WO2022063301A1 - 一种用于湿法刻蚀的带液滚轮及湿法刻蚀方法 - Google Patents

一种用于湿法刻蚀的带液滚轮及湿法刻蚀方法 Download PDF

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Publication number
WO2022063301A1
WO2022063301A1 PCT/CN2021/120998 CN2021120998W WO2022063301A1 WO 2022063301 A1 WO2022063301 A1 WO 2022063301A1 CN 2021120998 W CN2021120998 W CN 2021120998W WO 2022063301 A1 WO2022063301 A1 WO 2022063301A1
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WIPO (PCT)
Prior art keywords
wedge
shaft
liquid
brake
wet etching
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PCT/CN2021/120998
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English (en)
French (fr)
Inventor
卢林
陈斌
王云露
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晶澳（扬州）太阳能科技有限公司
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Application filed by 晶澳（扬州）太阳能科技有限公司 filed Critical 晶澳（扬州）太阳能科技有限公司
Priority to US18/028,598 priority Critical patent/US20230343888A1/en
Priority to EP21871670.2A priority patent/EP4207260A4/en
Publication of WO2022063301A1 publication Critical patent/WO2022063301A1/zh

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching
    • H01L21/67075—Apparatus for fluid treatment for etching for wet etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67706—Mechanical details, e.g. roller, belt
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/30604—Chemical etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching
    • H01L21/67075—Apparatus for fluid treatment for etching for wet etching
    • H01L21/67086—Apparatus for fluid treatment for etching for wet etching with the semiconductor substrates being dipped in baths or vessels
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/1804—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof comprising only elements of Group IV of the Periodic Table
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/1876—Particular processes or apparatus for batch treatment of the devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/6776—Continuous loading and unloading into and out of a processing chamber, e.g. transporting belts within processing chambers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

Definitions

  • the invention relates to the technical field of solar cell fabrication, in particular to a liquid-filled roller for wet etching and a wet etching method.
  • Etching is an important process in the preparation of silicon solar cells. Its purpose is to remove the PN junction and the phosphosilicate glass on the front of the cell. The quality of the etching directly affects the conversion efficiency of the cell.
  • the current etching methods of silicon wafers mainly include dry etching and wet etching.
  • the production process of wet etching is as follows: the silicon solar cells after diffusion are treated with HNO 3 and HF mixed acid solution in the etching tank. The lower surface and edge of the sheet are etched to achieve edge insulation.
  • the existing wet etching process is usually formed by connecting a series of tank modules, in order: etching tank ⁇ washing tank 1 ⁇ alkali tank ⁇ washing tank 2 ⁇ acid tank ⁇ washing tank 3 ⁇ drying.
  • the wet etching equipment suitable for the wet etching process is mostly driven by rollers at present.
  • the shafts at both ends of the roller with liquid are usually directly inserted into the bracket holes to realize the rotation of the roller, thereby realizing the silicon
  • the wafers are transferred from feeding to unloading; after long-term use, the diameter of the rollers will become smaller due to wear and tear, resulting in the inability to move horizontally during the transportation of running silicon wafers, affecting the etching quality of solar cells.
  • the water film covered on the upper surface also Due to the unevenness of the roller, it will slip into the chemical solution, resulting in abnormal concentration and affecting the etching effect. The overall etching effect.
  • the embodiments of the present invention aim to provide a liquid-filled roller for wet etching and a wet etching method, so as to solve the problem of abnormal roller level in the existing solar cell fabrication process.
  • the present invention provides a liquid-carrying roller for wet etching, comprising a first end shaft, a second end shaft and a liquid-carrying shaft, wherein the first end shaft and the second end shaft are respectively located on the side of the liquid-carrying shaft.
  • the first end shaft, the second end shaft and the liquid-carrying shaft are arranged concentrically, and the diameters of the first end shaft and the second end shaft can be adjusted.
  • first end shaft includes a plurality of first wedges, a plurality of second wedges, a first brake, a second brake and a first central shaft.
  • both the first brake and the second brake are sleeved on the first central shaft, the first brake is connected with the first wedge, the second brake is connected with the second wedge, the first center One end of the shaft is connected with the central hole of the liquid-filled shaft.
  • the second end shaft includes a plurality of third wedges, a plurality of fourth wedges, a third brake, a fourth brake and a second central shaft.
  • the third brake and the fourth brake are both sleeved on the second central shaft, the third brake is connected with the third wedge, the fourth brake is connected with the fourth wedge, and the second center One end of the shaft is connected with the central hole of the shaft with liquid.
  • first wedge and the second wedge are staggered, the side surface of the first wedge is always in contact with the side of the second wedge, the third wedge and the fourth wedge are staggered, the The sides of the third wedge and the sides of the fourth wedge are always in contact.
  • first brake and the second brake can move relatively along the first central axis.
  • first wedge can move in the radial direction of the first brake
  • second wedge can move in the radial direction of the second brake
  • the third brake and the fourth brake can move relatively along the second central axis.
  • the third wedge can move in the radial direction of the third brake
  • the fourth wedge can move in the radial direction of the fourth brake
  • first and second wedges define a first outer surface forming a first end shaft
  • the third and fourth wedges define a second outer surface that forms a second end shaft.
  • first outer surface has a first effective diameter, and the first effective diameter increases or decreases according to the axial movement between the first wedge and the second wedge;
  • second outer surface has a second effective diameter, The second effective diameter increases or decreases in accordance with the axial movement between the third wedge and the fourth wedge.
  • the material of the first end shaft, the second end shaft and the shaft with liquid is PVDF or PTFE.
  • the present invention provides a wet etching method, using the above-mentioned liquid-filled roller for wet etching, and the steps include:
  • Step 1 Adjust the shaft end of the roller with liquid so that the solar wafer is in a horizontal state
  • Step 2 The liquid-filled roller drives the solar wafer to move for wet etching.
  • the present invention can achieve at least one of the following beneficial effects:
  • the diameter of the first end shaft and the second end shaft can be adjusted.
  • the dimensions of the two ends of the separate liquid-filled roller can be adjusted in real time. Adjusting to ensure the horizontal placement of the liquid-filled roller on the support can greatly reduce the operating cost of the wet etching equipment while ensuring the quality of the solar cell etching process.
  • the first wedge and the second wedge are respectively provided on the first brake and the second brake, the first brake and the second brake can move relatively along the first central axis, and the first wedge and the second wedge can The diameter of the second end shaft is adjusted in the same manner as the diameter adjustment of the first end shaft by radial movement relative to the first brake and the second brake, thereby realizing the change of the diameter of the first end shaft.
  • the brake includes a connecting seat and a telescopic rod.
  • the connecting seat is sleeved with the central shaft.
  • One end of the telescopic rod is vertically connected to the radial direction of the connecting seat, and the other end is a free end, which is connected with the wedge-shaped piece.
  • the free end can be opposite to the connecting seat. telescopic, and then drive the wedge to expand and contract along the radial direction of the brake, so as to realize the adjustment of the diameter of the end shaft of the roller with liquid.
