WO2021027161A1 - 一种oled显示面板及显示装置 - Google Patents
一种oled显示面板及显示装置 Download PDFInfo
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- WO2021027161A1 WO2021027161A1 PCT/CN2019/118602 CN2019118602W WO2021027161A1 WO 2021027161 A1 WO2021027161 A1 WO 2021027161A1 CN 2019118602 W CN2019118602 W CN 2019118602W WO 2021027161 A1 WO2021027161 A1 WO 2021027161A1
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- layer
- touch
- electrode
- driving
- display panel
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Classifications
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- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
- G06F3/0448—Details of the electrode shape, e.g. for enhancing the detection of touches, for generating specific electric field shapes, for enhancing display quality
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- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
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- G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
- G06F3/0443—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a single layer of sensing electrodes
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- G06F3/0445—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using two or more layers of sensing electrodes, e.g. using two layers of electrodes separated by a dielectric layer
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
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- H10K50/84—Passivation; Containers; Encapsulations
- H10K50/844—Encapsulations
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
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- H10K59/40—OLEDs integrated with touch screens
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
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- G06F2203/04102—Flexible digitiser, i.e. constructional details for allowing the whole digitising part of a device to be flexed or rolled like a sheet of paper
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K77/00—Constructional details of devices covered by this subclass and not covered by groups H10K10/80, H10K30/80, H10K50/80 or H10K59/80
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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Definitions
- This application relates to the field of display technology, and in particular to an OLED display panel and a display device.
- the existing OLED display panel has the problem of poor touch performance and needs to be improved.
- the present application provides an OLED display panel and a display device to alleviate the technical problem of poor touch performance of the existing OLED display panel.
- An embodiment of the application provides an OLED display panel, which includes:
- the touch function layer is arranged on the flexible substrate
- the driving circuit layer is arranged on the touch function layer
- the light-emitting function layer is arranged on the driving circuit layer;
- the encapsulation layer is arranged on the light-emitting function layer.
- the touch function layer includes:
- a touch electrode layer the touch electrode layer is patterned to form self-capacitive touch electrodes arranged in an array.
- the touch function layer includes:
- a touch electrode layer is patterned to form driving electrodes and sensing electrodes arranged in an array
- At least one signal bridge layer is patterned to form a signal bridge line, and the signal bridge line is used to bridge the driving electrode or the sensing electrode;
- the insulating layer is located between the touch electrode layer and the signal bridge layer.
- the signal bridge layer is formed by at least one conductive layer in the driving circuit layer.
- the signal bridge layer is formed by a light shielding layer in the driving circuit layer.
- the signal bridge layer is formed by a second metal layer in the driving circuit layer.
- the touch function layer includes:
- a driving electrode layer, the driving electrode layer is patterned to form driving electrodes arranged in an array
- a sensing electrode layer, the sensing electrode layer is patterned to form sensing electrodes arranged in an array
- the insulating layer is located between the driving electrode layer and the sensing electrode layer.
- the material of the touch function layer to form the touch electrode is a transparent conductive material.
- the material of the touch function layer to form the touch electrode is metal, and the touch electrode is formed with a gap in the light exit area.
- the touch electrodes are in a grid shape.
- An embodiment of the present application also provides a display device, which includes an OLED display panel, and the OLED display panel includes:
- the touch function layer is arranged on the flexible substrate
- the driving circuit layer is arranged on the touch function layer
- the light-emitting function layer is arranged on the driving circuit layer;
- the encapsulation layer is arranged on the light-emitting function layer.
- the touch function layer includes:
- a touch electrode layer the touch electrode layer is patterned to form self-capacitive touch electrodes arranged in an array.
- the touch function layer includes:
- a touch electrode layer is patterned to form driving electrodes and sensing electrodes arranged in an array
- At least one signal bridge layer is patterned to form a signal bridge line, and the signal bridge line is used to bridge the driving electrode or the sensing electrode;
- the insulating layer is located between the touch electrode layer and the signal bridge layer.
- the signal bridge layer is formed by at least one conductive layer in the driving circuit layer.
- the signal bridge layer is formed by a light shielding layer in the driving circuit layer.
- the signal bridge layer is formed by a second metal layer in the driving circuit layer.
- the touch function layer includes:
- a driving electrode layer, the driving electrode layer is patterned to form driving electrodes arranged in an array
- a sensing electrode layer, the sensing electrode layer is patterned to form sensing electrodes arranged in an array
- the insulating layer is located between the driving electrode layer and the sensing electrode layer.
- the material of the touch function layer forming the touch electrode is a transparent conductive material.
- the material of the touch function layer to form the touch electrode is metal, and the touch electrode is formed with a notch in the light exit area.
- the touch electrode is in a grid shape.
- the OLED display panel includes a flexible substrate, a touch function layer provided on the flexible substrate, a drive circuit layer provided on the touch function layer, and a drive circuit layer
- the light-emitting function layer on the upper surface, and the encapsulation layer provided on the light-emitting function layer.
- Its touch function layer adopts self-capacitive touch electrode or mutual-capacitive touch electrode design, and improves light transmittance by using transparent electrodes or setting gaps.
- the touch function layer is arranged under the driving circuit layer and the light-emitting function layer.
- the touch function layer can be prepared under a high-temperature process, which avoids the influence of the low-temperature process characteristics of the organic light-emitting material of the light-emitting function layer and improves the touch performance .
- FIG. 1 is a schematic diagram of the first film structure of the touch function layer provided by an embodiment of the application.
- FIG. 2 is a schematic diagram of a second film structure of the touch function layer provided by an embodiment of the application.
- FIG. 3 is a schematic diagram of a third film structure of the touch function layer provided by an embodiment of the application.
- FIG. 4 is a schematic diagram of a fourth film structure of the touch function layer provided by an embodiment of the application.
- FIG. 5 is a first schematic diagram of driving electrodes provided by an embodiment of the application.
