WO2020019538A1 - 真空蒸镀设备及蒸发源装置 - Google Patents

真空蒸镀设备及蒸发源装置 Download PDF

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Publication number
WO2020019538A1
WO2020019538A1 PCT/CN2018/110732 CN2018110732W WO2020019538A1 WO 2020019538 A1 WO2020019538 A1 WO 2020019538A1 CN 2018110732 W CN2018110732 W CN 2018110732W WO 2020019538 A1 WO2020019538 A1 WO 2020019538A1
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Prior art keywords
source device
evaporation source
evaporation
crucible
chamber
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PCT/CN2018/110732
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English (en)
French (fr)
Inventor
黄春泉
周文炎
邹以慧
包立强
丁度泽
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华夏易能（广东）新能源科技有限公司
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Publication of WO2020019538A1 publication Critical patent/WO2020019538A1/zh

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation

Definitions

  • the present disclosure relates to the field of evaporation technology, and in particular, to a vacuum evaporation device and an evaporation source device.
  • CIGS copper indium gallium selenium
  • Existing vacuum evaporation equipment generally includes an evaporation chamber and an evaporation source.
  • the evaporation source is installed in the evaporation chamber, and the evaporation source includes a crucible that can hold materials.
  • an evaporation source device applied to a film coating apparatus including an evaporation chamber, the evaporation source device including:
  • a receiving cavity having a first open end, the receiving cavity faces the evaporation chamber, and the first open end is connected to an outer wall of the evaporation chamber;
  • a crucible at least partially disposed in the accommodation cavity
  • the nozzle is connected to the crucible and is located outside the accommodating cavity.
  • a flange is provided on an outer periphery of the first open end, and the flange is connected to an outer wall of the evaporation chamber.
  • the evaporation source device further includes:
  • a heating body is provided between the crucible and the accommodating cavity, and is used for heating the crucible.
  • the heating body is a cylindrical structure surrounding the crucible.
  • the heating body is a graphite coating applied on an outer wall of the crucible.
  • the evaporation source device further includes:
  • a first heat insulation layer surrounds the heating body and is located between the heating body and the accommodation cavity.
  • the evaporation source device further includes:
  • a cooling component is provided between the first heat insulation layer and the containing cavity, and the cooling component includes a cooling passage through which cooling water flows.
  • the evaporation source device further includes:
  • a first end cover is disposed outside the accommodation cavity and is opposite to the nozzle.
  • the first end cover is provided with an opening at least partially exposing the nozzle.
  • the evaporation source device further includes:
  • a second heat-insulating layer is disposed on a side of the first end cover near the accommodating cavity.
  • the receiving cavity further includes:
  • a second open end which is opposite to the first open end
  • the evaporation source device further includes a second end cover that detachably covers the second open end.
  • a vacuum evaporation apparatus including:
  • the accommodating chamber is disposed outside the evaporation chamber, and the first open end is connected to an outer wall of the evaporation chamber.
  • FIG. 1 is a schematic diagram of an evaporation source device according to an embodiment of the present disclosure.
  • evaporation chamber 1, containing chamber; 11, first open end; 12, second open end; 111, flange; 2, crucible; 3, nozzle; 4, heating body; 5, First insulation layer; 6. Cooling component; 7. First end cover; 8. Second insulation layer; 9. Second end cover; 10. Temperature detection component.
  • Existing vacuum evaporation equipment generally includes an evaporation chamber and an evaporation source.
  • the evaporation source is installed in the evaporation chamber, and the evaporation source includes a crucible that can hold materials.
  • the evaporation source includes a crucible that can hold materials.
  • the evaporation chamber also needs to be cleaned during the process of changing the evaporation material, further increasing the production cycle.
  • the coating device may include a vapor deposition chamber 100, and the vapor deposition chamber 100 may be a closed space surrounded by a shell. With inner and outer walls.
  • the evaporation source device may include a receiving chamber 1, a crucible 2 and a nozzle 3, wherein:
  • the accommodating chamber 1 may include a first open end 11, the accommodating chamber 1 faces the evaporation chamber 100, and the first open end 11 is connected to an outer wall of the evaporation chamber 100.
  • the crucible 2 is at least partially disposed in the accommodation cavity 1.
  • the nozzle 3 communicates with the crucible 2 and is located outside the accommodating cavity 1.
