WO2020181861A1 - 显示基板及其制备方法 - Google Patents

显示基板及其制备方法 Download PDF

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Publication number
WO2020181861A1
WO2020181861A1 PCT/CN2019/125133 CN2019125133W WO2020181861A1 WO 2020181861 A1 WO2020181861 A1 WO 2020181861A1 CN 2019125133 W CN2019125133 W CN 2019125133W WO 2020181861 A1 WO2020181861 A1 WO 2020181861A1
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Prior art keywords
layer
deformation layer
controllable deformation
controllable
display substrate
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PCT/CN2019/125133
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English (en)
French (fr)
Inventor
朱儒晖
姚固
Original Assignee
京东方科技集团股份有限公司
合肥鑫晟光电科技有限公司
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Application filed by 京东方科技集团股份有限公司, 合肥鑫晟光电科技有限公司 filed Critical 京东方科技集团股份有限公司
Priority to US16/767,425 priority Critical patent/US11329114B2/en
Publication of WO2020181861A1 publication Critical patent/WO2020181861A1/zh

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/50—OLEDs integrated with light modulating elements, e.g. with electrochromic elements, photochromic elements or liquid crystal elements
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/122—Pixel-defining structures or layers, e.g. banks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
    • H10K71/13—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
    • H10K71/135—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing using ink-jet printing
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/20—Changing the shape of the active layer in the devices, e.g. patterning

Definitions

  • the embodiment of the present disclosure relates to a display substrate and a preparation method thereof.
  • Organic light-emitting display devices have the advantages of self-luminescence, fast response, wide viewing angle, high brightness, bright colors, lightness and thinness, etc., and therefore become an important display technology.
  • the organic functional layer of the organic light emitting display device can be formed by inkjet printing, for example.
  • a pixel defining layer needs to be fabricated on the base substrate in advance to restrict the organic functional material to be accurately sprayed into the designated pixel area.
  • At least one embodiment of the present disclosure provides a display substrate, including: a pixel defining layer including a plurality of openings for defining a plurality of pixel units; a controllable deformation layer located on the pixel defining layer, and the controllable deformation The lateral extension of at least a part of the layer in a direction parallel to the pixel defining layer is controllable.
  • the cross-section of the controllable deformation layer after lateral extension is narrower on the side of the pixel defining layer Inverted trapezoid.
  • the material of the controllable deformation layer includes a photodeformable material.
  • the photodeformable material includes azobenzene, benzospiran, copolymer containing cinnamic acid groups, or polyethylene polymer.
  • the lateral extension is achieved by irradiating the controllable deformation layer with first light.
  • the lateral extension is withdrawn by removing the first light or irradiating the controllable deformable layer with a second light having a wavelength range different from that of the first light. .
  • the material of the controllable deformation layer includes a magnetostrictive material.
  • controllable deformation layer includes a resin polymer material containing terbium-dysprosium-iron rare earth giant magnetostrictive particles.
  • the lateral extension is achieved by applying a magnetic field to the controllable deformation layer.
  • the lateral extension is retracted by removing the magnetic field applied to the controllable deformation layer.
  • the thickness of the controllable deformation layer is 0.5 ⁇ m-1.5 ⁇ m.
  • At least one embodiment of the present disclosure provides a method for manufacturing a display substrate, including: forming a pixel defining layer, the pixel defining layer includes a plurality of openings for defining a plurality of pixel units; forming a controllable layer on the pixel defining layer Deformation layer, the lateral extension of at least a part of the controllable deformation layer in a direction parallel to the pixel defining layer is controllable.
  • the method for preparing a display substrate further includes: filling the opening with a liquid material; while drying the liquid material, applying a first control to the controllable deformation layer, so that the The controllable deformation layer extends laterally toward the direction of the opening.
  • the preparation method after drying the liquid material, the preparation method further includes: controlling the controllable deformation layer to extend the controllable deformation layer laterally withdraw.
  • applying the first control to the controllable deformable layer includes: controlling the first control by changing at least one of the duration and intensity of the first control The size of the lateral extension of the controllable deformation layer.
  • the first control is the first light
  • the controllable deformation layer is controlled
  • Retracting the lateral extension of the controllable deformable layer includes: removing the first light, or applying a second light having a wavelength range different from the first light to the controllable deformable layer; by changing the first light
  • Controlling at least one of duration and intensity to control the size of the lateral extension of the controllable deformation layer includes: controlling the controllable deformation by changing the irradiation time, light intensity, or irradiation time and light intensity of the first light.
  • the horizontal extent of the layer is controlled.
  • the first light is ultraviolet light
  • the second light is visible light
  • the light intensity of the first illumination is 20 mw/cm 2 -200 mw/cm 2
  • the irradiation time is 5s-35s.
  • the first control is a magnetic field
  • Controlling the size of the lateral extension of the controllable deformable layer by changing at least one of the duration and intensity of the first control includes: controlling by changing the acting time, magnetic field strength, or acting time and magnetic field strength of the magnetic field The lateral extension of the controllable deformation layer.
  • the magnetic field intensity is 100KA/m-600KA/m
  • the action time is 30s-120s.
  • Fig. 1 is a schematic diagram of the morphology of a liquid drop on a display substrate
  • Figure 2 is a schematic diagram showing the morphology of an organic functional layer in a substrate
  • FIG. 3 is a schematic diagram of a display substrate provided by some embodiments of the present disclosure.
  • FIG. 4 is a schematic diagram of a controllable deformation layer of a display substrate after deformation according to some embodiments of the present disclosure
  • FIG. 5 is a schematic diagram of a deformation principle of a controllable deformation layer of a display substrate provided by some embodiments of the present disclosure
  • 6A-6G are schematic diagrams of a display substrate provided by some embodiments of the disclosure during the manufacturing process
  • FIG. 7 is a schematic diagram of a display substrate provided by some embodiments of the disclosure in another manufacturing process.
  • the ink-jet-printed liquid droplets 13 are dripping, and during the drying process, there will be The capillary flow outside 1 and the Malaconi flow inside 2. Normally, the degree of outward capillary flow 1 is greater than the degree of inward Malaconi flow 2.
  • FIG. 2 when a liquid of an organic functional material is formed in the pixel defining layer 11 and on the first electrode 12, due to the above-mentioned flow of the liquid, the dried shape of the liquid is often uneven, for example, a thin middle edge is formed.
  • the thin film commonly known as "coffee ring" makes the shape of the finally formed organic functional layer 13 uneven, which affects the display effect of the display substrate.
  • At least one embodiment of the present disclosure provides a display substrate that includes a pixel defining layer and a controllable deformation layer; the pixel defining layer includes a plurality of openings for defining a plurality of pixel units; the controllable deformation layer is located on the pixel defining layer And the lateral extension of at least a part of the controllable deformation layer in a direction parallel to the pixel defining layer is controllable.
  • At least one embodiment of the present disclosure further provides a method for manufacturing a display substrate, including: forming a pixel defining layer, the pixel defining layer includes a plurality of openings for defining a plurality of pixel units; forming a controllable deformation layer on the pixel defining layer The lateral extension of at least a part of the controllable deformation layer in a direction parallel to the pixel defining layer is controllable.
  • FIG. 3 shows a schematic partial cross-sectional view of the display substrate.
  • the display substrate includes a pixel defining layer 101 and a controllable deformation layer 102;
  • the pixel defining layer 101 includes a plurality of openings 1011 for defining a plurality of pixel units;
  • the controllable deformation layer 102 is located on the pixel defining layer 101 ,
  • at least a part of the controllable deformation layer 102 can extend laterally in a direction parallel to the pixel defining layer 101 (the horizontal direction in FIG. 3), and the lateral extension thereof is controllable.
