WO2022124550A1 - 연신성 acf, 이의 제조방법, 이를 포함하는 계면 접합 부재 및 소자 - Google Patents
연신성 acf, 이의 제조방법, 이를 포함하는 계면 접합 부재 및 소자 Download PDFInfo
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- WO2022124550A1 WO2022124550A1 PCT/KR2021/014069 KR2021014069W WO2022124550A1 WO 2022124550 A1 WO2022124550 A1 WO 2022124550A1 KR 2021014069 W KR2021014069 W KR 2021014069W WO 2022124550 A1 WO2022124550 A1 WO 2022124550A1
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- Prior art keywords
- acf
- polymer film
- conductive particles
- stretchable
- patterned
- Prior art date
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- 238000000034 method Methods 0.000 title claims abstract description 51
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- 229910000077 silane Inorganic materials 0.000 claims description 10
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 9
- FACXGONDLDSNOE-UHFFFAOYSA-N buta-1,3-diene;styrene Chemical compound C=CC=C.C=CC1=CC=CC=C1.C=CC1=CC=CC=C1 FACXGONDLDSNOE-UHFFFAOYSA-N 0.000 claims description 9
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- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 claims description 9
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- 239000001301 oxygen Substances 0.000 claims description 9
- 229920000468 styrene butadiene styrene block copolymer Polymers 0.000 claims description 9
- VSKJLJHPAFKHBX-UHFFFAOYSA-N 2-methylbuta-1,3-diene;styrene Chemical compound CC(=C)C=C.C=CC1=CC=CC=C1.C=CC1=CC=CC=C1 VSKJLJHPAFKHBX-UHFFFAOYSA-N 0.000 claims description 7
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- ABLZXFCXXLZCGV-UHFFFAOYSA-N Phosphorous acid Chemical group OP(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 claims description 2
- 125000003172 aldehyde group Chemical group 0.000 claims description 2
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- IVRMZWNICZWHMI-UHFFFAOYSA-N azide group Chemical group [N-]=[N+]=[N-] IVRMZWNICZWHMI-UHFFFAOYSA-N 0.000 claims description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 2
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 2
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- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 claims description 2
- 125000003396 thiol group Chemical group [H]S* 0.000 claims description 2
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- 239000003575 carbonaceous material Substances 0.000 claims 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims 1
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- 229910052796 boron Inorganic materials 0.000 claims 1
- 239000007772 electrode material Substances 0.000 claims 1
- 150000002148 esters Chemical class 0.000 claims 1
- 229910052698 phosphorus Inorganic materials 0.000 claims 1
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- 239000010410 layer Substances 0.000 description 38
- 229920000642 polymer Polymers 0.000 description 22
- 238000002360 preparation method Methods 0.000 description 17
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- 238000005311 autocorrelation function Methods 0.000 description 11
- 239000010931 gold Substances 0.000 description 11
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 10
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 10
- 229910052737 gold Inorganic materials 0.000 description 10
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
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- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 5
- 229920001721 polyimide Polymers 0.000 description 5
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 4
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
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- 238000011161 development Methods 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
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- UUEWCQRISZBELL-UHFFFAOYSA-N 3-trimethoxysilylpropane-1-thiol Chemical compound CO[Si](OC)(OC)CCCS UUEWCQRISZBELL-UHFFFAOYSA-N 0.000 description 2
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 239000004970 Chain extender Substances 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 239000002033 PVDF binder Substances 0.000 description 1
- 229920001166 Poly(vinylidene fluoride-co-trifluoroethylene) Polymers 0.000 description 1
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- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000002174 Styrene-butadiene Substances 0.000 description 1
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- PYJJCSYBSYXGQQ-UHFFFAOYSA-N trichloro(octadecyl)silane Chemical compound CCCCCCCCCCCCCCCCCC[Si](Cl)(Cl)Cl PYJJCSYBSYXGQQ-UHFFFAOYSA-N 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
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Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/20—Conductive material dispersed in non-conductive organic material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B5/00—Non-insulated conductors or conductive bodies characterised by their form
- H01B5/16—Non-insulated conductors or conductive bodies characterised by their form comprising conductive material in insulating or poorly conductive material, e.g. conductive rubber
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L15/00—Compositions of rubber derivatives
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0017—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor for the production of embossing, cutting or similar devices; for the production of casting means
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/20—Conductive material dispersed in non-conductive organic material
- H01B1/22—Conductive material dispersed in non-conductive organic material the conductive material comprising metals or alloys
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B13/00—Apparatus or processes specially adapted for manufacturing conductors or cables
- H01B13/0016—Apparatus or processes specially adapted for manufacturing conductors or cables for heat treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B13/00—Apparatus or processes specially adapted for manufacturing conductors or cables
- H01B13/0026—Apparatus for manufacturing conducting or semi-conducting layers, e.g. deposition of metal
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
- H01B3/18—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances
- H01B3/30—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes
Definitions
- the present invention relates to a stretchable ACF, a manufacturing method thereof, and an interfacial bonding member and device including the same.
- Soft electronics are of great interest in a wide range of applications such as stretchable displays, implantable medical devices, and electronic wearables.
- applications such as stretchable displays, implantable medical devices, and electronic wearables.
- researchers have built more complex and multi-layered devices.
- One of them may be a physical and electrical interface between a device and a layer. Mismatch of elastic modulus between hard-soft-soft layers and between hard-soft layers can cause delamination and cracking during repeated deformation, resulting in device performance degradation.
- anisotropic conductive film among the electrical interconnection methods of rigid electronic devices is suitable for soft electronic applications because the manufacturing process is simple and ensures both mechanical and electrical connections, polymer and It is known as a composite of metal particles.
- An object of the present invention is to provide a stretchable ACF having excellent stretchability, a method for manufacturing the same, and an interfacial bonding member and device including the same.
- a polymer film inserted into and aligned with the polymer film, wherein the conductive particles are exposed to the outside of the upper and lower surfaces of the polymer film.
- the method comprising: preparing a polymer film patterned with a pattern including convex portions and concave portions; disposing conductive particles in the recesses of the patterned polymer film to obtain a polymer film in which conductive particles are aligned; and thermocompression bonding the polymer film in which the conductive particles are aligned.
- an interfacial bonding member including the stretchable ACF.
- a device including at least one of an electrode and an electronic component and the interface bonding member.
- the stretchable ACF according to the exemplary embodiment of the present invention has excellent stretchability, that is, elasticity, and thus may be changed according to the deformation of the substrate, and thus may be suitable for a flexible electronic device.
- the stretchable ACF according to the exemplary embodiment of the present invention has excellent adhesive strength, so that it can be applied to electronic devices to firmly bond interfaces between different members.
- the stretchable ACF according to an embodiment of the present invention may include regularly arranged conductive particles to maintain uniform and constant conductivity.
- the stretchable ACF according to an embodiment of the present invention can freely control the region in which the conductive particles are arranged, and thus can be utilized in various fields.
- the stretchable ACF according to the exemplary embodiment of the present invention has excellent elasticity and stretchability, and thus conductivity is not deteriorated even in the presence of a physical stimulus, and thus may have excellent stability.
- conductive microparticles of the same size may be inserted into the polymer film as a single layer, so that there may be no step in the height direction.
- the method for manufacturing a stretchable ACF according to an embodiment of the present invention may provide an ACF having excellent elasticity and conductivity.
