display substrate and the display device provided by the embodiments of the present disclosure will be further described in detail below with reference to the drawings and specific embodiments.
  • Fig. 4a is a schematic structural diagram of a display substrate provided by an embodiment of the present disclosure
  • Fig. 5a is an enlarged structural schematic diagram of a corner area in the display substrate shown in Fig. 4a. It can be understood that only The structure of the corner region at the lower left corner of the display substrate is shown, and the structure of the corner region at the lower right corner is similar to that of the corner region at the lower left corner. Embodiments of the present disclosure will be described with the corner region at the lower left corner of the display substrate.
  • the display substrate provided by the embodiment of the present disclosure has a display area 10 and a non-display area 20 surrounding the display area 10.
  • the display substrate includes: a base 101 located on the base 101 and disposed in the non-display area 20 The barrier structure 200; the display substrate also includes: a first conductive layer 102, a second conductive layer 103 and an anode conductive layer 104 located on the substrate 101 and arranged in sequence along the direction away from the substrate 101; the first conductive layer 102 has a first side The boundary line 1021; the anode conductive layer 104 has a second boundary line 1041 substantially parallel to the extending direction of the first boundary line.
  • the substrate 101 can be made of rigid materials such as glass, which can improve the bearing capacity of the substrate 101 on other film layers thereon.
  • the substrate 101 can also be made of flexible materials such as polyimide (PI), which can improve the bending and stretching resistance of the overall display substrate, and avoid the occurrence of bending, stretching, and twisting. The stress causes the substrate 101 to break, resulting in poor disconnection.
  • the material of the base 101 can be reasonably selected according to actual needs, so as to ensure that the display substrate has good performance.
  • the barrier structure 200 can be made of organic materials, such as organic materials such as polyimide and epoxy resin. At the same time, the barrier structure 200 can be made of a single-layer structure or a multi-layer structure.
  • the barrier structure 200 can be It is formed in the non-display area 20 of the display substrate and surrounds the entire display area 10, so that the cracks caused by external force in the encapsulation layer and other film layers in the display substrate are stopped at the position of the blocking structure 200, preventing the cracks from extending from the non-display area 20 to the display area 10, affecting the performance of the light emitting device in the display area 10.
  • the first conductive layer 102 and the second conductive layer 103 can be made of the same conductive material, for example, metal materials such as aluminum, titanium, copper, and molybdenum, and at the same time, the first conductive layer 102 and the second conductive layer 103 can be made of a single layer It can also be made of multi-layer structure, such as three-layer metal layer structure such as titanium/aluminum/titanium, molybdenum/aluminum/molybdenum, titanium/copper/titanium or molybdenum/copper/molybdenum.
  • the first conductive layer 102 and the second conductive layer 103 can extend from the display area 10 to the non-display area 20, specifically, the first conductive layer 102 and the second conductive layer 103 can form the film layer of the thin film transistor in the display area 10,
  • Signal lines for transmitting signals may also be formed, such as power supply voltage lines, specifically, the power supply voltage lines may be low-level power supply voltage lines VSS.
  • the first conductive layer 102 and the second conductive layer 103 can also be other types of signal lines, which are not listed here. In the embodiment of the present disclosure and the following descriptions, the low-level signal line VSS will be used Take this as an example.
  • the first conductive layer 102 is cut off and is in an off state, and the second conductive layer 103 passes through the barrier structure 200 and is in a continuous state, and the second conductive layer 103 is used to pass through the barrier structure 200 to connect the driving chip.
  • the anode conductive layer 104 is cut off.
  • the first conductive layer 102 has a first boundary line 1021, and the anode conductive layer 104 has a second boundary line 1041.
  • the second boundary line 1041 is located on the side of the first boundary line 1021 away from the display area 10, and the barrier structure
  • the orthographic projection of 200 on the substrate 101 at least partially covers the orthographic projection of the first boundary line 1021 and the second boundary line 1041 on the substrate 101, that is, the barrier structure 200 covers the second boundary line 1041 of the anode conductive layer 104, and the anode conductive layer 104 Covering the first boundary line 1021 of the first conductive layer 102 .
  • the first boundary line 1021 is substantially parallel to the second boundary line 1041, and the substantially parallel here refers to the parallel within the tolerance of the process error range. In the following description, the meaning of substantially parallel is the same , which will not be described in detail.
  • the barrier structure 200 covers the second boundary line 1041 of the anode conductive layer 104, and the anode conductive layer 104 covers the first boundary line 1021 of the first conductive layer 102. Since the anode conductive layer 104 generally covers With the pixel defining layer, it is not necessary to separately provide an organic material layer to cover the second boundary line 1041 of the anode conductive layer 104 and the first boundary line 1021 of the first conductive layer 102 .
  • Both the first boundary line 1021 of the first conductive layer 102 and the second boundary line 1041 of the anode conductive layer 104 are located under the barrier structure 200 and extend a certain distance toward the fan-out region 20a, that is, the first conductive layer 102 and the anode conductive layer 104 shrinks toward the display area 10 together, without extending to the area outside the barrier structure 200, which can ensure the integrity of the organic material layer and avoid the formation of water vapor channels, so that water vapor can be prevented from entering the display area 10 of the display substrate through the water vapor channels. , resulting in the failure of the organic light-emitting layer of the light-emitting device, thereby avoiding the defect of continuously expanding dark spots caused by the failure of the organic light-emitting layer, thereby improving the display effect of the display substrate.
  • the barrier structure 200 includes: a first barrier dam 201; the orthographic projection of the first barrier dam 201 on the substrate 101 at least partially covers the first boundary line 1021 and the second boundary Orthographic projection of line 1041 on substrate 101 .
  • the barrier structure 200 can be composed of a barrier dam, that is, the first barrier dam 201, the first boundary line 1021 of the first conductive layer 102 and the second boundary line 1041 of the anode conductive layer 104 are all located below the first barrier dam 201 and toward Extend a certain distance along the direction of the fan-out area 20a, that is, the first conductive layer 102 and the anode conductive layer 104 shrink toward the display area 10 together, and do not need to extend to the area outside the barrier structure 200, so as to ensure the integrity of the organic material layer.
  • the first conductive layer 102 further has a third boundary line 1022 substantially parallel to the extension direction of the first boundary line 1021; the third boundary line 1022 is located on the first boundary line 1021 away from the side of the display area 10; the anode conductive layer 104 also has a fourth boundary line 1042 substantially parallel to the extending direction of the second boundary line 1041; the fourth boundary line 1042 is located on a side of the second boundary line 1041 away from the display area 10 side, and the fourth boundary line 1042 is located on the side of the third boundary line 1022 away from the display area 10 .
  • the third boundary line 1022 of the first conductive layer 102 and the fourth boundary 1042 of the anode conductive layer 104 extend a certain distance toward the direction of the fan-out region 20a and then shrink toward the direction of the first barrier dam 201, and then the third boundary line 1042 of the first conductive layer 102
  • the boundary line 1022 is connected to the first boundary line 1021
  • the fourth boundary line 1042 of the anode conductive layer 104 is connected to the second boundary line 1041
  • the anode conductive layer 104 covers the third boundary line 1022 of the first conductive layer 102 .
  • both the first conductive layer 102 and the anode conductive layer 104 have been shrunk twice, and extend a certain distance toward the fan-out region 20a, so that it is not necessary to directly shrink the first conductive layer 102 to the display region by the shortest path 10. It can extend the distance of the possible water vapor channel and delay the intrusion of water vapor, so that water vapor can be prevented from entering the display area 10 of the display substrate through the water vapor channel, which will lead to the failure of the organic light-emitting layer of the light-emitting device, thereby avoiding the failure of the organic light-emitting layer. This results in the defect of continuously expanding dark spots, thereby improving the display effect of the display substrate.
  • the barrier structure 200 further includes: a second barrier dam 202; the second barrier dam 202 is located on the side of the first barrier dam 201 away from the display area 10; the second barrier dam 202
  • the orthographic projection on the base 101 at least partially covers the orthographic projections of the third boundary line 1022 and the fourth boundary line 1042 on the base 101 .
  • the barrier structure 200 in the display substrate shown in FIG. 5b may include two barrier dams, that is, a first barrier dam 201 and a second barrier dam 202, The second barrier dam 202 is farther away from the display area 10 than the first barrier dam 201 .
  • Both the third boundary line 1022 of the first conductive layer 102 and the fourth boundary line 1042 of the anode conductive layer 104 are located under the second barrier dam 202 , extend for a certain distance toward the fan-out region 20a and then shrink to the first barrier dam 201 Then, it extends toward the fan-out area 20a for a certain distance and then shrinks to the display area 10.
  • both the first conductive layer 102 and the anode conductive layer 104 have undergone two shrinkages, which can prolong the possible formation of water vapor.
  • the distance of the channel delays the intrusion of water vapor, so that water vapor can be prevented from entering the display area 10 of the display substrate through the water vapor channel, which will lead to the failure of the organic light-emitting layer of the light-emitting device, thereby avoiding the occurrence of continuously expanding dark spots due to the failure of the organic light-emitting layer Defective, and then improve the display effect of the display substrate.
  • it can ensure the integrity of the grooves in the organic material layer and avoid the formation of water vapor channels.
  • the first conductive layer 102 also has a first connection line 1023 connecting the first boundary line 1021 and the third boundary line 1022;
  • the second connection line 1043 is located on the side of the first connection line 1023 close to the fan-out area 20a; and the angle between the extension direction of the third boundary line 1022 is greater than or equal to 90 degrees; the angle between the extension direction of the second connection line 1043 and the extension direction of the second boundary line 1041 and the fourth boundary line 1042 is greater than or equal to equals 90 degrees.
  • the boundary lines and connection lines in the display substrate are due to the shrinkage of the film layers such as the first conductive layer 102 and the anode conductive layer 104 in the corner area 20b toward the direction close to the display area.
  • the extending direction of the first connecting line 1023 is not perpendicular to the extending direction of the first boundary line 1021 and the third boundary line 1022
  • the extending direction of the second connecting line 1043 is not perpendicular to the extending direction of the second boundary line 1041 and the second boundary line 1041.
  • the extension directions of the four boundary lines 1042 are not vertical, that is, the first connecting line 1023 and the second connecting line 1043 are all inclined, so that the distance between the first connecting line 1023 and the second connecting line 1043 can be extended, and the possible formation
  • the distance of the water vapor channel delays the intrusion of water vapor, so that water vapor can be prevented from entering the display area 10 of the display substrate through the water vapor channel, which will cause the organic light-emitting layer of the light-emitting device to fail, thereby avoiding the ever-expanding dark area caused by the failure of the organic light-emitting layer. Dot defects, thereby improving the display effect of the display substrate. It can be understood that, as shown in FIG.
  • the extending direction of the first connecting line 1023 can also be perpendicular to the extending direction of the first boundary line 1021 and the third boundary line 1022
  • the extending direction of the second connecting line 1043 can also be perpendicular to the extending direction of the first boundary line 1021.
  • the extension direction of the second boundary line 1041 and the fourth boundary line 1042 is vertical, which can reduce the difficulty of preparation of the first conductive layer 102 and the anode conductive layer 104, save the materials of the first conductive layer 102 and the anode conductive layer 104, thereby saving preparation cost.
  • the first conductive layer 102 further has a fifth boundary line 1024 substantially parallel to the extension direction of the third boundary line 1022; the fifth boundary line 1024 is located away from the third boundary line 1022 One side of the display area 10; the anode conductive layer 104 also has a sixth boundary line 1044 substantially parallel to the extension direction of the fourth boundary line 1042; the sixth boundary line 1044 is located on the side of the fourth boundary line 1042 away from the display area, and the sixth boundary line 1044 The sixth boundary line 1044 is located on a side of the fifth boundary line 1024 away from the display area.
  • the fifth boundary line 1024 of the first conductive layer 102 may extend toward the fan-out area 20a for a certain distance, and then shrink toward the second barrier dam 202 to form a third boundary line 1022, and the third boundary line 1022 shrinks toward the first barrier dam 201. And extend a certain distance toward the fan-out area 20a to form the first boundary line 1021, and then the first boundary line 1021 shrinks into the display area 10.
  • the sixth boundary line 1044 of the anode conductive layer 103 can also face the fan-out area After extending for a certain distance in the direction of the fan-out area 20a, it shrinks toward the second barrier dam 202 to form a fourth boundary line 1042, and the fourth boundary line 1042 shrinks toward the first barrier dam 201 and extends for a certain distance in the direction of the fan-out area 20a to form a second boundary line 1041 , and then the second boundary line 1041 shrinks into the display area 10 .
  • both the first conductive layer 102 and the anode conductive layer 104 have undergone three shrinkages, and after shrinkage, they extend toward the fan-out region 20a for a certain distance, which can extend the distance of possible water vapor channels and delay the intrusion of water vapor, so It can prevent water vapor from entering the display area 10 of the display substrate through the water vapor channel, and cause the organic light-emitting layer of the light-emitting device to fail, thereby avoiding the defect of continuously expanding dark spots caused by the failure of the organic light-emitting layer, thereby improving the display effect of the display substrate .
