WO2021227424A1 - 触控显示面板及触控显示装置 - Google Patents
触控显示面板及触控显示装置 Download PDFInfo
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- WO2021227424A1 WO2021227424A1 PCT/CN2020/130141 CN2020130141W WO2021227424A1 WO 2021227424 A1 WO2021227424 A1 WO 2021227424A1 CN 2020130141 W CN2020130141 W CN 2020130141W WO 2021227424 A1 WO2021227424 A1 WO 2021227424A1
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- touch
- touch electrode
- touch display
- display panel
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/0412—Digitisers structurally integrated in a display
Definitions
- This application relates to the field of display technology, and in particular to a touch display panel and a touch display device.
- the OLED panel has received extensive attention from the industry due to its advantages such as foldability and portability and has been rapidly developed.
- the industry vigorously promotes the development of integrated touch technology. (Such as in-cell touch technology, etc.), and then replace the existing plug-in touch technology.
- Integrated touch technology has many advantages such as thinner thickness, higher transmittance, resistance to water and oxygen intrusion, and strong corrosion resistance. It is an inevitable trend in the development of touch display technology.
- the cathode layer of the display panel is provided on the entire surface and is located on a different film layer from the touch electrode.
- the cathode layer on the entire surface has a strong shielding effect on the touch signal, resulting in the touch of the display panel.
- the present application provides a touch display panel including an array substrate and a light emitting device layer, a pixel definition layer, and a touch device provided on the array substrate;
- the light emitting device layer includes an anode, a light emitting layer disposed on the anode, and a cathode disposed on the light emitting layer and the pixel defining layer;
- the touch device includes a first touch electrode and a second touch electrode that are arranged oppositely, and the first touch electrode is located on the side of the light emitting device layer and is arranged on the same layer as the anode.
- a pixel definition layer covers the first touch electrode; the second touch electrode is disposed on a side of the pixel definition layer away from the first touch electrode, and the second touch electrode is on the array substrate.
- the orthographic projection on the upper surface is spaced apart from the orthographic projection of the cathode on the array substrate.
- a barrier wall surrounding the light emitting device layer is provided on the pixel definition layer, and the second touch electrode is provided on the barrier wall.
- the preparation material of the second touch electrode is the same as the preparation material of the cathode, and the second touch electrode and the cathode are formed by the same evaporation process.
- the longitudinal section of the retaining wall is an inverted trapezoid.
- the preparation material of the retaining wall includes a negative photoresist material.
- the longitudinal section of the retaining wall is a regular trapezoid, and the obtuse angle formed by the plane on which the side of the retaining wall is located and the horizontal plane is less than or equal to 110 degrees.
- the barrier wall is provided with an opening between the first touch electrode and the second touch electrode, the opening is filled with a dielectric layer, and the dielectric The dielectric constant of the prepared material of the layer is greater than the dielectric constant of the prepared material of the retaining wall.
- the array substrate includes:
- Source and drain provided on the base substrate
- the first flat layer is provided with a connecting metal layer and a second flat layer covering the connecting metal layer, and the anode, the first touch electrode and the pixel definition layer are arranged on the second On the flat layer, the connecting metal layer is electrically connected to the anode and the source and drain.
- connection metal layer includes a first connection block and a second connection block that are spaced apart, the first connection block is electrically connected to the anode and the source and drain, and the second connection block It is electrically connected to the first touch electrode.
- the present application also provides a touch display device, the touch display device includes a drive module and a touch display panel, the touch display panel includes an array substrate and a light emitting device disposed on the array substrate Layers, pixel definition layers and touch devices;
- the light emitting device layer includes an anode, a light emitting layer disposed on the anode, and a cathode disposed on the light emitting layer and the pixel defining layer;
- the touch device includes a first touch electrode and a second touch electrode that are arranged oppositely, and the first touch electrode is located on the side of the light emitting device layer and is arranged on the same layer as the anode.
- a pixel definition layer covers the first touch electrode; the second touch electrode is disposed on a side of the pixel definition layer away from the first touch electrode, and the second touch electrode is on the array substrate.
- the orthographic projection of the above is spaced apart from the orthographic projection of the cathode on the array substrate; the driving module is electrically connected to the touch display panel.
- a barrier wall surrounding the light emitting device layer is provided on the pixel definition layer, and the second touch electrode is provided on the barrier wall.
- the preparation material of the second touch electrode is the same as the preparation material of the cathode, and the second touch electrode and the cathode are formed by the same evaporation process.
- the longitudinal section of the retaining wall is an inverted trapezoid.
- the preparation material of the retaining wall includes a negative photoresist material.
- the longitudinal section of the retaining wall is a regular trapezoid, and the obtuse angle formed by the plane on which the side of the retaining wall is located and the horizontal plane is less than or equal to 110 degrees.
- the barrier wall is provided with an opening between the first touch electrode and the second touch electrode, the opening is filled with a dielectric layer, and the dielectric The dielectric constant of the prepared material of the layer is greater than the dielectric constant of the prepared material of the retaining wall.
