CN220079261U - Diffusion furnace device - Google Patents
Diffusion furnace device Download PDFInfo
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- CN220079261U CN220079261U CN202321103553.0U CN202321103553U CN220079261U CN 220079261 U CN220079261 U CN 220079261U CN 202321103553 U CN202321103553 U CN 202321103553U CN 220079261 U CN220079261 U CN 220079261U
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- air
- inner tube
- outer tube
- diffusion furnace
- air outlet
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- 238000009792 diffusion process Methods 0.000 title claims abstract description 51
- 230000004308 accommodation Effects 0.000 claims description 8
- 230000000712 assembly Effects 0.000 claims description 7
- 238000000429 assembly Methods 0.000 claims description 7
- 238000007789 sealing Methods 0.000 claims description 2
- 238000009826 distribution Methods 0.000 abstract description 11
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 21
- 229910052710 silicon Inorganic materials 0.000 description 21
- 239000010703 silicon Substances 0.000 description 21
- 235000012431 wafers Nutrition 0.000 description 21
- 238000004519 manufacturing process Methods 0.000 description 7
- 238000000034 method Methods 0.000 description 3
- 229910021419 crystalline silicon Inorganic materials 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 238000007664 blowing Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000014509 gene expression Effects 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 238000010408 sweeping Methods 0.000 description 1
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Abstract
The utility model provides a diffusion furnace device, which comprises an outer tube, an inner tube and at least one air outlet assembly, wherein the outer tube is provided with a first air inlet hole, and an external air source supplies air to the inside of the outer tube through the first air inlet hole; at least one part of the inner tube is arranged in the outer tube, an air supply channel is arranged between the inner tube and the outer tube, a plurality of second air inlets are formed in the circumferential side wall of the part of the inner tube, which is positioned in the outer tube, and an accommodating space is formed in the inner tube; one end of the air outlet component is positioned in the accommodating space, the other end of the air outlet component is positioned outside the outer tube and communicated with the outside, air conveyed by an external air source sequentially enters the accommodating space through the first air inlet hole, the air supply channel and the second air inlet hole, and the air in the accommodating space is discharged out of the inner tube through the air outlet component. The utility model solves the problem of uneven gas concentration distribution in the diffusion furnace in the prior art.
Description
Technical Field
The utility model relates to the technical field of solar cells, in particular to a diffusion furnace device.
Background
In the prior art, in the production process of solar cells, the solar cell diffusion furnace device is generally applied to process silicon wafers, the diffusion furnace device generally comprises a diffusion furnace chamber, a single air inlet pipe and a single air outlet pipe, wherein the single air inlet pipe and the single air outlet pipe are communicated with the diffusion furnace chamber, the silicon wafers are placed in the diffusion furnace chamber, air in the diffusion furnace chamber is blown into the air inlet pipe to purge the silicon wafers, however, along with the continuous increase of the size of the silicon wafers, the diameter of the diffusion furnace chamber is also increased, the single air inlet pipe blows an external air source into the diffusion furnace chamber to cause uneven air concentration distribution, so that the sheet resistance uniformity of the diffused silicon wafers is influenced, and in addition, under the condition of single-port air inlet, the time for the air source to be diffused is long, so that the production efficiency is influenced.
Therefore, the prior art has the problems of poor service performance of the diffusion furnace, and particularly uneven gas concentration distribution in the diffusion furnace.
Disclosure of Invention
The utility model mainly aims to provide a diffusion furnace device which is used for solving the problem of nonuniform concentration distribution of gas in a diffusion furnace in the prior art.
In order to achieve the above object, the present utility model provides a diffusion furnace device, comprising an outer tube, an inner tube and at least one air outlet assembly, wherein the outer tube has a first air inlet hole through which an external air source feeds air into the inside of the outer tube; at least one part of the inner tube is arranged in the outer tube, an air supply channel is arranged between the inner tube and the outer tube, a plurality of second air inlets are formed in the circumferential side wall of the part of the inner tube, which is positioned in the outer tube, and an accommodating space is formed in the inner tube; one end of the air outlet component is positioned in the accommodating space, the other end of the air outlet component is positioned outside the outer tube and communicated with the outside, air conveyed by an external air source sequentially enters the accommodating space through the first air inlet hole, the air supply channel and the second air inlet hole, and the air in the accommodating space is discharged out of the inner tube through the air outlet component.
