WO2019214229A1 - 一种单悬梁气体传感器、传感器阵列及传感器的制备方法 - Google Patents
一种单悬梁气体传感器、传感器阵列及传感器的制备方法 Download PDFInfo
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- cantilever
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- 238000000034 method Methods 0.000 title claims abstract description 30
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 42
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 42
- 239000010703 silicon Substances 0.000 claims abstract description 42
- 239000000758 substrate Substances 0.000 claims abstract description 39
- 238000010438 heat treatment Methods 0.000 claims abstract description 36
- 239000000463 material Substances 0.000 claims abstract description 21
- 230000008569 process Effects 0.000 claims abstract description 14
- 238000011068 loading method Methods 0.000 claims abstract description 10
- 238000001514 detection method Methods 0.000 claims abstract description 6
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 22
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 19
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 19
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 19
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 19
- 238000005530 etching Methods 0.000 claims description 12
- 238000002955 isolation Methods 0.000 claims description 11
- 229910052697 platinum Inorganic materials 0.000 claims description 11
- 238000010884 ion-beam technique Methods 0.000 claims description 10
- 238000001020 plasma etching Methods 0.000 claims description 10
- 239000011540 sensing material Substances 0.000 claims description 10
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 claims description 6
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 claims description 6
- 238000001039 wet etching Methods 0.000 claims description 6
- 238000005260 corrosion Methods 0.000 claims description 5
- 230000007797 corrosion Effects 0.000 claims description 5
- 238000001312 dry etching Methods 0.000 claims description 5
- 238000004518 low pressure chemical vapour deposition Methods 0.000 claims description 5
- 230000003647 oxidation Effects 0.000 claims description 5
- 238000007254 oxidation reaction Methods 0.000 claims description 5
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 claims description 5
- 238000004891 communication Methods 0.000 claims description 4
- 239000002131 composite material Substances 0.000 claims description 4
- 239000013078 crystal Substances 0.000 claims description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 3
- 229910052737 gold Inorganic materials 0.000 claims description 3
- 239000010931 gold Substances 0.000 claims description 3
- 238000000347 anisotropic wet etching Methods 0.000 claims description 2
- 238000005245 sintering Methods 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 abstract description 7
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 8
- 238000002360 preparation method Methods 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 3
- 230000010354 integration Effects 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 238000009966 trimming Methods 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 239000000084 colloidal system Substances 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- BLIQUJLAJXRXSG-UHFFFAOYSA-N 1-benzyl-3-(trifluoromethyl)pyrrolidin-1-ium-3-carboxylate Chemical compound C1C(C(=O)O)(C(F)(F)F)CCN1CC1=CC=CC=C1 BLIQUJLAJXRXSG-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- 238000013473 artificial intelligence Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000006855 networking Effects 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/30—Piezoelectric or electrostrictive devices with mechanical input and electrical output, e.g. functioning as generators or sensors
- H10N30/304—Beam type
- H10N30/306—Cantilevers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
- G01N27/02—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance
- G01N27/04—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance
- G01N27/12—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance of a solid body in dependence upon absorption of a fluid; of a solid body in dependence upon reaction with a fluid, for detecting components in the fluid
- G01N27/128—Microapparatus
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
- G01N27/02—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance
- G01N27/04—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance
- G01N27/12—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance of a solid body in dependence upon absorption of a fluid; of a solid body in dependence upon reaction with a fluid, for detecting components in the fluid
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
- G01N27/02—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance
- G01N27/04—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance
- G01N27/14—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance of an electrically-heated body in dependence upon change of temperature
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
- G01N27/02—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance
- G01N27/04—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance
- G01N27/14—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance of an electrically-heated body in dependence upon change of temperature
- G01N27/16—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance of an electrically-heated body in dependence upon change of temperature caused by burning or catalytic oxidation of surrounding material to be tested, e.g. of gas
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/50—Piezoelectric or electrostrictive devices having a stacked or multilayer structure
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/704—Piezoelectric or electrostrictive devices based on piezoelectric or electrostrictive films or coatings
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/80—Constructional details
- H10N30/85—Piezoelectric or electrostrictive active materials
- H10N30/853—Ceramic compositions
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02A—TECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE
- Y02A50/00—TECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE in human health protection, e.g. against extreme weather
- Y02A50/20—Air quality improvement or preservation, e.g. vehicle emission control or emission reduction by using catalytic converters
Definitions
- the invention belongs to the technical field of microelectronic mechanical systems and gas detection, and particularly relates to a method for preparing a single cantilever gas sensor, a sensor array and a sensor.
