WO2020195486A1 - 粒子の製造方法及び粒子製造装置 - Google Patents

粒子の製造方法及び粒子製造装置 Download PDF

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Publication number
WO2020195486A1
WO2020195486A1 PCT/JP2020/007752 JP2020007752W WO2020195486A1 WO 2020195486 A1 WO2020195486 A1 WO 2020195486A1 JP 2020007752 W JP2020007752 W JP 2020007752W WO 2020195486 A1 WO2020195486 A1 WO 2020195486A1
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raw material
particle
reaction raw
particles
material liquid
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English (en)
French (fr)
Japanese (ja)
Inventor
佐倉　直喜
洋和 佐々木
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Shoei Chemical Inc
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Shoei Chemical Inc
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Priority to US17/593,898 priority Critical patent/US12297521B2/en
Priority to CN202080022141.7A priority patent/CN113613814B/zh
Priority to KR1020217032953A priority patent/KR102842479B1/ko
Publication of WO2020195486A1 publication Critical patent/WO2020195486A1/ja
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F9/00—Making metallic powder or suspensions thereof
    • B22F9/16—Making metallic powder or suspensions thereof using chemical processes
    • B22F9/18—Making metallic powder or suspensions thereof using chemical processes with reduction of metal compounds
    • B22F9/24—Making metallic powder or suspensions thereof using chemical processes with reduction of metal compounds starting from liquid metal compounds, e.g. solutions
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/0006—Controlling or regulating processes
    • B01J19/0013—Controlling the temperature of the process
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2/00—Processes or devices for granulating materials, e.g. fertilisers in general; Rendering particulate materials free flowing in general, e.g. making them hydrophobic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2/00—Processes or devices for granulating materials, e.g. fertilisers in general; Rendering particulate materials free flowing in general, e.g. making them hydrophobic
    • B01J2/02—Processes or devices for granulating materials, e.g. fertilisers in general; Rendering particulate materials free flowing in general, e.g. making them hydrophobic by dividing the liquid material into drops, e.g. by spraying, and solidifying the drops
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
    • B22F1/05—Metallic powder characterised by the size or surface area of the particles
    • B22F1/054—Nanosized particles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F9/00—Making metallic powder or suspensions thereof
    • B22F9/16—Making metallic powder or suspensions thereof using chemical processes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F9/00—Making metallic powder or suspensions thereof
    • B22F9/16—Making metallic powder or suspensions thereof using chemical processes
    • B22F9/18—Making metallic powder or suspensions thereof using chemical processes with reduction of metal compounds
    • B22F9/28—Making metallic powder or suspensions thereof using chemical processes with reduction of metal compounds starting from gaseous metal compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F9/00—Making metallic powder or suspensions thereof
    • B22F9/16—Making metallic powder or suspensions thereof using chemical processes
    • B22F9/30—Making metallic powder or suspensions thereof using chemical processes with decomposition of metal compounds, e.g. by pyrolysis
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00049—Controlling or regulating processes
    • B01J2219/00051—Controlling the temperature
    • B01J2219/00139—Controlling the temperature using electromagnetic heating
    • B01J2219/00141—Microwaves
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00049—Controlling or regulating processes
    • B01J2219/00051—Controlling the temperature
    • B01J2219/00139—Controlling the temperature using electromagnetic heating
    • B01J2219/00146—Infrared radiation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00049—Controlling or regulating processes
    • B01J2219/00162—Controlling or regulating processes controlling the pressure
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00049—Controlling or regulating processes
    • B01J2219/00186—Controlling or regulating processes controlling the composition of the reactive mixture
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00781—Aspects relating to microreactors
    • B01J2219/00891—Feeding or evacuation
    • B01J2219/00903—Segmented flow
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F2203/00—Controlling
    • B22F2203/11—Controlling temperature, temperature profile
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F2203/00—Controlling
    • B22F2203/13—Controlling pressure
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F2302/00—Metal Compound, non-Metallic compound or non-metal composition of the powder or its coating
    • B22F2302/45—Others, including non-metals
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F2304/00—Physical aspects of the powder
    • B22F2304/05—Submicron size particles
    • B22F2304/054—Particle size between 1 and 100 nm

Definitions

  • the present invention relates to a particle manufacturing method and a particle manufacturing apparatus.
  • the particles may be desirable for the particles to have a narrow particle size distribution in order to obtain the desired performance.
  • a method for producing particles a method has been known in which a reaction vessel such as a flask or a tank is used, and the liquid is heated by using a heating device while stirring the liquid in the container. It does not require large-scale equipment, and it is excellent in that it can produce desired particles even with small-scale equipment such as those in laboratories.
  • the equipment is enlarged for mass production, it becomes more difficult to heat the liquid more uniformly than when the scale is small, and a temperature gradient is likely to occur, and as a result, the particle size distribution is likely to be widened.
  • the smaller the desired particle size the wider the particle size distribution tends to be.
  • quality differences are likely to occur from batch to batch, and in order to reduce this difference, it is necessary to strictly control the quality of raw materials and manufacturing conditions such as heating conditions, and stable and homogeneous production is performed. It's difficult.
  • a method for solving the above problems a method is known in which particles are produced by introducing a segmentation gas into a raw material liquid, forming a segment flow, and heating the particles (Patent Documents 1 to 3).
  • the segment flow flows in the pipe so that the gas pushes out the liquid, so that there is a problem that the flow velocity difference between the liquid flowing near the pipe wall and the liquid flowing in the center portion occurs in the above method. Since it does not occur and there is little difference in the time that the solution stays in the tube, the heating time can be made uniform. Also, since the solution is agitated within each segment, the solution is heated more uniformly. In this way, particles having a narrow particle size distribution can be produced. Furthermore, even if the diameter of the tube is increased to some extent, the liquid can be heated uniformly as described above, so that the production amount can be increased as compared with the conventional method.
  • Patent Documents 2 and 3 suggest that the boiling point of the reaction solvent can be raised by pressurizing with a limiting flow valve to increase the pressure in the flow path, thereby heating to a higher temperature. However, details are not given.
  • an object of the present invention is to provide a method for producing particles having a particle size distribution equal to or even narrower than the conventional one with higher production efficiency, and a production apparatus thereof, while maintaining safety and increasing the cost. To do.
