WO2021056752A1 - 显示面板以及显示装置 - Google Patents

显示面板以及显示装置 Download PDF

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Publication number
WO2021056752A1
WO2021056752A1 PCT/CN2019/118381 CN2019118381W WO2021056752A1 WO 2021056752 A1 WO2021056752 A1 WO 2021056752A1 CN 2019118381 W CN2019118381 W CN 2019118381W WO 2021056752 A1 WO2021056752 A1 WO 2021056752A1
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WIPO (PCT)
Prior art keywords
layer
pixel electrode
repair line
pixel
display panel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/CN2019/118381
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English (en)
French (fr)
Inventor
吴焕达
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TCL China Star Optoelectronics Technology Co Ltd
Original Assignee
TCL China Star Optoelectronics Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TCL China Star Optoelectronics Technology Co Ltd filed Critical TCL China Star Optoelectronics Technology Co Ltd
Priority to US16/626,325 priority Critical patent/US11605651B2/en
Publication of WO2021056752A1 publication Critical patent/WO2021056752A1/zh
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136259—Repairing; Defects
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133345—Insulating layers
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1343—Electrodes
    • G02F1/134309—Electrodes characterised by their geometrical arrangement
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136227—Through-hole connection of the pixel electrode to the active element through an insulation layer
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136259—Repairing; Defects
    • G02F1/136272—Auxiliary lines
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136286—Wiring, e.g. gate line, drain line
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10D86/441—Interconnections, e.g. scanning lines
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10D86/60—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs wherein the TFTs are in active matrices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/126—Shielding, e.g. light-blocking means over the TFTs
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/131—Interconnections, e.g. wiring lines or terminals
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136209—Light shielding layers, e.g. black matrix, incorporated in the active matrix substrate, e.g. structurally associated with the switching element
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136259—Repairing; Defects
    • G02F1/136263—Line defects
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/1368—Active matrix addressed cells in which the switching element is a three-electrode device
    • G02F1/13685—Top gates
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/122—Pixel-defining structures or layers, e.g. banks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/861—Repairing

Definitions

  • This application relates to the field of display technology, and in particular to a display panel and a display device.
  • the existing display panel has a technical problem that the repair effect of the bright spot is limited.
  • the present application provides a display panel and a display device, which are used to solve the technical problem that existing display panels have limited bright spot repair effects.
  • An embodiment of the present application provides a display panel, which includes:
  • the driving circuit layer is formed on the substrate, and a signal electrode for driving the thin film transistor is formed, and the signal electrode is a source electrode or a drain electrode;
  • the pixel electrode layer is patterned to form the pixel electrode of the sub-pixel unit.
  • the pixel electrode includes a pixel electrode body and a pixel electrode extension that are electrically connected; the pixel electrode body is located in the light-emitting area and communicates with the corresponding sub-pixel through the pixel signal line.
  • the signal electrode of the unit is electrically connected, and the pixel electrode extension is located in the light-shielding area; and
  • An insulating layer located between the repair line layer and the pixel electrode layer;
  • the pixel electrode extension part overlaps with the projection part of the repair line on the substrate, and when the insulating layer of the overlap area is opened, the pixel electrode extension part passes through the repair line and other sub-pixel units.
  • the signal electrodes are electrically connected.
  • the display panel includes sub-pixel units arranged in an array.
  • the pixel electrode extension part passes through the repair line and communicates with adjacent sub-pixel units.
  • the electrodes are electrically connected.
  • both ends of the repair line are respectively insulated from the pixel electrode extensions of the two sub-pixel units, and projected on the substrate overlap.
  • the insulating layer is formed with a connection via, one end of the repair line overlaps with the pixel electrode extension of one sub-pixel unit on the substrate, and the other end is connected to the substrate through the connection via.
  • the pixel electrode extension of the other sub-pixel unit is electrically connected.
  • the insulating layer is formed with a connection via hole, one end of the repair line overlaps with the pixel electrode extension of one sub-pixel unit on the substrate, and the other end directly overlaps with another sub-pixel unit.
  • the signal electrode is connected.
  • the display panel is a liquid crystal display panel
  • the liquid crystal display panel includes a substrate, a light shielding layer, a buffer layer, and a driving circuit layer arranged in a stack
  • the driving circuit layer includes a laminated active circuit layer.
  • the layer is arranged between the substrate and the planarization layer.
  • the light shielding layer and the repair line layer are arranged in the same layer, and the repair line layer is patterned to form a repair line and a light shielding layer corresponding to the position of the thin film transistor.
  • the source and drain layer and the repair line layer are arranged in the same layer, and the repair line layer is patterned to form the repair line and the source and drain of the thin film transistor.
  • the display panel is an OLED display panel
  • the OLED display panel includes a substrate, a light shielding layer, a buffer layer, and a driving circuit layer arranged in a stack
  • the driving circuit layer includes a stacked active Layer, gate insulating layer, first metal layer, first inter-insulating layer, second metal layer, second inter-insulating layer, source and drain layer, planarization layer, pixel definition layer, pixel electrode layer, light-emitting function layer, A common electrode layer and an encapsulation layer, and the repair line layer is arranged between the substrate and the encapsulation layer.
  • the common electrode layer and the repair line layer are arranged in the same layer, the common electrode layer is patterned to form a repair line and a common electrode, and the repair line is insulated from the common electrode.
  • the pixel definition layer is patterned to form a protruding area, and the protruding area is used to define a light-emitting area; the pixel electrode extension is located in the protruding area.
  • the pixel electrode extension is integrally provided with the pixel electrode body, and is located between the pixel definition layer and the planarization layer.
  • the pixel electrode extension portion and the pixel electrode body are arranged separately, and are tiled on the top surface of the protruding area, the slope of the corresponding light-emitting area of the protruding area, and the The pixel electrode body is connected.
  • An embodiment of the present application provides a display device, which includes a display panel, and the display panel includes:
  • the driving circuit layer is formed on the substrate, and a signal electrode for driving the thin film transistor is formed, and the signal electrode is a source electrode or a drain electrode;
  • the pixel electrode layer is patterned to form the pixel electrode of the sub-pixel unit.
  • the pixel electrode includes a pixel electrode body and a pixel electrode extension that are electrically connected; the pixel electrode body is located in the light-emitting area and communicates with the corresponding sub-pixel through the pixel signal line.
  • the signal electrode of the unit is electrically connected, and the pixel electrode extension is located in the light-shielding area; and
  • An insulating layer located between the repair line layer and the pixel electrode layer;
  • the pixel electrode extension part overlaps with the projection part of the repair line on the substrate, and when the insulating layer of the overlap area is opened, the pixel electrode extension part passes through the repair line and other sub-pixel units.
  • the signal electrodes are electrically connected.
  • the display panel includes sub-pixel units arranged in an array, and when the insulating layer in the overlapping area is opened, the pixel electrode extension part passes through the repair line and communicates with adjacent sub-pixel units.
  • the electrodes are electrically connected.
  • both ends of the repair line are respectively insulated from the pixel electrode extensions of the two sub-pixel units, and projected on the substrate overlap.
  • the insulating layer is formed with a connection via, one end of the repair line overlaps with the pixel electrode extension of one sub-pixel unit on the substrate, and the other end is connected to the substrate through the connection via.
  • the pixel electrode extension of the other sub-pixel unit is electrically connected.
  • the insulating layer is formed with a connection via, one end of the repair line overlaps with the pixel electrode extension of one sub-pixel unit on the substrate, and the other end directly overlaps with another sub-pixel unit.
  • the signal electrode is connected.
  • the display panel is a liquid crystal display panel
  • the liquid crystal display panel includes a substrate, a light shielding layer, a buffer layer, and a driving circuit layer arranged in a stack
  • the driving circuit layer includes a stacked active circuit layer.
  • the layer is arranged between the substrate and the planarization layer.
  • the light-shielding layer and the repair line layer are arranged in the same layer, and the repair line layer is patterned to form a repair line and a light-shielding layer corresponding to the position of the thin film transistor.
  • the present application provides a display panel and a display device.
  • the display panel includes a substrate, a driving circuit layer, a pixel electrode layer, a repair line layer, and an insulating layer.
  • the driving circuit layer is formed on the substrate and formed with signals for driving thin film transistors.
  • An electrode, the signal electrode is a source electrode or a drain electrode, the pixel electrode layer is patterned to form a pixel electrode of a sub-pixel unit, and the pixel electrode includes a pixel electrode body and a pixel electrode extension that are electrically connected.
  • the pixel electrode body is located in the light-emitting area and is electrically connected to the signal electrode of the corresponding sub-pixel unit through the pixel signal line, the pixel electrode extension is located in the light-shielding area, the repair line layer is patterned to form a repair line, and the insulating layer Located between the repair line layer and the pixel electrode layer, wherein the pixel electrode extension part overlaps with the projection part of the repair line on the substrate.
  • the The pixel electrode extension is electrically connected to the signal electrodes of other sub-pixel units through the repair line; in this way, when a bright spot appears in the sub-pixel unit, the pixel electrode of the sub-pixel unit is disconnected from the corresponding pixel circuit by laser, and then the laser is used to disconnect the pixel electrode of the sub-pixel unit from the corresponding pixel circuit
  • the pixel electrode extension is connected to the signal electrodes of other sub-pixel units to emit light through a repair line, which solves the technical problem that the existing display panel has a limited repair effect of bright spots.
  • FIG. 1 is a schematic top view of a conventional display panel.
  • FIG. 2 is a first schematic cross-sectional view of a display panel provided by an embodiment of the application.
  • FIG. 3 is a second schematic cross-sectional view of a display panel provided by an embodiment of the application.
  • FIG. 4 is a third schematic cross-sectional view of a display panel provided by an embodiment of the application.
  • FIG. 5 is a fourth cross-sectional schematic diagram of a display panel provided by an embodiment of the application.
  • FIG. 6 is a fifth schematic cross-sectional view of a display panel provided by an embodiment of the application.
  • FIG. 7 is a sixth schematic cross-sectional view of a display panel provided by an embodiment of the application.
  • FIG. 8 is a seventh schematic cross-sectional view of a display panel provided by an embodiment of the application.
  • FIG. 9 is a first schematic top view of a display panel provided by an embodiment of the application.
  • FIG. 10 is an eighth cross-sectional schematic diagram of a display panel provided by an embodiment of the application.
  • FIG. 11 is a ninth cross-sectional schematic diagram of a display panel provided by an embodiment of the application.
  • FIG. 12 is a tenth cross-sectional schematic diagram of a display panel provided by an embodiment of the application.
  • FIG. 13 is an eleventh cross-sectional schematic diagram of a display panel provided by an embodiment of the application.
  • FIG. 14 is a schematic diagram of a twelfth type of cross-section of a display panel provided by an embodiment of the application.
  • FIG. 15 is a second schematic top view of a display panel provided by an embodiment of the application.
  • FIG. 16 is a third schematic top view of a display panel provided by an embodiment of the application.
  • the embodiment of the present application can solve this problem.
  • the cross-sectional position of the schematic cross-sectional view of the present application is A-A1.
  • the display panel provided by the present application as shown in FIG. 2, the dotted frame is the position of the insulating layer that needs to be penetrated by the radium when the sub-pixel has a bright spot.
  • the display panel includes a substrate 101, a driving circuit layer 102, a pixel electrode layer 103, Repair the line layer 104 and the insulating layer, the drive circuit layer 102 is formed on the substrate, and the signal electrode for driving the thin film transistor is formed.
  • the signal electrode is the source electrode or the drain electrode.
  • the pixel electrode layer 103 is patterned to form the pixel of the sub-pixel unit.
  • the pixel electrode includes a pixel electrode body 202 that is electrically connected and a pixel electrode extension 201.
  • the pixel electrode body 202 is located in the light-emitting area and is electrically connected to the signal electrode of the corresponding sub-pixel unit through a pixel signal line.
  • the pixel electrode extension is located in the light-shielding area.
  • the repair line layer 104 is patterned to form a repair line
  • the insulating layer is located between the repair line layer 104 and the pixel electrode layer 103.
  • the pixel electrode extension 201 overlaps with the projection part of the repair line on the substrate. When the insulating layer is opened, the pixel electrode extension 201 is electrically connected to the signal electrodes of other sub-pixel units through the repair line.
  • the display panel includes a substrate, a driving circuit layer, a pixel electrode layer, a repair line layer, and an insulating layer.
  • the driving circuit layer is formed on the substrate, and a signal electrode for driving a thin film transistor is formed.
  • the signal electrode is a source electrode or Drain electrode, pixel electrode layer, patterned to form the pixel electrode of the sub-pixel unit.
  • the pixel electrode includes a pixel electrode body and a pixel electrode extension that are electrically connected. The pixel electrode body is located in the light-emitting area and communicates with the corresponding sub-pixel through the pixel signal line.
  • the signal electrode of the unit is electrically connected, the pixel electrode extension is located in the shading area, the repair line layer is patterned to form a repair line, the insulating layer is located between the repair line layer and the pixel electrode layer, wherein the pixel electrode extension and the repair line are on the substrate
  • the extension of the pixel electrode is electrically connected to the signal electrode of the other sub-pixel unit through the repair line; in this way, when a bright spot appears in the sub-pixel unit, the laser
  • the pixel electrode is disconnected from the corresponding pixel circuit, and then the pixel electrode extension is connected to the signal electrodes of other sub-pixel units through a repair line to emit light, which solves the technical problem that the existing display panel has limited bright spot repair effects.
  • the source and drain layer 409 and the repair line layer 104 are arranged in the same layer, and the repair line layer 104 is patterned to form the repair line, and the source and drain of the thin film transistor.
  • the insulating layer is formed with a connection via k1, one end of the repair line overlaps with the pixel electrode extension 201 of a sub-pixel unit on the substrate, and the other end passes through the connection via k1. It is electrically connected to the pixel electrode extension 201 of another sub-pixel unit.