  • Fig. 1 is the structural representation of the roller with liquid of the present invention
  • FIG. 2 is a schematic structural diagram of the initial state of the first end shaft of the present invention
  • FIG. 3 is a schematic structural diagram of the first end shaft of the present invention after the diameter of the first end shaft is adjusted and enlarged;
  • FIG. 4 is a schematic structural diagram of the first end shaft of the present invention after the diameter of the first end shaft is adjusted to be smaller;
  • FIG. 6 is a schematic diagram of the connection between the first brake and the first central shaft of the present invention.
  • FIG. 7 is a schematic diagram of the connection between the second brake and the first central shaft of the present invention.
  • FIG. 8 is a schematic diagram of the connection between the third brake and the second central shaft of the present invention.
  • FIG. 9 is a schematic diagram of the connection between the fourth brake and the second central shaft of the present invention.
  • Fig. 10 is the exploded schematic diagram of the shaft with liquid and the first central shaft of the present invention.
  • FIG. 11 is a schematic structural diagram of a wet etching groove of the present invention.
  • FIG. 12 is a schematic cross-sectional view of the connection between the liquid-carrying roller and the bracket of the present invention.
  • 100-hydraulic roller 110-first end shaft; 111-first wedge; 112-second wedge; 113-first brake; 114-second brake; 115-second central shaft; 120-second End shaft; 121-third wedge; 122-fourth wedge; 123-third brake; 124-fourth brake; 125-second center shaft; 130-with liquid shaft;
  • 300-solar wafer 400-water film; 500-etching tank; 600-etching liquid.
  • connection should be understood in a broad sense, for example, it may be a fixed connection, a detachable connection, or an integral connection , which can be mechanical connection, electrical connection, direct connection, or indirect connection through an intermediate medium.
  • connection can be mechanical connection, electrical connection, direct connection, or indirect connection through an intermediate medium.
  • top bottom
  • above bottom
  • under over
  • FIG. 1-FIG. 12 discloses a liquid-filled roller for wet etching, comprising a first end shaft 110, a second end shaft 120 and a liquid-filled shaft 130,
  • the first end shaft 110 and the second end shaft 120 are respectively located at the two ends of the liquid bearing shaft 130, the first end shaft 110, the second end shaft 120 and the liquid bearing shaft 130 are concentrically arranged, and the first end shaft 110 and the second end shaft 130 are arranged concentrically with the liquid bearing shaft 130.
  • the diameter of 120 can be adjusted.
  • the liquid-entrained roller for wet etching provided in this embodiment is worn at both ends or the level of the roller is abnormal due to the machining accuracy of the etching groove
  • the liquid-entrained roller of the individual liquid-entrained roller can be checked in real time in real time.
  • the diameter of the end is adjusted to ensure the horizontal placement of the liquid-filled roller on the support, which can greatly reduce the operating cost of the wet etching equipment while ensuring the quality of the solar cell etching process.
  • first end shaft 110 and the second end shaft 120 are collectively referred to as end shafts
  • first brake 113 , the second brake 114 , the third brake 123 and the fourth brake 124 are collectively referred to as brakes
  • first wedge 111 , The second wedge 112 , the third wedge 121 and the fourth wedge 122 are collectively referred to as wedges.
  • the first end shaft 110 includes a plurality of first wedges 111 , a plurality of second wedges 112 , a first brake 113 , a second brake 114 and a first central shaft 115 , and the first brake 113 and the second brake 114 are both sleeved
  • the first brake 113 is connected with the first wedge 111
  • the second brake 114 is connected with the second wedge 112
  • the first central shaft 115 is connected with the central hole of the liquid shaft 130
  • the first central One end of the shaft 115 is provided with a first limit block
  • the first limit block is a regular hexahedron structure
  • the first limit block is arranged in the central hole of the shaft 130 with liquid to limit the distance between the first end shaft 110 and the shaft 130 with liquid. relative rotation.
  • the first wedge-shaped member 111 is composed of a first circular arc surface, a second circular arc surface, two non-parallel side surfaces and two parallel end surfaces
  • the second wedge-shaped member 112 is composed of a third circular arc surface, a fourth circular arc surface, two A non-parallel side surface and two parallel end surfaces are formed.
  • the first arc surface of the first wedge-shaped member 111 and the third arc-shaped surface of the second wedge-shaped member 112 form the outer circumference of the first end shaft 110, adjacent to the first arc surface.
  • the side surface of the wedge-shaped member 111 and the side surface of the second wedge-shaped member 112 are in close contact with each other.
  • first circular arc surface and the second circular arc surface are concentric, and the third circular arc surface and the fourth circular arc surface are concentric, so that the outer circumferential surface formed by the first end shaft 110 is a cylindrical surface, avoiding the first end
  • the shaft 110 is in line contact with the mounting hole 220 of the bracket 200 of the wet etching groove after being assembled.
  • the first brake 113 and the second brake 114 can be slidably connected with the first central shaft 115 .
  • the first brake 113 includes a first telescopic rod and a first connecting seat, the first connecting seat is cylindrical, the first connecting seat is sleeved on the outer side of the first central shaft 115, and the inner hole of the first connecting seat is The diameter is equal to the diameter of the first central shaft 115 , so that the first connecting seat can move on the first central shaft 115 under the action of an external force.
  • the external force that enables the first brake 113 to move relative to the first central shaft 115 acts as an operator to manually move the first brake 113 so that the first brake 113 can stop at a desired position and the first end shaft 110 Get the diameter size needed to adjust the level.
  • the first telescopic rods are evenly distributed on the outer circumference of the first connecting seat.
  • One end of the first telescopic rod is connected to the first connecting seat, and the other end is a free end, which can be extended and retracted relative to the fixed end.
  • the arc surface is provided with a first installation hole, the first installation hole is arranged near the big end of the first wedge member 111 , and the free end of the first telescopic rod is installed in the first installation hole.
  • the first telescopic rod includes a first telescopic spring, a first inner telescopic rod and a first connecting rod.
  • One end of the first connecting rod has a hole and a cavity is formed in the first connecting rod.
  • the first telescopic spring is provided at In the cavity, the other end of the first connecting rod is fixedly connected with the first connecting seat, and one end of the first inner telescopic rod enters the cavity through the upper hole of the first connecting rod and presses against the first telescopic spring, and the first inner telescopic rod The other end of the rod is connected with the first wedge 111 .
  • the extension line of the fixed end of the first telescopic rod passes through the axis of the first connecting base, that is, the first telescopic rod is vertically arranged along the radial direction of the first connecting base.
  • the second brake 114 includes a second telescopic rod and a second connecting seat, the second connecting seat is cylindrical, the second connecting seat is sleeved on the outer side of the first central axis 115, and the inner hole diameter of the second connecting seat is equal to the first The diameter of the central shaft 115 enables the second connecting seat to move on the first central shaft 115 under the action of external force.
  • the external force that enables the second brake 114 to move relative to the first central shaft 115 acts as an operator to manually move the second brake 114 so that the second brake 114 can stop at a desired position and the first end shaft 110 Get the diameter size needed to adjust the level.
  • the second telescopic rods are evenly distributed on the outer circumference of the second connecting seat, one end of the second telescopic rod is connected to the second connecting seat, and the other end is a free end, which can be extended and retracted relative to the fixed end.
  • the arc surface is provided with a second mounting hole, the second mounting hole is provided near the big end of the second wedge-shaped member 112, and the free end of the second telescopic rod is mounted in the second mounting hole.