  • the display substrate further includes: an intercepting structure 300 located on the base 101 and disposed in the non-display area 20; the intercepting structure 300 is farther away from the display area 10 than the second barrier dam 202; the intercepting structure
  • the orthographic projection of 300 on the substrate 101 at least partially covers the orthographic projections of the fifth boundary line 1024 and the sixth boundary line 1044 on the substrate 101 .
  • the fifth boundary line 1024 of the first conductive layer 102 may be under the intercepting structure 300, and after extending for a certain distance toward the fan-out region 20a, it shrinks toward the second barrier dam 202 to form a third boundary line 1022.
  • the third boundary line Shrink toward the first barrier dam 201 and extend a certain distance toward the fan-out area 20a to form the first boundary line 1021, and then the first boundary line 1021 shrinks into the display area 10, correspondingly, the sixth boundary of the anode conductive layer 103
  • the line 1044 can also be under the intercepting structure 300, and after extending for a certain distance toward the fan-out area 20a, shrink toward the second barrier dam 202 to form a fourth boundary line 1042, and the fourth boundary line 1042 shrinks toward the first barrier dam 201 And extend a certain distance toward the fan-out area 20 a to form a second boundary line 1041 , and then the second boundary line 1041 shrinks into the display area 10 .
  • both the first conductive layer 102 and the anode conductive layer 104 have undergone three shrinkages, and after shrinkage, they extend toward the fan-out region 20a for a certain distance, which can extend the distance of possible water vapor channels and delay the intrusion of water vapor, so It can prevent water vapor from entering the display area 10 of the display substrate through the water vapor channel, and cause the organic light-emitting layer of the light-emitting device to fail, thereby avoiding the defect of continuously expanding dark spots caused by the failure of the organic light-emitting layer, thereby improving the display effect of the display substrate .
  • the first conductive layer 102 also has a third connection line 1025 connecting the third boundary line 1022 and the fifth boundary line 1024;
  • the fourth connection line 1045 is located on the side of the third connection line 1025 close to the fan-out area 20a; and the angle between the extension direction of the fifth boundary line 1024 is greater than or equal to 90 degrees; the angle between the extension direction of the fourth connection line 1045 and the extension direction of the fourth boundary line 1042 and the sixth boundary line 1044 is greater than or equal to equals 90 degrees.
  • the extending direction of the third connecting line 1025 is not perpendicular to the extending direction of the third boundary line 1022 and the fifth boundary line 1024, and the extending direction of the fourth connecting line 1045 is not perpendicular to the extending direction of the fourth boundary line 1042 and the fifth boundary line 1024.
  • the extension direction of the six boundary lines 1044 is not vertical, that is, the third connecting line 1025 and the fourth connecting line 1045 are arranged obliquely, so that the distance between the third connecting line 1025 and the fourth connecting line 1045 can be extended, and the possible formation of The distance of the water vapor channel delays the intrusion of water vapor, so that water vapor can be prevented from entering the display area 10 of the display substrate through the water vapor channel, which will cause the organic light-emitting layer of the light-emitting device to fail, thereby avoiding the ever-expanding dark area caused by the failure of the organic light-emitting layer. Dot defects, thereby improving the display effect of the display substrate. It can be understood that, as shown in FIG.
  • the extending direction of the third connecting line 1025 may also be perpendicular to the extending direction of the third boundary line 1022 and the fifth boundary line 1024, and the extending direction of the fourth connecting line 1045 and the extending direction of the first
  • the extension direction of the four boundary lines 1042 and the sixth boundary line 1044 can also be vertical, which can reduce the difficulty of preparation of the first conductive layer 102 and the anode conductive layer 104, and save the materials of the first conductive layer 102 and the anode conductive layer 104, Thus, the production cost can be saved.
  • the first conductive layer 102 further has a seventh boundary line 1026 substantially parallel to the extending direction of the third boundary line 1022; the seventh boundary line 1026 is located on the first boundary line 1021 and the third boundary line 1022; the anode conductive layer 104 also has an eighth boundary line 1046 substantially parallel to the extending direction of the fourth boundary line 1042; the eighth boundary line 1046 is located between the second boundary line 1041 and the fourth boundary line 1042 , and the eighth boundary line 1046 is located on the side of the seventh boundary line 1026 away from the display area 10 .
  • the fifth boundary line 1024 of the first conductive layer 102 shrinks to form the third boundary line 1022, and the third boundary line 1022 may extend a certain distance toward the fan-out area 20a, and then shrinks to form the seventh boundary line 1026, the seventh boundary line 1026 After shrinking and extending a certain distance toward the fan-out area 20 a, a first boundary line 1021 is formed, and the first boundary line 1021 shrinks into the display area 10 .
  • the sixth boundary line 1044 of the anode conductive layer 103 shrinks to form the fourth boundary line 1042, and after the fourth boundary line 1042 extends toward the direction of the fan-out area 20a for a certain distance, it shrinks to form the eighth boundary line 1046, and the eighth boundary line
  • the second boundary line 1041 is formed after the line 1046 shrinks and extends toward the fan-out area 20 a for a certain distance, and the second boundary line 1041 shrinks into the display area 10 .
  • both the first conductive layer 102 and the anode conductive layer 104 have undergone four shrinkages, and after shrinkage, they extend toward the fan-out region 20a for a certain distance, which can extend the distance of the possible water vapor channel and delay the water vapor intrusion. Therefore, water vapor can be prevented from entering the display area 10 of the display substrate through the water vapor channel, which will cause the organic light-emitting layer of the light-emitting device to fail, thereby avoiding the defect of continuously expanding dark spots caused by the failure of the organic light-emitting layer, thereby improving the display of the display substrate. Effect.
  • the first barrier dam 201 includes: a first sub-dam 2011 and a second sub-dam 2012; the first sub-dam 2011 is closer to the second sub-dam 2012 Display area 10; the orthographic projection of the first sub-dam 2011 on the substrate 101 at least partially covers the orthographic projection of the first boundary line 1021 and the second boundary line 1041 on the substrate 101; the orthographic projection of the second sub-dam 2012 on the substrate 101 The orthographic projection at least partially covers the orthographic projections of the seventh boundary line 1026 and the eighth boundary line 1046 on the substrate 101 .
  • the first barrier dam 201 may be composed of a first sub-dam 2011 and a second sub-dam 2022, and the first sub-dam 2011 and the second sub-dam 2012 are connected together at an end away from the fan-out area 20a.
  • the seventh boundary line 1026 of the first conductive layer 102 may be under the second sub-dam 2012, the seventh boundary line 1026 shrinks to form the first boundary line 1021, and the first boundary line 1021 may be under the first sub-dam 2011 .
  • the eighth boundary line 1046 of the anode conductive layer 104 may be under the second sub-dam 2012, the eighth boundary line 1046 shrinks to form the second boundary line 1041, and the second boundary line 1041 may be below the first sub-dam 2011. under.
  • both the first conductive layer 102 and the anode conductive layer 104 have been shrunk four times, and after shrinkage, they extend a certain distance toward the fan-out region 20a, which can prolong the distance of the possible water vapor channel and delay the water vapor intrusion, so it can avoid Water vapor enters the display area 10 of the display substrate through the water vapor channel, causing the organic light-emitting layer of the light-emitting device to fail, thereby avoiding the defect of expanding dark spots caused by the failure of the organic light-emitting layer, thereby improving the display effect of the display substrate.
  • the first conductive layer 102 further has a fifth connecting line 1027 connecting the first boundary line 1021 and the seventh boundary line 1026, and connecting the third boundary line 1022 and the seventh boundary line 1027.
  • the sixth connecting line 1028 of the seven boundary lines 1026; the anode conductive layer 104 also has the seventh connecting line 1047 connecting the second boundary line 1041 and the eighth boundary line 1046, and the connecting line 1047 connecting the fourth boundary line 1042 and the eighth boundary line 1046
  • the eighth connecting line 1048; the seventh connecting line 1047 is located on the side of the fifth connecting line 1027 close to the fan-out area 20a, and the eighth connecting line 1048 is located on the side of the sixth connecting line 1028 close to the fan-out area 20a;
  • the fifth connecting line The angle between the extension direction of 1027 and the extension direction of the first boundary line 1021 and the seventh boundary line 1026 is greater than or equal to 90 degrees;
  • the included angle between the extension directions of the seventh connecting line 1047 and the extension directions of the second boundary line 1041 and the eighth boundary line 1046 is greater than or equal to 90 degrees;
  • the eighth The included angle between the extending direction of the connection line 1048 and the extending directions of the fourth boundary line 1042 and the eighth boundary line 1046
  • the extending direction of the fifth connecting line 1027 is not perpendicular to the extending direction of the first boundary line 1021 and the seventh boundary line 1026
  • the extending direction of the sixth connecting line 1028 is not perpendicular to the extending direction of the third boundary line 1022 and the seventh boundary line 1026.
  • the extension direction of the seven boundary lines 1026 is not vertical, that is, the fifth connecting line 1027 and the sixth connecting line 1028 are arranged obliquely, so that the distance between the fifth connecting line 1027 and the sixth connecting line 1028 can be extended, and the possible formation of The distance of the water vapor channel delays the intrusion of water vapor, so that water vapor can be prevented from entering the display area 10 of the display substrate through the water vapor channel, which will cause the organic light-emitting layer of the light-emitting device to fail, thereby avoiding the ever-expanding dark area caused by the failure of the organic light-emitting layer. Dot defects, thereby improving the display effect of the display substrate.
  • the seventh connection line 1047 and the eighth connection line 1048 can also be arranged obliquely, so that the distance between the seventh connection line 1047 and the eighth connection line 1048 can be extended, and the distance of the possible water vapor channel can be further extended, and the water vapor can be delayed. Therefore, water vapor can be prevented from entering the interior of the display substrate display area 10 through the water vapor channel, resulting in the failure of the organic light-emitting layer of the light-emitting device, thereby avoiding the defect of continuously expanding dark spots caused by the failure of the organic light-emitting layer, thereby improving the performance of the display substrate. display effect. It can be understood that, as shown in FIG.
  • the fifth connection line 1027, the sixth connection line 1028, the seventh connection line 1047, and the eighth connection line 1048 can also be arranged perpendicular to their corresponding boundary lines, which can reduce the first conductive line.
  • the preparation difficulty of the layer 102 and the anode conductive layer 104 saves the materials of the first conductive layer 102 and the anode conductive layer 104 , thereby saving the preparation cost.
  • the first conductive layer 102 further has a ninth boundary line 1029 substantially parallel to the extension direction of the third boundary line 1022; the ninth boundary line 1029 is located on the third boundary line 1022 away from the side of the display area 10; the anode conductive layer 104 also has a tenth boundary line 1049 substantially parallel to the extending direction of the fourth boundary line 1042; the tenth boundary line 1049 is located on a side of the fourth boundary line 1042 away from the display area 10 side, and the tenth boundary line 1049 is located on the side of the ninth boundary line 1029 away from the display area 10 .
  • the fifth boundary line 1024 of the first conductive layer 102 may extend toward the fan-out area 20a for a certain distance, then shrink to form the ninth boundary line 1029, and the ninth boundary line 1029 shrinks and extends toward the fan-out area 20a for a certain distance.
  • a third boundary line 1022 is then formed, and the third boundary line 1022 shrinks to form the first boundary line 1021 , and the first boundary line 1021 shrinks into the display area 10 .
  • the sixth boundary line 1044 of the anode conductive layer 103 extends toward the fan-out region 20a for a certain distance, it shrinks to form the tenth boundary line 1049, and the tenth boundary line 1049 shrinks and extends toward the fan-out region 20a for a certain distance.
  • a fourth boundary line 1042 is formed, and the fourth boundary line 1042 shrinks to form a second boundary line 1041 , and the second boundary line 1041 shrinks into the display area 10 .
  • both the first conductive layer 102 and the anode conductive layer 104 have undergone four shrinkages, and after shrinkage, they extend toward the fan-out region 20a for a certain distance, which can extend the distance of the possible water vapor channel and delay the water vapor intrusion.
  • water vapor can be prevented from entering the display area 10 of the display substrate through the water vapor channel, which will cause the organic light-emitting layer of the light-emitting device to fail, thereby avoiding the defect of continuously expanding dark spots caused by the failure of the organic light-emitting layer, thereby improving the display of the display substrate. Effect.
  • the second barrier dam 202 includes: a third sub-dam 2021 and a fourth sub-dam 2022; the third sub-dam 2021 is closer to the fourth sub-dam 2022 Display area 10; the orthographic projection of the third sub-dam 2021 on the substrate 101 at least partially covers the orthographic projection of the third boundary line 1022 and the fourth boundary line 1042 on the substrate 101; the fourth sub-dam 2022 on the substrate 101 The orthographic projection at least partially covers the orthographic projections of the ninth boundary line 1029 and the tenth boundary line 1049 on the substrate 101 .
