CN209307484U - A kind of normal pressure multi-layer vapor reacting furnace - Google Patents

A kind of normal pressure multi-layer vapor reacting furnace Download PDF

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Publication number
CN209307484U
CN209307484U CN201822080106.3U CN201822080106U CN209307484U CN 209307484 U CN209307484 U CN 209307484U CN 201822080106 U CN201822080106 U CN 201822080106U CN 209307484 U CN209307484 U CN 209307484U
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air inlet
plating piece
inlet pipe
normal pressure
exhaust pipe
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杨少明
其他发明人请求不公开姓名
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Guangdong Shuan Hong New Material Science And Technology Ltd
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Guangdong Shuan Hong New Material Science And Technology Ltd
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Abstract

The utility model discloses a kind of normal pressure multi-layer vapor reacting furnaces, including going forward side by side the furnace body of promoting the circulation of qi phase reaction for placing plating piece, air inlet pipe and exhaust pipe are equipped in furnace body, air inlet pipe or so is laterally disposed and is equipped with along the vertical direction multiple, the conversion zone for placing plating piece is formed between neighbouring two air inlet pipe, and the position on upper lower inlet duct with respect to plating piece is respectively equipped with one group of air inlet towards plating piece, the front and rear sides of air inlet pipe are respectively equipped with exhaust pipe, exhaust pipe is longitudinally disposed, one group of exhaust outlet is respectively equipped on exhaust pipe at the position opposite with each conversion zone, the heating device for heating respectively to each conversion zone is additionally provided in furnace body, normal pressure multi-layer vapor reacting furnace further includes the field generator for magnetic for electromagnetic field to be electrically connected and loaded to plating piece with each plating piece.The utility model is layered temperature control using layering ventilation body, layering exhaust, carries out CVD reaction, high production efficiency simultaneously to multiple plating pieces, and structure is simple, low cost.

