WO2018161704A1 - 一种显示器件及其制造方法 - Google Patents

一种显示器件及其制造方法 Download PDF

Info

Publication number
WO2018161704A1
WO2018161704A1 PCT/CN2017/119651 CN2017119651W WO2018161704A1 WO 2018161704 A1 WO2018161704 A1 WO 2018161704A1 CN 2017119651 W CN2017119651 W CN 2017119651W WO 2018161704 A1 WO2018161704 A1 WO 2018161704A1
Authority
WO
WIPO (PCT)
Prior art keywords
sub
pixel
display device
pixel unit
color
Prior art date
Application number
PCT/CN2017/119651
Other languages
English (en)
French (fr)
Inventor
田国军
Original Assignee
成都爱可信科技有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 成都爱可信科技有限公司 filed Critical 成都爱可信科技有限公司
Publication of WO2018161704A1 publication Critical patent/WO2018161704A1/zh

Links

Images

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/30—Devices specially adapted for multicolour light emission
    • H10K59/35—Devices specially adapted for multicolour light emission comprising red-green-blue [RGB] subpixels
    • H10K59/351—Devices specially adapted for multicolour light emission comprising red-green-blue [RGB] subpixels comprising more than three subpixels, e.g. red-green-blue-white [RGBW]
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering

Definitions

  • the present invention relates to the field of display devices, and in particular to an AMOLED display device and a method of fabricating the same.
  • AMOLED Active Matrix Organic Light Emitting Diode
  • LCDs liquid crystal displays
  • the third generation of display technology can be widely used in terminal products such as smartphones, tablets, TVs, VR/AR (virtual reality/augmented reality) and military helmet displays.
  • the colorization method of AMOLED mainly uses red, green and blue (R, G, B) luminescent materials to directly obtain the corresponding three primary color sub-pixels (referred to herein as RGB direct method) and adopts "white light + color filter film" ( W+CF) obtains three primary color sub-pixels (herein referred to as W+CF method); there are two main methods for manufacturing colored pixel patterns of AMOLED: one is vacuum evaporation using fine metal mask (MASK).
  • MSEL fine metal mask
  • the organic light-emitting material is directly formed into a colorized pixel pattern (referred to herein as a mask method), and the second is to first fabricate a white light OLED device, and then overlying the color filter film to form a colored pixel pattern (referred to herein as a filter) Light film method).
  • a mask method a colorized pixel pattern
  • a filter a colored pixel pattern
  • Light film method a common technical problem facing the industry.
  • the widely used RGB direct method and the reticle method for preparing RGB strip-shaped pixel patterns can obtain good display performance, but the MASK alignment accuracy, MASK shadow, MASK deformation and other factors will be serious.
  • the object of the present invention is to provide a display device and a manufacturing method thereof, which can solve the problem that the prior art proposed in the background art cannot solve the problem of producing a large-size, high-resolution AMOLED display device, and the output rate of the product is low, and the display performance is not Good question.
  • a display device the display device is an AMOLED display device
  • the illuminating pixel units of the display device are arranged in a matrix, and each illuminating pixel unit includes a white sub-pixel unit W, a red sub-pixel unit R, a green sub-pixel unit G, and a blue sub-pixel unit B
  • the white sub-pixel unit W, the red sub-pixel unit R, the green sub-pixel unit G, and the blue sub-pixel unit B are arranged in a rectangular shape
  • the same color sub-pixels of the adjacent pixels of the top, bottom, left, and right are arranged in a combination of four in a "field" shape.
  • the sub-pixel units of each adjacent two rows of pixel units are symmetrically arranged with the center line of the two rows of pixel units as an axis, and the sub-pixel units of each adjacent two columns of pixel units are centered by the two columns of pixel units.
  • the axes are also arranged symmetrically.
  • the same color sub-pixel units of the upper, lower, left, and right adjacent pixel units are arranged in a combination of each of the four groups in a "field" shape.
  • Another object of the present invention is to provide a method of fabricating a display device, wherein the display device is an AMOLED display device, and the method for fabricating the display device comprises the following steps:
  • S1 MASK for preparing a colorized pixel pattern of an AMOLED display device: opening a rectangular opening in MASK1, each opening corresponding to a group of four sub-pixel units of the same color, the length and width of the opening and the length and width of the corresponding pixel Similarly, the horizontal spacing and the vertical spacing between each adjacent two sets of openings are equal to the length and width of one pixel unit, respectively.
  • the pixel unit is square, the length and width of the opening are equal, and a rectangular hole is opened in the MASK2.
  • the openings correspond to two adjacent rows of sub-pixel units of the same color, the length of the opening is the length of the entire MASK2, the opening width is equal to the width of one pixel unit, and the opening spacing is equal to the width of one pixel unit, which is opened on the MASK3.
  • a rectangular hole the vertical length of the opening is the same as the vertical length of the MASK3, and each opening corresponds to two adjacent sub-pixel units of the same color;
  • S2 an AMOLED display device in which a white sub-pixel is mixed with a yellow (Y) luminescent material and a blue (B) luminescent material, and three colors of red (R), green (G), and yellow (Y) are sequentially vapor-deposited using MASK1.
  • the red (R) luminescent material is vapor-deposited twice by MASK1, wherein the red sub-pixel of the pixel is evaporated at one time, and the red luminescent material in the white sub-pixel of the pixel is evaporated another time.
  • Still another object of the present invention is to provide a method of fabricating a display device, wherein the display device is an AMOLED display device, which is prepared by first preparing a white light OLED (WOLED) light emitting device and then on the WOLED device. A color filter film (CF) was prepared.
  • WOLED white light OLED
  • CF color filter film
  • the present invention provides a pixel arrangement structure in which each pixel includes four sub-pixels of WRGB and the same color sub-pixels of the upper, lower, left, and right adjacent pixels are arranged in a group of four.
  • the coloring method and the method for manufacturing the colorized pixel pattern because of the introduction of the W sub-pixel, are advantageous for improving the brightness, reducing the power consumption and prolonging the life of the AMOLED display device compared to the RGB strip-arranged structure of the WOLED+CF technology; More importantly, for the filter film preparation method of W+CF or the fine metal mask preparation method, the present invention can prepare a higher resolution AMOLED display device or higher based on the existing production equipment and process technology in the industry. Large-size AMOLED display devices of the generation line, or in the case of the same resolution, can reduce the requirements on the equipment and process technology, and help to improve the mass production yield.