  • the repair line layer 104 includes a first repair line layer 1041 and a second repair line layer 1042.
  • the first repair line layer 1041 and the second repair line layer 1042 pass through the repair line vias. Connect and pattern to form repair lines.
  • the light shielding layer 401 and the repair line layer 104 are provided in the same layer, and the repair line layer 104 is patterned to form a repair line and a light shielding layer 401 corresponding to the position of the thin film transistor.
  • the two ends of the repair line are respectively insulated from the pixel electrode extension portions 201 of the two sub-pixel units, and the projections overlap on the substrate.
  • the insulating layer is formed with connection vias, one end of the repair line overlaps with the pixel electrode extension of one sub-pixel unit projected on the substrate 101, and the other end is directly connected to the signal electrode of another sub-pixel unit.
  • a part of the repair line is used as a light shielding layer.
  • the active layer 404 and the repair line layer 104 are arranged in the same layer, and the active layer is patterned to form the repair line layer 104.
  • the first metal layer 406 and the repair line layer 104 are arranged in the same layer, and the repair line layer 104 is patterned to form the repair line, the gate of the low-temperature polysilicon thin film transistor, and the first part of the storage capacitor. Electrode plate.
  • the second metal layer 408 and the repair line layer 104 are arranged in the same layer, and the repair line layer 104 is patterned to form the repair line, the gate of the metal semiconductor oxide thin film transistor, and the storage capacitor.
  • the second electrode plate is patterned to form the repair line, the gate of the metal semiconductor oxide thin film transistor, and the storage capacitor.
  • the display panel includes sub-pixel units arranged in an array.
  • the pixel electrode extension is electrically connected to the signal electrode of the adjacent sub-pixel unit through the repair line. connection.
  • the display panel includes pixel units arranged in an array, and the pixel units include a plurality of sub-pixel units of different light-emitting colors; when the insulating layer in the overlapping area is opened, the pixel electrode extension passes through The repair line is electrically connected to the signal electrodes of the sub-pixel units of the same light-emitting color in the adjacent pixel units.
  • the display panel is a liquid crystal display panel.
  • the liquid crystal display panel includes a laminated substrate 101, a light shielding layer 401, a buffer layer 402, and a driving circuit layer 102.
  • the driving circuit layer 102 includes a laminated active layer 404, Gate insulating layer 403, first metal layer 406, first inter insulating layer 405, second metal layer 408, second inter insulating layer 407, source and drain layer 409, planarization layer 410, pixel electrode layer 105, and alignment film
  • the repair line layer 104 is disposed between the substrate 101 and the planarization layer 410.
  • the repair line layer 104 is disposed between the substrate 101 and the light shielding layer 401.
  • the pixel electrode extension 201 of the pixel electrode is formed by laser. It is electrically connected to the repair line at the repair line layer 104, and the pixel electrode extension 201 of the pixel electrode with a bright spot is electrically connected to the repair line at the repair line layer 104 by laser, and the pixel electrode extension 201 of the pixel electrode is connected to the repair line at the repair line layer 104.
  • the pixel electrode extension 201 of the pixel electrode is connected by the repair line at the repair line layer 104, so that the pixel electrode that has a bright spot failure resumes light emission.
  • the repair line layer 104 is disposed between the light shielding layer 401 and the buffer layer 402.
  • the pixel electrode extension portion of the pixel electrode is formed by laser.
  • 201 is electrically connected to the repair line at the repair line layer 104
  • the pixel electrode extension 201 of the bright pixel electrode is electrically connected to the repair line at the repair line layer 104 by means of laser
  • the pixel electrode extension 201 of the pixel electrode is electrically connected to the repair line at the repair line layer 104.
  • the pixel electrode extension 201 of the bright point pixel electrode is connected by a repair line at the repair line layer 104, so that the pixel electrode with a bright point failure resumes light emission.
  • the repair line layer 104 is disposed between the buffer layer 402 and the gate insulating layer 403.
  • the pixel electrode of the pixel electrode appears by laser.
  • the extension 201 is electrically connected to the repair line at the repair line layer 104, and the pixel electrode extension 201 where the bright pixel electrode appears and the repair line at the repair line layer 104 are electrically connected by laser, and the pixel electrode extension 201 of the pixel electrode.
  • the pixel electrode extension 201 that is connected to the pixel electrode with the bright spot is connected by the repair line at the repair line layer 104, so that the pixel electrode with the bright spot failure resumes light emission.
  • the repair line layer 104 is disposed between the gate insulating layer 403 and the first inter-insulating layer 405.
  • the pixel electrode appears by laser.
  • the pixel electrode extension 201 of the pixel electrode is electrically connected to the repair line at the repair line layer 104, and the pixel electrode extension 201 of the pixel electrode with bright spots is electrically connected to the repair line at the repair line layer 104 by means of laser, and the pixel electrode of the pixel electrode is electrically connected to the repair line at the repair line layer 104.
  • the extension portion 201 and the pixel electrode extension portion 201 where the bright point pixel electrode appears are connected by a repair line at the repair line layer 104, so that the pixel electrode that has a bright point failure resumes light emission.
  • the repair line layer 104 is disposed between the first inter-insulating layer 405 and the second inter-insulating layer 407.
  • the pixel is displayed by laser.
  • the pixel electrode extension 201 of the electrode is electrically connected to the repair line at the repair line layer 104, and the pixel electrode extension 201 where the bright pixel electrode appears is electrically connected to the repair line at the repair line layer 104 by means of laser.
  • the electrode extension 201 and the pixel electrode extension 201 where the bright point pixel electrode appears are connected by a repair line at the repair line layer 104, so that the pixel electrode that has a bright point failure resumes light emission.
  • the repair line layer 104 is disposed between the second insulating layer 407 and the planarization layer 410.
  • the laser beam is used to make the pixel electrode appear.
  • the pixel electrode extension 201 is electrically connected to the repair line at the repair line layer 104, and the pixel electrode extension 201 where the bright pixel electrode appears is electrically connected to the repair line at the repair line layer 104 by laser, and the pixel electrode of the pixel electrode extends
  • the portion 201 and the pixel electrode extension portion 201 of the pixel electrode with a bright spot are connected by a repair line at the repair line layer 104, so that the pixel electrode with a bright spot failure resumes light emission.
  • the display panel is an OLED display panel.
  • the OLED display panel includes a substrate 101, a light-shielding layer 401, a buffer layer 402, and a driving circuit layer 102 that are stacked.
  • the layer 105, the pixel electrode layer 103, the light-emitting function layer, the common electrode layer and the packaging layer, and the repair line layer is arranged between the substrate and the packaging layer.
  • the display panel in an OLED display panel, includes a pixel definition layer, and the pixel electrode extension 201 is disposed on the pixel definition layer, and the pixel electrode extension 201 needs to penetrate the pixel definition layer by laser. To be electrically connected to the repair line.
  • the display panel includes a pixel definition layer, and the pixel electrode extension 201 is integrally provided with the pixel electrode body 202 and is located between the pixel definition layer 105 and the planarization layer 410, and the pixel electrode extends The part 201 does not need the laser to penetrate the pixel definition layer to be electrically connected to the repair line.
  • the common electrode layer and the repair line layer are arranged in the same layer, the common electrode layer is patterned to form the repair line and the common electrode, and the repair line is insulated from the common electrode.
  • the pixel defining layer 105 is patterned to form a protruding area, and the protruding area is used to define the light-emitting area; the pixel electrode extension 201 is located in the protruding area.
  • the pixel electrode extension is separately arranged from the pixel electrode body, and is tiled on the top surface of the protruding area, the slope of the protruding area corresponding to the light-emitting area, and is connected to the pixel electrode body.
  • the repair line layer is formed by extending the source and drain layer 409, and the pixel electrode extension and the projection of the repair line layer on the substrate overlap.
  • the repair line is located in the protruding area.
  • the light shielding layer 401 and the repair line layer are provided in the same layer, and the light shielding layer 401 is patterned to form the repair line layer.
  • the active layer 404 and the repair line layer are arranged in the same layer, and the active layer 404 is patterned to form the repair line layer.
  • the first metal layer 406 and the repair line layer are arranged in the same layer, the first metal layer 406 is patterned to form the repair line layer, and the second metal layer 408 is arranged in the same layer as the repair line layer.
  • the metal layer 408 is patterned to form a repair line layer.
  • the second metal layer 408 and the repair line layer are arranged in the same layer, and the second metal layer 408 is patterned to form the repair line layer.
  • the repair line is connected to the signal electrode of the driving thin film transistor.
  • the repair line layer 104 is disposed between the substrate 101 and the light shielding layer 401.
  • the pixel electrode extension 201 of the pixel electrode is formed by laser. It is electrically connected to the repair line at the repair line layer 104, and the pixel electrode extension 201 of the pixel electrode with a bright spot is electrically connected to the repair line at the repair line layer 104 by laser, and the pixel electrode extension 201 of the pixel electrode is connected to the repair line at the repair line layer 104.
  • the pixel electrode extension 201 of the pixel electrode is connected by the repair line at the repair line layer 104, so that the pixel electrode that has a bright spot failure resumes light emission.
  • the repair line layer 104 is disposed between the light shielding layer 401 and the buffer layer 402.
  • the pixel electrode extension portion of the pixel electrode is formed by laser.
  • 201 is electrically connected to the repair line at the repair line layer 104
  • the pixel electrode extension 201 of the bright pixel electrode is electrically connected to the repair line at the repair line layer 104 by means of laser
  • the pixel electrode extension 201 of the pixel electrode is electrically connected to the repair line at the repair line layer 104.
  • the pixel electrode extension 201 of the bright point pixel electrode is connected by a repair line at the repair line layer 104, so that the pixel electrode with a bright point failure resumes light emission.
  • the repair line layer 104 is disposed between the buffer layer 402 and the gate insulating layer 403.
  • the pixel electrode of the pixel electrode appears by laser.
  • the extension 201 is electrically connected to the repair line at the repair line layer 104, and the pixel electrode extension 201 where the bright pixel electrode appears and the repair line at the repair line layer 104 are electrically connected by laser, and the pixel electrode extension 201 of the pixel electrode.
  • the pixel electrode extension 201 that is connected to the pixel electrode with the bright spot is connected by the repair line at the repair line layer 104, so that the pixel electrode with the bright spot failure resumes light emission.
  • the repair line layer 104 is disposed between the gate insulating layer 403 and the first inter-insulating layer 405.
  • the pixel electrode appears by laser.
  • the pixel electrode extension 201 of the pixel electrode is electrically connected to the repair line at the repair line layer 104, and the pixel electrode extension 201 of the pixel electrode with bright spots is electrically connected to the repair line at the repair line layer 104 by means of laser, and the pixel electrode of the pixel electrode is electrically connected to the repair line at the repair line layer 104.
  • the extension portion 201 and the pixel electrode extension portion 201 where the bright point pixel electrode appears are connected by a repair line at the repair line layer 104, so that the pixel electrode that has a bright point failure resumes light emission.
  • the repair line layer 104 is disposed between the first inter-insulating layer 405 and the second inter-insulating layer 407.
  • the pixel is displayed by laser.
  • the pixel electrode extension 201 of the electrode is electrically connected to the repair line at the repair line layer 104, and the pixel electrode extension 201 where the bright pixel electrode appears is electrically connected to the repair line at the repair line layer 104 by means of laser.
  • the electrode extension 201 and the pixel electrode extension 201 where the bright point pixel electrode appears are connected by a repair line at the repair line layer 104, so that the pixel electrode that has a bright point failure resumes light emission.
  • the repair line layer 104 is disposed between the second insulating layer 407 and the source/drain layer 409.
  • the pixel electrode appears by laser.
  • the pixel electrode extension 201 of the pixel electrode is electrically connected to the repair line at the repair line layer 104, and the pixel electrode extension 201 of the bright pixel electrode is electrically connected to the repair line at the repair line layer 104 by means of laser.
  • the extension portion 201 and the pixel electrode extension portion 201 where the bright point pixel electrode appears are connected by a repair line at the repair line layer 104, so that the pixel electrode that has a bright point failure resumes light emission.
  • the repair line layer 104 is disposed between the source and drain layer 409 and the planarization layer 410.
  • the pixel electrode appears by laser.
  • the electrode extension 201 is electrically connected to the repair line at the repair line layer 104, and the pixel electrode extension 201 where the bright pixel electrode appears and the repair line at the repair line layer 104 are electrically connected by laser, and the pixel electrode extension of the pixel electrode 201 and the pixel electrode extension 201 of the pixel electrode with a bright spot are connected by a repair line at the repair line layer 104, so that the pixel electrode with a bright spot failure resumes light emission.
  • one end of the repair line is connected to the extension 201 of the pixel electrode to be repaired, and the other end is projected to coincide with the extension of the pixel electrode in the same row on the substrate 101, and the pixels in the same row include the same pixel and different pixels.
  • the pixel electrode extension 201 is disposed close to the light-emitting area of the next pixel electrode.
  • the pixel electrode extension 201 is close to the light-emitting area of the next pixel electrode, so that the pixels are arranged Only the electrode extension 201 can achieve a good connection effect.
  • the entire layer of the repair line is arranged in a strip shape, and the repair line and the projections of all pixel electrode extensions on the substrate are coincident.
  • the pixel electrodes can be divided into six sub-pixels, namely, the first pixel electrode 301, the second pixel electrode 302, and the third pixel.
  • the electrode 303, the fourth pixel electrode 304, the fifth pixel electrode 305, and the sixth pixel electrode 306 also include a pixel circuit 307.
  • the first pixel electrode 301 is connected to the second pixel electrode 302 through a repair line. Both the first pixel electrode 301 and the second pixel electrode 302 belong to the first pixel and belong to the shared pixel circuit 307 in the pixel.