  • the evaporation source device of the present disclosure since at least a part of the crucible 2 is outside the evaporation chamber 100, its size can be exempted from being limited by the evaporation chamber 100, which is beneficial to expand the capacity of the crucible 2 and thereby accommodate more materials. To improve yield. At the same time, it can also reduce the pollution caused to the evaporation chamber 100, improve product quality, reduce cleaning or replacement cycles, shorten production cycles, and increase output.
  • the accommodating cavity 1 may be a cylindrical structure, and the material of the accommodating cavity 1 may be a metal material such as stainless steel. Of course, it may also be a metal compound or other high-temperature resistant materials other than metal. List them one by one.
  • the accommodating cavity 1 can accommodate the crucible 2.
  • the accommodating cavity 1 may have a first open end 11 and a second open end 12, and the crucible 2 may enter and exit the accommodating cavity 1 from the first open end 11 or the second open end 12.
  • the accommodating chamber 1 may be disposed outside the evaporation chamber 100, and the first open end 11 may be connected to the outer wall of the evaporation chamber 100, so as to fix the accommodating chamber 1 on the outer wall of the evaporation chamber 100.
  • the outer periphery of the first open end 11 may be provided with a flange 111, and the flange 111 may be detachably connected to the outer wall of the evaporation chamber 100 by bolts or screws, so as to facilitate disassembly and assembly, which is beneficial to regular material addition and maintenance. device.
  • the second open end 12 can be directly opposite to the first open end 11 so that both ends of the accommodating cavity 1 pass through.
  • the second open end 12 can be put in and out of the crucible 2 so as to install or take out the crucible 2.
  • the accommodating cavity 1 may not have the second open end 12 but only the first open end 11, and the crucible 2 may enter from the first open end 11.
  • the crucible 2 has a chamber that can hold materials for vacuum evaporation.
  • the material of the crucible 2 can be PBN (pyrolytic boron nitride pyrolysis boron nitride). At least a part of the crucible 2 can be placed in the container. In the chamber 1, at least a part of the crucible 2 is located outside the evaporation chamber 100. Therefore, the volume of the crucible 2 is not limited by the evaporation chamber 100, and it is convenient to accommodate more materials to increase the yield, and at the same time, it can reduce the The pollution of the plating chamber 100 improves the quality of the product, avoids or reduces cleaning, and shortens the production cycle.
  • the nozzle 3 may be disposed on the crucible 2 and located outside the accommodating chamber 1 and may extend into the evaporation chamber 100.
  • the nozzle 3 can be connected to the crucible 2 in a detachable manner such as by screw connection, and communicates with the inside of the crucible 2 so that the material can be ejected.
  • the detachable connection of the nozzle 3 and the crucible 2 can make the installation and removal of the nozzle 3 more convenient. , Easy to pick and place materials.
  • the material of the nozzle 3 can be graphite.
  • the nozzle 3 can be energized to raise the temperature of the graphite, so that the material is heated at the position where the material is sprayed to ensure that the material will not condense at the position where the material is sprayed to avoid clogging the evaporation port.
  • the nozzle 3 may also be other materials, and a special heating device may be provided around the nozzle 3 to heat the nozzle 3.
  • the evaporation source device of the present disclosure may further include a heating body 4, which may be disposed in the accommodating cavity 1 and located outside the crucible 2, which may be a cylindrical shape surrounding the outside of the crucible 2.
  • the structure for example, the heating body 4 may be a coating applied on the outer wall of the crucible 2 or a mesh structure covering the outside of the crucible 2.
  • the material of the heating body 4 may be graphite, and the crucible 2 is heated after being energized.
  • the heating body 4 may also be another heating device provided between the crucible 2 and the accommodating cavity 1 as long as the crucible 2 can be heated.
  • the evaporation source device may further include a first heat insulation layer 5.
  • the first heat insulation layer 5 may surround the heating body 4 and be located between the heating body 4 and the accommodation cavity 1.
  • the first heat-insulating layer 5 can be made of CFC material (carbon-carbon composite material), and can be a multilayer structure arranged in a stack, which can prevent heat diffusion and avoid harm to people.
  • the first heat-insulating layer 5 can make the temperature Stability, reduce the difficulty of temperature control, make the temperature control accuracy higher.
  • the first heat insulation layer 5 may also be asbestos, ceramic or other heat insulation materials.
  • the evaporation source device may further include a cooling component 6.
  • the cooling component 6 may be disposed between the first heat insulation layer 5 and the accommodation chamber 1, and the cooling component 6 may include cooling water.