- MEMS microelectromechanical systems
- MOS metal oxide semiconductor
- MEMS MOS gas sensors are mainly based on the research of suspension-type micro-heaters.
- the sensors of this structure have low power consumption, generally as low as 20 mW, as provided by the utility model patent No. 201520759054.6.
- a resistive gas sensor having a four-supported cantilever four-layer structure having a silicon substrate frame, a heating film layer, a heating electrode layer and a sensitive film layer arranged in this order from bottom to top, wherein the heating film layer comprises a heating film region, The heated film zone is connected to the silicon substrate frame by four cantilevers.
- Another example is a utility model patent with the patent number CN201520759055.0, which provides a resistive gas sensor with two supporting cantilever four-layer structure, the sensor also includes a silicon substrate frame, a heating film layer and a heating layer arranged from bottom to top. An electrode layer and a sensitive film layer, wherein the heated film layer comprises a heated film region connected to the silicon substrate frame by two cantilever beams.
- These multi-cantilever gas sensors have low power consumption, but with the rapid development of mobile and IoT applications, they are no longer sufficient. At the same time, when the multi-cantilever gas sensor is prepared, there are problems of complicated process, difficult positioning, and low efficiency.
- the technical problem to be solved by the present invention is how to further reduce the power consumption of the cantilever type gas sensor.
- a single cantilever gas sensor has a base structure and a cantilever structure, and includes the following portions that are sequentially stacked:
- a support film comprising a first base and a first cantilever, the first cantilever being connected to one side of the first base;
- a heating resistor comprising a second base and a second cantilever, the second cantilever being connected to one side of the second base;
- the second base is provided with a first window on a side of the second cantilever, the second cantilever a second window extending along the length of the second cantilever, the second window is in communication with the first window;
- the second base is respectively disposed at a position on both sides of the second window;
- the isolation film includes a third base and a third cantilever, the third cantilever is connected to one side of the third base; and the third base is provided with a through hole at a position corresponding to the first lead, the first lead Exposed to the outside through the corresponding through hole; the thickness of the isolation film is greater than the thickness of the heating resistor;
- the detecting electrode includes a fourth base and a fourth cantilever, wherein the fourth cantilever is connected to one side of the fourth base; the fourth base has a third window on a side facing away from the fourth cantilever, and the fourth cantilever is provided along the first
- the fourth cantilever extends in the longitudinal direction, and the fourth window is divided into a fourth window, the fourth window is connected to the third window, and the detecting electrode is divided into two parts; the detecting electrode does not cover the through hole; the detecting a second lead is disposed at a position of the electrode on both sides of the third window;
- the silicon substrate, the first base portion, the second base portion, the third base portion and the fourth base portion are correspondingly disposed to form the base structure;
- the first cantilever, the second cantilever, the third cantilever and the fourth cantilever are correspondingly disposed to form a body Said cantilever structure;
- a gas sensing material is disposed on one end of the fourth cantilever away from the base structure.
- the first cantilever, the second cantilever, the third cantilever and the fourth cantilever have a rectangular shape.
- the first cantilever, the second cantilever, the third cantilever, and the fourth cantilever are all in the shape of an isosceles trapezoid, and in a direction away from the base structure, The widths of the first cantilever, the second cantilever, the third cantilever, and the fourth cantilever are gradually increased.
- the first cantilever is provided with a first hole extending along the longitudinal direction of the first cantilever.
- the third cantilever is provided with a second hole, and the second hole extends along the length direction of the third cantilever and is disposed corresponding to the first hole.
- the silicon substrate, the first base portion, the second base portion, the third base portion and the fourth base portion are all rectangular; the fourth base portion is provided with a fourth cantilever
- the length of the side of the side is shorter than the length of the side of the first window away from the second cantilever; or the length of the side of the third window away from the side of the fourth cantilever is longer than the length of the side of the second base provided with the second cantilever.
- the support film is a composite film formed by a single silicon oxide layer and a single silicon nitride layer, and the silicon oxide layer and the silicon nitride layer are sequentially disposed on the silicon liner.
- the thickness of the silicon nitride layer is greater than the thickness of the silicon oxide layer;
- the isolation film is a silicon oxide film or a silicon nitride film.