  • Figure 1 is a schematic structural view of the present invention
  • FIG. 2 is a schematic diagram of a MASK for preparing an AMOLED colorized pixel pattern according to the present invention
  • FIG. 3 is a flow chart of preparing an AMOLED colorized pixel pattern using MASK in the present invention.
  • 1 white sub-pixel unit W 2 red sub-pixel unit R, 3 green sub-pixel unit G, 4 blue sub-pixel unit B.
  • a display device is arranged in a matrix by illuminating pixel units, and each illuminating pixel unit includes a white sub-pixel unit W1, a red sub-pixel unit R2, a green sub-pixel unit G3, and a blue sub-
  • the pixel unit B4, the white sub-pixel unit W1, the red sub-pixel unit R2, the green sub-pixel unit G3, and the blue sub-pixel unit B4 are arranged in a rectangular shape, and the same color sub-pixels of the upper, lower, left, and right adjacent pixels are each “Tian
  • the glyphs are arranged in a group, and the sub-pixel units of each adjacent two rows of pixel units are symmetrically arranged with the center line of the two rows of pixel units as an axis, and the sub-pixel units of each adjacent two columns of pixel units are in the two columns.
  • the center line of the pixel unit is also symmetrically arranged, and the same color sub-pixel unit of the upper, lower, left and right adjacent pixel units are
  • the present invention also provides a method of fabricating a display device.
  • a method for preparing a display device comprises the following steps:
  • S1 MASK for preparing a colorized pixel pattern of an AMOLED display device: opening a rectangular opening in MASK1, each opening corresponding to a group of four sub-pixel units of the same color, the length and width of the opening and the length and width of the corresponding pixel Similarly, the horizontal spacing and the vertical spacing between each adjacent two sets of openings are equal to the length and width of one pixel unit, respectively.
  • the pixel unit is square, the length and width of the opening are equal, and a rectangular hole is opened in the MASK2.
  • the openings correspond to two adjacent rows of sub-pixel units of the same color, the length of the opening is the length of the entire MASK2, the opening width is equal to the width of one pixel unit, and the opening spacing is equal to the width of one pixel unit, which is opened on the MASK3.
  • a rectangular hole the vertical length of the opening is the same as the vertical length of the MASK3, and each opening corresponds to two adjacent sub-pixel units of the same color;
  • S2 an AMOLED display device in which a white sub-pixel is mixed with a yellow (Y) luminescent material and a blue (B) luminescent material, and three colors of red (R), green (G), and yellow (Y) are sequentially vapor-deposited using MASK1.
  • MASK2 vapor-deposited blue (B) luminescent material AMOLED display device with white sub-pixels mixed with red (R), green (G) and blue (B) luminescent materials, using MASK2 vapor-deposited blue ( B) luminescent material, vapor-deposited green (G) luminescent material with MASK3, and red-etched red (R) luminescent material twice with MASK1, one of which red-dipped the red sub-pixel of the pixel, and another of the white sub-pixel of the evaporated pixel Red luminescent material;
  • the minimum aperture size and the minimum aperture spacing of the three MASKs are both a pixel width, wherein the minimum aperture size is equivalent to the RGB strip arrangement structure.
  • MASK has a minimum opening size of 3 times, and the minimum opening spacing is equivalent to 1.5 times the minimum opening spacing of MASK used in the RGB strip arrangement. It is well known that the larger the MASK opening size and the opening spacing, the easier the MASK processing, the smaller the requirement for MASK alignment accuracy and the MASK shadow when evaporating organic materials, and the less the MASK is deformed, which is capable of the present invention.
  • the requirements can significantly increase the yield of production. Taking an AMOLED display device with a resolution of 500 ppi as an example, using a conventional RGB strip arrangement, the minimum opening size of the vapor-deposited MASK is only about 17 ⁇ m, and the opening pitch is about 34 ⁇ m.
  • the existing MASK evaporation technology is extremely difficult to produce.
  • MASK has a minimum opening size and an opening pitch of about 51 um, which can be completely produced by the existing MASK evaporation technology. And achieve higher yield requirements.
  • a method for preparing a display device the method for preparing a colorized pixel pattern of the AMOLED display device by using a W+CF filter film method is the same as the prior art, that is, first preparing a white light OLED (WOLED) light emitting device, and then A color filter film (CF) is prepared on the WOLED element. Since the preparation method is understood by those of ordinary skill in the art, it will not be described in detail herein.
  • WOLED white light OLED
  • CF color filter film
  • the aperture area of each color sub-pixel is a complete pixel size, which is equivalent to three times the area of the opening of each sub-pixel of the conventional RGB stripe arrangement, and the sub-pixel of the general WRGB array structure. 4 times the opening area, which will greatly reduce the alignment accuracy requirements of CF and WOLED components, and help to improve the production yield of ultra-high resolution AMOLED display devices.
  • the pixel arrangement structure and the W+CF colorization pixel pattern preparation method capable of producing an AMOLED display device equivalent to a 4x resolution or a general WRGB arrangement structure using a conventional RGB stripe arrangement pixel structure .
  • the sub-pixel opening of the conventional RGB strip arrangement is only 3.3 um ⁇ 10 um, and the present invention is used.
  • the pixel arrangement structure and the W+CF colorization pixel pattern preparation method the openings of the same color sub-pixels are increased to 10um ⁇ 10um, which can greatly reduce the alignment accuracy requirement compared with the original 3.3um opening width, which is beneficial to Improve the yield of mass production.