  • the cooling channel in circulation can inject cooling water into the cooling module 6 and circulate the cooling water during use, which can further prevent heat from being transmitted outward, protect the components in the evaporation source device, and avoid high temperature causing harm to personnel.
  • the cooling speed of the evaporation source device can be increased.
  • the cooling assembly 6 may include a spirally coiled pipe that may surround the first heat insulation layer 5 and may have a water inlet and a water outlet.
  • the cooling component 6 may be a cylindrical structure, which may surround the first heat insulation layer 5, and the wall of the barrel is a hollow structure, and is provided with a water inlet and a water outlet, which can also realize the circulation of cooling water and thereby reduce the temperature. .
  • the evaporation source device may further include a first end cover 7, which may be disposed in the evaporation chamber 100 and is opposite to the nozzle 3.
  • the nozzle 3 is vertically disposed.
  • the end cap 7 is located directly above the nozzle 3.
  • the first end cover 7 may be provided with an opening, and the opening at least partially exposes the nozzle 3 to allow the material sprayed by the nozzle 3 to pass, thereby ensuring the material to be smoothly sprayed.
  • the material of the first end cover 7 may be the same as that of the accommodating cavity 1, of course, it may also be graphite or other heat-insulating materials.
  • the first end cover 7 may be directly connected to the nozzle 3 directly, or may be fixedly connected to the first open end 11 of the accommodation chamber 1, or may be fixedly connected to the inner wall of the evaporation chamber 100.
  • the evaporation source device may further include a second heat insulation layer 8, which may be disposed on a side of the first end cover 7 close to the accommodation cavity 1, for example, the second heat insulation layer 8
  • the material of the second heat insulation layer 8 may be the same as that of the first heat insulation layer 5, that is, the above-mentioned CFC material.
  • the material of the second heat insulation layer 8 can also be asbestos, ceramic or other insulation materials. Thereby, it plays a role of heat insulation, and further prevents the heat of the crucible 2 from diffusing outward.
  • the evaporation source device may further include a second end cover 9, which may cover the second open end 12, and may be detached and contained in a detachable manner such as snapping or using bolt connection.
  • the cavity 1 is fixedly connected so as to close the second open end 12, and the detachable connection facilitates the disassembly and assembly of the crucible 2, facilitates the pouring out and filling of materials, and improves the work efficiency.
  • the evaporation source device may further include a temperature detection component 10.
  • the temperature detection component 10 may be disposed in the accommodating chamber 1 to detect the temperature of the crucible 2 in real time, which is convenient for real-time monitoring of the evaporation source device temperature.
  • the evaporation source device may further include components such as a controller, a memory, and a display device connected to the temperature detection module 10, so as to facilitate judgment, storage, and display of the detected temperature.
  • the temperature detection component 10 may use a thermocouple, which may be directly attached to the bottom of the crucible 2 or located at the bottom of the accommodation chamber 1 and disposed near the crucible 2. The specific installation method and location are not described here. Special restrictions. Of course, the temperature detection component 10 may also use a thermal resistance, or other components that can measure the temperature of the crucible 2 such as an infrared temperature sensor, which are not listed here one by one.
  • An embodiment of the present disclosure further provides a vacuum evaporation apparatus, including an evaporation chamber 100 and an evaporation source device according to any one of the above embodiments.
  • the accommodating chamber 1 of the evaporation source device may be disposed outside the evaporation chamber 100, and The first open end 11 of the accommodating chamber 1 may be connected to an outer wall of the evaporation chamber 100. Therefore, the crucible 2 is located at least partially outside the evaporation chamber 100, and is not subject to the size limitation of the evaporation chamber 100, which is convenient for increasing the volume of the crucible 2 and containing more materials, thereby increasing the yield; at the same time, reducing the Pollution in the evaporation chamber 100 improves product quality.
  • the vacuum evaporation equipment may also include other parts such as a vacuum device, which will not be described in detail here.
  • the disclosed vacuum evaporation equipment and evaporation source device can fix the containing cavity of the evaporation source device outside the evaporation cavity, and the crucible is at least partially located in the containing cavity, and the nozzle connected to the crucible can extend into the evaporation cavity. So that the material in the crucible is sprayed out. Since at least a part of the crucible is outside the evaporation chamber, its size can be exempted from being limited by the evaporation chamber, which is conducive to expanding the capacity of the crucible, thereby accommodating more materials, and improving yield. At the same time, it can also reduce the pollution caused to the evaporation chamber, improve product quality, reduce cleaning or replacement cycles, shorten production cycles, and improve efficiency.

