WO2022228237A1 - Base station and surface cleaning system - Google Patents

Base station and surface cleaning system Download PDF

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Publication number
WO2022228237A1
WO2022228237A1 PCT/CN2022/087944 CN2022087944W WO2022228237A1 WO 2022228237 A1 WO2022228237 A1 WO 2022228237A1 CN 2022087944 W CN2022087944 W CN 2022087944W WO 2022228237 A1 WO2022228237 A1 WO 2022228237A1
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WO
WIPO (PCT)
Prior art keywords
base station
cleaning liquid
cover plate
connection interface
casing
Prior art date
Application number
PCT/CN2022/087944
Other languages
French (fr)
Chinese (zh)
Inventor
王珊珊
唐成
段飞
Original Assignee
北京顺造科技有限公司
苏州小顺科技有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 北京顺造科技有限公司, 苏州小顺科技有限公司 filed Critical 北京顺造科技有限公司
Publication of WO2022228237A1 publication Critical patent/WO2022228237A1/en

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Classifications

    • AHUMAN NECESSITIES
    • A47FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47LDOMESTIC WASHING OR CLEANING; SUCTION CLEANERS IN GENERAL
    • A47L11/00Machines for cleaning floors, carpets, furniture, walls, or wall coverings
    • A47L11/40Parts or details of machines not provided for in groups A47L11/02 - A47L11/38, or not restricted to one of these groups, e.g. handles, arrangements of switches, skirts, buffers, levers
    • A47L11/408Means for supplying cleaning or surface treating agents
    • A47L11/4083Liquid supply reservoirs; Preparation of the agents, e.g. mixing devices
    • AHUMAN NECESSITIES
    • A47FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47LDOMESTIC WASHING OR CLEANING; SUCTION CLEANERS IN GENERAL
    • A47L11/00Machines for cleaning floors, carpets, furniture, walls, or wall coverings
    • A47L11/28Floor-scrubbing machines, motor-driven
    • AHUMAN NECESSITIES
    • A47FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47LDOMESTIC WASHING OR CLEANING; SUCTION CLEANERS IN GENERAL
    • A47L11/00Machines for cleaning floors, carpets, furniture, walls, or wall coverings
    • A47L11/40Parts or details of machines not provided for in groups A47L11/02 - A47L11/38, or not restricted to one of these groups, e.g. handles, arrangements of switches, skirts, buffers, levers
    • A47L11/4002Installations of electric equipment
    • AHUMAN NECESSITIES
    • A47FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47LDOMESTIC WASHING OR CLEANING; SUCTION CLEANERS IN GENERAL
    • A47L11/00Machines for cleaning floors, carpets, furniture, walls, or wall coverings
    • A47L11/40Parts or details of machines not provided for in groups A47L11/02 - A47L11/38, or not restricted to one of these groups, e.g. handles, arrangements of switches, skirts, buffers, levers
    • A47L11/4011Regulation of the cleaning machine by electric means; Control systems and remote control systems therefor
    • AHUMAN NECESSITIES
    • A47FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47LDOMESTIC WASHING OR CLEANING; SUCTION CLEANERS IN GENERAL
    • A47L11/00Machines for cleaning floors, carpets, furniture, walls, or wall coverings
    • A47L11/40Parts or details of machines not provided for in groups A47L11/02 - A47L11/38, or not restricted to one of these groups, e.g. handles, arrangements of switches, skirts, buffers, levers
    • A47L11/408Means for supplying cleaning or surface treating agents
    • A47L11/4088Supply pumps; Spraying devices; Supply conduits
    • AHUMAN NECESSITIES
    • A47FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47LDOMESTIC WASHING OR CLEANING; SUCTION CLEANERS IN GENERAL
    • A47L11/00Machines for cleaning floors, carpets, furniture, walls, or wall coverings
    • A47L11/40Parts or details of machines not provided for in groups A47L11/02 - A47L11/38, or not restricted to one of these groups, e.g. handles, arrangements of switches, skirts, buffers, levers
    • A47L11/4091Storing or parking devices, arrangements therefor; Means allowing transport of the machine when it is not being used
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02TCLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO TRANSPORTATION
    • Y02T90/00Enabling technologies or technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02T90/10Technologies relating to charging of electric vehicles
    • Y02T90/14Plug-in electric vehicles

