WO2021172954A3 - 표면 돌기가 형성된 구형 무기 입자 및 그 제조 방법 - Google Patents

표면 돌기가 형성된 구형 무기 입자 및 그 제조 방법 Download PDF

Info

Publication number
WO2021172954A3
WO2021172954A3 PCT/KR2021/002502 KR2021002502W WO2021172954A3 WO 2021172954 A3 WO2021172954 A3 WO 2021172954A3 KR 2021002502 W KR2021002502 W KR 2021002502W WO 2021172954 A3 WO2021172954 A3 WO 2021172954A3
Authority
WO
WIPO (PCT)
Prior art keywords
inorganic particles
manufacturing same
bumps formed
spherical inorganic
surface bumps
Prior art date
Application number
PCT/KR2021/002502
Other languages
English (en)
French (fr)
Other versions
WO2021172954A2 (ko
Inventor
남재도
김나연
박인경
황의석
김동학
Original Assignee
비드오리진(주)
성균관대학교산학협력단
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 비드오리진(주), 성균관대학교산학협력단 filed Critical 비드오리진(주)
Priority to US17/611,806 priority Critical patent/US20220235252A1/en
Priority to EP21760538.5A priority patent/EP3957699A4/en
Priority to CN202180003490.9A priority patent/CN113891924B/zh
Priority to JP2021568911A priority patent/JP7281113B2/ja
Publication of WO2021172954A2 publication Critical patent/WO2021172954A2/ko
Publication of WO2021172954A3 publication Critical patent/WO2021172954A3/ko

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1409—Abrasive particles per se
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1436—Composite particles, e.g. coated particles
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C09K3/1463—Aqueous liquid suspensions

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Composite Materials (AREA)
  • Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Silicon Compounds (AREA)

Abstract

본 발명에 따른 무기 입자는 결정질과 무정형의 소립자의 응집으로 구성되며, 구형이고 매끄러운 표면을 나타낸다. 무기 입자의 구형 외관, 낮은 결정도 및 좁은 입도분포는 CMP 공정에서 스크래치 결함을 줄이는데 더욱 유리하다. 또한 무기물 입자 표면의 소립자들이 더 많은 활성 부위를 제공하여 연마율(removal rate)이 우수하므로 차세대 CMP 연마재로 유리하다.
PCT/KR2021/002502 2020-02-27 2021-02-26 표면 돌기가 형성된 구형 무기 입자 및 그 제조 방법 WO2021172954A2 (ko)

Priority Applications (4)

Application Number Priority Date Filing Date Title
US17/611,806 US20220235252A1 (en) 2020-02-27 2021-02-26 Spherical inorganic particles having surface bumps formed thereon, and method of manufacturing same
EP21760538.5A EP3957699A4 (en) 2020-02-27 2021-02-26 SPHERICAL INORGANIC PARTICLES WITH CURVED SURFACE SHAPED THEREON AND PROCESS FOR THEIR PRODUCTION
CN202180003490.9A CN113891924B (zh) 2020-02-27 2021-02-26 具有表面凸块的球状无机颗粒以及其制备方法
JP2021568911A JP7281113B2 (ja) 2020-02-27 2021-02-26 表面突起が形成された球状無機粒子及びその製造方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2020-0023993 2020-02-27
KR1020200023993A KR102261151B1 (ko) 2020-02-27 2020-02-27 표면 돌기가 형성된 구형 무기 입자 및 그 제조 방법

Publications (2)

Publication Number Publication Date
WO2021172954A2 WO2021172954A2 (ko) 2021-09-02
WO2021172954A3 true WO2021172954A3 (ko) 2021-10-21

Family

ID=76374503

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2021/002502 WO2021172954A2 (ko) 2020-02-27 2021-02-26 표면 돌기가 형성된 구형 무기 입자 및 그 제조 방법

Country Status (7)