  • the second telescopic rod includes a second telescopic spring, a second inner telescopic rod and a second connecting rod, one end of the second connecting rod is opened with a hole and a cavity is formed in the second connecting rod, and the second telescopic spring is provided at In the cavity, the other end of the second connecting rod is fixedly connected with the second connecting seat, and one end of the second inner telescopic rod enters the cavity through the upper hole of the second connecting rod and presses against the second telescopic spring, and the second inner telescopic rod enters the cavity and presses against the second telescopic spring.
  • the other end of the rod is connected to the second wedge 112 .
  • the first telescopic rod automatically expands and contracts with the movement of the first brake 113
  • the second telescopic rod automatically expands and contracts with the movement of the second brake 114 .
  • the telescopic amount of the first telescopic rod and the second telescopic rod can be limited, that is, when the positions of the first brake 113 and the second brake 114 are fixed, the first telescopic rod and the second telescopic rod can maintain a specific length under the action of the side pressing force of the first wedge-shaped member 111 and the second wedge-shaped member 112 .
  • the external force that causes the first brake 113 and the second brake 114 to move relative to the first central axis 115 is not limited to manual operation, and any force that can cause the first brake 113 and the second brake 114 to move relative to the first central axis 115 is not limited to manual operation. Any driving method for relative movement is acceptable.
  • the first brake 113 controls the movement of the first wedge 111
  • the second brake 114 controls the movement of the second wedge 112.
  • the first telescopic rod and the Under the action of the second telescopic rod the first wedge 111 and the second wedge 112 move outward along the radial direction of the first end shaft 110, and the first brake 113 and the second brake 114 are manually moved, so that the first brake 113 and the The second brake 114 moves relatively along the first central axis 115 , the side surface of the first wedge member 111 is abutted against the side surface of the second wedge member 112 , the first arc surface of the first wedge member 111 and the second wedge member 112 .
  • the three arc surfaces form the outer circle of the first end shaft 110 with a new diameter.
  • the second end shaft 120 includes a plurality of third wedges 121 , a plurality of fourth wedges 122 , a third brake 123 , a fourth brake 124 and a second central shaft 125 , and both the third brake 123 and the fourth brake 124 are sleeved
  • the third brake 123 is connected with the third wedge 121
  • the fourth brake 124 is connected with the fourth wedge 122
  • the second central shaft 125 is connected with the central hole of the liquid shaft 130
  • the second central One end of the shaft 125 is provided with a second limit block
  • the second limit block is a regular hexahedron structure
  • the second limit block is arranged in the center hole of the shaft 130 with liquid to limit the distance between the second end shaft 120 and the shaft 130 with liquid. relative rotation.
  • the third wedge-shaped member 121 is composed of a fifth circular arc surface, a sixth circular arc surface, two non-parallel side surfaces and two parallel end surfaces
  • the fourth wedge-shaped member 122 is composed of a seventh circular arc surface, an eighth circular arc surface, two A non-parallel side surface and two parallel end surfaces are formed.
  • the fifth circular arc surface of the third wedge-shaped member 121 and the seventh circular arc surface of the fourth wedge-shaped member 122 form the outer circumference of the second end shaft 120, adjacent to the third
  • the side surface of the wedge-shaped member 121 and the side surface of the fourth wedge-shaped member 122 are in close contact with each other.
  • the fifth circular arc surface and the sixth circular arc surface are concentric, and the seventh circular arc surface and the eighth circular arc surface are concentric, so that the outer circumferential surface formed by the second end shaft 120 is a cylindrical surface, avoiding the second end
  • the shaft 120 forms a line contact after being assembled with the mounting hole 220 of the bracket 200 of the wet etching groove.
  • the third brake 123 and the fourth brake 124 can be slidably connected with the second central shaft 125 .
  • the third brake 123 includes a third telescopic rod and a third connecting seat, the third connecting seat is cylindrical, the third connecting seat is sleeved on the outer side of the second central shaft 125, and the inner hole of the third connecting seat is The diameter is equal to the diameter of the second central shaft 125 , so that the third connecting seat can move on the second central shaft 125 under the action of external force.
  • the external force that enables the third brake 123 to move relative to the second central shaft 125 acts as an operator to manually move the third brake 123 so that the third brake 123 can stop at a desired position and the second end shaft 120 Get the diameter size needed to adjust the level.
  • the third telescopic rods are evenly distributed on the outer circumference of the third connecting seat, one end of the third telescopic rod is connected to the third connecting seat, and the other end is a free end, which can be extended and retracted relative to the fixed end.
  • the arc surface is provided with a third installation hole, the third installation hole is arranged near the big end of the third wedge 121, and the free end of the third telescopic rod is installed in the third installation hole.
  • the third telescopic rod includes a third telescopic spring, a third inner telescopic rod and a third connecting rod.
  • One end of the third connecting rod has a hole and a cavity is formed in the third connecting rod.
  • the third telescopic spring is provided at In the cavity, the other end of the third connecting rod is fixedly connected with the third connecting seat, and one end of the third inner telescopic rod enters the cavity through the upper hole of the third connecting rod and presses against the third telescopic spring, and the third inner telescopic rod The other end of the rod is connected with the third wedge 121 .
  • the fourth brake 124 includes a fourth telescopic rod and a fourth connecting seat, the fourth connecting seat is cylindrical, the fourth connecting seat is sleeved on the outside of the second central shaft 125, and the inner hole of the fourth connecting seat is The diameter is equal to the diameter of the second central shaft 125 , so that the fourth connecting seat can move on the second central shaft 125 under the action of an external force.
  • the external force that enables the fourth stopper 124 to move relative to the second central shaft 125 acts as the operator to manually move the fourth stopper 124 so that the fourth stopper 124 can stop at a desired position, so that the second end shaft 120 Get the diameter size needed to adjust the level.
  • the fourth telescopic rods are evenly distributed on the outer circumference of the fourth connecting seat, one end of the fourth telescopic rod is connected with the fourth connecting seat, and the other end is a free end, which can be extended and retracted relative to the fixed end.
  • the arc surface is provided with a fourth installation hole, the fourth installation hole is arranged near the big end of the fourth wedge 122, and the free end of the fourth telescopic rod is installed in the fourth installation hole.
  • the fourth telescopic rod includes a fourth telescopic spring, a fourth inner telescopic rod and a fourth connecting rod, one end of the fourth connecting rod is opened with a hole and a cavity is formed in the fourth connecting rod, and the fourth telescopic spring is provided at In the cavity, the other end of the fourth connecting rod is fixedly connected with the fourth connecting seat, and one end of the fourth inner telescopic rod enters the cavity through the upper hole of the fourth connecting rod and presses against the fourth telescopic spring, and the fourth inner telescopic rod The other end of the rod is connected with the fourth wedge 122 .
  • the third telescopic rod automatically expands and contracts with the movement of the third brake 123
  • the fourth telescopic rod automatically expands and contracts with the movement of the fourth brake 124 .
  • the telescopic amount of the third telescopic rod and the fourth telescopic rod can be limited, that is, when the positions of the third brake 123 and the fourth brake 124 are fixed, the third telescopic rod and the fourth telescopic rod can maintain a specific length under the action of the side pressing force of the third wedge-shaped member 121 and the fourth wedge-shaped member 122 .