- the array substrate includes:
- Source and drain provided on the base substrate
- the first flat layer is provided with a connecting metal layer and a second flat layer covering the connecting metal layer, and the anode, the first touch electrode and the pixel definition layer are arranged on the second On the flat layer, the connecting metal layer is electrically connected to the anode and the source and drain.
- connection metal layer includes a first connection block and a second connection block that are spaced apart, the first connection block is electrically connected to the anode and the source and drain, and the second connection block It is electrically connected to the first touch electrode, and the driving module is electrically connected to the second connection block.
- the first touch electrode and the anode are arranged in the same layer, and the second touch electrode is arranged on the barrier wall, thereby forming an in-cell touch device.
- the height difference between the top surface of the retaining wall and the pixel definition layer is used to make the metal material falling on the top surface of the retaining wall and the metal material falling on the pixel definition layer
- the metal material is disconnected to form the spaced cathode and the second touch electrode. There is no need to add a special process to form the spaced cathode and the second touch electrode, and when the cathode and the second touch electrode are formed, the light is emitted There are no related manufacturing process risks.
- FIG. 1 is a schematic diagram of the first structure of the touch display panel in this application.
- FIG. 2 is a schematic diagram of the second structure of the touch display panel in this application.
- FIG. 3 is a schematic diagram of a third structure of the touch display panel in this application.
- 4 to 7 are schematic diagrams of the manufacturing process of the touch display panel in one embodiment of the application.
- Array substrate 11.
- This application is aimed at the existing in-cell touch display panel, the cathode layer of the display panel is arranged on the entire surface and is located in a different film layer from the touch electrode, and the entire cathode layer has a strong shielding effect on the touch signal, resulting in a display
- the technical problem that the touch function of the panel does not work normally. This application can solve the above-mentioned problems.
- a touch display panel as shown in FIG. 1, the touch display panel includes an array substrate 10 and a light emitting device layer 20, a pixel definition layer 30 and a touch device 40 arranged on the array substrate 10.
- the light-emitting device layer 20 includes an anode 21, a light-emitting layer 22 disposed on the anode 21, and a cathode 23 disposed on the light-emitting layer 22 and the pixel definition layer 30.
- the pixel defining layer 30 is provided with a pixel opening 31 penetrating the upper and lower sides thereof, at least a part of the anode 21 is located in the pixel opening 31, and the light-emitting layer 22 is located in the pixel opening 31.
- the touch device 40 includes a first touch electrode 41 and a second touch electrode 42 disposed opposite to each other.
- the first touch electrode 41 is located on the side of the light emitting device layer 20 and is connected to the anode. 21 is arranged in the same layer, the pixel defining layer 30 covers the first touch electrode 41; the second touch electrode 42 is arranged on the side of the pixel defining layer 30 away from the first touch electrode 41,
- the orthographic projection of the second touch electrode 42 on the array substrate 10 is spaced apart from the orthographic projection of the cathode 23 on the array substrate 10.
- a capacitive touch capacitor is formed by the first touch electrode 41 and the second touch electrode 42.
- the first touch electrode 41 and the second touch The capacitance between the electrodes 42 changes, and a corresponding touch operation is generated to realize the touch function.
- the second touch electrode 42 is arranged above the pixel defining layer 30, thereby forming an in-cell touch device 40, reducing the overall thickness of the touch display panel,
- the orthographic projection of the second touch electrode 42 on the array substrate 10 and the orthographic projection of the cathode 23 on the array substrate 10 are spaced apart, which can prevent the cathode 23 from shielding the gap between the first touch electrode 41 and the second touch electrode 42 Touch signal.
- one of the first touch electrode 41 and the second touch electrode 42 is a transmitting electrode, and the other is a receiving electrode, and the first touch electrode 41 and the second touch electrode 42 are A mutual capacitive touch capacitor is formed.
- the multiple touch devices 40 may be evenly distributed on the array substrate 10, and the multiple touch devices 40 may also be scattered on the array substrate 10;
- the two touch electrodes 42 can be arranged in the same layer as the cathode 23 or on a different film layer than the cathode 23.
- the cathode 23 is not arranged on the entire surface, the cathode 23 may be formed of a plurality of spaced apart block structures, and the second touch electrode 42 is arranged corresponding to the gap between two adjacent block structures.
- the cathode 23 may also have a plurality of through holes, and the second touch electrode 42 is provided corresponding to the through holes.
- a barrier wall 50 surrounding the light-emitting device layer 20 is provided on the pixel defining layer 30, and the second touch electrode 42 is provided on the barrier wall 50.
- the barrier wall 50 is arranged around the pixel opening 31 to prevent the light-emitting material from diffusing and causing the light-emitting layers 22 in different pixel openings 31 to be integrated when the light-emitting layer 22 is formed by evaporation or inkjet printing.
- the retaining wall 50 can also be used as a supporting structure for placing the mask.
- the preparation material of the second touch electrode 42 is the same as the preparation material of the cathode 23, and the second touch electrode 42 and the cathode 23 are formed by the same evaporation process.
- the thickness of the barrier wall 50 is greater than 1.5 ⁇ m, so that there is a sufficiently high height difference between the top surface of the barrier wall 50 and the surface of the pixel definition layer 30.