  • the present inventors have found that the above-mentioned problems can be solved by simultaneously satisfying the following two conditions in the method for producing particles using the above-mentioned segment flow. That is, heating is performed so that the pressure is 2.0 times or more the vapor pressure of the solvent at the heating temperature, and the ratio of the reaction raw material liquid and the segmentation gas in the segmentation reaction liquid flow is within a predetermined range. As a result, they have found that particles having a particle size distribution equal to or even narrower than the conventional one can be produced with higher production efficiency without maintaining safety and increasing the cost, and have completed the present invention.
  • the present invention (1) comprises a reaction raw material liquid delivery step of delivering a reaction raw material liquid containing at least a particle-forming raw material and a solvent for dissolving the particle-forming raw material.
  • a segment flow forming step of introducing a segmentation gas into the reaction raw material liquid to form a segmentation reaction raw material liquid flow in which the reaction raw material liquid is divided into segments by the segmentation gas.
  • the ratio (V d / V c ) of the volume V d (mL) of the chemical conversion gas is 0.200 to 7.00.
  • the pressure P 1 in the particle generation step is 2.0 times or more of the vapor pressure P 2 of the solvent in the heating temperature T (MPa)
  • the present invention provides a method for producing particles, which is characterized by the above.
  • the ratio (V b / V a ) of the volume V b (mL) of the segmenting gas to the volume V a (mL) of the reaction raw material liquid is.
  • the present invention provides the method for producing particles according to (1), which comprises introducing the segmenting gas into the reaction raw material solution in an amount of 0.100 to 3.00.
  • the present invention (3) was heated at the heating temperature T (° C.) with respect to the volume V c (mL) of the reaction raw material liquid heated at the heating temperature T (° C.) in the particle generation step.
  • the method for producing (1) or (2), wherein the ratio (V d / V c ) of the volume V d (mL) of the segmenting gas is 0.200 to 3.50. Is.
  • the present invention (4) is characterized in that the pressure P 1 in the particle generation step is 3.0 times or more the vapor pressure P 2 (MPa) of the solvent at the heating temperature T (1). )-(3) Provided is a method for producing any of the particles.
  • the ratio (V b / V a ) of the volume V b (mL) of the segmenting gas to the volume V a (mL) of the reaction raw material liquid in the segment flow forming step is. It provides a method for producing any of the particles (1) to (4), which is characterized by being 0.200 to 1.50.
  • the present invention (6) is characterized in that, in the particle generation step, the diameter of the cross section of the flow path of the segmented reaction raw material liquid flow is 0.10 to 10.0 mm (1) to (5). ) Provided is a method for producing any of the particles.
  • the present invention (7) is characterized in that the volumetric flow rate of the reaction raw material liquid in the reaction raw material liquid delivery step is 10 ⁇ L / min to 1.0 L / min, any of (1) to (6). It provides a method for producing particles of the above.
  • the present invention (8) provides a method for producing any of the particles (1) to (7), wherein the target product particles have a particle size of 1 to 100 nm.
  • the reaction raw material liquid contains core particles or intermediate particles in the production of particles having a core / shell structure, and the target product particles are particles having a core / shell structure. It provides a method for producing particles according to any one of (1) to (8).
  • the present invention (10) provides a method for producing any of the particles (1) to (9), wherein the target product particles are semiconductor fine particles.
  • the present invention (11) provides the method for producing particles of (10), wherein the semiconductor fine particles contain In and P.
  • the present invention (12) provides a method for producing any of the particles (1) to (9), wherein the target product particle is a metal particle.
  • the metal particles include one or more metals selected from the group consisting of nickel, copper, silver, palladium, platinum, and alloys composed of two or more of these metals. (12) The method for producing particles according to the above.
  • the present invention (14) provides a method for producing particles of (13), wherein the metal particles contain nickel.
  • the present invention includes a cooling step for cooling the product particle stream and A gas-liquid separation step for separating the segmentation gas from the product particle stream, A recovery step of recovering the target product particle dispersion liquid containing the target product particles obtained by performing the gas-liquid separation step, and a recovery step.
  • the present invention provides a method for producing any of the particles (1) to (14), which further comprises.
  • a first flow path to which a reaction raw material liquid containing a particle-forming raw material and a solvent for dissolving the particle-forming raw material is sent is provided.
  • the second flow path that forms the particle flow A heating unit provided on the outer peripheral side of the second flow path and for heating the segmented reaction raw material liquid flow in the second flow path, It has a pressure control unit for adjusting the pressure of the segmented reaction raw material liquid flow in the second flow path.
  • the pressure of the segmented reaction raw material liquid flow flowing through the second flow path is P 1 (MPa)
  • the heating temperature of the segmented reaction raw material liquid flow is T (° C.)
  • the segmented reaction raw material liquid flow is in the segmented reaction raw material liquid flow.
  • the ratio (V d / V c ) of the volume V d (mL) of the segmenting gas to the volume V c (mL) of the reaction raw material solution is 0.200 to 7.00, and the pressure P 1 is the said.
  • the segmented reaction raw material liquid flow is formed by the segment flow forming unit, the heating unit, and the pressure control unit so as to be 2.0 times or more the vapor pressure P 2 (MPa) of the solvent at the heating temperature T.
  • the volume ratio of the reaction raw material liquid and the segmented gas, the heating temperature T of the pressure P 1 and the segmented reaction feed liquid flow of the segmented reaction feed liquid flow is regulated,
  • the present invention provides a particle manufacturing apparatus characterized by the above.
  • the present invention (17) provides the particle manufacturing apparatus according to (16), wherein the ratio of (V b / V a ) is 0.100 to 3.00.
  • the ratio (V d / V c ) of the volume V d (mL) of the segmenting gas to the volume V c (mL) of the reaction raw material liquid is 0.200 to 3. It provides the particle production apparatus of (16) or (17), which is characterized by being 50.
  • the present invention (19) is characterized in that the pressure P 1 is 3.0 times or more the vapor pressure P 2 (MPa) of the solvent at the heating temperature T (16) to (18). Any of the particle manufacturing apparatus is provided.
  • the ratio (V b / V a ) of the volume V b (mL) of the segmenting gas to the volume V a (mL) of the reaction raw material liquid is 0.200 to 1.50. (16) to (19), wherein the particle manufacturing apparatus is provided.
  • the second flow path is a tube having a circular cross section, the diameter of the cross section of the second flow path is 0.10 to 10.0 mm, and the heating portion.
  • the present invention (22) provides the particle manufacturing apparatus according to any one of (16) to (21), wherein the pressure control unit has a pressure valve.
