WO2020164687A1 - Holder for substrate processing in a vacuum chamber, holding arrangement, system and method - Google Patents

Holder for substrate processing in a vacuum chamber, holding arrangement, system and method Download PDF

Info

Publication number
WO2020164687A1
WO2020164687A1 PCT/EP2019/053415 EP2019053415W WO2020164687A1 WO 2020164687 A1 WO2020164687 A1 WO 2020164687A1 EP 2019053415 W EP2019053415 W EP 2019053415W WO 2020164687 A1 WO2020164687 A1 WO 2020164687A1
Authority
WO
WIPO (PCT)
Prior art keywords
holder
magnet
substrate
holding assembly
holding
Prior art date
Application number
PCT/EP2019/053415
Other languages
English (en)
French (fr)
Inventor
Matthias HEYMANNS
Sathiyamurthi GOVINDASAMY
Jens GRÖLS
Tommaso Vercesi
Original Assignee
Applied Materials, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials, Inc. filed Critical Applied Materials, Inc.
Priority to CN201980091964.2A priority Critical patent/CN113454261A/zh
Priority to PCT/EP2019/053415 priority patent/WO2020164687A1/en
Publication of WO2020164687A1 publication Critical patent/WO2020164687A1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/67346—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders characterized by being specially adapted for supporting a single substrate or by comprising a stack of such individual supports
PCT/EP2019/053415 2019-02-12 2019-02-12 Holder for substrate processing in a vacuum chamber, holding arrangement, system and method WO2020164687A1 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
CN201980091964.2A CN113454261A (zh) 2019-02-12 2019-02-12 用于在真空腔室中的基板处理的支架、固持布置、系统和方法
PCT/EP2019/053415 WO2020164687A1 (en) 2019-02-12 2019-02-12 Holder for substrate processing in a vacuum chamber, holding arrangement, system and method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/EP2019/053415 WO2020164687A1 (en) 2019-02-12 2019-02-12 Holder for substrate processing in a vacuum chamber, holding arrangement, system and method

Publications (1)

Publication Number Publication Date
WO2020164687A1 true WO2020164687A1 (en) 2020-08-20

Family

ID=65433664

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2019/053415 WO2020164687A1 (en) 2019-02-12 2019-02-12 Holder for substrate processing in a vacuum chamber, holding arrangement, system and method

Country Status (2)

Country Link
CN (1) CN113454261A (zh)
WO (1) WO2020164687A1 (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2022089746A1 (en) * 2020-10-29 2022-05-05 Applied Materials, Inc. Magnetic fixture, substrate support assembly and method for fixing an edge support frame to a table frame

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0897675A1 (en) * 1996-05-10 1999-02-24 Shishiai-Kabushikigaisha Energy conversion composition
US20070006807A1 (en) * 2005-04-20 2007-01-11 Dieter Manz Magnetic mask holder
WO2011141031A1 (en) * 2010-05-11 2011-11-17 Hindsbo Magneter Aps Suspension arrangement
KR20150069104A (ko) * 2013-12-13 2015-06-23 주식회사 에스에프에이 박막 증착 장치
US20150179710A1 (en) * 2013-12-23 2015-06-25 Samsung Display Co., Ltd. Method of manufacturing organic light emitting display apparatus
WO2017101971A1 (en) * 2015-12-14 2017-06-22 Applied Materials, Inc. Processing system for two-side processing of a substrate and method of two-side processing of a substrate
US9773600B2 (en) * 2014-09-17 2017-09-26 Samsung Display Co., Ltd. Magnet plate assembly, deposition apparatus including the same, and deposition method using the same

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0897675A1 (en) * 1996-05-10 1999-02-24 Shishiai-Kabushikigaisha Energy conversion composition
US20070006807A1 (en) * 2005-04-20 2007-01-11 Dieter Manz Magnetic mask holder
WO2011141031A1 (en) * 2010-05-11 2011-11-17 Hindsbo Magneter Aps Suspension arrangement
KR20150069104A (ko) * 2013-12-13 2015-06-23 주식회사 에스에프에이 박막 증착 장치
US20150179710A1 (en) * 2013-12-23 2015-06-25 Samsung Display Co., Ltd. Method of manufacturing organic light emitting display apparatus
US9773600B2 (en) * 2014-09-17 2017-09-26 Samsung Display Co., Ltd. Magnet plate assembly, deposition apparatus including the same, and deposition method using the same
WO2017101971A1 (en) * 2015-12-14 2017-06-22 Applied Materials, Inc. Processing system for two-side processing of a substrate and method of two-side processing of a substrate

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
K.-H. HABIG: "Wear behaviour of surface coatings on steels", TRIBOLOGY INTERNATIONAL, VOLUME 22, ISSUE 2, 1 January 1989 (1989-01-01), pages 65 - 73, XP055631345, Retrieved from the Internet <URL:https://www.sciencedirect.com/science/article/pii/0301679X89901679/pdf?md5=0cdc053588d3e3133cf94f8af3400d4f&pid=1-s2.0-0301679X89901679-main.pdf> [retrieved on 20191011], DOI: https://doi.org/10.1016/0301-679X(89)90167-9 *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2022089746A1 (en) * 2020-10-29 2022-05-05 Applied Materials, Inc. Magnetic fixture, substrate support assembly and method for fixing an edge support frame to a table frame

Also Published As

Publication number Publication date
CN113454261A (zh) 2021-09-28

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