WO2021010105A1 - 表面処理剤 - Google Patents

表面処理剤 Download PDF

Info

Publication number
WO2021010105A1
WO2021010105A1 PCT/JP2020/024623 JP2020024623W WO2021010105A1 WO 2021010105 A1 WO2021010105 A1 WO 2021010105A1 JP 2020024623 W JP2020024623 W JP 2020024623W WO 2021010105 A1 WO2021010105 A1 WO 2021010105A1
Authority
WO
WIPO (PCT)
Prior art keywords
group
independently
integer
appearance
surface treatment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2020/024623
Other languages
English (en)
French (fr)
Japanese (ja)
Inventor
孝史 野村
内藤 真人
香織 小澤
希望 中野
尚志 三橋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Daikin Industries Ltd
Original Assignee
Daikin Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=74210492&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=WO2021010105(A1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Daikin Industries Ltd filed Critical Daikin Industries Ltd
Priority to EP20840859.1A priority Critical patent/EP4001364A4/en
Priority to CN202080051310.XA priority patent/CN114127206A/zh
Priority to KR1020227001466A priority patent/KR102801885B1/ko
Publication of WO2021010105A1 publication Critical patent/WO2021010105A1/ja
Priority to US17/575,804 priority patent/US20220135839A1/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/16Antifouling paints; Underwater paints
    • C09D5/1656Antifouling paints; Underwater paints characterised by the film-forming substance
    • C09D5/1662Synthetic film-forming substance
    • C09D5/1675Polyorganosiloxane-containing compositions
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D171/00Coating compositions based on polyethers obtained by reactions forming an ether link in the main chain; Coating compositions based on derivatives of such polymers
    • C09D171/02Polyalkylene oxides
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/10Block or graft copolymers containing polysiloxane sequences
    • C09D183/12Block or graft copolymers containing polysiloxane sequences containing polyether sequences
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/28Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material
    • C03C17/30Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material with silicon-containing compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
    • C08G59/62Alcohols or phenols
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/002Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds
    • C08G65/005Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds containing halogens
    • C08G65/007Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds containing halogens containing fluorine
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/32Polymers modified by chemical after-treatment
    • C08G65/329Polymers modified by chemical after-treatment with organic compounds
    • C08G65/336Polymers modified by chemical after-treatment with organic compounds containing silicon
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/22Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
    • C08G77/24Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen halogen-containing groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/42Block-or graft-polymers containing polysiloxane sequences
    • C08G77/46Block-or graft-polymers containing polysiloxane sequences containing polyether sequences
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D171/00Coating compositions based on polyethers obtained by reactions forming an ether link in the main chain; Coating compositions based on derivatives of such polymers
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04Polysiloxanes
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04Polysiloxanes
    • C09D183/08Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/16Antifouling paints; Underwater paints
    • C09D5/1606Antifouling paints; Underwater paints characterised by the anti-fouling agent
    • C09D5/1612Non-macromolecular compounds
    • C09D5/1618Non-macromolecular compounds inorganic
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/16Antifouling paints; Underwater paints
    • C09D5/1606Antifouling paints; Underwater paints characterised by the anti-fouling agent
    • C09D5/1637Macromolecular compounds
    • C09D5/165Macromolecular compounds containing hydrolysable groups
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/20Diluents or solvents
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40Additives
    • C09D7/60Additives non-macromolecular
    • C09D7/61Additives non-macromolecular inorganic
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40Additives
    • C09D7/60Additives non-macromolecular
    • C09D7/63Additives non-macromolecular organic
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40Additives
    • C09D7/65Additives macromolecular
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00Materials not provided for elsewhere
    • C09K3/18Materials not provided for elsewhere for application to surfaces to minimize adherence of ice, mist or water thereto; Thawing or antifreeze materials for application to surfaces
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12Organic material
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C24/00Coating starting from inorganic powder
    • C23C24/02Coating starting from inorganic powder by application of pressure only
    • C23C24/04Impact or kinetic deposition of particles
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C26/00Coating not provided for in groups C23C2/00 - C23C24/00
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/18Coatings for keeping optical surfaces clean, e.g. hydrophobic or photo-catalytic films
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00Coatings on glass
    • C03C2217/70Properties of coatings
    • C03C2217/76Hydrophobic and oleophobic coatings
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00Coatings on glass
    • C03C2217/70Properties of coatings
    • C03C2217/78Coatings specially designed to be durable, e.g. scratch-resistant