  • the present invention (23) includes a third flow path provided on the downstream side of the second flow path and through which the product particle flow flows.
  • a cooling unit provided on the outer peripheral side of the third flow path and cooling the product particle flow flowing in the third flow path,
  • a gas-liquid separation unit provided on the downstream side of the third flow path and separating the segmentation gas from the product particle stream by gas-liquid separation.
  • a recovery unit that collects the target product dispersion liquid containing the target product particles, and a recovery unit. (16) to (22), wherein the particle manufacturing apparatus is further provided.
  • the present invention (24) provides the particle manufacturing apparatus according to any one of (16) to (23), wherein the particle manufacturing apparatus is for producing particles having a diameter of 1 to 100 nm.
  • the present invention (25) provides the particle manufacturing apparatus according to any one of (16) to (24), wherein the particle manufacturing apparatus is for producing semiconductor fine particles.
  • the present invention provides the particle manufacturing apparatus (25), which is characterized in that the particle manufacturing apparatus is for producing semiconductor fine particles containing In and P.
  • the present invention (27) provides the particle manufacturing apparatus according to any one of (16) to (24), wherein the particle manufacturing apparatus is for producing metal particles.
  • the particle manufacturing apparatus includes one or more metals selected from the group consisting of nickel, copper, silver, palladium, platinum, and alloys composed of two or more of these metals.
  • the present invention provides the particle manufacturing apparatus (27), which is characterized by being used for manufacturing metal particles.
  • the present invention provides the particle manufacturing apparatus of (28), wherein the particle manufacturing apparatus is for nickel particle production.
  • the present invention it is possible to provide a method for producing particles having a particle size distribution equal to or even narrower than the conventional one with higher production efficiency, and an apparatus for producing the same, without maintaining safety and increasing the cost.
  • FIG. 1 is a schematic flow chart of a form example of the particle manufacturing apparatus of the present invention.
  • the particle manufacturing apparatus 10 is connected to a segment flow forming unit 11, a pressure control unit having a pressure valve 16, a gas-liquid separation unit 14, and a segment flow forming unit 11, and forms a reaction raw material liquid 1 in a segment flow.
  • a heating unit 12 for heating and a cooling unit 13 provided on the outer peripheral side of the third flow path pipe 33 for cooling the third flow path pipe 33, and has a first flow path pipe.
  • a liquid feed pump 19 for the reaction raw material liquid 1 is attached to the 31, and a mass flow controller 21 and a pressure gauge 22 are attached to the segmentation gas introduction pipe 37.
  • a reaction raw material solution 1 containing at least a particle-forming raw material and a solvent for dissolving the particle-forming raw material is prepared.
  • the reaction raw material liquid 1 is sent to the segment flow forming unit 11 in the first flow path pipe 31 by using the liquid feed pump 19, and the pressure and the flow rate are sent by the mass flow controller 21 in the segmenting gas introduction pipe 37.
  • the segmenting gas 2 is supplied to the segment flow forming unit 11, and the segmenting reaction raw material liquid flow 3 is introduced into the reaction raw material liquid 1 by the segment flow forming unit 11. To form.
  • the segmentation reaction raw material liquid flow 3 is sent out from the segment flow forming unit 11 and passed through the heated portion of the second flow path pipe 32 heated by the heating unit 12. .. Then, when the segmentation reaction raw material liquid flow 3 passes through the heated portion of the second flow path tube 32, the particle-forming raw material reacts to generate target product particles, which contain the target product particles. The product particle stream 4 is formed.
  • the product particle flow 4 is sent out by the third flow path pipe 33, passed through the cooling portion of the third flow path pipe 33 cooled by the cooling unit 13, and the product particle flow 4 is passed. After cooling, the product particle stream 4 is supplied to the gas-liquid separation unit 14.
  • the gas-liquid separation unit 14 separates the segmentation gas 2 in the product particle stream 4, discharges the segmentation gas 2 from the segmentation gas discharge pipe 34, and discharges the target product particle dispersion liquid 7.
  • the target product is collected from the particle dispersion collection tube 38.
  • a gas generated by vaporizing the solvent by heating or a gas generated as a by-product by the reaction may be mixed with the segmentation gas 2, and these gases are also segmented together with the segmentation gas 2. It is discharged from the gas discharge pipe 34.
  • the delivery flow rate of the reaction raw material liquid 1 in the liquid feed pump 19 is controlled by the mass flow controller 21 and the pressure feed of the segmentation gas 2.
  • the following conditions are met by adjusting the introduction amount, the heating temperature of the segmented reaction raw material liquid flow 3 in the heating unit 12, and the pressure of the segmented reaction raw material liquid flow 3 in the pressure control unit having the pressure valve 16. Satisfaction is important in implementing this manufacturing method. That is, in the segmentation reaction raw material liquid flow 3, the segmentation gas 2 heated at the heating temperature T (° C.) with respect to the volume V c (mL) of the reaction raw material liquid 1 heated at the heating temperature T (° C.).
  • the volume V d (mL) ratio (V d / V c ) is adjusted to be in the range of 0.200 to 7.00, and the pressure of the segmented reaction raw material liquid flow 3 is adjusted by P 1 (MPa). , by adjusting the heating temperature T of the segmented reaction feed stream 3 (° C.) so that the above 2.0 times the vapor pressure P 2 of solvent (MPa), without and increase in cost maintaining safety, It is possible to produce particles having a particle size distribution equal to or even narrower than the conventional one with higher production efficiency.
  • the method for producing particles of the present invention includes, at least, a reaction raw material liquid delivery step of delivering a reaction raw material liquid containing a particle-forming raw material and a solvent for dissolving the particle-forming raw material.
  • a segment flow forming step of introducing a segmentation gas into the reaction raw material liquid to form a segmentation reaction raw material liquid flow in which the reaction raw material liquid is divided into segments by the segmentation gas.
  • the ratio (V d / V c ) of the volume V d (mL) of the chemical conversion gas is 0.200 to 7.00.
  • the pressure P 1 in the particle generation step is 2.0 times or more of the vapor pressure P 2 of the solvent in the heating temperature T (MPa), It is a method for producing particles characterized by.
  • the target product particles obtained by the method for producing particles of the present invention are not particularly limited, and examples thereof include semiconductor fine particles, metal particles, metal oxide particles, and organic polymer particles.
  • the particle size of the target product particles obtained by the method for producing particles of the present invention is not particularly limited, but is preferably 1.00 to 100 nm.
