CN212375378U

CN212375378U - Plasma enhanced chemical vapor deposition equipment

Info

Publication number: CN212375378U
Application number: CN202022079239.6U
Authority: CN
Inventors: 钱锋; 姚飞; 王小东; 廖运华; 梁锦东; 陈进福
Original assignee: Dongguan Plasma Electronic Equipment Co ltd
Current assignee: Dongguan Jiatuo Risheng Intelligent Technology Co.,Ltd.
Priority date: 2020-09-21
Filing date: 2020-09-21
Publication date: 2021-01-19
Anticipated expiration: 2030-09-21

Abstract

The utility model relates to a coating film technical field, concretely relates to plasma reinforcing chemical vapor deposition equipment, including evacuation mechanism, reaction mechanism and transfer mechanism, evacuation mechanism is linked together with reaction mechanism, transfer mechanism sends into pending product or takes out reaction mechanism, reaction mechanism includes reaction chamber, electrode subassembly and carrier assembly, electrode subassembly sets up on reaction chamber's top and removes in reaction chamber's inside, carrier assembly sets up in reaction chamber's bottom and removes in reaction chamber's inside, electrode subassembly includes at least one air outlet means, air outlet means down includes dispersion pipe and dispersion bulb from last in proper order, dispersion pipe and dispersion bulb all are equipped with a plurality of evenly distributed's the hole that diffuses. Therefore, the coating gas can be dispersed from the dispersion pipe and the dispersion ball head in all directions, the coating gas can be uniformly adhered to the inner wall of the vaccine bottle, the problems of coating defects and incompleteness of the inner wall of the vaccine bottle are avoided, and the production quality of the vaccine bottle is improved.

Description

Plasma enhanced chemical vapor deposition equipment

Technical Field

The utility model relates to the technical field of coating film, concretely relates to plasma enhanced chemical vapor deposition equipment.

Background

Plasma Enhanced Chemical Vapor Deposition (PECVD) is a process of ionizing a gas containing atoms constituting a thin film into a mixture of high-energy atoms, positive and negative ions, electrons, etc., by using energy such as microwave or radio frequency, etc., to form Plasma and deposit the thin film, thereby realizing high-rate film formation.

The inner wall of some bottle-shaped objects including vaccine bottles is usually coated. At present, the common mode is to put the vaccine bottle upside down, and the gas for coating the film rises from bottom to top at the mouth of the vaccine bottle and then adheres to the inner wall of the vaccine bottle to complete the film coating. However, in the conventional method, because the gas for coating the film rises from bottom to top, the plating film at the mouth of the vaccine bottle is likely to have uneven plating, even has problems of plating defects and incompleteness, and greatly affects the production quality of the vaccine bottle.

Therefore, there is a need in the industry for a solution to the above-mentioned problems.

SUMMERY OF THE UTILITY MODEL

The utility model aims to provide a plasma enhanced chemical vapor deposition equipment to the not enough of prior art. The purpose of the utility model can be realized by the technical scheme as follows.

A plasma enhanced chemical vapor deposition device, which comprises a vacuum pumping mechanism, a reaction mechanism and a transfer mechanism, the vacuumizing mechanism is communicated with the reaction mechanism, the transferring mechanism is used for feeding or taking out a product to be treated from the reaction mechanism, the reaction mechanism comprises a reaction chamber, an electrode assembly and a bearing assembly, wherein the electrode assembly is arranged at the top end of the reaction chamber and moves in the reaction chamber, the bearing assembly is arranged at the bottom end of the reaction chamber and moves in the reaction chamber, the electrode assembly comprises at least one air outlet device, the air outlet device sequentially comprises a hollow dispersion pipe and a dispersion ball head from top to bottom, the dispersion tube and the dispersion ball head are both provided with a plurality of uniformly distributed dispersion holes, the electrode assembly is made of conductive materials, and a bias power supply is additionally arranged on the electrode assembly.

Preferably, the dispersion pipe is sleeved with a sealing cover plate, the sealing cover plate covers and presses the product to be processed when the dispersion pipe works, the range of the vacuum degree inside the product to be processed is 1Pa-100Pa, and the range of the vacuum degree of the reaction chamber is 0.1Pa-10 Pa.

