WO2021042496A1 - 显示面板及其制备方法 - Google Patents

显示面板及其制备方法 Download PDF

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Publication number
WO2021042496A1
WO2021042496A1 PCT/CN2019/115855 CN2019115855W WO2021042496A1 WO 2021042496 A1 WO2021042496 A1 WO 2021042496A1 CN 2019115855 W CN2019115855 W CN 2019115855W WO 2021042496 A1 WO2021042496 A1 WO 2021042496A1
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layer
carbon quantum
quantum dot
hole
display panel
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PCT/CN2019/115855
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English (en)
French (fr)
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李祥龙
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深圳市华星光电半导体显示技术有限公司
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Priority to US16/618,954 priority Critical patent/US11063098B2/en
Publication of WO2021042496A1 publication Critical patent/WO2021042496A1/zh

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/20—Carbon compounds, e.g. carbon nanotubes or fullerenes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
    • H10K50/11—OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass

Definitions

  • the invention relates to the field of display, in particular to a display panel and a preparation method thereof.
  • Carbon quantum dot material is a solution-processable semiconductor material, which has the characteristics of easy processing and low cost. It has been highly valued by researchers in recent years and has excellent performance in the field of luminescence. At the same time, carbon quantum dot materials have advantages similar to quantum dot materials. They have luminous characteristics such as adjustable wavelength, narrow emission spectrum and no heavy metal elements. They also have great potential in the fields of electroluminescence and display.
  • the current methods of making thin films include sputtering, evaporation, screen printing, spin coating, blade coating, dip coating, pulling and inkjet printing, among which sputtering and evaporation are expensive; the screen printing thickness and accuracy are not good and can be controlled;
  • the spin coating process has large edge centrifugal force during the preparation and processing of large-area films, the film is thin, and the overall thickness is uneven. It is not suitable for the preparation of large-area films. It has outstanding advantages in the preparation of small-area devices because the processing equipment is simple and the operation is simple. It is particularly widely used in the laboratory; during the preparation process of dipping and pulling, the back of the glass is also covered by the prepared film, resulting in the need for secondary cleaning.
  • inkjet printing can be applied to low-cost, continuous, large-scale large-scale industrial production.
  • inkjet printing has precise thickness and position control, and has a micron-level resolution. It can realize all-digital graphic output, and can control the processing process flexibly and accurately through the computer. It has bright application prospects in large-scale production, and has received extensive attention and attention.
  • Carbon quantum dot materials are nano-particle materials that can be used to prepare thin films with mature solution processing equipment.
  • the processing methods that have attracted attention are spin coating and inkjet printing.
  • the carbon quantum dot material can be dispersed in a solvent to prepare an ink.
  • the inkjet printing technology can accurately deposit the carbon quantum dot material in the set position according to the required amount to form a precise pixel film, which is conducive to the emission of carbon quantum dots.
  • the manufacturing of devices reduces costs.
  • Carbon quantum dot materials have good luminescence performance under the action of light, the spectrum is narrow and the efficiency is high, and the particle size can be used to adjust the light color.
  • the high luminous efficiency makes it have good application prospects under electro-induced conditions.
  • the purpose of the present invention is to solve the technical problems of poor brightness of the light-emitting layer and difficulty in meeting high requirements for light-emitting performance in the existing display panel.
  • the present invention provides a display panel, including: a substrate; an anode layer provided on the surface of one side of the substrate; a pixel definition layer provided on the surface of the anode layer on the side away from the substrate; A hole penetrates the pixel definition layer and is arranged opposite to the anode layer; a hole injection layer is arranged on the surface of the anode layer away from the substrate; a hole transport layer is arranged on the through hole And extends to the surface of the pixel definition layer; a carbon quantum dot layer is provided on the surface of the hole transport layer away from the pixel definition layer; an electron transport layer is provided on the carbon quantum dot layer away from The surface on the side of the hole transport layer; the electron injection layer, which is provided on the surface of the electron transport layer away from the carbon quantum dot layer; and the cathode layer, which is provided on the electron transport layer away from the carbon quantum dots The surface on one side of the dot layer.
  • the material of the carbon quantum dot layer includes carbon quantum dots.
  • the diameter of the carbon quantum dots ranges from 1 nm to 20 nm.
  • the thickness of the carbon quantum dot layer ranges from 10 nm to 2000 nm.
  • the present invention also provides a method for manufacturing a display panel, including the following steps: a substrate providing step, providing a substrate; an anode layer preparation step, preparing an anode layer on the upper surface of the substrate; a pixel defining layer
  • the preparation step is to prepare a pixel definition layer on the upper surface of the anode layer;
  • the through hole setting step is to open a through hole in the pixel definition layer so that the through hole is arranged opposite to the anode layer;
  • hole injection Layer preparation step a hole injection layer is prepared in the through hole and the upper surface of the pixel definition layer;
  • a hole transport layer preparation step a hole is prepared in the through hole and the upper surface of the pixel definition layer Transport layer;
  • a carbon quantum dot layer preparation step a carbon quantum dot layer is prepared on the upper surface of the hole transport layer;
  • an electron transport layer preparation step an electron transport layer is prepared on the upper surface of the carbon quantum dot layer;
  • electron injection The layer preparation step is to prepare an electron injection layer on
  • the carbon quantum dot layer preparation step includes: a carbon quantum dot solution preparation step to prepare a carbon quantum dot solution; and a carbon quantum dot solution printing step to print the carbon on the upper surface of the hole transport layer Quantum dot solution.