  • the second barrier dam 202 may be composed of a third sub-barrier dam 2021 and a fourth sub-barrier dam 2022 , and the third sub-barrier dam 2021 and the fourth sub-barrier dam 2022 are connected together at an end away from the fan-out area 20 a.
  • the ninth boundary line 1029 of the first conductive layer 102 may be under the fourth sub-dam 2022, the ninth boundary line 1029 shrinks to form a third boundary line 1022, and the third boundary line 1022 may be under the third sub-dam 2021 .
  • the tenth boundary line 1049 of the anode conductive layer 104 may be under the fourth sub-barrier dam 2022, the tenth boundary line 1049 shrinks to form the fourth boundary line 1042, and the fourth boundary line 1042 may be below the third sub-barrier dam 2021. under.
  • both the first conductive layer 102 and the anode conductive layer 104 have been shrunk four times, and after shrinkage, they extend a certain distance toward the fan-out region 20a, which can prolong the distance of the possible water vapor channel and delay the water vapor intrusion, so it can avoid Water vapor enters the display area 10 of the display substrate through the water vapor channel, causing the organic light-emitting layer of the light-emitting device to fail, thereby avoiding the defect of expanding dark spots caused by the failure of the organic light-emitting layer, thereby improving the display effect of the display substrate.
  • the first conductive layer 102 also has a ninth connection line 1030 connecting the third boundary line 1022 and the ninth boundary line 1029, and connecting the fifth boundary line 1024 and the ninth boundary line 1029
  • the tenth connection line 1031 of the nine boundary lines 1029; the anode conductive layer 104 also has the eleventh connection line 1050 connecting the fourth boundary line 1042 and the tenth boundary line 1049, and connecting the sixth boundary line 1044 and the tenth boundary line 1049
  • the twelfth connection line 1051; the eleventh connection line 1050 is located on the side of the ninth connection line 1030 close to the fan-out area 20a, and the twelfth connection line 1051 is located on the side of the tenth connection line 1031 close to the fan-out area 20a;
  • the angle between the extension direction of the ninth connection line 1030 and the extension direction of the third boundary line 1022 and the ninth boundary line 1029 is greater than or equal to 90 degrees;
  • the extending direction of the ninth connecting line 1030 is not perpendicular to the extending direction of the third boundary line 1022 and the ninth boundary line 1029, and the extending direction of the tenth connecting line 1031 is not perpendicular to the extending direction of the fifth boundary line 1024 and the ninth boundary line 1029.
  • the extension direction of the nine boundary lines 1029 is not vertical, that is, the ninth connecting line 1030 and the tenth connecting line 1031 are arranged obliquely, so that the distance between the ninth connecting line 1030 and the tenth connecting line 1031 can be extended, and the possible formation of
  • the distance of the water vapor channel delays the intrusion of water vapor, so that water vapor can be prevented from entering the display area 10 of the display substrate through the water vapor channel, which will cause the organic light-emitting layer of the light-emitting device to fail, thereby avoiding the ever-expanding dark area caused by the failure of the organic light-emitting layer. Dot defects, thereby improving the display effect of the display substrate.
  • the eleventh connecting line 1050 and the twelfth connecting line 1051 can also be arranged obliquely, so that the distance between the eleventh connecting line 1050 and the twelfth connecting line 1051 can be extended, and the possibly formed
  • the distance of the water vapor channel delays the intrusion of water vapor, so that water vapor can be prevented from entering the display area 10 of the display substrate through the water vapor channel, resulting in the failure of the organic light-emitting layer of the light-emitting device, thereby avoiding the ever-expanding dark spots caused by the failure of the organic light-emitting layer defects, thereby improving the display effect of the display substrate.
  • the ninth connection line 1030, the tenth connection line 1031, the eleventh connection line 1050, and the twelfth connection line 1051 can also be arranged vertically to their corresponding boundary lines, so that the first conductive layer 102 and the The preparation difficulty of the anode conductive layer 104 saves the materials of the first conductive layer 102 and the anode conductive layer 104 , thereby saving the preparation cost.
  • the display substrate further includes: a pixel defining layer 105 on the anode conductive layer 104; the thickness of the pixel defining layer 105 in the fan-out region 20a is greater than that in the corner region 20b.
  • the thickness of the pixel defining layer 105 is different in different regions.
  • the pixel defining layer 105 is arranged on the anode conductive layer 104, which can play a role in planarization.
  • the thickness of the pixel defining layer 105 is relatively thick, which can avoid the step difference here, so as to avoid cracks in the film layer covering it such as the packaging layer due to the step difference. , to avoid encapsulation failure, thereby preventing water vapor from entering the interior of the display substrate through the water vapor channel, causing the organic light-emitting layer of the light-emitting device to oxidize and fail to perform normal light emission.
  • the display substrate further includes: a pixel circuit located between the substrate 101 and the anode conductive layer 104 and disposed in the display area 10 , and a light emitting device 40 located in a region defined by the pixel defining layer 105 ;
  • the pixel circuit includes: a thin film transistor 50; the thin film transistor 50 includes: an active layer 501, a gate insulating layer 502, a gate 503, an interlayer insulating layer 504, a source 505 and a drain 506 arranged on the substrate 101 in sequence;
  • a light emitting device 40 includes: a first electrode 401 and a second electrode 402 disposed opposite to each other, and an organic light-emitting layer 403 located between the first electrode 401 and the second electrode 402; the drain 506 is connected to the first electrode 401 through a via electrode 507;
  • the anode conductive layer 104 is provided on the same layer as the first electrode 401 .
  • the thin film transistor 50 includes an active layer 501, a gate insulating layer 502, a gate 503, an interlayer insulating layer 504, and source-drain electrodes (including a source 505 and a drain 506), which are sequentially arranged on the substrate 101.
  • the source 505 and the drain The electrodes 506 are respectively connected to both ends of the active layer 501 through via holes penetrating through the interlayer insulating layer 504 and the gate insulating layer 503 .
  • the drain 506 of the thin film transistor 50 is connected to the first electrode 401 of the light emitting device 40 through the transfer electrode 507 to provide an anode voltage signal for the light emitting device 40 .
  • the setting of the via electrode 507 can form a parallel structure with the drain electrode 506, which can reduce the resistance of the electrode in the thin film transistor 50, and facilitate the transmission of the anode voltage signal.
  • the first electrode 401 of the light-emitting device 40 can be an anode, and an anode voltage signal can be input to the light-emitting device to form holes.
  • the anode can be exposed from the containing part of the pixel defining layer 105, and the anode can be in the same layer as the above-mentioned anode conductive layer 104 The same material is used in the preparation process and the same process is used to reduce the difficulty of the process and save the cost of preparation.
  • the second electrode 402 of the light-emitting device 40 can be a cathode, and a cathode voltage signal can be input to the light-emitting device to form electrons.
  • the cathode can be covered on the pixel defining layer 105.
  • the cathode can be arranged on the entire surface to facilitate connection. Input the cathode voltage signal.
  • the organic light-emitting layer 403 of the light-emitting device 40 can be formed in the containing portion of the pixel defining layer 104 by using an organic light-emitting material through an inkjet printing process, and excitons are formed under the drive of the voltage signals of the anode and the cathode to emit light.
  • the anode conductive layer 104 can be set on the same layer as the first electrode 401, and the same material can be used in the manufacturing process, and the same manufacturing process can be used to reduce the difficulty of the process and save the manufacturing cost.
  • the first conductive layer 102 is disposed on the same layer as the source electrode 505 and the drain electrode 506 ; the second conductive layer 103 is disposed on the same layer as the via electrode 507 .
  • the source 505 and the drain 506 of the thin film transistor 50 can be arranged in the same layer as the first conductive layer 102 , and can be formed with the same material and the same manufacturing process in the manufacturing process, so as to reduce the difficulty of the process and save the manufacturing cost.
  • the via electrode 507 can be arranged on the same layer as the second conductive layer 103 , and can be formed by using the same material and the same manufacturing process in the manufacturing process, so as to reduce the difficulty of the process and save the manufacturing cost.
  • the display substrate further includes: a supply voltage line connected to the second electrode 402; the supply voltage line includes: a first sub-supply voltage line and a second sub-supply voltage line; the first sub-supply voltage line and the first The conductive layer is set on the same layer; the second sub-power supply voltage line is set on the same layer as the second conductive layer.
  • the power supply voltage line can be a low-level power supply voltage line VSS, and the low-level power supply voltage line VSS can be made of a double-layer structure of a first sub-power supply voltage line and a second sub-power supply voltage line to reduce low-level The resistance of the power supply voltage line VSS ensures the transmission of low-level power supply voltage signals.
  • the first sub-power supply voltage line can be arranged on the same layer as the first conductive layer 102, and the second sub-power supply voltage line can be arranged on the same layer as the second conductive layer 103.
  • the same material can be used in the preparation process and formed by the same preparation process to reduce The process is difficult and the preparation cost is saved.
  • the display substrate further includes: an encapsulation layer 106 located on the pixel defining layer 105; the encapsulation layer 106 may include: first inorganic encapsulation layers arranged in sequence along the direction away from the substrate 101 layer 1061, an organic encapsulation layer 1063, and a second inorganic encapsulation layer 1062; the first inorganic encapsulation layer 1061 and the second inorganic encapsulation layer 1062 cover the barrier structure 200, and stop at the side of the barrier structure 200 away from the display area 10; the organic encapsulation layer 1062 The blocking structure 200 is cut off at the side close to the display area 10 .
  • the encapsulation layer 106 can encapsulate structures such as the second electrode 402 of the light-emitting device 40 to prevent water vapor from entering the organic light-emitting layer 403 of the light-emitting device, and prevent the organic light-emitting layer 403 from being oxidized, resulting in poor display.
  • the encapsulation layer 106 may include: a first inorganic encapsulation layer 1061 , an organic encapsulation layer 1063 and a second inorganic encapsulation layer 1062 arranged in sequence along a direction away from the substrate 101 .
  • the first inorganic encapsulation layer and the second inorganic encapsulation layer can be formed of inorganic materials such as silicon nitride, silicon oxide, silicon oxynitride, etc., and the organic encapsulation layer can be formed of organic materials such as epoxy resin.
  • the first inorganic encapsulation layer 1061 and the second inorganic encapsulation layer 1062 in the encapsulation layer 106 can cover the barrier structure 200 and be cut off on the side of the barrier structure 200 away from the display area 10 .
  • the first inorganic encapsulation layer 1061 and the second inorganic encapsulation layer 1062 are cut off at the interception structure.
  • the organic encapsulation layer 1062 is cut off at the side of the barrier structure 200 close to the display area 10 , which can prevent water vapor from passing through the organic encapsulation layer 1063 from the non-display area 20 to the display area 10 .
  • the display substrate further includes: a first organic insulating layer (not shown in the figure) and a second organic insulating layer (not shown in the figure); the first organic insulating layer is located between the first conductive layer and the second between the conductive layers; the second organic insulating layer is located between the second conductive layer and the anode conductive layer.
  • the first organic insulating layer can insulate the first conductive layer 102 and the second conductive layer 103 to avoid short-circuiting of the two in corresponding areas and affect signal transmission; on the other hand, it can cover the first conductive layer 102, Avoid water vapor from corroding the first conductive layer 102 .
  • the second organic insulating layer can also insulate the second conductive layer 103 and the anode conductive layer 104, so as to prevent the two from being short-circuited in corresponding areas and affect signal transmission. On the other hand, it can cover the second conductive layer 103 , to prevent water vapor from corroding the second conductive layer 103 .
  • both the first organic insulating layer and the second organic insulating layer are provided with trenches in corresponding regions between the intercepting structure and the blocking structure.
  • Digging the groove can make the first organic insulating layer and the second organic insulating layer disconnected at the corresponding positions, and can prevent the formation of a water vapor channel between the intercepting structure 300 and the intercepting structure 200, so that water vapor can be prevented from entering the display of the display substrate through the water vapor channel.
  • the organic light-emitting layer of the light-emitting device fails, so that the defect of expanding dark spots caused by the failure of the organic light-emitting layer can be avoided, and the display effect of the display substrate can be improved.
  • the second conductive layer 103 has an eleventh boundary line 1032 ; in the corner area 20 b , the eleventh boundary line 1032 is located on the side of the sixth boundary line 1044 away from the display area 10 .
  • the structure of the second conductive layer 103 is not shown.
  • the structure of the second conductive layer 103 is shown in FIG. 5j.
  • the eleventh boundary line 1032 of the second conductive layer 103 is located at one side of the sixth boundary line 1044 away from the display area 10.
  • the second conductive layer 103 can cover the sixth boundary line of the anode conductive layer 104 and the fifth boundary line 1024 covering the first conductive layer 102, and the first conductive layer 102 can be avoided when etching the second conductive layer 103 cause damage.
  • the first conductive layer 102 also has a twelfth boundary line 1033 that intersects with the extension direction of the first boundary line 1021;
  • the thirteenth boundary line 1052 whose extension direction intersects with 1041; the twelfth boundary line 1033 is located in the fan-out area 20a, and the thirteenth boundary line 1052 is located in the corner area 20b.