  • the controllable deformation layer 102 performs lateral extension and the size of the lateral extension are controllable.
  • the lateral extension here means that at least a part of the controllable deformation layer can extend in the direction of the opening.
  • controllable lateral extension of the controllable deformation layer 102 includes: the controllable deformation layer 102 can be controlled to perform lateral extension, or can be controlled to withdraw the lateral extension to restore its original shape, or can be controlled to perform a preset range of lateral extension.
  • Extension for example, the range of lateral extension can be 10%, 20%, etc. of the original size, and those skilled in the art can choose according to needs.
  • the original size in the horizontal direction is 1 ⁇ m
  • the horizontal extension can be 0.1 ⁇ m, that is, lateral extension.
  • the latter size is 1.1 ⁇ m.
  • the cross-section of the controllable deformation layer 102 after being extended in the lateral direction may have a shape that is wide at the top and narrow at the bottom.
  • the cross-section of the controllable deformation layer 102 in the lateral direction is an inverted trapezoid that is narrower on the side of the pixel defining layer 101. Therefore, during the preparation process of the display substrate, when the liquid 1041 of organic functional material is formed in the opening 1011 of the pixel defining layer 101, the lateral extension of the controllable deformation layer 102 will exert a force on the liquid 1041 to promote the liquid 1041.
  • the inward Malaconi flow inhibits the outward capillary flow of the liquid 1041, thereby helping the liquid 1041 to form a uniform organic functional layer 104 after drying, as shown in FIG. 3. Therefore, the display substrate has a better display effect.
  • the material of the controllable deformation layer 102 includes a photodeformable material.
  • the photodeformable material includes azobenzene, benzospiran, cinnamic acid group-containing copolymer, or polyethylene polymer.
  • the material of the controllable deformation layer 102 includes polyimide or polysiloxane containing azobenzene, polyimide containing benzospiran, chlorinated polyethylene, acryloyl -Cinnamoyl-ethylenediester copolymers, and cross-linked liquid crystal polymers containing azobenzene, pyran, diarylethylene or stilbene groups, etc.
  • the lateral extension of the controllable deformation layer 102 can be achieved by irradiating the controllable deformation layer 102 with the first light.
  • the lateral extension of the controllable deformation layer 102 can be withdrawn by removing the first light or irradiating the controllable deformation layer 102 with a second light having a wavelength range different from the first light.
  • the lateral extension of the controllable deformation layer is withdrawn means that the lateral extension of the controllable deformation layer disappears and returns to its original shape, that is, the controllable deformation layer returns to its original size.
  • the first light may be ultraviolet light, such as ultraviolet light with a wavelength in the range of 200nm-380nm, such as ultraviolet light with a wavelength of 254nm, 308nm, or 360nm
  • the second light may be visible light, for example, the wavelength of the visible light The range is 380nm-780nm.
  • the material of the controllable deformation layer 102 includes azobenzene. Since the azobenzene group has a higher molar absorption coefficient, photons can be absorbed by the azobenzene group located on the surface of the controllable deformation layer 102. absorb. As shown in FIG.
  • the azobenzene element on the surface of the controllable deformation layer 102 can be restored to the original state, and in the controllable deformation layer 102, the azobenzene The orderly arrangement of the primitives is restored, so that the controllable deformation layer 102 also returns to the original shape.
  • the wavelength range of the first light and the second light can be selected according to the specific type and properties of the photodeformable material selected, which is not specifically limited in the embodiment of the present disclosure.
  • the material of the controllable deformation layer 102 includes a magnetostrictive material.
  • the controllable deformation layer 102 includes a resin polymer material containing terbium, dysprosium, iron, and rare earth giant magnetostrictive particles. This material has good magnetostrictive properties and can make the controllable deformation layer 102 controllable. Have sufficient lateral extension.
  • the lateral extension of the controllable deformation layer 102 can be achieved by applying a magnetic field to the controllable deformation layer 102.
  • the lateral extension of the controllable deformation layer 102 can be withdrawn by removing the magnetic field applied to the controllable deformation layer 102, that is, when the magnetic field is not applied to the controllable deformation layer 102, the lateral extension of the controllable deformation layer 102 can disappear and recover.
  • an electromagnet or a permanent magnet can be provided above the controllable deformation layer 102 to generate a magnetic field to control the lateral extension of the controllable deformation layer 102.
  • the thickness of the controllable deformation layer 102 (that is, the size of the controllable deformation layer 102 in a direction perpendicular to the surface of the pixel defining layer 101) may be 0.5 ⁇ m-1.5 ⁇ m, such as 0.8 ⁇ m, 1 ⁇ m, or 1.2 ⁇ m.
  • the thickness of the pixel defining layer 101 (that is, the size of the pixel defining layer 101 in a direction perpendicular to the surface of the pixel defining layer 101) may be 1 ⁇ m-2 ⁇ m, such as 1.2 ⁇ m, 1.5 ⁇ m, or 1.8 ⁇ m.
  • the height of the liquid formed in the pixel defining layer 101 is greater than the height of the pixel defining layer 101, so that the lateral extension of the controllable deformation layer 102 can apply enough to the liquid in the pixel defining layer 101. Therefore, the liquid in the pixel defining layer 101 can form a uniform film after drying.
  • the thickness of the controllable deformation layer 102 is selected to be about 1 ⁇ m, and the thickness of the pixel defining layer 101 is also selected to be about 1 ⁇ m.
  • the size of the lateral extension of the controllable deformation layer 102 is controllable.
  • the lateral extension of the controllable deformation layer 102 can be controlled by changing the irradiation time, light intensity, or both of the irradiation time and light intensity of the first light.
  • the irradiation intensity of the first light that causes the controllable deformation layer 102 to extend laterally is set at 20mw/cm 2 -200mw/cm 2 , and the irradiation time is 5s-35s, at this time the controllable deformation layer 102
  • the lateral elongation (the ratio of the laterally extended length of the controllable deformation layer 102 to the initial length of the controllable deformation layer 102) can reach about 5%-30%.
  • the lateral extension of the controllable deformation layer 102 can be controlled by changing the acting time of the magnetic field, the strength of the magnetic field, or the acting time and the strength of the magnetic field.
  • the intensity of the magnetic field applied to the controllable deformation layer 102 is set to 100KA/m-600KA/m, and the magnetic field action time is 30s-120s.
  • the magnetostriction coefficient of the controllable deformation layer 102 can be The ratio of the laterally extending length of the controllable deformation layer 102 to the initial length of the controllable deformation layer 102 can reach about 800PPM-6000PPM.
  • control parameters can be selected according to the specific material of the controllable deformation layer 102 to control the lateral extension degree of the controllable deformation layer 102, thereby controlling the force applied by the controllable deformation layer 102 to the liquid in the pixel defining layer 101 size.
  • controllable deformation layer 102 when the controllable deformation layer 102 is laterally extended by ultraviolet irradiation or applying a magnetic field above the display substrate, the material of the controllable deformation layer 102 closer to the position of ultraviolet irradiation or application of a magnetic field is deformed more, so the controllable deformation
  • the cross-section of the layer 102 extending in the lateral direction is easily formed into a narrow inverted trapezoid on the side of the pixel defining layer 101, and by controlling the intensity of ultraviolet radiation or applying a magnetic field, the surface of the controllable deformation layer 102 that is in contact with the pixel defining layer 101 is almost No deformation occurs, so the controllable deformation layer 102 can maintain a combined state with the pixel defining layer 101 without shifting.
  • the pixel defining layer 101 usually includes an organic insulating material, such as polyimide (PI), etc.
  • PI polyimide
  • the display substrate provided by the embodiments of the present disclosure includes a controllable deformation layer.