Definitions

  • the present disclosure relates to a surface treatment agent and an article having a layer formed by the surface treatment agent.
  • the layer obtained from the surface treatment agent containing a fluorine-containing silane compound (hereinafter, also referred to as "surface treatment layer") is a so-called functional thin film, for example, various base materials such as glass, plastic, fiber, sanitary goods, and building materials. (Patent Documents 1 and 2).
  • the fluorine-containing silane compound described in Patent Document 1 or Patent Document 2 can provide a surface treatment layer having excellent functions, but a surface treatment layer having higher friction durability and chemical resistance is required. ..
  • An object of the present disclosure is to provide an article having a surface treatment layer having higher friction durability and chemical resistance.
  • the fluorine-containing silane compound has the following formula (1) or (2): [During the ceremony: R F1 is independently at each occurrence, Rf 1 -R F -O q - a and; R F2 is -R f 2 p -RF -O q- ; Rf 1 is a C 1-16 alkyl group that may be independently substituted with one or more fluorine atoms at each appearance; Rf 2 is a C 1-6 alkylene group that may be substituted with one or more fluorine atoms; RF is a divalent fluoropolyester group independently at each appearance; p is 0 or 1; q is 0 or 1 independently at each occurrence; R Si is a monovalent group containing a Si atom to which a hydroxyl group, a hydrolyzable group, a hydrogen atom or a monovalent organic group is bonded independently at each appearance; At least one R Si is a monovalent group containing a Si atom to which a hydroxyl
  • Rf 1 is a C 1-16 perfluoroalkyl group independently at each appearance.
  • Rf 2 is a C 1-6 perfluoroalkylene group independently at each appearance.
  • RF is independent of each appearance, and the formula: - (OC 6 F 12) a - (OC 5 F 10) b - (OC 4 F 8) c - (OC 3 R Fa 6) d - (OC 2 F 4) e - (OCF 2) f - [In the formula, R Fa is a hydrogen atom, a fluorine atom or a chlorine atom independently at each appearance.
  • a, b, c, d, e and f are independently integers from 0 to 200, and the sum of a, b, c, d, e and f is 1 or more, and a, b,
  • the order of existence of each repeating unit in parentheses with c, d, e or f is arbitrary in the equation.
  • [5] The surface treatment agent according to the above [4], wherein R Fa is a fluorine atom.
  • RF is independently generated in each appearance by the following equations (f1), (f2), (f3), (f4) or (f5): -(OC 3 F 6 ) d- (f1) [In the formula, d is an integer from 1 to 200.
  • c and d are independently integers from 0 to 30; e and f are independently integers from 1 to 200; The sum of c, d, e and f is an integer from 10 to 200; The order of existence of each repeating unit with the subscripts c, d, e or f in parentheses is arbitrary in the equation.
  • R 6 is OCF 2 or OC 2 F 4 ;
  • R 7 is a group selected from OC 2 F 4 , OC 3 F 6 , OC 4 F 8 , OC 5 F 10 and OC 6 F 12 , or two or three selected from these groups.
  • a combination of groups; g is an integer from 2 to 100.
  • e is an integer of 1 or more and 200 or less, and a, b, c, d and f are independently integers of 0 or more and 200 or less, and a, b, c, d and e.
  • the sum of and f is at least 1, and the order of existence of each repeating unit in parentheses with a, b, c, d, e or f is arbitrary in the equation.
  • f is an integer of 1 or more and 200 or less, and a, b, c, d and e are integers of 0 or more and 200 or less independently, and a, b, c, d and e.
  • the sum of and f is at least 1, and the order of existence of each repeating unit in parentheses with a, b, c, d, e or f is arbitrary in the equation.
  • R Si is the following formula (S1), (S2), (S3), or (S4): [During the ceremony: R 11 is independently a hydroxyl group or a hydrolyzable group at each appearance; R 12 is an independent hydrogen atom or monovalent organic group at each appearance; n1 is an integer of 0 to 3 independently for each unit (SiR 11 n1 R 12 3-n1 ); X 11 is an independent, single-bonded or divalent organic group at each appearance; R 13 is an independent hydrogen atom or monovalent organic group at each appearance; t is an integer greater than or equal to 2 independently for each occurrence; R 14 is independently a hydrogen atom, a halogen atom or -X 11- SiR 11 n1 R 12 3-n1 at each appearance; R 15 is independently at each occurrence, a single bond, an oxygen atom, an alkylene group or alkyleneoxy group having 1 to 6 carbon
  • the surface treatment agent according to any one of the above [1] to [12] which further contains a solvent.
  • the metal atom is one or more metal atoms selected from Ta, Nb, Zr, Mo, W, Cr, Hf, Al, Ti, and V, as described above [18] or [19].
  • the article described in. [21] The article according to any one of the above [18] to [20], wherein the metal atom is Ta.
  • the fluorine-containing silane compound has the following formula (1) or (2): [During the ceremony: R F1 is independently at each occurrence, Rf 1 -R F -O q - a and; R F2 is -R f 2 p -RF -O q- ; Rf 1 is a C 1-16 alkyl group that may be independently substituted with one or more fluorine atoms at each appearance; Rf 2 is a C 1-6 alkylene group that may be substituted with one or more fluorine atoms; RF is a divalent fluoropolyester group independently at each appearance; p is 0 or 1; q is 0 or 1 independently at each occurrence; R Si is a monovalent group containing a Si atom to which a hydroxyl group, a hydrolyzable group, a hydrogen atom or a monovalent organic group is bonded independently at each appearance; At least one R Si is a monovalent group containing a Si atom to which a hydroxyl
  • the surface treatment layer is formed from a fluorine-containing silane compound and contains one or more metal atoms selected from the transition metal atoms of groups 3 to 11 of the periodic table and the typical metal atoms of groups 12 to 15.
  • a surface treatment agent containing the fluorine-containing silane compound and the metal compound containing the genus atom is used to deposit the fluorine-containing silane compound and the metal compound containing the metal atom on the substrate to form a surface treatment layer. Methods involving forming.
  • monovalent organic group means a carbon-containing monovalent group.
  • the monovalent organic group is not particularly limited, but may be a hydrocarbon group or a derivative thereof.
  • a hydrocarbon group derivative is a group having one or more N, O, S, Si, amide, sulfonyl, siloxane, carbonyl, carbonyloxy, etc. in the terminal or molecular chain of the hydrocarbon group.
  • organic group it means a monovalent organic group.
  • the "2 to 10 valent organic group” means a 2 to 10 valent group containing carbon.
  • the 2 to 10 valent organic group is not particularly limited, and examples thereof include a 2 to 10 valent group obtained by removing 1 to 9 hydrogen atoms from the organic group.
  • the divalent organic group is not particularly limited, and examples thereof include a divalent group obtained by desorbing one hydrogen atom from the organic group.
  • hydrocarbon group means a group that contains carbon and hydrogen and has one hydrogen atom desorbed from the hydrocarbon.
  • the hydrocarbon group is not particularly limited, but may be substituted with one or more substituents, such as C 1-20 hydrocarbon groups, for example, aliphatic hydrocarbon groups, aromatics. Hydrocarbon groups and the like can be mentioned.
  • the "aliphatic hydrocarbon group” may be linear, branched or cyclic, and may be saturated or unsaturated. In addition, the hydrocarbon group may contain one or more ring structures.
  • the substituent of the "hydrocarbon group” is not particularly limited, but may be substituted with, for example, a halogen atom, one or more halogen atoms, C 1-6 alkyl.
  • Group, C 2-6 alkenyl group, C 2-6 alkynyl group, C 3-10 cycloalkyl group, C 3-10 unsaturated cycloalkyl group, 5-10 member heterocyclyl group, 5-10 member unsaturated heterocyclyl Groups include one or more groups selected from C 6-10 aryl groups and 5-10 membered heteroaryl groups.
  • the surface treatment agent of the present disclosure includes a fluorine-containing silane compound and a metal compound.
  • the surface treatment agent of the present disclosure can provide a surface treatment layer having improved abrasion resistance and chemical resistance by further containing a metal compound in addition to the fluorine-containing silane compound.
  • the fluorine-containing silane compound is a compound that contains fluorine and can form a surface treatment layer having antifouling properties.
  • the fluorine-containing silane compound is prepared by the following formula (1) or (2): [During the ceremony: R F1 is independently at each occurrence, Rf 1 -R F -O q - a and; R F2 is -R f 2 p -RF -O q- ; Rf 1 is a C 1-16 alkyl group that may be independently substituted with one or more fluorine atoms at each appearance; Rf 2 is a C 1-6 alkylene group that may be substituted with one or more fluorine atoms; RF is a divalent fluoropolyester group independently at each appearance; p is 0 or 1; q is 0 or 1 independently at each occurrence; R Si is a monovalent group containing a Si atom to which a hydroxyl group, a hydrolyzable group, a hydrogen atom or a monovalent organic group is bonded independently at each appearance; At least one R Si is a monovalent group containing a Si atom to which a
  • R F1 is Rf 1 ⁇ R F ⁇ O q ⁇ independently at each appearance.
  • R F2 is, -Rf 2 p -R F -O q - is.
  • Rf 1 is a C 1-16 alkyl group that may be independently substituted with one or more fluorine atoms at each appearance.
  • the "C 1-16 alkyl group" in the C 1-16 alkyl group which may be substituted with one or more fluorine atoms may be a straight chain or a branched chain, and is preferable. Is a straight or branched C 1-6 alkyl group, particularly a C 1-3 alkyl group, more preferably a straight C 1-6 alkyl group, particularly a C 1-3 alkyl group.
  • the Rf 1 is preferably a one or more C 1-16 alkyl group substituted by fluorine atoms, more preferably CF 2 H-C 1-15 perfluoroalkylene group, more preferably Is a C 1-16 perfluoroalkyl group.
  • the C 1-16 perfluoroalkyl group may be linear or branched, preferably a linear or branched C 1-6 perfluoroalkyl group, particularly C 1-. It is a 3 perfluoroalkyl group, more preferably a linear C 1-6 perfluoroalkyl group, particularly a C 1-3 perfluoroalkyl group, specifically -CF 3 , -CF 2 CF 3 , or -CF. 2 CF 2 CF 3 .
  • Rf 2 is a C 1-6 alkylene group that may be substituted with one or more fluorine atoms.
  • C 1-6 alkylene group in the C 1-6 alkylene group which may be substituted with one or more fluorine atoms may be a straight chain or a branched chain, and is preferable. Is a linear or branched C 1-3 alkylene group, more preferably a linear C 1-3 alkylene group.
  • the Rf 2 is preferably a one or more C 1-6 alkylene group substituted with a fluorine atom, more preferably a C 1-6 perfluoroalkylene group, more preferably C 1- 3 Perfluoroalkylene group.
  • the C 1-6 perfluoroalkylene group may be a straight chain or a branched chain, preferably a straight chain or a branched C 1-3 perfluoroalkylene group, and more preferably. is -CF 2 C 1-3 perfluoroalkyl group linear, specifically -, - CF 2 CF 2 - , or -CF 2 CF 2 CF 2 - it is.
  • p is 0 or 1. In one embodiment, p is 0. In another embodiment p is 1.
  • q is 0 or 1 independently at each appearance. In one embodiment, q is 0. In another embodiment q is 1.
  • RF is a divalent fluoropolyester group independently at each appearance.
  • RF is preferably the formula: - (OC 6 F 12) a - (OC 5 F 10) b - (OC 4 F 8) c - (OC 3 R Fa 6) d - (OC 2 F 4) e - (OCF 2) f - [During the ceremony: R Fa is a hydrogen atom, a fluorine atom or a chlorine atom independently at each appearance. a, b, c, d, e and f are each independently an integer of 0 to 200, and the sum of a, b, c, d, e and f is 1 or more.
  • each repeating unit in parentheses with a, b, c, d, e or f is arbitrary in the equation. However, when all R Fas are hydrogen atoms or chlorine atoms, at least one of a, b, c, e and f is one or more. ] It is a group represented by.
  • R Fa is preferably a hydrogen atom or a fluorine atom, and more preferably a fluorine atom. However, when all R Fas are hydrogen atoms or chlorine atoms, at least one of a, b, c, e and f is one or more.
  • A, b, c, d, e and f are preferably independent integers from 0 to 100.
  • the sum of a, b, c, d, e and f is preferably 5 or more, more preferably 10 or more, and may be, for example, 15 or more or 20 or more.
  • the sum of a, b, c, d, e and f is preferably 200 or less, more preferably 100 or less, still more preferably 60 or less, and may be, for example, 50 or less or 30 or less.
  • repeating units may be linear or branched.
  • -(OC 6 F 12 )- is- (OCF 2 CF 2 CF 2 CF 2 CF 2 CF 2 CF 2 )-,-(OCF (CF 3 ) CF 2 CF 2 CF 2 )-,-(OCF 2 CF (CF 3 ) CF 2 CF 2 CF 2 )-,-(OCF 2 CF 2 CF (CF 3 ) CF 2 CF 2 )-,-(OCF 2 CF 2 CF (CF 3 ) CF 2 CF 2 )-,-(OCF 2 CF 2 CF 2 CF (CF 3 ) CF 2 )- ,-(OCF 2 CF 2 CF 2 CF 2 CF (CF 3 ))-etc.
  • -(OC 3 F 6 )-(that is, R Fa is a fluorine atom in the above formula) is-(OCF 2 CF 2 CF 2 )-,-(OCF (CF 3 ) CF 2 )-and-( It may be any of OCF 2 CF (CF 3 ))-.
  • -(OC 2 F 4 )- may be either-(OCF 2 CF 2 )-and-(OCF (CF 3 ))-.
  • the repeating unit is linear. By making the repeating unit linear, the surface slipperiness, friction durability, etc. of the surface treatment layer can be improved.
  • the repeating unit is branched chain. By forming the repeating unit into a branched chain shape, the coefficient of dynamic friction of the surface treatment layer can be increased.
  • R F are each independently in each occurrence is a group represented by any one of the following formulas (f1) ⁇ (f5). -(OC 3 F 6 ) d- (f1) [In the formula, d is an integer from 1 to 200. ]; - (OC 4 F 8) c - (OC 3 F 6) d - (OC 2 F 4) e - (OCF 2) f - (f2) [In the formula, c and d are independently integers of 0 or more and 30 or less, and e and f are independently integers of 1 or more and 200 or less.
  • f is an integer of 1 or more and 200 or less, and a, b, c, d and e are each independently an integer of 0 or more and 200 or less, and a, b, c, d.
  • the order of existence of each repeating unit enclosed in parentheses with, e or f is arbitrary in the equation.
  • d is preferably an integer of 5 to 200, more preferably 10 to 100, still more preferably 15 to 50, for example 25 to 35.
  • the above formula (f1) is preferably a group represented by ⁇ (OCF 2 CF 2 CF 2 ) d ⁇ or ⁇ (OCF (CF 3 ) CF 2 ) d ⁇ , and more preferably ⁇ (OCF 2).
  • e and f are independently integers of preferably 5 to 200, more preferably 10 to 200, respectively.
  • the sum of c, d, e and f is preferably 5 or more, more preferably 10 or more, and may be, for example, 15 or more or 20 or more.
  • the above formula (f2) is preferably ⁇ (OCF 2 CF 2 CF 2 CF 2 ) c ⁇ (OCF 2 CF 2 CF 2 ) d ⁇ (OCF 2 CF 2 ) e ⁇ (OCF 2 ). It is a group represented by f ⁇ .
  • the formula (f2) may be a group represented by ⁇ (OC 2 F 4 ) e ⁇ (OCF 2 ) f ⁇ .
  • R 6 is preferably OC 2 F 4 .