Preferably, the electrode assembly further includes a first lifting mechanism, an upper electrode plate and an air inlet channel, the first lifting mechanism is fixed at the top end of the reaction chamber, the upper electrode plate is fixed on a lifting shaft of the first lifting mechanism, the upper electrode plate is communicated with the air inlet channel, the air outlet device is fixed at the bottom end of the upper electrode plate and is communicated with the upper electrode plate, and the upper electrode plate is connected with the bias negative electrode.

Preferably, the upper electrode plate is provided with a plurality of dispersion layers, the width of each dispersion layer is sequentially enlarged from top to bottom, a dispersion plate is arranged between every two adjacent dispersion layers, a plurality of dispersion openings are formed in the dispersion plate, the dispersion openings of the dispersion plate are sequentially thinned from top to bottom, and a plurality of air outlet devices are arranged on the dispersion plate at the bottom end.

Preferably, the bearing assembly comprises a second lifting mechanism, a lower electrode plate and a positioning piece, the second lifting mechanism is fixed at the bottom end of the reaction chamber, the lower electrode plate is fixed on a lifting shaft of the second lifting mechanism, the positioning piece is arranged on the lower electrode plate, and the lower electrode plate is connected with the bias voltage anode.

Preferably, the transfer mechanism comprises a transfer chamber, a sheet feeding member, a transfer driving device and a guide rod, the transfer driving device is fixed on the wall of the transfer chamber, the guide rod is fixedly arranged in the transfer chamber, the sheet feeding member is in transmission connection with the transfer driving device, and the sheet feeding member is in sliding connection with the guide rod.

Preferably, a positioning monitoring device is fixedly arranged on the side wall of the transferring chamber.

Preferably, the vacuum pumping mechanism comprises a dry pump and a roots pump in sequence, and an angle valve and a butterfly valve are arranged between the roots pump and the reaction chamber.

Compared with the prior art, the beneficial effects of the utility model are that:

the utility model discloses a plasma reinforcing chemical vapor deposition equipment stretches into the vaccine bottle of just putting with air outlet means, makes coating film gas all-round dispersing in dispersion pipe and the dispersion bulb, ensures that coating film gas can the adhesion at vaccine bottle inner wall uniformly, avoids electroplating defect, incomplete problem to appear in vaccine bottle inner wall, is favorable to improving the production quality of vaccine bottle.

Drawings

For a clearer explanation of the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, it is obvious that the drawings in the following description are only some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to these drawings without creative efforts.

Fig. 1 is a schematic structural diagram of an apparatus according to an embodiment of the present invention.

Fig. 2 is a schematic diagram of an apparatus structure in an embodiment of the present invention, in which a partial structure is hidden.

Fig. 3 is a side sectional view of an apparatus according to an embodiment of the present invention.

Fig. 4 is a partially enlarged view of a portion a in fig. 3.

Fig. 5 is a side sectional view of the upper electrode plate in an embodiment of the present invention.

Fig. 6 is a schematic diagram of an apparatus according to an embodiment of the present invention.

Detailed Description

The technical solution of the present invention will be described clearly and completely with reference to the following specific embodiments, and it should be understood that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by a person skilled in the art without creative efforts belong to the protection scope of the present invention.

