WO2022021935A1 - 一种快速切换镀膜工艺气体的方法及设备 - Google Patents

一种快速切换镀膜工艺气体的方法及设备 Download PDF

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WO2022021935A1
WO2022021935A1 PCT/CN2021/086385 CN2021086385W WO2022021935A1 WO 2022021935 A1 WO2022021935 A1 WO 2022021935A1 CN 2021086385 W CN2021086385 W CN 2021086385W WO 2022021935 A1 WO2022021935 A1 WO 2022021935A1
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cavity
gas
cathode
pipeline
inner cavity
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PCT/CN2021/086385
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French (fr)
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李王俊
曹新民
张斌
王凤明
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苏州迈正科技有限公司
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating

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  • the invention relates to the technical field of vacuum coating, in particular to a method and equipment for rapidly switching coating process gases.
  • the process gas needs to be switched before switching to the second process.
  • the usual practice of existing coating equipment is to open the valve on the vacuum pumping pipeline of the cavity to clean up the residual gas in the cavity and the cathode cavity, and then the gas box (Gas Box) passes the new process gas into the cavity through the cathode. , start the second process after the process gas switching is completed.
  • the gas diffusion holes on the cathode are all micro-pores with large flow resistance. When the gas is pumped through the vacuum pipe of the cavity, it is difficult to extract the residual gas, and the evacuation time is relatively long; and the new process gas passes through the cathode. (showerhead) surface pores also take a long time to diffuse into the cavity, thus extending the cycle time of the device.
  • the purpose of the present invention is to provide a method and equipment for rapidly switching the coating process gas, which can quickly clean up the residual process gas and greatly shorten the time for switching the process gas.
  • the cavity and the cathode cavity are evacuated at the same time, and when the pressure of the cavity and the cathode cavity is lower than 0.1 Torr, the cathode cavity and the cathode cavity are simultaneously
  • the cavity is evacuated first, and when the air pressure in the cathode cavity is higher than the cavity air pressure by 0.05 Torr, the inner cavity of the cathode is evacuated at the same time. After the chamber gas pressure is lower than 0.1 Torr, a new process gas is introduced into the cathode inner chamber and the chamber at the same time.
  • the device for rapidly switching the coating process gas of the present invention includes a vacuum pump, a gas cabinet, a cavity evacuation pipeline, a cathode inner cavity inflation pipeline, and a cathode inner cavity evacuation pipeline, and one end of the cavity evacuation pipeline is connected to the vacuum pump , the other end is connected to the cavity, and the cavity vacuuming pipeline is provided with a valve; one end of the cathode inner cavity vacuuming pipeline is connected to the cavity vacuuming pipeline, and the other end is connected to the cathode inner cavity, and the cathode One end of the inner cavity inflation pipe is connected with the gas cabinet, and the other end is connected with the cathode inner cavity.
  • the cavity and the inner cavity of the cathode are respectively evacuated through two vacuuming pipes, so that the residual process gas can be quickly evacuated to prepare for the introduction of new process gas. Significantly reduces the time to switch process gases.
  • the cavity inflation pipeline also includes a cavity inflation pipeline, one end of the cavity inflation pipeline is connected with the gas cabinet, and the other end is connected with the cavity.
  • a mass flow meter is arranged on the cavity gas-filled pipeline. The new process gas can be quickly introduced into the cavity through the newly added cavity inflation pipe, which greatly shortens the time for gas switching of the coating process.
  • a mass flow meter is provided on the gas-filled pipeline in the inner cavity of the cathode.