Description

A kind of normal pressure multi-layer vapor reacting furnace
[technical field]
The utility model relates to a kind of normal pressure multi-layer vapor reacting furnaces.
[background technique]
CVD refers to the gas phase reaction under high temperature, and gas phase reaction furnace is a kind of common plated film equipment, usually there is tubular type Or flat two kinds, the equipment of flat large area largely uses vacuum form, there is low efficiency, and cost is high to be lacked Point.
The utility model is namely based on what such case was made.
[utility model content]
The utility model aim is to overcome the deficiencies in the prior art, and it is more to provide the normal pressure that a kind of structure is simple, high-efficient Layer gas phase reaction furnace.
The utility model is achieved through the following technical solutions:
A kind of normal pressure multi-layer vapor reacting furnace, including for place plating piece 10 and for plating piece 10 including carry out gas phase reaction Furnace body 1, the furnace body 1 is interior to be equipped with air inlet pipe 2 and exhaust pipe 3, it is characterised in that: the laterally disposed and edge of the air inlet pipe 2 or so Up and down direction be equipped with it is multiple, the conversion zone 4 for placing plating piece 10 is formed between neighbouring two air inlet pipe 2, and Position on upper lower inlet duct 2 with respect to plating piece 10 is respectively equipped with one group of air inlet 21 towards plating piece 10, before the air inlet pipe 2 Two sides are respectively equipped with exhaust pipe 3 afterwards, and the exhaust pipe 3 is longitudinally disposed, the position opposite with each conversion zone 4 on the exhaust pipe 3 The place of setting is respectively equipped with one group of exhaust outlet 31, and the heating dress for heating respectively to each conversion zone 4 is additionally provided in the furnace body 1 It sets, the normal pressure multi-layer vapor reacting furnace further includes the magnetic for electromagnetic field to be electrically connected and loaded to plating piece 10 with each plating piece 10 Field generating device.
A kind of normal pressure multi-layer vapor reacting furnace as described above, it is characterised in that: along right and left in each air inlet pipe 2 To the air inlet 21 for respectively corresponding multiple plating pieces 10 equipped with multiple groups, the exhaust pipe 3 positioned at 2 front and rear sides of air inlet pipe is respectively provided with One row, the exhaust pipe 3 of every row have multiple.
A kind of normal pressure multi-layer vapor reacting furnace as described above, it is characterised in that: be equipped with 4 around each plating piece 10 Exhaust pipe 3, two of them exhaust pipe 3 are located at front row, other two exhaust pipe 3 is located at heel row.
A kind of normal pressure multi-layer vapor reacting furnace as described above, it is characterised in that: the heating device includes and outside temperature The heating rod 5 of control system electrical connection, the front and rear sides of each air inlet pipe 2 are equipped with heating rod 5, and the heating rod 5 is parallel 10 either above or below of plating piece is placed in air inlet pipe 2.
A kind of normal pressure multi-layer vapor reacting furnace as described above, it is characterised in that: the air inlet pipe 2 is equipped with along the longitudinal direction N row, the exhaust pipe 3 are equipped with m along the longitudinal direction and arrange, and wherein n, m are positive integer.
A kind of normal pressure multi-layer vapor reacting furnace as described above, it is characterised in that: one end with the air inlet pipe 2 of row is set The air supply header 6 for having while being connected with each air inlet pipe 2 and being connect with external air feed equipment, with the exhaust pipe 3 arranged One end is equipped with the exhaust main 7 for being connected with each exhaust pipe 3 and connecting with external exhaust gas equipment simultaneously.
A kind of normal pressure multi-layer vapor reacting furnace as described above, it is characterised in that: exhaust outlet 31 described in every group have it is multiple simultaneously Axis around exhaust pipe 3 is evenly distributed.
A kind of normal pressure multi-layer vapor reacting furnace as described above, it is characterised in that: the exhaust outlet 31 is located at neighbouring The middle position of two air inlet pipe 2.
A kind of normal pressure multi-layer vapor reacting furnace as described above, it is characterised in that: there are three simultaneously for air inlet 21 described in every group In the oblique plating piece 10 of the shape that scatters outwardly, three air inlets 21 are uniformly distributed in 120 degree between each other.
A kind of normal pressure multi-layer vapor reacting furnace as described above, it is characterised in that: the folder of the air inlet 21 and horizontal plane Angle is 45 degree.
Compared with prior art, the utility model has the following advantages:
1, the utility model is layered temperature control using layering ventilation body, layering exhaust, carries out CVD simultaneously to multiple plating pieces 10 Reaction, high production efficiency can carry out CVD reaction in non-pressurized form, and structure is simple, low cost, and equipment is easily fabricated and pushes away It is wide to use.