  • R 7 is preferably a group selected from OC 2 F 4 , OC 3 F 6 and OC 4 F 8 , or 2 or independently selected from these groups. It is a combination of three groups, more preferably a group selected from OC 3 F 6 and OC 4 F 8 .
  • the combination of two or three groups independently selected from OC 2 F 4 , OC 3 F 6 and OC 4 F 8 is not particularly limited, but is, for example, -OC 2 F 4 OC 3 F 6- , -OC.
  • g is preferably an integer of 3 or more, more preferably 5 or more.
  • the above g is preferably an integer of 50 or less.
  • OC 2 F 4 , OC 3 F 6 , OC 4 F 8 , OC 5 F 10 and OC 6 F 12 may be either linear or branched, preferably straight. It is a chain.
  • the above formula (f3) is preferably ⁇ (OC 2 F 4 ⁇ OC 3 F 6 ) g ⁇ or ⁇ (OC 2 F 4 ⁇ OC 4 F 8 ) g ⁇ .
  • e is preferably an integer of 1 or more and 100 or less, more preferably 5 or more and 100 or less.
  • the sum of a, b, c, d, e and f is preferably 5 or more, more preferably 10 or more, for example 10 or more and 100 or less.
  • f is preferably an integer of 1 or more and 100 or less, and more preferably 5 or more and 100 or less.
  • the sum of a, b, c, d, e and f is preferably 5 or more, more preferably 10 or more, for example 10 or more and 100 or less.
  • the R F is a group represented by the formula (f1).
  • the R F is a group represented by the formula (f2).
  • the R F is a group represented by the formula (f3).
  • the R F is a group represented by the above formula (f4).
  • the R F is a group represented by the above formula (f5).
  • the ratio of e for f (hereinafter, referred to as "e / f ratio”) is 0.1 to 10, preferably from 0.2 to 5, more preferably 0.2 to 2 Yes, more preferably 0.2 to 1.5, and even more preferably 0.2 to 0.85.
  • e / f ratio the slipperiness, friction durability and chemical resistance (for example, durability against artificial sweat) of the surface treatment layer obtained from this compound are further improved.
  • the smaller the e / f ratio the better the slipperiness and friction durability of the surface treatment layer.
  • the stability of the compound can be further enhanced. The larger the e / f ratio, the better the stability of the compound.
  • the e / f ratio is preferably 0.2 to 0.95, more preferably 0.2 to 0.9.
  • the e / f ratio is preferably 1.0 or more, and more preferably 1.0 to 2.0.
  • a number average molecular weight of R F1 and R F2 portion is not particularly limited, for example, 500 to 30,000, preferably 1,500 to 30,000, more preferably It is 2,000 to 10,000.
  • the number average molecular weight of R F1 and R F2 is a value measured by 19 F-NMR.
  • the number average molecular weight of R F1 and R F2 portion 500 to 30,000, preferably more preferably 1,000 to 20,000, more preferably 2,000 to 15,000, further 2, It can be between 000 and 10,000, for example 3,000 and 6,000.
  • the number average molecular weight of R F1 and R F2 portion 4,000 to 30,000, preferably be 5,000 to 10,000, more preferably 6,000 to 10,000.
  • R Si is a monovalent group containing a Si atom to which a hydroxyl group, a hydrolyzable group, a hydrogen atom or a monovalent organic group is bonded independently at each appearance. At least one R Si is a monovalent group containing a Si atom to which a hydroxyl group or a hydrolyzable group is attached.
  • hydrolyzable group means a group capable of undergoing a hydrolysis reaction, that is, a group capable of being eliminated from the main skeleton of the compound by the hydrolysis reaction.
  • RSi is a monovalent group containing a Si atom to which a hydroxyl group or a hydrolyzable group is attached.
  • RSi is represented by the following formula (S1), (S2), (S3), or (S4): It is a group represented by.
  • R 11 is a hydroxyl group or a hydrolyzable group independently at each appearance.
  • R 11 is preferably a hydrolyzable group, each independently at each appearance.
  • R h include an unsubstituted alkyl group such as a methyl group, an ethyl group, a propyl group, an isopropyl group, an n-butyl group and an isobutyl group; and a substituted alkyl group such as a chloromethyl group.
  • an alkyl group particularly an unsubstituted alkyl group is preferable, and a methyl group or an ethyl group is more preferable.
  • R h is a methyl group and in another embodiment, R h is an ethyl group.
  • R 12 is a hydrogen atom or a monovalent organic group independently at each appearance.
  • the monovalent organic group is a monovalent organic group excluding the hydrolyzable group.
  • the monovalent organic group is preferably a C 1-20 alkyl group, more preferably a C 1-6 alkyl group, and even more preferably a methyl group.
  • n1 is an integer of 0 to 3 independently for each unit (SiR 11 n1 R 12 3-n1 ).
  • R Si is a group represented by the formula (S1) or (S2)
  • the R Si portion at the end of the formulas (1) and (2) (hereinafter, simply the formulas (1) and (2)).
  • n1 is 1 to 3 (SiR 11 n1 R 12 3-n1 ). That is, not all n1s are zero at the same time at such an end portion.
  • at least one Si atom to which a hydroxyl group or a hydrolyzable group is bonded is present at the terminal portions of the formulas (1) and (2).
  • n1 is an integer of preferably 1 to 3, more preferably 2 to 3, and even more preferably 3 independently for each unit (SiR 11 n1 R 12 3-n1 ).
  • X 11 is a single bond or divalent organic group independently at each appearance.
  • Such divalent organic group is preferably -R 28 -O x -R 29 - (In the formula, R 28 and R 29 each independently at each occurrence, a single bond or C 1-20 alkylene group , X is 0 or 1.).
  • the C 1-20 alkylene group may be a straight chain or a branched chain, but is preferably a straight chain.
  • the C 1-20 alkylene group is preferably a C 1-10 alkylene group, more preferably a C 1-6 alkylene group, and even more preferably a C 1-3 alkylene group.
  • X 11 are each independently at each occurrence, -C 1-6 alkylene--O-C 1-6 alkylene - or -O-C 1-6 alkylene - a.
  • X 11 is an independently single-bonded or linear C 1-6 alkylene group at each appearance, preferably a single-bonded or linear C 1-3 alkylene group, more preferably a single. It is a bonded or straight chain C 1-2 alkylene group, more preferably a straight chain C 1-2 alkylene group.
  • R 13 is a hydrogen atom or a monovalent organic group independently at each appearance.
  • a monovalent organic group is preferably a C 1-20 alkyl group.
  • the C 1-20 alkyl group may be a straight chain or a branched chain, but is preferably a straight chain.
  • R 13 is independently a hydrogen atom or a linear C 1-6 alkyl group at each appearance, preferably a hydrogen atom or a linear C 1-3 alkyl group, preferably a hydrogen atom. Or it is a methyl group.
  • t is an integer of 2 or more independently at each occurrence.
  • t is an integer of 2 to 10, preferably an integer of 2 to 6, independently of each appearance.
  • R 14 is independently a hydrogen atom, a halogen atom or -X 11- SiR 11 n1 R 12 3-n1 at each appearance.
  • a halogen atom is preferably an iodine atom, a chlorine atom or a fluorine atom, and more preferably a fluorine atom.
  • R 14 is a hydrogen atom.
  • R 15 are each independently at each occurrence, a single bond, an oxygen atom, an alkylene group or alkyleneoxy group having 1 to 6 carbon atoms having 1 to 6 carbon atoms.
  • R 15 is independently at each occurrence, is an oxygen atom, an alkylene group or alkyleneoxy group having 1 to 6 carbon atoms having 1 to 6 carbon atoms.
  • R 15 is a single bond.
  • the formula (S1) is the following formula (S1-a).
  • R 11 , R 12 , R 13 , X 11 , and n1 have the same meaning as the description in the above formula (S1);
  • t1 and t2 are independently greater than or equal to an integer of 1 or more, preferably an integer of 1 to 10, more preferably an integer of 2 to 10, such as an integer of 1 to 5 or an integer of 2 to 5;
  • the order of existence of each repeating unit in parentheses with t1 and t2 is arbitrary in the equation.
  • the formula (S1) is the following formula (S1-b). [In the formula, R 11 , R 12 , R 13 , X 11 , n1 and t have the same meaning as the description in the above formula (S1)].
  • R a1 is -Z 1- SiR 21 p1 R 22 q1 R 23 r1 independently at each appearance.
  • Z 1 is an oxygen atom or a divalent organic group independently at each appearance.
  • the right side is coupled to (SiR 21 p1 R 22 q1 R 23 r1 ).
  • Z 1 is a divalent organic group.
  • Z 1 does not include those forming a siloxane bond with the Si atom to which Z 1 is attached.
  • (Si—Z- 1 -Si) does not contain a siloxane bond.
  • Z 1 is preferably a C 1-6 alkylene group,-(CH 2 ) z1 -O- (CH 2 ) z2- (in the formula, z1 is an integer of 0 to 6, for example, an integer of 1 to 6).
  • z2 is an integer of 0 to 6, for example, an integer of 1 to 6) or- (CH 2 ) z3 -phenylene- (CH 2 ) z4- (in the formula, z3 is an integer of 0 to 6,
  • z4 is an integer of 0 to 6, for example, an integer of 1 to 6).
  • the C 1-6 alkylene group may be a straight chain or a branched chain, but is preferably a straight chain.
  • These groups may be substituted with one or more substituents selected from, for example, a fluorine atom, a C 1-6 alkyl group, a C 2-6 alkenyl group, and a C 2-6 alkynyl group. However, it is preferably unsubstituted.
  • Z 1 is a C 1-6 alkylene group or- (CH 2 ) z3 -phenylene- (CH 2 ) z4- , preferably -phenylene- (CH 2 ) z4- .
  • Z 1 is such a group, light resistance, especially UV resistance, can be higher.
  • the Z 1 is a C 1-3 alkylene group. In one embodiment, Z 1 can be -CH 2 CH 2 CH 2- . In another embodiment, Z 1 can be -CH 2 CH 2- .
  • the R 21 is ⁇ Z 1 ′ ⁇ SiR 21 ′ p1 ′ R 22 ′ q1 ′ R 23 ′ r1 ′ independently at each appearance.
  • the Z 1 ' are each independently at each occurrence, is an oxygen atom or a divalent organic group.
  • SiR 21' binds to p1 'R 22' q1 'R 23' r1 ').
  • Z 1 ' is a divalent organic group.
  • Z 1 ' is, Z 1' do not include those that form a siloxane bond and Si atoms are bonded.
  • Si-Z 1 '-Si do not include siloxane bond.
  • the Z 1 ' are preferably, C 1-6 alkylene group, - (CH 2) z1' -O- (CH 2) z2 '- ( wherein, z1' is an integer of 0 to 6, such as 1 to It is an integer of 6, and z2'is an integer of 0 to 6, for example, an integer of 1 to 6) or- (CH 2 ) z3'- phenylene- (CH 2 ) z4' -(in the formula, z3' Is an integer of 0 to 6, for example, an integer of 1 to 6, and z4'is an integer of 0 to 6, for example, an integer of 1 to 6).
  • the C 1-6 alkylene group may be a straight chain or a branched chain, but is preferably a straight chain. These groups may be substituted with one or more substituents selected from, for example, a fluorine atom, a C 1-6 alkyl group, a C 2-6 alkenyl group, and a C 2-6 alkynyl group. However, it is preferably unsubstituted.
  • Z 1 ' is, C 1-6 alkylene group or - (CH 2) z3' - phenylene - (CH 2) z4 '- , preferably - phenylene - (CH 2) z4' - a.
  • Z 1' is a such group, light resistance, especially UV resistance, can be higher.
  • the Z 1 ' is a C 1-3 alkylene group. In one embodiment, Z 1 'is, -CH 2 CH 2 CH 2 - may be. In another embodiment, Z 1 'is, -CH 2 CH 2 - may be.
  • the R 21 ' are each independently at each occurrence, is -Z 1 "-SiR 22" q1 " R 23" r1 ".
  • Z 1 " is an oxygen atom or a divalent organic group independently at each appearance.
  • the right side is (SiR 22 “ q1" R 23 " r1”. ).
  • Z 1 " is a divalent organic group.
  • Z 1 " does not include those forming a siloxane bond with the Si atom to which Z 1" is attached.
  • Z 1 does not include those forming a siloxane bond with the Si atom to which Z 1" is attached.
  • (Si—Z1 ′′ -Si) does not contain a siloxane bond.
  • Z 1 " is preferably a C 1-6 alkylene group,-(CH 2 ) z1" -O- (CH 2 ) z2 " -(in the formula, z1" is an integer of 0 to 6, for example, 1 to 1. It is an integer of 6, and z2 "is an integer of 0 to 6, for example, an integer of 1 to 6) or- (CH 2 ) z3" -phenylene- (CH 2 ) z4 " -(in the formula, z3". Is an integer of 0 to 6, for example, an integer of 1 to 6, and z4 "is an integer of 0 to 6, for example, an integer of 1 to 6).
  • Such a C 1-6 alkylene group is a straight chain.
  • These groups are, for example, a fluorine atom, a C 1-6 alkyl group, a C 2-6 alkenyl group, and a C 2-. It may be substituted with one or more substituents selected from the 6 alkynyl groups, but is preferably unsubstituted.
  • Z 1 " is a C 1-6 alkylene group or- (CH 2 ) z 3" -phenylene- (CH 2 ) z 4 " -, preferably -phenylene- (CH 2 ) z 4" -.
  • light resistance especially ultraviolet resistance, can be higher.
  • the Z 1 " is a C 1-3 alkylene group. In one embodiment, the Z 1" can be -CH 2 CH 2 CH 2- . In another embodiment, Z 1 " can be -CH 2 CH 2- .
  • the R 22 " is an hydroxyl group or a hydrolyzable group independently at each appearance.
  • the R 22 " is preferably an independently hydrolyzable group at each appearance.
  • R h is a methyl group, an ethyl group, a propyl group, and the like.
  • Unsubstituted alkyl groups such as isopropyl group, n-butyl group and isobutyl group; substituted alkyl groups such as chloromethyl group are mentioned.
  • alkyl groups especially unsubstituted alkyl groups are preferable, and methyl group or ethyl group is preferable. More preferred.
  • R h is a methyl group and in another embodiment, R h is an ethyl group.
  • the R 23 ′′ is a hydrogen atom or a monovalent organic group independently at each appearance.
  • the monovalent organic group is a monovalent organic group excluding the hydrolyzable group.
  • the monovalent organic group is preferably a C 1-20 alkyl group, more preferably a C 1-6 alkyl group, and even more preferably a methyl group.
  • the q1 " is an integer of 0 to 3 independently at each appearance, and the r1" is an integer of 0 to 3 independently at each appearance.
  • the total of q1 "and r1" is 3 in the unit of (SiR 22 " q1" R 23 " r1” ).
  • q1 is an integer of preferably 1 to 3, more preferably 2 to 3, and even more preferably 3 independently for each unit (SiR 22” q1 ” R 23” r1 ” ).
  • the R 22 ' are each independently at each occurrence, it is a hydroxyl group or a hydrolyzable group.
  • R 22' is preferably a hydrolyzable group, independently of each appearance.
  • R h include an unsubstituted alkyl group such as a methyl group, an ethyl group, a propyl group, an isopropyl group, an n-butyl group and an isobutyl group; and a substituted alkyl group such as a chloromethyl group.
  • an alkyl group particularly an unsubstituted alkyl group is preferable, and a methyl group or an ethyl group is more preferable.
  • R h is a methyl group and in another embodiment, R h is an ethyl group.
  • the R 23' is a hydrogen atom or a monovalent organic group independently at each appearance.
  • the monovalent organic group is a monovalent organic group excluding the hydrolyzable group.
  • the monovalent organic group is preferably a C 1-20 alkyl group, more preferably a C 1-6 alkyl group, and even more preferably a methyl group.
  • p1' is an integer of 0 to 3 independently at each appearance
  • q1' is an integer of 0 to 3 independently at each appearance
  • r1' is an integer of 0 to 3 independently at each appearance. Then, it is an integer of 0 to 3.
  • p ', q1'' is the sum of, (SiR 21' and r1 at p1 'R 22' q1 'R 23' r1 ') units, it is 3.
  • p1' is 0.
  • p1 ' is, (SiR 21' p1 'R 22' q1 'R 23' r1 ') independently for each unit, the integer of 1 to 3, 2-3 integer or 3, met You may. In a preferred embodiment, p1'is 3.