A plasma enhanced chemical vapor deposition device is shown in figures 1 to 6 and comprises a vacuumizing mechanism 1, a reaction mechanism 2 and a transfer mechanism 3, wherein the vacuumizing mechanism 1 is communicated with the reaction mechanism 2, the vacuumizing mechanism 1 vacuumizes the interior of the reaction mechanism 2 to provide reaction conditions meeting the requirement of coating inside a vaccine bottle, and the transfer mechanism 3 sends a product to be processed into or takes out of the reaction mechanism 2. According to different conditions, a transfer mechanism 3 can be arranged to send vaccine bottles to be coated into the reaction mechanism 2, the treated vaccine bottles are taken out by the transfer mechanism 3 after coating is finished, or two transfer mechanisms 3 can be arranged at two sides of the reaction mechanism 2 respectively, wherein one transfer mechanism 3 sends the vaccine bottles to be coated into the reaction mechanism 2, and the other transfer mechanism 3 takes out the coated vaccine bottles. As shown in fig. 3, the reaction mechanism 2 includes a reaction chamber 21, an electrode assembly 22 and a carrying assembly 23, the reaction chamber 21 is used for accommodating a vaccine bottle to be processed for coating the interior of the vaccine bottle, and the vacuumizing mechanism 1 vacuumizes the reaction chamber 21 to ensure that the vacuum degree of the reaction chamber 21 is within the working requirement range. The electrode assembly 22 is disposed at the top end of the reaction chamber 21 and moves inside the reaction chamber 21, and the position height of the gas outlet end of the plating gas can be adjusted, so that the plating gas can be uniformly dispersed in the vaccine bottle. The bearing assembly 23 is arranged at the bottom end of the reaction chamber 21 and moves in the reaction chamber 21, and the bearing assembly 23 can jack up the vaccine bottle after the coating treatment to a certain height, so that the vaccine bottle can be taken out by the transfer mechanism 3 conveniently. The electrode assembly 22 includes at least one air outlet device 221, and one air outlet device 221 corresponds to one vaccine bottle, as shown in fig. 6, a plurality of air outlet devices 221 can be arranged according to production requirements to perform film coating treatment on a plurality of vaccine bottles at the same time, which is beneficial to improving production efficiency. As shown in fig. 4, the air outlet device 221 sequentially includes a hollow dispersion tube 2211 and a dispersion ball 2212 from top to bottom, the dispersion tube 2211 and the dispersion ball 2212 are both provided with a plurality of dispersion holes 2213 uniformly distributed, and the coating gas is emitted to all directions through the dispersion tube 2211 and the dispersion holes 2213 on the dispersion ball 2212, wherein the dispersion tube 2211 mainly coats the mouth area of the vaccine bottle, the coating gas emitted therefrom can uniformly coat the mouth area of the vaccine bottle, and the dispersion ball 2212 is relatively divergent for coating the inner wall of the vaccine bottle. The electrode assembly 22 is made of conductive material, including the dispersion tube 2211 and the dispersion bulb 2212, so that the coating gas can be fully ionized.

In the embodiment of the plasma enhanced chemical vapor deposition equipment, the transfer mechanism 3 sends a vaccine bottle to be coated into the reaction chamber 21, the vacuumizing mechanism 1 vacuumizes the reaction chamber 21 to control the vacuum degree of the reaction chamber 21, the electrode assembly 22 moves downwards to enable the air outlet device 221 to enter the vaccine bottle, and then electroplating gas is introduced, wherein the electroplating gas is preferably silicon dioxide, the electrodes work in an RF power supply feeding mode, the introduced silicon dioxide ionizes the gas into a gas ion state under the action of the electrodes, and the gas is further emitted from the dispersion tube 2211 and the dispersion ball 2212 to be attached to the inner wall of the vaccine bottle, so that the coating gas can be emitted from the dispersion tube 2211 and the dispersion ball 2212 in an all-around manner, the coating gas can be uniformly adhered to the inner wall of the vaccine bottle, and electroplating defects on the inner wall of the vaccine bottle are avoided, Incomplete, and is beneficial to improving the production quality of the vaccine bottle.

In the plasma enhanced chemical vapor deposition apparatus provided in this embodiment, as shown in fig. 4, a sealing cover plate 222 is sleeved on the dispersion tube 2211, and when the sealing cover plate 222 is in operation, the product to be processed is pressed, and the magnitude of the vacuum degree inside and outside the product to be processed is different by one order of magnitude, that is, the magnitude of the vacuum degree inside and outside the vaccine bottle (inside the reaction chamber 21) is different by 10 times, wherein the magnitude of the vacuum degree is controlled by the vacuum pumping mechanism 1. In order to improve the coating effect, the vacuum degree of the coating inside the vaccine bottle is preferably about 1Pa to 100Pa, and the vacuum degree of the outside of the vaccine bottle is about 0.1Pa to 10 Pa. Therefore, the coating film can be smoothly and stably discharged in the vaccine bottle in the process, the outer side of the vaccine bottle can not be coated, and the coating quality of the vaccine bottle is ensured.

