WO2021093024A1 - 液晶面板及显示装置 - Google Patents

液晶面板及显示装置 Download PDF

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Publication number
WO2021093024A1
WO2021093024A1 PCT/CN2019/121175 CN2019121175W WO2021093024A1 WO 2021093024 A1 WO2021093024 A1 WO 2021093024A1 CN 2019121175 W CN2019121175 W CN 2019121175W WO 2021093024 A1 WO2021093024 A1 WO 2021093024A1
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WO
WIPO (PCT)
Prior art keywords
layer
substrate
spacer
liquid crystal
crystal panel
Prior art date
Application number
PCT/CN2019/121175
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English (en)
French (fr)
Inventor
余佳佳
Original Assignee
Tcl华星光电技术有限公司
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Publication of WO2021093024A1 publication Critical patent/WO2021093024A1/zh

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1343—Electrodes
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133357—Planarisation layers
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13398—Spacer materials; Spacer properties
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136222—Colour filters incorporated in the active matrix substrate

Definitions

  • This application relates to the technical field of liquid crystal display, and in particular to a liquid crystal panel and a display device.
  • the liquid crystal panel includes a first substrate and a second substrate arranged in a cell, and a liquid crystal layer located between the first substrate and the second substrate.
  • the spacer is located on the surface of the first substrate and extends to the second substrate for The role of supporting the thickness of the box.
  • the volume ratio of the liquid crystal and the spacer is uniform, filling the space in the liquid crystal cell, the liquid crystal will not peel off from the plastic frame, and the liquid crystal panel displays normally.
  • the flat layer in the conventional first substrate is made of polytetrafluoroethylene, the material is relatively soft, and the spacer is arranged on the surface of the flat layer. When the liquid crystal panel is pressed, the spacer compresses the flat layer downward, and the flat layer is compressed. The amount of deformation is larger, the elastic recovery is also faster, and the rebound speed of the liquid crystal is slower, resulting in a gap in the liquid crystal box, the liquid crystal falls off from the plastic frame, and vacuum bubbles are prone to appear.
  • the material of the flat layer on the surface of the first substrate is relatively soft.
  • the spacer is easy to be elastically compressed, and the liquid crystal is too late to rebound, causing gaps in the liquid crystal layer, and the liquid crystal falls off to form vacuum bubbles. Therefore, technical problems affecting the display quality of liquid crystal panels need to be improved.
  • the application provides a liquid crystal panel and a display device.
  • the material of the flat layer on the surface of the first substrate is relatively soft.
  • the spacer is easily compressed and the liquid crystal is too late to rebound, causing a gap in the liquid crystal layer, and the liquid crystal falls off to form a vacuum bubble, which affects the liquid crystal panel Display quality technical issues.
  • the present application provides a liquid crystal panel including a first substrate, a second substrate disposed opposite to the first substrate, and spacers located between the first substrate and the second substrate.
  • the first substrate includes a first substrate, a TFT array layer prepared on the first substrate, a color resist layer prepared on the TFT array layer, and a planarization layer prepared on the color resist layer , Prepared on the pixel electrode layer on the planarization layer; at the partition of the planarization layer, the pixel electrode layer is attached to the color set layer to form a recess, and one end of the spacer stands on the The surface of the depression.
  • the second substrate includes a second substrate, a light-shielding layer prepared on the second substrate, and a common electrode prepared on the light-shielding layer, and the other end of the spacer is supported on the common electrode.
  • the recessed portion is a step or a groove.
  • the side surface of the spacer is attached to the side wall of the recessed portion.
  • the cross-sectional shape of the spacer is an isosceles trapezoid or a boss.
  • the spacer is made of an elastic material, and after the first substrate and the second substrate are combined, the spacer undergoes elastic contraction and deformation due to compression.
  • the contact surface of the spacer and the common electrode is provided with a groove, and a corresponding position of the common electrode and the spacer is provided with a fitting corresponding to the groove.
  • Convex teeth are provided.
  • the protruding teeth are made of elastic material.
  • the TFT array layer includes a gate, a gate insulating layer covering the gate, an active layer located on the gate insulating layer, and sources located on the surface of the active layer and at both ends An electrode and a drain electrode, and a protective layer located on the active layer and covering the source electrode and the drain electrode.
  • the active layer includes a semiconductor layer and a doped layer on the surface of the semiconductor layer.
  • the area of the end face of the spacer standing on the first substrate is larger than the area of the end face of the spacer holding the second substrate.
  • an embodiment of the present application further provides a display device, the display device includes the above-mentioned liquid crystal panel, the liquid crystal panel includes a first substrate, a second substrate disposed opposite to the first substrate, and A spacer between the first substrate and the second substrate.
  • the first substrate includes a first substrate, a TFT array layer prepared on the first substrate, a color resist layer prepared on the TFT array layer, and a planarization layer prepared on the color resist layer , Prepared on the pixel electrode layer on the planarization layer; at the partition of the planarization layer, the pixel electrode layer is attached to the color set layer to form a recess, and one end of the spacer stands on the The surface of the depression.