  • the repair line is set under the film layer of the first pixel electrode 301 pixel electrode extension 201 and the second pixel electrode 302 pixel electrode extension 201. When a bright spot appears on the first pixel electrode 301, the first pixel electrode 301 pixel electrode extension is lasered
  • the pixel electrode extension 201 201 and the second pixel electrode 302 connect the first pixel electrode 301 and the second pixel electrode 302 through a repair line.
  • the first pixel electrode 301 is connected to the third pixel electrode 303 through a repair line, and both the first pixel electrode 301 and the third pixel electrode 303 belong to the first pixel and are shared within the pixel.
  • the repair line is set under the film layer of the first pixel electrode 301 pixel electrode extension 201 and the third pixel electrode 303 pixel electrode extension 201.
  • the first pixel is irradiated by laser.
  • the electrode 301 pixel electrode extension 201 and the third pixel electrode 303 pixel electrode extension 201 connect the first pixel electrode 301 and the third pixel electrode 303 through a repair line.
  • the first pixel electrode 301 is connected to the fourth pixel electrode 304 through a repair line, and the first pixel electrode 301 and the fourth pixel electrode 304 belong to two correspondingly arranged pixels, and belong to the pixel
  • the common pixel circuit 307 between the two pixels, the repair line is set under the film of the first pixel electrode 301 pixel electrode extension 201 and the fourth pixel electrode 304 pixel electrode extension 201.
  • laser The pixel electrode extension 201 of the first pixel electrode 301 and the pixel electrode extension 201 of the fourth pixel electrode 304 connect the first pixel electrode 301 and the fourth pixel electrode 304 through a repair line.
  • the first pixel electrode 301 is connected to the fifth pixel electrode 305 through a repair line, and the first pixel electrode 301 and the fifth pixel electrode 305 belong to two correspondingly arranged pixels, and belong to the pixel
  • the shared pixel circuit 307 between the first pixel electrode 301 and the fifth pixel electrode 305 pixel electrode extension portion 201 and the fifth pixel electrode 305 pixel electrode extension portion 201 film layer at this time.
  • laser The pixel electrode extension 201 of the first pixel electrode 301 and the pixel electrode extension 201 of the fifth pixel electrode 305 connect the first pixel electrode 301 and the fifth pixel electrode 305 through a repair line.
  • the first pixel electrode 301 is connected to the sixth pixel electrode 306 through a repair line, and the first pixel electrode 301 and the sixth pixel electrode 306 belong to two correspondingly arranged pixels, and belong to the pixels.
  • the repair line is set under the film of the pixel electrode extension 201 of the first pixel electrode 301 and the pixel electrode extension 201 of the sixth pixel electrode 306.
  • laser The pixel electrode extension 201 of the first pixel electrode 301 and the pixel electrode extension 201 of the sixth pixel electrode 306 connect the first pixel electrode 301 and the sixth pixel electrode 306 through a repair line.
  • the first pixel electrode 301 is connected to the third pixel electrode 303 through a repair line, and both the first pixel electrode 301 and the third pixel electrode 303 belong to the first pixel, and belong to the shared pixel. Pixel circuit 307.
  • the repair line is set under the film layer of the first pixel electrode 301 pixel electrode extension 201 and the third pixel electrode 303 pixel electrode extension 201.
  • the first pixel is irradiated by laser.
  • the electrode 301 pixel electrode extension 201 and the third pixel electrode 303 pixel electrode extension 201 connect the first pixel electrode 301 and the third pixel electrode 303 through a repair line.
  • the first pixel electrode 301 is connected to the fourth pixel electrode 304 through a repair line, and the first pixel electrode 301 and the fourth pixel electrode 304 belong to two correspondingly arranged pixels, and belong to the pixels.
  • the common pixel circuit 307 between the two pixels, the repair line is set under the film of the first pixel electrode 301 pixel electrode extension 201 and the fourth pixel electrode 304 pixel electrode extension 201.
  • laser The pixel electrode extension 201 of the first pixel electrode 301 and the pixel electrode extension 201 of the fourth pixel electrode 304 connect the first pixel electrode 301 and the fourth pixel electrode 304 through a repair line.
  • the first pixel electrode 301 is connected to the fifth pixel electrode 305 through a repair line, and the first pixel electrode 301 and the fifth pixel electrode 305 belong to two correspondingly arranged pixels, and belong to the pixels.
  • the shared pixel circuit 307 between the first pixel electrode 301 and the fifth pixel electrode 305 pixel electrode extension portion 201 and the fifth pixel electrode 305 pixel electrode extension portion 201 film layer at this time.
  • laser The pixel electrode extension 201 of the first pixel electrode 301 and the pixel electrode extension 201 of the fifth pixel electrode 305 connect the first pixel electrode 301 and the fifth pixel electrode 305 through a repair line.
  • the first pixel electrode 301 is connected to the sixth pixel electrode 306 through a repair line, and the first pixel electrode 301 and the sixth pixel electrode 306 belong to two correspondingly arranged pixels, and belong to the pixels.
  • the repair line is set under the film of the pixel electrode extension 201 of the first pixel electrode 301 and the pixel electrode extension 201 of the sixth pixel electrode 306.
  • laser The pixel electrode extension 201 of the first pixel electrode 301 and the pixel electrode extension 201 of the sixth pixel electrode 306 connect the first pixel electrode 301 and the sixth pixel electrode 306 through a repair line.
  • the display device provided by the present application includes a display panel. As shown in FIG. 2, the dotted frame is the position of the insulating layer that needs to be penetrated by the radium when the sub-pixel has a bright spot.
  • the display panel includes a substrate 101, a driving circuit layer 102, and pixels.
  • the electrode layer 103, the repair line layer 104 and the insulating layer, the driving circuit layer 102 is formed on the substrate, and the signal electrode for driving the thin film transistor is formed.
  • the signal electrode is the source electrode or the drain electrode.
  • the pixel electrode layer 103 is patterned to form a sub The pixel electrode of the pixel unit.
  • the pixel electrode includes a pixel electrode body 202 and a pixel electrode extension 201 that are electrically connected.
  • the pixel electrode body 202 is located in the light-emitting area and is electrically connected to the signal electrode of the corresponding sub-pixel unit through the pixel signal line.
  • the extension is located in the shading area, the repair line layer 104 is patterned to form a repair line, and the insulating layer is located between the repair line layer 104 and the pixel electrode layer 103, wherein the pixel electrode extension 201 overlaps with the projection part of the repair line on the substrate, When the insulating layer in the overlapping area is opened, the pixel electrode extension 201 is electrically connected to the signal electrodes of other sub-pixel units through the repair line.
  • a display device including a display panel.
  • the display panel includes a substrate, a driving circuit layer, a pixel electrode layer, a repair line layer, and an insulating layer.
  • the driving circuit layer is formed on the substrate and the driving thin film transistor is formed.
  • the signal electrode is a source electrode or a drain electrode, a pixel electrode layer, patterned to form a pixel electrode of a sub-pixel unit
  • the pixel electrode includes a pixel electrode body and a pixel electrode extension that are electrically connected, and the pixel electrode body is located in the light-emitting area And is electrically connected to the signal electrode of the corresponding sub-pixel unit through the pixel signal line, the pixel electrode extension is located in the light-shielding area, the repair line layer is patterned to form the repair line, and the insulating layer is located between the repair line layer and the pixel electrode layer, wherein, The pixel electrode extension part coincides with the projection part of the repair line on the substrate.
  • the pixel electrode extension part When the insulating layer in the overlapping area is opened, the pixel electrode extension part is electrically connected to the signal electrodes of other sub-pixel units through the repair line; thus, bright spots appear in the sub-pixel units.
  • the pixel electrode of the sub-pixel unit is disconnected from the corresponding pixel circuit by laser, the extension of the pixel electrode is connected to the signal electrode of other sub-pixel units through the repair line to emit light, which solves the problem of bright spots in the existing display panel. Repair technical problems with limited effect.
  • the source and drain layer 409 and the repair line layer 104 are arranged in the same layer, and the repair line layer 104 is patterned to form the repair line and the source and drain of the thin film transistor.
  • the insulating layer is formed with a connection via k1, one end of the repair line overlaps with the pixel electrode extension 201 of one sub-pixel unit on the substrate, and the other end It is electrically connected to the pixel electrode extension 201 of another sub-pixel unit through the connection via k1.
  • the repair line layer 104 includes a first repair line layer 1041 and a second repair line layer 1042, and the first repair line layer 1041 and the second repair line layer 1042 The repair line is connected through the via hole, and the repair line is formed by patterning.
  • the light shielding layer 401 and the repair line layer 104 are provided in the same layer, and the repair line layer 104 is patterned to form a repair line and a light shielding layer 401 corresponding to the position of the thin film transistor.
  • the two ends of the repair line are respectively insulated from the pixel electrode extension portions 201 of the two sub-pixel units, and the projections overlap on the substrate.
  • the insulating layer is formed with connection vias, one end of the repair line overlaps with the pixel electrode extension of one sub-pixel unit projected on the substrate 101, and the other end is directly connected to the signal electrode of another sub-pixel unit.
  • a partial area of the repair line is used as a light shielding layer.
  • the active layer 404 and the repair line layer 104 are arranged in the same layer, and the active layer is patterned to form the repair line layer 104.
  • the first metal layer 406 and the repair line layer 104 are arranged in the same layer, and the repair line layer 104 is patterned to form the repair line, the gate of the low-temperature polysilicon thin film transistor, and The first electrode plate of the storage capacitor.
  • the second metal layer 408 and the repair line layer 104 are arranged in the same layer, and the repair line layer 104 is patterned to form the repair line and the gate of the metal semiconductor oxide thin film transistor. And the second electrode plate of the storage capacitor.
  • the display panel includes sub-pixel units arranged in an array.
  • the pixel electrode extension is connected to the adjacent sub-pixel through the repair line.
  • the signal electrodes of the unit are electrically connected.
  • the display panel includes pixel units arranged in an array, and the pixel units include multiple sub-pixel units of different light-emitting colors; when the insulating layer in the overlapping area is opened, The pixel electrode extension is electrically connected to the signal electrode of the sub-pixel unit of the same light-emitting color in the adjacent pixel unit through the repair line.
  • the liquid crystal display panel in a liquid crystal display device, includes a substrate 101, a light shielding layer 401, a buffer layer 402, and a driving circuit layer 102 which are laminated and arranged.
  • the driving circuit layer 102 includes an active layer 404, a gate Polar insulating layer 403, first metal layer 406, first inter insulating layer 405, second metal layer 408, second inter insulating layer 407, source and drain layer 409, planarization layer 410, pixel electrode layer 105, and alignment film layer ,
  • the repair line layer 104 is disposed between the substrate 101 and the planarization layer 410.
  • the repair line layer 104 is disposed between the substrate 101 and the light shielding layer 401.
  • the pixel electrode extension 201 of the pixel electrode is formed by laser. It is electrically connected to the repair line at the repair line layer 104, and the pixel electrode extension 201 of the pixel electrode with a bright spot is electrically connected to the repair line at the repair line layer 104 by laser, and the pixel electrode extension 201 of the pixel electrode is connected to the repair line at the repair line layer 104.
  • the pixel electrode extension 201 of the pixel electrode is connected by the repair line at the repair line layer 104, so that the pixel electrode that has a bright spot failure resumes light emission.
  • the repair line layer 104 is disposed between the light shielding layer 401 and the buffer layer 402.
  • the pixel electrode extension portion of the pixel electrode is formed by laser.
  • 201 is electrically connected to the repair line at the repair line layer 104
  • the pixel electrode extension 201 of the bright pixel electrode is electrically connected to the repair line at the repair line layer 104 by means of laser
  • the pixel electrode extension 201 of the pixel electrode is electrically connected to the repair line at the repair line layer 104.
  • the pixel electrode extension 201 of the bright point pixel electrode is connected by the repair line at the repair line layer 104, so that the pixel electrode with the bright point failure resumes light emission.
  • the repair line layer 104 is disposed between the buffer layer 402 and the gate insulating layer 403.
  • the pixel electrode of the pixel electrode appears by laser.
  • the extension 201 is electrically connected to the repair line at the repair line layer 104, and the pixel electrode extension 201 where the bright pixel electrode appears and the repair line at the repair line layer 104 are electrically connected by laser, and the pixel electrode extension 201 of the pixel electrode.
  • the pixel electrode extension 201 that is connected to the pixel electrode with the bright spot is connected by the repair line at the repair line layer 104, so that the pixel electrode with the bright spot failure resumes light emission.
  • the repair line layer 104 is disposed between the gate insulating layer 403 and the first inter-insulating layer 405.
  • the pixel electrode appears by laser.
  • the pixel electrode extension 201 of the pixel electrode is electrically connected to the repair line at the repair line layer 104, and the pixel electrode extension 201 of the pixel electrode with bright spots is electrically connected to the repair line at the repair line layer 104 by means of laser.
  • the extension portion 201 and the pixel electrode extension portion 201 where the bright point pixel electrode appears are connected by a repair line at the repair line layer 104, so that the pixel electrode that has a bright point failure resumes light emission.
  • the repair line layer 104 is disposed between the first inter-insulating layer 405 and the second inter-insulating layer 407.
  • the pixel is displayed by laser.
  • the pixel electrode extension 201 of the electrode is electrically connected to the repair line at the repair line layer 104, and the pixel electrode extension 201 where the bright pixel electrode appears is electrically connected to the repair line at the repair line layer 104 by means of laser.
  • the electrode extension 201 and the pixel electrode extension 201 where the bright point pixel electrode appears are connected by a repair line at the repair line layer 104, so that the pixel electrode that has a bright point failure resumes light emission.
  • the repair line layer 104 is disposed between the second insulating layer 407 and the planarization layer 410.
  • the laser beam is used to make the pixel electrode appear
  • the pixel electrode extension 201 is electrically connected to the repair line at the repair line layer 104, and the pixel electrode extension 201 where the bright pixel electrode appears is electrically connected to the repair line at the repair line layer 104 by laser, and the pixel electrode of the pixel electrode extends
  • the portion 201 and the pixel electrode extension portion 201 of the pixel electrode with a bright spot are connected by a repair line at the repair line layer 104, so that the pixel electrode with a bright spot failure resumes light emission.