- the preparation material of the pixel definition layer 30 may be a positive organic photoresist
- the preparation material of the barrier wall 50 includes a photoresist material
- the preparation material of the barrier wall 50 may be the same as the preparation material of the pixel definition layer 30. Same or different.
- the longitudinal section of the retaining wall 50 is in the shape of an inverted trapezoid.
- the vertical section of the retaining wall 50 when the vertical section of the retaining wall 50 is set in an inverted trapezoid shape, when the metal material is vapor deposited on the entire surface of the pixel definition layer 30 by an evaporation process, the metal material on the top surface of the retaining wall 50 flows into the retaining wall. When the wall 50 is on the side, the metal material on the side of the retaining wall 50 drops under the action of gravity, thereby facilitating the separation of the metal material falling on the top surface of the retaining wall 50 from the metal material falling on the pixel definition layer 30 .
- the preparation material of the retaining wall 50 includes negative photoresist.
- the preparation material of the barrier wall 50 is different from the preparation material of the pixel definition layer 30.
- the pixel definition layer 30 will not be etched by the etching solution to facilitate the formation.
- the etching hole in the shape of a regular trapezoid facilitates the formation of the retaining wall 50 in the shape of an inverted trapezoid.
- the longitudinal section of the retaining wall 50 is a regular trapezoid, and the obtuse angle formed by the plane where the side of the retaining wall 50 is located and the horizontal plane is less than or equal to 110 degrees.
- the retaining wall 50 can be integrally formed with the pixel defining layer 30, thereby reducing the production process.
- the barrier wall 50 is provided with an opening 51 between the first touch electrode 41 and the second touch electrode 42, and the opening 51 is filled with a dielectric layer 60, so The dielectric constant of the preparation material of the dielectric layer 60 is greater than the dielectric constant of the preparation material of the retaining wall 50.
- the dielectric constant of generally photoresist materials is relatively small.
- the first touch electrode 41 and the second touch electrode 42 are strengthened.
- the capacitance value of the touch capacitance formed between the two touch electrodes 42 can improve the touch sensitivity of the touch device 40.
- the preparation material of the dielectric layer 60 may be one or more of silicon nitride and silicon oxide; the opening 51 may extend from the first touch electrode 41 to the second touch electrode 42 The surface is used to further enhance the capacitance value of the touch capacitance formed between the first touch electrode 41 and the second touch electrode 42.
- the array substrate 10 includes a base substrate 11, source and drain electrodes 18 disposed on the base substrate 11, and a first flat layer 19 covering the source and drain electrodes 18.
- the first flat layer 19 is provided with a connecting metal layer and a second flat layer 80 covering the connecting metal layer, and the anode 21, the first touch electrode 41 and the pixel definition layer 30 are provided On the second flat layer 80, the connecting metal layer is electrically connected to the anode 21 and the source and drain 18.
- the connecting metal layer includes a first connecting block 71 and a second connecting block 72 spaced apart, the first connecting block 71 is electrically connected to the anode 21 and the source and drain 18, and the second The connecting block 72 is electrically connected to the first touch electrode 41.
- the source drain 18 and the anode 21 are electrically connected through the first connecting block 71, and the first touch electrode 41 and the external driving module may be electrically connected through the second connecting block 72 to receive the driving provided by the driving module.
- the driving module may be a driving IC; two adjacent first touch electrodes 41 may also be electrically connected through the second connecting block 72 to form a mesh structure, so as to improve the touch sensitivity of the touch display panel.
- the base substrate 11 includes a base 111, a protective layer 112 disposed on the base 111, and a buffer layer 113 disposed on the protective layer 112.
- the substrate 111 may be a flexible substrate, the substrate may be a transparent glass substrate or a transparent plastic substrate, the substrate 111 may be made of polyimide; the buffer layer 113 may be made of nitride. Silicon or silicon oxide.
- the array substrate 10 further includes an active layer 12 disposed on the base substrate 11, a first gate insulating layer 13 covering the active layer 12, and a first gate insulating layer 13 disposed on the first The first gate 14 on the gate insulating layer 13, the second gate insulating layer 15 covering the first gate 14, the second gate 16 arranged on the second gate insulating layer 15, and the covering The interlayer insulating layer 17 of the second gate 16.
- the source and drain electrodes 18 are disposed on the interlayer insulating layer 17 and are electrically connected to the active layer 12.
- the touch display panel has a display area 91 and a bending area 92 located at the side of the display area 91, and the pixel definition layer 30 is provided with a pixel definition layer 30 that penetrates the pixel definition layer 30 and extends.
- the bending opening 921 to the surface of the substrate 111 is located in the bending area 92 to facilitate the bending of the bending area 92 of the touch display panel.
- the bending area 92 may be provided with a connecting terminal for accessing external signals, and the second connecting block 72 for connecting the first touch electrode 41 and the driving module may also be provided in the bending area 92 to facilitate The driving module is connected to the first touch electrode 41.
- connection terminal connecting the driving module and the second touch electrode 42 may also be provided in the bending area 92 to facilitate signal transmission between the driving module and the second touch electrode 42.
- FIGS. 4 to 7 are schematic diagrams of the manufacturing process of the touch display panel in one embodiment.