Country Link
US (1) US20220235252A1 (ko)
EP (1) EP3957699A4 (ko)
JP (1) JP7281113B2 (ko)
KR (1) KR102261151B1 (ko)
CN (1) CN113891924B (ko)
TW (1) TW202134183A (ko)
WO (1) WO2021172954A2 (ko)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20220153787A (ko) * 2021-05-12 2022-11-21 성균관대학교산학협력단 무기 입자를 포함하는 수분산액
KR102541883B1 (ko) * 2022-11-11 2023-06-13 비드오리진(주) 고성능 평탄화용 연마입자 및 이를 포함하는 슬러리

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20040080935A (ko) * 2002-02-20 2004-09-20 니혼 미크로 코팅 가부시끼 가이샤 연마 슬러리
JP2008169102A (ja) * 2006-10-12 2008-07-24 Catalysts & Chem Ind Co Ltd 金平糖状シリカ系ゾルおよびその製造方法
KR20150013558A (ko) * 2012-05-22 2015-02-05 디에스엠 아이피 어셋츠 비.브이. 하이브리드 유기-무기 나노-입자
KR20150093999A (ko) * 2014-02-10 2015-08-19 서울과학기술대학교 산학협력단 메조다공성 실리카/세리아―실리카 복합체 및 이의 제조방법
KR20190058715A (ko) * 2015-03-31 2019-05-29 니끼 쇼꾸바이 카세이 가부시키가이샤 실리카계 복합 미립자 분산액, 그의 제조 방법 및 실리카계 복합 미립자 분산액을 포함하는 연마용 슬러리

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2608583B1 (fr) * 1986-12-19 1990-12-07 Rhone Poulenc Chimie Oxyde cerique a nouvelles caracteristiques morphologiques et son procede d'obtention
FR2617153B1 (fr) * 1987-06-26 1991-04-05 Rhone Poulenc Chimie Procede d'obtention d'un oxyde cerique et oxyde cerique a nouvelles caracteristiques morphologiques
JPH10154672A (ja) * 1996-09-30 1998-06-09 Hitachi Chem Co Ltd 酸化セリウム研磨剤及び基板の研磨法
FR2800300B1 (fr) * 1999-11-02 2002-12-20 Rhodia Chimie Sa Materiau mesostructure integrant des particules de dimension nanometrique
TWI323741B (en) * 2004-12-16 2010-04-21 K C Tech Co Ltd Abrasive particles, polishing slurry, and producing method thereof
CN101284952B (zh) * 2007-04-12 2011-03-23 北京有色金属研究总院 化学机械抛光磨料粒子CeO2及其制备方法
EP2205689A1 (en) * 2007-09-28 2010-07-14 Coswell S.p.A. Liquid cleaning composition and method of cleaning a surface
KR101075966B1 (ko) * 2010-03-09 2011-10-21 주식회사 엘지화학 결정성 산화세륨 및 이의 제조 방법
KR101492234B1 (ko) * 2013-08-08 2015-02-13 주식회사 케이씨텍 산화세륨 입자 제조 방법, 이에 의한 산화세륨 입자 및 이를 포함하는 연마 슬러리
CN103641147B (zh) * 2013-12-05 2015-08-19 内蒙古科技大学 一种微米级椭球形氧化铈的制备方法
JP6130316B2 (ja) * 2014-03-11 2017-05-17 信越化学工業株式会社 研磨組成物及び研磨方法並びに研磨組成物の製造方法
TWD167467S (zh) * 2014-10-17 2015-05-01 劉錦松 自行車兒童椅架
WO2017010557A1 (ja) * 2015-07-14 2017-01-19 エム・テクニック株式会社 酸化物粒子の製造方法
CN105948097B (zh) * 2016-04-22 2018-09-07 广州市威格林环保科技有限公司 一种球形二氧化铈
CN105948098B (zh) * 2016-04-22 2017-11-14 广东工业大学 一种球形氧化镧
CN106145177B (zh) * 2016-07-10 2018-02-13 九江学院 一种小粒径二氧化铈纳米晶的制备方法
CN106587131B (zh) * 2016-11-23 2018-05-18 四川大学 一种球形纳米CeO2抛光粉的制备方法
CN108249468A (zh) * 2016-12-28 2018-07-06 安集微电子科技（上海）股份有限公司 一种氧化铈晶体的制备方法及其在化学机械抛光液中的应用
KR102530813B1 (ko) 2018-08-27 2023-05-11 (주)아모레퍼시픽 피부 투명도 및 칙칙함 개선용 조성물