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
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Abstract

一种真空蒸镀设备及蒸发源装置，其中蒸发源装置应用于包括蒸镀腔室(100)的镀膜设备，且该蒸发源装置包括：具有第一开放端(11)的容置腔(1)，所述容置腔(1)朝向所述蒸镀腔室(100)，并且所述第一开放端(11)连接于所述蒸镀腔室(100)的外壁；坩埚(2)，至少部分设于所述容置腔(1)内；喷嘴(3)，连通于所述坩埚(2)，且位于所述容置腔(1)外。

Description

真空蒸镀设备及蒸发源装置
交叉引用
本申请要求于2018年7月25日递交的中国发明申请第201810828439.1号的优先权，在此全文引用上述中国专利申请公开的内容以作为本公开的一部分。
技术领域
本公开涉及蒸镀技术领域，具体而言，涉及一种真空蒸镀设备及蒸发源装置。
背景技术
目前，CIGS(铜铟镓硒)薄膜太阳能电池的制造，通常采用通过真空镀膜的工艺，以降低制造成本，提高光电转换效率。现有真空蒸镀设备一般包括蒸镀腔室和蒸发源等，蒸发源安装于蒸镀腔室内，且蒸发源包括可容纳物料的坩埚。
需要说明的是，在上述背景技术部分公开的信息仅用于加强对本公开的背景的理解，因此可以包括不构成对本领域普通技术人员已知的现有技术的信息。
发明内容
根据本公开的一个方面，提供一种蒸发源装置，应用于包括蒸镀腔室的镀膜设备，所述蒸发源装置包括：
具有第一开放端的容置腔，所述容置腔朝向所述蒸镀腔室，并且所述第一开放端连接于所述蒸镀腔室的外壁；
坩埚，至少部分设于所述容置腔内；
喷嘴，连通于所述坩埚，且位于所述容置腔外。
在本公开的一种示例性实施例中，所述第一开放端的外周设有法兰，所述法兰与所述蒸镀腔室的外壁连接。
在本公开的一种示例性实施例中，所述蒸发源装置还包括：
加热体，设于所述坩埚和所述容置腔之间，用于对所述坩埚进行加热。
在本公开的一种示例性实施例中，所述加热体为环绕于所述坩埚外的筒状结构。
在本公开的一种示例性实施例中，所述加热体为涂布于所述坩埚外壁的石墨涂层。
在本公开的一种示例性实施例中，所述蒸发源装置还包括：
第一隔热层，环绕于所述加热体外，且位于所述加热体和所述容置腔之间。
在本公开的一种示例性实施例中，所述蒸发源装置还包括：
冷却组件，设于所述第一隔热层与所述容置腔之间，且所述冷却组件包括供冷却水流通的冷却通路。
在本公开的一种示例性实施例中，所述蒸发源装置还包括：
第一端盖，设于所述容置腔外，且与所述喷嘴相对，所述第一端盖设有至少部分露出所述喷嘴的开口。
在本公开的一种示例性实施例中，所述蒸发源装置还包括：
第二隔热层，设于所述第一端盖靠近所述容置腔的一侧。
在本公开的一种示例性实施例中，
所述容置腔还包括：
第二开放端，所述第二开放端与所述第一开放端相对；
所述蒸发源装置还包括：第二端盖，可拆卸地覆盖所述第二开放端。
根据本公开的一个方面，提供一种真空蒸镀设备，包括：
蒸镀腔室；以及
上述任意一项所述的蒸发源装置，所述容置腔设于所述蒸镀腔室外，且所述第一开放端与所述蒸镀腔室的外壁连接。
应当理解的是，以上的一般描述和后文的细节描述仅是示例性和解释性的，并不能限制本公开。
附图说明
此处的附图被并入说明书中并构成本说明书的一部分，示出了符合本公开的实施例，并与说明书一起用于解释本公开的原理。显而易见地，下面描述中的附图仅仅是本公开的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他的附图。
图1为本公开实施方式蒸发源装置的示意图。