  • the controllable deformation layer can be used to control the lateral extension of the controllable deformation layer so that the controllable deformation layer affects the organic matter in the pixel defining layer during the drying process.
  • the liquid of the functional material exerts a force to promote the inward flow of the Marragoni and inhibit the outward flow of the liquid, so that the liquid can form a uniform organic functional layer after drying, thereby improving the display quality of the display substrate.
  • At least one embodiment of the present disclosure provides a method for manufacturing a display substrate, including: forming a pixel defining layer, the pixel defining layer includes a plurality of openings for defining a plurality of pixel units; forming a controllable deformation layer on the pixel defining layer, At least a part of the controllable deformation layer can extend laterally in a direction parallel to the pixel defining layer, and the lateral extension thereof is controllable.
  • Forming a display substrate usually includes forming a pixel driving circuit on a base substrate, and then forming a light-emitting element, such as an organic light-emitting diode (OLED), etc.
  • the pixel driving circuit can adjust the light-emitting state of the light-emitting element, and then adjust the display gray scale of the display substrate .
  • the pixel driving circuit includes, for example, a plurality of thin film transistors (switching transistors, driving transistors, etc.), capacitors, gate lines, data lines, and other structures.
  • the method of forming the pixel driving circuit can refer to the conventional technology, which is not limited in the embodiment of the present disclosure. After the structure such as the driving circuit is formed, the light-emitting element OLED is formed.
  • the OLED includes an anode, a cathode, and an organic functional layer between the anode and the cathode.
  • the organic functional layer includes a light-emitting layer.
  • the organic functional layer further includes one or more of an electron injection layer, an electron transport layer, a hole injection layer, and a hole transport layer. Not limited. The following mainly introduces the formation process of the light-emitting element OLED on the display substrate.
  • the anode 103 of the OLED and the pixel defining layer 101 are formed first.
  • the material of the anode 103 includes metal oxides such as indium tin oxide (ITO) and indium zinc oxide (IZO).
  • ITO indium tin oxide
  • IZO indium zinc oxide
  • a method such as a magnetron sputtering method may be used to form an anode material layer on a base substrate on which a pixel driving circuit has been formed, and then a patterning process is performed on the anode material layer to form the anode 103.
  • a patterning process includes photoresist coating, exposure, development, and etching processes, which are not specifically limited in the embodiments of the present disclosure.
  • the pixel defining layer 101 is formed.
  • the material of the pixel defining layer 101 includes an organic insulating material, such as polyimide (PI).
  • PI polyimide
  • a method such as coating may be used to form a pixel defining material layer on the anode 103, and then a patterning process is performed on the pixel defining material layer to form the pixel defining layer 101.
  • the pixel defining layer 101 is used to define a plurality of pixel units, and each pixel unit includes a light emitting element OLED.
  • the formation thickness of the pixel defining layer 101 is 1 ⁇ m-2 ⁇ m, such as 1.2 ⁇ m, 1.5 ⁇ m, or 1.8 ⁇ m.
  • the pixel defining layer 101 formed by the patterning process includes a plurality of openings 1011, and the plurality of openings 1011 respectively expose the anode 103.
  • a controllable deformation layer 102 is formed on the pixel defining layer 101.
  • forming the controllable deformation layer 102 includes: forming a deformation material layer on the pixel defining layer 101 by coating or the like, and then performing a patterning process on the deformation material layer to form the controllable deformation layer 102.
  • the thickness of the controllable deformation layer 102 is 0.5 ⁇ m-1.5 ⁇ m, such as 0.8 ⁇ m, 1 ⁇ m, or 1.2 ⁇ m.
  • the material of the controllable deformation layer 102 includes a photodeformable material, such as azobenzene, benzospiran, copolymer containing cinnamic acid groups, or polyethylene polymer.
  • the material of the controllable deformation layer 102 includes a magnetostrictive material, such as a resin polymer material containing terbium, dysprosium, iron, and giant magnetostrictive particles.
  • the controllable deformation layer 102 may also include other controllable deformation materials, which are not specifically limited in the embodiment of the present disclosure.
  • controllable deformation layer and the pixel defining layer may be formed together in one patterning process.
  • a pixel defining material layer and a deformable material layer are sequentially formed, and then a patterning process is performed on the pixel defining material layer and the deformable material layer to form the pixel defining layer 101 and the controllable deforming layer 102.
  • the embodiment of the present disclosure does not limit the specific forming method of the controllable deformation layer.
  • an organic functional layer is formed in the plurality of openings 1011 of the pixel defining layer 101.
  • forming an organic functional layer includes: filling the opening 1011 with a liquid material, for example, using inkjet printing to form a liquid 1041 of the organic functional material in the opening 1011 of the pixel defining layer 101, and the height of the inkjet printing liquid 1041 is greater than The pixel defines the height of the layer 101.
  • the first control is applied to the controllable deformation layer 102 so that the controllable deformation layer 102 extends laterally toward the opening 1011. For example, as shown in FIG.
  • the cross-section of the controllable deformation layer 102 after lateral extension presents a shape with a large top and a small bottom, such as a narrow inverted trapezoid on the side of the pixel defining layer 101.
  • the controllable deformation layer 102 is In the process of lateral extension, a force can be applied to the liquid 1041 to promote the inward flow of the liquid 1041 and inhibit the capillary flow outward of the liquid 1041, so that the shape of the liquid 1041 after drying is more uniform.
  • applying the first control to the controllable deformation layer 102 includes: controlling the size of the lateral extension of the controllable deformation layer 102 by changing at least one of the duration and intensity of the first control. Therefore, appropriate control parameters can be selected according to the specific material of the controllable deformation layer 102 to control the lateral extension degree of the controllable deformation layer 102, thereby controlling the force applied by the controllable deformation layer 102 to the liquid in the pixel defining layer 101 size.
  • the first control is the first light.
  • the lateral extension of the controllable deformable layer 102 can be controlled by changing the irradiation time, light intensity, or irradiation time and light intensity of the first light.
  • the first light is ultraviolet light, such as ultraviolet light having a wavelength in the range of 200 nm to 380 nm, such as ultraviolet light having a wavelength of 254 nm, 308 nm, or 360 nm.
  • the irradiation intensity of the first light is selected to be 20mw/cm 2 -200mw/cm 2
  • the irradiation time is selected to be 5s-35s.
  • the lateral elongation of the controllable deformation layer 102 can reach about 5%- 30%. Therefore, the appropriate irradiation time and irradiation intensity can be selected according to actual production requirements.
  • the first control is a magnetic field.
  • the lateral extension of the controllable deformation layer 102 can be controlled by changing the acting time of the magnetic field, the strength of the magnetic field, or the acting time and the strength of the magnetic field.
  • the intensity of the magnetic field applied to the controllable deformation layer 102 is selected to be 100KA/m-600KA/m, and the time of the magnetic field is selected to be 30s-120s.
  • the magnetostriction coefficient of the controllable deformation layer 102 can reach About 800PPM-6000PPM. Therefore, the appropriate magnetic field strength and magnetic field action time can be selected according to actual production requirements.
  • the material of the controllable deformation layer 102 includes the photodeformable material azobenzene.
  • the first control includes irradiating the controllable deformation layer 102 with ultraviolet light through the mask 110.
  • the light-transmitting area 110A of the mask 110 exposes the controllable deformation layer 102, so that the ultraviolet light will not irradiate other parts of the display substrate to avoid adverse effects.
  • the first control when the material of the controllable deformation layer 102 includes a magnetostrictive material, the first control includes arranging a magnetic field generating device 120 above the controllable deformation layer 102 and controlling the magnetic field generating device 120 generates a magnetic field.
  • the magnetic field generating device 120 is a permanent magnet or an electromagnet.