  • the second substrate includes a second substrate, a light-shielding layer prepared on the second substrate, and a common electrode prepared on the light-shielding layer, and the other end of the spacer is supported on the common electrode.
  • the recessed portion is a step or a groove.
  • the side surface of the spacer is attached to the side wall of the recessed portion.
  • the cross-sectional shape of the spacer is an isosceles trapezoid or a boss.
  • the spacer is made of an elastic material, and after the first substrate and the second substrate are combined, the spacer undergoes elastic contraction and deformation due to compression.
  • the contact surface of the spacer and the common electrode is provided with a groove, and a corresponding position of the common electrode and the spacer is provided with a fitting corresponding to the groove.
  • Convex teeth are provided.
  • the protruding teeth are made of elastic material.
  • the TFT array layer includes a gate, a gate insulating layer covering the gate, an active layer located on the gate insulating layer, and sources located on the surface of the active layer and at both ends An electrode and a drain electrode, and a protective layer located on the active layer and covering the source electrode and the drain electrode.
  • the active layer includes a semiconductor layer and a doped layer on the surface of the semiconductor layer.
  • the area of the end face of the spacer standing on the first substrate is larger than the area of the end face of the spacer holding the second substrate.
  • One end of the spacer in the present application is located on the color resist layer in the first substrate, and the other end is embedded on the common electrode in the second substrate.
  • the material of the color resist layer is hard and not easy to be compressed, resulting in isolation.
  • the deformation of the cushion is small and the rebound speed is slow, which ensures that the deformation recovery speed of the spacer is close to the rebound speed of the liquid crystal, and ensures that the volume ratio of the liquid crystal and the spacer in the liquid crystal layer is uniform, filling the space in the liquid crystal cell ,
  • the liquid crystal will not peel off from the plastic frame, avoid the formation of vacuum bubbles, thereby improving the display quality of the liquid crystal panel.
  • FIG. 1 is a schematic structural diagram of a liquid crystal panel provided by an embodiment of the application.
  • FIG. 2 is a schematic diagram of another spacer structure according to an embodiment of the application.
  • FIG. 3 is a schematic diagram of another structure of a liquid crystal panel provided by an embodiment of the application.
  • This application aims to solve the problem that the flat layer on the surface of the first substrate in the prior art liquid crystal panel is relatively soft, and when the liquid crystal panel is pressed, the spacer is easily compressed elastically, and the liquid crystal is too late to rebound, causing gaps in the liquid crystal layer, and the liquid crystal falls off to form a vacuum bubble Therefore, the technical problem that affects the display quality of the liquid crystal panel can be solved by this embodiment.
  • the present application provides a liquid crystal panel 100, which includes a first substrate, a second substrate disposed opposite to the first substrate, and spacers 107 located between the first substrate and the second substrate;
  • the first substrate includes a first substrate 101, a TFT array layer prepared on the first substrate 101, a color resist layer 103 prepared on the TFT array layer, and a planarization layer 104 prepared on the color resist layer 103, which is prepared in planarization
  • the second substrate It includes a second substrate 109, a light-shielding layer 1084 prepared on the second substrate 109, and a common electrode 1081 prepared on the light-shielding layer 1084.
  • the other end of the spacer 107 is supported on the common electrode 1081 and stands on the first substrate.
  • the area of the end surface of the spacer 107 is larger than the area of the end surface of the spacer 107 supporting the second substrate.
  • the cross-sectional shape of the spacer 107 is preferably an isosceles trapezoid, the side surface of the spacer 107 forms a certain taper, and the taper is preferably 0° to 90°.
  • the spacer 107 is made of an elastic material, and the first substrate After being combined with the second substrate, the spacer 107 undergoes elastic contraction deformation due to pressure.
  • the elastic contraction deformation mainly occurs in the longitudinal direction of the spacer 107, and a small amount of elastic contraction deformation will cause the spacer 107 to move in the lateral direction.
  • the cross-sectional shape of the spacer 107 in this embodiment is not only an isosceles trapezoid, but also a boss shape. For the specific shape, refer to FIG. 2.
  • the end of the spacer 107 facing the first substrate is located on the recess 1051.
  • the recess 1051 is a step.
  • the width of the step is larger than that of the spacer 107.
  • the spacer 107 can be placed stably, and the side wall of the spacer 107 is attached to The side wall of the step, that is, the side surface of the spacer 107 is attached to the side wall of the recess 1051.
  • the end of the spacer 107 facing the second substrate is supported on the common electrode 1081, and the end surface of the spacer 107 is in planar contact with the common electrode 1081.
  • the TFT array layer in this embodiment includes a gate layer 1021 on the first substrate 101, a gate insulating layer 1022 on the first substrate 101 and covering the gate layer 1021, an active layer on the gate insulating layer 1022 1025, a source electrode 1026 and a drain electrode 1027 located on the surface of the active layer 1025 at both ends, and a protective layer 1028 located on the active layer 1025 and covering the source electrode 1026 and the drain electrode 1027.