- an active layer 12 and a first gate insulating layer 13 covering the active layer 12 are sequentially formed on the base substrate 11; a first gate 14 and a first gate insulating layer 13 are sequentially formed on the first gate insulating layer 13
- a bending opening 921 extending to the substrate 111 is formed on the layer 17.
- the source and drain electrodes 18 are formed on the interlayer insulating layer 17, and the first flat layer 19 covering the source and drain electrodes 18 and filling the bent opening 921 is formed on the interlayer insulating layer 17, after the A connecting metal layer is formed on the first flat layer 19, and the connecting metal layer is patterned to form a first connecting block 71 and a second connecting block 72 spaced apart.
- a second flat layer 80 is formed on the first flat layer 19; a first touch electrode 41 and an anode 21 spaced apart are formed on the second flat layer 80, and the second flat layer 80 covers the The pixel defining layer 30 of the first touch electrode 41; a pixel opening 31 and a barrier wall 50 are formed on the pixel defining layer 30, and an opening 51 extending to the surface of the first touch electrode 41 is formed on the barrier wall 50 .
- a dielectric material is filled in the opening 51 to form a dielectric layer 60.
- the barrier wall 50 and the dielectric layer 60 are shielded by a mask, the light-emitting layer 22 located in the pixel opening 31 is formed on the anode 21 by an evaporation process, and the barrier wall 50 is used to block adjacent pixels.
- the light emitting layer 22 in the opening 31 is connected.
- the metal material is vapor-deposited on the retaining wall 50, the pixel defining layer 30, and the light emitting layer 22 using an evaporation process, and the height difference between the top surface of the retaining wall 50 and the pixel defining layer 30 is used to make the top of the retaining wall 50
- the metal material on the surface is disconnected from the metal material on the pixel definition layer 30 to form the second touch electrode 42 and the cathode 23 spaced apart.
- the present application also provides a touch display device, the touch display device includes a drive module and the touch display panel as described in any of the above embodiments, the drive module and the The second connection block 72 of the touch display panel is electrically connected to realize the electrical connection between the driving module and the first touch electrode 41.