  • the method for producing particles of the present invention preferably exerts a particularly excellent effect on producing particles having a diameter of 1.00 to 100 nm.
  • the reaction raw material liquid delivery step according to the method for producing particles of the present invention is a step of delivering a reaction raw material liquid containing at least a particle-forming raw material and a solvent for dissolving the particle-forming raw material. Since the raw material for particle formation, the solvent, and the reaction raw material liquid differ depending on the type of the target product particle which is the target product for production, the target product particles are illustrated below, and the particle forming raw material, the solvent, and the reaction raw material liquid are exemplified below. However, the present invention is not limited to the following.
  • the semiconductor microparticle includes a particle having a single structure and a particle having a core / shell structure composed of a core particle and a shell having one or more layers.
  • the elements constituting the shell may be diffused in the core.
  • the shell has two or more layers, the elements constituting one shell may be diffused to the other shell.
  • Semiconductor microparticles composed of single-structured particles include InP-based particles, GaAs-based particles, InAs-based particles, InGaP-based particles, InZnP-based particles, ZnSe-based particles, GaP-based particles, and CdSe-based particles. Particles, CdS-based particles, and the like.
  • the semiconductor fine particles composed of core / shell structure particles include InP / ZnSe-ZnS-based particles having an InP / ZnSe-ZnS structure and an InP / GaP-ZnS-based particle having a core containing InP and a shell containing ZnSe and ZnS.
  • Core / shell structure particles, InP / ZnSeS-ZnS type core / shell structure particles, InP / ZnS type core / shell structure particles, InP / ZnSe type core / shell structure particles, InGaP / ZnSe-ZnS Examples include particles having a core / shell structure of the system, particles having a core / shell structure of the CdSe / CdS system, and the like.
  • the shell may be, for example, a II-VI group compound or a III-V group compound.
  • the raw material for particle formation reacts by being heated in the particle-forming step, and is a constituent substance of the semiconductor fine particles composed of single-structured particles. Is a precursor that produces.
  • the target product particles are core particles of semiconductor fine particles composed of particles having a core / shell structure
  • the raw material for particle formation reacts by being heated in the particle generation step, and the core particles of the semiconductor fine particles react. It is a precursor that becomes a constituent substance.
  • the target product particles are semiconductor fine particles composed of particles having a core / shell structure and a shell is formed in the particle generation step
  • the raw material for particle formation reacts by being heated in the particle formation step to react with the semiconductor fine particles. It is a precursor that is a constituent of the shell of particles.
  • the reaction raw material mixed solution contains the mother particles to be formed into the shell in addition to the particle forming raw material and the solvent.
  • the mother particles are the core particles
  • the reaction raw material liquid contains the core particles in addition to the particle forming raw material and the solvent.
  • the particle size of the core particles is not particularly limited, but is preferably 1 to 100 nm.
  • the mother particles are separated from the core particles and the first layer shell.
  • the reaction raw material liquid contains the core particles and the particles composed of the first layer shell in addition to the particle forming raw material and the solvent.
  • the mother particle is an intermediate particle in the production of particles having a core / shell structure. That is, the reaction raw material liquid can contain core particles or intermediate particles in the production of particles having a core / shell structure.
  • a precursor of semiconductor fine particles composed of particles having a single structure a precursor of core particles of semiconductor fine particles composed of particles having a core / shell structure, and a precursor of a shell of semiconductor fine particles composed of particles having a core / shell structure.
  • a precursor of semiconductor fine particles composed of particles having a single structure a precursor of core particles of semiconductor fine particles composed of particles having a core / shell structure, and a precursor of a shell of semiconductor fine particles composed of particles having a core / shell structure.
  • Can use known precursors for example, the raw materials described in Japanese Patent Application No. 2017-253303.
  • the solvent is not particularly limited, and examples thereof include 1-octadecane, hexadecane, squalene, oleylamine, trioctylphosphine, and trioctylphosphine oxide.
  • reaction raw material liquid may contain a dispersant in addition to the particle forming raw material and the solvent.
  • the dispersant is not particularly limited, and for example, the known dispersant described in Japanese Patent Application No. 2017-253303 can be used.
  • the target product particles are metal particles
  • examples of the metal include nickel, copper, silver, palladium, platinum, and alloys composed of two or more of these metals.
  • the raw material for particle formation is a precursor that reacts by being heated in the particle generation step to form metal particles.
  • the precursor which is a raw material for particle formation is not particularly limited, and examples thereof include acetates, chlorides, fluorides, hydroxides, and nitrates of the metals.
  • the solvent is not particularly limited, and examples thereof include alcohols such as ethylene glycol and triethylene glycol, and water.
  • reaction raw material liquid can contain a dispersant or the like in addition to the particle forming raw material and the solvent.
  • the metal oxides include, for example, samarium oxide, cerium oxide, tungsten oxide, tin oxide, nickel oxide, titanium oxide, niobium oxide, molybdenum oxide, tantalum oxide, and iridium oxide.
  • examples include vanadium oxide, tin oxide, aluminum oxide, cesium tungstate, cerium orthovanadate, terbium orthovanadate, antimony-tin oxide, and aluminum-zinc oxide.
  • the raw material for particle formation is a precursor that reacts by being heated in the particle generation step to form metal oxide particles.
  • the precursor which is a raw material for particle formation is not particularly limited, and for example, acetates, halides, nitrates, carbonates, other organic acid salts, and / Alternatively, any salt or the like that is soluble in the solvent can be mentioned.
  • the solvent is not particularly limited, and examples thereof include 1-octadecane, hexadecane, squalene, oleylamine, trioctylphosphine, and trioctylphosphine oxide.
  • reaction raw material liquid can contain a dispersant or the like in addition to the particle forming raw material and the solvent.
  • the organic polymers include, for example, styrene and its derivatives, vinyl halides, vinyl esters, unsaturated nitriles, (meth) acrylic acid esters, and conjugated dienes. , Vinyl ketones, etc. are polymerized.
  • the raw material for particle formation is a precursor that reacts and polymerizes by being heated in the particle generation step to form an organic polymer.
  • the precursor for example, the polymerizable monomer described in JP-A-2006-265477 can be used.
  • the solvent is not particularly limited, and examples thereof include alcohols such as ethylene glycol and triethylene glycol, and water.
  • the polymerization initiator is not particularly limited, and for example, the polymerization initiator described in JP-A-2006-265477 can be used.
  • the reaction raw material solution includes surfactants such as amphoteric ionic surfactants, anionic surfactants, cationic surfactants, and nonionic surfactants.