Definitions

  • the present disclosure relates to a base station and a surface cleaning system.
  • Today's surface cleaning units are used to wet clean hard floors or short-pile carpets.
  • the unit typically has one or more brushes or cleaning discs made of woolen material that can be used to scrub stubborn dirt from the floor by adding water or a water/detergent mixture.
  • the dirt that has been wiped off by the roller brush and dissolved by the water or water/detergent mixture is sucked up with the cleaning heads arranged along the moving direction of the roller brush.
  • the cleaning head it is not necessary to set The cleaning head, the dirt is directly absorbed by the cleaning material on the cleaning disc.
  • cleaning is usually done by mixing the cleaning agent and water.
  • the cleaning agent and water are mixed in the clean water tank of the surface cleaning device in a certain proportion to form a cleaning fluid, and then the cleaning fluid is applied to the roller brush or cleaning On the plate, to achieve a relatively good cleaning effect of stubborn stains.
  • a hot steam generating device is installed in the surface cleaning device.
  • the atomizing heating device of the surface cleaning device will replace the water in the clean water tank.
  • the water is steamed, sprayed on the roller brush or cleaning disc, especially the cleaning surface, to soften the stubborn stains, make them detach from the surface, and achieve the purpose of cleaning.
  • the steam of surface cleaning equipment is not easy to control and often consumes a lot.
  • the battery life of the surface cleaning device and the steam implementation process often produce additional steam leakage that the user does not want, which is unfriendly to the experience of ordinary household users.
  • the existing surface cleaning device whether it is an autonomous mobile cleaning device or a hand-held cleaning device, has a limited volume of the clean water tank carried by itself due to the natural limitation of its structure and volume. When there are stains, the clean water needs to be replaced frequently, and the battery life is short, which brings about a decline in experience. Therefore, it has gradually become a trend to set the water storage tank on the base station.
  • the base station is equipped with a water inlet and a charging structure at the same time to charge and replenish water for the surface cleaning equipment, when the surface cleaning equipment is placed on the base station or removed from the base station, the charging structure may be stained with Water stains from the water inlet are prone to short circuits and fire hazards. Therefore, there is a need for a technique that can solve the above-mentioned problems.
  • the present disclosure provides a base station and a surface cleaning system.
  • a base station comprising:
  • the cleaning liquid supply part is used for storing the cleaning liquid
  • the charging structure is used to provide electric power to the surface cleaning equipment docked at the base station, and realize the charging of the surface cleaning equipment;
  • connection interface is connected to the cleaning liquid supply part, when the surface cleaning device is docked at the base station, the cleaning liquid storage part of the surface cleaning device is connected to the connection interface to connect the surface cleaning device
  • the cleaning liquid of the cleaning liquid supply part is transported to the cleaning liquid storage part through the connection interface, or the cleaning liquid in the cleaning liquid storage part is transported to the cleaning liquid supply part through the connection interface;
  • the level where the connection interface is located is lower than the level where the charging structure is located.
  • the charging structure includes a plurality of pins
  • the charging connector of the surface cleaning device is a socket
  • the base station provides power to the surface cleaning device
  • the charging structure includes a plurality of sockets, at least part of the inner surface of the sockets is formed as an electrode
  • the charging connector of the surface cleaning device is a plug
  • the base station provides power to the surface cleaning device when the pins of the surface cleaning device are inserted into the receptacles of the charging structure.
  • the charging structure includes a charging contact
  • the charging connector of the surface cleaning device includes a charging contact
  • the charging contact of the charging structure is brought into contact with the charging connector of the charging connector
  • the base station provides electrical energy to the surface cleaning device; or, the charging structure includes a charging contact pad, and the charging connector of the surface cleaning device includes a charging contact.
  • the charging contact pad of the charging structure is connected The base station provides power to the surface cleaning device upon contact with the charging contacts of the charging connector.
  • the base station according to at least one embodiment of the present disclosure, further comprising:
  • a support assembly which is arranged on the casing of the base station and used to support the connection interface.
  • the support assembly includes:
  • a support plate fixed to the housing of the base station or formed as part of the housing of the base station;
  • the support seat extends upward from the support plate by a predetermined distance, and the middle part of the support seat is hollow, so that the part of the connection interface passes through the support seat and is connected to the second pipeline .
  • connection interface includes:
  • main body part is hollow
  • the base part is arranged at the lower end of the main body part and is used to close the lower end of the main body part;
  • the flange portion is provided on the upper end of the main body portion, and at least a part of the outer edge of the flange portion is supported on the upper end of the support seat;
  • connection joint which is arranged on the base part and located below the base part, so as to be connected to the second pipeline through the connection joint, so that the connection interface is communicated with the cleaning liquid supply part.
  • connection interface further includes:
  • resisting piece one end of the resisting piece is disposed on the base part and located above the base part, and the upper end of the resisting piece is spaced from the base part by a preset distance.
  • the cross-section of the interference member is cross-shaped.
  • the upper end of the flange portion is inclined upward in a direction away from the housing of the base station.
  • the base station according to at least one embodiment of the present disclosure, further comprising:
  • a cover plate movable between a first position and a second position, wherein when the cover plate is in the first position, the cover plate covers the connection interface, and when the cover plate is in the first position When in the second position, the connection interface is exposed.
  • the charging structure is disposed on a casing of the base station above the cover plate, or disposed on the cover plate.
  • the cover plate when an external force is applied to the cover plate, the cover plate moves from the first position to the second position, and when the external force disappears, the cover plate moves from the second position to the first position.
  • one end of the cover plate is rotatably connected to the housing of the base station, and the cover plate can swing between the first position and the second position.
  • one end of the cover plate connected to the casing of the base station is located inside the casing of the base station, and the casing of the base station is provided with a through hole, and when the cover plate moves to In the first position, the lower end of the cover plate passes through the casing of the base station, is located outside the casing of the base station, and covers the connection interface; when the cover plate moves to the second position, the cover At least a portion of the board is located within the housing of the base station.
  • the cover plate is slidably provided to the housing of the base station, and the cover plate is movable between the first position and the second position.
  • a limiting portion is formed on the flange portion of the connection interface, and when the cover plate is in the first position, the limiting portion and the surface of the cover plate At least a part of the cover plate is in contact, so that further movement of the cover plate is restricted by the limiting portion.
  • the limiting portion is formed at a portion of the flange that is remote from the housing of the base station.
  • the upper surface of the cover plate when the cover plate is located at the first position, is formed as a first inclined surface, wherein the first inclined surface is away from the base station along the The direction of the housing slopes downward.
  • a portion of the cover plate away from the housing of the base station is formed as a second inclined surface, wherein the second inclined surface An angle is formed between it and the horizontal plane.
  • a part of the connection interface away from the casing of the base station is formed as a third inclined surface, wherein an included angle is formed between the third inclined surface and the horizontal plane.
  • connection interface when the connection interface is supported by a support assembly, a portion of the support assembly away from the housing of the base station is formed as a fourth inclined surface, wherein the fourth inclined surface is connected to a horizontal plane An included angle is formed therebetween, so that the cleaning liquid flows downward along the first inclined surface, the second inclined surface, the third inclined surface and/or the fourth inclined surface.
  • an upper surface of the support plate is formed as an inclined surface, wherein the upper surface of the support plate is inclined downward in a direction away from a housing of the base station to prevent cleaning liquid Build up on the upper surface of the support plate.
  • the angle between the upper surface of the support plate and the horizontal plane is 10-20°.
  • the front surface of the support plate is formed as an inclined surface, wherein the front surface of the support plate is inclined downward in a direction approaching the housing of the base station, so that the cleaning liquid Drop directly into the tray from the upper surface of the support plate.
  • the angle between the front surface of the support plate and the vertical plane is 10-20°
  • a water collecting tank is provided near the lower edge of the front surface of the support plate.
  • a surface cleaning system including the above-mentioned base station.
  • a surface cleaning system according to at least one embodiment of the present disclosure, further comprising:
  • a surface cleaning device comprising a cleaning liquid storage part, so as to realize the connection between the cleaning liquid storage part and the cleaning liquid supply part when the cleaning liquid storage part and the cleaning liquid supply part are communicated through a connection interface fluid interaction.
  • the surface cleaning apparatus further includes:
  • the charging connector cooperates with the charging structure, so that the base station provides power to the surface cleaning device.
  • the surface cleaning apparatus further includes:
  • a joint assembly is connected to the cleaning liquid storage part so that when the joint assembly is inserted into the connection interface, there is communication between the cleaning liquid storage part and the cleaning liquid supply part.
  • the joint assembly includes:
  • the lower casing is formed with a pipeline for the passage of the cleaning liquid
  • the upper casing is connected to the lower casing, and the upper casing is formed with a pipeline for the passage of cleaning liquid;
  • valve assembly is disposed in the lower casing and can move in the direction of the pipeline of the lower casing, so that when the valve assembly is in the first position, the valve assembly closes the lower casing When the valve assembly is in the second position, the valve assembly opens the pipeline of the lower casing for the passage of the cleaning liquid.
  • the lower housing includes:
  • the insertion part when the connector assembly is connected to the connection interface, at least part of the insertion part is inserted into the connection interface.
  • the lower housing further includes:
  • the lower connection part is connected to the insertion part, and a mounting part for fixing the lower connection part is formed on the lower connection part.
  • a protrusion extending toward the interior of the lower case is formed on the inner wall of the lower case, wherein the protrusion is formed with a through hole; the valve The assembly slides along the inner wall of the through hole.
  • the valve assembly includes:
  • the guide rod is slidably disposed on the protruding part, and both ends of the guide rod are located on both sides of the protruding part;
  • the plug is arranged at one end of the guide rod close to the upper casing, and when the valve assembly is in the first position, the plug is in sealing contact with the inner wall surface of the lower casing to seal The pipeline of the lower casing for the passage of cleaning liquid; when the valve assembly is in the second position, the plug is spaced from the inner wall surface of the lower casing at a certain distance, so as to open the lower casing used to clean the lines through which the liquid passes.
  • the inner diameter of the lower connection part is larger than the inner diameter of the insertion part
  • the diameter of at least part of the plug is larger than the inner diameter of the insertion part, so that when the outer diameter of the plug is larger than the inner diameter of the insertion part
  • the pipeline for the cleaning liquid to pass through the lower casing is closed; when the outer wall surface of the plug is separated from the inner wall surface of the insertion part, the pipeline is opened.
  • the pipes of the lower casing for the passage of cleaning liquids.
  • an end of the guide rod away from the upper casing is formed with a shaft shoulder, one end of the spring is disposed on the shaft shoulder, and the other end is disposed on the protruding portion, and the The spring is in a pre-compressed state, so that the joint assembly is in a normally closed state by the elastic force of the spring.
  • the plug is formed in an inverted cone shape.
  • the upper housing includes:
  • an upper connecting pipe one end of the upper connecting pipe is disposed on the upper connecting part, so that the cleaning liquid storage part is connected to the cleaning liquid supply part by connecting the upper connecting pipe to the cleaning liquid storage part.
  • FIG. 1 is one of schematic structural diagrams of a base station according to an embodiment of the present disclosure.
  • FIG. 2 is a second schematic structural diagram of a base station according to an embodiment of the present disclosure.
  • FIG. 3 is a third schematic structural diagram of a base station according to an embodiment of the present disclosure.
  • FIG. 4 is a fourth schematic structural diagram of a base station according to an embodiment of the present disclosure.
  • FIG. 5 is a fifth schematic structural diagram of a base station according to an embodiment of the present disclosure.
  • FIG. 6 is a sixth schematic structural diagram of a base station according to an embodiment of the present disclosure.
  • FIG. 7 is a schematic structural diagram of a support assembly according to an embodiment of the present disclosure.
  • FIG. 8 is a schematic structural diagram of a connection interface according to an embodiment of the present disclosure.
  • FIG. 9 is another perspective structural diagram of a connection interface according to an embodiment of the present disclosure.
  • FIG. 10 is a schematic structural diagram of a cover plate according to an embodiment of the present disclosure.
  • FIG. 11 is a schematic structural diagram of a lower end cap and a valve assembly according to an embodiment of the present disclosure.
  • FIG. 12 is a schematic structural diagram of a surface cleaning system according to an embodiment of the present disclosure.
  • FIG. 13 is a schematic structural diagram of a surface cleaning apparatus according to an embodiment of the present disclosure.
  • 14 and 15 are schematic structural diagrams of a joint assembly according to an embodiment of the present disclosure.
  • FIG. 16 is a schematic structural diagram of a base station according to another embodiment of the present disclosure.
  • cross-hatching and/or hatching in the drawings is generally used to clarify boundaries between adjacent components. As such, unless stated, the presence or absence of cross-hatching or shading does not convey or represent any particular material, material properties, dimensions, proportions, commonalities between the illustrated components and/or any other characteristics of the components, any preferences or requirements for attributes, properties, etc. Furthermore, in the drawings, the size and relative sizes of components may be exaggerated for clarity and/or descriptive purposes. When example embodiments may be implemented differently, the specific process sequence may be performed in a different order than described. For example, two consecutively described processes may be performed substantially concurrently or in the reverse order of that described. In addition, the same reference numerals denote the same components.
  • connection When an element is referred to as being “on” or “over”, “connected to” or “coupled to” another element, it can be directly on, directly connected to, or directly on the other element Incorporated into another component, or intermediate components may be present. However, when an element is referred to as being “directly on,” “directly connected to,” or “directly coupled to” another element, there are no intervening elements present. To this end, the term “connected” may refer to a physical connection, electrical connection, etc., with or without intervening components.
  • the present disclosure may use terms such as “under”, “under”, “under”, “under”, “above”, “on”, “at” Spatially relative terms such as “above,” “higher,” and “side (eg, as in “sidewall”)” to describe one element to another (other) element as shown in the figures Relationship.
  • spatially relative terms are intended to encompass different orientations of the device in use, operation, and/or manufacture. For example, if the device in the figures is turned over, elements described as “below” or “beneath” other elements or features would then be oriented “above” the other elements or features.
  • the exemplary term “under” can encompass both an orientation of "above” and “below.”
  • the device may be otherwise oriented (eg, rotated 90 degrees or at other orientations) and, as such, the spatially relative descriptors used herein should be interpreted accordingly.
  • FIG. 1 is one of schematic structural diagrams of a base station according to an embodiment of the present disclosure.
  • FIG. 2 is a second schematic structural diagram of a base station according to an embodiment of the present disclosure.
  • FIG. 3 is a third schematic structural diagram of a base station according to an embodiment of the present disclosure.
  • FIG. 4 is a fourth schematic structural diagram of a base station according to an embodiment of the present disclosure.
  • FIG. 5 is a fifth schematic structural diagram of a base station according to an embodiment of the present disclosure.
  • FIG. 6 is a sixth schematic structural diagram of a base station according to an embodiment of the present disclosure.
  • a base station 100 which includes:
  • the cleaning liquid supply part 151 is used for storing the cleaning liquid
  • the charging structure 160 is used to provide electric power to the surface cleaning device 200 docked at the base station 100, and realize the charging of the surface cleaning device 200;
  • connection interface 170 is connected to the cleaning liquid supply part 151.
  • the cleaning liquid storage part of the surface cleaning device 200 is connected to the connection interface 170 to clean the cleaning liquid supply part 151.
  • the liquid is delivered to the cleaning liquid storage part through the connection interface 170, or the cleaning liquid in the cleaning liquid storage part is delivered to the cleaning liquid supply part 151 through the connection interface 170;
  • the level where the connection interface 170 is located is lower than the level where the charging structure 160 is located.
  • the base station 100 of the present disclosure separates the charging structure 160 and the connection interface 170 in height, which effectively prevents the surface cleaning device 200 from being charged when the base station 100 is placed on the base station 100 to replenish cleaning liquid and/or charge, or when the surface cleaning device 200 is removed from the base station.
