WO2020070933A1 - Lithium-ion secondary battery and method for manufacturing lithium-ion secondary battery - Google Patents

Lithium-ion secondary battery and method for manufacturing lithium-ion secondary battery

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Publication number
WO2020070933A1
WO2020070933A1 PCT/JP2019/026269 JP2019026269W WO2020070933A1 WO 2020070933 A1 WO2020070933 A1 WO 2020070933A1 JP 2019026269 W JP2019026269 W JP 2019026269W WO 2020070933 A1 WO2020070933 A1 WO 2020070933A1
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WIPO (PCT)
Prior art keywords
layer
substrate
ion secondary
secondary battery
lithium ion
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PCT/JP2019/026269
Other languages
French (fr)
Japanese (ja)
Inventor
安田 剛規
坂脇 彰
晴章 内田
恭成 渡邉
Original Assignee
昭和電工株式会社
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Publication of WO2020070933A1 publication Critical patent/WO2020070933A1/en

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M10/00Secondary cells; Manufacture thereof
    • H01M10/05Accumulators with non-aqueous electrolyte
    • H01M10/052Li-accumulators
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M10/00Secondary cells; Manufacture thereof
    • H01M10/05Accumulators with non-aqueous electrolyte
    • H01M10/056Accumulators with non-aqueous electrolyte characterised by the materials used as electrolytes, e.g. mixed inorganic/organic electrolytes
    • H01M10/0561Accumulators with non-aqueous electrolyte characterised by the materials used as electrolytes, e.g. mixed inorganic/organic electrolytes the electrolyte being constituted of inorganic materials only
    • H01M10/0562Solid materials
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M10/00Secondary cells; Manufacture thereof
    • H01M10/05Accumulators with non-aqueous electrolyte
    • H01M10/058Construction or manufacture
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00Electrodes
    • H01M4/02Electrodes composed of, or comprising, active material
    • H01M4/13Electrodes for accumulators with non-aqueous electrolyte, e.g. for lithium-accumulators; Processes of manufacture thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00Electrodes
    • H01M4/02Electrodes composed of, or comprising, active material
    • H01M4/62Selection of inactive substances as ingredients for active masses, e.g. binders, fillers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00Electrodes
    • H01M4/02Electrodes composed of, or comprising, active material
    • H01M4/64Carriers or collectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00Electrodes
    • H01M4/02Electrodes composed of, or comprising, active material
    • H01M4/64Carriers or collectors
    • H01M4/66Selection of materials
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/10Energy storage using batteries
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

Definitions

  • the present invention relates to a lithium ion secondary battery and a method for manufacturing a lithium ion secondary battery.
  • a lithium ion secondary battery has a positive electrode including a positive electrode active material, a negative electrode including a negative electrode active material, and an electrolyte having lithium ion conductivity and disposed between the positive electrode and the negative electrode.
  • Patent Document 1 discloses that a positive electrode current collector layer, a positive electrode active material layer, a solid electrolyte layer, a negative electrode active material layer, and a negative electrode current collector are provided on a substrate made of glass, semiconductor silicon, ceramic, stainless steel, resin, or the like. It is described that a lithium ion secondary battery is formed by stacking layers. Further, Patent Literature 1 describes that Li 3 PO 4 (lithium phosphate) is used as an inorganic solid electrolyte constituting a solid electrolyte layer.
  • Li 3 PO 4 lithium phosphate
  • the capacity of a lithium ion secondary battery gradually decreases with time after charging, even if the battery is not used.
  • the ratio of the capacity of the lithium ion secondary battery at the time when a predetermined period has elapsed to the initial capacity after the completion of charging is referred to as a capacity retention rate.
  • the internal resistance of the lithium ion secondary battery is low because the lithium ion conductivity of Li 3 PO 4 is low. Is high.
  • the present invention provides a thin-film laminated lithium-ion secondary battery using Li 3 PO 4 (lithium phosphate) as an inorganic solid electrolyte constituting a solid electrolyte layer, in which a rise in internal resistance and a decrease in capacity retention rate are reduced. The purpose is to suppress both.
  • Li 3 PO 4 lithium phosphate
  • the lithium ion secondary battery of the present invention includes a substrate having a surface and a back surface provided on the surface side of the substrate, a first polarity layer of occluding and releasing lithium ions at a first polarity, Li 3 PO And a solid electrolyte layer not containing LiPON in which a part of oxygen in Li 3 PO 4 is replaced by nitrogen, and a lithium ion absorbing and releasing lithium ion at a second polarity opposite to the first polarity.
  • a bipolar layer in order, and the surface of the substrate has a maximum / minimum difference between a maximum height and a minimum height obtained by measuring unevenness in a range of 20 ⁇ m ⁇ 20 ⁇ m with an AFM (Atomic Force Microscope).
  • the thickness of the solid electrolyte layer may be 400 nm or more and 800 nm or less. Further, the thickness of the solid electrolyte layer may be smaller than the thickness of the first polar layer.
  • the substrate may be made of a conductive metal. Further, the substrate may be made of SUS316L. Further, the substrate may be made of a metal material whose surface is subjected to Ni-P plating. Further, the solid electrolyte layer may have an amorphous structure. Further, the first polarity is positive, the second polarity is negative, and the first polar layer includes LiNiO 2 and Li 3 PO 4 .
  • the semiconductor device may further include a base layer provided between the surface of the substrate and the first polar layer, the base layer including LiNiO 2 and not including Li 3 PO 4 .
  • the first polarity is positive
  • the second polarity is negative
  • the first polarity is provided to face the solid electrolyte layer
  • a platinum group element Ru, Rh, Pd, Os, Ir, Pt
  • It further includes a metal layer made of gold (Au), aluminum (Al), or an alloy thereof, wherein the second polar layer contains lithium alloyed with a metal constituting the metal layer. It can be.
  • the semiconductor device may further include an amorphous layer which is provided to face the metal layer and has an amorphous structure and is made of a metal or an alloy.
  • the maximum and minimum height difference of the surface of the substrate may be 2.7 nm or less.
  • the arithmetic mean roughness Ra of the surface of the substrate may be 1.1 nm or less.
  • the method for manufacturing a lithium ion secondary battery of the present invention has a maximum height and a minimum height obtained by measuring unevenness in a range of 20 ⁇ m ⁇ 20 ⁇ m with an AFM (Atomic Force Microscope).
  • a first polarity layer forming step of forming a first polarity layer, replacing the first polarity layer side provided on the substrate, a portion of the oxygen in and Li 3 PO 4 include Li 3 PO 4 in a nitrogen
  • a solid electrolyte layer forming step of forming a solid electrolyte layer containing no LiPON the substrate preparing step may include preparing the substrate made of SUS316L.
  • the substrate made of a metal material plated with Ni-P may be prepared.
  • the first polarity is positive, and a platinum group element (Ru, Rh, Pd, Os, Ir, Pt), gold (Au), or aluminum (Al) is formed on the solid electrolyte layer provided on the substrate.
  • the metal layer may further include an amorphous layer forming step of forming an amorphous layer made of a metal or an alloy having an amorphous structure. May be included.
  • the first polarity is positive, and in the first polar layer forming step, a composite positive electrode containing LiNiO 2 and Li 3 PO 4 is formed.
  • the method may further include, between the substrate preparing step and the first polar layer forming step, an underlayer forming step of forming an underlayer containing LiNiO 2 and not Li 3 PO 4 on the surface of the substrate.
  • an underlayer forming step of forming an underlayer containing LiNiO 2 and not Li 3 PO 4 on the surface of the substrate.
  • the substrate preparing step the substrate having the maximum and minimum height difference of the surface set to 2.7 nm or less may be prepared.
  • the substrate may be prepared such that an arithmetic average roughness Ra of the surface is set to 1.1 nm or less.
  • Li 3 PO 4 lithium phosphate
  • FIG. 2 is a diagram illustrating a cross-sectional configuration of a lithium ion secondary battery according to an embodiment.
  • (A), (b) is a figure which shows the cross-sectional structural example of the board
  • (A)-(c) is a figure for demonstrating the procedure of making a holding
  • FIG. 1 is a diagram showing a cross-sectional configuration of a lithium ion secondary battery 1 of the present embodiment.
  • the lithium ion secondary battery 1 of the present embodiment has a structure in which a plurality of layers are stacked. After forming a basic structure by a so-called film forming process, the first charge / discharge operation is performed. Completes the structure.
  • the lithium ion secondary battery 1 shown in FIG. 1 includes a substrate 10, an underlayer 20 laminated on the substrate 10, a positive electrode layer 30 laminated on the underlayer 20, and a solid layer laminated on the positive electrode layer 30. And an electrolyte layer 40.
  • the solid electrolyte layer 40 covers the peripheral edges of both the base layer 20 and the positive electrode layer 30 and the ends thereof are directly laminated on the substrate 10, so that the solid electrolyte layer 40 covers the base layer 20 and the positive electrode layer 30 together with the substrate 10. I have.
  • this lithium ion secondary battery 1 has a holding layer 50 stacked on the solid electrolyte layer 40, a diffusion prevention layer 60 stacked on the holding layer 50, and a negative electrode collection layer stacked on the diffusion prevention layer 60. And an electric conductor layer 70.
  • the substrate 10 serves as a base on which the base layer 20 to the negative electrode current collector layer 70 are stacked by a film forming process.
  • the substrate 10 has a front surface 10a and a back surface 10b, and the base layer 20 to the negative electrode current collector layer 70 are stacked on the front surface 10a. The details of the substrate 10 will be described later.
  • the underlayer 20 is a solid thin film, which enhances the adhesion between the substrate 10 and the positive electrode layer 30, as well as a material (particularly a metal material) forming the substrate 10 and a Li 3 PO 4 (phosphorus) forming the positive electrode layer 30.
  • Li 3 PO 4 phosphorus
  • Li 3 PO 4 and Li + unlikely to occur corrosion by (Li-ion) or PO 4 3- (phosphate ions) constituting formed of a metal or metal compound such as Can be used.
  • the underlayer 20 is made of LiNiO 2 (nickel phosphate). LiNiO 2 is sometimes used as a positive electrode material of the lithium ion secondary battery 1.
  • the thickness of the underlayer 20 can be, for example, not less than 5 nm and not more than 50 ⁇ m. If the thickness of the underlayer 20 is less than 5 nm, the function as a barrier is reduced, which is not practical. On the other hand, if the thickness of the underlayer 20 exceeds 50 ⁇ m, the internal resistance of the battery increases, which is disadvantageous for high-speed charging and discharging.
  • any known film forming method such as various PVD (physical vapor deposition) and various CVD (chemical vapor deposition) may be used, but from the viewpoint of production efficiency, a sputtering method or a vacuum method is used. It is desirable to use an evaporation method.
  • the positive electrode layer 30 as an example of the first polar layer is a solid thin film and contains a positive electrode active material that releases lithium ions during charging and absorbs lithium ions during discharging.
  • the positive electrode active material constituting the positive electrode layer 30 is, for example, a kind selected from manganese (Mn), cobalt (Co), nickel (Ni), iron (Fe), molybdenum (Mo), and vanadium (V). Materials composed of various materials such as oxides, sulfides, and phosphorus oxides containing the above metals can be used.
  • the positive electrode layer 30 may be a composite positive electrode further containing a solid electrolyte. In this embodiment, the positive polarity corresponds to the first polarity.
  • the positive electrode layer 30 is formed of a mixed positive electrode including a positive electrode active material and a solid electrolyte made of an inorganic material (inorganic solid electrolyte). More specifically, the positive electrode layer 30 of the present embodiment has a solid electrolyte region mainly containing an inorganic solid electrolyte and a positive electrode region mainly containing a positive electrode active material. Then, in the positive electrode layer 30, the inorganic solid electrolyte forming the solid electrolyte region and the positive electrode active material forming the positive electrode region are mixed while maintaining each. As a result, in the positive electrode layer 30, one is a matrix (base material) and the other is a filler (particles). Here, in the positive electrode layer 30, it is desirable that the solid electrolyte region be a matrix and the positive electrode region be a filler.
  • the same LiNiO 2 as the underlayer 20 is used as the positive electrode active material forming the positive electrode layer 30.
  • Li 3 PO 4 lithium phosphate
  • the ratio between the positive electrode active material and the inorganic solid electrolyte in the positive electrode layer 30 may be appropriately selected.
  • the molar ratio of the positive electrode active material to the inorganic solid electrolyte is from 9: 1 (90%: 10%) to 3: 2 (60%: 40%).
  • the thickness of the positive electrode layer 30 can be, for example, not less than 10 nm and not more than 40 ⁇ m.
  • the thickness of the positive electrode layer 30 is less than 10 nm, the capacity of the obtained lithium ion secondary battery 1 becomes too small, which is not practical.
  • the thickness of the positive electrode layer 30 exceeds 40 ⁇ m, it takes too much time to form the layer, and the productivity is reduced.
  • the thickness of the positive electrode layer 30 may be more than 40 ⁇ m.
  • a known film forming method such as various PVD or various CVD may be used, but it is preferable to use a sputtering method from the viewpoint of production efficiency.
  • the solid electrolyte layer 40 is a solid thin film made of an inorganic material, and includes an inorganic solid electrolyte capable of moving lithium ions by an externally applied electric field.
  • the solid electrolyte layer 40 of the present embodiment is made of the same Li 3 PO 4 as the inorganic solid electrolyte in the positive electrode layer 30. Further, the solid electrolyte layer 40 of the present embodiment contains Li 3 PO 4 , while LiPON (Li 3 PO 4-x N x (0 ⁇ x ⁇ ) in which part of oxygen in Li 3 PO 4 is replaced by nitrogen. 1)) is not included.
  • the thickness of the solid electrolyte layer 40 can be, for example, 400 nm or more and 800 nm or less. When the thickness of the solid electrolyte layer 40 is less than 400 nm, current leakage between the positive electrode layer 30 and the holding layer 50 easily occurs in the obtained lithium ion secondary battery 1. On the other hand, if the thickness of the solid electrolyte layer 40 exceeds 800 nm, the internal resistance of the battery increases, which is disadvantageous for high-speed charging and discharging. Further, the thickness of the solid electrolyte layer 40 is preferably, for example, not less than 600 nm and not more than 800 nm.
  • the thickness of the positive electrode layer 30 As for the relationship between the thickness of the positive electrode layer 30 and the thickness of the solid electrolyte layer 40, whichever may be thicker or the same. However, from the viewpoint of suppressing an increase in the internal resistance of the battery, it is preferable that the thickness of the solid electrolyte layer 40 be smaller than the thickness of the positive electrode layer 30.
  • a known film forming method such as various PVD or various CVD may be used, but from the viewpoint of production efficiency, it is preferable to use a sputtering method.
  • the holding layer 50 as an example of a metal layer is a solid thin film and has a function of holding lithium ions during charging and releasing lithium ions during discharging.
  • the point that the holding layer 50 of the present embodiment does not itself include a negative electrode active material and is configured to hold lithium functioning as a negative electrode active material therein is different from a general negative electrode layer. Is different.
  • the holding layer 50 of the present embodiment also functions as an example of the second polar layer when lithium is held inside. In this embodiment, the second polarity corresponds to the negative polarity.
  • the holding layer 50 of the present embodiment has a porous structure, and is constituted by a porous portion (not shown) in which a large number of holes are formed.
  • the porousization of the holding layer 50 that is, the formation of the porous portion, is performed in the first charge / discharge operation after the film formation, and the details will be described later.
  • a platinum group element Ru, Rh, Pd, Os, Ir, Pt
  • gold Au
  • aluminum Al
  • an alloy thereof it is desirable that the holding layer 50 be made of platinum or gold, which is less likely to be oxidized.
  • the holding layer 50 of the present embodiment can be made of the above-mentioned noble metal and metal or a polycrystal of an alloy thereof.
  • the holding layer 50 is made of platinum.
  • the thickness of the holding layer 50 can be, for example, not less than 10 nm and not more than 40 ⁇ m.
  • the thickness of the holding layer 50 is less than 10 nm, the ability to hold lithium becomes insufficient.
  • the thickness of the holding layer 50 exceeds 40 ⁇ m, the internal resistance of the battery increases, which is disadvantageous for high-speed charging and discharging.
  • the thickness of the holding layer 50 may be more than 40 ⁇ m.
  • a known film forming method such as various PVD or various CVD may be used, but from the viewpoint of production efficiency, it is preferable to use a sputtering method.
  • a method for manufacturing the porous holding layer 50 it is desirable to employ a method of performing charging and discharging, as described later.
  • the diffusion prevention layer 60 as an example of the amorphous layer is a solid thin film, and is for suppressing diffusion of lithium ions held in the holding layer 50 to the outside of the lithium ion secondary battery 1. .
  • a material having an amorphous structure and made of a metal or an alloy can be used.
  • the diffusion prevention layer 60 is preferably made of a metal or an alloy that does not form an intermetallic compound with lithium. Among these, from the viewpoint of corrosion resistance, chromium (Cr) alone or an alloy containing chromium is preferred. Is preferred.
  • the diffusion prevention layer 60 may be formed by laminating a plurality of amorphous layers having different constituent materials (for example, a laminated structure of an amorphous chromium layer and an amorphous chromium titanium alloy layer).
  • the “amorphous structure” in the present embodiment includes not only a structure having an amorphous structure as a whole but also a structure in which microcrystals are precipitated in the amorphous structure. .
  • the diffusion preventing layer 60 is made of an alloy of chromium and titanium (CrTi).
  • the metals (alloys) that can be used for the diffusion preventing layer 60 include, in addition to CrTi, ZrCuAlNiPdP, CuZr, FeZr, TiZr, CoZrNb, NiNb, NiTiNb, NiP, CuP, NiPCu, NiTi, AlTi, FeSiB, AuSi And the like.
  • the thickness of the diffusion preventing layer 60 can be, for example, not less than 10 nm and not more than 40 ⁇ m.
  • the thickness of the diffusion preventing layer 60 is less than 10 nm, it is difficult for the lithium that has passed through the holding layer 50 from the solid electrolyte layer 40 side to be blocked by the diffusion preventing layer 60.
  • the thickness of the diffusion prevention layer 60 exceeds 40 ⁇ m, the internal resistance of the battery increases, which is disadvantageous for high-speed charging and discharging.
  • the diffusion preventing layer 60 As a method for manufacturing the diffusion preventing layer 60, a known film forming method such as various PVD or various CVD may be used, but from the viewpoint of production efficiency, it is preferable to use a sputtering method.
  • a sputtering method when the diffusion prevention layer 60 is made of the above-described chromium-titanium alloy, the chromium-titanium alloy tends to be amorphous when the sputtering method is adopted.
  • the negative electrode current collector layer 70 is a solid thin film having electron conductivity, and has a function of collecting current to the holding layer 50.
  • the material constituting the negative electrode current collector layer 70 is not particularly limited as long as it has electron conductivity, and various metals and conductive materials including alloys of various metals may be used. it can.
  • a chemically stable material for example, a platinum group element (Ru, Rh, Pd, Os, Ir, Pt) or gold ( Au) or an alloy thereof is preferable.
  • the negative electrode current collector layer 70 is made of the same platinum as the holding layer 50. However, unlike the holding layer 50, the negative electrode current collector layer 70 does not have a porous structure.
  • the thickness of the negative electrode current collector layer 70 can be, for example, not less than 5 nm and not more than 50 ⁇ m. If the thickness of the negative electrode current collector layer 70 is less than 5 nm, the corrosion resistance and the current collecting function will be reduced, and it will not be practical. On the other hand, if the thickness of the negative electrode current collector layer 70 exceeds 50 ⁇ m, the internal resistance of the battery increases, which is disadvantageous for high-speed charging and discharging.
  • the negative electrode current collector layer 70 As a method of manufacturing the negative electrode current collector layer 70, a known film forming method such as various PVD or various CVD may be used, but from the viewpoint of production efficiency, it is preferable to use a sputtering method.
  • the material forming the substrate 10 is not particularly limited, and various materials such as metal, glass, ceramics, and resin can be adopted.
  • the substrate 10 is made of a metal plate having electron conductivity. Thereby, the substrate 10 is caused to function as a positive electrode current collector layer that collects electric current to the positive electrode layer 30 via the base layer 20.
  • the thickness of the substrate 10 can be, for example, not less than 20 ⁇ m and not more than 2000 ⁇ m. If the thickness of the substrate 10 is less than 20 ⁇ m, the strength of the lithium ion secondary battery 1 may be insufficient. On the other hand, if the thickness of the substrate 10 exceeds 2000 ⁇ m, the volume energy density and the weight energy density decrease due to the increase in the thickness and weight of the battery.
  • FIG. 2 is a diagram showing a cross-sectional configuration example of a substrate 10 constituting the lithium ion secondary battery 1 of the embodiment.
  • the substrate 10 shown in FIG. 2A will be referred to as a first configuration example
  • the substrate 10 shown in FIG. 2B will be referred to as a second configuration example.