  • the preparation step of the carbon quantum dot solution includes the following steps: a reaction liquid preparation step, dispersing a carbon quantum dot material with a weight percentage of 0.01 to 30 wt% in a solvent with a weight percentage of 40 to 99.7 wt% to form a reaction solution And the adjustment step, while stirring the reaction solution, adding a regulator to the reaction solution to form a carbon quantum dot solution.
  • the solvent includes an organic solvent; the organic solvent includes: a compound containing at least one alkane or aromatic hydrocarbon; and/or, at least one alcohol compound; and/or, a solvent with a boiling point higher than 200 degrees Celsius .
  • the solvent with a boiling point higher than 200 degrees Celsius includes ether compounds, ester compounds or aromatic compounds.
  • the regulator includes: a first regulator, the first regulator includes at least one of imidazole and its derivatives, phenol, and hydroquinone; and a second regulator, the second regulator The agent includes at least one of alcohol, ether, ester, phenol, and amine.
  • the technical effect of the present invention is that carbon quantum dots are used as the material of the light-emitting layer to improve the quantum efficiency of the display panel and further improve the luminous efficiency of the display panel.
  • the different particle diameters of the carbon quantum dots can control the display panel to emit different colors of light without using quantum dots of different colors to emit light.
  • FIG. 1 is a schematic structural diagram of a display panel according to an embodiment of the present invention.
  • FIG. 2 is a flowchart of a manufacturing method of a display panel according to an embodiment of the present invention.
  • Substrate 2. Pixel definition layer; 3. Anode layer; 4. Hole injection layer; 5. Hole transport layer; 6. Carbon quantum dot layer; 7. Electron transport layer; 8. Electron injection layer; 9. Cathode layer; 21. Through hole.
  • the component can be directly placed on the other component; there may also be an intermediate component on which the component is placed , And the intermediate component is placed on another component.
  • a component is described as “installed to” or “connected to” another component, both can be understood as directly “installed” or “connected”, or a component is “installed to” or “connected to” through an intermediate component Another component.
  • This embodiment provides a display panel, including the display panel shown in FIG. 1.
  • the display panel includes a substrate 1, a pixel definition layer 2, an anode layer 3, a hole injection layer 4, a hole transport layer 5, and a carbon quantum
  • the substrate 1 plays a supporting role, and may be a rigid substrate or a flexible substrate, the rigid substrate includes glass, and the flexible substrate includes polyimide material.
  • the anode layer 3 is provided on the upper surface of the substrate 1, and the anode layer 3 (Anode) is electrically connected to a thin film transistor (TFT) of the display panel, and electrical signals are obtained from the thin film transistor (TFT) to provide electrical signals for the entire display panel.
  • the material of the anode layer 3 (Anode) is a material with a higher work function, generally indium tin oxide (ITO), indium zinc oxide (IZO), gold (Au), platinum (Pt), silicon (Si) And so on, in this embodiment, it is preferably indium tin oxide (ITO).
  • Holes are injected from the anode layer 3 to the hole injection layer 4, the holes migrate to the carbon quantum dot layer 6 through the hole transport layer 5, and meet electrons in the carbon quantum dot layer 6, forming excitons and exciting light-emitting molecules , The latter emit visible light after radiative relaxation.
  • the pixel defining layer 2 is provided on the upper surface of the anode layer 3 to define the light-emitting layer.
  • the pixel defining layer 2 is provided with a through hole 21, the through hole 21 is arranged opposite to the anode layer 3, and the through hole 21 is used to provide a channel for the subsequent film layer.
  • the hole injection layer 4 is provided on the upper surface of the anode layer 3 for injecting holes.
  • the material of the hole injection layer 4 is generally a metal oxide doped p-type material or conductive polymer (PEDOT:PSS) or other materials that can inject holes.
  • the thickness of the hole injection layer 4 ranges from 1 to 100. nm.
  • Hole Tranport Layer 5 (HTL, Hole Tranport Layer) can realize the directional and orderly and controllable migration of holes under the action of electric field when carriers (ie holes) are injected, so as to achieve the role of charge transport.
  • the material of the hole transport layer 5 is conductive polymer (PEDOT:PSS), etc., and the thickness of the hole transport layer 5 ranges from 10 nm to 300 nm.
  • the carbon quantum dot layer 6 is provided on the upper surface of the hole transport layer 5, and the carbon quantum dot layer 6 is a light-emitting layer. Holes and electrons combine to emit light in the carbon quantum dot layer 6 to realize the light-emitting function.
  • the thickness of the carbon quantum dot layer 6 ranges from 10 nm to 2000 nm.
  • the material of the carbon quantum dot layer 6 is carbon quantum dots.
  • the particle diameter of the carbon quantum dots ranges from 1 nm to 20 nm. In the visible light range, different particle diameters can emit light of different colors.