  • the structure may get wet with cleaning liquid from the connection interface 170, or the cleaning liquid may splash on the charging structure, resulting in problems of short circuit and fire hazard.
  • the charging structure 160 includes a plurality of pins, and the charging connector of the surface cleaning device 200 is a jack.
  • the base station 100 sends the surface cleaning device 200 Electrical energy is supplied, and at this time, at least part of the inner surface of the socket is formed as an electrode.
  • the charging structure 160 includes a plurality of sockets, at least part of the inner surfaces of the sockets are formed as electrodes, and the charging connectors of the surface cleaning device 200 are pins. When the pins of the surface cleaning device 200 are inserted into the charging The base station 100 provides power to the surface cleaning device 200 while in the receptacle of the structure 160 .
  • the charging structure 160 includes charging contacts
  • the charging connector of the surface cleaning device 200 includes charging contacts.
  • the base station 100 cleans the surface.
  • Device 200 provides electrical power.
  • the charging structure 160 includes a charging contact
  • the charging connector of the surface cleaning device 200 includes a charging contact.
  • the charging structure 160 is provided on the housing 165 of the base station 100 , and more preferably, the charging structure 160 is provided on a vertical portion of the housing 165 of the base station 100 .
  • the charging structure 160 is disposed on the casing of the base station above the cover plate 190 , or is disposed on the cover plate 190 .
  • the base station 100 further includes:
  • the support assembly 180 is disposed on the housing 165 of the base station 100 for supporting the connection interface 170 .
  • the support assembly 180 includes:
  • a support plate 181 that is fixed to the housing 165 of the base station 100 or formed as part of the housing 165 of the base station 100;
  • the support base 182 extends upwards from the support plate 181 by a predetermined distance, and the middle of the support base 182 is hollow, so that part of the connection interface 170 passes through the support base 182 and is connected to the second pipeline 1072 .
  • the upper surface 180 a of the support assembly 180 is formed with an inclination toward the tray part 102 to guide the residual liquid on the tray part 102 .
  • an inclination is formed on the front surface 180b of the support assembly 180 connected to the upper surface 180a, and the inclination is formed from the lower edge of the front surface 180b to the upper edge of the front surface 180b, so that the front surface 180b is formed on the front surface 180b. 180b tends to be inclined toward the tray portion 102.
  • the front surface of the support plate 181 is formed as an inclined surface, wherein the front surface of the support plate 181 is inclined downward in a direction approaching the housing of the base station so that the cleaning liquid directly falls from the upper surface of the support plate into the tray part.
  • the included angle between the front surface of the support plate and the vertical plane is 10-20°.
  • a water collecting groove 180c is provided at a position adjacent to the lower edge of the front surface 180b to receive water along the front surface 180b Some residual water that flows down.
  • connection interface 170 includes:
  • the main body part 171, the main body part 171 is hollow;
  • the base part 172 is arranged at the lower end of the main body part 171, and is used for closing the lower end of the main body part 171;
  • the flange portion 173 is disposed on the upper end of the main body portion 171, and at least a portion of the outer edge of the flange portion 173 is supported on the upper end of the support seat 182;
  • connection joint 174 is disposed on the base portion 172 and located below the base portion 172 to be connected to the second pipeline 1072 through the connection joint 174 , so that the connection interface 170 communicates with the cleaning liquid supply portion 151 .
  • connection interface 170 further includes:
  • the interference piece 175, one end of the interference piece 175 is disposed on the base portion 172, and is located above the base portion 172, and the upper end of the interference piece 175 is spaced from the base portion 172 by a predetermined distance; more preferably, the cross-section of the interference piece 175 is cross-shaped .
  • the upper end of the flange portion 173 is inclined upward along the direction away from the housing 165 of the base station 100 ;
  • the base station 100 further includes:
  • the cover plate 190 is movable between a first position and a second position, wherein when the cover plate 190 is in the first position, the cover plate 190 covers the connection interface 170, and when the cover plate 190 is in the second position, The connection interface 170 is exposed.
  • the cover plate 190 moves from the first position to the second position, and when the external force disappears, the cover plate 190 moves from the second position to the first position, wherein when the cover plate 190 When moving from the second position to the first position, the gravity of the cover plate 190 can be used, or the restoring force provided by the spring can be used.
  • one end of the cover plate 190 is rotatably connected to the housing 165 of the base station 100, and the cover plate 190 can swing between the first position and the second position.
  • One end of the cover plate 190 connected to the casing 165 of the base station 100 is located inside the casing 165 of the base station 100.
  • the casing 165 of the base station 100 is provided with a through hole.
  • the casing 165 of the base station 100 is located outside the casing 165 of the base station 100 and covers the connection interface 170 ; when the cover plate 190 moves to the second position, at least part of the cover plate 190 is located in the casing 165 of the base station 100 .
  • the cover plate 190 is slidably disposed on the housing of the base station 100, and the cover plate 190 can move between the first position and the second position.
  • FIG. 8 is a schematic structural diagram of a connection interface according to an embodiment of the present disclosure.
  • FIG. 9 is another perspective structural diagram of a connection interface according to an embodiment of the present disclosure.
  • a limiting portion 1731 is formed on the flange portion 173 of the connection interface 170 .
  • the limiting portion 1731 is in contact with at least a part of the surface of the cover plate 190 to Further movement of the cover plate 190 is restricted by the limiting portion 1731 .
  • the limiting portion 1731 is formed at a portion of the flange that is far away from the housing 165 of the base station 100 .
  • FIG. 10 is a schematic structural diagram of a cover plate according to an embodiment of the present disclosure.
  • the upper surface of the cover plate 190 is formed as a first inclined surface 1901 , wherein the first inclined surface 1901 extends away from the base station along the The housing 165 of 100 is oriented downwardly.
  • the cover plate 190 When the cover plate 190 is in the first position, the part of the cover plate 190 away from the housing 165 of the base station 100 is formed as a second inclined surface 1902 , wherein an included angle is formed between the second inclined surface 1902 and the horizontal plane.
  • the included angle between the second inclined surface 1902 and the horizontal plane may be 90°, that is, the second inclined surface 1902 may be disposed vertically.
  • the part of the connection interface 170 away from the housing 165 of the base station 100 is formed as a third inclined surface 176 , wherein an included angle is formed between the third inclined surface 176 and the horizontal plane.
  • the included angle formed between the third inclined surface 176 and the horizontal plane may also be 90°, that is, the third inclined surface 176 may be arranged vertically.
  • connection interface 170 when the connection interface 170 is supported by the support assembly 180, the part of the support assembly 180 away from the housing 165 of the base station 100 is formed as a fourth inclined surface 183, wherein an included angle is formed between the fourth inclined surface 183 and the horizontal surface, so that the The cleaning liquid flows downward along the first inclined surface, the second inclined surface, the third inclined surface and/or the fourth inclined surface.
  • the first inclined surface is formed with the first water guiding surface, and the second inclined surface, the third inclined surface and/or the fourth inclined surface together form the second water guiding surface, so as to disperse water droplets through the first water guiding surface and the second water guiding surface Quickly guide away from the position of the charging structure.
  • FIG. 7 is a schematic structural diagram of a support assembly according to an embodiment of the present disclosure.
  • the upper surface of the support plate 181 is formed as an inclined surface, wherein the upper surface of the support plate 181 is inclined downward in a direction away from the housing of the base station 100 to prevent the cleaning liquid from Accumulation on the upper surface of the support plate 181 , especially the accumulation of water, may lead to evaporation of water vapor in some special cases, so there is also a risk of short circuit. More preferably, the angle between the upper surface of the support plate 181 and the horizontal plane is 10-20°.
  • the base station of the present disclosure may further include: a base 101, the base 101 may be a cavity structure, a tray portion 102 may be provided on the base 101, and two main rolling wheel positioning seats 1021 may be provided on the tray portion 102 , and two auxiliary rolling wheel positioning seats 1022, those skilled in the art can adjust the number and structure of the main rolling wheel positioning seats 1021 based on the specific rolling wheel form of the surface cleaning equipment, and adjust the number and structure of the auxiliary rolling wheel positioning seats 1022.
  • the structure is adjusted, and for the surface cleaning equipment without the auxiliary scroll wheel, the base station 100 can adaptively only have the main scroll wheel positioning seat 1021 .
  • the tray part 102 of the base station 100 is also preferably formed with a cleaning groove 1023.
  • the shape of the cleaning groove 1023 can be adapted to the shape of the roller brush of the surface cleaning device.
  • the roller of the surface cleaning device A brush can be placed in the cleaning tank 1023.
  • the tray part 102 is detachably connected with the base 101 .
  • the base 101 of the base station 100 is a cavity structure, and an air supply device is arranged in the cavity structure of the base 101 (the air supply device may have a heating component to provide hot air), and the base 101 is formed with an air supply device.
  • the base air outlet 1011 and the base air intake portion 1012, correspondingly, the tray portion 102 is provided with a tray air outlet 1024 at the corresponding position of the base air outlet 1011, so that the airflow output by the air supply device can pass through the base air outlet 1011. and the tray air outlet 1024 are applied to the roller brush and other components of the surface cleaning device placed in the cleaning tank 1023 to dry the roller brush and other components.
  • the base air intake portion 1012 can be disposed at a suitable position of the base 101, and the number thereof can be one or more than two.
  • the susceptor air intake 1012 may be in porous form.
  • the base 101 may have a substantially square shape or other suitable shapes.
  • the base station 100 has a housing 165, the housing 165 is fixedly connected with one end of the base 101, and the housing 165 has an extended dimension along the vertical direction.
  • the base station 100 may further be provided with a storage box 103 , and both the storage box 103 and the cleaning liquid supply part 151 are supported and held by the housing 165 , and the storage box 103 may have an openable box door.
  • the storage box 103 and the cleaning liquid supply part 151 are both cylindrical structures, and those skilled in the art can also adjust the shapes of the storage box 103 and the cleaning liquid supply part 151 .
  • a liquid addition part 1511 may be provided on the top of the cleaning liquid supply part 151 , and the liquid addition part 1511 may be in the form of a liquid addition cap and a liquid addition port.
  • the cleaning liquid supply part 151 may also be provided with a handle part 1512 , and the cleaning liquid supply part 151 and the housing 165 are detachably connected.
  • FIG. 11 is a schematic structural diagram of a lower end cap and a valve assembly according to an embodiment of the present disclosure.
  • the base station 100 further has a two-way pump device, a first pipeline 1071, a second pipeline 1072 and a heating device 106, and the two-way pump device is connected between the valve assembly 153 and the first pipeline.
  • the second end of the first pipeline 1071 is connected to the heating device 106 , and the heating device 106 is connected to the second end of the first pipeline 1071 and the first end of the second pipeline 1072 In between, the second end of the second pipeline 1072 is connected to the above-mentioned connection interface, so that the liquid in the cleaning liquid supply part 151 passes through the valve assembly 153, the two-way pump device, the first pipeline 1071, the heating device 106, and the second pipeline in sequence. Road 1072, the connection interface is supplied to the surface cleaning device.
  • the cleaning liquid supply part 151 is provided on the housing 165 through the lower end cover 152 , and the valve assembly 153 is provided in the lower end cover 152 .
  • the cleaning liquid supply part 151 can be removed from the lower end cap 152 .
  • FIG. 12 is a schematic structural diagram of a surface cleaning system according to an embodiment of the present disclosure.
  • a surface cleaning system which includes the base station 100 described above.
  • the surface cleaning system also includes:
  • the surface cleaning apparatus 200 includes a cleaning liquid storage portion to achieve fluid interaction between the cleaning liquid storage portion and the cleaning liquid supply portion 151 when the cleaning liquid storage portion and the cleaning liquid supply portion 151 are communicated through the connection interface 170 .
  • the surface cleaning apparatus 200 further includes:
  • a charging connector (not shown in the figure), the charging connector cooperates with the charging structure 160 so that the base station 100 provides power to the surface cleaning device 200 .
  • 13 is a schematic structural diagram of a surface cleaning apparatus according to an embodiment of the present disclosure.
  • 14 and 15 are schematic structural diagrams of a joint assembly according to an embodiment of the present disclosure.
  • the surface cleaning apparatus 200 further includes:
  • the joint assembly 210 is connected to the cleaning liquid storage part so that when the joint assembly 210 is inserted into the connection interface 170 , there is communication between the cleaning liquid storage part and the cleaning liquid supply part 151 .
  • joint assembly 210 includes:
  • the lower casing 2101, the lower casing 2101 is formed with a pipeline for the passage of the cleaning liquid;
  • the upper case 2102 is connected to the lower case 2101, and the upper case 2102 is formed with a pipeline for the passage of cleaning liquid;
  • valve assembly 2103 the valve assembly 2103 is arranged in the lower casing 2101, and can move along the direction of the pipeline of the lower casing 2101, so that when the valve assembly 2103 is in the first position, the valve assembly 2103 closes the function of the lower casing 2101. For the pipeline through which the cleaning liquid passes, when the valve assembly 2103 is in the second position, the valve assembly 2103 opens the pipeline for the cleaning liquid to pass through the lower housing 2101 .
  • the lower case 2101 includes:
  • the insertion portion 21011 when the connector assembly 210 is connected to the connection interface 170 , at least part of the insertion portion 21011 is inserted into the connection interface 170 .
  • the lower casing 2101 also includes:
  • the lower connecting portion 21012 is connected to the inserting portion 21011, and a mounting portion for fixing the lower connecting portion 21012 is formed on the lower connecting portion 21012.
  • a protruding portion 21013 extending inside the lower housing 2101 is formed on the inner wall of the lower housing 2101 , wherein the protruding portion 21013 is formed with a through hole; the valve assembly 2103 slides along the inner wall surface of the through hole.
  • valve assembly 2103 includes:
  • the guide rod 21031 is slidably disposed on the protruding part 21013, and both ends of the guide rod 21031 are located on both sides of the protruding part 21013;
  • the plug 21032 is arranged at one end of the guide rod 21031 close to the upper casing 2102, and when the valve assembly 2103 is in the first position, the plug 21032 is in sealing contact with the inner wall surface of the lower casing 2101 to close the lower casing 2101 for the passage of the cleaning liquid; when the valve assembly 2103 is in the second position, the plug 21032 is spaced a certain distance from the inner wall surface of the lower casing 2101 to open the passage of the lower casing 2101 for the passage of the cleaning liquid road.
  • the inner diameter of the lower connecting part 21012 is larger than the inner diameter of the insertion part 21011, and at least part of the plug 21032 has a diameter larger than the inner diameter of the insertion part 21011, so that when the outer wall surface of the plug 21032 contacts with the inner wall surface of the insertion part 21011, it closes the The pipeline of the lower casing 2101 for the passage of the cleaning liquid; when the outer wall surface of the plug 21032 is separated from the inner wall of the insertion portion 21011, the pipeline for the passage of the cleaning liquid of the lower casing 2101 is opened.
  • one end of the guide rod 21031 away from the upper casing 2102 is formed with a shaft shoulder, one end of the spring 2104 is arranged on the shaft shoulder, and the other end is arranged on the protruding part 21013 , and the spring 2104 is in a pre-compressed state to pass the elastic force of the spring 2104
  • the joint assembly 210 is made to be in a normally closed state.
  • the plug 21032 is formed in an inverted tapered shape.
  • the joint assembly 210 further includes a sealing member 2105, which is disposed on the outside of the insertion portion 21011 of the lower housing, so as to form a seal between the joint assembly 210 and the connection interface.
  • the upper housing 2102 includes:
  • the upper connecting pipe 21022 one end of the upper connecting pipe 21022 is disposed on the upper connecting part 21021, so that the cleaning liquid storage part is connected to the cleaning liquid supply part 151 by connecting the upper connecting pipe 21022 to the cleaning liquid storage part.
  • FIG. 16 is a schematic structural diagram of a base station according to another embodiment of the present disclosure.
  • the difference between the base station and the above-mentioned embodiment is that the charging structure 160 is disposed on the cover plate 190 to provide electric power to the surface cleaning device through the charging structure 160 .
  • the first inclined surface 1901 and the second inclined surface 1902 of the cover plate 190 are formed as continuous arc surfaces, and the charging structure 160 protrudes from the continuous arc surfaces.
  • the charging structure 160 may protrude from the first inclined surface 1901 or protrude from the second inclined surface 1902 .
  • references to the terms “one embodiment/mode”, “some embodiments/modes”, “example”, “specific example”, or “some examples”, etc. are intended to be combined with the description of the embodiment/mode
  • a particular feature, structure, material, or characteristic described by way of example or example is included in at least one embodiment/mode or example of the present application.
  • schematic representations of the above terms are not necessarily directed to the same embodiment/mode or example.
  • the particular features, structures, materials or characteristics described may be combined in any suitable manner in any one or more embodiments/means or examples.
  • those skilled in the art may combine and combine the different embodiments/modes or examples described in this specification and the features of the different embodiments/modes or examples without conflicting each other.
  • first and second are only used for descriptive purposes, and should not be construed as indicating or implying relative importance or implying the number of indicated technical features. Thus, a feature delimited with “first”, “second” may expressly or implicitly include at least one of that feature.
  • plurality means at least two, such as two, three, etc., unless expressly and specifically defined otherwise.