  • q1 ' is, (SiR 21' p1 'R 22' q1 'R 23' r1 ') independently for each unit in an integer of 1 to 3, preferably an integer of 2 to 3, More preferably, it is 3.
  • p1 ' is 0, q1' is, (SiR 21 'p1' R 22 'q1' R 23 'r1') independently for each unit, an integer of 1 to 3, preferably Is an integer of 2 to 3, more preferably 3.
  • the R 22 is a hydroxyl group or a hydrolyzable group independently at each appearance.
  • R 22 is preferably a hydrolyzable group, each independently at each appearance.
  • R h include an unsubstituted alkyl group such as a methyl group, an ethyl group, a propyl group, an isopropyl group, an n-butyl group and an isobutyl group; and a substituted alkyl group such as a chloromethyl group.
  • an alkyl group particularly an unsubstituted alkyl group is preferable, and a methyl group or an ethyl group is more preferable.
  • R h is a methyl group and in another embodiment, R h is an ethyl group.
  • the R 23 is a hydrogen atom or a monovalent organic group independently at each appearance.
  • the monovalent organic group is a monovalent organic group excluding the hydrolyzable group.
  • the monovalent organic group is preferably a C 1-20 alkyl group, more preferably a C 1-6 alkyl group, and even more preferably a methyl group.
  • p1 is an integer of 0 to 3 independently in each appearance
  • q1 is an integer of 0 to 3 independently in each appearance
  • r1 is an integer of 0 to 3 independently in each appearance. It is an integer from 0 to 3.
  • the total of p1, q1 and r1 is 3 in the unit of (SiR 21 p1 R 22 q1 R 23 r1 ).
  • p1 is 0.
  • p1 may be an integer of 1 to 3, an integer of 2 to 3, or 3 independently for each unit (SiR 21 p1 R 22 q1 R 23 r1 ). In a preferred embodiment, p1 is 3.
  • q1 is an integer of 1 to 3, preferably an integer of 2 to 3, more preferably 3, independently of each unit (SiR 21 p1 R 22 q1 R 23 r1 ).
  • p1 is 0 and q1 is an integer of 1 to 3, preferably an integer of 2 to 3, independently of each unit (SiR 21 p1 R 22 q1 R 23 r1 ). It is preferably 3.
  • R b1 is a hydroxyl group or a hydrolyzable group independently at each appearance.
  • the R b1 is preferably a hydrolyzable group independently at each appearance.
  • h is a substituted or unsubstituted C 1-4 alkyl group), more preferably ⁇ OR h (ie, an alkoxy group).
  • R h include an unsubstituted alkyl group such as a methyl group, an ethyl group, a propyl group, an isopropyl group, an n-butyl group and an isobutyl group; and a substituted alkyl group such as a chloromethyl group.
  • an alkyl group particularly an unsubstituted alkyl group is preferable, and a methyl group or an ethyl group is more preferable.
  • R h is a methyl group and in another embodiment, R h is an ethyl group.
  • R c1 is a hydrogen atom or a monovalent organic group independently at each appearance.
  • the monovalent organic group is a monovalent organic group excluding the hydrolyzable group.
  • the monovalent organic group is preferably a C 1-20 alkyl group, more preferably a C 1-6 alkyl group, and even more preferably a methyl group.
  • k1 is an integer of 0 to 3 independently in each appearance
  • l1 is an integer of 0 to 3 independently in each appearance
  • m1 is an independent integer in each appearance. It is an integer from 0 to 3.
  • the total of k1, l1 and m1 is 3 in the unit of (SiR a1 k1 R b1 l1 R c1 m1 ).
  • k1 is an integer of 1 to 3 independently for each unit (SiR a1 k1 R b1 l1 R c1 m1 ), preferably 2 or 3, and more preferably 3. In a preferred embodiment, k1 is 3.
  • R Si is a group represented by the formula (S3)
  • a hydroxyl group or a hydrolyzable group is preferably at the terminal portion of the formulas (1) and (2).
  • the group represented by the formula (S3) during -Z 1 -SiR 22 q1 R 23 r1 (wherein, q1 is an integer of 1 to 3, preferably 2 or 3, more preferably 3 in it, r1 is an integer of 0 ⁇ 2), -.
  • Z 1 '-SiR 22' q1 'R 23' r1 ' (wherein, q1' is an integer of 1 to 3, preferably 2 Or 3, more preferably 3, r1'is an integer of 0 to 2), or -Z 1 " -SiR 22" q1 " R 23" r1 " (in the formula, q1" is 1 to It is an integer of 3, preferably 2 or 3, more preferably 3, and r1 "is an integer of 0 to 2).
  • Z 1 , Z 1' , Z 1". , R 22 , R 23 , R 22' , R 23' , R 22 " , and R 23" have the same meaning as above.
  • R 21 is present in formula (S3)
  • p1' is 0 and q1'is an integer of 1-3, preferably in at least one, preferably all R 21 ,. Is 2 or 3, more preferably 3.
  • Ra1 when Ra1 is present, in at least one, preferably all Ra1 , p1 is 0 and q1 is an integer of 1-3, preferably 2. Or 3, more preferably 3.
  • k1 is 2 or 3, preferably 3, p1 is 0, and q1 is 2 or 3, preferably 3.
  • R d1 is -Z 2- CR 31 p2 R 32 q2 R 33 r2 independently at each appearance.
  • Z 2 is an independent, single bond, oxygen atom or divalent organic group at each appearance.
  • the right side is coupled to (CR 31 p2 R 32 q2 R 33 r2 ).
  • Z 2 is a divalent organic group.
  • Z 2 is preferably a C 1-6 alkylene group,-(CH 2 ) z5- O- (CH 2 ) z6- (in the formula, z5 is an integer of 0 to 6, for example, an integer of 1 to 6).
  • z6 is an integer of 0 to 6, for example, an integer of 1 to 6) or- (CH 2 ) z7 -phenylene- (CH 2 ) z8- (in the formula, z7 is an integer of 0 to 6,
  • z8 is an integer of 0 to 6, for example, an integer of 1 to 6).
  • the C 1-6 alkylene group may be a straight chain or a branched chain, but is preferably a straight chain.
  • These groups may be substituted with one or more substituents selected from, for example, a fluorine atom, a C 1-6 alkyl group, a C 2-6 alkenyl group, and a C 2-6 alkynyl group. However, it is preferably unsubstituted.
  • Z 2 is a C 1-6 alkylene group or- (CH 2 ) z7 -phenylene- (CH 2 ) z8- , preferably -phenylene- (CH 2 ) z8- .
  • Z 2 is such a group, light resistance, especially UV resistance, can be higher.
  • the Z 2 is a C 1-3 alkylene group. In one embodiment, Z 2 can be -CH 2 CH 2 CH 2- . In another embodiment, Z 2 can be -CH 2 CH 2- .
  • R 31 is independently at each occurrence, is -Z 2 '-CR 32' q2 ' R 33' r2 '.
  • Z 2 ' are each independently at each occurrence, a single bond, an oxygen atom or a divalent organic group.
  • Z 2 'structure described as the right side CR 32' binds to q2 'R 33' r2 ') .
  • Said Z 2 ' are preferably, C 1-6 alkylene group, - (CH 2) z5' -O- (CH 2) z6 '- ( wherein, z5' is an integer of 0 to 6, such as 1 to It is an integer of 6, and z6'is an integer of 0 to 6, for example, an integer of 1 to 6) or- (CH 2 ) z7'- phenylene- (CH 2 ) z8' -(in the formula, z7' Is an integer of 0 to 6, for example, an integer of 1 to 6, and z8'is an integer of 0 to 6, for example, an integer of 1 to 6).
  • the C 1-6 alkylene group may be a straight chain or a branched chain, but is preferably a straight chain. These groups may be substituted with one or more substituents selected from, for example, a fluorine atom, a C 1-6 alkyl group, a C 2-6 alkenyl group, and a C 2-6 alkynyl group. However, it is preferably unsubstituted.
  • Z 2 ' is, C 1-6 alkylene group or - (CH 2) z7' - phenylene - (CH 2) z8 '- , preferably - phenylene - (CH 2) z8' - a.
  • Z 2' is such a group, light resistance, especially UV resistance, can be higher.
  • the Z 2 ' is a C 1-3 alkylene group. In one embodiment, Z 2 'is, -CH 2 CH 2 CH 2 - may be. In another embodiment, Z 2 'is, -CH 2 CH 2 - may be.
  • the R 32 ' are each independently at each occurrence, is -Z 3 -SiR 34 n2 R 35 3 -n2.
  • Z 3 is a single bond, an oxygen atom or a divalent organic group independently at each appearance.
  • the right side is coupled to (SiR 34 n2 R 35 3-n2 ).
  • Z 3 is an oxygen atom.
  • Z 3 is a divalent organic group.
  • Z 3 is preferably a C 1-6 alkylene group,-(CH 2 ) z5 " -O- (CH 2 ) z6" -(in the formula, z5 "is an integer of 0 to 6, for example, 1 to 6. an integer, z6 "is an integer of 0 to 6, for example an integer of 1 to 6) or, - (CH 2) z7" - phenylene - (CH 2) z8 "- ( wherein, z7” is , An integer of 0 to 6, for example, an integer of 1 to 6, and z8 "is an integer of 0 to 6, for example, an integer of 1 to 6).
  • the C 1-6 alkylene group may be a straight chain or a branched chain, but is preferably a straight chain. These groups may be substituted with one or more substituents selected from, for example, a fluorine atom, a C 1-6 alkyl group, a C 2-6 alkenyl group, and a C 2-6 alkynyl group. However, it is preferably unsubstituted.
  • Z 3 is, C 1-6 alkylene group or - (CH 2) z7 "- phenylene - (CH 2) z8" - , preferably - phenylene - (CH 2) z8 "- a .Z 3 If the group is such a group, light resistance, especially UV resistance, can be higher.
  • the Z 3 is a C 1-3 alkylene group. In one embodiment, Z 3 can be -CH 2 CH 2 CH 2- . In another embodiment, Z 3 can be -CH 2 CH 2- .
  • the R 34 is a hydroxyl group or a hydrolyzable group independently at each appearance.
  • R 34 is preferably a hydrolyzable group, each independently at each appearance.
  • R h include an unsubstituted alkyl group such as a methyl group, an ethyl group, a propyl group, an isopropyl group, an n-butyl group and an isobutyl group; and a substituted alkyl group such as a chloromethyl group.
  • an alkyl group particularly an unsubstituted alkyl group is preferable, and a methyl group or an ethyl group is more preferable.
  • R h is a methyl group and in another embodiment, R h is an ethyl group.
  • the R 35 is a hydrogen atom or a monovalent organic group independently at each appearance.
  • the monovalent organic group is a monovalent organic group excluding the hydrolyzable group.
  • the monovalent organic group is preferably a C 1-20 alkyl group, more preferably a C 1-6 alkyl group, and even more preferably a methyl group.
  • n2 is an integer of 0 to 3 independently for each unit (SiR 34 n2 R 35 3-n2 ).
  • R Si is a group represented by the formula (S4)
  • n2 is 1 to 3 in the terminal portions of the formulas (1) and (2) (SiR 34 n2 R 35 3-n2 ).
  • at least one Si atom to which a hydroxyl group or a hydrolyzable group is bonded is present at the terminal portions of the formulas (1) and (2).
  • n2 is an integer of preferably 1 to 3, more preferably 2 to 3, and even more preferably 3 independently for each unit (SiR 34 n2 R 35 3-n2 ).
  • the R 33' is a hydrogen atom, a hydroxyl group or a monovalent organic group independently at each appearance.
  • the monovalent organic group is a monovalent organic group excluding the hydrolyzable group.
  • the monovalent organic group is preferably a C 1-20 alkyl group or- (C s H 2s ) t 1- ( OC s H 2s ) t 2 (in the formula, s is 1 to 6).
  • R 33' is a hydroxyl group.
  • R 33 represents a monovalent organic group, preferably a C 1-20 alkyl group, more preferably a C 1-6 alkyl group.
  • the q2' is an integer of 0 to 3 independently at each appearance
  • the r2' is an integer of 0 to 3 independently at each appearance.
  • the sum of q2 'and r2' are the (CR 32 'q2' R 33 'r2') units, it is 3.
  • q2 ' is, (CR 32' q2 'R 33' r2 ') independently for each unit in, preferably an integer of 1 to 3, more preferably 2 to 3, more preferably 3.
  • R 32 is -Z 3- SiR 34 n2 R 35 3-n2 independently in each appearance.
  • Such -Z 3 -SiR 34 n2 R 35 3 -n2 are as defined herein in the R 32 '.
  • the R 33 is a hydrogen atom, a hydroxyl group or a monovalent organic group independently at each appearance.
  • the monovalent organic group is a monovalent organic group excluding the hydrolyzable group.
  • the monovalent organic group is preferably a C 1-20 alkyl group or- (C s H 2s ) t1- ( OC s H 2s ) t 2 (in the formula, s is 1 to 6). It is an integer, preferably an integer of 2-4, t1 is 1 or 0, preferably 0, and t2 is an integer of 1-20, preferably an integer of 2-10, more preferably an integer of 2-6. ), More preferably a C 1-20 alkyl group, even more preferably a C 1-6 alkyl group, and particularly preferably a methyl group.
  • R 33 is a hydroxyl group.
  • R 33 is a monovalent organic group, preferably a C 1-20 alkyl group, more preferably a C 1-6 alkyl group.
  • p2 is an integer of 0 to 3 independently at each appearance
  • q2 is an integer of 0 to 3 independently at each appearance
  • r2 is an integer of 0 to 3 independently at each appearance. It is an integer from 0 to 3.
  • the total of p2, q2 and r2 is 3 in the unit of (CR 31 p2 R 32 q2 R 33 r2 ).
  • p2 is 0.
  • p2 may be an integer of 1 to 3, an integer of 2 to 3, or 3 independently for each unit (CR 31 p2 R 32 q2 R 33 r2 ). In a preferred embodiment, p2 is 3.
  • q2 is an integer of 1 to 3, preferably an integer of 2 to 3, and more preferably 3 independently for each unit (CR 31 p2 R 32 q2 R 33 r2 ).
  • p2 is 0 and q2 is an integer of 1-3, preferably an integer of 2-3, independently for each unit (CR 31 p2 R 32 q2 R 33 r2 ). It is preferably 3.
  • the Re1 is -Z 3- SiR 34 n2 R 35 3-n2 independently at each appearance.
  • Such -Z 3 -SiR 34 n2 R 35 3 -n2 are as defined herein in the R 32 '.
  • the R f1 is a hydrogen atom, a hydroxyl group or a monovalent organic group independently at each appearance.
  • the monovalent organic group is a monovalent organic group excluding the hydrolyzable group.
  • the monovalent organic group is preferably a C 1-20 alkyl group or- (C s H 2s ) t 1- ( OC s H 2s ) t 2 (in the formula, s is 1 to 6). It is an integer, preferably an integer of 2-4, t1 is 1 or 0, preferably 0, and t2 is an integer of 1-20, preferably an integer of 2-10, more preferably an integer of 2-6. ), More preferably a C 1-20 alkyl group, even more preferably a C 1-6 alkyl group, and particularly preferably a methyl group.
  • R f1 is a hydroxyl group.
  • R f1 is a monovalent organic group, preferably a C 1-20 alkyl group, more preferably a C 1-6 alkyl group.
  • k2 is an integer of 0 to 3 independently in each appearance
  • l2 is an integer of 0 to 3 independently in each appearance
  • m2 is an independent integer in each appearance. It is an integer from 0 to 3.
  • the total of k2, l2 and m2 is 3 in the unit of (CR d1 k2 Re1 l2 R f1 m2 ).
  • n2 is 1 to 3, preferably 2 or 3, more preferably 3 (SiR 34 n2 R 35 3-n2 ) units.
  • n2 is 1 to 3, preferably 2 or 3, more preferably 3 (SiR 34 n2 R 35 3-n2 ) units.
  • two or more for example, 2 to 27 pieces, preferably 2 to 9, more preferably 2 to 6, still more preferably 2 to 3 pieces.
  • n2 is an integer of 1-3, preferably 2 or 3, more preferably. Is 3.
  • n2 is an integer of 1-3, preferably 2 or 3, more preferably 3. Is.
  • n2 is an integer of 1-3, preferably 2 or 3, more preferably 3. Is.
  • k2 is 0, l2 is 2 or 3, preferably 3, and n2 is 2 or 3, preferably 3.
  • R Si is a group represented by the formula (S2), (S3) or (S4). These compounds can form a surface treatment layer having high surface slipperiness.
  • R Si is a group represented by the formula (S1), (S3) or (S4). Since these compounds have a plurality of hydrolyzable groups at one end, they can strongly adhere to the base material and form a surface treatment layer having high friction durability.
  • R Si is a group represented by the formula (S3) or (S4). Since these compounds may have a plurality of hydrolyzable groups branched from one Si atom or C atom at one end, a surface treatment layer having even higher friction durability can be formed.
  • R Si is a group represented by the formula (S1).