- FIG. 6 is a second schematic diagram of driving electrodes provided by an embodiment of the application.
- FIG. 7 is a schematic diagram of a fifth film layer structure of the touch function layer provided by an embodiment of the application.
- the embodiment of the present application can alleviate the technical problem of poor touch performance of the existing OLED display panel.
- the OLED display panel 100 provided in this embodiment includes:
- the touch function layer 10 is disposed on the flexible substrate 11;
- the driving circuit layer 20 is disposed on the touch function layer 10;
- the light-emitting function layer 30 is disposed on the driving circuit layer 20;
- the encapsulation layer 40 is disposed on the light-emitting function layer 30.
- This embodiment provides an OLED display panel including a flexible substrate, a touch function layer provided on the flexible substrate, a drive circuit layer provided on the touch function layer, and a light emitting function layer provided on the drive circuit layer, And an encapsulation layer disposed on the light-emitting function layer; the touch function layer adopts a self-capacitive touch electrode or a mutual-capacitive touch electrode design, and improves light transmittance by using transparent electrodes or setting gaps; this embodiment
- the touch function layer is arranged under the driving circuit layer and the light emitting function layer, and the touch function layer can be prepared under a high temperature process, which avoids the influence of the low temperature process characteristics of the organic light emitting material of the light emitting function layer and improves the touch performance.
- the flexible substrate 11 is disposed on a glass substrate, and the material of the flexible substrate may be a flexible polymer such as polyimide.
- the touch function layer 10 includes:
- the barrier layer 12 is disposed on the flexible substrate 11;
- a touch electrode layer 13 which is patterned to form driving electrodes and sensing electrodes arranged in an array
- At least one signal bridge layer is patterned to form signal bridge wires
- the protective layer 14 is formed on the touch electrode layer 13.
- the driving electrode and the sensing electrode are arranged in the same layer to form a mutual capacitive touch electrode.
- the mutual-capacitive touch electrode is to make the horizontal electrode and the vertical electrode with conductive material on the glass surface, and the capacitor will be formed at the intersection of the two groups of electrodes, that is, the two groups of electrodes respectively constitute the two poles of the capacitor.
- the finger touches the capacitive screen it affects the coupling between the two electrodes near the touch point, thereby changing the capacitance between the two electrodes.
- the horizontal electrodes send out excitation signals in turn, and all the vertical electrodes receive signals at the same time. In this way, the capacitance value of the intersection of all the horizontal and vertical electrodes can be obtained, that is, the capacitance of the two-dimensional plane of the entire touch screen. According to the two-dimensional capacitance change data of the touch screen, the coordinates of each touch point can be calculated.
- the driving circuit layer 20 includes:
- the buffer layer 21 is formed on the protective layer 14;
- the active layer 22 is formed on the buffer layer 21 and patterned to form a doped region and a channel region;
- the first insulating layer 23 is formed on the active layer 22 and the buffer layer 21;
- the first metal layer 24 is formed on the first insulating layer 23 and is patterned to form the first electrode plate of the storage capacitor;
- the second insulating layer 25 is formed on the first metal layer 24;
- the second metal layer 26 is formed on the second insulating layer 25 and is patterned to form a second electrode plate of the storage capacitor;
- An interlayer insulating layer 27 is formed on the second metal layer 26 and the second insulating layer 25, and patterned to form first via holes;
- the source-drain layer 28 is formed on the interlayer insulating layer 27 and patterned to form source, drain, and source-drain lines;
- the planarization layer 29 is formed on the source drain layer 28 and the interlayer insulating layer 27, and is patterned to form a second via hole.
- the doped region may be blocked by the corresponding first metal layer 24 and the patterned first electrode plate to block the channel region, and connect to both sides of the channel region.
- the region is formed by ion doping process.
- the source electrode and the drain electrode are connected to the doped region of the active layer 22 through a first via hole formed by patterning the interlayer insulating layer 27.
- the signal bridge layer is formed by the second metal layer 26 in the driving circuit layer 20.
- the second metal layer 26 is further patterned with a signal bridge wire 261, and the signal bridge wire 261 is used to bridge the driving electrode or the sensing electrode.
- the signal bridge wire 261 is used to bridge the driving electrode 131.
- the second insulating layer 25 is patterned with a third via hole, and the driving electrode 131 is connected to the signal bridge wire 261 through the third via hole.
- the material of the touch electrode is a transparent conductive material.
- the transparent conductive material may be one of metal oxides such as nano silver wires, graphene, and indium tin oxide.
- the light-emitting functional layer 30 includes:
- the pixel electrode layer 31 is formed on the planarization 29 and patterned to form pixel electrodes;
- the pixel defining layer 32 is formed on the pixel electrode layer 31, and is patterned with openings, and the openings are used to define the light-emitting area of the light-emitting body;
- the light-emitting layer 33 is formed in the light-emitting area defined by the pixel defining layer 32;
- the cathode layer 34 is formed on the light-emitting layer 33 and the pixel defining layer 32.
- the pixel electrode is connected to the drain electrode through a second via hole formed by the planarization layer 27.
- the light-emitting functional layer 30 further includes a hole injection layer and a hole transport layer located between the pixel electrode layer 31 and the light-emitting layer 33, and a hole transport layer located between the cathode layer 33 and the light-emitting layer 33.
- the electron injection layer and the electron transport layer between the light-emitting layer 33 are described.
- the encapsulation layer 40 includes:
- the first inorganic encapsulation layer 41 is formed on the light-emitting function layer 30;
- the organic encapsulation layer 42 is formed on the first inorganic encapsulation layer 41;
- the second inorganic encapsulation layer 43 is formed on the organic encapsulation layer 42.
- both the first inorganic encapsulation layer 41 and the second inorganic encapsulation layer 43 may adopt chemical vapor deposition (CVD), physical vapor deposition (PVD) or atomic layer deposition (ALD) processes.