- the interface bonding member according to the exemplary embodiment of the present invention may be interposed between soft-soft members or between soft-hard members to firmly bond the interface.
- the interfacial bonding member according to the exemplary embodiment of the present invention can join different members even through a low-temperature process.
- the device according to the embodiment of the present invention may have strong physical and chemical bonding between the stretchable ACF and the electrode or substrate, and as a result, the interfacial bonding strength between the electrode and the substrate may be excellent.
- FIG. 1 is a schematic diagram of a stretchable ACF film according to an embodiment of the present invention.
- FIG. 2 is a schematic diagram of a method for manufacturing an extensible ACF according to an embodiment of the present invention.
- FIG. 3 is a schematic diagram of a case in which conductive particles of an extensible ACF function as a conduction path according to an embodiment of the present invention.
- FIG. 4 is a schematic diagram for calculating the minimum width of a connectable wiring in a form in which conductive particles of an extensible ACF are arranged according to an embodiment of the present invention.
- Example 5 is a SEM image of a cross-section of a patterned polymer film in which conductive particles of Example 1 are aligned.
- FIG. 6 is a SEM image of a cross-section of the stretchable ACF prepared in Example 1.
- 7A and 7B are OM images of the surface of the stretchable ACF prepared in Example 1, respectively.
- 10A to 10C are surface OM images of stretchable ACFs prepared in Examples 1, 4, and 5, respectively.
- Example 11 is an OM image taken from the upper surface of the laminate including the stretchable ACF prepared in Example 1.
- 13 is a graph of the adhesive force according to the distance of the laminates prepared in Examples 6 to 8 and Reference Examples 3 and 4;
- Example 14 is a graph showing pressure and relative current according to time applied to the laminate of Example 9;
- 15 and 16 are graphs showing elongation and relative current according to time applied to the laminates of Examples 10 and 11, respectively.
- the unit "part by weight” may mean a ratio of weight between each component.
- a and/or B means “A and B, or A or B.”
- a polymer film inserted into and aligned with the polymer film, wherein the conductive particles are exposed to the outside of the upper and lower surfaces of the polymer film.
- the stretchable ACF has excellent stretchability, ie, elasticity, so that it can be changed together according to the deformation of the substrate, so it can be suitable for a flexible electronic device, and has excellent adhesion, so that it can be applied to an electronic device to each other It can firmly bond the interfaces of other members, maintain uniform and constant conductivity including regularly arranged conductive particles, and can freely control the area where conductive particles are arranged, which can be used in various fields.
- the stretchable ACF includes a polymer film.
- the polymer film has excellent elasticity, high elongation, and low conductivity, so that an ACF can be formed so that electricity can flow only at a desired location.
- the polymer film may include a thermoplastic rubber grafted with maleic anhydride.
- the thermoplastic rubber grafted with maleic anhydride has excellent flexibility and elasticity, and thus may be suitable as a material for the polymer film.
- the thermoplastic rubber is styrene-ethylene-butylene-styrene (SEBS), styrene-isoprene-styrene (SIS), styrene-butadiene-styrene (SBS), polyurethane (PU)-based rubber. and polyolefin (PO)-based rubber, preferably styrene-ethylene-butylene-styrene, but is not limited to those listed above.
- SEBS styrene-ethylene-butylene-styrene
- SIS styrene-isoprene-styrene
- SBS styrene-butadiene-styrene
- PU polyurethane
- PO polyolefin
- the content of maleic anhydride relative to the total weight of the thermoplastic rubber may be 1% by weight or more.
- maleic anhydride is included in an amount within the above range, there is an effect of providing a sufficient number of bond formation sites relative to the adhesion area.
- the thickness of the polymer film may be 10 ⁇ m to 30 ⁇ m, but is not limited within the above range.
- the stretchable ACF includes conductive particles.
- the conductive particles may provide an ACF having region-selective conductivity at least on the surface of which is conductive.
- the conductive particles are inserted and aligned in the polymer film. That is, the conductive particles may be embedded in the polymer film, and may be regularly arranged and aligned.
- the “alignment” may mean that a plurality of conductive particles are arranged at the same interval or at intervals having a specific regularity. That is, when a certain conductive particle is inserted into the polymer film, the other conductive particles may be positioned at a predetermined distance, and another conductive particle may be positioned at a predetermined distance from the other conductive particles. .
- the conductive particles may be arranged in any one arrangement form of a grid type, a honeycomb type, a linear type, and a square shape, but the present invention is not limited thereto and may be arranged in various shapes as needed.
- the distance between the conductive particles may be 10 ⁇ m to 400 ⁇ m, but it is not limited thereto, and it can be adjusted according to the arrangement shape, the diameter of the conductive particles, and the field of application of the stretchable ACF.
- the distance between the conductive particles may mean a distance from the center of one conductive particle to the center of another conductive particle.
- the distance between the conductive particles may be L to 1.41 L.
- the distance between the conductive particles at the origin and the particles in the vertical direction, that is, on the x-axis and the y-axis may be L, and the distance from the particles on the plane other than the axis is ⁇ 2L, that is, about 1.41 L.
- the L may be 15 ⁇ m to 400 ⁇ m.
- the distance between the conductive particles may be L.
- the six conductive particles closest to the conductive particle at the origin may all be located at a distance L.
- L may be 15 ⁇ m to 400 ⁇ m.
- the material and shape of the conductive particles are not particularly limited, but at least the surface is preferably a metal material and has a spherical shape.
- the conductive particles may be metal particles or hollow metal particles, and may be particles having a non-conductive material inside and a conductive coating only on the surface.
- it is not limited to the above, and those used in the relevant technical field may be used.
- the conductive particles may include a core including a polymer; and a shell including a metal; and may have a core-shell structure.
- a core containing a polymer and a shell containing a metal are included, conductive particles of a uniform size can be used for the stretchable ACF, and the weight of the stretchable ACF can be reduced, thereby reducing the weight of the device. And there is the effect of reducing the production cost.
- the diameter of the conductive particles may be in the range of 10 ⁇ m to 200 ⁇ m.
- the numerical range may correspond to the particle size range of the conductive particles used in the relevant technical field, so that various technical applications may be possible.
- each of the individual conductive particles may have the same diameter. When conductive particles having the same diameter are used, there is no step in the height direction of the stretchable ACF, so a separate bumper layer for anisotropic conduction may not be required.
- the conductive particles may be aligned in a partial region of the polymer film. That is, when the polymer film is a two-dimensional plane, a region in which the conductive particles are aligned may exist only in a part of the corresponding area.
- the position of the region may vary depending on the device utilizing the stretchable ACF, and the position of the region may be adjusted according to the purpose.
- the region may be one or a plurality of regions, and the number of regions may vary depending on an apparatus using the stretchable ACF or the purpose of application.
- FIG. 1 is a schematic diagram of a stretchable ACF film according to an embodiment of the present invention.
- the conductive particles may be aligned in a partial region of a polymer film.
- the conductive particles are exposed to the outside of the upper and lower surfaces of the polymer film.
- a current flowing from a member in contact with one surface of the stretchable ACF may flow to another member in contact with the other surface of the stretchable ACF, and the conductive path ( path) can be used.