  • the substrate 10 includes a base material 11 made of a single-layer metal plate.
  • various metals and alloys thereof can be used as the metal material forming the base material 11.
  • stainless steel having a coefficient of thermal expansion close to that of LiNiO 2 is used as the metal material forming the base material 11. Is preferred.
  • the base material 11 is also used as a positive electrode current collector layer as in the present embodiment, the metal material constituting the base material 11 is hardly corroded even in a high voltage environment and resistant to overdischarge. It is preferable to use stainless steel.
  • the base material 11 forming the substrate 10 is not limited to a single-layer metal plate, and may be formed of a laminate of a plurality of metal plates.
  • the substrate 10 includes a base material 11 made of a single-layer metal plate, and a coating layer 12 that covers the entire surface of the base material 11.
  • the metal material forming the base material 11 various metals, their alloys, metal compounds, and the like can be used.
  • the base material 11 is not limited to a single-layer metal plate, and may be formed of a laminate of a plurality of metal plates.
  • the coating layer 12 As a material forming the coating layer 12, various metals, their alloys, metal compounds, or the like can be used.
  • the substrate 10 formed by forming the coating layer 12 on the base material 11 is adopted, from the viewpoint of suppressing corrosion caused by lithium, CrTi, ZrCuAlNiPdP, CuZr, FeZr, TiZr, CoZrNb, NiNb, It is preferable to use NiTiNb, NiP, CuP, NiPCu, NiTi, AlTi, FeSiB, AuSi, or the like.
  • NiP nickel-phosphorous
  • the method for forming the coating layer 12 is not limited to the plating method, and various film forming methods may be employed.
  • the substrate 10 is formed by covering the entire surface of the base material 11 with the coating layer 12, but the present invention is not limited to this.
  • the coating layer 12 may be provided on at least the side of the substrate 10 that becomes the surface 10 a on the substrate 10.
  • the maximum and minimum height difference Rmm of the substrate 10 of the present embodiment is a measure for defining the smoothness of the laminated surface of the battery structure on the substrate 10 (the surface 10a of the substrate 10 in the present embodiment).
  • the maximum-to-minimum height difference Rmm in the present embodiment is the height between the maximum height and the minimum height obtained by measuring irregularities in a range of 20 ⁇ m ⁇ 20 ⁇ m (square region) with an AFM (Atomic Force Microscope). Defined by the difference. Therefore, the definition of the maximum and minimum height difference Rmm is different from the maximum height Rz defined in, for example, JIS B0601.
  • the maximum / minimum height difference Rmm in the present embodiment is obtained, for example, by using a D3100 manufactured by Bruker, which is an AFM apparatus (atomic force microscope system), and acquiring data in an area of 20 ⁇ m ⁇ 20 ⁇ m. Is prepared by using a cubic expression as an approximate polynomial, preparing an image (which has been subjected to “smoothing” processing) converted to a displacement from the reference plane (a positive displacement and a negative displacement may exist), and It can be obtained from the “maximum value ⁇ minimum value” of the direction (z displacement).
  • the maximum and minimum height difference Rmm of the surface 10a of the substrate 10 is set to 78 nm or less.
  • the maximum and minimum height difference Rmm of the base material 11 located on the front surface 10a side is set to 78 nm or less.
  • the maximum and minimum height difference Rmm of the coating layer 12 located on the surface 10a side is set to 78 nm or less.
  • the arithmetic average roughness Ra is specified, for example, in JIS B0601.
  • the arithmetic mean roughness Ra of the surface 10a of the substrate 10 is preferably 1.1 nm or less.
  • FIG. 3 is a flowchart for explaining the method for manufacturing the lithium ion secondary battery of the present embodiment.
  • a substrate preparation step of preparing a substrate 10 which has been subjected to a surface treatment so that the maximum / minimum height difference Rmm of the surface 10a is 78 (nm) or less is executed (step 10).
  • the substrate 10 according to the first configuration example shown in FIG. 2A is manufactured by, for example, the following procedure.
  • a metal plate is manufactured by a rolling method or the like, and the surface 10a side of the base material 11 obtained by cutting the metal plate is subjected to a general mechanical polishing treatment, and then further subjected to CMP (Chemical Mechanical Polishing).
  • CMP Chemical Mechanical Polishing
  • the substrate 10 according to the second configuration example shown in FIG. 2B is manufactured by, for example, the following procedure. First, a metal plate is manufactured by a rolling method or the like, and a coating layer 12 made of Ni—P is formed on the entire surface of a base material 11 obtained by cutting the metal plate by an electroless nickel plating method or the like. A laminate of the material 11 and the coating layer 12 is obtained. Then, after performing a general mechanical polishing process on the coating layer 12 positioned on the surface 10a side of the thus obtained laminated body, a polishing process using a CMP method or the like is performed, so that the surface 10a The substrate 10 having the maximum and minimum height difference Rmm set to 78 nm or less is obtained.
  • Step 20 the substrate 10 is mounted on a sputtering device (not shown), and a base layer forming step of forming the base layer 20 on the surface 10a of the substrate 10 is performed (Step 20).
  • a positive electrode layer forming step of forming the positive electrode layer 30 on the underlayer 20 is performed by the sputtering apparatus (step 30).
  • sputtering using a sputtering target containing a positive electrode active material and an inorganic solid electrolyte may be performed, or a sputtering target containing a positive electrode active material and an inorganic solid electrolyte may be used. Co-sputtering using the above sputtering target.
  • Solid electrolyte layer forming step Subsequently, a solid electrolyte layer forming step of forming the solid electrolyte layer 40 on the positive electrode layer 30 is performed by the sputtering device (step 40).
  • the formation of the solid electrolyte layer 40 is performed using a sputtering target containing lithium, phosphorus and oxygen under an atmosphere containing oxygen and not containing nitrogen. Is preferably performed.
  • a holding layer forming step (an example of a metal layer forming step) of forming the holding layer 50 on the solid electrolyte layer 40 is performed by the sputtering apparatus (step 50).
  • a diffusion preventing layer forming step (an example of an amorphous layer forming step) for forming the diffusion preventing layer 60 on the holding layer 50 is performed by the sputtering apparatus (step 60).
  • a negative electrode current collector layer forming step of forming the negative electrode current collector layer 70 on the diffusion prevention layer 60 is performed by the sputtering device (step 70).
  • the basic structure of the lithium ion secondary battery 1 is obtained.
  • the basic structure of the lithium ion secondary battery 1 is removed from the sputtering device.
  • an initial charging step (an example of a charging step) for performing a first charging is performed on the basic structure of the lithium ion secondary battery 1 removed from the sputtering apparatus (step 80).
  • an initial discharge step (an example of a discharge step) for performing a first discharge is performed on the charged basic structure of the lithium ion secondary battery 1 (step 90).
  • the holding layer 50 is made porous, that is, a porous portion and a large number of pores are formed, and the lithium ion secondary battery 1 shown in FIG. 1 is obtained.
  • FIG. 4 is a diagram for explaining a procedure for making the holding layer 50 porous, and is an enlarged view of the holding layer 50 and the periphery thereof.
  • FIG. 4A shows the state after the film formation and before the first charge (between Step 70 and Step 80)
  • FIG. 4B shows the state after the first charge and before the first discharge (Step 80 and Step 90).
  • 4C shows a state after the first discharge (after step 90).
  • the holding layer 50 is dense.
  • the thickness of the holding layer 50 is the thickness of the holding layer t50
  • the thickness of the diffusion prevention layer 60 is the thickness of the diffusion prevention layer t60
  • the thickness of the negative electrode current collector layer 70 is the thickness of the negative electrode current collector layer. It is t70.
  • the positive electrode of the DC power supply is provided on the substrate 10 (see FIG. 1), and the DC power supply is provided on the negative electrode current collector layer 70. Negative electrodes are respectively connected.
  • FIG. 4B lithium ions (Li + ) constituting the positive electrode active material in the positive electrode layer 30 move to the holding layer 50 via the solid electrolyte layer 40. That is, in the charging operation, the lithium ions move in the thickness direction of the lithium ion secondary battery 1 (upward in FIG. 4B).
  • the lithium ions that have moved from the positive electrode layer 30 side to the holding layer 50 side are alloyed with the metal constituting the holding layer 50.
  • the holding layer 50 is made of platinum (Pt)
  • platinum and platinum are alloyed (solid solution, formation of an intermetallic compound, or eutectic).
  • the diffusion prevention layer 60 of the present embodiment is made of a metal or an alloy having an amorphous structure, and the number of grain boundaries is significantly smaller than that of the holding layer 50 having a polycrystalline structure. ing. For this reason, the lithium ions that have reached the boundary between the holding layer 50 and the diffusion prevention layer 60 are less likely to enter the diffusion prevention layer 60, and thus maintain the state held in the holding layer 50.
  • the lithium ions that have moved from the positive electrode layer 30 to the holding layer 50 are held by the holding layer 50.
  • the lithium ions that have moved to the holding layer 50 are held by the holding layer 50 by alloying with platinum or by precipitating metallic lithium in the platinum.
  • the holding layer thickness t50 is changed from the film formation shown in FIG. More than the state. That is, the volume of the holding layer 50 increases by the first charging. This is considered to be due to the fact that lithium and platinum are alloyed in the holding layer 50.
  • the thickness t60 of the diffusion prevention layer does not substantially change before and after the first charge. That is, the volume of the diffusion prevention layer 60 is not substantially changed by the first charge. This is considered to be due to the fact that lithium hardly enters the diffusion preventing layer 60.
  • the thickness t70 of the negative electrode current collector layer does not substantially change before and after the first charge, that is, the volume of the negative electrode current collector layer 70 does not substantially change before and after the first charge (negative electrode current collector). It is considered that the platinum constituting the electric conductor layer 70 is not made porous and remains dense like the platinum constituting the holding layer 50).
  • a positive electrode of a load is provided on the substrate 10 (see FIG. 1), and a negative electrode of the load is provided on the negative electrode current collector layer 70.
  • the electrodes are respectively connected.
  • the lithium ions (Li + ) held in the holding layer 50 move to the positive electrode layer 30 via the solid electrolyte layer 40. That is, in the discharging operation, the lithium ions move in the thickness direction of the lithium ion secondary battery 1 (downward in FIG. 4C) and are held by the positive electrode layer 30. Accordingly, a DC current is supplied to the load.
  • the alloy of lithium and platinum is dealloyed (dissolution of the metallic lithium when metallic lithium is precipitated) with the release of lithium. Then, as a result of dealloying in the holding layer 50, the holding layer 50 is made porous, and becomes a porous portion 51 in which a large number of holes 52 are formed.
  • the porous portion 51 obtained in this way is substantially made of metal (for example, platinum).
  • metal for example, platinum
  • the holding layer thickness t50 is larger than the state after the first charge and before the first discharge shown in FIG. 4B. Decrease. This is considered to be due to the fact that the alloy of lithium and platinum is dealloyed in the holding layer 50. This is supported by the fact that the shape of the holes 52 formed in the holding layer 50 by the first discharge is flattened so that the thickness direction is smaller than the plane direction. Further, as shown in FIG. 4C, in the lithium ion secondary battery 1 after the initial discharge, the holding layer thickness t50 is larger than the state after the film formation and before the first charge shown in FIG. I do.
  • the holding layer 50 is made porous by the first charging and the first discharging, that is, a large number of holes 52 are formed in the holding layer 50.
  • the thickness t60 of the diffusion prevention layer and the thickness t70 of the negative electrode current collector layer are not substantially changed before and after the first discharge.
  • the base layer 20, the positive electrode layer 30, the solid electrolyte layer 40, the holding layer 50, the diffusion preventing layer 60, and the negative electrode current collector layer 70 are sequentially stacked on the surface 10a of the substrate 10.
  • the basic structure of the lithium ion secondary battery 1 was formed. That is, a configuration is adopted in which the positive electrode layer 30 is arranged on the side closer to the substrate 10 and the holding layer 50 is arranged on the side farther from the substrate 10.
  • the configuration is not limited to this, and a configuration in which the holding layer 50 is arranged on the side closer to the substrate 10 and the positive electrode layer 30 is arranged on the side farther from the substrate 10 may be adopted.
  • the order of lamination of each layer on the substrate 10 is opposite to that described above.
  • the basic structure of the lithium ion secondary battery 1 is formed on one surface of the substrate 10, that is, on the surface 10a.
  • the present invention is not limited to this.
  • another lithium The basic structure of the ion secondary battery 1 may be formed. In this case, it is necessary to set the maximum / minimum height difference Rmm on the back surface 10b of the substrate 10 to 78 nm or less, similarly to the front surface 10a.
  • the present inventor produced ten types of lithium ion secondary batteries 1 (Examples 1 to 5 and Comparative Examples 1 to 5), and evaluated the structures and various electrical characteristics of each.
  • Examples 1 to 3 First, in Examples 1 to 3, among the lithium ion secondary batteries 1 described in the above embodiment, those using the substrate 10 of the first configuration example shown in FIG. 2A were used. That is, in Examples 1 to 3, the lithium ion secondary battery 1 including the substrate 10 constituted of the base material 11 and having its surface 10a polished to the maximum and minimum height difference Rmm ⁇ 78 nm was used. In the following description, Examples 1 to 3 may be collectively referred to as a “first example group”.
  • Examples 4 and 5 and Comparative Example 5 among the lithium ion secondary batteries 1 described in the above embodiment, those using the substrate 10 of the second configuration example shown in FIG. was. That is, in Examples 4 and 5 and Comparative Example 5, the lithium ion secondary was provided with the substrate 10 which was constituted by the base material 11 and the coating layer 12 and whose surface 10a was polished to the maximum and minimum height difference Rmm ⁇ 78 nm. Battery 1 was used. In the following description, Examples 4 and 5 may be collectively referred to as a “second example group”.
  • Comparative Examples 1 to 4 On the other hand, in Comparative Examples 1 to 4, the basic structure itself is the same as in Examples 1 to 4, but the surface 10a is provided with the substrate 10 polished to the maximum / minimum height difference Rmm> 400 nm. The following battery 1 was used.
  • Table 1 shows the configuration of the substrate 10 in the lithium ion secondary batteries 1 according to Examples 1 to 5 and Comparative Examples 1 to 5.
  • Table 1 shows the constituent materials of the base material 11 constituting the substrate 10, the presence or absence of the coating layer 12 on the substrate 10 (if any), the presence or absence of the CMP process on the substrate 10, The relationship between the thickness, the maximum and minimum height difference Rmm of the surface 10a of the substrate 10, and the arithmetic average roughness Ra is shown.
  • Example 1 to 3 the substrate 10 had a single-layer structure of the base material 11. That is, the configuration was such that the substrate 10 did not include the coating layer 12.
  • SUS316L was used as the base material 11 and the thickness was set to 0.1 (mm).
  • a precision polishing process by a CMP process was further performed.
  • the maximum and minimum height difference Rmm of the surface 10a of the substrate 10 was 78.0 (nm).
  • the substrate 10 that has been subjected to the precision polishing by the CMP process and used in Examples 1 to 3 (first example group) may be referred to as a “polished SUS substrate”.
  • Example 4 and 5 and Comparative Example 5 the substrate 10 had a laminated structure of the base material 11 and the coating layer 12.
  • Al (aluminum) was used as the base material 11 and the thickness was set to 0.1 (mm), which is the same as Examples 1 to 3.
  • Ni—P was used as the coating layer 12.
  • the coating layer 12 was attached to the substrate 11 by using an electroless nickel plating method. Further, in Examples 4 and 5 and Comparative Example 5, similarly to Examples 1 to 3, the surface 10a of the substrate 10 was subjected to general mechanical polishing, and then subjected to precision polishing by CMP.
  • the maximum and minimum height difference Rmm of the surface 10a of the substrate 10 was 2.7 (nm), which was smaller than that of Examples 1 to 3.
  • the substrate 10 that has been subjected to the precision polishing process by the CMP process and used in Examples 4 and 5 (second example group) and Comparative Example 5 is referred to as a “polished Al substrate”.
  • Comparative Examples 1 to 4 In Comparative Examples 1 to 4, the substrate 10 had the same single-layer structure of the base material 11 as in Examples 1 to 3. That is, the configuration was such that the substrate 10 did not include the coating layer 12.
  • SUS316L was used as the base material 11 and the thickness was 0.1 (mm), as in Examples 1 to 3.
  • the maximum and minimum height difference Rmm of the surface 10a of the substrate 10 was 438 (nm), which was larger than in Examples 1 to 5.
  • the substrate 10 that has not been subjected to the precision polishing process by the CMP process used in Comparative Examples 1 to 4 may be referred to as an “unpolished SUS substrate”.
  • Table 2 shows the configuration of each layer in the lithium ion secondary battery 1 according to the first example group, that is, Examples 1 to 3.
  • Table 3 shows the configuration of each layer in the lithium ion secondary battery 1 according to the second example group, that is, Examples 4 and 5, and Comparative Example 5.
  • Table 4 shows the configuration of each layer in the lithium ion secondary batteries 1 according to Comparative Examples 1 to 4.
  • Tables 2 to 4 show the relationship between the name of each layer, the material constituting each layer, and the thickness thereof.
  • Example 1 will now be described with reference to Table 2.
  • the substrate 10 the above-mentioned polished SUS substrate was used.
  • the underlayer 20 LiNiO 2 formed by a sputtering method was used.
  • the thickness of the underlayer 20 was 200 nm.
  • LiNiO 2 and Li 3 PO 4 formed by a sputtering method were used.
  • the thickness of the positive electrode layer 30 was 1200 nm.
  • the ratio (molar ratio) between LiNiO 2 and Li 3 PO 4 in the positive electrode layer 30 was 73:27.
  • the solid electrolyte layer 40 Li 3 PO 4 formed by a sputtering method was used.
  • the thickness of the solid electrolyte layer 40 was 800 nm.
  • the thickness of the holding layer 50 was 30 nm.
  • the diffusion prevention layer 60 CrTi formed by a sputtering method was used. The thickness of the diffusion prevention layer 60 was 200 nm.
  • the negative electrode current collector layer 70 Pt formed by a sputtering method was used. The thickness of the negative electrode current collector layer 70 was 30 nm.
  • Example 2 Next, Example 2 will be described with reference to Table 2.
  • Example 2 is the same as Example 1 except that the thickness of the solid electrolyte layer 40 was set to 600 nm, which is smaller than that of Example 1.
  • Example 3 Next, a third embodiment will be described with reference to Table 2.
  • Example 3 is the same as Examples 1 and 2, except that the thickness of the solid electrolyte layer 40 is 400 nm, which is smaller than that of Examples 1 and 2.
  • Example 4 Now, a fourth embodiment will be described with reference to Table 3.
  • Example 5 is the same as Example 1 except that a polished Al substrate was used for the substrate 10 and the thickness of the solid electrolyte layer 40 was 700 nm.
  • Example 5 Next, a fifth embodiment will be described with reference to Table 3.
  • Example 5 is the same as Example 4 except that the thickness of the solid electrolyte layer 40 was set to 600 nm, which is smaller than Example 4.
  • Comparative Example 1 is the same as Example 1 except that an unpolished SUS substrate was used for the substrate 10 and the thickness of the solid electrolyte layer 40 was 1000 nm.
  • Comparative Example 2 Next, Comparative Example 2 will be described with reference to Table 4. Comparative Example 2 was the same as Comparative Example 1 except that the thickness of the solid electrolyte layer 40 was 800 nm, which was smaller than Comparative Example 1. From a different viewpoint, Comparative Example 2 is the same as Example 1 except that an unpolished SUS substrate was used for the substrate 10.
  • Comparative Example 3 is the same as Comparative Examples 1 and 2, except that the thickness of the solid electrolyte layer 40 is set to 600 nm, which is smaller than Comparative Examples 1 and 2. From a different viewpoint, Comparative Example 3 is the same as Example 2 except that an unpolished SUS substrate was used for the substrate 10.
  • Comparative Example 4 will be described with reference to Table 4. Comparative Example 4 is the same as Comparative Examples 1 to 3, except that the thickness of the solid electrolyte layer 40 is 400 nm, which is smaller than Comparative Examples 1 to 3. From a different viewpoint, Comparative Example 4 is the same as Example 3 except that an unpolished SUS substrate is used for the substrate 10.
  • Comparative Example 5 Next, Comparative Example 5 will be described with reference to Table 3. Comparative Example 5 is the same as Examples 4 and 5, except that the thickness of the solid electrolyte layer 40 is set to 1000 nm, which is larger than Examples 4 and 5.
  • Examples 1 to 3 the first example group
  • Comparative Examples 1 to 4 the substrate 10 and the negative electrode current collector were more intense than Examples 4 and 5 (the second example group) and Comparative Example 5.
  • Each area of the body layer 70 was increased.
  • the size of the positive electrode layer 30 was set to 21 mm ⁇ 36 mm.
