WO2021248303A1

WO2021248303A1 - Coating equipment and application

Info

Publication number: WO2021248303A1
Application number: PCT/CN2020/095072
Authority: WO
Inventors: 宗坚
Original assignee: 江苏菲沃泰纳米科技股份有限公司
Priority date: 2020-06-09
Filing date: 2020-06-09
Publication date: 2021-12-16
Also published as: CN114072539B; CN114072539A

Abstract

The present invention provides coating equipment and an application, for use in coating the surface of a workpiece to be coated. The coating equipment comprises an electrode device and a reaction chamber. The reaction chamber has a reaction chamber body, and at least one feed port and at least one evacuation port communicating with the reaction chamber body. The feed port is located close to the middle of the reaction chamber, and the evacuation port in a side of the reaction chamber. The electrode device discharges in the reaction chamber body for coating the surface of a workpiece to be coated.

Description

Coating equipment and applications

Technical field

The present invention relates to the field of coating, in particular to coating equipment and applications.

Background technique

The coating can protect the surface of the material and endow the material with good physical and chemical durability. Some coatings, such as polymer coatings, have certain anti-corrosion properties. They form a protective film layer on the surface of electronic components such as electronic appliances, circuit boards, etc., which can effectively protect the circuit from corrosion and damage in a corrosive environment, thereby improving The reliability of electronic components.

A typical coating equipment has a reaction chamber, a feed port connected to the reaction chamber, and an exhaust port. During the coating process, one or more workpieces to be coated need to be placed in the reaction chamber, and then removed from the reaction chamber. The reaction gas is introduced into the feed port. The reactive gas undergoes chemical vapor deposition on the surface of the workpiece to be coated under the action of the plasma to form a coating. In this process, it is necessary to continuously draw a vacuum so that the exhaust gas generated by the continuous reaction of the reactive material on the surface of the workpiece can be removed from the exhaust port, so as to maintain a stable coating pressure condition.

The feed port of the traditional coating equipment is located at the side of the reaction chamber, and the gas extraction port is located at the middle position of the reaction chamber. During the coating process, the flow direction of the reaction gas is from the side of the reaction chamber to the middle position. The concentration gradually decreases along the gas flow direction, which is likely to cause the closer to the middle of the reaction chamber, the thinner or unqualified the coating thickness on the surface of the workpiece to be coated. Further, the coating equipment includes a support set in the reaction chamber, and a plurality of the workpieces to be coated are supported on the support. In order to meet the convenience of use, for example, a rotatable or detachable support structure, the support The middle position of the reaction chamber is arranged symmetrically, and a certain avoidance space is reserved between the reaction chamber and the side wall of the reaction chamber. Since the feed port is also located on the side wall of the reaction chamber, the reaction gas needs to diffuse through the avoidance space. For the workpiece to be coated installed on the reaction chamber support, a large amount of reactant gas gathers in the avoidance space, which easily causes the coating thickness on the surface of the workpiece to be coated to not meet the standard, and even the surface of the workpiece to be coated near the middle position is not up to the standard. The phenomenon of forming a coating.

In addition, a typical existing coating equipment further includes a plasma excitation field arranged in the reaction chamber, wherein the workpiece to be coated and the feed port are respectively located on both sides of the plasma excitation field, wherein the feed The reaction gas is passed through the opening to generate discharge through the excitation field, and then is deposited on the surface of the workpiece to be coated on the opposite side of the excitation field to form a thin film. It can be seen that the monomer needs to completely pass through the excitation field before it can be deposited on the surface of the workpiece to be coated. During the passage, the excitation field easily decomposes a large amount of monomers for a long time or excessively, destroying the monomer. The structural integrity of the body reduces the quality of the film.

Summary of the invention

An advantage of the present invention is to provide a coating equipment and application, wherein the reaction gas can diffuse uniformly from a position close to the middle of a reaction chamber of the coating equipment to the surroundings, thereby increasing the uniformity of the reaction gas concentration in the reaction chamber and improving The uniformity of the film layer formed on the surface of at least one workpiece to be coated.

Another advantage of the present invention is to provide a coating equipment and application, in which a movable support is moved in the reaction chamber to stir the reaction gas dispersed in the reaction chamber to increase the amount of gas on the substrate. The uniformity of the polymer film layer formed on the surface.

Another advantage of the present invention is to provide a coating equipment and its application, which can avoid problems such as poor film performance due to excessive decomposition of the reactive gas monomer during the coating process, thereby improving the quality of the coating.

Another advantage of the present invention is to provide a coating equipment and a coating method, wherein in some embodiments, the workpiece to be coated is adapted to be placed for introducing the reaction gas into the reaction chamber Between the feed port and an electrode device for exciting the reaction gas, thereby reducing excessive decomposition of the film forming material.

Another advantage of the present invention is to provide a coating equipment and coating method, in which the monomer molecular structure in the prepared coating or film is relatively complete, and the branching and crosslinking ratio in the molecular structure can be preset and adjusted. To prepare coatings or films with good performance.

Another advantage of the present invention is to provide a coating equipment and application, wherein the coating equipment has a simple structure, convenient use, and low cost.

According to one aspect of the present invention, the present invention provides a coating equipment for coating the surface of a workpiece to be coated, including:

An electrode device; and

A reaction chamber, wherein the reaction chamber has a reaction chamber and at least one feed port connected to the reaction chamber, wherein the feed port is located near the middle of the reaction chamber so as to A reaction gas is introduced into the reaction chamber, and the electrode device discharges in the reaction chamber for coating the surface of the workpiece to be coated.

