WO2023058480A1 - 上部電極構造及びプラズマ処理装置 - Google Patents

上部電極構造及びプラズマ処理装置 Download PDF

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Publication number
WO2023058480A1
WO2023058480A1 PCT/JP2022/035608 JP2022035608W WO2023058480A1 WO 2023058480 A1 WO2023058480 A1 WO 2023058480A1 JP 2022035608 W JP2022035608 W JP 2022035608W WO 2023058480 A1 WO2023058480 A1 WO 2023058480A1
Authority
WO
WIPO (PCT)
Prior art keywords
plasma processing
processing apparatus
cooling plate
electrode
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2022/035608
Other languages
English (en)
French (fr)
Japanese (ja)
Inventor
徹治 佐藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Priority to CN202280065772.6A priority Critical patent/CN118043945A/zh
Priority to JP2023552803A priority patent/JPWO2023058480A1/ja
Priority to KR1020247013621A priority patent/KR20240090232A/ko
Publication of WO2023058480A1 publication Critical patent/WO2023058480A1/ja
Priority to US18/628,269 priority patent/US20240249907A1/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32577—Electrical connecting means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32541—Shape
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H01J37/32522—Temperature
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32568—Relative arrangement or disposition of electrodes; moving means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32715—Workpiece holder
    • H01J37/32724—Temperature
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
    • H10P14/29—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials characterised by the substrates
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P50/00—Etching of wafers, substrates or parts of devices
    • H10P50/20—Dry etching; Plasma etching; Reactive-ion etching
    • H10P50/24—Dry etching; Plasma etching; Reactive-ion etching of semiconductor materials
    • H10P50/242—Dry etching; Plasma etching; Reactive-ion etching of semiconductor materials of Group IV materials
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/72—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using electrostatic chucks
    • H10P72/722—Details of electrostatic chucks

Definitions

  • the gas flow path may be formed at a position that does not overlap the gas ejection holes when viewed in the thickness direction.
  • radicals or the like move linearly from the chamber toward the gas flow path, the radicals collide with the electrostatic adsorption portion, so that direct entry of the radicals into the gas flow path can be avoided. Therefore, the upper electrode structure can suppress abnormal discharge due to plasma.
  • a shield 46 is detachably provided along the inner wall of the chamber main body 12 in the plasma processing apparatus 10 .
  • the shield 46 is also provided on the outer circumference of the support portion 13 .
  • Shield 46 prevents etch byproducts from adhering to chamber body 12 .
  • the shield 46 is configured, for example, by coating an aluminum member with ceramics such as Y 2 O 3 .
  • the electrostatic chuck 35 has a through hole penetrating in the thickness direction at a position corresponding to the gas supply channel 37 e of the cooling plate 37 .
  • the processing gas present in the gas diffusion chamber 37b passes through the gas supply channel 37e and through the through hole of the electrostatic chuck 35 to be supplied to the upper surface of the electrode plate 34. As shown in FIG.
  • FIG. 4 is a diagram showing the lower surface of the cooling plate according to one exemplary embodiment.
  • FIG. 5 is a diagram illustrating electrodes of a cooling plate according to one exemplary embodiment. As shown in FIG. 4, an electrostatic chuck 35 having a plurality of projections 35c is formed on the lower surface of the cooling plate body 37A. As shown in FIG. 5, the polarity of the voltage supplied to the central electrode 352b corresponding to the central region Z1 (an example of the first region) is the same as that of the outer edge electrode corresponding to the outer edge region Z2 (an example of the second region). A voltage with a polarity different from the polarity of the voltage supplied to 351b may be applied.
  • the electrostatic chuck 35 has a plurality of protrusions 35 c that contact the top surface of the electrode plate 34 , a space is formed between the electrostatic chuck 35 and the top surface of the electrode plate 34 .
  • the processing gas flows through the space formed between the electrostatic chuck 35 and the electrode plate 34, so that the electrode plate 34 can be cooled more efficiently.