  • the carbon quantum dots When the particle size of the dot is 2nm, the carbon quantum dot layer 6 emits blue light; when the particle size of the carbon quantum dot is 5nm, the carbon quantum dot layer 6 emits green light; when the particle size of the carbon quantum dot is 10nm , The carbon quantum dot layer 6 emits red light.
  • the carbon quantum dots can meet the light-emitting requirements of the light-emitting layer, and there is no need to use quantum dots of different colors to emit light.
  • the electron transport layer 7 (ETL, Electron Transport Layer) is set on the upper surface of the carbon quantum dot layer 6 to transport electrons into the carbon quantum dot layer 6.
  • ETL Electron Transport Layer
  • the material of the electron transport layer 7 is an organic semiconductor material, which has high film stability, thermal stability and electronic Good transmission, generally used (such as 1,3,5-tris(1-phenyl-1H-benzimidazol-2-yl)benzene (TPBI)), or metal oxide such as zinc oxide (ZnO), etc.
  • the thickness of the electron transport layer 7 ranges from 2 nm to 200 nm.
  • the electron injection layer 8 is provided on the upper surface of the electron transport layer 7 for injecting electrons.
  • the material of the electron injection layer 8 generally includes a simple substance of an alkali metal, a halide, a carbonate or other materials capable of electron injection, and the thickness of the electron injection layer 8 ranges from 0.5 nm to 100 nm.
  • the cathode layer 9 (Cathode) is provided on the upper surface of the electron injection layer 8.
  • the cathode layer 9 is used to inject electrons into the electron injection layer 8.
  • the material of the cathode layer 9 is a low work function material, which generally includes elemental metals or alloy materials.
  • the elemental metal includes silver (Ag), aluminum (Al), lithium (Li), magnesium (Mg), calcium (Ca), indium (In), etc.
  • the alloy material includes magnesium aluminum alloy (Mg:Ag(10) :1)), lithium aluminum alloy (Li:Al(0.6%Li)). Electrons are injected from the cathode layer 9 to the electron injection layer 8.
  • the electrons migrate to the carbon quantum dot layer 6 through the electron transport layer 7, and meet holes in the carbon quantum dot layer 6, forming excitons and exciting light-emitting molecules. After radiation relaxation, visible light is emitted.
  • the thickness of the cathode layer 9 ranges from 10 nm to 1000 nm.
  • the technical effect of the display panel of this embodiment is that carbon quantum dots are used as the material of the light-emitting layer to improve the quantum efficiency of the display panel and further improve the luminous efficiency of the display panel.
  • the different particle diameters of the carbon quantum dots can control the display panel to emit different colors of light without using quantum dots of different colors to emit light.
  • the present invention also provides a method for manufacturing a display panel, including steps S1 to S10.
  • the substrate providing step is to provide a substrate, the substrate plays a supporting role, and may be a rigid substrate or a flexible substrate, the rigid substrate includes glass, and the flexible substrate includes a polyimide material.
  • magnetron sputtering technology is used to prepare an anode layer on the upper surface of the substrate.
  • the material of the anode layer is a material with a high work function, generally indium tin oxide (ITO) , Indium zinc oxide (IZO), gold (Au), platinum (Pt), silicon (Si), etc.
  • ITO indium tin oxide
  • a pixel definition layer is prepared on the upper surface of the anode layer, and the pixel definition layer is used to define a light-emitting layer.
  • a through hole setting step is to open a through hole on the pixel definition layer, the through hole is arranged opposite to the anode layer, and the through hole is used to provide a channel for a subsequent film layer.
  • a hole injection layer is prepared on the upper surface of the anode layer by using techniques such as inkjet printing, spin coating or evaporation, and the hole injection layer is used for injecting holes.
  • the raw materials for inkjet printing, spin coating or evaporation are generally p-type materials doped with metal oxides or conductive polymers (PEDOT:PSS) or other materials that can be used for hole injection.
  • the obtained hole injection layer The thickness range is 1nm ⁇ 100 nm.
  • S6 Hole transport layer preparation step, using inkjet printing technology to prepare a hole transport layer on the upper surface of the hole injection layer, so that when carriers (ie holes) are injected, it can be realized under the action of an electric field
  • the directional and orderly and controllable migration of holes can achieve the role of charge transfer.
  • the raw materials of inkjet printing are conductive polymers (PEDOT:PSS), etc., and the thickness of the hole transport layer obtained is in the range of 10nm ⁇ 300nm.
  • inkjet printing technology is used to print a carbon quantum dot solution on the upper surface of the hole transport layer to prepare a carbon quantum dot layer.
  • the thickness of the carbon quantum dot layer is in the range of 10 nm to 2000 nm.
  • the material of the carbon quantum dot layer is carbon quantum dots.
  • the particle size of the carbon quantum dots ranges from 1 nm to 20 nm.
  • different particle sizes can emit light of different colors, for example, when the carbon When the particle size of the quantum dots is 2nm, the carbon quantum dot layer emits blue light; when the particle size of the carbon quantum dots is 5nm, the carbon quantum dot layer emits green light; when the particle size of the carbon quantum dots At 10 nm, the carbon quantum dot layer emits red light.
  • the carbon quantum dots can meet the light-emitting requirements of the light-emitting layer, and there is no need to use quantum dots of different colors to emit light.