图中：100、蒸镀腔室；1、容置腔；11、第一开放端；12、第二开放端；111、法兰；2、坩埚；3、喷嘴；4、加热体；5、第一隔热层；6、冷却组件；7、第一端盖；8、第二隔热层；9、第二端盖；10、温度检测组件。
具体实施方式
现在将参考附图更全面地描述示例实施方式。然而，示例实施方式能够以多种形式实施，且不应被理解为限于在此阐述的实施方式；相反，提供这些实施方式使得本发明将全面和完整，并将示例实施方式的构思全面地传达给本领域的技术人员。图中相同的附图标记表示相同或类似的结构，因而将省略它们的详细描述。
虽然本说明书中使用相对性的用语，例如“上”“下”来描述图标的一个组件对于另一组件的相对关系，但是这些术语用于本说明书中仅出于方便，例如根据附图中所述的示例的方向。能理解的是，如果将图标的装置翻转使其上下颠倒，则所叙述在“上”的组件将会成为在“下”的组件。当某结构在其它结构“上”时，有可能是指某结构一体形成于其它结构上，或指某结构“直接”设置在其它结构上，或指某结构通过另一结构“间接”设置在其它结构上。
用语“一个”、“一”、“该”和“所述”用以表示存在一个或多个要素/组成部分/等；用语“包括”和“具有”用以表示开放式的包括在内的意思并且是指除了列出的要素/组成部分/等之外还可存在另外的要素/组成部分/等；用语“第一”和“第二”仅作为标记使用，不是对其对象的数量限制。
现有真空蒸镀设备一般包括蒸镀腔室和蒸发源等，蒸发源安装于蒸镀腔室内，且蒸发源包括可容纳物料的坩埚。但是，受限于蒸发源尺寸的限制，需要频繁的补充蒸发物料，增加生产周期，影响产量。更换蒸发物料的过程中也需要清洁蒸发腔室，进一步的增加生产周期。
本公开实施方式提供了一种蒸发源装置，可用于镀膜设备，如图1所示，该镀膜设备可包括蒸镀腔室100，该蒸镀腔室100可为一壳体围成的封闭空间，具有内壁和外壁。
如图1所示，本公开实施方式的蒸发源装置可以包括容置腔1、坩埚2和喷嘴3，其中：
容置腔1可包括具有第一开放端11，容置腔1朝向蒸镀腔室100，第一开放端11连接于蒸镀腔室100的外壁。
坩埚2至少部分设于容置腔1内。
喷嘴3连通于坩埚2，且位于容置腔1外。
本公开的蒸发源装置，由于将坩埚2至少有一部分在蒸镀腔室100外，其尺寸可免于受到蒸镀腔室100的限定，有利于扩大坩埚2的容量，从而容纳更多的物料，便于提高产 量。同时，还可减少对蒸镀腔室100内造成的污染，提高产品质量，减少清洁或更换周期，缩短生产周期，以提高产量。
下面对本公开的蒸发源装置的各部分进行详细说明：
如图1所示，容置腔1可为筒状结构，容置腔1的材料可以是不锈钢等金属材质，当然，还可以是金属化物或金属以外的其它耐高温的材料，在此不再一一列举。容置腔1内可容纳坩埚2。该容置腔1可具有第一开放端11和第二开放端12，坩埚2可从第一开放端11或第二开放端12进出容置腔1。容置腔1可设于蒸镀腔室100外，且第一开放端11可与蒸镀腔室100的外壁连接，从而将容置腔1固定于蒸镀腔室100外壁上。例如，第一开放端11的外周可设有法兰111，可通过螺栓或螺钉等将法兰111与蒸镀腔室100的外壁可拆卸地连接，以便拆装，有利于定期添加物料以及保养设备。第二开放端12可与第一开放端11正对设置，使得容置腔1的两端贯通，第二开放端12可供坩埚2进出，以便安装或取出坩埚2。当然，容置腔1也可不具有第二开放端12，而仅具有第一开放端11，坩埚2可从第一开放端11进入。
如图1所示，坩埚2具有可容纳用于真空蒸镀的物料的腔室，坩埚2的材料可以是PBN(pyrolytic boron nitride热解氮化硼)，坩埚2至少有一部分可置于容置腔1内，使得坩埚2至少一部分位于蒸镀腔室100以外，因而，坩埚2的体积可不受蒸镀腔室100的限制，便于容纳更多的物料，以提高产量，同时，可减少对蒸镀腔室100的污染，提高产品的质量，避免或减少清洁，缩短生产周期。