  • the display panel is an OLED display panel.
  • the OLED display panel includes a substrate 101, a light shielding layer 401, a buffer layer 402, and a driving circuit layer 102, which are laminated and arranged.
  • the circuit layer includes an active layer 404, a gate insulating layer 403, a first metal layer 406, a first inter-insulating layer 405, a second metal layer 408, a second inter-insulating layer 407, a source-drain layer 409, a flat
  • the chemical layer 410, the pixel definition layer 105, the pixel electrode layer 103, the light-emitting function layer, the common electrode layer, and the encapsulation layer, and the repair line layer is arranged between the substrate and the encapsulation layer.
  • the display panel includes a pixel definition layer, the pixel electrode extension 201 is disposed on the pixel definition layer, and the pixel electrode extension 201 needs to penetrate the pixel definition layer by laser. To be electrically connected to the repair line.
  • the display panel includes a pixel definition layer, and the pixel electrode extension 201 is integrally provided with the pixel electrode body 202 and is located between the pixel definition layer 105 and the planarization layer 410, and the pixel electrode extends The part 201 does not need the laser to penetrate the pixel definition layer to be electrically connected to the repair line.
  • the common electrode layer and the repair line layer are arranged in the same layer, the common electrode layer is patterned to form the repair line and the common electrode, and the repair line is insulated from the common electrode.
  • the pixel defining layer 105 is patterned to form a protruding area, and the protruding area is used to define a light-emitting area; the pixel electrode extension 201 is located in the protruding area.
  • the pixel electrode extension is separately provided from the pixel electrode body, and is tiled on the top surface of the protruding area, the slope of the protruding area corresponding to the light-emitting area, and is connected to the pixel electrode body.
  • the repair line layer is formed by extending the source and drain layer 409, and the projection of the pixel electrode extension and the repair line layer on the substrate overlaps.
  • the repair line is located in the protruding area.
  • the light shielding layer 401 and the repair line layer are arranged in the same layer, and the light shielding layer 401 is patterned to form the repair line layer.
  • the active layer 404 and the repair line layer are arranged in the same layer, and the active layer 404 is patterned to form the repair line layer.
  • the first metal layer 406 and the repair line layer are arranged in the same layer, the first metal layer 406 is patterned to form the repair line layer, the second metal layer 408 and the repair line layer The same layer is arranged, and the second metal layer 408 is patterned to form a repair line layer.
  • the second metal layer 408 and the repair line layer are arranged in the same layer, and the second metal layer 408 is patterned to form the repair line layer.
  • the repair line is located in the protruding area.
  • the repair line layer 104 is disposed between the substrate 101 and the light shielding layer 401.
  • the pixel electrode extension 201 of the pixel electrode is formed by laser. It is electrically connected to the repair line at the repair line layer 104, and the pixel electrode extension 201 of the pixel electrode with a bright spot is electrically connected to the repair line at the repair line layer 104 by laser, and the pixel electrode extension 201 of the pixel electrode is connected to the repair line at the repair line layer 104.
  • the pixel electrode extension 201 of the pixel electrode is connected by the repair line at the repair line layer 104, so that the pixel electrode that has a bright spot failure resumes light emission.
  • the repair line layer 104 is disposed between the light shielding layer 401 and the buffer layer 402.
  • the pixel electrode extension portion of the pixel electrode is formed by laser.
  • 201 is electrically connected to the repair line at the repair line layer 104
  • the pixel electrode extension 201 of the bright pixel electrode is electrically connected to the repair line at the repair line layer 104 by means of laser
  • the pixel electrode extension 201 of the pixel electrode is electrically connected to the repair line at the repair line layer 104.
  • the pixel electrode extension 201 of the bright point pixel electrode is connected by the repair line at the repair line layer 104, so that the pixel electrode with the bright point failure resumes light emission.
  • the repair line layer 104 is disposed between the buffer layer 402 and the gate insulating layer 403.
  • the pixel electrode of the pixel electrode is formed by laser.
  • the extension 201 is electrically connected to the repair line at the repair line layer 104, and the pixel electrode extension 201 where the bright pixel electrode appears and the repair line at the repair line layer 104 are electrically connected by laser, and the pixel electrode extension 201 of the pixel electrode.
  • the pixel electrode extension 201 that is connected to the pixel electrode with the bright spot is connected by the repair line at the repair line layer 104, so that the pixel electrode with the bright spot failure resumes light emission.
  • the repair line layer 104 is disposed between the gate insulating layer 403 and the first inter-insulating layer 405.
  • the pixel electrode appears by laser.
  • the pixel electrode extension 201 of the pixel electrode is electrically connected to the repair line at the repair line layer 104, and the pixel electrode extension 201 of the pixel electrode with bright spots is electrically connected to the repair line at the repair line layer 104 by means of laser, and the pixel electrode of the pixel electrode is electrically connected to the repair line at the repair line layer 104.
  • the extension portion 201 and the pixel electrode extension portion 201 where the bright point pixel electrode appears are connected by a repair line at the repair line layer 104, so that the pixel electrode that has a bright point failure resumes light emission.
  • the repair line layer 104 is disposed between the first inter-insulating layer 405 and the second inter-insulating layer 407.
  • the pixel is displayed by laser.
  • the pixel electrode extension 201 of the electrode is electrically connected to the repair line at the repair line layer 104, and the pixel electrode extension 201 of the pixel electrode with bright spots is electrically connected to the repair line at the repair line layer 104 by means of laser.
  • the electrode extension portion 201 and the pixel electrode extension portion 201 where the bright point pixel electrode appears are connected by a repair line at the repair line layer 104, so that the pixel electrode that has a bright point failure resumes light emission.
  • the repair line layer 104 is disposed between the second insulating layer 407 and the source/drain layer 409.
  • the pixel electrode appears by laser.
  • the pixel electrode extension 201 of the pixel electrode is electrically connected to the repair line at the repair line layer 104, and the pixel electrode extension 201 of the pixel electrode with bright spots is electrically connected to the repair line at the repair line layer 104 by means of laser.
  • the extension portion 201 and the pixel electrode extension portion 201 where the bright point pixel electrode appears are connected by a repair line at the repair line layer 104, so that the pixel electrode that has a bright point failure resumes light emission.
  • the repair line layer 104 is disposed between the source and drain layer 409 and the planarization layer 410.
  • the pixel electrode appears by laser.
  • the electrode extension 201 is electrically connected to the repair line at the repair line layer 104, and the pixel electrode extension 201 where the bright pixel electrode appears and the repair line at the repair line layer 104 are electrically connected by laser, and the pixel electrode extension of the pixel electrode 201 and the pixel electrode extension 201 of the pixel electrode with a bright spot are connected by a repair line at the repair line layer 104, so that the pixel electrode with a bright spot failure resumes light emission.
  • one end of the repair line is connected to the extension 201 of the pixel electrode to be repaired, and the other end is projected to coincide with the extension of the pixel electrode in the same row on the substrate 101, and the pixels in the same row include the same pixel and different pixels.
  • the pixel electrode extension 201 is disposed close to the light-emitting area of the next pixel electrode.
  • the pixel electrode extension 201 is close to the next pixel electrode.
  • the pixel electrode extension 201 is provided in this way to achieve a good connection effect.
  • the entire layer of the repair line is arranged in a strip shape, and the repair line and the projections of all pixel electrode extensions on the substrate coincide.
  • the pixel electrodes can be divided into six sub-pixels, which are a first pixel electrode 301 and a second pixel electrode. 302, the third pixel electrode 303, the fourth pixel electrode 304, the fifth pixel electrode 305, and the sixth pixel electrode 306, and further include a pixel circuit 307.
  • the first pixel electrode 301 is connected to the second pixel electrode 302 through a repair line, and both the first pixel electrode 301 and the second pixel electrode 302 belong to the first pixel and belong to the common pixel within the pixel. Circuit 307.
  • the repair line is set under the film layer of the first pixel electrode 301 pixel electrode extension 201 and the second pixel electrode 302 pixel electrode extension 201.
  • the first pixel electrode is irradiated by laser 301
  • the pixel electrode extension 201 and the second pixel electrode 302 The pixel electrode extension 201 connects the first pixel electrode 301 and the second pixel electrode 302 through a repair line.
  • the first pixel electrode 301 is connected to the third pixel electrode 303 through a repair line, and both the first pixel electrode 301 and the third pixel electrode 303 belong to the first pixel and belong to the shared pixel.
  • the repair line is set under the film layer of the first pixel electrode 301 pixel electrode extension 201 and the third pixel electrode 303 pixel electrode extension 201.
  • the first pixel is irradiated by laser.
  • the electrode 301 pixel electrode extension 201 and the third pixel electrode 303 pixel electrode extension 201 connect the first pixel electrode 301 and the third pixel electrode 303 through a repair line.
  • the first pixel electrode 301 is connected to the fourth pixel electrode 304 through a repair line, and the first pixel electrode 301 and the fourth pixel electrode 304 belong to two correspondingly arranged pixels, and belong to the pixels.
  • the common pixel circuit 307 between the two pixels, the repair line is set under the film of the first pixel electrode 301 pixel electrode extension 201 and the fourth pixel electrode 304 pixel electrode extension 201.
  • laser The pixel electrode extension 201 of the first pixel electrode 301 and the pixel electrode extension 201 of the fourth pixel electrode 304 connect the first pixel electrode 301 and the fourth pixel electrode 304 through a repair line.
  • the first pixel electrode 301 is connected to the fifth pixel electrode 305 through a repair line, and the first pixel electrode 301 and the fifth pixel electrode 305 belong to two correspondingly arranged pixels, and belong to the pixels.
  • the shared pixel circuit 307 between the first pixel electrode 301 and the fifth pixel electrode 305 pixel electrode extension portion 201 and the fifth pixel electrode 305 pixel electrode extension portion 201 film layer at this time.
  • laser The pixel electrode extension 201 of the first pixel electrode 301 and the pixel electrode extension 201 of the fifth pixel electrode 305 connect the first pixel electrode 301 and the fifth pixel electrode 305 through a repair line.
  • the first pixel electrode 301 is connected to the sixth pixel electrode 306 through a repair line, and the first pixel electrode 301 and the sixth pixel electrode 306 belong to two correspondingly arranged pixels, and belong to the pixels.
  • the repair line is set under the film of the pixel electrode extension 201 of the first pixel electrode 301 and the pixel electrode extension 201 of the sixth pixel electrode 306.
  • laser The pixel electrode extension 201 of the first pixel electrode 301 and the pixel electrode extension 201 of the sixth pixel electrode 306 connect the first pixel electrode 301 and the sixth pixel electrode 306 through a repair line.
  • the first pixel electrode 301 is connected to the third pixel electrode 303 through a repair line, and both the first pixel electrode 301 and the third pixel electrode 303 belong to the first pixel, and belong to the shared pixel. Pixel circuit 307.
  • the repair line is set under the film layer of the first pixel electrode 301 pixel electrode extension 201 and the third pixel electrode 303 pixel electrode extension 201.
  • the first pixel is irradiated by laser.
  • the electrode 301 pixel electrode extension 201 and the third pixel electrode 303 pixel electrode extension 201 connect the first pixel electrode 301 and the third pixel electrode 303 through a repair line.
  • the first pixel electrode 301 is connected to the fourth pixel electrode 304 through a repair line, and the first pixel electrode 301 and the fourth pixel electrode 304 belong to two correspondingly arranged pixels, and belong to the pixel
  • the common pixel circuit 307 between the two pixels, the repair line is set under the film of the first pixel electrode 301 pixel electrode extension 201 and the fourth pixel electrode 304 pixel electrode extension 201.
  • laser The pixel electrode extension 201 of the first pixel electrode 301 and the pixel electrode extension 201 of the fourth pixel electrode 304 connect the first pixel electrode 301 and the fourth pixel electrode 304 through a repair line.
  • the first pixel electrode 301 is connected to the fifth pixel electrode 305 through a repair line, and the first pixel electrode 301 and the fifth pixel electrode 305 belong to two correspondingly arranged pixels, and belong to the pixels.
  • the shared pixel circuit 307 between the first pixel electrode 301 and the fifth pixel electrode 305 pixel electrode extension portion 201 and the fifth pixel electrode 305 pixel electrode extension portion 201 film layer at this time.
  • laser The pixel electrode extension 201 of the first pixel electrode 301 and the pixel electrode extension 201 of the fifth pixel electrode 305 connect the first pixel electrode 301 and the fifth pixel electrode 305 through a repair line.
  • the first pixel electrode 301 is connected to the sixth pixel electrode 306 through a repair line, and the first pixel electrode 301 and the sixth pixel electrode 306 belong to two correspondingly arranged pixels, and belong to the pixels.
  • the repair line is set under the film of the pixel electrode extension 201 of the first pixel electrode 301 and the pixel electrode extension 201 of the sixth pixel electrode 306.
  • laser The pixel electrode extension 201 of the first pixel electrode 301 and the pixel electrode extension 201 of the sixth pixel electrode 306 connect the first pixel electrode 301 and the sixth pixel electrode 306 through a repair line.
  • the present application provides a display panel and a display device.
  • the display panel includes a substrate, a driving circuit layer, a pixel electrode layer, a repair line layer, and an insulating layer.
  • the driving circuit layer is formed on the substrate, and a signal electrode for driving a thin film transistor is formed. It is a source electrode or a drain electrode, a pixel electrode layer, patterned to form a pixel electrode of a sub-pixel unit.
  • the pixel electrode includes a pixel electrode body and a pixel electrode extension that are electrically connected. The pixel electrode body is located in the light-emitting area and passes through the pixel signal.