In the plasma enhanced chemical vapor deposition apparatus provided in this embodiment, as shown in fig. 3 and fig. 4, the electrode assembly 22 further includes a first lifting mechanism 223, an upper electrode plate 225 and an air inlet channel 224, and the first lifting mechanism 223 includes, but is not limited to, a motor drive, a cylinder drive, and the like. The gas inlet passage 224 is connected to an external source of coating gas to introduce the coating gas to the interior wall of the vaccine vial for coating. The first lifting mechanism 223 is fixed at the top end of the reaction chamber 21, the upper electrode plate 225 is fixed on the lifting shaft of the first lifting mechanism 223, the upper electrode plate 225 is communicated with the gas inlet channel 224 so as to ionize the coating gas and can play a role of diffusing the gas, the gas outlet device 221 is fixed at the bottom end of the upper electrode plate 225 and is communicated with the upper electrode plate 225, and the gas outlet device 221 is communicated with the upper electrode plate 225 so as to diffuse the ionized coating gas into the vaccine bottle so as to be attached to the inside of the vaccine bottle to realize coating.

In the plasma-enhanced chemical vapor deposition apparatus provided in this embodiment, as shown in fig. 5, the upper electrode plate 225 is provided with a plurality of dispersion layers 2251, the widths of the dispersion layers 2251 are sequentially expanded from top to bottom, and the width of the dispersion layer 2251 closer to the input end is larger, so that the area of the upper electrode plate 225 where the coating gas is dispersed may be expanded, and more dispersion tubes 2211 and dispersion bulbs 2212 may be connected to facilitate coating more vaccine bottles at the same time, thereby improving the production efficiency, and the widths of the dispersion layers 2251 are gradually increased, which is beneficial to scattering the coating gas, so that the distribution of the coating gas in each direction is uniform. Be equipped with between two adjacent dispersion layers 2251 and disperse board 2252, disperse board 2252 separates two adjacent dispersion layers 2251, be equipped with a plurality of dispersion opening (not shown in the figure) on the dispersion board 2252, and from the last dispersion opening that down disperses board 2252 in proper order the attenuate, can ensure that coating gas receives sufficient power of dispersing on the one hand, and the upper electrode plate 225 can be sent out smoothly to coating gas of being convenient for, and on the other hand also can ensure the balanced change of power of dispersing that coating gas received, avoids the not uniform condition of coating film that leads to of equidirectional atress inequality.

In the embodiment of the present invention, as shown in fig. 3, the carrier assembly 23 includes a second lifting mechanism 231, a lower electrode plate 232 and a positioning member 233, the lower electrode plate 232 and the upper electrode plate 225 form an electroplating loop for electroplating the inner wall of the vaccine bottle, the second lifting mechanism 231 is fixed at the bottom end of the reaction chamber 21, the lower electrode plate 232 is fixed on a lifting shaft of the second lifting mechanism 231, after the coating is completed, the first lifting mechanism 223 drives the dispersion tube 2211 and the dispersion ball 2212 to ascend away from the vaccine bottle, and the second lifting mechanism 231 jacks up the vaccine bottle to a certain height, so that the transfer mechanism 3 can take out the vaccine bottle. The positioning member 233 is disposed on the lower electrode plate 232, and the positioning member 233 can fix the position of the vaccine bottle, so as to ensure that the position of the vaccine bottle is not changed during the coating process, thereby ensuring that the coating is smoothly and stably performed.

In the embodiment of the present invention, as shown in fig. 2, the transfer mechanism 3 includes a transfer chamber 31, a sheet feeding member 33, a transfer driving device (not shown) and a guide rod 32, the transfer driving device is fixed on a cavity wall of the transfer chamber 31, the guide rod 32 is fixedly disposed inside the transfer chamber 31, the sheet feeding member 33 is in transmission connection with the transfer driving device, the sheet feeding member 33 is in sliding connection with the guide rod 32, the transfer driving device provides power to make the sheet feeding member 33 feed vaccine bottles into the reaction chamber 21 along the guide rod 32, and then return to avoid interference with the coating film, and the sheet feeding member 33 enters the reaction chamber 21 after the coating film is completed to take out the coated vaccine bottles. Moreover, it is fixed on the lateral wall of transferring chamber 31 to be equipped with location monitoring devices for whether the position of control piece 33 removes and reaches predetermined position, if reach then stop drive piece 33 and remove, avoid piece 33 to damage, the middle part of piece 33 is equipped with the space of stepping down, avoids causing the interference to the bacterin bottle electroplating.

As shown in fig. 1 and 6, the vacuum pumping mechanism 1 includes a dry pump 12 and a roots pump 11, an angle valve 13 and a butterfly valve 14 are disposed between the roots pump and the reaction chamber 21, and the vacuum degree in the reaction mechanism 2 can meet the requirements of the process through the dry pump 12 and the roots pump 11, which is convenient for adjustment.