如图1所示，喷嘴3可设于坩埚2上，且位于容置腔1外，并可伸入蒸镀腔室100内。同时，喷嘴3可通过螺纹连接等可拆卸的方式与坩埚2连接，并与坩埚2内部连通，以便物料喷出，喷嘴3和坩埚2可拆卸的连接，可使喷嘴3的安装和拆卸更加方便，便于取放物料。喷嘴3的材料可以是石墨，在蒸镀时，可对喷嘴3通电，使石墨升温，从而在物料喷出的位置进行加热，保证物料不会喷出的位置凝结，避免蒸发口堵塞。当然，喷嘴3还可以是其它材料，并可在喷嘴3的周围设置专门的加热装置，对喷嘴3进行加热。
如图1所示，本公开的蒸发源装置还可以包括加热体4，该加热体4可设于容置腔1内，且位于坩埚2外，其可为环绕于坩埚2的外的筒状结构，例如，加热体4可为涂布于坩埚2外壁的涂层，或者包覆于坩埚2外的网状结构等，该加热体4的材料可以是石墨，在通电后对坩埚2进行加热。当然，加热体4还可以是设于坩埚2与容置腔1间的其它加热装置，只要能对坩埚2进行加热即可。
如图1所示，本公开实施方式的蒸发源装置还可以包括第一隔热层5，第一隔热层5 可环绕于加热体4外，且位于加热体4和容置腔1之间。第一隔热层5可采用CFC材料(碳-碳复合材料)，且可以是层叠设置的多层结构，可阻止热量扩散，避免对人员造成伤害，同时，第一隔热层5可使温度稳定，降低温度控制难度，使温度控制精度更高。当然，第一隔热层5还可以是石棉、陶瓷或其它隔热材料。
如图1所示，本公开实施方式的蒸发源装置还可以包括冷却组件6，冷却组件6可设于第一隔热层5与容置腔1之间，且冷却组件6可包括供冷却水流通的冷却通路，在使用时，可向冷却组件6注入冷却水，并使冷却水循环，可进一步防止热量向外传递，保护蒸发源装置中的零部件，并避免高温对人员造成伤害，同时，在停机降温时，可提高蒸发源装置降温的速度。
举例而言，冷却组件6可包括螺旋形盘绕的管道，其可围绕于第一隔热层5外，并可具有进水口和出水口。或者，冷却组件6可为筒状结构，其可围绕于第一隔热层5外，且筒壁为中空结构，且设有进水口和出水口，同样可实现冷却水的循环，从而实现降温。
如图1所示，本公开实施方式的蒸发源装置还可以包括第一端盖7，其可设于蒸镀腔室100内，且与喷嘴3相对，例如，喷嘴3竖直设置，第一端盖7位于喷嘴3的正上方。第一端盖7可设有开口，开口至少部分露出喷嘴3，以供喷嘴3喷出的物料通过，从而保证物料顺畅喷出。同时，第一端盖7的材料可与容置腔1相同，当然，也可以是石墨或其它隔热材质。第一端盖7可直接与喷嘴3固定连接，也可以与容置腔1的第一开放端11固定连接，还可以与蒸镀腔室100的内壁固定连接。
如图1所示，本公开实施方式的蒸发源装置还可以包括第二隔热层8，其可设于第一端盖7靠近容置腔1的一侧，例如，第二隔热层8为形成于第一端盖7靠近容置腔1的表面的隔热层，第二隔热层8的材料可与第一隔热层5相同，即上述的CFC材料。当然也可以是石棉、陶瓷或其它隔热材料。从而起到隔热的作用，进一步防止坩埚2的热量向外扩散。
如图1所示，本公开实施方式的蒸发源装置还可以包括第二端盖9，其可覆盖于第二开放端12，并可通过卡接或利用螺栓连接等可拆卸的方式与容置腔1固定连接，以便将第二开放端12封闭起来，且可拆卸的连接有利于坩埚2的拆装，方便物料的倒出和装填，有利于提高工作效率。
如图1所示，本公开实施方式的蒸发源装置还可以包括温度检测组件10，温度检测组件10可设于容置腔1内，用于实时检测坩埚2的温度，便于实时监控蒸发源装置的温度。该蒸发源装置还可包括与温度检测组件10连接的控制器、存储器及显示装置等元件，以 便于对检测到的温度进行判断、存储和显示。
举例而言，温度检测组件10可采用热电偶，该热电偶可直接贴合于坩埚2的底部，或者设于容置腔1底部，且靠近坩埚2设置，具体安装方式和位置在此不做特殊限定。当然，温度检测组件10还可以采用热电阻，或者，该可以采用红外温度传感器等其它可测量坩埚2的温度的元件，在此不再一一列举。
