WO2020143218A1 - 掩膜单元及其制作方法、掩膜版 - Google Patents

掩膜单元及其制作方法、掩膜版 Download PDF

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Publication number
WO2020143218A1
WO2020143218A1 PCT/CN2019/098694 CN2019098694W WO2020143218A1 WO 2020143218 A1 WO2020143218 A1 WO 2020143218A1 CN 2019098694 W CN2019098694 W CN 2019098694W WO 2020143218 A1 WO2020143218 A1 WO 2020143218A1
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WIPO (PCT)
Prior art keywords
mask
mask opening
opening
unit
mask unit
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Ceased
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PCT/CN2019/098694
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English (en)
French (fr)
Inventor
康梦华
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Kunshan Govisionox Optoelectronics Co Ltd
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Kunshan Govisionox Optoelectronics Co Ltd
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Publication of WO2020143218A1 publication Critical patent/WO2020143218A1/zh
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Ceased legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation

Definitions

  • the present application relates to the field of display technology, for example, to a mask unit, a manufacturing method thereof, and a mask plate.
  • OLED Organic Light-Emitting Diode
  • LCD Organic Light-Emitting Diode
  • the organic material is vacuum-evaporated on the base substrate after being heated.
  • a mask plate is required to define the evaporation area.
  • the mask can be used to define evaporation regions such as red sub-pixel evaporation regions, green sub-pixel evaporation regions, and blue sub-pixel evaporation regions, corresponding to the size of the mask opening of each evaporation region It is on the order of micrometers, so the mask used for evaporation is a fine metal mask (FMM).
  • FMM fine metal mask
  • the FMM is generally prepared by a strip mask unit (FMM sheet) process, and the strip mask unit is individually welded to the mask plate by a netting process On the frame, a plurality of strip mask units are spliced into an FMM of a required size. Therefore, the opening of the sub-pixel position on the strip mask unit determines the position of the sub-pixel after evaporation, and the opening of the sub-pixel position on the strip mask unit Position accuracy is particularly important.
  • FMM sheet strip mask unit
  • Embodiments of the present application provide a mask unit, a manufacturing method thereof, and a mask plate, to solve the problem that the position of the opening of the sub-pixel position on the strip mask unit may be shifted during the web opening process.
  • An embodiment of the present application provides a method for manufacturing a mask unit, including:
  • a mask opening is formed on the main body of the mask unit according to the offset amount of the mask opening and the preset mask opening position, so that the mask opening of the mask unit is located at the preset mask opening position after stretching the web .
  • the acquiring the tensile displacement data of the stretched web includes: forming a standard mask unit with a mask opening at a predetermined mask opening position; stretching the standard mask unit to obtain the net The tensile displacement of the stretched mesh is simulated.
  • stretching the standard mask unit to stretch the net to obtain the simulated displacement data of the stretched net includes: stretching the standard mask unit to stretch the net and acquiring the standard The stretched simulated displacement image of the stretched net of the mask unit; obtaining the stretched simulated displacement data of the stretched net based on the stretched simulated displacement image of the stretched net
  • calculating the offset of the mask opening of the mask unit based on the tensile displacement data of the stretched mesh includes: selecting a plurality of mask opening test points on the standard mask unit; according to the standard The tensile displacement of the tensile net of the mask unit is used to obtain the offsets of the test points of the mask openings; the offsets of all the mask openings are obtained according to the offsets of the test points of the mask openings .
  • selecting a plurality of mask opening test points on the standard mask unit includes: selecting all mask openings on the standard unit as mask opening test points.
  • the standard mask unit includes multiple display panel evaporation areas; selecting multiple mask opening test points on the standard mask unit includes: each of the standard mask units The evaporation area of the display panel is divided into N parts, and the mask opening at the center of each part is selected as the mask opening test point.
  • the standard mask unit includes multiple display panel evaporation areas; selecting multiple mask opening test points on the standard mask unit includes: each of the standard mask units The evaporation area of the display panel is divided into N parts, and the mask opening at the edge of each part is selected as the mask opening test point.
  • obtaining the offsets of all the mask openings according to the offsets of the plurality of mask opening test points includes: forming a preset according to the offsets of the plurality of mask opening test points A graph of the relationship between the position of the mask opening and the offset; according to the graph of the relationship between the preset position of the mask opening and the amount of offset, the offset of each mask opening is obtained.
  • a mask opening is formed on the body of the mask unit according to the offset of the mask opening and the preset mask opening position, so that the mask opening of the mask unit is located after stretching the web
  • the preset position of the mask opening includes: obtaining a reverse compensation amount of the same magnitude and opposite direction according to the offset amount of the mask opening; shifting the preset mask opening position by the The position of the reverse compensation amount is used as the mask opening position of the mask unit, so that the mask opening of the mask unit is located at the preset mask opening position after the web is stretched.
  • An embodiment of the present application further provides a mask unit, including: a mask unit body;
  • the mask unit body includes at least one mask opening; the mask opening is formed according to the following manufacturing method of the mask unit:
  • a mask opening is formed on the main body of the mask unit according to the offset amount of the mask opening and the preset mask opening position, so that the mask opening of the mask unit is located at the preset mask opening position after stretching the web .
  • each of the display panel evaporation regions includes a plurality of rows of sub-pixel position openings perpendicular to the stretching direction of the sheet network; each In all the column sub-pixel position openings in the evaporation area of the display panel, the spacing between the openings of two adjacent sub-pixel positions in each column of sub-pixel position openings gradually increases from the middle region to the edge region along the stretching direction of the web Decrease.
  • An embodiment of the present application also provides a mask plate, which includes a plurality of mask units provided by any embodiment of the present application, and the plurality of mask units are sequentially welded to the mask frame in a direction perpendicular to the stretching direction of the web .
  • the simulated tensile data of the stretched mesh is obtained, and the offset of the mask opening after the stretched net of the mask unit is calculated according to the simulated tensile data of the stretched mesh
  • the mask opening is formed on the body of the mask unit according to the offset of the mask opening and the preset mask opening position, so that the mask opening is located at the preset mask opening position after the mask unit is stretched by the web.
  • the offset of the mask opening during the stretching process of the mesh is pre-compensated to ensure a higher position accuracy of the mask opening after the stretching of the mesh, Furthermore, a higher position accuracy of the pixels vapor-deposited by the mask unit is ensured, and display abnormalities such as color spots and color shifts caused by reduced pixel accuracy are avoided.
  • Figure 1 is a schematic diagram of a mask unit
  • Figure 2 is a schematic diagram of a net-opening process
  • FIG. 3 is a schematic diagram of a method for manufacturing a mask unit provided by an embodiment of the present application.