  • Comparative Example 5 the size of the positive electrode layer 30 was 8 mm ⁇ 8 mm.
  • each lithium ion secondary battery 1 thus obtained was initially charged and discharged, whereby a lithium ion secondary battery 1 was obtained.
  • the thickness of the holding layer 50 was increased from the respective initial values by performing the initial charge / discharge.
  • Crystal structure First, the crystal structure will be described.
  • the present inventor measured the electron beam diffraction pattern of each of the lithium ion secondary batteries 1 of Examples 1 to 5 and Comparative Examples 1 to 5 to determine the crystal structure of each layer constituting the lithium ion secondary battery 1. (Crystallization, amorphization) was evaluated.
  • the substrate 10, the holding layer 50, and the negative electrode current collector layer 70 were each crystallized.
  • the underlayer 20, the solid electrolyte layer 40, and the diffusion prevention layer 60 were amorphous.
  • the positive electrode layer 30 a crystallized region and an amorphous region were mixed, and a crystallized region was scattered with respect to the amorphous region.
  • the lithium ion secondary batteries 1 of Comparative Examples 1 to 5 also exhibited the same crystal structure as the layers constituting the lithium ion secondary batteries 1 of Examples 1 to 5.
  • the discharge capacity is the amount of charge that the lithium ion secondary battery 1 can store, that is, the capacity ( ⁇ Ah). In this case, the larger the value of the discharge capacity, the better.
  • the discharge capacity was measured at two current values. In the evaluation relating to the first example group (Examples 1 to 3), the current values were set to 0.6 mA and 20 mA, and in the evaluation relating to the second example group (Examples 4 and 5), The current values were 0.08 mA and 2.7 mA.
  • the reason for setting the current value of the latter including the second embodiment group lower than that of the former including the first embodiment group is that the second embodiment has a lower current value than the first embodiment group. This is because the group has a smaller area of the lithium ion secondary battery 1.
  • the capacity retention rate is a percentage (%) of the capacity of the lithium ion secondary battery 1 at the time when a predetermined period has elapsed with respect to the initial capacity after the completion of charging. In this case, the higher the value of the capacity retention ratio is, the better, and the maximum value is 100%.
  • the capacity maintenance ratio after the full charge and after 3 hours was evaluated for the first example group (Examples 1 to 3) and Comparative Examples 1 to 4, and the second example was performed. For the group of examples (Examples 4 and 5) and Comparative Example 5, the capacity retention rate after full charge and 24 hours was evaluated.
  • the open circuit voltage is a voltage value (V) when no current is flowing through the lithium ion secondary battery 1. In this case, the larger the value of the open circuit voltage, the better.
  • the open circuit voltage was evaluated after charging (full charge) at 0.6 mA and after 10 minutes.
  • the internal resistance is an electric resistance value ( ⁇ ) existing inside the lithium ion secondary battery 1. In this case, the smaller the value of the internal resistance, the better.
  • the internal resistance at a current value of 20 mA was evaluated for the first example group (Examples 1 to 3) and Comparative Examples 1 to 4, and the second example was evaluated.
  • the internal resistance at a current value of 2.7 mA was evaluated for the group (Examples 4 and 5) and Comparative Example 5.
  • Table 5 shows the evaluation results of the electrical characteristics of the lithium ion secondary batteries 1 according to Examples 1 to 3 and Comparative Examples 1 to 4.
  • Table 6 shows the evaluation results of the electrical characteristics of the lithium ion secondary batteries 1 according to Examples 4 and 5 and Comparative Example 5. That is, Table 5 shows the evaluation results related to the first example group (Examples 1 to 3), and Table 6 shows the evaluation results related to the second example group (Examples 4 and 5). ing. Therefore, in Table 5, the current values when measuring the discharge capacity are 0.6 mA and 20 mA, and in Table 6, the current values when measuring the discharge capacity are 0.08 mA and 2.7 mA. I have.
  • the open-circuit voltage after charging at 0.6 mA and 10 minutes after was described as “open circuit voltage @ 10 minutes after charging at 0.6 mA”.
  • the discharge capacity at 0.6 mA is described as “$ 0.6 mA”
  • the discharge capacity at 20 mA is described as “$ 20 mA”.
  • the capacity retention rate after full charge and after 3 hours is described as “capacity retention rate @ after 3 hours”.
  • the discharge capacity at 0.08 mA is described as “$ 0.08 mA”
  • the discharge capacity at 2.7 mA is described as “$ 2.7 mA”.
  • the capacity retention rate after full charge and after 24 hours is described as “capacity retention rate @ after 24 hours”.
  • the internal resistance at 20 mA is described as “internal resistance @ 20 mA”
  • the internal resistance at 2.7 mA is described as “internal resistance@2.7 mA”.
  • Comparative Example 1 the value of the discharge capacity @ 20 mA was low, and was not suitable for high-speed charge / discharge.
  • SYMBOLS 1 lithium ion secondary battery, 10 ... board

Abstract

A lithium-ion secondary battery (1) consists of layers in the following order: a substrate (10) that serves as a positive electrode current collector layer; an underlayer (20); a positive electrode layer (30) containing a positive electrode active material; a solid electrolyte layer (40) containing Li3PO4 but not containing LiPON; a retaining layer (50) composed of a noble metal or the like; a diffusion prevention layer (60) composed of an amorphous alloy; and a negative electrode current collector layer (70) composed of a noble metal. A surface (10a) of the substrate (10) for laminating the underlayer (20) etc. has a maximum-minimum height difference, which is the height difference between the maximum height and the minimum height obtained by measuring unevenness in a range of 20 μm × 20 μm by Atomic Force Microscope (AFM), that is established at 78 nm or less. Thus, in a thin-film laminated lithium-ion secondary battery using Li3PO4 as an inorganic solid electrolyte constituting a solid electrolyte layer, an increase in internal resistance and a decrease in capacity retention rate are both suppressed.

Description

リチウムイオン二次電池、リチウムイオン二次電池の製造方法Lithium ion secondary battery, method of manufacturing lithium ion secondary battery
 本発明は、リチウムイオン二次電池、リチウムイオン二次電池の製造方法に関する。 The present invention relates to a lithium ion secondary battery and a method for manufacturing a lithium ion secondary battery.
 携帯電話やノート型パソコンなどの携帯電子機器の普及に伴い、高いエネルギー密度を有する、小型で軽量な二次電池の開発が強く望まれている。このような要求を満たす二次電池として、リチウムイオン二次電池が知られている。リチウムイオン二次電池は、正極活物質を含む正極と、負極活物質を含む負極と、リチウムイオン伝導性を示し且つ正極および負極の間に配置される電解質とを有している。 携 帯 With the spread of portable electronic devices such as mobile phones and notebook computers, there is a strong demand for the development of small and lightweight secondary batteries with high energy density. As a secondary battery satisfying such requirements, a lithium ion secondary battery is known. A lithium ion secondary battery has a positive electrode including a positive electrode active material, a negative electrode including a negative electrode active material, and an electrolyte having lithium ion conductivity and disposed between the positive electrode and the negative electrode.
 従来のリチウムイオン二次電池では、電解質として有機電解液等が用いられてきた。これに対し、電解質として無機材料からなる固体電解質(無機固体電解質)を用いるとともに、負極、固体電解質および正極をすべて薄膜で構成した、全固体型且つ薄膜積層型のリチウムイオン二次電池が提案されている(特許文献1参照)。
 また、特許文献1には、ガラス、半導体シリコン、セラミック、ステンレス、樹脂等からなる基板の上に、正極集電体層、正極活物質層、固体電解質層、負極活物質層および負極集電体層を積層することで、リチウムイオン二次電池を形成することが記載されている。さらに、特許文献1には、固体電解質層を構成する無機固体電解質としてLi3PO4(リン酸リチウム)を用いることが記載されている。
In a conventional lithium ion secondary battery, an organic electrolyte or the like has been used as an electrolyte. On the other hand, an all-solid-state and thin-film laminated lithium-ion secondary battery in which a solid electrolyte made of an inorganic material (inorganic solid electrolyte) is used as an electrolyte and the negative electrode, the solid electrolyte, and the positive electrode are all formed of thin films has been proposed. (See Patent Document 1).
Patent Document 1 discloses that a positive electrode current collector layer, a positive electrode active material layer, a solid electrolyte layer, a negative electrode active material layer, and a negative electrode current collector are provided on a substrate made of glass, semiconductor silicon, ceramic, stainless steel, resin, or the like. It is described that a lithium ion secondary battery is formed by stacking layers. Further, Patent Literature 1 describes that Li 3 PO 4 (lithium phosphate) is used as an inorganic solid electrolyte constituting a solid electrolyte layer.
特開2008-226728号公報JP 2008-226728 A
 一般に、リチウムイオン二次電池の容量は、充電後、特に使用しなくても、時間の経過とともに漸次減少していく。ここで、リチウムイオン二次電池の、充電完了後の初期の容量に対する、予め定められた期間が経過した時点における容量の比を百分率で表したものを、容量維持率と称する。
 無機固体電解質としてLi3PO4(リン酸リチウム)を用いた薄膜積層型のリチウムイオン二次電池の場合、Li3PO4のリチウムイオン伝導性が低いために、リチウムイオン二次電池の内部抵抗が高くなるという問題がある。そして、内部抵抗を低下させるために無機固体電解質の層を薄くすると、上記容量維持率が低下しやすくなり、充電後、特に使用しなくても、リチウムイオン二次電池が電源として機能しなくなるまでの時間が短くなることがあった。
 本発明は、固体電解質層を構成する無機固体電解質としてLi3PO4(リン酸リチウム)を用いた、薄膜積層型のリチウムイオン二次電池において、内部抵抗の上昇および容量維持率の低下を、ともに抑制することを目的とする。
In general, the capacity of a lithium ion secondary battery gradually decreases with time after charging, even if the battery is not used. Here, the ratio of the capacity of the lithium ion secondary battery at the time when a predetermined period has elapsed to the initial capacity after the completion of charging, expressed as a percentage, is referred to as a capacity retention rate.
In the case of a thin-film lithium ion secondary battery using Li 3 PO 4 (lithium phosphate) as the inorganic solid electrolyte, the internal resistance of the lithium ion secondary battery is low because the lithium ion conductivity of Li 3 PO 4 is low. Is high. When the thickness of the inorganic solid electrolyte layer is reduced in order to lower the internal resistance, the capacity retention ratio tends to decrease, and after charging, even if not particularly used, until the lithium ion secondary battery does not function as a power supply. Time was sometimes shortened.
The present invention provides a thin-film laminated lithium-ion secondary battery using Li 3 PO 4 (lithium phosphate) as an inorganic solid electrolyte constituting a solid electrolyte layer, in which a rise in internal resistance and a decrease in capacity retention rate are reduced. The purpose is to suppress both.
 本発明のリチウムイオン二次電池は、表面および裏面を有する基板と、前記基板における前記表面側に設けられ、第1の極性にてリチウムイオンを吸蔵および放出する第1極性層と、Li3PO4を含み且つLi3PO4における酸素の一部を窒素で置換したLiPONを含まない固体電解質層と、前記第1の極性とは逆の第2の極性にてリチウムイオンを吸蔵および放出する第2極性層とを順に含み、前記基板における前記表面は、AFM(Atomic Force Microscope)にて20μm×20μmの範囲の凹凸を測定して得られた最大高さと最小高さとの高低差である最大最小高低差が、78nm以下であることを特徴としている。
 このようなリチウムイオン二次電池において、前記固体電解質層の厚さが、400nm以上800nm以下であることを特徴とすることができる。
 また、前記固体電解質層の厚さが、前記第1極性層の厚さよりも小さいことを特徴とすることができる。
 また、前記基板が、導電性を有する金属で構成されることを特徴とすることができる。
 また、前記基板が、SUS316Lで構成されることを特徴とすることができる。
 また、前記基板が、前記表面にNi-Pめっきを施した金属材料で構成されることを特徴とすることができる。
 また、前記固体電解質層は、非晶質構造を有することを特徴とすることができる。
 また、前記第1の極性が正であり、前記第2の極性が負であり、前記第1極性層は、LiNiO2およびLi3PO4を含んでいることを特徴とすることができる。
 また、前記基板の前記表面と前記第1極性層との間に設けられ、LiNiO2を含みLi3PO4を含まない下地層をさらに有することを特徴とすることができる。
 また、前記第1の極性が正であり、前記第2の極性が負であり、前記固体電解質層と対峙して設けられ、白金族元素(Ru、Rh、Pd、Os、Ir、Pt)、金(Au)またはアルミニウム(Al)あるいはこれらの合金で構成される金属層をさらに有し、前記第2極性層は、前記金属層を構成する金属と合金化したリチウムを含んでいることを特徴とすることができる。
 また、前記金属層と対峙して設けられ、非晶質構造を有する、金属または合金で構成される非晶質層をさらに有することを特徴とすることができる。
 また、前記基板における前記表面の前記最大最小高低差が、2.7nm以下であることを特徴とすることができる。
 また、前記基板における前記表面の算術平均粗さRaが1.1nm以下であることを特徴とすることができる。
 また、他の観点から捉えると、本発明のリチウムイオン二次電池の製造方法は、AFM(Atomic Force Microscope)にて20μm×20μmの範囲の凹凸を測定して得られた最大高さと最小高さとの高低差である最大最小高低差が、78nm以下となる表面が設けられた基板を準備する基板準備工程と、前記基板における前記表面側に、第1の極性にてリチウムイオンを吸蔵および放出する第1極性層を形成する第1極性層形成工程と、前記基板上に設けられた前記第1極性層側に、Li3PO4を含み且つLi3PO4における酸素の一部を窒素で置換したLiPONを含まない固体電解質層を形成する固体電解質層形成工程と有している。
 このようなリチウムイオン二次電池の製造方法において、前記基板準備工程では、SUS316Lで構成された前記基板を準備することを特徴とすることができる。
 また、前記基板準備工程では、Ni-Pめっきを施した金属材料で構成された前記基板を準備することを特徴とすることができる。
 また、前記第1の極性が正であり、前記基板上に設けられた前記固体電解質層に、白金族元素(Ru、Rh、Pd、Os、Ir、Pt)、金(Au)またはアルミニウム(Al)あるいはこれらの合金で構成される金属層を形成する金属層形成工程と、前記基板、前記第1極性層、前記固体電解質層および前記金属層を含む積層体に対し、当該第1極性層から当該固体電解質層を介して当該金属層にリチウムイオンを移動させることで充電を行う充電工程と、充電された前記積層体に対し、前記金属層から前記固体電解質層を介して前記第1極性層にリチウムイオンを移動させることで放電を行う放電工程とをさらに有することを特徴とすることができる。
 また、前記金属層形成工程と前記充電工程との間において、前記金属層に、非晶質構造を有する、金属または合金で構成される非晶質層を形成する非晶質層形成工程をさらに含むことを特徴とすることができる。
 また、前記第1の極性が正であり、前記第1極性層形成工程では、LiNiO2およびLi3PO4を含む合材正極を形成することを特徴とすることができる。
 また、前記基板準備工程と前記第1極性層形成工程との間において、前記基板における前記表面に、LiNiO2を含みLi3PO4を含まない下地層を形成する下地層形成工程をさらに含むことを特徴とすることができる。
 また、前記基板準備工程では、前記表面の前記最大最小高低差が2.7nm以下に設定された前記基板を準備することを特徴とすることができる。
 また、前記基板準備工程では、前記表面の算術平均粗さRaが1.1nm以下に設定された前記基板を準備することを特徴とすることができる。
The lithium ion secondary battery of the present invention includes a substrate having a surface and a back surface provided on the surface side of the substrate, a first polarity layer of occluding and releasing lithium ions at a first polarity, Li 3 PO And a solid electrolyte layer not containing LiPON in which a part of oxygen in Li 3 PO 4 is replaced by nitrogen, and a lithium ion absorbing and releasing lithium ion at a second polarity opposite to the first polarity. And a bipolar layer in order, and the surface of the substrate has a maximum / minimum difference between a maximum height and a minimum height obtained by measuring unevenness in a range of 20 μm × 20 μm with an AFM (Atomic Force Microscope). The height difference is not more than 78 nm.
In such a lithium ion secondary battery, the thickness of the solid electrolyte layer may be 400 nm or more and 800 nm or less.
Further, the thickness of the solid electrolyte layer may be smaller than the thickness of the first polar layer.
Further, the substrate may be made of a conductive metal.
Further, the substrate may be made of SUS316L.
Further, the substrate may be made of a metal material whose surface is subjected to Ni-P plating.
Further, the solid electrolyte layer may have an amorphous structure.
Further, the first polarity is positive, the second polarity is negative, and the first polar layer includes LiNiO 2 and Li 3 PO 4 .
In addition, the semiconductor device may further include a base layer provided between the surface of the substrate and the first polar layer, the base layer including LiNiO 2 and not including Li 3 PO 4 .
Further, the first polarity is positive, the second polarity is negative, and the first polarity is provided to face the solid electrolyte layer, and a platinum group element (Ru, Rh, Pd, Os, Ir, Pt), It further includes a metal layer made of gold (Au), aluminum (Al), or an alloy thereof, wherein the second polar layer contains lithium alloyed with a metal constituting the metal layer. It can be.
In addition, the semiconductor device may further include an amorphous layer which is provided to face the metal layer and has an amorphous structure and is made of a metal or an alloy.
The maximum and minimum height difference of the surface of the substrate may be 2.7 nm or less.
The arithmetic mean roughness Ra of the surface of the substrate may be 1.1 nm or less.
From another viewpoint, the method for manufacturing a lithium ion secondary battery of the present invention has a maximum height and a minimum height obtained by measuring unevenness in a range of 20 μm × 20 μm with an AFM (Atomic Force Microscope). A substrate preparation step of preparing a substrate provided with a surface having a maximum / minimum height difference of 78 nm or less, and occluding and releasing lithium ions at a first polarity on the surface side of the substrate. a first polarity layer forming step of forming a first polarity layer, replacing the first polarity layer side provided on the substrate, a portion of the oxygen in and Li 3 PO 4 include Li 3 PO 4 in a nitrogen And a solid electrolyte layer forming step of forming a solid electrolyte layer containing no LiPON.
In such a method for manufacturing a lithium ion secondary battery, the substrate preparing step may include preparing the substrate made of SUS316L.
Further, in the substrate preparing step, the substrate made of a metal material plated with Ni-P may be prepared.
In addition, the first polarity is positive, and a platinum group element (Ru, Rh, Pd, Os, Ir, Pt), gold (Au), or aluminum (Al) is formed on the solid electrolyte layer provided on the substrate. Or a metal layer forming step of forming a metal layer made of an alloy thereof, and a step of forming a metal layer comprising the substrate, the first polar layer, the solid electrolyte layer, and the metal layer from the first polar layer. A charging step of performing charging by moving lithium ions to the metal layer via the solid electrolyte layer; and, for the charged laminate, the first polar layer from the metal layer via the solid electrolyte layer. A discharge step of performing discharge by moving lithium ions to the substrate.
In addition, between the metal layer forming step and the charging step, the metal layer may further include an amorphous layer forming step of forming an amorphous layer made of a metal or an alloy having an amorphous structure. May be included.
Further, the first polarity is positive, and in the first polar layer forming step, a composite positive electrode containing LiNiO 2 and Li 3 PO 4 is formed.
The method may further include, between the substrate preparing step and the first polar layer forming step, an underlayer forming step of forming an underlayer containing LiNiO 2 and not Li 3 PO 4 on the surface of the substrate. Can be characterized.
Further, in the substrate preparing step, the substrate having the maximum and minimum height difference of the surface set to 2.7 nm or less may be prepared.
Further, in the substrate preparing step, the substrate may be prepared such that an arithmetic average roughness Ra of the surface is set to 1.1 nm or less.
 本発明によれば、固体電解質層を構成する無機固体電解質としてLi3PO4(リン酸リチウム)を用いた、薄膜積層型のリチウムイオン二次電池において、内部抵抗の上昇および容量維持率の低下を、ともに抑制することができる。 According to the present invention, in a thin-film laminated lithium ion secondary battery using Li 3 PO 4 (lithium phosphate) as an inorganic solid electrolyte constituting a solid electrolyte layer, an increase in internal resistance and a decrease in capacity retention rate are achieved. Can be suppressed together.
実施の形態のリチウムイオン二次電池の断面構成を示す図である。FIG. 2 is a diagram illustrating a cross-sectional configuration of a lithium ion secondary battery according to an embodiment. (a)、(b)は、実施の形態のリチウムイオン二次電池を構成する基板の断面構成例を示す図である。(A), (b) is a figure which shows the cross-sectional structural example of the board | substrate which comprises the lithium ion secondary battery of embodiment. 実施の形態のリチウムイオン二次電池の製造方法を説明するためのフローチャートである。4 is a flowchart for explaining a method of manufacturing a lithium ion secondary battery according to an embodiment. (a)~(c)は、保持層を多孔質化する手順を説明するための図である。(A)-(c) is a figure for demonstrating the procedure of making a holding | maintenance layer porous.
