MY146813A - Method of manufacturing a substrate for a mask blank, method of manufacturing a mask blank, and method of manufacturing a mask - Google Patents
Method of manufacturing a substrate for a mask blank, method of manufacturing a mask blank, and method of manufacturing a maskInfo
- Publication number
- MY146813A MY146813A MYPI20063535A MYPI20063535A MY146813A MY 146813 A MY146813 A MY 146813A MY PI20063535 A MYPI20063535 A MY PI20063535A MY PI20063535 A MYPI20063535 A MY PI20063535A MY 146813 A MY146813 A MY 146813A
- Authority
- MY
- Malaysia
- Prior art keywords
- substrate
- mask blank
- manufacturing
- abrasive cloth
- mask
- Prior art date
Links
- 239000000758 substrate Substances 0.000 title abstract 7
- 238000004519 manufacturing process Methods 0.000 title abstract 4
- 239000004744 fabric Substances 0.000 abstract 6
- 238000005498 polishing Methods 0.000 abstract 2
- 239000012530 fluid Substances 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 230000002093 peripheral effect Effects 0.000 abstract 1
- 238000007517 polishing process Methods 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/60—Substrates
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
- B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
- B24B7/22—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
- B24B7/24—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding or polishing glass
- B24B7/242—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding or polishing glass for plate glass
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1454—Abrasive powders, suspensions and pastes for polishing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
- G03F1/84—Inspecting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/30625—With simultaneous mechanical treatment, e.g. mechanico-chemical polishing
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Mechanical Engineering (AREA)
- Ceramic Engineering (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Inorganic Chemistry (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Optical Filters (AREA)
- Grinding Of Cylindrical And Plane Surfaces (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
TO IMPROVE A POLISHING PROCESS SO AS TO DECREASE A HIGH POLISH RESISTANCE AT THE TIME OF POLISHING A LARGE-SIZED SUBSTRATE (4), ENABLING TO EFFICIENTLY POLISH THE SAME UNDER A HIGHER LOAD. A METHOD OF MANUFACTURING A SUBSTRATE (4) FOR A MASK BLANK INCLUDING A PROCESS OF MOVING A SURFACE PLATE (1) APPLIED WITH AN ABRASIVE CLOTH (2) AND THE SUBSTRATE (4) FOR A MASK BLANK, RELATIVELY EACH OTHER IN A CONDITION THAT A PREDETERMINED LOAD IS APPLIED THERETO WHILE PROVIDING POLISHING FLUID (11) BETWEEN CONTACT SURFACES OF THE ABRASIVE CLOTH (2) AND THE SUBSTRATE (4) FOR A MASK BLANK TO POLISH THE SUBSTRATE (4) FOR A MASK BLANK. IN THE SURFACE PLATE (1) APPLIED WITH THE ABRASIVE CLOTH (2), GROOVES (1A) ARE FORMED ON A SURFACE WHERE AN ABRASIVE CLOTH (2) IS TO BE APPLIED AND EACH OF THE GROOVES (1A) IS SHAPED IN A PREDETERMINED SHAPE AT LEAST AT A PERIPHERAL EDGE OF AN OPENING THEREOF IN A CROSS SECTION. THE ABRASIVE CLOTH (2) IS APPLIED ALONG A FLAT SURFACE (1B) TO BE APPLIED WITH THE ABRASIVE CLOTH, AND A CONFIGURATION OF THE GROOVES (1A). UNDER THE CIRCUMSTANCES, THE SUBSTRATE (4) IS POLISHED.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005214220 | 2005-07-25 |
Publications (1)
Publication Number | Publication Date |
---|---|
MY146813A true MY146813A (en) | 2012-09-28 |
Family
ID=38013044
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MYPI20063535A MY146813A (en) | 2005-07-25 | 2006-07-25 | Method of manufacturing a substrate for a mask blank, method of manufacturing a mask blank, and method of manufacturing a mask |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP5429824B2 (en) |
