CN218951490U

CN218951490U - Atomic layer deposition reaction device

Info

Publication number: CN218951490U
Application number: CN202222267111.1U
Authority: CN
Inventors: 刘磊; 唐继远; 张洪国
Original assignee: Jiangsu Pengju Semiconductor Equipment Technology Co ltd
Current assignee: Jiangsu Pengju Semiconductor Equipment Technology Co ltd
Priority date: 2022-08-26
Filing date: 2022-08-26
Publication date: 2023-05-02
Anticipated expiration: 2032-08-26

Abstract

The embodiment of the utility model discloses an atomic layer deposition reaction device, which is applied to powder coating and comprises the following components: the reaction tank body is hollow in the reaction tank body to form a reaction cavity; the rotary driving assembly is arranged on the periphery of the reaction tank body and is in transmission connection with the reaction tank body; the reaction cavity comprises a first reaction chamber and a second reaction chamber which are communicated in sequence, a blowing part is arranged in each of the first reaction chamber and the second reaction chamber, at least two blowing holes are formed in the surface of the blowing part, one end of each blowing hole is communicated with the first reaction chamber or the second reaction chamber, and the other end of each blowing hole is communicated with external air source equipment. According to the utility model, the powder to be coated is in a suspension state in each reaction chamber, so that the precursor and the powder surface can be fully contacted, the full progress of atomic layer deposition reaction is ensured, and the coating effect of the powder surface coating is improved.

Description

Atomic layer deposition reaction device

Technical Field

The utility model relates to the technical field of atomic layer deposition, in particular to an atomic layer deposition reaction device.

Background

Atomic layer deposition is a thin film technique based on self-limiting chemical half reactions that deposit substances in the form of monoatomic films layer by layer on the surface of an object. Unlike conventional chemical vapor deposition, atomic layer deposition breaks down the complete chemical reaction into multiple half reactions, thereby achieving single atomic layer level film control accuracy. Since active sites like hydroxyl groups are present on the substrate surface, the precursor can form a monolayer of saturated chemisorption, thus allowing a self-limiting reaction, while after a single cycle of reaction, new sites are exposed and the next cycle of reaction can proceed.

At present, the existing three-dimensional atomic layer deposition technology can realize perfect coating when being applied to film coating of a three-dimensional piece, realizes accurate control of film thickness, has obvious defects, and the atomic layer deposition reaction carried out on the surface of powder is more complex than that of a planar sample, and the powder material in the same volume needs more precursors to react due to the huge surface area of the powder sample; meanwhile, due to the characteristic that powder is easy to agglomerate, the precursor diffusion efficiency of a planar atomic layer deposition mode is low, so that the defect of atomic layer deposition reaction carried out on the surface of the powder is more obvious.

Disclosure of Invention

The embodiment of the utility model provides an atomic layer deposition reaction device for improving the coating effect of a powder coating film.

In order to solve the technical problems, the embodiment of the utility model discloses the following technical scheme:

in one aspect, an atomic layer deposition reaction apparatus is provided, including: the reaction tank body is hollow in the reaction tank body to form a reaction cavity; the rotary driving assembly is arranged on the periphery of the reaction tank body and is in transmission connection with the reaction tank body;

the reaction cavity comprises a first reaction chamber and a second reaction chamber which are communicated in sequence, a blowing part is arranged in each of the first reaction chamber and the second reaction chamber, at least two blowing holes are formed in the surface of the blowing part, one end of each blowing hole is communicated with the first reaction chamber or the second reaction chamber, and the other end of each blowing hole is communicated with external air source equipment.

In addition to or in lieu of one or more of the features disclosed above, the blowing member may be movably mounted to the inner wall of the reaction tank and the angle between the blowing member and the horizontal may be adjustable.

In addition to one or more of the features disclosed above, or alternatively, the angle α between the blowing member and the horizontal direction is defined as α, and the magnitude of the angle α satisfies 30 ° to 60 °.

In addition to or in lieu of one or more of the features disclosed above, the blow holes are diffusely distributed on the surface of the blow member.