In some embodiments of the present invention, the reaction chamber further has at least one suction port located adjacent to the inner surface of the reaction chamber.

In some embodiments of the present invention, it further includes at least one intake column, wherein the intake column is accommodated in the reaction chamber, wherein the intake column has an intake chamber and a plurality of outlets located on the side of the intake column. The air hole, wherein the feed port communicates with the air inlet cavity.

In some embodiments of the present invention, the electrode device includes at least one electrode, wherein the electrode is located outside the intake column.

In some embodiments of the present invention, the electrode has a plurality of through holes, wherein the through holes correspond to the air outlet holes.

In some embodiments of the present invention, at least part of the intake column is made of conductive material, and the electrode discharges toward the intake column.

In some embodiments of the present invention, the electrode device further includes at least one conductive plate, wherein the conductive plate is installed on the intake column, and the electrode discharges toward the conductive plate.

In some embodiments of the present invention, the conductive plate has a plurality of air holes corresponding to the air outlet holes.

In some embodiments of the present invention, the electrode is a moving electrode, which is movably disposed in the reaction chamber relative to the reaction chamber.

In some embodiments of the present invention, a movable support is further included, the movable support is movably arranged in the reaction chamber relative to the reaction chamber, and the workpiece to be coated is suitable to be held in the reaction chamber. The movable support moves along with the movable support, and the electrode is installed on the movable support.

In some embodiments of the present invention, the two feed ports are symmetrically located on the upper and lower sides of the reaction chamber, wherein the upper and lower ends of the gas inlet cavity of the gas inlet column are respectively connected to the two Inlet.

In some embodiments of the present invention, the diameter of the air outlet hole away from the feed port gradually increases.

In some embodiments of the present invention, the number of the air outlet holes away from the feed port gradually increases.

In some embodiments of the present invention, the suction port is located on one side of the reaction chamber.

In some embodiments of the present invention, it further includes at least one support, wherein the support is rotatably accommodated in the reaction chamber for supporting the workpiece to be coated to rotate in the reaction chamber.

In some embodiments of the present invention, wherein the bracket rotates around the intake column.

In some embodiments of the present invention, a plurality of the suction ports are respectively located around the reaction chamber.

In some embodiments of the present invention, the coating equipment further includes at least one support, wherein the support is fixedly or rotatably accommodated in the reaction chamber for supporting the workpiece to be coated.

In some embodiments of the present invention, the coating equipment further includes a feeding device, wherein the feeding device is connected to the feeding port for filling the reaction chamber with a reaction gas.

In some embodiments of the present invention, the coating equipment further includes an air extraction device, wherein the air extraction device is connected to the air extraction port for maintaining the reaction chamber in a preset negative pressure environment.

In some embodiments of the present invention, the electrode device is arranged at a position close to the side wall in the reaction chamber, and forms a plasma environment, so that the workpiece to be coated is suitable for being placed on the inlet column and the chamber. Between the electrode device.

In some embodiments of the present invention, the coating equipment further includes a support, wherein the support is installed between the electrode device and the intake column, wherein the support is a movable support, and the support It is used to support the workpiece to be coated to reciprocate in and out of the plasma environment.

According to another aspect of the present invention, the present invention provides a coating method including:

Fill a reaction chamber of a reaction chamber of a coating equipment with reaction gas along at least one feed port, wherein the feed port is located at a position close to the middle of the reaction chamber;

Extract the gas in the reaction chamber from at least one air extraction port located on the side of the reaction chamber, so as to maintain the reaction chamber in a preset negative pressure environment; and

Discharge in the reaction chamber.

Description of the drawings

Fig. 1 is a schematic diagram of a coating equipment according to a preferred embodiment of the present invention.

2A is a schematic partial cross-sectional view of an embodiment of the coating equipment according to the above-mentioned preferred embodiment of the present invention.

2B is a schematic diagram of an alternative structure of the air inlet column of the coating equipment according to the above-mentioned preferred embodiment of the present invention.

3A is a schematic partial cross-sectional view of an embodiment of the coating equipment according to the above-mentioned preferred embodiment of the present invention.

3B is a schematic diagram of an alternative structure of the air inlet column of the coating equipment according to the above-mentioned preferred embodiment of the present invention.

4 is a schematic plan view of an embodiment of the coating equipment according to the above preferred embodiment of the present invention.

5 is a schematic plan view of an embodiment of the coating equipment according to the above preferred embodiment of the present invention.

FIG. 6 is a schematic diagram of the discharge of the electrode device of an embodiment of the coating equipment according to the above preferred embodiment of the present invention.

FIG. 7 is a schematic diagram of the discharge of the electrode device of an embodiment of the coating equipment according to the above preferred embodiment of the present invention.

Fig. 8 is a three-dimensional schematic diagram of the coating equipment according to the above-mentioned preferred embodiment of the present invention.

FIG. 9 is a schematic diagram of a modified structure of the coating equipment according to the above-mentioned preferred embodiment of the present invention.

FIG. 10 is a schematic partial cross-sectional view of a modified structure of the coating equipment according to the above-mentioned preferred embodiment of the present invention.

FIG. 11 is a schematic diagram of a modified structure of the coating equipment according to the above-mentioned preferred embodiment of the present invention.

FIG. 12 is a schematic diagram of a modified structure of the coating equipment according to the above-mentioned preferred embodiment of the present invention.