  • the external force that causes the third brake 123 and the fourth brake 124 to move relative to the second central shaft 125 is not limited to manual operation, and any force that can cause the third brake 123 and the fourth brake 124 to move relative to the second central shaft 125 is not limited to manual operation. Any driving method for relative movement is acceptable.
  • the third brake 123 controls the movement of the third wedge 121
  • the fourth brake 124 controls the movement of the fourth wedge 122.
  • the third telescopic rod and the Under the action of the fourth telescopic rod the third wedge 121 and the fourth wedge 122 move outward along the radial direction of the second end shaft 120, and manually move the third brake 123 and the fourth brake 124, so that the third brake 123 and The fourth brake 124 moves relatively along the second central axis 125 , the side of the third wedge 121 is in contact with the side of the fourth wedge 122 , the fifth circular arc surface of the third wedge 121 and the fourth wedge 122 .
  • FIG. 5( a ) is a schematic diagram showing the change of the diameter of the second end shaft 120 from the initial position to a smaller size
  • FIG. 5( b ) The diameter of the second end shaft 120 is a schematic diagram of the initial state
  • FIG. 5( c ) is a schematic diagram showing the change of the diameter of the second end shaft 120 to increase.
  • first end shaft 110 and the second end shaft 120 are the same.
  • first wedge 111 and the second wedge 112 define a first outer surface of the first end shaft 110 (by the first arc surface of the first wedge 111 and the third arc of the second wedge surface formation), the first outer surface has a first effective diameter that increases or decreases in accordance with the axial movement between the first wedge 111 and the second wedge 112 (ie, the first wedge 111 and the second wedge 112).
  • the second wedge 112 moves toward each other along the first central axis 124, the first effective diameter increases, the first wedge 111 and the second wedge 112 move in opposite directions along the first central axis 115, and the first effective diameter decreases);
  • the wedge piece 121 and the fourth wedge piece 122 define a second outer surface (formed by the fifth circular arc surface of the third wedge piece 121 and the seventh circular arc surface of the fourth wedge piece 122) forming the second end shaft 120, the second The outer surface has a second effective diameter that increases or decreases in accordance with the axial movement between the third wedge 121 and the fourth wedge 122 (ie, the third wedge 121 and the fourth wedge 122 along the
  • the second central axis 125 moves toward each other, the second effective diameter increases, the third wedge 121 and the fourth wedge 122 move in opposite directions along the second central axis 125, and the second effective diameter decreases).
  • the first end shaft 110, the second end shaft 120 and the liquid shaft 130 are made of PVDF (Poly vinylidene fluoride) or PTFE (Poly tetra fluoroethylene, polyvinylidene fluoride). tetrafluoroethylene).
  • the liquid-entrained roller 100 in this embodiment is applied to a wet etching tank.
  • the etching tank 500 includes a bracket 200 and a liquid-entrained roller 100.
  • the etching tank 500 is provided with an etching liquid 600, and the liquid-entrained roller 100 is provided with solar energy.