本公开实施方式还提供一种真空蒸镀设备，包括蒸镀腔室100和上述任一实施方式的蒸发源装置，该蒸发源装置的容置腔1可设于蒸镀腔室100外，且容置腔1的第一开放端11可与蒸镀腔室100的外壁连接。从而使坩埚2至少部分位于蒸镀腔室100外，免于受蒸镀腔室100对尺寸的限制，便于增大坩埚2的容积，容纳更多的物料，从而提高产量；同时，可降低对蒸镀腔室100内的污染，提高产品质量。此外，真空蒸镀设备还可以包括抽真空装置等其它部分，在此不再详述。
本公开的真空蒸镀设备及蒸发源装置，可将蒸发源装置的容置腔固定于蒸镀腔室外，而坩埚至少部分位于容置腔内，连通于坩埚的喷嘴可伸入蒸镀腔室，以便坩埚内的物料喷出。由于将坩埚至少有一部分在蒸镀腔室外，其尺寸可免于受蒸镀腔室的限定，有利于扩大坩埚的容量，从而容纳更多的物料，便于提高产量。同时，还可减少对蒸镀腔室内造成的污染，提高产品质量，减少清洁或更换周期，以缩短生产周期，提高效率。
本领域技术人员在考虑说明书及实践这里公开的发明后，将容易想到本公开的其它实施方案。本申请旨在涵盖本公开的任何变型、用途或者适应性变化，这些变型、用途或者适应性变化遵循本公开的一般性原理并包括本公开未公开的本技术领域中的公知常识或惯用技术手段。说明书和实施例仅被视为示例性的，本公开的真正范围和精神由所附的权利要求指出。

Claims (11)

  1. 一种蒸发源装置，应用于包括蒸镀腔室的镀膜设备，其特征在于，所述蒸发源装置包括：
    具有第一开放端的容置腔，所述容置腔朝向所述蒸镀腔室，并且所述第一开放端连接于所述蒸镀腔室的外壁；
    坩埚，至少部分设于所述容置腔内；
    喷嘴，连通于所述坩埚，且位于所述容置腔外。
  2. 根据权利要求1所述的蒸发源装置，其特征在于，所述第一开放端的外周设有法兰，所述法兰与所述蒸镀腔室的外壁连接。
  3. 根据权利要求1所述的蒸发源装置，其特征在于，所述蒸发源装置还包括：
    加热体，设于所述坩埚和所述容置腔之间，用于对所述坩埚进行加热。
  4. 根据权利要求3所述的蒸发源装置，其特征在于，所述加热体为环绕于所述坩埚外的筒状结构。
  5. 根据权利要求3所述的蒸发源装置，其特征在于，所述加热体为涂布于所述坩埚外壁的石墨涂层。
  6. 根据权利要求3所述的蒸发源装置，其特征在于，所述蒸发源装置还包括：
    第一隔热层，环绕于所述加热体外，且位于所述加热体和所述容置腔之间。
  7. 根据权利要求6所述的蒸发源装置，其特征在于，所述蒸发源装置还包括：
    冷却组件，设于所述第一隔热层与所述容置腔之间，且所述冷却组件包括供冷却水流通的冷却通路。
  8. 根据权利要求1所述的蒸发源装置，其特征在于，所述蒸发源装置还包括：
    第一端盖，设于所述容置腔外，且与所述喷嘴相对，所述第一端盖设有至少部分露出所述喷嘴的开口。
  9. 根据权利要求8所述的蒸发源装置，其特征在于，所述蒸发源装置还包括：
    第二隔热层，设于所述第一端盖靠近所述容置腔的一侧。
  10. 根据权利要求1所述的蒸发源装置，其特征在于，
    所述容置腔还包括：
    第二开放端，所述第二开放端与所述第一开放端相对；
    所述蒸发源装置还包括：第二端盖，可拆卸地覆盖所述第二开放端。
  11. 一种真空蒸镀设备，其特征在于，包括：
    蒸镀腔室；以及
    权利要求1-10任一项所述的蒸发源装置，所述容置腔设于所述蒸镀腔室外，且所述第一开放端与所述蒸镀腔室的外壁连接。
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