Landscapes

  • Cleaning By Liquid Or Steam (AREA)
  • Charge And Discharge Circuits For Batteries Or The Like (AREA)
  • Cleaning In General (AREA)
  • Electric Vacuum Cleaner (AREA)

Abstract

A base station (100), comprising: a cleaning liquid supply portion (151), the cleaning liquid supply portion (151) being used for storing a cleaning liquid; a charging structure (160), the charging structure (160) being used for providing electric energy to a surface cleaning apparatus (200) docked on the base station (100), and charging the surface cleaning apparatus (200); and a connection interface (170), the connection interface (170) being connected to the cleaning liquid supply portion (151). When the surface cleaning apparatus (200) is docked on the base station (100), a cleaning liquid storage portion of the surface cleaning apparatus (200) is connected to the connection interface (170), such that the cleaning liquid in the cleaning liquid supply portion (151) is conveyed to the cleaning liquid storage portion through the connection interface (170), or the cleaning liquid in the cleaning liquid storage portion is conveyed to the cleaning liquid supply portion (151) through the connection interface (170); and the position where the connection interface (170) is located is lower than the position where the charging structure (160) is located.

Description

基站及表面清洁系统Base station and surface cleaning system 技术领域technical field
本公开涉及一种基站及表面清洁系统。The present disclosure relates to a base station and a surface cleaning system.
背景技术Background technique
当今的表面清洁装置用于湿清洁硬地板或短毛地毯。该装置通常具有一个或多个由毛织材料制成的滚刷或清洁盘,它们可以通过添加水或水/清洁剂混合物来擦洗地板上的顽固污垢。Today's surface cleaning units are used to wet clean hard floors or short-pile carpets. The unit typically has one or more brushes or cleaning discs made of woolen material that can be used to scrub stubborn dirt from the floor by adding water or a water/detergent mixture.
当机器在污垢上移动时,已经被滚刷擦掉并被水或水/洗涤剂混合物溶解的污垢用沿滚刷运动方向排列的清洁头吸起,在设置清洁盘的技术中,可以不设置清洁头,污垢直接被清洁盘上的清洁材料吸附。When the machine moves on the dirt, the dirt that has been wiped off by the roller brush and dissolved by the water or water/detergent mixture is sucked up with the cleaning heads arranged along the moving direction of the roller brush. In the technique of setting the cleaning disc, it is not necessary to set The cleaning head, the dirt is directly absorbed by the cleaning material on the cleaning disc.
但是,顽固的污渍通常难以清理,奶渍、果汁和酱汁等,散落在地板表面,水分蒸发后,则会在清洁表面形成难以祛除的顽固污渍。通常,在擦洗过程中,并非所有这些顽固的污垢都可以通过吸尘来清除,因此其中一些残留在地板上,从而降低了清洁质量。However, stubborn stains are often difficult to remove. Milk stains, juices and sauces, etc., are scattered on the surface of the floor. After the water evaporates, it will form stubborn stains on the cleaning surface that are difficult to remove. Often, not all of this stubborn dirt can be removed by vacuuming during the scrubbing process, so some of it remains on the floor, reducing the quality of the cleaning.
为了提高清洁质量,通常使用清洁剂和水混合的方式来清理,按照一定比例将清洁剂和水在表面清洁装置的清水箱内混合,形成清洁流体,然后将该清洁流体施加到滚刷或清洁盘上,达到较为良好的顽固污渍的清洁效果。但这意味着清洁剂比例的控制,还必须专门地执行该清洁剂的清洁过程,并且并不是清洁表面的每一处都需要施加这种清洁剂,以实现最佳的清洁质量和卫生状况,这导致增加的时间花费和额外的成本。In order to improve the cleaning quality, cleaning is usually done by mixing the cleaning agent and water. The cleaning agent and water are mixed in the clean water tank of the surface cleaning device in a certain proportion to form a cleaning fluid, and then the cleaning fluid is applied to the roller brush or cleaning On the plate, to achieve a relatively good cleaning effect of stubborn stains. However, this means that the proportion of the cleaning agent is controlled, and the cleaning process of this cleaning agent must also be carried out exclusively, and this cleaning agent is not required to be applied to every part of the cleaned surface in order to achieve the best cleaning quality and hygiene. This results in increased time spent and additional costs.
另一种方式就是实施蒸汽处理,表面清洁装置中设置了热蒸汽发生装置,在清洁特定的顽固污渍表面的时候,通过控制信号的输入,表面清洁装置的雾化加热装置,将清水箱中的水进行蒸汽处理,喷洒到滚刷或清洁盘,特别是清洁表面,以软化该顽固的污渍,使其脱离表面,达到清洁目的,但是,表面清洁设备的蒸汽不容易控制,往往会极大消耗表面清洁装置的续航能力,并且蒸汽实施的过程中,往往会产生用户不希望的额外蒸汽外泄,这对于普通家庭的用户是体验并不友好。Another way is to implement steam treatment. A hot steam generating device is installed in the surface cleaning device. When cleaning a specific surface with stubborn stains, through the input of a control signal, the atomizing heating device of the surface cleaning device will replace the water in the clean water tank. The water is steamed, sprayed on the roller brush or cleaning disc, especially the cleaning surface, to soften the stubborn stains, make them detach from the surface, and achieve the purpose of cleaning. However, the steam of surface cleaning equipment is not easy to control and often consumes a lot. The battery life of the surface cleaning device and the steam implementation process often produce additional steam leakage that the user does not want, which is unfriendly to the experience of ordinary household users.
现有的表面清洁装置,无论是自主移动式清洁装置还是手持式清洁装置,由于其结构和体积的天然限制,自身携带的清水箱体积有限,在清洁大面积的情况,特别是带有上述的污渍时候,需要频繁更换清水,续航较短,这带来了体验上的下降,因此,将储水箱设置在基站上逐渐成为一种趋势。The existing surface cleaning device, whether it is an autonomous mobile cleaning device or a hand-held cleaning device, has a limited volume of the clean water tank carried by itself due to the natural limitation of its structure and volume. When there are stains, the clean water needs to be replaced frequently, and the battery life is short, which brings about a decline in experience. Therefore, it has gradually become a trend to set the water storage tank on the base station.
但是,当储水箱设置于基站时,由于基站同时设置接水口和充电结构,以给表面清洁设备充电和补水,因此表面清洁设备放置于基站或者从基站上取下时,充电结构可能会沾到来自于接水口的水渍,容易产生短路和着火隐患。因此需要一种能解决上述问题的技术。However, when the water storage tank is installed at the base station, since the base station is equipped with a water inlet and a charging structure at the same time to charge and replenish water for the surface cleaning equipment, when the surface cleaning equipment is placed on the base station or removed from the base station, the charging structure may be stained with Water stains from the water inlet are prone to short circuits and fire hazards. Therefore, there is a need for a technique that can solve the above-mentioned problems.
发明内容SUMMARY OF THE INVENTION
为了解决上述技术问题之一,本公开提供了一种基站及表面清洁系统。In order to solve one of the above technical problems, the present disclosure provides a base station and a surface cleaning system.
根据本公开的一个方面,提供了一种基站,其包括:According to one aspect of the present disclosure, there is provided a base station, comprising:
清洁液体供给部,所述清洁液体供给部用于存储清洁液体;a cleaning liquid supply part, the cleaning liquid supply part is used for storing the cleaning liquid;
充电结构,所述充电结构用于向停靠于所述基站的表面清洁设备提供电能,并实现所述表面清洁设备的充电;以及a charging structure, the charging structure is used to provide electric power to the surface cleaning equipment docked at the base station, and realize the charging of the surface cleaning equipment; and
连接接口,所述连接接口连接至所述清洁液体供给部,当所述表面清洁设备停靠于所述基站时,所述表面清洁设备的清洁液体存储部连接于所述连接接口,以将所述清洁液体供给部的清洁液体通过所述连接接口输送至所述清洁液体存储部,或者将所述清洁液体存储部内的清洁液体通过所述连接接口输送至所述清洁液体供给部;a connection interface, the connection interface is connected to the cleaning liquid supply part, when the surface cleaning device is docked at the base station, the cleaning liquid storage part of the surface cleaning device is connected to the connection interface to connect the surface cleaning device The cleaning liquid of the cleaning liquid supply part is transported to the cleaning liquid storage part through the connection interface, or the cleaning liquid in the cleaning liquid storage part is transported to the cleaning liquid supply part through the connection interface;
其中,所述连接接口所处的位置所在水平面低于充电结构所处的位置所在水平面。Wherein, the level where the connection interface is located is lower than the level where the charging structure is located.
根据本公开的至少一个实施方式的基站,所述充电结构包括多个插针,所述表面清洁设备的充电接头为插孔,当将所述充电结构的插针插入所述充电接头的插孔内时,所述基站向所述表面清洁设备提供电能,或者,所述充电结构包括多个插孔,所述插孔的至少部分内表面形成为电极,所述表面清洁设备的充电接头为插针,当将所述表面清洁设备的插针插入于所述充电结构的插孔内时,所述基站 向所述表面清洁设备提供电能。According to the base station of at least one embodiment of the present disclosure, the charging structure includes a plurality of pins, the charging connector of the surface cleaning device is a socket, and when the pins of the charging structure are inserted into the socket of the charging connector When inside, the base station provides power to the surface cleaning device, or the charging structure includes a plurality of sockets, at least part of the inner surface of the sockets is formed as an electrode, and the charging connector of the surface cleaning device is a plug The base station provides power to the surface cleaning device when the pins of the surface cleaning device are inserted into the receptacles of the charging structure.
根据本公开的至少一个实施方式的基站,所述充电结构包括充电触点,所述表面清洁设备的充电接头包括充电触片,当将所述充电结构的充电触点接触所述充电接头的充电触片时,所述基站向所述表面清洁设备提供电能;或者,所述充电结构包括充电触片,所述表面清洁设备的充电接头包括充电触点,当将所述充电结构的充电触片接触所述充电接头的充电触点时,所述基站向所述表面清洁设备提供电能。According to the base station of at least one embodiment of the present disclosure, the charging structure includes a charging contact, and the charging connector of the surface cleaning device includes a charging contact, and when the charging contact of the charging structure is brought into contact with the charging connector of the charging connector When contacting the surface cleaning device, the base station provides electrical energy to the surface cleaning device; or, the charging structure includes a charging contact pad, and the charging connector of the surface cleaning device includes a charging contact. When the charging contact pad of the charging structure is connected The base station provides power to the surface cleaning device upon contact with the charging contacts of the charging connector.
根据本公开的至少一个实施方式的基站,还包括:The base station according to at least one embodiment of the present disclosure, further comprising:
支撑组件,所述支撑组件设置于所述基站的外壳,用于支撑所述连接接口。A support assembly, which is arranged on the casing of the base station and used to support the connection interface.
根据本公开的至少一个实施方式的基站,所述支撑组件包括:According to the base station of at least one embodiment of the present disclosure, the support assembly includes:
支撑板,所述支撑板固定于所述基站的外壳,或者所述支撑板形成为所述基站的外壳的一部分;以及a support plate fixed to the housing of the base station or formed as part of the housing of the base station; and
支撑座,所述支撑座从所述支撑板向上延伸预设距离,并且所述支撑座的中部呈中空状,以使得所述连接接口的部分穿过所述支撑座,连接于第二管路。a support seat, the support seat extends upward from the support plate by a predetermined distance, and the middle part of the support seat is hollow, so that the part of the connection interface passes through the support seat and is connected to the second pipeline .
根据本公开的至少一个实施方式的基站,所述连接接口包括:According to the base station of at least one embodiment of the present disclosure, the connection interface includes:
主体部,所述主体部呈中空状;a main body part, the main body part is hollow;
底座部,所述底座部设置于所述主体部的下端,用于封闭所述主体部的下端;a base part, the base part is arranged at the lower end of the main body part and is used to close the lower end of the main body part;
法兰部,所述法兰部设置于所述主体部的上端,并且所述法兰部的外边缘的至少一部分支撑在所述支撑座的上端;以及a flange portion, the flange portion is provided on the upper end of the main body portion, and at least a part of the outer edge of the flange portion is supported on the upper end of the support seat; and
连接接头,所述连接接头设置于底座部,并位于所述底座部的下方,以通过所述连接接头连接于第二管路,使得连接接口与所述清洁液体供给部连通。a connection joint, which is arranged on the base part and located below the base part, so as to be connected to the second pipeline through the connection joint, so that the connection interface is communicated with the cleaning liquid supply part.
根据本公开的至少一个实施方式的基站,所述连接接口还包括:According to the base station of at least one embodiment of the present disclosure, the connection interface further includes:
抵触件,所述抵触件的一端设置于所述底座部,并且位于所述底座部的上方,所述抵触件的上端与所述底座部间隔预设距离。a resisting piece, one end of the resisting piece is disposed on the base part and located above the base part, and the upper end of the resisting piece is spaced from the base part by a preset distance.
根据本公开的至少一个实施方式的基站,所述抵触件的横截面为十字形。According to the base station of at least one embodiment of the present disclosure, the cross-section of the interference member is cross-shaped.
根据本公开的至少一个实施方式的基站,沿远离所述基站的外壳的方向,所述法兰部的上端向上倾斜。According to the base station of at least one embodiment of the present disclosure, the upper end of the flange portion is inclined upward in a direction away from the housing of the base station.
根据本公开的至少一个实施方式的基站,还包括:The base station according to at least one embodiment of the present disclosure, further comprising:
盖板,所述盖板能够在第一位置和第二位置之间运动,其中,当所述盖板位于所述第一位置时,所述盖板覆盖所述连接接口,当所述盖板位于第二位置时,使得所述连接接口露出。a cover plate movable between a first position and a second position, wherein when the cover plate is in the first position, the cover plate covers the connection interface, and when the cover plate is in the first position When in the second position, the connection interface is exposed.
根据本公开的至少一个实施方式的基站,所述充电结构设置于所述盖板上方的基站的外壳,或者设置于所述盖板。According to the base station of at least one embodiment of the present disclosure, the charging structure is disposed on a casing of the base station above the cover plate, or disposed on the cover plate.
根据本公开的至少一个实施方式的基站,当向所述盖板施加外力时,所述盖板从第一位置运动至第二位置,并且当外力消失时,所述盖板从第二位置运动至第一位置。According to the base station of at least one embodiment of the present disclosure, when an external force is applied to the cover plate, the cover plate moves from the first position to the second position, and when the external force disappears, the cover plate moves from the second position to the first position.
根据本公开的至少一个实施方式的基站,所述盖板的一端可转动地连接于所述基站的外壳,并且所述盖板能够在所述第一位置和第二位置之间摆动。According to the base station of at least one embodiment of the present disclosure, one end of the cover plate is rotatably connected to the housing of the base station, and the cover plate can swing between the first position and the second position.
根据本公开的至少一个实施方式的基站,所述盖板连接于所述基站的外壳的一端位于所述基站的外壳的内部,所述基站的外壳开设有通孔,当所述盖板运动至第一位置时,所述盖板的下端穿过所述基站的外壳,位于所述基站的外壳的外部,并覆盖所述连接接口;当所述盖板运动至第二位置时,所述盖板的至少部分位于所述基站的外壳内。According to the base station of at least one embodiment of the present disclosure, one end of the cover plate connected to the casing of the base station is located inside the casing of the base station, and the casing of the base station is provided with a through hole, and when the cover plate moves to In the first position, the lower end of the cover plate passes through the casing of the base station, is located outside the casing of the base station, and covers the connection interface; when the cover plate moves to the second position, the cover At least a portion of the board is located within the housing of the base station.
根据本公开的至少一个实施方式的基站,所述盖板可滑动地设置于所述基站的壳体,并且所述盖板能够在所述第一位置和第二位置之间移动。According to the base station of at least one embodiment of the present disclosure, the cover plate is slidably provided to the housing of the base station, and the cover plate is movable between the first position and the second position.
根据本公开的至少一个实施方式的基站,所述连接接口的法兰部上形成有限位部,当所述盖板位于所述第一位置时,所述限位部与所述盖板的表面的至少一部分接触,以通过所述限位部限制所述盖板的进一步移动。According to the base station of at least one embodiment of the present disclosure, a limiting portion is formed on the flange portion of the connection interface, and when the cover plate is in the first position, the limiting portion and the surface of the cover plate At least a part of the cover plate is in contact, so that further movement of the cover plate is restricted by the limiting portion.
根据本公开的至少一个实施方式的基站,所述限位部形成于所述法兰远离所述基站的外壳的部分。According to the base station of at least one embodiment of the present disclosure, the limiting portion is formed at a portion of the flange that is remote from the housing of the base station.
根据本公开的至少一个实施方式的基站,当所述盖板位于所述第一位置时,所述盖板的上表面形成为第一倾斜面,其中所述第一倾斜面沿远离所述基站的外壳的方向向下倾斜。According to the base station of at least one embodiment of the present disclosure, when the cover plate is located at the first position, the upper surface of the cover plate is formed as a first inclined surface, wherein the first inclined surface is away from the base station along the The direction of the housing slopes downward.
根据本公开的至少一个实施方式的基站,当所述盖板位于所述第一位置时,所述盖板远离所述基站的外壳的部分形成为第二倾斜面,其中所述第二倾斜面与水平面之间形成一夹角。According to the base station of at least one embodiment of the present disclosure, when the cover plate is in the first position, a portion of the cover plate away from the housing of the base station is formed as a second inclined surface, wherein the second inclined surface An angle is formed between it and the horizontal plane.
根据本公开的至少一个实施方式的基站,所述连接接口远离所述基站的外壳的部分形成为第三倾斜面,其中所述第三倾斜面与水平面之间形成一夹角。According to the base station of at least one embodiment of the present disclosure, a part of the connection interface away from the casing of the base station is formed as a third inclined surface, wherein an included angle is formed between the third inclined surface and the horizontal plane.