- CVD chemical vapor deposition
- PVD physical vapor deposition
- ALD atomic layer deposition
- the material of the first inorganic encapsulation layer 41 and the second inorganic encapsulation layer 43 may be one of silicon oxide, silicon nitride, and silicon oxynitride.
- the organic encapsulation layer 42 may be coated on the first inorganic encapsulation layer 41 by any process of inkjet printing, spraying, and coating.
- the material of the organic encapsulation layer 42 may be one of epoxy and acrylic.
- the glass substrate under the flexible substrate 11 can be peeled off by a laser lift-off process.
- FIG. 2 it is a schematic diagram of the second film structure of the touch function layer in the OLED display panel. Compared with FIG. 1, FIG. 2 only shows the touch function layer and part of the driving circuit layer. .
- the touch function layer includes 10:
- the barrier layer 12 is arranged on the flexible substrate 11;
- a touch electrode layer 13 which is patterned to form driving electrodes and sensing electrodes arranged in an array
- At least one signal bridge layer is patterned to form signal bridge wires
- the protective layer 14 is disposed on the touch electrode layer 13.
- the driving electrodes and the sensing electrodes are arranged in the same layer to form a mutual capacitive touch electrode.
- the driving circuit layer 20 includes a light shielding layer 210 and an active layer 22 on the protective layer 14, and a buffer layer between the active layer 23 and the light shielding layer 210 twenty one.
- the material of the light shielding layer 210 is metal.
- the active layer 22 is patterned to form a doped region and a channel region.
- the signal bridge layer is formed by the light shielding layer 210 in the driving circuit layer 20.
- the light shielding layer 210 is patterned to form the signal bridge wire 261, and the signal bridge wire 261 is used to bridge the driving electrode or the sensing electrode.
- the signal bridge wire 261 described in FIG. 2 is used to bridge the driving electrode 131.
- the signal bridge wire 261 is connected to the driving electrode 131 through a via hole formed by patterning the protective layer 14.
- the material of the touch electrode is a transparent conductive material.
- FIG. 3 it is a schematic diagram of the third film structure of the touch function layer in an OLED display panel. Compared with FIG. 1, FIG. 3 only shows a schematic diagram of the film structure of the touch function layer. .
- the touch function layer 10 includes:
- the barrier layer 12 is formed on the flexible substrate 11;
- a touch electrode layer 13 is formed on the barrier layer 12, and the touch electrode layer 13 is patterned to form driving electrodes and sensing electrodes arranged in an array;
- At least one signal bridge layer 17, and the signal bridge layer 17 is patterned to form a signal bridge line 261;
- the insulating layer 16 is located between the touch electrode layer 13 and the signal bridge layer 17;
- the protective layer 14 is formed on the signal bridge layer 17.
- the driving electrode and the sensing electrode are arranged in the same layer to form a mutual capacitive touch electrode.
- the signal bridge wire 261 is used to bridge the driving electrode or the sensing electrode.
- the signal bridge wire 261 is used to bridge the driving electrode 131.
- the insulating layer 16 is patterned with via holes, and the via holes are used to connect the signal bridge wire 261 and the driving electrode 131.
- the material of the insulating layer 16 may be silicon nitride, silicon oxide or a combination of both.
- the signal bridge layer 17 is disposed on the touch electrode layer 13 and the insulating layer 16.
- the touch electrode layer 13 is disposed on the signal bridge layer 17 and the insulating layer 16.
- the material of the touch electrode is a transparent conductive material.
- FIG. 4 it is a schematic diagram of the fourth film structure of the touch function layer in an OLED display panel. Compared with FIG. 1, FIG. 4 only shows a schematic diagram of the film structure of the touch function layer. .
- the touch function layer 10 includes:
- the barrier layer 12 is formed on the flexible substrate 11;
- a driving electrode layer 13 which is patterned to form driving electrodes 131 arranged in an array
- sensing electrode layer 15 which is patterned to form sensing electrodes 151 arranged in an array
- the insulating layer 16 is located between the driving electrode 13 and the sensing electrode 15;
- the protective layer 14 is formed on the sensing electrode layer 15.
- the driving electrode 131 and the sensing electrode 151 are arranged in layers to form a mutual capacitive touch electrode.
- the sensing electrode 151 is disposed on the insulating layer 16 and the driving electrode 131.
- the driving electrode device may also be placed on the insulating layer and the sensing electrode.
- the material of the insulating layer 16 may be silicon nitride, silicon oxide or a combination of both.
- the material of the driving electrode 131 and the sensing electrode 151 is metal. Due to the opacity of the metal material, the driving electrode 131 and the sensing electrode 151 in this embodiment are formed in the light exit area There is a gap, as shown in FIG. 5, taking the driving electrode 131 as an example, a gap 132 is formed on the driving electrode 131, and the gap 132 can allow the light of the corresponding light-emitting area to pass through and improve the light transmission Sex.
- the shape of the gap 132 may be one of a circle, a triangle, a square, a rectangle, etc. As shown in FIG. 5, the gap is a circle.
- the notches formed by the driving electrodes 131 and the sensing electrodes 151 in the light exit area are in a grid shape. As shown in FIG. 6, taking the driving electrodes 131 as an example, each driving electrode 131 is Four notches 132 are formed. Each of the notches 132 has the same shape and is rectangular. The notches 132 are combined to form a grid. The grid design is more conducive to light transmission.
- FIG. 7 it is a schematic diagram of the fifth film structure of the touch function layer in an OLED display panel. Compared with FIG. 1, FIG. 7 only shows a schematic diagram of the film structure of the touch function layer. .
- the touch function layer 10 includes:
- the barrier layer 12 is formed on the flexible substrate 11;
- a touch electrode layer 13 which is patterned to form self-capacitive touch electrodes 131 arranged in an array;
- the protective layer 14 is formed on the touch electrode layer 13.
