WO2022196806A1 - Appareil et procédé de production de structure - Google Patents

Appareil et procédé de production de structure Download PDF

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Publication number
WO2022196806A1
WO2022196806A1 PCT/JP2022/012743 JP2022012743W WO2022196806A1 WO 2022196806 A1 WO2022196806 A1 WO 2022196806A1 JP 2022012743 W JP2022012743 W JP 2022012743W WO 2022196806 A1 WO2022196806 A1 WO 2022196806A1
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WIPO (PCT)
Prior art keywords
porous substrate
end surface
slurry
face
plate
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PCT/JP2022/012743
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English (en)
Japanese (ja)
Inventor
信吾 小林
善洋 原
岳史 鍋本
Original Assignee
三井金属鉱業株式会社
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Application filed by 三井金属鉱業株式会社 filed Critical 三井金属鉱業株式会社
Priority to CN202280021620.6A priority Critical patent/CN117043124A/zh
Priority to JP2023507204A priority patent/JPWO2022196806A1/ja
Publication of WO2022196806A1 publication Critical patent/WO2022196806A1/fr

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
    • B01D53/86—Catalytic processes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J35/00—Catalysts, in general, characterised by their form or physical properties
    • B01J35/50—Catalysts, in general, characterised by their form or physical properties characterised by their shape or configuration
    • B01J35/56—Foraminous structures having flow-through passages or channels, e.g. grids or three-dimensional monoliths
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B38/00—Porous mortars, concrete, artificial stone or ceramic ware; Preparation thereof
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
    • C04B41/81—Coating or impregnation
    • C04B41/85—Coating or impregnation with inorganic materials

Definitions

  • the present invention produces a structure (e.g., an exhaust gas purifying catalyst or its precursor) comprising a porous substrate and a functional layer (e.g., a catalyst layer or its precursor layer) provided on the porous substrate.
  • a structure e.g., an exhaust gas purifying catalyst or its precursor
  • a functional layer e.g., a catalyst layer or its precursor layer
  • a slurry containing a raw material for a catalyst layer is supplied to one end surface of a base material, and the supplied slurry is sucked from the other end surface side of the base material to form a slurry layer on the base material.
  • a manufacturing apparatus and a manufacturing method for a catalyst for industrial use are known (for example, Patent Document 1).
  • wall-flow type substrates are known as substrates for exhaust gas purification catalysts.
  • the wall-flow type substrate includes a porous tubular portion, porous partition walls provided in the tubular portion, and cells partitioned by the partition walls.
  • the cells in the wall flow type substrate are divided into an exhaust gas inflow side cell whose end on the exhaust gas inflow side is open and an end on the exhaust gas outflow side is closed, and an exhaust gas inflow side cell whose end is open on the exhaust gas outflow side and is closed on the exhaust gas inflow side. It is composed of an exhaust gas outflow side cell that is closed.
  • the wall flow type substrate In the wall-flow type substrate, the exhaust gas that has flowed in from the exhaust gas inflow side end (opening) of the exhaust gas inflow side cell passes through the porous partition wall and reaches the exhaust gas outflow side end of the exhaust gas outflow side cell ( opening). At this time, particulate matter (PM) in the exhaust gas is trapped in the pores of the partition wall. Therefore, the wall flow type substrate is useful as a filter having a PM collection function, for example, a particulate filter for gasoline engines (GPF: Gasoline Particulate Filter) or a particulate filter for diesel engines (DPF: Diesel Particulate Filter). is.
  • GPF Gasoline Particulate Filter
  • DPF Diesel Particulate Filter
  • both the tubular portion and the partition wall portion are porous. Therefore, when slurry is supplied to one end surface of the wall-flow substrate and the supplied slurry is sucked from the other end surface of the wall-flow substrate, the outer peripheral surface of the cylindrical portion of the wall-flow substrate Air flows in and the suction force at the radially outer portion of the wall-flow substrate is less than the suction force at the radially inner portion of the wall-flow substrate.
  • the slurry is supplied to the end surface of the wall flow type substrate on the exhaust gas inflow side.
  • the ends of the exhaust gas inflow side cells are open, but the ends of the exhaust gas outflow side cells are closed.
  • the present invention provides a structure (e.g., an exhaust gas purification catalyst or its precursor) comprising a porous substrate and a functional layer (e.g., a catalyst layer or its precursor layer) provided on the porous substrate.
  • a structure e.g., an exhaust gas purification catalyst or its precursor
  • a functional layer e.g., a catalyst layer or its precursor layer
  • the present invention provides an apparatus for manufacturing a structure
  • the structure is an axially extending porous substrate; and a functional layer provided on the porous substrate
  • the porous substrate is a first end face positioned on one side in the axial direction; a second end face located on the other side in the axial direction; a first cell extending in the axial direction and having an open end on the first end surface side and a closed end on the second end surface side; a second cell extending in the axial direction, having an open end on the second end face side and a closed end on the first end face side;
  • the device comprises: a slurry supply unit that supplies a slurry containing raw materials for the functional layer to the first end face side; a slurry suction part that sucks the slurry supplied to the first end face side from the second end face side and forms a slurry layer that does not reach the second end face on the inner wall of the first cell; When the slurry supplied to the first end face side is sucked from
  • the present invention also provides a method of manufacturing a structure, comprising:
  • the structure is an axially extending porous substrate; and a functional layer provided on the porous substrate,
  • the porous substrate is a first end face positioned on one side in the axial direction; a second end face located on the other side in the axial direction; a first cell extending in the axial direction and having an open end on the first end surface side and a closed end on the second end surface side; a second cell extending in the axial direction, having an open end on the second end face side and a closed end on the first end face side;
  • the method comprises the steps of: (a) supplying a slurry containing raw materials for the functional layer to the first end face; and (b) sucking the slurry supplied to the first end face from the second end face, forming a slurry layer that does not reach the second end surface on the inner wall of the first cell; In step (b), when sucking the slurry supplied to the first end face side from the second end
  • a structure e.g., an exhaust gas purification catalyst or its precursor
  • a functional layer e.g., a catalyst layer or its precursor layer
  • An apparatus and method for manufacturing wherein the length of the slurry layer formed on the radially inner portion of the wall-flow substrate and the length of the slurry layer formed on the radially outer portion of the wall-flow substrate Apparatus and methods are provided that can reduce the difference in .
  • FIG. 1 is a side view of a porous substrate according to one embodiment.
  • FIG. 2 is an end view taken along the line AA of FIG. 1.
  • FIG. 3 is an enlarged view of the area indicated by symbol R in FIG. 4 is an end view taken along the line BB of FIG. 1.
  • FIG. 5 is a schematic diagram showing the configuration of a structure manufacturing apparatus according to one embodiment.
  • FIG. 6 is a schematic plan view showing the configuration of a base material processing section according to one embodiment.
  • FIG. 7 is a schematic partial end view showing the configuration of the coating processing section according to one embodiment. In addition, FIG. 7 shows the state before the coating process is performed on the porous substrate.
  • FIG. 8 is a schematic partial end view showing the configuration of the coating processing section according to one embodiment. In addition, FIG.
  • FIG. 8 shows the state when the coating process is performed on the porous substrate.
  • FIG. 9 is a plan view of the second end surface of the porous substrate according to one embodiment.
  • FIG. 10 is an end view (end view corresponding to FIG. 4) of the porous substrate after coating treatment according to one embodiment.
  • FIG. 11 is an enlarged view of the inside of the suction tube provided with the straightening member according to the first embodiment.
  • FIG. 12 is a plan view of a rectifying plate included in the rectifying member according to the first embodiment;
  • FIG. 13 is an enlarged view of the inside of a suction tube provided with a straightening member according to the second embodiment.
  • FIG. 14 is a plan view of a first straightening vane included in the straightening member according to the second embodiment.
  • FIG. 15 is a plan view of a second rectifying plate included in the rectifying member according to the second embodiment.
  • 16 is a plan view showing an embodiment in which a through hole is formed in the second portion of the rectifying plate shown in FIG. 12.
  • FIG. 17 is a plan view showing an embodiment in which through holes are formed in the second current plate shown in FIG. 15.
  • FIG. 18 is a plan view of a current plate according to a modification.
  • FIG. 19 is an end view for explaining a modification in which a gap is formed between the suction tube and the end portion of the porous substrate on the second end surface side that has entered the suction tube.
  • FIG. 20 is a schematic partial end view showing the configuration of a coating processing section according to a modification.
  • FIG. 20 is a schematic partial end view showing the configuration of a coating processing section according to a modification.
  • FIG. 20 is a schematic partial end view showing the configuration of a coating processing section according to a modification.
  • FIG. 20 is a schematic partial end view showing the
  • FIG. 20 shows the state when the coating process is performed on the porous substrate.
  • FIG. 21 is a plan view of the first end surface of the porous base material according to the modification.
  • FIG. 22 is a plan view of a current plate according to a modification.
  • FIG. 23 is a schematic partial end view showing the configuration of a coating processing section according to a modification. In addition, FIG. 23 shows the state before the slurry supply process and the coating process are performed on the porous substrate.
  • FIG. 24 is a schematic partial end view showing the configuration of a coating processing section according to a modification. In addition, FIG. 24 shows the state when the slurry supply process is performed on the porous substrate.
  • FIG. 25 is a schematic partial end view showing the configuration of a coating processing section according to a modification. In addition, FIG. 25 shows the state when the coating process is performed on the porous substrate.
  • FIG. 26 is a diagram for explaining the radial outer portion and inner portion of the porous substrate.
  • FIG. 1 is a side view of the porous substrate 1
  • FIG. 2 is an end view of the AA line in FIG. 1
  • FIG. 3 is an enlarged view of the region indicated by symbol R in FIG. 4 is an end view taken along the line BB of FIG. 1.
  • FIG. 1 is a side view of the porous substrate 1
  • FIG. 2 is an end view of the AA line in FIG. 1
  • FIG. 3 is an enlarged view of the region indicated by symbol R in FIG. 4 is an end view taken along the line BB of FIG. 1.
  • the porous substrate 1 has a porous structure through which air can pass.
  • the material constituting the porous substrate 1 is not particularly limited, and can be appropriately selected from materials commonly used in the field of exhaust gas purification catalysts.
  • the constituent material is preferably capable of stably maintaining the shape of the porous substrate 1 even when exposed to high-temperature (for example, 400° C. or higher) exhaust gas.
  • constituent materials include ceramics. Examples of ceramics include alumina, zirconia, mullite, zircon, cordierite, aluminum titanate, silicon carbide, silicon nitride, and boron nitride.
  • the porous substrate 1 extends in the axial direction X and has an end surface S1 located on one side in the axial direction X and an end surface S2 located on the other side in the axial direction X.
  • the length P1 of the porous substrate 1 is, for example, 40 mm or more and 300 mm or less, and the diameter P2 of the end surfaces S1 and S2 of the porous substrate 1 is, for example, 30 mm or more and 250 mm or less.
  • the diameter P2 of the end surfaces S1 and S2 of the porous substrate 1 means the diameter of the circle when the end surfaces S1 and S2 of the porous substrate 1 are circular.
  • S1 and S2 are shapes other than circles (for example, polygons such as squares), they refer to diameters of circles circumscribing the shapes.
  • the porous substrate 1 includes a porous tubular portion 11 that defines the outer shape of the porous substrate 1, and a porous partition wall portion 12 provided in the tubular portion 11. and cells 13 partitioned by partition walls 12 .
  • Both the tubular portion 11 and the partition wall portion 12 have a porous structure through which air can pass.
  • the tubular portion 11 and the partition wall portion 12 are integrally molded.
  • the tubular portion 11 and the partition portion 12 are separate and joined together.
  • the porosity of the tubular portion 11 and the porosity of the partition wall portion 12 may or may not be the same.
  • the thickness of the cylindrical portion 11 and the partition wall portion 12 can be adjusted as appropriate.
  • the thickness of the cylindrical portion 11 is, for example, 100 ⁇ m or more and 3000 ⁇ m or less, and the thickness of the partition wall portion 12 is, for example, 20 ⁇ m or more and 1500 ⁇ m or less. .
  • the cylindrical portion 11 is cylindrical, but the shape of the cylindrical portion 11 can be changed as appropriate.
  • the tubular portion 11 may be, for example, an elliptical tubular shape, a rectangular tubular shape, or the like.
  • planar view shape of the cell 13 is square, but the planar view shape of the cell 13 can be changed as appropriate.
  • the planar shape of the cell 13 may be, for example, a quadrangle other than a square, a triangle such as a regular triangle, a hexagon such as a regular hexagon, an octagon such as a regular octagon, a circle, or an oval.