  • FIG. 4 is a schematic diagram of a simulated displacement image of tension stretching of a standard mask unit provided by an embodiment of the present application
  • FIG. 5 is a schematic diagram of another method for manufacturing a mask unit provided by an embodiment of the present application.
  • FIG. 6 is a curve diagram of a relationship between a preset mask opening position and an offset provided by an embodiment of the present application
  • FIG. 7 is a schematic diagram of a mask unit provided by an embodiment of the present application.
  • FIG. 8 is a schematic diagram of the evaporation area of the display panel in FIG. 7;
  • FIG. 9 is a schematic diagram of the display panel evaporation area of FIG. 8 after undergoing a net stretching process
  • FIG. 10 is a schematic diagram of a mask provided by an embodiment of the present application.
  • a plurality of mask openings 111 are provided on the mask unit 1, which are arranged to form a plurality of sub-pixels by evaporation, and a plurality of strip-shaped mask units 1 shown in FIG. 1 are welded by a net stretching process
  • the strip-shaped mask unit 1 is stretched along the X direction and welded to the mask frame 2.
  • the mask opening 111 on the mask unit 1 is shifted due to the pulling force on both sides in the X direction. As shown in FIGS.
  • the mask opening 111 is shifted in the Y direction, and the position of the mask opening 111 is contracted, so that the position accuracy of the mask opening 111 is reduced, so that the position accuracy of the sub-pixels formed through the mask opening 111 is reduced, which affects pixel display.
  • the embodiment of the present application provides a manufacturing method of the mask unit.
  • the manufacturing method of the mask unit include:
  • obtaining the simulated displacement data of the tension stretching may include: forming a standard mask unit with a mask opening at a predetermined mask opening position; stretching the standard mask unit to stretch the mesh to obtain the tension stretch Simulated displacement data.
  • the mask unit 1 shown in FIG. 1 is a standard mask unit, and the mask opening 111 on the standard mask unit is located at a preset mask opening position.
  • the preset mask opening position is the mask opening position consistent with the position of the sub-pixel to be evaporated. For example, referring to FIG. 1, if the shapes of the sub-pixels that need to be vapor-deposited are arranged in a matrix, all the mask openings 111 are arranged in a matrix that matches the size and position of the sub-pixels that need to be vapor-deposited.
  • the simulated stretching data of the stretching of the mesh of each mask opening 111 in the standard mask unit can be obtained. That is, in this embodiment, the standard mask unit is subjected to a net stretching test to obtain the amount of change in the position of the mask opening 111 before and after the net stretching.
  • stretching the standard mask unit to obtain the simulated displacement data of stretching the net may include: stretching the standard mask unit to obtain the stretch of the standard mask unit Stretch simulation displacement image; obtain stretch simulation displacement data based on the stretch simulation displacement image.
  • a simulated displacement image of the stretch of the mesh stretched by the standard mask unit is obtained.
  • the deformation of the standard mask unit at different positions before and after the stretched net is different.
  • Figure 4 shows the contour lines of the deformed variable.
  • the edges of the standard mask unit The deformation of region B is larger, because the standard mask unit is stretched in the X direction only, that is, the standard mask unit is stretched in one direction, so that the Y direction perpendicular to the X direction shrinks As shown in FIG. 4, the edge region B of the standard mask unit shrinks severely.
  • the stretched simulated displacement data of each mask opening 111 can be obtained.
  • the data refers to the distance that each mask opening 111 deviates from the preset mask opening position after the standard mask unit is stretched.
  • the value A represents the mask opening
  • the displacement amount of 111 is 5 microns
  • the simulated displacement data of the stretch of the opening of the mask opening 111 is 5 microns.
  • the simulated displacement data of the stretching of each mask opening 111 refers to the amount of displacement of each mask opening 111 from the position of the preset mask opening after the stretching of the mesh of the standard mask unit, that is, the mask The offset of the opening 111.
  • the offset of the mask opening 111 at each position of the mask unit 1 is similar to that of the standard mask unit, so this embodiment
  • the measurement of the displacement data of the tensile stretching of the membrane unit of the membrane unit calculates the offset of the mask opening 111 at each position of the mask unit 1.
  • each mask opening 111 shrinks in the Y direction, then the offset of each mask opening 111 can record the shrinkage of each mask opening 111 in the Y direction.
  • each mask opening 111 also has a certain amount of offset. The offset of each mask opening 111 in the X direction can be obtained according to the tensile displacement data of the net stretching of the standard mask unit the amount.
  • the mask opening 111 of the mask unit 1 after stretching the web is located at a predetermined mask opening position.
  • the offset is D(-5,4)
  • the preset opening position is P(m ,n)
  • the mask opening 111 The coordinates are set to P'(m+5, n-4). Then, after the mask opening 111 is shifted by an offset D (-5, 4), it just falls at the preset opening position P.
  • the manufacturing method of the mask unit obtains the simulated tensile data of the stretch of the stretched net by performing the tensile test of the stretched net of the mask unit, and calculates the stretched net of the mask unit according to the simulated stretched data of the stretched net
  • a mask opening is formed on the body of the mask unit according to the offset of the mask opening and the preset position of the mask opening, so that after the mask unit is stretched by the web, the mask The opening is at a predetermined mask opening position.
  • the offset of the mask opening during the stretching of the mesh is pre-compensated to ensure that the mask opening has a higher position accuracy after the stretching of the mesh. Furthermore, it is ensured that the pixels vapor-deposited by the mask unit have high position accuracy, and avoid display problems such as color spots and color shift caused by the decrease in pixel accuracy.
  • calculating the offset of the mask opening of the mask unit based on the tensile displacement data of the stretched mesh may include: selecting a plurality of mask opening test points on the standard mask unit; according to the standard mask unit The tensile displacement data of the stretched net is used to obtain the offset of multiple mask opening test points; the offset of the mask opening is obtained according to the offset of multiple mask opening test points.
  • multiple mask openings 111 need to be selected as test points to obtain multiple mask opening tests The offset of the point.
  • all the mask openings 111 on the mask unit 1 can be used as test points to obtain the offset of each mask opening 111.
  • a plurality of representative mask openings 111 can also be selected as mask opening test points to obtain the offset of the mask opening test point, and then according to the offset of the mask opening test point, Infer or calculate the offset of all mask openings on the standard mask unit.
  • a mask opening is formed on the body of the mask unit according to the offset of the mask opening and the preset position of the mask opening, so that the mask opening of the mask unit is located at the preset position after stretching the web
  • the position of the mask opening may include: obtaining a reverse compensation amount that is the same size and opposite direction according to the offset amount of the mask opening; and a position where the preset mask opening position is offset by the reverse compensation amount is used as a mask The mask opening position of the unit, so that the mask opening of the mask unit is located at the preset mask opening position after the stretching of the web.