  • the first substrate 101 is usually a glass substrate, but may also be a substrate of other materials, which is not limited here.
  • the gate layer 1021 is formed on the first substrate 101 by a physical vapor deposition method, and then a photolithography process is performed. The gate pattern is formed.
  • the material of the gate layer 1021 may be a metal material, such as copper (Cu), aluminum (Al), titanium (Ti), tantalum (Ta), tungsten (W), molybdenum (Mo), chromium (Cr), etc.
  • the gate insulating layer 1022 is formed on the gate layer 1021 and covers the gate layer 1021 and the first substrate 101.
  • the gate insulating layer 1022 is formed on the gate layer 1021 by a chemical vapor deposition method, and then annealed at 400° C. in a dry air atmosphere.
  • the material of the gate insulating layer 1021 is generally silicon oxide (SiOx), silicon nitride (SiNx), silicon oxynitride (SiON), or a sandwich structure of the three.
  • the active layer 1025 is formed on the gate insulating layer 1022, and the active layer 1025 and the gate layer 1021 are insulated from each other.
  • the active layer 1025 includes a stacked semiconductor layer 1023 and a doped layer 1024 on the surface of the semiconductor layer 1023.
  • the semiconductor layer 1023 is deposited by magnetron sputtering, metal organic chemical vapor deposition or pulsed laser evaporation.
  • an annealing process is performed at 400°C in a dry air atmosphere for about 0.5 hours. After the annealing process is completed, the semiconductor layer 1023 is etched using a wet etching process or a dry etching process using oxalic acid as an etching solution.
  • the doped layer 1024 is formed by chemical vapor deposition On the semiconductor layer 1023, the doped layer 1024 is doped with nitrogen ions, and can also be doped with phosphorus ions and boron ions to increase or decrease the electrical characteristics of the TFT array layer channel, reduce the barrier and power consumption, and increase the on-state current of the TFT array layer. .
  • a source 1026 and a drain 1027 are formed on the surface of the active layer 1025 and at both ends.
  • a protective layer 1028 is formed on the active layer 1025 and covering the source 1026 and the drain 1027.
  • the protective layer 1028 is a stacked SiN layer and SiO layer, first deposit the SiN layer, then deposit the SiO layer, after the SiN layer and SiO layer are deposited, the SiN layer and SiO layer need to be activated and hydrogenated with implanted ions to repair the dangling bonds of polysilicon, and then exposed and wet
  • the etching and photoresist stripping process completes the entire manufacturing process of the protective layer 1028, ensuring that the protective layer 1028 has good elasticity and stability, and bears less stress, will not damage the TFT film, and will not cause the TFT film to crack and peel.
  • the protective layer 1028 is provided with a pixel via hole at a corresponding position of the drain electrode 1027, and the pixel electrode 105 is in electrical contact with the drain electrode
  • the liquid crystal layer 106 located between the first substrate and the second substrate, includes a plastic frame, liquid crystal 1061, and spacers 107.
  • the plastic frame allows the glass on both sides of the liquid crystal 1061 to be tightly adhered; the liquid crystal 1061 is generally elliptical and follows The long axis direction is connected in series, the liquid crystal 1061 of each column is a liquid crystal domain, any two adjacent liquid crystal domains are independent of each other, and the boundary between any two adjacent liquid crystal domains is a continuously changing area.
  • the spacer The liquid crystal 203 around 107 is arranged around the spacer 107, and the deflection angle of the liquid crystal 1061 is determined by the magnitude of the electric field between the common electrode layer 1081 and the pixel electrode layer 105 located on both sides of the liquid crystal layer 106.
  • the second substrate includes a second substrate 109, a light-shielding layer 1084 prepared on the second substrate 109, and a common electrode 1081 prepared on the light-shielding layer 1084.
  • the light-shielding layer 1084 includes a first light-shielding layer 1082 and a second light-shielding layer 1083 to prevent
  • the backlight source produces light mixing after passing through the red, green, and blue color resist patterns in the liquid crystal layer 106 and the first substrate to avoid display abnormalities.
  • the first light-shielding layer 1082 and the second light-shielding layer 1083 have a light-reflecting effect. , It can reflect the light incident on the surface from the outside.
  • the material of the first light-shielding layer 1082 and the second light-shielding layer 1083 is preferably a black resin layer or a black matrix, which is prepared by exposing and developing the black resin layer or the black matrix through a light-shielding mask.
  • the common electrode layer 109 is usually a transparent conductive film of indium tin oxide, and the thickness is generally 20 nm to 40 nm.
  • the common electrode layer 109 is deposited by a sputtering method.
  • One end of the spacer 107 close to the second substrate is supported on the common electrode 1081.