  • partition walls 12 exist between adjacent cells 13, and the adjacent cells 13 are partitioned by the partition walls 12.
  • the partition 12 and the cells 13 extend in the axial direction X.
  • the porous substrate 1 is a wall flow type substrate. That is, the porous substrate 1 includes a sealing portion 14 that seals the ends of some of the cells 13 on the side of the end surface S2 and a sealing portion 15 that seals the ends of the remaining cells 13 on the side of the end surface S1. and As a result, some of the cells 13 extend in the axial direction X and form cells 13a whose ends on the side of the end face S1 are open and whose ends on the side of the end face S2 are closed by the sealing portion 14. The cell 13 extends in the axial direction X and is a cell 13 b whose end on the side of the end surface S2 is open and whose end on the side of the end surface S1 is closed by the sealing portion 15 .
  • the cells 13a and 13b are arranged such that a plurality of (for example, four) cells 13b are adjacent to one cell 13a.
  • the cell 13b is partitioned by the partition wall portion 12. As shown in FIG. 4, the cells 13a and 13b are arranged such that a plurality of (for example, four) cells 13b are adjacent to one cell 13a.
  • the cell 13b is partitioned by the partition wall portion 12. As shown in FIG. 4,
  • the number of cells 13 per square inch of the porous substrate 1 can be adjusted as appropriate, but is, for example, 100 cells/inch 2 or more and 1000 cells/inch 2 or less.
  • the number of cells 13 per square inch of the porous substrate 1 is the number of cells 13a and cells 13b per square inch on a cut surface obtained by cutting the porous substrate 1 along a plane perpendicular to the axial direction X. total number.
  • FIG. 5 is a schematic diagram showing the configuration of the structure manufacturing apparatus 100. As shown in FIG.
  • the structure manufacturing apparatus 100 includes a base material processing section 2 and a control section 3 that controls the operation of the base material processing section 2 .
  • the base material treatment section 2 performs various treatments on the porous base material 1 . Various processes performed by the base material processing section 2 will be described later.
  • the control unit 3 is, for example, a computer, and includes a main control unit and a storage unit.
  • the main control section is composed of, for example, a CPU (Central Processing Unit), and controls the operation of the base material processing section 2 by reading and executing a program stored in the storage section.
  • CPU Central Processing Unit
  • FIG. 6 is a schematic plan view showing the configuration of the base material processing section 2. As shown in FIG. A dotted line in FIG. 6 represents the porous substrate 1 .
  • the base material processing section 2 includes a loading/unloading station 21 and a processing station 22 provided adjacent to the loading/unloading station 21 .
  • the loading/unloading station 21 includes a placement section 211 .
  • the porous substrate 1 is mounted on the mounting portion 211 .
  • the processing station 22 includes a transport path 221 extending in a predetermined direction, and a transport mechanism 222 provided on the transport path 221 .
  • the transport mechanism 222 includes a holding mechanism that holds the porous substrate 1, and is configured to be capable of horizontal and vertical movement and rotation about the vertical axis.
  • the processing station 22 includes a coating processing section 4 .
  • the processing station 22 may include a baking processing section.
  • the baking treatment section dries the porous substrate 1 coated by the coating treatment section 4 as necessary, and then bakes it.
  • the transport mechanism 222 transports the porous substrate 1 between the placing section 211 and the coating processing section 4 .
  • the transport mechanism 222 carries the porous substrate 1 placed on the placement unit 211 into the coating processing unit 4, carries out the coated porous substrate 1 from the coating processing unit 4, and places it. It is placed on the part 211 .
  • the transport mechanism 222 may transport the porous substrate 1 between the coating processing section 4 and the firing processing section and between the firing processing section and the placing section 211 .
  • the transport mechanism 222 carries the porous substrate 1 placed on the placement unit 211 into the coating processing unit 4, carries out the coated porous substrate 1 from the coating processing unit 4, and bakes it.
  • the porous substrate 1 after the baking treatment may be carried out from the baking treatment part and placed on the placing part 211 .
  • FIG. 7 and 8 are schematic partial end views showing the configuration of the coating processing section 4
  • FIG. 9 is a plan view of the second end surface T2 of the porous substrate 1
  • FIG. 5 is an end view of the porous substrate 1 (end view corresponding to FIG. 4).
  • FIG. 7 shows the state before the coating process is performed on the porous substrate 1
  • FIG. 8 shows the state when the coating process is performed on the porous substrate 1.
  • the coating processing unit 4 performs coating processing on the porous substrate 1 .
  • the porous substrate 1 is coated with the slurry M to form a slurry layer N on the porous substrate 1 (see FIG. 10).
  • the slurry layer N becomes a catalyst layer by being dried as necessary and then calcined.
  • the coating processing section 4 includes a chamber C.
  • a coating process for the porous substrate 1 is performed in the chamber C. As shown in FIG.
  • the coating processing section 4 includes a substrate holding section 41 that holds the porous substrate 1 .
  • the coating process for the porous substrate 1 is performed while the porous substrate 1 is held by the substrate holder 41 .
  • the substrate holding part 41 has a holding mechanism that holds the porous substrate 1 .
  • the substrate holding unit 41 has, for example, a chuck mechanism such as a hand chuck, and holds the porous substrate 1 by gripping the central portion of the cylindrical portion 11 of the porous substrate 1 with the chuck mechanism.
  • the substrate holding unit 41 is configured so that the held porous substrate 1 can be moved in horizontal and vertical directions, rotated around the vertical axis, rotated around the horizontal axis, and the like. may
  • the substrate holding portion 41 is configured such that the first end surface T1 of the porous substrate 1 faces the nozzle 422 side of the slurry supply portion 42 (upper side in FIGS. 7 and 8), and the porous substrate The porous substrate 1 is held so that the second end face T2 of the substrate 1 faces the suction pipe 461 side of the slurry suction part 46 (lower side in FIGS. 7 and 8).
  • the first end surface T1 of the porous substrate 1 is one of the end surfaces S1 and S2 of the porous substrate 1, and the second end surface T2 of the porous substrate 1 is the end surface S1 and S2 of the porous substrate 1.
  • the end surface S2 corresponds to the second end surface T2.
  • the end surface S1 corresponds to the second end surface T2.
  • the end surface S1 corresponds to the second end surface T2.
  • the end surface S1 is the first end surface T1
  • the end surface S2 is the second end surface T2.
  • the second end face T2 of the porous substrate 1 includes an annular (for example, annular) outer edge region T21 located radially outside the second end face T2 and an outer edge region T21 located radially outward of the second end face T2. It is partitioned into a central region T22 located inside T21. Boundary line L2 is a virtual line. In FIG. 9, the openings of the cells 13b present on the second end surface T2 are omitted.
  • the area of the central region T22 is preferably 40% or more and 90% or less of the area of the second end surface T2, and more preferably 65% or more and 85% or less.
  • the shape of the central region T22 and the shape of the second end face T2 are preferably similar shapes.
  • the shape of the central region T22 means the shape defined by the outline of the central region T22 (that is, the boundary line L2), and the shape of the second end surface T2 means the shape defined by the outline of the second end surface T2. means.
  • the outer edge region T21 is preferably formed with a predetermined width along the outline of the second end face T2 so that the shape of the central region T22 and the shape of the second end face T2 are similar. As long as the shape of the central region T22 and the shape of the second end surface T2 are similar, the width of the outer edge region T21 may or may not be constant.
  • the porous substrate 1 carried into the coating processing section 4 by the transport mechanism 222 may be held by the transport mechanism 222 as it is.
  • the transport mechanism 222 functions as the substrate holder 41 .
  • the coating processing section 4 includes a slurry supply section 42 that supplies the slurry M to the first end surface T1 side of the porous substrate 1 .
  • the slurry supply unit 42 includes a storage tank 421 in which the slurry M is stored, a nozzle 422 for discharging the slurry M toward the first end surface T1 of the porous substrate 1, and a storage and a supply pipe 423 for supplying the slurry M in the tank 421 to the nozzle 422 .
  • the slurry supply unit 42 supplies the slurry M in the storage tank 421 to the nozzle 422 through the supply pipe 423 and discharges the slurry M from the nozzle 422 onto the first end surface T1 of the porous substrate 1, whereby the porous substrate 1 is A slurry M is supplied to the first end face T1.
  • the slurry M contains raw materials for the functional layer provided on the porous substrate 1 .
  • the viscosity of the slurry M is, for example, 100 mPa s or more and 1000 mPa s or less when measured using a cone and plate type viscometer at a temperature of 25 ° C. and a shear rate of 380 s -1 .
  • the velocity is measured as 4 s ⁇ 1 , it is, for example, 1000 mPa ⁇ s or more and 10000 mPa ⁇ s or less.
  • a functional layer is a layer having a predetermined function, and the type of functional layer is appropriately selected according to the type of structure to be manufactured.
  • the structure to be manufactured is an exhaust gas purifying catalyst or its precursor
  • the functional layer is a catalyst layer or its precursor layer.
  • the catalyst layer is formed by calcining the slurry layer N after drying it if necessary.
  • the precursor layer of the catalyst layer includes the slurry layer N before drying and the slurry layer N after drying.
  • the exhaust gas purifying catalyst is a structure comprising a porous substrate 1 and a catalyst layer provided on the porous substrate 1 .
  • the precursor of the exhaust gas purifying catalyst includes a structure including a porous substrate 1 and a slurry layer N before drying provided on the porous substrate 1, a porous substrate 1, and a porous substrate A structure comprising a slurry layer N after drying provided on the material 1 is included.
  • the slurry M contains a catalytically active component and a dispersion medium.
  • catalytically active components include Au (gold element), Ag (silver element), Pt (platinum element), Pd (palladium element), Rh (rhodium element), Ir (iridium element), Ru (ruthenium element), Noble metal elements such as Os (osmium element) are included.
  • the slurry M contains, for example, a noble metal element in the form of a salt of the noble metal element, which is a supply source of the noble metal element.
  • salts of noble metal elements include nitrates, ammine complex salts, and chlorides. The content of the noble metal element in the slurry M can be adjusted as appropriate.
  • dispersion media examples include water and organic solvents.
  • the dispersion medium may be one solvent or a mixture of two or more solvents.
  • organic solvents include alcohol, acetone, dimethylsulfoxide, dimethylformamide and the like.
  • the slurry M may contain a carrier that supports catalytically active components.
  • the catalytically active component is supported on the carrier by, for example, being physically or chemically adsorbed or retained on the outer surface or inner surface of pores of the carrier.
  • the carrier examples include inorganic oxide particles.
  • the inorganic oxide constituting the inorganic oxide particles may be an inorganic oxide having oxygen storage capacity (OSC: Oxygen Storage Capacity) (hereinafter referred to as “oxygen storage component”), or an inorganic oxide other than the oxygen storage component. It may be an oxide.
  • OSC Oxygen Storage Capacity
  • the oxygen storage component examples include cerium oxide, composite oxides containing cerium element and zirconium element (hereinafter referred to as "CeO 2 —ZrO 2 -based composite oxide"), and the like.
  • the CeO 2 —ZrO 2 -based composite oxide may contain metal elements other than the cerium element and the zirconium element.
  • metal elements other than the cerium element and the zirconium element include rare earth elements other than the cerium element, alkaline earth metals, and transition metals.
  • inorganic oxides other than oxygen storage components include alumina, silica, silica-alumina, alumino-silicate, alumina-zirconia, alumina-chromia, alumina-ceria, alumina-lanthana, and titania.
  • the slurry M may contain a stabilizer.
  • stabilizers include nitrates, carbonates, oxides and sulfates of alkaline earth metal elements.
  • the slurry M may contain a binder component.
  • binder components include inorganic binders such as alumina sol.
  • the coating processing section 4 includes a nozzle moving mechanism 43 that moves the nozzle 422. As shown in FIGS. 7 and 8, the coating processing section 4 includes a nozzle moving mechanism 43 that moves the nozzle 422. As shown in FIGS. 7 and 8, the coating processing section 4 includes a nozzle moving mechanism 43 that moves the nozzle 422. As shown in FIGS. 7 and 8, the coating processing section 4 includes a nozzle moving mechanism 43 that moves the nozzle 422. As shown in FIGS.
  • the nozzle moving mechanism 43 includes a nozzle holding portion 431 that holds the nozzle 422 and a lifting mechanism 432 that lifts and lowers the nozzle holding portion 431 .
  • the nozzle moving mechanism 43 moves the nozzle 422 closer to the porous substrate 1 by lowering the nozzle holding part 431 by the lifting mechanism 432 to the slurry supply position shown in FIG. Further, the nozzle moving mechanism 43 moves the nozzle 422 away from the porous substrate 1 and moves it to the standby position shown in FIG. The nozzle 422 discharges the slurry M toward the first end surface T1 of the porous substrate 1 at the slurry supply position shown in FIG.
