WO2022041852A1 - Photocatalyseur à film mince à structure organométallique à base de nickel (ni-mof) développé in situ sur une surface de nickel moussé, son procédé de préparation, et son utilisation - Google Patents
Photocatalyseur à film mince à structure organométallique à base de nickel (ni-mof) développé in situ sur une surface de nickel moussé, son procédé de préparation, et son utilisation Download PDFInfo
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- WO2022041852A1 WO2022041852A1 PCT/CN2021/093779 CN2021093779W WO2022041852A1 WO 2022041852 A1 WO2022041852 A1 WO 2022041852A1 CN 2021093779 W CN2021093779 W CN 2021093779W WO 2022041852 A1 WO2022041852 A1 WO 2022041852A1
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- mof
- nickel
- foamed nickel
- nickel foam
- photocatalyst
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- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 title claims abstract description 158
- 229910052759 nickel Inorganic materials 0.000 title claims abstract description 79
- 238000011065 in-situ storage Methods 0.000 title claims abstract description 40
- 239000011941 photocatalyst Substances 0.000 title claims abstract description 38
- 239000010409 thin film Substances 0.000 title claims abstract description 30
- 238000002360 preparation method Methods 0.000 title claims abstract description 17
- 239000013099 nickel-based metal-organic framework Substances 0.000 claims abstract description 59
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims abstract description 42
- 239000003792 electrolyte Substances 0.000 claims abstract description 20
- 238000000034 method Methods 0.000 claims abstract description 19
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 claims abstract description 17
- 239000012855 volatile organic compound Substances 0.000 claims abstract description 14
- 230000003647 oxidation Effects 0.000 claims abstract description 13
- 238000007254 oxidation reaction Methods 0.000 claims abstract description 13
- VEQPNABPJHWNSG-UHFFFAOYSA-N Nickel(2+) Chemical compound [Ni+2] VEQPNABPJHWNSG-UHFFFAOYSA-N 0.000 claims abstract description 7
- 229910021607 Silver chloride Inorganic materials 0.000 claims abstract description 7
- 150000007522 mineralic acids Chemical class 0.000 claims abstract description 7
- 229910001453 nickel ion Inorganic materials 0.000 claims abstract description 7
- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 claims abstract description 7
- 238000001816 cooling Methods 0.000 claims abstract description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 claims description 84
- 239000006260 foam Substances 0.000 claims description 63
- 239000010408 film Substances 0.000 claims description 37
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 13
- 239000008367 deionised water Substances 0.000 claims description 12
- 229910021641 deionized water Inorganic materials 0.000 claims description 12
- 150000002815 nickel Chemical class 0.000 claims description 12
- 238000013033 photocatalytic degradation reaction Methods 0.000 claims description 9
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 8
- 230000033558 biomineral tissue development Effects 0.000 claims description 8
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 6
- 150000001298 alcohols Chemical class 0.000 claims description 6
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 claims description 6
- 238000002156 mixing Methods 0.000 claims description 6
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 4
- 230000015556 catabolic process Effects 0.000 claims description 3
- 238000006731 degradation reaction Methods 0.000 claims description 3
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 2
- 230000004913 activation Effects 0.000 claims description 2
- WSFSSNUMVMOOMR-UHFFFAOYSA-N formaldehyde Substances O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 claims description 2
- 229910017604 nitric acid Inorganic materials 0.000 claims description 2
- 230000001590 oxidative effect Effects 0.000 claims description 2
- 239000000126 substance Substances 0.000 claims description 2
- 229910001868 water Inorganic materials 0.000 claims 1
- 239000012621 metal-organic framework Substances 0.000 abstract description 18
- 239000000463 material Substances 0.000 abstract description 9
- 239000003054 catalyst Substances 0.000 abstract description 6
- 230000001699 photocatalysis Effects 0.000 abstract description 6
- 238000001035 drying Methods 0.000 abstract description 5
- 238000005406 washing Methods 0.000 abstract description 4
- 238000012545 processing Methods 0.000 abstract 2
- 238000004140 cleaning Methods 0.000 abstract 1
- 230000000593 degrading effect Effects 0.000 abstract 1
- 238000001179 sorption measurement Methods 0.000 description 27
- 238000004070 electrodeposition Methods 0.000 description 13
- 238000003795 desorption Methods 0.000 description 6
- 238000002474 experimental method Methods 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 4
- 238000005265 energy consumption Methods 0.000 description 4
- 238000004729 solvothermal method Methods 0.000 description 4
- 238000003786 synthesis reaction Methods 0.000 description 4
- 238000001291 vacuum drying Methods 0.000 description 4
- 230000003197 catalytic effect Effects 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 239000011148 porous material Substances 0.000 description 3