Further, the plurality of second air inlet holes are divided into a plurality of hole groups, and the plurality of hole groups are arranged at intervals along the axial direction of the inner tube.
Further, each group of holes has the same number of second air inlet holes; and/or a plurality of groups of holes are arranged at equal intervals along the axial direction of the inner tube; and/or the second air inlet holes of the same hole group are arranged at intervals around the circumference of the inner tube.
Further, the first air inlet hole is formed in one axial end of the outer tube, the diffusion furnace device further comprises a furnace door, the furnace door is arranged at the other axial end of the outer tube in an openable and closable manner, and when the furnace door is closed, one end, far away from the first air inlet hole, of the inner tube is sealed by the furnace door.
Further, the inner tube and the outer tube are coaxially arranged, the inner tube is located in the outer tube, a first avoidance gap is formed between one end, close to the first air inlet, of the inner tube and one end, far away from the furnace door, of the outer tube, a second avoidance gap is formed between the circumferential outer side wall of the inner tube and the circumferential inner side wall of the outer tube, and the first avoidance gap and the second avoidance gap form an air supply channel.
Further, the air outlet assembly comprises an air outlet pipe and a vacuum pump, wherein one end of the air outlet pipe is positioned in the accommodating space; the other end of the air outlet pipe is positioned outside the outer pipe and communicated with the vacuum pump.
Further, the part of the air outlet pipe positioned in the accommodating space is parallel to the axial direction of the inner pipe.
Further, the part of the air outlet pipe located in the accommodating space is provided with at least one air outlet hole, and when the number of the air outlet holes is multiple, at least one part of the air outlet holes are arranged at intervals along the length direction of the air outlet pipe.
Further, the number of the air outlet components is multiple, and air outlet pipes of at least two air outlet components in the multiple air outlet components are symmetrically arranged about the axis of the inner pipe.
Further, the circle center of the first air inlet hole coincides with the axis of the outer tube.
By applying the technical scheme of the utility model, the diffusion furnace device comprises an outer tube, an inner tube and at least one air outlet assembly, wherein the outer tube is provided with a first air inlet hole, and an external air source supplies air to the inside of the outer tube through the first air inlet hole; at least one part of the inner tube is arranged in the outer tube, an air supply channel is arranged between the inner tube and the outer tube, a plurality of second air inlets are formed in the circumferential side wall of the part of the inner tube, which is positioned in the outer tube, and an accommodating space is formed in the inner tube; one end of the air outlet component is positioned in the accommodating space, the other end of the air outlet component is positioned outside the outer tube and communicated with the outside, air conveyed by an external air source sequentially enters the accommodating space through the first air inlet hole, the air supply channel and the second air inlet hole, and the air in the accommodating space is discharged out of the inner tube through the air outlet component.
When the diffusion furnace device of the present utility model is used, at least a part of the inner tube is provided inside the outer tube, so that a nested diffusion furnace can be formed by the inner tube and the outer tube. Therefore, taking the production process of the crystalline silicon solar cell as an example, when the diffusion furnace device is used, the gas conveyed by the external gas source does not directly enter the space where the silicon wafer is located after entering the diffusion furnace device, namely, the gas does not directly enter the accommodating space of the inner tube, but enters the gas supply channel. And because the axial side wall of the inner tube is provided with a plurality of second air inlets, the air in the air supply channel can enter the accommodating space through the different second air inlets, so that the concentration distribution of the air in the accommodating space is ensured to be more uniform, the sheet resistance uniformity of the diffused silicon wafer is ensured, and even if the size of the silicon wafer is larger, the air and the silicon wafer can be ensured to be in uniform contact. In addition, a plurality of second air inlets are used for simultaneously feeding air, so that the time for diffusing an air source is reduced, and the production efficiency can be improved. Therefore, the diffusion furnace device effectively solves the problem of uneven concentration distribution of gas in the diffusion furnace in the prior art.