  • the relative position between the porous substrate 1 and the nozzle 422 is changed by moving the nozzle 422 with the nozzle moving mechanism 43. By moving , the relative position between the porous substrate 1 and the nozzle 422 may be changed.
  • the coating processing section 4 includes a jig 44. As shown in FIGS. 7 and 8, the coating processing section 4 includes a jig 44. As shown in FIG.
  • the jig 44 has a tubular shape such as a cylindrical shape, and the inner diameter of the jig 44 is larger than the outer diameter of the porous substrate 1 .
  • the jig 44 is attached to the nozzle holder 431 so as to surround the nozzle 422 . Therefore, the jig 44 is moved together with the nozzle 422 by the nozzle moving mechanism 43 .
  • the coating processing section 4 includes a first substrate fixing section 45. As shown in FIG.
  • the first substrate fixing portion 45 is provided at the lower end portion of the jig 44, and the end of the porous substrate 1 entering the jig 44 on the first end surface T1 side The part is fixed in jig 44 .
  • the first base material fixing part 45 has, for example, a chuck mechanism such as a balloon type chuck. When the end of the porous substrate 1 on the side of the first end surface T1 enters the jig 44, the balloon of the balloon-type chuck is not inflated so as not to hinder the entry.
  • the end portion of the porous substrate 1 on the side of the first end surface T1 enters the jig 44 it is expanded by the air pressure, and the end portion of the porous substrate 1 on the side of the first end surface T1 that has entered the jig 44 is removed by the jig. 44.
  • the balloon held by the balloon-type chuck fills the space between the jig 44 and the end of the porous base material 1 on the first end surface T1 side that has entered the jig 44 without any gap, and the balloon is discharged from the storage space V1. Prevent the slurry M from leaking.
  • the coating processing unit 4 sucks the slurry M supplied to the first end surface T1 side of the porous substrate 1 from the second end surface T2 side of the porous substrate 1, A slurry suction part 46 for forming a slurry layer N on the inner wall of the first cell of the substrate 1 is provided.
  • the first cell of the porous substrate 1 is a cell having an opening in the first end surface T1 of the porous substrate 1.
  • the cell 13a is the first cell and the cell 13b is the second cell.
  • the cell 13b is the first cell and the cell 13a is the second cell.
  • the cell 13a is the first cell and the cell 13b is the second cell.
  • the slurry suction unit 46 includes a suction tube 461 and a suction mechanism 462 connected to the lower end of the suction tube 461.
  • the suction tube 461 has a tubular shape such as a cylindrical shape, and the inner diameter of the suction tube 461 is larger than the outer diameter of the porous substrate 1 .
  • the suction tube moving mechanism 47 brings the suction tube 461 closer to the porous substrate 1 and moves it to the slurry suction position shown in FIG. inside the suction tube 461, a suction space V2 is formed in which the slurry M supplied to the first end face T1 side of the porous substrate 1 can be sucked.
  • the suction mechanism 462 includes, for example, a pump, and depressurizes the suction space V2 inside the suction pipe 461. As a result, an air flow is generated from the first end surface T1 of the porous substrate 1 toward the second end surface T2 of the porous substrate 1, and the slurry M supplied to the first end surface T1 side of the porous substrate 1 is sucked toward the second end surface T2 of the porous substrate 1 . Specifically, the slurry M supplied to the first end surface T1 side of the porous substrate 1 is introduced into the cells 13a and flows along the inner walls of the cells 13a from the first end surface T1 to the second end surface T2. As a result, as shown in FIG.
  • the inner walls of the cells 13 a are formed from the first end surface T1 of the porous substrate 1 to the porous substrate 1 so as not to reach the second end surface T2 of the porous substrate 1 .
  • a slurry layer N extending toward the second end surface T2 of is formed.
  • the coating processing section 4 includes a suction tube moving mechanism 47 that moves the suction tube 461. As shown in FIGS. 7 and 8, the coating processing section 4 includes a suction tube moving mechanism 47 that moves the suction tube 461. As shown in FIGS.
  • the suction tube moving mechanism 47 moves the suction tube 461 to the slurry suction position shown in FIG. Further, the suction tube moving mechanism 47 moves the suction tube 461 to the standby position shown in FIG. 7 by lowering the suction tube 461 away from the porous substrate 1 .
  • the suction mechanism 462 decompresses the suction space V2 inside the suction pipe 461 when the suction pipe 461 is at the slurry suction position shown in FIG.
  • the suction tube moving mechanism 47 moves the suction tube 461 to change the relative position between the porous substrate 1 and the suction tube 461 .
  • the suction tube moving mechanism 47 moves the suction tube 461 to change the relative position between the porous substrate 1 and the suction tube 461 .
  • the relative positions of the porous substrate 1 and the suction tube 461 may be changed.
  • the coating processing section 4 includes a second base material fixing section 48 .
  • the second base material fixing part 48 is provided at the upper end of the suction tube 461 and fixes the second end surface T2 side end of the porous base material 1 that has entered the suction tube 461 inside the suction tube 461 .
  • the second base material fixing portion 48 has, for example, a chuck mechanism such as a balloon type chuck. When the end of the porous substrate 1 on the side of the second end surface T2 enters the suction tube 461, the balloon of the balloon-type chuck is not inflated so as not to hinder the entry.
  • the porous substrate 1 on the second end surface T2 side After the end portion of the porous substrate 1 on the second end surface T2 side enters the suction tube 461 , the porous substrate 1 is expanded by air pressure to fix the end portion on the second end surface T2 side of the porous substrate 1 inside the suction tube 461 .
  • the balloon held by the balloon-type chuck fills the gap between the suction tube 461 and the end portion of the porous substrate 1 on the second end surface T2 side that has entered the suction tube 461, and seals the suction space V2. do.
  • the air outside the suction pipe 461 is It does not flow into the through-hole formed in the rectifying member 40 in the suction tube 461 along the outer peripheral surface of 1 .
  • the air outside the suction tube 461 flows along the outer peripheral surface of the porous substrate 1 through holes formed in the straightening plate 49a inside the suction tube 461 (for example, the straightening plate 49a). does not flow into the first through hole G) formed in the first portion 491 of the .
  • air outside the suction pipe 461 is formed along the outer peripheral surface of the porous substrate 1 in the first straightening plate 49b and the second straightening plate 50 inside the suction pipe 461.
  • Through holes for example, a first through hole G formed in the first portion 491 of the first straightening plate 49b, a second through hole J formed in the second portion 492 of the first straightening plate 49b, a second straightening plate 50 Do not flow into the through holes, etc. formed in the
  • the coating processing section 4 includes a straightening member 40. As shown in FIGS. 7 and 8, the straightening member 40 is illustrated in a simplified manner.
  • the straightening member 40 is arranged inside the suction tube 461 .
  • the straightening member 40 is fixed inside the suction pipe 461 so that its position does not change even if the suction space V2 inside the suction pipe 461 is decompressed.
  • the straightening member 40 can be fixed within the suction tube 461 by, for example, a holding mechanism or a supporting mechanism.
  • the rectifying member 40 is positioned between the second substrate fixing portion 48 provided at the upper end of the suction tube 461 and the suction mechanism 462 connected to the lower end of the suction tube 461. are placed.
  • the rectifying member 40 moves toward the second end surface T2 of the porous substrate 1. It is located apart from the second end surface T2. That is, when the slurry M supplied to the first end face T1 side of the porous base material 1 is sucked from the second end face T2 side of the porous base material 1, the rectifying member 40 moves toward the second end face T2 of the porous base material 1. It is located on the side of the end face T2 and is spaced apart from the second end face T2 of the porous substrate 1 .
  • the rectifying member 40 moves toward the second end surface T2 of the porous substrate 1. At least part of the central region T22 of the porous substrate 1 is covered, and at least part of the outer edge region T21 of the second end surface T2 of the porous substrate 1 is exposed.
  • the rectifying member 40 covers at least a part of the central region T22 of the second end surface T2 of the porous substrate 1
  • the porous substrate is in a state where the suction pipe 461 is at the slurry suction position shown in FIG. 1 and the rectifying member 40 in plan view from the axial direction X of the porous substrate 1, the portion of the rectifying member 40 other than the through holes is the center of the second end surface T2 of the porous substrate 1. It means overlapping with at least part of the region T22.
  • the rectifying member 40 may cover the entire central region T22 of the second end surface T2 of the porous substrate 1, or may cover a part of the central region T22 of the second end surface T2 of the porous substrate 1. good too.
  • the rectifying member 40 may expose the entire outer edge region T21 of the second end surface T2 of the porous substrate 1, or expose a part of the outer edge region T21 of the second end surface T2 of the porous substrate 1. good too.
  • the rectifying member 40 covers at least a part of the central region T22 of the second end surface T2 of the porous substrate 1, it is difficult for air to flow in the radially inner portion of the porous substrate 1. Since the rectifying member 40 exposes at least a portion of the outer edge region T21 of the second end surface T2 of the porous substrate 1, air can easily flow through the radially outer portion of the porous substrate 1.
  • the difference between the suction force applied to the radially inner portion of the porous substrate 1 and the suction force applied to the radially outer portion of the porous substrate 1 becomes small, The difference between the length of the slurry layer N formed on the inner portion and the length of the slurry layer N formed on the radially outer portion of the porous substrate 1 is reduced.
  • FIG. 11 is an enlarged view of the inside of the suction tube 461 provided with the straightening member 40a
  • FIG. 12 is a plan view of the straightening plate 49a provided in the straightening member 40a
  • 11 is an enlarged view of the inside of the suction pipe 461 at the slurry suction position shown in FIG.
  • the rectifying member 40a is used as the rectifying member 40.
  • the straightening member 40a includes a straightening plate 49a.
  • the rectifying member 40a may be composed of the rectifying plate 49a, or may have a member other than the rectifying plate 49a as long as the effect of the rectifying member 40a, which will be described later, is exhibited.
  • the material of the current plate 49a is, for example, resin, ceramics, metal, or the like.
  • the thickness of the current plate 49a can be adjusted as appropriate, and is, for example, 1 mm or more and 15 mm or less, preferably 1 mm or more and 5 mm or less.
  • the thickness of the current plate 49a may be constant or may not be constant.
  • both the minimum value and the maximum value of the thickness of the rectifying plate 49a are preferably within the above ranges.
  • the current plate 49a is arranged inside the suction pipe 461. As shown in FIG. 11, the current plate 49a is arranged inside the suction pipe 461. As shown in FIG. The straightening plate 49a is fixed inside the suction pipe 461 so that its position does not change even if the suction space V2 inside the suction pipe 461 is decompressed.
  • the straightening plate 49a is held by, for example, a holding mechanism (for example, a chuck mechanism (eg, hand chuck) provided on the inner wall of the suction tube 461 that grips the outer edge of the straightening plate 49a), or a supporting mechanism (eg, It can be fixed in the suction tube 461 by a support rod provided between the straightening plate 49 a and the suction mechanism 462 and supporting the surface of the straightening plate 49 a on the side of the suction mechanism 462 .
  • a holding mechanism for example, a chuck mechanism (eg, hand chuck) provided on the inner wall of the suction tube 461 that grips the outer edge of the straightening plate 49a
  • a supporting mechanism eg, It can be fixed in the suction tube 461 by a support rod provided between the straightening plate 49 a and the suction mechanism 462 and supporting the surface of the straightening plate 49 a on the side of the suction mechanism 462 .
  • the straightening plate 49a is arranged between the second substrate fixing portion 48 provided at the upper end of the suction tube 461 and the suction mechanism 462 connected to the lower end of the suction tube 461. ing.
  • the rectifying plate 49a moves toward the second end surface T2 of the porous substrate 1 and moves toward the second end surface T2 of the porous substrate 1. As shown in FIG. It is located apart from the end surface T2. That is, when the slurry M supplied to the first end surface T1 side of the porous substrate 1 is sucked from the second end surface T2 side of the porous substrate 1, the rectifying plate 49a moves toward the second end surface T2 of the porous substrate 1. It is located on the side of the end face T2 and is spaced apart from the second end face T2 of the porous substrate 1 .
  • the distance between the current plate 49a and the second end surface T2 of the porous substrate 1 becomes the distance D2a.
  • the distance D2a is the distance between the second end face T2 side of the current plate 49a and the second end face T2 of the porous substrate 1 .
  • the main surface of the current plate 49a on the second end surface T2 side is substantially parallel to the second end surface T2 of the porous substrate 1.
  • the term “substantially parallel” means that the angle formed by two target surfaces is preferably 0° or more and 10° or less, more preferably 0° or more and 5° or less. In addition, parallel is also included in “substantially parallel.”