  • the twelfth boundary line 1033 of the first conductive layer 102 may extend from the fan-out area 20a to the display area 10, and the thirteenth boundary line 1052 of the anode conductive layer 104 may extend from the corner area 20b to the display area 10 to form the display area 10.
  • the light emitting device 40 in provides a low-level power signal.
  • At least part of the first conductive layer 102 , the second conductive layer 103 and the anode conductive layer 104 are electrically connected at the corner region 20 b.
  • the first conductive layer 102 and the second conductive layer 103 are electrically connected to form a low-level power supply voltage line VSS of a double-layer structure, which is connected to the anode conductive layer 104, and the anode conductive layer 104 extends from the corner area 20b to
  • the display area 10 is also connected to the cathode of the light-emitting device 40 in the display area 10 to provide a low-level power supply signal for the light-emitting device in the display area 10, so that the light-emitting device 40 emits light and realizes the display function.
  • An embodiment of the present disclosure also provides a display device, which includes the display substrate provided in any of the above embodiments, and the display device can be a mobile phone, a tablet computer, a TV, a monitor, a notebook computer, a digital photo frame, a navigator Any product or component with a display function, which is not limited by the embodiments of the present disclosure.
  • the realization principle and technical effect thereof are the same as those of the display substrate provided by any of the above embodiments, and will not be repeated here.

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  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

一种显示基板及显示装置,可解决现有的水汽随着缝隙进入显示基板内部,形成不断扩大的黑点不良的问题。显示基板包括:基底(101)、位于基底(101)上且设置于非显示区(20)的阻挡结构(200);显示基板还包括:位于基底(101)上且沿着背离基底(101)方向依次设置的第一导电层(102)、第二导电层(103)和阳极导电层(104);第一导电层(102)具有第一边界线(1021);阳极导电层(104)具有与第一边界线(1021)的延伸方向基本平行的第二边界线(1041);第二边界线(1041)位于第一边界线(1021)远离显示区(10)的一侧;在扇出区(20a),第一导电层(102)截止,第二导电层(102)连续设置;在拐角区(20b),阳极导电层(104)截止,阻挡结构(200)在基底(101)上的正投影至少部分覆盖第一边界线(1021)和第二边界线(1041)在基底(101)上的正投影。

Description

显示基板及显示装置 技术领域
本公开属于显示技术领域,具体涉及一种显示基板及显示装置。
背景技术
有机电致发光二极管(Organic Light-Emitting Diode,OLED)和量子点发光二极管(Quantum Dot Light Emitting Diodes,QLED)面板一般采用化学气相沉积(Chemical Vapor Deposition,CVD)形成封装层,对其中的发光器件进行保护,以确保发光器件不与外界发生氧化反应。
然而,封装一旦失败,例如封装层发生断裂、产生裂缝等,水汽会沿着缝隙进入OLED或QLED面板的内部,导致发光器件的有机发光层氧化而失效,不能进行正常发光。随着水汽不断侵入,不能进行正常发光的发光器件越来越多,OLED或QLED面板会出现不断扩大的暗点的不良,影响显示效果。
发明内容
本公开旨在至少解决现有技术中存在的技术问题之一,提供一种显示基板及显示装置。
第一方面,本公开实施例提供一种显示基板,具有显示区及围绕所述显示区的非显示区,其中,所述显示基板包括:基底、位于所述基底上且设置于所述非显示区的阻挡结构;所述显示基板还包括:位于所述基底上且沿着背离所述基底方向依次设置的第一导电层、第二导电层和阳极导电层;所述第一导电层具有第一边界线;所述阳极导电层具有与所述第一边界线的延伸方向基本平行的第二边界线;所述第二边界线位于所述第一边界线远离所述 显示区的一侧;所述非显示区包括:设置于所述显示区一侧的扇出区及与所述扇出区连接的拐角区;
在所述扇出区,所述第一导电层截止,所述第二导电层连续设置;
在所述拐角区,所述阳极导电层截止,所述阻挡结构在所述基底上的正投影至少部分覆盖所述第一边界线和所述第二边界线在所述基底上的正投影。
可选地,所述阻挡结构包括:第一阻挡坝;
所述第一阻挡坝在所述基底上的正投影至少部分覆盖所述第一边界线和所述第二边界线在所述基底上的正投影。
可选地,所述第一导电层还具有与所述第一边界线的延伸方向基本平行的第三边界线;所述第三边界线位于所述第一边界线远离所述显示区的一侧;
所述阳极导电层还具有与所述第二边界线的延伸方向基本平行的第四边界线;所述第四边界线位于所述第二边界线远离所述显示区的一侧,且所述第四边界线位于所述第三边界线远离所述显示区的一侧。
可选地,所述阻挡结构还包括:第二阻挡坝;所述第二阻挡坝位于所述第一阻挡坝远离所述显示区的一侧;
所述第二阻挡坝在所述基底上的正投影至少部分覆盖所述第三边界线和所述第四边界线在所述基底上的正投影。
可选地,所述第一导电层还具有连接所述第一边界线和所述第三边界线的第一连接线;所述阳极导电层还具有连接所述第二边界线和所述第四边界线的第二连接线;所述第二连接线位于所述第一连接线靠近所述扇出区的一侧;
所述第一连接线的延伸方向与所述第一边界线及所述第三边界线的延伸方向之间的夹角大于或等于90度;
所述第二连接线的延伸方向与所述第二边界线及所述第四边界线的延伸方向之间的夹角大于或等于90度。
可选地,所述第一导电层还具有与所述第三边界线的延伸方向基本平行的第五边界线;所述第五边界线位于所述第三边界线远离所述显示区的一侧;
所述阳极导电层还具有所述第四边界线的延伸方向基本平行的第六边界线;所述第六边界线位于所述第四边界线远离所述显示区的一侧,且所述第六边界线位于所述第五边界线远离所述显示区的一侧。
可选地,所述显示基板还包括:位于所述基底上且设置于所述非显示区的拦截结构;
所述拦截结构较所述第二阻挡坝远离所述显示区。
可选地,所述拦截结构在所述基底上的正投影至少部分覆盖所述第五边界线和所述第六边界线在所述基底上的正投影。
可选地,所述第一导电层还具有连接所述第三边界线和所述第五边界线的第三连接线;所述阳极导电层还具有连接所述第四边界线和所述第六边界线的第四连接线;所述第四连接线位于所述第三连接线靠近所述扇出区的一侧;
所述第三连接线的延伸方向与所述第三边界线及所述第五边界线的延伸方向之间的夹角大于或等于90度;
所述第四连接线的延伸方向与所述第四边界线及所述第六边界线的延伸方向之间的夹角大于或等于90度。
可选地,所述第一导电层还具有与所述第三边界线的延伸方向基本平行的第七边界线;所述第七边界线位于所述第一边界线和所述第三边界线之间;
所述阳极导电层还具有与所述第四边界线的延伸方向基本平行的第八 边界线;所述第八边界线位于所述第二边界线和所述第四边界线之间,且所述第八边界线位于所述第七边界线远离所述显示区的一侧。
可选地,所述第一阻挡坝包括:第一子阻挡坝和第二子阻挡坝;所述第一子阻挡坝较所述第二子阻挡坝靠近所述显示区;
所述第一子阻挡坝在所述基底上的正投影至少部分覆盖所述第一边界线和所述第二边界线在所述基底上的正投影;
所述第二子阻挡坝在所述基底上的正投影至少部分覆盖所述第七边界线和所述第八边界线在所述基底上的正投影。
可选地,所述第一导电层还具有连接所述第一边界线和所述第七边界线的第五连接线、及连接所述第三边界线和所述第七边界线的第六连接线;所述阳极导电层还具有连接所述第二边界线和所述第八边界线的第七连接线、及连接所述第四边界线和所述第八边界线的第八连接线;所述第七连接线位于所述第五连接线靠近所述扇出区的一侧,所述第八连接线位于所述第六连接线靠近所述扇出区的一侧;
所述第五连接线的延伸方向与所述第一边界线及所述第七边界线的延伸方向之间的夹角大于或等于90度;所述第六连接线的延伸方向与所述第三边界线及所述第七边界线的延伸方向之间的夹角大于或等于90度;
所述第七连接线的延伸方向与所述第二边界线及所述第八边界线的延伸方向之间的夹角大于或等于90度;所述第八连接线的延伸方向与所述第四边界线及所述第八边界线的延伸方向之间的夹角大于或等于90度。
可选地,所述第一导电层还具有与所述第三边界线的延伸方向基本平行的第九边界线;所述第九边界线位于所述第三边界线远离所述显示区的一侧;
所述阳极导电层还具有与所述第四边界线的延伸方向基本平行的第十边界线;所述第十边界线位于所述第四边界线远离所述显示区的一侧,且所 述第十边界线位于所述第九边界线远离所述显示区的一侧。
可选地,所述第二阻挡坝包括:第三子阻挡坝和第四子阻挡坝;所述第三子阻挡坝较所述第四子阻挡坝靠近所述显示区;
所述第三子阻挡坝在所述基底上的正投影至少部分覆盖所述第三边界线和所述第四边界线在所述基底上的正投影;
所述第四子阻挡坝在所述基底上的正投影至少部分覆盖所述第九边界线和所述第十边界线在所述基底上的正投影。
可选地,所述第一导电层还具有连接所述第三边界线和所述第九边界线的第九连接线、及连接所述第五边界线和所述第九边界线的第十连接线;所述阳极导电层还具有连接所述第四边界线和所述第十边界线的第十一连接线、及连接所述第六边界线和所述第十边界线的第十二连接线;所述第十一连接线位于所述第九连接线靠近所述扇出区的一侧,所述第十二连接线位于所述第十连接线靠近所述扇出区的一侧;
所述第九连接线的延伸方向与所述第三边界线及所述第九边界线的延伸方向之间的夹角大于或等于90度;所述第十连接线的延伸方向与所述第五边界线及所述第九边界线的延伸方向之间的夹角大于或等于90度;
所述第十一连接线的延伸方向与所述第四边界线及所述第十边界线的延伸方向之间的夹角大于或等于90度;所述第十二连接线的延伸方向与所述第六边界线及所述第十边界线的延伸方向之间的夹角大于或等于90度。
可选地,所述显示基板还包括:位于所述阳极导电层上的像素限定层;
所述像素限定层在所述扇出区的厚度大于在所述拐角区的厚度。
可选地,所述显示基板还包括:位于所述像素限定层限定区域的发光器件;所述发光器件包括:相对设置的第一电极和第二电极、及位于所述第一电极和所述第二电极之间的有机发光层;
所述第一电极与所述阳极导电层同层设置。
可选地,所述显示基板还包括:位于所述基底与所述阳极导电层之间且设置于所述显示区的像素电路;所述像素电路包括:薄膜晶体管;所述薄膜晶体管包括:依次设置在基底上的有源层、栅绝缘层、栅极、层间绝缘层、源极和漏极;所述第一电极通过转接电极与所述源极或所述漏极电连接;