2, the utility model sidewards and is arranged above and below in furnace body 1 using multiple air inlet pipe 2 or so, and it is anti-to form multilayer Layer 4 is answered, plating piece 10, the external air feed equipment of the air inlet pipe 2, the upper air between each conversion zone 4 are packed into each conversion zone 4 Pipe 2 is located at 21 air inlet of air inlet of 10 upside of plating piece, and lower inlet duct 2 is located at 21 air inlet of air inlet of 10 downside of plating piece, realizes and divide Layer air inlet, keeps each 4 air inlet of conversion zone full and uniform, and about 10 two sides of plating piece gas supply is balanced;The heating device is given respectively Each heating of conversion zone 4 carries out layering temperature control, makes each 4 homogeneous heating of conversion zone, the reaction temperature consistency of each plating piece 10 It is good;And electromagnetic field is loaded to each plating piece 10 by field generator for magnetic, to promote catalyst growth, raising efficiency;Gas from The entrance conversion zone 4 of air inlet 21 is flowed through and is discharged from every layer of opposite entrance exhaust pipe 3 of exhaust outlet 31 after plating piece 10 reacts, drops Gas after low reaction flows to influence each other caused by other conversion zones on, guarantee the adequately contact of each plating piece 10 from air inlet 21 live gas entered, improve reaction speed and product quality.
[Detailed description of the invention]
Specific embodiment of the present utility model is described in further detail with reference to the accompanying drawing, in which:
Fig. 1 is the structural schematic diagram of the utility model;
Fig. 2 is the single air inlet pipe and the combining structure schematic diagram of relevant exhaust pipe of the utility model;
Fig. 3 is the main view of the air inlet pipe of the utility model, the composite structure of exhaust pipe and heating rod;
Fig. 4 is the vertical view of the air inlet pipe of the utility model, the composite structure of exhaust pipe, heating rod and field generator for magnetic Figure.
[specific embodiment]
The utility model is further described with reference to the accompanying drawing:
A kind of normal pressure multi-layer vapor reacting furnace as shown in Figures 1 to 4, including for placing plating piece 10 and existing for plating piece 10 The interior furnace body 1 for carrying out gas phase reaction, the preferred atmospheric box type structure of the furnace body 1, using 200-900 DEG C of temperature, in the furnace body 1 Equipped with air inlet pipe 2 and exhaust pipe 3, the air inlet pipe 2 or so it is laterally disposed and along the vertical direction be equipped with it is multiple, neighbouring two The conversion zone 4 for placing plating piece 10 is formed between the air inlet pipe 2, and with respect to the position of plating piece 10 on upper lower inlet duct 2 It is respectively equipped with one group of air inlet 21 towards plating piece 10, the front and rear sides of the air inlet pipe 2 are respectively equipped with exhaust pipe 3, the row Tracheae 3 is longitudinally disposed, is respectively equipped with one group of exhaust outlet 31 on the exhaust pipe 3 at the position opposite with each conversion zone 4, described The heating device for heating respectively to each conversion zone 4 is additionally provided in furnace body 1, the normal pressure multi-layer vapor reacting furnace further includes For the field generator for magnetic of electromagnetic field to be electrically connected and loaded to plating piece 10 with each plating piece 10.
Multiple air inlet pipe 2 or so sidewards and are arranged above and below in furnace body 1, reactive multilayer layer 4 are formed, in each reaction Plating piece 10 is packed into layer 4, furnace body 1 includes the supporting structure for placing plating piece 10, which is existing structure, can be card slot Or hook etc., the external air feed equipment of the air inlet pipe 2, such as natural gas heated filament dore furnace 11, natural gas is through natural gas heated filament point Enter multiple air inlet pipe 2 after solving furnace 11, the intake pipe 2 between each conversion zone 4 is located at the air inlet 21 of 10 upside of plating piece Air inlet, lower inlet duct 2 are located at 21 air inlet of air inlet of 10 downside of plating piece, realize stratified charge, keep each 4 air inlet of conversion zone abundant Uniformly, and about 10 two sides of plating piece gas supply is balanced;The heating device gives each heating of conversion zone 4 to carry out layering temperature control respectively, Make each 4 homogeneous heating of conversion zone, the reaction temperature consistency of each plating piece 10 is good;And each plating is given by field generator for magnetic Part 10 loads electromagnetic field, to promote catalyst growth, raising efficiency;Gas enters conversion zone 4 from air inlet 21, flows through plating piece 10 Enter in exhaust pipe 3 after reaction from every layer of opposite exhaust outlet 31 and be discharged, the gas after reducing reaction flows to other conversion zones and makes At influence each other on, guarantee that each plating piece 10 adequately contacts the live gas entered from air inlet 21, improve reaction speed And product quality.