Drawings
The accompanying drawings, which are included to provide a further understanding of the utility model and are incorporated in and constitute a part of this specification, illustrate embodiments of the utility model and together with the description serve to explain the utility model. In the drawings:
FIG. 1 shows a schematic structural view of a diffusion furnace apparatus according to an alternative embodiment of the present utility model;
FIG. 2 is a schematic view showing the structure of an inner tube of the diffusion furnace apparatus of FIG. 1;
fig. 3 is a schematic cross-sectional structure of the diffusion furnace apparatus of fig. 1.
Wherein the above figures include the following reference numerals:
10. an outer tube; 11. a first air inlet hole; 20. an inner tube; 21. a second air inlet hole; 22. an accommodation space; 30. an air supply passage; 31. a first avoidance gap; 32. a second avoidance gap; 40. an air outlet assembly; 41. an air outlet pipe; 411. an air outlet hole; 42. a vacuum pump; 50. a furnace door; 2. a silicon wafer; 3. and an external air source.
Detailed Description
The following description of the embodiments of the present utility model will be made clearly and completely with reference to the accompanying drawings, in which it is apparent that the embodiments described are only some embodiments of the present utility model, but not all embodiments. The following description of at least one exemplary embodiment is merely exemplary in nature and is in no way intended to limit the utility model, its application, or uses. All other embodiments, which can be made by those skilled in the art based on the embodiments of the utility model without making any inventive effort, are intended to be within the scope of the utility model.
The utility model provides a diffusion furnace device for solving the problem of uneven gas concentration distribution caused by single-tube air inlet in the prior art.
As shown in fig. 1 to 3, the diffusion furnace apparatus of the present utility model comprises an outer tube 10, an inner tube 20, and at least one gas outlet assembly 40, wherein the outer tube 10 has a first gas inlet hole 11, and an external gas source 3 supplies gas to the inside of the outer tube 10 through the first gas inlet hole 11; at least a part of the inner tube 20 is arranged inside the outer tube 10, an air supply channel 30 is arranged between the inner tube 20 and the outer tube 10, a plurality of second air inlet holes 21 are arranged on the circumferential side wall of the part of the inner tube 20 positioned inside the outer tube 10, and an accommodating space 22 is arranged inside the inner tube 20; one end of the air outlet assembly 40 is located in the accommodating space 22, the other end of the air outlet assembly 40 is located outside the outer tube 10 and is communicated with the outside, air conveyed by the outside air source 3 sequentially passes through the first air inlet hole 11, the air supply channel 30 and the second air inlet hole 21 to enter the accommodating space 22, and air in the accommodating space 22 is discharged out of the inner tube 20 through the air outlet assembly 40.
When the diffusion furnace device of the present utility model is used, since at least a part of the inner tube 20 is provided inside the outer tube 10, a nested diffusion furnace can be formed by the inner tube 20 and the outer tube 10. Therefore, taking a crystalline silicon solar cell production process as an example, when the diffusion furnace device of the present utility model is used, the gas delivered from the external gas source 3 does not directly enter the space where the silicon wafer 2 is located after entering the diffusion furnace device, that is, the gas does not directly enter the accommodating space 22 of the inner tube 20, but enters the gas supply channel 30. Moreover, since the axial side wall of the inner tube 20 is provided with the plurality of second air inlets 21, the air in the air supply channel 30 can enter the accommodating space 22 through the different second air inlets 21, so that the concentration distribution of the air in the accommodating space 22 is more uniform, the sheet resistance uniformity of the diffused silicon wafer 2 is further ensured, and even if the size of the silicon wafer 2 is larger, the air and the silicon wafer 2 can be uniformly contacted. Furthermore, the plurality of second air intake holes 21 are simultaneously intake air, reducing the time required for diffusion of the air source, and also improving the efficiency of production. Therefore, the diffusion furnace device effectively solves the problem of uneven concentration distribution of gas in the diffusion furnace in the prior art.
The gas supplied from the external gas source in the utility model at least comprises N 2 、O 2 、N 2 POCL 3 。
Example 1
As shown in fig. 2, the plurality of second intake holes 21 are divided into a plurality of hole groups, which are disposed at intervals in the axial direction of the inner tube 20. In this way, the plurality of sets of second air intake holes 21 can improve the efficiency of air intake and ensure more uniform gas concentration distribution in the accommodation space.
Preferably, a plurality of hole groups are provided at equal intervals in the axial direction of the inner tube 20.