  • the rectifying plate 49a includes an annular (for example, annular) first portion 491, a second portion 492 positioned inside the first portion 491, and a second portion 492 positioned outside the first portion 491. and an annular (eg, toric) third portion 493 .
  • the first portion 491 of the straightening plate 49a is formed with an elongated first through hole G extending in the circumferential direction of the first portion 491.
  • a plan view shape of the first through hole G is an elongated shape having a width W.
  • the plan view shape and number of the first through holes G can be changed as appropriate.
  • the planar shape of the first through hole G may be, for example, circular, elliptical, square, rectangular, or a rectangular shape with rounded corners.
  • the number of first through holes G may be one, or two or more.
  • the number of first through holes G in this embodiment is four.
  • the second portion 492 of the rectifying plate 49a is not formed with through holes, but may be formed with through holes (hereinafter referred to as "second through holes").
  • the second portion 492 of the current plate 49a covers at least a portion of the central region T22 of the second end surface T2 of the porous substrate 1, and the first portion 491 of the current plate 49a.
  • the formed first through-hole G exposes at least part of the outer edge region T21 of the second end surface T2 of the porous substrate 1 .
  • the second portion 492 of the current plate 49a covers at least part of the central region T22 of the second end surface T2 of the porous substrate 1
  • the suction pipe 461 is in the slurry suction position shown in FIG. , when the second end surface T2 of the porous substrate 1 and the current plate 49a are viewed from the axial direction X of the porous substrate 1 (for example, the second end surface T2 of the porous substrate 1 is shown in the plan view of the current plate 49a). is projected), as shown in FIGS. It means overlapping with a part.
  • the second portion 492 of the straightening plate 49a When the second portion 492 of the straightening plate 49a does not have a second through hole, the second portion 492 of the straightening plate 49a covers the entire central region T22 of the second end surface T2 of the porous substrate 1, When the second portion 492 of the straightening plate 49a has the second through hole, the second portion 492 of the straightening plate 49a covers part of the central region T22 of the second end surface T2 of the porous substrate 1. .
  • the first through holes G formed in the first portion 491 of the rectifying plate 49a expose at least a portion of the outer edge region T21 of the second end surface T2 of the porous substrate 1'' means that the suction tube 461 is 8, when the second end surface T2 of the porous substrate 1 and the rectifying plate 49a are viewed from the axial direction X of the porous substrate 1 (for example, a plan view of the rectifying plate 49a shows a porous structure).
  • the first through hole G formed in the first portion 491 of the rectifying plate 49a is located at the second end surface T2 of the porous substrate 1). It means overlapping with at least part of the outer edge region T21 of the two end surfaces T2.
  • the second portion 492 of the rectifying plate 49a covers at least part of the central region T22 of the second end surface T2 of the porous substrate 1, it is difficult for air to flow through the radially inner portion of the porous substrate 1.
  • the first through holes G formed in the first portion 491 of the current plate 49a expose at least part of the outer edge region T21 of the second end surface T2 of the porous substrate 1, the porous substrate The radially outer portion of 1 facilitates air flow.
  • the difference between the suction force applied to the radially inner portion of the porous substrate 1 and the suction force applied to the radially outer portion of the porous substrate 1 becomes small, The difference between the length of the slurry layer N formed on the inner portion and the length of the slurry layer N formed on the radially outer portion of the porous substrate 1 is reduced.
  • FIG. 13 is an enlarged view of the inside of the suction pipe 461 provided with the straightening member 40b
  • FIG. 14 is a plan view of the first straightening plate 49b provided in the straightening member 40b
  • FIG. 15 is a plan view of the straightening member 40b.
  • 2 is a plan view of a second rectifying plate 50 provided in the .
  • 13 is an enlarged view of the inside of the suction pipe 461 at the slurry suction position shown in FIG.
  • a rectifying member 40b is used as the rectifying member 40.
  • the straightening member 40b includes a first straightening plate 49b and a second straightening plate 50.
  • the rectifying member 40b may be composed of the first rectifying plate 49b and the second rectifying plate 50, or other than the first rectifying plate 49b and the second rectifying plate 50 as long as the effect of the rectifying member 40b described later is exhibited. You may have a member of.
  • the material of the first current plate 49b is, for example, resin, ceramics, metal, or the like.
  • the thickness of the first current plate 49b can be adjusted as appropriate, and is, for example, 1 mm or more and 15 mm or less, preferably 1 mm or more and 5 mm or less.
  • the thickness of the first current plate 49b may be constant or may not be constant. If the thickness of the first current plate 49b is not constant, both the minimum value and the maximum value of the thickness of the first current plate 49b are preferably within the above ranges.
  • the first current plate 49b is arranged inside the suction pipe 461.
  • the first straightening plate 49b is fixed inside the suction pipe 461 so that its position does not change even if the pressure in the suction space V2 inside the suction pipe 461 is reduced.
  • the first straightening plate 49b is, for example, supported by a holding mechanism (eg, a chuck mechanism (eg, hand chuck) provided on the inner wall of the suction tube 461 that grips the outer edge of the first straightening plate 49b).
  • a mechanism for example, a support rod provided between the first straightening plate 49b and the suction mechanism 462 and supporting the surface of the first straightening plate 49b on the side of the suction mechanism 462).
  • the first straightening plate 49b is located between the second substrate fixing portion 48 provided at the upper end of the suction pipe 461 and the suction mechanism 462 connected to the lower end of the suction pipe 461. are placed.
  • the first rectifying plate 49b moves toward the second end surface T2 of the porous substrate 1. It is located apart from the second end surface T2. That is, when the slurry M supplied to the first end surface T1 side of the porous substrate 1 is sucked from the second end surface T2 side of the porous substrate 1, the first straightening plate 49b It is located on the side of the second end face T2 and separated from the second end face T2 of the porous substrate 1 .
  • the distance between the first current plate 49b and the second end surface T2 of the porous substrate 1 becomes the distance D2b.
  • the distance D2b is the distance between the main surface of the first current plate 49b on the second end surface T2 side and the second end surface T2 of the porous substrate 1 .
  • the main surface of the first current plate 49b on the second end surface T2 side is substantially parallel to the second end surface T2 of the porous substrate 1 .
  • the meaning of "substantially parallel” is as described above.
  • the first straightening plate 49b differs from the straightening plate 49a according to the first embodiment in that the second portion 492 is formed with the second through holes J.
  • Other configurations of the first straightening plate 49b are the same as those of the straightening plate 49a, and in the first straightening plate 49b, the same members or portions as the straightening plate 49a are denoted by the same reference numerals as those of the straightening plate 49a.
  • the above description of the rectifying plate 49a also applies to the first rectifying plate 49b, unless otherwise specified.
  • the planar shape of the second through holes J is circular, and the number of the second through holes J is one.
  • the planar view shape of the second through hole J can be changed as appropriate, and may be other shapes such as an elliptical shape, a square shape, a rectangular shape, a rectangular shape with rounded corners, and the like.
  • the number of second through holes J can be changed as appropriate, and may be two or more.
  • the second through hole J is not continuous with the first through hole G formed in the first portion 491, but may be continuous.
  • planar view shape of the central region T22 and the planar view shape of the second through hole J are similar shapes.
  • the second through hole J exposes at least part of the central region T22 of the second end surface T2 of the porous substrate 1.
  • the second through-hole J exposes at least a part of the central region T22 of the second end surface T2 of the porous substrate 1” means that the suction tube 461 is porous when it is in the slurry suction position shown in FIG.
  • T2 of the substrate 1 and the first current plate 49b are viewed from the axial direction X of the porous substrate 1 (for example, the second end surface of the porous substrate 1 is shown in the plan view of the first current plate 49b).
  • T2 as shown in FIGS. 13 and 14, the second through hole J overlaps at least a portion of the central region T22 of the second end surface T2 of the porous substrate 1.
  • the outline of the second end surface T2 and the outline of the central region T22 that is, the boundary line L2 projected onto the plan view of the first current plate 49b are indicated by dotted lines and chain double-dashed lines, respectively.
  • the second through hole J may expose the entire central region T22 of the second end surface T2 of the porous substrate 1, or expose a portion of the central region T22 of the second end surface T2 of the porous substrate 1. You may let When the second through hole J exposes a part of the central region T22 of the second end surface T2 of the porous substrate 1, the second portion 492 of the first current plate 49b Cover the rest of the central region T22 of T2.
  • the second through-hole J exposes a part of the central region T22 of the second end surface T2 of the porous substrate 1, and the second portion 492 of the first straightening plate 49b exposes the second end surface of the porous substrate 1.
  • the phrase "covering the remainder of the central region T22 of T2" means that the second end surface T2 of the porous substrate 1 and the first straightening plate 49b are covered with the porous substrate while the suction pipe 461 is in the slurry suction position shown in FIG. 1 (for example, when the second end surface T2 of the porous substrate 1 is projected onto the plan view of the first current plate 49b), as shown in FIGS.
  • the hole J overlaps with a part of the central region T22 of the second end surface T2 of the porous substrate 1, and the portion of the second portion 492 of the first current plate 49b other than the second through hole J overlaps with the porous substrate. It means overlapping with the rest of the central region T22 of the second end face T2 of No. 1.
  • the planar shape of the central region T22 and the second through hole J is formed with a predetermined width along the outline of the second portion 492 so that the second portion 492 of the first current plate 49b has a similar shape to the shape in plan view. It is preferable that That is, it is preferable that the planar view shape of the second portion 492 of the first current plate 49b other than the second through hole J is annular (for example, annular).
  • the width of the portion other than the second through hole J in the second portion 492 of the first current plate 49b is constant. It may be, or it may not be constant.
  • the material of the second current plate 50 is, for example, resin, ceramics, metal, or the like.
  • the thickness of the second current plate 50 can be adjusted as appropriate, and is, for example, 1 mm or more and 15 mm or less, preferably 1 mm or more and 5 mm or less.
  • the thickness of the second current plate 50 may be constant or may not be constant. When the thickness of the second current plate 50 is not constant, both the minimum value and the maximum value of the thickness of the second current plate 50 are preferably within the above ranges.
  • the second current plate 50 is arranged inside the suction pipe 461 .
  • the second straightening plate 50 is fixed inside the suction pipe 461 so that its position does not change even if the pressure in the suction space V2 inside the suction pipe 461 is reduced.
  • the second rectifying plate 50 is, for example, a connecting member that connects the first rectifying plate 49b and the second rectifying plate 50 (for example, a connecting member that connects the third portion 493 of the first rectifying plate 49b and the second rectifying plate 50).
  • member 70 see FIG.
  • the connecting member 70 is omitted.
  • the connecting member 70 overlaps a part of the first through hole G formed in the first portion 491 of the first rectifying plate 49b.
  • the area of the part of the first through hole G that overlaps with the connecting member 70 is preferably 20% or less, more preferably 10% or less, and 5% or less of the area of the first through hole G. is even more preferred. In this case, since the connecting member 70 does not interfere with the flow of air passing through the first through holes G, the effect of the rectifying member 40b, which will be described later, can be further improved.
  • the lower limit of the area of the portion of the first through-hole G that overlaps the connecting member 70 can be appropriately adjusted in consideration of the strength of the connecting member 70 and the like.
  • the "area of the first through holes G" is means the total area of
  • “the area of the first through-hole G” is the area of the first through-hole G when viewed from the axial direction X of the porous substrate 1 in plan view.
  • the second straightening plate 50 is arranged between the first straightening plate 49b and the suction mechanism 462 connected to the lower end of the suction pipe 461. As shown in FIG. That is, the second straightening plate 50 is arranged on the side opposite to the second end face T2 of the porous substrate 1 with respect to the first straightening plate 49b. This positional relationship does not change whether the suction tube 461 is at the slurry suction position or at the standby position. Therefore, when the slurry M supplied to the first end surface T1 side of the porous substrate 1 is sucked from the second end surface T2 side of the porous substrate 1, the second rectifying plate 50 moves toward the first rectifying plate 49b. On the other hand, it is located on the side opposite to the second end surface T2 of the porous substrate 1 .
  • the distance between the first rectifying plate 49b and the second rectifying plate 50 is the distance D3.
  • the distance D3 is the distance between the main surface of the first straightening plate 49b on the second straightening plate 50 side and the main surface of the second straightening plate 50 on the first straightening plate 49b side.
  • the distance D3 does not change whether the suction tube 461 is at the slurry suction position or at the standby position. Therefore, when the slurry M supplied to the first end surface T1 side of the porous substrate 1 is sucked from the second end surface T2 side of the porous substrate 1, the first rectifying plate 49b and the second rectifying plate 50 The distance is distance D3.