  • the spacer 107 When the liquid crystal panel 100 is under pressure, the spacer 107 will move down. When the pressure on the liquid crystal panel 100 disappears, the spacer 107 will move up quickly and deform faster, causing the spacer 107 to move up quickly, for better To solve this problem, the applicant uses elastic contact where the spacer 107 and the common electrode 1081 want to contact.
  • the second substrate moves down, and the spacer 107 does not deform at the beginning.
  • the spacer 107 begins to deform, thus slowing down the spacer.
  • the speed and amount of deformation of the cushion 107 ensure that the deformation recovery speed of the spacer is close to the rebound speed of the liquid crystal, and the volume ratio of the liquid crystal and the spacer in the liquid crystal layer is uniform, filling the space in the liquid crystal cell , The liquid crystal will not peel off from the plastic frame, avoid the formation of vacuum bubbles, thereby improving the display quality of the liquid crystal panel.
  • an embodiment of the present application provides another structural schematic diagram of a liquid crystal panel.
  • the spacer 107 and the second substrate are in contact with elastic contact, and the spacer 107 and the common electrode 1081 are provided on the contact surface with elastic contact.
  • the common electrode 1081 and the spacer 107 are provided with protruding teeth 10811 corresponding to the groove 1071 and fitted therein.
  • the convex teeth 10811 are made of elastic material.
  • the convex teeth 10811 relieve a part of the stress of the spacer 107.
  • the upper surface of the spacer 107 has a small compression and the rebound speed is slower, ensuring the liquid crystal and the spacer 107 in the liquid crystal layer.
  • the volume ratio is uniform, filling the space in the liquid crystal box, the liquid crystal will not peel off from the plastic frame, avoiding the formation of vacuum bubbles, thereby improving the display quality of the liquid crystal panel.
  • a display device includes the above-mentioned liquid crystal panel, the liquid crystal panel includes a first substrate, a second substrate disposed opposite to the first substrate, and located between the first substrate and the second substrate The spacer; wherein the first substrate includes a first substrate, a TFT array layer prepared on the first substrate, a