  • Wafer 300, the upper surface of the solar wafer 300 is provided with a water film 400, and the liquid-filled roller 100 is connected to the bracket 200.
  • the one end shaft 110 and the second end shaft 120 are respectively placed in the mounting holes 220 of the bracket body 210 on both sides of the bracket 200 .
  • the entire liquid-carrying roller 100 does not need to be replaced, and only the diameter of the end shaft needs to be adjusted, which reduces the operating cost of the etching tank 500 , and can be independently adjusted The levelness of the liquid roller 100.
  • Another specific embodiment of the present invention discloses a wet etching method, using the liquid-entrained roller for wet etching of Embodiment 1, and the steps include:
  • Step 1 Adjust the shaft end of the liquid-carrying roller 100 to ensure that the solar wafer 300 is placed on the liquid-carrying roller 100 in a horizontal state.
  • liquid-carrying rollers 100 are installed on the etching tank 500, and all the liquid-carrying rollers 100 need to be adjusted so that the solar wafer 300 is in a horizontal position.
  • Step 2 Place the solar wafer 300 on the liquid-filled roller 100, and the liquid-filled roller 100 rotates under the action of an external force (such as a motor), which drives the solar wafer 300 to move forward, and brushes the etching liquid 600 to the surface of the solar wafer 300.
  • an external force such as a motor

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Abstract

本发明涉及一种用于湿法刻蚀的带液滚轮及湿法刻蚀方法，属于太阳能电池制作技术领域，解决了现有技术中太阳能电池制作过程中滚轮水平异常的问题。本发明的用于湿法刻蚀的带液滚轮包括第一端轴、第二端轴和带液轴，第一端轴和第二端轴分别位于带液轴的两端，第一端轴、第二端轴与带液轴同心设置，第一端轴和第二端轴的直径均能够调节。本发明的带液轴的两端轴直径可调，当带液滚轮两端磨损或刻蚀槽加工精度导致的滚轮水平异常时，保证带液滚轮在支架上的水平状态，在保证太阳能电池刻蚀过程质量的同时，大大降低湿法刻蚀设备的运行成本。

Description

一种用于湿法刻蚀的带液滚轮及湿法刻蚀方法
本申请要求于2020年09月28日提交的题为“一种用于湿法刻蚀的带液滚轮及湿法刻蚀方法”的中国专利申请No.202011054898.2的优先权，在此全文引用上述中国专利申请公开的内容以作为本申请的一部分。
技术领域
本发明涉及太阳能电池制作技术领域，尤其涉及一种用于湿法刻蚀的带液滚轮及湿法刻蚀方法。
背景技术
近年来，太阳能电池片生产技术不断进步，生产成本不断降低，电池效率不断提高，使光伏发电的应用日益普及并发展迅猛，逐渐成为电力供应的重要来源。刻蚀是制备硅太阳能电池片的重要工序，其目的是去除PN结和电池正面的磷硅玻璃，刻蚀的好坏直接影响电池片的转换效率。当前硅片的刻蚀方法主要包括干法和湿法刻蚀，其中湿法刻蚀的生产过程为：经扩散后的硅太阳能电池片，利用刻蚀槽的HNO 3、HF混合酸液对硅片的下表面和边缘进行腐蚀，从而达到边缘绝缘化。
现有湿法刻蚀工艺通常由一系列槽体模块连接而成，依次为刻蚀槽→水洗1槽→碱槽→水洗2槽→酸槽→水洗3槽→烘干。适用于湿法刻蚀工艺的湿法刻蚀设备，目前大多采用滚轮传动方式，湿法刻蚀设备上，带液滚轮两端的轴通常是直接穿插在支架孔内，实现滚轮转动，从而实现硅片从上料传送到下料；长期使用后，滚轮的直径会因磨损变小，导致运转硅片运输过程无法水平移动，影响太阳能电池片的刻蚀质量，同时，上表面覆盖的水膜也会因滚轮的不平整，会滑落至化学品溶液中，导致浓度异常，也会影响刻蚀效果；刻蚀槽支架的加工精度及滚轮的加工精度偏差，会使得个别的滚轮水平存在异常，影响 整体的刻蚀效果。
发明内容
鉴于上述的分析，本发明实施例旨在提供一种用于湿法刻蚀的带液滚轮及湿法刻蚀方法，用以解决现有太阳能电池制作过程中滚轮水平异常的问题。
一方面，本发明提供了一种用于湿法刻蚀的带液滚轮，包括第一端轴、第二端轴和带液轴，第一端轴和第二端轴分别位于带液轴的两端，第一端轴、第二端轴与带液轴同心设置，第一端轴和第二端轴的直径均能够调节。
进一步，所述第一端轴包括多个第一楔形件、多个第二楔形件、第一制动器、第二制动器和第一中心轴。
进一步，所述第一制动器和第二制动器均套设在第一中心轴上，所述第一制动器与第一楔形件连接，所述第二制动器和第二楔形件连接，所述第一中心轴的一端与所述带液轴的中心孔连接。
进一步，所述第二端轴包括多个第三楔形件、多个第四楔形件、第三制动器、第四制动器和第二中心轴。
进一步，所述第三制动器和第四制动器均套设在第二中心轴上，所述第三制动器与第三楔形件连接，所述第四制动器与第四楔形件连接，所述第二中心轴的一端与带液轴的中心孔连接。
进一步，所述第一楔形件和第二楔形件交错设置，所述第一楔形件的侧面与第二楔形件的侧面始终接触，所述第三楔形件和第四楔形件交错设置，所述第三楔形件的侧面和第四楔形件的侧面始终接触。
进一步，所述第一制动器和第二制动器能够沿第一中心轴相对移动。
进一步，所述第一楔形件能够沿第一制动器的径向移动，所述第二楔形件能够沿第二制动器的径向移动。
进一步，所述第三制动器和第四制动器能够沿第二中心轴相对移动。
进一步，所述第三楔形件能够沿第三制动器的径向移动，所述第四楔形件能够沿第四制动器的径向移动。
进一步，所述第一楔形件和第二楔形件限定形成第一端轴的第一外表面；
所述第三楔形件和第四楔形件限定形成第二端轴的第二外表面。
进一步，所述第一外表面具有第一有效直径，第一有效直径按照第一楔形件和第二楔形件间的轴向运动的增大或减小；第二外表面具有第二有效直径，第二有效直径按照第三楔形件和第四楔形件之间的轴向运动的增大或减小。
进一步，所述第一端轴、第二端轴和带液轴的材质为PVDF或PTFE。
另一方面，本发明提供了一种湿法刻蚀方法，使用上述用于湿法刻蚀的带液滚轮，步骤包括：
步骤1：调整带液滚轮的轴端，使太阳能晶片处于水平状态；
相向移动制动器，使楔形件向端轴的柱体中心方向移动，端轴直径增大；反向移动制动，使楔形件向端轴的柱体中心反方向移动，端轴直径减少；
步骤2：带液滚轮带动太阳能晶片运动，进行湿法刻蚀。