所述第一导电层与所述源极及所述漏极同层设置;
所述第二导电层与所述转接电极同层设置。
可选地,所述显示基板还包括:与所述第二电极连接的电源电压线;
所述电源电压线包括:第一子电源电压线和第二子电源电压线;
所述第一子电源电压线与所述第一导电层同层设置;所述第二子电源电压线与所述第二导电层同层设置。
可选地,所述显示基板还包括:位于所述像素限定层上的封装层;所述封装层包括:沿着背离所述基底方向依次设置的第一无机封装层、有机封装层和第二无机封装层;
所述第一无机封装层和所述第二无机封装层覆盖所述阻挡结构,且在所述阻挡结构远离所述显示区一侧截止;
所述有机封装层在所述阻挡结构靠近所述显示区一侧截止。
可选地,所述显示基板还包括:第一有机绝缘层和第二有机绝缘层;
所述第一有机绝缘层位于所述第一导电层和所述第二导电层之间;
所述第二有机绝缘层位于所述第二导电层和所述阳极导电层之间。
可选地,所述第一有机绝缘层和所述第二有机绝缘层在所述拦截结构与所述阻挡结构之间的对应区域均设置有挖槽。
可选地,所述第二导电层具有第十一边界线;在所述拐角区,所述第十一边界线位于所述第六边界线远离所述显示区的一侧。
可选地,所述第一导电层还具有与所述第一边界线延伸方向相交的第十二边界线;所述阳极导电层还具有与所述第二边界线延伸方向相交的十三边 界线;
所述第十二边界线线位于所述扇出区,所述第十三边界线位于所述拐角区。
可选地,在所述拐角区,所述第一导电层、所述第二导电层和所述阳极导电层的至少部分电连接。
第二方面,本公开实施例提供一种显示装置,其中,所述显示装置包括如上述提供的显示基板。
附图说明
图1为一种示例性的显示基板的结构示意图;;
图2为图1所示的显示基板中拐角区的放大结构示意图;
图3为图2所示的显示基板沿A-A’方向的截面结构示意图;
图4a为本公开实施例提供的一种显示基板的结构示意图;
图4b为本公开实施例提供的另一种显示基板的结构示意图;
图4c为本公开实施例提供的又一种显示基板的结构示意图;
图4d为本公开实施例提供的再一种显示基板的结构示意图;
图5a为图4a所示的显示基板中拐角区的放大结构示意图;
图5b-5e为图4b所示的显示基板中拐角区的放大结构示意图;
图5f-5g为图4c所示的显示基板中拐角区的放大结构示意图;
图5h-5i为图4d所示的显示基板中拐角区的放大结构示意图;
图5j为图4b所示的显示基板中拐角区的放大结构示意图;
图6为图5a-5i所示的显示基板沿B-B’方向的截面结构示意图;
图7为图4a-4d所示的显示基板沿C-C’方向的截面结构示意图;
图8为图4b所示的显示基板沿D-D’方向的截面结构示意图。
具体实施方式
为使本领域技术人员更好地理解本公开的技术方案,下面结合附图和具体实施方式对本公开作进一步详细描述。
除非另外定义,本公开使用的技术术语或者科学术语应当为本公开所属领域内具有一般技能的人士所理解的通常意义。本公开中使用的“第一”、“第二”以及类似的词语并不表示任何顺序、数量或者重要性,而只是用来区分不同的组成部分。同样,“一个”、“一”或者“该”等类似词语也不表示数量限制,而是表示存在至少一个。“包括”或者“包含”等类似的词语意指出现该词前面的元件或者物件涵盖出现在该词后面列举的元件或者物件及其等同,而不排除其他元件或者物件。“连接”或者“相连”等类似的词语并非限定于物理的或者机械的连接,而是可以包括电性的连接,不管是直接的还是间接的。“上”、“下”、“左”、“右”等仅用于表示相对位置关系,当被描述对象的绝对位置改变后,则该相对位置关系也可能相应地改变。
图1为一种示例性的显示基板的结构示意图,图2为图1所示的显示基板中拐角区的放大结构示意图,如图1和图2所示,该显示基板具有显示区10及围绕显示区10的非显示区20,显示基板包括:基底101、位于基底101上且设置于非显示区20的阻挡结构200和拦截结构300;阻挡结构200较拦截结构300靠近显示区10;显示基板还包括:位于基底101上且沿着背离基底101方向依次设置的第一导电层102、第二导电层103和阳极导电层104。其中,第一导电层102和第二导电层103可以形成显示区10中各个薄膜晶体管器件的膜层,也可以形成与显示区10中的薄膜晶体管以及发光器件连接的信号线,阳极导电层104可以形成显示区10中各个发光器件的阳极。
需要说明的是,上述的显示基板以及之后的描述中是以OLED显示基板为为例进行说明的,当然上述的显示基板也可以为QLED显示基板,其实现原理基本相同,将不在赘述。
第一导电层102和第二导电层103可以由显示区10延伸至非显示区20 中,具体地,第一导电层102和第二导电层103可以为电源电压线,例如低电平电源电压线VSS。可以理解的是,第一导电层102和第二导电层103还可以为其他类型的信号线,在此不在一一列举,在本公开实施例及之后的描述中将以低电平信号线VSS为例进行说明。阻挡结构200和拦截结构300均采用有机材料制成,具体地,阻挡结构200包括第一阻挡坝201和第二阻挡坝202。
在常规的显示基板中,第一导电层102和第二导电层103之间设置有两层绝缘层,其中一层为有机绝缘层,另一层为无机绝缘层。目前为了节约制备成本,提高显示基板的产能,往往将其中的无机绝缘层取消,即第一导电层102和第二导电层103之间仅设置有一层有机绝缘层。在非显示区20中,为了减少信号线的阻抗,低电平电源线VSS一般采用双层导电层制成,但是由于无机绝缘层取消后,在扇出区20a中,如果仅使用第一导电层102穿过阻挡结构200及拦截结构300与驱动芯片连接,第二导电层103需要在拐角区20b中进行截止,由于第一导电层102和第二导电层103采用相同材料制成,第一导电层102裸露出会在第二导电层103刻蚀时被刻蚀掉,影响电路结构。并且第二导电层103在第一导电层102之后制备,后续工艺较少,第二导电层103的刻蚀深度相对于第一导电层102的刻蚀深度较小。因此,必须仅使用一层第二导电层103穿过阻挡结构200及拦截结构300,以连接驱动芯片。
当仅使用第二导电层103连接驱动芯片时,第一导电层102需要从拦截结构300的位置收缩至显示区10内以在扇出区20a位置截止,保证扇出区20a位置仅有第二导电层103穿过阻挡结构200和拦截结构300,由于在第一导电层102上往往设置有有机材料层覆盖,在第一导电层102向显示区10收缩的位置,即1位置处和2位置处,容易形成水汽通道(图中箭头标识处)。具体地,第一导电层102的边界线在拦截结构300的下方,并沿着拦截结构 300延伸至1位置处;在1位置处,第一导电层102由拦截结构300收缩至第二阻挡坝202的下方,并沿着第二阻挡坝202延伸至3位置处,同时,阳极导电层104在2位置处由第二阻挡坝202收缩至第一阻挡坝201靠近显示区10的一侧。在1位置处,第一导电层102在由拦截结构300至第二阻挡坝202之间时需要有有机材料层包覆;在2位置处,阳极导电层104由第二阻挡坝202收缩至第一阻挡坝201内侧,且被像素限定层包覆;第一导电层102由第二阻挡坝202收缩至第一阻挡坝201下方,并沿着第一阻挡坝201延伸至3位置处,以最终收缩至显示区10,在3位置处,为了减少水汽通道,第一导电层102未覆盖有机材料层。可以看出,在1位置处和2位置处第一导电层102均采用最短的路径进行收缩,形成1位置处至2位置处之间的水汽通道。封装一旦失败,例如封装层发生断裂、产生裂缝等,水汽会沿着缝隙通过水汽通道进入显示基板的内部,导致发光器件的有机发光层氧化而失效,不能进行正常发光。随着水汽不断侵入,不能进行正常发光的发光器件越来越多,OLED面板会出现不断扩大的暗点的不良,影响显示效果。
图3为图2所示的显示基板中3位置处沿A-A’方向的截面结构示意图,如图3所示,在3位置处,第一导电层102截止,但是第二导电层103依然连续设置,此时第二导电层103容易在此处发生断裂,由于此处无阳极导电层104覆盖,此处容易形成段差,其上的封装层在断裂处容易形成裂缝,导致封装失败,使得水汽通过水汽通道进入显示基板的内部,导致发光器件的有机发光层氧化而失效不能进行正常发光。
为了至少解决上述的技术问题之一,本公开实施例提供了一种显示基板及显示装置,下面将结合附图和具体实施方式对本公开实施例提供的显示基板及显示装置进行进一步详细描述。
图4a为本公开实施例提供的一种显示基板的结构示意图,图5a为图4a所示的显示基板中拐角区的放大结构示意图,可以理解的是,本公开实施例 的图5a中仅示出了显示基板的左下角的拐角区的结构,其右下角的拐角区结构与左下角的拐角区的结构类似,本公开实施例将以显示基板的左下角的拐角区的结构为了进行说明。如图4a和图5a所示,本公开实施例提供的显示基板具有显示区10及围绕显示区10的非显示区20,显示基板包括:基底101、位于基底101上且设置于非显示区20的阻挡结构200;显示基板还包括:位于基底101上且沿着背离基底101方向依次设置的第一导电层102、第二导电层103和阳极导电层104;第一导电层102具有第一边界线1021;阳极导电层104具有与第一边界线的延伸方向基本平行的第二边界线1041第二边界线1041位于第一边界线1021远离显示区10的一侧;非显示区20包括:设置于显示区10一侧的扇出区20a及与扇出区20a连接的拐角区20b;在扇出区20a,第一导电层102截止,第二导电层103连续设置;在拐角区20b,阳极导电层104截止,阻挡结构200在基底101上的正投影至少部分覆盖第一边界线1021和第二边界线1041在基底101上的正投影。
例如,基底101可以采用玻璃等刚性材料制成,可以提高基底101对其上的其他膜层的承载能力。当然,基底101还可以采用聚酰亚胺(polyimide,PI)等柔性材料制成,可以提高整体显示基板的抗弯折、抗拉伸性能,避免在弯折、拉伸、扭曲过程中产生的应力使得基底101发生断裂,造成断路不良。在实际应用中,可以根据实际需要,合理选择基底101的材料,以保证显示基板具有良好的性能。
阻挡结构200可以采用有机材料制成,例如,聚酰亚胺、环氧树脂等有机材料,同时,阻挡结构200可以采用单层结构制成,也可以采用多层结构制成,阻挡结构200可以形成在显示基板的非显示区20中,并且围绕整个显示区10,以使得显示基板中封装层等膜层由于外力作用造成的裂缝在阻挡结构200的位置截止,避免裂缝由非显示区20延伸至显示区10,影响显示区10中发光器件的性能。
第一导电层102和第二导电层103可以采用相同的导电材料制成,例如,铝、钛、铜、钼等金属材料,同时,第一导电层102和第二导电层103可以采用单层结构制成,也可以采用多层结构制成,例如钛/铝/钛、钼/铝/钼、钛/铜/钛或者钼/铜/钼等三层金属层结构。第一导电层102和第二导电层103可以由显示区10延伸至非显示区20中,具体地,第一导电层102和第二导电层103可以形成显示区10中薄膜晶体管的膜层,也可以形成用于传输信号的信号线,例如电源电压线,具体地电源电压线可以为低电平电源电压线VSS。可以理解的是,第一导电层102和第二导电层103还可以为其他类型的信号线,在此不在一一列举,在本公开实施例及之后的描述中将以低电平信号线VSS为例进行说明。
在扇出区20a,第一导电层102截止,处于断开状态,第二导电层103穿过阻挡结构200,处于连续状态,使用第二导电层103穿过阻挡结构200,以连接驱动芯片。在拐角区20b,阳极导电层104截止。第一导电层102具有第一边界线1021,阳极导电层104具有第二边界线1041,在拐角区20b,第二边界线1041位于第一边界线1021远离显示区10的一侧,且阻挡结构200在基底101上的正投影至少部分覆盖第一边界线1021和第二边界线1041在基底101上的正投影,即阻挡结构200覆盖阳极导电层104的第二边界线1041,阳极导电层104覆盖第一导电层102的第一边界线1021。在此需要说明的是,第一边界线1021与第二边界线1041基本平行,此处的基本平行是指在工艺误差范围允许内的平行,在之后的描述中,基本平行的含义是相同的,将不再进行详述。
本公开实施例提供的显示基板中,阻挡结构200覆盖阳极导电层104的第二边界线1041,阳极导电层104覆盖第一导电层102的第一边界线1021,由于阳极导电层104上一般覆盖有像素限定层,可以不必为阳极导电层104的第二边界线1041以及第一导电层102的第一边界线1021单独设置有机材 料层进行覆盖。第一导电层102的第一边界线1021和阳极导电层104的第二边界线1041均位于阻挡结构200之下并朝着扇出区20a延伸一段距离,即第一导电层102和阳极导电层104一起向显示区10进行收缩,不必延伸至阻挡结构200之外的区域,这样可以保证有机材料层挖槽完整,避免形成水汽通道,因此可以避免水汽通过水汽通道进入显示基板的显示区10内部,而导致发光器件的有机发光层失效,从而可以避免由于有机发光层失效造成出现不断扩大的暗点的不良,进而提高显示基板的显示效果。