In addition to, or in lieu of, one or more of the features disclosed above, the rotary drive assembly includes: the mounting tables are provided with at least two mounting tables, and the two mounting tables are symmetrically arranged;

the rotary driver is fixedly arranged on one of the mounting tables;

the connecting frame is arranged between the two mounting tables, is fixedly arranged on the periphery of the reaction tank body and is in transmission connection with the power output end of the rotary driver;

under the action of the rotary driver, the reaction tank body reciprocally rotates along a rotation direction at a rotation angle.

In addition to, or in lieu of, one or more of the features disclosed above, further comprises: the isolation valve is arranged in the middle area of the reaction tank body, and the reaction cavity is divided into a first reaction chamber and a second reaction chamber by the isolation valve.

In addition to or instead of one or more of the features disclosed above, the reaction tank body is provided with a first feed port and a second feed port which are arranged oppositely, the first feed port is communicated with the first reaction chamber, the second feed port is communicated with the second reaction chamber,

and the first feeding hole and the second feeding hole are respectively provided with an aperture diaphragm valve and a guide piece.

In addition to or instead of one or more of the above-disclosed features, the reaction tank body is further provided with a first discharge port and a second discharge port,

one end of the first discharge port is communicated with the first reaction chamber, and the other end of the first discharge port is respectively communicated with an external vacuum generator and a product material box;

one end of the second discharge port is communicated with the second reaction chamber, and the other end of the second discharge port is respectively communicated with an external vacuum generator and a product material box.

In addition to or in lieu of one or more of the features disclosed above, the first and second discharge ports are each provided with a filter element.

In addition to, or in lieu of, one or more of the features disclosed above, further comprises: the heating piece is embedded and installed on the outer wall of the reaction tank body.

One of the above technical solutions has the following advantages or beneficial effects: according to the utility model, two independent reaction chambers are arranged, so that each reaction chamber is respectively and independently subjected to one half reaction in the atomic layer deposition reaction, and cross contamination is avoided; through setting up blowing material spare, to the inert gas who carries gaseous precursor in the reaction chamber, under the effect of jet gas, the powder of coating film is waited on the surface is in suspension state in every reaction chamber, prevents that the powder from agglomerating, and then makes precursor and powder surface fully contact, guarantees the abundant of atomic layer deposition reaction and goes on, finally makes the surface cladding of powder complete, does not have the defect to produce, has promoted the cladding effect of powder surface coating film.

The other technical scheme has the following advantages or beneficial effects: according to the utility model, the reaction tank body is driven by the rotary driver to reciprocally rotate at a rotation angle of 180 degrees along a rotation direction, so that the relative positions of the first reaction chamber and the second reaction chamber are alternately changed, the stress balance of gravity and blowing force can be realized in each reaction chamber, the powder is ensured to be in a suspension state in each reaction chamber, and finally the effect of coating the surface of the powder is ensured.

Drawings

The technical solution and other advantageous effects of the present utility model will be made apparent by the following detailed description of the specific embodiments of the present utility model with reference to the accompanying drawings.

FIG. 1 is a schematic diagram of an atomic layer deposition reaction;

FIG. 2 is a comparative diagram of three conventional coating processes;

FIG. 3 is a defect map of the product after planar atomic layer deposition reaction;

FIG. 4 is a front view of an atomic layer deposition reactor according to an embodiment of the present utility model;

FIG. 5 is a cross-sectional view of an atomic layer deposition reactor along the A-A direction according to an embodiment of the present utility model;

fig. 6 is a cross-sectional view of a blow member along the direction B-B provided in accordance with an embodiment of the present utility model.

Reference numerals illustrate:

100. an atomic layer deposition reaction device;

110. a reaction tank body; 111. a first reaction chamber; 112. a first reaction chamber; 113. a first feed port; 114. a second feed inlet; 115. a first discharge port; 116. a second discharge port;

120. a rotary drive assembly; 121. a rotary driver; 122. a connecting frame; 123. a mounting table;

130. blowing a material piece; 131. blowing holes;

140. an aperture diaphragm valve; 150. a guide member; 160. a filter; 170. an isolation valve; 180. and a heating member.