  • a vacuum pressure gauge is also included, and the vacuum pressure gauge is used to detect the pressure of the inner cavity of the cathode and the cavity, and an angle valve is arranged on the vacuuming pipeline of the inner cavity of the cathode.
  • the vacuum pressure gauge detects that the inner cavity of the cathode reaches a certain degree of vacuum
  • the angle valve is opened, and the inner cavity of the cathode is evacuated, which can quickly remove the residual gas in the inner cavity of the cathode and provide a measure for the completeness of the process gas switching. standard.
  • the device for rapidly switching the coating process gas of the present invention includes a vacuum pump, a gas cabinet, a cavity evacuation pipeline, a cathode inner cavity inflation pipeline, and a cavity inflation pipeline.
  • One end of the cavity evacuation pipeline is connected to the vacuum pump, and the other One end is connected to the cavity, and a valve is arranged on the cavity vacuuming pipeline;
  • one end of the cathode inner cavity inflation pipeline is connected to the gas cabinet, and the other end is connected to the cathode inner cavity;
  • One end is connected with the gas cabinet, and the other end is connected with the cavity.
  • a mass flow meter is arranged on the cavity gas-filled pipeline.
  • the present invention has the following advantages:
  • the residual gas in the cathode cavity can be quickly evacuated, and the vacuum degree of the cathode cavity and the cavity can be measured by the vacuum pressure gauge, which is also used for process gas switching. whether measures are thoroughly provided;
  • the time for switching process gas can be greatly shortened by adding a cavity gas-filled pipe leading to the bottom of the cavity from the gas tank and installing a mass flow meter with a large flow rate.
  • Fig. 1 is the pipeline schematic diagram of existing equipment switching coating process gas
  • Figure 2 is a schematic diagram of the pipeline of the present invention.
  • Cavity cover 2. Cathode, 3. Cathode inner cavity, 4. Cavity, 5. Cavity vacuuming pipeline, 6. Vacuum pump, 7. Gas cabinet, 8. Cathode inner cavity inflation pipeline, 9 .
  • the present invention adds a cathode inner cavity vacuuming pipeline 9 to the pipeline of the existing equipment, one end of which is connected to the cathode inner cavity 3 , and the other end is connected to the cavity vacuuming pipeline 5 .
  • An angle valve 10 is installed on the cathode inner cavity evacuating pipeline 9 , and a vacuum pressure gauge 11 for detecting the pressure of the cathode inner cavity 3 and the cavity 4 is also installed.
  • the cavity 4 is first evacuated from the cavity evacuating pipeline 5.
  • the angle valve 10 When the vacuum pressure gauge 11 detects that the air pressure in the cathode cavity 3 is higher than the air pressure in the cavity 4 by 0.05 Torr, the angle valve 10 is opened, and the inner cavity of the cathode is evacuated. 3 Carry out vacuuming. In other embodiments of the present invention, the angle valve 10 and the vacuum pressure gauge 11 are not provided, and when the coating process gas is switched, when the gas pressure in the cavity 4 and the cathode cavity 3 is lower than 0.1 Torr, the pressure in the cavity 4 and the cathode is simultaneously Chamber 3 is evacuated.
  • the present invention adds a new gas path from the gas tank 7 to the bottom of the cavity 4 on the pipeline of the existing equipment, that is, the cavity gas charging pipe 12 , one end of which is connected to the gas tank 7 and the other end is connected to the cavity 4 .
  • the bottom of cavity 4 is connected.
  • a mass flow meter 13 with a large flow rate is installed on the cavity gas-filled pipe 12, and a mass flow meter 14 is provided on the cathode inner cavity gas-filled pipe 8.
  • the gas cabinet 7 enters the cathode inner cavity 3 with new process gas, it passes through the new process gas.
  • the added cavity air-filling pipe 12 quickly feeds the new process gas into the cavity 4, which greatly shortens the switching time of the coating process gas.