As shown in fig. 2, each group of holes has the same number of second air intake holes 21; and/or a plurality of groups of holes are equally spaced along the axial direction of the inner tube 20; and/or second intake holes 21 of the same hole group are spaced around the circumference of the inner tube 20. Thus, the second air inlet holes 21 are uniformly arranged on the inner tube 20, so that the uniformity of air outlet of the air inlet holes can be ensured, and uneven square resistance of the silicon wafer 2 caused by uneven air outlet is prevented.
Preferably, the second intake holes 21 of the same hole group are equally spaced around the circumference of the inner tube 20.
Of course, the arrangement of the plurality of second air intake holes 21 may be other than the arrangement of the first embodiment, as long as the air intake efficiency and the gas concentration distribution in the accommodating space 22 can be ensured to be more uniform.
Example two
As shown in fig. 1, the first air intake hole 11 is provided at one axial end of the outer tube 10, and the diffusion furnace apparatus further includes a furnace door 50, the furnace door 50 being openably and closably provided at the other axial end of the outer tube 10, the furnace door 50 sealing one end of the inner tube 20 remote from the first air intake hole 11 when the furnace door 50 is closed. In this way, the silicon wafer 2 may be placed into the accommodating space 22 when the door 50 is opened, and the silicon wafer 2 located in the accommodating space 22 is purged through the gas supply passage 30 and the gas outlet assembly 40 when the door 50 is closed.
As shown in fig. 1 and 3, the inner tube 20 and the outer tube 10 are coaxially arranged, the inner tube 20 is located in the outer tube 10, a first avoiding gap 31 is formed between one end of the inner tube 20, which is close to the first air inlet hole 11, and one end of the outer tube 10, which is far away from the oven door 50, a second avoiding gap 32 is formed between the circumferential outer side wall of the inner tube 20 and the circumferential inner side wall of the outer tube 10, and the first avoiding gap 31 and the second avoiding gap 32 form an air supply channel 30. In this way, the air conveyed by the external air source 3 sequentially passes through the first air inlet hole 11, the first avoidance gap 31, the second avoidance gap 32 and the plurality of second air inlet holes 21 to enter the accommodating space 22.
Example III
As shown in fig. 1, the air outlet assembly 40 includes an air outlet pipe 41 and a vacuum pump 42, wherein one end of the air outlet pipe 41 is located in the accommodating space 22; the other end of the air outlet pipe 41 is located outside the outer pipe 10 and communicates with a vacuum pump 42. Thus, the vacuum pump 42 provides suction to the gas outlet pipe 41, and discharges the gas introduced into the accommodating space 22 through the gas outlet pipe 41.
As shown in fig. 1 and 3, the portion of the outlet duct 41 located in the accommodation space 22 is parallel to the axial direction of the inner tube 20. In this way, the outlet duct 41 is prevented from stopping the second inlet hole 21, and the gas affecting the second inlet hole 21 is prevented from blowing into the accommodating space 22.
Preferably, the outlet duct 41 is located between two adjacent second inlet holes 21 in the circumferential direction of the inner duct 20.
As shown in fig. 1, the air outlet pipe 41 has at least one air outlet 411 at a portion thereof located in the accommodating space 22, and when the number of air outlet 411 is plural, at least a portion of the air outlet 411 is disposed at intervals along the length direction of the air outlet pipe 41. In this way, the plurality of air outlet holes 411 can ensure air outlet efficiency.
As shown in fig. 3, the plurality of air outlet assemblies 40 is provided, and the air outlet pipes 41 of at least two air outlet assemblies 40 of the plurality of air outlet assemblies 40 are symmetrically disposed about the axis of the inner pipe 20. In this way, uniformity of gas discharge in the accommodation space 22 is ensured.
Preferably, the number of the air outlet assemblies 40 is two, and the two air outlet pipes 41 are symmetrically arranged about the axis of the inner pipe 20.
As shown in fig. 1, the center of the first air inlet hole 11 coincides with the axis of the outer tube 10. In this way, the gas passing through the first gas inlet holes 11 is ensured to be uniformly diffused in the first escape gap 31.