Detailed Description

In order to make the objects, technical solutions and advantageous effects of the present utility model more apparent, the present utility model will be further described in detail with reference to the accompanying drawings and detailed description. It should be understood that the detailed description is intended to illustrate the utility model, and not to limit the utility model.

In the description of the present utility model, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", etc. indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings are merely for convenience in describing the present utility model and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be configured and operated in a specific orientation, and thus should not be construed as limiting the present utility model. Furthermore, the terms "first," "second," and the like, are used for descriptive purposes only and are not to be construed as indicating or implying a relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defining "a first" or "a second" may explicitly or implicitly include one or more of the described features. In the description of the present utility model, the meaning of "plurality" means two or more, unless specifically defined otherwise.

In the description of the present utility model, it should be noted that, unless explicitly specified and limited otherwise, the terms "mounted," "connected," and "connected" are to be construed broadly, and may be either fixedly connected, detachably connected, or integrally connected, for example; the connection may be mechanical connection, direct connection or indirect connection through an intermediate medium, and may be internal connection of two elements or interaction relationship of two elements. The specific meaning of the above terms in the present utility model can be understood by those of ordinary skill in the art according to the specific circumstances.

In the present utility model, unless expressly stated or limited otherwise, a first feature "above" or "below" a second feature may include both the first and second features being in direct contact, as well as the first and second features not being in direct contact but being in contact with each other through additional features therebetween. Moreover, a first feature being "above," "over" and "on" a second feature includes the first feature being directly above and obliquely above the second feature, or simply indicating that the first feature is higher in level than the second feature. The first feature being "under", "below" and "beneath" the second feature includes the first feature being directly above and obliquely above the second feature, or simply indicating that the first feature is less level than the second feature.

The existing atomic layer deposition technology is used for coating a product, wherein the reaction process of the atomic layer deposition reaction is shown in fig. 1, the existing three-dimensional atomic layer deposition technology can realize perfect coating when being applied to coating a three-dimensional part, and can realize accurate control of the thickness of a film, the planar atomic layer deposition technology is provided with obvious defects such as incomplete coating, coating defects and defects caused by agglomeration, and the atomic layer deposition reaction performed on the surface of powder is more complex than that of a planar sample, and the powder material in the same volume needs more precursors to react due to the huge surface area of the powder sample; meanwhile, due to the characteristic that powder is easy to agglomerate, the precursor diffusion efficiency of a planar atomic layer deposition mode is low, so that the defect of atomic layer deposition reaction carried out on the surface of the powder is more obvious.

In order to solve the problem of defects of atomic layer deposition reaction performed on the powder surface. The embodiment of the utility model provides an atomic layer deposition reaction device 100. Fig. 4 is a structural view of an atomic layer deposition reactor, fig. 5 is a sectional view of the atomic layer deposition reactor, and fig. 6 is a sectional view of a blowing member.

In the present utility model, as shown in fig. 4 to 6, the atomic layer deposition reaction apparatus 100, which is applied to a powder coating film, may include: the reaction tank 110, the interior of which is hollow to form a reaction cavity; and a rotary driving assembly 120 disposed at an outer circumference of the reaction tank 110, and the rotary driving assembly 120 is in driving connection with the reaction tank 110; the reaction cavity comprises a first reaction chamber 111 and a second reaction chamber 112 which are sequentially communicated, a blowing piece 130 is arranged in each of the first reaction chamber 111 and the second reaction chamber 112, at least two blowing holes 131 are formed in the surface of the blowing piece 130, one ends of the blowing holes 131 are communicated with the first reaction chamber 111 or the second reaction chamber 112, and the other ends of the blowing holes 131 are communicated with external air source equipment.

In a preferred embodiment of the present utility model, the gas carrying the first precursor is injected into the first reaction chamber 111 through the blowing holes 131 of the blowing member 130 by an inert gas using an external gas source device,

the gas carrying the second precursor is injected into the second reaction chamber 111 by an inert gas through the blowing holes 131 of the blowing member 130 using an external gas source device.