FIG. 13 is a schematic diagram of the support of the coating equipment driving the workpiece to be coated to make a rotational movement according to a modified embodiment of the above-mentioned preferred embodiment of the present invention.

detailed description

The following description is used to disclose the present invention so that those skilled in the art can implement the present invention. The preferred embodiments in the following description are only examples, and those skilled in the art can think of other obvious variations. The basic principles of the present invention defined in the following description can be applied to other embodiments, modifications, improvements, equivalents, and other technical solutions that do not depart from the spirit and scope of the present invention.

Those skilled in the art should understand that, in the disclosure of the present invention, the terms "longitudinal", "lateral", "upper", "lower", "front", "rear", "left", "right", " The orientation or positional relationship indicated by "vertical", "horizontal", "top", "bottom", "inner", "outer", etc. are based on the orientation or positional relationship shown in the drawings, which is only for the convenience of describing the present invention And to simplify the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, so the above terms should not be understood as limiting the present invention.

It can be understood that the term "a" should be understood as "at least one" or "one or more", that is, in one embodiment, the number of an element may be one, and in another embodiment, the number of the element The number can be more than one, and the term "one" cannot be understood as a restriction on the number.

Referring to FIGS. 1 to 12, a coating equipment according to a preferred embodiment of the present invention is illustrated separately. Referring to Figure 1, it is a schematic diagram of an application of the coating equipment.

The coating equipment can be used to coat the surface of the workpiece to be coated, and prepare at least one layer of coating on the surface of the workpiece to be coated to protect the surface of the workpiece to be coated, or to impart physical or chemical properties to the surface of the workpiece to be coated Wait.

As shown in Figures 1 and 4, the coating equipment includes a reaction chamber 10 and an electrode device 20, wherein the workpiece to be coated is accommodated in the reaction chamber 10, wherein the reaction chamber 10 can be communicated with Into the reactive gas, the reactive gas includes, but is not limited to, reactive raw materials or plasma source gas used for coating. The electrode device 20 is used for discharging in the reaction chamber 10, and a plasma environment can be formed in the reaction chamber 10 for coating the surface of the workpiece to be coated.

As shown in FIG. 1, the reaction chamber body 10 has a reaction chamber 11, at least one feed port 12 communicating with the reaction chamber 11, and at least one suction port 13, wherein the feed port 12 is located in the reaction chamber. The body 10 is close to the middle position 101, wherein the suction port 13 is located at the side position 102 of the reaction chamber 10, that is, the suction port 13 is located adjacent to the inner surface of the reaction chamber 10. The feed port 12 is used to pass reaction gas into the reaction chamber 11, and the gas extraction port 13 is used to draw out the gas in the reaction chamber 11.

That is to say, during the coating process, the reaction gas is introduced into the reaction chamber 11 along the feed port 12, and is discharged from the reaction chamber 11 through the gas extraction port 13. The gas flow direction in the reaction chamber 11 It is from the feed port 12 to the gas extraction port 13, that is, the gas flow direction is from the middle position 101 to the side position 102 of the reaction chamber 11.

In this embodiment, the position near the middle 101 of the reaction cavity 10 is defined as a position of the reaction cavity 10 within a preset radius range with the center of one side as the center of the circle. Preferably, the reaction cavity 10 is a cube, a cuboid, an ellipsoidal sphere or a sphere structure, etc., and the position near the middle 101 of the reaction cavity 10 is a preset with the center of the upper or lower side of the reaction cavity 10 being the center of the circle. Set the position of the radius range. In other words, the feed inlet 11 is located near the center of the upper or lower side of the reaction chamber 10, preferably at the upper center or lower center of the reaction chamber 10. The side position 102 of the reaction chamber 10 is defined as any position on the side of the reaction chamber 10, that is, the suction port 13 is located at any position on the side of the reaction chamber 10, This is not restricted.

The workpiece to be coated is contained in the reaction chamber 11, and the feed port 12 of the coating device is located at a position near the middle 101 of the reaction chamber 10, instead of the side position 102 of the reaction chamber 10, The reaction gas concentration near the middle position 101 of the reaction chamber 10 is increased to prevent the situation that the coating on the surface of the workpiece to be coated near the middle position of the reaction chamber 10 is thin or unqualified.

As shown in FIGS. 2A and 2B, further, the coating equipment includes at least one air inlet column 30, wherein the air inlet column 30 is accommodated in the reaction chamber 11, and the air inlet column 30 has an air inlet The cavity 31 and a plurality of air outlet holes 32 on the side thereof, wherein the feed port 12 communicates with the air inlet cavity 31. The air inlet column 30 is preferably a hollow cylindrical structure to form the air inlet cavity 31, and the air outlet hole 32 communicates with the air inlet cavity 31 and the reaction cavity 11. The reaction gas is introduced into the gas inlet chamber 31 from the feed port 12, and then diffuses into the reaction chamber 11 along each of the gas outlet holes 32, which facilitates the relatively uniform diffusion of the reaction gas to the reaction chamber 11 In order to improve the uniformity of the coating. Preferably, the air intake column 30 is a hollow or hollow cylindrical structure or a square column structure or the like.

In this embodiment, the air inlet column 30 is vertically arranged at a position close to the middle of the reaction chamber 11, such as a position close to the central axis, and the end of the air inlet column 30 is just connected to the inlet 12 Through, sealed connection is optional. It is understandable that, in an optional embodiment, there is one feed port 12, and one end of the gas inlet column 30 corresponding to the feed port 12 is in communication with the feed port 12. In another optional embodiment, there are two inlets 12, which are respectively located symmetrically at the upper and lower sides of the reaction chamber 10 near the middle position 101, and the upper and lower ends of the inlet column 30 are respectively It is connected with the corresponding feed port 12 to realize simultaneous air intake on both sides, thereby improving air intake efficiency.