  • R Si is a group represented by the formula (S2).
  • R Si is a group represented by the formula (S3).
  • R Si is a group represented by the formula (S4).
  • X A is mainly to provide the binding ability of the fluoropolyether part for providing water repellency and surface sliding property, etc. and (R F1 and R F2) and base section ( It is understood as a linker that connects R Si ). Therefore, the X A may be any one compound of the formula (1) and (2) can exist stably, may be a single bond, may be any group.
  • is an integer of 1 to 9
  • is an integer of 1 to 9.
  • ⁇ and ⁇ can vary depending on the valence of X A.
  • the sum of ⁇ and ⁇ is the same as the valence of X A.
  • X A is a 10-valent organic group
  • the sum of ⁇ and ⁇ is 10, for example, ⁇ is 9 and ⁇ is 1, ⁇ is 5 and ⁇ is 5, or ⁇ is 1 and ⁇ is 9. obtain.
  • ⁇ and ⁇ are 1.
  • is an integer of 1 to 9. ⁇ can vary depending on the valence of X A. That is, ⁇ is a value obtained by subtracting 1 from the valence of X A.
  • X A is each independently a single bond or a 2-10 valent organic group
  • 2-10 divalent organic groups represented by X A is preferably 2-8 monovalent organic group.
  • the divalent to 10 valent organic group is preferably a 2 to 4 valent organic group, more preferably a divalent organic group.
  • the divalent to 10 valent organic group is preferably a 3 to 8 valent organic group, more preferably a 3 to 6 valent organic group.
  • X A is a single bond or divalent organic group, ⁇ is 1 and ⁇ is 1.
  • X A is a single bond or divalent organic group and ⁇ is 1.
  • X A is 3 to hexavalent organic group, alpha is 1, beta is 2-5.
  • X A is 3 to hexavalent organic group, gamma is 2-5.
  • X A is a trivalent organic group, ⁇ is 1 and ⁇ is 2.
  • X A is a trivalent organic group and ⁇ is 2.
  • X A is a single bond.
  • X A is a divalent organic group.
  • the X A for example, a single bond or the following formula: -(R 51 ) p5- (X 51 ) q5- [During the ceremony: R 51 represents a single bond,-(CH 2 ) s5- or o-, m- or p-phenylene group, preferably-(CH 2 ) s5- .
  • s5 is an integer of 1 to 20, preferably an integer of 1 to 6, more preferably an integer of 1 to 3, and even more preferably 1 or 2.
  • X 51 represents ⁇ (X 52 ) l5-
  • X 52 is an independent -O-, -S-, o-, m- or p-phenylene group, -C (O) O-, -Si (R 53 ) 2 -,-( Si (R 53) 2 O) m5 -Si (R 53) 2 -, - CONR 54 -, - O-CONR 54 -, - NR 54 - and - (CH 2)
  • R 54 independently represents a hydrogen atom, a phenyl group or a C 1-6 alkyl group (preferably a methyl group) at each appearance.
  • m5 is an integer of 1 to 100, preferably an integer of 1 to 20, independently of each occurrence.
  • n5 is an integer of 1 to 20, preferably an integer of 1 to 6, and more preferably an integer of 1 to 3, independently of each occurrence.
  • l5 is an integer of 1 to 10, preferably an integer of 1 to 5, more preferably an integer of 1 to 3.
  • p5 is 0 or 1 and q5 is 0 or 1 and
  • at least one of p5 and q5 is 1, and the order of existence of each repeating unit in parentheses with p5 or q5 is arbitrary].
  • Examples thereof include a divalent organic group represented by.
  • X A (typically the hydrogen atom of X A ) is substituted with one or more substituents selected from fluorine atoms, C 1-3 alkyl groups and C 1-3 fluoroalkyl groups. May be. In preferred embodiments, X A is not substituted by these groups.
  • the X A are each independently, - (R 51) p5 - (X 51) q5 -R 52 - it is.
  • R 52 represents a single bond,-(CH 2 ) t5- or o-, m- or p-phenylene group, preferably ⁇ (CH 2 ) t5- .
  • t5 is an integer of 1 to 20, preferably an integer of 2 to 6, and more preferably an integer of 2 to 3.
  • R 52 (typically the hydrogen atom of R 52 ) is substituted with one or more substituents selected from fluorine atoms, C 1-3 alkyl groups and C 1-3 fluoroalkyl groups. May be.
  • R 56 is not substituted with these groups.
  • the X A are each, independently, Single bond, C 1-20 alkylene group, -R 51- X 53 -R 52- , or -X 54 -R 5- [In the formula, R 51 and R 52 have the same meaning as above.
  • X 53 is -O-, -S-, -C (O) O-, -CONR 54 -, -O-CONR 54 -, -Si (R 53 ) 2- , - (Si (R 53) 2 O) m5 -Si (R 53) 2 -, -O- (CH 2) u5 - ( Si (R 53) 2 O) m5 -Si (R 53) 2 -, -O- (CH 2) u5 -Si ( R 53) 2 -O-Si (R 53) 2 -CH 2 CH 2 -Si (R 53) 2 -O-Si (R 53) 2 -, -O- (CH 2 ) u5-Si (OCH 3 ) 2 OSI (OCH 3 ) 2- , -CONR 54 - (CH 2) u5 - (Si (R 53) 2 O) m5 -Si (R 53) 2 -, -CONR 54
  • u5 is an integer of 1 to 20, preferably an integer of 2 to 6, and more preferably an integer of 2 to 3.
  • X 54 is -S-, -C (O) O-, -CONR 54 -, -O-CONR 54 -, -CONR 54 - (CH 2) u5 - (Si (R 54) 2 O) m5 -Si (R 54) 2 -, -CONR 54 - (CH 2) u5 -N (R 54) -, or -CONR 54 - (o-, m- or p- phenylene) -Si (R 54) 2 - (In the formula, each symbol has the same meaning as above.) Represents. ] Can be.
  • the X A are each, independently, Single bond, C 1-20 alkylene group, - (CH 2) s5 -X 53 -, - (CH 2) s5 -X 53 - (CH 2) t5 - -X 54 -, or -X 54 - (CH 2) t5 - [In the formula, X 53 , X 54 , s5 and t5 have the same meaning as above. ] Is.
  • the X A are each, independently, Single bond, C 1-20 alkylene group, - (CH 2) s5 -X 53 - (CH 2) t5 -, or -X 54 - (CH 2) t5 - [In the formula, each symbol has the same meaning as above. ] Can be.
  • the X A are each, independently, Single bond C 1-20 alkylene group, - (CH 2) s5 -X 53 -, or - (CH 2) s5 -X 53 - (CH 2) t5 -
  • X 53 is, -O -, - CONR 54 - , or -O-CONR 54 - a and, R 54 independently represents a hydrogen atom, a phenyl group or a C 1-6 alkyl group at each appearance.
  • s5 is an integer from 1 to 20 and t5 is an integer from 1 to 20.
  • the X A are each, independently, -(CH 2 ) s5- O- (CH 2 ) t5- -CONR 54 - (CH 2) t5 -
  • R 54 independently represents a hydrogen atom, a phenyl group or a C 1-6 alkyl group at each appearance.
  • s5 is an integer from 1 to 20 and t5 is an integer from 1 to 20.
  • the X A are each, independently, Single bond, C 1-20 alkylene group, -(CH 2 ) s5- O- (CH 2 ) t5- , - (CH 2) s5 - ( Si (R 53) 2 O) m5 -Si (R 53) 2 - (CH 2) t5 -, - (CH 2) s5 -O- ( CH 2) u5 - (Si (R 53) 2 O) m5 -Si (R 53) 2 - (CH 2) t5 -, or - (CH 2) s5 -O- (CH 2) t5 -Si (R 53) 2 - (CH 2) u5 -Si (R 53) 2 - (C v H 2v) - [In the formula, R 53 , m5, s5, t5 and u5 have the same meaning as above, and v5 is an integer of 1 to 20, preferably an integer of 2 to 6, and more preferably an integer of
  • - (C v H 2v) - can be linear, may be branched, for example, -CH 2 CH 2 -, - CH 2 CH 2 CH 2 -, - CH It can be (CH 3 )-,-CH (CH 3 ) CH 2- .
  • Said X A are each independently a fluorine atom, C 1-3 (preferably, C 1-3 perfluoroalkyl group) alkyl and C 1-3 fluoroalkyl group one or more selected from It may be substituted with a substituent. In one embodiment, X A is unsubstituted.
  • X A is the left side of each formula is bound to R F1 or R F2, the right side is attached to the R Si.
  • X A are each independently be other than -O-C 1-6 alkylene group.
  • R 41 is independently a hydrogen atom, a phenyl group, an alkyl group having 1 to 6 carbon atoms, or a C 1-6 alkoxy group, preferably a methyl group;
  • D is -CH 2 O (CH 2 ) 2- , -CH 2 O (CH 2 ) 3- , -CF 2 O (CH 2 ) 3- , -(CH 2 ) 2- , -(CH 2 ) 3- , - (CH 2) 4 -, -CONH- (CH 2 ) 3- , -CON (CH 3 )-(CH 2 ) 3- , -CON (Ph)-(CH 2 ) 3- (In the formula, Ph means phenyl), and (Wherein, R 42 are each independently a hydrogen atom, an alkyl group or an alkoxy group C 1-6 of C 1-6, preferably methyl group or a methoxy group, more preferably a
  • X A is a group independently represented by the formula:-(R 16 ) x1- (CFR 17 ) y1- (CH 2 ) z1- .
  • x1, y1 and z1 are independently integers of 0 to 10
  • the sum of x1, y1 and z1 is 1 or more
  • the order of existence of each repeating unit enclosed in parentheses is in the formula. Is optional.
  • R 16 are each independently at each occurrence, an oxygen atom, a phenylene, carbazolylene, -NR 18 - (wherein, R 18 represents a hydrogen atom or an organic group) or a divalent organic group is there.
  • R 18 is an oxygen atom or a divalent polar group.
  • the "lower alkyl group” is, for example, an alkyl group having 1 to 6 carbon atoms, for example, methyl, ethyl, n-propyl, which may be substituted with one or more fluorine atoms.
  • R 17 is independently a hydrogen atom, a fluorine atom or a lower fluoroalkyl group at each appearance, and is preferably a fluorine atom.
  • the "lower fluoroalkyl group” is, for example, a fluoroalkyl group having 1 to 6 carbon atoms, preferably 1 to 3 carbon atoms, preferably a perfluoroalkyl group having 1 to 3 carbon atoms, and more preferably a trifluoromethyl group. It is a pentafluoroethyl group, more preferably a trifluoromethyl group.
  • each R 41 is independently a hydrogen atom, a phenyl group, an alkyl group having 1 to 6 carbon atoms, or a C 1-6 alkoxy group, preferably a methyl group;
  • R F1 or R F2 molecular backbone -CH 2 O (CH 2 ) 2- , -CH 2 O (CH 2 ) 3- , -CF 2 O (CH 2 ) 3- , -(CH 2 ) 2- , -(CH 2 ) 3- , - (CH 2) 4 -, -CONH- (CH 2 ) 3- , -CON (CH 3 )-(CH 2 ) 3- , -CON (Ph)-(CH 2 ) 3- (In the formula, Ph means phenyl), or Wherein, R 42 are each independently a hydrogen atom, an alkyl group or an alk
  • the radical trapping group is not particularly limited as long as it can trap radicals generated by light irradiation, but for example, benzophenones, benzotriazoles, benzoic acid esters, phenyl salicylates, crotonic acids, malonic acid esters, organoacrylates, etc. , Hindered amines, hindered phenols, or triazine residues.
  • the ultraviolet absorbing group is not particularly limited as long as it can absorb ultraviolet rays, and for example, benzotriazoles, hydroxybenzophenones, esters of substituted and unsubstituted benzoic acid or salicylic acid compounds, acrylates or alkoxycinnamates, oxamides, etc. Included are residues of oxanilides, benzoxadinones and benzoxazoles.
  • the preferred radical scavenging group or UV absorbing group is Can be mentioned.
  • X A are each independently be 3-10 monovalent organic group.
  • X A include the following groups: [In the formula, R 25 , R 26 and R 27 are independently divalent to hexavalent organic groups, respectively. R 25 binds to at least one R F1 , and R 26 and R 27 each bind to at least one R Si . ]
  • the R 25 is a single bond, C 1-20 alkylene group, C 3-20 cycloalkylene groups, C 5-20 arylene group, -R 57 -X 58 -R 59 - , - X 58 - R 59 -, or -R 57 -X 58 - it is.
  • the R 57 and R 59 described above are independently single-bonded, C 1-20 alkylene groups, C 3-20 cycloalkylene groups, or C 5-20 arylene groups, respectively.
  • the X 58 is -O-, -S-, -CO-, -O-CO- or -COO-.
  • R 26 and R 27 are hydrocarbons, or groups having at least one atom selected from N, O, and S in the end or main chain of the hydrocarbon. preferably, C 1-6 alkyl group, -R 36 -R 37 -R 36 - , - R 36 -CHR 38 2 - and the like.
  • R 36 is independently a single bond or an alkyl group having 1 to 6 carbon atoms, preferably an alkyl group having 1 to 6 carbon atoms.
  • R 37 is N, O or S, preferably N or O.
  • R 38 are, -R 45 -R 46 -R 45 - , - R 46 -R 45 - or -R 45 -R 46 - is.
  • R 45 is an alkyl group having 1 to 6 carbon atoms independently.
  • R 46 is N, O or S, preferably O.
  • X A are each independently be 3-10 monovalent organic group.
  • the fluoropolyester group-containing compound represented by the above formula (1) or the formula (2) is not particularly limited, but may have an average molecular weight of 5 ⁇ 10 2 to 1 ⁇ 10 5 . Within such a range, it is preferable to have an average molecular weight of 2,000 to 32,000, more preferably 2,500 to 12,000, from the viewpoint of friction durability.
  • the "average molecular weight” refers to a number average molecular weight, and the "average molecular weight” is a value measured by 19 F-NMR.
  • the fluorine-containing silane compound in the surface treatment agent of the present disclosure is a compound represented by the formula (1).
  • the fluorine-containing silane compound in the surface treatment agent of the present disclosure is a compound represented by the formula (2).
  • the fluorine-containing silane compound is a compound represented by the formula (1) and a compound represented by the formula (2).
  • the compound represented by the formula (2) is preferably 0.1 with respect to the total of the compound represented by the formula (1) and the compound represented by the formula (2). It is more than mol% and less than 35 mol%.
  • the lower limit of the content of the compound represented by the formula (2) with respect to the total of the compound represented by the formula (1) and the compound represented by the formula (2) is preferably 0.1 mol%, more preferably 0.1 mol%. It can be 0.2 mol%, even more preferably 0.5 mol%, even more preferably 1 mol%, particularly preferably 2 mol%, and particularly 5 mol%.
  • the upper limit of the content of the compound represented by the formula (2) with respect to the total of the compound represented by the formula (1) and the compound represented by the formula (2) is preferably 35 mol%, more preferably 30 mol. %, More preferably 20 mol%, even more preferably 15 mol% or 10 mol%.
  • the compound represented by the formula (2) is preferably 0.1 mol% or more and 30 mol% or less, more preferably 0.1 mol% or more and 30 mol% or less, based on the total of the compound represented by the formula (1) and the compound represented by the formula (2).
  • 0.1 mol% or more and 20 mol% or less more preferably 0.2 mol% or more and 10 mol% or less, still more preferably 0.5 mol% or more and 10 mol% or less, particularly preferably 1 mol% or more and 10 mol% or less.
  • it is 2 mol% or more and 10 mol% or less, or 5 mol% or more and 10 mol% or less.
  • the compound represented by the above formula (1) or (2) can be obtained, for example, by the method described in the above-mentioned Patent Document 1, Patent Document 2, and the like.
  • the metal compound examples include simple substances of metals, compounds of metal atoms and other atoms, for example, compounds to which a reactive group is bonded, salts, other organic metal compounds, and the like.
  • the metal atom contained in the metal compound also includes a metalloid such as B, Si, Ge, Sb, As, and Te.
  • the metal atom contained in the metal compound is one or more metal atoms selected from the transition metal atoms of groups 3 to 11 of the periodic table and the typical metal atoms of groups 12 to 15.
  • the metal atom is preferably a transition metal atom of groups 3 to 11 in the periodic table, and one or more metal atoms selected from typical metal atoms of groups 12 to 15 (excluding Si). It is preferably a transition metal atom of groups 3 to 11, more preferably a transition metal atom of groups 3 to 7, and even more preferably a transition metal atom of groups 4 to 6.
  • the metal atom can be present in the surface treatment layer formed from the surface treatment agent, whereby the friction durability and chemical resistance of the surface treatment layer can be allowed to exist. Can be improved.
  • the metal atom is one or more atoms selected from Ta, Nb, Zr, Mo, W, Cr, Hf, Al, Ti and V.
  • the metal atom is Ta, Nb, W, Mo, Cr or V.
  • the metal atom is Ta.
  • tantalum As the metal atom, the friction durability and chemical resistance of the surface treatment layer can be further improved.