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Electroluminescent Light Sources (AREA)

Abstract

一种显示器件技术领域的显示器件及其制造方法，AMOLED显示器件的发光像素单元呈矩阵排列，每个发光像素单元包括白色子像素单元W（1）、红色子像素单元R（2）、绿色子像素单元G（3）和蓝色子像素单元B（4），白色子像素单元W（1）、红色子像素单元R（2）、绿色子像素单元G（3）和蓝色子像素单元B（4）呈矩形排列，且上下左右相邻像素的同色子像素每四个集中排列成一个组合。能够基于业内现有的生产设备和制程工艺制备更高解析度的AMOLED显示器件或更高世代线的大尺寸AMOLED显示器件，或者，在解析度相同的情况下，可以降低对设备及制程工艺的要求，有利于提高量产良率；也有利于提高相比WOLED+CF技术的RGB条状排列结构的AMOLED显示器件的亮度，降低功耗，延长寿命。

Description

一种显示器件及其制造方法 技术领域
本发明涉及显示器件技术领域，具体为一种AMOLED显示器件及其制造方法。
背景技术
在平板显示技术中，主动矩阵有机发光二极管(AMOLED)显示器件以其轻薄、主动发光、快响应速度、广视角、色彩丰富、耐高低温等众多优点而被业界公认为是继液晶显示器(LCD)之后的第三代显示技术，可以广泛用于智能手机、平板电脑、电视、VR/AR(虚拟现实/增强现实)及军用头盔显示器等终端产品。AMOLED的彩色化方法主要有采用红、绿、蓝(R、G、B)发光材料直接得到对应的三基色子像素(这里称之为RGB直接法)和采用“白光+彩色滤光膜”(W+CF)得到三基色子像素(这里称之为W+CF法)两种方式；AMOLED的彩色化像素图案的制造方法也主要有两种：一是采用精细金属掩模板(MASK)真空蒸镀有机发光材料直接形成彩色化像素图案(这里称之为掩模板法)，二是首先制造出白光OLED器件，然后再在其上覆盖彩色滤光膜形成彩色化像素图案(这里称之为滤光膜法)。但无论采用上述现有技术的哪一种组合方案，均难以在生产大尺寸、高解析度AMOLED显示器件和提高量产良率、改善显示性能等诸要素方面得到较好的的解决方案，此为行业目前面临的共性技术难题。比如，目前广泛采用的RGB直接法、用掩模板法制备RGB条状排列像素图案的技术方案，虽然能得到很好的显示性能，但由于MASK对位精度、MASK阴影、MASK变形等因素将严重影响形成精准的彩色化像素图案，因此难以提高生产良率且很难生产解析度在300ppi以上或在6代线以上生产大尺寸AMOLED显示屏；在此基础上，出现一种PenTile RGB像素排列结构，虽然可以将解析度提高到600ppi，但依然不能解决生产高世代、大尺寸AMOLED的难题，且PenTile RGB像素排列存在图像串扰加重、莫尔效应明显、斜线锯齿恶化及需特别的驱动方法等新问题；采用RGB条状排列的W+CF的滤光膜法，虽然可以生产更高解析度和高世代、大尺寸的AMOLED，但由于滤光膜对色光的衰减，AMOLED的亮度、色彩、功耗等性能被大大降低；采用WRGB像素排列的W+CF的滤光膜法，虽然显示性能有所改善但仍不及RGB直接法，且仍难以生产用于VR/AR及头盔显示器等对解析度要求高达4000ppi以上的微显示AMOLED器件。为此，我们提出一种显示器件及其制造方法。
发明内容
本发明的目的在于提供一种显示器件及其制造方法，以解决上述背景技术中提出的现 有的技术无法解决生产大尺寸、高解析度AMOLED显示器件，而且产品的产量率低，显示性能不好的问题。
为实现上述目的，本发明提供如下技术方案：一种显示器件，所述显示器件为AMOLED显示器件，该显示器件的发光像素单元呈矩阵排列，且每个发光像素单元包括白色子像素单元W、红色子像素单元R、绿色子像素单元G和蓝色子像素单元B，所述白色子像素单元W、红色子像素单元R、绿色子像素单元G和蓝色子像素单元B呈矩形排列，且上下左右相邻像素的同色子像素每四个呈“田”字形集中排列成一个组合。
优选的，每相邻两行像素单元的子像素单元以该两行像素单元的中心线为轴心对称排列，且每相邻两列像素单元的子像素单元以该两列像素单元的中心线为轴心也对称排列。
优选的，上下左右相邻像素单元的同色子像素单元每四组呈“田”字形集中排列成一个组合。