与现有技术相比，本发明至少可实现如下有益效果之一：
(1)第一端轴和第二端轴的直径可调，当带液滚轮两端磨损或刻蚀槽加工精度导致的滚轮水平异常时，可以实时的对单独的带液滚轮的两端尺寸进行调节，保证带液滚轮在支架上的水平放置，在保证太阳能电池刻蚀过程质量的同时，可以大大降低湿法刻蚀设备的运行成本。
(2)第一楔形件和第二楔形件分别设在第一制动器和第二制动器上，第一制动器和第二制动器能够沿第一中心轴相对移动，第一楔形件和第二楔形件能够相对第一制动器和第二制动器径向移动，进而实现第一端轴直径的变化，第二端轴的直径调整与第一端轴直径调整方式相同。
(3)制动器包括连接座和伸缩杆，连接座与中心轴套设，伸缩杆的一端与连接座的径向垂直连接，另一端为自由端，并与楔形件连接，自由端能够相对连接座伸缩，进而带动楔形件沿制动器的径向伸缩，实现带液滚轮端轴的直径调节。
本发明中，上述各技术方案之间还可以相互组合，以实现更多的优选组合方案。本发明的其他特征和优点将在随后的说明书中阐述，并且，部分优点可从说明书中变得显而易见，或者通过实施本发明而了解。本发明的目的和其他优点可通过说明书以及附图中所特别指出的内容中来实现和获得。
上述的非惯用的可选方式所具有的进一步效果将在下文中结合具体实施方式加以说明。
附图说明
附图仅用于示出具体实施例的目的，而并不认为是对本发明的限制，在整个附图中，相同的参考符号表示相同的部件。
图1为本发明的带液滚轮的结构示意图；
图2为本发明的第一端轴初始状态结构示意图；
图3为本发明的第一端轴的直径调整变大后的结构示意图；
图4为本发明的第一端轴的直径调整变小后的结构示意图；
图5为本发明的第二端轴的直径调整变化示意图；
图6为本发明的第一制动器与第一中心轴连接示意图；
图7为本发明的第二制动器与第一中心轴连接示意图；
图8为本发明的第三制动器与第二中心轴连接示意图；
图9为本发明的第四制动器与第二中心轴连接示意图；
图10为本发明的带液轴与第一中心轴的爆炸示意图；
图11为本发明的湿法刻蚀槽的结构示意图；
图12为本发明的带液滚轮和支架连接的截面示意图。
附图标记：
100-带液滚轮；110-第一端轴；111-第一楔形件；112-第二楔形件；113-第一制动器；114-第二制动器；115-第二中心轴；120-第二端轴；121-第三楔形件；122-第四楔形件；123-第三制动器；124-第四制动器；125-第二中心轴；130-带液轴；
200-支架；210-支架本体；220-安装孔；
300-太阳能晶片；400-水膜；500-刻蚀槽；600-刻蚀液体。
具体实施方式
下面结合附图来具体描述本发明的优选实施例，其中，附图构成本发明一部分，并与本发明的实施例一起用于阐释本发明的原理，并非用于限定本发明的范围。
在本发明实施例的描述中，需要说明的是，除非另有明确的规定和限定，术语“相连”应做广义理解，例如，可以是固定连接，也可以是可拆卸连接，或一体地连接，可以是机械连接，也可以是电连接，可以是直接相连，也可以通过中间媒介间接相连。对于本领域的普通技 术人员而言，可以根据具体情况理解上述术语在本发明中的具体含义。
全文中描述使用的术语“顶部”、“底部”、“在……上方”、“下”和“在……上”是相对于装置的部件的相对位置，例如装置内部的顶部和底部衬底的相对位置。可以理解的是装置是多功能的，与它们在空间中的方位无关。
实施例1
本发明的一个具体实施例，如图1-图12所示，公开了一种用于湿法刻蚀的带液滚轮，包括第一端轴110、第二端轴120和带液轴130，第一端轴110和第二端轴120分别位于带液轴130的两端，第一端轴110、第二端轴120与带液轴130同心设置，第一端轴110和第二端轴120的直径均能够调节。
与现有技术相比，本实施例提供的用于湿法刻蚀的带液滚轮在两端磨损或刻蚀槽加工精度导致的滚轮水平异常时，可以实时的对单独的带液滚轮的两端直径进行调节，保证带液滚轮在支架上的水平放置，在保证太阳能电池刻蚀过程质量的同时，可以大大降低湿法刻蚀设备的运行成本。
本实施例中，第一端轴110和第二端轴120统称为端轴，第一制动器113、第二制动器114、第三制动器123和第四制动器124统称为制动器，第一楔形件111、第二楔形件112、第三楔形件121和第四楔形件122统称为楔形件。
第一端轴110包括多个第一楔形件111、多个第二楔形件112、第一制动器113、第二制动器114和第一中心轴115，第一制动器113和第二制动器114均套设在第一中心轴115上，第一制动器113与第一楔形件111连接，第二制动器114和第二楔形件112连接，第一中心轴115与带液轴130的中心孔连接，第一中心轴115的一端设有第一 限位块，第一限位块为正六面体结构，第一限位块设在带液轴130的中心孔内，限制第一端轴110与带液轴130的相对转动。
第一楔形件111由第一圆弧面、第二圆弧面、两个不平行的侧面和两个平行的端面构成，第二楔形件112第三圆弧面、第四圆弧面、两个不平行的侧面和两个平行的端面构成，第一楔形件111的第一圆弧面和第二楔形件112的第三圆弧面形成第一端轴110的外圆周，相邻第一楔形件111的侧面和第二楔形件112的侧面紧贴在一起。
值得注意的是，第一圆弧面和第二圆弧面同心，第三圆弧面和第四圆弧面同心，使得第一端轴110形成的外圆周面是圆柱面，避免第一端轴110与湿法刻蚀槽的支架200的安装孔220装配后形成线接触。
为了实现第一端轴110的直径可调，第一制动器113和第二制动器114与第一中心轴115均可滑动连接。
具体而言，第一制动器113包括第一伸缩杆和第一连接座，第一连接座为圆筒状，第一连接座套设在第一中心轴115的外侧，第一连接座的内孔直径等于第一中心轴115的直径，使得在外力的作用下第一连接座能够在第一中心轴115上移动。
本实施例中，使第一制动器113能够相对第一中心轴115相对移动的外力作用为操作人员手动移动第一制动器113，以便第一制动器113能够停在所需位置，使第一端轴110获得调整水平所需的直径大小。
第一伸缩杆均布在第一连接座的外周，第一伸缩杆的一端与第一连接座连接，另一端为自由端，能够相对固定端伸缩，具体地，第一楔形件111的第二圆弧面设有第一安装孔，第一安装孔设在靠近第一楔形件111的大头一端，第一伸缩杆的自由端安装在第一安装孔中。
具体而言，第一伸缩杆包括第一伸缩弹簧、第一内伸缩杆和第一连接杆，第一连接杆的一端开孔并在第一连接杆内形成空腔，第一伸缩弹簧设在空腔内，第一连接杆的另一端与第一连接座固定连接，第一内伸缩杆的一端通过第一连接杆上孔进入空腔并抵压在第一伸缩弹簧上，第一内伸缩杆的另一端与第一楔形件111连接。
值得注意的是，第一伸缩杆的固定端的延长线通过第一连接座的轴心，即第一伸缩杆沿第一连接座的径向垂直设置。
第二制动器114包括第二伸缩杆和第二连接座，第二连接座为圆筒状，第二连接座套设在第一中心轴115的外侧，第二连接座的内孔直径等于第一中心轴115的直径，使得在外力的作用下第二连接座能够在第一中心轴115上移动。
本实施例中，使第二制动器114能够相对第一中心轴115相对移动的外力作用为操作人员手动移动第二制动器114，以便第二制动器114能够停在所需位置，使第一端轴110获得调整水平所需的直径大小。
第二伸缩杆均布在第二连接座的外周，第二伸缩杆的一端与第二连接座连接，另一端为自由端，能够相对固定端伸缩，具体地，第二楔形件112的第四圆弧面设有第二安装孔，第二安装孔设在靠近第二楔形件112的大头一端，第二伸缩杆的自由端安装在第二安装孔中。
具体而言，第二伸缩杆包括第二伸缩弹簧、第二内伸缩杆和第二连接杆，第二连接杆的一端开孔并在第二连接杆内形成空腔，第二伸缩弹簧设在空腔内，第二连接杆的另一端与第二连接座固定连接，第二内伸缩杆的一端通过第二连接杆上孔进入空腔并抵压在第二伸缩弹簧上，第二内伸缩杆的另一端与第二楔形件112连接。
本实施例中，第一伸缩杆随第一制动器113的移动而自动伸缩， 第二伸缩杆随第二制动器114的移动而自动伸缩，由于第一楔形件111和第二楔形件112侧面贴合，在第一楔形件111和第二楔形件112的作用力下能够限定第一伸缩杆和第二伸缩杆伸缩量，即当第一制动器113和第二制动器114的位置固定时第一伸缩杆和第二伸缩杆在第一楔形件111和第二楔形件112的侧面挤压力作用下能够保持一个特定的长度。