  • the metal compound is a metal compound represented by MR (in the formula, M is a metal atom and R is a hydrolyzable group).
  • M is a metal atom and R is a hydrolyzable group.
  • the hydrolyzable group means a group capable of undergoing a hydrolyzing reaction, that is, a group capable of being eliminated from a metal atom by the hydrolyzing reaction, similarly to the hydrolyzable group relating to the fluorine-containing silane.
  • the hydrolyzable group is ⁇ OR m , preferably methoxy or ethoxy.
  • ⁇ OR m preferably methoxy or ethoxy.
  • the hydrolyzable group may be the same as the hydrolyzable group contained in the fluorine-containing silane compound described above.
  • the influence of the hydrolyzable group can be reduced even when they are exchanged with each other.
  • the hydrolyzable group may be different from the hydrolyzable group contained in the fluorine-containing silane compound described above.
  • the hydrolyzable group and the hydrolyzable group contained in the fluorine-containing silane compound may be interchanged with each other in the surface treatment agent.
  • the metal compound may be Ta (OR m ) 5 , preferably Ta (OCH 2 CH 3 ) 5 .
  • the metal compound is preferably 0.1 to 10 times, more preferably 0.2 to 5 times, still more preferably 0.3 to 3 times in molar ratio with respect to the fluorine-containing silane compound in the surface treatment agent. Included in double the amount.
  • the surface treatment agent of the present disclosure is a solvent, a (non-reactive) fluoropolyether compound that can be understood as a fluorine-containing oil, preferably a perfluoro (poly) ether compound (hereinafter collectively referred to as "fluorine-containing oil”).
  • fluorine-containing oil preferably a perfluoro (poly) ether compound
  • Silicone compounds (non-reactive) that can be understood as silicone oils (hereinafter referred to as "silicone oils”), alcohols, catalysts, surfactants, polymerization inhibitors, sensitizers and the like may be included.
  • solvent examples include aliphatic hydrocarbons such as hexane, cyclohexane, heptane, octane, nonane, decane, undecane, dodecane and mineral spirit; aromatic hydrocarbons such as benzene, toluene, xylene, naphthalene and solventnaphtha.
  • aliphatic hydrocarbons such as hexane, cyclohexane, heptane, octane, nonane, decane, undecane, dodecane and mineral spirit
  • aromatic hydrocarbons such as benzene, toluene, xylene, naphthalene and solventnaphtha.
  • the fluorine-containing oil is not particularly limited, and examples thereof include a compound represented by the following general formula (3) (perfluoro (poly) ether compound).
  • Rf 5 represents an alkyl group having 1 to 16 carbon atoms (preferably a perfluoroalkyl group having C 1-16 ) which may be substituted with one or more fluorine atoms
  • Rf 6 is Represents an alkyl group having 1 to 16 carbon atoms (preferably a C 1-16 perfluoroalkyl group), a fluorine atom or a hydrogen atom which may be substituted with one or more fluorine atoms, where Rf 5 and Rf 6 are.
  • each independently is a C 1-3 perfluoroalkyl group.
  • a', b', c'and d' represent the number of four types of repeating units of perfluoro (poly) ether constituting the main skeleton of the polymer, and are integers of 0 or more and 300 or less independently of each other.
  • A', b', c'and d' are at least 1, preferably 1 to 300, more preferably 20 to 300.
  • the order of existence of each repeating unit in parentheses with the subscripts a', b', c'or d' is arbitrary in the equation.
  • -(OC 3 F 6 )- may be any of-(OCF 2 CF 2 CF 2 )-,-(OCF (CF 3 ) CF 2 )-and (OCF 2 CF (CF 3 ))-.
  • -(OC 2 F 4 )- may be any of-(OCF 2 CF 2 )-and (OCF (CF 3 ))-, but is preferably-(OCF 2 CF 2 )-.
  • the compound (one or a mixture of two or more) represented by any of the following general formulas (3a) and (3b) is used. It may be).
  • Rf 5 and Rf 6 are as described above; in equation (3a), b "is an integer between 1 and 100; in equation (3b), a" and b “are independent of each other. Is an integer of 0 or more and 30 or less, and c "and d" are independently integers of 1 or more and 300 or less.
  • the subscripts a ", b", c ", and d" are added and enclosed in parentheses. The order of existence of each repeating unit is arbitrary in the equation.
  • the fluorine-containing oil may be a compound represented by the general formula Rf 3- F (in the formula, Rf 3 is a C 5-16 perfluoroalkyl group). Further, it may be a chlorotrifluoroethylene oligomer.
  • the fluorine-containing oil may have an average molecular weight of 500 to 10000.
  • the molecular weight of the fluorinated oil can be measured using GPC.
  • the fluorine-containing oil may be contained, for example, 0 to 50% by mass, preferably 0 to 30% by mass, and more preferably 0 to 5% by mass with respect to the surface treatment agent of the present disclosure.
  • the surface treatment agents of the present disclosure are substantially free of fluorinated oils.
  • substantially free of fluorinated oil means that it may contain no fluorinated oil or may contain a very small amount of fluorinated oil.
  • the average molecular weight of the fluorine-containing oil may be larger than the average molecular weight of the fluorine-containing silane compound.
  • the average molecular weight of the fluorine-containing oil may be smaller than the average molecular weight of the fluorine-containing silane compound.
  • the fluorine-containing oil contributes to improving the surface slipperiness of the layer formed by the surface treatment agent of the present disclosure.
  • the silicone oil for example, a linear or cyclic silicone oil having a siloxane bond of 2,000 or less can be used.
  • the linear silicone oil may be a so-called straight silicone oil or a modified silicone oil.
  • the straight silicone oil include dimethyl silicone oil, methyl phenyl silicone oil, and methyl hydrogen silicone oil.
  • the modified silicone oil include those obtained by modifying straight silicone oil with alkyl, aralkyl, polyether, higher fatty acid ester, fluoroalkyl, amino, epoxy, carboxyl, alcohol and the like.
  • Examples of the cyclic silicone oil include cyclic dimethylsiloxane oil.
  • such silicone oil is used, for example, with respect to a total of 100 parts by mass of the above-mentioned fluoropolyether group-containing silane compound of the present disclosure (in the case of two or more kinds, the total of these, the same applies hereinafter). It may be contained in an amount of 0 to 300 parts by mass, preferably 50 to 200 parts by mass.
  • Silicone oil contributes to improving the surface slipperiness of the surface treatment layer.
  • the alcohols include alcohols having 1 to 6 carbon atoms which may be substituted with one or more fluorine atoms, such as methanol, ethanol, iso-propanol, tert-butanol, CF 3 CH 2 OH, and the like. CF 3 CF 2 CH 2 OH, (CF 3 ) 2 CHOH can be mentioned.
  • the alcohols are preferably 0.1 to 5 times, more preferably 0.5 to 3 times, still more preferably 0.8 to 1.2 times in molar ratio with respect to the metal compound in the surface treatment agent. Included in double the amount.
  • the catalyst examples include acids (for example, acetic acid, trifluoroacetic acid, etc.), bases (for example, ammonia, triethylamine, diethylamine, etc.), transition metals (for example, Ti, Ni, Sn, etc.) and the like.
  • acids for example, acetic acid, trifluoroacetic acid, etc.
  • bases for example, ammonia, triethylamine, diethylamine, etc.
  • transition metals for example, Ti, Ni, Sn, etc.
  • the catalyst promotes the hydrolysis and dehydration condensation of the fluorine-containing silane compound of the present disclosure, and promotes the formation of the layer formed by the surface treatment agent of the present disclosure.
  • examples of other components include tetraethoxysilane, methyltrimethoxysilane, 3-aminopropyltrimethoxysilane, 3-glycidoxypropyltrimethoxysilane, methyltriacetoxysilane, and the like.
  • the surface treatment agent of the present disclosure can be made into pellets by impregnating a porous substance such as a porous ceramic material or metal fiber, for example, steel wool into a cotton-like material.
  • the pellet can be used, for example, for vacuum deposition.
  • the surface treatment agent of the present disclosure contains a small amount of impurities such as Pt, Rh, Ru, 1,3-divinyltetramethyldisiloxane, triphenylphosphine, NaCl, KCl, and a condensate of silane. obtain.
  • the article of the present disclosure includes a base material and a layer (surface treatment layer) formed from the surface treatment agent of the present disclosure on the surface of the base material.
  • the substrates that can be used in the present disclosure are, for example, glass, resin (natural or synthetic resin, for example, general plastic material), metal, ceramics, semiconductor (silicon, germanium, etc.), fiber (woven fabric, non-woven fabric, etc.). Etc.), fur, leather, wood, ceramics, stones, etc., building materials, sanitary goods, and any suitable material.
  • the material constituting the surface of the base material may be a material for the optical member, for example, glass or transparent plastic.
  • some layer (or film), such as a hard coat layer or an antireflection layer may be formed on the surface (outermost layer) of the base material.
  • the antireflection layer either a single-layer antireflection layer or a multi-layer antireflection layer may be used.
  • the article to be manufactured is an optical glass component for a touch panel
  • a thin film using a transparent electrode such as indium tin oxide (ITO) or zinc oxide is provided on a part of the surface of the base material (glass).
  • the base material may be an insulating layer, an adhesive layer, a protective layer, a decorative frame layer (I-CON), an atomized film layer, a hard coating film layer, a polarizing film, a phase difference film, etc., depending on the specific specifications thereof.
  • the base material may be an insulating layer, an adhesive layer, a protective layer, a decorative frame layer (I-CON), an atomized film layer, a hard coating film layer, a polarizing film, a phase difference film, etc., depending on the specific specifications thereof.
  • I-CON decorative frame layer
  • an atomized film layer atomized film layer
  • a hard coating film layer a polarizing film
  • a phase difference film etc.
  • the shape of the base material is not particularly limited, and may be, for example, a plate shape, a film, or other form. Further, the surface region of the base material on which the surface treatment layer should be formed may be at least a part of the surface of the base material, and may be appropriately determined according to the use of the article to be manufactured, specific specifications and the like.
  • the base material may be such that at least its surface portion is made of a material originally having a hydroxyl group.
  • a material originally having a hydroxyl group examples include glass, and examples thereof include metals (particularly base metals) in which a natural oxide film or a thermal oxide film is formed on the surface, ceramics, semiconductors, and the like.
  • the hydroxyl group is introduced to the surface of the base material by applying some pretreatment to the base material. Can be increased or increased. Examples of such pretreatment include plasma treatment (for example, corona discharge) and ion beam irradiation.
  • the plasma treatment can introduce or increase hydroxyl groups on the surface of the base material, and can also be suitably used for cleaning the surface of the base material (removing foreign substances and the like).
  • an interfacial adsorbent having a carbon-carbon unsaturated bond group is previously subjected to a monomolecular film on the surface of the base material by an LB method (Langmuir-Bloget method), a chemical adsorption method, or the like. Examples thereof include a method of forming the morphology and then cleaving the unsaturated bond in an atmosphere containing oxygen, nitrogen and the like.
  • the substrate may be such that at least its surface portion is made of a silicone compound having one or more reactive groups, for example Si—H groups, or a material containing an alkoxysilane. ..
  • the base material is glass.
  • glass sapphire glass, soda lime glass, alkali aluminosilicate glass, borosilicate glass, non-alkali glass, crystal glass and quartz glass are preferable, and chemically strengthened soda lime glass, chemically strengthened alkali aluminosilicate glass, etc. And chemically bonded borosilicate glass are particularly preferred.
  • the article of the present disclosure forms a layer of the above-mentioned surface treatment agent of the present disclosure on the surface of the above-mentioned base material, and post-treats this layer as necessary, whereby a layer is formed from the surface treatment agent of the present disclosure. It can be manufactured by forming.
  • the layer formation of the surface treatment agent of the present disclosure can be carried out by applying the surface treatment agent to the surface of the base material so as to cover the surface.
  • the coating method is not particularly limited. For example, a wet coating method and a dry coating method can be used.
  • wet coating methods include dip coating, spin coating, flow coating, spray coating, roll coating, gravure coating and similar methods.
  • dry coating methods include vapor deposition (usually vacuum vapor deposition), sputtering, CVD and similar methods.
  • vapor deposition method usually, vacuum vapor deposition method
  • CVD method include plasma-CVD, optical CVD, thermal CVD and similar methods.
  • the surface treatment agents of the present disclosure can be diluted with a solvent before being applied to the surface of the substrate.
  • a solvent for example, perfluoroaliphatic hydrocarbons having 5 to 12 carbon atoms (eg, perfluorohexane, perfluoromethylcyclohexane and).
  • perfluoro-1,3-dimethylcyclohexane polyfluoro aromatic hydrocarbons (e.g., bis (trifluoromethyl) benzene); polyfluoro aliphatic hydrocarbons (e.g., C 6 F 13 CH 2 CH 3 ( e.g., Asahi Glass Asahiclean (registered trademark) AC-6000), 1,1,2,2,3,3,4-heptafluorocyclopentane (for example, Zeorora (registered trademark) H manufactured by Nippon Zeon Co., Ltd.); Hydrofluoroether (HFE) (for example, perfluoropropylmethyl ether (C 3 F 7 OCH 3 )) (for example, Novec 7000 manufactured by Sumitomo 3M Co., Ltd.), perfluorobutyl methyl ether (C 4 F 9 OCH 3) ) (For example, Novec TM 7100 manufactured by Sumitomo 3M Co., Ltd.), Perfluorobuty
  • solvents can be used alone or It can be used as a mixture of two or more kinds.
  • hydrofluoroether is preferable, and perfluorobutylmethyl ether (C 4 F 9 OCH 3 ) and / or perfluorobutyl ethyl ether (C 4 F 9 OC 2 H) is preferable. 5 ) is particularly preferable.
  • the surface treatment agent of the present disclosure may be subjected to the dry coating method as it is, or may be diluted with the above-mentioned solvent and then subjected to the dry coating method.
  • the layer formation of the surface treatment agent is preferably carried out so that the surface treatment agent of the present disclosure is present in the layer together with a catalyst for hydrolysis and dehydration condensation.