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Abstract
一种触控显示面板及触控显示装置，触控显示面板包括：阵列基板（10）；发光器件层（20）；触控器件（40），其包括第一触控电极（41）和第二触控电极（42），第一触控电极（41）与发光器件层（20）的阳极（21）同层设置；像素定义层（30），其覆盖第一触控电极（41），第二触控电极（42）设置于像素定义层（30）的上方，第二触控电极（42）以及阴极（23）在阵列基板（10）上的正投影相间隔。
Description
本申请涉及显示技术领域，尤其涉及一种触控显示面板及触控显示装置。
OLED面板以其可折叠和便携式强等优点受到了业界的广泛关注并得到了迅猛的发展，为了进一步实现面板结构轻薄化以及得到更优的触控显示面板，行业内大力推进开发集成触控技术（如内嵌式触控技术等），继而取代现有的外挂式触控技术。集成触控技术具有厚度更薄、透过率更高、抗水氧入侵以及耐腐蚀的可靠性强等诸多优势，是触控显示技术发展的必然趋势。
现有的内嵌式触控显示面板中，显示面板的阴极层整面设置且与触控电极位于不同膜层，整面的阴极层对触控信号的屏蔽效应较强，导致显示面板的触控功能不能正常运行的技术问题。
第一方面，本申请提供一种触控显示面板，所述触控显示面板包括阵列基板以及设置于所述阵列基板上的发光器件层、像素定义层和触控器件；
所述发光器件层包括阳极、设置于所述阳极上的发光层以及设置于所述发光层和所述像素定义层上的阴极；
其中，所述触控器件包括相对设置的第一触控电极和第二触控电极，所述第一触控电极位于所述发光器件层的侧部且与所述阳极同层设置，所述像素定义层覆盖所述第一触控电极；所述第二触控电极设置于所述像素定义层远离所述第一触控电极的一侧，所述第二触控电极在所述阵列基板上的正投影与所述阴极在所述阵列基板上的正投影相间隔。
在一些实施例中，所述像素定义层上设置有围绕所述发光器件层的挡墙，所述第二触控电极设置于所述挡墙上。
在一些实施例中，所述第二触控电极的制备材料与所述阴极的制备材料相同，所述第二触控电极与所述阴极采用同一道蒸镀工序形成。
在一些实施例中，所述挡墙的纵截面呈倒梯形。
在一些实施例中，所述挡墙的制备材料包括负性光阻材料。
在一些实施例中，所述挡墙的纵截面呈正梯形，所述挡墙的侧边所在的平面与水平面所形成的钝角小于或等于110度。
在一些实施例中，所述挡墙上设置有位于所述第一触控电极和所述第二触控电极之间的开孔，所述开孔中填充有介电层，所述介电层的制备材料的介电常数大于所述挡墙的制备材料的介电常数。
在一些实施例中，所述阵列基板包括：
衬底基板；
设置于所述衬底基板上的源漏极；
覆盖所述源漏极的第一平坦层；
其中，所述第一平坦层上设置有连接金属层以及覆盖所述连接金属层的第二平坦层，所述阳极、所述第一触控电极以及所述像素定义层设置于所述第二平坦层上，所述连接金属层与所述阳极以及所述源漏极电连接。
在一些实施例中，所述连接金属层包括相间隔的第一连接块和第二连接块，所述第一连接块与所述阳极以及所述源漏极电连接，所述第二连接块与所述第一触控电极电连接。
第二方面，本申请还提供一种触控显示装置，所述触控显示装置包括驱动模块以及触控显示面板，所述触控显示面板包括阵列基板以及设置于所述阵列基板上的发光器件层、像素定义层和触控器件；
所述发光器件层包括阳极、设置于所述阳极上的发光层以及设置于所述发光层和所述像素定义层上的阴极；
其中，所述触控器件包括相对设置的第一触控电极和第二触控电极，所述第一触控电极位于所述发光器件层的侧部且与所述阳极同层设置，所述像素定义层覆盖所述第一触控电极；所述第二触控电极设置于所述像素定义层远离所述第一触控电极的一侧，所述第二触控电极在所述阵列基板上的正投影与所述阴极在所述阵列基板上的正投影相间隔；所述驱动模块与所述触控显示面板电连接。
在一些实施例中，所述像素定义层上设置有围绕所述发光器件层的挡墙，所述第二触控电极设置于所述挡墙上。
在一些实施例中，所述第二触控电极的制备材料与所述阴极的制备材料相同，所述第二触控电极与所述阴极采用同一道蒸镀工序形成。
在一些实施例中，所述挡墙的纵截面呈倒梯形。
在一些实施例中，所述挡墙的制备材料包括负性光阻材料。
在一些实施例中，所述挡墙的纵截面呈正梯形，所述挡墙的侧边所在的平面与水平面所形成的钝角小于或等于110度。
在一些实施例中，所述挡墙上设置有位于所述第一触控电极和所述第二触控电极之间的开孔，所述开孔中填充有介电层，所述介电层的制备材料的介电常数大于所述挡墙的制备材料的介电常数。
在一些实施例中，所述阵列基板包括：
衬底基板；
设置于所述衬底基板上的源漏极；
覆盖所述源漏极的第一平坦层；
其中，所述第一平坦层上设置有连接金属层以及覆盖所述连接金属层的第二平坦层，所述阳极、所述第一触控电极以及所述像素定义层设置于所述第二平坦层上，所述连接金属层与所述阳极以及所述源漏极电连接。
在一些实施例中，所述连接金属层包括相间隔的第一连接块和第二连接块，所述第一连接块与所述阳极以及所述源漏极电连接，所述第二连接块与所述第一触控电极电连接，所述驱动模块与所述第二连接块电连接。