Optionally, as shown in FIGS. 2A, 2B, 3A, and 3B, the hole diameter or the number of the air outlet holes 32 far from the feed port 12 gradually increases. In other words, the diameter or number of the outlet holes 32 along the axial direction of the inlet column 30 from the inlet 12 gradually increases. After the reaction gas enters the gas inlet cavity 31 from the feed port 12 and diffuses along the axial direction of the gas inlet cavity 31, the diameter or number of the outlet holes 32 gradually increases to increase The unit air output of the air outlet 32 at a position far away from the inlet 12 is beneficial to promote the unit air output of the air outlet 32 at all positions on the side of the air inlet column 30 to be relatively uniform, that is, it is beneficial to promote The amount of reaction gas diffused to the reaction chamber 11 by the gas inlet holes 32 at various positions in the axial direction of the gas inlet column 30 is relatively uniform, thereby improving the coating uniformity. Those skilled in the art can know that the diameter, shape, number, and arrangement of the air outlet holes 32 of the air inlet column 30 can be set according to actual coating requirements, and this is only an example.

As shown in FIGS. 9 and 10, there are two inlets 12, and they are connected to the two ends of the inlet column 30 respectively. The number of the outlet holes 32 far from the inlet 12 gradually increases. . In other words, the number of the air outlet holes 32 in the middle part of the intake column 30 is more than the number of the air outlet holes 32 at both ends.

As shown in FIGS. 4 to 7, the electrode device 20 includes at least one electrode 21, wherein the electrode 21 is located outside the gas inlet column 30, and the electrode 21 is used for discharging in the reaction chamber 11 . In other words, the electrode 21 can discharge. For example, the electrode 21 is a cathode, and the reaction chamber 10 may be made of a metal material to serve as an anode. For example, the reaction chamber 10 is grounded to discharge electricity in the reaction chamber 11.

In this embodiment, at least part of the intake column 30 is made of conductive material, wherein the intake column 30 serves as an anode, and the electrode 21 discharges toward the intake column 30. Preferably, the intake column 30 is grounded, and there is a preset discharge distance between the electrode 21 and the intake column 30.

In an optional embodiment, the electrode device 20 further includes at least one conductive plate 22 made of conductive material, wherein the conductive plate 22 is installed on the intake column 20, and the electrode 21 faces the The conductive plate 22 discharges, and there is a preset discharge distance between the electrode 21 and the conductive plate 22. The electrode 21 may be supported by a bracket, or the electrode 21 may also be installed on the intake column 20.

It is worth mentioning that the conductive plate 22 has a conductive surface, and the electrode 21 corresponds to the conductive surface and discharges. It is understandable that there may be no need to provide the conductive plate 22, and the intake column 30 made of at least part of a conductive material provides the conductive surface for the electrode 21 to discharge.

Preferably, as shown in FIG. 6, the electrode 21 has a plurality of through holes 211, wherein the through holes 211 correspond to the outlet holes 32 of the inlet column 30 to improve the uniformity of the reaction gas diffusion. To improve the uniformity of the coating. In other words, part of the reaction gas may pass through the electrode 21 along the through hole 211. It can be understood that the number, diameter, shape, and arrangement of the through holes 211 can be preset according to actual coating requirements.

Further, as shown in FIG. 7, the conductive plate 22 has a plurality of air holes 221 corresponding to the air outlet holes 32, wherein the air holes 221 allow the reaction gas to pass through, and prevent the conductive plate 22 from shielding the outlet holes. The pores 32 improve the uniformity of the reaction gas diffusion. Of course, the number, diameter, shape, and arrangement of the air holes 221 can be preset according to actual coating requirements.

In this embodiment, the number of electrodes 21 is set to four, which are respectively arranged symmetrically around the intake column 30, and the conductive plates 22 are also set to four correspondingly, which correspond to the corresponding electrodes. 21 corresponds.

In an optional embodiment, the electrode 21 is a moving electrode, which is movably arranged in the reaction chamber 10 relative to the reaction chamber 10 so as to be installed in the reaction chamber 11 of the coating device. Provide a relatively uniform discharge environment.

Further, as shown in FIG. 4, the coating equipment includes a movable support 40, wherein the movable support 40 is movably arranged in the reaction chamber 10 relative to the reaction chamber 10, wherein The coated workpiece is adapted to be held on the movable support 40 to move with the movable support 40, and the electrode 21 is installed on the movable support 40. For example, the electrode 21 can rotate together with the movable support 40, and a stage for supporting the workpiece to be coated rotates around its central axis when the movable support 40 rotates, so that the coating The relative movement between the electrode 21 of the equipment and the workpiece to be coated is caused by the rotation of the carrier, so that the electrode 21 provides a relatively uniform discharge environment for the workpiece to be coated.

The workpiece to be coated in the coating equipment can move relative to the electrode 21 so that the workpiece to be coated can be located inside the opposite electrode 21 or far away from the inner area of the opposite electrode 21 during the coating process, avoiding plasma only relying on Diffusion and deposition on the surface of the workpiece to be coated leads to a slower deposition rate.

The electrode 21 can move. This kind of moving electrode not only makes the coating uniform, but also because some of the coating material gas can pass through the discharge area to be fully ionized, and some of the discharge area that does not pass through the electrode is incompletely ionized, so Raw materials with different ionization forms can be adjusted to obtain a richer coating structure and a more stable coating quality through the adjustment of coating parameters.