根据本公开的至少一个实施方式的基站,当通过支撑组件支撑所述连接接口时,所述支撑组件远离所述基站的外壳的部分形成为第四倾斜面,其中所述第四倾斜面与水平面之间形成一夹角,以便清洁液体沿所述第一倾斜面、第二倾斜面、第三倾斜面和/或第四倾斜面向下流动。According to the base station of at least one embodiment of the present disclosure, when the connection interface is supported by a support assembly, a portion of the support assembly away from the housing of the base station is formed as a fourth inclined surface, wherein the fourth inclined surface is connected to a horizontal plane An included angle is formed therebetween, so that the cleaning liquid flows downward along the first inclined surface, the second inclined surface, the third inclined surface and/or the fourth inclined surface.
根据本公开的至少一个实施方式的基站,所述支撑板的上表面形成为倾斜表面,其中,所述支撑板的上表面沿远离所述基站的壳体的方向向下倾斜,以防止清洁液体在支撑板的上表面积聚。According to the base station of at least one embodiment of the present disclosure, an upper surface of the support plate is formed as an inclined surface, wherein the upper surface of the support plate is inclined downward in a direction away from a housing of the base station to prevent cleaning liquid Build up on the upper surface of the support plate.
根据本公开的至少一个实施方式的基站,所述支撑板的上表面与水平面的夹角为10-20°。According to the base station of at least one embodiment of the present disclosure, the angle between the upper surface of the support plate and the horizontal plane is 10-20°.
根据本公开的至少一个实施方式的基站,所述支撑板的前表面形成为倾斜表面,其中,所述支撑板的前表面沿接近所述基站的壳体的方向向下倾斜,以使得清洁液体从支撑板的上表面直接落入托盘。According to the base station of at least one embodiment of the present disclosure, the front surface of the support plate is formed as an inclined surface, wherein the front surface of the support plate is inclined downward in a direction approaching the housing of the base station, so that the cleaning liquid Drop directly into the tray from the upper surface of the support plate.
根据本公开的至少一个实施方式的基站,所述支撑板的前表面与竖直面的夹角为10-20°According to the base station of at least one embodiment of the present disclosure, the angle between the front surface of the support plate and the vertical plane is 10-20°
根据本公开的至少一个实施方式的基站,在所述支撑板的前表面的下沿临近位置设置有集水槽。According to the base station of at least one embodiment of the present disclosure, a water collecting tank is provided near the lower edge of the front surface of the support plate.
根据本公开的另一方面,提供一种表面清洁系统,其包括上述的基站。According to another aspect of the present disclosure, there is provided a surface cleaning system including the above-mentioned base station.
根据本公开的至少一个实施方式的表面清洁系统,还包括:A surface cleaning system according to at least one embodiment of the present disclosure, further comprising:
表面清洁设备,所述表面清洁设备包括清洁液体存储部,以当所述清洁液体存储部与所述清洁液体供给部通过连接接口连通时,实现所述清洁液体存储部和清洁液体供给部之间的流体交互。A surface cleaning device, the surface cleaning device comprising a cleaning liquid storage part, so as to realize the connection between the cleaning liquid storage part and the cleaning liquid supply part when the cleaning liquid storage part and the cleaning liquid supply part are communicated through a connection interface fluid interaction.
根据本公开的至少一个实施方式的表面清洁系统,所述表面清洁设备还包括:According to the surface cleaning system of at least one embodiment of the present disclosure, the surface cleaning apparatus further includes:
充电接头,所述充电接头与所述充电结构配合,以便所述基站向所述表面清洁设备提供电能。and a charging connector, the charging connector cooperates with the charging structure, so that the base station provides power to the surface cleaning device.
根据本公开的至少一个实施方式的表面清洁系统,所述表面清洁设备还包括:According to the surface cleaning system of at least one embodiment of the present disclosure, the surface cleaning apparatus further includes:
接头组件,所述接头组件连接于所述清洁液体存储部,以当将所述接头组件插入所述连接接口时,所述清洁液体存储部与所述清洁液体供给部之间连通。A joint assembly is connected to the cleaning liquid storage part so that when the joint assembly is inserted into the connection interface, there is communication between the cleaning liquid storage part and the cleaning liquid supply part.
根据本公开的至少一个实施方式的表面清洁系统,所述接头组件包括:According to a surface cleaning system of at least one embodiment of the present disclosure, the joint assembly includes:
下壳体,所述下壳体形成有用于清洁液体通过的管路;a lower casing, the lower casing is formed with a pipeline for the passage of the cleaning liquid;
上壳体,所述上壳体连接于所述下壳体,并且所述上壳体形成有用于清洁液体通过的管路;以及an upper casing, the upper casing is connected to the lower casing, and the upper casing is formed with a pipeline for the passage of cleaning liquid; and
阀组件,所述阀组件设置于所述下壳体内,并能够沿所述下壳体的管路的方向运动,以当所述阀组件处于第一位置时,所述阀组件封闭所述下壳体的用于清洁液体通过的管路,当所述阀组件处于第二位置时,所述阀组件打开所述下壳体的用于清洁液体通过的管路。a valve assembly, the valve assembly is disposed in the lower casing and can move in the direction of the pipeline of the lower casing, so that when the valve assembly is in the first position, the valve assembly closes the lower casing When the valve assembly is in the second position, the valve assembly opens the pipeline of the lower casing for the passage of the cleaning liquid.
根据本公开的至少一个实施方式的表面清洁系统,所述下壳体包括:According to the surface cleaning system of at least one embodiment of the present disclosure, the lower housing includes:
插入部,当所述接头组件连接于所述连接接口时,至少部分插入部插入于所述连接接口。The insertion part, when the connector assembly is connected to the connection interface, at least part of the insertion part is inserted into the connection interface.
根据本公开的至少一个实施方式的表面清洁系统,所述下壳体还包括:According to the surface cleaning system of at least one embodiment of the present disclosure, the lower housing further includes:
下连接部,所述下连接部连接于所述插入部,并且所述下连接部上形成有用于固定所述下连接部的安装部。a lower connection part, the lower connection part is connected to the insertion part, and a mounting part for fixing the lower connection part is formed on the lower connection part.
根据本公开的至少一个实施方式的表面清洁系统,在所述下壳体内壁形成有向所述下壳体内部延伸的凸出部,其中,所述凸出部形成有通孔;所述阀组件沿所述通孔的内壁面滑动。According to the surface cleaning system of at least one embodiment of the present disclosure, a protrusion extending toward the interior of the lower case is formed on the inner wall of the lower case, wherein the protrusion is formed with a through hole; the valve The assembly slides along the inner wall of the through hole.
根据本公开的至少一个实施方式的表面清洁系统,所述阀组件包括:According to a surface cleaning system of at least one embodiment of the present disclosure, the valve assembly includes:
导杆,所述导杆可滑动地设置于所述凸出部,并且所述导杆的两端位于所述凸出部的两侧;以及a guide rod, the guide rod is slidably disposed on the protruding part, and both ends of the guide rod are located on both sides of the protruding part; and
堵头,所述堵头设置于导杆接近所述上壳体的一端,并且当所述阀组件位于第一位置时,所述堵头与所述下壳体的内壁面密封接触,以封闭所述下壳体的用于清洁液体通过的管路;当所述阀组件位于第二位置时,所述堵头与所述下壳体的内壁面间隔一定距离,以打开所述下壳体的用于清洁液体通过的管路。a plug, the plug is arranged at one end of the guide rod close to the upper casing, and when the valve assembly is in the first position, the plug is in sealing contact with the inner wall surface of the lower casing to seal The pipeline of the lower casing for the passage of cleaning liquid; when the valve assembly is in the second position, the plug is spaced from the inner wall surface of the lower casing at a certain distance, so as to open the lower casing used to clean the lines through which the liquid passes.
根据本公开的至少一个实施方式的表面清洁系统,所述下连接部的内径大于所述插入部的内径,至少部分堵头的直径大于所述插入部的内径,以当所述堵头的外壁面与所述插入部的内壁面接触时,封闭所述下壳体的用于清洁液体通过的管路;当所述堵头的外壁面与所述插入部的内壁面分离时,打开所述下壳体的用于清洁液体通过的管路。According to the surface cleaning system of at least one embodiment of the present disclosure, the inner diameter of the lower connection part is larger than the inner diameter of the insertion part, and the diameter of at least part of the plug is larger than the inner diameter of the insertion part, so that when the outer diameter of the plug is larger than the inner diameter of the insertion part When the wall surface is in contact with the inner wall surface of the insertion part, the pipeline for the cleaning liquid to pass through the lower casing is closed; when the outer wall surface of the plug is separated from the inner wall surface of the insertion part, the pipeline is opened. The pipes of the lower casing for the passage of cleaning liquids.
根据本公开的至少一个实施方式的表面清洁系统,所述导杆远离上壳体的一端形成有轴肩,弹簧的一端设置于所述轴肩,另一端设置于所述凸出部,并且所述 弹簧处于预压缩状态,以通过所述弹簧的弹力使得所述接头组件为常闭状态。According to the surface cleaning system of at least one embodiment of the present disclosure, an end of the guide rod away from the upper casing is formed with a shaft shoulder, one end of the spring is disposed on the shaft shoulder, and the other end is disposed on the protruding portion, and the The spring is in a pre-compressed state, so that the joint assembly is in a normally closed state by the elastic force of the spring.
根据本公开的至少一个实施方式的表面清洁系统,所述堵头形成为倒锥形。According to the surface cleaning system of at least one embodiment of the present disclosure, the plug is formed in an inverted cone shape.
根据本公开的至少一个实施方式的表面清洁系统,所述上壳体包括:According to the surface cleaning system of at least one embodiment of the present disclosure, the upper housing includes:
上连接部,所述上连接部连接于所述下连接部;以及an upper connecting portion connected to the lower connecting portion; and
上连接管,所述上连接管的一端设置于所述上连接部,以通过将所述上连接管连接于清洁液体存储部,使得清洁液体存储部连接于所述清洁液体供给部。an upper connecting pipe, one end of the upper connecting pipe is disposed on the upper connecting part, so that the cleaning liquid storage part is connected to the cleaning liquid supply part by connecting the upper connecting pipe to the cleaning liquid storage part.
附图说明Description of drawings
附图示出了本公开的示例性实施方式,并与其说明一起用于解释本公开的原理,其中包括了这些附图以提供对本公开的进一步理解,并且附图包括在本说明书中并构成本说明书的一部分。The accompanying drawings illustrate exemplary embodiments of the present disclosure and, together with the description, serve to explain the principles of the present disclosure, are included to provide a further understanding of the disclosure, and are incorporated in and constitute the present specification part of the manual.
图1是根据本公开的一个实施方式的基站的结构示意图之一。FIG. 1 is one of schematic structural diagrams of a base station according to an embodiment of the present disclosure.
图2是根据本公开的一个实施方式的基站的结构示意图之二。FIG. 2 is a second schematic structural diagram of a base station according to an embodiment of the present disclosure.
图3是根据本公开的一个实施方式的基站的结构示意图之三。FIG. 3 is a third schematic structural diagram of a base station according to an embodiment of the present disclosure.
图4是根据本公开的一个实施方式的基站的结构示意图之四。FIG. 4 is a fourth schematic structural diagram of a base station according to an embodiment of the present disclosure.
图5是根据本公开的一个实施方式的基站的结构示意图之五。FIG. 5 is a fifth schematic structural diagram of a base station according to an embodiment of the present disclosure.
图6是根据本公开的一个实施方式的基站的结构示意图之六。FIG. 6 is a sixth schematic structural diagram of a base station according to an embodiment of the present disclosure.
图7是根据本公开的一个实施方式的支撑组件的结构示意图。FIG. 7 is a schematic structural diagram of a support assembly according to an embodiment of the present disclosure.
图8是根据本公开的一个实施方式的连接接口的结构示意图。FIG. 8 is a schematic structural diagram of a connection interface according to an embodiment of the present disclosure.
图9是根据本公开的一个实施方式的连接接口的另一角度结构示意图。FIG. 9 is another perspective structural diagram of a connection interface according to an embodiment of the present disclosure.
图10是根据本公开的一个实施方式的盖板的结构示意图。10 is a schematic structural diagram of a cover plate according to an embodiment of the present disclosure.
图11是根据本公开的一个实施方式的下端盖和阀组件结构示意图。11 is a schematic structural diagram of a lower end cap and a valve assembly according to an embodiment of the present disclosure.
图12是根据本公开的一个实施方式的表面清洁系统的结构示意图。12 is a schematic structural diagram of a surface cleaning system according to an embodiment of the present disclosure.
图13是根据本公开的一个实施方式的表面清洁设备的结构示意图。13 is a schematic structural diagram of a surface cleaning apparatus according to an embodiment of the present disclosure.
图14和图15是根据本公开的一个实施方式的接头组件的结构示意图。14 and 15 are schematic structural diagrams of a joint assembly according to an embodiment of the present disclosure.
图16是根据本公开的另一个实施方式的基站的结构示意图。FIG. 16 is a schematic structural diagram of a base station according to another embodiment of the present disclosure.
具体实施方式Detailed ways
下面结合附图和实施方式对本公开作进一步的详细说明。可以理解的是,此处所描述的具体实施方式仅用于解释相关内容,而非对本公开的限定。另外还需要说明的是,为了便于描述,附图中仅示出了与本公开相关的部分。The present disclosure will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the related content, but not to limit the present disclosure. In addition, it should be noted that, for the convenience of description, only the parts related to the present disclosure are shown in the drawings.
需要说明的是,在不冲突的情况下,本公开中的实施方式及实施方式中的特征可以相互组合。下面将参考附图并结合实施方式来详细说明本公开的技术方案。It should be noted that the embodiments of the present disclosure and the features of the embodiments may be combined with each other unless there is conflict. The technical solutions of the present disclosure will be described in detail below with reference to the accompanying drawings and in conjunction with the embodiments.
除非另有说明,否则示出的示例性实施方式/实施例将被理解为提供可以在实践中实施本公开的技术构思的一些方式的各种细节的示例性特征。因此,除非另有说明,否则在不脱离本公开的技术构思的情况下,各种实施方式/实施例的特征可以另外地组合、分离、互换和/或重新布置。Unless otherwise stated, the illustrated exemplary embodiments/embodiments are to be understood as exemplary features providing various details of some ways in which the technical concept of the present disclosure may be implemented in practice. Therefore, unless otherwise stated, the features of various embodiments/embodiments may be additionally combined, separated, interchanged and/or rearranged without departing from the technical concept of the present disclosure.
在附图中使用交叉影线和/或阴影通常用于使相邻部件之间的边界变得清晰。如此,除非说明,否则交叉影线或阴影的存在与否均不传达或表示对部件的具体材料、材料性质、尺寸、比例、示出的部件之间的共性和/或部件的任何其它特性、属性、性质等的任何偏好或者要求。此外,在附图中,为了清楚和/或描述性的目的,可以夸大部件的尺寸和相对尺寸。当可以不同地实施示例性实施例时,可以以不同于所描述的顺序来执行具体的工艺顺序。例如,可以基本同时执行或者以与所描述的顺序相反的顺序执行两个连续描述的工艺。此外,同样的附图标记表示同样的部件。The use of cross-hatching and/or hatching in the drawings is generally used to clarify boundaries between adjacent components. As such, unless stated, the presence or absence of cross-hatching or shading does not convey or represent any particular material, material properties, dimensions, proportions, commonalities between the illustrated components and/or any other characteristics of the components, any preferences or requirements for attributes, properties, etc. Furthermore, in the drawings, the size and relative sizes of components may be exaggerated for clarity and/or descriptive purposes. When example embodiments may be implemented differently, the specific process sequence may be performed in a different order than described. For example, two consecutively described processes may be performed substantially concurrently or in the reverse order of that described. In addition, the same reference numerals denote the same components.
当一个部件被称作“在”另一部件“上”或“之上”、“连接到”或“结合到”另一部件时,该部件可以直接在另一部件上、直接连接到或直接结合到另一部件,或者可以存在中间部件。然而,当部件被称作“直接在”另一部件“上”、“直接连接到”或“直接结合到”另一部件时,不存在中间部件。为此,术语“连接”可以指物理连接、电气连接等,并且具有或不具有中间部件。When an element is referred to as being "on" or "over", "connected to" or "coupled to" another element, it can be directly on, directly connected to, or directly on the other element Incorporated into another component, or intermediate components may be present. However, when an element is referred to as being "directly on," "directly connected to," or "directly coupled to" another element, there are no intervening elements present. To this end, the term "connected" may refer to a physical connection, electrical connection, etc., with or without intervening components.
为了描述性目的,本公开可使用诸如“在……之下”、“在……下方”、“在……下”、“下”、“在……上方”、“上”、“在……之上”、“较高的”和“侧(例如,如在“侧壁”中)”等的空间相对术语,从而来描述如附图中示出的一个部件与另一(其它)部件的关系。除了附图中描绘的方位之外,空间相对术语还意图包含设备在使用、操作和/或制造中的不同方位。例如,如果附图中的设备被翻转,则被描述为“在”其它部件或特征“下方”或“之下”的部件将随后被定位为“在”其它部件或特征“上方”。因此,示例性术语“在……下方”可以包含“上方”和“下方”两种方位。此外,设备可被另外定位(例如,旋转90度或者在其它方位处),如此,相应地解释这里使用的空间相对描述语。For descriptive purposes, the present disclosure may use terms such as "under", "under", "under", "under", "above", "on", "at" Spatially relative terms such as "above," "higher," and "side (eg, as in "sidewall")" to describe one element to another (other) element as shown in the figures Relationship. In addition to the orientation depicted in the figures, spatially relative terms are intended to encompass different orientations of the device in use, operation, and/or manufacture. For example, if the device in the figures is turned over, elements described as "below" or "beneath" other elements or features would then be oriented "above" the other elements or features. Thus, the exemplary term "under" can encompass both an orientation of "above" and "below." In addition, the device may be otherwise oriented (eg, rotated 90 degrees or at other orientations) and, as such, the spatially relative descriptors used herein should be interpreted accordingly.
这里使用的术语是为了描述具体实施例的目的,而不意图是限制性的。如这里所 使用的,除非上下文另外清楚地指出,否则单数形式“一个(种、者)”和“(该)”也意图包括复数形式。此外,当在本说明书中使用术语“包含”和/或“包括”以及它们的变型时,说明存在所陈述的特征、整体、步骤、操作、部件、组件和/或它们的组,但不排除存在或附加一个或更多个其它特征、整体、步骤、操作、部件、组件和/或它们的组。还要注意的是,如这里使用的,术语“基本上”、“大约”和其它类似的术语被用作近似术语而不用作程度术语,如此,它们被用来解释本领域普通技术人员将认识到的测量值、计算值和/或提供的值的固有偏差。The terminology used herein is for the purpose of describing particular embodiments and is not intended to be limiting. As used herein, the singular forms "a" and "(the)" are intended to include the plural forms as well, unless the context clearly dictates otherwise. Furthermore, when the terms "comprising" and/or "comprising" and their variants are used in this specification, it is indicated that the stated features, integers, steps, operations, parts, components and/or groups thereof are present, but not excluded One or more other features, integers, steps, operations, parts, components and/or groups thereof are present or additional. Note also that, as used herein, the terms "substantially," "approximately," and other similar terms are used as terms of approximation and not as terms of degree, as they are used to explain what one of ordinary skill in the art would recognize Inherent deviations from measured, calculated and/or provided values.