 以下、添付図面を参照して、本発明の実施の形態について詳細に説明する。なお、以下の説明で参照する図面における各部の大きさや厚さ等は、実際の寸法とは異なっている場合がある。 Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. Note that the size, thickness, and the like of each part in the drawings referred to in the following description may be different from actual dimensions.
[リチウムイオン二次電池の構成]
 図1は、本実施の形態のリチウムイオン二次電池1の断面構成を示す図である。本実施の形態のリチウムイオン二次電池1は、後述するように、複数の層を積層した構造を有しており、所謂成膜プロセスによって基本的な構造を形成した後、初回の充放電動作によってその構造を完成させるようになっている。
[Configuration of lithium ion secondary battery]
FIG. 1 is a diagram showing a cross-sectional configuration of a lithium ion secondary battery 1 of the present embodiment. As described later, the lithium ion secondary battery 1 of the present embodiment has a structure in which a plurality of layers are stacked. After forming a basic structure by a so-called film forming process, the first charge / discharge operation is performed. Completes the structure.
 図1に示すリチウムイオン二次電池1は、基板10と、基板10上に積層される下地層20と、下地層20上に積層される正極層30と、正極層30上に積層される固体電解質層40とを備えている。ここで、固体電解質層40は、下地層20および正極層30の両者の周縁を覆うとともにその端部が基板10に直接積層されることで、基板10とともに下地層20および正極層30を覆っている。また、このリチウムイオン二次電池1は、固体電解質層40上に積層される保持層50と、保持層50上に積層される拡散防止層60と、拡散防止層60上に積層される負極集電体層70とをさらに備えている。 The lithium ion secondary battery 1 shown in FIG. 1 includes a substrate 10, an underlayer 20 laminated on the substrate 10, a positive electrode layer 30 laminated on the underlayer 20, and a solid layer laminated on the positive electrode layer 30. And an electrolyte layer 40. Here, the solid electrolyte layer 40 covers the peripheral edges of both the base layer 20 and the positive electrode layer 30 and the ends thereof are directly laminated on the substrate 10, so that the solid electrolyte layer 40 covers the base layer 20 and the positive electrode layer 30 together with the substrate 10. I have. Further, this lithium ion secondary battery 1 has a holding layer 50 stacked on the solid electrolyte layer 40, a diffusion prevention layer 60 stacked on the holding layer 50, and a negative electrode collection layer stacked on the diffusion prevention layer 60. And an electric conductor layer 70.
(基板)
 基板10は、下地層20乃至負極集電体層70を、成膜プロセスによって積層するための土台となるものである。そして、この基板10は、表面10aと裏面10bとを有しており、表面10a側に、下地層20乃至負極集電体層70が積層されるようになっている。なお、基板10の詳細については後述する。
(substrate)
The substrate 10 serves as a base on which the base layer 20 to the negative electrode current collector layer 70 are stacked by a film forming process. The substrate 10 has a front surface 10a and a back surface 10b, and the base layer 20 to the negative electrode current collector layer 70 are stacked on the front surface 10a. The details of the substrate 10 will be described later.
(下地層)
 下地層20は、固体薄膜であって、基板10と正極層30との密着性を高めるとともに、基板10を構成する材料(特に金属材料)と、正極層30を構成するLi3PO4(リン酸リチウム:詳細は後述する)とが、直接に接触するのを抑制するための障壁となるものである。
 下地層20としては、電子伝導性を有するとともに、Li3PO4を構成するLi+(リチウムイオン)やPO4 3-(リン酸イオン)による腐食が生じ難い、金属または金属化合物等で構成されたものを用いることができる。
(Underlayer)
The underlayer 20 is a solid thin film, which enhances the adhesion between the substrate 10 and the positive electrode layer 30, as well as a material (particularly a metal material) forming the substrate 10 and a Li 3 PO 4 (phosphorus) forming the positive electrode layer 30. (A lithium oxide: described later in detail) is a barrier for suppressing direct contact.
As the base layer 20, which has electron conductivity, Li 3 PO 4 and Li + unlikely to occur corrosion by (Li-ion) or PO 4 3- (phosphate ions) constituting, formed of a metal or metal compound such as Can be used.
 ここで、本実施の形態では、下地層20を、LiNiO2(リン酸ニッケル)で構成している。LiNiO2は、リチウムイオン二次電池1の正極材料として用いられることがあるものである。 Here, in the present embodiment, the underlayer 20 is made of LiNiO 2 (nickel phosphate). LiNiO 2 is sometimes used as a positive electrode material of the lithium ion secondary battery 1.
 下地層20の厚さは、例えば5nm以上50μm以下とすることができる。下地層20の厚さが5nm未満であると、障壁としての機能が低下し、実用的ではなくなる。一方、下地層20の厚さが50μmを超えると、電池の内部抵抗が高くなり、高速での充放電には不利である。 The thickness of the underlayer 20 can be, for example, not less than 5 nm and not more than 50 μm. If the thickness of the underlayer 20 is less than 5 nm, the function as a barrier is reduced, which is not practical. On the other hand, if the thickness of the underlayer 20 exceeds 50 μm, the internal resistance of the battery increases, which is disadvantageous for high-speed charging and discharging.
 また、下地層20の製造方法としては、各種PVD(物理蒸着)や各種CVD(化学蒸着)など、公知の成膜手法を用いてかまわないが、生産効率の観点からすれば、スパッタ法もしくは真空蒸着法を用いることが望ましい。 As a method for manufacturing the underlayer 20, any known film forming method such as various PVD (physical vapor deposition) and various CVD (chemical vapor deposition) may be used, but from the viewpoint of production efficiency, a sputtering method or a vacuum method is used. It is desirable to use an evaporation method.
(正極層)
 第1極性層の一例としての正極層30は、固体薄膜であって、充電時にはリチウムイオンを放出するとともに放電時にはリチウムイオンを吸蔵する正極活物質を含むものである。ここで、正極層30を構成する正極活物質としては、例えば、マンガン(Mn)、コバルト(Co)、ニッケル(Ni)、鉄(Fe)、モリブデン(Mo)、バナジウム(V)から選ばれる一種以上の金属を含む、酸化物、硫化物あるいはリン酸化物など、各種材料で構成されたものを用いることができる。また、正極層30は、さらに固体電解質を含んだ合材正極であってもよい。なお、本実施の形態では、第1の極性に正極性が対応している。
(Positive electrode layer)
The positive electrode layer 30 as an example of the first polar layer is a solid thin film and contains a positive electrode active material that releases lithium ions during charging and absorbs lithium ions during discharging. Here, the positive electrode active material constituting the positive electrode layer 30 is, for example, a kind selected from manganese (Mn), cobalt (Co), nickel (Ni), iron (Fe), molybdenum (Mo), and vanadium (V). Materials composed of various materials such as oxides, sulfides, and phosphorus oxides containing the above metals can be used. Further, the positive electrode layer 30 may be a composite positive electrode further containing a solid electrolyte. In this embodiment, the positive polarity corresponds to the first polarity.
 ここで、本実施の形態では、正極層30を、正極活物質と、無機材料からなる固体電解質(無機固体電解質)とを含む合材正極で構成している。より具体的に説明すると、本実施の形態の正極層30は、主として無機固体電解質を含む固体電解質領域と、主として正極活物質を含む正極領域とを有している。そして、正極層30内では、固体電解質領域を構成する無機固体電解質と、正極領域を構成する正極活物質とが、それぞれを維持した状態で混在している。その結果、正極層30では、一方がマトリックス(母材)となっており、他方がフィラー(粒子)となっている。ここで、正極層30においては、固体電解質領域をマトリックスとし、正極領域をフィラーとすることが望ましい。 Here, in the present embodiment, the positive electrode layer 30 is formed of a mixed positive electrode including a positive electrode active material and a solid electrolyte made of an inorganic material (inorganic solid electrolyte). More specifically, the positive electrode layer 30 of the present embodiment has a solid electrolyte region mainly containing an inorganic solid electrolyte and a positive electrode region mainly containing a positive electrode active material. Then, in the positive electrode layer 30, the inorganic solid electrolyte forming the solid electrolyte region and the positive electrode active material forming the positive electrode region are mixed while maintaining each. As a result, in the positive electrode layer 30, one is a matrix (base material) and the other is a filler (particles). Here, in the positive electrode layer 30, it is desirable that the solid electrolyte region be a matrix and the positive electrode region be a filler.
 そして、本実施の形態では、正極層30を構成する正極活物質として、上記下地層20と同じLiNiO2を用いている。また、正極層30を構成する無機固体電解質として、Li3PO4(リン酸リチウム)を用いている。ここで、正極層30における正極活物質と無機固体電解質との比率については、適宜選択して差し支えない。ただし、容量および導電性の両者を確保するという観点からすれば、正極活物質と無機固体電解質との比率を、モル比で9:1(90%:10%)乃至3:2(60%:40%)の範囲とすることが好ましい。 In the present embodiment, the same LiNiO 2 as the underlayer 20 is used as the positive electrode active material forming the positive electrode layer 30. Li 3 PO 4 (lithium phosphate) is used as the inorganic solid electrolyte constituting the positive electrode layer 30. Here, the ratio between the positive electrode active material and the inorganic solid electrolyte in the positive electrode layer 30 may be appropriately selected. However, from the viewpoint of securing both capacity and conductivity, the molar ratio of the positive electrode active material to the inorganic solid electrolyte is from 9: 1 (90%: 10%) to 3: 2 (60%: 40%).
 正極層30の厚さは、例えば10nm以上40μm以下とすることができる。正極層30の厚さが10nm未満であると、得られるリチウムイオン二次電池1の容量が小さくなりすぎ、実用的ではなくなる。一方、正極層30の厚さが40μmを超えると、層形成に時間がかかりすぎるようになってしまい、生産性が低下する。ただし、リチウムイオン二次電池1に要求される電池容量が大きい場合には、正極層30の厚さを40μm超としてもかまわない。 (4) The thickness of the positive electrode layer 30 can be, for example, not less than 10 nm and not more than 40 μm. When the thickness of the positive electrode layer 30 is less than 10 nm, the capacity of the obtained lithium ion secondary battery 1 becomes too small, which is not practical. On the other hand, if the thickness of the positive electrode layer 30 exceeds 40 μm, it takes too much time to form the layer, and the productivity is reduced. However, when the battery capacity required for the lithium ion secondary battery 1 is large, the thickness of the positive electrode layer 30 may be more than 40 μm.
 さらに、正極層30の作製方法としては、各種PVDや各種CVDなど、公知の成膜手法を用いてかまわないが、生産効率の観点からすれば、スパッタ法を用いることが望ましい。 Further, as a method for forming the positive electrode layer 30, a known film forming method such as various PVD or various CVD may be used, but it is preferable to use a sputtering method from the viewpoint of production efficiency.
(固体電解質層)
 固体電解質層40は、無機材料からなる固体薄膜であって、外部から加えられた電場によってリチウムイオンを移動させることのできる無機固体電解質を含むものである。
 本実施の形態の固体電解質層40は、正極層30における無機固体電解質と同じLi3PO4で構成されている。また、本実施の形態の固体電解質層40は、Li3PO4を含む一方、Li3PO4における酸素の一部を窒素で置換したLiPON(Li3PO4-xx(0<x<1))を含んでいない。
(Solid electrolyte layer)
The solid electrolyte layer 40 is a solid thin film made of an inorganic material, and includes an inorganic solid electrolyte capable of moving lithium ions by an externally applied electric field.
The solid electrolyte layer 40 of the present embodiment is made of the same Li 3 PO 4 as the inorganic solid electrolyte in the positive electrode layer 30. Further, the solid electrolyte layer 40 of the present embodiment contains Li 3 PO 4 , while LiPON (Li 3 PO 4-x N x (0 <x <) in which part of oxygen in Li 3 PO 4 is replaced by nitrogen. 1)) is not included.
 固体電解質層40の厚さは、例えば400nm以上800nm以下とすることができる。固体電解質層40の厚さが400nm未満であると、得られたリチウムイオン二次電池1において、正極層30と保持層50との間での電流の漏れ(リーク)が生じやすくなる。一方、固体電解質層40の厚さが800nmを超えると、電池の内部抵抗が高くなり、高速での充放電には不利である。また、固体電解質層40の厚さは、例えば600nm以上800nm以下とすることが好ましい。 厚 The thickness of the solid electrolyte layer 40 can be, for example, 400 nm or more and 800 nm or less. When the thickness of the solid electrolyte layer 40 is less than 400 nm, current leakage between the positive electrode layer 30 and the holding layer 50 easily occurs in the obtained lithium ion secondary battery 1. On the other hand, if the thickness of the solid electrolyte layer 40 exceeds 800 nm, the internal resistance of the battery increases, which is disadvantageous for high-speed charging and discharging. Further, the thickness of the solid electrolyte layer 40 is preferably, for example, not less than 600 nm and not more than 800 nm.
 ここで、正極層30および固体電解質層40の厚さの関係については、どちらが厚くてもかまわないし、同じであってもよい。ただし、電池の内部抵抗の増大を抑制するという観点からすれば、固体電解質層40の厚さを、正極層30の厚さよりも小さくすることが好ましい。 Here, as for the relationship between the thickness of the positive electrode layer 30 and the thickness of the solid electrolyte layer 40, whichever may be thicker or the same. However, from the viewpoint of suppressing an increase in the internal resistance of the battery, it is preferable that the thickness of the solid electrolyte layer 40 be smaller than the thickness of the positive electrode layer 30.
 さらに、固体電解質層40の製造方法としては、各種PVDや各種CVDなど、公知の成膜手法を用いてかまわないが、生産効率の観点からすれば、スパッタ法を用いることが望ましい。 Further, as a method for manufacturing the solid electrolyte layer 40, a known film forming method such as various PVD or various CVD may be used, but from the viewpoint of production efficiency, it is preferable to use a sputtering method.
(保持層)
 金属層の一例としての保持層50は、固体薄膜であって、充電時にはリチウムイオンを保持するとともに放電時にはリチウムイオンを放出する機能を備えるものである。ここで、本実施の形態の保持層50は、自身は負極活物質を含んでおらず、負極活物質として機能するリチウムを内部に保持するようになっている点が、一般的な負極層とは異なる。また、本実施の形態の保持層50は、リチウムを内部に保持した場合に、第2極性層の一例としての機能も果たすようになっている。なお、本実施の形態では、第2の極性に負極性が対応している。
(Holding layer)
The holding layer 50 as an example of a metal layer is a solid thin film and has a function of holding lithium ions during charging and releasing lithium ions during discharging. Here, the point that the holding layer 50 of the present embodiment does not itself include a negative electrode active material and is configured to hold lithium functioning as a negative electrode active material therein is different from a general negative electrode layer. Is different. Further, the holding layer 50 of the present embodiment also functions as an example of the second polar layer when lithium is held inside. In this embodiment, the second polarity corresponds to the negative polarity.
 そして、本実施の形態の保持層50は、多孔質構造を有しており、多数の空孔が形成された多孔質部(図示せず)によって構成されている。なお、保持層50の多孔質化すなわち多孔質部の形成は、成膜後の初回の充放電動作に伴って行われるのであるが、その詳細については後述する。 The holding layer 50 of the present embodiment has a porous structure, and is constituted by a porous portion (not shown) in which a large number of holes are formed. The porousization of the holding layer 50, that is, the formation of the porous portion, is performed in the first charge / discharge operation after the film formation, and the details will be described later.
 保持層50を構成する材料としては、白金族元素(Ru、Rh、Pd、Os、Ir、Pt)または金(Au)、アルミニウム(Al)あるいはこれらの合金を用いることができる。これらの中でも、より酸化されにくい白金または金で保持層50を構成することが望ましい。また、本実施の形態の保持層50は、上述した貴金属および金属あるいはこれらの合金の多結晶体で構成することができる。 材料 As a material for forming the holding layer 50, a platinum group element (Ru, Rh, Pd, Os, Ir, Pt), gold (Au), aluminum (Al), or an alloy thereof can be used. Among these, it is desirable that the holding layer 50 be made of platinum or gold, which is less likely to be oxidized. Further, the holding layer 50 of the present embodiment can be made of the above-mentioned noble metal and metal or a polycrystal of an alloy thereof.
 ここで、本実施の形態では、保持層50を白金で構成している。 Here, in the present embodiment, the holding layer 50 is made of platinum.
 保持層50の厚さは、例えば10nm以上40μm以下とすることができる。保持層50の厚さが10nm未満であると、リチウムを保持する能力が不十分となる。一方、保持層50の厚さが40μmを超えると、電池の内部抵抗が高くなり、高速での充放電には不利である。ただし、リチウムイオン二次電池1に要求される電池容量が大きい場合には、保持層50の厚さを40μm超としてもかまわない。 The thickness of the holding layer 50 can be, for example, not less than 10 nm and not more than 40 μm. When the thickness of the holding layer 50 is less than 10 nm, the ability to hold lithium becomes insufficient. On the other hand, if the thickness of the holding layer 50 exceeds 40 μm, the internal resistance of the battery increases, which is disadvantageous for high-speed charging and discharging. However, when the battery capacity required for the lithium ion secondary battery 1 is large, the thickness of the holding layer 50 may be more than 40 μm.
 さらに、保持層50の製造方法としては、各種PVDや各種CVDなど、公知の成膜手法を用いてかまわないが、生産効率の観点からすれば、スパッタ法を用いることが望ましい。そして、多孔質化した保持層50の製造方法としては、後述するような、充電と放電とを行う手法を採用することが望ましい。 Further, as a method for manufacturing the holding layer 50, a known film forming method such as various PVD or various CVD may be used, but from the viewpoint of production efficiency, it is preferable to use a sputtering method. As a method for manufacturing the porous holding layer 50, it is desirable to employ a method of performing charging and discharging, as described later.
(拡散防止層)
 非晶質層の一例としての拡散防止層60は、固体薄膜であって、保持層50に保持されたリチウムイオンの、リチウムイオン二次電池1の外部への拡散を抑制するためのものである。
 拡散防止層60としては、非晶質構造を有する、金属または合金で構成されたものを用いることができる。また、拡散防止層60は、リチウムと金属間化合物を形成しない金属または合金で構成されることが好ましく、これらの中でも、耐腐食性の観点から、クロム(Cr)単体またはクロムを含む合金であることが好ましい。なお、拡散防止層60は、構成材料が異なる非晶質層を、複数積層して構成する(例えば非晶質クロム層および非晶質クロムチタン合金層の積層構造とする)こともできる。また、本実施の形態における「非晶質構造」には、全体が非晶質構造を有しているものはもちろんのこと、非晶質構造中に微結晶が析出しているものも含まれる。
(Diffusion prevention layer)
The diffusion prevention layer 60 as an example of the amorphous layer is a solid thin film, and is for suppressing diffusion of lithium ions held in the holding layer 50 to the outside of the lithium ion secondary battery 1. .
As the diffusion prevention layer 60, a material having an amorphous structure and made of a metal or an alloy can be used. The diffusion prevention layer 60 is preferably made of a metal or an alloy that does not form an intermetallic compound with lithium. Among these, from the viewpoint of corrosion resistance, chromium (Cr) alone or an alloy containing chromium is preferred. Is preferred. The diffusion prevention layer 60 may be formed by laminating a plurality of amorphous layers having different constituent materials (for example, a laminated structure of an amorphous chromium layer and an amorphous chromium titanium alloy layer). Further, the “amorphous structure” in the present embodiment includes not only a structure having an amorphous structure as a whole but also a structure in which microcrystals are precipitated in the amorphous structure. .
 ここで、本実施の形態では、拡散防止層60を、クロムおよびチタンの合金(CrTi)で構成している。また、拡散防止層60に用いることが可能な金属(合金)としては、CrTi以外に、ZrCuAlNiPdP、CuZr、FeZr、TiZr、CoZrNb、NiNb、NiTiNb、NiP、CuP、NiPCu、NiTi、AlTi、FeSiB、AuSi等を挙げることができる。 Here, in the present embodiment, the diffusion preventing layer 60 is made of an alloy of chromium and titanium (CrTi). The metals (alloys) that can be used for the diffusion preventing layer 60 include, in addition to CrTi, ZrCuAlNiPdP, CuZr, FeZr, TiZr, CoZrNb, NiNb, NiTiNb, NiP, CuP, NiPCu, NiTi, AlTi, FeSiB, AuSi And the like.