From the above description, it can be seen that the above embodiments of the present utility model achieve the following technical effects: by incorporating the diffusion furnace apparatus comprising an outer tube 10, an inner tube 20 and at least one air outlet assembly 40, the outer tube 10 has a first air inlet hole 11, and the external air source 3 is fed into the interior of the outer tube 10 through the first air inlet hole 11; at least a part of the inner tube 20 is arranged inside the outer tube 10, an air supply channel 30 is arranged between the inner tube 20 and the outer tube 10, a plurality of second air inlet holes 21 are arranged on the circumferential side wall of the part of the inner tube 20 positioned inside the outer tube 10, and an accommodating space 22 is arranged inside the inner tube 20; one end of the air outlet assembly 40 is located inside the accommodating space 22, the other end of the air outlet assembly 40 is located outside the outer tube 10 and is communicated with the outside, air conveyed by the outside air source 3 sequentially passes through the first air inlet hole 11, the air supply channel 30 and the second air inlet hole 21 to enter the accommodating space 22, the air in the accommodating space 22 is discharged out of the inner tube 20 through the air outlet assembly 40, the plurality of second air inlet holes 21 simultaneously sweep the air into the accommodating space 22 along the circumferential direction of the inner tube 20, even if the size of the silicon wafer 2 is large, the air can be uniformly contacted with the silicon wafer 2, the sheet resistance uniformity of the diffused silicon wafer 2 is ensured, moreover, the plurality of second air inlet holes 21 are simultaneously used for air inlet, the time for the air source to be required to be diffused is reduced, the production efficiency is also improved, wherein the sheet resistance uniformity is improved by 1-3% (five-point test in the silicon wafer), and the sweeping time is saved by 30-90s.
It is noted that the terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of exemplary embodiments according to the present utility model. As used herein, the singular is also intended to include the plural unless the context clearly indicates otherwise, and furthermore, it is to be understood that the terms "comprises" and/or "comprising" when used in this specification are taken to specify the presence of stated features, steps, operations, devices, components, and/or combinations thereof.
The relative arrangement of the components and steps, numerical expressions and numerical values set forth in these embodiments do not limit the scope of the present utility model unless it is specifically stated otherwise. Meanwhile, it should be understood that the sizes of the respective parts shown in the drawings are not drawn in actual scale for convenience of description. Techniques, methods, and apparatus known to one of ordinary skill in the relevant art may not be discussed in detail, but should be considered part of the specification where appropriate. In all examples shown and discussed herein, any specific values should be construed as merely illustrative, and not a limitation. Thus, other examples of the exemplary embodiments may have different values. It should be noted that: like reference numerals and letters denote like items in the following figures, and thus once an item is defined in one figure, no further discussion thereof is necessary in subsequent figures.
Spatially relative terms, such as "above … …," "above … …," "upper surface at … …," "above," and the like, may be used herein for ease of description to describe one device or feature's spatial location relative to another device or feature as illustrated in the figures. It will be understood that the spatially relative terms are intended to encompass different orientations in use or operation in addition to the orientation depicted in the figures. For example, if the device in the figures is turned over, elements described as "above" or "over" other devices or structures would then be oriented "below" or "beneath" the other devices or structures. Thus, the exemplary term "above … …" may include both orientations of "above … …" and "below … …". The device may also be positioned in other different ways (rotated 90 degrees or at other orientations) and the spatially relative descriptors used herein interpreted accordingly.
It is noted that the terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of exemplary embodiments according to the present utility model. As used herein, the singular is also intended to include the plural unless the context clearly indicates otherwise, and furthermore, it is to be understood that the terms "comprises" and/or "comprising" when used in this specification are taken to specify the presence of stated features, steps, operations, devices, components, and/or combinations thereof.
It should be noted that the terms "first," "second," and the like in the description and the claims of the present utility model and the above figures are used for distinguishing between similar objects and not necessarily for describing a particular sequential or chronological order. It is to be understood that the data so used may be interchanged where appropriate such that embodiments of the utility model described herein may be implemented in sequences other than those illustrated or otherwise described herein.
The above description is only of the preferred embodiments of the present utility model and is not intended to limit the present utility model, but various modifications and variations can be made to the present utility model by those skilled in the art. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present utility model should be included in the protection scope of the present utility model.