  • a catalyst may be added to the diluted solution of the surface treatment agent of the present disclosure immediately after diluting the surface treatment agent of the present disclosure with a solvent and immediately before applying to the surface of the substrate.
  • the surface treatment agent of the present disclosure to which a catalyst has been added is directly vapor-deposited (usually vacuum-deposited), or the surface treatment agent of the present disclosure is catalyst-added to a metal porous body such as iron or copper.
  • a vapor deposition (usually vacuum vapor deposition) treatment may be performed using a pellet-like substance impregnated with.
  • any suitable acid or base can be used as the catalyst.
  • the acid catalyst for example, acetic acid, formic acid, trifluoroacetic acid and the like can be used.
  • the base catalyst for example, ammonia, organic amines and the like can be used.
  • the article of the present disclosure is produced by forming a surface treatment layer on a base material using a surface treatment agent containing a fluorine-containing silane compound and a metal compound. Therefore, the surface-treated layer in the article of the present disclosure contains metal atoms derived from metal compounds.
  • the present disclosure is an article containing a base material and a surface treatment layer formed on the base material, and the surface treatment layer is formed of a fluorine-containing silane compound, and is group 3 to 11 of the periodic table.
  • Articles are provided that include a Group transition metal atom and one or more metal atoms selected from Group 12-15 typical metal atoms.
  • the fluorine-containing silane compound is a fluorine-containing silane compound contained in the surface treatment agent of the present disclosure. Therefore, the fluorine-containing silane compound that forms the surface treatment layer contained in the article has the same embodiment as the fluorine-containing silane contained in the surface treatment agent described above.
  • the fluorine-containing silane compound has the following formula (1) or (2): [During the ceremony: R F1 is independently at each occurrence, Rf 1 -R F -O q - a and; R F2 is -R f 2 p -RF -O q- ; Rf 1 is a C 1-16 alkyl group that may be independently substituted with one or more fluorine atoms at each appearance; Rf 2 is a C 1-6 alkylene group that may be substituted with one or more fluorine atoms; RF is a divalent fluoropolyester group independently at each appearance; p is 0 or 1; q is 0 or 1 independently at each occurrence; R Si is a monovalent group containing a Si atom to which a hydroxyl group, a hydrolyzable group, a hydrogen atom or a monovalent organic group is bonded independently at each appearance; At least one R Si is a monovalent group containing a Si atom to which
  • the metal atom is a metal atom constituting the metal compound contained in the surface treatment agent of the present disclosure. Therefore, the metal atom contained in the surface treatment layer contained in the article has the same embodiment as the metal relating to the metal compound contained in the surface treatment agent described above.
  • the metal atom is preferably one or more metal atoms selected from the transition metal atoms of groups 3 to 11 of the periodic table and the typical metal atoms of groups 12 to 15 (excluding Si). , More preferably a transition metal atom of groups 3 to 11, still more preferably a transition metal atom of groups 3 to 7, and even more preferably a transition metal atom of groups 4 to 6.
  • the metal atom is one or more atoms selected from Ta, Nb, Zr, Mo, W, Cr, Hf, Al, Ti and V.
  • the metal atom is Ta, Nb, W, Mo, Cr or V.
  • the metal atom is Ta.
  • the atomic composition and the ratio of constituent atoms of the surface treatment layer can be determined by surface analysis and depth direction analysis.
  • X-ray photoelectron spectroscopy, time-of-flight secondary ion mass spectrometry, or the like can be used.
  • XPS surface analysis
  • PHI5000 VersaProbe II manufactured by ULVAC-PHI, Inc. can be used as an apparatus for performing X-ray photoelectron spectroscopy for measuring the atomic composition and the ratio of constituent atoms of the surface treatment layer.
  • the measurement conditions for XPS analysis are astrophysical X-ray source with monochromatic AlK ⁇ ray 25 W, photoelectron detection area 1400 ⁇ m ⁇ 300 ⁇ m, photoelectron detection angle 20 degrees, 45 degrees, 90 degrees, path energy 23.5 eV, and spatter ion. Ar ion can be used for.
  • Suitable orbitals of the metal atom include, for example, atomic number 5 (B) is a 1s orbital, atomic numbers 13 to 14, 21 to 31 (Al to Si, Sc to Ga) are 2p orbitals, and atomic numbers 32 to 33, 39.
  • ⁇ 52 Ga to As, Y to Te
  • atomic numbers 72 to 83 Hf to Bi
  • Depth direction analysis It is also possible to perform an analysis in the depth direction of the surface treatment layer.
  • monochromatic AlK ⁇ rays were used as the X-ray source at 25 W, the photoelectron detection area was 1400 ⁇ m ⁇ 300 ⁇ m, the photoelectron detection angle was 45 degrees, the path energy was 23.5 eV, and the sputter ions were Ar ions. Can be used.
  • the surface layer of the laminate is etched by 1 to 100 nm by sputtering with Ar ions, and the peak areas of C1s, O1s, F1s, Si2p orbitals, and appropriate orbitals of metal atoms are observed at the depth after each etching, and carbon and oxygen are observed.
  • Suitable orbitals of the metal atom include, for example, atomic number 5 (B) is a 1s orbital, atomic numbers 13 to 14, 21 to 31 (Al to Si, Sc to Ga) are 2p orbitals, and atomic numbers 32 to 33, 39.
  • ⁇ 52 Ga to As, Y to Te
  • atomic numbers 72 to 83 Hf to Bi
  • the metal atoms are carbon, oxygen, fluorine, silicon and metal atoms (in the surface-treated layer).
  • the metal atoms are carbon, oxygen, fluorine, silicon and metal atoms (in the surface-treated layer).
  • the total amount of tantalum preferably 0.03 to 3.0 at%, more preferably 0.1 to 1.0 at%, still more preferably 0.1 to 0.5 at%, more preferably 0. .1 to 0.3 at% is present.
  • the molar ratio of carbon atoms to metal atoms (C / M ratio) in the surface-treated layer is It can be preferably 10 to 1,000, more preferably 50 to 500. By setting the ratio of carbon atoms to metal atoms in such a range, the friction durability and chemical resistance of the surface treatment layer can be more reliably improved.
  • the surface treatment layer contained in the article of the present disclosure may contain a trace amount of impurities such as Pt, Rh, Ru, 1,3-divinyltetramethyldisiloxane, triphenylphosphine, NaCl, KCl, and a condensate of silane.
  • impurities such as Pt, Rh, Ru, 1,3-divinyltetramethyldisiloxane, triphenylphosphine, NaCl, KCl, and a condensate of silane.
  • the surface treatment layer contained in the article of the present disclosure has both high surface slipperiness and high friction durability.
  • the surface treatment layer has water repellency, oil repellency, and stain resistance (for example, adhesion of stains such as fingerprints), although it depends on the composition of the surface treatment agent used. It can have (prevent), waterproof (prevents water from entering electronic parts, etc.), surface slipperiness (or lubricity, for example, wiping off stains such as fingerprints, and excellent touch to fingers). It can be suitably used as a functional thin film.
  • the present disclosure further relates to an optical material having the surface treatment layer as the outermost layer.
  • optical material preferably include a wide variety of optical materials in addition to optical materials related to displays and the like as exemplified below: for example, cathode ray tubes (CRTs; for example, personal computer monitors), liquid crystal displays, plasma displays, organic EL. Display, inorganic thin film EL dot matrix display, rear projection type display, fluorescent display tube (VFD), field emission display (FED; Field Mission Display) and other displays or protective plates for those displays, or antireflection film on their surface. Processed.
  • CTRs cathode ray tubes
  • LCD liquid crystal displays
  • plasma displays organic EL.
  • Display inorganic thin film EL dot matrix display, rear projection type display, fluorescent display tube (VFD), field emission display (FED; Field Mission Display) and other displays or protective plates for those displays, or antireflection film on their surface.
  • VFD fluorescent display tube
  • FED Field Mission Display
  • the article of the present disclosure is not particularly limited, but may be an optical member.
  • optical components include: lenses such as spectacles; front protective plates for displays such as PDPs and LCDs, antireflection plates, polarizing plates, anti-glare plates; for devices such as mobile phones and mobile information terminals. Touch panel sheet; Blu-ray (registered trademark) disc, DVD disc, optical disc surface such as CD-R, MO; optical fiber; clock display surface, etc.
  • the article of the present disclosure may be a medical device or a medical material.
  • the thickness of the above layer is not particularly limited.
  • the thickness of the layer is preferably in the range of 1 to 50 nm, 1 to 30 nm, preferably 1 to 15 nm from the viewpoint of optical performance, surface slipperiness, friction durability and antifouling property. ..
  • This disclosure further An article containing a base material and a surface-treated layer formed on the base material, wherein the surface-treated layer is formed of a fluorine-containing silane compound, and transition metal atoms of Groups 3 to 11 of the periodic table. And a method for producing an article comprising one or more metal atoms selected from the main group metal atoms of groups 12-15.
  • a surface treatment agent containing the fluorine-containing silane compound and the metal compound containing the metal atom is used to deposit the fluorine-containing silane compound and the metal compound containing the metal atom on the substrate to form a surface treatment layer.
  • the surface treatment agents 1 to 6 prepared above were vacuum-deposited on gorilla glass 3 (manufactured by Corning Inc.) having been chemically strengthened and surface-polished to a thickness of 0.5 mm and 71.5 mm ⁇ 149.0 mm, respectively. .. Specifically, each of the surface treatment agents 1 to 6 (0.05 g) was filled in the resistance heating boat in the vacuum vapor deposition apparatus, and the inside of the vacuum vapor deposition apparatus was exhausted to a pressure of 3.0 ⁇ 10 -3 Pa or less. Next, a 5 nm silicon dioxide film was formed on the gorilla glass 3 and the temperature of the resistance heating boat was raised to form a film on the chemically strengthened glass.
  • the chemically strengthened glass with a vapor-deposited film was allowed to stand for 30 minutes in an atmosphere at a temperature of 150 ° C., and then allowed to cool to room temperature to form a surface treatment layer on the substrate.
  • Glass substrates with a surface treatment layer of 1 to 3, 5 and 6) and Comparative Example 1 (surface treatment agent 4) were obtained.
  • Alkaline immersion test An O-ring made of PTFE (polytetrafluoroethylene) having a diameter of 1 cm was placed on the surface of the glass substrate of Example 1 and Comparative Example 1 on which the surface treatment layer was formed, and an 8N NaOH solution was dropped into the O-ring. , The surface of the surface treatment layer was brought into contact with an alkaline aqueous solution and subjected to an alkaline immersion test. After 20 to 120 minutes of the alkaline immersion test, the NaOH solution was wiped off, washed with pure water and ethanol, and then the contact angle with water was measured.
  • PTFE polytetrafluoroethylene
  • the static contact angle of water is determined by dripping 2 ⁇ L of pure water droplets on the surface of the glass substrate after the above alkaline immersion test, and using a contact angle meter (manufactured by Kyowa Surface Chemical Co., Ltd .: automatic contact angle meter). The contact angle with water was measured using DropMaster701). The static contact angle of water after the alkaline immersion test was measured at five points. Table 1 below shows the relationship between the immersion time and the average value of the contact angles at the five locations.
  • a material obtained by covering the surface (diameter 1 cm) of the silicone rubber processed product shown below with cotton immersed in artificial sweat having the composition shown below was used as a friction element.
  • Composition of artificial sweat Anhydrous disodium hydrogen phosphate: 2 g Sodium chloride: 20g 85% lactic acid: 2g Histidine hydrochloride: 5g
  • Distilled water 1 kg
  • Silicone rubber processed product A silicone rubber stopper SR-51 made by Tigers Polymer, processed into a cylinder with a diameter of 1 cm and a thickness of 1 cm.
  • the surface composition of the surface-treated layer of the treated glass substrate was prepared using an X-ray photoelectron spectroscopy analyzer (XPS, PHI5000 VersaProbe II manufactured by ULVAC-PHI, Inc.).
  • XPS X-ray photoelectron spectroscopy analyzer
  • the measurement conditions for XPS analysis were as follows.
  • X-ray source Monochromatic AlK ⁇ ray (25W)
  • Photoelectron detection area 1400 ⁇ m ⁇ 300 ⁇ m
  • Photoelectron detection angle 45 degrees
  • Path energy 23.5 eV
  • Example 1 and Comparative Example 1 With respect to the glass substrates with the surface treatment layer obtained in Example 1 and Comparative Example 1, the peak areas of C1s, O1s, F1s, Si2p, and Ta4f orbitals were observed by the above XPS, and carbon, oxygen, fluorine, silicon, and tantalum were observed.
  • the composition of the treated surface including the surface-treated antifouling layer was determined by calculating the atomic ratio and the area ratio of. The results are shown in Table 3 below for Examples 1 and 2 using RAS.
  • the surface-treated layer of the example containing Ta gives better results in both the alkaline immersion test and the friction durability test as compared with the surface-treated layer of the comparative example containing no Ta. Was confirmed.
  • the article of the present disclosure can be suitably used for various purposes, for example, as an optical member such as a touch panel.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • Optics & Photonics (AREA)
  • Inorganic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Paints Or Removers (AREA)
  • Materials Applied To Surfaces To Minimize Adherence Of Mist Or Water (AREA)
  • Polyethers (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Laminated Bodies (AREA)
  • Chemical Vapour Deposition (AREA)
PCT/JP2020/024623 2019-07-17 2020-06-23 表面処理剤 Ceased WO2021010105A1 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
EP20840859.1A EP4001364A4 (en) 2019-07-17 2020-06-23 Surface treatment agent
CN202080051310.XA CN114127206A (zh) 2019-07-17 2020-06-23 表面处理剂
KR1020227001466A KR102801885B1 (ko) 2019-07-17 2020-06-23 표면 처리제
US17/575,804 US20220135839A1 (en) 2019-07-17 2022-01-14 Surface treatment agent