 拡散防止層60の厚さは、例えば10nm以上40μm以下とすることができる。拡散防止層60の厚さが10nm未満であると、固体電解質層40側から保持層50を通過してきたリチウムを、拡散防止層60でせき止めにくくなる。一方、拡散防止層60の厚さが40μmを超えると、電池の内部抵抗が高くなり、高速での充放電には不利である。 The thickness of the diffusion preventing layer 60 can be, for example, not less than 10 nm and not more than 40 μm. When the thickness of the diffusion preventing layer 60 is less than 10 nm, it is difficult for the lithium that has passed through the holding layer 50 from the solid electrolyte layer 40 side to be blocked by the diffusion preventing layer 60. On the other hand, if the thickness of the diffusion prevention layer 60 exceeds 40 μm, the internal resistance of the battery increases, which is disadvantageous for high-speed charging and discharging.
 さらに、拡散防止層60の製造方法としては、各種PVDや各種CVDなど、公知の成膜手法を用いてかまわないが、生産効率の観点からすれば、スパッタ法を用いることが望ましい。特に、拡散防止層60を、上述したクロムチタン合金で構成する場合、スパッタ法を採用すると、クロムチタン合金が非晶質化しやすい。 Further, as a method for manufacturing the diffusion preventing layer 60, a known film forming method such as various PVD or various CVD may be used, but from the viewpoint of production efficiency, it is preferable to use a sputtering method. In particular, when the diffusion prevention layer 60 is made of the above-described chromium-titanium alloy, the chromium-titanium alloy tends to be amorphous when the sputtering method is adopted.
(負極集電体層)
 負極集電体層70は、電子伝導性を有する固体薄膜であって、保持層50への集電を行う機能を備えるものである。ここで、負極集電体層70を構成する材料は、電子伝導性を有するものであれば、特に限定されるものではなく、各種金属や、各種金属の合金を含む導電性材料を用いることができる。ただし、拡散防止層60の腐食を抑制するという観点からすれば、化学的に安定した材料を用いることが好ましく、例えば、白金族元素(Ru、Rh、Pd、Os、Ir、Pt)または金(Au)あるいはこれらの合金で構成することが好ましい。
(Negative electrode current collector layer)
The negative electrode current collector layer 70 is a solid thin film having electron conductivity, and has a function of collecting current to the holding layer 50. Here, the material constituting the negative electrode current collector layer 70 is not particularly limited as long as it has electron conductivity, and various metals and conductive materials including alloys of various metals may be used. it can. However, from the viewpoint of suppressing corrosion of the diffusion prevention layer 60, it is preferable to use a chemically stable material, for example, a platinum group element (Ru, Rh, Pd, Os, Ir, Pt) or gold ( Au) or an alloy thereof is preferable.
 ここで、本実施の形態では、負極集電体層70を、保持層50と同じ白金で構成している。ただし、負極集電体層70は、保持層50とは異なり、多孔質構造を有していない。 Here, in the present embodiment, the negative electrode current collector layer 70 is made of the same platinum as the holding layer 50. However, unlike the holding layer 50, the negative electrode current collector layer 70 does not have a porous structure.
 負極集電体層70の厚さは、例えば5nm以上50μm以下とすることができる。負極集電体層70の厚さが5nm未満であると、耐腐食性および集電機能が低下し、実用的ではなくなる。一方、負極集電体層70の厚さが50μmを超えると、電池の内部抵抗が高くなり、高速での充放電には不利である。 厚 The thickness of the negative electrode current collector layer 70 can be, for example, not less than 5 nm and not more than 50 μm. If the thickness of the negative electrode current collector layer 70 is less than 5 nm, the corrosion resistance and the current collecting function will be reduced, and it will not be practical. On the other hand, if the thickness of the negative electrode current collector layer 70 exceeds 50 μm, the internal resistance of the battery increases, which is disadvantageous for high-speed charging and discharging.
 また、負極集電体層70の製造方法としては、各種PVDや各種CVDなど、公知の成膜手法を用いてかまわないが、生産効率の観点からすれば、スパッタ法を用いることが望ましい。 As a method of manufacturing the negative electrode current collector layer 70, a known film forming method such as various PVD or various CVD may be used, but from the viewpoint of production efficiency, it is preferable to use a sputtering method.
[基板の構成]
 次に、本実施の形態で用いた基板10について説明を行う。
 基板10を構成する材料は、特に限定されるものではなく、金属、ガラス、セラミックス、樹脂など、各種材料を採用することができる。
[Structure of substrate]
Next, the substrate 10 used in the present embodiment will be described.
The material forming the substrate 10 is not particularly limited, and various materials such as metal, glass, ceramics, and resin can be adopted.
 ここで、本実施の形態では、基板10を、電子伝導性を有する金属製の板材で構成している。これにより、基板10を、下地層20を介して正極層30への集電を行う正極集電体層として機能させるようになっている。 Here, in the present embodiment, the substrate 10 is made of a metal plate having electron conductivity. Thereby, the substrate 10 is caused to function as a positive electrode current collector layer that collects electric current to the positive electrode layer 30 via the base layer 20.
 基板10の厚さは、例えば20μm以上2000μm以下とすることができる。基板10の厚さが20μm未満であると、リチウムイオン二次電池1の強度が不足するおそれがある。一方、基板10の厚さが2000μmを超えると、電池の厚さおよび重量の増加により体積エネルギー密度および重量エネルギー密度が低下する。 The thickness of the substrate 10 can be, for example, not less than 20 μm and not more than 2000 μm. If the thickness of the substrate 10 is less than 20 μm, the strength of the lithium ion secondary battery 1 may be insufficient. On the other hand, if the thickness of the substrate 10 exceeds 2000 μm, the volume energy density and the weight energy density decrease due to the increase in the thickness and weight of the battery.
 図2は、実施の形態のリチウムイオン二次電池1を構成する基板10の断面構成例を示す図である。以下では、図2(a)に示す基板10を第1の構成例、また、図2(b)に示す基板10を第2の構成例と称し、それぞれについて説明を行う。 FIG. 2 is a diagram showing a cross-sectional configuration example of a substrate 10 constituting the lithium ion secondary battery 1 of the embodiment. Hereinafter, the substrate 10 shown in FIG. 2A will be referred to as a first configuration example, and the substrate 10 shown in FIG. 2B will be referred to as a second configuration example.
(第1の構成例)
 図2(a)に示す第1の構成例において、基板10は、単層の金属板で構成された基材11を備えている。
 第1の構成例において、基材11を構成する金属材料としては、各種金属やこれらの合金等を用いることができる。ここで、第1の構成例において、リン酸に起因する腐食を抑制するという観点からすれば、基材11としてステンレスを用いることが望ましく、特に、粒界腐食を抑止するという観点からすれば、SUS316、より好ましくはSUS316Lを用いることが望ましい。また、本実施の形態のように、基材11上に積層する下地層20としてLiNiO2を採用する場合は、基材11を構成する金属材料として、熱膨張率がLiNiO2に近いステンレスを用いることが好ましい。さらに、本実施の形態のように、基材11を正極集電体層としても利用する場合は、基材11を構成する金属材料として、高電圧環境下においても腐食されにくく、過放電に強いステンレスを用いることが好ましい。
 なお、第1の構成例において、基板10を構成する基材11は、単層の金属板に限られるものではなく、複数の金属板の積層体で構成されていてもかまわない。
(First configuration example)
In the first configuration example shown in FIG. 2A, the substrate 10 includes a base material 11 made of a single-layer metal plate.
In the first configuration example, various metals and alloys thereof can be used as the metal material forming the base material 11. Here, in the first configuration example, it is desirable to use stainless steel as the substrate 11 from the viewpoint of suppressing corrosion caused by phosphoric acid, and particularly from the viewpoint of suppressing intergranular corrosion, It is desirable to use SUS316, more preferably SUS316L. When LiNiO 2 is used as the base layer 20 laminated on the base material 11 as in the present embodiment, stainless steel having a coefficient of thermal expansion close to that of LiNiO 2 is used as the metal material forming the base material 11. Is preferred. Further, when the base material 11 is also used as a positive electrode current collector layer as in the present embodiment, the metal material constituting the base material 11 is hardly corroded even in a high voltage environment and resistant to overdischarge. It is preferable to use stainless steel.
In the first configuration example, the base material 11 forming the substrate 10 is not limited to a single-layer metal plate, and may be formed of a laminate of a plurality of metal plates.
(第2の構成例)
 図2(b)に示す第2の構成例において、基板10は、単層の金属板で構成された基材11と、基材11の全面を覆う被覆層12とを備えている。
 第2の構成例において、基材11を構成する金属材料としては、各種金属やこれらの合金あるいは金属化合物等を用いることができる。ここで、第2の構成例において、リチウムに起因する腐食を抑制するという観点からすれば、基材11としてアルミニウムを用いることが望ましい。
 なお、第2の構成例において、基材11は、単層の金属板に限られるものではなく、複数の金属板の積層体で構成されていてもかまわない。
(Second configuration example)
In the second configuration example shown in FIG. 2B, the substrate 10 includes a base material 11 made of a single-layer metal plate, and a coating layer 12 that covers the entire surface of the base material 11.
In the second configuration example, as the metal material forming the base material 11, various metals, their alloys, metal compounds, and the like can be used. Here, in the second configuration example, it is desirable to use aluminum as the base material 11 from the viewpoint of suppressing corrosion caused by lithium.
Note that, in the second configuration example, the base material 11 is not limited to a single-layer metal plate, and may be formed of a laminate of a plurality of metal plates.
 また、第2の構成例において、被覆層12を構成する材料としては、各種金属やこれらの合金あるいは金属化合物等を用いることができる。ここで、基材11に被覆層12を形成してなる基板10を採用する場合、リチウムに起因する腐食を抑制するという観点からすれば、CrTi、ZrCuAlNiPdP、CuZr、FeZr、TiZr、CoZrNb、NiNb、NiTiNb、NiP、CuP、NiPCu、NiTi、AlTi、FeSiB、AuSi等を用いることが好ましい。そして、これらの中でも、機械研磨が可能な硬質な外周面を設けるという観点からすれば、例えば、無電解ニッケルメッキ法により成膜されるNiP(ニッケル-リン、以下では「Ni-P」と表記することがある)を用いることが望ましい。
 ただし、被覆層12の形成手法としては、メッキ法に限られるものではなく、各種成膜手法を採用してかまわない。
Further, in the second configuration example, as a material forming the coating layer 12, various metals, their alloys, metal compounds, or the like can be used. Here, when the substrate 10 formed by forming the coating layer 12 on the base material 11 is adopted, from the viewpoint of suppressing corrosion caused by lithium, CrTi, ZrCuAlNiPdP, CuZr, FeZr, TiZr, CoZrNb, NiNb, It is preferable to use NiTiNb, NiP, CuP, NiPCu, NiTi, AlTi, FeSiB, AuSi, or the like. Among these, from the viewpoint of providing a hard outer peripheral surface capable of mechanical polishing, for example, NiP (nickel-phosphorous, hereinafter referred to as “Ni-P”) formed by an electroless nickel plating method. May be used).
However, the method for forming the coating layer 12 is not limited to the plating method, and various film forming methods may be employed.
 なお、図2(b)に示す例では、基材11の全面を被覆層12で覆うことによって基板10を形成しているが、これに限られるものではない。例えば図1に示したように、基板10の表面10aにのみ電池構造を形成する場合は、基材11のうち、少なくとも基板10において表面10aとなる側に、被覆層12を設ければよい。 In the example shown in FIG. 2B, the substrate 10 is formed by covering the entire surface of the base material 11 with the coating layer 12, but the present invention is not limited to this. For example, as shown in FIG. 1, when the battery structure is formed only on the surface 10 a of the substrate 10, the coating layer 12 may be provided on at least the side of the substrate 10 that becomes the surface 10 a on the substrate 10.
(最大最小高低差)
 次に、本実施の形態の基板10における最大最小高低差Rmmについて説明を行う。
 最大最小高低差Rmmは、基板10における電池構造の積層面(本実施の形態では基板10の表面10a)の平滑度を規定する尺度である。そして、本実施の形態における最大最小高低差Rmmは、AFM(Atomic Force Microscope)にて20μm×20μmの範囲(正方形状の領域)の凹凸を測定して得られた最大高さと最小高さとの高低差によって定義される。したがって、最大最小高低差Rmmは、例えばJIS B 0601に規定される最大高さRzとは定義が異なる。
(Maximum height difference)
Next, the maximum and minimum height difference Rmm of the substrate 10 of the present embodiment will be described.
The maximum / minimum height difference Rmm is a measure for defining the smoothness of the laminated surface of the battery structure on the substrate 10 (the surface 10a of the substrate 10 in the present embodiment). The maximum-to-minimum height difference Rmm in the present embodiment is the height between the maximum height and the minimum height obtained by measuring irregularities in a range of 20 μm × 20 μm (square region) with an AFM (Atomic Force Microscope). Defined by the difference. Therefore, the definition of the maximum and minimum height difference Rmm is different from the maximum height Rz defined in, for example, JIS B0601.
 では、最大最小高低差Rmmの定義について、より詳細な説明を行う。
 本実施の形態における最大最小高低差Rmmは、例えばAFM装置(原子間力顕微鏡システム)であるブルカー社製D3100を用い、20μm×20μmの領域内のデータを取得した後、スキャンライン毎に基準面を作成する際に、近似多項式として3次式を用い、基準面からの変位(+変位および-変位が存在し得る)に変換した(「平滑化」処理した)像を準備し、像における垂直方向(z変位)の「最大値-最小値」によって求めることができる。
Now, the definition of the maximum and minimum height difference Rmm will be described in more detail.
The maximum / minimum height difference Rmm in the present embodiment is obtained, for example, by using a D3100 manufactured by Bruker, which is an AFM apparatus (atomic force microscope system), and acquiring data in an area of 20 μm × 20 μm. Is prepared by using a cubic expression as an approximate polynomial, preparing an image (which has been subjected to “smoothing” processing) converted to a displacement from the reference plane (a positive displacement and a negative displacement may exist), and It can be obtained from the “maximum value−minimum value” of the direction (z displacement).
 本実施の形態では、基板10における表面10aの最大最小高低差Rmmが78nm以下に設定されている。ここで、図2(a)に示す第1の構成例の基板10では、表面10a側に位置する基材11の最大最小高低差Rmmが78nm以下に設定される。また、図2(b)に示す第2の構成例の基板10では、表面10a側に位置する被覆層12の最大最小高低差Rmmが78nm以下に設定される。 In the present embodiment, the maximum and minimum height difference Rmm of the surface 10a of the substrate 10 is set to 78 nm or less. Here, in the substrate 10 of the first configuration example shown in FIG. 2A, the maximum and minimum height difference Rmm of the base material 11 located on the front surface 10a side is set to 78 nm or less. In the substrate 10 of the second configuration example shown in FIG. 2B, the maximum and minimum height difference Rmm of the coating layer 12 located on the surface 10a side is set to 78 nm or less.
(算術平均粗さ)
 続いて、本実施の形態の基板10における算術平均粗さRaについて説明を行う。
 算術平均粗さRaは、例えばJIS B 0601に規定されているものである。
 そして、本実施の形態では、基板10における表面10aの算術平均粗さRaが、1.1nm以下であることが好ましい。
(Arithmetic mean roughness)
Next, the arithmetic average roughness Ra of the substrate 10 according to the present embodiment will be described.
The arithmetic average roughness Ra is specified, for example, in JIS B0601.
In the present embodiment, the arithmetic mean roughness Ra of the surface 10a of the substrate 10 is preferably 1.1 nm or less.
[リチウムイオン二次電池の製造方法]
 では、上述したリチウムイオン二次電池1の製造方法について説明を行う。
 図3は、本実施の形態のリチウムイオン二次電池の製造方法を説明するためのフローチャートである。
[Method of manufacturing lithium ion secondary battery]
Now, a method for manufacturing the above-described lithium ion secondary battery 1 will be described.
FIG. 3 is a flowchart for explaining the method for manufacturing the lithium ion secondary battery of the present embodiment.
(基板準備工程)
 まず、表面10aの最大最小高低差Rmmが78(nm)以下となるように表面処理が施された基板10を準備する、基板準備工程を実行する(ステップ10)。
(Substrate preparation process)
First, a substrate preparation step of preparing a substrate 10 which has been subjected to a surface treatment so that the maximum / minimum height difference Rmm of the surface 10a is 78 (nm) or less is executed (step 10).
 ここで、図2(a)に示す第1の構成例にかかる基板10は、例えば以下の手順にて製造される。まず、圧延法等によって金属板を製造し、この金属板を切断して得られた基材11の表面10a側に、一般的な機械研磨処理を施した後、さらにCMP(Chemical Mechanical Polishing:化学機械研磨)法等を用いた精密研磨処理を施すことで、表面10aの最大最小高低差Rmmが78nm以下に設定された基板10を得る。 Here, the substrate 10 according to the first configuration example shown in FIG. 2A is manufactured by, for example, the following procedure. First, a metal plate is manufactured by a rolling method or the like, and the surface 10a side of the base material 11 obtained by cutting the metal plate is subjected to a general mechanical polishing treatment, and then further subjected to CMP (Chemical Mechanical Polishing). By performing a precision polishing process using a mechanical polishing method or the like, the substrate 10 in which the maximum and minimum height difference Rmm of the surface 10a is set to 78 nm or less is obtained.
 また、図2(b)に示す第2の構成例にかかる基板10は、例えば以下の手順にて製造される。まず圧延法等によって金属板を製造し、この金属板を切断して得られた基材11の全面に、無電解ニッケルメッキ法等によってNi-Pからなる被覆層12を形成することで、基材11と被覆層12との積層体を得る。そして、このようにして得られた積層体の表面10a側に位置する被覆層12に、一般的な機械研磨処理を施した後、CMP法等を用いた研磨処理を施すことで、表面10aの最大最小高低差Rmmが78nm以下に設定された基板10を得る。 {Circle around (2)} The substrate 10 according to the second configuration example shown in FIG. 2B is manufactured by, for example, the following procedure. First, a metal plate is manufactured by a rolling method or the like, and a coating layer 12 made of Ni—P is formed on the entire surface of a base material 11 obtained by cutting the metal plate by an electroless nickel plating method or the like. A laminate of the material 11 and the coating layer 12 is obtained. Then, after performing a general mechanical polishing process on the coating layer 12 positioned on the surface 10a side of the thus obtained laminated body, a polishing process using a CMP method or the like is performed, so that the surface 10a The substrate 10 having the maximum and minimum height difference Rmm set to 78 nm or less is obtained.
(下地層形成工程)
 そして、図示しないスパッタ装置に基板10を装着し、基板10の表面10a上に下地層20を形成する下地層形成工程を実行する(ステップ20)。
(Underlayer forming step)
Then, the substrate 10 is mounted on a sputtering device (not shown), and a base layer forming step of forming the base layer 20 on the surface 10a of the substrate 10 is performed (Step 20).
(正極層形成工程)
 次に、上記スパッタ装置にて、下地層20上に正極層30を形成する正極層形成工程(第1極性層形成工程の一例)を実行する(ステップ30)。
(Positive electrode layer forming step)
Next, a positive electrode layer forming step of forming the positive electrode layer 30 on the underlayer 20 (an example of a first polar layer forming step) is performed by the sputtering apparatus (step 30).
 なお、正極層30として合材正極を用いる場合、正極活物質と無機固体電解質とを含むスパッタリングターゲットを用いたスパッタを行ってもよいし、正極活物質を含むスパッタリングターゲットと無機固体電解質を含む他のスパッタリングターゲットとを用いたコスパッタを行ってもよい。 In the case of using a mixed material positive electrode as the positive electrode layer 30, sputtering using a sputtering target containing a positive electrode active material and an inorganic solid electrolyte may be performed, or a sputtering target containing a positive electrode active material and an inorganic solid electrolyte may be used. Co-sputtering using the above sputtering target.
(固体電解質層形成工程)
 続いて、上記スパッタ装置にて、正極層30上に固体電解質層40を形成する固体電解質層形成工程を実行する(ステップ40)。
(Solid electrolyte layer forming step)
Subsequently, a solid electrolyte layer forming step of forming the solid electrolyte layer 40 on the positive electrode layer 30 is performed by the sputtering device (step 40).
 なお、固体電解質層40を構成する無機固体電解質としてLi3PO4を用いる場合、リチウム、リンおよび酸素を含むスパッタリングターゲットを用い、酸素を含み且つ窒素を含まない雰囲気下で固体電解質層40の形成を行うことが好ましい。 When Li 3 PO 4 is used as the inorganic solid electrolyte constituting the solid electrolyte layer 40, the formation of the solid electrolyte layer 40 is performed using a sputtering target containing lithium, phosphorus and oxygen under an atmosphere containing oxygen and not containing nitrogen. Is preferably performed.
(保持層形成工程)
 次いで、上記スパッタ装置にて、固体電解質層40上に保持層50を形成する保持層形成工程(金属層形成工程の一例)を実行する(ステップ50)。
(Retaining layer forming step)
Next, a holding layer forming step (an example of a metal layer forming step) of forming the holding layer 50 on the solid electrolyte layer 40 is performed by the sputtering apparatus (step 50).