Claims (10)
1. A diffusion furnace apparatus, comprising:
an outer tube (10), wherein the outer tube (10) is provided with a first air inlet hole (11), and an external air source (3) supplies air to the inside of the outer tube (10) through the first air inlet hole (11);
an inner tube (20), at least a part of the inner tube (20) is arranged inside the outer tube (10), an air supply channel (30) is arranged between the inner tube (20) and the outer tube (10), a plurality of second air inlet holes (21) are formed in the circumferential side wall of the part, located inside the outer tube (10), of the inner tube (20), and an accommodating space (22) is formed inside the inner tube (20);
at least one component (40) of giving vent to anger, the one end of component (40) of giving vent to anger is located the inside of accommodation space (22), the other end of component (40) of giving vent to anger is located the outside of outer tube (10) and with external intercommunication, the gas that external air supply (3) carried is in proper order through first inlet port (11) gas feed channel (30), second inlet port (21) enter into accommodation space (22), just the gas in accommodation space (22) is through component (40) of giving vent to anger is discharged inner tube (20).
2. A diffusion furnace device according to claim 1, wherein the plurality of second air intake holes (21) are divided into a plurality of hole groups, the plurality of hole groups being arranged at intervals along the axial direction of the inner tube (20).
3. A diffusion furnace apparatus according to claim 2 wherein,
the number of the second air inlets (21) in each hole group is the same; and/or
A plurality of groups of holes are arranged at equal intervals along the axial direction of the inner tube (20); and/or
The second air inlet holes (21) of the same hole group are arranged at intervals around the circumference of the inner tube (20).
4. The diffusion furnace device according to claim 1, characterized in that the first air intake hole (11) is provided at one axial end of the outer tube (10), the diffusion furnace device further comprising a furnace door (50), the furnace door (50) being openably provided at the other axial end of the outer tube (10), the furnace door (50) sealing one end of the inner tube (20) remote from the first air intake hole (11) when the furnace door (50) is closed.
5. The diffusion furnace device according to claim 4, wherein the inner tube (20) and the outer tube (10) are coaxially arranged, the inner tube (20) is located in the outer tube (10) entirely, a first avoidance gap (31) is formed between one end of the inner tube (20) close to the first air inlet hole (11) and one end of the outer tube (10) far away from the furnace door (50), a second avoidance gap (32) is formed between the circumferential outer side wall of the inner tube (20) and the circumferential inner side wall of the outer tube (10), and the first avoidance gap (31) and the second avoidance gap (32) form the air supply channel (30).
6. The diffusion furnace arrangement according to any one of claims 1 to 5, wherein the gas outlet assembly (40) comprises:
an air outlet pipe (41), wherein one end of the air outlet pipe (41) is positioned in the accommodating space (22);
and the other end of the air outlet pipe (41) is positioned outside the outer pipe (10) and is communicated with the vacuum pump (42).
7. A diffusion furnace arrangement according to claim 6, wherein the portion of the outlet duct (41) located in the accommodation space (22) is parallel to the axial direction of the inner tube (20).
8. The diffusion furnace device according to claim 7, wherein the portion of the air outlet pipe (41) located in the accommodating space (22) is provided with at least one air outlet hole (411), and when the number of the air outlet holes (411) is plural, at least a part of the air outlet holes (411) are arranged at intervals along the length direction of the air outlet pipe (41).
9. The diffusion furnace arrangement according to claim 6, wherein the number of gas outlet assemblies (40) is plural, and the gas outlet pipes (41) of at least two of the gas outlet assemblies (40) of the plurality of gas outlet assemblies (40) are symmetrically arranged about the axis of the inner pipe (20).
10. A diffusion furnace device according to any one of claims 1 to 5, wherein the centre of the first inlet aperture (11) coincides with the axis of the outer tube (10).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202321103553.0U CN220079261U (en) | 2023-05-09 | 2023-05-09 | Diffusion furnace device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202321103553.0U CN220079261U (en) | 2023-05-09 | 2023-05-09 | Diffusion furnace device |
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| Publication Number | Publication Date |
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| CN220079261U true CN220079261U (en) | 2023-11-24 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN202321103553.0U Active CN220079261U (en) | 2023-05-09 | 2023-05-09 | Diffusion furnace device |
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| Country | Link |
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| CN (1) | CN220079261U (en) |
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2023
- 2023-05-09 CN CN202321103553.0U patent/CN220079261U/en active Active
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