  • the offset is D(-5, 4)
  • the preset opening position is P(m, n)
  • the reverse compensation amount of the mask opening 111 is D'(5, -4)
  • the preset opening position P is shifted from the position P'after the reverse compensation amount D'as the mask when the mask unit 1 is made
  • the mask opening position of the opening 111 that is, the mask opening position is set to P'(m+5, n-4), then the mask opening 111 is located at the preset mask opening position after the web is stretched.
  • the amount of reverse compensation is added to the mask opening position in advance on the basis of the preset mask opening position, so that After the mask unit is stretched, the mask opening position is exactly at the preset mask opening position, which increases the accuracy of the mask opening position.
  • the manufacturing method of the mask unit may specifically include:
  • a tensile test is performed through a standard mask unit, and a simulated tensile displacement image of the tensile net of the standard mask unit is obtained, and a tensile simulation of the tensile network is obtained from the simulated displacement image of the tensile network. Displacement data.
  • each mask unit 1 includes a plurality of display panel evaporation regions 11, and each display panel evaporation region 11 corresponds to the evaporation of the display area of one display panel, respectively.
  • the plating area 11 includes a plurality of mask openings 111.
  • Each display panel evaporation area 11 can be divided into N parts.
  • the mask opening 111 at the center of each part is selected as the mask opening test point, or the edge position of each part
  • the mask opening 111 serves as a mask opening test point.
  • N may be 9 or 25 or the like.
  • obtaining offsets of all mask openings according to offsets of multiple mask opening test points may include: forming preset mask openings according to offsets of multiple mask opening test points Position-offset relationship curve; according to the preset mask opening position-offset relationship curve, obtain the offset of all mask openings.
  • the correspondence relationship between the preset mask opening position and the mask opening offset of multiple mask opening test points is obtained and found in the coordinate system of the preset mask opening position P-offset D
  • the coordinate position C of multiple mask opening test points is marked, and finally the coordinate points of the preset mask opening position P-offset D corresponding to the coordinate position C of all mask opening test points are sequentially connected,
  • the corresponding relationship between the position P and the offset D obtains the offset of the mask opening 111.
  • the preset mask opening position P represents a plane coordinate position where one coordinate value is fixed and another coordinate value changes
  • the offset D represents the offset position of the preset mask opening position P in one coordinate direction
  • the graph shown in FIG. 6 can record the relationship between the two preset mask opening positions P-offset D Figures, referring to FIGS.
  • the relationship curve between the preset mask opening position P that changes in the X direction and the offset D in the Y direction can be obtained; the preset mask opening position P that changes in the X direction can be obtained The relationship curve of the offset D in the X direction; gradually change the fixed value of the preset mask opening position P in the Y direction, so that the preset mask opening position P can be obtained on the plane formed by the X direction and the Y direction At any position, the plane coordinate of the corresponding offset D.
  • the coordinate value n of the preset mask opening position P on the Y axis may be fixed, and the preset opening position is P(m, n), then the set of preset opening positions P is A straight line parallel to the X direction records the offset of the preset opening position P in the Y direction, then only the offset of the preset mask opening position P that changes in the X direction in the Y direction is recorded in FIG. 6 .
  • the set of preset opening positions P is a straight line parallel to the X direction, and only the preset opening position P in the X direction is recorded at this moment.
  • the offset D of the preset opening position P in the plane formed by the X direction and the Y direction is obtained.
  • the fixed coordinate value n of the preset mask opening position P on the Y axis is gradually changed, for example, the coordinate value of the preset mask opening position P on the Y axis is fixed to n1, n2, And other fixed values, in this embodiment, the offset D when acquiring a plurality of sets of preset opening positions P as straight lines parallel to the X direction can be obtained, and multiple straight lines parallel to the X direction can cover the entire X direction and Y direction to form The plane of X can be obtained in the entire plane composed of the X direction and the Y direction.
  • the offset D changes with the position of the preset mask opening position P, and the preset mask opening position P of the mask opening 111 according to any position To obtain the offset of the mask opening 111.
  • the reverse compensation amount can be obtained according to the offset.
  • the distance of the reverse compensation amount from the preset mask opening position is equal to the offset amount, and the direction is opposite, so that the reverse compensation amount can play a pre-compensating role for the offset amount.
  • the position where the preset mask opening position is shifted by the reverse compensation amount is used as the mask opening position of the mask unit, so that the mask opening of the mask unit after the stretched net is located at the preset mask opening position.
  • the amount of reverse compensation is added to the mask opening position in advance on the basis of the preset mask opening position, so that After the mask unit is stretched, the mask opening position is exactly at the preset mask opening position, which increases the accuracy of the mask opening position.
  • the process of setting the mask opening position of the mask unit is simplified, and the production of the mask unit is accelerated .
  • the embodiment of the present application further provides a mask unit.
  • the mask unit of this embodiment includes: a mask unit body 12;
  • the mask unit body 12 includes at least one mask opening 111; the mask opening 111 is formed according to the following manufacturing method of the mask unit:
  • a mask opening 111 is formed on the mask unit body 12 according to the offset amount of the mask opening 111 and the preset mask opening position, so that the mask opening 111 of the mask unit 1 is located at the preset mask after the web is stretched Location of membrane opening.
  • the mask unit provided in this embodiment obtains the simulated stretch data of the stretched mesh by performing the stretched tensile experiment on the mask unit, and calculates the mask after the stretched mesh of the mask unit according to the simulated displacement data of the stretched mesh
  • the offset of the film opening, a mask opening is formed on the body of the mask unit according to the offset of the mask opening and the preset position of the mask opening, so that after the mask unit is stretched by the web, the mask opening is located at the preset Mask opening position.
  • the offset of the mask opening during the stretching of the mesh is pre-compensated to ensure that the mask opening has a higher position accuracy after the stretching of the mesh. Furthermore, it is ensured that the pixels vapor-deposited by the mask unit have high position accuracy, and avoid display problems such as color spots and color shift caused by the decrease in pixel accuracy.
  • each display panel evaporation region 11 includes stretching perpendicular to the web Multiple rows of sub-pixel position openings in the direction X; among all the row of sub-pixel position openings in the evaporation area 11 of each display panel, the spacing between the openings of two adjacent sub-pixel positions in each row of sub-pixel position openings stretches along the web In the direction X, the area gradually decreases from the middle area to the edge area.
  • the display panel evaporation area 11 may include a plurality of sub-pixel position openings.