- 239000003153 chemical reaction reagent Substances 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000001027 hydrothermal synthesis Methods 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 230000035484 reaction time Effects 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 238000006555 catalytic reaction Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 229940079593 drug Drugs 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000013110 organic ligand Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000011056 performance test Methods 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
Images
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
- B01J37/34—Irradiation by, or application of, electric, magnetic or wave energy, e.g. ultrasonic waves ; Ionic sputtering; Flame or plasma spraying; Particle radiation
- B01J37/348—Electrochemical processes, e.g. electrochemical deposition or anodisation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/007—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by irradiation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
- B01D53/86—Catalytic processes
- B01D53/8678—Removing components of undefined structure
- B01D53/8687—Organic components
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J31/00—Catalysts comprising hydrides, coordination complexes or organic compounds
- B01J31/16—Catalysts comprising hydrides, coordination complexes or organic compounds containing coordination complexes
- B01J31/1691—Coordination polymers, e.g. metal-organic frameworks [MOF]
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J31/00—Catalysts comprising hydrides, coordination complexes or organic compounds
- B01J31/16—Catalysts comprising hydrides, coordination complexes or organic compounds containing coordination complexes
- B01J31/18—Catalysts comprising hydrides, coordination complexes or organic compounds containing coordination complexes containing nitrogen, phosphorus, arsenic or antimony as complexing atoms, e.g. in pyridine ligands, or in resonance therewith, e.g. in isocyanide ligands C=N-R or as complexed central atoms
- B01J31/1805—Catalysts comprising hydrides, coordination complexes or organic compounds containing coordination complexes containing nitrogen, phosphorus, arsenic or antimony as complexing atoms, e.g. in pyridine ligands, or in resonance therewith, e.g. in isocyanide ligands C=N-R or as complexed central atoms the ligands containing nitrogen
- B01J31/181—Cyclic ligands, including e.g. non-condensed polycyclic ligands, comprising at least one complexing nitrogen atom as ring member, e.g. pyridine
- B01J31/1815—Cyclic ligands, including e.g. non-condensed polycyclic ligands, comprising at least one complexing nitrogen atom as ring member, e.g. pyridine with more than one complexing nitrogen atom, e.g. bipyridyl, 2-aminopyridine
-
- B01J35/39—
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2257/00—Components to be removed
- B01D2257/70—Organic compounds not provided for in groups B01D2257/00 - B01D2257/602
- B01D2257/708—Volatile organic compounds V.O.C.'s
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2259/00—Type of treatment
- B01D2259/80—Employing electric, magnetic, electromagnetic or wave energy, or particle radiation
- B01D2259/802—Visible light
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2531/00—Additional information regarding catalytic systems classified in B01J31/00
- B01J2531/80—Complexes comprising metals of Group VIII as the central metal
- B01J2531/84—Metals of the iron group
- B01J2531/847—Nickel
Definitions
- the invention belongs to the technical field of photocatalytic materials, and more particularly relates to a Ni-MOF thin film photocatalyst grown on the surface of foamed nickel in situ and a preparation method and application thereof.
- MOFs as a member of emerging porous materials, have been widely used in the fields of gas adsorption, separation, and drug release, and MOFs have a large number of metal active sites, structural diversity, controllable pore size, large The advantages of specific surface area and good stability make it also have great application potential in the field of catalysis.
- the synthesis of MOFs generally requires higher temperature, certain pressure and longer reaction time.
- the synthesis of MOFs films is mainly based on hydrothermal and solvothermal methods.
- the hydrothermal method and solvothermal method have the problems of poor controllability, long cycle, and high energy consumption, which make the production of MOFs membranes still face the problems of low efficiency and difficult to achieve controllable preparation.
- the purpose of the present invention is to overcome the defects of the prior art, and provide a preparation method for in-situ growth of Ni-MOF thin film photocatalyst on the surface of foamed nickel.
- the method uses nickel foam as a nickel source, applies a certain oxidation voltage to the nickel foam to precipitate nickel ions, and then utilizes nickel ions and organic ligands to self-assemble on the surface of the nickel foam to grow MOFs films in situ.
- Another object of the present invention is to provide a Ni-MOF thin film photocatalyst prepared by the above method for in-situ growth on the surface of nickel foam.
- Another object of the present invention is to provide the application of in-situ growth of Ni-MOF thin film photocatalyst on the surface of foamed nickel.