- the self-capacitive touch electrode is an array of horizontal and vertical electrodes made of a conductive material on the glass surface. These horizontal and vertical electrodes respectively form a capacitor with the ground. This capacitor is commonly referred to as self-capacitance, that is, an electrode pair Ground capacitance.
- self-capacitance that is, an electrode pair Ground capacitance.
- the self-capacitance screen detects the horizontal and vertical electrode arrays in sequence, and determines the horizontal and vertical coordinates according to the changes in capacitance before and after the touch, and then combines them into planar touch coordinates.
- the self-capacitance scanning method is equivalent to projecting the touch points on the touch screen to the X-axis and Y-axis directions respectively, and then calculate the coordinates in the X-axis and Y-axis directions respectively, and finally combine them into the coordinates of the touch point.
- the material of the touch electrode is a transparent conductive material.
- the embodiment of the present application also provides a method for manufacturing an OLED display panel, which includes the following steps:
- S1 provide a glass substrate, and prepare a flexible substrate on the glass substrate;
- preparing a touch function layer on a flexible substrate including a barrier layer, a touch electrode layer, an insulating layer, a signal bridge layer, and a protective layer prepared in sequence, and the method for preparing the touch function layer only
- the touch function layer including a barrier layer, a touch electrode layer, an insulating layer, a signal bridge layer, and a protective layer prepared in sequence, and the method for preparing the touch function layer only
- the driving circuit layer including a buffer layer, an active layer, a first insulating layer, a first metal layer, a second insulating layer, a second metal layer, and a layer Inter-insulating layer, source-drain layer and planarization layer, when preparing the metal wiring of the driving circuit layer, adopt the avoidance design to avoid the light exit area and improve the light transmittance;
- the light-emitting functional layer including a pixel electrode layer, a pixel defining layer, a light-emitting layer, and a cathode layer that are sequentially prepared;
- the embodiment of the present application further provides a display device, the display device includes an OLED display panel, and the OLED display panel includes:
- the touch function layer is arranged on the flexible substrate
- the driving circuit layer is arranged on the touch function layer
- the light-emitting function layer is arranged on the driving circuit layer;
- the encapsulation layer is arranged on the light-emitting function layer.
- the touch function layer includes:
- a touch electrode layer the touch electrode layer is patterned to form self-capacitive touch electrodes arranged in an array.
- the touch function layer includes:
- a touch electrode layer is patterned to form driving electrodes and sensing electrodes arranged in an array
- At least one signal bridge layer is patterned to form a signal bridge line, and the signal bridge line is used to bridge the driving electrode or the sensing electrode;
- the insulating layer is located between the touch electrode layer and the signal bridge layer.
- the signal bridge layer is formed by at least one conductive layer in the driving circuit layer.
- the signal bridge layer is formed by a light shielding layer in the driving circuit layer.
- the signal bridge layer is formed by a second metal layer in the driving circuit layer.
- the touch function layer includes:
- a driving electrode layer, the driving electrode layer is patterned to form driving electrodes arranged in an array
- a sensing electrode layer, the sensing electrode layer is patterned to form sensing electrodes arranged in an array
- the insulating layer is located between the driving electrode layer and the sensing electrode layer.
- the material of the touch function layer forming the touch electrode is a transparent conductive material.
- the material of the touch function layer to form the touch electrode is metal, and the touch electrode is formed with a gap in the light exit area.
- the touch electrodes are in a grid shape.
- the present application provides an OLED display panel, a preparation method thereof, and a display device.
- the OLED display panel includes a flexible substrate, a touch function layer provided on the flexible substrate, and a drive circuit layer provided on the touch function layer.
- the touch function layer is arranged under the driving circuit layer and the light-emitting function layer.
- the touch function layer can be prepared under a high-temperature process, which avoids the low-temperature process characteristics of the organic light-emitting material of the light-emitting function layer. Impact, improve touch performance.
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Abstract
本申请提供一种OLED显示面板及显示装置,其OLED显示面板包括层叠设置的柔性衬底、触控功能层、驱动电路层、发光功能层和封装层;本申请把触控功能层设置在驱动电路层以及发光功能层下,可以在高温制程下先制备触控功能层,避免了受发光功能层有机发光材料低温制程特性的影响,提高了触控性能。
Description
本申请涉及显示技术领域,尤其涉及一种OLED显示面板及显示装置。
近年随着显示技术的快速发展,OLED柔性显示引起了人们极大关注,具有可折叠特征的柔性面板已成为后续智能手机发展的趋势,提升手机的弯折性能主要从减少产品整体厚度和增加产品抗弯折性能来考虑。为了达到更高的产品的抗弯折强度,除了在材料和制程工艺上做出了改变,结构上也需要做出调整。
由于OLED有机发光材料的低温制程特性,使得很多关键制程在低温下表现不佳,例如触控功能层和封装层,采用低温制程制备与高温制程比起来防水氧性能效果要差很多,并且触控功能层的触控性能也会受到影响。
因此,现有OLED显示面板存在触控性能不佳的问题需要改进。
本申请提供一种OLED显示面板及显示装置,以缓解现有OLED显示面板触控性能不佳的技术问题。
为解决上述问题,本申请提供的技术方案如下:
本申请实施例提供一种OLED显示面板,其包括:
柔性衬底;
触控功能层,设置于所述柔性衬底上;
驱动电路层,设置于所述触控功能层上;
发光功能层,设置于所述驱动电路层上;
封装层,设置于所述发光功能层上。
在本申请实施例提供的OLED显示面板中,所述触控功能层包括:
一触控电极层,所述触控电极层图案化形成阵列排布的自容式触控电极。
在本申请实施例提供的OLED显示面板中,所述触控功能层包括:
一触控电极层,所述触控电极层图案化形成阵列排布的驱动电极和感应电极;
至少一信号桥接层,所述信号桥接层图案化形成信号桥接线,所述信号桥接线用于桥接所述驱动电极或所述感应电极;
绝缘层,位于所述触控电极层和所述信号桥接层之间。
在本申请实施例提供的OLED显示面板中,所述信号桥接层由所述驱动电路层中的至少一层导电层形成。
在本申请实施例提供的OLED显示面板中,所述信号桥接层由所述驱动电路层中的遮光层形成。
在本申请实施例提供的OLED显示面板中,所述信号桥接层由所述驱动电路层中的第二金属层形成。
在本申请实施例提供的OLED显示面板中,所述触控功能层包括:
一驱动电极层,所述驱动电极层图案化形成阵列排布的驱动电极;
一感应电极层,所述感应电极层图案化形成阵列排布的感应电极;
绝缘层,位于所述驱动电极层和所述感应电极层之间。
在本申请实施例提供的OLED显示面板中,所述触控功能层形成触控电极的材料,为透明导电材料。
在本申请实施例提供的OLED显示面板中,所述触控功能层形成触控电极的材料为金属,所述触控电极在出光区形成有缺口。
在本申请实施例提供的OLED显示面板中,所述触控电极呈网格状。
本申请实施例还提供一种显示装置,其包括OLED显示面板,所述OLED显示面板包括:
柔性衬底;
触控功能层,设置于所述柔性衬底上;
驱动电路层,设置于所述触控功能层上;
发光功能层,设置于所述驱动电路层上;
封装层,设置于所述发光功能层上。
在本申请实施例提供的显示装置中,所述触控功能层包括:
一触控电极层,所述触控电极层图案化形成阵列排布的自容式触控电极。
在本申请实施例提供的显示装置中,所述触控功能层包括:
一触控电极层,所述触控电极层图案化形成阵列排布的驱动电极和感应电极;
至少一信号桥接层,所述信号桥接层图案化形成信号桥接线,所述信号桥接线用于桥接所述驱动电极或所述感应电极;
绝缘层,位于所述触控电极层和所述信号桥接层之间。
在本申请实施例提供的显示装置中,所述信号桥接层由所述驱动电路层中的至少一层导电层形成。
在本申请实施例提供的显示装置中,所述信号桥接层由所述驱动电路层中的遮光层形成。
在本申请实施例提供的显示装置中,所述信号桥接层由所述驱动电路层中的第二金属层形成。
在本申请实施例提供的显示装置中,所述触控功能层包括:
一驱动电极层,所述驱动电极层图案化形成阵列排布的驱动电极;
一感应电极层,所述感应电极层图案化形成阵列排布的感应电极;
绝缘层,位于所述驱动电极层和所述感应电极层之间。
在本申请实施例提供的显示装置中,所述触控功能层形成触控电极的材料,为透明导电材料。
在本申请实施例提供的显示装置中,所述触控功能层形成触控电极的材料为金属,所述触控电极在出光区形成有缺口。
在本申请实施例提供的显示装置中,所述触控电极呈网格状。
本申请提供一种OLED显示面板及显示装置,其OLED显示面板包括柔性衬底,设置在柔性衬底上的触控功能层,设置在触控功能层上的驱动电路层,设置在驱动电路层上的发光功能层,以及设置在发光功能层上的封装层。其触控功能层采用自容式触控电极或互容式触控电极设计,并通过使用透明电极或设置缺口的方式提高透光性。本申请把触控功能层设置在驱动电路层以及发光功能层下方,可以在高温制程下先制备触控功能层,避免了受发光功能层有机发光材料低温制程特性的影响,提高了触控性能。
为了更清楚地说明实施例或现有技术中的技术方案,下面将对实施例或现有技术描述中所需要使用的附图作简单介绍,显而易见地,下面描述中的附图仅仅是申请的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其他的附图。
图1为本申请实施例提供的触控功能层的第一种膜层结构示意图。
图2为本申请实施例提供的触控功能层的第二种膜层结构示意图。
图3为本申请实施例提供的触控功能层的第三种膜层结构示意图。
图4为本申请实施例提供的触控功能层的第四种膜层结构示意图。
图5为本申请实施例提供的驱动电极的第一种示意图。
图6为本申请实施例提供的驱动电极的第二种示意图。
图7为本申请实施例提供的触控功能层的第五种膜层结构示意图。
以下各实施例的说明是参考附加的图示,用以例示本申请可用以实施的特定实施例。本申请所提到的方向用语,例如[上]、[下]、[前]、[后]、[左]、[右]、[内]、[外]、[侧面]等,仅是参考附加图式的方向。因此,使用的方向用语是用以说明及理解本申请,而非用以限制本申请。在图中,结构相似的单元是用以相同标号表示。
针对现有OLED显示面板触控性能不佳的技术问题,本申请实施例可以缓解。
在一种实施例中,如图1所示,本实施例提供的OLED显示面板100,包括:
柔性衬底11;
触控功能层10,设置于所述柔性衬底11上;
驱动电路层20,设置于所述触控功能层10上;
发光功能层30,设置于所述驱动电路层20上;
封装层40,设置于所述发光功能层30上。
本实施例提供一种OLED显示面板,包括柔性衬底,设置在柔性衬底上的触控功能层,设置在触控功能层上的驱动电路层,设置在驱动电路层上的发光功能层,以及设置在发光功能层上的封装层;其触控功能层采用自容式触控电极或互容式触控电极设计,并通过使用透明电极或设置缺口的方式提高透光性;本实施例把触控功能层设置在驱动电路层以及发光功能层下方,可以在高温制程下先制备触控功能层,避免了受发光功能层有机发光材料低温制程特性的影响,提高了触控性能。
在一种实施例中,所述柔性衬底11设置在玻璃基底上,所述柔性衬底的材料可以为聚酰亚胺等柔性聚合物。
在一种实施例中,如图1所示,所述触控功能层10包括:
阻隔层12,设置于所述柔性衬底11上;
一触控电极层13,所述触控电极层图案化形成阵列排布的驱动电极和感应电极;
至少一信号桥接层,所述信号桥接层图案化形成信号桥接线;
保护层14,所述保护层14形成于所述触控电极层13上。
在一种实施例中,所述驱动电极和所述感应电极同层设置,形成互容式触控电极。
互容式触控电极是,在玻璃表面用导电材料制作横向电极与纵向电极,两组电极交叉的地方将会形成电容,也即这两组电极分别构成了电容的两极。当手指触摸到电容屏时,影响了触摸点附近两个电极之间的耦合,从而改变了这两个电极之间的电容量。检测互电容大小时,横向的电极依次发出激励信号,纵向的所有电极同时接收信号,这样可以得到所有横向和纵向电极交汇点的电容值大小,即整个触摸屏的二维平面的电容大小。根据触摸屏二维电容变化量数据,可以计算出每一个触摸点的坐标。
在一种实施例中,如图1所示,所述驱动电路层20包括:
缓冲层21,形成于所述保护层14上;
有源层22,形成于所述缓冲层21上,图案化形成掺杂区和沟道区;
第一绝缘层23,形成于所述有源层22及所述缓冲层21上;
第一金属层24,形成于所述第一绝缘层23上,图案化形成存储电容第一电极板;
第二绝缘层25,形成于所述第一金属层24上;
第二金属层26,形成于所述第二绝缘层25上,图案化形成存储电容第二电极板;
层间绝缘层27,形成于所述第二金属层26及所述第二绝缘层25上,图案化形成有第一过孔;
源漏极层28,形成于层间绝缘层27上,图案化形成源极、漏极和源漏极线;
平坦化层29,形成于所述源漏极层28及所述层间绝缘层27上,图案化形成第二过孔。
在一种实施例中,所述掺杂区可以由对应的所述第一金属层24,图案化形成的所述第一电极板阻挡所述沟道区,并对所述沟道区两侧的区域进行离子掺杂工艺而形成。
在一种实施例中,所述源极和所述漏极通过所述层间绝缘层27图案化形成的第一过孔,连接到所述有源层22的掺杂区。
在一种实施例中,所述信号桥接层由所述驱动电路层20中的第二金属层26形成。
在一种实施例中,所述第二金属层26还图案化形成有信号桥接线261,所述信号桥接线261用于桥接所述驱动电极或所述感应电极。