The relative position between the electrode 21 and the movable support 40 is fixed, and the movable support 40 of the coating equipment can not interfere with the discharge of the electrode 21.

In this embodiment, as shown in FIG. 8, the suction port 13 is located on one side of the reaction chamber 11. Preferably, there is one suction port 13, and the suction port 13 is located at any position on one side of the reaction chamber 11. Further, the coating equipment includes at least one support 50, wherein the support 50 is rotatably accommodated in the reaction chamber 11 for supporting the workpiece to be coated to rotate in the reaction chamber 11. For example, the support 50 is a support that can rotate around an axis in the reaction chamber 11, and the axis is preferably the central axis of the reaction chamber 10, thereby driving the workpiece to be coated in the reaction chamber 11 Rotation is conducive to the uniformity of the coating on the workpiece to be coated. That is to say, during the coating process, the gas flow direction in the coating chamber 11 is from the feed port 12 to the exhaust port 13, and the support 50 drives each workpiece to be coated in the reaction chamber 11 Internal rotation makes each workpiece to be coated pass through the flowing reaction gas in turn to increase the uniformity of the coating. It is understandable that the movable bracket 40 and the bracket 50 may be the same, that is, the electrode 21 may be provided on the bracket 50. The movable bracket 40 and the bracket 50 can also be installed in cooperation with each other, or separated from each other, which is not limited here.

Furthermore, the support 50 rotates around the inlet column 30 to drive the workpiece to be coated to rotate in the reaction chamber 11 around the inlet column 30. In other words, the intake column 30 is located at the position of the axis.

It is worth mentioning that the support 50 supports the workpiece to be coated around the intake column 30, and there is no need to reserve a space between the support 50 and the intake column 30, so that the reaction gas can be It diffuses directly from the intake column 30 to the space where the bracket 50 is located. Therefore, compared with the traditional coating equipment, the coating equipment of the present invention does not need to pass through the avoiding space during the coating process. The air intake column 30 directly diffuses to the workpiece to be coated to ensure the quality of the coating.

In an optional embodiment, a plurality of the gas extraction ports 13 are respectively located on different sides of the reaction chamber 11, so that a plurality of gas flow directions in different directions can be formed in the reaction chamber 11 to increase the workpieces to be coated The coating uniformity. For example, as shown in FIG. 12, there are four air extraction ports 13, which are respectively located around the reaction chamber 11, so that they are formed in the reaction chamber 11 from the middle of the reaction chamber 11 toward the reaction chamber 11. The four gas flow directions on the four sides of the four sides to increase the uniformity of the gas in the reaction chamber 11. It is understandable that by adding a larger number of air extraction ports and arranging the positions of the air extraction ports, the flow direction and quantity of the reaction gas can be adjusted to meet the coating requirements.

Further, the support 50 is fixedly or rotatably accommodated in the reaction chamber 11. That is, in the above-mentioned optional embodiment, the support 50 may be fixedly arranged in the reaction chamber 11, and the workpiece to be coated supported by the support 50 is also relatively contained in the reaction chamber 11. As the flow direction of the reaction gas in the reaction chamber 11 increases, the uniformity of the reaction gas in the reaction chamber 11 is increased, so that the reaction gas in the reaction chamber 11 flows relatively uniformly through the workpieces to be coated , Thereby increasing the uniformity of the coating. It can be understood that, in order to further improve the coating uniformity, the support 50 is rotatably accommodated in the reaction chamber 11.

It is worth mentioning that, as shown in FIG. 11, the feed inlet 12 may be provided with more than one, and the intake column 30 may be provided with more than one correspondingly. A plurality of the air inlet columns 30 are arranged side by side in the reaction chamber 11 and are respectively communicated with the corresponding feeding ports 12. For example, there are five intake columns 30, one of the intake columns 30 is set in the middle of the reaction chamber 11, and the other four intake columns 30 are symmetrically arranged in the middle of the intake column. The periphery of the air column 30 and between the middle and the side wall of the reaction chamber 11, preferably at a quarter of the position of the reaction chamber, that is, the four air inlet columns 30 on the periphery are symmetrically arranged in the middle Around the intake column 30.

Furthermore, the bracket 50 is provided in multiple, and each bracket 50 is arranged on the outer side of the corresponding air inlet column 30. For example, there are five intake columns 30, four brackets 50, and four brackets 50 are respectively arranged on the outer side of the four intake columns 30 on the periphery, between the four brackets 50 Do not interfere with each other, and reserve a certain amount of avoidance space between each other. Furthermore, each of the brackets 50 respectively rotates around the corresponding intake column 30 to improve the uniformity of the coating. It is understandable that the bracket 50 has a hollow structure or a hollow structure to ensure the gas flow in the reaction chamber 11 and reduce the obstruction to the gas flow. Alternatively, the number of the brackets 50 and the intake columns 30 are the same, and the brackets 50 are respectively arranged on the outer side of the corresponding intake column 30 and rotate around it, and there is a certain amount between the brackets 50 Avoid space to prevent it from affecting its rotation.

In a modified embodiment of the preferred embodiment, the workpiece to be coated is adapted to be placed in the feed port 12 for introducing the reaction gas into the reaction chamber 11 and Between the electrode devices 20 that excite the reaction gas, the excessive decomposition of the film forming material is thus reduced. As shown in FIG. 13, the gas inlet column 30 is located near the middle position 101 of the reaction chamber 11 and communicates with the feed port 12, that is, the feed port 12 is also connected to the reaction chamber 11. Near the middle position 101. The electrode device 20 is disposed at a position near the side wall of the reaction chamber 11. For example, the electrode device 20 is supported at a position near the side wall of the reaction chamber 11 through an electrode holder, or the electrode device 20 can be installed on the side wall of the reaction chamber 11 and does not need to be installed on an electrode holder. During film coating, the workpiece to be coated is placed in the area between the electrode device 20 and the gas inlet column 30 in the reaction chamber 11.