  • the lateral extension of the controllable deformable layer 102 can be controlled by controlling the magnitude and duration of the current to be energized to the electromagnet.
  • the magnetostrictive direction of a magnetostrictive material is related to the direction of the applied magnetic field and is related to the type of magnetostrictive material. Therefore, it can be based on the type of magnetostrictive material and the required transverse direction of the controllable deformation layer 102.
  • the extension direction selects the direction of the applied magnetic field.
  • the controllable deformation layer 102 includes a resin polymer material containing terbium-dysprosium rare earth giant magnetostrictive particles
  • the magneto-extension direction and the magnetic field direction of the resin polymer material containing terbium-dysprosium rare earth giant magnetostrictive particles are It is basically the same.
  • the magnetic field generating device 120 applies a magnetic field parallel to the lateral extension direction to the controllable deformable layer 102.
  • the two magnetic poles of the magnetic field generating device 120 are placed parallel to the surface of the display substrate above the controllable deformation layer 102, and generate a magnetic field parallel to the lateral extension direction of the controllable deformation layer 102, thereby applying the controllable deformation layer 102
  • the uniform magnetic field makes the controllable deformation layer 102 extend laterally toward the opening direction of the pixel defining layer.
  • FIG. 7 only shows an exemplary form of a magnetic field generating device.
  • the controllable deformation layer 102 includes a resin polymer material containing terbium dysprosium iron giant magnetostrictive particles, as long as the magnetic field generating device can It suffices to generate a magnetic field or a magnetic field component parallel to the deformation direction of the controllable deformation layer, for example, a transverse extension direction.
  • the embodiment of the present disclosure does not limit the direction and manner of the magnetic field generating device.
  • the magnetostrictive material included in the controllable deformation layer 102 may also contain rare earth-iron materials such as TbFe2 (terbium iron), SmFe2 (samarium iron), DyFe2 (dysprosium iron) or HoFe2 (holmium iron). System compound resin polymer material.
  • the magnetic field generating device 120 when used to apply a magnetic field, the setting position of the magnetic field generating device 120 can be adjusted according to the characteristics of the material and the required extension direction.
  • the embodiments of the present disclosure have an effect on the type of magnetostrictive material and the application of the magnetic field.
  • the manner is not specifically limited, as long as a magnetic field can be applied to the controllable deformation layer 120 to make the controllable deformation layer extend laterally.
  • the magnetic field generating device may be an electromagnetic material layer formed on the controllable deformation layer 102.
  • the electromagnetic material layer When the electromagnetic material layer is energized, a magnetic field applied to the controllable deformation layer 102 can be formed to make the controllable deformation layer 102
  • the arrangement of the electromagnetic material layer and the relative positional relationship with the controllable deformation layer can be set according to the type of magnetostrictive material, as long as the controllable deformation layer 120 can be applied with a magnetic field to make the controllable deformation layer occur. Extend it horizontally.
  • the organic functional material liquid 1041 formed in the opening 1011 of the pixel defining layer 101 is dried to form an organic functional layer 104, and the organic functional layer 104 has a uniform shape.
  • controllable deformation layer 102 is controlled so that the lateral extension of the controllable deformation layer 102 is withdrawn.
  • the lateral extension and withdrawal of the controllable deformation layer 102 includes: removing the first light, or applying a wavelength range different from the first light to the controllable deformation layer 102
  • the second light For example, in the above example, the first light is ultraviolet light. In this case, the second light may be visible light, and the wavelength range of the visible light is 380nm-780nm.
  • retracting the lateral extension of the controllable deformation layer 102 includes: removing the magnetic field.
  • retracting the lateral extension of the controllable deformation layer 102 includes: removing ultraviolet light, or irradiating the controllable deformation layer 102 with visible light through the mask 110, so that the controllable deformation layer 102 The horizontal extension is withdrawn.
  • retracting the lateral extension of the controllable deformation layer 102 includes: removing the magnetic field, for example, stopping energization of the electromagnet, so that the lateral extension of the controllable deformation layer 102 is retracted. After that, for example, a manipulator is used to remove the display substrate from under the electromagnet and move it to a corresponding device for the subsequent preparation process.
  • a cathode 105 is formed on the organic functional layer 104.
  • the material of the cathode includes metal materials, such as copper, copper alloy, aluminum, aluminum alloy, magnesium, magnesium alloy and other metal materials.
  • a method such as magnetron sputtering may be used to form a cathode material layer on the organic functional layer 104, and then the cathode material layer may be patterned once to form the cathode 105.
  • the method for preparing the display substrate further includes forming structures such as insulating layers, spacers, and encapsulation layers.
  • structures such as insulating layers, spacers, and encapsulation layers.
  • the formation of these structures can refer to conventional technologies, which are not limited in the embodiments of the present disclosure.
  • the lateral extension of the controllable deformation layer is controllable. While the lateral extension, the controllable deformation layer can also undergo other forms of deformation, for example, elongation in the height direction, or Bending or the like occurs, but as long as it can be ensured that the lateral extension occurs and the deformation is retractable, the present disclosure does not limit this.
  • the preparation method of the display substrate forms a controllable deformation layer, so that during the preparation process of the display substrate, the controllable deformation layer can be dried in the pixel defining layer by controlling the lateral extension of the controllable deformation layer.
  • the liquid of the organic functional material exerts a force to promote the inward flow of the Marragoni and inhibit the outward capillary flow of the liquid, so that the liquid can form a uniform organic functional layer after drying, thereby improving the display substrate Display quality.