- FIG. 3 is a schematic diagram showing a case where the conductive particles of the stretchable ACF according to an embodiment of the present invention function as a conduction path.
- current may flow in the vertical direction through the portion exposed to the outside of the upper and lower surfaces of the polymer film as a vertical conduction path (blue arrow) ), since the polymer film is non-conductive, it can be confirmed that current cannot flow in the horizontal direction (black arrow).
- 10% to 30%, 14% to 30%, 10% to 21%, or 14% to 21% of the outer surface of the conductive particles are exposed to the outside of the polymer film. have.
- the step difference of the stretchable ACF is minimized and the connection resistance is low, so that excellent conductivity can be ensured.
- the region to which the conductive particles are exposed may be on the same plane as the polymer film.
- the shape of the conductive particles may be deformed by the stretchable ACF manufacturing process.
- the stretchable ACF according to an embodiment of the present invention may have a stress of 10 MPa or less, 8 MPa or less, or 5 MPa or less when stretched at an elongation of 100%.
- the stretchability of the ACF may be excellent, and even if there is a physical stimulus, conductivity may not be lowered, and thus conduction stability may be excellent.
- the stretchable ACF according to an embodiment of the present invention may have a stress of 10 MPa or less when stretched at an elongation of 200%.
- a relative current value according to Equation 1 may be 0.8 or more and less than 1.05. That is, the stretchable ACF according to an embodiment of the present invention may have excellent conduction stability because conductivity does not decrease even when there is a stretching stimulus.
- Equation 1 I is the current measured in the stretched state at an elongation of 80%, and I 0 is the current measured in the non-stretched state.
- the method comprising: preparing a polymer film patterned with a pattern including convex portions and concave portions; disposing conductive particles in the recesses of the patterned polymer film to obtain a polymer film in which conductive particles are aligned; and thermocompression bonding the polymer film in which the conductive particles are aligned.
- the method for manufacturing an extensible ACF according to an embodiment of the present invention may provide an ACF having excellent elasticity and conductivity.
- a polymer film patterned with a pattern including convex portions and concave portions is prepared.
- the pattern including the convex portion and the concave portion may conform to an area requiring conduction in the circuit.
- the step of preparing the patterned polymer film is not particularly limited, and the patterned polymer film can be prepared by a method used in the field of imprint lithography. Examples thereof include, but are not limited to:
- the manufacturing of the patterned polymer film includes: manufacturing a multi-use stamp; and thermocompression-bonding the multi-use stamp with the polymer film to prepare a polymer film patterned with a pattern including convex portions and concave portions.
- FIG. 2 shows a schematic diagram of a method for manufacturing an extensible ACF according to an embodiment of the present invention.
- a patterned polymer film 60 is prepared by thermocompression bonding the multi-use stamp 30 with a polymer film, and conductive particles 10 are placed in the recesses of the patterned polymer film 60 , and then , the stretchable ACF 100 may be manufactured by thermocompression bonding the polymer film 60 in which the conductive particles are aligned.
- the step of manufacturing the multi-use stamp is not particularly limited, and the multi-use stamp may be manufactured by a method used in the imprint lithography field. Examples thereof include, but are not limited to:
- the manufacturing of the multi-use stamp may include coating and curing a photoresist on a substrate to form a photoresist layer; forming a patterned photoresist layer by placing a photomask on the photoresist layer and irradiating light; and further curing the patterned photoresist layer and immersing it in a developing solution to prepare a mold; and manufacturing a multi-use stamp including a pattern including convex portions and concave portions using the mold; may include.
- a photoresist may be coated on a substrate and cured to form a photoresist layer.
- the substrate is not particularly limited, and a silicon wafer, glass, indium tin oxide (ITO), and metal substrates such as gold, aluminum, copper, nickel, and the like may be used.
- the photoresist may be utilized without any particular limitation as long as it is used in the relevant technical field, and may include, for example, a photosensitive resin.
- a suitable level of workability for forming a columnar shape positioned on a substrate may be used, and in particular, in the columnar shape, a workability of a level suitable for forming a shape in which the ratio of the column height to the column diameter is 4 or more can be used with
- a method of coating the photoresist is not particularly limited, and may be coated using a spin coating method for uniform coating.
- the coating may be performed once or twice or more, and a thicker photoresist layer may be formed when coating is performed several times.
- the process of curing the photoresist may be performed by a first heat treatment step and a second heat treatment step.
- the first heat treatment may be performed at a temperature of 50 ° C. to 70 ° C. for 5 minutes to 15 minutes
- the second heat treatment step is performed at a temperature of 80 ° C. to 100 ° C. for 15 minutes to 25 minutes. it could be
- a photomask is placed on the photoresist layer thus formed and light is irradiated to form a patterned photoresist layer.
- the photoresist may include a photosensitive resin, and the molecular structure of the photosensitive resin included in the photoresist is modified by an exposure process of placing a photomask including a predetermined pattern on the photoresist layer and irradiating light. and a difference in physical properties with the unexposed portion may be formed.
- the photomask may finally include a pattern having a desired shape.
- the light beam passing through the light-transmitting part of the photomask can be photocured by modifying the molecular structure of the resin of the photoresist, and the photoresist layer under the light-transmitting part of the photomask has a molecular structure that is modified by the light beam. Since it does not proceed, a separate photocuring may not proceed. That is, the photo-cured photoresist and non-photo-cured photoresist formed according to the shape of the pattern included in the photomask may form concave and convex portions of the mold by treatment with a developing solution, which will be described later.
- the photomask may have a shape including a plurality of cells, and may have any one of a lattice type, a honeycomb type, a linear shape, and a rectangular shape.
- the size of the cell may be larger than the diameter of the conductive particles, for example, may have a size of more than 500 nm and 100 ⁇ m or less.
- the forming of the patterned photoresist layer may be performed by irradiating light having a wavelength of 300 nm to 400 nm, and the light may be irradiated for 30 seconds to 50 seconds, 20 mW/cm2 It may be irradiated with an energy density of 40 mW/cm2.
- the photoresist layer can be smoothly photoreacted, and in particular, the light transmitting portion of the photomask can be sufficiently photoreacted. .
- the patterned photoresist layer may be further cured.
- the additional curing may be performed as a first additional heat treatment step and a second additional heat treatment step, and the first additional heat treatment step may be performed at a temperature of 50 ° C. to 70 ° C. for 5 minutes to 15 minutes.
- the second heat treatment may be performed at a temperature of 80° C. to 100° C. for 15 minutes to 25 minutes.
- first additional heat treatment may be performed for a shorter time than the first heat treatment
- second additional heat treatment may be performed for a shorter time than the second heat treatment
- the degree of curing of the photocured photoresist may be increased, and the photocured photoresist may be dissolved or the photocured photoresist layer may not be damaged in the developing step to be described later.
- the patterned photoresist layer may be immersed in a developing solution to manufacture a mold.
- the photoresist that is not photocured formed on the light-transmitting portion of the photomask has a low degree of curing and may be removed by the developing solution. That is, the photo-cured photoresist formed by being irradiated with light through the light-transmitting part of the photomask has a high degree of curing and is not removed even if it is immersed in a developing solution, thereby forming the convex part of the mold.
- the recesses of the mold can be formed by being removed by the developer solution.
- the developing solution one used in the relevant technical field may be used, and a solution suitable for development may be used in consideration of the type of photoresist.