  • surfactants such as amphoteric ionic surfactants, anionic surfactants, cationic surfactants, and nonionic surfactants.
  • Additives such as dispersion stabilizers such as inorganic dispersion stabilizers and polymer dispersion stabilizers can be contained.
  • the reaction raw material liquid may form an emulsion.
  • the above-mentioned raw materials for forming particles, a solvent, and the like are examples, and in addition to the above, they are applied to the method for producing particles of the present invention according to the type of target product particles. What is possible is used as appropriate.
  • trioctylphosphine since the vapor pressure of trioctylphosphine at 300 ° C. is 0.25 MPa, it is difficult to obtain desired particles when heated to 300 ° C. under atmospheric pressure. However, by using the production method of the present invention, trioctylphosphine can be preferably used even at 300 ° C.
  • the vapor pressure of 1-octadecene at 300 ° C. is 0.07 MPa, and it is possible to heat up to 300 ° C. even under atmospheric pressure.
  • 1-octadecene is preferably used. Can be used.
  • the reaction raw material liquid in the reaction raw material liquid delivery step according to the method for producing particles of the present invention contains at least a particle-forming raw material and a solvent for dissolving the particle-forming raw material, but in addition to these, various as required. Additives can be included.
  • the reaction raw material liquid delivery step the reaction raw material liquid obtained by mixing the particle forming raw material and the solvent is sent to the segment flow forming unit for performing the segment flow forming step.
  • the method of delivering the reaction raw material liquid is not particularly limited.
  • the reaction raw material liquid is placed in a storage container, and the storage container and the segment flow forming portion are connected by a liquid feed pipe.
  • a method of sending the reaction raw material liquid from the storage container to the segment flow forming part by providing a liquid feeding pump in the middle of the liquid feeding pipe, and putting the reaction raw material liquid in the storage container to form the storage container and the segment flow.
  • Examples thereof include a method of connecting the parts with a liquid feed pipe, applying pressure to the storage container, and feeding the reaction raw material liquid while controlling the liquid feed amount with a mass flow controller.
  • the liquid feed pump include a peristaltic pump, a syringe pump, a diaphragm pump, a gear pump and the like.
  • the volumetric flow rate of the reaction raw material liquid when the reaction raw material liquid is delivered is not particularly limited, but is preferably 10 ⁇ L / min to 1.0 L / min.
  • a segmenting reaction raw material liquid flow in which a segmenting gas is introduced into the reaction raw material liquid and the reaction raw material liquid is divided into segments by the segmenting gas. It is a process of forming.
  • the segmented reaction raw material flow is a state in which the reaction raw material is divided into small segments in the flow direction of the reaction raw material by the segmenting gas in the pipe to which the segmented reaction raw material flow is sent. It is a flow. That is, the segmented reaction raw material liquid flow is composed of a segment of the reaction raw material liquid and a segmentation gas that divides the segment of the reaction raw material liquid and the segment, and the segment of the reaction raw material liquid and the segmentation gas alternate. It is a repeated flow of the reaction raw material liquid.
  • FIG. 2 shows a schematic diagram of the segmentation reaction raw material liquid flow.
  • the first flow path pipe 31 sends the reaction raw material liquid 1 toward the segment flow forming unit 11, while the segmenting gas introduction pipe 37 directs the segmenting gas 2 toward the segment flow forming unit 11.
  • the segmenting gas 2 is introduced into the reaction raw material liquid 1 at the segment forming unit 11.
  • the segment forming unit 11 introduces the segmentation gas 2 into the reaction raw material liquid 1, so that the segmentation gas 2 divides the reaction raw material liquid 1 into small units of segments 8.
  • the chemical reaction raw material liquid flow 3 in other words, the segmentation reaction raw material liquid flow 3 in which the segment 8 of the reaction raw material liquid and the segmentation gas 2 are alternately repeated is formed.
  • the temperature difference in the reaction raw material liquid when the particle forming raw material is reacted. Is small, and the difference in particle formation rate is small.
  • the method for forming the segmentation reaction raw material liquid flow is not particularly limited.
  • the reaction raw material liquid and the segmentation gas are merged using a T-shaped tube to form the segmentation reaction raw material.
  • Examples thereof include a method of forming a liquid flow and a method of forming a segmented reaction raw material liquid flow by merging the reaction raw material liquid and the segmenting gas using a Y-shaped tube.
  • the method of delivering the segmenting gas is not particularly limited.
  • the segmenting gas is controlled by the mass flow controller from the segmenting gas storage container while controlling the flow rate of the segmenting gas. Is sent to the segment flow forming unit and the like.
  • the ratio (V b / V a ) of the volume V b (mL) of the segmenting gas to the volume V a (mL) of the reaction raw material liquid introduced into the reaction raw material liquid is particularly limited.
  • the amount of the segmentation gas is preferably 0.100 to 3.00, more preferably 0.200 to 1.50, and particularly preferably 0.200 to 0.750.
  • the raw material for particle formation is reacted by heating the segmented reaction raw material liquid stream under pressure of pressure P 1 (MPa) and at a heating temperature T (° C.). This is a step of forming the target product particles to form a product particle stream containing the target product particles.
  • the heating temperature T (° C.) with respect to the volume V c (mL) of the reaction raw material liquid heated at the heating temperature T (° C.) in the segmented reaction raw material liquid flow.
  • the ratio (V d / V c ) of the volume V d (mL) of the segmentation gas heated in is 0.200 to 7.00, preferably 0.200 to 3.50, particularly preferably 0.400.
  • the pressure P 1 is 2.0 times or more, preferably 3.0 times or more, the vapor pressure P 2 (MPa) of the solvent at the heating temperature T.
  • the segmentation reaction raw material liquid flow is heated while adjusting to, and the reaction of the raw material for particle formation is carried out.
  • There ratio of V d for V c (V d / V c ) is in the above range, and, by the pressure P 1 is in the above range, the segmented reaction feed liquid flow, be heated under pressure, the flow velocity Can be controlled to a desired rate, and the state of the segment of the reaction raw material liquid can be made uniform.
  • the disorder of the segments can be reduced, so that the reaction temperature and the reaction rate within the segments of the reaction raw material solution and between the segments can be made uniform.
  • the particle size distribution of the target product particles can be narrowed, and the yield per unit time can be increased.
  • the upper limit of the pressure P 1 is appropriately selected depending on safety, a pressure that can be controlled by the pressure control unit, and the like, but is preferably 100 times or less the pressure of P 2 , for example.