值得注意的是，第二伸缩杆通过第二连接座的直径方向。
需要说明的是，使第一制动器113和第二制动器114相对第一中心轴115发生相对移动的外力并不限于手动操作，任何能够使第一制动器113和第二制动器114相对第一中心轴115发生相对移动的驱动方式均可。
本实施例中，第一制动器113控制第一楔形件111的移动，第二制动器114控制第二楔形件112的移动，当第一端轴110磨损导致直径减小后，在第一伸缩杆和第二伸缩杆的作用下，第一楔形件111和第二楔形件112沿第一端轴110的径向向外运动，手动移动第一制动器113和第二制动器114，使第一制动器113和第二制动器114沿第一中心轴115相对运动，第一楔形件111的侧面与第二楔形件112的侧面贴实，第一楔形件111的第一圆弧面和第二楔形件112的第三圆弧面形成新直径的第一端轴110的外圆。
第二端轴120包括多个第三楔形件121、多个第四楔形件122、第三制动器123、第四制动器124和第二中心轴125，第三制动器123和第四制动器124均套设在第二中心轴125上，第三制动器123与第三楔形件121连接，第四制动器124与第四楔形件122连接，第二中心轴125与带液轴130的中心孔连接，第二中心轴125的一端设有第二限位块，第二限位块为正六面体结构，第二限位块设在带液轴130的中心孔内，限制第二端轴120与带液轴130的相对转动。
第三楔形件121由第五圆弧面、第六圆弧面、两个不平行的侧面和两个平行的端面构成，第四楔形件122第七圆弧面、第八圆弧面、两个不平行的侧面和两个平行的端面构成，第三楔形件121的第五圆弧面和第四楔形件122的第七圆弧面形成第二端轴120的外圆周，相邻第三楔形件121的侧面和第四楔形件122的侧面紧贴在一起。
值得注意的是，第五圆弧面和第六圆弧面同心，第七圆弧面和第八圆弧面同心，使得第二端轴120形成的外圆周面是圆柱面，避免第二端轴120与湿法刻蚀槽的支架200的安装孔220装配后形成线接触。
为了实现第二端轴120的直径可调，第三制动器123和第四制动器124与第二中心轴125均可滑动连接。
具体而言，第三制动器123包括第三伸缩杆和第三连接座，第三连接座为圆筒状，第三连接座套设在第二中心轴125的外侧，第三连接座的内孔直径等于第二中心轴125的直径，使得在外力的作用下第三连接座能够在第二中心轴125上移动。
本实施例中，使第三制动器123能够相对第二中心轴125相对移动的外力作用为操作人员手动移动第三制动器123，以便第三制动器123能够停在所需位置，使第二端轴120获得调整水平所需的直径大小。
第三伸缩杆均布在第三连接座的外周，第三伸缩杆的一端与第三连接座连接，另一端为自由端，能够相对固定端伸缩，具体地，第三楔形件121的第六圆弧面设有第三安装孔，第三安装孔设在靠近第三楔形件121的大头端，第三伸缩杆的自由端安装在第三安装孔中。
具体而言，第三伸缩杆包括第三伸缩弹簧、第三内伸缩杆和第三连接杆，第三连接杆的一端开孔并在第三连接杆内形成空腔，第三伸 缩弹簧设在空腔内，第三连接杆的另一端与第三连接座固定连接，第三内伸缩杆的一端通过第三连接杆上孔进入空腔并抵压在第三伸缩弹簧上，第三内伸缩杆的另一端与第三楔形件121连接。
值得注意的是，第三伸缩杆通过第三连接座的直径方向。
同理可知，第四制动器124包括第四伸缩杆和第四连接座，第四连接座为圆筒状，第四连接座套设在第二中心轴125的外侧，第四连接座的内孔直径等于第二中心轴125的直径，使得在外力的作用下第四连接座能够在第二中心轴125上移动。
本实施例中，使第四制动器124能够相对第二中心轴125相对移动的外力作用为操作人员手动移动第四制动器124，以便第四制动器124能够停在所需位置，使第二端轴120获得调整水平所需的直径大小。
第四伸缩杆均布在第四连接座的外周，第四伸缩杆的一端与第四连接座连接，另一端为自由端，能够相对固定端伸缩，具体地，第四楔形件122的第八圆弧面设有第四安装孔，第四安装孔设在靠近第四楔形件122的大头端，第四伸缩杆的自由端安装在第四安装孔中。
具体而言，第四伸缩杆包括第四伸缩弹簧、第四内伸缩杆和第四连接杆，第四连接杆的一端开孔并在第四连接杆内形成空腔，第四伸缩弹簧设在空腔内，第四连接杆的另一端与第四连接座固定连接，第四内伸缩杆的一端通过第四连接杆上孔进入空腔并抵压在第四伸缩弹簧上，第四内伸缩杆的另一端与第四楔形件122连接。
本实施例中，第三伸缩杆随第三制动器123的移动而自动伸缩，第四伸缩杆随第四制动器124的移动而自动伸缩，由于第三楔形件121和第四楔形件122侧面贴合，在第三楔形件121和第四楔形件122的作用力下能够限定第三伸缩杆和第四伸缩杆伸缩量，即当第三制动器 123和第四制动器124的位置固定时第三伸缩杆和第四伸缩杆在第三楔形件121和第四楔形件122的侧面挤压力作用下能够保持一个特定的长度。
值得注意的是，第四伸缩杆通过第四连接座的直径方向。
需要说明的是，使第三制动器123和第四制动器124相对第二中心轴125发生相对移动的外力并不限于手动操作，任何能够使第三制动器123和第四制动器124相对第二中心轴125发生相对移动的驱动方式均可。
本实施例中，第三制动器123控制第三楔形件121的移动，第四制动器124控制第四楔形件122的移动，当第二端轴120磨损导致直径减小后，在第三伸缩杆和第四伸缩杆的作用下，第三楔形件121和第四楔形件122沿第二端轴120的径向向外运动，手动移动第三制动器123和第四制动器124，使第三制动器123和第四制动器124沿第二中心轴125相对运动，第三楔形件121的侧面与第四楔形件122的侧面贴实，第三楔形件121的第五圆弧面和第四楔形件122的第七圆弧面形成新直径的第二端轴120的外圆，如图5所示，图5(a)表示第二端轴120的直径从初始位置调小的变化示意图，图5(b)表示第二端轴120的直径为初始状态示意图，图5(c)表示第二端轴120直径调大的变化示意图。
需要说明的是，为了减小加工成本，第一端轴110和第二端轴120的尺寸、结构相同。
值得注意的是，第一楔形件111和第二楔形件112限定形成第一端轴110第一外表面(由第一楔形件111的第一圆弧面和第二楔形件的第三圆弧面形成)，第一外表面具有第一有效直径，第一有效直径按照第一楔形件111和第二楔形件112之间的轴向运动的增大或减小 (即第一楔形件111和第二楔形件112沿第一中心轴124相向运动，第一有效直径增加，第一楔形件111和第二楔形件112沿第一中心轴115相反运动，第一有效直径减小)；第三楔形件121和第四楔形件122限定形成第二端轴120第二外表面(由第三楔形件121的第五圆弧面和第四楔形件122的第七圆弧面形成)，第二外表面具有第二有效直径，第二有效直径按照第三楔形件121和第四楔形件122之间的轴向运动的增大或减小(即第三楔形件121和第四楔形件122沿第二中心轴125相向运动，第二有效直径增加，第三楔形件121和第四楔形件122沿第二中心轴125相反运动，第二有效直径减小)。
由于滚轮材料必须为耐酸碱的材质，第一端轴110、第二端轴120和带液轴130的材质均为PVDF(Poly vinylidene fluoride，聚偏氟乙烯)或PTFE(Poly tetra fluoroethylene，聚四氟乙烯)。
本实施例中的带液滚轮100应用于湿法刻蚀槽，刻蚀槽500包括支架200和带液滚轮100，刻蚀槽500内设有刻蚀液体600，带液滚轮100上设有太阳能晶片300，太阳能晶片300上表面设有水膜400，带液滚轮100与支架200连接，具体地，支架200包括支架本体210，支架本体210上均匀开设有安装孔220，带液滚轮100的第一端轴110和第二端轴120分别置于支架200的两侧支架本体210的安装孔220内。
本实施例中，带液滚轮100和支架200摩擦产生磨损时，无需更换整根带液滚轮100，只需将端轴直径进行调整，降低了刻蚀槽500的运行成本，此外，可独立调节带液滚轮100的水平度。
实施例2
本发明的另一个具体实施例，公开了一种湿法刻蚀方法，使用实施例1的用于湿法刻蚀的带液滚轮，步骤包括：