- a preparation method for in-situ growth of Ni-MOF thin film photocatalyst on the surface of foamed nickel comprising the following steps:
- the surface-activated nickel foam is used as the working electrode, the Pt is used as the counter electrode, and the Ag/AgCl is used as the reference electrode, and the surface-activated nickel foam is immersed in the methanol solution of the electrolyte 2-methylimidazole;
- step S3 React the mixing system of step S2 at 30-120°C, apply an oxidizing voltage to the nickel foam of the working electrode, and leave it to stand after each pressurization, so that the nickel ions precipitated by the nickel foam and the 2-formaldehyde in the surrounding electrolyte
- the coordination of imidazole occurs, and the Ni-MOF film is grown in situ on the surface of the nickel foam.
- the nickel foam is taken out and washed with alcohols and deionized water, and dried in vacuum, that is, in situ on the surface of the nickel foam. Growth of Ni-MOF thin film photocatalysts.
- the ultrasonic time in step S1 is 5-60 min.
- the inorganic acid in step S1 is hydrochloric acid, sulfuric acid or nitric acid, and the concentration of the inorganic acid is 0.5-5 mol/L.
- the molar ratio of 2-methylimidazole to methanol in the methanol solution of 2-methylimidazole in step S2 is 1:(10-100).
- step S3 the number of times of applying the oxidation voltage is 1-10 times, the application of the oxidation voltage is 1-10V/time, and the time of applying the oxidation voltage is 1-1800s/time.
- the alcohol substance in step S3 is methanol or ethanol.
- a photocatalyst for in-situ growth of Ni-MOF thin film on the surface of foamed nickel is prepared by the method.
- Ni-MOF thin film photocatalyst on the surface of nickel foam to degrade volatile organic compounds in the atmosphere driven by sunlight.
- the volatile organic compound is ethyl acetate.
- the photocatalytic degradation rate of the Ni-MOF film to gas-phase ethyl acetate reaches more than 72%, and the mineralization rate of the complete decomposition of ethyl acetate into CO 2 and H 2 O reaches more than 54%.
- the invention uses foamed nickel with good electrical and thermal conductivity as a base, and prepares the surface of the foamed nickel by an electrochemical deposition method to grow Ni-MOF thin film photocatalysts in situ.
- This method can rapidly synthesize MOFs under mild conditions, which greatly saves the reaction time and energy consumption, and has the advantages of simple process, easy operation, safety and environmental protection, and convenient application.
- the electrochemical deposition method Metal ions can be released through electrode oxidation, avoiding subsequent steps of removing ions such as NO 3 - or Cl - involved in traditional preparation methods using metal salts.
- the material synthesis method obtained by this preparation method is universal, and defects, pore size and particle size can be controlled and optimized by electrolyte, potential and reaction temperature.
- the prepared photocatalyst film can efficiently catalyze the degradation of low-concentration VOCs under the driving of sunlight, and has excellent stability. This is because the MOFs film is highly dispersed on the surface of the nickel foam with macropores, which not only enhances the absorption and utilization of light, but also improves the mass transfer of VOCs; and because the conductivity of the nickel foam is conducive to the transmission of photogenerated electrons, reducing the amount of electrons. - The bulk recombination of holes can effectively improve the separation efficiency of photogenerated carriers, thereby improving the photocatalytic activity and stability of composite photocatalysts, and at the same time solving the assembly and application problems of MOFs catalysts in atmospheric treatment.
- the present invention has the following beneficial effects:
- the present invention utilizes the characteristics of foamed nickel with good electrical and thermal conductivity, and uses electrochemical deposition to prepare a Ni-MOF thin film photocatalyst in situ growth on the surface of foamed nickel. Combined with the semiconductor characteristics of MOFs and the characteristics of MOFs with good adsorption capacity for VOCs, the precipitated nickel ions are self-assembled with 2-methylimidazole in the electrolyte, and Ni-MOF film materials can be obtained on the surface of nickel foam.
- the method of the present invention can not only overcome the problems of excessively long synthesis time and high energy consumption in common solvothermal methods, but also realize the controllable preparation of MOFs materials on the surface of foamed nickel, and at the same time solve the assembly and application problems of MOFs catalysts in atmospheric treatment. .
- Ni-MOF thin film photocatalyst on the surface of nickel foam prepared by electrodeposition method in the present invention exhibits good adsorption capacity and excellent catalytic activity for typical VOCs (ethyl acetate).
- VOCs ethyl acetate
- the results of dark adsorption experiments showed that the adsorption of ethyl acetate on Ni-MOF films synthesized by electrochemical deposition reached the equilibrium of adsorption and desorption within 60 min, and the maximum adsorption rate was 24.1% of the initial concentration of ethyl acetate.