  • each display panel evaporation area 11 is provided along the Y direction perpendicular to the X direction.
  • the sub-pixel position openings are arranged, and the sub-pixel position openings are provided as mask openings 111 for vapor-depositing each sub-pixel.
  • Each column of sub-pixel position openings includes a plurality of sub-pixel position openings, and the opening distance L between two adjacent sub-pixel positions is the same.
  • the opening distance L of two adjacent sub-pixel positions of each column gradually decreases, and thus passes through the mask unit 1
  • all the sub-pixel position openings in the evaporation area 11 of the display panel are located at the preset mask opening positions, as shown in FIG.
  • the position opening pitch L is the same, and all the sub-pixel position openings form a matrix arrangement, so that through the mask unit, a matrix arrangement of sub-pixel arrays can be formed by evaporation.
  • An embodiment of the present application also provides a mask plate, referring to FIG. 10, including a mask unit 1 provided by any embodiment of the present application, a plurality of mask units 1 are sequentially welded to the mask plate along a direction X perpendicular to the stretching direction of the web Frame 2.
  • the mask plate provided in this embodiment stretches the mask unit 1 on the web stretching Pre-compensation for the offsets that occur during the process ensures that the mask opening 1 has a higher positional accuracy after the stretching of the mask unit 1 and thus ensures that the pixels vaporized by the masking unit have a higher positional accuracy.

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Abstract

一种掩膜单元及其制作方法和掩膜版，该掩膜单元的制作方法包括：获取张网拉伸模拟位移数据；根据张网拉伸模拟位移数据计算掩膜单元的掩膜开口的偏移量；根据掩膜开口的偏移量以及预设掩膜开口位置在掩膜单元本体上形成掩膜开口，以使在张网拉伸后所述掩膜单元的掩膜开口位于预设掩膜开口位置。所制作的掩模单元及掩膜版由于在制作过程中对掩膜开口在张网拉伸过程中出现的偏移量进行预补偿，保证在张网拉伸后，掩膜开口的较高位置精度，进而保证通过掩膜单元蒸镀的像素的较高位置精度，从而避免了由于像素精度降低引起的彩斑、色偏等显示异常问题。

Description

掩膜单元及其制作方法、掩膜版
本申请要求在2019年01月09日提交中国专利局、申请号为201910020178.5的中国专利申请的优先权，该申请的全部内容通过引用结合在本公开中。
技术领域
本申请涉及显示技术领域，例如涉及一种掩膜单元及其制作方法、掩膜版。
背景技术
有机发光二极管(Organic Light-Emitting Diode，OLED)显示面板是通过有机发光材料在电场驱动下发光的显示器件，与液晶显示面板相比，有机发光显示面板更轻薄，具有更好的视角和对比度等优势，因此受到了人们的广泛关注。
在OLED显示面板的制备过程中，有机材料是被加热后真空蒸镀在衬底基板上的，在有机材料的蒸镀过程中，需要使用掩膜版来界定蒸镀区域。示例性的，通过掩膜版可限定出红色子像素蒸镀区域、绿色子像素蒸镀区域以及蓝色子像素蒸镀区域等蒸镀区域，对应每个蒸镀区域的掩膜版开口的尺寸为微米量级，所以，蒸镀使用的掩膜版为精密金属掩膜版(fine metal mask，FMM)。因为目前蒸镀使用的FMM的尺寸较大，无法一体加工成型，一般将FMM采用条状掩膜单元(FMM sheet)工艺制备，并将条状掩膜单元通过张网工艺单独焊接在掩膜版框架上，多条条状掩膜单元拼接成为需要尺寸的FMM，所以，条状掩膜单元上子像素位置开口决定了蒸镀后子像素的位置，条状掩膜单元上子像素位置开口的位置精度尤为重要。