  • the main surface of the second current plate 50 on the second end surface T2 side is substantially parallel to the second end surface T2 of the porous substrate 1 .
  • the meaning of "substantially parallel” is as described above.
  • the second current plate 50 is not formed with through holes, but may be formed with through holes.
  • the second current plate 50 covers at least part of the second through holes J. As shown in FIGS. 13 to 15, the second current plate 50 covers at least part of the second through holes J. As shown in FIGS. 13 to 15, the second current plate 50 covers at least part of the second through holes J. As shown in FIGS. 13 to 15, the second current plate 50 covers at least part of the second through holes J.
  • the second straightening plate 50 covers at least part of the second through hole J means that the first straightening plate 49b and the second straightening plate 50 are in a state where the suction pipe 461 is at the slurry suction position shown in FIG. is viewed from the axial direction X of the porous substrate 1 (for example, when the second straightening plate 50 is projected on the plan view of the first straightening plate 49b, or when the second straightening plate 50 is projected on the plan view of the second straightening plate 50, the second 13 to 15, the portion of the second current plate 50 other than the through hole overlaps with at least a portion of the second through hole J when the through hole J is projected.
  • the outline of the second straightening plate 50 projected onto the plan view of the first straightening plate 49b is indicated by a dotted line.
  • the outline of the second through hole J projected onto the plan view of the second current plate 50 is indicated by a dotted line.
  • the second current plate 50 When the second current plate 50 does not have a through hole, the second current plate 50 covers the entire second through hole J, and when the second current plate 50 has a through hole, the second current plate 50 covers the second through hole J. The current plate 50 partially covers the second through hole J. As shown in FIG.
  • the outline of the second flow plate 50 is preferably positioned outside the outline of the second through hole J, as shown in FIGS.
  • the opening area of the second straightening plate 50 is adjusted so that the entire second through hole J becomes the second straightening plate. It is also possible to cover a part of the second through hole J with the second current plate 50 .
  • the outline of the second straightening plate 50 is positioned inside the outline of the second portion 492 of the first straightening plate 49b. preferably.
  • the second rectifying plate 50 does not interfere with the flow of air passing through the first through holes G, so that the effect of the rectifying member 40b, which will be described later, can be further improved.
  • the second through hole J formed in the first straightening plate 49b exposes at least a portion of the central region T22 of the second end surface T2 of the porous substrate 1, and the second straightening plate 50 serves as the first straightening plate. Since at least a part of the second through hole J formed in the plate 49b is covered, it is difficult for air to flow in the radially inner portion of the porous substrate 1. Since the first through holes G expose at least a portion of the outer edge region T21 of the second end surface T2 of the porous substrate 1, air can easily flow through the radially outer portion of the porous substrate 1. FIG.
  • the difference between the suction force applied to the radially inner portion of the porous substrate 1 and the suction force applied to the radially outer portion of the porous substrate 1 becomes small, The difference between the length of the slurry layer N formed on the inner portion and the length of the slurry layer N formed on the radially outer portion of the porous substrate 1 is reduced.
  • the straightening member 40b By arranging on the end surface T2 side, the following effects are exhibited.
  • the slurry M supplied to the first end surface T1 side of the porous substrate 1 is sucked from the second end surface T2 side of the porous substrate 1, the current plate 49a side, a turbulent flow occurs between the second portion 492 of the rectifying plate 49a and the second end surface T2 of the porous substrate 1, causing variations in the length of the slurry layers N (particularly, Variation in length between slurry layers N formed on the inner portion of the porous substrate 1 in the radial direction may occur.
  • the distance between the rectifying plate 49a and the second end surface T2 of the porous substrate 1, which generates turbulent flow is defined as Dx.
  • the straightening member 49b since the second through hole J is formed in the second portion 492 of the first straightening plate 49b, the first straightening plate 49b and the second end surface T2 of the porous base material 1 is Dx, turbulent flow is less likely to occur between the second portion 492 of the first rectifying plate 49b and the second end face T2 of the porous substrate 1 .
  • the second rectifying plate 50 is arranged on the opposite side of the first rectifying plate 49b from the second end surface T2 of the porous substrate 1, so that the first rectifying plate 49b and the porous Even if the distance from the second end surface T2 of the substrate 1 is Dx, the distance between the second straightening plate 50 and the second end surface T2 of the porous substrate 1 is greater than Dx, and the second straightening plate A turbulent flow is less likely to occur between 50 and the second end surface T2 of the porous substrate 1 .
  • the variation in length between the slurry layers N (in particular, the porous substrate 1 It is possible to prevent the occurrence of variations in length between the slurry layers N formed in the radially inner portion of the .
  • the structure manufacturing method of the present invention comprises the following steps: (a) a step of supplying a slurry M containing raw materials for the functional layer to the first end surface T1 side of the porous substrate 1; and (b) a slurry supplied to the first end surface T1 side of the porous substrate 1.
  • M is sucked from the second end surface T2 side of the porous substrate 1, and is applied to the inner wall of the first cell of the porous substrate 1 from the first end surface T1 of the porous substrate 1 to the second end surface of the porous substrate 1.
  • a step of forming a slurry layer N that extends toward T2 and does not reach the second end face T2 of the porous substrate 1 is included.
  • the structure manufacturing method of the present invention can be implemented by the structure manufacturing apparatus 100.
  • steps (a) and (b) are performed by the coating processing section 4 .
  • the operation of the coating processor 4 is controlled by the controller 3 .
  • the end face S1 is the first end face T1
  • the end face S2 is the second end face T2
  • the cell 13a is the first cell
  • the cell 13b is the second cell.
  • the base material loading process is performed.
  • the porous substrate 1 is loaded into the coating processing section 4 .
  • the control unit 3 controls the operation of the transport mechanism 222 to carry the porous substrate 1 placed on the placement unit 211 into the coating processing unit 4 .
  • the base material holding process is performed.
  • the porous substrate 1 carried into the coating processing section 4 is held by the substrate holding section 41 .
  • the porous substrate 1 carried into the coating processing section 4 by the transport mechanism 222 may be held by the transport mechanism 222 as it is.
  • the transport mechanism 222 functions as the substrate holder 41 .
  • the nozzle moving process and the suction pipe moving process are performed.
  • the order of the nozzle moving process and the suction tube moving process is not particularly limited. After the nozzle moving process, the suction tube moving process may be performed, after the suction tube moving process, the nozzle moving process may be performed, or the nozzle moving process and the suction tube moving process may be performed at the same time. good.
  • the nozzle moving mechanism 43 moves the nozzle 422 from the standby position shown in FIG. 7 to the slurry supply position shown in FIG.
  • the control unit 3 controls the operation of the nozzle moving mechanism 43 to control the timing of moving the nozzle 422 from the standby position to the slurry supply position, the timing of moving the nozzle 422 from the slurry supply position to the standby position, and the like.
  • a storage space V1 is formed in which the slurry M supplied to the T1 side can be stored.
  • the end portion of the porous substrate 1 on the side of the first end surface T1 that has entered the jig 44 is fixed inside the jig 44 by the first substrate fixing portion 45 .
  • the first base material fixing part 45 has, for example, a chuck mechanism such as a balloon type chuck.
  • the control unit 3 controls the operation of the first base material fixing unit 45, and determines the timing and fixing of the end of the porous base material 1 that has entered the jig 44 on the side of the first end surface T1 in the jig 44.
  • control unit 3 controls the operation of the first base material fixing unit 45, and when the end of the porous base material 1 on the first end surface T1 side enters the jig 44, After the end portion of the porous substrate 1 on the first end surface T1 side enters the jig 44 without expanding the balloon held by the balloon chuck, the balloon held by the balloon chuck is expanded by air pressure, and the jig is moved. The end portion of the porous substrate 1 on the first end surface T1 side that has entered the inside 44 is fixed inside the jig 44 .
  • the balloon held by the balloon-type chuck fills the space between the jig 44 and the end of the porous base material 1 on the first end surface T1 side that has entered the jig 44 without any gap, and the balloon is discharged from the storage space V1. Prevent the slurry M from leaking.
  • the nozzle moving mechanism 43 moves the nozzle 422 to change the relative position between the porous substrate 1 and the nozzle 422 .
  • the relative position between the porous substrate 1 and the nozzle 422 may be changed.
  • the suction tube moving mechanism 47 moves the suction tube 461 from the standby position shown in FIG. 7 to the slurry suction position shown in FIG.
  • the control unit 3 controls the operation of the suction tube moving mechanism 47, and controls the timing of moving the suction tube 461 from the standby position to the slurry suction position, the timing of moving the suction tube 461 from the slurry suction position to the standby position, and the like.
  • the end portion of the porous substrate 1 on the second end surface T2 side that has entered the suction tube 461 is fixed inside the suction pipe 461 by the second substrate fixing portion 48 .
  • the second base material fixing portion 48 has, for example, a chuck mechanism such as a balloon type chuck.
  • the control unit 3 controls the operation of the second base material fixing unit 48, and determines the timing and fixing of the second end surface T2 side end of the porous base material 1 that has entered the suction tube 461, in the suction tube 461.
  • control unit 3 controls the operation of the second base material fixing unit 48, and when the end of the porous base material 1 on the second end surface T2 side enters the suction tube 461, After the end portion of the porous substrate 1 on the second end surface T2 side enters the suction tube 461 without expanding the balloon of the balloon chuck, the balloon of the balloon chuck is expanded by the air pressure to open the suction tube. The end portion of the porous substrate 1 on the second end surface T2 side that has entered the inside of the suction tube 461 is fixed inside the suction tube 461 .
  • the balloon held by the balloon-type chuck fills the gap between the suction tube 461 and the end portion of the porous substrate 1 on the second end surface T2 side that has entered the suction tube 461, and seals the suction space V2. do. Therefore, when the slurry M supplied to the first end surface T1 side of the porous substrate 1 is sucked from the second end surface T2 side of the porous substrate 1, it does not flow into the straightening member 40 inside the suction tube 461.
  • the air outside the suction tube 461 flows along the outer peripheral surface of the porous substrate 1 through through holes formed in the rectifying plate 49a in the suction tube 461 (for example, through the through holes of the rectifying plate 49a).
  • the air outside the suction tube 461 flows along the outer peripheral surface of the porous substrate 1 and through the through holes formed in the first straightening plate 49 b and the second straightening plate 50 inside the suction tube 461 .
  • the suction tube moving mechanism 47 moves the suction tube 461 to change the relative position between the porous substrate 1 and the suction tube 461 .
  • the suction tube moving mechanism 47 moves the suction tube 461 to change the relative position between the porous substrate 1 and the suction tube 461 .
  • the relative positions of the porous substrate 1 and the suction tube 461 may be changed.
  • Step (a) is performed after the nozzle moving step and the suction tube moving step.
  • step (a) the slurry supply unit 42 supplies the slurry M to the first end surface T1 of the porous substrate 1 .
  • the slurry M supplied to the first end face T1 side of the porous substrate 1 is stored in the storage space V1.
  • the control unit 3 controls the operation of the slurry supply unit 42, and controls the timing of starting supply of the slurry M, the amount of supply of the slurry M, the timing of stopping the supply of the slurry M, and the like.
  • step (b) is performed.
  • step (b) the slurry suction part 46 sucks the slurry M supplied to the first end surface T1 side of the porous substrate 1 from the second end surface T2 side of the porous substrate 1, and the porous substrate 1 forming a slurry layer N on the inner walls of the first cells of the .
  • the suction mechanism 462 decompresses the suction space V2 inside the suction pipe 461 .
  • the slurry layer N is formed on the surface of the partition wall 12 on the cell 13a side.
  • the slurry layer N has a portion protruding from the surface of the partition wall 12 toward the cell 13a.
  • the slurry layer N may be composed only of a portion protruding from the surface of the partition wall 12 toward the cell 13a, or may have a portion present inside the partition wall 12 together with the portion. . Since the partition wall 12 is porous, the slurry layer N usually has a portion existing inside the partition wall 12 .
  • the slurry layer N may be composed only of the portion existing inside the partition wall portion 12 .
  • the slurry layer N does not reach the second end surface T2 of the porous substrate 1. That is, the length PN of the slurry layer N is smaller than the length P1 of the porous substrate 1 .
  • the length PN of the slurry layer N is preferably 10% or more and 90% or less, more preferably 20% or more and 80% or less of the length P1 of the porous substrate 1 .
  • the length PN of the slurry layer N is within the above range, the porous substrate 1 is easily uniformly coated with the slurry.
  • the control unit 3 controls the operation of the slurry suction unit 46 so that the slurry layer N does not reach the second end surface T2 of the porous substrate 1, and the timing of starting the pressure reduction of the suction space V2 in the suction pipe 461, Adjust the degree of decompression, the timing to stop decompression, etc.