  • the carbon quantum dot layer preparation step includes a carbon quantum dot solution preparation step and a carbon quantum dot solution printing step.
  • the preparation step of the carbon quantum dot solution can be completed in advance.
  • the carbon quantum dot solution preparation step includes a reaction solution preparation step and an adjustment step.
  • carbon quantum dots are dispersed in a solvent to form a reaction liquid, wherein the weight percentage of the carbon quantum dots is 0.01-30 wt%, and the carbon quantum dots need to be selected from carbon with different particle diameters. Quantum dot particles are used to achieve luminous colors in different wavelength bands.
  • the weight percentage of the solvent is 40-99.7 wt%, and the solvent includes: a compound containing at least one alkane or aromatic hydrocarbon or at least one alcohol compound (may be a monohydric alcohol or a polyhydric alcohol), and the solvent is also It may be a high boiling point solvent with a boiling point higher than 200 degrees Celsius, and the high boiling point solvent includes ether compounds, ester compounds or aromatic compounds.
  • the reaction solution is stirred, and at the same time, a regulator is added to the reaction solution to form a carbon quantum dot solution.
  • the regulator includes a first regulator and a second regulator, the first regulator is a surface tension regulator, and the surface tension regulator includes a co-solvent, a surfactant, and a small molecule compound that regulates surface tension.
  • the weight percentage of the surface tension regulator is 0.01-5 wt%
  • the small molecule compound for adjusting surface tension includes at least one of imidazole and its derivatives, phenol, and hydroquinone.
  • the second regulator is a viscosity regulator
  • the viscosity regulator is used to adjust the viscosity of the entire solution system
  • the weight percentage of the viscosity regulator is 0.01-5 wt%
  • the material of the viscosity modifier includes at least one of alcohol, ether, ester, phenol, and amine.
  • inkjet printing technology can accurately deposit carbon quantum dot material in a set position according to the required amount to form a precise pixel film, which is beneficial to the manufacture of carbon quantum dot light-emitting devices and reduces production costs.
  • S8 electron transport layer preparation step using inkjet printing technology, spray 1,3,5-tris(1-phenyl-1H-benzimidazol-2-yl)benzene (TPBI) on the upper surface of the carbon quantum dot layer ), or metal oxides such as zinc oxide (ZnO), to prepare an electron transport layer.
  • TPBI 1,3,5-tris(1-phenyl-1H-benzimidazol-2-yl)benzene
  • ZnO zinc oxide
  • the thickness of the electron transport layer ranges from 2 nm to 200 nm.
  • an electron injection layer is prepared on the upper surface of the electron transport layer using inkjet printing, spin coating, or evaporation techniques, and the electron injection layer is used to inject electrons.
  • the material of the electron injection layer generally includes simple substance of alkali metal, halide, carbonate or other materials capable of electron injection, and the thickness of the obtained electron injection layer ranges from 0.5 nm to 100 nm.
  • a vacuum sputtering technique is used to sputter a cathode layer on the upper surface of the electron injection layer.
  • the cathode layer is used to inject electrons into the electron injection layer.
  • the material is a low work function material, generally including elemental metals or alloy materials.
  • the elemental metals include silver (Ag), aluminum (Al), lithium (Li), magnesium (Mg), calcium (Ca), indium (In), etc.
  • the alloy material includes magnesium aluminum alloy (Mg:Ag(10:1)), lithium aluminum alloy (Li:Al(0.6%Li)).
  • the thickness of the cathode layer ranges from 10 nm to 1000 nm.
  • the technical effect of the method for manufacturing the display panel in this embodiment is that carbon quantum dots are used as the material of the light-emitting layer to improve the quantum efficiency of the display panel, so that the quantum efficiency can reach 5-25%, and the luminous efficiency of the display panel is further improved.
  • the different particle diameters of the carbon quantum dots can control the display panel to emit different colors of light without using quantum dots of different colors to emit light.