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Drying Of Semiconductors (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Chemical Vapour Deposition (AREA)
PCT/JP2022/035608 2021-10-05 2022-09-26 上部電極構造及びプラズマ処理装置 Ceased WO2023058480A1 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
CN202280065772.6A CN118043945A (zh) 2021-10-05 2022-09-26 上部电极构造和等离子体处理装置
JP2023552803A JPWO2023058480A1 (https=) 2021-10-05 2022-09-26
KR1020247013621A KR20240090232A (ko) 2021-10-05 2022-09-26 상부 전극 구조 및 플라즈마 처리 장치
US18/628,269 US20240249907A1 (en) 2021-10-05 2024-04-05 Upper electrode structure and plasma processing apparatus

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021-164043 2021-10-05
JP2021164043 2021-10-05

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US18/628,269 Continuation US20240249907A1 (en) 2021-10-05 2024-04-05 Upper electrode structure and plasma processing apparatus

Publications (1)

Publication Number Publication Date
WO2023058480A1 true WO2023058480A1 (ja) 2023-04-13

Family

ID=85804227

Family Applications (1)

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PCT/JP2022/035608 Ceased WO2023058480A1 (ja) 2021-10-05 2022-09-26 上部電極構造及びプラズマ処理装置

Country Status (6)

Country Link
US (1) US20240249907A1 (https=)
JP (1) JPWO2023058480A1 (https=)
KR (1) KR20240090232A (https=)
CN (1) CN118043945A (https=)
TW (1) TW202333189A (https=)
WO (1) WO2023058480A1 (https=)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2025212306A1 (en) * 2024-04-04 2025-10-09 Lam Research Corporation Gas distribution assembly for semiconductor processing chamber with aluminum nitride layer
WO2025216054A1 (ja) * 2024-04-09 2025-10-16 東京エレクトロン株式会社 プラズマ処理装置

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001085398A (ja) * 1999-09-13 2001-03-30 Kobe Steel Ltd プラズマ処理装置
JP2004538633A (ja) * 2001-08-08 2004-12-24 ラム　リサーチ　コーポレーション 半導体処理反応室用シャワーヘッド電極構造
JP2008205415A (ja) * 2007-02-16 2008-09-04 Creative Technology:Kk 静電チャック
JP2009212340A (ja) * 2008-03-05 2009-09-17 Tokyo Electron Ltd 電極ユニット、基板処理装置及び電極ユニットの温度制御方法
JP2010514160A (ja) * 2006-12-18 2010-04-30 ラム リサーチ コーポレーション 電極寿命の延長のためのガス流れの修正を伴うシャワーヘッド電極組立体
JP2015536043A (ja) * 2012-09-26 2015-12-17 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ 基板処理システムにおける温度制御
JP2020057696A (ja) * 2018-10-02 2020-04-09 東京エレクトロン株式会社 プラズマ処理装置及び静電吸着方法
JP2020115419A (ja) * 2019-01-17 2020-07-30 東京エレクトロン株式会社 上部電極構造、プラズマ処理装置、及び上部電極構造を組み立てる方法

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001085398A (ja) * 1999-09-13 2001-03-30 Kobe Steel Ltd プラズマ処理装置
JP2004538633A (ja) * 2001-08-08 2004-12-24 ラム　リサーチ　コーポレーション 半導体処理反応室用シャワーヘッド電極構造
JP2010514160A (ja) * 2006-12-18 2010-04-30 ラム リサーチ コーポレーション 電極寿命の延長のためのガス流れの修正を伴うシャワーヘッド電極組立体
JP2008205415A (ja) * 2007-02-16 2008-09-04 Creative Technology:Kk 静電チャック
JP2009212340A (ja) * 2008-03-05 2009-09-17 Tokyo Electron Ltd 電極ユニット、基板処理装置及び電極ユニットの温度制御方法
JP2015536043A (ja) * 2012-09-26 2015-12-17 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ 基板処理システムにおける温度制御
JP2020057696A (ja) * 2018-10-02 2020-04-09 東京エレクトロン株式会社 プラズマ処理装置及び静電吸着方法
JP2020115419A (ja) * 2019-01-17 2020-07-30 東京エレクトロン株式会社 上部電極構造、プラズマ処理装置、及び上部電極構造を組み立てる方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2025212306A1 (en) * 2024-04-04 2025-10-09 Lam Research Corporation Gas distribution assembly for semiconductor processing chamber with aluminum nitride layer
WO2025216054A1 (ja) * 2024-04-09 2025-10-16 東京エレクトロン株式会社 プラズマ処理装置

Also Published As

Publication number Publication date
US20240249907A1 (en) 2024-07-25
TW202333189A (zh) 2023-08-16
KR20240090232A (ko) 2024-06-21
JPWO2023058480A1 (https=) 2023-04-13
CN118043945A (zh) 2024-05-14

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