图1是根据本公开的一个实施方式的基站的结构示意图之一。图2是根据本公开的一个实施方式的基站的结构示意图之二。图3是根据本公开的一个实施方式的基站的结构示意图之三。图4是根据本公开的一个实施方式的基站的结构示意图之四。图5是根据本公开的一个实施方式的基站的结构示意图之五。图6是根据本公开的一个实施方式的基站的结构示意图之六。FIG. 1 is one of schematic structural diagrams of a base station according to an embodiment of the present disclosure. FIG. 2 is a second schematic structural diagram of a base station according to an embodiment of the present disclosure. FIG. 3 is a third schematic structural diagram of a base station according to an embodiment of the present disclosure. FIG. 4 is a fourth schematic structural diagram of a base station according to an embodiment of the present disclosure. FIG. 5 is a fifth schematic structural diagram of a base station according to an embodiment of the present disclosure. FIG. 6 is a sixth schematic structural diagram of a base station according to an embodiment of the present disclosure.
如图1至图6所示,本公开提供一种基站100,其包括:As shown in FIG. 1 to FIG. 6, the present disclosure provides a base station 100, which includes:
清洁液体供给部151,清洁液体供给部151用于存储清洁液体;the cleaning liquid supply part 151, the cleaning liquid supply part 151 is used for storing the cleaning liquid;
充电结构160,充电结构160用于向停靠于基站100的表面清洁设备200提供电能,并实现表面清洁设备200的充电;以及a charging structure 160, the charging structure 160 is used to provide electric power to the surface cleaning device 200 docked at the base station 100, and realize the charging of the surface cleaning device 200; and
连接接口170,连接接口170连接至清洁液体供给部151,当表面清洁设备200停靠于基站100时,表面清洁设备200的清洁液体存储部连接于连接接口170,以将清洁液体供给部151的清洁液体通过连接接口170输送至清洁液体存储部,或者将清洁液体存储部内的清洁液体通过连接接口170输送至清洁液体供给部151;The connection interface 170 is connected to the cleaning liquid supply part 151. When the surface cleaning device 200 is docked on the base station 100, the cleaning liquid storage part of the surface cleaning device 200 is connected to the connection interface 170 to clean the cleaning liquid supply part 151. The liquid is delivered to the cleaning liquid storage part through the connection interface 170, or the cleaning liquid in the cleaning liquid storage part is delivered to the cleaning liquid supply part 151 through the connection interface 170;
其中,连接接口170所处的位置所在水平面低于充电结构160所处的位置所在水平面。The level where the connection interface 170 is located is lower than the level where the charging structure 160 is located.
本公开的基站100将充电结构160和连接接口170在高度上分离,有效地避免表面清洁设备200放置于基站100补充清洁液体和/或充电时,或者表面清洁设备200从基站取下时,充电结构可能会沾到来自于连接接口170的清洁液体,或者清洁液体溅到充电结构,产生短路和着火隐患的问题。The base station 100 of the present disclosure separates the charging structure 160 and the connection interface 170 in height, which effectively prevents the surface cleaning device 200 from being charged when the base station 100 is placed on the base station 100 to replenish cleaning liquid and/or charge, or when the surface cleaning device 200 is removed from the base station. The structure may get wet with cleaning liquid from the connection interface 170, or the cleaning liquid may splash on the charging structure, resulting in problems of short circuit and fire hazard.
作为一种实现形式,充电结构160包括多个插针,表面清洁设备200的充电接头为插孔,当将充电结构160的插针插入充电接头的插孔内时,基站100向表面清洁设备200提供电能,此时,插孔的至少部分内表面形成为电极。As an implementation form, the charging structure 160 includes a plurality of pins, and the charging connector of the surface cleaning device 200 is a jack. When the pins of the charging structure 160 are inserted into the jacks of the charging connector, the base station 100 sends the surface cleaning device 200 Electrical energy is supplied, and at this time, at least part of the inner surface of the socket is formed as an electrode.
作为第二种实现形式,充电结构160包括多个插孔,插孔的至少部分内表面形成为电极,表面清洁设备200的充电接头为插针,当将表面清洁设备200的插针插入于充电结构160的插孔内时,基站100向表面清洁设备200提供电能。As a second implementation form, the charging structure 160 includes a plurality of sockets, at least part of the inner surfaces of the sockets are formed as electrodes, and the charging connectors of the surface cleaning device 200 are pins. When the pins of the surface cleaning device 200 are inserted into the charging The base station 100 provides power to the surface cleaning device 200 while in the receptacle of the structure 160 .
作为第三种实现形式,充电结构160包括充电触点,表面清洁设备200的充电接头包括充电触片,当将充电结构160的充电触点接触充电接头的充电触片时,基站100向表面清洁设备200提供电能。As a third implementation form, the charging structure 160 includes charging contacts, and the charging connector of the surface cleaning device 200 includes charging contacts. When the charging contacts of the charging structure 160 are brought into contact with the charging contacts of the charging connector, the base station 100 cleans the surface. Device 200 provides electrical power.
作为第四种实现形式,充电结构160包括充电触片,表面清洁设备200的充电接头包括充电触点,当将充电结构160的充电触片接触充电接头的充电触点时,基站100向表面清洁设备200提供电能。As a fourth implementation form, the charging structure 160 includes a charging contact, and the charging connector of the surface cleaning device 200 includes a charging contact. When the charging contact of the charging structure 160 contacts the charging contact of the charging connector, the base station 100 cleans the surface Device 200 provides electrical power.
优选地,充电结构160设置于基站100的外壳165,并且更优选地,充电结构160设置于基站100的外壳165的竖直部分。Preferably, the charging structure 160 is provided on the housing 165 of the base station 100 , and more preferably, the charging structure 160 is provided on a vertical portion of the housing 165 of the base station 100 .
优选地,充电结构160设置于盖板190上方的基站的外壳,或者设置于盖板190。Preferably, the charging structure 160 is disposed on the casing of the base station above the cover plate 190 , or is disposed on the cover plate 190 .
在本公开的一个可选实施例中,的基站100还包括:In an optional embodiment of the present disclosure, the base station 100 further includes:
支撑组件180,支撑组件180设置于基站100的外壳165,用于支撑连接接口170。The support assembly 180 is disposed on the housing 165 of the base station 100 for supporting the connection interface 170 .
优选地,支撑组件180包括:Preferably, the support assembly 180 includes:
支撑板181,支撑板181固定于基站100的外壳165,或者支撑板181形成为基站100的外壳165的一部分;以及a support plate 181 that is fixed to the housing 165 of the base station 100 or formed as part of the housing 165 of the base station 100; and
支撑座182,支撑座182从支撑板181向上延伸预设距离,并且支撑座182的中部呈中空状,以使得连接接口170的部分穿过支撑座182,连接于第二管路1072。The support base 182 extends upwards from the support plate 181 by a predetermined distance, and the middle of the support base 182 is hollow, so that part of the connection interface 170 passes through the support base 182 and is connected to the second pipeline 1072 .
优选地,如图6和图16所示,为防止支撑组件180积水,支撑组件180的上表面180a形成有向托盘部102的倾斜度,以向托盘部102上进行残留液体导流。Preferably, as shown in FIG. 6 and FIG. 16 , in order to prevent the support assembly 180 from accumulating water, the upper surface 180 a of the support assembly 180 is formed with an inclination toward the tray part 102 to guide the residual liquid on the tray part 102 .
在一个可选的实施例中,支撑组件180的与上表面180a连接的前表面180b上形成有倾斜度,倾斜度由自前表面180b的下沿至前表面180b的上沿形成,以在前表面180b形成向托盘部102倾斜的趋势。In an optional embodiment, an inclination is formed on the front surface 180b of the support assembly 180 connected to the upper surface 180a, and the inclination is formed from the lower edge of the front surface 180b to the upper edge of the front surface 180b, so that the front surface 180b is formed on the front surface 180b. 180b tends to be inclined toward the tray portion 102.
即支撑板181的前表面形成为倾斜表面,其中,支撑板181的前表面沿接近基站的壳体的方向向下倾斜,以使得清洁液体从支撑板的上表面直接落入托盘部。That is, the front surface of the support plate 181 is formed as an inclined surface, wherein the front surface of the support plate 181 is inclined downward in a direction approaching the housing of the base station so that the cleaning liquid directly falls from the upper surface of the support plate into the tray part.
优选地,支撑板的前表面与竖直面的夹角为10-20°。Preferably, the included angle between the front surface of the support plate and the vertical plane is 10-20°.
在一个可选的实施例中,为了进一步防止积水从前表面180b向下流入可拆托盘部与底座的间隙,在前表面180b的下沿临近位置设置集水槽180c,以接收沿着前表 面180b流下来的部分残余水。In an optional embodiment, in order to further prevent water from flowing downward from the front surface 180b into the gap between the detachable tray part and the base, a water collecting groove 180c is provided at a position adjacent to the lower edge of the front surface 180b to receive water along the front surface 180b Some residual water that flows down.
在本公开的一个可选实施例中,连接接口170包括:In an optional embodiment of the present disclosure, the connection interface 170 includes:
主体部171,主体部171呈中空状;The main body part 171, the main body part 171 is hollow;
底座部172,底座部172设置于主体部171的下端,用于封闭主体部171的下端;the base part 172, the base part 172 is arranged at the lower end of the main body part 171, and is used for closing the lower end of the main body part 171;
法兰部173,法兰部173设置于主体部171的上端,并且法兰部173的外边缘的至少一部分支撑在支撑座182的上端;以及a flange portion 173, the flange portion 173 is disposed on the upper end of the main body portion 171, and at least a portion of the outer edge of the flange portion 173 is supported on the upper end of the support seat 182; and
连接接头174,连接接头174设置于底座部172,并位于底座部172的下方,以通过连接接头174连接于第二管路1072,使得连接接口170与清洁液体供给部151连通。The connection joint 174 is disposed on the base portion 172 and located below the base portion 172 to be connected to the second pipeline 1072 through the connection joint 174 , so that the connection interface 170 communicates with the cleaning liquid supply portion 151 .
优选地,连接接口170还包括:Preferably, the connection interface 170 further includes:
抵触件175,抵触件175的一端设置于底座部172,并且位于底座部172的上方,抵触件175的上端与底座部172间隔预设距离;更优选地,抵触件175的横截面为十字形。The interference piece 175, one end of the interference piece 175 is disposed on the base portion 172, and is located above the base portion 172, and the upper end of the interference piece 175 is spaced from the base portion 172 by a predetermined distance; more preferably, the cross-section of the interference piece 175 is cross-shaped .
根据本公开至少一个实施方式,沿远离基站100的外壳165的方向,法兰部173的上端向上倾斜;远离基站100的外壳165的方向可以为图8中的大致左右方向。According to at least one embodiment of the present disclosure, the upper end of the flange portion 173 is inclined upward along the direction away from the housing 165 of the base station 100 ;
在本公开的一个可选实施例中,的基站100还包括:In an optional embodiment of the present disclosure, the base station 100 further includes:
盖板190,盖板190能够在第一位置和第二位置之间运动,其中,当盖板190位于第一位置时,盖板190覆盖连接接口170,当盖板190位于第二位置时,使得连接接口170露出。The cover plate 190 is movable between a first position and a second position, wherein when the cover plate 190 is in the first position, the cover plate 190 covers the connection interface 170, and when the cover plate 190 is in the second position, The connection interface 170 is exposed.
优选地,当向盖板190施加外力时,盖板190从第一位置运动至第二位置,并且当外力消失时,盖板190从第二位置运动至第一位置,其中,当盖板190从第二位置运动至第一位置时,可以利用盖板190的重力实现,也可以利用弹簧提供的恢复力实现。Preferably, when an external force is applied to the cover plate 190, the cover plate 190 moves from the first position to the second position, and when the external force disappears, the cover plate 190 moves from the second position to the first position, wherein when the cover plate 190 When moving from the second position to the first position, the gravity of the cover plate 190 can be used, or the restoring force provided by the spring can be used.
优选地,盖板190的一端可转动地连接于基站100的外壳165,并且盖板190能够在第一位置和第二位置之间摆动。Preferably, one end of the cover plate 190 is rotatably connected to the housing 165 of the base station 100, and the cover plate 190 can swing between the first position and the second position.
盖板190连接于基站100的外壳165的一端位于基站100的外壳165的内部,基站100的外壳165开设有通孔,当盖板190运动至第一位置时,盖板190的下端穿过基站100的外壳165,位于基站100的外壳165的外部,并覆盖连接接口170;当盖板190运动至第二位置时,盖板190的至少部分位于基站100的外壳165内。One end of the cover plate 190 connected to the casing 165 of the base station 100 is located inside the casing 165 of the base station 100. The casing 165 of the base station 100 is provided with a through hole. When the cover plate 190 moves to the first position, the lower end of the cover plate 190 passes through the base station. The casing 165 of the base station 100 is located outside the casing 165 of the base station 100 and covers the connection interface 170 ; when the cover plate 190 moves to the second position, at least part of the cover plate 190 is located in the casing 165 of the base station 100 .
作为另一种实现形式,盖板190可滑动地设置于基站100的壳体,并且盖板190能够在第一位置和第二位置之间移动。As another implementation form, the cover plate 190 is slidably disposed on the housing of the base station 100, and the cover plate 190 can move between the first position and the second position.
图8是根据本公开的一个实施方式的连接接口的结构示意图。图9是根据本公开的一个实施方式的连接接口的另一角度结构示意图。FIG. 8 is a schematic structural diagram of a connection interface according to an embodiment of the present disclosure. FIG. 9 is another perspective structural diagram of a connection interface according to an embodiment of the present disclosure.
如图8和图9所示,连接接口170的法兰部173上形成有限位部1731,当盖板190位于第一位置时,限位部1731与盖板190的表面的至少一部分接触,以通过限位部1731限制盖板190的进一步移动。As shown in FIGS. 8 and 9 , a limiting portion 1731 is formed on the flange portion 173 of the connection interface 170 . When the cover plate 190 is in the first position, the limiting portion 1731 is in contact with at least a part of the surface of the cover plate 190 to Further movement of the cover plate 190 is restricted by the limiting portion 1731 .
本公开中,限位部1731形成于法兰远离基站100的外壳165的部分。In the present disclosure, the limiting portion 1731 is formed at a portion of the flange that is far away from the housing 165 of the base station 100 .
图10是根据本公开的一个实施方式的盖板的结构示意图。10 is a schematic structural diagram of a cover plate according to an embodiment of the present disclosure.
在本公开的一个可选实施例中,如图10所示,当盖板190位于第一位置时,盖板190的上表面形成为第一倾斜面1901,其中第一倾斜面1901沿远离基站100的外壳165的方向向下倾斜。In an optional embodiment of the present disclosure, as shown in FIG. 10 , when the cover plate 190 is in the first position, the upper surface of the cover plate 190 is formed as a first inclined surface 1901 , wherein the first inclined surface 1901 extends away from the base station along the The housing 165 of 100 is oriented downwardly.
当盖板190位于第一位置时,盖板190远离基站100的外壳165的部分形成为第二倾斜面1902,其中第二倾斜面1902与水平面之间形成一夹角。When the cover plate 190 is in the first position, the part of the cover plate 190 away from the housing 165 of the base station 100 is formed as a second inclined surface 1902 , wherein an included angle is formed between the second inclined surface 1902 and the horizontal plane.
本公开中,第二倾斜面1902与水平面之间的夹角可以为90°,即第二倾斜面1902可以竖直设置。In the present disclosure, the included angle between the second inclined surface 1902 and the horizontal plane may be 90°, that is, the second inclined surface 1902 may be disposed vertically.
更优选地,连接接口170远离基站100的外壳165的部分形成为第三倾斜面176,其中第三倾斜面176与水平面之间形成一夹角。More preferably, the part of the connection interface 170 away from the housing 165 of the base station 100 is formed as a third inclined surface 176 , wherein an included angle is formed between the third inclined surface 176 and the horizontal plane.
相似地,第三倾斜面176与水平面之间形成的夹角也可以为90°,即第三倾斜面176可以竖直设置。Similarly, the included angle formed between the third inclined surface 176 and the horizontal plane may also be 90°, that is, the third inclined surface 176 may be arranged vertically.
更优选地,当通过支撑组件180支撑连接接口170时,支撑组件180远离基站100的外壳165的部分形成为第四倾斜面183,其中第四倾斜面183与水平面之间形成一夹角,以便清洁液体沿第一倾斜面、第二倾斜面、第三倾斜面和/或第四倾斜面向下流动。More preferably, when the connection interface 170 is supported by the support assembly 180, the part of the support assembly 180 away from the housing 165 of the base station 100 is formed as a fourth inclined surface 183, wherein an included angle is formed between the fourth inclined surface 183 and the horizontal surface, so that the The cleaning liquid flows downward along the first inclined surface, the second inclined surface, the third inclined surface and/or the fourth inclined surface.
由此,第一倾斜面形成有第一导水面,第二倾斜面、第三倾斜面和/或第四倾斜面共同形成第二导水面,以通过第一导水面和第二导水面将水滴快速导离充电结构位置。Therefore, the first inclined surface is formed with the first water guiding surface, and the second inclined surface, the third inclined surface and/or the fourth inclined surface together form the second water guiding surface, so as to disperse water droplets through the first water guiding surface and the second water guiding surface Quickly guide away from the position of the charging structure.
图7是根据本公开的一个实施方式的支撑组件的结构示意图。FIG. 7 is a schematic structural diagram of a support assembly according to an embodiment of the present disclosure.
本公开中,优选地,如图7所示,支撑板181的上表面形成为倾斜表面,其中, 支撑板181的上表面沿远离基站100的壳体的方向向下倾斜,以防止清洁液体在支撑板181的上表面积聚,尤其是积水会在一些特殊情况下导致水蒸气蒸发,因此也有短路风险。更优选地,支撑板181的上表面与水平面的夹角为10-20°。In the present disclosure, preferably, as shown in FIG. 7 , the upper surface of the support plate 181 is formed as an inclined surface, wherein the upper surface of the support plate 181 is inclined downward in a direction away from the housing of the base station 100 to prevent the cleaning liquid from Accumulation on the upper surface of the support plate 181 , especially the accumulation of water, may lead to evaporation of water vapor in some special cases, so there is also a risk of short circuit. More preferably, the angle between the upper surface of the support plate 181 and the horizontal plane is 10-20°.