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Abstract

本发明提供一种显示面板及其制备方法，所述显示面板包括基板、阳极层、像素定义层、空穴注入层、空穴传输层、碳量子点层、电子传输层、电子注入层以及阴极层。所述显示面板的制备方法包括基板提供步骤、阳极层制备步骤、像素定义层制备步骤、通孔设置步骤、空穴传输层制备步骤、碳量子点层制备步骤、电子传输层制备步骤以及阴极层制备步骤。

Description

显示面板及其制备方法 技术领域
本发明涉及显示领域，特别涉及一种显示面板及其制备方法。
 背景技术
碳量子点材料是一种可溶液加工的半导体材料，具有易加工、低成本等特点，近几年受到研究者的高度重视，在发光领域有非常优异的表现。与此同时，碳量子点材料具有类似于量子点材料的优点，发光波长可调、发射光谱窄且不含重金属元素等发光特性，在电致发光以及显示等领域中也有着巨大的潜力。
目前制作薄膜的方法包括溅射、蒸镀、丝印、旋涂、刮涂、浸涂、提拉和喷墨打印等方法，其中溅射和蒸镀成本高；丝印厚度和精度不好可控制；旋涂工艺在大面积薄膜制备加工时边缘离心力较大，薄膜偏薄，整体厚度不均匀，不适于大面积薄膜制备，在小面积器件制备中有着突出的优点，因为加工设备简单，操作简便，在实验室中有着特别广泛的应用；浸涂和提拉则在制备过程中，玻璃背面也同时被制备的薄膜覆盖，导致需要二次清理。
相比较之下，喷墨打印可适用于低成本、连续、大面积的规模化工业生产中，与其他成膜加工方式相比，喷墨打印的厚度和位置控制精确，具有微米级分辨率，可实现全数字图形输出，可通过计算机对加工过程灵活高精度控制等突出优点，在大规模生产中有着光明的应用前景，而受到广泛关注与重视。
碳量子点材料是纳米颗粒材料，可用成熟的溶液加工设备来制备薄膜，目前受人瞩目的加工方式为旋涂和喷墨打印。碳量子点材料可分散于溶剂中配制成可墨水，利用喷墨打印技术可以精确地按所需量将碳量子点材料沉积在设定的位置，沉积形成精密像素薄膜，有利于碳量子点发光器件的制造，降低成本。
碳量子点材料在光致作用下有很好的发光性能表现，光谱较窄且效率高，粒径大小可以用来调节光色。高的发光效率使其在电致条件下也能有很好的应用前景。
 技术问题
本发明的目的在于，解决现有的显示面板中发光层亮度不佳、发光性能难以满足高要求的技术问题。
 技术解决方案
为实现上述目的，本发明提供一种显示面板，包括：基板；阳极层，设于所述基板一侧的表面；像素定义层，设于所述阳极层远离所述基板一侧的表面；通孔，贯穿于所述像素定义层，且与所述阳极层相对设置；空穴注入层，设于所述阳极层远离所述基板一侧的表面；空穴传输层，设于所述通孔内，且延伸至所述像素定义层的表面；碳量子点层，设于所述空穴传输层远离所述像素定义层一侧的表面；电子传输层，设于所述碳量子点层远离所述空穴传输层一侧的表面；电子注入层，设于所述电子传输层远离所述碳量子点层一侧的表面；以及阴极层，设于所述电子传输层远离所述碳量子点层一侧的表面。
进一步地，所述碳量子点层的材质包括碳量子点。
进一步地，所述碳量子点的直径范围为1nm~20nm。
进一步地，所述碳量子点层的厚度范围为10nm~2000nm。
为实现上述目的，本发明还提供一种显示面板的制备方法，包括以下步骤：基板提供步骤，提供一基板；阳极层制备步骤，在所述基板的上表面制备出一阳极层；像素定义层制备步骤，在所述阳极层的上表面制备出一像素定义层；通孔设置步骤，在所述像素定义层上开设一通孔，使得所述通孔与所述阳极层相对设置；空穴注入层制备步骤，在所述通孔内及所述像素定义层上表面制备出空穴注入层；空穴传输层制备步骤，在所述通孔内及所述像素定义层上表面制备出空穴传输层；碳量子点层制备步骤，在所述空穴传输层上表面制备出碳量子点层；电子传输层制备步骤，在所述碳量子点层的上表面制备出电子传输层；电子注入层制备步骤，在所述电子传输层的上表面制备出电子注入层；以及阴极层制备步骤，在所述电子传输层的上表面制备出阴极层。
进一步地，所述碳量子点层制备步骤包括：碳量子点溶液制备步骤，制备出一碳量子点溶液；以及碳量子点溶液打印步骤，在所述空穴传输层的上表面打印所述碳量子点溶液。
进一步地，所述碳量子点溶液制备步骤包括以下步骤：反应液制备步骤，将重量百分比为0.01~30wt%的碳量子点材料分散于重量百分比为40~99.7 wt%的溶剂中，形成反应液；以及调节步骤，在搅拌所述反应液的同时，在所述反应液中加入调节剂，形成碳量子点溶液。
进一步地，所述溶剂包括有机溶剂；所述有机溶剂包括：至少含有一种烷烃或芳香烃的化合物；和/或，至少含有一种醇类化合物；和/或，沸点高于200摄氏度的溶剂。
进一步地，所述沸点高于200摄氏度的溶剂包括醚类化合物、酯类化合物或芳香类化合物。
进一步地，所述调节剂包括：第一调节剂，所述第一调节剂包括咪唑及其衍生物、苯酚、对苯二酚中的至少一种；以及第二调节剂，所述第二调节剂包括醇、醚、酯、酚、胺中的至少一种。