color resist layer prepared on the TFT array layer, a planarization layer prepared on the color resist layer, prepared in The pixel electrode layer on the planarization layer; at the partition of the planarization layer, the pixel electrode layer is attached to the color set layer to form a recess, and one end of the spacer stands on the surface of the recess; the second substrate includes a second substrate, A light-shielding layer is prepared on the second substrate, and a common electrode is prepared on the light-shielding layer, and the other end of the spacer is supported on the common electrode.
  • one end of the spacer in the present application is located on the color resist layer in the first substrate, and the other end is embedded on the common electrode in the second substrate.
  • the material of the color resist layer is harder. It is not easy to compress, resulting in small deformation of the spacer and slow rebound speed, which ensures that the deformation recovery speed of the spacer is close to the rebound speed of the liquid crystal, and ensures that the volume ratio of the liquid crystal and the spacer in the liquid crystal layer is uniform. Filling up the space in the liquid crystal cell, the liquid crystal will not peel off from the plastic frame, avoiding the formation of vacuum bubbles, thereby improving the display quality of the liquid crystal panel.

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Liquid Crystal (AREA)

Abstract

一种液晶面板（100）及显示装置，其中隔垫物（107）一端位于第一基板中色阻层（103）上，另一端嵌设于第二基板中公共电极（1081）上，当液晶面板（100）受压时，色阻层（103）材料较硬，不容易压缩，确保了隔垫物（107）的变形回复速度跟液晶（1061）的回弹速度接近，液晶层（106）中液晶（1061）和隔垫物（107）填满液晶盒内空间，液晶（1061）不会从胶框内剥离，避免了形成真空气泡，从而提高液晶面板（100）的显示品质。

Description

液晶面板及显示装置 技术领域
本申请涉及液晶显示的技术领域，尤其涉及一种液晶面板及显示装置。
 背景技术
液晶面板包括成盒设置的第一基板和第二基板，以及位于第一基板和第二基板之间的液晶层，隔垫物位于第一基板表面，并延伸至所述第二基板，用于支撑盒厚的作用。
在液晶盒中液晶和隔垫物的体积占比均匀，填满液晶盒内空间，液晶不会从胶框内剥离，液晶面板正常显示。由于常规第一基板中平坦层为聚四氟乙烯，材质较软，隔垫物设置在平坦层表面，液晶面板受压时，隔垫物向下压缩平坦层，平坦层被压缩，隔垫物变形量较大，弹性回复也较快，液晶回弹速度较慢，造成液晶盒内存在间隙，液晶从胶框中脱落，容易出现真空气泡。
综上所述，现有技术液晶面板中第一基板表面平坦层材质较软，在液晶面板受到压力，隔垫物容易弹性压缩，液晶来不及回弹，造成液晶层产生间隙，液晶脱落形成真空气泡，从而影响液晶面板显示品质的技术问题，需要改进。
 技术问题
本申请提供一种液晶面板及显示装置。现有技术液晶面板中第一基板表面平坦层材质较软，在液晶面板受到压力，隔垫物容易弹性压缩，液晶来不及回弹，造成液晶层产生间隙，液晶脱落形成真空气泡，从而影响液晶面板显示品质的技术问题。
 技术解决方案
为解决上述问题，本申请提供的技术方案如下：
本申请提供一种液晶面板，包括第一基板、与所述第一基板相对设置的第二基板、以及位于所述第一基板与所述第二基板之间的隔垫物。
其中，所述第一基板包括第一衬底、制备于所述第一衬底上TFT阵列层、制备于所述TFT阵列层上的色阻层、制备于所述色阻层上平坦化层，制备于所述平坦化层上像素电极层；在所述平坦化层的隔断处，所述像素电极层贴合于所述色组层上形成凹陷部，所述隔垫物一端站立于所述凹陷部的表面。