- the developing solution may include an organic solvent capable of dissolving the photoresist.
- the patterned photoresist layer may be immersed in a developing solution for 10 to 30 minutes or 15 to 20 minutes to proceed with development.
- a developing solution for 10 to 30 minutes or 15 to 20 minutes to proceed with development.
- the steps of the concave and convex portions of the mold are sufficiently provided to make the pattern clear, and accordingly, the problem of pattern blur during the transfer process may not occur, and the mold
- the multi-use stamp and the patterned polymer film produced by may have an appropriate level of step for the conductive particles to be accurately placed.
- the mold may be manufactured based on the patterned photoresist layer, and since the photoresist layer forms concave portions and convex portions based on the photomask, the mold may have a plurality of It may have a shape including cells, and may be any one of a lattice type, a honeycomb type, a linear shape, and a rectangular shape.
- the size of the cell may be larger than the diameter of the conductive particles, for example, may have a size of more than 500 nm and 100 ⁇ m or less.
- the mold may have a form in which photocured photoresist pillars are formed on a substrate. That is, the convex portions of the mold may be photo-cured photoresist pillars, and the concave portions of the mold may be spaces between the photo-cured photoresist pillars.
- a multi-use stamp including a pattern including convex portions and concave portions may be manufactured by using the mold next.
- the convex portion and the concave portion may be formed in the mold as described above, the convex portion of the mold may form the concave portion of the multi-use stamp, and the concave portion of the mold may form the concave portion of the multi-use stamp.
- the manufacturing of the multi-use stamp may include: pouring a prepolymer solution on the mold and curing it to form a polymer pattern layer; It may include; pouring and curing a photocurable resin composition on the polymer pattern layer to prepare a multi-use stamp.
- the mold includes concave and convex portions having the same shape as the desired multi-use stamp, since the mold includes photoresist pillars formed on the substrate, the bonding force between the substrate and the photoresist pillar is low, so that it can be used as a multi-use stamp. Therefore, it is possible to manufacture a multi-use stamp by the same process as above.
- the prepolymer solution may include PDMS, but is not limited thereto, and may include silicone-based rubber that is used in the art and has a low surface energy, so that it is easy to demold, ie, separate from the mold.
- PDMS polymethyl methacrylate
- silicone-based rubber that is used in the art and has a low surface energy, so that it is easy to demold, ie, separate from the mold.
- Ecoflex or Dragon skin among commercially available products can be used.
- the prepolymer solution may include a liquid prepolymer, and may include at least one additive selected from a solvent, a crosslinking agent, an initiator, an antifoaming agent, and a chain extender.
- the polymer pattern layer may be formed by curing the prepolymer solution at a temperature of 50°C to 150°C or 70°C to 90°C for 2 hours to 4 hours or 3 hours.
- the degassing process may be performed before the photocurable resin composition is poured onto the polymer pattern layer and then cured.
- the polymer pattern layer includes concave portions having a very narrow diameter, when the photocurable resin composition is poured onto the polymer pattern layer, the photocurable resin composition does not sufficiently penetrate into the concave portions of the polymer pattern layer due to capillary action.
- a degassing process of removing a gas located in the space between the photocurable resin composition and the concave portion of the polymer pattern layer may be performed to allow the photocurable resin composition to penetrate deeply into the concave portion of the polymer pattern layer, and thus It is possible to form a multi-use stamp having a high shape similarity to the polymer pattern layer.
- the photocurable resin composition may include a photocurable resin, and the photocurable resin is not particularly limited and may include those used in the art.
- the cured product of the photocurable resin composition may have an appropriate modulus, for example, may have a Shore A hardness of greater than 61 and less than 95.
- the multi-use stamp is manufactured by irradiating the photocurable resin composition with light at an energy density of 196 mW/cm2 to 134 mW/cm2 or 198 mW/cm2 to 132 mW/cm2 for 20 to 30 minutes and curing it.
- the multi-use stamp since the multi-use stamp can be manufactured based on the mold, it may have a shape including a plurality of cells, and may have any one shape of a grid type, a honeycomb type, a linear type, and a square shape. have.
- the size of the cell may be larger than the diameter of the conductive particles, for example, may have a size of more than 500 nm and 100 ⁇ m or less.
- the surface of the multi-use stamp on which the concave and convex portions are formed may be surface-treated with silane. Since the multi-use stamp is surface-treated with silane, the multi-use stamp can be easily separated after the polymer film is patterned.
- a polymer film patterned with a pattern including convex portions and concave portions may be manufactured by thermocompression bonding the multi-use stamp prepared as described above with the polymer film.
- the multi-use stamp may be manufactured as described above and have a pattern including convex portions and concave portions.
- the convex portions and concave portions of the multi-use stamp may be in contact with the soft polymer film, and the polymer film may be deformed and patterned according to the pattern of the multi-use stamp by thermocompression bonding. That is, the concave portion of the patterned polymer film may be formed by the convex portion of the multi-use stamp, and the convex portion of the patterned polymer film may be formed by the concave portion of the multi-use stamp.
- the polymer film may be thermocompression-bonded on a substrate, and the substrate may be a surface on which the polymer film is formed, which is surface-treated with silane.
- the substrate may be a slide glass, but is not particularly limited, and the extensible ACF manufactured later can be easily separated by silane surface treatment.
- the polymer film contains 5 wt% to 20 wt%, 6 wt% to 20 wt%, 6 wt% to 12 wt%, 8 wt% to 12 wt% of maleic anhydride grafted thermoplastic rubber. It may be prepared by coating and drying a solution containing 6% to 12% by weight or 6% by weight.
- the polymer film contains a thermoplastic rubber grafted with maleic anhydride in an amount within the numerical range, the extensibility ACF to be manufactured is manufactured to match the desired shape, so that when applied to devices, etc., the connection rate is excellent and the conductivity is excellent.
- the thermoplastic rubber is styrene-ethylene-butylene-styrene (SEBS), styrene-isoprene-styrene (SIS), styrene-butadiene-styrene (SBS), polyurethane (PU)-based rubber. and polyolefin (PO)-based rubber.
- SEBS styrene-ethylene-butylene-styrene
- SIS styrene-isoprene-styrene
- SBS polyurethane
- PO polyolefin
- the polymer film may have a thickness of 10 ⁇ m to 30 ⁇ m or 15 ⁇ m to 20 ⁇ m.
- the step of thermocompression bonding the multi-use stamp with the polymer film is 150 °C to 200 °C, 160 °C to 200 °C, 150 °C to 190 °C, 160 °C to 190 °C, 160 °C to It may be performed by thermocompression bonding at a temperature of 180 °C or 170 °C to 180 °C for 5 minutes to 20 minutes, 7 minutes to 15 minutes, or 9 minutes to 11 minutes.
- thermocompression bonding is performed at a temperature and pressure within the above range, patterning of the polymer film can be smoothly performed, and the extensible polymer film for ACF can be molded without destroying the multi-use stamp, and the pressure in the thermocompression bonding region It can be uniformly dispersed and molded to have an accurate numerical value, thereby improving the particle placement accuracy.
- the step of thermocompression bonding the multi-use stamp with the polymer film may be performed by applying a pressure of 5 MPa to 20 MPa or 7.0 MPa to 15.7 MPa, but is not limited to the above range It may be performed by applying sufficient pressure to the polymer film to be patterned.