 有益效果
本发明的技术效果在于，采用碳量子点作为发光层的材料，提高显示面板的量子效率，进一步提高显示面板的发光效率。同时，碳量子点的不同粒径可控制所述显示面板发出不同颜色的光，无需使用不同颜色的量子点发光。
 附图说明
图1为本发明实施例所述显示面板的结构示意图；
图2为本发明实施例所述显示面板的制备方法的流程图。
部分组件标识如下：
1、基板；2、像素定义层；3、阳极层；4、空穴注入层；5、空穴传输层；6、碳量子点层；7、电子传输层；8、电子注入层；9、阴极层；21、通孔。
 本发明的最佳实施方式
以下结合说明书附图详细说明本发明的优选实施例，以向本领域中的技术人员完整介绍本发明的技术内容，以举例证明本发明可以实施，使得本发明公开的技术内容更加清楚，使得本领域的技术人员更容易理解如何实施本发明。然而本发明可以通过许多不同形式的实施例来得以体现，本发明的保护范围并非仅限于文中提到的实施例，下文实施例的说明并非用来限制本发明的范围。
本发明所提到的方向用语，例如「上」、「下」、「前」、「后」、「左」、「右」、「内」、「外」、「侧面」等，仅是附图中的方向，本文所使用的方向用语是用来解释和说明本发明，而不是用来限定本发明的保护范围。
在附图中，结构相同的部件以相同数字标号表示，各处结构或功能相似的组件以相似数字标号表示。此外，为了便于理解和描述，附图所示的每一组件的尺寸和厚度是任意示出的，本发明并没有限定每个组件的尺寸和厚度。
当某些组件，被描述为“在”另一组件“上”时，所述组件可以直接置于所述另一组件上；也可以存在一中间组件，所述组件置于所述中间组件上，且所述中间组件置于另一组件上。当一个组件被描述为“安装至”或“连接至”另一组件时，二者可以理解为直接“安装”或“连接”，或者一个组件通过一中间组件“安装至”或“连接至”另一个组件。
本实施例提供一种显示面板，包括如图1所示的显示面板，所述显示面板包括基板1、像素定义层2、阳极层3、空穴注入层4、空穴传输层5、碳量子点层6、电子传输层7、电子注入层8及阴极层9。
基板1起到支撑作用，可为硬质基板或柔性基板，所述硬质基板包括玻璃，所述柔性基板包括聚酰亚胺材料。
阳极层3设于基板1的上表面，阳极层3（Anode)电连接至显示面板的薄膜晶体管（TFT），从所述薄膜晶体管（TFT）处获得电信号，为整个显示面板提供电信号。阳极层3（Anode)的材质为功函数（work function）较高的材料，一般为氧化铟锡（ITO）、氧化铟锌（IZO）、金（Au）、铂（Pt）、硅（Si）等等，在本实施例中，优选为氧化铟锡（ITO）。空穴从阳极层3注入到空穴注入层4，空穴经过空穴传输层5迁移到碳量子点层6，并在碳量子点层6中与电子相遇，形成激子并使发光分子激发，后者经过辐射弛豫而发出可见光。
像素定义层2设于阳极层3的上表面，用以定义发光层。像素定义层2上设有通孔21，通孔21与阳极层3相对设置，通孔21用以为后续膜层提供通道。
空穴注入层4设于阳极层3的上表面，用以注入空穴。空穴注入层4的材质一般为金属氧化物掺杂的p型材料或者导电聚合物（PEDOT:PSS）或者其他可以起到空穴注入的材料，空穴注入层4的厚度范围为1~100 nm。
空穴传输层5（HTL，Hole Tranport Layer）在有载流子(即空穴)注入时，在电场作用下可以实现空穴的定向有序的可控迁移，从而达到传输电荷的作用，空穴传输层5的材质为导电聚合物（PEDOT:PSS）等，空穴传输层5的厚度范围为10nm~300nm。
碳量子点层6设于空穴传输层5 的上表面，碳量子点层6为发光层，空穴和电子在碳量子点层6中复合发光，用以实现发光功能。碳量子点层6的厚度范围为10nm~2000nm。碳量子点层6的材质为碳量子点，所述碳量子点的粒径范围为1nm~20nm，在可见光范围内，不同的粒径大小可发出不同颜色的光，例如，当所述碳量子点的粒径为2nm时，碳量子点层6发出蓝光；当所述碳量子点的粒径为5nm时，碳量子点层6发出绿光；当所述碳量子点的粒径为10nm时，碳量子点层6发出红光。所述碳量子点可满足发光层的发光需求，无需再使用不同颜色的量子点进行发光。
采用碳量子点发光，使得显示面板的发光效率达到5~25%，远高于现有的各种发光材料的发光效率。
电子传输层7（ETL，Electron Transport Layer)设于碳量子点层6的上表面，用以将电子传输到碳量子点层6中，在有载流子(即电子)注入时，电子传输层7在电场作用下可以实现电子的定向有序的可控迁移，从而达到传输电荷的作用，电子传输层7的材质为有机半导体材料，所述有机半导体材料制膜安定性高、热稳定且电子传输性佳，一般采用（如1,3,5-三(1-苯基-1H-苯并咪唑-2-基)苯（TPBI）），也可以是金属氧化物如氧化锌（ZnO）等。电子传输层7的厚度范围为2nm~200nm。