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Abstract

一种显示基板及其制备方法。该显示基板包括像素界定层(101)和可控变形层(102)；像素界定层(101)包括多个开口(1011)，用于界定多个像素单元；可控变形层(102)位于像素界定层(101)上，且可控变形层(102)的至少一部分在平行于像素界定层(101)的方向上的横向延伸是可控的。该显示基板的有机功能层形态均匀，因此该显示基板具有更优质的显示效果。

Description

显示基板及其制备方法
本申请要求于2019年3月11日递交的中国专利申请第201910179693.8号的优先权，在此全文引用上述中国专利申请公开的内容以作为本申请的一部分。
技术领域
本公开的实施例涉及一种显示基板及其制备方法。
背景技术
有机发光显示装置具有自发光、反应快、视角广、亮度高、色彩艳、轻薄等优点，因此成为一种重要的显示技术。
有机发光显示装置的有机功能层例如可以采用喷墨打印的方式形成，此时，需要预先在衬底基板上制作像素界定层，以限定有机功能材料精确的喷入指定的像素区域内。
发明内容
本公开至少一实施例提供一种显示基板，包括：像素界定层，包括多个开口，用于界定多个像素单元；可控变形层，位于所述像素界定层上，且所述可控变形层的至少一部分在平行于所述像素界定层的方向上的横向延伸是可控的。
例如，本公开至少一实施例提供的显示基板中，在垂直于所述像素界定层的方向上，所述可控变形层的横向延伸后的截面为在所述像素界定层一侧较窄的倒梯形。
例如，本公开至少一实施例提供的显示基板中，所述可控变形层的材料包括光致变形材料。
例如，本公开至少一实施例提供的显示基板中，所述光致变形材料包括偶氮苯、苯并螺吡喃、含肉桂酸基团的共聚物或聚乙烯聚合物。
例如，本公开至少一实施例提供的显示基板中，所述横向延伸通过采用第一光照射所述可控变形层而实现。
例如，本公开至少一实施例提供的显示基板中，所述横向延伸通过撤去所述第一光或者采用与所述第一光的波长范围不同的第二光照射所述可控变形层而撤回。
例如，本公开至少一实施例提供的显示基板中，所述可控变形层的材料包括磁致伸缩材料。
例如，本公开至少一实施例提供的显示基板中，所述可控变形层包括含有铽镝铁稀土超磁致伸缩粒子的树脂聚合物材料。
例如，本公开至少一实施例提供的显示基板中，所述横向延伸通过对所述可控变形层施加磁场而实现。
例如，本公开至少一实施例提供的显示基板中，所述横向延伸通过撤去对所述可控变形层施加的磁场而撤回。
例如，本公开至少一实施例提供的显示基板中，所述可控变形层的厚度为0.5μm-1.5μm。
本公开至少一实施例提供一种显示基板的制备方法，包括：形成像素界定层，所述像素界定层包括多个开口，用于界定多个像素单元；在所述像素界定层上形成可控变形层，所述可控变形层的至少一部分在平行于所述像素界定层的方向上的横向延伸是可控的。
例如，本公开至少一实施例提供的显示基板的制备方法还包括：在所述开口中填充液体材料；在干燥所述液体材料的同时，向所述可控变形层施加第一控制，使得所述可控变形层朝向所述开口的方向横向延伸。
例如，本公开至少一实施例提供的显示基板的制备方法中，在干燥所述液体材料之后，所述制备方法还包括：控制所述可控变形层，使所述可控变形层的横向延伸撤回。
例如，本公开至少一实施例提供的显示基板的制备方法中，向所述可控变形层施加第一控制包括：通过改变所述第一控制的持续时间和强度的至少之一而控制所述可控变形层的横向延伸的大小。
例如，本公开至少一实施例提供的显示基板的制备方法中，当所述可控变形层的材料为光致变形材料时，所述第一控制是第一光照；控制所述可控变形层，使所述可控变形层的横向延伸撤回包括：撤去所述第一光照，或者对所述可控变形层施加与所述第一光照波长范围不同的第二光照；通过改变所述第一控制的持续时间和强度的至少之一而控制所述可控变形层的横向 延伸的大小包括：通过改变所述第一光照的照射时间、光强度或者照射时间和光强度而控制所述可控变形层的横向延伸大小。
例如，本公开至少一实施例提供的显示基板的制备方法中，所述第一光照为紫外光照，所述第二光照为可见光照。
例如，本公开至少一实施例提供的显示基板的制备方法中，所述第一光照的光强度为20mw/cm 2-200mw/cm 2，照射时间为5s-35s。
例如，本公开至少一实施例提供的显示基板的制备方法中，当所述可控变形层的材料为磁致伸缩材料时，所述第一控制是磁场；控制所述可控变形层，使所述可控变形层的横向延伸撤回包括：撤去所述磁场。通过改变所述第一控制的持续时间和强度的至少之一而控制所述可控变形层的横向延伸的大小包括：通过改变所述磁场的作用时间、磁场强度或者作用时间和磁场强度而控制所述可控变形层的横向延伸大小。
例如，本公开至少一实施例提供的显示基板的制备方法中，所述磁场强度为100KA/m-600KA/m，所述作用时间为30s-120s。
附图说明
为了更清楚地说明本公开实施例的技术方案，下面将对实施例的附图作简单地介绍，显而易见地，下面描述中的附图仅仅涉及本公开的一些实施例，而非对本公开的限制。
图1为一种液滴在显示基板上的形态示意图；
图2为一种显示基板中有机功能层的形态示意图；
图3本公开一些实施例提供的一种显示基板的示意图；
图4为本公开一些实施例提供的一种显示基板的可控变形层在变形后的示意图；
图5为本公开一些实施例提供的一种显示基板的可控变形层的变形原理的示意图；
图6A-图6G为本公开一些实施例提供的一种显示基板在制备过程中的示意图；
图7为本公开一些实施例提供的一种显示基板在另一制备过程中的示意图。
具体实施方式
为使本公开实施例的目的、技术方案和优点更加清楚，下面将结合本公开实施例的附图，对本公开实施例的技术方案进行清楚、完整地描述。显然，所描述的实施例是本公开的一部分实施例，而不是全部的实施例。基于所描述的本公开的实施例，本领域普通技术人员在无需创造性劳动的前提下所获得的所有其他实施例，都属于本公开保护的范围。
除非另外定义，本公开使用的技术术语或者科学术语应当为本公开所属领域内具有一般技能的人士所理解的通常意义。本公开中使用的“第一”、“第二”以及类似的词语并不表示任何顺序、数量或者重要性，而只是用来区分不同的组成部分。“包括”或者“包含”等类似的词语意指出现该词前面的元件或者物件涵盖出现在该词后面列举的元件或者物件及其等同，而不排除其他元件或者物件。“连接”或者“相连”等类似的词语并非限定于物理的或者机械的连接，而是可以包括电性的连接，不管是直接的还是间接的。“上”、“下”、“左”、“右”等仅用于表示相对位置关系，当被描述对象的绝对位置改变后，则该相对位置关系也可能相应地改变。
在显示基板的制备过程中，例如在采用喷墨打印的方式形成发光元件的有机功能层时，如图1所示，喷墨打印的液滴13在滴落后，在干燥过程中，会产生向外的毛细流动1以及向内的马拉哥尼流动2。通常情况下，向外的毛细流动1的程度大于向内的马拉哥尼流动2的程度。如图2所示，当在像素界定层11内以及在第一电极12上形成有机功能材料的液体时，由于液体的上述流动，液体干燥后的形态往往不均匀，例如形成中间薄边缘厚的薄膜(俗称“咖啡环”)，使得最终形成的有机功能层13形态不均匀，影响显示基板的显示效果。
本公开至少一实施例提供一种显示基板，该显示基板包括像素界定层和可控变形层；像素界定层包括多个开口，用于界定多个像素单元；可控变形层位于像素界定层上，且可控变形层的至少一部分在平行于像素界定层的方向上的横向延伸是可控的。
本公开至少一实施例还提供一种显示基板的制备方法，包括：形成像素界定层，该像素界定层包括多个开口，用于界定多个像素单元；在像素界定层上形成可控变形层，该可控变形层的至少一部分在平行于像素界定层的方向上的横向延伸是可控的。