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Vapour Deposition (AREA)
  • Pipeline Systems (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

本发明公开一种快速切换镀膜工艺气体的方法及设备，涉及真空镀膜技术领域。本发明的快速切换镀膜工艺气体的设备，包括真空泵、气柜、腔体抽真空管道、阴极内腔充气管道、阴极内腔抽真空管道，所述腔体抽真空管道的一端与所述真空泵连接，另一端与腔体连接，所述腔体抽真空管道上设置有阀门；所述阴极内腔抽真空管道的一端与所述腔体抽真空管道连接，另一端与阴极内腔连接，所述阴极内腔充气管道的一端与所述气柜连接，另一端与所述阴极内腔连接。本发明的快速切换镀膜工艺气体的设备，通过两路抽真空管道分别对腔体、阴极内腔进行抽真空，能够快速把残留的工艺气体抽干净，为通入新的工艺气体做好准备，极大地缩短切换工艺气体的时间。

Description

一种快速切换镀膜工艺气体的方法及设备 技术领域
本发明涉及真空镀膜技术领域，尤其涉及一种快速切换镀膜工艺气体的方法及设备。
背景技术
在真空镀膜设备中，第一道工艺完成后，切换成第二道工艺前，需要进行工艺气体切换。现有镀膜设备通常采取的做法是打开腔体抽真空管路上的阀门，把腔体及阴极内腔中的残留气体抽干净，然后气柜(Gas Box)通过阴极把新工艺气体通入到腔体中，完成工艺气体切换后再开始第二道工艺。但是阴极(showerhead)上的气体扩散孔都是微孔，流阻大，通过腔体抽真空管道抽气的情况下，残余气体比较难以抽出，抽空用的时间比较长；并且新工艺气体通过阴极(showerhead)表面的微孔扩散到腔体中的时间也长，这样就延长设备的节拍时间。
发明内容
本发明的目的在于提供一种快速切换镀膜工艺气体的方法及设备，能够快速把残留的工艺气体抽干净，极大地缩短切换工艺气体的时间。
本发明的快速切换镀膜工艺气体的方法，在一些实施例中，同时对腔体和阴极内腔抽真空，当腔体及阴极内腔气压低于0.1Torr后，同时往阴极内腔和腔体中通入新的工艺气体；在另一些实施例中，先对腔体抽真空，当阴极内腔气压高于腔体气压0.05Torr时，同时对阴极内腔抽真空，当腔体及阴极内腔气压低于0.1Torr后，同时往阴极内腔和腔体中通入新的工艺气体。
本发明的快速切换镀膜工艺气体的设备，包括真空泵、气柜、腔体抽真空管道、阴极内腔充气管道、阴极内腔抽真空管道，所述腔体抽真空管道的一端与所述真空泵连接，另一端与腔体连接，所述腔体抽真空管道上设置有阀门；所述阴极内腔抽真空管道的一端与所述腔体抽真空管道连接，另一端与阴极内腔连接，所述阴极内腔充气管道的一端与所述气柜连接，另一端与所述阴极内腔连接。
本发明的快速切换镀膜工艺气体的设备，通过两路抽真空管道分别对腔体、阴极内腔进行抽真空，能够快速把残留的工艺气体抽干净，为通入新的工艺气体做好准备，极 大地缩短切换工艺气体的时间。
进一步，还包括腔体充气管道，该腔体充气管道的一端与所述气柜连接，另一端与所述腔体连接。所述腔体充气管道上设置有质量流量计。通过新增的腔体充气管道能够快速地往腔体内部通入新的工艺气体，大大缩短了镀膜工艺气体切换的时间。
进一步，所述阴极内腔充气管道上设置有质量流量计。
进一步，还包括真空压力计，该真空压力计用于检测阴极内腔和腔体的压力，所述阴极内腔抽真空管道上设置有角阀。当真空压力计检测阴极内腔达到一定的真空度后，角阀开启，对阴极内腔进行抽真空，可以快速把阴极内腔中的残余气体抽干净，并且为工艺气体切换是否彻底提供了衡量标准。
本发明的快速切换镀膜工艺气体的设备，包括真空泵、气柜、腔体抽真空管道、阴极内腔充气管道、腔体充气管道，所述腔体抽真空管道的一端与所述真空泵连接，另一端与腔体连接，所述腔体抽真空管道上设置有阀门；所述阴极内腔充气管道的一端与所述气柜连接，另一端与所述阴极内腔连接；所述腔体充气管道的一端与所述气柜连接，另一端与所述腔体连接。所述腔体充气管道上设置有质量流量计。
本发明与现有技术相比，具有以下优点：
(1)通过新增阴极内腔抽真空管道及真空压力计，可以快速把阴极内腔中的残余气体抽干净，通过真空压力计测量阴极内腔和腔体的真空度，也为工艺气体切换是否彻底提供了衡量标准；
(2)通过新增气柜通往腔体底部的腔体充气管道以及安装大流量的质量流量计，可以极大地缩短切换工艺气体的时间。
附图说明
图1是现有设备切换镀膜工艺气体的管路示意图；
图2是本发明的管路示意图。
附图标记：1.腔盖、2.阴极、3.阴极内腔、4.腔体、5.腔体抽真空管道、6.真空泵、7.气柜、8.阴极内腔充气管道、9.阴极内腔抽真空管道、10.角阀、11.真空压力计、12.腔体充气管道、13.质量流量计、14.质量流量计。
具体实施方式
下面结合实施例和说明书附图对本发明作进一步的说明。
如图1所示，现有设备切换镀膜工艺气体时，先打开腔体抽真空管道5上的阀门，真空泵6把腔体4及阴极内腔3中的残留气体抽干净，然后气柜7通过阴极内腔充气管道8把新工艺气体通入到阴极内腔3及腔体4中，完成工艺气体切换。
如图2所示，本发明在现有设备的管路上新增了阴极内腔抽真空管道9，其一端与阴极内腔3连接，另一端与腔体抽真空管道5连接。该阴极内腔抽真空管道9上安装有角阀10，还有检测阴极内腔3和腔体4压力的真空压力计11。切换镀膜工艺气体时，先由腔体抽真空管道5对腔体4抽真空，真空压力计11检测阴极内腔3气压高于腔体4气压0.05Torr时，角阀10开启，对阴极内腔3进行抽真空。在本发明的其他实施例中，不设置角阀10和真空压力计11，切换镀膜工艺气体时，当腔体4及阴极内腔3气压低于0.1Torr后，同时对腔体4和阴极内腔3抽真空。
如图2所示，本发明在现有设备的管路上新增了一路气柜7通往腔体4底部的气路，即腔体充气管道12，其一端与气柜7连接，另一端与腔体4底部连接。该腔体充气管道12上安装有大流量的质量流量计13，阴极内腔充气管道8上设置有质量流量计14，在气柜7往阴极内腔3通入新工艺气体的同时，通过新增的腔体充气管道12快速地往腔体4内部通入新工艺气体，大大缩短了镀膜工艺气体切换的时间。上述实施例仅是本发明的优选实施方式，应当指出：对于本技术领域的普通技术人员来说，在不脱离本发明原理的前提下，还可以做出若干改进和等同替换，这些对本发明权利要求进行改进和等同替换后的技术方案，均落入本发明的保护范围。