电子注入层8设于电子传输层7的上表面，用以注入电子。电子注入层8的材质一般包括碱金属的单质、卤化物、碳酸盐或者其他可以起着电子注入的材料，电子注入层8的厚度范围为0.5nm~100 nm。
阴极层9（Cathode）设于电子注入层8的上表面，阴极层9用以将电子入到电子注入层8中，阴极层9的材质为低功函数材料，一般包括单质金属或合金材料，所述单质金属包括银（Ag）、铝（Al）、锂（Li）、镁（Mg）、钙（Ca）、铟（In）等，所述合金材料包括镁铝合金（Mg:Ag(10:1)）、锂铝合金（Li:Al(0.6%Li)）。电子从阴极层9注入到电子注入层8，电子经过电子传输层7迁移到碳量子点层6，并在碳量子点层6中与空穴相遇，形成激子并使发光分子激发，后者经过辐射弛豫而发出可见光。阴极层9的厚度范围为10nm~1000nm。
本实施例所述显示面板的技术效果在于，采用碳量子点作为发光层的材料，提高显示面板的量子效率，进一步提高显示面板的发光效率。同时，碳量子点的不同粒径可控制所述显示面板发出不同颜色的光，无需使用不同颜色的量子点发光。
如图2所示，本发明还提供一种显示面板的制备方法，包括步骤S1~S10。
S1 基板提供步骤，提供一基板，所述基板起到支撑作用，可为硬质基板或柔性基板，所述硬质基板包括玻璃，所述柔性基板包括聚酰亚胺材料。
S2阳极层制备步骤，采用磁控溅射技术，在所述基板的上表面制备出阳极层，所述阳极层材质为功函数（work function）较高的材料，一般为氧化铟锡（ITO）、氧化铟锌（IZO）、金（Au）、铂（Pt）、硅（Si）等等，在本实施例中，优选为氧化铟锡（ITO）。
S3像素定义层制备步骤，在所述阳极层的上表面制备出像素定义层，所述像素定义层用以定义发光层。
S4通孔设置步骤，在所述像素定义层上开设一通孔，所述通孔与所述阳极层相对设置，所述通孔用以为后续膜层提供通道。
S5空穴注入层制备步骤，采用喷墨打印、旋涂或蒸镀等技术，在所述阳极层的上表面制备出空穴注入层，所述空穴注入层用以注入空穴。喷墨打印、旋涂或蒸镀的原材料一般为金属氧化物掺杂的p型材料或者导电聚合物（PEDOT:PSS）或者其他可以起到空穴注入的材料，所获得的空穴注入层的厚度范围为1nm~100 nm。
S6空穴传输层制备步骤，采用喷墨打印技术在所述空穴注入层的上表面制备出空穴传输层，使得在有载流子(即空穴)注入时，在电场作用下可以实现空穴的定向有序的可控迁移，从而达到传输电荷的作用，喷墨打印的原材料为导电聚合物（PEDOT:PSS）等，所得到的空穴传输层的厚度范围为10nm~300nm。
S7碳量子点层制备步骤，采用喷墨打印技术在所述空穴传输层的上表面打印碳量子点溶液，制备出碳量子点层。使得所述碳量子点层的厚度范围为10nm~2000nm。所述碳量子点层的材质为碳量子点，所述碳量子点的粒径范围为1nm~20nm，在可见光范围内，不同的粒径大小可发出不同颜色的光，例如，当所述碳量子点的粒径为2nm时，所述碳量子点层发出蓝光；当所述碳量子点的粒径为5nm时，所述碳量子点层发出绿光；当所述碳量子点的粒径为10nm时，所述碳量子点层发出红光。所述碳量子点可满足发光层的发光需求，无需再使用不同颜色的量子点进行发光。
所述碳量子点层制备步骤包括碳量子点溶液制备步骤及碳量子点溶液打印步骤。所述碳量子点溶液制备步骤可事先制备完成。所述碳量子点溶液制备步骤包括反应液制备步骤及调节步骤。
在所述反应液制备步骤中，将碳量子点分散于溶剂中，形成反应液，其中，所述碳量子点的重量百分比为0.01~30wt%，所述碳量子点需选用不同粒径的碳量子点颗粒，用以实现不同波段的发光色。所述溶剂的重量百分比为40~99.7 wt%，所述溶剂包括：至少含有一种烷烃或芳香烃的化合物或至少含有一种醇类化合物（可为一元醇或多元醇），所述溶剂还可以为一种沸点高于200摄氏度的高沸点溶剂，所述高沸点溶剂包括醚类化合物、酯类化合物或芳香类化合物。
在所述调节步骤中，搅拌所述反应液，同时向所述反应液中加入调节剂，形成碳量子点溶液。所述调节剂包括第一调节剂及第二调节剂，所述第一调节剂为表面张力调节剂，所述表面张力调节剂包括共溶剂、表面活性剂、调节表面张力的小分子化合物中的至少一种，所述表面张力调节剂的重量百分比为0.01~5 wt%，所述调节表面张力的小分子化合物包括咪唑及其衍生物、苯酚、对苯二酚中的至少一种。所述第二调节剂为黏度调节剂，所述黏度调节剂用以调节整个溶液体系的黏度，所述黏度调节剂的重量百分比为0.01~5 wt%，所述黏度调节剂的材质包括醇、醚、酯、酚、胺中的至少一种。
采用喷墨打印技术可以精确地按所需量将碳量子点材料沉积在设定的位置，沉积形成精密像素薄膜，有利于碳量子点发光器件的制造，降低生产成本。
S8电子传输层制备步骤，采用喷墨打印技术，在所述碳量子点层的上表面喷涂1,3,5-三(1-苯基-1H-苯并咪唑-2-基)苯（TPBI），或金属氧化物如氧化锌（ZnO），制备出电子传输层。所述电子传输层的厚度范围为2nm~200nm。