Wherein the first precursor is Al (CH 3) ₃ The second precursor is H ₂ O; the inert gas is any one of helium, neon, argon and other inert gases, such as argon. It should be noted that the specific choice of the inert gas is given by way of example only, and the present utility model is not limited thereto.

The "first" and "second" in the first reaction chamber 111 and the first reaction chamber 112 are only for enabling distinction between two different reaction chambers provided in the reaction chamber, and are not limitations on the number or order of the reaction chambers.

It can be understood that in the utility model, by arranging two independent reaction chambers, each reaction chamber is respectively and independently used for carrying out one half reaction in the atomic layer deposition reaction, so that cross contamination is avoided; through setting up blowing spare to the inert gas who carries the precursor in the reaction chamber sprays the effect of gas under, make the powder of waiting to coat film be in suspension in every reaction chamber, prevent that the powder from agglomerating, and then make precursor and powder surface can fully contact, guarantee the abundant of atomic layer deposition reaction and go on, finally make the surface cladding of powder complete, no defect produces, promoted the cladding effect of powder surface coating film.

In the embodiment of the present utility model, the blowing member 130 is movably mounted on the inner wall of the reaction tank 110, and an included angle between the blowing member 130 and the horizontal direction is adjustable. According to the utility model, by arranging the angle-adjustable blowing piece 130 and adjusting the included angle between the blowing piece 130 and the horizontal direction, the blowing angle of the blowing hole 131 is adjusted, so that a good blowing angle can be ensured when the blowing piece 130 sprays inert gas, the precursor carried by the blowing piece is convenient to fully contact with powder, meanwhile, the inert gas is convenient for enabling the powder to be in a suspension state in the cavity, and the effect of coating the surface of the powder is improved.

In the embodiment of the present utility model, the included angle between the blowing member 130 and the horizontal direction is defined as α, and the included angle α is 30 ° to 60 °. Namely, the included angle α between the blowing member 130 and the horizontal direction may be controlled within a range of 30 ° to 60 °. For example, the included angle α may be 30 °, 35 °, 40 °, 45 °, 50 °, 55 °, 60 °, and the like. It should be noted that the specific values of the angle are given only by way of example, as long as any value of the included angle α in the range of 30 ° to 60 ° is within the scope of protection of the present application. Through controlling the included angle alpha between the blowing piece 130 and the horizontal direction within the range of 30-60 degrees, the better spraying angle can be ensured when the blowing piece 130 sprays inert gas, the precursor which is convenient to spray and carry is fully contacted with the powder, meanwhile, the inert gas is convenient for enabling the powder to be in a suspension state in the cavity, and the effect of coating film on the surface of the powder is improved.

In the embodiment of the present utility model, in order to further enhance the effect of the blowing member 130 on the atomic layer deposition reaction, and simultaneously enhance the effect of coating the powder surface, the blowing holes 131 are in diffusion distribution on the surface of the blowing member 130. Specifically, the blowing holes 131 are distributed on the surface of the blowing member 130 in an array direction, and the array direction is any one of a curve, a straight line, and a ring. For example, the blowing holes 131 are distributed in a curved shape on the surface of the blowing member 130, for example, the blowing holes 131 are distributed in a straight line on the surface of the blowing member 130, and for example, the blowing holes 131 are distributed in a ring shape on the surface of the blowing member 130. It should be noted that, the specific selection of the array arrangement of the blowing holes 131 is given only by way of example, and the present utility model is not limited thereto. According to the utility model, the blowing holes 131 are distributed in a diffusion manner, so that the blowing holes 131 uniformly spray gas into the reaction chamber, the precursor carried by spraying is fully contacted with the powder, meanwhile, the inert gas is further convenient for enabling the powder to be in a suspension state in the cavity, and the effect of coating the surface of the powder is improved.