- the method of applying the pressure is also not particularly limited, and, for example, may be compressed by gravity by lifting a weight, and may be compressed by magnetic force by placing permanent magnets at the lower and upper portions.
- the maximum step difference between the convex portions and the concave portions of the patterned polymer film, that is, the depth may be 5 ⁇ m to 350 ⁇ m.
- the conductive particles may be precisely disposed in the concave portion as will be described later.
- the maximum step, ie, the depth, of the convex and concave portions of the patterned polymer film is 0.3 to 0.8 times, 0.5 to 0.8 times, 0.6 to 0.8 times or more than the diameter of the conductive particles. It may be 0.7 times.
- the conductive particles may be well inserted into the concave portion and do not easily fall out after being inserted, thereby providing excellent process stability.
- the patterned polymer film since the patterned polymer film can be manufactured based on the multi-use stamp, it may have a shape including a plurality of cells, and any one of a lattice type, a honeycomb type, a linear type, and a square type. may be in the shape of In addition, the size of the cell may be larger than the diameter of the conductive particles, for example, may have a size of more than 500 nm and 100 ⁇ m or less.
- the concave portion may have a shape of a space formed by the convex portion, and the space may be a space having a size larger than the diameter of the conductive particles.
- the size, ie, the width, of the concave portion of the patterned polymer film may be greater than 1.0 times and less than or equal to 1.5 times the particle diameter. Accordingly, one conductive particle can be accurately and stably arranged in one concave portion. By disposing the conductive particles in this way, a polymer film in which the conductive particles are aligned can be obtained.
- conductive particles are disposed in the concave portion of the patterned polymer film prepared as described above.
- the process of disposing the conductive particles is not particularly limited, but may be performed, for example, by the following method.
- the disposing of the conductive particles includes: positioning a plurality of conductive particles on a part or all of the patterned polymer film; placing an elastic member on the conductive particles at a distance of 1 to 10 times the diameter of the conductive particles from the patterned polymer film; and reciprocating the patterned polymer film by a predetermined distance once or a plurality of times in one direction to insert the conductive particles into the concave portion of the patterned polymer film by the elastic member.
- a plurality of conductive particles may be placed on some or all of the patterned polymer film. Specifically, it may be to position a plurality of conductive particles on the patterned surface including the concave and convex portions of the patterned polymer film.
- the process of disposing the particles may be applied to a process of disposing conductive particles of various sizes as a dry process.
- an elastic member may be positioned on the conductive particles at a distance of 1 to 10 times, 1 to 5 times, 1 to 2 times, or 1.5 times the diameter of the conductive particles from the patterned polymer film.
- the elastic member may serve to hold the conductive particles, and more specifically, may perform a role of rubbing on the pattern including the concave and convex portions formed in the polymer film in direct contact with the conductive particles.
- the elastic member is PDMS (polydimethylsiloxane), PUA (polyurethane acrylate), PMMA (polymethyl methacrylate), PB (polybutadiene), PU (polyurethane), SBR (styrene-butadiene rubber), PVDF (polyvinylidene fluoride), PVDF-TrFE (poly (vinylidenefluoride-co-trifluoroethylene)), PS(polystyrene), SBS PEDGA(poly(ethylene glycol) diacrylate), SBS(ploy(styrene-butadiene-styrene)), SEBS(poly(styreneethylene-butylene-styrene)), SIS (poly(styrene-isoprene-styrene)), etc. are possible, but preferably PDMS.
- the patterned polymer film may be reciprocated once or a plurality of times in one direction by a predetermined distance to allow the elastic member to insert the conductive particles into the concave portion of the patterned polymer film.
- the patterned polymer film may be positioned and moved on a moving member, and the moving member may be a belt of a conveyor.
- the patterned polymer film on the belt is correspondingly deformed into a ⁇ or ⁇ shape, so that the conductive particles are continuously disposed on a large area.
- a portion of the patterned polymer film is moved using the moving member, and the patterned polymer film is reciprocated once or a plurality of times in one direction by a predetermined distance to form a polymer film in which the conductive particles are patterned. It may be inserted into the concave portion of the other part, and the above step may be repeated a plurality of times, respectively, as needed.
- conductive particles may be aligned in the concave portions of the patterned polymer film.
- a polymer film in which conductive particles are aligned through the above process thermocompression-bonding it to prepare an extensible ACF.
- Conductive particles may be aligned in the recesses of the polymer film, and when they are thermocompressed, the polymer film is deformed to fill the void between the conductive particles and the polymer film, and the conductive particles are firmly inserted into the polymer film.
- Extensible ACFs can be prepared.
- the step of thermocompression bonding the polymer film in which the conductive particles are aligned 100 °C to 300 °C, 130 °C to 300 °C, 100 °C to 280 °C, 130 °C to 280 °C, 130 °C To 250 °C, 130 °C to 235 °C, 130 °C to 200 °C, 180 °C to 235 °C or 235 °C to 280 °C at a temperature of 1 hour to 4 hours or 2 hours may be performed by thermocompression bonding.
- thermocompression bonding When thermocompression bonding is performed at a temperature and time within the above range, the polymer may be appropriately deformed to be in close contact with the conductive particles, and all of the polymer remaining on the exposed surface of the conductive particles is removed, thereby reducing contact resistance.
- the temperature and time for performing the thermocompression bonding may be adjusted according to the type of thermoplastic rubber included in the polymer film.
- the step of thermocompression bonding the polymer film in which the conductive particles are aligned may be performed by applying a pressure of 50 MPa to 150 MPa or 57.1 MPa to 128 MPa, but is not limited to the above range It may be carried out by applying sufficient pressure to properly deform the polymer film and the conductive particles to adhere.
- the method of applying the pressure is also not particularly limited.
- the method may further include surface-treating one or both surfaces of the stretchable ACF with oxygen plasma.
- the surface of the stretchable ACF is surface-treated with oxygen plasma, the surface energy is increased and the surface becomes relatively hydrophilic, thereby improving interfacial adhesion with other members.
- the stretchable ACF manufactured by the method according to an embodiment of the present invention may have an alignment retention of 0.8 to 1.0.
- the “alignment retention” may mean the number of conductive particles per unit area after the second thermocompression bonding to the number of conductive particles per unit area before the second thermocompression bonding, and may be expressed by the following Equation 2.
- N is the number of conductive particles per unit area after secondary thermocompression bonding
- N 0 is the number of conductive particles per unit area before secondary thermocompression bonding
- the stretchable ACF to be manufactured is manufactured to match the desired shape, so that when applied to a device, the connection rate is excellent and conductivity can be excellent, and aggregation of conductive particles does not occur , it is possible to increase the electrical resolution of the ACF.
- the stretchable ACF can be manufactured while the alignment before thermocompression bonding is maintained, the stretchable ACF is calculated in advance in consideration of the wiring width of a circuit for using the stretchable ACF as an adhesive member, and the stretchable ACF is manufactured according to the circuit can do.
- an interfacial bonding member including the stretchable ACF.
- the interface bonding member may be interposed between soft-soft members or between soft-hard members to firmly bond the interface.
- a device including at least one of an electrode and an electronic component and the interface bonding member.
- the device can be applied to the semiconductor industry, the display industry, etc. in various forms within the scope used in the relevant technical field.