The electrode device 20 generates plasma by discharging the released plasma source gas, and forms a plasma environment 201 around it. Specifically, the electrode 21 of the electrode device 20 is installed at a position close to the side wall of the reaction chamber 11, and the plasma environment 201 is formed at a position close to the side wall of the reaction chamber 11. The position close to the side wall may be a partial area of the surrounding area close to the side wall in the reaction chamber 11, or the position close to the side wall may be a surrounding area close to the side wall in the reaction chamber 11.

Specifically, during film coating, the reaction gas is charged into the gas inlet cavity 31 of the gas inlet column 30 along the feed port 12, and diffuses into the gas inlet cavity 32 of the gas inlet column 30. In the reaction chamber 11, and first reaches the area in the reaction chamber 11 where the workpiece to be coated is placed, only a part of the reaction gas is excited by the electrode device 20, causing the reaction gas to decompose, polymerize and deposit On the surface of the workpiece to be coated to form a coating. The reaction gas may be a single molecule of monomer, oligomer, or a combination thereof, etc., for example, the oligomer may be a dipolymer or the like. In the description of the following embodiments, the reaction gas is described by taking gas monomer or monomer vapor as an example.

In the present invention, since the workpiece to be coated is suitable to be placed in the flow path of the plasma environment 201 formed by the reaction gas flowing from the inlet column 30 to the electrode device 20, and the workpiece to be coated is The distance between the gas inlet posts 30 is smaller than the distance between the workpiece to be coated and the electrode device 20, and not all the reaction gas is excited by the electrode device 20, so as to avoid the reaction gas during the coating process. Excessive decomposition of monomers leads to problems such as poor film performance, thereby improving the quality of the coating.

Further, the support 50 is arranged between the intake column 30 and the electrode device 20, the workpiece to be coated is suitable to be supported on the support 50, and the support 50 is a movable support. The support 50 can support the workpiece to be coated to reciprocate between the plasma environment 201 formed by the discharge of the electrode device 20 and the intake column 30. Specifically, the support 50 is a movable support, and the support 50 reciprocates between the plasma environment 201 and the intake column 30. During coating, the support 50 reciprocally moves the workpiece to be coated The air outlet 32 of the plasma environment 201 or the air inlet column 30 can be alternately approached.

Optionally, the movement mode of the support 50 may be rotation, turning or translation, or the like, or in other words, the support 50 is configured as a rotatable structure, a reversible structure, or a translational structure to move the workpiece to be coated. Rotation, flip or translation movement is not restricted here. As shown in FIG. 13, the support 50 is a rotatable structure, wherein the support 50 can drive the workpiece to be coated to rotate in the reaction chamber 11 around the intake column 30, and the electrode device 20 is in the reaction chamber 11 The plasma environment 201 is formed in one side area of the cavity 11 close to the sidewall position, and the support 50 drives the workpiece to be coated to rotatably enter and exit the plasma environment 201 alternately. During the coating process, the support 50 reciprocally enters and exits the plasma environment 201 formed by the electrode device 20. When the support 50 is close to the air outlet 32 of the inlet column 30, the gas monomer or monomer vapor adheres to the surface of the workpiece to be coated to form a thin layer, that is, the gas monomer or monomer vapor is Adsorbed on the surface of the workpiece to be coated. When the support 50 is close to the plasma environment 201, the gas monomer or monomer vapor attached to the surface of the workpiece to be coated is activated by the plasma. When the support 50 approaches the air outlet 32 of the inlet column 30 again, the gas monomer or monomer vapor is grafted or polymerized with the activated molecules on the surface of the workpiece to be coated, and the film grows thicker. This is repeated continuously until a film or coating with a predetermined thickness is prepared on the surface of the workpiece to be coated.

In this embodiment of the present invention, the difference from the prior art is that the prior art uses plasma to act on the gas monomer or monomer vapor in the space, wherein the gas monomer or monomer vapor molecules are completely exposed to the plasma. In the body, it decomposes in space and generates various polymerization products, which are then deposited on the surface of the workpiece to be coated to prepare a film or coating, resulting in low molecular integrity in the film or coating, and poor performance of the film or coating; In the modified embodiment, the plasma generated by the electrode device 20 only acts on the gas monomer or monomer vapor molecules adsorbed on the surface of the workpiece to be coated, and then connects with the gas monomer or monomer vapor molecules that have not been plasma-affected. Branches or polymerized growth to prepare films or coatings, and the molecular integrity is high, so the performance of the film or coating is better.

On the other hand, part of the gas monomer or monomer vapor diffuses into the plasma environment 201, decomposes and polymerizes in the plasma environment 201, and deposits on the surface of the workpiece to be coated when it moves, forming a part of the coating. This part of the polymerization product has a higher degree of branching and cross-linking structure. A certain degree of branching and cross-linking in the coating is beneficial to improve the polymerization efficiency and the stability of the coating. The present invention can conveniently control the branching and cross-linking ratio in the coating by adjusting the moving speed and residence time of the workpiece to be coated between the air outlet 32 of the air inlet column 30 and the plasma environment 201, Obtain the best coating characteristics.