  • particle generating step as a method of controlling the pressure P 1, is not particularly limited, for example, a tube segmented reaction feed liquid flow is delivered to the end opposite to the segment flow forming section, the pressure valve and attaching a pressure control unit including a method or the like to control the pressure to P 1.
  • the method for controlling the reaction temperature T in the particle generation step is not particularly limited, but for example, the outer peripheral side of the pipe to which the segmented reaction raw material liquid flow is sent is set on an oil bath, a sand bath, an oven, a solder bath, or the like. Examples thereof include a method of covering with a heating part and heating, a method of heating using microwaves, a method of heating using infrared rays, and the like.
  • a flow path composed of a tube that is transparent to microwaves and a solvent that is absorbent to microwaves can be used.
  • a flow path composed of a tube that is transparent to infrared rays and a solvent that is absorbent to infrared rays can be used.
  • the flow velocity of the segmented reaction raw material liquid flow is not particularly limited, but is preferably 0.01 to 20 m / min, particularly preferably 0.10 to 2.0 m / min.
  • the flow velocity of the segmentation reaction raw material liquid flow is within the above range, the yield per unit time is high, and the particle size distribution of the particles produced by suppressing the turbulence of the segments is narrowed.
  • the cross section of the flow path of the segmented reaction raw material liquid flow is preferably circular.
  • the diameter of the cross section of the flow path of the segmented reaction raw material liquid flow is preferably 0.100 to 10.0 mm, particularly preferably 0.500 to 5.00 mm. Since the diameter of the cross section of the flow path of the segmented reaction raw material liquid flow is within the above range, the pressure loss can be suppressed, the liquid can be sent by a cheaper pump, and the cost can be suppressed. In addition, the segmentation gas is prevented from floating in the flow path, appropriate segmentation is performed, and the particle size distribution of the generated particles is narrowed.
  • the heating temperature T (° C.) with respect to the volume V c (mL) of the reaction raw material liquid heated at the heating temperature T (° C.) in the segmented reaction raw material liquid flow.
  • the ratio (V d / V c ) of the volume V d (mL) of the segmentation gas heated in is 0.200 to 7.00, preferably 0.200 to 3.50, particularly preferably 0.400.
  • the segmented reaction raw material liquid is used. Even if the flow is heated while pressurizing, the flow velocity can be controlled to a desired rate, and the state of the segments of the reaction raw material liquid can be made uniform.
  • the disorder of the segments can be reduced, so that the reaction temperature and the reaction rate within the segments of the reaction raw material solution and between the segments can be made uniform.
  • the particle size distribution of the target product particles can be narrowed, and the yield per unit time can be increased.
  • the flow path length of the flow path of the segmented reaction raw material liquid flow is not particularly limited, but is preferably 0.10 to 500 m. Further, in the particle generation step, the time for the segmented reaction raw material liquid flow to pass through the heated portion of the flow path is not particularly limited and is appropriately selected.
  • the method for producing particles of the present invention after performing the particle generation step, cooling of the product particle stream containing the target product particles, separation of the target product particles from the product particle stream, and the like are performed by an appropriate method.
  • the target product particles are separated in the state of the target product particle dispersion liquid containing the target product particles described below.
  • the method for producing particles of the present invention further comprises a cooling step of cooling a product particle stream containing the target product particles, a gas-liquid separation step of separating a segmentation gas from the product particle stream, and a gas-liquid separation. It can have a recovery step of recovering the target product particle dispersion liquid containing the target product particles obtained by performing the step.
  • the target product particle dispersion is a dispersion in which the target product particles are dispersed in a solvent.
  • the method of cooling the product particle flow is not particularly limited, and for example, a method of thermally coupling a heat radiating plate to the outer peripheral side of the pipe to which the product particle flow is sent to cool the liquid.
  • the medium used for cooling is not limited to water, and any medium can be used as long as it can be used as a refrigerant.
  • the cooling temperature is appropriately selected and adjusted to be the processing temperature in the gas-liquid separation step which is the next step.
  • the cooling step may be in a pressure controlled state.
  • the segmentation gas is separated from the target product particles and the solvent by gas-liquid separation from the product particle stream consisting of the target product particles, the solvent, and the segmentation gas. , Remove the segmenting gas.
  • gas-liquid separation for example, by pouring a product particle stream into a storage container provided with a liquid outlet at the lower part and a check valve at the upper part, a target is generated in the storage container.
  • the gas is discharged from the check valve so that the pressure inside the storage container becomes constant, and the liquid accumulates in the storage container. Examples thereof include a method of collecting the liquid from the liquid outlet.
  • the target product particle dispersion liquid containing the target product particles is recovered.
  • Examples of the target product particles obtained by performing the method for producing particles of the present invention as described above include the above-mentioned semiconductor fine particles, metal particles, metal oxide particles, organic polymer particles and the like.
  • the target product particles that can be obtained by the method for producing particles of the present invention are not limited to these, and the purpose is that they are produced from all reaction raw material liquids to which the method for producing particles of the present invention can be applied. Product particles are included.
  • the particle manufacturing apparatus of the present invention has at least a first flow path through which a reaction raw material liquid containing a particle-forming raw material and a solvent for dissolving the particle-forming raw material is sent.
  • a segmentation reaction raw material liquid flow provided on the downstream side of the first flow path and in which the reaction raw material liquid is divided into segments by the segmentation gas by introducing a segmentation gas into the reaction raw material liquid.
  • the segment flow forming part that forms Provided on the downstream side of the segment flow forming portion, the segmentation reaction raw material liquid flow is sent out, and the particle forming raw material is reacted to generate target product particles, and a product containing the target product particles is produced.
  • the second flow path that forms the particle flow A heating unit provided on the outer peripheral side of the second flow path and for heating the segmented reaction raw material liquid flow in the second flow path, It has a pressure control unit for adjusting the pressure of the segmented reaction raw material liquid flow in the second flow path.
  • the pressure of the segmented reaction raw material liquid flow flowing through the second flow path is P 1 (MPa)
  • the heating temperature of the segmented reaction raw material liquid flow is T (° C.)
  • the segmented reaction raw material liquid flow is in the segmented reaction raw material liquid flow.
  • the ratio (V d / V c ) of the volume V d (mL) of the segmenting gas to the volume V c (mL) of the reaction raw material solution is 0.200 to 7.00, and the pressure P 1 is the said.