- the device may include at least one of an electrode and an electronic component.
- the device may include one or more electrodes, one or more electronic components, or both electrodes and one or more electronic components.
- the electronic component may include at least one of an active device and a passive device.
- the active device may include an electronic member forming an integrated circuit such as a driving chip, a light emitting device, and a memory device.
- the electronic component may be a wiring.
- the electrode may include a substrate on which a conductive material layer is formed.
- the substrate may be an insulating material such as a polymer substrate, and the conductive material layer may include a metal such as gold.
- the interfacial bonding member bonds between electrodes when the device includes one or more electrodes, or bonds between electronic components when the device includes one or more electronic components, between electrodes when the device includes at least one of the electrodes and electronic components; between electronic components; and between electrodes and electronic components; It may be a bonding of one or more of them.
- the stretchable ACF may be bonded to a wiring having a width that can include at least one particle.
- Figure 4 shows a schematic diagram for calculating the minimum width of the wiring in the form in which the conductive particles of the stretchable ACF according to an embodiment of the present invention are arranged.
- the wiring if the wiring is arranged at an angle of 45° to the conductive particle arrangement as shown in the red shade, the wiring must be at least 3.41 If the width of a+0.71b or more, the electrical connection can be ensured, and if the wiring is arranged at 0° to the conductive particle array as shown in the blue shade, if the circuit has a width of at least 4a+b, the electrical Connection can be guaranteed.
- the minimum width of the wiring may be calculated differently depending on the arrangement of the conductive particles, the size of the conductive particles, and the spacing between the conductive particles, and the conductivity of the stretchable ACF according to an embodiment of the present invention for a circuit having such a minimum width This can be guaranteed.
- the substrate may be a flexible substrate or a stretchable substrate.
- the flexible substrate may be a substrate whose shape may change due to an external force, but the size of the substrate cannot be changed, and the flexible substrate may be a substrate whose shape may change due to an external force while the size of the substrate may change as well.
- At least one of the electrode and the electronic component may have a hydrophilic surface-treated surface in contact with the interfacial bonding member.
- the hydrophilic surface treatment may be oxygen plasma treatment.
- oxygen plasma treatment is performed on the surface of the electrode and/or substrate, surface energy may be improved by introducing a hydroxyl group to the surface, and thus a chemical bond may be formed with the stretchable ACF, thereby improving bonding strength.
- the hydrophilic surface treatment may use a silane compound, and the silane compound is a thiol group, an amine group, a glycidyl group, a hydroxyl group, a carboxyl group, a vinyl group, a phosphonate group, an anhydride group , a (meth) acrylate group, an isocyanate group, an aldehyde group, a cyano group, an azide group, an ester group, and may include one or more of a halogen substituent.
- the hydrophilic functional group forms a chemical bond with the polymer film, so that bonding strength between the stretchable ACF and the electrode or the substrate may be improved.
- the electrode and the electronic component when at least one of the electrode and the electronic component is subjected to a hydrophilic surface treatment on a surface in contact with the interfacial bonding member, simple compression even at a low temperature of about 50 to 100 °C by chemical bonding It can be bonded to the stretchable ACF only by using only the ACF, so that the polymer film does not dissolve or the conductive particles do not move, so bonding stability can be excellent.
- the compression may be performed at a pressure of 0.1 MPa or more, but is not limited to the above range.
- the method of applying the pressure is also not particularly limited, and for example, the member may be directly compressed by hand.
- Styrene-ethylene-butylene-styrene grafted with maleic anhydride SEBS-g-MA, MA content is 2 wt% or less: Sigma-Aldrich
- Chloroform (99.5%): Samcheon Chemical, Korea
- Gold-coated conductive microparticles (diameter 3.25 ⁇ m): Deoksan Co., Korea
- SU-8 50 photoresist was spin-coated on the Si wafer at 500 rpm for 10 sec and 2000 rpm for 30 sec. Then, it was heat-treated twice at 65° C. for 10 minutes and at 95° C. for 20 minutes. Thereafter, a photomask was placed thereon and then exposed to 30 mW/cm2 ultraviolet light with a wavelength of 365 nm for 36 seconds.
- the slightly crosslinked photoresist was post-heat-treated at 65° C. for 9 minutes and at 95° C. for 12 minutes, and then immersed in a developer solution to remove the unexposed SU-8 prepolymer. Then, after rinsing with IPA, the solution was removed by evaporation at 80° C. to obtain a mold.
- Liquid PDMS prepolymer and crosslinking agent weight ratio 10:1 was poured onto a mold and cured at 80° C. for 3 hours. Then, NOA 61 was poured onto the cured polymer pattern layer and the NOA 61 prepolymer was degassed to overcome the capillary force. Uncured NOA 61 on the polymer pattern layer was exposed to UV of 132 mW/cm 2 for 20 minutes, and then peeled off from the polymer pattern layer and washed with toluene. A 2 wt % solution of OTS in toluene was spin-coated on an oxygen plasma-treated NOA 61 stamp to prepare a multi-use stamp.
- Extensible ACF was obtained in the same manner as in Example 1, except that the patterned polymer film in which conductive particles were aligned was interposed between PDMS and slide glass and thermocompressed under vacuum at 180° C. for 2 hours.
- Stretchable ACF was obtained in the same manner as in Example 1, except that a patterned polymer film in which conductive particles were aligned was interposed between PDMS and slide glass and thermocompressed under vacuum at 130° C. for 2 hours.
- Extensible ACF was obtained in the same manner as in Example 1, except that a 6 wt% solution of SEBS-g-MA in chloroform was used.
- Extensible ACF was obtained in the same manner as in Example 1, except that a 12 wt% solution of SEBS-g-MA in chloroform was used.
- the patterned polymer film in which the conductive particles prepared in Example 1 were aligned was prepared without performing a separate thermocompression bonding process.
- Example 1 the cross-section of the patterned polymer film in which the conductive particles were aligned was taken SEM images using an FE-SEM (S-2400, Hitachi) device at 25 kV and 1.2 k times.
- Example 5 shows an SEM image of a cross-section of the patterned polymer film in which the conductive particles of Example 1 are aligned.
- the polymer film is patterned in a pattern including concave portions and convex portions, and conductive particles are arranged and aligned in the concave portions of the pattern.
- Example 6 shows an SEM image of a cross-section of the stretchable ACF prepared in Example 1.
- the conductive particles included in the polymer film are in a spherical shape observed in FIG. 5 , deformed by thermocompression bonding, so that the top and bottom are exposed.
- the surface of the stretchable ACF prepared in Example 1 was taken using an Olympus BX-51 in reflective mode and an optical microscope (OM) image under the condition of 200 times, and 100% of the stretchable ACF prepared in Example 1 was used. After uniaxial stretching in the transverse direction, OM images of the surface were taken under the same conditions as above.
- the stretchable ACF prepared in Example 1 has excellent structural stability and durability because the polymer film is not destroyed or particles are not removed even when the stretching stimulus is stimulated.
- the stretchable ACF of Examples 1 to 3 and the films of Reference Examples 1 and 2 were cut to a size of 5 mm ⁇ 30 mm, and both sides were fixed to a tensioner with a polyimide adhesive tape. Stress strain curves were obtained under the following conditions using a tensioner (T95-PE, LINKAM SCIENTIFIC INSTRUMENTS LTD, UK): The tensile ACP thickness was 13 ⁇ m, and the size was 5 mm * 5 mm. The tensile speed was 50 ⁇ m/s and the initial distance was 5 mm.