在一些实施例中,如图图4a和5a所示,阻挡结构200包括:第一阻挡坝201;第一阻挡坝201在基底101上的正投影至少部分覆盖第一边界线1021和第二边界线1041在基底101上的正投影。
阻挡结构200可以由一个阻挡坝构成,即第一阻挡坝201,第一导电层102的第一边界线1021和阳极导电层104的第二边界线1041均位于第一阻挡坝201之下并朝着扇出区20a方向延伸一段距离,即第一导电层102和阳极导电层104一起向显示区10进行收缩,不必延伸至阻挡结构200之外的区域,这样可以保证有机材料层挖槽完整,避免形成水汽通道,因此可以避免水汽通过水汽通道进入显示基板的显示区10内部,而导致发光器件的有机发光层失效,从而可以避免由于有机发光层失效造成出现不断扩大的暗点的不良,进而提高显示基板的显示效果。
在一些实施例中,如图4b和图5b所示,第一导电层102还具有与第一边界线1021的延伸方向基本平行的第三边界线1022;第三边界线1022位于第一边界线1021远离显示区10的一侧;阳极导电层104还具有与第二边界线1041的延伸方向基本平行的第四边界线1042;第四边界线1042位于第二边界线1041远离显示区10的一侧,且第四边界线1042位于第三边界线1022远离显示区10的一侧。
第一导电层102的第三边界线1022和阳极导电层104的第四边界1042 朝着扇出区20a方向延伸一段距离后向第一阻挡坝201方向收缩,之后第一导电层102的第三边界线1022与第一边界线1021连接,阳极导电层104的第四边界线1042与第二边界线1041连接,并且阳极导电层104覆盖第一导电层102的第三边界线1022。可以看出,第一导电层102和阳极导电层104均经过了两次收缩,并且朝着扇出区20a方向延伸一段距离,这样可以不必将第一导电层102以最短路径直接收缩至显示区10,可以延长可能形成的水汽通道的距离,延缓水汽侵入,因此可以避免水汽通过水汽通道进入显示基板的显示区10内部,而导致发光器件的有机发光层失效,从而可以避免由于有机发光层失效造成出现不断扩大的暗点的不良,进而提高显示基板的显示效果。
在一些实施例中,如图4b和5b所示,阻挡结构200还包括:第二阻挡坝202;第二阻挡坝202位于第一阻挡坝201远离显示区10的一侧;第二阻挡坝202在基底101上的正投影至少部分覆盖第三边界线1022和第四边界线1042在基底101上的正投影。
具体地,与上述图5a所示显示基板的结构不同的是,图5b中所示的显示基板中的阻挡结构200可以包括两个阻挡坝,即第一阻挡坝201和第二阻挡坝202,第二阻挡坝202较第一阻挡坝201更远离显示区10。第一导电层102的第三边界线1022和阳极导电层104的第四边界线1042均位于第二阻挡坝202之下,朝着扇出区20a方向延伸一段距离后收缩至第一阻挡坝201之下,之后再朝着扇出区20a方向延伸一段距离后收缩至显示区10,可以看出,第一导电层102和阳极导电层104均经过了两次收缩,这样可以延长可能形成的水汽通道的距离,延缓水汽侵入,因此可以避免水汽通过水汽通道进入显示基板的显示区10内部,而导致发光器件的有机发光层失效,从而可以避免由于有机发光层失效造成出现不断扩大的暗点的不良,进而提高显示基板的显示效果。另一方面,可以保证有机材料层挖槽的完整,避免形成 水汽通道。
在一些实施例中,如图5b和图5c所示,第一导电层102还具有连接第一边界线1021和第三边界线1022的第一连接线1023;阳极导电层104还具有连接第二边界线1041和第四边界线1042的第二连接线1043;第二连接线1043位于第一连接线1023靠近扇出区20a的一侧;第一连接线1023的延伸方向与第一边界线1021及第三边界线1022的延伸方向之间的夹角大于或等于90度;第二连接线1043的延伸方向与第二边界线1041及第四边界线1042的延伸方向之间的夹角大于或等于90度。
在此需要说明的是,本公开实施例提供的显示基板中的边界线以及连接线是由于第一导电层102和阳极导电层104等膜层在拐角区20b内朝着靠近显示区的方向收缩形成的。如图5c所示,第一连接线1023的延伸方向与第一边界线1021及第三边界线1022的延伸方向是不垂直的,第二连接线1043的延伸方向与第二边界线1041及第四边界线1042的延伸方向是不垂直的,即第一连接线1023和第二连接线1043均倾斜设置,这样可以延长第一连接线1023和第二连接线1043的距离,可以进一步延长可能形成的水汽通道的距离,延缓水汽侵入,因此可以避免水汽通过水汽通道进入显示基板显示区10的内部,而导致发光器件的有机发光层失效,从而可以避免由于有机发光层失效造成出现不断扩大的暗点的不良,进而提高显示基板的显示效果。可以理解的是,如图5b所示,第一连接线1023的延伸方向也可以与第一边界线1021及第三边界线1022的延伸方向垂直,第二连接线1043的延伸方向也可以与第二边界线1041及第四边界线1042的延伸方向垂直,这样可以降低第一导电层102和阳极导电层104的制备难度,节约第一导电层102和阳极导电层104的材料,从而可以节约制备成本。
在一些实施例中,如图5d和图5e,第一导电层102还具有与第三边界线1022的延伸方向基本平行的第五边界线1024;第五边界线1024位于第三 边界线1022远离显示区10的一侧;阳极导电层104还具有第四边界线1042的延伸方向基本平行的第六边界线1044;第六边界线1044位于第四边界线1042远离显示区的一侧,且第六边界线1044位于第五边界线1024远离显示区的一侧。
第一导电层102的第五边界线1024可以朝着扇出区20a方向延伸一段距离后,向第二阻挡坝202收缩形成第三边界线1022,第三边界线1022向第一阻挡坝201收缩并朝着扇出区20a方向延伸一段距离形成第一边界线1021,之后第一边界线1021再收缩至显示区10内,相应地,阳极导电层103的第六边界线1044也可以朝着扇出区20a方向延伸一段距离后,向第二阻挡坝202收缩形成第四边界线1042,第四边界线1042向第一阻挡坝201收缩并朝着扇出区20a方向延伸一段距离形成第二边界线1041,之后第二边界线1041再收缩至显示区10内。可以看出,第一导电层102和阳极导电层104均经过了三次收缩,并且在收缩后朝着扇出区20a延伸一段距离,这样可以延长可能形成的水汽通道的距离,延缓水汽侵入,因此可以避免水汽通过水汽通道进入显示基板的显示区10内部,而导致发光器件的有机发光层失效,从而可以避免由于有机发光层失效造成出现不断扩大的暗点的不良,进而提高显示基板的显示效果。
在一些实施例中,如图5d和图5e,显示基板还包括:位于基底101上且设置于非显示区20的拦截结构300;拦截结构300较第二阻挡坝202远离显示区10;拦截结构300在基底101上的正投影至少部分覆盖第五边界线1024和第六边界线1044在基底101上的正投影。
第一导电层102的第五边界线1024可以在拦截结构300之下,并朝着扇出区20a方向延伸一段距离后,向第二阻挡坝202收缩形成第三边界线1022,第三边界线向第一阻挡坝201收缩并朝着扇出区20a方向延伸一段距离形成第一边界线1021,之后第一边界线1021再收缩至显示区10内,相应 地,阳极导电层103的第六边界线1044也可以在拦截结构300之下,并朝着扇出区20a方向延伸一段距离后,向第二阻挡坝202收缩形成第四边界线1042,第四边界线1042向第一阻挡坝201收缩并朝着扇出区20a方向延伸一段距离形成第二边界线1041,之后第二边界线1041再收缩至显示区10内。可以看出,第一导电层102和阳极导电层104均经过了三次收缩,并且在收缩后朝着扇出区20a延伸一段距离,这样可以延长可能形成的水汽通道的距离,延缓水汽侵入,因此可以避免水汽通过水汽通道进入显示基板的显示区10内部,而导致发光器件的有机发光层失效,从而可以避免由于有机发光层失效造成出现不断扩大的暗点的不良,进而提高显示基板的显示效果。
在一些实施例中,如图5d和图5e所示,第一导电层102还具有连接第三边界线1022和第五边界线1024的第三连接线1025;阳极导电层104还具有连接第四边界线1042和第六边界线1044的第四连接线1045;第四连接线1045位于第三连接线1025靠近扇出区20a的一侧;第三连接线1025的延伸方向与第三边界线1022及第五边界线1024的延伸方向之间的夹角大于或等于90度;第四连接线1045的延伸方向与第四边界线1042及第六边界线1044的延伸方向之间的夹角大于或等于90度。
如图5e所示,第三连接线1025的延伸方向与第三边界线1022及第五边界线1024的延伸方向是不垂直的,第四连接线1045的延伸方向与第四边界线1042及第六边界线1044的延伸方向是不垂直的,即第三连接线1025和第四连接线1045均倾斜设置,这样可以延长第三连接线1025和第四连接线1045的距离,可以进一步延长可能形成的水汽通道的距离,延缓水汽侵入,因此可以避免水汽通过水汽通道进入显示基板显示区10的内部,而导致发光器件的有机发光层失效,从而可以避免由于有机发光层失效造成出现不断扩大的暗点的不良,进而提高显示基板的显示效果。可以理解的是,如图5d所示,第三连接线1025的延伸方向与第三边界线1022及第五边界线 1024的延伸方向也可以是垂直的,第四连接线1045的延伸方向与第四边界线1042及第六边界线1044的延伸方向也可以是垂直的,这样可以降低第一导电层102和阳极导电层104的制备难度,节约第一导电层102和阳极导电层104的材料,从而可以节约制备成本。
在一些实施例中,如图5f和图5g所示,第一导电层102还具有与第三边界线1022的延伸方向基本平行的第七边界线1026;第七边界线1026位于第一边界线1021和第三边界线1022之间;阳极导电层104还具有与第四边界线1042的延伸方向基本平行的第八边界线1046;第八边界线1046位于第二边界线1041和第四边界线1042之间,且第八边界线1046位于第七边界线1026远离显示区10的一侧。
第一导电层102的第五边界线1024收缩形成第三边界线1022,第三边界线1022可以朝着扇出区20a方向延伸一段距离后,收缩形成第七边界线1026,第七边界线1026收缩并朝着扇出区20a方向延伸一段距离之后再形成第一边界线1021,第一边界线1021收缩至显示区10内。相应地,阳极导电层103的第六边界线1044收缩形成第四边界线1042,第四边界线1042可以朝着扇出区20a方向延伸一段距离后,收缩形成第八边界线1046,第八边界线1046收缩并朝着扇出区20a方向延伸一段距离之后再形成第二边界线1041,第二边界线1041收缩至显示区10内。可以看出,第一导电层102和阳极导电层104均经过了四次收缩,并且在收缩后朝着扇出区20a延伸一段距离,这样可以延长可能形成的水汽通道的距离,延缓水汽侵入,因此可以避免水汽通过水汽通道进入显示基板的显示区10内部,而导致发光器件的有机发光层失效,从而可以避免由于有机发光层失效造成出现不断扩大的暗点的不良,进而提高显示基板的显示效果。
在一些实施例中,如图5f和图5g所示,第一阻挡坝201包括:第一子阻挡坝2011和第二子阻挡坝2012;第一子阻挡坝2011较第二子阻挡坝2012 靠近显示区10;第一子阻挡坝2011在基底101上的正投影至少部分覆盖第一边界线1021和第二边界线1041在基底101上的正投影;第二子阻挡坝2012在基底101上的正投影至少部分覆盖第七边界线1026和第八边界线1046在基底101上的正投影。
第一阻挡坝201可以由第一子阻挡坝2011和第二子阻挡坝2022构成,第一子阻挡坝2011和第二子阻挡坝2012在远离扇出区20a的一端连接在一起。第一导电层102的第七边界线1026可以在第二子阻挡坝2012之下,第七边界线1026收缩形成第一边界线1021,第一边界线1021可以在第一子阻挡坝2011之下。相应地,阳极导电层104的第八边界线1046可以在第二子阻挡坝2012之下,第八边界线1046收缩形成第二边界线1041,第二边界线1041可以在第一子阻挡坝2011之下。这样第一导电层102和阳极导电层104均经过了四次收缩,并且在收缩后朝着扇出区20a延伸一段距离,这样可以延长可能形成的水汽通道的距离,延缓水汽侵入,因此可以避免水汽通过水汽通道进入显示基板的显示区10内部,而导致发光器件的有机发光层失效,从而可以避免由于有机发光层失效造成出现不断扩大的暗点的不良,进而提高显示基板的显示效果。
在一些实施例中,如图5f和图5g所示,第一导电层102还具有连接第一边界线1021和第七边界线1026的第五连接线1027、及连接第三边界线1022和第七边界线1026的第六连接线1028;阳极导电层104还具有连接第二边界线1041和第八边界线1046的第七连接线1047、及连接第四边界线1042和第八边界线1046的第八连接线1048;第七连接线1047位于第五连接线1027靠近扇出区20a的一侧,第八连接线1048位于第六连接线1028靠近扇出区20a的一侧;第五连接线1027的延伸方向与第一边界线1021及第七边界线1026的延伸方向之间的夹角大于或等于90度;第六连接线1028的延伸方向与第三边界线1022及第七边界线1026的延伸方向之间的夹角大 于或等于90度;第七连接线1047的延伸方向与第二边界线1041及第八边界线1046的延伸方向之间的夹角大于或等于90度;第八连接线1048的延伸方向与第四边界线1042及第八边界线1046的延伸方向之间的夹角大于或等于90度。