(拡散防止層形成工程)
 それから、上記スパッタ装置にて、保持層50上に拡散防止層60を形成する拡散防止層形成工程(非晶質層形成工程の一例)を実行する(ステップ60)。
(Diffusion prevention layer forming step)
Then, a diffusion preventing layer forming step (an example of an amorphous layer forming step) for forming the diffusion preventing layer 60 on the holding layer 50 is performed by the sputtering apparatus (step 60).
(負極集電体層形成工程)
 そして、上記スパッタ装置にて、拡散防止層60上に負極集電体層70を形成する負極集電体層形成工程を実行する(ステップ70)。
 これらステップ10~70を実行することにより、リチウムイオン二次電池1の基本構造体が得られる。そして、このリチウムイオン二次電池1の基本構造体を、スパッタ装置から取り外す。
(Negative electrode current collector layer forming step)
Then, a negative electrode current collector layer forming step of forming the negative electrode current collector layer 70 on the diffusion prevention layer 60 is performed by the sputtering device (step 70).
By performing these steps 10 to 70, the basic structure of the lithium ion secondary battery 1 is obtained. Then, the basic structure of the lithium ion secondary battery 1 is removed from the sputtering device.
(初回充電工程)
 続いて、スパッタ装置から取り外したリチウムイオン二次電池1の基本構造体に対し、1回目の充電を行わせる初回充電工程(充電工程の一例)を実行する(ステップ80)。
(First charging process)
Subsequently, an initial charging step (an example of a charging step) for performing a first charging is performed on the basic structure of the lithium ion secondary battery 1 removed from the sputtering apparatus (step 80).
(初回放電工程)
 それから、充電がなされたリチウムイオン二次電池1の基本構造体に対し、1回目の放電を行わせる初回放電工程(放電工程の一例)を実行する(ステップ90)。これら初回充電と初回放電とにより、保持層50の多孔質化すなわち多孔質部および多数の空孔の形成が行われ、図1に示すリチウムイオン二次電池1が得られる。
(First discharge process)
Then, an initial discharge step (an example of a discharge step) for performing a first discharge is performed on the charged basic structure of the lithium ion secondary battery 1 (step 90). By these initial charging and initial discharging, the holding layer 50 is made porous, that is, a porous portion and a large number of pores are formed, and the lithium ion secondary battery 1 shown in FIG. 1 is obtained.
[保持層の多孔質化]
 では、上述した保持層50の多孔質化について、より詳細な説明を行う。
 図4は、保持層50を多孔質化する手順を説明するための図であり、保持層50およびその周辺を拡大して示した図である。ここで、図4(a)は成膜後且つ初回充電前(ステップ70とステップ80との間)の状態を、図4(b)は初回充電後且つ初回放電前(ステップ80とステップ90との間)の状態を、図4(c)は初回放電後(ステップ90の後)の状態を、それぞれ示している。
[Porosification of holding layer]
Now, the above-described porous formation of the holding layer 50 will be described in more detail.
FIG. 4 is a diagram for explaining a procedure for making the holding layer 50 porous, and is an enlarged view of the holding layer 50 and the periphery thereof. Here, FIG. 4A shows the state after the film formation and before the first charge (between Step 70 and Step 80), and FIG. 4B shows the state after the first charge and before the first discharge (Step 80 and Step 90). 4C), and FIG. 4C shows a state after the first discharge (after step 90).
(成膜後且つ初回充電前)
 まず、図4(a)に示す「成膜後且つ初回充電前」の状態では、保持層50が緻密化している。また、保持層50の厚さは保持層厚さt50であり、拡散防止層60の厚さは拡散防止層厚さt60であり、負極集電体層70の厚さは負極集電体層厚さt70である。
(After film formation and before initial charge)
First, in the state “after film formation and before initial charging” shown in FIG. 4A, the holding layer 50 is dense. The thickness of the holding layer 50 is the thickness of the holding layer t50, the thickness of the diffusion prevention layer 60 is the thickness of the diffusion prevention layer t60, and the thickness of the negative electrode current collector layer 70 is the thickness of the negative electrode current collector layer. It is t70.
(初回充電後且つ初回放電前)
 図4(a)に示すリチウムイオン二次電池1を充電(初回充電)する場合、基板10(図1参照)には直流電源の正の電極が、負極集電体層70には直流電源の負の電極が、それぞれ接続される。すると、図4(b)に示すように、正極層30で正極活物質を構成するリチウムイオン(Li+)が、固体電解質層40を介して保持層50へと移動する。すなわち、充電動作において、リチウムイオンはリチウムイオン二次電池1の厚さ方向(図4(b)において上方向)に移動する。
(After initial charging and before initial discharging)
When charging (initial charging) the lithium ion secondary battery 1 shown in FIG. 4A, the positive electrode of the DC power supply is provided on the substrate 10 (see FIG. 1), and the DC power supply is provided on the negative electrode current collector layer 70. Negative electrodes are respectively connected. Then, as shown in FIG. 4B, lithium ions (Li + ) constituting the positive electrode active material in the positive electrode layer 30 move to the holding layer 50 via the solid electrolyte layer 40. That is, in the charging operation, the lithium ions move in the thickness direction of the lithium ion secondary battery 1 (upward in FIG. 4B).
 このとき、正極層30側から保持層50側に移動してきたリチウムイオンは、保持層50を構成する金属と合金化する。例えば保持層50を白金(Pt)で構成した場合、保持層50では、リチウムと白金とが合金化(固溶体化、金属間化合物の形成あるいは共晶化)する。 At this time, the lithium ions that have moved from the positive electrode layer 30 side to the holding layer 50 side are alloyed with the metal constituting the holding layer 50. For example, when the holding layer 50 is made of platinum (Pt), in the holding layer 50, lithium and platinum are alloyed (solid solution, formation of an intermetallic compound, or eutectic).
 また、保持層50内に入り込んできたリチウムイオンの一部は、保持層50を通過して拡散防止層60との境界部に到達する。ここで、本実施の形態の拡散防止層60は、非晶質構造を有する、金属または合金で構成されており、多結晶構造を有する保持層50と比べて、粒界の数が著しく少なくなっている。このため、保持層50と拡散防止層60との境界部に到達したリチウムイオンは、拡散防止層60に入り込みにくくなることから、保持層50内に保持された状態を維持する。 (4) Part of the lithium ions that have entered the holding layer 50 passes through the holding layer 50 and reaches the boundary with the diffusion preventing layer 60. Here, the diffusion prevention layer 60 of the present embodiment is made of a metal or an alloy having an amorphous structure, and the number of grain boundaries is significantly smaller than that of the holding layer 50 having a polycrystalline structure. ing. For this reason, the lithium ions that have reached the boundary between the holding layer 50 and the diffusion prevention layer 60 are less likely to enter the diffusion prevention layer 60, and thus maintain the state held in the holding layer 50.
 そして、初回充電動作が終了した状態において、正極層30から保持層50に移動したリチウムイオンは、保持層50に保持される。このとき、保持層50に移動してきたリチウムイオンは、白金との合金化あるいは白金内での金属リチウムの析出化等によって、保持層50に保持されるものと考えられる。 (4) In the state where the initial charging operation has been completed, the lithium ions that have moved from the positive electrode layer 30 to the holding layer 50 are held by the holding layer 50. At this time, it is considered that the lithium ions that have moved to the holding layer 50 are held by the holding layer 50 by alloying with platinum or by precipitating metallic lithium in the platinum.
 ここで、図4(b)に示すように、初回充電後且つ初回放電前のリチウムイオン二次電池1では、保持層厚さt50が、図4(a)に示す成膜後且つ初回充電前の状態よりも増加する。すなわち、保持層50の体積は、初回充電によって増加する。これは、保持層50において、リチウムと白金とが合金化することに起因しているものと考えられる。これに対し、拡散防止層厚さt60は、初回充電の前後でほぼ変わらない。すなわち、拡散防止層60の体積は、初回充電によってほぼ変わらない。これは、拡散防止層60に、リチウムが入り込みにくいことに起因するものと考えられる。そして、このことは、負極集電体層厚さt70が、初回充電の前後でほぼ変わらないこと、すなわち、負極集電体層70の体積が、初回充電の前後でほぼ変わらないこと(負極集電体層70を構成する白金が、保持層50を構成する白金のように多孔質化しておらず、緻密なままであること)によって裏付けられるものと考えられる。 Here, as shown in FIG. 4B, in the lithium ion secondary battery 1 after the first charge and before the first discharge, the holding layer thickness t50 is changed from the film formation shown in FIG. More than the state. That is, the volume of the holding layer 50 increases by the first charging. This is considered to be due to the fact that lithium and platinum are alloyed in the holding layer 50. On the other hand, the thickness t60 of the diffusion prevention layer does not substantially change before and after the first charge. That is, the volume of the diffusion prevention layer 60 is not substantially changed by the first charge. This is considered to be due to the fact that lithium hardly enters the diffusion preventing layer 60. This means that the thickness t70 of the negative electrode current collector layer does not substantially change before and after the first charge, that is, the volume of the negative electrode current collector layer 70 does not substantially change before and after the first charge (negative electrode current collector). It is considered that the platinum constituting the electric conductor layer 70 is not made porous and remains dense like the platinum constituting the holding layer 50).
(初回放電後)
 図4(b)に示すリチウムイオン二次電池1を放電(初回放電)する場合、基板10(図1参照)には負荷の正の電極が、負極集電体層70には負荷の負の電極が、それぞれ接続される。すると、図4(c)に示すように、保持層50に保持されるリチウムイオン(Li+)が、固体電解質層40を介して正極層30へと移動する。すなわち、放電動作において、リチウムイオンはリチウムイオン二次電池1の厚さ方向(図4(c)において下方向)へと移動し、正極層30に保持される。これに伴って、負荷には直流電流が供給される。
(After the first discharge)
When discharging (initial discharge) the lithium ion secondary battery 1 shown in FIG. 4B, a positive electrode of a load is provided on the substrate 10 (see FIG. 1), and a negative electrode of the load is provided on the negative electrode current collector layer 70. The electrodes are respectively connected. Then, as shown in FIG. 4C, the lithium ions (Li + ) held in the holding layer 50 move to the positive electrode layer 30 via the solid electrolyte layer 40. That is, in the discharging operation, the lithium ions move in the thickness direction of the lithium ion secondary battery 1 (downward in FIG. 4C) and are held by the positive electrode layer 30. Accordingly, a DC current is supplied to the load.
 このとき、保持層50では、リチウムが離脱することに伴い、リチウムと白金との合金の脱合金化(金属リチウムが析出した場合は金属リチウムの溶解化)が行われる。そして、保持層50で脱合金化が行われた結果、保持層50が多孔質化され、多数の空孔52が形成された多孔質部51となる。このようにして得られる多孔質部51は、ほぼ金属(例えば白金)で構成されることになる。ただし、初回放電が終了した状態において、保持層50の内部でリチウムは完全に消失するわけではなく、放電動作による移動を行わない一部のリチウムが残存する。 At this time, in the holding layer 50, the alloy of lithium and platinum is dealloyed (dissolution of the metallic lithium when metallic lithium is precipitated) with the release of lithium. Then, as a result of dealloying in the holding layer 50, the holding layer 50 is made porous, and becomes a porous portion 51 in which a large number of holes 52 are formed. The porous portion 51 obtained in this way is substantially made of metal (for example, platinum). However, in the state where the first discharge is completed, lithium does not completely disappear inside the holding layer 50, and some lithium which does not move by the discharge operation remains.
 ここで、図4(c)に示すように、初回放電後のリチウムイオン二次電池1では、保持層厚さt50が、図4(b)に示す初回充電後且つ初回放電前の状態よりも減少する。これは、保持層50において、リチウムと白金との合金の脱合金化が行われることに起因するものと考えられる。そして、このことは、初回放電によって保持層50内に形成される空孔52の形状が、面方向に比べて厚さ方向が小さくなるように扁平化していることによって裏付けられる。また、図4(c)に示すように、初回放電後のリチウムイオン二次電池1では、保持層厚さt50が、図4(a)に示す成膜後且つ初回充電前の状態よりも増加する。これは、初回充電および初回放電によって保持層50が多孔質化されること、すなわち、保持層50内に多数の空孔52が形成されることに起因するものと考えられる。なお、これに対し、拡散防止層厚さt60および負極集電体層厚さt70は、初回放電の前後でもほぼ変わらない。 Here, as shown in FIG. 4C, in the lithium ion secondary battery 1 after the first discharge, the holding layer thickness t50 is larger than the state after the first charge and before the first discharge shown in FIG. 4B. Decrease. This is considered to be due to the fact that the alloy of lithium and platinum is dealloyed in the holding layer 50. This is supported by the fact that the shape of the holes 52 formed in the holding layer 50 by the first discharge is flattened so that the thickness direction is smaller than the plane direction. Further, as shown in FIG. 4C, in the lithium ion secondary battery 1 after the initial discharge, the holding layer thickness t50 is larger than the state after the film formation and before the first charge shown in FIG. I do. This is considered to be due to the fact that the holding layer 50 is made porous by the first charging and the first discharging, that is, a large number of holes 52 are formed in the holding layer 50. On the other hand, the thickness t60 of the diffusion prevention layer and the thickness t70 of the negative electrode current collector layer are not substantially changed before and after the first discharge.
[その他]
 なお、本実施の形態では、基板10の表面10a上に、下地層20、正極層30、固体電解質層40、保持層50、拡散防止層60および負極集電体層70の順に積層を行うことで、リチウムイオン二次電池1の基本構造体を形成していた。すなわち、基板10に近い側に正極層30を配置し、基板10から遠い側に保持層50を配置する構成を採用していた。ただし、これに限られるものではなく、基板10に近い側に保持層50を配置し、基板10から遠い側に正極層30を配置する構成を採用してもかまわない。ただし、この場合は、基板10に対する各層の積層順が、上述したものとは逆になる。
[Others]
In this embodiment, the base layer 20, the positive electrode layer 30, the solid electrolyte layer 40, the holding layer 50, the diffusion preventing layer 60, and the negative electrode current collector layer 70 are sequentially stacked on the surface 10a of the substrate 10. Thus, the basic structure of the lithium ion secondary battery 1 was formed. That is, a configuration is adopted in which the positive electrode layer 30 is arranged on the side closer to the substrate 10 and the holding layer 50 is arranged on the side farther from the substrate 10. However, the configuration is not limited to this, and a configuration in which the holding layer 50 is arranged on the side closer to the substrate 10 and the positive electrode layer 30 is arranged on the side farther from the substrate 10 may be adopted. However, in this case, the order of lamination of each layer on the substrate 10 is opposite to that described above.
 また、本実施の形態では、基板10の一方の面すなわち表面10a上に、リチウムイオン二次電池1の基本構造体を形成していた。ただし、これに限られるものではなく、基板10の表面10a上にリチウムイオン二次電池1の基本構造体を形成するのに加えて、基板10の他方の面すなわち裏面10b上に、別のリチウムイオン二次電池1の基本構造体を形成するようにしてもかまわない。この場合は、基板10の裏面10bも、表面10aと同じく、最大最小高低差Rmmを78nm以下に設定しておくことが必要となる。 In the present embodiment, the basic structure of the lithium ion secondary battery 1 is formed on one surface of the substrate 10, that is, on the surface 10a. However, the present invention is not limited to this. In addition to forming the basic structure of the lithium ion secondary battery 1 on the front surface 10a of the substrate 10, another lithium The basic structure of the ion secondary battery 1 may be formed. In this case, it is necessary to set the maximum / minimum height difference Rmm on the back surface 10b of the substrate 10 to 78 nm or less, similarly to the front surface 10a.
 以下、実施例に基づいて本発明をさらに詳細に説明する。ただし、本発明は、その要旨を超えない限り、以下の実施例に限定されるものではない。
 本発明者は、10種類(実施例1~5および比較例1~5)のリチウムイオン二次電池1を作製し、それぞれの構造と各種電気特性とに関する評価を行った。
Hereinafter, the present invention will be described in more detail based on examples. However, the present invention is not limited to the following examples unless it exceeds the gist.
The present inventor produced ten types of lithium ion secondary batteries 1 (Examples 1 to 5 and Comparative Examples 1 to 5), and evaluated the structures and various electrical characteristics of each.
[実施例1~3について]
 まず、実施例1~3では、上記実施の形態で説明したリチウムイオン二次電池1のうち、図2(a)に示す第1の構成例の基板10を適用したものを用いた。すなわち、実施例1~3では、基材11で構成され、その表面10aが最大最小高低差Rmm≦78nmに研磨されてなる基板10を備えた、リチウムイオン二次電池1を用いた。なお、以下の説明においては、これら実施例1~3を、まとめて「第1の実施例群」と称することがある。
[Examples 1 to 3]
First, in Examples 1 to 3, among the lithium ion secondary batteries 1 described in the above embodiment, those using the substrate 10 of the first configuration example shown in FIG. 2A were used. That is, in Examples 1 to 3, the lithium ion secondary battery 1 including the substrate 10 constituted of the base material 11 and having its surface 10a polished to the maximum and minimum height difference Rmm ≦ 78 nm was used. In the following description, Examples 1 to 3 may be collectively referred to as a “first example group”.
[実施例4、5および比較例5について]
 また、実施例4、5および比較例5では、上記実施の形態で説明したリチウムイオン二次電池1のうち、図2(b)に示す第2の構成例の基板10を適用したものを用いた。すなわち、実施例4、5および比較例5では、基材11および被覆層12で構成され、その表面10aが最大最小高低差Rmm≦78nmに研磨されてなる基板10を備えた、リチウムイオン二次電池1を用いた。なお、以下の説明においては、これら実施例4、5を、まとめて「第2の実施例群」と称することがある。
[Examples 4 and 5 and Comparative Example 5]
In Examples 4 and 5 and Comparative Example 5, among the lithium ion secondary batteries 1 described in the above embodiment, those using the substrate 10 of the second configuration example shown in FIG. Was. That is, in Examples 4 and 5 and Comparative Example 5, the lithium ion secondary was provided with the substrate 10 which was constituted by the base material 11 and the coating layer 12 and whose surface 10a was polished to the maximum and minimum height difference Rmm ≦ 78 nm. Battery 1 was used. In the following description, Examples 4 and 5 may be collectively referred to as a “second example group”.
[比較例1~4について]
 一方、比較例1~4では、その基本構成自体は実施例1~4と同様であるものの、その表面10aが最大最小高低差Rmm>400nmに研磨されてなる基板10を備えた、リチウムイオン二次電池1を用いた。
[Comparative Examples 1 to 4]
On the other hand, in Comparative Examples 1 to 4, the basic structure itself is the same as in Examples 1 to 4, but the surface 10a is provided with the substrate 10 polished to the maximum / minimum height difference Rmm> 400 nm. The following battery 1 was used.
[実施例および比較例の具体的な構成]
 次に、各実施例および各比較例にかかるリチウムイオン二次電池1の具体的な構成について説明を行う。
[Specific Configurations of Examples and Comparative Examples]
Next, a specific configuration of the lithium ion secondary battery 1 according to each example and each comparative example will be described.
(基板の構成)
 表1は、実施例1~5および比較例1~5にかかるリチウムイオン二次電池1における、基板10の構成を示している。ここで、表1は、基板10を構成する基材11の構成材料と、基板10における被覆層12の有無(ある場合はその構成材料)と、基板10に対するCMP処理の有無と、基板10の厚さと、基板10における表面10aの最大最小高低差Rmmおよび算術平均粗さRaとの関係を示している。
(Structure of substrate)
Table 1 shows the configuration of the substrate 10 in the lithium ion secondary batteries 1 according to Examples 1 to 5 and Comparative Examples 1 to 5. Here, Table 1 shows the constituent materials of the base material 11 constituting the substrate 10, the presence or absence of the coating layer 12 on the substrate 10 (if any), the presence or absence of the CMP process on the substrate 10, The relationship between the thickness, the maximum and minimum height difference Rmm of the surface 10a of the substrate 10, and the arithmetic average roughness Ra is shown.
Figure JPOXMLDOC01-appb-T000001
Figure JPOXMLDOC01-appb-T000001
 では、それぞれの基板10について説明を行う。
〔実施例1~3〕
 実施例1~3では、基板10を、基材11の単層構成とした。すなわち、基板10が被覆層12を備えない構成とした。また、実施例1~3では、基材11としてSUS316Lを用い、その厚さは0.1(mm)とした。さらに、実施例1~3では、基板10の表面10aに一般的な機械研磨処理を施した後、さらにCMP処理による精密研磨処理を施した。その結果、基板10における表面10aの最大最小高低差Rmmは78.0(nm)となった。なお、以下の説明においては、実施例1~3(第1の実施例群)で用いた、CMP処理による精密研磨処理が施された基板10を、「研磨SUS基板」と称することがある。
Now, each substrate 10 will be described.