本发明的另一个目的是提供一种显示器件的制备方法，其中，所述显示器件为AMOLED显示器件，该显示器件的制备方法包括如下步骤：
S1：制备AMOLED显示器件的彩色化像素图案的MASK：在MASK1开矩形开孔，每个开孔分别对应一组同色的四个子像素单元，开孔的长度和宽度与对应的像素的长度和宽度相同，每相邻两组开孔之间的水平间距和垂直间距分别等于一个像素单元的长度和宽度，在像素单元为正方形时，开孔的长度和宽度相等，在MASK2上开长方形孔，每个开孔分别对应相邻两行同色的子像素单元，开孔长度为整张MASK2的长度，开孔宽度等于一个像素单元的宽度，开孔间距也等于一个像素单元的宽度，在MASK3上开长方形孔，开孔垂直方向的长度为MASK3的垂直长度相同，每个开孔分别对应相邻两列同色的子像素单元；
S2：对白色子像素由黄色(Y)发光材料和蓝色(B)发光材料混合发光的AMOLED显示器件，采用MASK1依次蒸镀红色(R)、绿色(G)和黄色(Y)三种发光材料，用MASK2蒸镀蓝色(B)发光材料，对白色子像素由红色(R)、绿色(G)和蓝色(B)发光材料混合发光的AMOLED显示器件，采用MASK2蒸镀蓝色(B)发光材料，用MASK3蒸镀绿色(G)发光材料，用MASK1分别两次蒸镀红色(R)发光材料；
S3：当蒸镀指定颜色的子像素时，使MASK开孔正对该颜色子像素，而其他颜色子像素被MASK遮挡，这样从坩锅蒸发出的该颜色的发光材料就可以精确地只沉积在该颜色子像素区，该颜色发光材料蒸镀完成后，再用另一张MASK并使其开孔对准另一颜色的子像素，以此类推完成所有发光材料的蒸镀，从而形成彩色化像素图案。
优选的，所述步骤2用MASK1分别两次蒸镀红色(R)发光材料中，其中一次蒸镀像素的红色子像素，另一次蒸镀像素的白色子像素中的红色发光材料。
本发明的又一个目的是提供一种显示器件的制备方法，其中，所述显示器件为AMOLED显示器件，该AMOLED显示器件的制备方法为首先制备白光OLED(WOLED)发光元件，然后在WOLED元件上制备彩色滤光膜(CF)。
与现有技术相比，本发明的有益效果是：本发明提供了一种每个像素包括WRGB四个子像素且上下左右相邻像素的同色子像素每四个集中排列成一个组合的像素排列结构及其彩色化方法和彩色化像素图案的制造方法，由于W子像素的引入，有利于提高相比WOLED+CF技术的RGB条状排列结构的AMOLED显示器件的亮度，降低功耗，延长寿命；更重要的是，对无论是W+CF的滤光膜制备方法还是精细金属掩模板制备方法，本发明能够基于业内现有的生产设备和制程工艺制备更高解析度的AMOLED显示器件或更高世代线的大尺寸AMOLED显示器件，或者，在解析度相同的情况下，可以降低对设备及制程工艺的要求，有利于提高量产良率。
附图说明
图1为本发明结构示意图；
图2为本发明制备AMOLED彩色化像素图案的MASK示意图；
图3为本发明用MASK制备AMOLED彩色化像素图案的流程。
图中：1白色子像素单元W、2红色子像素单元R、3绿色子像素单元G、4蓝色子像素单元B。
具体实施方式
下面将结合本发明实施例中的附图，对本发明实施例中的技术方案进行清楚、完整地描述，显然，所描述的实施例仅仅是本发明一部分实施例，而不是全部的实施例。基于本发明中的实施例，本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例，都属于本发明保护的范围。
请参阅图1，一种显示器件，该AMOLED显示器件由发光像素单元呈矩阵排列，且每个发光像素单元包括白色子像素单元W1、红色子像素单元R2、绿色子像素单元G3和蓝色子像素单元B4，所述白色子像素单元W1、红色子像素单元R2、绿色子像素单元G3和蓝色子像素单元B4呈矩形排列，且上下左右相邻像素的同色子像素每四个呈“田”字形集中排列成一个组合，每相邻两行像素单元的子像素单元以该两行像素单元的中心线为轴心对称排列，且每相邻两列像素单元的子像素单元以该两列像素单元的中心线为轴心也 对称排列，上下左右相邻像素单元的同色子像素单元每四组呈“田”字形集中排列成一个组合。
请参阅图1-3，本发明还提供一种显示器件的制备方法。
实施例1
一种显示器件的制备方法，该AMOLED显示器件的制备方法包括如下步骤：