Claims (10)

  1. 一种快速切换镀膜工艺气体的方法，其特征在于：同时对腔体和阴极内腔抽真空。
  2. 根据权利要求1所述的快速切换镀膜工艺气体的方法，其特征在于：先对腔体抽真空，当阴极内腔气压高于腔体气压0.05Torr时，同时对阴极内腔抽真空。
  3. 根据权利要求1或2所述的快速切换镀膜工艺气体的方法，其特征在于：当腔体及阴极内腔气压低于0.1Torr后，同时往阴极内腔和腔体中通入新的工艺气体。
  4. 一种快速切换镀膜工艺气体的设备，其特征在于：包括真空泵、气柜、腔体抽真空管道、阴极内腔充气管道、阴极内腔抽真空管道，所述腔体抽真空管道的一端与所述真空泵连接，另一端与腔体连接，所述腔体抽真空管道上设置有阀门；所述阴极内腔抽真空管道的一端与所述腔体抽真空管道连接，另一端与阴极内腔连接，所述阴极内腔充气管道的一端与所述气柜连接，另一端与所述阴极内腔连接。
  5. 根据权利要求4所述的快速切换镀膜工艺气体的设备，其特征在于：还包括腔体充气管道，该腔体充气管道的一端与所述气柜连接，另一端与所述腔体连接。
  6. 根据权利要求5所述的快速切换镀膜工艺气体的设备，其特征在于：所述腔体充气管道上设置有质量流量计。
  7. 根据权利要求4-6任一项所述的快速切换镀膜工艺气体的设备，其特征在于：所述阴极内腔充气管道上设置有质量流量计。
  8. 根据权利要求4-6任一项所述的快速切换镀膜工艺气体的设备，其特征在于：还包括真空压力计，该真空压力计用于检测阴极内腔和腔体的压力，所述阴极内腔抽真空管道上设置有角阀。
  9. 一种快速切换镀膜工艺气体的设备，其特征在于：包括真空泵、气柜、腔体抽真空管道、阴极内腔充气管道、腔体充气管道，所述腔体抽真空管道的一端与所述真空泵连接，另一端与腔体连接，所述腔体抽真空管道上设置有阀门；所述阴极内腔充气管道的一端与所述气柜连接，另一端与所述阴极内腔连接；所述腔体充气管道的一端与所述气柜连接，另一端与所述腔体连接。
  10. 根据权利要求9所述的快速切换镀膜工艺气体的设备，其特征在于：所述腔体充气管道上设置有质量流量计。
PCT/CN2021/086385 2020-07-29 2021-04-12 一种快速切换镀膜工艺气体的方法及设备 WO2022021935A1 (zh)

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