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2019-132027 2019-07-17
JP2019132027 2019-07-17

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US17/575,804 Continuation US20220135839A1 (en) 2019-07-17 2022-01-14 Surface treatment agent

Publications (1)

Publication Number Publication Date
WO2021010105A1 true WO2021010105A1 (ja) 2021-01-21

Family

ID=74210492

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2020/024623 Ceased WO2021010105A1 (ja) 2019-07-17 2020-06-23 表面処理剤

Country Status (6)

Country Link
US (1) US20220135839A1 (https=)
EP (1) EP4001364A4 (https=)
JP (2) JP6927373B2 (https=)
KR (1) KR102801885B1 (https=)
CN (1) CN114127206A (https=)
WO (1) WO2021010105A1 (https=)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2023074874A1 (ja) 2021-10-29 2023-05-04 Agc株式会社 化合物、組成物、表面処理剤、コーティング液、物品及び物品の製造方法
WO2025070362A1 (ja) * 2023-09-27 2025-04-03 Agc株式会社 化合物、組成物、表面処理剤、物品及び物品の製造方法

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4001364A4 (en) * 2019-07-17 2024-02-14 Daikin Industries, Ltd. Surface treatment agent
CN117813362A (zh) * 2021-08-26 2024-04-02 大金工业株式会社 表面处理剂
JPWO2023136144A1 (https=) 2022-01-11 2023-07-20

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001139886A (ja) * 1999-11-17 2001-05-22 Matsushita Electric Ind Co Ltd 防汚性反射体とこれを有する調理機器
JP2001158643A (ja) * 1999-11-29 2001-06-12 Jsr Corp ガラス用コーティング組成物およびコーティングガラス
JP2007196162A (ja) * 2006-01-27 2007-08-09 Nippon Soda Co Ltd フッ素系薄膜基材の製造方法
JP2014218639A (ja) 2012-11-05 2014-11-20 ダイキン工業株式会社 パーフルオロ(ポリ)エーテル基含有シラン化合物
JP2017082194A (ja) 2015-07-31 2017-05-18 ダイキン工業株式会社 パーフルオロ(ポリ)エーテル基含有シラン化合物
WO2019088116A1 (ja) * 2017-10-31 2019-05-09 ダイキン工業株式会社 表面処理組成物

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002077116A1 (en) * 2001-03-21 2002-10-03 Daikin Industries, Ltd. Surface-treating agent comprising inorganic/organic composite material
US7803894B2 (en) * 2003-12-05 2010-09-28 3M Innovatie Properties Company Coating compositions with perfluoropolyetherisocyanate derived silane and alkoxysilanes
FR2886309B1 (fr) * 2005-05-31 2007-08-17 Airbus France Sas Sol pour le revetement par voie sol-gel d'une surface et procede de revetement par voie sol-gel le mettant en oeuvre
JP5176265B2 (ja) * 2005-07-04 2013-04-03 東レ株式会社 コーティング材料およびそれを用いた光学物品
JP2016020407A (ja) * 2014-07-11 2016-02-04 信越化学工業株式会社 含フッ素有機ケイ素化合物の硬化方法、硬化皮膜の製造方法、含フッ素有機ケイ素化合物を含む組成物、及び該組成物の硬化物で表面処理された物品
JP6248858B2 (ja) * 2014-08-07 2017-12-20 信越化学工業株式会社 フッ素系表面処理剤及び該表面処理剤で表面処理された物品
CN107001619B (zh) * 2014-11-28 2019-07-19 大金工业株式会社 含氟氧亚甲基的全氟聚醚改性体
WO2016190047A1 (ja) * 2015-05-22 2016-12-01 ダイキン工業株式会社 表面処理層を有する物品の製造方法
JP6107891B2 (ja) * 2015-06-25 2017-04-05 ダイキン工業株式会社 パーフルオロ(ポリ)エーテル基含有シラン化合物を含む表面処理剤
WO2018056410A1 (ja) * 2016-09-23 2018-03-29 ダイキン工業株式会社 撥水性を有する基材
EP4001364A4 (en) * 2019-07-17 2024-02-14 Daikin Industries, Ltd. Surface treatment agent

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001139886A (ja) * 1999-11-17 2001-05-22 Matsushita Electric Ind Co Ltd 防汚性反射体とこれを有する調理機器
JP2001158643A (ja) * 1999-11-29 2001-06-12 Jsr Corp ガラス用コーティング組成物およびコーティングガラス
JP2007196162A (ja) * 2006-01-27 2007-08-09 Nippon Soda Co Ltd フッ素系薄膜基材の製造方法
JP2014218639A (ja) 2012-11-05 2014-11-20 ダイキン工業株式会社 パーフルオロ(ポリ)エーテル基含有シラン化合物
JP2017082194A (ja) 2015-07-31 2017-05-18 ダイキン工業株式会社 パーフルオロ(ポリ)エーテル基含有シラン化合物
WO2019088116A1 (ja) * 2017-10-31 2019-05-09 ダイキン工業株式会社 表面処理組成物

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of EP4001364A4

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2023074874A1 (ja) 2021-10-29 2023-05-04 Agc株式会社 化合物、組成物、表面処理剤、コーティング液、物品及び物品の製造方法
KR20240090997A (ko) 2021-10-29 2024-06-21 에이지씨 가부시키가이샤 화합물, 조성물, 표면 처리제, 코팅액, 물품 및 물품의 제조 방법
WO2025070362A1 (ja) * 2023-09-27 2025-04-03 Agc株式会社 化合物、組成物、表面処理剤、物品及び物品の製造方法

Also Published As

Publication number Publication date
JP2021152164A (ja) 2021-09-30
US20220135839A1 (en) 2022-05-05
JP6927373B2 (ja) 2021-08-25
EP4001364A1 (en) 2022-05-25
KR102801885B1 (ko) 2025-05-02
EP4001364A4 (en) 2024-02-14
CN114127206A (zh) 2022-03-01
JP2021017581A (ja) 2021-02-15
KR20220024599A (ko) 2022-03-03
JP7614506B2 (ja) 2025-01-16

Similar Documents

Publication Publication Date Title
JP6927373B2 (ja) 表面処理剤
JP6943315B2 (ja) 防汚基材
JP6828841B2 (ja) 表面処理剤
WO2021049240A1 (ja) 表面処理剤
WO2023074410A1 (ja) 表面処理剤
WO2023074416A1 (ja) 表面処理剤
JP7116352B1 (ja) 表面処理剤
WO2021005981A1 (ja) 表面処理剤
TWI872287B (zh) 表面處理劑
KR20230108323A (ko) 표면 처리제
JP7252500B2 (ja) 表面処理剤
JP7277838B2 (ja) 表面処理用液状組成物
WO2023032817A1 (ja) 表面処理剤

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 20840859

Country of ref document: EP

Kind code of ref document: A1

ENP Entry into the national phase

Ref document number: 20227001466

Country of ref document: KR

Kind code of ref document: A

NENP Non-entry into the national phase

Ref country code: DE

ENP Entry into the national phase

Ref document number: 2020840859

Country of ref document: EP

Effective date: 20220217

WWW Wipo information: withdrawn in national office

Ref document number: 2020840859

Country of ref document: EP