It is worth mentioning that the movement path, movement speed, rhythm, residence time, cycle time, and movement time of the stent 50 can be preset to control the branching and cross-linking of molecules in the prepared coating. Proportion to ensure performance, suitable for preparing the required film or coating, etc.

In this embodiment, the coating equipment further includes a feeding device 60, wherein the feeding device 60 is connected to the feeding port for filling the reaction chamber 11 with reaction gas. For example, the reaction gas directly comes from a gas source or is generated by the vaporization of a liquid raw material. The feeding device 60 is directly connected to the coating cavity 10 and communicates with the coating cavity 11 through the feeding port 12.

The coating equipment further includes an air extraction device 70, wherein the air extraction device 70 is connected to the air extraction port 13, and the air extraction device 70 is used for air extraction to maintain the reaction chamber 11 at a preset negative pressure Environment, the air extraction device 70 is connected to the coating cavity 10 and communicates with the coating cavity 11 through the air extraction port 13.

On the other hand, this embodiment also provides a coating method, including:

S10. Fill the reaction chamber 11 of the reaction chamber 10 of the coating equipment with a reaction gas along the feed port 12, wherein the feed port 12 is located in the reaction chamber of the coating equipment 10 near the middle position of the reaction chamber 11;

S20. Extract the gas in the reaction chamber 11 from the gas extraction port 13 located on the side of the reaction chamber 11 to maintain the reaction chamber 11 in a preset negative pressure environment; and

S30. Discharge in the reaction chamber 11.

That is to say, during the coating process, the feed device 60 fills the reaction chamber 11 with reaction gas through the feed port 12, and the gas extraction device 70 continuously draws out the reaction gas through the gas extraction port 13 The gas in the reaction chamber 11 to ensure that the reaction chamber 11 is in a preset negative pressure environment, and the electrode device 20 discharges in the reaction chamber 11 to form a plasma environment in the reaction chamber 11 to Coating on the surface of the workpiece to be coated.

Further, the gas inlet column 30 is accommodated in the reaction chamber 11, the gas inlet column 30 communicates with the feed port 12, and the gas inlet column 30 has a plurality of gas outlet holes 32, so that the reaction gas The air outlet hole 32 of the air inlet column 30 diffuses into the reaction chamber 11 to improve the uniformity of the coating film.

In some embodiments, in the method, electric discharge is performed in the reaction chamber 11 through the electrode 21, wherein the electrode 11 is located outside the gas inlet column 30.

In some embodiments, in the method, wherein the electrode 21 has a plurality of through holes 211, wherein the through holes 211 correspond to the air outlet holes 32.

In some embodiments, in the method, at least part of the intake column 30 is made of a conductive material, wherein the electrode 21 discharges toward the intake column 30.

In some embodiments, in the method, the conductive plate 22 is installed on the intake column 30, wherein the electrode 21 discharges toward the conductive plate 22.

In some embodiments, in the method, the conductive plate 22 has a plurality of air holes 221 corresponding to the air outlet holes 32.

In some embodiments, in the method, the electrode 21 is a moving electrode, which is movably disposed in the reaction cavity 10 relative to the reaction cavity 10.

In some embodiments, in the method, the two feed ports 12 are symmetrically located on the upper and lower sides of the reaction chamber 11, and the upper and lower sides of the gas inlet chamber 31 of the gas inlet column 30 are located symmetrically. The two ends are respectively connected with the two feeding ports 12.

In some embodiments, in the method, the pore size or the number of the air outlet holes 32 away from the feed port 12 gradually increases.

In some embodiments, in the method, the suction port 13 is located on one side of the reaction chamber 11. Alternatively, a plurality of the suction ports 13 are respectively located around the reaction chamber 11.

In some embodiments, in the method, the support 50 is rotatably or fixedly accommodated in the reaction chamber 11.

In some embodiments, in the method, the plasma environment 201 is formed by discharging the electrode device 20 at a position close to the side wall of the reaction chamber 11, wherein the workpiece to be coated is suitable to be placed in the reaction chamber 11 Between the position near the middle and the position near the side wall in the cavity 11.

In some embodiments, in the method, the workpiece to be coated is moved in and out of the plasma environment 201 reciprocally.

Those skilled in the art should understand that the above description and the embodiments of the present invention shown in the accompanying drawings are only examples and do not limit the present invention. The purpose of the present invention has been completely and effectively achieved. The functions and structural principles of the present invention have been shown and explained in the embodiments. Without departing from the principles, the implementation of the present invention may have any deformation or modification.

Claims

A coating equipment for coating the surface of the workpiece to be coated, characterized in that it includes:

An electrode device; and

A reaction chamber, wherein the reaction chamber has a reaction chamber and at least one feed port connected to the reaction chamber, wherein the feed port is located near the middle of the reaction chamber so as to A reaction gas is introduced into the reaction chamber, and the electrode device discharges in the reaction chamber for coating the surface of the workpiece to be coated.
4. The coating equipment according to claim 1, wherein the reaction chamber further has at least one suction port located adjacent to the inner surface of the reaction chamber.
The coating equipment according to claim 1, further comprising at least one air inlet column, wherein the air inlet column is accommodated in the reaction chamber, wherein the air inlet column has an air inlet cavity and a plurality of An air outlet, wherein the feed port communicates with the air inlet cavity.
3. The coating equipment according to claim 3, wherein the electrode device comprises at least one electrode, wherein the electrode is located outside the intake column.
4. The coating apparatus according to claim 4, wherein the electrode has a plurality of through holes, wherein the through holes correspond to the air outlet holes.
The coating equipment according to claim 4 or 5, wherein at least a part of the intake column is made of conductive material, and wherein the electrode discharges toward the intake column.
The coating equipment according to claim 4 or 5, wherein the electrode device further comprises at least one conductive plate, wherein the conductive plate is installed on the intake column, and the electrode discharges toward the conductive plate.
8. The coating equipment according to claim 7, wherein the conductive plate has a plurality of air holes corresponding to the air outlet holes.
The coating device according to claim 4 or 5, wherein the electrode is a moving electrode, which is movably arranged in the reaction chamber relative to the reaction chamber.
The coating equipment according to claim 9, further comprising a movable support, wherein the movable support is movably arranged in the reaction chamber relative to the reaction chamber, wherein the workpiece to be coated is suitable to be held As the movable support moves with the movable support, the electrode is installed on the movable support.
The coating equipment according to claim 3, wherein the two feed ports are symmetrically located on the upper and lower sides of the reaction chamber, and the upper and lower ends of the gas inlet cavity of the gas inlet column are respectively connected with two The feed port.
The coating equipment according to claim 3 or 10, wherein the diameter of the air outlet hole away from the feed port gradually increases.
The coating equipment according to claim 3 or 10, wherein the number of the air outlet holes away from the feed port gradually increases.
4. The coating equipment according to claim 2, wherein the suction port is located on one side of the reaction chamber.
The coating equipment according to claim 14, further comprising at least one support, wherein the support is rotatably accommodated in the reaction chamber for supporting the workpiece to be coated to rotate in the reaction chamber.
The coating equipment according to claim 15, further comprising at least one air inlet column, wherein the air inlet column is accommodated in the reaction chamber, wherein the air inlet column has an air inlet chamber and a plurality of The air outlet, wherein the feed port is connected to the air inlet cavity, and the bracket rotates around the air inlet column.
4. The coating equipment according to claim 2, wherein a plurality of the air extraction ports are respectively located around the reaction chamber.
The coating equipment according to claim 17, further comprising at least one support, wherein the support is fixedly or rotatably accommodated in the reaction chamber for supporting the workpiece to be coated.
The coating equipment according to claim 1, further comprising a feeding device, wherein the feeding device communicates with the feeding port for filling the reaction chamber with a reaction gas.
The coating equipment according to claim 2, further comprising an air extraction device, wherein the air extraction device communicates with the air extraction port for maintaining the reaction chamber in a preset negative pressure environment.
The coating equipment according to claim 3, wherein the electrode device is arranged in the reaction chamber close to the side wall, and forms a plasma environment, so that the workpiece to be coated is suitable for being placed on the inlet column and Between the electrode devices.
The coating equipment according to claim 21, further comprising a bracket, wherein the bracket is installed between the electrode device and the intake column, wherein the bracket is a movable bracket, and the bracket is used to support The workpiece to be coated reciprocates between the plasma environment and the intake column.
A coating method is characterized in that it includes:

Fill a reaction chamber of a reaction chamber of a coating equipment with reaction gas along at least one feed port, wherein the feed port is located at a position close to the middle of the reaction chamber;

Extract the gas in the reaction chamber from at least one air extraction port located on the side of the reaction chamber, so as to maintain the reaction chamber in a preset negative pressure environment; and

Discharge in the reaction chamber.
The coating method according to claim 23, wherein at least one gas inlet column is contained in the reaction chamber, wherein the gas inlet column has an gas inlet cavity and a plurality of gas outlet holes on the side of the gas inlet column, wherein the material inlet Communicate with the air inlet cavity.
22. The coating method of claim 24, wherein at least one electrode is used to discharge in the reaction chamber, wherein the electrode is located outside the gas inlet column.
The coating method according to claim 25, wherein the electrode has a plurality of through holes, wherein the through holes correspond to the air outlet holes.
The coating method according to claim 25 or 26, wherein at least a part of the intake column is made of conductive material, and the electrode discharges toward the intake column.
According to the coating method of claim 25 or 26, at least one conductive plate is installed on the intake column, wherein the electrode discharges toward the conductive plate.
The coating method according to claim 28, wherein the conductive plate has a plurality of air holes corresponding to the air outlet holes.
The coating method according to claim 25 or 26, wherein the electrode is a moving electrode, which is movably arranged in the reaction chamber relative to the reaction chamber.
The coating method according to claim 24, wherein the two feed inlets are symmetrically located on the upper and lower sides of the reaction chamber, and the upper and lower ends of the gas inlet cavity of the gas inlet column are respectively connected with two The feed port.
The coating method according to claim 24 or 31, wherein the pore diameter of the air outlet hole away from the feed port gradually increases.
The coating method according to claim 24 or 31, wherein the number of the air outlet holes away from the feed port gradually increases.
The film coating method according to claim 24, wherein the suction port is located on one side of the reaction chamber.
The coating method according to claim 34, wherein at least one support is rotatably accommodated in the reaction chamber.
The coating method according to claim 35, wherein the bracket rotates around the intake column.
The coating method according to claim 24, wherein a plurality of the air extraction ports are respectively located around the reaction chamber.
According to the coating method of claim 37, at least one support is fixedly or rotatably accommodated in the reaction chamber.
The coating method according to claim 23, wherein a plasma environment is formed by discharging an electrode device at a position close to the side wall of the reaction chamber, wherein the workpiece to be coated is suitable to be placed in the close middle position of the reaction chamber And the position close to the side wall.
According to the coating method of claim 39, the workpiece to be coated is moved back and forth in and out of the plasma environment.