Specifically, during the coating process, process gas is properly introduced into the vaccine bottle product to be treated through the dispersion tube 2211 and the dispersion head 2212 to achieve the required gas flow, the butterfly valve 14 between the pump and the reaction chamber 21 is adjusted to enable the internal vacuum degree of the vaccine bottle product to be treated to be within a certain value in a range of 1-100 Pa, medium-frequency or high-frequency electromagnetic waves are fed simultaneously to enable the coating gas to discharge to generate plasma, and bias voltage is properly applied to the upper electrode plate 225 and the lower electrode plate 232 to enable the interior of the treated product to be coated with the required film.

The present invention has been further described with reference to specific embodiments, but it should be understood that the specific description herein should not be construed as limiting the spirit and scope of the present invention, and that various modifications to the above-described embodiments, which would occur to persons skilled in the art after reading this specification, are within the scope of the present invention.

Claims

1. A plasma enhanced chemical vapor deposition device is characterized by comprising a vacuum pumping mechanism, a reaction mechanism and a transfer mechanism, the vacuumizing mechanism is communicated with the reaction mechanism, the transferring mechanism is used for feeding or taking out a product to be treated from the reaction mechanism, the reaction mechanism comprises a reaction chamber, an electrode assembly and a bearing assembly, wherein the electrode assembly is arranged at the top end of the reaction chamber and moves in the reaction chamber, the bearing assembly is arranged at the bottom end of the reaction chamber and moves in the reaction chamber, the electrode assembly comprises at least one air outlet device, the air outlet device sequentially comprises a hollow dispersion pipe and a dispersion ball head from top to bottom, the dispersion tube and the dispersion ball head are both provided with a plurality of uniformly distributed dispersion holes, the electrode assembly is made of conductive materials, and a bias power supply is additionally arranged on the electrode assembly.

2. The plasma enhanced chemical vapor deposition device according to claim 1, wherein a sealing cover plate is sleeved on the dispersion pipe, the sealing cover plate covers and presses the product to be processed during operation, the vacuum degree range inside the product to be processed is 1Pa-100Pa, and the vacuum degree range of the reaction chamber is 0.1Pa-10 Pa.

3. The apparatus of claim 1, wherein the electrode assembly further comprises a first lifting mechanism, an upper electrode plate and a gas inlet channel, the first lifting mechanism is fixed at the top end of the reaction chamber, the upper electrode plate is fixed on a lifting shaft of the first lifting mechanism, the upper electrode plate is communicated with the gas inlet channel, the gas outlet device is fixed at the bottom end of the upper electrode plate and is communicated with the upper electrode plate, and the upper electrode plate is connected with the biased cathode.

4. A plasma enhanced chemical vapor deposition apparatus according to claim 3, wherein the upper electrode plate is provided with a plurality of dispersion layers, the width of each dispersion layer is enlarged from top to bottom, a dispersion plate is arranged between two adjacent dispersion layers, the dispersion plate is provided with a plurality of dispersion openings, the dispersion openings of the dispersion plate are tapered from top to bottom, and the dispersion plate at the bottom end is provided with a plurality of air outlet devices.

5. The apparatus of claim 1, wherein the carrier assembly comprises a second lifting mechanism, a lower electrode plate and a positioning member, the second lifting mechanism is fixed at the bottom end of the reaction chamber, the lower electrode plate is fixed on a lifting shaft of the second lifting mechanism, the positioning member is disposed on the lower electrode plate, and the lower electrode plate is connected to the bias positive electrode.

6. The apparatus of claim 1, wherein the transfer mechanism comprises a transfer chamber, a sheet feeding member, a transfer driving device and a guiding rod, the transfer driving device is fixed on a chamber wall of the transfer chamber, the guiding rod is fixedly arranged inside the transfer chamber, the sheet feeding member is in transmission connection with the transfer driving device, and the sheet feeding member is in sliding connection with the guiding rod.

7. A plasma enhanced chemical vapor deposition apparatus according to claim 6, wherein a positioning monitor device is fixedly disposed on a sidewall of the transfer chamber.

8. A plasma enhanced chemical vapor deposition apparatus as claimed in claim 1, wherein the vacuum pumping mechanism comprises a dry pump, a roots pump, and an angle valve and a butterfly valve are arranged between the roots pump and the reaction chamber.