Above-mentioned gas phase reaction furnace is layered temperature control, is carried out simultaneously to multiple plating pieces 10 using layering ventilation body, layering exhaust CVD reaction, high production efficiency can carry out CVD reaction in non-pressurized form, and structure is simple, low cost, and equipment is easily fabricated.
The gas phase reaction furnace can carry out large and small workpiece, the coating process of single, double surface material, will when single side material film plating Two workpiece do not need reclining on one side for plated film, and workpiece needs the one of plated film to face outwardly, and form a plating piece 10, are put into conversion zone 4 carry out CVD reaction.
Preferably, the gas is non-corrosive gas, and the air inlet pipe 2 is stainless steel tube, and the exhaust pipe 3 is quartz Glass tube.
Preferably, each conversion zone 4 transversely arranged can place multiple plating pieces 10, edge left and right in each air inlet pipe 2 Direction is equipped with the air inlet 21 that multiple groups respectively correspond multiple plating pieces 10, and the exhaust pipe 3 positioned at 2 front and rear sides of air inlet pipe is respectively set There is a row, the exhaust pipe 3 of every row has multiple, forms the reaction structure of single multiple row, improves the number of packages once produced, improves production Efficiency.
Preferably, 4 exhaust pipes 3 are equipped with around each plating piece 10, two of them exhaust pipe 3 is located at front row, in addition Two exhaust pipes 3 are located at heel row, make the intake and exhaust system relative equilibrium around each plating piece 10, further, described Exhaust outlet 31 is located at the middle position of neighbouring two air inlet pipe 2, makes the intake and exhaust system phase of about 10 two sides of plating piece Equilibrium, to guarantee the harmony of about 10 two sides plated film of plating piece.
To enter exhaust pipe 3 convenient for the gas of each different direction, exhaust outlet 31 described in every group has multiple and around exhaust pipe 3 Axis it is evenly distributed.
In order to make gas be capable of the plating piece 10 of equal cross being close to after the entrance of air inlet 21, air inlet 21 described in every group has three A and in scattering outwardly the oblique plating piece 10 of shape, three air inlets 21 are uniformly distributed in 120 degree between each other, not by three Air inlet 21 with orientation to 10 surface jet of plating piece, make entire 10 surface of plating piece it is more balanced touch gas, improve plating The consistency of 10 surface coating of part.
Preferably, the angle of the air inlet 21 and horizontal plane is 45 degree.
The heating device includes the heating rod 5 being electrically connected with external temperature control system, the front and back two of each air inlet pipe 2 Side is equipped with heating rod 5, and the heating rod 5 is parallel to air inlet pipe 2 and is placed in 10 either above or below of plating piece, then each conversion zone 4 heating rods 5 with upper layer and lower layer, front two rows carry out temperature control heating, and plating piece 10 can be named more balanced between upper layer and lower layer 10 reaction zone of covering plating piece, improve 10 reaction zone of plating piece temperature control consistency and the rate of heat addition.The heating rod 5 of every row can To be whole root knot structure and carry out temperature control respectively across in 10 either above or below of plating piece, being also possible to be segmented more root knot structures.
Such as Fig. 4, the field generator for magnetic includes the cable 9 for plating piece 10 to be electrically connected with electromagnetic field generator 8, is led to It crosses electromagnetic field generator 8 and loads electromagnetic field to plating piece 10.Or be electrically connected by cable 9 with external communication electricity, it is not indicated in figure, Plating piece 10, which is supplied electricity to, by external communication loads electromagnetic field.
One end with the air inlet pipe 2 of row is equipped with while being connected with each air inlet pipe 2 and connecting with external air feed equipment The air supply header 6 connect, with row the exhaust pipe 3 one end be equipped with simultaneously be connected with each exhaust pipe 3 and and external exhaust gas The exhaust main 7 of equipment connection, structure is simple.
Preferably, the air inlet pipe 2 is equipped with n along the longitudinal direction and arranges, and the exhaust pipe 3 is equipped with m along the longitudinal direction and arranges, wherein N, m are positive integer, to be formed, multilayer, front and back up and down be multiple rows of, reaction structure of left and right multiple row, can disposably carry out multiple platings The production of part 10 is reacted, and structure is simple, small in size, high production efficiency.Embodiment as shown in Figure 3 and Figure 4, the air inlet pipe 2 have two rows, and the exhaust pipe 3 has three rows, and the heating rod 5 has four rows, and has six layers, forms the gas phase of six layers of two rows three column Reacting furnace.
The utility model structure is simple, high production efficiency, low cost, easily fabricated and popularization and use.