In an embodiment of the present utility model, the rotation driving assembly 120 includes: a mounting table 123 provided with not less than two, and two of the mounting tables 123 are symmetrically arranged; a rotation driver 121 fixedly mounted on one of the mounting tables 123; a connecting frame 122 disposed between the two mounting tables 123, wherein the connecting frame 122 is fixedly mounted on the outer periphery of the reaction tank 110, and the connecting frame 122 is in transmission connection with the power output end of the rotary driver 121; the reaction tank 110 is reciprocally rotated at a rotation angle in a rotation direction by the rotation driver 121.

In a preferred embodiment of the present utility model, the rotary driver 121 is any one of a motor, a rotary cylinder, or an electromagnet, for example, the rotary driver 121 may be a motor, for another example, the rotary driver 121 may be a rotary cylinder, for another example, the rotary driver 121 may be an electromagnet, and it should be noted that a specific choice of the rotary driver 121 is given only by way of example, and the present utility model is not limited thereto. The rotation angle is 180 °.

It can be appreciated that the rotary driver 121 drives the reaction tank 110 to reciprocally rotate at a rotation angle of 180 ° along a rotation direction, so that the relative positions of the first reaction chamber 111 and the second reaction chamber 112 are alternately changed, so that the powder can be balanced between gravity and the blown air in each reaction chamber, the powder is in a suspension state in each reaction chamber, and finally the effect of coating the surface of the powder is ensured.

In an embodiment of the present utility model, the atomic layer deposition reaction apparatus 100 further includes: an isolation valve 170, wherein the isolation valve 170 is installed in a middle region of the reaction tank 110, and the isolation valve 170 divides the reaction chamber into a first reaction chamber 111 and a second reaction chamber 112. In the utility model, the isolation valve 170 is arranged to divide the reaction cavity into the first reaction chamber 111 and the second reaction chamber 112 which are mutually independent, powder firstly performs the first half reaction of the atomic layer deposition reaction in the first reaction chamber 111, after the powder is completed, the isolation valve 170 is opened, and the powder enters the second reaction chamber 112 to perform the second half reaction, so that each reaction chamber respectively performs one half reaction independently, and cross contamination is avoided.

In a preferred embodiment, the isolation valve 170 is a vacuum valve.

In the embodiment of the present utility model, a first feeding port 113 and a second feeding port 114 are formed on the reaction tank 110, which are oppositely arranged, the first feeding port 113 is communicated with the first reaction chamber 111, the second feeding port 114 is communicated with the second reaction chamber 112, and diaphragm valves 140 and guide members 150 are disposed at the positions of the first feeding port 113 and the second feeding port 114.

The "first" and "second" of the first feed port 113 and the second feed port 114 are only for distinguishing two different feed ports provided in the first reaction chamber 111 and the second reaction chamber 112, and are not limited to the number or order of the feed ports.

It can be understood that in the utility model, by arranging the diaphragm valves 140 at the first feed port 113 and the second feed port 114, the sizes of the first feed port 113 and the second feed port 114 are adjusted by utilizing the characteristic that the diaphragm valves can be adjusted, and the powder to be coated is properly released, so that the gravity of each powder and the stress balance of blowing on the powder blowing force are realized when the blowing hole 131 blows, and the powder is ensured to be in a suspension state.

Meanwhile, the guide members 150 are arranged at the first feeding port 113 and the second feeding port 114, so that the powder can be smoothly transferred into the first reaction chamber 111, the second feeding port 114 and the second reaction chamber 112.

In the embodiment of the present utility model, the reaction tank 110 is further provided with a first discharge port 115 and a second discharge port 116, one end of the first discharge port 115 is communicated with the first reaction chamber 111, and the other end of the first discharge port 115 is respectively communicated with an external air extraction system and a product bin; one end of the second discharging hole 116 is communicated with the second reaction chamber 112, and the other end of the second discharging hole 116 is communicated with an external air extraction system and a product material box.

The "first" and "second" of the first discharge port 115 and the second discharge port 116 are only for distinguishing two different discharge ports provided in the first reaction chamber 111 and the second reaction chamber 112, and are not limited to the number or the sequence of the discharge ports.