所述第二基板包括第二衬底、制备于所述第二衬底上遮光层、以及制备于所述遮光层上公共电极，所述隔垫物另一端顶持在所述公共电极上。
根据本申请一优选实施例，所述凹陷部为台阶或凹槽。
根据本申请一优选实施例，所述隔垫物的侧面贴合于所述凹陷部的侧壁。
根据本申请一优选实施例，所述隔垫物的截面形状为等腰梯形或凸台。
根据本申请一优选实施例，所述隔垫物为弹性材料制成，所述第一基板和所述第二基板对合后所述隔垫物因受压而发生弹性收缩形变。
根据本申请一优选实施例，所述隔垫物与所述公共电极接触面设置有凹槽，所述公共电极与所述隔垫物对应位置上设置有与所述凹槽对应且嵌合的凸齿。
根据本申请一优选实施例，所述凸齿为弹性材料制成。
根据本申请一优选实施例，所述TFT阵列层包括栅极、覆盖所述栅极的栅绝缘层、位于所述栅绝缘层上的有源层，位于所述有源层表面且两端的源极和漏极、以及位于所述有源层上且覆盖所述源极和所述漏极的保护层。
根据本申请一优选实施例，所述有源层包括半导体层、以及位于所述半导体层表面掺杂层。
根据本申请一优选实施例，站立于所述第一基板的所述隔垫物端面面积大于顶持所述第二基板的所述隔垫物端面面积。
为了解决上述问题，本申请实施例还提供了一种显示装置，所述显示装置包括上述液晶面板，所述液晶面板包括第一基板、与所述第一基板相对设置的第二基板、以及位于所述第一基板与所述第二基板之间的隔垫物。
其中，所述第一基板包括第一衬底、制备于所述第一衬底上TFT阵列层、制备于所述TFT阵列层上的色阻层、制备于所述色阻层上平坦化层，制备于所述平坦化层上像素电极层；在所述平坦化层的隔断处，所述像素电极层贴合于所述色组层上形成凹陷部，所述隔垫物一端站立于所述凹陷部的表面。
所述第二基板包括第二衬底、制备于所述第二衬底上遮光层、以及制备于所述遮光层上公共电极，所述隔垫物另一端顶持在所述公共电极上。
根据本申请一优选实施例，所述凹陷部为台阶或凹槽。
根据本申请一优选实施例，所述隔垫物的侧面贴合于所述凹陷部的侧壁。
根据本申请一优选实施例，所述隔垫物的截面形状为等腰梯形或凸台。
根据本申请一优选实施例，所述隔垫物为弹性材料制成，所述第一基板和所述第二基板对合后所述隔垫物因受压而发生弹性收缩形变。
根据本申请一优选实施例，所述隔垫物与所述公共电极接触面设置有凹槽，所述公共电极与所述隔垫物对应位置上设置有与所述凹槽对应且嵌合的凸齿。
根据本申请一优选实施例，所述凸齿为弹性材料制成。
根据本申请一优选实施例，所述TFT阵列层包括栅极、覆盖所述栅极的栅绝缘层、位于所述栅绝缘层上的有源层，位于所述有源层表面且两端的源极和漏极、以及位于所述有源层上且覆盖所述源极和所述漏极的保护层。
根据本申请一优选实施例，所述有源层包括半导体层、以及位于所述半导体层表面掺杂层。
根据本申请一优选实施例，站立于所述第一基板的所述隔垫物端面面积大于顶持所述第二基板的所述隔垫物端面面积。
 有益效果
本申请中隔垫物一端位于第一基板中色阻层上，另一端嵌设于第二基板中公共电极上，当液晶面板受压时，色阻层材料较硬，不容易压缩，导致隔垫物的变形小，回弹速度慢，确保了隔垫物的变形回复速度跟液晶的回弹速度接近，确保了液晶层中液晶和隔垫物的体积占比均匀，填满液晶盒内空间，液晶不会从胶框内剥离，避免了形成真空气泡，从而提高液晶面板的显示品质。
 附图说明
为了更清楚地说明本申请实施例中的技术方案，下面将对实施例描述中所需要使用的附图作简单地介绍，显而易见地，下面描述中的附图仅仅是本申请的一些实施例，对于本领域技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他的附图。
图1为本申请实施例提供一种液晶面板结构示意图。
图2为本申请实施例提供另一种隔垫物结构示意图。
图3为本申请实施例提供一种液晶面板另一结构示意图。
本申请的实施方式
以下各实施例的说明是参考附加的图示，用以例示本申请可用以实施的特定实施例。本申请所提到的方向用语，例如[上]、[下]、[前]、[后]、[左]、[右]、[内]、[外]、[侧面]等，仅是参考附加图式的方向。因此，使用的方向用语是用以说明及理解本申请，而非用以限制本申请。在图中，结构相似的单元是用以相同标号表示，图中虚线表示在结构中并不存在的，仅仅说明结构的形状和位置。
本申请针对能够解决现有技术液晶面板中第一基板表面平坦层材质较软，在液晶面板受到压力，隔垫物容易弹性压缩，液晶来不及回弹，造成液晶层产生间隙，液晶脱落形成真空气泡，从而影响液晶面板显示品质的技术问题，本实施例能够解决该缺陷。
如图1所示，本申请提供一种液晶面板100，包括第一基板、与第一基板相对设置的第二基板、以及位于第一基板与第二基板之间的隔垫物107；其中，第一基板包括第一衬底101、制备于第一衬底101上TFT阵列层、制备于TFT阵列层上的色阻层103、制备于色阻层103上平坦化层104，制备于平坦化层104上像素电极层105；在平坦化层104的隔断处，像素电极层105贴合于色组层103上形成凹陷部1051，隔垫物107一端站立于凹陷部1051的表面；第二基板包括第二衬底109、制备于第二衬底109上遮光层1084、以及制备于遮光层1084上公共电极1081，隔垫物107另一端顶持在公共电极1081上，站立于第一基板的隔垫物107端面面积大于顶持第二基板的隔垫物107端面面积。液晶面板受压后，由于色阻层103的硬度至少大于平坦化层104的硬度，减小隔垫物107下移的高度，回弹速度慢，跟液晶的回弹速度接近，让液晶层中液晶和隔垫物的体积占比均匀，始终填满液晶盒内空间，液晶不会从胶框内剥离，避免了形成真空气泡，从而提高液晶面板的显示品质。