[Examples 1 to 3]
In Examples 1 to 3, the substrate 10 had a single-layer structure of the base material 11. That is, the configuration was such that the substrate 10 did not include the coating layer 12. In Examples 1 to 3, SUS316L was used as the base material 11 and the thickness was set to 0.1 (mm). Further, in Examples 1 to 3, after performing a general mechanical polishing process on the surface 10a of the substrate 10, a precision polishing process by a CMP process was further performed. As a result, the maximum and minimum height difference Rmm of the surface 10a of the substrate 10 was 78.0 (nm). In the following description, the substrate 10 that has been subjected to the precision polishing by the CMP process and used in Examples 1 to 3 (first example group) may be referred to as a “polished SUS substrate”.
〔実施例4、5および比較例5〕
 実施例4、5および比較例5では、基板10を、基材11および被覆層12の積層構成とした。また、実施例4、5および比較例5では、基材11としてAl(アルミニウム)を用い、その厚さは実施例1~3と同じ0.1(mm)とした。そして、実施例4、5および比較例5では、被覆層12としてNi-Pを用いた。なお、被覆層12は、基材11に対し、無電解ニッケルメッキ法を用いて付着させた。さらに、実施例4、5および比較例5では、実施例1~3と同様に、基板10の表面10aに一般的な機械研磨処理を施した後、さらにCMP処理による精密研磨処理を施した。その結果、基板10における表面10aの最大最小高低差Rmmは、実施例1~3よりも小さい2.7(nm)となった。なお、以下の説明においては、実施例4、5(第2の実施例群)および比較例5で用いた、CMP処理による精密研磨処理が施された基板10を、「研磨Al基板」と称することがある。
[Examples 4, 5 and Comparative Example 5]
In Examples 4 and 5 and Comparative Example 5, the substrate 10 had a laminated structure of the base material 11 and the coating layer 12. In Examples 4 and 5 and Comparative Example 5, Al (aluminum) was used as the base material 11 and the thickness was set to 0.1 (mm), which is the same as Examples 1 to 3. In Examples 4 and 5 and Comparative Example 5, Ni—P was used as the coating layer 12. The coating layer 12 was attached to the substrate 11 by using an electroless nickel plating method. Further, in Examples 4 and 5 and Comparative Example 5, similarly to Examples 1 to 3, the surface 10a of the substrate 10 was subjected to general mechanical polishing, and then subjected to precision polishing by CMP. As a result, the maximum and minimum height difference Rmm of the surface 10a of the substrate 10 was 2.7 (nm), which was smaller than that of Examples 1 to 3. In the following description, the substrate 10 that has been subjected to the precision polishing process by the CMP process and used in Examples 4 and 5 (second example group) and Comparative Example 5 is referred to as a “polished Al substrate”. Sometimes.
〔比較例1~4〕
 比較例1~4では、基板10を、実施例1~3と同じ基材11の単層構成とした。すなわち、基板10が被覆層12を備えない構成とした。また、比較例1~4では、実施例1~3と同じく、基材11としてSUS316Lを用い、その厚さは0.1(mm)とした。ただし、比較例1~4では、実施例1~3とは異なり、基板10の表面10aに一般的な機械研磨処理を施すのみとし、CMP処理による精密研磨処理を施さないようにした。その結果、基板10における表面10aの最大最小高低差Rmmは、実施例1~5よりも大きい438(nm)となった。なお、以下の説明においては、比較例1~4で用いた、CMP処理による精密研磨処理が施されていない基板10を、「未研磨SUS基板」と称することがある。
[Comparative Examples 1 to 4]
In Comparative Examples 1 to 4, the substrate 10 had the same single-layer structure of the base material 11 as in Examples 1 to 3. That is, the configuration was such that the substrate 10 did not include the coating layer 12. In Comparative Examples 1 to 4, SUS316L was used as the base material 11 and the thickness was 0.1 (mm), as in Examples 1 to 3. However, in Comparative Examples 1 to 4, unlike Examples 1 to 3, only the general mechanical polishing treatment was performed on the surface 10a of the substrate 10, and the precision polishing treatment by the CMP treatment was not performed. As a result, the maximum and minimum height difference Rmm of the surface 10a of the substrate 10 was 438 (nm), which was larger than in Examples 1 to 5. In the following description, the substrate 10 that has not been subjected to the precision polishing process by the CMP process used in Comparative Examples 1 to 4 may be referred to as an “unpolished SUS substrate”.
(各層の構成)
 表2は、第1実施例群すなわち実施例1~3にかかるリチウムイオン二次電池1における、各層の構成を示している。また、表3は、第2実施例群すなわち実施例4、5と、比較例5とにかかるリチウムイオン二次電池1における、各層の構成を示している。さらに、表4は、比較例1~4にかかるリチウムイオン二次電池1における、各層の構成を示している。ここで、表2~表4は、各層の名称と、各層を構成する材料およびその厚さとの関係を示している。
(Structure of each layer)
Table 2 shows the configuration of each layer in the lithium ion secondary battery 1 according to the first example group, that is, Examples 1 to 3. Table 3 shows the configuration of each layer in the lithium ion secondary battery 1 according to the second example group, that is, Examples 4 and 5, and Comparative Example 5. Further, Table 4 shows the configuration of each layer in the lithium ion secondary batteries 1 according to Comparative Examples 1 to 4. Here, Tables 2 to 4 show the relationship between the name of each layer, the material constituting each layer, and the thickness thereof.
Figure JPOXMLDOC01-appb-T000002
Figure JPOXMLDOC01-appb-T000002
Figure JPOXMLDOC01-appb-T000003
Figure JPOXMLDOC01-appb-T000003
Figure JPOXMLDOC01-appb-T000004
Figure JPOXMLDOC01-appb-T000004
〔実施例1〕
 では、表2を参照しつつ、実施例1について説明を行う。
 基板10には、上述した研磨SUS基板を用いた。
 下地層20には、スパッタ法で形成されたLiNiO2を用いた。下地層20の厚さは200nmとした。
 正極層30には、スパッタ法で形成されたLiNiO2およびLi3PO4を用いた。正極層30の厚さは1200nmとした。そして、正極層30におけるLiNiO2とLi3PO4との比率(モル比)は73:27とした。
 固体電解質層40には、スパッタ法で形成されたLi3PO4を用いた。固体電解質層40の厚さは800nmとした。
 保持層50には、スパッタ法で形成されたPtを用いた。保持層50の厚さは30nmとした。
 拡散防止層60には、スパッタ法で形成されたCrTiを用いた。拡散防止層60の厚さは200nmとした。
 負極集電体層70には、スパッタ法で形成されたPtを用いた。負極集電体層70の厚さは30nmとした。
[Example 1]
Example 1 will now be described with reference to Table 2.
As the substrate 10, the above-mentioned polished SUS substrate was used.
For the underlayer 20, LiNiO 2 formed by a sputtering method was used. The thickness of the underlayer 20 was 200 nm.
For the positive electrode layer 30, LiNiO 2 and Li 3 PO 4 formed by a sputtering method were used. The thickness of the positive electrode layer 30 was 1200 nm. The ratio (molar ratio) between LiNiO 2 and Li 3 PO 4 in the positive electrode layer 30 was 73:27.
For the solid electrolyte layer 40, Li 3 PO 4 formed by a sputtering method was used. The thickness of the solid electrolyte layer 40 was 800 nm.
For the holding layer 50, Pt formed by a sputtering method was used. The thickness of the holding layer 50 was 30 nm.
For the diffusion prevention layer 60, CrTi formed by a sputtering method was used. The thickness of the diffusion prevention layer 60 was 200 nm.
For the negative electrode current collector layer 70, Pt formed by a sputtering method was used. The thickness of the negative electrode current collector layer 70 was 30 nm.
〔実施例2〕
 次に、表2を参照しつつ、実施例2について説明を行う。
 実施例2は、固体電解質層40の厚さを、実施例1よりも小さい600nmとした以外は、実施例1と同じである。
[Example 2]
Next, Example 2 will be described with reference to Table 2.
Example 2 is the same as Example 1 except that the thickness of the solid electrolyte layer 40 was set to 600 nm, which is smaller than that of Example 1.
〔実施例3〕
 続いて、表2を参照しつつ、実施例3について説明を行う。
 実施例3は、固体電解質層40の厚さを、実施例1、2よりも小さい400nmとした以外は、実施例1、2と同じである。
[Example 3]
Next, a third embodiment will be described with reference to Table 2.
Example 3 is the same as Examples 1 and 2, except that the thickness of the solid electrolyte layer 40 is 400 nm, which is smaller than that of Examples 1 and 2.
〔実施例4〕
 では、表3を参照しつつ、実施例4について説明を行う。
 実施例5は、基板10に研磨Al基板を用い、固体電解質層40の厚さを700nmとした以外は、実施例1と同じである。
[Example 4]
Now, a fourth embodiment will be described with reference to Table 3.
Example 5 is the same as Example 1 except that a polished Al substrate was used for the substrate 10 and the thickness of the solid electrolyte layer 40 was 700 nm.
〔実施例5〕
 次に、表3を参照しつつ、実施例5について説明を行う。
 実施例5は、固体電解質層40の厚さを、実施例4よりも小さい600nmとした以外は、実施例4と同じである。
[Example 5]
Next, a fifth embodiment will be described with reference to Table 3.
Example 5 is the same as Example 4 except that the thickness of the solid electrolyte layer 40 was set to 600 nm, which is smaller than Example 4.
〔比較例1〕
 では、表4を参照しつつ、比較例1について説明を行う。
 比較例1は、基板10に未研磨SUS基板を用い、固体電解質層40の厚さを1000nmとした以外は、実施例1と同じである。
[Comparative Example 1]
Now, Comparative Example 1 will be described with reference to Table 4.
Comparative Example 1 is the same as Example 1 except that an unpolished SUS substrate was used for the substrate 10 and the thickness of the solid electrolyte layer 40 was 1000 nm.
〔比較例2〕
 次に、表4を参照しつつ、比較例2について説明を行う。
 比較例2は、固体電解質層40の厚さを、比較例1よりも小さい800nmとした以外は、比較例1と同じである。これを別の観点からみると、比較例2は、基板10に未研磨SUS基板を用いた以外は、実施例1と同じである。
[Comparative Example 2]
Next, Comparative Example 2 will be described with reference to Table 4.
Comparative Example 2 was the same as Comparative Example 1 except that the thickness of the solid electrolyte layer 40 was 800 nm, which was smaller than Comparative Example 1. From a different viewpoint, Comparative Example 2 is the same as Example 1 except that an unpolished SUS substrate was used for the substrate 10.
〔比較例3〕
 続いて、表4を参照しつつ、比較例3について説明を行う。
 比較例3は、固体電解質層40の厚さを、比較例1、2よりも小さい600nmとした以外は、比較例1、2と同じである。これを別の観点からみると、比較例3は、基板10に未研磨SUS基板を用いた以外は、実施例2と同じである。
[Comparative Example 3]
Subsequently, Comparative Example 3 will be described with reference to Table 4.
Comparative Example 3 is the same as Comparative Examples 1 and 2, except that the thickness of the solid electrolyte layer 40 is set to 600 nm, which is smaller than Comparative Examples 1 and 2. From a different viewpoint, Comparative Example 3 is the same as Example 2 except that an unpolished SUS substrate was used for the substrate 10.
〔比較例4〕
 さらに、表4を参照しつつ、比較例4について説明を行う。
 比較例4は、固体電解質層40の厚さを、比較例1~3よりも小さい400nmとした以外は、比較例1~3と同じである。これを別の観点からみると、比較例4は、基板10に未研磨SUS基板を用いた以外は、実施例3と同じである。
[Comparative Example 4]
Further, Comparative Example 4 will be described with reference to Table 4.
Comparative Example 4 is the same as Comparative Examples 1 to 3, except that the thickness of the solid electrolyte layer 40 is 400 nm, which is smaller than Comparative Examples 1 to 3. From a different viewpoint, Comparative Example 4 is the same as Example 3 except that an unpolished SUS substrate is used for the substrate 10.
〔比較例5〕
 次に、表3を参照しつつ、比較例5について説明を行う。
 比較例5は、固体電解質層40の厚さを、実施例4、5よりも大きい1000nmとした以外は、実施例4、5と同じである。
[Comparative Example 5]
Next, Comparative Example 5 will be described with reference to Table 3.
Comparative Example 5 is the same as Examples 4 and 5, except that the thickness of the solid electrolyte layer 40 is set to 1000 nm, which is larger than Examples 4 and 5.
 なお、実施例1~3(第1の実施例群)および比較例1~4については、実施例4、5(第2の実施例群)および比較例5よりも、基板10~負極集電体層70の各面積を大きくした。例えば実施例1~3(第1の実施例群)および比較例1~4では、正極層30の大きさを21mm×36mmとしたのに対し、実施例4、5(第2の実施例群)および比較例5では、正極層30の大きさを8mm×8mmとした。 Note that, in Examples 1 to 3 (the first example group) and Comparative Examples 1 to 4, the substrate 10 and the negative electrode current collector were more intense than Examples 4 and 5 (the second example group) and Comparative Example 5. Each area of the body layer 70 was increased. For example, in Examples 1 to 3 (first example group) and Comparative Examples 1 to 4, the size of the positive electrode layer 30 was set to 21 mm × 36 mm. ) And Comparative Example 5, the size of the positive electrode layer 30 was 8 mm × 8 mm.
 このようにして得られた各リチウムイオン二次電池1の基本構造体に対し、初回充放電を行わせることにより、リチウムイオン二次電池1を得た。なお、初回充放電を行わせることにより、保持層50の厚さは、それぞれの初期値よりも増加した。 (4) The basic structure of each lithium ion secondary battery 1 thus obtained was initially charged and discharged, whereby a lithium ion secondary battery 1 was obtained. In addition, the thickness of the holding layer 50 was increased from the respective initial values by performing the initial charge / discharge.
[リチウムイオン二次電池の評価]
 ここでは、実施例1~5および比較例1~5の各リチウムイオン二次電池1を評価するための尺度として、リチウムイオン二次電池1の結晶構造と、電気的特性とを用いた。
[Evaluation of lithium ion secondary battery]
Here, as a scale for evaluating each of the lithium ion secondary batteries 1 of Examples 1 to 5 and Comparative Examples 1 to 5, the crystal structure and the electrical characteristics of the lithium ion secondary battery 1 were used.
(結晶構造)
 まず、結晶構造について説明を行う。本発明者は、実施例1~5および比較例1~5の各リチウムイオン二次電池1に対し、電子線回折パターンを測定することで、リチウムイオン二次電池1を構成する各層の結晶構造(結晶化、非晶質化)に関する評価を行った。
(Crystal structure)
First, the crystal structure will be described. The present inventor measured the electron beam diffraction pattern of each of the lithium ion secondary batteries 1 of Examples 1 to 5 and Comparative Examples 1 to 5 to determine the crystal structure of each layer constituting the lithium ion secondary battery 1. (Crystallization, amorphization) was evaluated.
 実施例1~5のリチウムイオン二次電池1において、基板10、保持層50および負極集電体層70は、それぞれ結晶化していた。これに対し、下地層20、固体電解質層40および拡散防止層60は、非晶質化していた。また、正極層30については、結晶化している領域と非晶質化している領域とが混在しており、非晶質化している領域に対し、結晶化している領域が点在していた。
 一方、比較例1~5のリチウムイオン二次電池1も、上記実施例1~5のリチウムイオン二次電池1を構成する各層と、同様の結晶構造を呈していた。
In the lithium ion secondary batteries 1 of Examples 1 to 5, the substrate 10, the holding layer 50, and the negative electrode current collector layer 70 were each crystallized. On the other hand, the underlayer 20, the solid electrolyte layer 40, and the diffusion prevention layer 60 were amorphous. In the positive electrode layer 30, a crystallized region and an amorphous region were mixed, and a crystallized region was scattered with respect to the amorphous region.
On the other hand, the lithium ion secondary batteries 1 of Comparative Examples 1 to 5 also exhibited the same crystal structure as the layers constituting the lithium ion secondary batteries 1 of Examples 1 to 5.
(電気的特性)
 次に、電気的特性について説明を行う。なお、ここでは、電気的特性の評価項目として、放電容量、容量維持率、開回路電圧および内部抵抗を用いた。なお、これら電気的特性の測定機器としては、北斗電工株式会社製 充放電装置HJ1020mSD8を用いた。
(Electrical characteristics)
Next, electrical characteristics will be described. Here, discharge capacity, capacity retention, open circuit voltage, and internal resistance were used as evaluation items of the electrical characteristics. As a device for measuring these electrical characteristics, a charge / discharge device HJ1020mSD8 manufactured by Hokuto Denko KK was used.
〔放電容量〕
 放電容量は、リチウムイオン二次電池1が蓄えることのできる電荷の量すなわち容量(μAh)である。この場合、放電容量の値は大きいほどよいことになる。なお、ここでは、2つの電流値にて放電容量の測定を行った。そして、第1の実施例群(実施例1~3)に関連する評価では、電流値を0.6mAおよび20mAとし、第2の実施例群(実施例4、5)に関連する評価では、電流値を0.08mAおよび2.7mAとした。ここで、第1の実施例群を含む前者に比べて、第2の実施例群を含む後者の電流値を低く設定しているのは、第1の実施例群よりも第2の実施例群の方が、リチウムイオン二次電池1の面積を小さくしているためである。
(Discharge capacity)
The discharge capacity is the amount of charge that the lithium ion secondary battery 1 can store, that is, the capacity (μAh). In this case, the larger the value of the discharge capacity, the better. Here, the discharge capacity was measured at two current values. In the evaluation relating to the first example group (Examples 1 to 3), the current values were set to 0.6 mA and 20 mA, and in the evaluation relating to the second example group (Examples 4 and 5), The current values were 0.08 mA and 2.7 mA. Here, the reason for setting the current value of the latter including the second embodiment group lower than that of the former including the first embodiment group is that the second embodiment has a lower current value than the first embodiment group. This is because the group has a smaller area of the lithium ion secondary battery 1.
〔容量維持率〕
 容量維持率は、リチウムイオン二次電池1の、充電完了後の初期の容量に対する、予め定められた期間が経過した時点における容量の比を、百分率(%)で表したものである。この場合、容量維持率の値は高いほどよく、最高で100%となる。そして、ここでは、第1の実施例群(実施例1~3)と比較例1~4とに対しては、満充電後且つ3時間後の容量維持率の評価を行い、第2の実施例群(実施例4、5)と比較例5とに対しては、満充電後且つ24時間後の容量維持率の評価を行った。
[Capacity maintenance rate]
The capacity retention rate is a percentage (%) of the capacity of the lithium ion secondary battery 1 at the time when a predetermined period has elapsed with respect to the initial capacity after the completion of charging. In this case, the higher the value of the capacity retention ratio is, the better, and the maximum value is 100%. Here, the capacity maintenance ratio after the full charge and after 3 hours was evaluated for the first example group (Examples 1 to 3) and Comparative Examples 1 to 4, and the second example was performed. For the group of examples (Examples 4 and 5) and Comparative Example 5, the capacity retention rate after full charge and 24 hours was evaluated.
〔開回路電圧〕
 開回路電圧(Open Circuit Voltage:OCV)は、リチウムイオン二次電池1に電流を流していないときの電圧値(V)である。この場合、開回路電圧の値は大きいほどよいことになる。そして、ここでは、0.6mAでの充電(満充電)後且つ10分後の開回路電圧の評価を行った。
(Open circuit voltage)
The open circuit voltage (OCV) is a voltage value (V) when no current is flowing through the lithium ion secondary battery 1. In this case, the larger the value of the open circuit voltage, the better. Here, the open circuit voltage was evaluated after charging (full charge) at 0.6 mA and after 10 minutes.
〔内部抵抗〕
 内部抵抗は、リチウムイオン二次電池1の内部に存在する電気抵抗値(Ω)である。この場合、内部抵抗の値は小さいほどよいことになる。そして、ここでは、第1の実施例群(実施例1~3)と比較例1~4とに対しては、電流値を20mAとしたときの内部抵抗の評価を行い、第2の実施例群(実施例4、5)と比較例5とに対しては、電流値を2.7mAとしたときの内部抵抗の評価を行った。
(Internal resistance)
The internal resistance is an electric resistance value (Ω) existing inside the lithium ion secondary battery 1. In this case, the smaller the value of the internal resistance, the better. Here, the internal resistance at a current value of 20 mA was evaluated for the first example group (Examples 1 to 3) and Comparative Examples 1 to 4, and the second example was evaluated. For the group (Examples 4 and 5) and Comparative Example 5, the internal resistance at a current value of 2.7 mA was evaluated.