KR (1) | KR101334012B1 (en) |
MY (1) | MY146813A (en) |
TW (1) | TWI413573B (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101681344B1 (en) * | 2009-02-13 | 2016-11-30 | 호야 가부시키가이샤 | Photomask blank and fabrication method therefor, and photomask and fabrication method therefor |
US9522454B2 (en) * | 2012-12-17 | 2016-12-20 | Seagate Technology Llc | Method of patterning a lapping plate, and patterned lapping plates |
CN113178386A (en) * | 2021-04-22 | 2021-07-27 | 上海新昇半导体科技有限公司 | Chemical mechanical polishing method |
CN115805523A (en) * | 2022-12-29 | 2023-03-17 | 西安奕斯伟材料科技有限公司 | Fixed plate, polishing device and polishing method |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4178403A (en) * | 1977-08-04 | 1979-12-11 | Konishiroku Photo Industry Co., Ltd. | Mask blank and mask |
DE69511068T2 (en) | 1994-02-22 | 2000-04-06 | Minnesota Mining And Mfg. Co. | ABRASIVE ARTICLE, METHOD FOR PRODUCING THE SAME, AND METHOD FOR APPLYING THE SAME IN FINISHING |
US5942356A (en) * | 1996-03-30 | 1999-08-24 | Hoya Corporation | Phase shift mask and phase shift mask blank |
JPH09277163A (en) * | 1996-04-16 | 1997-10-28 | Sony Corp | Polishing method and polishing device |
US5876268A (en) * | 1997-01-03 | 1999-03-02 | Minnesota Mining And Manufacturing Company | Method and article for the production of optical quality surfaces on glass |
EP0964772A1 (en) * | 1997-03-07 | 1999-12-22 | Minnesota Mining And Manufacturing Company | Abrasive article for providing a clear surface finish on glass |
JPH11267961A (en) * | 1998-03-23 | 1999-10-05 | Sony Corp | Abrasive pad, polishing device and polishing method |
KR100322537B1 (en) * | 1999-07-02 | 2002-03-25 | 윤종용 | Blank mask and method for fabricating using the same |
JP2001018163A (en) * | 1999-07-06 | 2001-01-23 | Speedfam Co Ltd | Polishing pad |
US6251549B1 (en) * | 1999-07-19 | 2001-06-26 | Marc David Levenson | Generic phase shift mask |
EP1077108B1 (en) * | 1999-08-18 | 2006-12-20 | Ebara Corporation | Polishing method and polishing apparatus |
AU2001247171A1 (en) * | 2000-02-23 | 2001-09-03 | Nutool, Inc. | Pad designs and structures with improved fluid distribution |
JP2002254297A (en) * | 2001-02-28 | 2002-09-10 | Toyoda Mach Works Ltd | Lapping surface plate with spiral groove |
DE10303407A1 (en) * | 2003-01-27 | 2004-08-19 | Friedrich-Schiller-Universität Jena | Method and device for high-precision processing of the surface of an object, in particular for polishing and lapping semiconductor substrates |
JP4219718B2 (en) * | 2003-03-28 | 2009-02-04 | Hoya株式会社 | Manufacturing method of glass substrate for EUV mask blanks and manufacturing method of EUV mask blanks |
JP4481688B2 (en) * | 2003-04-10 | 2010-06-16 | Hoya株式会社 | Substrate processing apparatus, coating apparatus, coating method, and photomask manufacturing method |
JP2005066781A (en) * | 2003-08-26 | 2005-03-17 | Hoya Corp | Manufacturing method for glass substrate for electronic device, manufacturing method for mask blank, and manufacturing method for transfer mask |
US7018274B2 (en) * | 2003-11-13 | 2006-03-28 | Rohm And Haas Electronic Materials Cmp Holdings, Inc | Polishing pad having slurry utilization enhancing grooves |
-
2006
- 2006-07-21 KR KR1020060068422A patent/KR101334012B1/en active IP Right Grant
- 2006-07-25 TW TW095127055A patent/TWI413573B/en active
- 2006-07-25 MY MYPI20063535A patent/MY146813A/en unknown
-
2011
- 2011-06-22 JP JP2011138199A patent/JP5429824B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
KR20070013212A (en) | 2007-01-30 |
TWI413573B (en) | 2013-11-01 |
KR101334012B1 (en) | 2013-12-02 |
JP2011240482A (en) | 2011-12-01 |
JP5429824B2 (en) | 2014-02-26 |
TW200714411A (en) | 2007-04-16 |
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