S9电子注入层制备步骤，采用喷墨打印、旋涂或蒸镀等技术，在所述电子传输层的上表面制备出电子注入层，所述电子注入层用以注入电子。所述电子注入层的材质一般包括碱金属的单质、卤化物、碳酸盐或者其他可以起着电子注入的材料，所获得的电子注入层的厚度范围为0.5nm~100 nm。
S10阴极层制备步骤，采用真空溅镀的技术，在所述电子注入层的上表面溅镀出阴极层，所述阴极层用以将电子入到所述电子注入层中，所述阴极层的材质为低功函数材料，一般包括单质金属或合金材料，所述单质金属包括银（Ag）、铝（Al）、锂（Li）、镁（Mg）、钙（Ca）、铟（In）等，所述合金材料包括镁铝合金（Mg:Ag(10:1)）、锂铝合金（Li:Al(0.6%Li)）。所述阴极层的厚度范围为10nm~1000nm。
本实施例所述显示面板的制备方法的技术效果在于，采用碳量子点作为发光层的材料，提高显示面板的量子效率，使得量子效率可达5~25%，进一步提高显示面板的发光效率。同时，碳量子点的不同粒径可控制所述显示面板发出不同颜色的光，无需使用不同颜色的量子点发光。
以上所述仅是本发明的优选实施方式，应当指出，对于本技术领域的普通技术人员，在不脱离本发明原理的前提下，还可以做出若干改进和润饰，这些改进和润饰也应视为本发明的保护范围。

Claims (10)

  1. 一种显示面板，其包括：
    基板；
    阳极层，设于所述基板一侧的表面；
    像素定义层，设于所述阳极层远离所述基板一侧的表面；
    通孔，贯穿于所述像素定义层，且与所述阳极层相对设置；
    空穴注入层，设于所述阳极层远离所述基板一侧的表面；
    空穴传输层，设于所述通孔内，且延伸至所述像素定义层的表面；
    碳量子点层，设于所述空穴传输层远离所述像素定义层一侧的表面；
    电子传输层，设于所述碳量子点层远离所述空穴传输层一侧的表面；
    电子注入层，设于所述电子传输层远离所述碳量子点层一侧的表面；以及
    阴极层，设于所述电子传输层远离所述碳量子点层一侧的表面。
  2. 如权利要求1所述的显示面板，其中，
    所述碳量子点层的材质包括碳量子点。
  3. 如权利要求2所述的显示面板，其中，
    所述碳量子点的直径范围为1nm~20nm。
  4. 如权利要求1所述的显示面板，其中，
    所述碳量子点层的厚度范围为10nm~2000nm。
  5. 一种显示面板的制备方法，其包括以下步骤：
    基板提供步骤，提供一基板；
    阳极层制备步骤，在所述基板的上表面制备出一阳极层；
    像素定义层制备步骤，在所述阳极层的上表面制备出一像素定义层；
    通孔设置步骤，在所述像素定义层上开设一通孔，使得所述通孔与所述阳极层相对设置；
    空穴注入层制备步骤，在所述通孔内及所述像素定义层上表面制备出空穴注入层；
    空穴传输层制备步骤，在所述空穴注入层的上表面制备出空穴传输层；
    碳量子点层制备步骤，在所述空穴传输层上表面制备出碳量子点层；
    电子传输层制备步骤，在所述碳量子点层的上表面制备出电子传输层；
    电子注入层制备步骤，在所述电子传输层的上表面制备出电子注入层；以及
    阴极层制备步骤，在所述电子传输层的上表面制备出阴极层。
  6. 如权利要求5所述的显示面板的制备方法，其中，
    所述碳量子点层制备步骤包括：
    碳量子点溶液制备步骤，制备出一碳量子点溶液；以及
    碳量子点溶液打印步骤，在所述空穴传输层的上表面打印所述碳量子点溶液。
  7. 如权利要求6所述的显示面板的制备方法，其中，
    所述碳量子点溶液制备步骤包括以下步骤：
    反应液制备步骤，将重量百分比为0.01~30wt%的碳量子点材料分散于重量百分比为40~99.7 wt%的溶剂中，形成反应液；以及
    调节步骤，在搅拌所述反应液的同时，在所述反应液中加入调节剂，形成碳量子点溶液。
  8. 如权利要求7所述的显示面板的制备方法，其中，
    所述溶剂包括有机溶剂；
    所述有机溶剂包括：
    至少含有一种烷烃或芳香烃的化合物；和/或，
    至少含有一种醇类化合物；和/或，
    沸点高于200摄氏度的溶剂。
  9. 如权利要求8所述的显示面板的制备方法，其中，
    所述沸点高于200摄氏度的溶剂包括醚类化合物、酯类化合物或芳香类化合物。
  10. 如权利要求7所述的显示面板的制备方法，其中，
    所述调节剂包括：
    第一调节剂，所述第一调节剂包括共溶剂、表面活性剂、调节表面张力的小分子化合物中的至少一种；以及
    第二调节剂，所述第二调节剂包括醇、醚、酯、酚、胺中的至少一种。
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