S1：制备AMOLED显示器件的彩色化像素图案的MASK：在MASK1开矩形开孔，每个开孔分别对应一组同色的四个子像素单元，开孔的长度和宽度与对应的像素的长度和宽度相同，每相邻两组开孔之间的水平间距和垂直间距分别等于一个像素单元的长度和宽度，在像素单元为正方形时，开孔的长度和宽度相等，在MASK2上开长方形孔，每个开孔分别对应相邻两行同色的子像素单元，开孔长度为整张MASK2的长度，开孔宽度等于一个像素单元的宽度，开孔间距也等于一个像素单元的宽度，在MASK3上开长方形孔，开孔垂直方向的长度为MASK3的垂直长度相同，每个开孔分别对应相邻两列同色的子像素单元；
S2：对白色子像素由黄色(Y)发光材料和蓝色(B)发光材料混合发光的AMOLED显示器件，采用MASK1依次蒸镀红色(R)、绿色(G)和黄色(Y)三种发光材料，用MASK2蒸镀蓝色(B)发光材料，对白色子像素由红色(R)、绿色(G)和蓝色(B)发光材料混合发光的AMOLED显示器件，采用MASK2蒸镀蓝色(B)发光材料，用MASK3蒸镀绿色(G)发光材料，用MASK1分别两次蒸镀红色(R)发光材料，其中一次蒸镀像素的红色子像素，另一次蒸镀像素的白色子像素中的红色发光材料；
S3：当蒸镀某种颜色的子像素时(以红色为例)，使MASK开孔正对红色子像素，而绿、蓝子像素被MASK遮挡，这样从坩锅蒸发出的红色发光材料就可以精确地只沉积在红色子像素区，红色发光材料蒸镀完成后，再用另一张MASK并使其开孔对准另一颜色的子像素，以此类推完成所有发光材料的蒸镀，从而形成彩色化像素图案。
采用本发明所述像素排列结构及彩色化像素图案制备方法，上述三种MASK的最小开孔尺寸和最小开孔间距均为一个像素的宽度，其中最小开孔尺寸相当于RGB条状排列结构所用MASK最小开孔尺寸的3倍，最小开孔间距相当于RGB条状排列结构所用MASK最小开孔间距的1.5倍。众所周知，MASK开孔尺寸和开孔间距越大，MASK加工越容易，蒸镀有机材料时对MASK对位精度的要求及MASK阴影的影响也越小，且MASK越不易变形，这是本发明能够基于业内成熟的MASK蒸镀技术制备高解析度或大尺寸AMOLED显示器件的彩色化像素图案的关键；反之，在解析度或显示器件尺寸相同的情况下，本发明可以降低对生产设备和制程工艺的要求，可以显著提高量产良率。以解析度为500ppi的AMOLED显 示器件为例，采用传统的RGB条状排列，所需蒸镀MASK的最小开孔尺寸仅约17um，开孔间距约34um，现有MASK蒸镀技术极难生产这种高解析度的AMOLED显示器件，而采用本发明所述像素排列结构及彩色化像素图案制备方法，MASK的最小开孔尺寸和开孔间距均约51um，完全能用现有MASK蒸镀技术生产并达到较高的良率要求。
实施例2
一种显示器件的制备方法，采用W+CF的滤光膜法制备所述AMOLED显示器件的彩色化像素图案的方法与现有技术相同，即：首先制备白光OLED(WOLED)发光元件，然后在WOLED元件上制备彩色滤光膜(CF)。鉴于所述制备方法是本领域的普通技术人员都应该理解的，因此在此不再详述。
由于本发明所述特别的像素排列结构，每种颜色子像素的开口面积是一个完整的像素大小，相当于传统RGB条状排列各子像素开口面积的3倍，一般性WRGB排列结构的子像素开口面积的4倍，因此将大大降低CF与WOLED元件的对位精度要求，有利于提高超高解析度AMOLED显示器件的生产良率；反之，在相同生产设备及制程工艺的条件下，采用本发明所述像素排列结构及W+CF的彩色化像素图案制备方法，能够生产相当于采用传统RGB条状排列像素结构的3倍解析度或一般性WRGB排列结构的4倍解析度的AMOLED显示器件。以解析度为2500ppi的AMOLED微显示器件为例(相当于分辨率为1280×720的0.5英寸微显示器件)，传统RGB条状排列的各子像素开口仅3.3um×10um，而采用本发明所述像素排列结构及W+CF的彩色化像素图案制备方法，各同色子像素的开口均增大到10um×10um，相比原3.3um的开口宽度，可以大大降低对位精度的要求，有利于提高量产良率。
尽管已经示出和描述了本发明的实施例，对于本领域的普通技术人员而言，可以理解在不脱离本发明的原理和精神的情况下可以对这些实施例进行多种变化、修改、替换和变型，本发明的范围由所附权利要求及其等同物限定。
Figure PCTCN2017119651-appb-000001