- the photocatalytic degradation rate of gas-phase ethyl acetate can reach 86.8%, and the mineralization rate of ethyl acetate being completely decomposed into CO 2 and H 2 O also reaches 64.5%. It can be seen that the composite catalyst can solve the assembly and application problems of MOFs catalysts in atmospheric treatment, has great potential for large-scale preparation of supported photocatalyst materials, and is more conducive to industrial applications.
- Example 1 is a scanning electron microscope photograph of in-situ growth of Ni-MOF films on the surface of nickel foam prepared in Example 1.
- Example 2 is the kinetic curve of adsorption and photocatalytic degradation of gas-phase ethyl acetate by in-situ growth of Ni-MOF film on the surface of nickel foam obtained in Example 1.
- step S2 The mixing system of step S2 is reacted at 50°C, and an oxidation voltage of 2V is applied to the nickel foam of the working electrode for 1 s, and the pressure is 10 times. , coordinated with 2-methylimidazole in the electrolyte to synthesize Ni-MOF film on the surface of nickel foam;
- step S4 Take out the synthetic nickel foam obtained in step S3 and grow the Ni-MOF film in situ on the surface. After cross-washing with alcohols and deionized water, put it into a vacuum drying oven for drying to obtain the in-situ growth of Ni-MOF on the nickel foam. MOF photocatalyst thin film.
- FIG. 1 is a scanning electron microscope photograph of the Ni-MOF film grown in situ on the surface of the nickel foam obtained in Example 1. It can be seen from Figure 1 that Ni-MOF grows on the surface of nickel foam in the form of a dense film.
- 2 is the adsorption kinetic curve and photocatalytic degradation kinetic curve of the Ni-MOF film material obtained in Example 1 to gas-phase ethyl acetate. It can be seen from Figure 2 that within 60 min, the adsorption of ethyl acetate by the Ni-MOF film synthesized by electrodeposition method reached the equilibrium of adsorption and desorption, and the maximum adsorption rate was 24.1% of the initial concentration of ethyl acetate.
- the photocatalytic degradation rate of ethyl acetate in gas phase by Ni-MOF film can reach 86.8%, and the mineralization rate at this time is 64.5%.
- the results show that the photocatalyst has certain adsorption performance and high visible light catalytic activity.
- the Ni-MOF thin film photocatalyst is a new material with certain adsorption capacity for VOCs and high photocatalytic activity.
- step S2 The mixing system of step S2 is reacted at 120°C, and an oxidation voltage of 10V is applied to the nickel foam of the working electrode, the time is 1s, and the pressure is 1 time. , coordinated with 2-methylimidazole in the electrolyte to synthesize Ni-MOF film on the surface of nickel foam;
- step S4 After the in-situ growth of the Ni-MOF film on the surface of the synthesized nickel foam obtained in step S3 is cross-washed with alcohols and deionized water, put it into a vacuum drying oven to dry, and obtain an in-situ on the surface of the nickel foam using an electrodeposition method. Growth of Ni-MOF thin film photocatalysts.
- the adsorption of ethyl acetate on Ni-MOF films synthesized by electrodeposition reached the equilibrium of adsorption and desorption, and the maximum adsorption rate was 22.8% of the initial concentration of ethyl acetate.
- the photocatalytic degradation rate of ethyl acetate in gas phase by Ni-MOF film can reach 78.2%, and the mineralization rate at this time is 59.5%.
- step S2 The mixing system of step S2 is reacted at 70°C, and the oxidation voltage of 3V is applied to the nickel foam of the working electrode for 600s, and the pressure is 5 times. , coordinated with 2-methylimidazole in the electrolyte to synthesize Ni-MOF film on the surface of nickel foam;
- step S4 in-situ growth of the Ni-MOF film on the surface of the synthesized nickel foam obtained in step S3, cross-washing with alcohols and deionized water, and drying in a vacuum drying oven to obtain the original raw material on the surface of the nickel foam using an electrodeposition method.
- step S4 in-situ growth of the Ni-MOF film on the surface of the synthesized nickel foam obtained in step S3, cross-washing with alcohols and deionized water, and drying in a vacuum drying oven to obtain the original raw material on the surface of the nickel foam using an electrodeposition method.
- the adsorption of ethyl acetate on Ni-MOF films synthesized by electrodeposition reached the equilibrium of adsorption and desorption, and the maximum adsorption rate was 27.3% of the initial concentration of ethyl acetate.
- the photocatalytic degradation rate of ethyl acetate in gas phase by Ni-MOF film can reach 80.5%, and the mineralization rate at this time is 62.1%.