  • the line is electrically connected to the signal electrode of the corresponding sub-pixel unit, the pixel electrode extension is located in the shading area, the repair line layer is patterned to form a repair line, and the insulating layer is located between the repair line layer and the pixel electrode layer.
  • the projection part of the repair line overlaps on the substrate.
  • the pixel electrode extension When the insulating layer in the overlap area is opened, the pixel electrode extension is electrically connected to the signal electrodes of other sub-pixel units through the repair line; in this way, when a bright spot appears in the sub-pixel unit, the laser will The pixel electrode of the sub-pixel unit is disconnected from the corresponding pixel circuit, and then the pixel electrode extension is connected to the signal electrodes of other sub-pixel units through a repair line to emit light, which solves the problem of the limited bright spot repairing effect of the existing display panel problem.

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Abstract

一种显示面板以及显示装置，显示面板的像素电极包括像素电极本体（202）和像素电极延伸部（201），像素电极本体（202）位于发光区内，像素电极延伸部（201）位于遮光区内，在重合区域的绝缘层被打通时，像素电极延伸部（201）通过修复线与其他子像素单元的信号电极电连接，解决了现有显示面板存在亮点修复效果有限的技术问题。

Description

显示面板以及显示装置 技术领域
本申请涉及显示技术领域，尤其涉及一种显示面板以及显示装置。
 背景技术
如图1所示，目前已有的面板亮点均是修复为暗点，将图示虚线框处进行镭射断开，此时出现问题的像素电极变为暗点，使得面板修复效果有限。
所以，现有显示面板存在亮点修复效果有限的技术问题。
 技术问题
本申请提供一种显示面板以及显示装置，用于解决现有显示面板存在亮点修复效果有限的技术问题。
 技术解决方案
为解决上述问题，本申请提供的技术方案如下：
本申请实施例提供一种显示面板，其包括：
基板；
驱动电路层，形成于所述基板上，形成有驱动薄膜晶体管的信号电极，所述信号电极为源极电极或漏极电极；
像素电极层，图案化形成子像素单元的像素电极，所述像素电极包括电连接的像素电极本体和像素电极延伸部；所述像素电极本体位于发光区内、且通过像素信号线与对应子像素单元的信号电极电连接，所述像素电极延伸部位于遮光区内；以及
修复线层，图案化形成修复线；
绝缘层，位于所述修复线层和所述像素电极层之间；
其中，所述像素电极延伸部与所述修复线在所述基板上的投影部分重合，在重合区域的绝缘层被打通时，所述像素电极延伸部通过所述修复线与其他子像素单元的信号电极电连接。
在本申请提供的显示面板中，所述显示面板包括阵列设置的子像素单元，在重合区域的绝缘层被打通时，所述像素电极延伸部通过所述修复线与相邻子像素单元的信号电极电连接。
在本申请提供的显示面板中，所述修复线的两端分别与两个子像素单元的像素电极延伸部绝缘设置、且在基板上投影重合。
在本申请提供的显示面板中，所述绝缘层形成有连接过孔，所述修复线的一端与一个子像素单元的像素电极延伸部在基板上投影重合，另一端通过所述连接过孔与另一个子像素单元的像素电极延伸部电连接。
在本申请提供的显示面板中，所述绝缘层形成有连接过孔，所述修复线的一端与一个子像素单元的像素电极延伸部在基板上投影重合，另一端直接与另一个子像素单元的信号电极连接。
在本申请提供的显示面板中，所述显示面板为液晶显示面板，所述液晶显示面板包括层叠设置的基板、遮光层、缓冲层、驱动电路层，所述驱动电路层包括层叠设置的有源层、栅极绝缘层、第一金属层、第一间绝缘层、第二金属层、第二间绝缘层、源漏极层、平坦化层、像素电极层以及配向膜层，所述修复线层设置于所述基板和所述平坦化层之间。
在本申请提供的显示面板中，所述遮光层和修复线层同层设置，所述修复线层图案化形成修复线、以及对应薄膜晶体管位置的遮光层。
在本申请提供的显示面板中，所述源漏极层和修复线层同层设置，所述修复线层图案化形成修复线、以及薄膜晶体管的源极和漏极。
在本申请提供的显示面板中，所述显示面板为OLED显示面板，所述OLED显示面板包括层叠设置的基板、遮光层、缓冲层、驱动电路层，所述驱动电路层包括层叠设置的有源层、栅极绝缘层、第一金属层、第一间绝缘层、第二金属层、第二间绝缘层、源漏极层、平坦化层、像素定义层、像素电极层、发光功能层、公共电极层以及封装层，所述修复线层设置于所述基板和所述封装层之间。
在本申请提供的显示面板中，所述公共电极层和修复线层同层设置，所述公共电极层图案化形成修复线以及公共电极，所述修复线与所述公共电极绝缘。
在本申请提供的显示面板中，所述像素定义层图案化形成突出区域，所述突出区域用于定义发光区域；所述像素电极延伸部位于突出区域内。
在本申请提供的显示面板中，所述像素电极延伸部与所述像素电极本体一体设置，且位于所述像素定义层与所述平坦化层之间。
在本申请提供的显示面板中，所述像素电极延伸部与所述像素电极本体分体设置，且平铺在所述突出区域的顶面、所述突出区域的对应发光区域的斜坡，与所述像素电极本体连接。
本申请实施例提供一种显示装置，其包括显示面板，所述显示面板包括：
基板；
驱动电路层，形成于所述基板上，形成有驱动薄膜晶体管的信号电极，所述信号电极为源极电极或漏极电极；
像素电极层，图案化形成子像素单元的像素电极，所述像素电极包括电连接的像素电极本体和像素电极延伸部；所述像素电极本体位于发光区内、且通过像素信号线与对应子像素单元的信号电极电连接，所述像素电极延伸部位于遮光区内；以及
修复线层，图案化形成修复线；
绝缘层，位于所述修复线层和所述像素电极层之间；
其中，所述像素电极延伸部与所述修复线在所述基板上的投影部分重合，在重合区域的绝缘层被打通时，所述像素电极延伸部通过所述修复线与其他子像素单元的信号电极电连接。
在本申请提供的显示装置中，所述显示面板包括阵列设置的子像素单元，在重合区域的绝缘层被打通时，所述像素电极延伸部通过所述修复线与相邻子像素单元的信号电极电连接。
在本申请提供的显示装置中，所述修复线的两端分别与两个子像素单元的像素电极延伸部绝缘设置、且在基板上投影重合。
在本申请提供的显示装置中，所述绝缘层形成有连接过孔，所述修复线的一端与一个子像素单元的像素电极延伸部在基板上投影重合，另一端通过所述连接过孔与另一个子像素单元的像素电极延伸部电连接。
在本申请提供的显示装置中，所述绝缘层形成有连接过孔，所述修复线的一端与一个子像素单元的像素电极延伸部在基板上投影重合，另一端直接与另一个子像素单元的信号电极连接。
在本申请提供的显示装置中，所述显示面板为液晶显示面板，所述液晶显示面板包括层叠设置的基板、遮光层、缓冲层、驱动电路层，所述驱动电路层包括层叠设置的有源层、栅极绝缘层、第一金属层、第一间绝缘层、第二金属层、第二间绝缘层、源漏极层、平坦化层、像素电极层以及配向膜层，所述修复线层设置于所述基板和所述平坦化层之间。
在本申请提供的显示装置中，所述遮光层和修复线层同层设置，所述修复线层图案化形成修复线、以及对应薄膜晶体管位置的遮光层。
 有益效果
本申请提供一种显示面板以及显示装置，显示面板包括基板、驱动电路层、像素电极层、修复线层和绝缘层，所述驱动电路层形成于所述基板上，形成有驱动薄膜晶体管的信号电极，所述信号电极为源极电极或漏极电极，所述像素电极层，图案化形成子像素单元的像素电极，所述像素电极包括电连接的像素电极本体和像素电极延伸部，所述像素电极本体位于发光区内、且通过像素信号线与对应子像素单元的信号电极电连接，所述像素电极延伸部位于遮光区内，所述修复线层图案化形成修复线，所述绝缘层位于所述修复线层和所述像素电极层之间，其中，所述像素电极延伸部与所述修复线在所述基板上的投影部分重合，在重合区域的绝缘层被打通时，所述像素电极延伸部通过所述修复线与其他子像素单元的信号电极电连接；这样在子像素单元出现亮点时，通过镭射将该子像素单元的像素电极与对应像素电路断开，再用镭射将该像素电极延伸部通过修复线与其他子像素单元的信号电极连接发光，解决了现有显示面板存在亮点修复效果有限的技术问题。
 附图说明
为了更清楚地说明实施例或现有技术中的技术方案，下面将对实施例或现有技术描述中所需要使用的附图作简单介绍，显而易见地，下面描述中的附图仅仅是申请的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他的附图。
图1为现有显示面板的俯视示意图。
图2为本申请实施例提供的显示面板的第一种截面示意图。
图3为本申请实施例提供的显示面板的第二种截面示意图。
图4为本申请实施例提供的显示面板的第三种截面示意图。
图5为本申请实施例提供的显示面板的第四种截面示意图。
图6为本申请实施例提供的显示面板的第五种截面示意图。
图7为本申请实施例提供的显示面板的第六种截面示意图。
图8为本申请实施例提供的显示面板的第七种截面示意图。
图9为本申请实施例提供的显示面板的第一种俯视示意图。
图10为本申请实施例提供的显示面板的第八种截面示意图。
图11为本申请实施例提供的显示面板的第九种截面示意图。
图12为本申请实施例提供的显示面板的第十种截面示意图。
图13为本申请实施例提供的显示面板的第十一种截面示意图。
图14为本申请实施例提供的显示面板的第十二种截面示意图。
图15为本申请实施例提供的显示面板的第二种俯视示意图。
图16为本申请实施例提供的显示面板的第三种俯视示意图。
 本发明的实施方式
以下各实施例的说明是参考附加的图示，用以例示本申请可用以实施的特定实施例。本申请所提到的方向用语，例如[上]、[下]、[前]、[后]、[左]、[右]、[内]、[外]、[侧面]等，仅是参考附加图式的方向。因此，使用的方向用语是用以说明及理解本申请，而非用以限制本申请。在图中，结构相似的单元是用以相同标号表示。
针对现有显示面板存在亮点修复效果有限的技术问题，本申请实施例可以解决这个问题。
如图9所示，本申请的截面图示意图的剖面位置为A-A1。
本申请提供的显示面板，如图2所示，虚线框处为当该子像素出现亮点时需要镭射击穿的绝缘层的位置，显示面板包括基板101、驱动电路层102、像素电极层103、修复线层104和绝缘层，驱动电路层102形成于基板上，形成有驱动薄膜晶体管的信号电极，信号电极为源极电极或漏极电极，像素电极层103，图案化形成子像素单元的像素电极，像素电极包括电连接的像素电极本体202和像素电极延伸部201，像素电极本体202位于发光区内、且通过像素信号线与对应子像素单元的信号电极电连接，像素电极延伸部位于遮光区内，修复线层104图案化形成修复线，绝缘层位于修复线层104和像素电极层103之间，其中，像素电极延伸部201与修复线在基板上的投影部分重合，在重合区域的绝缘层被打通时，像素电极延伸部201通过修复线与其他子像素单元的信号电极电连接。
在本实施例中，显示面板包括基板、驱动电路层、像素电极层、修复线层和绝缘层，驱动电路层形成于基板上，形成有驱动薄膜晶体管的信号电极，信号电极为源极电极或漏极电极，像素电极层，图案化形成子像素单元的像素电极，像素电极包括电连接的像素电极本体和像素电极延伸部，像素电极本体位于发光区内、且通过像素信号线与对应子像素单元的信号电极电连接，像素电极延伸部位于遮光区内，修复线层图案化形成修复线，绝缘层位于修复线层和像素电极层之间，其中，像素电极延伸部与修复线在基板上的投影部分重合，在重合区域的绝缘层被打通时，像素电极延伸部通过修复线与其他子像素单元的信号电极电连接；这样在子像素单元出现亮点时，通过镭射将该子像素单元的像素电极与对应像素电路断开，再用镭射将该像素电极延伸部通过修复线与其他子像素单元的信号电极连接发光，解决了现有显示面板存在亮点修复效果有限的技术问题。
在一种实施例中，如图2，源漏极层409和修复线层104同层设置，修复线层104图案化形成修复线、以及薄膜晶体管的源极和漏极。
在一种实施例中，如图3所示，绝缘层形成有连接过孔k1，修复线的一端与一个子像素单元的像素电极延伸部201在基板上投影重合，另一端通过连接过孔k1与另一个子像素单元的像素电极延伸部201电连接。
在一种实施例中，如图4所示，修复线层104包括第一修复线层1041和第二修复线层1042，第一修复线层1041和第二修复线层1042通过修复线过孔连接，并图案化形成修复线。
在一种实施例中，如图5所示，遮光层401和修复线层104同层设置，修复线层104图案化形成修复线、以及对应薄膜晶体管位置的遮光层401。
在一种实施例中，修复线的两端分别与两个子像素单元的像素电极延伸部201绝缘设置、且在基板上投影重合。
