WO2021172954A3 - 표면 돌기가 형성된 구형 무기 입자 및 그 제조 방법 - Google Patents

표면 돌기가 형성된 구형 무기 입자 및 그 제조 방법 Download PDF

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Publication number
WO2021172954A3
WO2021172954A3 PCT/KR2021/002502 KR2021002502W WO2021172954A3 WO 2021172954 A3 WO2021172954 A3 WO 2021172954A3 KR 2021002502 W KR2021002502 W KR 2021002502W WO 2021172954 A3 WO2021172954 A3 WO 2021172954A3
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WO
WIPO (PCT)
Prior art keywords
inorganic particles
manufacturing same
bumps formed
spherical inorganic
surface bumps
Prior art date
Application number
PCT/KR2021/002502
Other languages
English (en)
French (fr)
Other versions
WO2021172954A2 (ko
Inventor
남재도
김나연
박인경
황의석
김동학
Original Assignee
비드오리진(주)
성균관대학교산학협력단
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 비드오리진(주), 성균관대학교산학협력단 filed Critical 비드오리진(주)
Priority to EP21760538.5A priority Critical patent/EP3957699A4/en
Priority to CN202180003490.9A priority patent/CN113891924B/zh
Priority to US17/611,806 priority patent/US20220235252A1/en
Priority to JP2021568911A priority patent/JP7281113B2/ja
Publication of WO2021172954A2 publication Critical patent/WO2021172954A2/ko
Publication of WO2021172954A3 publication Critical patent/WO2021172954A3/ko

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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1409—Abrasive particles per se
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1436—Composite particles, e.g. coated particles
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C09K3/1463—Aqueous liquid suspensions

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Composite Materials (AREA)
  • Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Silicon Compounds (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)

Abstract

본 발명에 따른 무기 입자는 결정질과 무정형의 소립자의 응집으로 구성되며, 구형이고 매끄러운 표면을 나타낸다. 무기 입자의 구형 외관, 낮은 결정도 및 좁은 입도분포는 CMP 공정에서 스크래치 결함을 줄이는데 더욱 유리하다. 또한 무기물 입자 표면의 소립자들이 더 많은 활성 부위를 제공하여 연마율(removal rate)이 우수하므로 차세대 CMP 연마재로 유리하다.
PCT/KR2021/002502 2020-02-27 2021-02-26 표면 돌기가 형성된 구형 무기 입자 및 그 제조 방법 WO2021172954A2 (ko)

Priority Applications (4)

Application Number Priority Date Filing Date Title
EP21760538.5A EP3957699A4 (en) 2020-02-27 2021-02-26 SPHERICAL INORGANIC PARTICLES WITH CURVED SURFACE SHAPED THEREON AND PROCESS FOR THEIR PRODUCTION
CN202180003490.9A CN113891924B (zh) 2020-02-27 2021-02-26 具有表面凸块的球状无机颗粒以及其制备方法
US17/611,806 US20220235252A1 (en) 2020-02-27 2021-02-26 Spherical inorganic particles having surface bumps formed thereon, and method of manufacturing same
JP2021568911A JP7281113B2 (ja) 2020-02-27 2021-02-26 表面突起が形成された球状無機粒子及びその製造方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2020-0023993 2020-02-27
KR1020200023993A KR102261151B1 (ko) 2020-02-27 2020-02-27 표면 돌기가 형성된 구형 무기 입자 및 그 제조 방법

Publications (2)

Publication Number Publication Date
WO2021172954A2 WO2021172954A2 (ko) 2021-09-02
WO2021172954A3 true WO2021172954A3 (ko) 2021-10-21

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2021/002502 WO2021172954A2 (ko) 2020-02-27 2021-02-26 표면 돌기가 형성된 구형 무기 입자 및 그 제조 방법

Country Status (7)

Country Link
US (1) US20220235252A1 (ko)
EP (1) EP3957699A4 (ko)
JP (1) JP7281113B2 (ko)
KR (1) KR102261151B1 (ko)
CN (1) CN113891924B (ko)
TW (1) TW202134183A (ko)
WO (1) WO2021172954A2 (ko)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
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KR20220153787A (ko) * 2021-05-12 2022-11-21 성균관대학교산학협력단 무기 입자를 포함하는 수분산액
KR102541883B1 (ko) * 2022-11-11 2023-06-13 비드오리진(주) 고성능 평탄화용 연마입자 및 이를 포함하는 슬러리

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Also Published As

Publication number Publication date
US20220235252A1 (en) 2022-07-28
JP2022534203A (ja) 2022-07-28
JP7281113B2 (ja) 2023-05-25
EP3957699A2 (en) 2022-02-23
CN113891924B (zh) 2023-03-31
TW202134183A (zh) 2021-09-16
WO2021172954A2 (ko) 2021-09-02
EP3957699A4 (en) 2022-12-28
KR102261151B1 (ko) 2021-06-07
CN113891924A (zh) 2022-01-04

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