In a preferred embodiment of the present utility model, the other end of the first discharge port 115 is respectively communicated with an external air extraction system and a product tank by using a three-way valve; the other end of the second discharging hole 116 is respectively communicated with an external air extraction system and a product material box by a three-way valve.

The air extraction system is a vacuum pump and an air extraction pipeline thereof.

In the embodiment of the present utility model, the filter 160 is disposed at each of the first discharge port 115 and the second discharge port 116. In a preferred embodiment, the filter 160 is a screen.

It can be appreciated that, in the present utility model, the filter 160 is disposed at the first discharge port 115 and the second discharge port 116, when the vacuum generator vacuumizes the first reaction chamber 111 or the second reaction chamber 112, the filter 160 is in a closed state to prevent the powder from being pumped out during vacuuming, and when the powder coating is completed, the filter 160 is in an open state to enable the coated powder to be smoothly discharged from the first discharge port 115 or the second discharge port 116.

In an embodiment of the present utility model, the atomic layer deposition reaction apparatus 100 further includes: and a heating member 180, wherein the heating member 180 is embedded and mounted on the outer wall of the reaction tank 110. The heating part 180 is used for heating the reaction chamber so as to meet the temperature required by the atomic layer deposition reaction and ensure the atomic layer deposition reaction.

In a preferred embodiment of the present utility model, the heating element 180 has different heating temperatures according to products, so as to ensure coating effects of different products.

The heating temperature of the heating member 180 satisfies 100 to 500 ℃. I.e., the heating temperature of the heating member 180 may be controlled to be in the range of 100 deg.c to 500 deg.c. For example, the heating temperature of the heating element 180 is 100 ℃, 200 ℃, 300 ℃, 400 ℃, 500 ℃, or the like. It should be noted that the specific values of the heating temperature are given only by way of example, so long as any value of the heating temperature of the heating member 180 in the range of 100 ° to 500 ° is within the scope of the present application. According to the utility model, the heating temperature of the heating element 180 is controlled within the range of 100-500 degrees, so that the heating temperature of the heating element 180 is different according to different products, and the coating effect of different products is ensured.

In summary, the working procedure of the atomic layer deposition reaction apparatus 100 in the present utility model is as follows:

the air extraction system respectively vacuumizes the first reaction chamber 111 and the second reaction chamber 112, the heating element 180 heats the reaction tank 110, the first precursor gas is carried by inert gas and sprayed out from the blowing hole 131 of the blowing element 130 positioned in the first reaction chamber 111, the powder to be coated is properly put into the first reaction chamber 111 by the diaphragm valve 140, the powder is in a suspension state in the first reaction chamber 111, and the first precursor gas fully contacts with the surface of the powder to complete the first half reaction; at this time, the isolation valve 170 is opened, the gas injection is stopped, and the powder is introduced into the second reaction chamber 112 and is fed into the second feed port 114 through the diaphragm valve 140. The isolation valve 170 is closed, and the inert gas is injected from the blowing hole 131 of the blowing member 130 in the first reaction chamber 111, so as to purge the first reaction chamber 111. Vacuumizing, wherein the filter 160 is in a closed state, and discharging reaction products and redundant reactants from the first discharge hole 115; the rotary driver 121 drives the reaction tank 110 to rotate 180 ° to exchange the positions of the first reaction chamber 111 and the second reaction chamber 112. In the second reaction chamber 112, the powder to be coated is properly put into the second reaction chamber 112 by the diaphragm valve 140, the second precursor gas is carried by the inert gas and sprayed out from the blowing holes 131 of the blowing piece 130 positioned in the second reaction chamber 112, the powder is in a suspension state in the second reaction chamber 112, and the second precursor gas is fully contacted with the surface of the powder to complete the second half reaction; at this time, the isolation valve 170 is opened, the gas injection is stopped, and the powder is introduced into the first reaction chamber 111 and is fed into the first feed port 113 through the diaphragm valve 140. The isolation valve 170 is closed, inert gas is sprayed out from the blowing holes 131 of the blowing member 130 in the second reaction chamber 112, and meanwhile, the first reaction chamber 111 is purged and vacuumized. The filter 160 is closed to remove the reaction products and excess reactants from the second outlet 116. The rotary driver 121 drives the reaction tank 110 to rotate 180 degrees, and returns to the beginning at this time; repeating the above operation, and automatically running by setting the cycle number to obtain the expected thickness of the powder surface coating; finally, the filter 160 is opened, and the powder is drawn out to complete the coating.