在一种实施例中，绝缘层形成有连接过孔，修复线的一端与一个子像素单元的像素电极延伸部在基板101上投影重合，另一端直接与另一个子像素单元的信号电极连接。
在一种实施例中，修复线的部分区域作为遮光层。
在一种实施例中，如图6所示，有源层404和修复线层104同层设置，有源层图案化形成修复线层104。
在一种实施例中，如图7所示，第一金属层406和修复线层104同层设置，修复线层104图案化形成修复线、低温多晶硅薄膜晶体管的栅极以及存储电容的第一电极板。
在一种实施例中，如图8所示，第二金属层408和修复线层104同层设置，修复线层104图案化形成修复线、金属半导体氧化物薄膜晶体管的栅极以及存储电容的第二电极板。
在一种实施例中，如图9所示，显示面板包括阵列设置的子像素单元，在重合区域的绝缘层被打通时，像素电极延伸部通过修复线与相邻子像素单元的信号电极电连接。
在一种实施例中，如图9所示，显示面板包括阵列设置的像素单元，像素单元包括多种不同发光颜色的子像素单元；在重合区域的绝缘层被打通时，像素电极延伸部通过修复线与相邻像素单元中相同发光颜色的子像素单元的信号电极电连接。
在一种实施例中，显示面板为液晶显示面板，液晶显示面板包括层叠设置的基板101、遮光层401、缓冲层402、驱动电路层102，驱动电路层102包括层叠设置的有源层404、栅极绝缘层403、第一金属层406、第一间绝缘层405、第二金属层408、第二间绝缘层407、源漏极层409、平坦化层410、像素电极层105以及配向膜层，修复线层104设置于基板101和平坦化层410之间。
在一种实施例中，在液晶显示面板中，修复线层104设置于基板101和遮光层401之间，在一个像素电极出现亮点时，通过镭射的方式使出现像素电极的像素电极延伸部201和修复线层104处的修复线电连接，通过镭射的方式使出现亮点像素电极的像素电极延伸部201和修复线层104处的修复线电连接，像素电极的像素电极延伸部201和出现亮点像素电极的像素电极延伸部201通过修复线层104处的修复线连接，使出现亮点故障的像素电极恢复发光。
在一种实施例中，在液晶显示面板中，修复线层104设置于遮光层401和缓冲层402之间，在一个像素电极出现亮点时，通过镭射的方式使出现像素电极的像素电极延伸部201和修复线层104处的修复线电连接，通过镭射的方式使出现亮点像素电极的像素电极延伸部201和修复线层104处的修复线电连接，像素电极的像素电极延伸部201和出现亮点像素电极的像素电极延伸部201通过修复线层104处的修复线连接，使出现亮点故障的像素电极恢复发光。
在一种实施例中，在液晶显示面板中，修复线层104设置于缓冲层402和栅极绝缘层403之间，在一个像素电极出现亮点时，通过镭射的方式使出现像素电极的像素电极延伸部201和修复线层104处的修复线电连接，通过镭射的方式使出现亮点像素电极的像素电极延伸部201和修复线层104处的修复线电连接，像素电极的像素电极延伸部201和出现亮点像素电极的像素电极延伸部201通过修复线层104处的修复线连接，使出现亮点故障的像素电极恢复发光。
在一种实施例中，在液晶显示面板中，修复线层104设置于栅极绝缘层403和第一间绝缘层405之间，在一个像素电极出现亮点时，通过镭射的方式使出现像素电极的像素电极延伸部201和修复线层104处的修复线电连接，通过镭射的方式使出现亮点像素电极的像素电极延伸部201和修复线层104处的修复线电连接，像素电极的像素电极延伸部201和出现亮点像素电极的像素电极延伸部201通过修复线层104处的修复线连接，使出现亮点故障的像素电极恢复发光。
在一种实施例中，在液晶显示面板中，修复线层104设置于第一间绝缘层405和第二间绝缘层407之间，在一个像素电极出现亮点时，通过镭射的方式使出现像素电极的像素电极延伸部201和修复线层104处的修复线电连接，通过镭射的方式使出现亮点像素电极的像素电极延伸部201和修复线层104处的修复线电连接，像素电极的像素电极延伸部201和出现亮点像素电极的像素电极延伸部201通过修复线层104处的修复线连接，使出现亮点故障的像素电极恢复发光。
在一种实施例中，在液晶显示面板中，修复线层104设置于第二间绝缘层407和平坦化层410之间，在一个像素电极出现亮点时，通过镭射的方式使出现像素电极的像素电极延伸部201和修复线层104处的修复线电连接，通过镭射的方式使出现亮点像素电极的像素电极延伸部201和修复线层104处的修复线电连接，像素电极的像素电极延伸部201和出现亮点像素电极的像素电极延伸部201通过修复线层104处的修复线连接，使出现亮点故障的像素电极恢复发光。
在一种实施例中，如图10所示，显示面板为OLED显示面板，OLED显示面板包括层叠设置的基板101、遮光层401、缓冲层402、驱动电路层102，驱动电路层包括层叠设置的有源层404、栅极绝缘层403、第一金属层406、第一间绝缘层405、第二金属层408、第二间绝缘层407、源漏极层409、平坦化层410、像素定义层105、像素电极层103、发光功能层、公共电极层以及封装层，修复线层设置于基板和封装层之间。
在一种实施例中，如图10所示，在OLED显示面板中，显示面板包括像素定义层，像素电极延伸部201设置于像素定义层上，像素电极延伸部201需要镭射穿透像素定义层才能与修复线电连接。
在一种实施例中，在OLED显示面板中，显示面板包括像素定义层，像素电极延伸部201与像素电极本体202一体设置，且位于像素定义层105与平坦化层410之间，像素电极延伸部201不需要镭射穿透像素定义层才能与修复线电连接。
在一种实施例中，在OLED显示面板中，公共电极层和修复线层同层设置，公共电极层图案化形成修复线以及公共电极，修复线与公共电极绝缘。
在一种实施例中，在OLED显示面板中，像素定义层105图案化形成突出区域，突出区域用于定义发光区域；像素电极延伸部201位于突出区域内。
在一种实施例中，在OLED显示面板中，像素电极延伸部与像素电极本体分体设置，且平铺在突出区域的顶面、突出区域的对应发光区域的斜坡，与像素电极本体连接。
在一种实施例中，如图10，修复线层为源漏极层409延伸形成，像素电极延伸部与修复线层在基板上的投影有重合。
在一种实施例中，在OLED显示面板中，修复线位于突出区域内。
在一种实施例中，如图11，所示，遮光层401和修复线层同层设置，遮光层401图案化形成修复线层。
在一种实施例中，如图12，有源层404和修复线层同层设置，有源层404图案化形成修复线层。
在一种实施例中，如图13，第一金属层406和修复线层同层设置，第一金属层406图案化形成修复线层第二金属层408和修复线层同层设置，第二金属层408图案化形成修复线层。
在一种实施例中，如图14，第二金属层408和修复线层同层设置，第二金属层408图案化形成修复线层。
在一种实施例中，修复线与驱动薄膜晶体管的信号电极连接。
在一种实施例中，在OLED显示面板中，修复线层104设置于基板101和遮光层401之间，在一个像素电极出现亮点时，通过镭射的方式使出现像素电极的像素电极延伸部201和修复线层104处的修复线电连接，通过镭射的方式使出现亮点像素电极的像素电极延伸部201和修复线层104处的修复线电连接，像素电极的像素电极延伸部201和出现亮点像素电极的像素电极延伸部201通过修复线层104处的修复线连接，使出现亮点故障的像素电极恢复发光。
在一种实施例中，在OLED显示面板中，修复线层104设置于遮光层401和缓冲层402之间，在一个像素电极出现亮点时，通过镭射的方式使出现像素电极的像素电极延伸部201和修复线层104处的修复线电连接，通过镭射的方式使出现亮点像素电极的像素电极延伸部201和修复线层104处的修复线电连接，像素电极的像素电极延伸部201和出现亮点像素电极的像素电极延伸部201通过修复线层104处的修复线连接，使出现亮点故障的像素电极恢复发光。
在一种实施例中，在OLED显示面板中，修复线层104设置于缓冲层402和栅极绝缘层403之间，在一个像素电极出现亮点时，通过镭射的方式使出现像素电极的像素电极延伸部201和修复线层104处的修复线电连接，通过镭射的方式使出现亮点像素电极的像素电极延伸部201和修复线层104处的修复线电连接，像素电极的像素电极延伸部201和出现亮点像素电极的像素电极延伸部201通过修复线层104处的修复线连接，使出现亮点故障的像素电极恢复发光。
在一种实施例中，在OLED显示面板中，修复线层104设置于栅极绝缘层403和第一间绝缘层405之间，在一个像素电极出现亮点时，通过镭射的方式使出现像素电极的像素电极延伸部201和修复线层104处的修复线电连接，通过镭射的方式使出现亮点像素电极的像素电极延伸部201和修复线层104处的修复线电连接，像素电极的像素电极延伸部201和出现亮点像素电极的像素电极延伸部201通过修复线层104处的修复线连接，使出现亮点故障的像素电极恢复发光。
在一种实施例中，在OLED显示面板中，修复线层104设置于第一间绝缘层405和第二间绝缘层407之间，在一个像素电极出现亮点时，通过镭射的方式使出现像素电极的像素电极延伸部201和修复线层104处的修复线电连接，通过镭射的方式使出现亮点像素电极的像素电极延伸部201和修复线层104处的修复线电连接，像素电极的像素电极延伸部201和出现亮点像素电极的像素电极延伸部201通过修复线层104处的修复线连接，使出现亮点故障的像素电极恢复发光。
在一种实施例中，在OLED显示面板中，修复线层104设置于第二间绝缘层407和源漏极层409之间，在一个像素电极出现亮点时，通过镭射的方式使出现像素电极的像素电极延伸部201和修复线层104处的修复线电连接，通过镭射的方式使出现亮点像素电极的像素电极延伸部201和修复线层104处的修复线电连接，像素电极的像素电极延伸部201和出现亮点像素电极的像素电极延伸部201通过修复线层104处的修复线连接，使出现亮点故障的像素电极恢复发光。
在一种实施例中，在OLED显示面板中，修复线层104设置于源漏极层409和平坦化层410之间，在一个像素电极出现亮点时，通过镭射的方式使出现像素电极的像素电极延伸部201和修复线层104处的修复线电连接，通过镭射的方式使出现亮点像素电极的像素电极延伸部201和修复线层104处的修复线电连接，像素电极的像素电极延伸部201和出现亮点像素电极的像素电极延伸部201通过修复线层104处的修复线连接，使出现亮点故障的像素电极恢复发光。
在一种实施例中，修复线一端连接待修复像素电极延伸部201，另一端与同行像素电极的延伸部在基板101上投影重合，同行像素包括同一个像素和不同像素。
在一种实施例中，如图15所示，像素电极延伸部201靠近下一个像素电极的发光区设置，在OLED显示面板中，像素电极延伸部201靠近下一个像素电极发光区，这样设置像素电极延伸部201才能达到好的连接效果。
在一种实施例中，如图15所示，修复线整层呈条状设置，修复线和所有像素电极延伸部在基板上的投影都重合。
在一种实施例中，如图16所示，以两个相对设置的像素为例，可以分为六个子像素的像素电极，分别为第一像素电极301、第二像素电极302、第三像素电极303、第四像素电极304、第五像素电极305、第六像素电极306，还包括像素电路307。
在一种实施例中，第一像素电极301通过修复线与第二像素电极302相连，第一像素电极301和第二像素电极302都属于第一像素，属于像素内共用像素电路307，此时修复线设置在第一像素电极301像素电极延伸部201和第二像素电极302像素电极延伸部201膜层下方，在第一像素电极301出现亮点时，通过镭射第一像素电极301像素电极延伸部201和第二像素电极302像素电极延伸部201，使第一像素电极301和第二像素电极302通过修复线连接。
在一种实施例中，在液晶显示面板中，第一像素电极301通过修复线与第三像素电极303相连，第一像素电极301和第三像素电极303都属于第一像素，属于像素内共用像素电路307，此时修复线设置在第一像素电极301像素电极延伸部201和第三像素电极303像素电极延伸部201膜层下方，在第一像素电极301出现亮点时，通过镭射第一像素电极301像素电极延伸部201和第三像素电极303像素电极延伸部201，使第一像素电极301和第三像素电极303通过修复线连接。
在一种实施例中，在液晶显示面板中，第一像素电极301通过修复线与第四像素电极304相连，第一像素电极301和第四像素电极304属于对应设置的两个像素，属于像素间的共用像素电路307，此时修复线设置在第一像素电极301像素电极延伸部201和第四像素电极304像素电极延伸部201膜层下方，在第一像素电极301出现亮点时，通过镭射第一像素电极301像素电极延伸部201和第四像素电极304像素电极延伸部201，使第一像素电极301和第四像素电极304通过修复线连接。
在一种实施例中，在液晶显示面板中，第一像素电极301通过修复线与第五像素电极305相连，第一像素电极301和第五像素电极305属于对应设置的两个像素，属于像素间的共用像素电路307，此时修复线设置在第一像素电极301像素电极延伸部201和第五像素电极305像素电极延伸部201膜层下方，在第一像素电极301出现亮点时，通过镭射第一像素电极301像素电极延伸部201和第五像素电极305像素电极延伸部201，使第一像素电极301和第五像素电极305通过修复线连接。
在一种实施例中，在液晶显示面板中，第一像素电极301通过修复线与第六像素电极306相连，第一像素电极301和第六像素电极306属于对应设置的两个像素，属于像素间的共用像素电路307，此时修复线设置在第一像素电极301像素电极延伸部201和第六像素电极306像素电极延伸部201膜层下方，在第一像素电极301出现亮点时，通过镭射第一像素电极301像素电极延伸部201和第六像素电极306像素电极延伸部201，使第一像素电极301和第六像素电极306通过修复线连接。