优选地,本公开的基站还可以包括:基座101,基座101可以为腔体结构,基座101上可以设置有托盘部102,托盘部102上可以设置有两个主滚动轮定位座1021,以及两个辅助滚动轮定位座1022,本领域技术人员可以基于表面清洁设备的具体地滚动轮形式对主滚动轮定位座1021的数量和结构进行调整、对辅助滚动轮定位座1022的数量和结构进行调整,对于不具有辅助滚动轮的表面清洁设备,基站100可以适应性地仅具有主滚动轮定位座1021。Preferably, the base station of the present disclosure may further include: a base 101, the base 101 may be a cavity structure, a tray portion 102 may be provided on the base 101, and two main rolling wheel positioning seats 1021 may be provided on the tray portion 102 , and two auxiliary rolling wheel positioning seats 1022, those skilled in the art can adjust the number and structure of the main rolling wheel positioning seats 1021 based on the specific rolling wheel form of the surface cleaning equipment, and adjust the number and structure of the auxiliary rolling wheel positioning seats 1022. The structure is adjusted, and for the surface cleaning equipment without the auxiliary scroll wheel, the base station 100 can adaptively only have the main scroll wheel positioning seat 1021 .
基站100的托盘部102上还优选地形成有清洁槽1023,清洁槽1023的形状可以与表面清洁设备的滚刷等部件的形状适配,表面清洁设备停靠至基站100时,表面清洁设备的滚刷可以被置于清洁槽1023之中。The tray part 102 of the base station 100 is also preferably formed with a cleaning groove 1023. The shape of the cleaning groove 1023 can be adapted to the shape of the roller brush of the surface cleaning device. When the surface cleaning device is docked to the base station 100, the roller of the surface cleaning device A brush can be placed in the cleaning tank 1023.
优选地,托盘部102与基座101可拆卸地连接。Preferably, the tray part 102 is detachably connected with the base 101 .
根据本公开的优选实施方式,基站100的基座101为腔体结构,基座101的腔体结构内设置送风装置(送风装置可以具有加热组件以提供热风),基座101上形成有基座出风口1011以及基座进气部1012,相应地,托盘部102上与基座出风口1011的对应位置设置有托盘出风口1024,使得送风装置输出的气流能够经由基座出风口1011及托盘出风口1024施加到被置于清洁槽1023中的表面清洁设备的滚刷等部件上,以对滚刷等部件进行干燥。According to the preferred embodiment of the present disclosure, the base 101 of the base station 100 is a cavity structure, and an air supply device is arranged in the cavity structure of the base 101 (the air supply device may have a heating component to provide hot air), and the base 101 is formed with an air supply device. The base air outlet 1011 and the base air intake portion 1012, correspondingly, the tray portion 102 is provided with a tray air outlet 1024 at the corresponding position of the base air outlet 1011, so that the airflow output by the air supply device can pass through the base air outlet 1011. and the tray air outlet 1024 are applied to the roller brush and other components of the surface cleaning device placed in the cleaning tank 1023 to dry the roller brush and other components.
基座进气部1012可以设置在基座101的合适部位,其数量可以是一个或者两个以上。基座进气部1012可以是多孔形式。The base air intake portion 1012 can be disposed at a suitable position of the base 101, and the number thereof can be one or more than two. The susceptor air intake 1012 may be in porous form.
基座101可以为大致方形形状,也可以为其他合适的形状。The base 101 may have a substantially square shape or other suitable shapes.
本公开中,基站100具有外壳165,外壳165与基座101的一端固定连接,外壳165沿着竖直方向具有延伸尺寸。In the present disclosure, the base station 100 has a housing 165, the housing 165 is fixedly connected with one end of the base 101, and the housing 165 has an extended dimension along the vertical direction.
基站100还可以设置有收纳箱103,收纳箱103与清洁液体供给部151均被外壳165支撑以及保持,收纳箱103可以具有可被打开的箱门。The base station 100 may further be provided with a storage box 103 , and both the storage box 103 and the cleaning liquid supply part 151 are supported and held by the housing 165 , and the storage box 103 may have an openable box door.
优选地,收纳箱103以及清洁液体供给部151均为圆柱形结构,本领域技术人员也可以对收纳箱103及清洁液体供给部151的形状进行调整。Preferably, the storage box 103 and the cleaning liquid supply part 151 are both cylindrical structures, and those skilled in the art can also adjust the shapes of the storage box 103 and the cleaning liquid supply part 151 .
清洁液体供给部151的顶部可以设置加液部1511,加液部1511可以是加液盖配合加液口的形式。A liquid addition part 1511 may be provided on the top of the cleaning liquid supply part 151 , and the liquid addition part 1511 may be in the form of a liquid addition cap and a liquid addition port.
清洁液体供给部151上还可以设置有提手部1512,清洁液体供给部151与外壳165为可拆卸连接。The cleaning liquid supply part 151 may also be provided with a handle part 1512 , and the cleaning liquid supply part 151 and the housing 165 are detachably connected.
图11是根据本公开的一个实施方式的下端盖和阀组件结构示意图。11 is a schematic structural diagram of a lower end cap and a valve assembly according to an embodiment of the present disclosure.
优选地,如图1至图6,以及图11所示,基站100还具有双向泵装置、第一管路1071、第二管路1072及加热装置106,双向泵装置连接在阀组件153与第一管路1071的第一端之间,第一管路1071的第二端与加热装置106连接,加热装置106连接在第一管路1071的第二端与第二管路1072的第一端之间,第二管路1072的第二端与上述连接接口连接,使得清洁液体供给部151中的液体依次经由阀组件153、双向泵装置、第一管路1071、加热装置106、第二管路1072、连接接口被供应给表面清洁设备。Preferably, as shown in FIG. 1 to FIG. 6 and FIG. 11 , the base station 100 further has a two-way pump device, a first pipeline 1071, a second pipeline 1072 and a heating device 106, and the two-way pump device is connected between the valve assembly 153 and the first pipeline. Between the first ends of a pipeline 1071 , the second end of the first pipeline 1071 is connected to the heating device 106 , and the heating device 106 is connected to the second end of the first pipeline 1071 and the first end of the second pipeline 1072 In between, the second end of the second pipeline 1072 is connected to the above-mentioned connection interface, so that the liquid in the cleaning liquid supply part 151 passes through the valve assembly 153, the two-way pump device, the first pipeline 1071, the heating device 106, and the second pipeline in sequence. Road 1072, the connection interface is supplied to the surface cleaning device.
优选地,清洁液体供给部151通过下端盖152设置在外壳165上,阀组件153设置在下端盖152中。清洁液体供给部151能够从下端盖152上取下。Preferably, the cleaning liquid supply part 151 is provided on the housing 165 through the lower end cover 152 , and the valve assembly 153 is provided in the lower end cover 152 . The cleaning liquid supply part 151 can be removed from the lower end cap 152 .
图12是根据本公开的一个实施方式的表面清洁系统的结构示意图。12 is a schematic structural diagram of a surface cleaning system according to an embodiment of the present disclosure.
根据本公开的另一方面,如图12所示,提供一种表面清洁系统,其包括上述的基站100。According to another aspect of the present disclosure, as shown in FIG. 12 , a surface cleaning system is provided, which includes the base station 100 described above.
本公开中,的表面清洁系统还包括:In the present disclosure, the surface cleaning system also includes:
表面清洁设备200,表面清洁设备200包括清洁液体存储部,以当清洁液体存储部与清洁液体供给部151通过连接接口170连通时,实现清洁液体存储部和清洁液体供给部151之间的流体交互。The surface cleaning apparatus 200 includes a cleaning liquid storage portion to achieve fluid interaction between the cleaning liquid storage portion and the cleaning liquid supply portion 151 when the cleaning liquid storage portion and the cleaning liquid supply portion 151 are communicated through the connection interface 170 .
优选地,表面清洁设备200还包括:Preferably, the surface cleaning apparatus 200 further includes:
充电接头(图中未示出),充电接头与充电结构160配合,以便基站100向表面清洁设备200提供电能。A charging connector (not shown in the figure), the charging connector cooperates with the charging structure 160 so that the base station 100 provides power to the surface cleaning device 200 .
图13是根据本公开的一个实施方式的表面清洁设备的结构示意图。图14和图15是根据本公开的一个实施方式的接头组件的结构示意图。13 is a schematic structural diagram of a surface cleaning apparatus according to an embodiment of the present disclosure. 14 and 15 are schematic structural diagrams of a joint assembly according to an embodiment of the present disclosure.
在本公开的一个可选实施例中,如图13至图15所示,表面清洁设备200还包括:In an optional embodiment of the present disclosure, as shown in FIGS. 13 to 15 , the surface cleaning apparatus 200 further includes:
接头组件210,接头组件210连接于清洁液体存储部,以当将接头组件210插入连接接口170时,清洁液体存储部与清洁液体供给部151之间连通。The joint assembly 210 is connected to the cleaning liquid storage part so that when the joint assembly 210 is inserted into the connection interface 170 , there is communication between the cleaning liquid storage part and the cleaning liquid supply part 151 .
优选地,接头组件210包括:Preferably, joint assembly 210 includes:
下壳体2101,下壳体2101形成有用于清洁液体通过的管路;The lower casing 2101, the lower casing 2101 is formed with a pipeline for the passage of the cleaning liquid;
上壳体2102,上壳体2102连接于下壳体2101,并且上壳体2102形成有用于清洁液体通过的管路;以及an upper case 2102, the upper case 2102 is connected to the lower case 2101, and the upper case 2102 is formed with a pipeline for the passage of cleaning liquid; and
阀组件2103,阀组件2103设置于下壳体2101内,并能够沿下壳体2101的管路的方向运动,以当阀组件2103处于第一位置时,阀组件2103封闭下壳体2101的用于清洁液体通过的管路,当阀组件2103处于第二位置时,阀组件2103打开下壳体2101的用于清洁液体通过的管路。The valve assembly 2103, the valve assembly 2103 is arranged in the lower casing 2101, and can move along the direction of the pipeline of the lower casing 2101, so that when the valve assembly 2103 is in the first position, the valve assembly 2103 closes the function of the lower casing 2101. For the pipeline through which the cleaning liquid passes, when the valve assembly 2103 is in the second position, the valve assembly 2103 opens the pipeline for the cleaning liquid to pass through the lower housing 2101 .
本公开中,下壳体2101包括:In the present disclosure, the lower case 2101 includes:
插入部21011,当接头组件210连接于连接接口170时,至少部分插入部21011插入于连接接口170。For the insertion portion 21011 , when the connector assembly 210 is connected to the connection interface 170 , at least part of the insertion portion 21011 is inserted into the connection interface 170 .
而且,下壳体2101还包括:Moreover, the lower casing 2101 also includes:
下连接部21012,下连接部21012连接于插入部21011,并且下连接部21012上形成有用于固定下连接部21012的安装部。The lower connecting portion 21012 is connected to the inserting portion 21011, and a mounting portion for fixing the lower connecting portion 21012 is formed on the lower connecting portion 21012.
本公开中,在下壳体2101内壁形成有向下壳体2101内部延伸的凸出部21013,其中,凸出部21013形成有通孔;阀组件2103沿通孔的内壁面滑动。In the present disclosure, a protruding portion 21013 extending inside the lower housing 2101 is formed on the inner wall of the lower housing 2101 , wherein the protruding portion 21013 is formed with a through hole; the valve assembly 2103 slides along the inner wall surface of the through hole.
本公开中,阀组件2103包括:In this disclosure, valve assembly 2103 includes:
导杆21031,导杆21031可滑动地设置于凸出部21013,并且导杆21031的两端位于凸出部21013的两侧;以及a guide rod 21031, the guide rod 21031 is slidably disposed on the protruding part 21013, and both ends of the guide rod 21031 are located on both sides of the protruding part 21013; and
堵头21032,堵头21032设置于导杆21031接近上壳体2102的一端,并且当阀组件2103位于第一位置时,堵头21032与下壳体2101的内壁面密封接触,以封闭下壳体2101的用于清洁液体通过的管路;当阀组件2103位于第二位置时,堵头21032与下壳体2101的内壁面间隔一定距离,以打开下壳体2101的用于清洁液体通过的管路。The plug 21032 is arranged at one end of the guide rod 21031 close to the upper casing 2102, and when the valve assembly 2103 is in the first position, the plug 21032 is in sealing contact with the inner wall surface of the lower casing 2101 to close the lower casing 2101 for the passage of the cleaning liquid; when the valve assembly 2103 is in the second position, the plug 21032 is spaced a certain distance from the inner wall surface of the lower casing 2101 to open the passage of the lower casing 2101 for the passage of the cleaning liquid road.
本公开中,下连接部21012的内径大于插入部21011的内径,至少部分堵头21032的直径大于插入部21011的内径,以当堵头21032的外壁面与插入部21011的内壁面接触时,封闭下壳体2101的用于清洁液体通过的管路;当堵头21032的外壁面与插入部21011的内壁面分离时,打开下壳体2101的用于清洁液体通过的管路。In the present disclosure, the inner diameter of the lower connecting part 21012 is larger than the inner diameter of the insertion part 21011, and at least part of the plug 21032 has a diameter larger than the inner diameter of the insertion part 21011, so that when the outer wall surface of the plug 21032 contacts with the inner wall surface of the insertion part 21011, it closes the The pipeline of the lower casing 2101 for the passage of the cleaning liquid; when the outer wall surface of the plug 21032 is separated from the inner wall of the insertion portion 21011, the pipeline for the passage of the cleaning liquid of the lower casing 2101 is opened.
优选地,导杆21031远离上壳体2102的一端形成有轴肩,弹簧2104的一端设置于轴肩,另一端设置于凸出部21013,并且弹簧2104处于预压缩状态,以通过弹簧2104的弹力使得接头组件210为常闭状态。Preferably, one end of the guide rod 21031 away from the upper casing 2102 is formed with a shaft shoulder, one end of the spring 2104 is arranged on the shaft shoulder, and the other end is arranged on the protruding part 21013 , and the spring 2104 is in a pre-compressed state to pass the elastic force of the spring 2104 The joint assembly 210 is made to be in a normally closed state.
本公开中,堵头21032形成为倒锥形。In the present disclosure, the plug 21032 is formed in an inverted tapered shape.
本公开中,接头组件210还包括密封件2105,密封件设置于下壳体的插入部21011的外部,以使得接头组件210与连接接口之间形成密封。In the present disclosure, the joint assembly 210 further includes a sealing member 2105, which is disposed on the outside of the insertion portion 21011 of the lower housing, so as to form a seal between the joint assembly 210 and the connection interface.
在本公开的一个可选实施例中,上壳体2102包括:In an optional embodiment of the present disclosure, the upper housing 2102 includes:
上连接部21021,上连接部21021连接于下连接部21012;以及an upper connecting portion 21021, the upper connecting portion 21021 is connected to the lower connecting portion 21012; and
上连接管21022,上连接管21022的一端设置于上连接部21021,以通过将上连接管21022连接于清洁液体存储部,使得清洁液体存储部连接于清洁液体供给部151。The upper connecting pipe 21022, one end of the upper connecting pipe 21022 is disposed on the upper connecting part 21021, so that the cleaning liquid storage part is connected to the cleaning liquid supply part 151 by connecting the upper connecting pipe 21022 to the cleaning liquid storage part.
图16是根据本公开的另一个实施方式的基站的结构示意图。FIG. 16 is a schematic structural diagram of a base station according to another embodiment of the present disclosure.
如图16所示,该基站与上述实施例的不同之处在于,充电结构160设置于盖板190上,以通过充电结构160向表面清洁设备提供电能。As shown in FIG. 16 , the difference between the base station and the above-mentioned embodiment is that the charging structure 160 is disposed on the cover plate 190 to provide electric power to the surface cleaning device through the charging structure 160 .
优选地,盖板190的第一倾斜面1901和第二倾斜面1902形成为连续的弧面,充电结构160从连续的弧面伸出。Preferably, the first inclined surface 1901 and the second inclined surface 1902 of the cover plate 190 are formed as continuous arc surfaces, and the charging structure 160 protrudes from the continuous arc surfaces.
当然,充电结构160可以从第一倾斜面1901伸出或者从第二倾斜面1902伸出。Of course, the charging structure 160 may protrude from the first inclined surface 1901 or protrude from the second inclined surface 1902 .
在本说明书的描述中,参考术语“一个实施例/方式”、“一些实施例/方式”、“示例”、“具体示例”、或“一些示例”等的描述意指结合该实施例/方式或示例描述的具体特征、结构、材料或者特点包含于本申请的至少一个实施例/方式或示例中。在本说明书中,对上述术语的示意性表述不必须针对的是相同的实施例/方式或示例。而且,描述的具体特征、结构、材料或者特点可以在任一个或多个实施例/方式或示例中以合适的方式结合。此外,在不相互矛盾的情况下,本领域的技术人员可以将本说明书中描述的不同实施例/方式或示例以及不同实施例/方式或示例的特征进行结合和组合。In the description of this specification, references to the terms "one embodiment/mode", "some embodiments/modes", "example", "specific example", or "some examples", etc. are intended to be combined with the description of the embodiment/mode A particular feature, structure, material, or characteristic described by way of example or example is included in at least one embodiment/mode or example of the present application. In this specification, schematic representations of the above terms are not necessarily directed to the same embodiment/mode or example. Furthermore, the particular features, structures, materials or characteristics described may be combined in any suitable manner in any one or more embodiments/means or examples. Furthermore, those skilled in the art may combine and combine the different embodiments/modes or examples described in this specification and the features of the different embodiments/modes or examples without conflicting each other.
此外,术语“第一”、“第二”仅用于描述目的,而不能理解为指示或暗示相对重要性或者隐含指明所指示的技术特征的数量。由此,限定有“第一”、“第二”的特征可以明示或者隐含地包括至少一个该特征。在本申请的描述中,“多个”的含义是至少两个,例如两个,三个等,除非另有明确具体的限定。In addition, the terms "first" and "second" are only used for descriptive purposes, and should not be construed as indicating or implying relative importance or implying the number of indicated technical features. Thus, a feature delimited with "first", "second" may expressly or implicitly include at least one of that feature. In the description of the present application, "plurality" means at least two, such as two, three, etc., unless expressly and specifically defined otherwise.
本领域的技术人员应当理解,上述实施方式仅仅是为了清楚地说明本公开,而并非是对本公开的范围进行限定。对于所属领域的技术人员而言,在上述公开的基础上还可以做出其它变化或变型,并且这些变化或变型仍处于本公开的范围内。It should be understood by those skilled in the art that the above embodiments are only for clearly illustrating the present disclosure, but not for limiting the scope of the present disclosure. For those skilled in the art, other changes or modifications may also be made on the basis of the above disclosure, and these changes or modifications are still within the scope of the present disclosure.