Claims (3)

  1. 蒸镀绿色(G)发光材料，用MASK1分别两次蒸镀红色(R)发光材料；
    S3：当蒸镀指定颜色的子像素时，使MASK开孔正对该颜色子像素，而其他颜色子像素被MASK遮挡，这样从坩锅蒸发出的该颜色的发光材料就可以精确地只沉积在该颜色子像素区，该颜色发光材料蒸镀完成后，再用另一张MASK并使其开孔对准另一颜色的子像素，以此类推完成所有发光材料的蒸镀，从而形成彩色化像素图案。
  2. 根据权利要求4所述的一种显示器件的制备方法，其特征在于：所述步骤2用MASK1分别两次蒸镀红色(R)发光材料中，其中一次蒸镀像素的红色子像素，另一次蒸镀像素的白色子像素中的红色发光材料。
  3. 一种如权利要求1所述的显示器件的制备方法，其特征在于：所述显示器件为AMOLED显示器件，该显示器件的制备方法为首先制备白光OLED(WOLED)发光元件，然后在WOLED元件上制备彩色滤光膜(CF)。
PCT/CN2017/119651 2017-03-05 2017-12-29 一种显示器件及其制造方法 WO2018161704A1 (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201710125737.XA CN106816461A (zh) 2017-03-05 2017-03-05 一种amoled显示器件及其制造方法
CN201710125737.X 2017-03-05

Publications (1)

Publication Number Publication Date
WO2018161704A1 true WO2018161704A1 (zh) 2018-09-13

Family

ID=59115045

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2017/119651 WO2018161704A1 (zh) 2017-03-05 2017-12-29 一种显示器件及其制造方法

Country Status (2)

Country Link
CN (1) CN106816461A (zh)
WO (1) WO2018161704A1 (zh)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112725729A (zh) * 2020-12-29 2021-04-30 天津市滨海新区微电子研究院 一种彩色硅基oled微显示器的制作方法及掩膜板
US11145844B2 (en) 2019-02-27 2021-10-12 Int Tech Co., Ltd. Method for manufacturing electroluminescent device

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106816461A (zh) * 2017-03-05 2017-06-09 成都爱可信科技有限公司 一种amoled显示器件及其制造方法
CN112128710A (zh) * 2019-06-24 2020-12-25 宜兰汽车配件制造(平湖)有限公司 使用于汽车投影灯的彩色图案成像透光片的制造方法

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030160915A1 (en) * 2002-02-25 2003-08-28 Himax Technologies, Inc. Arrangement for pixel array of color filter
CN102830450A (zh) * 2011-06-13 2012-12-19 广东中显科技有限公司 全彩顶部发光型有机电致发光显示器的彩色滤色片
CN103872091A (zh) * 2014-03-18 2014-06-18 四川虹视显示技术有限公司 一种高解析度oled器件及制造用掩膜板
CN104916661A (zh) * 2015-04-21 2015-09-16 京东方科技集团股份有限公司 像素结构、掩膜板、有机电致发光显示面板及显示装置
CN106653799A (zh) * 2016-10-31 2017-05-10 昆山工研院新型平板显示技术中心有限公司 像素结构以及包含所述像素结构的oled显示面板
CN106816461A (zh) * 2017-03-05 2017-06-09 成都爱可信科技有限公司 一种amoled显示器件及其制造方法
CN107068714A (zh) * 2017-01-20 2017-08-18 成都晶砂科技有限公司 一种oled像素排列结构及显示装置
CN206619597U (zh) * 2017-03-05 2017-11-07 成都爱可信科技有限公司 一种amoled显示器件