在一种实施例中，在OLED显示面板中，第一像素电极301通过修复线与第三像素电极303相连，第一像素电极301和第三像素电极303都属于第一像素，属于像素内共用像素电路307，此时修复线设置在第一像素电极301像素电极延伸部201和第三像素电极303像素电极延伸部201膜层下方，在第一像素电极301出现亮点时，通过镭射第一像素电极301像素电极延伸部201和第三像素电极303像素电极延伸部201，使第一像素电极301和第三像素电极303通过修复线连接。
在一种实施例中，在OLED显示面板中，第一像素电极301通过修复线与第四像素电极304相连，第一像素电极301和第四像素电极304属于对应设置的两个像素，属于像素间的共用像素电路307，此时修复线设置在第一像素电极301像素电极延伸部201和第四像素电极304像素电极延伸部201膜层下方，在第一像素电极301出现亮点时，通过镭射第一像素电极301像素电极延伸部201和第四像素电极304像素电极延伸部201，使第一像素电极301和第四像素电极304通过修复线连接。
在一种实施例中，在OLED显示面板中，第一像素电极301通过修复线与第五像素电极305相连，第一像素电极301和第五像素电极305属于对应设置的两个像素，属于像素间的共用像素电路307，此时修复线设置在第一像素电极301像素电极延伸部201和第五像素电极305像素电极延伸部201膜层下方，在第一像素电极301出现亮点时，通过镭射第一像素电极301像素电极延伸部201和第五像素电极305像素电极延伸部201，使第一像素电极301和第五像素电极305通过修复线连接。
在一种实施例中，在OLED显示面板中，第一像素电极301通过修复线与第六像素电极306相连，第一像素电极301和第六像素电极306属于对应设置的两个像素，属于像素间的共用像素电路307，此时修复线设置在第一像素电极301像素电极延伸部201和第六像素电极306像素电极延伸部201膜层下方，在第一像素电极301出现亮点时，通过镭射第一像素电极301像素电极延伸部201和第六像素电极306像素电极延伸部201，使第一像素电极301和第六像素电极306通过修复线连接。
本申请提供的显示装置，包括显示面板，如图2所示，虚线框处为当该子像素出现亮点时需要镭射击穿的绝缘层的位置，显示面板包括基板101、驱动电路层102、像素电极层103、修复线层104和绝缘层，驱动电路层102形成于基板上，形成有驱动薄膜晶体管的信号电极，信号电极为源极电极或漏极电极，像素电极层103，图案化形成子像素单元的像素电极，像素电极包括电连接的像素电极本体202和像素电极延伸部201，像素电极本体202位于发光区内、且通过像素信号线与对应子像素单元的信号电极电连接，像素电极延伸部位于遮光区内，修复线层104图案化形成修复线，绝缘层位于修复线层104和像素电极层103之间，其中，像素电极延伸部201与修复线在基板上的投影部分重合，在重合区域的绝缘层被打通时，像素电极延伸部201通过修复线与其他子像素单元的信号电极电连接。
在本实施例中，提供一种显示装置，包括显示面板，显示面板包括基板、驱动电路层、像素电极层、修复线层和绝缘层，驱动电路层形成于基板上，形成有驱动薄膜晶体管的信号电极，信号电极为源极电极或漏极电极，像素电极层，图案化形成子像素单元的像素电极，像素电极包括电连接的像素电极本体和像素电极延伸部，像素电极本体位于发光区内、且通过像素信号线与对应子像素单元的信号电极电连接，像素电极延伸部位于遮光区内，修复线层图案化形成修复线，绝缘层位于修复线层和像素电极层之间，其中，像素电极延伸部与修复线在基板上的投影部分重合，在重合区域的绝缘层被打通时，像素电极延伸部通过修复线与其他子像素单元的信号电极电连接；这样在子像素单元出现亮点时，通过镭射将该子像素单元的像素电极与对应像素电路断开，再用镭射将该像素电极延伸部通过修复线与其他子像素单元的信号电极连接发光，解决了现有显示面板存在亮点修复效果有限的技术问题。
在一种实施例中，在显示装置中，如图2，源漏极层409和修复线层104同层设置，修复线层104图案化形成修复线、以及薄膜晶体管的源极和漏极。
在一种实施例中，在显示装置中，如图3所示，绝缘层形成有连接过孔k1，修复线的一端与一个子像素单元的像素电极延伸部201在基板上投影重合，另一端通过连接过孔k1与另一个子像素单元的像素电极延伸部201电连接。
在一种实施例中，在显示装置中，如图4所示，修复线层104包括第一修复线层1041和第二修复线层1042，第一修复线层1041和第二修复线层1042通过修复线过孔连接，并图案化形成修复线。
在一种实施例中，在显示装置中，如图5所示，遮光层401和修复线层104同层设置，修复线层104图案化形成修复线、以及对应薄膜晶体管位置的遮光层401。
在一种实施例中，修复线的两端分别与两个子像素单元的像素电极延伸部201绝缘设置、且在基板上投影重合。
在一种实施例中，绝缘层形成有连接过孔，修复线的一端与一个子像素单元的像素电极延伸部在基板101上投影重合，另一端直接与另一个子像素单元的信号电极连接。
在一种实施例中，在显示装置中，修复线的部分区域作为遮光层。
在一种实施例中，在显示装置中，如图6所示，有源层404和修复线层104同层设置，有源层图案化形成修复线层104。
在一种实施例中，在显示装置中，如图7所示，第一金属层406和修复线层104同层设置，修复线层104图案化形成修复线、低温多晶硅薄膜晶体管的栅极以及存储电容的第一电极板。
在一种实施例中，在显示装置中，如图8所示，第二金属层408和修复线层104同层设置，修复线层104图案化形成修复线、金属半导体氧化物薄膜晶体管的栅极以及存储电容的第二电极板。
在一种实施例中，在显示装置中，如图9所示，显示面板包括阵列设置的子像素单元，在重合区域的绝缘层被打通时，像素电极延伸部通过修复线与相邻子像素单元的信号电极电连接。
在一种实施例中，在显示装置中，如图9所示，显示面板包括阵列设置的像素单元，像素单元包括多种不同发光颜色的子像素单元；在重合区域的绝缘层被打通时，像素电极延伸部通过修复线与相邻像素单元中相同发光颜色的子像素单元的信号电极电连接。
在一种实施例中，在液晶显示装置中，液晶显示面板包括层叠设置的基板101、遮光层401、缓冲层402、驱动电路层102，驱动电路层102包括层叠设置的有源层404、栅极绝缘层403、第一金属层406、第一间绝缘层405、第二金属层408、第二间绝缘层407、源漏极层409、平坦化层410、像素电极层105以及配向膜层，修复线层104设置于基板101和平坦化层410之间。
在一种实施例中，在液晶显示装置中，修复线层104设置于基板101和遮光层401之间，在一个像素电极出现亮点时，通过镭射的方式使出现像素电极的像素电极延伸部201和修复线层104处的修复线电连接，通过镭射的方式使出现亮点像素电极的像素电极延伸部201和修复线层104处的修复线电连接，像素电极的像素电极延伸部201和出现亮点像素电极的像素电极延伸部201通过修复线层104处的修复线连接，使出现亮点故障的像素电极恢复发光。
在一种实施例中，在液晶显示装置中，修复线层104设置于遮光层401和缓冲层402之间，在一个像素电极出现亮点时，通过镭射的方式使出现像素电极的像素电极延伸部201和修复线层104处的修复线电连接，通过镭射的方式使出现亮点像素电极的像素电极延伸部201和修复线层104处的修复线电连接，像素电极的像素电极延伸部201和出现亮点像素电极的像素电极延伸部201通过修复线层104处的修复线连接，使出现亮点故障的像素电极恢复发光。
在一种实施例中，在液晶显示装置中，修复线层104设置于缓冲层402和栅极绝缘层403之间，在一个像素电极出现亮点时，通过镭射的方式使出现像素电极的像素电极延伸部201和修复线层104处的修复线电连接，通过镭射的方式使出现亮点像素电极的像素电极延伸部201和修复线层104处的修复线电连接，像素电极的像素电极延伸部201和出现亮点像素电极的像素电极延伸部201通过修复线层104处的修复线连接，使出现亮点故障的像素电极恢复发光。
在一种实施例中，在液晶显示装置中，修复线层104设置于栅极绝缘层403和第一间绝缘层405之间，在一个像素电极出现亮点时，通过镭射的方式使出现像素电极的像素电极延伸部201和修复线层104处的修复线电连接，通过镭射的方式使出现亮点像素电极的像素电极延伸部201和修复线层104处的修复线电连接，像素电极的像素电极延伸部201和出现亮点像素电极的像素电极延伸部201通过修复线层104处的修复线连接，使出现亮点故障的像素电极恢复发光。
在一种实施例中，在液晶显示装置中，修复线层104设置于第一间绝缘层405和第二间绝缘层407之间，在一个像素电极出现亮点时，通过镭射的方式使出现像素电极的像素电极延伸部201和修复线层104处的修复线电连接，通过镭射的方式使出现亮点像素电极的像素电极延伸部201和修复线层104处的修复线电连接，像素电极的像素电极延伸部201和出现亮点像素电极的像素电极延伸部201通过修复线层104处的修复线连接，使出现亮点故障的像素电极恢复发光。
在一种实施例中，在液晶显示装置中，修复线层104设置于第二间绝缘层407和平坦化层410之间，在一个像素电极出现亮点时，通过镭射的方式使出现像素电极的像素电极延伸部201和修复线层104处的修复线电连接，通过镭射的方式使出现亮点像素电极的像素电极延伸部201和修复线层104处的修复线电连接，像素电极的像素电极延伸部201和出现亮点像素电极的像素电极延伸部201通过修复线层104处的修复线连接，使出现亮点故障的像素电极恢复发光。
在一种实施例中，在OLED显示装置中，如图10所示，显示面板为OLED显示面板，OLED显示面板包括层叠设置的基板101、遮光层401、缓冲层402、驱动电路层102，驱动电路层包括层叠设置的有源层404、栅极绝缘层403、第一金属层406、第一间绝缘层405、第二金属层408、第二间绝缘层407、源漏极层409、平坦化层410、像素定义层105、像素电极层103、发光功能层、公共电极层以及封装层，修复线层设置于基板和封装层之间。
在一种实施例中，在OLED显示装置中，如图10所示，显示面板包括像素定义层，像素电极延伸部201设置于像素定义层上，像素电极延伸部201需要镭射穿透像素定义层才能与修复线电连接。
在一种实施例中，在OLED显示装置中，显示面板包括像素定义层，像素电极延伸部201与像素电极本体202一体设置，且位于像素定义层105与平坦化层410之间，像素电极延伸部201不需要镭射穿透像素定义层才能与修复线电连接。
在一种实施例中，在OLED显示装置中，公共电极层和修复线层同层设置，公共电极层图案化形成修复线以及公共电极，修复线与公共电极绝缘。
在一种实施例中，在OLED显示装置中，像素定义层105图案化形成突出区域，突出区域用于定义发光区域；像素电极延伸部201位于突出区域内。
在一种实施例中，在OLED显示装置中，像素电极延伸部与像素电极本体分体设置，且平铺在突出区域的顶面、突出区域的对应发光区域的斜坡，与像素电极本体连接。
在一种实施例中，在OLED显示装置中，如图10，修复线层为源漏极层409延伸形成，像素电极延伸部与修复线层在基板上的投影有重合。
在一种实施例中，在OLED显示装置中，修复线位于突出区域内。
在一种实施例中，在OLED显示装置中，如图11，所示，遮光层401和修复线层同层设置，遮光层401图案化形成修复线层。
在一种实施例中，在OLED显示装置中，如图12，有源层404和修复线层同层设置，有源层404图案化形成修复线层。
在一种实施例中，在OLED显示装置中，如图13，第一金属层406和修复线层同层设置，第一金属层406图案化形成修复线层第二金属层408和修复线层同层设置，第二金属层408图案化形成修复线层。
在一种实施例中，在OLED显示装置中，如图14，第二金属层408和修复线层同层设置，第二金属层408图案化形成修复线层。
在一种实施例中，在OLED显示装置中，修复线位于突出区域内。
在一种实施例中，在OLED显示装置中，修复线层104设置于基板101和遮光层401之间，在一个像素电极出现亮点时，通过镭射的方式使出现像素电极的像素电极延伸部201和修复线层104处的修复线电连接，通过镭射的方式使出现亮点像素电极的像素电极延伸部201和修复线层104处的修复线电连接，像素电极的像素电极延伸部201和出现亮点像素电极的像素电极延伸部201通过修复线层104处的修复线连接，使出现亮点故障的像素电极恢复发光。
在一种实施例中，在OLED显示装置中，修复线层104设置于遮光层401和缓冲层402之间，在一个像素电极出现亮点时，通过镭射的方式使出现像素电极的像素电极延伸部201和修复线层104处的修复线电连接，通过镭射的方式使出现亮点像素电极的像素电极延伸部201和修复线层104处的修复线电连接，像素电极的像素电极延伸部201和出现亮点像素电极的像素电极延伸部201通过修复线层104处的修复线连接，使出现亮点故障的像素电极恢复发光。
在一种实施例中，在OLED显示装置中，修复线层104设置于缓冲层402和栅极绝缘层403之间，在一个像素电极出现亮点时，通过镭射的方式使出现像素电极的像素电极延伸部201和修复线层104处的修复线电连接，通过镭射的方式使出现亮点像素电极的像素电极延伸部201和修复线层104处的修复线电连接，像素电极的像素电极延伸部201和出现亮点像素电极的像素电极延伸部201通过修复线层104处的修复线连接，使出现亮点故障的像素电极恢复发光。
在一种实施例中，在OLED显示装置中，修复线层104设置于栅极绝缘层403和第一间绝缘层405之间，在一个像素电极出现亮点时，通过镭射的方式使出现像素电极的像素电极延伸部201和修复线层104处的修复线电连接，通过镭射的方式使出现亮点像素电极的像素电极延伸部201和修复线层104处的修复线电连接，像素电极的像素电极延伸部201和出现亮点像素电极的像素电极延伸部201通过修复线层104处的修复线连接，使出现亮点故障的像素电极恢复发光。