下面通过几个具体的实施例对本公开的显示基板及其制备方法进行说明。
本公开至少一实施例提供一种显示基板，图3示出了该显示基板的部分截面示意图。如图3所示，该显示基板包括像素界定层101和可控变形层102；像素界定层101包括多个开口1011，用于界定多个像素单元；可控变形层102位于像素界定层101上，且可控变形层102的至少一部分在平行于像素界定层101的方向(图3中的水平方向)上可横向延伸，且其横向延伸是可控的。例如，可控变形层102是否进行横向延伸以及进行横向延伸的大小是可控的。
这里的横向延伸指的是，可控变形层的至少一部分可以向开口的方向伸出。
例如，可控变形层102的横向延伸可控包括：可控变形层102可以被控制为进行横向延伸，或者可以被控制为撤回横向延伸而恢复原状，或者可以被控制为进行预设范围的横向延伸，例如横向延伸的范围可以为原始尺寸10％、20％等，本领域的技术人员可以根据需要进行选择，例如，在水平方向的原始尺寸为1μm，可以横向延伸0.1μm，也就是横向延伸后的尺寸为1.1μm。
例如，在垂直于像素界定层101所在面的方向上，可控变形层102在横向延伸后的截面可以呈现上宽下窄的形状。
例如，在一个示例中，如图4所示，可控变形层102在横向延伸后的截面为在像素界定层101一侧较窄的倒梯形。由此，在该显示基板的制备过程中，在像素界定层101的开口1011中形成有机功能材料的液体1041时，可控变形层102的横向延伸会给液体1041施加作用力，以促进液体1041向内的马拉哥尼流动、抑制液体1041向外的毛细流动，从而有助于液体1041在干燥后形成形态均匀的有机功能层104，如图3所示。由此，该显示基板具有更优质的显示效果。
例如，在一些实施例中，可控变形层102的材料包括光致变形材料。例如，光致变形材料包括偶氮苯、苯并螺吡喃、含肉桂酸基团的共聚物或聚乙烯聚合物等。例如，在一些示例中，可控变形层102的材料包括含有偶氮苯的聚酰亚胺或聚硅氧烷、含有苯并螺吡喃的聚酰亚胺、氯化聚乙烯、丙己酰-肉桂酰-乙二脂共聚物、以及含有偶氮苯、啰吡喃、二芳基乙烯或二苯乙烯 等基团的交联液晶聚合物等。
例如，当可控变形层102的材料包括光致变形材料时，可控变形层102的横向延伸可以通过采用第一光照射可控变形层102而实现。例如，可控变形层102的横向延伸可以通过撤去第一光或者采用与第一光的波长范围不同的第二光照射可控变形层102而撤回。
应该注意得的是，本公开的实施例中，可控变形层的横向延伸被撤回意指可控变形层的横向延伸消失而恢复原状，也就是，可控变形层恢复原始尺寸。
例如，在一些示例中，第一光可以为紫外光，例如波长范围为200nm-380nm的紫外光，例如波长为254nm、308nm或者360nm的紫外光，第二光例如可以为可见光，该可见光的波长范围为380nm-780nm。
例如，在一个示例中，可控变形层102的材料包括偶氮苯，由于偶氮苯基团具有较高的摩尔吸光系数，因此光子能被位于可控变形层102表面的偶氮苯基团吸收。如图5所示，当偶氮苯基元1021的取向垂直于像素界定层101的表面时(即图中的竖直方向)，紫外光(UV)照射可控变形层102后，位于可控变形层102表面的偶氮苯基元垂直弯曲，呈现弯曲状态1021A，从而使可控变形层102的表面产生各向同性的膨胀，进而导致可控变形层102的横向延伸。当处于横向延伸状态的可控变形层102受到可见光(Vis)照射后，位于可控变形层102表面的偶氮苯基元可恢复到初始状态，并且在可控变形层102中，偶氮苯基元恢复有序排列，从而可控变形层102也恢复到初始形态。
例如，在其他实施例中，第一光和第二光的波长范围可根据所选用的光致变形材料的具体类型以及性质进行选择，本公开的实施例对此不作具体限定。
例如，在另一些实施例中，可控变形层102的材料包括磁致伸缩材料。例如，在一个示例中，可控变形层102包括含有铽镝铁稀土超磁致伸缩粒子的树脂聚合物材料，该材料具有较好的磁致伸缩性能，可使可控变形层102受控后具有足够的横向延伸量。
例如，当可控变形层102的材料包括磁致伸缩材料时，可控变形层102的横向延伸可以通过对可控变形层102施加磁场而实现。例如，可控变形层102的横向延伸可以通过撤去对可控变形层102施加的磁场而撤回，也就是， 当不对可控变形层102施加磁场后，可控变形层的横向延伸可消失而恢复原状。例如，可通过在可控变形层102上方设置电磁铁或者永磁体等产生磁场，以控制可控变形层102的横向延伸。
例如，可控变形层102的厚度(即可控变形层102在垂直于像素界定层101所在面的方向上的尺寸)可以为0.5μm-1.5μm，例如0.8μm、1μm或者1.2μm等。例如，像素界定层101的厚度(即像素界定层101在垂直于像素界定层101所在面的方向上的尺寸)可以为1μm-2μm，例如1.2μm、1.5μm或者1.8μm等。此时，在显示基板的制备过程中，形成在像素界定层101中的液体的高度大于像素界定层101的高度，使得可控变形层102的横向延伸可对像素界定层101中的液体施加足够的作用力，从而有利于像素界定层101中的液体在干燥后形成均匀的薄膜。例如，在一个示例中，可控变形层102的厚度选择为约1μm，像素界定层101厚度也选择为约1μm。
例如，在一些实施例中，可控变形层102的横向延伸的大小是可控的。例如，当可控变形层102的材料为光致变形材料时，通过改变第一光的照射时间、光强度或者照射时间和光强度二者而控制可控变形层102的横向延伸大小。例如，在一些示例中，使可控变形层102产生横向延伸的第一光的照射强度设定在20mw/cm 2-200mw/cm 2，照射时间为5s-35s，此时可控变形层102的横向延伸率(可控变形层102横向延伸的长度与可控变形层102的初始长度之比)可达到约5％-30％。
例如，当可控变形层102的材料为磁致伸缩材料时，通过改变磁场的作用时间、磁场强度或者作用时间和磁场强度而控制可控变形层102的横向延伸大小。例如，在一些示例中，对可控变形层102施加的磁场强度设定为100KA/m-600KA/m，磁场作用时间为30s-120s，此时可控变形层102的磁致伸缩系数(可控变形层102横向延伸的长度与可控变形层102的初始长度之比)可达到约800PPM-6000PPM。
由此，可根据可控变形层102的具体材料选择适当的控制参数来控制可控变形层102的横向延伸程度，进而控制可控变形层102对像素界定层101中的液体施加的作用力的大小。
例如，在显示基板上方通过紫外线照射或者施加磁场等方式使得可控变形层102进行横向延伸时，由于越靠近紫外线照射或者施加磁场位置的可控变形层102的材料变形更大，因此可控变形层102在横向延伸后的截面容易 形成为在像素界定层101一侧较窄的倒梯形，并且通过控制紫外线照射或者施加磁场的强度，可控变形层102的与像素界定层101接触的表面几乎不产生变形，因此可控变形层102可与像素界定层101保持结合状态，而不会产生偏移。并且，像素界定层101通常包括有机绝缘材料，例如聚酰亚胺(PI)等，此时可控变形层102与像素界定层101接触可产生较强的分子间结合力，因此也进一步避免了可控变形层102与像素界定层101之间发生偏移。
本公开实施例提供的显示基板包括可控变形层，在该显示基板的制备过程中，可通过控制可控变形层的横向延伸使可控变形层对像素界定层中的处于干燥过程中的有机功能材料的液体施加作用力，以促进液体向内的马拉哥尼流动、抑制液体向外的毛细流动，从而液体在干燥后可形成形态均匀的有机功能层，进而提高显示基板的显示质量。
本公开至少一实施例提供一种显示基板的制备方法，包括：形成像素界定层，该像素界定层包括多个开口，用于界定多个像素单元；在像素界定层上形成可控变形层，该可控变形层的至少一部分在平行于像素界定层的方向上可横向延伸，且其横向延伸是可控的。