本实施例中隔垫物107的截面形状优选为等腰梯形，隔垫物107的侧面形成一定锥度，该锥度优选0°到90°，隔垫物107为弹性材料制备而成，第一基板和第二基板对合后隔垫物107因受压而发生弹性收缩形变，弹性收缩形变主要发生隔垫物107纵向，少点弹性收缩形变会产生隔垫物107横向上。本实施例中隔垫物107的截面形状并不仅仅等腰梯形，还可以为凸台状，具体形状参考图2。
隔垫物107朝向第一基板的一端位于凹陷部1051上，凹陷部1051为台阶，台阶的宽度大于隔垫物107，能够平稳放置隔垫物107，且隔垫物107的侧壁贴合于台阶的侧壁，即隔垫物107的侧面贴合于凹陷部1051的侧壁。隔垫物107朝向第二基板的一端顶持在公共电极1081上，隔垫物107的端面与公共电极1081平面接触。
本实施例中TFT阵列层包括位于第一衬底101上的栅极层1021、位于第一衬底101上且覆盖栅极层1021的栅绝缘层1022、位于栅绝缘层1022上的有源层1025，位于有源层1025表面且两端的源极1026和漏极1027、以及位于有源层1025上且覆盖源极1026和漏极1027的保护层1028。
其中，第一衬底101通常为玻璃基板，也可为其他材质的基板，在此不做限制，栅极层1021经物理气相沉积方法形成于第一衬底101上，再经由一次光刻制程形成栅极图案。栅极层1021的材料可以是金属材料，例如是铜(Cu)、铝(Al)、钛(Ti)、钽(Ta)、钨(W)、钼(Mo)、铬(Cr)等。栅绝缘层1022形成于栅极层1021上，且覆盖栅极层1021和第一衬底101。栅绝缘层1022是通过化学气相沉积法形成于栅极层1021上，然后在400℃干燥空气氛围下退火处理得到。栅绝缘层1021的材料一般为氧化硅(SiOx)、氮化硅(SiNx)、氮氧化硅(SiON)、或者三者的夹层结构等。
有源层1025形成于栅绝缘层1022上，且有源层1025与栅极层1021绝缘设置。有源层1025包括层叠设置的半导体层1023、以及位于半导体层1023表面的掺杂层1024，半导体层1023是透过磁控溅镀法、金属有机化学气相沉积法或脉冲雷射蒸镀法沉积在栅绝缘层1022上，在400℃干燥空气氛围下退火处理约0.5小时，退火处理完成后，采用草酸作为刻蚀液的湿法蚀刻工艺或干法刻蚀工艺对半导体层1023进行刻蚀，经过蚀刻制程后，整层的金属氧化物薄膜将图案化形成岛状的金属氧化物层，半导体层1023起到开关作用；在半导体层1023制备完成后，掺杂层1024通过化学气相沉积法形成于半导体层1023上，掺杂层1024掺杂有氮离子，还可以掺杂磷离子、硼离子，增减TFT阵列层通道的电学特性，降低势垒和功耗，提高TFT阵列层开态电流。
有源层1025表面且两端形成有源极1026和漏极1027，在有源层上1025且覆盖源极1026和漏极1027上形成有保护层1028，保护层1028为层叠设置的SiN层和SiO层，首先沉积SiN层，然后沉积SiO层，沉积完SiN层和SiO层后，需对SiN层和SiO层进行植入离子的活化和氢化处理，修补多晶硅的悬空键，而后经过曝光、湿蚀刻、光阻剥离过程，完成保护层1028整个制程，确保护层1028具有良好的弹性和稳定性，并且承受的应力较小，不会破坏TFT膜层，不会造成TFT膜层破裂剥落。保护层1028在漏极1027对应位置上设置有像素过孔，像素电极105通过像素过孔与漏极1027电性接触。
液晶层106，位于第一基板和第二基板之间，包括胶框、液晶1061、以及隔垫物107，胶框让液晶1061两侧玻璃能够紧密黏住；液晶1061一般为椭圆状，顺着长轴方向串接，每一列的液晶1061为一个液晶畴，任意相邻的两个液晶畴彼此独立，且任意相邻的两个液晶畴之间的边界为连续地变化的区域，隔垫物107周围的液晶203围绕着隔垫物107设置，液晶1061的偏转角度由位于液晶层106两侧的公共电极层1081和像素电极层105之间的电场大小决定的。
第二基板包括第二衬底109、制备于第二衬底109上遮光层1084、以及制备于遮光层1084上公共电极1081，遮光层1084包括第一遮光层1082和第二遮光层1083，防止背光源在透过液晶层106和第一基板中红、绿、蓝三种色阻图案后产生混光现象，以避免显示异常，同时第一遮光层1082和第二遮光层1083本身具有反光效果，能够对从外界入射到其表面的光进行反射。第一遮光层1082和第二遮光层1083的材质优选黑色树脂层或者黑矩阵，通过遮光掩膜版对黑色树脂层或者黑矩阵进行曝光和显影制备而成。公共电极层109通常为氧化铟锡的透明导电薄膜，厚度一般为20nm到40nm，公共电极层109采用溅射方法沉积所得。隔垫物107靠近第二基板的一端顶持在公共电极1081上。
当液晶面板100受到压力时，隔垫物107跟着下移，液晶面板100受到压力消失时，隔垫物107会迅速上移，变形较快，导致隔垫物107跟着迅速上移，为了更好的解决这个问题，申请人在隔垫物107和公共电极1081想接触的地方采用弹性接触。当液晶面板受到压力时，第二基板下移，隔垫物107一开始并没有发生形变，当第二基板下移到一定距离后，隔垫物107才开始发生形变，这样一来就减缓隔垫物107发生形变的速度和形变量，确保了隔垫物的变形回复速度跟液晶的回弹速度接近，确保了液晶层中液晶和隔垫物的体积占比均匀，填满液晶盒内空间，液晶不会从胶框内剥离，避免了形成真空气泡，从而提高液晶面板的显示品质。
如图3所示，本申请实施例提供一种液晶面板的另一结构示意图，隔垫物107和第二基板相接触的位置上采用弹性接触，隔垫物107与公共电极1081接触面设置有凹槽1071，公共电极1081与隔垫物107对应位置上设置有与凹槽1071对应且嵌合的凸齿10811。凸齿10811为弹性材料制成。