  • the porous substrate is removed from the first end surface T1 of the porous substrate 1 so as not to reach the second end surface T2 of the porous substrate 1 by firing.
  • a catalyst layer extending toward the second end face T2 of the material 1 is formed on the surface of the partition wall portion 12 on the cell 13a side.
  • the catalyst layer has a portion protruding from the surface of the partition wall portion 12 toward the cell 13a.
  • the catalyst layer may consist only of a portion protruding from the surface of the partition wall 12 toward the cell 13a, or may have a portion existing inside the partition wall 12 together with the portion. Since the partition wall 12 is porous, the catalyst layer usually has a portion existing inside the partition wall 12 .
  • the catalyst layer may be composed only of the portion existing inside the partition wall portion 12 .
  • the straightening member 40 When the suction pipe 461 moves to the slurry suction position, the straightening member 40 is positioned on the second end face T2 side of the porous base material 1 and spaced from the second end face T2 of the porous base material 1 . That is, when the slurry M supplied to the first end face T1 side of the porous base material 1 is sucked from the second end face T2 side of the porous base material 1, the rectifying member 40 moves toward the second end face T2 of the porous base material 1. It is located on the side of the end face T2 and is spaced apart from the second end face T2 of the porous substrate 1 .
  • the rectifying member 40 moves toward the second end surface T2 of the porous substrate 1. At least part of the central region T22 of the porous substrate 1 is covered, and at least part of the outer edge region T21 of the second end surface T2 of the porous substrate 1 is exposed.
  • the rectifying member 40 covers at least a part of the central region T22 of the second end surface T2 of the porous substrate 1, it is difficult for air to flow in the radially inner portion of the porous substrate 1. Since the rectifying member 40 exposes at least a portion of the outer edge region T21 of the second end surface T2 of the porous substrate 1, air can easily flow through the radially outer portion of the porous substrate 1.
  • the difference between the suction force applied to the radially inner portion of the porous substrate 1 and the suction force applied to the radially outer portion of the porous substrate 1 becomes small, The difference between the length of the slurry layer N formed on the inner portion and the length of the slurry layer N formed on the radially outer portion of the porous substrate 1 is reduced.
  • the rectifying plate 49a When the suction pipe 461 moves to the slurry suction position, the rectifying plate 49a is positioned on the second end face T2 side of the porous base material 1 and spaced apart from the second end face T2 of the porous base material 1 . Therefore, in the step (b), when the slurry M supplied to the first end surface T1 side of the porous substrate 1 is sucked from the second end surface T2 side of the porous substrate 1, the rectifying plate 49a becomes porous. It is located on the side of the second end surface T2 of the base material 1 and spaced from the second end surface T2 of the porous base material 1 .
  • step (b) when the slurry M supplied to the first end surface T1 side of the porous substrate 1 is sucked from the second end surface T2 side of the porous substrate 1, the current plate 49a At least part of the central region T22 of the one second end face T2 is covered, and at least part of the outer edge region T21 is exposed.
  • the second portion 492 of the straightening plate 49a covers at least a portion of the central region T22 of the second end surface T2 of the porous substrate 1
  • the first portion 491 formed on the first portion 491 of the straightening plate 49a covers at least a portion of the central region T22.
  • 1 through-hole G exposes at least part of outer edge region T21 of second end surface T2 of porous substrate 1 .
  • the second portion 492 of the rectifying plate 49a covers at least part of the central region T22 of the second end surface T2 of the porous substrate 1, it is difficult for air to flow through the radially inner portion of the porous substrate 1.
  • the first through holes G formed in the first portion 491 of the current plate 49a expose at least part of the outer edge region T21 of the second end surface T2 of the porous substrate 1, the porous substrate The radially outer portion of 1 facilitates air flow.
  • the difference between the suction force applied to the radially inner portion of the porous substrate 1 and the suction force applied to the radially outer portion of the porous substrate 1 becomes small, The difference between the length of the slurry layer N formed on the inner portion and the length of the slurry layer N formed on the radially outer portion of the porous substrate 1 is reduced.
  • the first rectifying plate 49b is positioned on the second end face T2 side of the porous base material 1 and spaced apart from the second end face T2 of the porous base material 1 . That is, when the slurry M supplied to the first end surface T1 side of the porous substrate 1 is sucked from the second end surface T2 side of the porous substrate 1, the first straightening plate 49b It is located on the side of the second end face T2 and separated from the second end face T2 of the porous substrate 1 .
  • the second straightening plate 50 is arranged on the side opposite to the second end surface T2 of the porous substrate 1 with respect to the first straightening plate 49b. This positional relationship does not change whether the suction tube 461 is at the slurry suction position or at the standby position. Therefore, when the slurry M supplied to the first end surface T1 side of the porous substrate 1 is sucked from the second end surface T2 side of the porous substrate 1, the second rectifying plate 50 moves toward the first rectifying plate 49b. On the other hand, it is located on the side opposite to the second end surface T2 of the porous substrate 1 .
  • the distance between the first rectifying plate 49b and the second rectifying plate 50 is the distance D3.
  • the distance D3 does not change whether the suction tube 461 is at the slurry suction position or at the standby position. Therefore, when the slurry M supplied to the first end surface T1 side of the porous substrate 1 is sucked from the second end surface T2 side of the porous substrate 1, the first rectifying plate 49b and the second rectifying plate 50 The distance is distance D3.
  • the second through hole J formed in the first straightening plate 49b exposes at least a portion of the central region T22 of the second end surface T2 of the porous substrate 1, and the second straightening plate 50 serves as the first straightening plate. Since at least a part of the second through hole J formed in the plate 49b is covered, it is difficult for air to flow in the radially inner portion of the porous substrate 1. Since the first through holes G expose at least a portion of the outer edge region T21 of the second end surface T2 of the porous substrate 1, air can easily flow through the radially outer portion of the porous substrate 1. FIG.
  • the difference between the suction force applied to the radially inner portion of the porous substrate 1 and the suction force applied to the radially outer portion of the porous substrate 1 becomes small, The difference between the length of the slurry layer N formed on the inner portion and the length of the slurry layer N formed on the radially outer portion of the porous substrate 1 is reduced.
  • the straightening member 40b By arranging on the end surface T2 side, the following effects are exhibited.
  • the slurry M supplied to the first end surface T1 side of the porous substrate 1 is sucked from the second end surface T2 side of the porous substrate 1, the current plate 49a side, a turbulent flow occurs between the second portion 492 of the rectifying plate 49a and the second end surface T2 of the porous substrate 1, causing variations in the length of the slurry layers N (particularly, Variation in length between slurry layers N formed on the inner portion of the porous substrate 1 in the radial direction may occur.
  • the distance between the rectifying plate 49a and the second end surface T2 of the porous substrate 1, which generates turbulent flow is defined as Dx.
  • the straightening member 49b since the second through hole J is formed in the second portion 492 of the first straightening plate 49b, the first straightening plate 49b and the second end surface T2 of the porous base material 1 is Dx, turbulent flow is less likely to occur between the second portion 492 of the first rectifying plate 49b and the second end face T2 of the porous substrate 1 .
  • the second rectifying plate 50 is arranged on the opposite side of the first rectifying plate 49b from the second end surface T2 of the porous substrate 1, so that the first rectifying plate 49b and the porous Even if the distance from the second end surface T2 of the substrate 1 is Dx, the distance between the second straightening plate 50 and the second end surface T2 of the porous substrate 1 is greater than Dx, and the second straightening plate A turbulent flow is less likely to occur between 50 and the second end surface T2 of the porous substrate 1 .
  • the variation in length between the slurry layers N (in particular, the porous substrate 1 It is possible to prevent the occurrence of variations in length between the slurry layers N formed in the radially inner portion of the .
  • the radial direction of the porous substrate 1 is preferably 1 m/s or more and 10 m/s or less, more preferably 2 m/s or more and 5 m/s or less.
  • the radial direction of the porous substrate 1 is preferably 1 m/s or more and 30 m/s or less, more preferably 5 m/s or more and 15 m/s or less.
  • the porous substrate 1 on which the slurry layer N is formed may be dried and then fired as necessary. Thereby, the slurry layer N becomes a catalyst layer.
  • the drying temperature is, for example, 70° C. or more and 150° C. or less
  • the drying time is, for example, 0.2 hours or more and 3 hours or less
  • the firing temperature is, for example, 400° C. or more and 900° C. or less
  • the firing time is , for example, from 1 hour to 10 hours. Firing can be performed in an air atmosphere.
  • the process (a) may be performed without performing the suction tube moving process.
  • the suction tube moving step is performed during or after the step (a)
  • the step (b) is performed after the step (a) and the suction tube moving step.
  • the second portion 492 of the rectifying plate 49a does not have the second through hole, at least one of the central regions T22 covered by the second portion 492 of the rectifying plate 49a is provided from the viewpoint of further improving the above effect of the rectifying member 40a.
  • the area of the part is preferably 50% or more of the area of the central region T22, more preferably 60% or more, even more preferably 70% or more, and even more preferably 80% or more. It is preferably 90% or more, even more preferably 95% or more.
  • the upper limit is 100%.
  • the second portion 492 of the current plate 49a and the porous substrate 1 It prevents turbulent flow from occurring between the second end surface T2, and thus the length variation between the slurry layers N (especially, the slurry formed in the radially inner part of the porous substrate 1 From the viewpoint of preventing occurrence of variation in length between layers N, it is preferable that a second through hole is formed in the second portion 492 of the straightening plate 49a.
  • FIG. 16 shows an embodiment in which a second through hole is formed in the second portion 492 of the rectifying plate 49a.
  • a large number of round second through holes Q are formed in the second portion 492 of the current plate 49a.
  • the planar view shape of the second through hole Q can be changed as appropriate, and the planar view shape of the second through hole Q includes, for example, a circular shape, an elliptical shape, a square shape, a rectangular shape, and a rectangular shape with rounded corners. etc.
  • the number of second through holes Q can be changed as appropriate, and the number of second through holes Q may be one, or two or more.
  • the second through hole Q formed in the second portion 492 of the current plate 49a may be continuous with the first through hole G formed in the first portion 491 of the current plate 49a.
  • the diameter of the second through hole Q is, for example, 1 mm or more and 5 mm or less.
  • the diameter of the second through-hole Q means the diameter of the circle. means the diameter of the circle that
  • the second through hole Q When the second through hole Q is formed in the second portion 492 of the current plate 49a, the second through hole Q exposes a part of the central region T22 of the second end surface T2 of the porous substrate 1.
  • the second through-hole Q exposes a part of the central region T22 of the second end surface T2 of the porous substrate 1” means that the suction tube 461 is at the slurry suction position shown in FIG.
  • the second end face T2 of the material 1 and the straightening plate 49a are viewed from the axial direction X of the porous substrate 1 (for example, when the second end face T2 of the porous substrate 1 is projected on the plan view of the straightening plate 49a ), as shown in FIG.
  • the outline of the second end surface T2 and the outline of the central region T22 that is, the boundary line L2 projected onto the plan view of the current plate 49a are indicated by dotted lines and chain double-dashed lines, respectively.
  • the second The area of the part of the central region T22 exposed by the through hole Q is preferably 10% or more and 50% or less, more preferably 20% or more and 40% or less, of the area of the central region T22.
  • the "area of the part of the central region T22 exposed by the second through holes Q" is the two It means the total area of the portion of the central region T22 exposed by the second through holes Q described above.
  • the area of at least a part of the outer edge region T21 exposed by the first through holes G formed in the first portion 491 of the rectifying plate 49a is reduced to the area of the outer edge region T21. It is preferably 50% or more of the area, more preferably 60% or more, still more preferably 70% or more, still more preferably 80% or more, and 90% or more. More preferably, it is 95% or more. The upper limit is 100%. "The area of at least a part of the outer edge region T21 exposed by the first through holes G formed in the first portion 491 of the straightening plate 49a or 49b" is two or more first portions 491 of the straightening plate 49a or 49b. When one through-hole G is formed, it means the total area of the portion of the outer edge region T21 exposed by the two or more first through-holes G.
  • the second portion 492 may be, for example, a supporting mechanism (for example, the second portion 492 provided between the second portion 492 and the suction mechanism 462).
  • the third part 493 can be fixed in the suction tube 461 by a support rod that supports the surface on the suction mechanism 462 side of the suction tube 461, and the third part 493 is, for example, a holding mechanism (for example, a third A chuck mechanism (e.g., hand chuck, etc.) that grips the outer edge of the third portion 493) or a support mechanism (e.g., the suction mechanism 462 side of the third portion 493 provided between the third portion 493 and the suction mechanism 462 It can be fixed within the aspiration tube 461 by means of a support rod supporting the surface of the .