The above steps are presented merely to aid in understanding the method, structure, and core concept of the utility model. It will be apparent to those skilled in the art that various changes and modifications can be made to the present utility model without departing from the principles of the utility model, and such changes and modifications are intended to be included within the scope of the appended claims.

Claims

1. An atomic layer deposition reaction device applied to powder coating, which is characterized by comprising the following components:

a reaction tank (110) having a hollow interior to form a reaction chamber; and

a rotary driving assembly (120) arranged at the periphery of the reaction tank body (110), and the rotary driving assembly (120) is in transmission connection with the reaction tank body (110);

the reaction cavity comprises a first reaction chamber (111) and a second reaction chamber (112) which are sequentially communicated, wherein a blowing part (130) is arranged in each of the first reaction chamber (111) and the second reaction chamber (112), at least two blowing holes (131) are formed in the surface of each blowing part (130), one end of each blowing hole (131) is communicated with the first reaction chamber (111) or the second reaction chamber (112), and the other end of each blowing hole (131) is communicated with external air source equipment.

2. The atomic layer deposition reaction apparatus according to claim 1, wherein the blowing member (130) is movably mounted on an inner wall of the reaction tank (110), and an included angle between the blowing member (130) and a horizontal direction is adjustable.

3. The atomic layer deposition reactor according to claim 1, wherein the angle α between the blowing member (130) and the horizontal direction is defined to be 30 ° to 60 °.

4. An atomic layer deposition reactor according to any one of claims 1 to 3, wherein the blowing holes (131) are diffusely distributed on the surface of the blowing member (130).

5. The atomic layer deposition reaction apparatus according to claim 1, wherein the rotation driving assembly (120) comprises: a mounting table (123) provided with not less than two, and the two mounting tables (123) are symmetrically arranged;

a rotary driver (121) fixedly mounted on one of the mounting tables (123);

the connecting frame (122) is arranged between the two mounting tables (123), the connecting frame (122) is fixedly arranged on the periphery of the reaction tank body (110), and the connecting frame (122) is in transmission connection with the power output end of the rotary driver (121);

the reaction tank (110) is reciprocally rotated at a rotation angle along a rotation direction by a rotation driver (121).

6. The atomic layer deposition reactor according to claim 1, further comprising: the isolation valve (170), isolation valve (170) install in the middle part region of the retort body (110), isolation valve (170) will the reaction cavity separates into first reaction chamber (111) and second reaction chamber (112).

7. The atomic layer deposition reaction device according to claim 1, wherein the reaction tank body (110) is provided with a first feed port (113) and a second feed port (114) which are arranged oppositely, the first feed port (113) is communicated with the first reaction chamber (111), the second feed port (114) is communicated with the second reaction chamber (112),

and the first feeding hole (113) and the second feeding hole (114) are respectively provided with an aperture diaphragm valve (140) and a guide piece (150).

8. The atomic layer deposition reactor according to claim 1, wherein the reactor tank (110) is further provided with a first discharge port (115) and a second discharge port (116),

one end of the first discharge hole (115) is communicated with the first reaction chamber (111), and the other end of the first discharge hole (115) is respectively communicated with an external vacuum generator and a product material box;

one end of the second discharging hole (116) is communicated with the second reaction chamber (112), and the other end of the second discharging hole (116) is respectively communicated with an external vacuum generator and a product material box.

9. The atomic layer deposition reactor according to claim 8, wherein the first outlet (115) and the second outlet (116) are each provided with a filter (160).

10. The atomic layer deposition reactor according to claim 1, further comprising: and the heating piece (180) is embedded and arranged on the outer wall of the reaction tank body (110).