下面，结合图6A-图6G对本公开一些实施例提供的显示基板的制备方法进行详细介绍。
形成显示基板通常包括在衬底基板上形成像素驱动电路，然后形成发光元件，例如有机发光二极管(OLED)等，像素驱动电路可对发光元件的发光状态进行调节，进而调节显示基板的显示灰阶。像素驱动电路例如包括多个薄膜晶体管(开光晶体管、驱动晶体管等)、电容、栅线和数据线等结构。形成像素驱动电路的方法可参考常规技术，本公开的实施例对此不做限定。在驱动电路等结构形成后，形成发光元件OLED。OLED包括阳极、阴极以及位于阳极和阴极之间的有机功能层。有机功能层包括发光层，在一些实施例中，有机功能层还包括电子注入层、电子传输层、空穴注入层和空穴传输层中的一种或几种，本公开的实施例对此不做限定。下面主要介绍显示基板上发光元件OLED的形成过程。
例如，如图6A所述，首先形成OLED的阳极103以及像素界定层101。例如，阳极103的材料包括氧化铟锡(ITO)、氧化铟锌(IZO)等金属氧化物。例如，可以采用磁控溅射法等方法在已经形成有像素驱动电路的衬底基板上形成阳极材料层，然后对阳极材料层进行一次构图工艺形成阳极103。 例如，一次构图工艺包括光刻胶的涂覆、曝光、显影和刻蚀等工序，本公开的实施例对此不做具体限定。
例如，阳极103形成后，形成像素界定层101。例如，像素界定层101的材料包括有机绝缘材料，例如聚酰亚胺(PI)等。例如，可以采用涂覆等方法在阳极103上形成像素界定材料层，然后对像素界定材料层进行一次构图工艺形成像素界定层101。像素界定层101用于界定多个像素单元，每个像素单元包括一个发光元件OLED。例如，像素界定层101的形成厚度为1μm-2μm，例如1.2μm、1.5μm或者1.8μm等。通过构图工艺形成的像素界定层101包括多个开口1011，多个开口1011分别暴露出阳极103。
例如，如图6B所示，像素界定层101形成后，在像素界定层101上形成可控变形层102。例如，形成可控变形层102包括：采用涂覆等方式在像素界定层101上形成变形材料层，然后对变形材料层进行一次构图工艺形成可控变形层102。例如，可控变形层102的形成厚度为0.5μm-1.5μm，例如0.8μm、1μm或者1.2μm等。
例如，在一些实施例中，可控变形层102的材料包括光致变形材料，例如包括偶氮苯、苯并螺吡喃、含肉桂酸基团的共聚物或聚乙烯聚合物等。例如，在另一些实施例中，可控变形层102的材料包括磁致伸缩材料，例如含有铽镝铁稀土超磁致伸缩粒子的树脂聚合物材料等。当然，可控变形层102还可以包括其他可受控变形的材料，本公开的实施例对此不作具体限定。
备选地，在一些示例中，可控变形层和像素界定层可以在一次构图工艺中一起形成。例如，依次形成像素界定材料层和变形材料层，然后对像素界定材料层和变形材料层进行一次构图工艺，以形成像素界定层101和可控变形层102。本公开的实施例对可控变形层的具体形成方式不做限定。
例如，如图6C所示，可控变形层102形成后，在像素界定层101的多个开口1011中形成有机功能层。
例如，形成有机功能层包括：在开口1011中填充液体材料，例如采用喷墨打印的方式在像素界定层101的开口1011中形成有机功能材料的液体1041，并且喷墨打印的液体1041的高度大于像素界定层101的高度。如图6D所示，在干燥液体1041的同时，向可控变形层102施加第一控制，使可控变形层102朝向开口1011的方向横向延伸。例如，如图6E所示，可控变形层102在横向延伸后的截面呈现上大下小的形状，例如呈现在像素界定层 101侧较窄的倒梯形，此时，可控变形层102在横向延伸的过程中可向液体1041施加作用力，以促进液体1041向内的马拉哥尼流动、抑制液体1041向外的毛细流动，从而使液体1041在干燥后的形态更加均匀。
例如，向可控变形层102施加第一控制包括：通过改变第一控制的持续时间和强度的至少之一而控制可控变形层102的横向延伸的大小。由此，可根据可控变形层102的具体材料选择适当的控制参数来控制可控变形层102的横向延伸程度，进而控制可控变形层102对像素界定层101中的液体施加的作用力的大小。
例如，当可控变形层102的材料为光致变形材料时，第一控制是第一光照。此时，可通过改变第一光照的照射时间、光强度或者照射时间和光强度而控制可控变形层102的横向延伸大小。例如，在一些示例中，第一光照为紫外光照，例如波长范围为200nm-380nm的紫外光照，例如波长为254nm、308nm或者360nm的紫外光照。
例如，在一些示例中，第一光照的照射强度选择为20mw/cm 2-200mw/cm 2，照射时间选择为5s-35s，此时可控变形层102的横向延伸率可达到约5％-30％。由此，可根据实际生产需求选择合适的照射时间以及照射强度。
例如，当可控变形层102的材料为磁致伸缩材料时，第一控制是磁场。此时，可通过改变磁场的作用时间、磁场强度或者作用时间和磁场强度而控制可控变形层102的横向延伸大小。例如，在一些示例中，对可控变形层102施加的磁场强度选择为100KA/m-600KA/m，磁场作用时间选择为30s-120s，此时可控变形层102的磁致伸缩系数可达到约800PPM-6000PPM。由此，可根据实际生产需求选择合适的磁场强度与磁场作用时间。
例如，在图6D示出的示例中，可控变形层102的材料包括光致变形材料偶氮苯，此时，第一控制包括采用紫外光通过掩膜板110照射可控变形层102。例如，掩膜板110的透光区域110A暴露可控变形层102，从而紫外光不会照射到显示基板的其他部位，以免带来不利影响。
例如，在另一个示例中，如图7所示，当可控变形层102的材料包括磁致伸缩材料，第一控制包括在可控变形层102上方设置磁场产生装置120，并控制磁场产生装置120产生磁场。例如，磁场产生装置120为永磁体或者电磁铁等。例如，当磁场产生装置120采用电磁铁时，可通过控制对电磁铁 通电的电流大小、持续时间或者电流大小和持续时间来控制可控变形层102的横向延伸大小。
例如，磁致伸缩材料的磁致伸缩方向与所施加的磁场的方向有关，且与磁致伸缩材料的种类有关，因此可根据磁致伸缩材料的种类以及所要求的可控变形层102的横向延伸方向选择所施加的磁场方向。例如，当可控变形层102包括含有铽镝铁稀土超磁致伸缩粒子的树脂聚合物材料时，由于含有铽镝铁稀土超磁致伸缩粒子的树脂聚合物材料的磁致延伸方向与磁场方向基本一致，因此在采用磁场产生装置120施加磁场时，磁场产生装置120向可控变形层102施加与横向延伸方向平行的磁场。例如，磁场产生装置120的两个磁极在可控变形层102的上方平行于显示基板的表面放置，且产生平行于可控变形层102的横向延伸方向的磁场，从而为可控变形层102施加均匀的磁场，并使可控变形层102向像素界定层的开口方向横向延伸。
示例性地，图7仅是示出了一种示例形式的磁场产生装置，对于可控变形层102包括含有铽镝铁稀土超磁致伸缩粒子的树脂聚合物材料的情况，只要磁场产生装置能够产生平行于可控变形层的变形方向，例如，横向延伸方向的磁场或磁场分量即可，本公开的实施例不限定其磁场产生装置的设置方向以及设置方式。
例如，在其他示例中，可控变形层102所包括的磁致伸缩材料还可以为含有TbFe2(铽铁)、SmFe2(钐铁)、DyFe2(镝铁)或HoFe2(钬铁)等稀土-铁系化合物的树脂聚合物材料。此时，在采用磁场产生装置120施加磁场时，磁场产生装置120的设置位置可以根据材料的特性以及所需的延伸方向进行调整，本公开的实施例对磁致伸缩材料的种类以及磁场的施加方式不作具体限定，只要能够向可控变形层120施加磁场后能够使得可控变形层发生横向延伸即可。