通过将第一触控电极与阳极同层设置，第二触控电极设置于挡墙上，从而形成内嵌式的触控器件。而在像素定义层上采用蒸镀工艺整面蒸镀金属材料时，利用挡墙的顶面与像素定义层的高度差使得落在挡墙的顶面上的金属材料与落在像素定义层上的金属材料断开，从而形成相间隔的阴极和第二触控电极，无需新增特殊工艺制程来形成相间隔的阴极和第二触控电极，且形成阴极和第二触控电极时对发光层无相关制程风险。
下面结合附图，通过对本申请的具体实施方式详细描述，将使本申请的技术方案及其它有益效果显而易见。
图1为本申请中触控显示面板的第一种结构示意图；
图2为本申请中触控显示面板的第二种结构示意图；
图3为本申请中触控显示面板的第三种结构示意图；
图4至图7为本申请一实施方式中触控显示面板的制备流程示意图。
附图标记：
10、阵列基板；11、衬底基板；111、基底；112、保护层；113、缓冲层；12、有源层；13、第一栅极绝缘层；14、第一栅极；15、第二栅极绝缘层；16、第二栅极；17、层间绝缘层；18、源漏极；19、第一平坦层；20、发光器件层；21、阳极；22、发光层；23、阴极；30、像素定义层；31、像素开口；40、触控器件；41、第一触控电极；42、第二触控电极；50、挡墙；51、开孔；60、介电层；71、第一连接块；72、第二连接块；80、第二平坦层；91、显示区；92、弯折区；921、弯折开口。
以下各实施例的说明是参考附加的图示，用以例示本发明可用以实施的特定实施例。本发明所提到的方向用语，例如[上]、[下]、[前]、[后]、[左]、[右]、[内]、[外]、[侧面]等，仅是参考附加图式的方向。因此，使用的方向用语是用以说明及理解本发明，而非用以限制本发明。在图中，结构相似的单元是用以相同标号表示。
本申请针对现有的内嵌式触控显示面板中，显示面板的阴极层整面设置且与触控电极位于不同膜层，整面的阴极层对触控信号的屏蔽效应较强，导致显示面板的触控功能不能正常运行的技术问题。本申请可以解决上述问题。
一种触控显示面板，如图1所示，所述触控显示面板包括阵列基板10以及设置于所述阵列基板10上的发光器件层20、像素定义层30和触控器件40。
具体的，所述发光器件层20包括阳极21、设置于所述阳极21上的发光层22以及设置于所述发光层22和所述像素定义层30上的阴极23。
具体的，所述像素定义层30上设置有贯穿其上下两侧的像素开口31，所述阳极21的至少一部分位于所述像素开口31中，所述发光层22位于所述像素开口31中。
具体的，所述触控器件40包括相对设置的第一触控电极41和第二触控电极42，所述第一触控电极41位于所述发光器件层20的侧部且与所述阳极21同层设置，所述像素定义层30覆盖所述第一触控电极41；所述第二触控电极42设置于所述像素定义层30远离所述第一触控电极41的一侧，所述第二触控电极42在所述阵列基板10上的正投影与所述阴极23在所述阵列基板10上的正投影相间隔。
需要说明的是，通过第一触控电极41与第二触控电极42形成电容式的触控电容，手指触碰触控显示面板的显示面时，第一触控电极41与第二触控电极42之间的电容发生变化，产生相应的触控操作，以实现触控功能。通过将第一触控电极41与阳极21同层设置，第二触控电极42设置于像素定义层30的上方，从而形成内嵌式的触控器件40，降低触控显示面板的整体厚度，而第二触控电极42在阵列基板10上的正投影与阴极23在阵列基板10上的正投影相间隔，可以防止阴极23屏蔽第一触控电极41与第二触控电极42之间的触控信号。
需要说明的是，所述第一触控电极41和第二触控电极42中的一者为发射电极，另一者为接收电极，所述第一触控电极41和第二触控电极42形成互容式触控电容。
具体的，所述触控器件40设置有多个，多个所述触控器件40可以均匀分布于阵列基板10上，多个所述触控器件40也可以零散分布于阵列基板10上；第二触控电极42可以与阴极23同层设置或与阴极23位于不同膜层。
需要说明的是，所述阴极23为非整面设置，阴极23可以由多个相间隔的块状结构形成，第二触控电极42与相邻两所述块状结构之间的间隙对应设置；阴极23也可以具有多个通孔，第二触控电极42与通孔对应设置。
具体的，所述像素定义层30上设置有围绕所述发光器件层20的挡墙50，所述第二触控电极42设置于所述挡墙50上。
其中，所述挡墙50围绕所述像素开口31设置，以在通过蒸镀或喷墨打印等方式形成发光层22时防止发光材料扩散导致不同像素开口31中的发光层22连成一体，使用掩膜板蒸镀发光层22时，挡墙50也可以作为放置掩膜板的支撑结构。
具体的，所述第二触控电极42的制备材料与所述阴极23的制备材料相同，所述第二触控电极42与所述阴极23采用同一道蒸镀工序形成。
需要说明的是，采用同一道工序同时形成阴极23和第二触控电极42，可以减少生产工序，降低生产成本，同时由于挡墙50的顶面与像素定义层30之间的高度差，在像素定义层30上采用蒸镀工艺整面蒸镀金属材料时，落在挡墙50的顶面上的金属材料与落在像素定义层30上的金属材料断开，从而形成相间隔的阴极23和第二触控电极42，无需新增特殊工艺制程来形成相间隔的阴极23和第二触控电极42，且形成阴极23和第二触控电极42时对发光层22无相关制程风险。
其中，所述挡墙50的厚度大于1.5微米，从而使得挡墙50的顶面与像素定义层30的表面之间具有足够高的高度差。
具体的，所述像素定义层30的制备材料可以为正性有机光阻，所述挡墙50的制备材料包括光阻材料，所述挡墙50的制备材料可以与像素定义层30的制备材料相同或不同。