- the stretchable ACFs of Examples 1 to 3 have excellent stretchability and thus the stress is less than 10 MPa under an elongation of 100%.
- the stretchable ACF of Example 1 prepared by thermocompression bonding at the highest temperature has the lowest stress and thus excellent elasticity.
- a gold circuit line with a width of 1 mm and a thickness of 60 nm was prepared with a thermal evaporator (TERALEADER Co. LTD., Korea) using a PET shadow mask on an MPTMPS-treated PI film.
- the ACFs prepared in Examples 1, 4 and 5 were laminated on the prepared gold circuit line, and 4-probe measurement was performed using a Keithley 2450. Connection resistance was derived from the measurement result. In addition, the connection resistance was measured under the same conditions by directly connecting using a liquid metal (ref).
- the stretchable ACF prepared in Example 1 has an excellent effect due to high alignment retention while low connection resistance.
- the content of the polymer is small and the connection resistance is not constant due to a mixture of a wide area and a narrow area where the conductive particles are exposed during the thermocompression bonding process, so the scale bar is displayed in a rather wide range.
- OM images were taken on the surfaces of the stretchable ACFs prepared in Example 1 and Examples 4 and 5 using Olympus BX-51 in reflection mode, 50 times.
- 10a to 10c show the surface OM images of the stretchable ACFs prepared in Examples 1, 4, and 5, respectively.
- wiring 1 and wiring 2 were prepared by depositing a 100 ⁇ m-wide gold line with an evaporator, and then, between wiring 1 and wiring 2, the connection prepared in Example 1 was The surface of the laminate prepared by laminating so that the new ACF is located and thermocompression bonding at a temperature of 230° C. for 1 to 2 hours was taken as an OM image in the reflective mode and 50 times condition using Olympus BX-51.
- FIG 11 shows an OM image taken from the upper surface of the laminate including the stretchable ACF prepared in Example 1.
- the stretchable ACF (a portion in which the conductive particles are aligned) is positioned between the wiring 1 (the dark pink solid line portion) and the wiring 2 (the black dotted line portion). Also shown are gold lines of Wire 1 and Wire 2 connected via stretchable ACF (A1-A2 (not shown), B1-B2, C1-C2, D1-D2, E1-E2).
- connection lines (A1-A2, B1-B2, C1-C2, D1-D2, E1-E2) of the stacked wiring 1 and 2 it was confirmed that high conductivity connection is possible through the ACF, It was confirmed that no current was measured in lines A1-B2. As a result, it can be confirmed that perfect anisotropic conduction is achieved through the fabricated ACF.
- the polyimide film washed with acetone, ethanol, and deionized water was subjected to oxygen plasma treatment, and a (3-mercaptopropyl)trimethoxysilane solution was vapor-deposited for 2 hours in a vacuum to deposit target molecules.
- the self-assembled membrane (SAM)-treated substrate was rinsed and dried at 80° C. to prepare a surface-treated substrate.
- a surface-treated substrate was prepared in the same manner as in Preparation Example 1, except that a (3-aminopropyl)triethoxysilane solution was used.
- a surface-treated substrate was prepared in the same manner as in Preparation Example 1, except that a (3-glycidyloxypropyl)triethoxysilane solution was used.
- the stretchable ACF prepared in Example 1 was interposed between the two surface-treated substrates prepared in Preparation Example 1 so as to be in contact with the surface-treated surface, and thermocompression-bonded for 1 hour to prepare a laminate.
- the stretchable ACF prepared in Example 1 was interposed between the two surface-treated substrates prepared in Preparation Example 2 so as to be in contact with the surface-treated surface, and thermocompression-bonded for 1 hour to prepare a laminate.
- the stretchable ACF prepared in Example 1 was interposed between the two surface-treated substrates prepared in Preparation Example 3 so as to be in contact with the surface-treated surface, and thermocompression-bonded for 1 hour to prepare a laminate.
- the purchased and prepared double-sided tape (TT044) for wig adhesion from 3M was interposed between the two surface-treated substrates prepared in Preparation Example 3 so as to be in contact with the surface-treated surface, and thermocompression-bonded for 1 hour to prepare a laminate.
- the purchased and prepared polystyrene-block-poly(ethylene-random-butyrene)-block-polystyrene film from Sigma-Aldrich was interposed between the two surface-treated substrates prepared in Preparation Example 3 so that the surface-treated side was in contact with 1
- a laminate was prepared by thermocompression bonding for a period of time.
- 13 is a graph showing the adhesive force according to the distance of the laminates prepared in Examples 6 to 8 and Reference Examples 3 and 4 are shown.
- the laminate of Example 7 has the strongest adhesive force, and then it can be confirmed that the laminate of Example 6 has the strongest adhesive force. That is, when the surface of the substrate is surface-treated with silane having a hydrophilic group, it can be confirmed that the bonding strength is strong.
- a 200 um wide 60 nm thick gold line was formed with a thermal evaporator through a SUS shadow mask, and a (3-aminopropyl)triethoxysilane solution was applied in a vacuum.
- Target molecules were deposited by vapor deposition for 2 hours.
- the self-assembled membrane (SAM)-treated substrate was rinsed and dried at 80° C. to prepare a surface-treated electrode including a flexible substrate.
- a 200 um-wide EGaIn liquid metal line was fabricated to be embedded on the PDMS film, and the surface on which the liquid metal line was formed was treated with oxygen plasma to prepare an electrode including a stretchable substrate.
- the extensible ACF prepared in Example 1 was interposed between the two electrodes prepared in Preparation Example 4 so as to be in contact with the surface on which the gold line was formed, and was compressed at a temperature of 80° C. for 1 hour to form a stack of 5 mm * 10 mm dimensions. sieve was prepared.
- the stretchable ACF prepared in Example 1 was interposed between the electrode prepared in Preparation Example 4 and the electrode prepared in Preparation Example 5 so that the surface on which the gold line was formed and the surface on which the metal line was formed of the electrode were placed in contact with each other for 1 hour.
- a laminate of 5 mm * 10 mm standard was prepared by compression at a temperature of 80 °C.
- the extensible ACF prepared in Example 1 is interposed between the two electrodes prepared in Preparation Example 5 so as to be in contact with the surface on which the metal line is formed, and is compressed at a temperature of 80° C. for 1 hour to stack 5 mm * 10 mm standard sieve was prepared.
- a current value was measured when 1 V was applied with a Keitheley 2400 while applying different pressures over time to the laminate of Example 9.
- the laminates of Examples 10 and 11 were stretched in one direction at different elongation rates over time, and current values were measured when 1 V was applied using Keitheley 2400.
- the measured current was expressed as a relative current by dividing by the current value (I0) when no pressure was applied or stretching was performed.
- FIGS. 15 and 16 are elongation and relative current according to time applied to the laminate of Examples 10 and 11, respectively. This is the graph shown.