例如，在一个示例中，磁场产生装置可以为形成在可控变形层102上的电磁材料层，该电磁材料层在通电时可形成施加到可控变形层102的磁场以使可控变形层102产生横向延伸，该电磁材料层的设置方式以及与可控变形层的相对位置关系可以根据磁致伸缩材料的种类而设置，只要能够向可控变形层120施加磁场后能够使得可控变形层发生横向延伸即可。
如图6F所示，像素界定层101的开口1011中形成的有机功能材料的液体1041干燥后形成为有机功能层104，该有机功能层104形态均匀。
例如，在液体1041干燥完成后，控制可控变形层102，使可控变形层102的横向延伸撤回。
例如，当可控变形层102的材料为光致变形材料时，使可控变形层102的横向延伸撤回包括：撤去第一光照，或者对可控变形层102施加与第一光照波长范围不同的第二光照。例如，在上述示例中，第一光照为紫外光照，此时，第二光照可为可见光照，该可见光的波长范围在380nm-780nm。例如，当可控变形层102的材料为磁致伸缩材料时，使可控变形层102的横向延伸撤回包括：撤去磁场。
例如，在对应于图6D所示的示例，使可控变形层102的横向延伸撤回包括：撤去紫外光照，或者采用可见光通过掩膜板110照射可控变形层102，以使可控变形层102的横向延伸撤回。对应于图7所示的示例，使可控变形层102的横向延伸撤回包括：撤去磁场，例如，停止对电磁铁通电，以使可控变形层102的横向延伸撤回。之后，例如采用机械手将显示基板从电磁铁下方移开，并移动到相应的设备，以进行后面的制备流程。
例如，如图6G所示，有机功能层104形成后，且在可控变形层102的横向延伸撤回后，在有机功能层104上形成阴极105。例如，阴极的材料包括金属材料，例如铜、铜合金、铝、铝合金、镁、镁合金等金属材料。例如，可以采用磁控溅射法等方法在有机功能层104上形成阴极材料层，然后对阴极材料层进行一次构图工艺形成阴极105。
例如，在阴极105形成后，显示基板的制备方法还包括形成有绝缘层、隔离物、封装层等结构，这些结构的形成方式可参照常规技术，本公开的实施例对此不做限定。
需要注意的是，在本公开中，可控变形层的横向延伸是可控的，在横向延伸的同时，可控变形层也可以在发生其他形式的变形，例如，在高度方向伸长，或者发生弯曲等，但只要能够确保横向延伸发生且变形是可撤回的即可，本公开不对此进行限制。
本公开实施例提供的显示基板的制备方法通过形成可控变形层，使得在该显示基板的制备过程中，可通过控制可控变形层的横向延伸使可控变形层对像素界定层中处于干燥过程中的有机功能材料的液体施加作用力，以促进液体向内的马拉哥尼流动、抑制液体向外的毛细流动，从而液体在干燥后可形成形态均匀的有机功能层，进而提高显示基板的显示质量。
还有以下几点需要说明：
(1)本公开实施例附图只涉及到与本公开实施例涉及到的结构，其他结构可参考通常设计。
(2)为了清晰起见，在用于描述本公开的实施例的附图中，层或区域的厚度被放大或缩小，即这些附图并非按照实际的比例绘制。可以理解，当诸如层、膜、区域或基板之类的元件被称作位于另一元件“上”或“下”时，该元件可以“直接”位于另一元件“上”或“下”或者可以存在中间元件。
(3)在不冲突的情况下，本公开的实施例及实施例中的特征可以相互组合以得到新的实施例。
以上所述，仅为本公开的具体实施方式，但本公开的保护范围并不局限于此，任何熟悉本技术领域的技术人员在本公开揭露的技术范围内，可轻易想到变化或替换，都应涵盖在本公开的保护范围之内。因此，本公开的保护范围应以权利要求的保护范围为准。

Claims (20)

  1. 一种显示基板，包括：
    像素界定层，包括多个开口，用于界定多个像素单元；
    可控变形层，位于所述像素界定层上，且所述可控变形层的至少一部分在平行于所述像素界定层的方向上的横向延伸是可控的。
  2. 根据权利要求1所述的显示基板，其中，在垂直于所述像素界定层的方向上，所述可控变形层的横向延伸后的截面为在所述像素界定层一侧较窄的倒梯形。
  3. 根据权利要求1或2所述的显示基板，其中，所述可控变形层的材料包括光致变形材料。
  4. 根据权利要求3所述的显示基板，其中，所述光致变形材料包括偶氮苯、苯并螺吡喃、含肉桂酸基团的共聚物或聚乙烯聚合物。
  5. 根据权利要求3所述的显示基板，其中，所述横向延伸通过采用第一光照射所述可控变形层而实现。
  6. 根据权利要求5所述的显示基板，其中，所述横向延伸通过撤去所述第一光或者采用与所述第一光的波长范围不同的第二光照射所述可控变形层而撤回。
  7. 根据权利要求1或2所述的显示基板，其中，所述可控变形层的材料包括磁致伸缩材料。
  8. 根据权利要求7所述的显示基板，其中，所述可控变形层包括含有铽镝铁稀土超磁致伸缩粒子的树脂聚合物材料。
  9. 根据权利要求7所述的显示基板，其中，所述横向延伸通过对所述可控变形层施加磁场而实现。
  10. 根据权利要求9所述的显示基板，其中，所述横向延伸通过撤去对所述可控变形层施加的磁场而撤回。
  11. 根据权利要求1-10任一所述的显示基板，其中，所述可控变形层的厚度为0.5μm-1.5μm。
  12. 一种显示基板的制备方法，包括：
    形成像素界定层，所述像素界定层包括多个开口，用于界定多个像素单元；
    在所述像素界定层上形成可控变形层，所述可控变形层的至少一部分在平行于所述像素界定层的方向上的横向延伸是可控的。
  13. 根据权利要求12所述的显示基板的制备方法，还包括：
    在所述开口中填充液体材料；
    在干燥所述液体材料的同时，向所述可控变形层施加第一控制，使得所述可控变形层朝向所述开口的方向横向延伸。
  14. 根据权利要求13所述的显示基板的制备方法，其中，在干燥所述液体材料之后，所述制备方法还包括：
    控制所述可控变形层，使所述可控变形层的横向延伸撤回。
  15. 根据权利要求14所述的显示基板的制备方法，其中，向所述可控变形层施加第一控制包括：
    通过改变所述第一控制的持续时间和强度的至少之一而控制所述可控变形层的横向延伸的大小。
  16. 根据权利要求15所述的显示基板的制备方法，其中，
    当所述可控变形层的材料为光致变形材料时，所述第一控制是第一光照；
    控制所述可控变形层，使所述可控变形层的横向延伸撤回包括：
    撤去所述第一光照，或者对所述可控变形层施加与所述第一光照波长范围不同的第二光照；
    通过改变所述第一控制的持续时间和强度的至少之一而控制所述可控变形层的横向延伸的大小包括：
    通过改变所述第一光照的照射时间、光强度或者照射时间和光强度而控制所述可控变形层的横向延伸大小。
  17. 根据权利要求16所述的显示基板的制备方法，其中，所述第一光照为紫外光照，所述第二光照为可见光照。
  18. 根据权利要求16或17所述的显示基板的制备方法，其中，所述第一光照的光强度为20mw/cm 2-200mw/cm 2，照射时间为5s-35s。
  19. 根据权利要求15所述的显示基板的制备方法，其中，
    当所述可控变形层的材料为磁致伸缩材料时，所述第一控制是磁场；
    控制所述可控变形层，使所述可控变形层的横向延伸撤回包括：
    撤去所述磁场；
    通过改变所述第一控制的持续时间和强度的至少之一而控制所述可控变形层的横向延伸的大小包括：
    通过改变所述磁场的作用时间、磁场强度或者作用时间和磁场强度而控制所述可控变形层的横向延伸大小。
  20. 根据权利要求19所述的显示基板的制备方法，其中，所述磁场强度为100KA/m-600KA/m，所述作用时间为30s-120s。
PCT/CN2019/125133 2019-03-11 2019-12-13 显示基板及其制备方法 WO2020181861A1 (zh)

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