  • a holding mechanism for example, a third A chuck mechanism (e.g., hand chuck, etc.) that grips the outer edge of the third portion 493) or a support mechanism (e.g., the suction mechanism 462 side of the third portion 493 provided between the third portion 493 and the suction mechanism 462
  • the current plate 49a or 49b may consist of only the second portion 492 .
  • the area of the part of the central region T22 exposed by the second through-holes Q is reduced from the viewpoint of further improving the above effect of the rectifying member 40a.
  • the ratio (the area of the part of the central region T22 exposed by the second through hole Q/the area of the central region T22) is the outer edge region T21 exposed by the first through hole G formed in the first portion 491 of the current plate 49a. (area of at least part of the outer edge region T21 exposed by the first through holes G formed in the first portion 491 of the current plate 49a/area of the outer edge region T21).
  • the distance D2a or D2b between the rectifying plate 49a or 49b and the second end surface T2 of the porous substrate 1 when the suction tube 461 is at the slurry suction position is , preferably 5 mm or more and 30 mm or less, more preferably 5 mm or more and 15 mm or less.
  • both the minimum value and the maximum value of the distance D2a or D2b are preferably within the above range.
  • the area of at least a part of the central region T22 exposed by the second through holes J is preferably 50% or more, more preferably 60% or more of the area of the central region T22. is more preferable.
  • the upper limit is 100%.
  • the area of at least a part of the central region T22 exposed by the second through holes J is 90% of the area of the central region T22. % or less, more preferably 80% or less.
  • the "area of at least a part of the central region T22 exposed by the second through holes J" is the two or more second through holes J. 2 means the total area of the portion of the central region T22 exposed by the through holes J.
  • the area of at least a portion of the second through hole J covered by the second current plate 50 is preferably 50% or more of the area of the second through hole J.
  • the "area of the second through holes J" is means the total area of
  • the area of the second through hole J” means the area of the second through hole J when viewed from the axial direction X of the porous substrate 1 in plan view.
  • the second A through hole is preferably formed in the second straightening plate 50 so that the straightening plate 50 partially covers the second through hole J. As shown in FIG.
  • FIG. 17 shows an embodiment in which through holes are formed in the second current plate 50 .
  • a large number of circular through holes K are formed in the second current plate 50 .
  • the planar view shape of the through hole K can be changed as appropriate, and examples of the planar view shape of the through hole K include a circular shape, an elliptical shape, a square shape, a rectangular shape, a rectangular shape with rounded corners, and the like. .
  • the number of through-holes K can be changed as appropriate, and the number of through-holes K may be one, or two or more.
  • the diameter of the through hole K is, for example, 1 mm or more and 5 mm or less.
  • the diameter of the through-hole K means the diameter of the circle when the through-hole K is circular, and the diameter of the circle circumscribing the shape when the through-hole K has a shape other than a circle. do.
  • the through holes K are formed in the second straightening plate 50, when the slurry M supplied to the first end surface T1 side of the porous substrate 1 is sucked from the second end surface T2 side of the porous substrate 1, , the occurrence of turbulent flow is effectively prevented, and thus the variation in length between the slurry layers N (in particular, the length between the slurry layers N formed in the radially inner portion of the porous substrate 1
  • the area of the part of the second through hole J covered by the second current plate 50 is 50% or more and 90% or less of the area of the second through hole J. , and more preferably 60% or more and 90% or less.
  • the distance D3 between the first rectifying plate 49b and the second rectifying plate 50 when the suction pipe 461 is at the slurry suction position is preferably 5 mm or more and 30 mm or less. It is preferably 5 mm or more and 15 mm or less. If the distance D3 is not constant, it is preferable that both the minimum value and the maximum value of the distance D3 are within the above ranges.
  • FIG. 18 is a plan view of a current plate 49a' according to a modification.
  • the outline of the second end face T2 and the outline of the central region T22 (that is, the boundary line L2) projected onto the plan view of the current plate 49a' are indicated by dotted lines and chain double-dashed lines, respectively. .
  • a straightening plate 49a' may be used instead of the straightening plate 49a.
  • the rectifying plate 49a' differs from the rectifying plate 49a in that a large number of circular through holes H are formed in the first portion 491 instead of the through holes G.
  • through holes G also applies to through holes H, unless otherwise specified.
  • the planar view shape of the through hole H is circular, but the planar view shape of the through hole H may be other shapes such as elliptical, square, rectangular, and rectangular with rounded corners. It may be a shape or the like.
  • the diameter of the through hole H is, for example, 1 mm or more and 4 mm or less.
  • the diameter of the through-hole H means the diameter of the circle when the through-hole H is circular, and the diameter of the circle circumscribing the shape when the through-hole H has a shape other than a circle. do.
  • the modified example 1A has the same effect as the above effect of the rectifying member 40a.
  • ⁇ Modification 1B> In the straightening member 40b, instead of the through holes G, a large number of circular through holes H may be formed in the first portion 491 of the first straightening plate 49b. The above description regarding the through hole H also applies to the modification 1B. Modification 1B has the same effect as the above effect of the rectifying member 40b.
  • FIG. 19 is an end view for explaining a modification in which a gap is formed between the suction tube 461 and the end of the porous substrate 1 on the second end face T2 side that has entered the suction tube 461.
  • FIG. . 19 is a plane perpendicular to the axial direction X of the porous substrate 1 in a state where the suction tube 461 is at the slurry suction position shown in FIG. 48 and an end view when the end portion on the second end face T2 side of the porous substrate 1 is cut.
  • a gap V3 may be formed between the second end surface T2 side end of the porous substrate 1 that has entered inside.
  • the second base material fixing part 48 does not fix the end of the porous base material 1 on the side of the second end surface T2 that has entered the suction tube 461 (for example, the second base material fixing part 48 has a balloon chuck, the gap V3 can be formed by not inflating the balloon).
  • the gap V3 is formed between the suction tube 461 and the end portion of the porous substrate 1 on the side of the second end surface T2 that has entered the suction tube 461, the porous substrate 1 on the side of the first end surface T1 is formed.
  • the air outside the suction tube 461 is rectified in the suction tube 461 along the outer peripheral surface of the porous substrate 1. It flows into through-holes formed in member 40 .
  • the air outside the suction tube 461 flows along the outer peripheral surface of the porous substrate 1 and flows through the through holes (for example, the first portion 491) formed in the current plate 49a inside the suction tube 461.
  • the air outside the suction tube 461 flows along the outer peripheral surface of the porous substrate 1 and through the through holes formed in the first straightening plate 49 b and the second straightening plate 50 inside the suction tube 461 .
  • FIG. 20 is a schematic partial end view showing the configuration of a coating processing section 4a according to a modification.
  • FIG. 20 shows the state when the porous substrate 1 is subjected to the coating process.
  • the same members or portions as the coating processing unit 4 are denoted by the same reference numerals as the coating processing unit 4.
  • the above description of the coating section 4 also applies to the coating section 4a, unless otherwise specified.
  • the jig 44 may be moved independently of the nozzle 422 by the jig moving mechanism 7. In this case, the jig 44 is not attached to the nozzle holder 431 .
  • FIG. 20 is as described above
  • FIG. 21 is a plan view of the first end face of the porous base material according to the modification
  • FIG. 22 is a plan view of the current plate according to the modification.
  • Modification 4 is an example in which the arrangement position of the current plate 49a is changed. Therefore, the configuration of the rectifying plate 49a in Modification 4 is the same as that described above, and the above description of the rectifying plate 49a also applies to Modification 4, unless otherwise specified.
  • the main surface of the current plate 49a on the side of the first end surface T1 is substantially parallel to the first end surface T1 of the porous substrate 1.
  • the meaning of "substantially parallel” is as described above.
  • the following steps are performed instead of the nozzle movement step.
  • the end portion of the porous substrate 1 on the side of the first end surface T1 is caused to enter the jig 44, and the porous substrate 1 is inserted into the jig 44.
  • a storage space V1 that enables storage of the supplied slurry M is formed on the first end face T1 side of the .
  • the lifting mechanism 432 lowers the nozzle holder 431 to bring the nozzle 422 closer to the porous substrate 1 and move it to the slurry supply position.
  • the slurry M is supplied from the nozzle 422 to the first end surface T1 of the porous substrate 1 at the slurry supply position.
  • the lifting mechanism 432 lifts the nozzle holder 431 to move the nozzle 422 away from the porous substrate 1 to the standby position.
  • the straightening plate 49a is arranged on the first end surface T1 side of the porous substrate 1 .
  • the rectifying plate 49a may be arranged by a rectifying plate moving mechanism (not shown) or manually.
  • the first end surface T1 of the porous substrate 1 includes an annular (for example, annular) outer edge region T11 located radially outside the first end surface T1 and an outer edge region T11 located radially outward of the first end surface T1. It is partitioned into a central region T12 located inside T11.
  • the boundary line L1 is a virtual line.
  • the openings of the cells 13a existing in the first end surface T1 are omitted.
  • the area of the central region T12 is preferably 40% or more and 90% or less, more preferably 65% or more and 85% or less, of the area of the first end surface T1.
  • the shape of the central region T12 and the shape of the first end face T1 are preferably similar shapes.
  • the shape of the central region T12 means the shape defined by the outline of the central region T12 (that is, the boundary line L1), and the shape of the first end face T1 means the shape defined by the outline of the first end face T1. means.
  • the outer edge region T11 is preferably formed with a predetermined width along the outline of the first end face T1 so that the shape of the central region T12 and the shape of the first end face T1 are similar. As long as the shape of the central region T12 and the shape of the first end face T1 are similar, the width of the outer edge region T11 may or may not be constant.
  • the current plate 49a includes a first annular (for example, annular) portion 491, a second portion 492 positioned inside the first portion 491, and a second portion 492 positioned outside the first portion 491. and an annular (eg, toric) third portion 493 .
  • the rectifying plate 49a in a state where the rectifying plate 49a is arranged on the first end surface T1 side of the porous substrate 1, the first end surface T1 of the porous substrate 1 and the rectifying plate 49a are aligned with the axis of the porous substrate 1.
  • the first end surface T1 of the porous substrate 1 of the straightening plate 49a is A portion overlapping with the outer edge region T11 is the first portion 491, and a portion overlapping with the central region T12 of the first end surface T1 of the porous substrate 1 is the second portion 492.
  • the outline of the first end face T1 and the outline of the central region T12 that is, the boundary line L1 projected onto the plan view of the current plate 49a are indicated by dotted lines and chain double-dashed lines, respectively.
  • the second portion 492 of the straightening plate 49a preferably does not have a through hole as in the present embodiment, but may have a through hole (hereinafter referred to as "second through hole").
  • second through hole a through hole
  • the above description regarding the second through hole also applies to Modification 4.
  • the second through-hole exposes part of the central region T12 of the first end surface T1 of the porous substrate 1.
  • the second through-hole exposes a part of the central region T12 of the first end surface T1 of the porous substrate 1 means that the porous substrate is in a state where the suction pipe 461 is at the slurry suction position shown in FIG. 1 and the straightening plate 49a are viewed from the axial direction X of the porous substrate 1 (for example, when the first end surface T1 of the porous substrate 1 is projected onto the plan view of the straightening plate 49a).
  • the area of the part of the central region T12 exposed by the second through holes is preferably 50% or less of the area of the central region T12, and 40% or less. is more preferably 30% or less, even more preferably 20% or less, even more preferably 10% or less, and even more preferably 5% or less.
  • the "area of the part of the central region T12 exposed by the second through holes" is the two or more second through holes. It means the total area of the portion of the central region T12 exposed by the through holes.
  • the second portion 492 of the current plate 49a covers at least part of the central region T12 of the first end surface T1 of the porous substrate 1, and the first through hole G formed in the first portion 491 of the current plate 49a At least part of the outer edge region T11 of the one end surface T1 is exposed.
  • the second portion 492 of the straightening plate 49a covers at least part of the central region T12 of the first end surface T1 of the porous substrate 1” means that the straightening plate 49a covers the first end surface T1 of the porous substrate 1.
  • the portion of the second portion 492 of the rectifying plate 49a other than the second through-hole is located at the center of the first end surface T1 of the porous substrate 1, as shown in FIG. It means that it overlaps with the region T12.
  • the second portion 492 of the current plate 49a When the second portion 492 of the current plate 49a does not have a second through hole, the second portion 492 of the current plate 49a covers the entire central region T12 of the first end surface T1 of the porous substrate 1, When the second portion 492 of the straightening plate 49a has the second through hole, the second portion 492 of the straightening plate 49a covers part of the central region T12 of the first end surface T1 of the porous substrate 1. .