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104637972A (zh) * 2013-11-08 2015-05-20 昆山工研院新型平板显示技术中心有限公司 一种高分辨率的有机发光显示器及其制造方法
CN105932038A (zh) * 2016-05-23 2016-09-07 深圳市华星光电技术有限公司 Woled显示装置

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030160915A1 (en) * 2002-02-25 2003-08-28 Himax Technologies, Inc. Arrangement for pixel array of color filter
CN102830450A (zh) * 2011-06-13 2012-12-19 广东中显科技有限公司 全彩顶部发光型有机电致发光显示器的彩色滤色片
CN103872091A (zh) * 2014-03-18 2014-06-18 四川虹视显示技术有限公司 一种高解析度oled器件及制造用掩膜板
CN104916661A (zh) * 2015-04-21 2015-09-16 京东方科技集团股份有限公司 像素结构、掩膜板、有机电致发光显示面板及显示装置
CN106653799A (zh) * 2016-10-31 2017-05-10 昆山工研院新型平板显示技术中心有限公司 像素结构以及包含所述像素结构的oled显示面板
CN107068714A (zh) * 2017-01-20 2017-08-18 成都晶砂科技有限公司 一种oled像素排列结构及显示装置
CN106816461A (zh) * 2017-03-05 2017-06-09 成都爱可信科技有限公司 一种amoled显示器件及其制造方法
CN206619597U (zh) * 2017-03-05 2017-11-07 成都爱可信科技有限公司 一种amoled显示器件

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11145844B2 (en) 2019-02-27 2021-10-12 Int Tech Co., Ltd. Method for manufacturing electroluminescent device
CN112725729A (zh) * 2020-12-29 2021-04-30 天津市滨海新区微电子研究院 一种彩色硅基oled微显示器的制作方法及掩膜板

Also Published As

Publication number Publication date
CN106816461A (zh) 2017-06-09

Similar Documents

Publication Publication Date Title
TWI741192B (zh) 像素結構、ｏｌｅｄ顯示幕以及蒸鍍掩膜板
WO2015139436A1 (zh) 一种高解析度有机发光二极管显示器件及制造用掩膜板
US10062737B2 (en) OLED pixel arrangement structure and display device
EP3091577B1 (en) Pixel structure and organic light-emitting display using pixel structure
CN104465714B (zh) 一种像素结构及其显示方法、显示装置
TWI506774B (zh) 畫素結構及其金屬光罩
TWI559524B (zh) 電激發光顯示面板之畫素結構
TWI585726B (zh) 畫素結構
WO2018161704A1 (zh) 一种显示器件及其制造方法
US11302750B2 (en) Pixel structure and OLED display panel
WO2018161809A1 (zh) Oled阵列基板及其制造方法和显示装置
WO2015096370A1 (zh) 显示面板及其驱动方法和显示装置
CN107086239A (zh) 像素结构及其制备方法和显示装置
WO2017118003A1 (zh) Oled像素阵列、制备oled像素阵列的方法、oled显示面板和显示装置
WO2020124693A1 (zh) Oled像素结构
CN104659064B (zh) 有机发光二极管显示器像素排列结构及显示装置
CN106229300B (zh) 像素结构及制作方法
TWI706399B (zh) 顯示面板的像素排列結構及顯示裝置
TW201629945A (zh) 顯示幕及其驅動方法
WO2020134794A1 (zh) 像素结构和显示面板
CN106469743A (zh) 像素结构、oled显示面板及其制作方法
WO2019062278A1 (zh) 像素排列结构、像素结构及其制作方法、阵列基板和显示面板
CN206619597U (zh) 一种amoled显示器件
WO2022241963A1 (zh) 像素排列结构、金属掩膜板以及有机发光显示装置
WO2022121401A1 (zh) 像素排布结构及显示面板

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 17899557

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 17899557

Country of ref document: EP

Kind code of ref document: A1