但是，在条状掩膜单元的张网工艺中，由于条状掩膜单元受到沿张网拉伸方向上拉力的影响，条状掩膜单元上子像素位置开口的位置会发生偏移，且无法通过张网及后续工艺进行补正，从而直接影响到蒸镀后的像素的位置精度，引起彩斑、色偏等显示异常问题。
发明内容
本申请实施例提供了一种掩膜单元及其制作方法、掩膜版，以解决条状掩膜单元上子像素位置开口的位置在张网过程中会发生偏移的问题。
本申请实施例提供了一种掩膜单元的制作方法，包括：
获取张网拉伸模拟位移数据；
根据张网拉伸模拟位移数据计算掩膜单元的掩膜开口的偏移量；
根据掩膜开口的偏移量以及预设掩膜开口位置在掩膜单元本体上形成掩膜开口，以使在张网拉伸后所述掩膜单元的掩膜开口位于预设掩膜开口位置。
在一实施例中，所述获取张网拉伸模拟位移数据，包括：形成掩膜开口位于预设掩膜开口位置的标准掩膜单元；将所述标准掩膜单元进行张网拉伸，获取所述张网拉伸模拟位移数据。
在一实施例中，将所述标准掩膜单元进行张网拉伸，获取所述张网拉伸模拟位移数据，包括：将所述标准掩膜单元进行张网拉伸，并获取所述标准掩膜单元的张网拉伸模拟位移图像；根据所述张网拉伸模拟位移图像获取所述张网拉伸模拟位移数据。
在一实施例中，根据张网拉伸模拟位移数据计算掩膜单元的掩膜开口的偏移量，包括：在所述标准掩膜单元上选取多个掩膜开口测试点；根据所述标准掩膜单元的张网拉伸模拟位移数据，获取所述多个掩膜开口测试点的偏移量；根据所述多个掩膜开口测试点的偏移量获取所有掩膜开口的偏移量。
在一实施例中，在所述标准掩膜单元上选取多个掩膜开口测试点，包括：选取所述标准单元上所有的掩膜开口作为掩膜开口测试点。
在一实施例中，所述标准掩膜单元包括多个显示面板蒸镀区；在所述标准掩膜单元上选取多个掩膜开口测试点，包括：将所述标准掩膜单元的每个显示面板蒸镀区均分为N部分，选择每部分中心位置的掩膜开口作为掩膜开口测试点。
在一实施例中，所述标准掩膜单元包括多个显示面板蒸镀区；在所述标准掩膜单元上选取多个掩膜开口测试点，包括：将所述标准掩膜单元的每个显示面板蒸镀区均分为N部分，选择每部分边缘位置的掩膜开口作为掩膜开口测试点。
在一实施例中，根据所述多个掩膜开口测试点的偏移量获取所有掩膜开口的偏移量，包括：根据所述多个掩膜开口测试点的偏移量，形成预设掩膜开口位置-偏移量的关系曲线图；根据所述预设掩膜开口位置-偏移量的关系曲线图，获取每个掩膜开口的偏移量。
在一实施例中，根据掩膜开口的偏移量以及预设掩膜开口位置在掩膜单元本体上形成掩膜开口，以使在张网拉伸后所述掩膜单元的掩膜开口位于预设掩膜开口位置，包括：根据所述掩膜开口的偏移量获取与所述偏移量大小相同、方向相反的反向补偿量；将所述预设掩膜开口位置偏移所述反向补偿量的位置作为掩膜单元的掩膜开口位置，以使张网拉伸后所述掩膜单元的掩膜开口位于预设掩膜开口位置。
本申请实施例还提供了一种掩膜单元，包括：掩膜单元本体；
所述掩膜单元本体包括至少一个掩膜开口；所述掩膜开口根据下述掩膜单元的制作方法形成：
获取张网拉伸模拟位移数据；
根据张网拉伸模拟位移数据计算掩膜单元的掩膜开口的偏移量；
根据掩膜开口的偏移量以及预设掩膜开口位置在掩膜单元本体上形成掩膜开口，以使在张网拉伸后所述掩膜单元的掩膜开口位于预设掩膜开口位置。
在一实施例中，在沿张网拉伸方向上，包括多个显示面板蒸镀区，每个所述显示面板蒸镀区包括垂直于张网拉伸方向上的多列子像素位置开口；每个所述显示面板蒸镀区的所有列子像素位置开口中，每列子像素位置开口中相邻两个子像素位置开口之间的间距，在沿张网拉伸方向上，由中间区域至边缘区域逐渐减小。
本申请实施例还提供了一种掩膜版，包括多个本申请任意实施例提供的掩膜单元，多个所述掩膜单元沿垂直于张网拉伸方向依次焊接在掩膜版框架上。
本发明中，通过对掩膜单元进行张网拉伸实验，获取张网拉伸模拟位移数据，并根据张网拉伸模拟位移数据计算掩膜单元张网拉伸后的掩膜开口的偏移量，根据掩膜开口的偏移量和预设掩膜开口位置在掩膜单元本体上形成掩膜开口，使得掩膜单元经过张网拉伸后，掩膜开口位于预设掩膜开口位置。本发明实施例在掩膜单元的制作过程中，对掩膜开口在张网拉伸过程中出现的偏移量进行预补偿，保证在张网拉伸后，掩膜开口的较高位置精度，进而保证通过掩膜单元蒸镀的像素的较高位置精度，避免因为像素精度降低引起的彩斑、色偏等显示异常问题。
附图概述
图1是一种掩膜单元的示意图；
图2是一种张网工艺的示意图；
图3是本申请一实施例提供的一种掩膜单元的制作方法的示意图；
图4是本申请一实施例提供的一种标准掩膜单元的张网拉伸模拟位移图像示意图；
图5是本申请一实施例提供的另一种掩膜单元的制作方法的示意图；
图6是本申请一实施例提供的一种预设掩膜开口位置-偏移量的关系曲线图；
图7是本申请一实施例提供的一种掩膜单元的示意图；
图8是图7中显示面板蒸镀区的示意图；
图9是图8中显示面板蒸镀区经过张网拉伸工艺后的示意图；
图10是本申请一实施例提供的一种掩膜版的示意图。
具体实施方式
下面结合附图和实施例对本申请作进一步的详细说明。可以理解的是，此处所描述的具体实施例仅仅设置为解释本申请，而非对本申请的限定。另外，为了便于描述，附图中仅示出了与本申请相关的部分而非全部结构。
参考图1和图2，掩膜单元1上设置有多个掩膜开口111，设置为蒸镀形成多个子像素，将多个图1所示的条形的掩膜单元1通过张网工艺焊接在掩膜版框架2上，示例性的，在相互垂直的X方向和Y方向构成的平面内，条形的掩膜单元1沿X方向进行拉伸，并焊接在掩膜版框架2上。但是掩膜单元1在进行张网时，由于受到沿X方向上两侧拉力的作用，掩膜单元1上的掩膜开口111会发生偏移，如图1和图2所示，掩膜开口111在Y方向上产生偏移，掩膜开口111位置产生内缩，使得掩膜开口111的位置精度降低，从而通过掩膜开口111形成的子像素的位置精度下降，影响像素显示。
为解决掩膜单元1在张网工艺后，掩膜开口的偏移量较大的问题，本申请实施例提供了一种掩膜单元的制作方法，参考图3，该掩膜单元的制作方法包括：
S301、获取张网拉伸模拟位移数据。