Claims (39)

  1. 一种基站,其特征在于,包括:A base station, characterized in that it includes:
    清洁液体供给部,所述清洁液体供给部用于存储清洁液体;a cleaning liquid supply part, the cleaning liquid supply part is used for storing the cleaning liquid;
    充电结构,所述充电结构用于向停靠于所述基站的表面清洁设备提供电能,并实现所述表面清洁设备的充电;以及a charging structure, the charging structure is used to provide electric power to the surface cleaning equipment docked at the base station, and realize the charging of the surface cleaning equipment; and
    连接接口,所述连接接口连接至所述清洁液体供给部,当所述表面清洁设备停靠于所述基站时,所述表面清洁设备的清洁液体存储部连接于所述连接接口,以将所述清洁液体供给部的清洁液体通过所述连接接口输送至所述清洁液体存储部,或者将所述清洁液体存储部内的清洁液体通过所述连接接口输送至所述清洁液体供给部;a connection interface, the connection interface is connected to the cleaning liquid supply part, when the surface cleaning device is docked at the base station, the cleaning liquid storage part of the surface cleaning device is connected to the connection interface to connect the surface cleaning device The cleaning liquid of the cleaning liquid supply part is transported to the cleaning liquid storage part through the connection interface, or the cleaning liquid in the cleaning liquid storage part is transported to the cleaning liquid supply part through the connection interface;
    其中,所述连接接口所处的位置所在水平面低于充电结构所处的位置所在水平面。Wherein, the level where the connection interface is located is lower than the level where the charging structure is located.
  2. 如权利要求1所述的基站,其特征在于,所述充电结构包括多个插针,所述表面清洁设备的充电接头为插孔,当将所述充电结构的插针插入所述充电接头的插孔内时,所述基站向所述表面清洁设备提供电能;或者,所述充电结构包括多个插孔,所述插孔的至少部分内表面形成为电极,所述表面清洁设备的充电接头为插针,当将所述表面清洁设备的插针插入于所述充电结构的插孔内时,所述基站向所述表面清洁设备提供电能。The base station according to claim 1, wherein the charging structure includes a plurality of pins, the charging connector of the surface cleaning device is a jack, and when the pins of the charging structure are inserted into the charging connector When inside the jack, the base station provides power to the surface cleaning device; or, the charging structure includes a plurality of jacks, at least part of the inner surface of the jacks is formed as an electrode, and the charging connector of the surface cleaning device For the pins, the base station provides power to the surface cleaning device when the pins of the surface cleaning device are inserted into the receptacles of the charging structure.
  3. 如权利要求1所述的基站,其特征在于,所述充电结构包括充电触点,所述表面清洁设备的充电接头包括充电触片,当将所述充电结构的充电触点接触所述充电接头的充电触片时,所述基站向所述表面清洁设备提供电能;或者,所述充电结构包括充电触片,所述表面清洁设备的充电接头包括充电触点,当将所述充电结构的充电触片接触所述充电接头的充电触点时,所述基站向所述表面清洁设备提供电能。The base station of claim 1, wherein the charging structure includes a charging contact, and the charging connector of the surface cleaning device includes a charging contact piece, and when the charging contact of the charging structure is brought into contact with the charging connector When the charging contacts are connected, the base station provides electrical energy to the surface cleaning device; or, the charging structure includes a charging contact, and the charging connector of the surface cleaning device includes a charging contact, when the charging structure is charged The base station provides electrical power to the surface cleaning device when the contacts contact the charging contacts of the charging connector.
  4. 如权利要求1所述的基站,其特征在于,还包括:The base station of claim 1, further comprising:
    支撑组件,所述支撑组件设置于所述基站的外壳,用于支撑所述连接接口。A support assembly, which is arranged on the casing of the base station and used to support the connection interface.
  5. 如权利要求4所述的基站,其特征在于,所述支撑组件包括:The base station of claim 4, wherein the support assembly comprises:
    支撑板,所述支撑板固定于所述基站的外壳,或者所述支撑板形成为所述基站的外壳的一部分;以及a support plate fixed to the housing of the base station or formed as part of the housing of the base station; and
    支撑座,所述支撑座从所述支撑板向上延伸预设距离,并且所述支撑座的中部呈中空状,以使得所述连接接口的部分穿过所述支撑座,连接于第二管路。a support seat, the support seat extends upward from the support plate by a predetermined distance, and the middle part of the support seat is hollow, so that the part of the connection interface passes through the support seat and is connected to the second pipeline .
  6. 如权利要求5所述的基站,其特征在于,所述连接接口包括:The base station of claim 5, wherein the connection interface comprises:
    主体部,所述主体部呈中空状;a main body part, the main body part is hollow;
    底座部,所述底座部设置于所述主体部的下端,用于封闭所述主体部的下端;a base part, the base part is arranged at the lower end of the main body part and is used to close the lower end of the main body part;
    法兰部,所述法兰部设置于所述主体部的上端,并且所述法兰部的外边缘的至少一部分支撑在所述支撑座的上端;以及a flange portion, the flange portion is provided on the upper end of the main body portion, and at least a part of the outer edge of the flange portion is supported on the upper end of the support seat; and
    连接接头,所述连接接头设置于底座部,并位于所述底座部的下方,以通过所述连接接头连接于第二管路,使得连接接口与所述清洁液体供给部连通。a connection joint, which is arranged on the base part and located below the base part, so as to be connected to the second pipeline through the connection joint, so that the connection interface is communicated with the cleaning liquid supply part.
  7. 如权利要求6所述的基站,其特征在于,所述连接接口还包括:The base station of claim 6, wherein the connection interface further comprises:
    抵触件,所述抵触件的一端设置于所述底座部,并且位于所述底座部的上方,所述抵触件的上端与所述底座部间隔预设距离。a resisting piece, one end of the resisting piece is disposed on the base part and located above the base part, and the upper end of the resisting piece is spaced from the base part by a preset distance.
  8. 如权利要求7所述的基站,其特征在于,所述抵触件的横截面为十字形。The base station according to claim 7, wherein the cross section of the interference member is cross-shaped.
  9. 如权利要求6所述的基站,其特征在于,沿远离所述基站的外壳的方向,所述法兰部的上端向上倾斜。6. The base station of claim 6, wherein an upper end of the flange portion is inclined upward in a direction away from the housing of the base station.
  10. 如权利要求1所述的基站,其特征在于,还包括:The base station of claim 1, further comprising:
    盖板,所述盖板能够在第一位置和第二位置之间运动,其中,当所述盖板位于所述第一位置时,所述盖板覆盖所述连接接口,当所述盖板位于第二位置时,使得所述连接接口露出。a cover plate movable between a first position and a second position, wherein when the cover plate is in the first position, the cover plate covers the connection interface, and when the cover plate is in the first position When in the second position, the connection interface is exposed.
  11. 如权利要求10所述的基站,其特征在于,所述充电结构设置于所述盖板上方的基站的外壳,或者设置于所述盖板。The base station according to claim 10, wherein the charging structure is arranged on a casing of the base station above the cover plate, or is arranged on the cover plate.
  12. 如权利要求11所述的基站,其特征在于,当向所述盖板施加外力时,所述盖板从第一位置运动至第二位置,并且当外力消失时,所述盖板从第二位置运动至第一位置。The base station of claim 11, wherein when an external force is applied to the cover plate, the cover plate moves from the first position to the second position, and when the external force disappears, the cover plate moves from the second position The position moves to the first position.
  13. 如权利要求11所述的基站,其特征在于,所述盖板的一端可转动地连接于所述基站的外壳,并且所述盖板能够在所述第一位置和第二位置之间摆动。The base station of claim 11, wherein one end of the cover plate is rotatably connected to the housing of the base station, and the cover plate can swing between the first position and the second position.
  14. 如权利要求13所述的基站,其特征在于,所述盖板连接于所述基站的外壳的一端位于所述基站的外壳的内部,所述基站的外壳开设有通孔,当所述盖板运动至第一位置时,所述盖板的下端穿过所述基站的外壳,位于所述基站的外壳的外部,并覆盖所述连接接口;当所述盖板运动至第二位置时,所述盖板的至少部分位于所述基站的外壳内。The base station according to claim 13, wherein one end of the cover plate connected to the casing of the base station is located inside the casing of the base station, and the casing of the base station is provided with a through hole, when the cover plate is When moving to the first position, the lower end of the cover plate passes through the casing of the base station, is located outside the casing of the base station, and covers the connection interface; when the cover plate moves to the second position, the cover plate is moved to the second position. At least part of the cover plate is located in the housing of the base station.
  15. 如权利要求11所述的基站,其特征在于,所述盖板可滑动地设置于所述基站的壳体,并且所述盖板能够在所述第一位置和第二位置之间移动。The base station of claim 11, wherein the cover plate is slidably disposed on the housing of the base station, and the cover plate is movable between the first position and the second position.
  16. 如权利要求13或15所述的基站,其特征在于,所述连接接口的法兰部上形成有限位部,当所述盖板位于所述第一位置时,所述限位部与所述盖板的表面的至少一部分接触,以通过所述限位部限制所述盖板的进一步移动。The base station according to claim 13 or 15, wherein a limiting portion is formed on the flange portion of the connection interface, and when the cover plate is located at the first position, the limiting portion and the At least a portion of the surface of the cover plate is in contact to limit further movement of the cover plate by the stopper.
  17. 如权利要求16所述的基站,其特征在于,所述限位部形成于所述法兰远离所述基站的外壳的部分。The base station according to claim 16, wherein the limiting portion is formed at a part of the flange away from the casing of the base station.
  18. 如权利要求11所述的基站,其特征在于,当所述盖板位于所述第一位置时,所述盖板的上表面形成为第一倾斜面,其中所述第一倾斜面沿远离所述基站的外壳的方向向下倾斜。The base station of claim 11, wherein when the cover plate is in the first position, the upper surface of the cover plate is formed as a first inclined surface, wherein the first inclined surface The direction of the casing of the base station is inclined downward.
  19. 如权利要求18所述的基站,其特征在于,当所述盖板位于所述第一位置时,所述盖板远离所述基站的外壳的部分形成为第二倾斜面,其中所述第二倾斜面与水平面之间形成一夹角。The base station according to claim 18, wherein when the cover plate is located at the first position, a part of the cover plate away from the casing of the base station is formed as a second inclined surface, wherein the second inclined surface is formed. An included angle is formed between the inclined plane and the horizontal plane.
  20. 如权利要求19所述的基站,其特征在于,所述连接接口远离所述基站的外壳的部分形成为第三倾斜面,其中所述第三倾斜面与水平面之间形成一夹角。The base station of claim 19, wherein a part of the connection interface away from the casing of the base station is formed as a third inclined surface, wherein an included angle is formed between the third inclined surface and the horizontal plane.
  21. 如权利要求20所述的基站,其特征在于,当通过支撑组件支撑所述连接接口时,所述支撑组件远离所述基站的外壳的部分形成为第四倾斜面,其中所述第四倾斜面与水平面之间形成一夹角,以便清洁液体沿所述第一倾斜面、第二倾斜面、第三倾斜面和/或第四倾斜面向下流动。The base station of claim 20, wherein when the connection interface is supported by a support assembly, a part of the support assembly away from the housing of the base station is formed as a fourth inclined surface, wherein the fourth inclined surface An included angle is formed with the horizontal surface, so that the cleaning liquid flows downward along the first inclined surface, the second inclined surface, the third inclined surface and/or the fourth inclined surface.
  22. 如权利要求5所述的基站,其特征在于,所述支撑板的上表面形成为倾斜表面,其中,所述支撑板的上表面沿远离所述基站的壳体的方向向下倾斜,以防止清洁液体在支撑板的上表面积聚。6. The base station of claim 5, wherein the upper surface of the support plate is formed as an inclined surface, wherein the upper surface of the support plate is inclined downward in a direction away from the housing of the base station to prevent Cleaning liquid builds up on the upper surface of the support plate.
  23. 如权利要求22所述的基站,其特征在于,所述支撑板的上表面与水平面的夹角为10-20°。The base station according to claim 22, wherein the angle between the upper surface of the support plate and the horizontal plane is 10-20°.
  24. 如权利要求5所述的基站,其特征在于,所述支撑板的前表面形成为倾斜表面,其中,所述支撑板的前表面沿接近所述基站的壳体的方向向下倾斜,以使得清洁液体从支撑板的上表面直接落入托盘。6. The base station of claim 5, wherein the front surface of the support plate is formed as an inclined surface, wherein the front surface of the support plate is inclined downward in a direction approaching the housing of the base station such that The cleaning liquid falls directly into the tray from the upper surface of the support plate.
  25. 如权利要求24所述的基站,其特征在于,所述支撑板的前表面与竖直面的夹角为10-20°。The base station according to claim 24, wherein the angle between the front surface of the support plate and the vertical plane is 10-20°.
  26. 如权利要求24所述的基站,其特征在于,在所述支撑板的前表面的下沿临近位置设置有集水槽。The base station according to claim 24, characterized in that a water collecting groove is provided at a position adjacent to the lower edge of the front surface of the support plate.
  27. 一种表面清洁系统,其特征在于,包括权利要求1至26中任一项所述的基站。A surface cleaning system, characterized by comprising the base station according to any one of claims 1 to 26.
  28. 如权利要求27所述的表面清洁系统,其特征在于,还包括:The surface cleaning system of claim 27, further comprising:
    表面清洁设备,所述表面清洁设备包括清洁液体存储部,以当所述清洁液体存储部与所述清洁液体供给部通过连接接口连通时,实现所述清洁液体存储部和清洁液体供给部之间的流体交互。A surface cleaning device comprising a cleaning liquid storage part, so as to realize the connection between the cleaning liquid storage part and the cleaning liquid supply part when the cleaning liquid storage part and the cleaning liquid supply part are communicated through a connection interface fluid interaction.
  29. 如权利要求28所述的表面清洁系统,其特征在于,所述表面清洁设备还包括:The surface cleaning system of claim 28, wherein the surface cleaning apparatus further comprises:
    充电接头,所述充电接头与所述充电结构配合,以便所述基站向所述表面清洁设备提供电能。and a charging connector, the charging connector cooperates with the charging structure, so that the base station provides power to the surface cleaning device.
  30. 如权利要求28所述的表面清洁系统,其特征在于,所述表面清洁设备还包括:The surface cleaning system of claim 28, wherein the surface cleaning apparatus further comprises:
    接头组件,所述接头组件连接于所述清洁液体存储部,以当将所述接头组件插入所述连接接口时,所述清洁液体存储部与所述清洁液体供给部之间连通。A joint assembly is connected to the cleaning liquid storage part so that when the joint assembly is inserted into the connection interface, there is communication between the cleaning liquid storage part and the cleaning liquid supply part.
  31. 如权利要求30所述的表面清洁系统,其特征在于,所述接头组件包括:31. The surface cleaning system of claim 30, wherein the joint assembly comprises:
    下壳体,所述下壳体形成有用于清洁液体通过的管路;a lower casing, the lower casing is formed with a pipeline for the passage of the cleaning liquid;
    上壳体,所述上壳体连接于所述下壳体,并且所述上壳体形成有用于清洁液体通过的管路;以及an upper casing, the upper casing is connected to the lower casing, and the upper casing is formed with a pipeline for the passage of cleaning liquid; and
    阀组件,所述阀组件设置于所述下壳体内,并能够沿所述下壳体的管路的方向运动,以当所述阀组件处于第一位置时,所述阀组件封闭所述下壳体的用于清洁液体通过的管路,当所述阀组件处于第二位置时,所述阀组件打开所述下壳体的用于清洁液体通过的管路。a valve assembly, the valve assembly is disposed in the lower casing and can move in the direction of the pipeline of the lower casing, so that when the valve assembly is in the first position, the valve assembly closes the lower casing When the valve assembly is in the second position, the valve assembly opens the pipeline of the lower casing for the passage of the cleaning liquid.
  32. 如权利要求31所述的表面清洁系统,其特征在于,所述下壳体包括:The surface cleaning system of claim 31, wherein the lower housing comprises:
    插入部,当所述接头组件连接于所述连接接口时,至少部分插入部插入于所述连接接口。The insertion part, when the connector assembly is connected to the connection interface, at least part of the insertion part is inserted into the connection interface.
  33. 如权利要求32所述的表面清洁系统,其特征在于,所述下壳体还包括:The surface cleaning system of claim 32, wherein the lower housing further comprises:
    下连接部,所述下连接部连接于所述插入部,并且所述下连接部上形成有用于固定所述下连接部的安装部。a lower connection part, the lower connection part is connected to the insertion part, and a mounting part for fixing the lower connection part is formed on the lower connection part.
  34. 如权利要求33所述的表面清洁系统,其特征在于,在所述下壳体内壁形成有向所述下壳体内部延伸的凸出部,其中,所述凸出部形成有通孔;所述阀组件沿所述通孔的内壁面滑动。The surface cleaning system of claim 33, wherein a protruding portion extending toward the interior of the lower housing is formed on the inner wall of the lower housing, wherein the protruding portion is formed with a through hole; and The valve assembly slides along the inner wall surface of the through hole.
  35. 如权利要求34所述的表面清洁系统,其特征在于,所述阀组件包括:The surface cleaning system of claim 34, wherein the valve assembly comprises:
    导杆,所述导杆可滑动地设置于所述凸出部,并且所述导杆的两端位于所述凸出部的两侧;以及a guide rod, the guide rod is slidably disposed on the protruding part, and both ends of the guide rod are located on both sides of the protruding part; and
    堵头,所述堵头设置于导杆接近所述上壳体的一端,并且当所述 阀组件位于第一位置时,所述堵头与所述下壳体的内壁面密封接触,以封闭所述下壳体的用于清洁液体通过的管路;当所述阀组件位于第二位置时,所述堵头与所述下壳体的内壁面间隔一定距离,以打开所述下壳体的用于清洁液体通过的管路。a plug, the plug is arranged at one end of the guide rod close to the upper casing, and when the valve assembly is in the first position, the plug is in sealing contact with the inner wall surface of the lower casing to seal The pipeline of the lower casing for the passage of cleaning liquid; when the valve assembly is in the second position, the plug is spaced from the inner wall surface of the lower casing at a certain distance, so as to open the lower casing for cleaning the lines through which the liquid passes.
  36. 如权利要求35所述的表面清洁系统,其特征在于,所述下连接部的内径大于所述插入部的内径,至少部分堵头的直径大于所述插入部的内径,以当所述堵头的外壁面与所述插入部的内壁面接触时,封闭所述下壳体的用于清洁液体通过的管路;当所述堵头的外壁面与所述插入部的内壁面分离时,打开所述下壳体的用于清洁液体通过的管路。36. The surface cleaning system according to claim 35, wherein the inner diameter of the lower connecting portion is larger than the inner diameter of the insertion portion, and the diameter of at least part of the plug is larger than the inner diameter of the insertion portion, so that when the plug is used When the outer wall surface of the plug is in contact with the inner wall surface of the insertion part, the pipeline for the cleaning liquid to pass through the lower casing is closed; when the outer wall surface of the plug is separated from the inner wall surface of the insertion part, it is opened. The pipeline of the lower casing is used for the passage of cleaning liquid.
  37. 如权利要求36所述的表面清洁系统,其特征在于,所述导杆远离上壳体的一端形成有轴肩,弹簧的一端设置于所述轴肩,另一端设置于所述凸出部,并且所述弹簧处于预压缩状态,以通过所述弹簧的弹力使得所述接头组件为常闭状态。The surface cleaning system according to claim 36, wherein a shaft shoulder is formed at one end of the guide rod away from the upper casing, one end of the spring is arranged on the shaft shoulder, and the other end is arranged on the protruding portion, And the spring is in a pre-compressed state, so that the joint assembly is normally closed by the elastic force of the spring.
  38. 如权利要求37所述的表面清洁系统,其特征在于,所述堵头形成为倒锥形。38. The surface cleaning system of claim 37, wherein the plug is formed as an inverted cone.
  39. 如权利要求37所述的表面清洁系统,其特征在于,所述上壳体包括:38. The surface cleaning system of claim 37, wherein the upper housing comprises:
    上连接部,所述上连接部连接于所述下连接部;以及an upper connecting portion connected to the lower connecting portion; and
    上连接管,所述上连接管的一端设置于所述上连接部,以通过将所述上连接管连接于清洁液体存储部,使得清洁液体存储部连接于所述清洁液体供给部。an upper connecting pipe, one end of the upper connecting pipe is disposed on the upper connecting part, so that the cleaning liquid storage part is connected to the cleaning liquid supply part by connecting the upper connecting pipe to the cleaning liquid storage part.
PCT/CN2022/087944 2021-02-10 2022-04-20 Base station and surface cleaning system WO2022228237A1 (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
CN202110185367 2021-02-10
CN202110454736.6A CN113243823B (en) 2021-02-10 2021-04-26 Base station and surface cleaning system
CN202110454736.6 2021-04-26
CN202120874820.9 2021-04-26
CN202120874820.9U CN215899565U (en) 2021-02-10 2021-04-26 Base station and surface cleaning system

Publications (1)

Publication Number Publication Date
WO2022228237A1 true WO2022228237A1 (en) 2022-11-03

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