在一种实施例中,如图1所示,所述信号桥接线261用于桥接所述驱动电极131。
在一种实施例中,所述第二绝缘层25图案化形成有第三过孔,所述驱动电极131通过所述第三过孔连接到所述信号桥接线261。
在一种实施例中,所述触控电极的材料为透明导电材料。
在一种实施例中,所述透明导电材料可以是纳米银线、石墨烯、氧化铟锡等金属氧化物中的一种。
在一种实施例中,如图1所示,所述发光功能层30包括:
像素电极层31,形成于所述平坦化29上,图案化形成像素电极;
像素定义层32,形成于所述像素电极层31上,图案化形成有开孔,所述开孔用于定义出发光主体的发光区域;
发光层33,形成于所述像素定义层32定义出来的发光区域内;
阴极层34,形成于所述发光层33及所述像素定义层32上。
在一种实施例中,所述像素电极通过所述平坦化层27形成的第二过孔连接所述漏极。
在一种实施例中,所述发光功能层30还包括,位于所述像素电极层31和所述发光层33之间的空穴注入层和空穴传输层,位于所述阴极层33和所述发光层33之间的电子注入层和电子传输层。
在一种实施例中,如图2所示,所述封装层40包括:
第一无机封装层41,形成于发光功能层30上;
有机封装层42,形成于所述第一无机封装层41上;
第二无机封装层43,形成于所述有机封装层42上。
在一种实施例中,所述第一无机封装层41和第二无机封装层43均可以采用化学气相沉积法(CVD)、物理气相沉积法(PVD)或原子层沉积法(ALD)的工艺方法在所述发光功能层30上沉积。
在一种实施例中,所述第一无机封装层41和第二无机封装层43的材料可以是氧化硅、氮化硅和氮氧化硅中的一种。
在一种实施例中,所述有机封装层42可以通过喷墨打印、喷涂和涂布中的任一工艺涂覆在所述第一无机封装层41上。
在一种实施例中,有机封装层42的材料可以为环氧系和丙烯酸系中的一种。
在一种实施例中,在所述封装层40制备完成后,所述柔性衬底11下面的玻璃基板,可以通过激光剥离工艺剥离掉。
在一种实施例中,如图2所示,为OLED显示面板中触控功能层的第二种膜层结构示意图,对比图1,图2仅画出了触控功能层和部分驱动电路层。
在一种实施例中,所述触控功能层包括10:
阻隔层12,设置于柔性衬底11上;
一触控电极层13,所述触控电极层图案化形成阵列排布的驱动电极和感应电极;
至少一信号桥接层,所述信号桥接层图案化形成信号桥接线;
保护层14,设置于所述触控电极层13上。
在一种实施例中,所述驱动电极所述感应电极同层设置,形成互容式触控电极。
在一种实施例中,所述驱动电路层20包括位于所述保护层14上的遮光层210和有源层22,以及位于所述有源层23和所述遮光层210之间的缓冲层21。
在一种实施例中,所述遮光层210的材料为金属。
在一种实施例中,所述有源层22图案化形成掺杂区和沟道区。
在一种实施例中,所述信号桥接层由所述驱动电路层20中的所述遮光层210形成。
在一种实施例中,所述遮光层210图案化形成所述信号桥接线261,所述信号桥接线261用于桥接所述驱动电极或所述感应电极。
在一种实施例中,如图2所述所述信号桥接线261用于桥接所述驱动电极131。
在一种实施例中,所述信号桥接线261通过所述保护层14图案化形成的过孔,连接所述驱动电极131。
在一种实施例中,所述触控电极的材料为透明导电材料。
在一种实施例中,如图3所示,为OLED显示面板中触控功能层的第三种膜层结构示意图,对比图1,图3仅画出了触控功能层的膜层结构示意图。
在一种实施例中,所述触控功能层10包括:
阻隔层12,形成于柔性衬底11上;
一触控电极层13,形成于所述阻隔层12上,所述触控电极层13图案化形成阵列排布的驱动电极和感应电极;
至少一信号桥接层17,所述信号桥接层17图案化形成信号桥接线261;
绝缘层16,位于所述触控电极层13和所述信号桥接层17之间;
保护层14,形成于所述信号桥接层17上。
在一种实施例中,所述驱动电极和所述感应电极同层设置,形成互容式触控电极。
在一种实施例中,所述信号桥接线261用于桥接所述驱动电极或感应电极。
在一种实施例中,如图3所示,所述信号桥接线261用于桥接所述驱动电极131。
在一种实施例中,所述绝缘层16图案化形成有过孔,所述过孔用于所述信号桥接线261与驱动电极131连接。
在一种实施例中,所述绝缘层16的材料可以是氮化硅、氧化硅或两者的组合。
在一种实施例中,如图3所示,所述信号桥接层17设置于所述触控电极层13及所述绝缘层16上。
在一种实施例中,所述触控电极层13设置于所述信号桥接层17及所述绝缘层16上。
在本实施例中,所述触控电极的材料为透明导电材料。
在一种实施例中,如图4所示,为OLED显示面板中触控功能层的第四种膜层结构示意图,对比图1,图4仅画出了触控功能层的膜层结构示意图。
在一种实施例中,所述触控功能层10包括:
阻隔层12,形成于柔性衬底11上;
一驱动电极层13,所述驱动电极层13图案化形成阵列排布的驱动电极131;
一感应电极层15,所述感应电极层15图案化形成阵列排布的感应电极151;
绝缘层16,位于所述驱动电极13和所述感应电极15之间;
保护层14,形成于所述感应电极层15上。
在一种实施例中,所述驱动电极131和所述感应电极151分层设置,形成互容式触控电极。
在一种实施例中,如图4所示,所述感应电极151设置于所述绝缘层16及所述驱动电极131上。
在一种实施例中,所述驱动电极设也可以置于所述绝缘层及所述感应电极上。
在一种实施例中,所述绝缘层16材料可以是氮化硅、氧化硅或两者的组合。
在一种实施例中,所述驱动电极131和所述感应电极151的材料为金属,因金属材料的不透光性,本实施例中的驱动电极131和所述感应电极151在出光区形成有缺口,如图5所示,以所述驱动电极131为例,在所述驱动电极131上形成有缺口132,所述缺口132可以让对应的出光区的光穿过,提高光的透过性。
在一种实施例中,所述缺口132的形状可以是圆形、三角形、正方形、矩形等的一种,如图5所述,缺口为圆形。
在一种实施例中,所述驱动电极131和所述感应电极151在出光区形成的缺口呈网格状,如图6所示,以所述驱动电极131为例,每个驱动电极131上都形成有有四个缺口132,每个所述缺口132的形状相同且为矩形,所述缺口132组合到一块呈网格状,该网格状设计更有利于光的透过。
在一种实施例中,如图7所示,为OLED显示面板中触控功能层的第五种膜层结构示意图,对比图1,图7仅画出了触控功能层的膜层结构示意图。
在一种实施例中,所述触控功能层10包括:
阻隔层12,形成于柔性衬底11上;
一触控电极层13,所述触控电极层图案化形成阵列排布的自容式触控电极131;
保护层14,形成于所述触控电极层13上。
自容式触控电极是,在玻璃表面用一种导电材料制作成横向与纵向电极阵列,这些横向和纵向的电极分别与地构成电容,这个电容就是通常所说的自电容,也就是电极对地的电容。当手指触摸到电容屏时,手指的电容将会叠加到屏体电容上,使屏体电容量增加。在触摸检测时,自电容屏依次分别检测横向与纵向电极阵列,根据触摸前后电容的变化,分别确定横向坐标和纵向坐标,然后组合成平面的触摸坐标。自电容的扫描方式,相当于把触摸屏上的触摸点分别投影到X轴和Y轴方向,然后分别在X轴和Y轴方向计算出坐标,最后组合成触摸点的坐标。