- FIG. 14 it can be seen that stable interfacial connection is made even in the presence of external pressure by chemical bonding between the maleic acid group and the amine group on the surface of the flexible substrate included in the polymer film of the stretchable ACF prepared in Example 1, and FIG. 15 Referring to, since the maleic acid group contained in the stretchable ACF polymer film prepared in Example 1, the amine group on the surface of the flexible substrate, and the hydroxyl group on the surface of the stretchable substrate chemically bond, a stable interface even when stretching according to an external force is applied up to 20% It can be seen that the connection is made, and referring to FIG.
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Abstract
Description
Claims (25)
- 고분자 필름; 및 상기 고분자 필름에 삽입되어 정렬된 전도성 입자를 포함하고,상기 전도성 입자는 고분자 필름의 상부 및 하부 표면 외부로 노출되어 있는 것인 연신성 ACF.
- 제1항에 있어서,상기 고분자 필름은 무수말레인산이 그래프트된 열가소성 고무를 포함하는 것인 연신성 ACF.
- 제2항에 있어서,상기 열가소성 고무는 스티렌-에틸렌-부틸렌-스티렌(SEBS), 스티렌-이소프렌-스티렌(SIS), 스티렌-부타디엔-스티렌(SBS), 폴리우레탄(PU) 계 고무 및 폴리올레핀(PO) 계 고무에서 선택된 것인 연신성 ACF.
- 제1항에 있어서,상기 전도성 입자의 직경은 10 μm 내지 200 μm 인 것인 연신성 ACF의 제조방법.
- 제1항에 있어서,상기 전도성 입자 간 간격은 10 μm 내지 400 μm 인 것인 연신성 ACF.
- 제1항에 있어서,상기 전도성 입자는 격자형, 허니콤형, 선형 및 사각형 중 어느 한 배치 형태로 정렬된 것인 연신성 ACF.
- 제1항에 있어서,상기 전도성 입자는 외부 표면의 10 % 내지 30 %가 고분자 필름의 외부로 노출되어 있는 것인 연신성 ACF.
- 제1항에 있어서,100 %의 연신율로 연신하였을 때의 응력이 10 MPa 이하인 연신성 ACF.
- 볼록부 및 오목부를 포함하는 패턴으로 패터닝된 고분자 필름을 제조하는 단계;상기 패터닝된 고분자 필름의 상기 오목부에 전도성 입자를 배치하여 전도성 입자가 정렬된 고분자 필름을 수득하는 단계; 및상기 전도성 입자가 정렬된 고분자 필름을 열압착하는 단계;를 포함하는 것인 제1항에 따른 연신성 ACF(Anisotropic Conductive Film)의 제조방법.
- 제9항에 있어서,상기 패터닝된 고분자 필름을 제조하는 단계는,다회용 스탬프를 제조하는 단계; 및상기 다회용 스탬프를 고분자 필름과 열압착하여 볼록부 및 오목부를 포함하는 패턴으로 패터닝된 고분자 필름을 제조하는 단계;를 포함하는 것인 연신성 ACF의 제조방법.
- 제10항에 있어서,상기 다회용 스탬프를 제조하는 단계는,기재 상에 포토레지스트를 코팅하고 경화하여 포토레지스트층을 형성하는 단계;상기 포토레지스트층 상에 포토마스크를 위치시키고 광을 조사하여 패터닝된 포토레지스트층을 형성하는 단계; 및상기 패터닝된 포토레지스트층을 추가 경화하고 현상 용액에 침지하여 몰드를 제조하는 단계; 및상기 몰드를 이용하여 볼록부 및 오목부를 포함하는 패턴을 포함하는 다회용 스탬프를 제조하는 단계; 를 포함하는 것인 연신성 ACF의 제조방법.
- 제10항에 있어서,상기 고분자 필름은 무수말레인산이 그래프트된 열가소성 고무를 5 중량% 내지 20 중량% 포함하는 용액을 코팅하고 건조하여 제조된 것인 연신성 ACF의 제조방법.
- 제10항에 있어서,상기 다회용 스탬프를 상기 고분자 필름과 열압착하는 단계;는 150 ℃ 내지 200 ℃의 온도에서 5 분 내지 20 분 동안 열압착하여 수행되는 것인 연신성 ACF의 제조방법.
- 제10항에 있어서,상기 패터닝된 고분자 필름의 상기 오목부는 상기 다회용 스탬프의 볼록부에 의해 형성되고, 상기 패터닝된 고분자 필름의 상기 볼록부는 상기 다회용 스탬프의 오목부에 의해 형성되는 것인 연신성 ACF의 제조방법.
- 제9항에 있어서,상기 전도성 입자를 배치하는 단계는,상기 패터닝된 고분자 필름의 일부 또는 전부에 다수의 전도성 입자를 위치시키는 단계;탄성부재를 상기 패터닝된 고분자 필름으로부터 상기 전도성 입자 직경의 1배 내지 10배의 이격거리로 상기 전도성 입자 상에 위치시키는 단계; 및상기 패터닝된 고분자 필름을 일 방향으로 1회 또는 복수회 소정 거리를 왕복시켜 상기 탄성부재가 상기 전도성 입자를 상기 패터닝된 고분자 필름의 상기 오목부에 삽입시키는 단계;를 포함하는 것인 연신성 ACF의 제조방법.
- 제9항에 있어서,상기 전도성 입자가 정렬된 고분자 필름을 열압착하는 단계;는 100 ℃ 내지 300 ℃의 온도에서 1 시간 내지 4 시간 동안 열압착하여 수행되는 것인 연신성 ACF의 제조방법.
- 제9항에 있어서,상기 2차 열압착하는 단계 이후에 상기 연신성 ACF의 일면 또는 양면을 산소 플라즈마로 표면처리하는 단계를 더 포함하는 것인 연신성 ACF의 제조방법.
- 제1항에 따른 연신성 ACF를 포함하는 계면 접합 부재.
- 전극 및 전자 부품 중 1종 이상 및 제18항에 따른 계면 접합 부재를 포함하는 소자.
- 제19항에 있어서,상기 전극 및 전자 부품 중 1종 이상은 상기 계면 접합 부재와 접하는 면에 친수성 표면 처리된 것인 소자.
- 제20항에 있어서,상기 친수성 표면 처리는 산소 플라즈마 처리인 것인 소자.
- 제20항에 있어서,상기 친수성 표면 처리는 실란 화합물을 이용하는 것인 소자.
- 제22항에 있어서,상기 실란 화합물은 티올기, 아민기, 글리시딜기, 히드록시기, 카르복실기, 비닐기, 포스포네이트기, 무수물기, (메트)아크릴레이트기, 이소시아네이트기, 알데하이드기, 시아노기, 아자이드기, 에스테르기 및 할로겐 치환기 중 1종 이상을 포함하는 것인 소자.
- 제19항에 있어서,상기 전자 부품은 능동소자 및 수동소자 중 1종 이상을 포함하는 것인 소자.
- 제19항에 있어서,상기 전극은 전도성 물질층이 형성되어 있는 기판을 포함하는 것인 소자.탄소물질;상기 탄소물질에 도핑된 인(P) 및 붕소(B);를 포함하는,슈퍼 커패시터 전극소재.
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WO2024043976A1 (en) * | 2022-08-23 | 2024-02-29 | Virginia Tech Intellectual Properties, Inc. | Bonding of liquid-metal elastomer composites to substrates |
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JP2023553168A (ja) | 2023-12-20 |
KR20220082446A (ko) | 2022-06-17 |
KR102464438B1 (ko) | 2022-11-07 |
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