在液晶面板受压时，凸齿10811缓解了隔垫物107的一部分应力，隔垫物107上表面压缩量较小，回弹的速度较慢，确保了液晶层中液晶和隔垫物107的体积占比均匀，填满液晶盒内空间，液晶不会从胶框内剥离，避免了形成真空气泡，从而提高液晶面板的显示品质。
根据本申请的目的，提供一种显示装置，该显示装置包括上述液晶面板，该液晶面板包括第一基板、与第一基板相对设置的第二基板、以及位于第一基板与第二基板之间的隔垫物；其中，第一基板包括第一衬底、制备于第一衬底上TFT阵列层、制备于TFT阵列层上的色阻层、制备于色阻层上平坦化层，制备于平坦化层上像素电极层；在平坦化层的隔断处，像素电极层贴合于色组层上形成凹陷部，隔垫物一端站立于凹陷部的表面；第二基板包括第二衬底、制备于第二衬底上遮光层、以及制备于遮光层上公共电极，隔垫物另一端顶持在公共电极上。
本申请的有益效果：本申请中隔垫物一端位于第一基板中色阻层上，另一端嵌设于第二基板中公共电极上，当液晶面板受压时，色阻层材料较硬，不容易压缩，导致隔垫物的变形小，回弹速度慢，确保了隔垫物的变形回复速度跟液晶的回弹速度接近，确保了液晶层中液晶和隔垫物的体积占比均匀，填满液晶盒内空间，液晶不会从胶框内剥离，避免了形成真空气泡，从而提高液晶面板的显示品质。
综上，虽然本申请已以优选实施例揭露如上，但上述优选实施例并非用以限制本申请，本领域的普通技术人员，在不脱离本申请的精神和范围内，均可作各种更动与润饰，因此本申请的保护范围以权利要求界定的范围为准。

Claims (20)

  1. 一种液晶面板，其包括第一基板、与所述第一基板相对设置的第二基板、以及位于所述第一基板与所述第二基板之间的隔垫物；
    其中，所述第一基板包括第一衬底、制备于所述第一衬底上的TFT阵列层、制备于所述TFT阵列层上的色阻层、制备于所述色阻层上的平坦化层，制备于所述平坦化层上的像素电极层；在所述平坦化层的隔断处，所述像素电极层贴合于所述色组层上形成凹陷部，所述隔垫物一端站立于所述凹陷部的表面；
    所述第二基板包括第二衬底、制备于所述第二衬底上的遮光层、以及制备于所述遮光层上的公共电极，所述隔垫物另一端顶持在所述公共电极上。
  2. 根据权利要求1所述的液晶面板，其中，所述凹陷部为台阶或凹槽。
  3. 根据权利要求1所述的液晶面板，其中，所述隔垫物的侧面贴合于所述凹陷部的侧壁。
  4. 根据权利要求1所述的液晶面板，其中，所述隔垫物的截面形状为等腰梯形或凸台。
  5. 根据权利要求1所述的液晶面板，其中，所述隔垫物为弹性材料制成，所述第一基板和所述第二基板对合后所述隔垫物因受压而发生弹性收缩形变。
  6. 根据权利要求1所述的液晶面板，其中，所述隔垫物与所述公共电极接触面设置有凹槽，所述公共电极与所述隔垫物对应位置上设置有与所述凹槽对应且嵌合的凸齿。
  7. 根据权利要求6所述的液晶面板，其中，所述凸齿为弹性材料制成。
  8. 根据权利要求1所述的液晶面板，其中，所述TFT阵列层包括栅极、覆盖所述栅极的栅绝缘层、位于所述栅绝缘层上的有源层，位于所述有源层表面且两端的源极和漏极、以及位于所述有源层上且覆盖所述源极和所述漏极的保护层。
  9. 根据权利要求8所述的液晶面板，其中，所述有源层包括半导体层、以及位于所述半导体层表面掺杂层。
  10. 根据权利要求8所述的液晶面板，其中，站立于所述第一基板的所述隔垫物端面面积大于顶持所述第二基板的所述隔垫物端面面积。
  11. 一种显示装置，其中，所述显示装置包括液晶面板，所述液晶面板包括第一基板、与所述第一基板相对设置的第二基板、以及位于所述第一基板与所述第二基板之间的隔垫物；
    其中，所述第一基板包括第一衬底、制备于所述第一衬底上的TFT阵列层、制备于所述TFT阵列层上的色阻层、制备于所述色阻层上的平坦化层，制备于所述平坦化层上的像素电极层；在所述平坦化层的隔断处，所述像素电极层贴合于所述色组层上形成凹陷部，所述隔垫物一端站立于所述凹陷部的表面；
    所述第二基板包括第二衬底、制备于所述第二衬底上的遮光层、以及制备于所述遮光层上的公共电极，所述隔垫物另一端顶持在所述公共电极上。
  12. 根据权利要求11所述的显示装置，其中，所述凹陷部为台阶或凹槽。
  13. 根据权利要求11所述的显示装置，其中，所述隔垫物的侧面贴合于所述凹陷部的侧壁。
  14. 根据权利要求11所述的显示装置，其中，所述隔垫物的截面形状为等腰梯形或凸台。
  15. 根据权利要求11所述的显示装置，其中，所述隔垫物为弹性材料制成，所述第一基板和所述第二基板对合后所述隔垫物因受压而发生弹性收缩形变。
  16. 根据权利要求11所述的显示装置，其中，所述隔垫物与所述公共电极接触面设置有凹槽，所述公共电极与所述隔垫物对应位置上设置有与所述凹槽对应且嵌合的凸齿。
  17. 根据权利要求16所述的显示装置，其中，所述凸齿为弹性材料制成。
  18. 根据权利要求11所述的显示装置，其中，所述TFT阵列层包括栅极、覆盖所述栅极的栅绝缘层、位于所述栅绝缘层上的有源层，位于所述有源层表面且两端的源极和漏极、以及位于所述有源层上且覆盖所述源极和所述漏极的保护层。
  19. 根据权利要求18所述的显示装置，其中，所述有源层包括半导体层、以及位于所述半导体层表面掺杂层。
  20. 根据权利要求11所述的液晶面板，其中，站立于所述第一基板的所述隔垫物端面面积大于顶持所述第二基板的所述隔垫物端面面积。
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