在一种实施例中,所述触控电极的材料为透明导电材料。
在一种实施例中,本申请实施例还提供了一种OLED显示面板的制备方法,其包括以下步骤:
S1,提供玻璃基板,在玻璃基板上制备柔性衬底;
S2,在柔性衬底上制备触控功能层,所述触控功能层包括依次制备的阻隔层、触控电极层、绝缘层、信号桥接层和保护层,该触控功能层制备方法仅以上述实施例中其一为例制备;
S3,在触控功能层上制备驱动电路层,所述驱动电路层包括依次制备的缓冲层、有源层、第一绝缘层、第一金属层、第二绝缘层、第二金属层、层间绝缘层、源漏极层和平坦化层,在制备驱动电路层金属走线时,采用避让设计,避开出光区,提高透光性;
S4,在驱动电路层上制备发光功能层,所述发光功能层包括依次制备的像素电极层、像素定义层、发光层和阴极层;
S5,在发光功能层上制备封装层,所述封装层包括依次制备的第一无机封装层、有机封装层和第二无机封装层;
S6,剥离掉玻璃基板。
同时,在一种实施例中,本申请实施例还提供了一种显示装置,该显示装置包括OLED显示面板,其OLED显示面板包括:
柔性衬底;
触控功能层,设置于所述柔性衬底上;
驱动电路层,设置于所述触控功能层上;
发光功能层,设置于所述驱动电路层上;
封装层,设置于所述发光功能层上。
在一种实施例中,所述触控功能层包括:
一触控电极层,所述触控电极层图案化形成阵列排布的自容式触控电极。
在一种实施例中,所述触控功能层包括:
一触控电极层,所述触控电极层图案化形成阵列排布的驱动电极和感应电极;
至少一信号桥接层,所述信号桥接层图案化形成信号桥接线,所述信号桥接线用于桥接所述驱动电极或所述感应电极;
绝缘层,位于所述触控电极层和所述信号桥接层之间。
在一种实施例中,所述信号桥接层由所述驱动电路层中的至少一层导电层形成。
在一种实施例中,所述信号桥接层由所述驱动电路层中的遮光层形成。
在一种实施例中,所述信号桥接层由所述驱动电路层中的第二金属层形成。
在一种实施例中,所述触控功能层包括:
一驱动电极层,所述驱动电极层图案化形成阵列排布的驱动电极;
一感应电极层,所述感应电极层图案化形成阵列排布的感应电极;
绝缘层,位于所述驱动电极层和所述感应电极层之间。
在一种实施例中,所述触控功能层形成触控电极的材料,为透明导电材料。
在一种实施例中,所述触控功能层形成触控电极的材料为金属,所述触控电极在出光区形成有缺口。
在一种实施例中,所述触控电极呈网格状。
根据上述实施例可知:
本申请提供一种OLED显示面板及其制备方法以及显示装置,该OLED显示面板包括柔性衬底,设置在柔性衬底上的触控功能层,设置在触控功能层上的驱动电路层,设置在驱动电路层上的发光功能层,以及设置在发光功能层上的封装层;其触控功能层采用自容式触控电极或互容式触控电极设计,并通过使用透明电极或设置缺口的方式提高透光性;本申请把触控功能层设置在驱动电路层以及发光功能层下方,可以在高温制程下先制备触控功能层,避免了受发光功能层有机发光材料低温制程特性的影响,提高了触控性能。
综上所述,虽然本申请已以优选实施例揭露如上,但上述优选实施例并非用以限制本申请,本领域的普通技术人员,在不脱离本申请的精神和范围内,均可作各种更动与润饰,因此本申请的保护范围以权利要求界定的范围为准。
Claims (20)
- 一种OLED显示面板,其包括:柔性衬底;触控功能层,设置于所述柔性衬底上;驱动电路层,设置于所述触控功能层上;发光功能层,设置于所述驱动电路层上;封装层,设置于所述发光功能层上。
- 根据权利要求1所述的OLED显示面板,其中,所述触控功能层包括:一触控电极层,所述触控电极层图案化形成阵列排布的自容式触控电极。
- 根据权利要求1所述的OLED显示面板,其中,所述触控功能层包括:一触控电极层,所述触控电极层图案化形成阵列排布的驱动电极和感应电极;至少一信号桥接层,所述信号桥接层图案化形成信号桥接线,所述信号桥接线用于桥接所述驱动电极或所述感应电极;绝缘层,位于所述触控电极层和所述信号桥接层之间。
- 根据权利要求3所述的OLED显示面板,其中,所述信号桥接层由所述驱动电路层中的至少一层导电层形成。
- 根据权利要求4所述的OLED显示面板,其中,所述信号桥接层由所述驱动电路层中的遮光层形成。
- 根据权利要求4所述的OLED显示面板,其中,所述信号桥接层由所述驱动电路层中的第二金属层形成。
- 根据权利要求1所述的OLED显示面板,其中,所述触控功能层包括:一驱动电极层,所述驱动电极层图案化形成阵列排布的驱动电极;一感应电极层,所述感应电极层图案化形成阵列排布的感应电极;绝缘层,位于所述驱动电极层和所述感应电极层之间。
- 根据权利要求1所述的OLED显示面板,其中,所述触控功能层形成触控电极的材料,为透明导电材料。
- 根据权利要求1所述的OLED显示面板,其中,所述触控功能层形成触控电极的材料为金属,所述触控电极在出光区形成有缺口。
- 根据权利要求9所述的OLED显示面板,其中,所述触控电极呈网格状。
- 一种显示装置,其包括OLED显示面板,所述OLED显示面板包括:柔性衬底;触控功能层,设置于所述柔性衬底上;驱动电路层,设置于所述触控功能层上;发光功能层,设置于所述驱动电路层上;封装层,设置于所述发光功能层上。
- 根据权利要求11所述的显示装置,其中,所述触控功能层包括:一触控电极层,所述触控电极层图案化形成阵列排布的自容式触控电极。
- 根据权利要求11所述的显示装置,其中,所述触控功能层包括:一触控电极层,所述触控电极层图案化形成阵列排布的驱动电极和感应电极;至少一信号桥接层,所述信号桥接层图案化形成信号桥接线,所述信号桥接线用于桥接所述驱动电极或所述感应电极;绝缘层,位于所述触控电极层和所述信号桥接层之间。
- 根据权利要求13所述的显示装置,其中,所述信号桥接层由所述驱动电路层中的至少一层导电层形成。
- 根据权利要求14所述的显示装置,其中,所述信号桥接层由所述驱动电路层中的遮光层形成。
- 根据权利要求14所述的显示装置,其中,所述信号桥接层由所述驱动电路层中的第二金属层形成。
- 根据权利要求11所述的显示装置,其中,所述触控功能层包括:一驱动电极层,所述驱动电极层图案化形成阵列排布的驱动电极;一感应电极层,所述感应电极层图案化形成阵列排布的感应电极;绝缘层,位于所述驱动电极层和所述感应电极层之间。
- 根据权利要求11所述的显示装置,其中,所述触控功能层形成触控电极的材料,为透明导电材料。
- 根据权利要求11所述的显示装置,其中,所述触控功能层形成触控电极的材料为金属,所述触控电极在出光区形成有缺口。
- 根据权利要求19所述的显示装置,其中,所述触控电极呈网格状。
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US20210359020A1 (en) | 2021-11-18 |
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