在一种实施例中，在OLED显示装置中，修复线层104设置于第一间绝缘层405和第二间绝缘层407之间，在一个像素电极出现亮点时，通过镭射的方式使出现像素电极的像素电极延伸部201和修复线层104处的修复线电连接，通过镭射的方式使出现亮点像素电极的像素电极延伸部201和修复线层104处的修复线电连接，像素电极的像素电极延伸部201和出现亮点像素电极的像素电极延伸部201通过修复线层104处的修复线连接，使出现亮点故障的像素电极恢复发光。
在一种实施例中，在OLED显示装置中，修复线层104设置于第二间绝缘层407和源漏极层409之间，在一个像素电极出现亮点时，通过镭射的方式使出现像素电极的像素电极延伸部201和修复线层104处的修复线电连接，通过镭射的方式使出现亮点像素电极的像素电极延伸部201和修复线层104处的修复线电连接，像素电极的像素电极延伸部201和出现亮点像素电极的像素电极延伸部201通过修复线层104处的修复线连接，使出现亮点故障的像素电极恢复发光。
在一种实施例中，在OLED显示装置中，修复线层104设置于源漏极层409和平坦化层410之间，在一个像素电极出现亮点时，通过镭射的方式使出现像素电极的像素电极延伸部201和修复线层104处的修复线电连接，通过镭射的方式使出现亮点像素电极的像素电极延伸部201和修复线层104处的修复线电连接，像素电极的像素电极延伸部201和出现亮点像素电极的像素电极延伸部201通过修复线层104处的修复线连接，使出现亮点故障的像素电极恢复发光。
在一种实施例中，修复线一端连接待修复像素电极延伸部201，另一端与同行像素电极的延伸部在基板101上投影重合，同行像素包括同一个像素和不同像素。
在一种实施例中，在OLED显示装置中，如图15所示，像素电极延伸部201靠近下一个像素电极的发光区设置，在OLED显示面板中，像素电极延伸部201靠近下一个像素电极发光区，这样设置像素电极延伸部201才能达到好的连接效果。
在一种实施例中，在显示装置中，如图15所示，修复线整层呈条状设置，修复线和所有像素电极延伸部在基板上的投影都重合。
在一种实施例中，在显示装置中，如图16所示，以两个相对设置的像素为例，可以分为六个子像素的像素电极，分别为第一像素电极301、第二像素电极302、第三像素电极303、第四像素电极304、第五像素电极305、第六像素电极306，还包括像素电路307。
在一种实施例中，在显示装置中，第一像素电极301通过修复线与第二像素电极302相连，第一像素电极301和第二像素电极302都属于第一像素，属于像素内共用像素电路307，此时修复线设置在第一像素电极301像素电极延伸部201和第二像素电极302像素电极延伸部201膜层下方，在第一像素电极301出现亮点时，通过镭射第一像素电极301像素电极延伸部201和第二像素电极302像素电极延伸部201，使第一像素电极301和第二像素电极302通过修复线连接。
在一种实施例中，在液晶显示装置中，第一像素电极301通过修复线与第三像素电极303相连，第一像素电极301和第三像素电极303都属于第一像素，属于像素内共用像素电路307，此时修复线设置在第一像素电极301像素电极延伸部201和第三像素电极303像素电极延伸部201膜层下方，在第一像素电极301出现亮点时，通过镭射第一像素电极301像素电极延伸部201和第三像素电极303像素电极延伸部201，使第一像素电极301和第三像素电极303通过修复线连接。
在一种实施例中，在液晶显示装置中，第一像素电极301通过修复线与第四像素电极304相连，第一像素电极301和第四像素电极304属于对应设置的两个像素，属于像素间的共用像素电路307，此时修复线设置在第一像素电极301像素电极延伸部201和第四像素电极304像素电极延伸部201膜层下方，在第一像素电极301出现亮点时，通过镭射第一像素电极301像素电极延伸部201和第四像素电极304像素电极延伸部201，使第一像素电极301和第四像素电极304通过修复线连接。
在一种实施例中，在液晶显示装置中，第一像素电极301通过修复线与第五像素电极305相连，第一像素电极301和第五像素电极305属于对应设置的两个像素，属于像素间的共用像素电路307，此时修复线设置在第一像素电极301像素电极延伸部201和第五像素电极305像素电极延伸部201膜层下方，在第一像素电极301出现亮点时，通过镭射第一像素电极301像素电极延伸部201和第五像素电极305像素电极延伸部201，使第一像素电极301和第五像素电极305通过修复线连接。
在一种实施例中，在液晶显示装置中，第一像素电极301通过修复线与第六像素电极306相连，第一像素电极301和第六像素电极306属于对应设置的两个像素，属于像素间的共用像素电路307，此时修复线设置在第一像素电极301像素电极延伸部201和第六像素电极306像素电极延伸部201膜层下方，在第一像素电极301出现亮点时，通过镭射第一像素电极301像素电极延伸部201和第六像素电极306像素电极延伸部201，使第一像素电极301和第六像素电极306通过修复线连接。
在一种实施例中，在OLED显示装置中，第一像素电极301通过修复线与第三像素电极303相连，第一像素电极301和第三像素电极303都属于第一像素，属于像素内共用像素电路307，此时修复线设置在第一像素电极301像素电极延伸部201和第三像素电极303像素电极延伸部201膜层下方，在第一像素电极301出现亮点时，通过镭射第一像素电极301像素电极延伸部201和第三像素电极303像素电极延伸部201，使第一像素电极301和第三像素电极303通过修复线连接。
在一种实施例中，在OLED显示装置中，第一像素电极301通过修复线与第四像素电极304相连，第一像素电极301和第四像素电极304属于对应设置的两个像素，属于像素间的共用像素电路307，此时修复线设置在第一像素电极301像素电极延伸部201和第四像素电极304像素电极延伸部201膜层下方，在第一像素电极301出现亮点时，通过镭射第一像素电极301像素电极延伸部201和第四像素电极304像素电极延伸部201，使第一像素电极301和第四像素电极304通过修复线连接。
在一种实施例中，在OLED显示装置中，第一像素电极301通过修复线与第五像素电极305相连，第一像素电极301和第五像素电极305属于对应设置的两个像素，属于像素间的共用像素电路307，此时修复线设置在第一像素电极301像素电极延伸部201和第五像素电极305像素电极延伸部201膜层下方，在第一像素电极301出现亮点时，通过镭射第一像素电极301像素电极延伸部201和第五像素电极305像素电极延伸部201，使第一像素电极301和第五像素电极305通过修复线连接。
在一种实施例中，在OLED显示装置中，第一像素电极301通过修复线与第六像素电极306相连，第一像素电极301和第六像素电极306属于对应设置的两个像素，属于像素间的共用像素电路307，此时修复线设置在第一像素电极301像素电极延伸部201和第六像素电极306像素电极延伸部201膜层下方，在第一像素电极301出现亮点时，通过镭射第一像素电极301像素电极延伸部201和第六像素电极306像素电极延伸部201，使第一像素电极301和第六像素电极306通过修复线连接。
根据上述实施例可知：
本申请提供一种显示面板和显示装置，显示面板包括基板、驱动电路层、像素电极层、修复线层和绝缘层，驱动电路层形成于基板上，形成有驱动薄膜晶体管的信号电极，信号电极为源极电极或漏极电极，像素电极层，图案化形成子像素单元的像素电极，像素电极包括电连接的像素电极本体和像素电极延伸部，像素电极本体位于发光区内、且通过像素信号线与对应子像素单元的信号电极电连接，像素电极延伸部位于遮光区内，修复线层图案化形成修复线，绝缘层位于修复线层和像素电极层之间，其中，像素电极延伸部与修复线在基板上的投影部分重合，在重合区域的绝缘层被打通时，像素电极延伸部通过修复线与其他子像素单元的信号电极电连接；这样在子像素单元出现亮点时，通过镭射将该子像素单元的像素电极与对应像素电路断开，再用镭射将该像素电极延伸部通过修复线与其他子像素单元的信号电极连接发光，解决了现有显示面板存在亮点修复效果有限的技术问题。
综上，虽然本申请已以优选实施例揭露如上，但上述优选实施例并非用以限制本申请，本领域的普通技术人员，在不脱离本申请的精神和范围内，均可作各种更动与润饰，因此本申请的保护范围以权利要求界定的范围为准。

Claims (20)

  1. 一种显示面板，其包括：
    基板；
    驱动电路层，形成于所述基板上，形成有驱动薄膜晶体管的信号电极，所述信号电极为源极电极或漏极电极；
    像素电极层，图案化形成子像素单元的像素电极，所述像素电极包括电连接的像素电极本体和像素电极延伸部；所述像素电极本体位于发光区内、且通过像素信号线与对应子像素单元的信号电极电连接，所述像素电极延伸部位于遮光区内；以及
    修复线层，图案化形成修复线；
    绝缘层，位于所述修复线层和所述像素电极层之间；
    其中，所述像素电极延伸部与所述修复线在所述基板上的投影部分重合，在重合区域的绝缘层被打通时，所述像素电极延伸部通过所述修复线与其他子像素单元的信号电极电连接。
  2. 根据权利要求1所述的显示面板，其中，所述显示面板包括阵列设置的子像素单元，在重合区域的绝缘层被打通时，所述像素电极延伸部通过所述修复线与相邻子像素单元的信号电极电连接。
  3. 根据权利要求1所述的显示面板，其中，所述修复线的两端分别与两个子像素单元的像素电极延伸部绝缘设置、且在基板上投影重合。
  4. 根据权利要求1所述的显示面板，其中，所述绝缘层形成有连接过孔，所述修复线的一端与一个子像素单元的像素电极延伸部在基板上投影重合，另一端通过所述连接过孔与另一个子像素单元的像素电极延伸部电连接。
  5. 根据权利要求1所述的显示面板，其中，所述绝缘层形成有连接过孔，所述修复线的一端与一个子像素单元的像素电极延伸部在基板上投影重合，另一端直接与另一个子像素单元的信号电极连接。
  6. 根据权利要求1所述的显示面板，其中，所述显示面板为液晶显示面板，所述液晶显示面板包括层叠设置的基板、遮光层、缓冲层、驱动电路层，所述驱动电路层包括层叠设置的有源层、栅极绝缘层、第一金属层、第一间绝缘层、第二金属层、第二间绝缘层、源漏极层、平坦化层、像素电极层以及配向膜层，所述修复线层设置于所述基板和所述平坦化层之间。
  7. 根据权利要求6所述的显示面板，其中，所述遮光层和修复线层同层设置，所述修复线层图案化形成修复线、以及对应薄膜晶体管位置的遮光层。
  8. 根据权利要求6所述的显示面板，其中，所述源漏极层和修复线层同层设置，所述修复线层图案化形成修复线、以及薄膜晶体管的源极和漏极。
  9. 根据权利要求1所述的显示面板，其中，所述显示面板为OLED显示面板，所述OLED显示面板包括层叠设置的基板、遮光层、缓冲层、驱动电路层，所述驱动电路层包括层叠设置的有源层、栅极绝缘层、第一金属层、第一间绝缘层、第二金属层、第二间绝缘层、源漏极层、平坦化层、像素定义层、像素电极层、发光功能层、公共电极层以及封装层，所述修复线层设置于所述基板和所述封装层之间。
  10. 根据权利要求9所述的显示面板，其中，所述公共电极层和修复线层同层设置，所述公共电极层图案化形成修复线以及公共电极，所述修复线与所述公共电极绝缘。
  11. 根据权利要求10所述的显示面板，其中，所述像素定义层图案化形成突出区域，所述突出区域用于定义发光区域；所述像素电极延伸部位于突出区域内。
  12. 根据权利要求11所述的显示面板，其中，所述像素电极延伸部与所述像素电极本体一体设置，且位于所述像素定义层与所述平坦化层之间。
  13. 根据权利要求11所述的显示面板，其中，所述像素电极延伸部与所述像素电极本体分体设置，且平铺在所述突出区域的顶面、所述突出区域的对应发光区域的斜坡，与所述像素电极本体连接。
  14. 一种显示装置，其包括显示面板，所述显示面板包括：
    基板；
    驱动电路层，形成于所述基板上，形成有驱动薄膜晶体管的信号电极，所述信号电极为源极电极或漏极电极；
    像素电极层，图案化形成子像素单元的像素电极，所述像素电极包括电连接的像素电极本体和像素电极延伸部；所述像素电极本体位于发光区内、且通过像素信号线与对应子像素单元的信号电极电连接，所述像素电极延伸部位于遮光区内；以及
    修复线层，图案化形成修复线；
    绝缘层，位于所述修复线层和所述像素电极层之间；
    其中，所述像素电极延伸部与所述修复线在所述基板上的投影部分重合，在重合区域的绝缘层被打通时，所述像素电极延伸部通过所述修复线与其他子像素单元的信号电极电连接。
  15. 根据权利要求14所述的显示装置，其中，所述显示面板包括阵列设置的子像素单元，在重合区域的绝缘层被打通时，所述像素电极延伸部通过所述修复线与相邻子像素单元的信号电极电连接。
  16. 根据权利要求14所述的显示装置，其中，所述修复线的两端分别与两个子像素单元的像素电极延伸部绝缘设置、且在基板上投影重合。
  17. 根据权利要求14所述的显示装置，其中，所述绝缘层形成有连接过孔，所述修复线的一端与一个子像素单元的像素电极延伸部在基板上投影重合，另一端通过所述连接过孔与另一个子像素单元的像素电极延伸部电连接。
  18. 根据权利要求14所述的显示装置，其中，所述绝缘层形成有连接过孔，所述修复线的一端与一个子像素单元的像素电极延伸部在基板上投影重合，另一端直接与另一个子像素单元的信号电极连接。
  19. 根据权利要求14所述的显示装置，其中，所述显示面板为液晶显示面板，所述液晶显示面板包括层叠设置的基板、遮光层、缓冲层、驱动电路层，所述驱动电路层包括层叠设置的有源层、栅极绝缘层、第一金属层、第一间绝缘层、第二金属层、第二间绝缘层、源漏极层、平坦化层、像素电极层以及配向膜层，所述修复线层设置于所述基板和所述平坦化层之间。
  20. 根据权利要求19所述的显示装置，其中，所述遮光层和修复线层同层设置，所述修复线层图案化形成修复线、以及对应薄膜晶体管位置的遮光层。
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