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20040080935A (ko) * 2002-02-20 2004-09-20 니혼 미크로 코팅 가부시끼 가이샤 연마 슬러리
JP2008169102A (ja) * 2006-10-12 2008-07-24 Catalysts & Chem Ind Co Ltd 金平糖状シリカ系ゾルおよびその製造方法
KR20150013558A (ko) * 2012-05-22 2015-02-05 디에스엠 아이피 어셋츠 비.브이. 하이브리드 유기-무기 나노-입자
KR20150093999A (ko) * 2014-02-10 2015-08-19 서울과학기술대학교 산학협력단 메조다공성 실리카/세리아―실리카 복합체 및 이의 제조방법
KR20190058715A (ko) * 2015-03-31 2019-05-29 니끼 쇼꾸바이 카세이 가부시키가이샤 실리카계 복합 미립자 분산액, 그의 제조 방법 및 실리카계 복합 미립자 분산액을 포함하는 연마용 슬러리

Also Published As

Publication number Publication date
CN113891924B (zh) 2023-03-31
EP3957699A2 (en) 2022-02-23
EP3957699A4 (en) 2022-12-28
WO2021172954A2 (ko) 2021-09-02
JP2022534203A (ja) 2022-07-28
KR102261151B1 (ko) 2021-06-07
US20220235252A1 (en) 2022-07-28
JP7281113B2 (ja) 2023-05-25
CN113891924A (zh) 2022-01-04
TW202134183A (zh) 2021-09-16

Similar Documents

Publication Publication Date Title
WO2021172954A3 (ko) 표면 돌기가 형성된 구형 무기 입자 및 그 제조 방법
JP6586963B2 (ja) 超微細研磨材生体高分子柔軟研磨膜及びその製造方法
KR102163145B1 (ko) 형상화 연마 입자 및 형성 방법
US8337282B2 (en) Polishing pad
US20010005666A1 (en) Chemical mechanical polishing methods
SG143116A1 (en) Slurry composition for final polishing of silicon wafers and method for final polishing of silicon wafers using the same
CN113683962B (zh) 二氧化硅研磨抛光剂的制备方法
TW201305067A (zh) 透過研磨與蝕刻而成之光散射物件
MY165952A (en) Method of manufacturing glass substrate for magnetic disk and method of manufacturing magnetic disk
KR20170118147A (ko) 연마물품 및 이용방법
CN111500258A (zh) 研磨微粒及其制造方法、研磨剂
CN108587478B (zh) 一种改性纳米二氧化硅复合抛光液及其应用
US20140073136A1 (en) Semiconductor device manufacturing method
CN102515230A (zh) 一种氧化铝基质的汽车漆面抛光原料制作方法
CN204149007U (zh) 一种研磨垫调整器
WO2003057624A1 (fr) Matiere spherique en nano-graphite et procede de preparation
CN111171788A (zh) 研磨微粒及其制造方法、研磨剂
MY146813A (en) Method of manufacturing a substrate for a mask blank, method of manufacturing a mask blank, and method of manufacturing a mask
CN102873590A (zh) 黑曜石抛光方法
CN206662971U (zh) 一种便于拆卸的零件加工用打磨装置
CN104531068A (zh) 一种超硬磨料的涂覆方法
CN206653282U (zh) 一种磨削内、外转角型材的钎焊金刚石磨轮
CN201842886U (zh) 钽溅射环
CN203993508U (zh) 柔性研磨网片
CN111823126B (zh) 一种陶瓷片式元器件倒角工艺

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 21760538

Country of ref document: EP

Kind code of ref document: A2

ENP Entry into the national phase

Ref document number: 2021568911

Country of ref document: JP

Kind code of ref document: A

ENP Entry into the national phase

Ref document number: 2021760538

Country of ref document: EP

Effective date: 20211116

NENP Non-entry into the national phase

Ref country code: DE