  • the segmented reaction raw material liquid flow is formed by the segment flow forming unit, the heating unit, and the pressure control unit so as to be 2.0 times or more the vapor pressure P 2 (MPa) of the solvent at the heating temperature T.
  • the volume ratio of the reaction raw material liquid and the segmented gas, the heating temperature T of the pressure P 1 and the segmented reaction feed liquid flow of the segmented reaction feed liquid flow is regulated, It is a particle manufacturing apparatus characterized by.
  • a reaction raw material liquid containing at least a particle forming raw material and a solvent for dissolving the particle forming raw material is delivered toward the segment flow forming portion. It is a flow path. One end side of the first flow path is connected to the segment forming portion. Further, the reaction raw material liquid is supplied from the other end side of the first flow path, and is connected to, for example, a container for storing the reaction raw material liquid.
  • the cross-sectional shape of the tube forming the first flow path is not particularly limited, but is preferably circular. Further, the length of the first flow path is appropriately selected.
  • the first flow path may be provided with a liquid feeding unit for delivering the reaction raw material liquid, for example, a liquid feeding pump and a mass flow controller.
  • a mass flow controller is a device that measures the mass flow rate of a gas or liquid with a mass flow meter and controls the mass flow rate of the gas or liquid by opening and closing a valve based on the measured value.
  • the liquid feed pump include a peristaltic pump, a syringe pump, a diaphragm pump, a gear pump and the like.
  • a pump is attached to each, and each flow path joins the first flow path. Can be mentioned.
  • the reaction raw material liquid according to the particle manufacturing apparatus of the present invention is the same as the reaction raw material liquid according to the particle manufacturing method of the present invention.
  • the segment flow forming portion according to the particle manufacturing apparatus of the present invention is provided on the downstream side of the first flow path, and by introducing the segmentation gas into the reaction raw material liquid, the reaction raw material liquid is segmented with the segmentation gas.
  • a member, part, or part that forms a segmented reaction raw material liquid flow divided into two parts.
  • One end side of the segmentation gas introduction pipe is connected to the segment flow forming portion.
  • the segment flow forming portion includes, for example, a flow path of the reaction raw material liquid and an introduction path of the segmentation gas which is opened and connected to the flow path of the reaction raw material liquid. More specifically, the segment flow forming portion includes a form in which two flow paths such as a T-shaped pipe and a Y-shaped pipe merge into one flow path.
  • the segmented reaction raw material liquid flow according to the particle manufacturing apparatus of the present invention is the same as the segmented reaction raw material liquid flow according to the particle manufacturing method of the present invention.
  • the second flow path according to the particle manufacturing apparatus of the present invention is provided on the downstream side of the segment flow forming portion, and the segmentation reaction raw material liquid flow is sent out to react the particle forming raw material in the flow path. It is a flow path for generating product particles and forming a product particle stream containing the target product particles.
  • One end side of the second flow path is connected to the segment flow forming portion.
  • a pressure control unit is provided on the other end side of the second flow path.
  • the cross-sectional shape of the second flow path is not particularly limited, but is preferably circular.
  • the diameter of the cross section of the pipe forming the second flow path is preferably 0.10 to 10.0 mm, particularly preferably 0.50 to 5.00 mm. When the diameter of the cross section of the tube forming the second flow path is in the above range, particles having a narrow particle size distribution can be obtained with a high yield.
  • the length of the second flow path is not particularly limited, but is preferably 0.10 to 500 m.
  • the heating unit according to the particle manufacturing apparatus of the present invention is a member, component, or portion provided on the outer peripheral side of the second flow path and for heating the segmented reaction raw material liquid flow in the second flow path. It is provided so as to cover the heating portion of the second flow path.
  • the heating unit include an oil bath, a sand bath, an oven, a solder bath, a microwave heating device, an infrared heating device, and the like.
  • the pressure control unit according to the particle manufacturing apparatus of the present invention is a member, part or part for adjusting the pressure of the segmented reaction raw material liquid flow in the second flow path.
  • the pressure control unit is not particularly limited as long as the pressure of the segmented reaction raw material liquid flow in the second flow path can be adjusted to a predetermined pressure.
  • a pressure control unit having a pressure valve and a pressure gauge.
  • An electron having a calculation unit that is electrically connected to the valve, the pressure gauge, and the valve, receives the pressure data sent from the pressure gauge, and sends an opening adjustment command to the valve based on the data.
  • Examples include a computer and a pressure control unit including a computer.
  • the pressure of the segmented reaction raw material liquid flow flowing through the second flow path is P 1 (MPa)
  • the heating temperature of the segmented reaction raw material liquid flow is T (° C.)
  • the segmented reaction raw material is 0.200 to 7.00, preferably 0. 2. 200 to 3.50, particularly preferably 0.400 to 1.75
  • the pressure P 1 is 2.0 times or more the vapor pressure P 2 (MPa) of the solvent at the heating temperature T, preferably 3.
  • the ratio of V d for V c (V d / V c ) and the pressure P 1 is, by the above range, it is possible to size distribution obtained a narrow particle in high yields.
  • the target product particles formed by passing through the second flow path specifically, the raw materials for particle formation react by passing through the heated portion of the second flow path.
  • the segmentation gas and the solvent are separated by an appropriate method to obtain the target product particles.
  • the ratio (V b / V a ) of the volume V b (mL) of the segmenting gas to the volume V a (mL) of the reaction raw material liquid introduced into the reaction raw material liquid is particularly limited.
  • the reaction raw material is preferably 0.100 to 3.00, more preferably 0.200 to 1.50, and particularly preferably 0.200 to 0.750, depending on the segment flow forming portion.
  • the amount of liquid supplied and the amount of segmented gas introduced are adjusted.
  • the particle manufacturing apparatus of the present invention is provided on the downstream side of the second flow path and is provided on the outer peripheral side of the third flow path and the third flow path through which the product particle flow flows.
  • a cooling unit that cools the product particle flow flowing inside
  • a gas-liquid separation unit that is provided on the downstream side of the third flow path and separates the segmentation gas from the product particle flow, and the target product particles. It is possible to further have a recovery unit for recovering the target product particle dispersion liquid.
  • the third flow path is provided on the downstream side of the second flow path, and is a flow path through which the product particle flow containing the target product particles flows.
  • the cross-sectional shape of the pipe of the third flow path is not particularly limited, but a circular shape is preferable.
  • the length of the third flow path is appropriately selected.
  • the third flow path may be pressure controlled.