在一实施例中，获取张网拉伸模拟位移数据，可以包括：形成掩膜开口位于预设掩膜开口位置的标准掩膜单元；将标准掩膜单元进行张网拉伸，获取张网拉伸模拟位移数据。
参考图1，图1中示出的掩膜单元1即为标准掩膜单元，标准掩膜单元上的掩 膜开口111位于预设掩膜开口位置。预设掩膜开口位置即为与需要蒸镀的子像素的位置一致的掩膜开口位置。例如，参考图1，若需要蒸镀的子像素的形状排布为矩阵排列，则所有掩膜开口111呈与需要蒸镀的子像素大小、位置一致的矩阵排列。通过对该标准掩膜单元进行张网拉伸，能够获取标准掩膜单元内每个掩膜开口111的张网拉伸模拟位移数据。即，本实施例通过将标准掩膜单元进行张网拉伸实验，获得掩膜开口111在张网拉伸前后位置的变化量。
在一实施例中，将标准掩膜单元进行张网拉伸，获取张网拉伸模拟位移数据，可以包括：将标准掩膜单元进行张网拉伸，并获取标准掩膜单元的张网拉伸模拟位移图像；根据张网拉伸模拟位移图像获取张网拉伸模拟位移数据。
继续参考图1，将图1所示的标准掩膜单元进行张网拉伸后，获取标准掩膜单元的张网拉伸模拟位移图像，示例性的，参考图4，在标准掩膜单元的张网拉伸模拟位移图像中，张网拉伸前后标准掩膜单元不同位置的形变大小不一，图4中示出了形变量等位线，如图4所示，标准掩膜单元的边缘区域B形变较大，因为仅在X方向上对标准掩膜单元进行张网拉伸，即对标准掩膜单元在一维方向上进行张网拉伸，使得与X方向垂直的Y方向出现收缩，如图4所示，标准掩膜单元的边缘区域B收缩严重。
根据图4所示的张网拉伸模拟位移图像中每个掩膜开口111处的形变量等位线的数值，可获取每个掩膜开口111的张网拉伸模拟位移数据，所述位移数据指的是标准掩膜单元在进行张网拉伸后，每个掩膜开口111偏离预设掩膜开口位置的距离。示例性的，在张网拉伸模拟位移图像中，若标准掩膜单元的边缘区域B中的一个掩膜开口111处的形变量等位线的数值为A，而数值A代表该掩膜开口111的位移量为5微米，则该掩膜开口111的张网拉伸模拟位移数据为5微米。
S302、根据张网拉伸模拟位移数据计算掩膜单元的掩膜开口的偏移量。
每个掩膜开口111的张网拉伸模拟位移数据，指的是标准掩膜单元在进行张网拉伸后，每个掩膜开口111偏离预设掩膜开口位置的位移量，即掩膜开口111的偏移量。则对于非标准的掩膜单元1，经过张网拉伸工艺后，掩膜单元1的每 个位置的掩膜开口111的偏移量同标准掩膜单元类似，所以本实施例通过对标准掩膜单元的张网拉伸模拟位移数据的测量，计算获取掩膜单元1的每个位置的掩膜开口111的偏移量。
本实施例中，每个掩膜开口111在Y方向上进行收缩，则每个掩膜开口111的偏移量可记录每个掩膜开口111在Y方向上的收缩量。当然，在沿X方向上，每个掩膜开口111也存在一定的偏移量，可根据标准掩膜单元的张网拉伸模拟位移数据获取每个掩膜开口111在X方向上的偏移量。
S303、根据掩膜开口的偏移量以及预设掩膜开口位置在掩膜单元本体上形成掩膜开口，以使在张网拉伸后掩膜单元的掩膜开口位于预设掩膜开口位置。
在实际生成需要的掩膜单元1时，需要参考标准掩膜单元掩膜开口在张网拉伸后的偏移量，以及预设掩膜开口位置，设定生成的掩膜开口111的位置，使得张网拉伸后掩膜单元1的掩膜开口111位于预设掩膜开口位置。例如，在上述X方向和Y方向上，标准掩膜单元中某个掩膜开口111经过张网拉伸后，偏移量为D(-5,4)，若预设开口位置为P(m,n)，则为了使制作的掩膜单元1的掩膜开口111的位置经过张网拉伸后仍然处于预设开口位置P，则在制作掩膜单元1时，将该掩膜开口111的坐标设置为P’(m+5，n-4)。则该掩膜开口111经过一个偏移量D(-5，4)的偏移后，恰好落在预设开口位置P处。
本申请实施例提供的掩膜单元的制作方法，通过对掩膜单元进行张网拉伸实验，获取张网拉伸模拟位移数据，并根据张网拉伸模拟位移数据计算掩膜单元张网拉伸后的掩膜开口的偏移量，根据掩膜开口的偏移量和预设掩膜开口位置在掩膜单元本体上形成掩膜开口，使得掩膜单元经过张网拉伸后，掩膜开口位于预设掩膜开口位置。本申请实施例在掩膜单元的制作过程中，对掩膜开口在张网拉伸过程中出现的偏移量进行预补偿，保证在张网拉伸后，掩膜开口具有较高位置精度，进而保证通过掩膜单元蒸镀的像素具有较高位置精度，避免因为像素精度降低引起的彩斑、色偏等显示异常问题。
在一实施例中，根据张网拉伸模拟位移数据计算掩膜单元的掩膜开口的偏 移量，可以包括：在标准掩膜单元上选取多个掩膜开口测试点；根据标准掩膜单元的张网拉伸模拟位移数据，获取多个掩膜开口测试点的偏移量；根据多个掩膜开口测试点的偏移量获取掩膜开口的偏移量。
因为无法直接将标准掩膜单元上所有位置的张网拉伸模拟位移数据根据张网拉伸模拟位移图像进行获取，则需要选取多个掩膜开口111作为测试点，获取多个掩膜开口测试点的偏移量。在一实施例中，可以将掩膜单元1上所有的掩膜开口111作为测试点获取每个掩膜开口111的偏移量。或者，为了加快测试进程，也可以选取多个具有代表性的掩膜开口111作为掩膜开口测试点，获取掩膜开口测试点的偏移量，再根据掩膜开口测试点的偏移量，推测或者计算标准掩膜单元上所有掩膜开口的偏移量。
在一实施例中，根据掩膜开口的偏移量以及预设掩膜开口位置在掩膜单元本体上形成掩膜开口，以使在张网拉伸后掩膜单元的掩膜开口位于预设掩膜开口位置，可以包括：根据掩膜开口的偏移量获取与偏移量大小相同、方向相反的反向补偿量；将预设掩膜开口位置偏移反向补偿量的位置作为掩膜单元的掩膜开口位置，以使张网拉伸后掩膜单元的掩膜开口位于预设掩膜开口位置。
参考上述实例，若标准掩膜单元中某个掩膜开口111经过张网拉伸后，偏移量为D(-5，4)，若预设开口位置为P(m，n)，则设置该掩膜开口111的反向补偿量为D’(5，-4)，则将预设开口位置P偏移反向补偿量D’之后的位置P’作为制作掩膜单元1时的掩膜开口111的掩膜开口位置，即掩膜开口位置设置为P’(m+5，n-4)，则张网拉伸后掩膜开口111位于预设掩膜开口位置。本实施例中，在将掩膜单元进行张网拉伸之前，在制作掩膜单元的过程中，预先对掩膜开口位置在预设掩膜开口位置的基础上，增加反向补偿量，使得掩膜单元在进行张网拉伸后，掩膜开口位置恰处于预设掩膜开口位置，增高掩膜开口的位置精度。