- step S2 The mixing system of step S2 is reacted at 70°C, and an oxidation voltage of 1V is applied to the nickel foam of the working electrode, the time is 1800s, and the pressure is applied once. , coordinated with 2-methylimidazole in the electrolyte to synthesize Ni-MOF film on the surface of nickel foam;
- step S4 in-situ growth of the Ni-MOF film on the surface of the synthesized nickel foam obtained in step S3, cross-washing with alcohols and deionized water, and drying in a vacuum drying oven to obtain the raw material on the surface of the nickel foam using an electrodeposition method.
- step S4 in-situ growth of the Ni-MOF film on the surface of the synthesized nickel foam obtained in step S3, cross-washing with alcohols and deionized water, and drying in a vacuum drying oven to obtain the raw material on the surface of the nickel foam using an electrodeposition method.
- the adsorption of ethyl acetate on Ni-MOF films synthesized by electrodeposition reached the equilibrium of adsorption and desorption, and the maximum adsorption rate was 20.7% of the initial concentration of ethyl acetate.
- the photocatalytic degradation rate of ethyl acetate in gas phase by Ni-MOF film can reach 72%, and the mineralization rate at this time is 54%.
- the adsorption of ethyl acetate by the Ni-MOF film synthesized by the electrodeposition method of the invention reaches the equilibrium of adsorption and desorption, and within 60 minutes, the maximum adsorption rate is more than 20.7% of the initial concentration of ethyl acetate.
- the catalytic degradation rate can reach over 72%, and the corresponding mineralization rate is over 54%.
- the results show that the Ni-MOF thin film photocatalyst has a certain adsorption capacity for VOCs, good photocatalytic activity and stability, which can not only overcome the problems of long synthesis time and high energy consumption by common solvothermal methods, but also facilitate the regulation of MOFs on the surface of nickel foam. film thickness. Driven by sunlight, the photocatalyst material can effectively degrade VOCs in the atmosphere, and at the same time, it can solve the assembly and application problems of MOFs catalysts in atmospheric treatment.
Abstract
La présente invention appartient au domaine technique des matériaux photocatalytiques, et divulgue un photocatalyseur à film mince Ni-MOF développé in situ sur une surface de nickel moussé, son procédé de préparation, et son utilisation. Le procédé comprend : le placement du nickel moussé dans un acide inorganique pour un traitement, nettoyage et séchage par ultrasons afin de produire du nickel moussé activé en surface ; l'utilisation d'un système à trois électrodes, au moyen du nickel moussé activé en surface comme électrode de travail, Pt comme contre-électrode, Ag/AgCl en tant qu'électrode de référence, et l'immersion du nickel moussé dans une solution de méthanol de 2-méthylimidazole d'électrolyte ; l'application d'une tension d'oxydation à 30 à 120 °C pour les ions nickel libérés sur la surface du nickel moussé à auto-assembler avec du 2-méthylimidazole dans l'électrolyte entourant les ions nickel, après refroidissement, l'élimination et le lavage du nickel moussé, et le séchage pour obtenir le photocatalyseur à film mince. Le photocatalyseur de la présente invention présente une bonne activité photocatalytique et une bonne stabilité, est capable de dégrader efficacement les COV dans l'atmosphère sous l'action de la lumière solaire, et résout simultanément la difficulté dans l'assemblage du catalyseur MOF dans le traitement atmosphérique.
Applications Claiming Priority (2)
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CN202010878624.9A CN112076791A (zh) | 2020-08-27 | 2020-08-27 | 一种在泡沫镍表面原位生长Ni-MOF薄膜光催化剂及其制备方法和应用 |
CN202010878624.9 | 2020-08-27 |
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WO2022041852A1 true WO2022041852A1 (fr) | 2022-03-03 |
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PCT/CN2021/093779 WO2022041852A1 (fr) | 2020-08-27 | 2021-05-14 | Photocatalyseur à film mince à structure organométallique à base de nickel (ni-mof) développé in situ sur une surface de nickel moussé, son procédé de préparation, et son utilisation |
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Cited By (4)
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CN114457362A (zh) * | 2022-03-10 | 2022-05-10 | 河南科技大学 | 一种P-Co3O4/NF电催化剂在电催化尿素氧化中的应用 |
CN115260514A (zh) * | 2022-08-01 | 2022-11-01 | 中国华能集团清洁能源技术研究院有限公司 | 一种zif-8或其衍生物薄膜的制备方法 |
CN115874213A (zh) * | 2022-11-11 | 2023-03-31 | 石河子大学 | 一种快速原位合成羟基氧化物电催化剂的制备方法 |
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CN116060018A (zh) * | 2023-02-10 | 2023-05-05 | 河南工业大学 | 一种用于VOCs气体催化燃烧的镍基催化剂及制备方法 |
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