Claims (10)

1. a kind of normal pressure multi-layer vapor reacting furnace, including for place plating piece (10) and for plating piece (10) inside progress gas phase reaction Furnace body (1), air inlet pipe (2) and exhaust pipe (3) are equipped in the furnace body (1), it is characterised in that: described air inlet pipe (2) controls It is laterally disposed and along the vertical direction be equipped with it is multiple, between neighbouring two air inlet pipe (2) formed for placing plating piece (10) conversion zone (4), and the position on upper lower inlet duct (2) with respect to plating piece (10) is respectively equipped with one group towards plating piece (10) Air inlet (21), the front and rear sides of the air inlet pipe (2) are respectively equipped with exhaust pipe (3), and the exhaust pipe (3) is longitudinally disposed, One group of exhaust outlet (31), the furnace body (1) are respectively equipped on the exhaust pipe (3) at the position opposite with each conversion zone (4) It is inside additionally provided with the heating device for heating respectively to each conversion zone (4), the normal pressure multi-layer vapor reacting furnace further includes using In the field generator for magnetic that electromagnetic field is electrically connected and loaded to plating piece (10) with each plating piece (10).
2. a kind of normal pressure multi-layer vapor reacting furnace according to claim 1, it is characterised in that: each air inlet pipe (2) On be equipped with multiple groups in left-right direction and respectively correspond the air inlets (21) of multiple plating pieces (10), be located at two before and after the air inlet pipe (2) The exhaust pipe (3) of side is respectively provided with a row, and the exhaust pipe (3) of every row has multiple.
3. a kind of normal pressure multi-layer vapor reacting furnace according to claim 2, it is characterised in that: around each plating piece (10) 4 exhaust pipes (3) are equipped with, two of them exhaust pipe (3) is located at front row, other two exhaust pipe (3) is located at heel row.
4. a kind of normal pressure multi-layer vapor reacting furnace according to claim 1, it is characterised in that: the heating device include with The heating rod (5) of external temperature control system electrical connection, the front and rear sides of each air inlet pipe (2) are equipped with heating rod (5), described Heating rod (5) is parallel to air inlet pipe (2) and is placed in plating piece (10) either above or below.
5. a kind of normal pressure multi-layer vapor reacting furnace according to claim 1, it is characterised in that: the air inlet pipe (2) is along preceding Rear direction is arranged equipped with n, and the exhaust pipe (3) is equipped with m along the longitudinal direction and arranges, and wherein n, m are positive integer.
6. a kind of normal pressure multi-layer vapor reacting furnace according to claim 1, it is characterised in that: with the air inlet pipe of row (2) one end is equipped with the air supply header (6) for being connected with each air inlet pipe (2) and connecting with external air feed equipment simultaneously, with row One end of the exhaust pipe (3) be equipped with the exhaust that is connected and connect with external exhaust gas equipment with each exhaust pipe (3) simultaneously General pipeline (7).
7. a kind of normal pressure multi-layer vapor reacting furnace according to claim 1, it is characterised in that: exhaust outlet described in every group (31) Have multiple and evenly distributed around the axis of exhaust pipe (3).
8. a kind of normal pressure multi-layer vapor reacting furnace according to claim 1, it is characterised in that: the exhaust outlet (31) is located at The middle position of neighbouring two air inlet pipe (2).
9. a kind of normal pressure multi-layer vapor reacting furnace according to claim 1, it is characterised in that: air inlet described in every group (21) There are three and in scatter outwardly the oblique plating piece of shape (10), three air inlets (21) are uniformly distributed in 120 degree between each other.
10. a kind of normal pressure multi-layer vapor reacting furnace according to claim 9, it is characterised in that: the air inlet (21) with The angle of horizontal plane is 45 degree.
CN201822080106.3U 2018-12-11 2018-12-11 A kind of normal pressure multi-layer vapor reacting furnace Active CN209307484U (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109554686A (en) * 2018-12-11 2019-04-02 广东双虹新材料科技有限公司 A kind of normal pressure multilayer CVD reactor
WO2021248303A1 (en) * 2020-06-09 2021-12-16 江苏菲沃泰纳米科技股份有限公司 Coating equipment and application

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109554686A (en) * 2018-12-11 2019-04-02 广东双虹新材料科技有限公司 A kind of normal pressure multilayer CVD reactor
CN109554686B (en) * 2018-12-11 2023-09-22 广东双虹新材料科技有限公司 Atmospheric pressure multilayer CVD reactor
WO2021248303A1 (en) * 2020-06-09 2021-12-16 江苏菲沃泰纳米科技股份有限公司 Coating equipment and application

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