如图5所示，该掩膜单元的制作方法具体可以包括：
S501、形成掩膜开口位于预设掩膜开口位置的标准掩膜单元。
S502、将标准掩膜单元进行张网拉伸，获取张网拉伸模拟位移数据。
参考图1至图4，通过一个标准掩膜单元进行张网拉伸试验，并获取标准掩膜单元的张网拉伸模拟位移图像，并根据张网拉伸模拟位移图像获取张网拉伸模拟位移数据。
S503、在标准掩膜单元上选取多个掩膜开口测试点。
S504、根据标准掩膜单元的张网拉伸模拟位移数据，获取多个掩膜开口测试点的偏移量。
在计算标准掩膜单元的掩膜开口111的偏移量时，选取多个掩膜开口111作为测试点，并通过标准掩膜单元的张网拉伸模拟位移数据，获取选取的多个掩膜开口测试点的位移量，即为多个掩膜开口测试点的偏移量。示例性的，参考图1和图2，每个掩膜单元1包括多个显示面板蒸镀区11，每个显示面板蒸镀区11分别对应一个显示面板的显示区域的蒸镀，显示面板蒸镀区11内包含多个掩膜开口111，可将每个显示面板蒸镀区11均分成N部分，选取每部分中心位置的掩膜开口111作为掩膜开口测试点，或者每部分边缘位置的掩膜开口111作为掩膜开口测试点。示例性的，N可以为9或者25等。
S505、根据多个掩膜开口测试点的偏移量获取所有掩膜开口的偏移量。
在一实施例中，根据多个掩膜开口测试点的偏移量获取所有掩膜开口的偏移量，可以包括：根据多个掩膜开口测试点的偏移量，形成预设掩膜开口位置-偏移量的关系曲线图；根据预设掩膜开口位置-偏移量的关系曲线图，获取所有掩膜开口的偏移量。
参考图6，获取多个掩膜开口测试点的预设掩膜开口位置和掩膜开口的偏移量的对应关系，并在预设掩膜开口位置P-偏移量D的坐标系中找到多个掩膜开口测试点的坐标位置C，进行标注，最后将所有的掩膜开口测试点的坐标位置C对应的预设掩膜开口位置P-偏移量D的关系坐标点顺次连接，得到图6所示的预设掩膜开口位置P-偏移量D曲线图，可选择任意一个掩膜开口111的预设掩膜开口位置C’，根据掩膜开口111的预设掩膜开口位置P和偏移量D的对应关系，获取该掩膜开口111的偏移量。
需要注意的是，图6中示出的预设掩膜开口位置P-偏移量D曲线图中，预设掩膜开口位置P表示一个坐标值固定，另一个坐标值变化的平面坐标位置，偏移量D表示预设掩膜开口位置P在一个坐标方向上的偏移位置，则图6所示的曲线图可记录两种组合的预设掩膜开口位置P-偏移量D的关系图，参考图2和图6，可获取X方向上变化的预设掩膜开口位置P与Y方向上的偏移量D的关系曲线；获取X方向上变化的预设掩膜开口位置P与X方向上的偏移量D的关系曲线；逐渐变化预设掩膜开口位置P的Y方向上的固定值，从而能够获取预设掩膜开口位置P在X方向和Y方向形成的平面上的任意位置处，对应的偏移量D的平面坐标。
示例性的，参考图2和图6，可固定预设掩膜开口位置P在Y轴上的坐标值n，预设开口位置为P(m，n)，则预设开口位置P的集合为平行于X方向的一条直线，记录预设开口位置P在Y方向上的偏移量，则图6中仅记录了沿X方向变化的预设掩膜开口位置P在Y方向上的偏移量。同理，在固定预设掩膜开口位置P在Y轴上的坐标值n时，预设开口位置P的集合为平行于X方向的一条直线，此刻仅记录预设开口位置P在X方向上的偏移量，综上，则获取预设开口位置P的集合为平行于X方向的一条直线时，预设开口位置P在X方向和Y方向形成的平面内的偏移量D。在上述示例的基础上，逐渐变化预设掩膜开口位置P在Y轴上的固定坐标值n，例如，逐次将预设掩膜开口位置P在Y轴上的坐标值固定为n1，n2，及其他固定值，本实施例将获取多组预设开口位置P的集合为平行于X方向的直线时的偏移量D，多个平行于X方向的直线能够覆盖整个X方向和Y方向形成的平面，最终可获取X方向和Y方向构成的整个平面内，偏移量D随着预设掩膜开口位置P的位置变化，并根据任意位置掩膜开口111的预设掩膜开口位置P，获取该掩膜开口111的偏移量。
S506、根据掩膜开口的偏移量获取与偏移量大小相同、方向相反的反向补偿量。
获取掩膜开口111的预设掩膜开口位置和偏移量的对应关系后，可根据偏移量获取反向补偿量。反向补偿量距离预设掩膜开口位置的距离与偏移量大小相 等，方向相反，从而反向补偿量能够对偏移量起到预补偿的作用。
S507、将预设掩膜开口位置偏移反向补偿量的位置作为掩膜单元的掩膜开口位置，以使张网拉伸后掩膜单元的掩膜开口位于预设掩膜开口位置。
本实施例中，在将掩膜单元进行张网拉伸之前，在制作掩膜单元的过程中，预先对掩膜开口位置在预设掩膜开口位置的基础上，增加反向补偿量，使得掩膜单元在进行张网拉伸后，掩膜开口位置恰处于预设掩膜开口位置，增高掩膜开口的位置精度。另外，获取预设掩膜开口位置和偏移量关系时，通过绘制预设掩膜开口位置-偏移量关系图，简化掩膜单元的掩膜开口位置的设置过程，加快掩膜单元的制作。
本申请实施例还提供一种掩膜单元。如图7所示，本实施例的掩膜单元包括：掩膜单元本体12；
掩膜单元本体12包括至少一个掩膜开口111；掩膜开口111根据下述掩膜单元的制作方法形成：
获取张网拉伸模拟位移数据；
根据张网拉伸模拟位移数据计算掩膜单元1的掩膜开口111的偏移量；
根据掩膜开口111的偏移量以及预设掩膜开口位置在掩膜单元本体12上形成掩膜开口111，以使在张网拉伸后掩膜单元1的掩膜开口111位于预设掩膜开口位置。
本实施例提供的掩膜单元，通过对掩膜单元进行张网拉伸实验，获取张网拉伸模拟位移数据，并根据张网拉伸模拟位移数据计算掩膜单元张网拉伸后的掩膜开口的偏移量，根据掩膜开口的偏移量和预设掩膜开口位置在掩膜单元本体上形成掩膜开口，使得掩膜单元经过张网拉伸后，掩膜开口位于预设掩膜开口位置。本申请实施例在掩膜单元的制作过程中，对掩膜开口在张网拉伸过程中出现的偏移量进行预补偿，保证在张网拉伸后，掩膜开口具有较高位置精度，进而保证通过掩膜单元蒸镀的像素具有较高位置精度，避免因为像素精度降低 引起的彩斑、色偏等显示异常问题。