在一实施方式中，所述挡墙50的纵截面呈倒梯形。
需要说明的是，通过将挡墙50的纵截面设置成倒梯形状，在像素定义层30上采用蒸镀工艺整面蒸镀金属材料时，挡墙50的顶面上的金属材料流入到挡墙50的侧面时，在重力的作用下挡墙50的侧面上的金属材料滴落，从而便于使得落在挡墙50顶面上的金属材料与落在像素定义层30上的金属材料断开。
进一步的，所述挡墙50的制备材料包括负性光阻。
需要说明的是，挡墙50的制备材料与像素定义层30的制备材料不同，对挡墙50进行蚀刻使其形成倒梯形结构时，像素定义层30不会受到蚀刻液的蚀刻，以便于形成正梯形形状的蚀刻孔，从而便于形成呈倒梯形的挡墙50。
在另一实施方式中，如图2所示，所述挡墙50的纵截面呈正梯形，所述挡墙50的侧边所在的平面与水平面所形成的钝角小于或等于110度。
其中，所述挡墙50可以与所述像素定义层30一体成型，从而减少生产工序。
具体的，所述挡墙50上设置有位于所述第一触控电极41和所述第二触控电极42之间的开孔51，所述开孔51中填充有介电层60，所述介电层60的制备材料的介电常数大于所述挡墙50的制备材料的介电常数。
需要说明的是，一般光阻材料的介电常数较小，通过在第一触控电极41和所述第二触控电极42之间设置介电层60，增强第一触控电极41与第二触控电极42之间形成的触控电容的电容值，可以提升触控器件40的触控灵敏性。
需要说明的是，所述介电层60的制备材料可以为氮化硅和氧化硅中的一种或多种；开孔51可以由第一触控电极41延伸至第二触控电极42的表面，以进一步增强第一触控电极41与第二触控电极42之间形成的触控电容的电容值。
具体的，如图3所示，所述阵列基板10包括衬底基板11、设置于所述衬底基板11上的源漏极18以及覆盖所述源漏极18的第一平坦层19。
其中，所述第一平坦层19上设置有连接金属层以及覆盖所述连接金属层的第二平坦层80，所述阳极21、所述第一触控电极41以及所述像素定义层30设置于所述第二平坦层80上，所述连接金属层与所述阳极21以及所述源漏极18电连接。
具体的，所述连接金属层包括相间隔的第一连接块71和第二连接块72，所述第一连接块71与所述阳极21以及所述源漏极18电连接，所述第二连接块72与所述第一触控电极41电连接。
需要说明的是，源漏极18和阳极21通过第一连接块71实现电连接，第一触控电极41和外接的驱动模块可以通过第二连接块72电连接，以接收驱动模块提供的驱动信号，驱动模块可以为驱动IC；相邻两第一触控电极41之间也可以通过第二连接块72实现电连接以形成网状结构，以提高触控显示面板的触控灵敏性。
在一实施方式中，所述衬底基板11包括基底111、设置于所述基底111上的保护层112以及设置于所述保护层112上的缓冲层113。
其中，所述基底111可以为柔性基底，所述基底可以为透明玻璃基底或透明塑料基底，所述基底111的制备材料可以为聚酰亚胺；所述缓冲层113的制备材料可以为氮化硅或氧化硅。
在一实施方式中，所述阵列基板10还包括设置于所述衬底基板11上的有源层12、覆盖所述有源层12的第一栅极绝缘层13、设置于所述第一栅极绝缘层13上的第一栅极14、覆盖所述第一栅极14的第二栅极绝缘层15、设置于所述第二栅极绝缘层15上的第二栅极16以及覆盖所述第二栅极16的层间绝缘层17。
其中，所述源漏极18设置于所述层间绝缘层17上且与所述有源层12电连接。
在一实施方式中，所述触控显示面板具有显示区91和位于所述显示区91的侧部的弯折区92，所述像素定义层30上设置有贯穿所述像素定义层30且延伸至所述基底111的表面的弯折开口921，弯折开口921位于弯折区92，以便于触控显示面板的弯折区92的弯折。
需要说明的是，弯折区92处可以设置用于接入外接信号的连接端子，用于连接第一触控电极41与驱动模块的第二连接块72也可以设置于弯折区92，以便于驱动模块与第一触控电极41连接。
需要说明的是，也可以在弯折区92设置连接驱动模块和第二触控电极42的连接端子，以便于驱动模块与第二触控电极42之间的信号传输。
参见图4至图7，图4至图7为一实施方式中触控显示面板的制备流程示意图。
如图4所示，在衬底基板11上依次形成有源层12以及覆盖有源层12的第一栅极绝缘层13；在第一栅极绝缘层13上依次形成第一栅极14和覆盖第一栅极14的第二栅极绝缘层15；在第二栅极绝缘层15上依次形成第二栅极16以及覆盖第二栅极16的层间绝缘层17后，在层间绝缘层17上形成延伸至基底111的弯折开口921。
进一步的，在层间绝缘层17上形成源漏极18，在层间绝缘层17上形成覆盖所述源漏极18并填充所述弯折开口921的第一平坦层19后，在所述第一平坦层19上形成连接金属层，并对所述连接金属层进行图案化，以形成相间隔的第一连接块71和第二连接块72。
进一步的，在第一平坦层19上形成第二平坦层80；在第二平坦层80上形成相间隔的第一触控电极41和阳极21，并在第二平坦层80上形成覆盖所述第一触控电极41的像素定义层30；在所述像素定义层30上形成像素开口31以及挡墙50，并在挡墙50上形成延伸至第一触控电极41的表面的开孔51。
如图5所示，在所述开孔51中填充介电材料以形成介电层60。
如图6所示，利用掩膜板将挡墙50和介电层60遮挡，采用蒸镀工艺在所述阳极21上形成位于像素开口31中的发光层22，利用挡墙50阻止相邻像素开口31中的发光层22相连接。