 表5は、実施例1~3および比較例1~4にかかるリチウムイオン二次電池1における、電気的特性の評価結果を示している。また、表6は、実施例4、5および比較例5にかかるリチウムイオン二次電池1における、電気的特性の評価結果を示している。すなわち、表5は第1の実施例群(実施例1~3)に関連する評価結果を、表6は第2の実施例群(実施例4、5)に関連する評価結果を、それぞれ示している。したがって、表5では、放電容量を測定する際の電流値が0.6mAおよび20mAとなっており、表6では、放電容量を測定する際の電流値が0.08mAおよび2.7mAとなっている。なお、表5および表6では、0.6mA充電後且つ10分後の開回路電圧を「開回路電圧@0.6mA充電後10分後」と表記した。また、表5では、0.6mAでの放電容量を「@0.6mA」と表記し、20mAでの放電容量を「@20mA」と表記した。さらに、表5では、満充電後且つ3時間後の容量維持率を「容量維持率@3時間後」と表記した。また、表6では、0.08mAでの放電容量を「@0.08mA」と表記し、2.7mAでの放電容量を「@2.7mA」と表記した。さらに、表6では、満充電後且つ24時間後の容量維持率を「容量維持率@24時間後」と表記した。さらにまた、表5では、20mAにおける内部抵抗を「内部抵抗@20mA」と表記し、表6では、2.7mAにおける内部抵抗を「内部抵抗@2.7mA」と表記した。 Table 5 shows the evaluation results of the electrical characteristics of the lithium ion secondary batteries 1 according to Examples 1 to 3 and Comparative Examples 1 to 4. Table 6 shows the evaluation results of the electrical characteristics of the lithium ion secondary batteries 1 according to Examples 4 and 5 and Comparative Example 5. That is, Table 5 shows the evaluation results related to the first example group (Examples 1 to 3), and Table 6 shows the evaluation results related to the second example group (Examples 4 and 5). ing. Therefore, in Table 5, the current values when measuring the discharge capacity are 0.6 mA and 20 mA, and in Table 6, the current values when measuring the discharge capacity are 0.08 mA and 2.7 mA. I have. In Tables 5 and 6, the open-circuit voltage after charging at 0.6 mA and 10 minutes after was described as “open circuit voltage @ 10 minutes after charging at 0.6 mA”. In Table 5, the discharge capacity at 0.6 mA is described as “$ 0.6 mA”, and the discharge capacity at 20 mA is described as “$ 20 mA”. Further, in Table 5, the capacity retention rate after full charge and after 3 hours is described as “capacity retention rate @ after 3 hours”. In Table 6, the discharge capacity at 0.08 mA is described as “$ 0.08 mA”, and the discharge capacity at 2.7 mA is described as “$ 2.7 mA”. Further, in Table 6, the capacity retention rate after full charge and after 24 hours is described as “capacity retention rate @ after 24 hours”. Furthermore, in Table 5, the internal resistance at 20 mA is described as “internal resistance @ 20 mA”, and in Table 6, the internal resistance at 2.7 mA is described as “internal resistance@2.7 mA”.
Figure JPOXMLDOC01-appb-T000005
Figure JPOXMLDOC01-appb-T000005
Figure JPOXMLDOC01-appb-T000006
Figure JPOXMLDOC01-appb-T000006
(第1の実施例群について)
 まず、表5を参照しつつ、第1の実施例群(実施例1~3)に関連する評価結果(比較対象となる比較例1~4も含む)について説明を行う。
 実施例1~3では、いずれも容量維持率@3時間後は92%以上で、高い維持率を示した。また、固体電解質層40の厚さを薄くするにしたがって、内部抵抗@20mAは低くなり、放電容量@20mAの値は高くなった。
 これに対して、固体電解質層40の厚さが1000nmである比較例1は、容量維持率@3時間後が99%であるものの、内部抵抗@20mAは48Ωと高い値であった。また、比較例1では、放電容量@20mAの値は低く、高速充放電に適していなかった。
 固体電解質層40の厚さが800nm以下の比較例2~4は微弱なリークが発生し、容量維持率は83%以下の低い水準であった。
(About the first embodiment group)
First, the evaluation results (including Comparative Examples 1 to 4 to be compared) related to the first example group (Examples 1 to 3) will be described with reference to Table 5.
In each of Examples 1 to 3, the capacity retention rate was 92% or more after 3 hours, indicating a high retention rate. Further, as the thickness of the solid electrolyte layer 40 was reduced, the internal resistance @ 20 mA decreased and the value of the discharge capacity @ 20 mA increased.
On the other hand, in Comparative Example 1 in which the thickness of the solid electrolyte layer 40 was 1000 nm, although the capacity retention ratio was 99% after 3 hours, the internal resistance @ 20 mA was as high as 48Ω. Further, in Comparative Example 1, the value of the discharge capacity @ 20 mA was low, and was not suitable for high-speed charge / discharge.
In Comparative Examples 2 to 4 in which the thickness of the solid electrolyte layer 40 was 800 nm or less, a slight leak occurred, and the capacity retention was a low level of 83% or less.
(第2の実施例群について)
 次いで、表6を参照しつつ、第2の実施例群(実施例4、5)に関連する評価結果(比較対象となる比較例5も含む)について説明を行う。
 実施例4、5では、いずれも容量維持率@24時間後は93%以上で、高い維持率を示した。また、固体電解質層40の厚さを薄くするにしたがって、内部抵抗@2.7mAは低くなり、放電容量@2.7mAの値は高くなった。
 これに対して、固体電解質層40の厚さが1000nmである比較例5は、容量維持率@24時間後が99%であるものの、内部抵抗@2.7mAは394Ωと高い値であった。また、比較例5では、放電容量@2.7mAの値は低く、高速充放電に適していなかった。
(About the second embodiment group)
Next, evaluation results (including Comparative Example 5 to be compared) relating to the second example group (Examples 4 and 5) will be described with reference to Table 6.
In Examples 4 and 5, the capacity retention ratio was 93% or more after 24 hours, indicating a high retention ratio. Further, as the thickness of the solid electrolyte layer 40 was reduced, the internal resistance @ 2.7 mA decreased and the value of the discharge capacity @ 2.7 mA increased.
On the other hand, in Comparative Example 5 in which the thickness of the solid electrolyte layer 40 was 1000 nm, the internal resistance @ 2.7 mA was a high value of 394Ω although the capacity retention ratio was 99% after 24 hours. Further, in Comparative Example 5, the value of the discharge capacity@2.7 mA was low, and was not suitable for high-speed charge / discharge.
1…リチウムイオン二次電池、10…基板、10a…表面、10b…裏面、11…基材、12…被覆層、20…下地層、30…正極層、40…固体電解質層、50…保持層、51…多孔質部、52…空孔、60…拡散防止層、70…負極集電体層 DESCRIPTION OF SYMBOLS 1 ... lithium ion secondary battery, 10 ... board | substrate, 10a ... front surface, 10b ... back surface, 11 ... base material, 12 ... coating layer, 20 ... underlayer, 30 ... positive electrode layer, 40 ... solid electrolyte layer, 50 ... holding layer Reference numerals 51, porous part, 52, pores, 60, diffusion preventing layer, 70, negative electrode current collector layer

Claims (22)

  1.  表面および裏面を有する基板と、
     前記基板における前記表面側に設けられ、第1の極性にてリチウムイオンを吸蔵および放出する第1極性層と、
     Li3PO4を含み且つLi3PO4における酸素の一部を窒素で置換したLiPONを含まない固体電解質層と、
     前記第1の極性とは逆の第2の極性にてリチウムイオンを吸蔵および放出する第2極性層と
    を順に含み、
     前記基板における前記表面は、AFM(Atomic Force Microscope)にて20μm×20μmの範囲の凹凸を測定して得られた最大高さと最小高さとの高低差である最大最小高低差が、78nm以下であること
    を特徴とするリチウムイオン二次電池。
    A substrate having a front surface and a back surface;
    A first polar layer provided on the front surface side of the substrate and occluding and releasing lithium ions at a first polarity;
    A solid electrolyte layer containing no LiPON a part of oxygen was substituted with nitrogen in Li 3 comprises PO 4 and Li 3 PO 4,
    A second polar layer that occludes and releases lithium ions at a second polarity opposite to the first polarity.
    The surface of the substrate has a maximum minimum height difference of 78 nm or less, which is a height difference between a maximum height and a minimum height obtained by measuring unevenness in a range of 20 μm × 20 μm with an AFM (Atomic Force Microscope). A lithium ion secondary battery characterized by the above-mentioned.
  2.  前記固体電解質層の厚さが、400nm以上800nm以下であること
    を特徴とする請求項1記載のリチウムイオン二次電池。
    The lithium ion secondary battery according to claim 1, wherein the thickness of the solid electrolyte layer is 400 nm or more and 800 nm or less.
  3.  前記固体電解質層の厚さが、前記第1極性層の厚さよりも小さいこと
    を特徴とする請求項1または2記載のリチウムイオン二次電池。
    The lithium ion secondary battery according to claim 1, wherein a thickness of the solid electrolyte layer is smaller than a thickness of the first polar layer.
  4.  前記基板が、導電性を有する金属で構成されること
    を特徴とする請求項1乃至3のいずれか1項記載のリチウムイオン二次電池。
    The lithium ion secondary battery according to any one of claims 1 to 3, wherein the substrate is made of a conductive metal.
  5.  前記基板が、SUS316Lで構成されること
    を特徴とする請求項4記載のリチウムイオン二次電池。
    The lithium ion secondary battery according to claim 4, wherein the substrate is made of SUS316L.
  6.  前記基板が、前記表面にNi-Pめっきを施した金属材料で構成されること
    を特徴とする請求項4記載のリチウムイオン二次電池。
    5. The lithium ion secondary battery according to claim 4, wherein the substrate is made of a metal material whose surface is subjected to Ni-P plating.
  7.  前記固体電解質層は、非晶質構造を有すること
    を特徴とする請求項1乃至6のいずれか1項記載のリチウムイオン二次電池。
    The lithium ion secondary battery according to any one of claims 1 to 6, wherein the solid electrolyte layer has an amorphous structure.
  8.  前記第1の極性が正であり、前記第2の極性が負であり、
     前記第1極性層は、LiNiO2およびLi3PO4を含んでいることを特徴とする請求項1乃至7のいずれか1項記載のリチウムイオン二次電池。
    The first polarity is positive, the second polarity is negative,
    The lithium ion secondary battery according to claim 1, wherein the first polar layer contains LiNiO 2 and Li 3 PO 4 .
  9.  前記基板の前記表面と前記第1極性層との間に設けられ、LiNiO2を含みLi3PO4を含まない下地層をさらに有すること
    を特徴とする請求項8記載のリチウムイオン二次電池。
    Wherein provided between the surface of the substrate and the first polarity layer, the lithium ion secondary battery according to claim 8, further comprising a base layer containing no Li 3 PO 4 include LiNiO 2.
  10.  前記第1の極性が正であり、前記第2の極性が負であり、
     前記固体電解質層と対峙して設けられ、白金族元素(Ru、Rh、Pd、Os、Ir、Pt)、金(Au)またはアルミニウム(Al)あるいはこれらの合金で構成される金属層をさらに有し、
     前記第2極性層は、前記金属層を構成する金属と合金化したリチウムを含んでいること
    を特徴とする請求項1乃至9のいずれか1項記載のリチウムイオン二次電池。
    The first polarity is positive, the second polarity is negative,
    A metal layer provided opposite to the solid electrolyte layer and made of a platinum group element (Ru, Rh, Pd, Os, Ir, Pt), gold (Au), aluminum (Al), or an alloy thereof is further provided. And
    The lithium ion secondary battery according to any one of claims 1 to 9, wherein the second polar layer contains lithium alloyed with a metal constituting the metal layer.
  11.  前記金属層と対峙して設けられ、非晶質構造を有する、金属または合金で構成される非晶質層をさらに有すること
    を特徴とする請求項10記載のリチウムイオン二次電池。
    The lithium ion secondary battery according to claim 10, further comprising an amorphous layer provided opposite to the metal layer and having an amorphous structure and made of a metal or an alloy.
  12.  前記基板における前記表面の前記最大最小高低差が、2.7nm以下であること
    を特徴とする請求項1乃至11のいずれか1項記載のリチウムイオン二次電池。
    The lithium ion secondary battery according to any one of claims 1 to 11, wherein the maximum and minimum height difference of the surface of the substrate is 2.7 nm or less.
  13.  前記基板における前記表面の算術平均粗さRaが1.1nm以下であること
    を特徴とする請求項1乃至12のいずれか1項記載のリチウムイオン二次電池。
    The lithium ion secondary battery according to any one of claims 1 to 12, wherein the arithmetic mean roughness Ra of the surface of the substrate is 1.1 nm or less.
  14.  AFM(Atomic Force Microscope)にて20μm×20μmの範囲の凹凸を測定して得られた最大高さと最小高さとの高低差である最大最小高低差が、78nm以下となる表面が設けられた基板を準備する基板準備工程と、
     前記基板における前記表面側に、第1の極性にてリチウムイオンを吸蔵および放出する第1極性層を形成する第1極性層形成工程と、
     前記基板上に設けられた前記第1極性層側に、Li3PO4を含み且つLi3PO4における酸素の一部を窒素で置換したLiPONを含まない固体電解質層を形成する固体電解質層形成工程と
    を有するリチウムイオン二次電池の製造方法。
    A substrate provided with a surface having a maximum / minimum height difference of 78 nm or less, which is a height difference between a maximum height and a minimum height obtained by measuring unevenness in a range of 20 μm × 20 μm with an AFM (Atomic Force Microscope). A substrate preparation step for preparing,
    A first polar layer forming step of forming a first polar layer for absorbing and releasing lithium ions with a first polarity on the front surface side of the substrate;
    The first polarity layer side provided on the substrate, the solid electrolyte layer to form a solid electrolyte layer containing no LiPON a part of oxygen was substituted with nitrogen in and Li 3 PO 4 include Li 3 PO 4 is formed And a method for producing a lithium ion secondary battery.
  15.  前記基板準備工程では、SUS316Lで構成された前記基板を準備すること
    を特徴とする請求項14記載のリチウムイオン二次電池の製造方法。
    The method for manufacturing a lithium ion secondary battery according to claim 14, wherein in the substrate preparing step, the substrate made of SUS316L is prepared.
  16.  前記基板準備工程では、Ni-Pめっきを施した金属材料で構成された前記基板を準備すること
    を特徴とする請求項14記載のリチウムイオン二次電池の製造方法。
    15. The method for manufacturing a lithium ion secondary battery according to claim 14, wherein in the substrate preparing step, the substrate made of a metal material plated with Ni—P is prepared.
  17.  前記第1の極性が正であり、
     前記基板上に設けられた前記固体電解質層に、白金族元素(Ru、Rh、Pd、Os、Ir、Pt)、金(Au)またはアルミニウム(Al)あるいはこれらの合金で構成される金属層を形成する金属層形成工程と、
     前記基板、前記第1極性層、前記固体電解質層および前記金属層を含む積層体に対し、当該第1極性層から当該固体電解質層を介して当該金属層にリチウムイオンを移動させることで充電を行う充電工程と、
     充電された前記積層体に対し、前記金属層から前記固体電解質層を介して前記第1極性層にリチウムイオンを移動させることで放電を行う放電工程と
    をさらに有することを特徴とする請求項14乃至16のいずれか1項記載のリチウムイオン二次電池の製造方法。
    The first polarity is positive;
    A metal layer made of a platinum group element (Ru, Rh, Pd, Os, Ir, Pt), gold (Au), aluminum (Al), or an alloy thereof is formed on the solid electrolyte layer provided on the substrate. Forming a metal layer forming step;
    For the laminate including the substrate, the first polar layer, the solid electrolyte layer, and the metal layer, charging is performed by moving lithium ions from the first polar layer to the metal layer via the solid electrolyte layer. A charging process to be performed;
    The method according to claim 14, further comprising: discharging the charged laminate by moving lithium ions from the metal layer to the first polar layer via the solid electrolyte layer. 17. The method for producing a lithium ion secondary battery according to any one of claims 16 to 16.
  18.  前記金属層形成工程と前記充電工程との間において、前記金属層に、非晶質構造を有する、金属または合金で構成される非晶質層を形成する非晶質層形成工程
    をさらに含むことを特徴とする請求項17記載のリチウムイオン二次電池の製造方法。
    Between the metal layer forming step and the charging step, the metal layer further includes an amorphous layer forming step of forming an amorphous layer made of a metal or an alloy having an amorphous structure. The method for producing a lithium ion secondary battery according to claim 17, wherein:
  19.  前記第1の極性が正であり、
     前記第1極性層形成工程では、LiNiO2およびLi3PO4を含む合材正極を形成すること
    を特徴とする請求項14乃至18のいずれか1項記載のリチウムイオン二次電池の製造方法。
    The first polarity is positive;
    In the first polarity layer forming step, LiNiO 2 and Li 3 PO 4 method for manufacturing a lithium ion secondary battery of any one of claims 14 to 18, characterized by forming a mixed material cathode including.
  20.  前記基板準備工程と前記第1極性層形成工程との間において、前記基板における前記表面に、LiNiO2を含みLi3PO4を含まない下地層を形成する下地層形成工程をさらに含むことを特徴とする請求項19記載のリチウムイオン二次電池の製造方法。 Between the substrate preparing step and the first polar layer forming step, the method further includes an underlayer forming step of forming an underlayer containing LiNiO 2 and not Li 3 PO 4 on the surface of the substrate. The method for manufacturing a lithium ion secondary battery according to claim 19, wherein
  21.  前記基板準備工程では、前記表面の前記最大最小高低差が2.7nm以下に設定された前記基板を準備すること
    を特徴とする請求項14乃至20のいずれか1項記載のリチウムイオン二次電池の製造方法。
    The lithium ion secondary battery according to any one of claims 14 to 20, wherein, in the substrate preparing step, the substrate having the maximum and minimum height difference of the surface set to 2.7 nm or less is prepared. Manufacturing method.
  22.  前記基板準備工程では、前記表面の算術平均粗さRaが1.1nm以下に設定された前記基板を準備すること
    を特徴とする請求項14乃至21のいずれか1項記載のリチウムイオン二次電池の製造方法。
    The lithium ion secondary battery according to any one of claims 14 to 21, wherein in the substrate preparing step, the substrate having an arithmetic mean roughness Ra of the surface set to 1.1 nm or less is prepared. Manufacturing method.
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Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07267800A (en) * 1994-03-25 1995-10-17 Shinkosha:Kk Surface treatment of single crystal
JPH08274195A (en) * 1995-03-30 1996-10-18 Mitsubishi Chem Corp Ferroelectric fet element
JP2004063419A (en) * 2002-07-31 2004-02-26 Matsushita Electric Ind Co Ltd Method for manufacturing thin film, and battery
JP2012256581A (en) * 2010-12-02 2012-12-27 Sony Corp Solid electrolyte battery and positive electrode active material
JP2013058376A (en) * 2011-09-08 2013-03-28 Toyota Motor Corp Solid electrolyte particle, solid electrolyte membrane and method for producing solid electrolyte particle
JP2016213124A (en) * 2015-05-12 2016-12-15 トヨタ自動車株式会社 Electrode laminate
JP2016225281A (en) * 2015-05-26 2016-12-28 パナソニックIpマネジメント株式会社 All-solid lithium ion secondary battery and method of manufacturing the same
JP2018029046A (en) * 2016-08-19 2018-02-22 国立大学法人東北大学 All-solid lithium battery and method for manufacturing all-solid lithium battery
JP2018129159A (en) * 2017-02-07 2018-08-16 三星電子株式会社Samsung Electronics Co.,Ltd. Negative electrode for all-solid-state secondary battery and all-solid-state secondary battery

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07267800A (en) * 1994-03-25 1995-10-17 Shinkosha:Kk Surface treatment of single crystal
JPH08274195A (en) * 1995-03-30 1996-10-18 Mitsubishi Chem Corp Ferroelectric fet element
JP2004063419A (en) * 2002-07-31 2004-02-26 Matsushita Electric Ind Co Ltd Method for manufacturing thin film, and battery
JP2012256581A (en) * 2010-12-02 2012-12-27 Sony Corp Solid electrolyte battery and positive electrode active material
JP2013058376A (en) * 2011-09-08 2013-03-28 Toyota Motor Corp Solid electrolyte particle, solid electrolyte membrane and method for producing solid electrolyte particle
JP2016213124A (en) * 2015-05-12 2016-12-15 トヨタ自動車株式会社 Electrode laminate
JP2016225281A (en) * 2015-05-26 2016-12-28 パナソニックIpマネジメント株式会社 All-solid lithium ion secondary battery and method of manufacturing the same
JP2018029046A (en) * 2016-08-19 2018-02-22 国立大学法人東北大学 All-solid lithium battery and method for manufacturing all-solid lithium battery
JP2018129159A (en) * 2017-02-07 2018-08-16 三星電子株式会社Samsung Electronics Co.,Ltd. Negative electrode for all-solid-state secondary battery and all-solid-state secondary battery

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
"RECHARGEABLE LITHIUM BATTERIES. 1st ed.", 20 August 2010, OHMSHA, LTD., pages: 132 - 133 *

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