在一实施例中，继续参考图7，在沿张网拉伸方向X上，包括多个显示面板蒸镀区11，参考图8，每个显示面板蒸镀区11包括垂直于张网拉伸方向X上的多列子像素位置开口；每个显示面板蒸镀区11的所有列子像素位置开口中，每列子像素位置开口中相邻两个子像素位置开口之间的间距，在沿张网拉伸方向X上，由中间区域至边缘区域逐渐减小。
如图7和图8所示，显示面板蒸镀区11内可包含多个子像素位置开口，在一实施例中，每个显示面板蒸镀区11沿垂直于X方向上的Y方向，设置多列子像素位置开口，子像素位置开口设置为蒸镀每个子像素的掩膜开口111。
每列子像素位置开口包括多个子像素位置开口，并且相邻两个子像素位置开口间距L是相同的。在每个显示面板蒸镀区11内，在沿张网拉伸方向X上，从中间区域至边缘区域，每列相邻两个子像素位置开口间距L逐渐减小，从而在掩膜单元1经过张网拉伸后，显示面板蒸镀区11内所有子像素位置开口均位于预设掩膜开口位置，如图9所示，在沿张网拉伸方向X上，每列相邻两个子像素位置开口间距L均相同，所有子像素位置开口形成矩阵排布，从而通过该掩膜单元，可蒸镀形成矩阵排布的子像素阵列。
本申请实施例还提供一种掩膜版，参考图10，包括本申请任意实施例提供的掩膜单元1，多个掩膜单元1沿垂直于张网拉伸方向X依次焊接在掩膜版框架2上。
如图10所示，掩膜单元1经过张网拉伸工艺后，所有掩膜开口111回到预设掩膜开口位置，本实施例提供的掩膜版对掩膜单元1在张网拉伸过程中出现的偏移量进行预补偿，保证掩膜单元1在张网拉伸后，掩膜开口111具有较高位置精度，进而保证通过掩膜单元蒸镀的像素具有较高位置精度。
注意，上述仅为本申请的较佳实施例及所运用技术原理。本领域技术人员 会理解，本申请不限于这里所述的特定实施例，对本领域技术人员来说能够进行每种明显的变化、重新调整和替代而不会脱离本申请的保护范围。因此，虽然通过以上实施例对本申请进行了较为详细的说明，但是本申请不仅仅限于以上实施例，在不脱离本申请构思的情况下，还可以包括更多其他等效实施例，而本申请的范围由所附的权利要求范围决定。

Claims (12)

  1. 一种掩膜单元的制作方法，包括：
    获取张网拉伸模拟位移数据；
    根据张网拉伸模拟位移数据计算掩膜单元的掩膜开口的偏移量；
    根据掩膜开口的偏移量以及预设掩膜开口位置在掩膜单元本体上形成掩膜开口，以使在张网拉伸后所述掩膜单元的掩膜开口位于预设掩膜开口位置。
  2. 根据权利要求1所述的掩膜单元的制作方法，其中，所述获取张网拉伸模拟位移数据，包括：
    形成掩膜开口位于预设掩膜开口位置的标准掩膜单元；
    将所述标准掩膜单元进行张网拉伸，获取所述张网拉伸模拟位移数据。
  3. 根据权利要求2所述的掩膜单元的制作方法，其中，将所述标准掩膜单元进行张网拉伸，获取所述张网拉伸模拟位移数据，包括：
    将所述标准掩膜单元进行张网拉伸，并获取所述标准掩膜单元的张网拉伸模拟位移图像；
    根据所述张网拉伸模拟位移图像获取所述张网拉伸模拟位移数据。
  4. 根据权利要求2所述的掩膜单元的制作方法，其中，根据张网拉伸模拟位移数据计算掩膜单元的掩膜开口的偏移量，包括：
    在所述标准掩膜单元上选取多个掩膜开口测试点；
    根据所述标准掩膜单元的张网拉伸模拟位移数据，获取所述多个掩膜开口测试点的偏移量；
    根据所述多个掩膜开口测试点的偏移量获取所有掩膜开口的偏移量。
  5. 根据权利要求4所述的掩膜单元的制作方法，其中，在所述标准掩膜单元上选取多个掩膜开口测试点，包括：
    选取所述标准单元上所有的掩膜开口作为掩膜开口测试点。
  6. 根据权利要求4所述的掩膜单元的制作方法，其中，所述标准掩膜单元包括多个显示面板蒸镀区；
    在所述标准掩膜单元上选取多个掩膜开口测试点，包括：
    将所述标准掩膜单元的每个显示面板蒸镀区均分为N部分，选择每部分中心位置的掩膜开口作为掩膜开口测试点。
  7. 根据权利要求4所述的掩膜单元的制作方法，其中，所述标准掩膜单元包括多个显示面板蒸镀区；
    在所述标准掩膜单元上选取多个掩膜开口测试点，包括：
    将所述标准掩膜单元的每个显示面板蒸镀区均分为N部分，选择每部分边缘位置的掩膜开口作为掩膜开口测试点。
  8. 根据权利要求4所述的掩膜单元的制作方法，其中，根据所述多个掩膜开口测试点的偏移量获取所有掩膜开口的偏移量，包括：
    根据所述多个掩膜开口测试点的偏移量，形成预设掩膜开口位置-偏移量的关系曲线图；
    根据所述预设掩膜开口位置-偏移量的关系曲线图，获取每个掩膜开口的偏移量。
  9. 根据权利要求2所述的掩膜单元的制作方法，其中，根据掩膜开口的偏移量以及预设掩膜开口位置在掩膜单元本体上形成掩膜开口，以使在张网拉伸后所述掩膜单元的掩膜开口位于预设掩膜开口位置，包括：
    根据所述掩膜开口的偏移量获取与所述偏移量大小相同、方向相反的反向补偿量；
    将所述预设掩膜开口位置偏移所述反向补偿量的位置作为掩膜单元的掩膜开口位置，以使张网拉伸后所述掩膜单元的掩膜开口位于预设掩膜开口位置。
  10. 一种掩膜单元，包括：掩膜单元本体；
    所述掩膜单元本体包括至少一个掩膜开口；所述掩膜开口根据下述掩膜单元的制作方法形成：
    获取张网拉伸模拟位移数据；
    根据张网拉伸模拟位移数据计算掩膜单元的掩膜开口的偏移量；
    根据掩膜开口的偏移量以及预设掩膜开口位置在掩膜单元本体上形成掩膜开口，以使在张网拉伸后所述掩膜单元的掩膜开口位于预设掩膜开口位置。
  11. 根据权利要求10所述的掩膜单元，其中：
    在沿张网拉伸方向上，包括多个显示面板蒸镀区，每个所述显示面板蒸镀区包括垂直于张网拉伸方向上的多列子像素位置开口；
    每个所述显示面板蒸镀区的所有列子像素位置开口中，每列子像素位置开口中相邻两个子像素位置开口之间的间距，在沿张网拉伸方向上，由中间区域至边缘区域逐渐减小。
  12. 一种掩膜版，包括多个权利要求10所述的掩膜单元；多个所述掩膜单元沿垂直于张网拉伸方向依次焊接在掩膜版框架上。
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