步骤1：调整带液滚轮100的轴端，确保太阳能晶片300放置到带液滚轮100上处于水平状态。
需要说明的是，刻蚀槽500上安装有多个带液滚轮100，需要调整所有带液滚轮100，使得太阳能晶片300处于水平位置。
相向移动第一制动器113和第二制动器114，使第一楔形件111和第二楔形件112向第一端轴110柱体中心方向移动，第一端轴110直径增大；相向移动第三制动器123和第四制动器124，使第三楔形件121和第四楔形件122向第二端轴120柱体中心方向移动，第二端轴120直径增大；
反向移动第一制动器113和第二制动器114，使第一楔形件111和第二楔形件112向第一端轴110柱体中心反方向移动，第一端轴110直径减少；反向移动第三制动器123和第四制动器124，使第三楔形件121和第四楔形件122向第二端轴120柱体中心反方向移动，第二端轴120直径减少。
步骤2：将太阳能晶片300放置在带液滚轮100上，带液滚轮100在外力(如电机)作用下转动，带动太阳能晶片300向前运动的同时，将刻蚀液体600刷到太阳能晶片300的背面进行湿法刻蚀。
需要说明的是，由于太阳能晶片300的正面设有水膜400，避免了刻蚀液体600对太阳能晶片300的正面的损坏。
以上所述，仅为本发明较佳的具体实施方式，但本发明的保护范围并不局限于此，任何熟悉本技术领域的技术人员在本发明揭露的技术范围内，可轻易想到的变化或替换，都应涵盖在本发明的保护范围之内。

Claims (18)

  1. 一种用于湿法刻蚀的带液滚轮，其特征在于，包括第一端轴(110)、第二端轴(120)和带液轴(130)，第一端轴(110)和第二端轴(120)分别位于带液轴(130)的两端，第一端轴(110)、第二端轴(120)与带液轴(130)同心设置，第一端轴(110)和第二端轴(120)的直径均能够调节。
  2. 根据权利要求1所述的用于湿法刻蚀的带液滚轮，其特征在于，所述第一端轴(110)包括多个第一楔形件(111)、多个第二楔形件(112)、第一制动器(113)、第二制动器(114)和第一中心轴(115)；
    所述第一制动器(113)和第二制动器(114)均套设在所述第一中心轴(115)上，所述第一制动器(113)与所述第一楔形件(111)连接，所述第二制动器(114)和第二楔形件(112)连接，所述第一中心轴(115)的一端与所述带液轴(130)的中心孔连接。
  3. 根据权利要求2所述的用于湿法刻蚀的带液滚轮，其特征在于，所述第二端轴(120)包括多个第三楔形件(121)、多个第四楔形件(122)、第三制动器(123)、第四制动器(124)和第二中心轴(125)；
    所述第三制动器(123)和所述第四制动器(124)均套设在所述第二中心轴(125)上，所述第三制动器(123)与所述第三楔形件(121)连接，所述第四制动器(124)与所述第四楔形件(122)连接，所述第二中心轴(125)的一端与所述带液轴(130)的中心孔连接。
  4. 根据权利要求2所述的用于湿法刻蚀的带液滚轮，其特征在于，所述第一制动器(113)和所述第二制动器(114)能够沿所述第一中心轴(115)相对移动。
  5. 根据权利要求2所述的用于湿法刻蚀的带液滚轮，其特征在于，所述第一楔形件(111)能够沿所述第一制动器(113)的径向移动，所述 第二楔形件(112)能够沿所述第二制动器(114)的径向移动。
  6. 根据权利要求3所述的用于湿法刻蚀的带液滚轮，其特征在于，所述第三制动器(123)和所述第四制动器(124)能够沿所述第二中心轴(125)相对移动。
  7. 根据权利要求3所述的用于湿法刻蚀的带液滚轮，其特征在于，所述第三楔形件(121)能够沿所述第三制动器(123)的径向移动，所述第四楔形件(122)能够沿所述第四制动器(124)的径向移动。
  8. 根据权利要求3所述的用于湿法刻蚀的带液滚轮，其特征在于，所述第一楔形件(111)和所述第二楔形件(112)限定形成所述第一端轴(110)的第一外表面；
    所述第三楔形件(121)和所述第四楔形件(122)限定形成所述第二端轴(120)的第二外表面。
  9. 根据权利要求1所述的用于湿法刻蚀的带液滚轮，其特征在于，所述第一端轴(110)、所述第二端轴(120)和所述带液轴(130)的材质为PVDF或PTFE。
  10. 根据权利要求3所述的用于湿法刻蚀的带液滚轮，其特征在于，
    所述第一楔形件(111)和所述第二楔形件(112)交错设置，所述第一楔形件(111)的侧面与所述第二楔形件(112)的侧面始终接触，所述第三楔形件(121)和所述第四楔形件(122)交错设置，所述第三楔形件(121)的侧面和所述第四楔形件(122)的侧面始终接触。
  11. 根据权利要求3所述的用于湿法刻蚀的带液滚轮，其特征在于，
    所述第一中心轴(115)的一端设有第一限位块，所述第一限位块设在所述带液轴(130)的中心孔内，限制所述第一端轴(110)与所述带液轴(130)的相对转动；
    所述第二中心轴(125)的一端设有第二限位块，所述第二限位块设在所述带液轴(130)的中心孔内，限制所述第二端轴(120)与所述带液轴(130)的相对转动。
  12. 根据权利要求2所述的用于湿法刻蚀的带液滚轮，其特征在于，
    所述第一楔形件(111)由第一圆弧面、第二圆弧面、两个不平行的侧面和两个平行的端面构成，所述第二楔形件(112)第三圆弧面、第四圆弧面、两个不平行的侧面和两个平行的端面构成，所述第一楔形件(111)的第一圆弧面和所述第二楔形件(112)的第三圆弧面形成所述第一端轴(110)的外圆周，相邻的第一楔形件(111)的侧面和第二楔形件(112)的侧面紧贴在一起。
  13. 根据权利要求12所述的用于湿法刻蚀的带液滚轮，其特征在于，
    所述第一圆弧面和所述第二圆弧面同心，所述第三圆弧面和所述第四圆弧面同心，使得所述第一端轴(110)形成的外圆周面是圆柱面。
  14. 根据权利要求3所述的用于湿法刻蚀的带液滚轮，其特征在于，
    所述第三楔形件(121)由第五圆弧面、第六圆弧面、两个不平行的侧面和两个平行的端面构成，所述第四楔形件(122)第七圆弧面、第八圆弧面、两个不平行的侧面和两个平行的端面构成，所述第三楔形件(121)的第五圆弧面和所述第四楔形件(122)的第七圆弧面形成所述第二端轴(120)的外圆周，相邻第三楔形件(121)的侧面和第四楔形件(122)的侧面紧贴在一起。
  15. 根据权利要求14所述的用于湿法刻蚀的带液滚轮，其特征在于，
    所述第五圆弧面和所述第六圆弧面同心，所述第七圆弧面和所述第八圆弧面同心，使得所述第二端轴(120)形成的外圆周面是圆柱面。
  16. 根据权利要求8所述的用于湿法刻蚀的带液滚轮，其特征在于，
    所述第一外表面具有第一有效直径，所述第一有效直径按照所述第一 楔形件(111)和所述第二楔形件(112)间的轴向运动的增大或减小；所述第二外表面具有第二有效直径，所述第二有效直径按照所述第三楔形件(121)和所述第四楔形件(122)之间的轴向运动的增大或减小。
  17. 一种湿法刻蚀方法，其特征在于，使用权利要求1-16所述的用于湿法刻蚀的带液滚轮，步骤包括：
    步骤1：调整带液滚轮的轴端，使太阳能晶片处于水平状态；
    相向移动制动器，使楔形件向端轴的柱体中心方向移动，端轴直径增大；反向移动制动器，使楔形件向端轴的柱体中心反方向移动，端轴直径减少；
    步骤2：带液滚轮带动太阳能晶片运动，进行湿法刻蚀。
  18. 一种应用于湿法刻蚀的刻蚀槽，其特征在于，包括：支架(200)以及权利要求1至16任一所述的带液滚轮(100)，其中，
    所述支架(200)包括支架本体(210)，所述支架本体(210)上均匀开设有安装孔(220)，所述带液滚轮(100)的第一端轴(110)和所述第二端轴(120)分别置于所述支架(200)的两侧所述支架本体(210)的所述安装孔(220)内。
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