如图5g所示,第五连接线1027的延伸方向与第一边界线1021和第七边界线1026的延伸方向是不垂直的,第六连接线1028的延伸方向与第三边界线1022和第七边界线1026的延伸方向是不垂直的,即第五连接线1027和第六连接线1028均倾斜设置,这样可以延长第五连接线1027和第六连接线1028的距离,可以进一步延长可能形成的水汽通道的距离,延缓水汽侵入,因此可以避免水汽通过水汽通道进入显示基板显示区10的内部,而导致发光器件的有机发光层失效,从而可以避免由于有机发光层失效造成出现不断扩大的暗点的不良,进而提高显示基板的显示效果。同样地,第七连接线1047和第八连接线1048也可以均倾斜设置,这样可以延长第七连接线1047和第八连接线1048的距离,可以进一步延长可能形成的水汽通道的距离,延缓水汽侵入,因此可以避免水汽通过水汽通道进入显示基板显示区10的内部,而导致发光器件的有机发光层失效,从而可以避免由于有机发光层失效造成出现不断扩大的暗点的不良,进而提高显示基板的显示效果。可以理解的是,如图5f所示,第五连接线1027、第六连接线1028、第七连接线1047和第八连接线1048也可以与其对应的边界线垂直设置,这样可以降低第一导电层102和阳极导电层104的制备难度,节约第一导电层102和阳极导电层104的材料,从而可以节约制备成本。
在一些实施例中,如图5h和图5i所示,第一导电层102还具有与第三边界线1022的延伸方向基本平行的第九边界线1029;第九边界线1029位于第三边界线1022远离显示区10的一侧;阳极导电层104还具有与第四边界线1042的延伸方向基本平行的第十边界线1049;第十边界线1049位于第四 边界线1042远离显示区10的一侧,且第十边界线1049位于第九边界线1029远离显示区10的一侧。
第一导电层102的第五边界线1024可以朝着扇出区20a方向延伸一段距离后,收缩形成第九边界线1029,第九边界线1029收缩并朝着扇出区20a方向延伸一段距离之后再形成第三边界线1022,第三边界线1022收缩形成第一边界线1021,第一边界线1021收缩至显示区10内。相应地,阳极导电层103的第六边界线1044可以朝着扇出区20a方向延伸一段距离后,收缩形成第十边界线1049,第十边界线1049收缩并朝着扇出区20a方向延伸一段距离之后再形成第四边界线1042,第四边界线1042收缩形成第二边界线1041,第二边界线1041收缩至显示区10内。可以看出,第一导电层102和阳极导电层104均经过了四次收缩,并且在收缩后朝着扇出区20a延伸一段距离,这样可以延长可能形成的水汽通道的距离,延缓水汽侵入,因此可以避免水汽通过水汽通道进入显示基板的显示区10内部,而导致发光器件的有机发光层失效,从而可以避免由于有机发光层失效造成出现不断扩大的暗点的不良,进而提高显示基板的显示效果。
在一些实施例中,如图5h和图5i所示,第二阻挡坝202包括:第三子阻挡坝2021和第四子阻挡坝2022;第三子阻挡坝2021较第四子阻挡坝2022靠近显示区10;第三子阻挡坝2021在基底101上的正投影至少部分覆盖第三边界线1022和第四边界线1042在基底上101的正投影;第四子阻挡坝2022在基底101上的正投影至少部分覆盖第九边界线1029和第十边界线1049在基底101上的正投影。
第二阻挡坝202可以由第三子阻挡坝2021和第四子阻挡坝2022构成,第三子阻挡坝2021和第四子阻挡坝2022在远离扇出区20a的一端连接在一起。第一导电层102的第九边界线1029可以在第四子阻挡坝2022之下,第九边界线1029收缩形成第三边界线1022,第三边界线1022可以在第三子阻 挡坝2021之下。相应地,阳极导电层104的第十边界线1049可以在第四子阻挡坝2022之下,第十边界线1049收缩形成第四边界线1042,第四边界线1042可以在第三子阻挡坝2021之下。这样第一导电层102和阳极导电层104均经过了四次收缩,并且在收缩后朝着扇出区20a延伸一段距离,这样可以延长可能形成的水汽通道的距离,延缓水汽侵入,因此可以避免水汽通过水汽通道进入显示基板的显示区10内部,而导致发光器件的有机发光层失效,从而可以避免由于有机发光层失效造成出现不断扩大的暗点的不良,进而提高显示基板的显示效果。
在一些实施例中,如图5h和图5i所示,第一导电层102还具有连接第三边界线1022和第九边界线1029的第九连接线1030、及连接第五边界线1024和第九边界线1029的第十连接线1031;阳极导电层104还具有连接第四边界线1042和第十边界线1049的第十一连接线1050、及连接第六边界线1044和第十边界线1049的第十二连接线1051;第十一连接线1050位于第九连接线1030靠近扇出区20a的一侧,第十二连接线1051位于第十连接线1031靠近扇出区20a的一侧;第九连接线1030的延伸方向与第三边界线1022及第九边界线1029的延伸方向之间的夹角大于或等于90度;第十连接线1031的延伸方向与第五边界线1024及第九边界线1029的延伸方向之间的夹角大于或等于90度;第十一连接线1050的延伸方向与第四边界线1042及第十边界线1049的延伸方向之间的夹角大于或等于90度;第十二连接线1051的延伸方向与第六边界线1044及第十边界线1049的延伸方向之间的夹角大于或等于90度。
如图5i所示,第九连接线1030的延伸方向与第三边界线1022和第九边界线1029的延伸方向是不垂直的,第十连接线1031的延伸方向与第五边界线1024和第九边界线1029的延伸方向是不垂直的,即第九连接线1030和第十连接线1031均倾斜设置,这样可以延长第九连接线1030和第十连接线 1031的距离,可以进一步延长可能形成的水汽通道的距离,延缓水汽侵入,因此可以避免水汽通过水汽通道进入显示基板显示区10的内部,而导致发光器件的有机发光层失效,从而可以避免由于有机发光层失效造成出现不断扩大的暗点的不良,进而提高显示基板的显示效果。同样地,同样地,第十一连接线1050和第十二连接线1051也可以均倾斜设置,这样可以延长第十一连接线1050和第十二连接线1051的距离,可以进一步延长可能形成的水汽通道的距离,延缓水汽侵入,因此可以避免水汽通过水汽通道进入显示基板显示区10的内部,而导致发光器件的有机发光层失效,从而可以避免由于有机发光层失效造成出现不断扩大的暗点的不良,进而提高显示基板的显示效果。如图5h所示,第九连接线1030、第十连接线1031、第十一连接线1050、第十二连接线1051也可以与其对应的边界线垂直设置,这样可以降低第一导电层102和阳极导电层104的制备难度,节约第一导电层102和阳极导电层104的材料,从而可以节约制备成本。
在一些实施例中,如图6所示,显示基板还包括:位于阳极导电层104上的像素限定层105;像素限定层105在扇出区20a的厚度大于在拐角区20b的厚度。
如图6所示,像素限定层105在不同区域的厚度是不同的,像素限定层105设置于阳极导电层104上,其可以起到平坦化的作用,在第一导电层102截止且第二导电层103连续设置的位置,即扇出区20a,像素限定层105的厚度较厚,可以避免此处产生段差,这样可以避免覆盖在其上的封装层等膜层由于段差的存在而产生裂缝,避免封装失败,从而可以防止水汽通过水汽通道进入显示基板的内部,导致发光器件的有机发光层氧化而失效不能进行正常发光。
在一些实施例中,如图7所示,显示基板还包括:位于基底101与阳极导电层104之间且设置于显示区10的像素电路,及位于像素限定层105限 定区域的发光器件40;像素电路包括:薄膜晶体管50;薄膜晶体管50包括:依次设置在基底101上的有源层501、栅绝缘层502、栅极503,层间绝缘层504、源极505和漏极506;发光器件40包括:相对设置的第一电极401和第二电极402、及位于第一电极401和第二电极402之间的有机发光层403;漏极506与第一电极401通过转接电极507连接;阳极导电层104与第一电极401同层设置。
薄膜晶体管50包括依次设置在基底101上的有源层501、栅绝缘层502、栅极503,层间绝缘层504和源漏电极(包括源极505和漏极506),源极505和漏极506分别通过贯穿层间绝缘层504及栅绝缘层503的过孔与有源层501的两端连接。薄膜晶体管50的漏极506通过转接电极507与发光器件40的第一电极401连接,以为发光器件40提供阳极电压信号。转接电极507的设置可以与漏极506形成并联结构,可以降低薄膜晶体管50中电极的电阻,有利于阳极电压信号的传输。
发光器件40的第一电极401可以为阳极,可以为发光器件输入阳极电压信号,以形成空穴,阳极可以由像素限定层105的容纳部裸露出来,阳极可以与上述的阳极导电层104同层设置,在制备过程中采用相同的材料,同一工艺制备形成,以降低工艺难度,节约制备成本。发光器件40的第二电极402可以为阴极,可以为发光器件输入阴极电压信号,以形成电子,阴极可以覆盖在像素限定层105上,在实际应用中可,阴极可以整面设置,以便于接入阴极电压信号。发光器件40的有机发光层403可以利用有机发光材料通过喷墨打印工艺形成在像素限定层104的容纳部内,在阳极和阴极的电压信号的驱动下形成激子,以进行发光。
阳极导电层104可以与第一电极401同层设置,在制备过程中可以采用相同材料,同一制备工艺形成,以降低工艺难度,节约制备成本。
在一些实施例中,第一导电层102与源极505及漏极506同层设置;第 二导电层103与转接电极507同层设置。
薄膜晶体管50的源极505和漏极506可以与第一导电层102同层设置,在制备过程中可以采用相同材料,同一制备工艺形成,以降低工艺难度,节约制备成本。相应地,转接电极507可以与第二导电层103同层设置,在制备过程中可以采用相同材料,同一制备工艺形成,以降低工艺难度,节约制备成本。
在一些实施例中,显示基板还包括:与第二电极402连接的电源电压线;电源电压线包括:第一子电源电压线和第二子电源电压线;第一子电源电压线与第一导电层同层设置;第二子电源电压线与第二导电层同层设置。具体地,电源电压线可以为低电平电源电压线VSS,低电平电源电压线VSS可以采用第一子电源电压线和第二子电源电压线的双层结构制成,以降低低电平电源电压线VSS的电阻,保证低电平电源电压信号的传输。第一子电源电压线可以与第一导电层102同层设置,第二子电源电压线可以与第二导电层103同层设置,在制备过程中可以采用相同材料,同一制备工艺形成,以降低工艺难度,节约制备成本。
在一些实施例中,如图7和图8所示,显示基板还包括:位于像素限定层105上的封装层106;封装层106可以包括:沿着背离基底101方向依次设置的第一无机封装层1061、有机封装层1063和第二无机封装层1062;第一无机封装层1061和第二无机封装层1062覆盖阻挡结构200,且在阻挡结构200远离显示区10一侧截止;有机封装层1062在阻挡结构200靠近显示区10一侧截止。
封装层106可以对发光器件40的第二电极402等结构进行封装,以防止水汽进入发光器件的有机发光层403,避免有机发光层403氧化,造成显示不良。具体地,封装层106可以包括:沿着背离基底101方向依次设置的第一无机封装层1061、有机封装层1063和第二无机封装层1062。第一无机 封装层和第二无机封装层可以采用氮化硅、氧化硅、氮氧化硅等无机材料形成,有机封装层可以采用环氧树脂等有机材料形成。同时,封装层106中的第一无机封装层1061和第二无机封装层1062可以覆盖阻挡结构200,且在阻挡结构200远离显示区10一侧截止,当阻挡结构200远离显示区10一侧设置有拦截结构时,第一无机封装层1061和第二无机封装层1062在拦截结构处截止。有机封装层1062在阻挡结构200靠近显示区10一侧截止,可以避免水汽通过其中的有机封装层1063由非显示区20向显示区10内传导。
在一些实施例中,显示基板还包括:第一有机绝缘层(图中未示出)和第二有机绝缘层(图中未示出);第一有机绝缘层位于第一导电层和第二导电层之间;第二有机绝缘层位于第二导电层和阳极导电层之间。
第一有机绝缘层一方面可以对第一导电层102和第二导电层103进行绝缘,避免二者在相应区域发生短接,影响信号传输,另一方面可以对第一导电层102进行覆盖,避免水汽对第一导电层102造成腐蚀。同样地,第二有机绝缘层也可以对第二导电层103与阳极导电层104进行绝缘,避免二者在相应区域发生短接,影响信号传输,另一方面可以对第二导电层103进行覆盖,避免水汽对第二导电层103造成腐蚀。
在一些实施例中,第一有机绝缘层和所述第二有机绝缘层在拦截结构与阻挡结构之间的对应区域均设置有挖槽。