  • the first through holes G formed in the first portion 491 of the current plate 49a expose at least part of the outer edge region T11 of the first end surface T1 of the porous substrate 1 means that the current plate 49a is porous.
  • the first end surface T1 of the porous substrate 1 and the rectifying plate 49a are arranged on the first end surface T1 side of the porous substrate 1 and viewed from the axial direction X of the porous substrate 1 (for example, the rectifying plate 22, when the first end face T1 of the porous substrate 1 is projected onto the plan view of the plate 49a, the first through holes G formed in the first portion 491 of the current plate 49a are aligned with the porous substrate. It means that it overlaps with at least part of the outer edge region T11 of the first end surface T1 of the material 1 .
  • the current plate 49a When the slurry M supplied to the first end surface T1 side of the porous substrate 1 is sucked from the second end surface T2 side of the porous substrate 1, the current plate 49a When the rectifying plate 49a is arranged on the second end surface T2 side of the porous substrate 1, the same effect as when the rectifying plate 49a is arranged on the second end surface T2 side of the porous substrate 1 can be obtained.
  • the area of at least part of the central region T12 covered by the second portion 492 of the rectifying plate 49a is 50% or more of the area of the central region T12. preferably 60% or more, even more preferably 70% or more, even more preferably 80% or more, even more preferably 90% or more, 95% The above is even more preferable.
  • the upper limit is 100%.
  • the area of at least a part of the outer edge region T11 exposed by the first through holes G formed in the first portion 491 of the rectifying plate 49a is The area of the region T11 is preferably 50% or more, more preferably 60% or more, still more preferably 70% or more, even more preferably 80% or more, and 90% or more. It is more preferable that the ratio is 95% or more. The upper limit is 100%. "At least a part of the outer edge region T11 exposed by the first through holes G formed in the first portion 491 of the straightening plate 49a" is defined by two or more first through holes G formed in the first portion 491 of the straightening plate 49a. is formed, it means the total area of the portion of the outer edge region T21 exposed by the two or more first through holes G.
  • the straightening plate 49a and the porous substrate 1 are arranged in a state where the straightening plate 49a is arranged on the first end surface T1 side of the porous substrate 1.
  • a distance D1 from the first end face T1 is preferably 5 mm or more and 30 mm or less, and more preferably 5 mm or more and 15 mm or less.
  • the distance D1 is the distance between the first end surface T1 side main surface of the current plate 49a and the first end surface T1 of the porous substrate 1 . If the distance D1 is not constant, both the minimum value and the maximum value of the distance D1 are preferably within the above range.
  • FIGS. 23 to 25 are schematic partial end views showing the configuration of the coating processing section 4b according to the modification.
  • 23 shows the state before the slurry supply process and the coating process are performed on the porous substrate 1
  • FIG. 24 shows the state when the slurry supply process is performed on the porous substrate 1.
  • FIG. 25 show the state when the porous substrate 1 is subjected to the coating process.
  • the coating processing unit 4b does not include the slurry supply unit 42, the nozzle moving mechanism 43, and the first substrate fixing unit 45, and is provided with a storage tank 42b in which the slurry M is stored. , and is different from the coating processing section 4 .
  • the same members or portions as the coating processing section 4 are denoted by the same reference numerals as in the coating processing section 4.
  • the above description of the coating section 4 also applies to the coating section 4b, unless otherwise specified.
  • the storage tank 42b is installed below the porous substrate 1 held by the substrate holding portion 41. As shown in FIG. 23, the storage tank 42b is installed below the porous substrate 1 held by the substrate holding portion 41. As shown in FIG. 23, the storage tank 42b is installed below the porous substrate 1 held by the substrate holding portion 41.
  • the substrate holding part 41 holds the porous substrate 1 so that the first end face T1 of the porous substrate 1 faces the reservoir 42b side (lower side in FIG. 23).
  • the step (a) is performed after the substrate holding step, without performing the nozzle moving step and the suction tube moving step.
  • step (a) the substrate holder 41 lowers the porous substrate 1 .
  • the end portion of the porous substrate 1 on the first end surface T1 side is immersed in the slurry M in the storage tank 42b, and the porous substrate 1 on the first end surface T1 side is , slurry M is supplied. Therefore, in Modification 5, the base material holding part 41 and the storage tank 42b function as a slurry supply part that supplies the slurry M to the first end surface T1 side of the porous base material 1 .
  • the base material holding part 41 raises the porous base material 1 so that the end portion of the porous base material 1 on the first end face T1 side is is taken out from the slurry M in the storage tank 42 b , the porous substrate 1 is inverted, and the porous substrate 1 is moved above the suction tube 461 .
  • the second end surface T2 of the porous substrate 1 held above the suction tube 461 by the substrate holding portion 41 faces the suction tube 461 side (lower side in FIG. 25). .
  • the porous substrate 1 may be turned over.
  • the control unit 3 controls the operation of the substrate holding unit 41, and determines the timing and duration of immersion of the end of the porous substrate 1 on the first end surface T1 side in the slurry M in the storage tank 42b ( supply amount), the timing of removing the end of the porous substrate 1 on the first end face T1 side from the slurry M in the storage tank 42b, the timing of turning over the porous substrate 1, Controls the timing of upward movement.
  • a suction tube moving step is performed.
  • the suction tube moving mechanism 47 moves the suction tube 461 from the standby position shown in FIGS. 23 and 24 to the slurry suction position shown in FIG.
  • Example 1 A cylindrical porous substrate 1 shown in FIGS. 1 to 4 was prepared.
  • the length of the porous substrate 1 was 127 mm
  • the diameter of the porous substrate 1 was 118 mm
  • the total number of cells per square inch of the porous substrate 1 was 300 cells per square inch.
  • a slurry M containing raw materials for the catalyst layer was prepared.
  • the viscosity of slurry M is 500 mPa s when measured using a cone and plate type viscometer at a temperature of 25 ° C. and a shear rate of 380 s -1 , and a shear rate of 4 s -1 . was 5500 mPa ⁇ s.
  • a structure manufacturing apparatus 100 shown in FIGS. 5 to 8 was prepared.
  • the rectifying member 40 the rectifying plate 49a shown in FIGS. 11 and 12 was used.
  • the diameter of the second portion 492 of the current plate 49a was adjusted to 108.4 mm, and the width W of the first through hole G was adjusted to 5 mm.
  • the first portion 491 of the rectifying plate 49a and the outer edge region T21 of the second end surface T2 are 16% of the area of the second end surface T2
  • the second portion 492 of the rectifying plate 49a and the central region T22 of the second end surface T2 are the second end surface T2. It was adjusted to 84% of the area of the end surface T2.
  • the area of the outer edge region T21 exposed by the first through holes G formed in the first portion 491 of the current plate 49a is 97% of the area of the outer edge region T21, and the central region T22 covered by the second portion 492 of the current plate 49a. was adjusted to 100% of the central region T22.
  • the distance D2a between the current plate 49a and the second end face T2 of the porous substrate 1 when the suction pipe 461 is at the slurry suction position was adjusted to 6 mm.
  • the slurry M supplied to the first end surface T1 side of the porous substrate 1 is sucked from the second end surface T2 side of the porous substrate 1, and the first cell of the porous substrate 1 is A slurry layer N that did not reach the second end surface T2 of the porous substrate 1 was formed on the inner wall.
  • the inner part of the porous substrate 1 in the radial direction is the first
  • the flow velocity of air in the portion on the side of the first end surface T1 is 3.8 m/s
  • the flow velocity of air in the portion on the side of the first end surface T1 among the radially outer portions of the porous substrate 1 is 14 m/s. Met.
  • the porous substrate 1 is cut along a plane parallel to the axial direction X, and the radial outer portion Q1 of the porous substrate 1 (as shown in FIG. 26, the left portion (5% ) and the right portion (5%)) were measured, and the average value was obtained. Similarly, the length of 36 slurry layers N in the radially inner portion Q2 of the porous substrate 1 (the central portion (90%) of the porous substrate 1 as shown in FIG. 26) is measured. and calculated the average value.
  • Example 2 As shown in FIG. 19, the end portion of the porous substrate 1 on the second end surface T2 side that has entered the suction tube 461 is not fixed by the second substrate fixing portion 48, and the suction tube 461 and the suction tube 461 are separated from each other. The same operation as in Example 1 was performed, except that a gap was formed between the second end face T2 side end of the porous substrate 1 that had entered inside.
  • the air flow velocity in the portion on the first end surface T1 side is 3.1 m/s
  • the air flow velocity in the portion on the first end surface T1 side of the radially outer portion of the porous substrate 1 is 9 .2 m/s.
  • Example 1 The same operation as in Example 1 was performed, except that the current plate 49a was not used.
  • the air flow velocity in the portion on the first end surface T1 side is 14.6 m/s
  • the air flow velocity in the portion on the first end surface T1 side of the radially outer portion of the porous substrate 1 is 15 m/s. .3 m/s.
  • Example 2 The same operation as in Example 2 was performed, except that the current plate 49a was not used.
  • the flow velocity of air in the portion on the side of the first end surface T1 is 12.1 m/s
  • the flow velocity of air in the portion on the side of the first end surface T1 among the radially outer portions of the porous substrate 1 is 11 m/s. .1 m/s.
  • SYMBOLS 1 Porous base material, 11... Cylindrical part, 12... Partition part, 13... Cell, 13a... First cell, 13b... Second cell, T1 (S1) ... first end face, T11 ... outer edge region of the first end face, T12 ... central region of the first end face, T2 (S2) ... second end face, T21 ... outer edge region of the second end face , T22... Central region of the second end surface, 100... Structure manufacturing apparatus, 2... Base material processing unit, 3... Control unit, 4... Coating processing unit, 40... Rectification Members 40a... Straightening member according to the first embodiment 40b... Straightening member according to the second embodiment 41... Base material holding part 42... Slurry supply part 43... Nozzle Moving mechanism 44 Jig 45 First base material fixing part 46 Slurry suction part 47 Suction tube moving mechanism 48 Second base material fixing part 49a Straightening plate 49b First straightening plate 50 Second straightening plate G Through hole M Slurry N Slurry layer

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Abstract

L'objectif de la présente invention est de fournir un appareil et un procédé grâce auxquels il devient possible de réduire la différence entre la longueur d'une couche de bouillie formée dans une partie intérieure d'un substrat de type à écoulement de paroi lorsqu'elle est observée dans la direction de diamètre du substrat de type à écoulement de paroi et la longueur de la couche de bouillie formée dans une partie extérieure du substrat de type à écoulement de paroi lorsqu'elle est observée dans la direction de diamètre du substrat de type à écoulement de paroi. Dans l'appareil et le procédé, lorsqu'une bouillie M fournie à une première surface de bord (T1) d'un substrat poreux (1) est absorbée à partir du côté d'une seconde surface de bord (T2) du substrat poreux (1), un élément de redressement d'écoulement (40) qui recouvre une région centrale (T12, T22) de l'une ou l'autre de la première surface de bord (T1) ou de la seconde surface de bord (T2) et expose au moins une partie d'une région de bord externe (T11, T21) de la surface de bord est disposé sur le côté de la première surface de bord (T1) ou de la seconde surface de bord (T2).
PCT/JP2022/012743 2021-03-18 2022-03-18 Appareil et procédé de production de structure WO2022196806A1 (fr)

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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009136833A (ja) * 2007-12-10 2009-06-25 Toyota Motor Corp 排気ガス浄化用モノリス触媒の製造方法とモノリス触媒
JP2015039672A (ja) * 2013-08-22 2015-03-02 株式会社キャタラー スラリー供給ノズルとそれを用いた排ガス浄化用触媒の製造装置および製造方法
WO2016143811A1 (fr) * 2015-03-09 2016-09-15 株式会社キャタラー Dispositif d'application de boue sur catalyseur
WO2018180090A1 (fr) * 2017-03-31 2018-10-04 株式会社キャタラー Procédé de fabrication d'un dispositif de purification de gaz d'échappement

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009136833A (ja) * 2007-12-10 2009-06-25 Toyota Motor Corp 排気ガス浄化用モノリス触媒の製造方法とモノリス触媒
JP2015039672A (ja) * 2013-08-22 2015-03-02 株式会社キャタラー スラリー供給ノズルとそれを用いた排ガス浄化用触媒の製造装置および製造方法
WO2016143811A1 (fr) * 2015-03-09 2016-09-15 株式会社キャタラー Dispositif d'application de boue sur catalyseur
WO2018180090A1 (fr) * 2017-03-31 2018-10-04 株式会社キャタラー Procédé de fabrication d'un dispositif de purification de gaz d'échappement

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