  • the cooling unit is provided on the outer peripheral side of the third flow path, is a member, a component, or a portion for cooling the product particle flow flowing in the third flow path, and covers the cooling portion of the third flow path. It is provided as follows.
  • the cooling unit includes, for example, a cooling unit that cools the liquid by thermally coupling a heat dissipation plate to the outer peripheral side of the pipe to which the product particle flow is sent, and a pipe to which the product particle flow is sent is immersed in circulating water. Examples include a cooling unit that cools water with water, a cooling unit in which a pipe through which a product particle flow is sent is a double pipe, and a refrigerant flows through an outer pipe.
  • the gas-liquid separation unit is a member, component, or part for separating the segmentation gas from the product particle stream containing the target product particles and recovering the segmentation gas.
  • the recovery unit is a member, part, or part for recovering the target product particle dispersion liquid containing the target product particles obtained by separating the segmentation gas in the gas-liquid separation unit.
  • a product particle flow is poured into a storage container provided with a liquid outlet at the lower part and a check valve at the upper part of the storage container, and the storage container is provided.
  • the target product particle dispersion liquid containing the target product particles and the segmentation gas are separated from each other, and the gas is discharged from the check valve so that the pressure inside the storage container becomes constant, and the liquid is filled in the tank.
  • An example is a gas-liquid separation part where the liquid is collected from the liquid outlet when the particles are collected.
  • inventions of the particle production apparatus of the present invention include, for example, 1 to 100 nm particle production, semiconductor fine particle production, metal particle production, metal oxide production, organic polymer particle production, and the like.
  • the semiconductor microparticles produced according to the semiconductor microparticle manufacturing application are not limited, and examples thereof include semiconductor microparticles containing In and P.
  • the metal produced by the metal particle manufacturing application is not limited, and includes, for example, nickel, copper, silver, palladium, platinum, and one or more selected from the group consisting of alloys consisting of two or more of these metals. Metal is mentioned.
  • the target product particles were produced using the flow particle production apparatus shown in FIG. 1, in which the length of the tube of the heating section was 100 m and the diameter of the tube was 3 mm.
  • the vapor pressure P 2 at 300 ° C. of 1-octadecene was used as the solvent in the reaction raw material solution prepared above is 0.07 MPa.
  • the above-prepared reaction raw material liquid 1 is delivered at the volume flow rate shown in Table 1, and nitrogen gas is introduced as the segmentation gas 2 at the volume flow rate shown in Table 1 at the volume ratio (V b / V a ).
  • a T-shaped tube was used as the segment flow forming portion 11 to merge with one flow path to obtain a segmented reaction raw material liquid flow.
  • the pressure P 1 of the second segmented reaction feed liquid flow 3 in the flow channel 32 to the pressure indicated in Table 1, by adjusting the heating temperature of 300 ° C., the segmented reaction feed liquid flow 3, the second The target product particles were produced by passing through the heated portion of the flow path 32 of the above.
  • Table 1 shows the ratio (V d / V c ) of the volume V d (mL) of the heated segmentation gas to the volume V c (mL) of the heated reaction raw material solution.
  • the volumetric flow rate of the segmented reaction raw material liquid flow 3 during heating was 258.9 mL / min, and the residence time from when the segmented reaction raw material liquid flow 3 entered the heating unit 12 to when it exited was about 3. It was a minute.
  • the volumetric flow rate of the segmented reaction raw material liquid flow 3 during heating was 70.6 mL / min, from when the segmented reaction raw material liquid flow 3 entered the heating unit 12 until it exited. The residence time was about 10 minutes.
  • gas-liquid separation of the obtained product particle stream 4 was performed, and the segmentation gas 2 was separated to obtain a target product particle dispersion liquid 7 containing InP particles as the target product particles.
  • the yield of InP particles per unit time of Comparative Example 2 was set to 1.00, and the yield of InP particles per unit time of each example was calculated.
  • the results are shown in Table 1.
  • a process of attaching a shell to the obtained InP core was performed.
  • 1 L of the InP particle dispersion obtained above is provided with a stirrer and a heater for heating, and is supplied with an inert gas and placed in a reaction vessel having a closed structure in which oxygen and moisture in the air do not enter.
  • Octanoyl chloride (52.5 mmol) was added thereto, and the temperature was raised to 240 ° C. and heated for 3 hours.
  • a 1-octadecene solution (75 ml) of zinc oleate (30 mmol) and a solution of Se (30 mmol) dissolved in TBP (45 mmol) are added, and the temperature is 200 ° C. for 30 minutes. It was heated. Further, a 1-octadecene solution (150 ml) of zinc oleate (60 mmol) and dodecanethiol (120 mmol) were added, the temperature was raised to 250 ° C., and the mixture was heated for 3 hours. Then, the temperature was lowered to 25 ° C. to obtain a solution containing semiconductor fine particles having a core / shell structure of InP / ZnSe—ZnS.
  • FWHM full width at half maximum
  • QY quantum efficiency
  • the optical properties of the semiconductor nanoparticles were measured using a quantum efficiency measurement system (QE-2100, manufactured by Otsuka Electronics Co., Ltd.).
  • the solution containing the semiconductor microparticles of the core / shell structure obtained above was dispersed in a dispersion liquid, excited light was applied to obtain an emission spectrum, and the emission spectrum obtained here was reexcited and fluorescently emitted.
  • the quantum efficiency (QY) and half-value width (FWHM) were calculated from the emission spectrum after re-excitation correction excluding the excitation fluorescence emission spectrum. Normal hexane and 1-octadecene were used as the dispersion.
  • Example 19 ⁇ Preparation of reaction raw material solution> Indium isopropoxide (60 mmol), anhydrous indium chloride (60 mmol) and trioctylphosphine (2000 g) are placed in a precursor tank and dissolved by stirring with a vacuum pump while lowering the pressure to 100 Pa or less to obtain an In precursor. It was. Tristrimethylsilylphosphine (90 mmol) as a P precursor was added to this solution, and the mixture was sufficiently stirred to prepare a reaction raw material solution.
  • reaction raw material solution Anhydrous indium chloride (18 mmol), anhydrous zinc chloride (18 mmol) and oleylamine (1000 ml) were placed in a precursor tank and dissolved by stirring while heating at 100 ° C. to obtain an In precursor. After cooling this solution to room temperature, trisdimethylaminophosphine (5 ml) was added as a P precursor, and the mixture was sufficiently stirred to prepare a reaction raw material solution.

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