如图7所示，将金属材料采用蒸镀工艺蒸镀至挡墙50、像素定义层30以及发光层22上，利用挡墙50的顶面与像素定义层30的高度差使得挡墙50顶面上的金属材料与像素定义层30上的金属材料断开，以形成相间隔的第二触控电极42和阴极23。
基于上述触控显示面板，本申请还提供一种触控显示装置，所述触控显示装置包括驱动模块以及如上述任一实施方式中所述的触控显示面板，所述驱动模块与所述触控显示面板的第二连接块72电连接，以实现驱动模块与第一触控电极41的电连接。
在上述实施例中，对各个实施例的描述都各有侧重，某个实施例中没有详述的部分，可以参见其他实施例的相关描述。
本文中应用了具体个例对本申请的原理及实施方式进行了阐述，以上实施例的说明只是用于帮助理解本申请的技术方案及其核心思想；本领域的普通技术人员应当理解：其依然可以对前述各实施例所记载的技术方案进行修改，或者对其中部分技术特征进行等同替换；而这些修改或者替换，并不使相应技术方案的本质脱离本申请各实施例的技术方案的范围。
Claims (18)
- 一种触控显示面板，其中，所述触控显示面板包括阵列基板以及设置于所述阵列基板上的发光器件层、像素定义层和触控器件；所述发光器件层包括阳极、设置于所述阳极上的发光层以及设置于所述发光层和所述像素定义层上的阴极；其中，所述触控器件包括相对设置的第一触控电极和第二触控电极，所述第一触控电极位于所述发光器件层的侧部且与所述阳极同层设置，所述像素定义层覆盖所述第一触控电极；所述第二触控电极设置于所述像素定义层远离所述第一触控电极的一侧，所述第二触控电极在所述阵列基板上的正投影与所述阴极在所述阵列基板上的正投影相间隔。
- 根据权利要求1所述的触控显示面板，其中，所述像素定义层上设置有围绕所述发光器件层的挡墙，所述第二触控电极设置于所述挡墙上。
- 根据权利要求2所述的触控显示面板，其中，所述第二触控电极的制备材料与所述阴极的制备材料相同，所述第二触控电极与所述阴极采用同一道蒸镀工序形成。
- 根据权利要求3所述的触控显示面板，其中，所述挡墙的纵截面呈倒梯形。
- 根据权利要求4所述的触控显示面板，其中，所述挡墙的制备材料包括负性光阻材料。
- 根据权利要求3所述的触控显示面板，其中，所述挡墙的纵截面呈正梯形，所述挡墙的侧边所在的平面与水平面所形成的钝角小于或等于110度。
- 根据权利要求2所述的触控显示面板，其中，所述挡墙上设置有位于所述第一触控电极和所述第二触控电极之间的开孔，所述开孔中填充有介电层，所述介电层的制备材料的介电常数大于所述挡墙的制备材料的介电常数。
- 根据权利要求1所述的触控显示面板，其中，所述阵列基板包括：衬底基板；设置于所述衬底基板上的源漏极；覆盖所述源漏极的第一平坦层；其中，所述第一平坦层上设置有连接金属层以及覆盖所述连接金属层的第二平坦层，所述阳极、所述第一触控电极以及所述像素定义层设置于所述第二平坦层上，所述连接金属层与所述阳极以及所述源漏极电连接。
- 根据权利要求8所述的触控显示面板，其中，所述连接金属层包括相间隔的第一连接块和第二连接块，所述第一连接块与所述阳极以及所述源漏极电连接，所述第二连接块与所述第一触控电极电连接。
- 一种触控显示装置，其中，所述触控显示装置包括驱动模块以及触控显示面板，所述触控显示面板包括阵列基板以及设置于所述阵列基板上的发光器件层、像素定义层和触控器件；所述发光器件层包括阳极、设置于所述阳极上的发光层以及设置于所述发光层和所述像素定义层上的阴极；其中，所述触控器件包括相对设置的第一触控电极和第二触控电极，所述第一触控电极位于所述发光器件层的侧部且与所述阳极同层设置，所述像素定义层覆盖所述第一触控电极；所述第二触控电极设置于所述像素定义层远离所述第一触控电极的一侧，所述第二触控电极在所述阵列基板上的正投影与所述阴极在所述阵列基板上的正投影相间隔；所述驱动模块与所述触控显示面板电连接。
- 根据权利要求10所述的触控显示装置，其中，所述像素定义层上设置有围绕所述发光器件层的挡墙，所述第二触控电极设置于所述挡墙上。
- 根据权利要求11所述的触控显示装置，其中，所述第二触控电极的制备材料与所述阴极的制备材料相同，所述第二触控电极与所述阴极采用同一道蒸镀工序形成。
- 根据权利要求12所述的触控显示装置，其中，所述挡墙的纵截面呈倒梯形。
- 根据权利要求13所述的触控显示装置，其中，所述挡墙的制备材料包括负性光阻材料。
- 根据权利要求12所述的触控显示装置，其中，所述挡墙的纵截面呈正梯形，所述挡墙的侧边所在的平面与水平面所形成的钝角小于或等于110度。
- 根据权利要求11所述的触控显示装置，其中，所述挡墙上设置有位于所述第一触控电极和所述第二触控电极之间的开孔，所述开孔中填充有介电层，所述介电层的制备材料的介电常数大于所述挡墙的制备材料的介电常数。
- 根据权利要求10所述的触控显示装置，其中，所述阵列基板包括：衬底基板；设置于所述衬底基板上的源漏极；覆盖所述源漏极的第一平坦层；其中，所述第一平坦层上设置有连接金属层以及覆盖所述连接金属层的第二平坦层，所述阳极、所述第一触控电极以及所述像素定义层设置于所述第二平坦层上，所述连接金属层与所述阳极以及所述源漏极电连接。
- 根据权利要求17所述的触控显示装置，其中，所述连接金属层包括相间隔的第一连接块和第二连接块，所述第一连接块与所述阳极以及所述源漏极电连接，所述第二连接块与所述第一触控电极电连接，所述驱动模块与所述第二连接块电连接。
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