挖槽可以使得第一有机绝缘层和第二有机绝缘层在相应的位置断开,可以防止在拦截结构300和拦截结构200之间形成水汽通道,因此可以避免水汽通过水汽通道进入显示基板的显示区10内部,而导致发光器件的有机发光层失效,从而可以避免由于有机发光层失效造成出现不断扩大的暗点的不良,进而提高显示基板的显示效果。
在一些实施例中,如图5j所示,第二导电层103具有第十一边界线1032;在拐角区20b,第十一边界线1032位于第六边界线1044远离显示区10的一 侧。
可以理解的是,在图5a-图5i中为了更清楚的表示第一导电层102与阳极导电层104的边界线及连接线之间的位置关系,未示出第二导电层103的结构,在图5j中示出了第二导电层103的结构,如图5j所示,在拐角区20b,第二导电层103的第十一边界线1032位于第六边界线1044远离显示区10的一侧,这样第二导电层103可以覆盖阳极导电层104的第六边界线以及覆盖第一导电层102的第五边界线1024,在刻蚀第二导电层103时可以避免将第一导电层102造成损坏。
在一些实施例中,如图5a-图5j所示,第一导电层102还具有与第一边界线1021延伸方向相交的第十二边界线1033;阳极导电层104还具有与第二边界线1041延伸方向相交的十三边界线1052;第十二边界线线1033位于扇出区20a,第十三边界线1052位于拐角区20b。
第一导电层102的第十二边界线1033可以由扇出区20a延伸至显示区10,阳极导电层104的第十三边界线1052可以由拐角区20b延伸至显示区10,以为显示区10中的发光器件40提供低电平电源信号。
在一些实施例中,如图8所示,在拐角区20b,第一导电层102、第二导电层103和阳极导电层104的至少部分电连接。
在拐角区20b,第一导电层102和第二导电层103电连接可以形成双层结构的低电平电源电压线VSS,其与阳极导电层104连接,阳极导电层104由拐角区20b延伸至显示区10并与显示区10中的发光器件40的阴极连接,以为显示区10中的发光器件提供低电平电源信号,使得发光器件40发光,实现显示功能。
本公开实施例还提供了一种显示装置,该显示装置包括如上述任一实施例提供的显示基板,该显示装置可以为手机、平板电脑、电视机、显示器、笔记本电脑、数码相框、导航仪等任何具有显示功能的产品或部件,本公开 的实施例对此不做限定。其实现原理及技术效果与上述任一实施例提供的显示基板的实现原理及技术效果相同,在此不再赘述。
可以理解的是,以上实施方式仅仅是为了说明本公开的原理而采用的示例性实施方式,然而本公开并不局限于此。对于本领域内的普通技术人员而言,在不脱离本公开的精神和实质的情况下,可以做出各种变型和改进,这些变型和改进也视为本公开的保护范围。

Claims (26)

  1. 一种显示基板,具有显示区及围绕所述显示区的非显示区,其中,所述显示基板包括:基底、位于所述基底上且设置于所述非显示区的阻挡结构;所述显示基板还包括:位于所述基底上且沿着背离所述基底方向依次设置的第一导电层、第二导电层和阳极导电层;所述第一导电层具有第一边界线;所述阳极导电层具有与所述第一边界线的延伸方向基本平行的第二边界线;所述第二边界线位于所述第一边界线远离所述显示区的一侧;所述非显示区包括:设置于所述显示区一侧的扇出区及与所述扇出区连接的拐角区;
    在所述扇出区,所述第一导电层截止,所述第二导电层连续设置;
    在所述拐角区,所述阳极导电层截止,所述阻挡结构在所述基底上的正投影至少部分覆盖所述第一边界线和所述第二边界线在所述基底上的正投影。
  2. 根据权利要求1所述的显示基板,其中,所述阻挡结构包括:第一阻挡坝;
    所述第一阻挡坝在所述基底上的正投影至少部分覆盖所述第一边界线和所述第二边界线在所述基底上的正投影。
  3. 根据权利要求1或2所述的显示基板,其中,所述第一导电层还具有与所述第一边界线的延伸方向基本平行的第三边界线;所述第三边界线位于所述第一边界线远离所述显示区的一侧;
    所述阳极导电层还具有与所述第二边界线的延伸方向基本平行的第四边界线;所述第四边界线位于所述第二边界线远离所述显示区的一侧,且所述第四边界线位于所述第三边界线远离所述显示区的一侧。
  4. 根据权利要求2或3所述的显示基板,其中,所述阻挡结构还包括:第二阻挡坝;所述第二阻挡坝位于所述第一阻挡坝远离所述显示区的一侧;
    所述第二阻挡坝在所述基底上的正投影至少部分覆盖所述第三边界线和所述第四边界线在所述基底上的正投影。
  5. 根据权利要求3或4所述的显示基板,其中,所述第一导电层还具有连接所述第一边界线和所述第三边界线的第一连接线;所述阳极导电层还具有连接所述第二边界线和所述第四边界线的第二连接线;所述第二连接线位于所述第一连接线靠近所述扇出区的一侧;
    所述第一连接线的延伸方向与所述第一边界线及所述第三边界线的延伸方向之间的夹角大于或等于90度;
    所述第二连接线的延伸方向与所述第二边界线及所述第四边界线的延伸方向之间的夹角大于或等于90度。
  6. 根据权利要求3-5任一项所述的显示基板,其中,所述第一导电层还具有与所述第三边界线的延伸方向基本平行的第五边界线;所述第五边界线位于所述第三边界线远离所述显示区的一侧;
    所述阳极导电层还具有所述第四边界线的延伸方向基本平行的第六边界线;所述第六边界线位于所述第四边界线远离所述显示区的一侧,且所述第六边界线位于所述第五边界线远离所述显示区的一侧。
  7. 根据权利要求4-6任一项所述的显示基板,其中,所述显示基板还包括:位于所述基底上且设置于所述非显示区的拦截结构;
    所述拦截结构较所述第二阻挡坝远离所述显示区。
  8. 根据权利要求7所述的显示基板,其中,所述拦截结构在所述基底上的正投影至少部分覆盖所述第五边界线和所述第六边界线在所述基底上的正投影。
  9. 根据权利要求4-6任一项所述的显示基板,其中,所述第一导电层还具有连接所述第三边界线和所述第五边界线的第三连接线;所述阳极导电层还具有连接所述第四边界线和所述第六边界线的第四连接线;所述第四连接线位于所述第三连接线靠近所述扇出区的一侧;
    所述第三连接线的延伸方向与所述第三边界线及所述第五边界线的延伸方向之间的夹角大于或等于90度;
    所述第四连接线的延伸方向与所述第四边界线及所述第六边界线的延伸方向之间的夹角大于或等于90度。
  10. 根据权利要求3或4所述的显示基板,其中,所述第一导电层还具有与所述第三边界线的延伸方向基本平行的第七边界线;所述第七边界线位于所述第一边界线和所述第三边界线之间;
    所述阳极导电层还具有与所述第四边界线的延伸方向基本平行的第八边界线;所述第八边界线位于所述第二边界线和所述第四边界线之间,且所述第八边界线位于所述第七边界线远离所述显示区的一侧。
  11. 根据权利要求2-10任一项所述的显示基板,其中,所述第一阻挡坝包括:第一子阻挡坝和第二子阻挡坝;所述第一子阻挡坝较所述第二子阻挡坝靠近所述显示区;
    所述第一子阻挡坝在所述基底上的正投影至少部分覆盖所述第一边界线和所述第二边界线在所述基底上的正投影;
    所述第二子阻挡坝在所述基底上的正投影至少部分覆盖所述第七边界线和所述第八边界线在所述基底上的正投影。
  12. 根据权利要求2-10任一项所述的显示基板,其中,所述第一导电层还具有连接所述第一边界线和所述第七边界线的第五连接线、及连接所述第三边界线和所述第七边界线的第六连接线;所述阳极导电层还具有连接所述第二边界线和所述第八边界线的第七连接线、及连接所述第四边界线和所述第八边界线的第八连接线;所述第七连接线位于所述第五连接线靠近所述扇出区的一侧,所述第八连接线位于所述第六连接线靠近所述扇出区的一侧;
    所述第五连接线的延伸方向与所述第一边界线及所述第七边界线的延伸方向之间的夹角大于或等于90度;所述第六连接线的延伸方向与所述第三边界线及所述第七边界线的延伸方向之间的夹角大于或等于90度;
    所述第七连接线的延伸方向与所述第二边界线及所述第八边界线的延 伸方向之间的夹角大于或等于90度;所述第八连接线的延伸方向与所述第四边界线及所述第八边界线的延伸方向之间的夹角大于或等于90度。
  13. 根据权利要求3或4所述的显示基板,其中,所述第一导电层还具有与所述第三边界线的延伸方向基本平行的第九边界线;所述第九边界线位于所述第三边界线远离所述显示区的一侧;
    所述阳极导电层还具有与所述第四边界线的延伸方向基本平行的第十边界线;所述第十边界线位于所述第四边界线远离所述显示区的一侧,且所述第十边界线位于所述第九边界线远离所述显示区的一侧。
  14. 根据权利要求4-13任一项所述的显示基板,其中,所述第二阻挡坝包括:第三子阻挡坝和第四子阻挡坝;所述第三子阻挡坝较所述第四子阻挡坝靠近所述显示区;
    所述第三子阻挡坝在所述基底上的正投影至少部分覆盖所述第三边界线和所述第四边界线在所述基底上的正投影;
    所述第四子阻挡坝在所述基底上的正投影至少部分覆盖所述第九边界线和所述第十边界线在所述基底上的正投影。
  15. 根据权利要求4-13任一项所述的显示基板,其中,所述第一导电层还具有连接所述第三边界线和所述第九边界线的第九连接线、及连接所述第五边界线和所述第九边界线的第十连接线;所述阳极导电层还具有连接所述第四边界线和所述第十边界线的第十一连接线、及连接所述第六边界线和所述第十边界线的第十二连接线;所述第十一连接线位于所述第九连接线靠近所述扇出区的一侧,所述第十二连接线位于所述第十连接线靠近所述扇出区的一侧;
    所述第九连接线的延伸方向与所述第三边界线及所述第九边界线的延伸方向之间的夹角大于或等于90度;所述第十连接线的延伸方向与所述第五边界线及所述第九边界线的延伸方向之间的夹角大于或等于90度;
    所述第十一连接线的延伸方向与所述第四边界线及所述第十边界线的 延伸方向之间的夹角大于或等于90度;所述第十二连接线的延伸方向与所述第六边界线及所述第十边界线的延伸方向之间的夹角大于或等于90度。
  16. 根据权利要求1-15任一项所述的显示基板,其中,所述显示基板还包括:位于所述阳极导电层上的像素限定层;
    所述像素限定层在所述扇出区的厚度大于在所述拐角区的厚度。
  17. 根据权利要求16所述的显示基板,其中,所述显示基板还包括:位于所述像素限定层限定区域的发光器件;所述发光器件包括:相对设置的第一电极和第二电极、及位于所述第一电极和所述第二电极之间的有机发光层;
    所述第一电极与所述阳极导电层同层设置。
  18. 根据权利要求17所述的显示基板,其中,所述显示基板还包括:位于所述基底与所述阳极导电层之间且设置于所述显示区的像素电路;所述像素电路包括:薄膜晶体管;所述薄膜晶体管包括:依次设置在基底上的有源层、栅绝缘层、栅极、层间绝缘层、源极和漏极;所述第一电极通过转接电极与所述源极或所述漏极电连接;
    所述第一导电层与所述源极及所述漏极同层设置;
    所述第二导电层与所述转接电极同层设置。
  19. 根据权利要求17所述的显示基板,其中,所述显示基板还包括:与所述第二电极连接的电源电压线;
    所述电源电压线包括:第一子电源电压线和第二子电源电压线;
    所述第一子电源电压线与所述第一导电层同层设置;所述第二子电源电压线与所述第二导电层同层设置。
  20. 根据权利要求17所述的显示基板,其中,所述显示基板还包括:位于所述像素限定层上的封装层;所述封装层包括:沿着背离所述基底方向依次设置的第一无机封装层、有机封装层和第二无机封装层;
    所述第一无机封装层和所述第二无机封装层覆盖所述阻挡结构,且在所 述阻挡结构远离所述显示区一侧截止;
    所述有机封装层在所述阻挡结构靠近所述显示区一侧截止。
  21. 根据权利要求1所述的显示基板,其中,所述显示基板还包括:第一有机绝缘层和第二有机绝缘层;
    所述第一有机绝缘层位于所述第一导电层和所述第二导电层之间;
    所述第二有机绝缘层位于所述第二导电层和所述阳极导电层之间。
  22. 根据权利要求21所述的显示基板,其中,所述第一有机绝缘层和所述第二有机绝缘层在所述拦截结构与所述阻挡结构之间的对应区域均设置有挖槽。
  23. 根据权利要求6所述的显示基板,其中,所述第二导电层具有第十一边界线;在所述拐角区,所述第十一边界线位于所述第六边界线远离所述显示区的一侧。
  24. 根据权利要求1所述的显示基板,其中,所述第一导电层还具有与所述第一边界线延伸方向相交的第十二边界线;所述阳极导电层还具有与所述第二边界线延伸方向相交的十三边界线;
    所述第十二边界线线位于所述扇出区,所述第十三边界线位于所述拐角区。
  25. 根据权利要求1所述的显示基板,其中,在所述拐角区,所述第一导电层、所述第二导电层和所述阳极导电层的至少部分电连接。
  26. 一种显示装置,其中,所述显示装置包括如权利要求1-25任一项所述的显示基板。
PCT/CN2021/133450 2021-11-26 2021-11-26 显示基板及显示装置 WO2023092444A1 (zh)

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