- the present invention also provides a sensor array that is comprised of a plurality of the above-described single cantilever gas sensor arrays.
- the invention provides a method for preparing a sensor for preparing the above single suspension beam gas sensor, comprising the following steps:
- release film firstly, the exposed support film is completely etched by reactive ion etching or ion beam etching to expose the silicon substrate to form a film release window, and then anisotropic wet method using tetramethylammonium hydroxide or potassium hydroxide. Corrosion liquid, or an isotropic wet etching solution composed of hydrofluoric acid, nitric acid and water, or XeF 2 isotropic dry etching gas to hollow out the silicon substrate under the support film to release the film structure;
- the heating resistor in the step (3) is a platinum resistor, and the thickness is The thickness of the separator in the step (4) is
- the detecting electrode is a platinum electrode or a gold electrode, and the thickness thereof is
- the technical scheme of the invention adopts a single cantilever structure, and the effective area is arranged at the end of the cantilever beam, and the power consumption of the sensor is reduced to 1 milliwatt by reducing the effective area area and reducing the number of the cantilever;
- the single cantilever type sensor has a smaller size, higher integration, and an integration degree that is an order of magnitude higher than that of the existing multi-cantilever structure;
- the preparation method of the single cantilever gas sensor proposed by the invention is simple in process, easy to locate, effectively improves production efficiency, and is also easier to prepare a gas sensing material having a composite structure of temperament materials.
- FIG. 1 is a schematic structural view of a single cantilever beam gas sensor according to an embodiment of the present invention
- Figure 2 is a schematic exploded view of Figure 1;
- FIG. 3 is a schematic exploded view of another single cantilever gas sensor according to an embodiment of the present invention.
- FIG. 4 is a schematic structural diagram of a sensor array according to an embodiment of the present invention.
- the present invention provides a single cantilever gas sensor comprising a silicon substrate 1, a support film 2, a heating resistor 3, a separator 4, a detecting electrode 5, and a gas sensing material 6.
- the sensor has a base structure and a cantilever structure.
- the base structure has a rectangular shape
- the cantilever structure is disposed at a middle portion of a long side of the base structure to form a "T" type single cantilever structure.
- the silicon substrate 1, the support film 2, the heating resistor 3, the isolation film 4, and the detecting electrode 5 are stacked in this order from bottom to top, and the specific structure thereof is as follows:
- the upper and lower end faces of the silicon substrate 1 have a rectangular shape.
- the support film 2 is used to support the entire cantilever structure. It comprises a first base portion 21 having a rectangular shape, and a first side of a long side of the first base portion 21 is provided with a first cantilever 22 extending outward.
- the heating resistor 3 is constructed of a metal or semiconductor material to provide the required operating temperature for sensor operation.
- the heating resistor 3 includes a second base portion 31 having a rectangular shape.
- the second base portion 31 is provided with a second cantilever 32 at a central portion of the long side, and a first window 33 is opened on a side of the second base portion 31 opposite to the second cantilever 32.
- the second cantilever 32 is open with a second window 34 extending along the length of the second cantilever 32, and the second window 34 is in communication with the first window 31.
- the heating resistor 3 is provided with two first leads (not shown), and the two first leads are respectively disposed on the side of the second base 31 facing away from the second cantilever 32, and are located at the first window 33 On the side.
- the isolation film 4 is made of an insulating medium such as silicon nitride or silicon oxide for electrically isolating the heating resistor 3 and the detecting electrode 5.
- the third base portion 41 has a rectangular base portion 41.
- the third base portion 41 is respectively provided with a through hole 44 at a position corresponding to the first lead wire.
- the first lead wire is exposed through the corresponding through hole 44 and is exposed;
- a third cantilever 42 is disposed at a middle portion of a long side of the base portion 41; and a thickness of the separation film 4 is greater than a thickness of the heating resistor 3;
- the detecting electrode 5 is generally a noble metal material electrode such as metal platinum or gold.
- the detecting electrode 5 includes a fourth base portion 51 having a rectangular shape, and a fourth cantilever 52 is disposed in a middle portion of the long side of the fourth base portion 51, and a third window 53 is defined on a side of the fourth base portion 51 opposite to the fourth cantilever 52.
- the fourth cantilever 52 is open with a fourth window 54 extending along the length of the fourth cantilever 52 and dividing the fourth cantilever 52.
- the fourth window 54 is in communication with the third window 53.
- the detecting electrode 5 is provided with two second leads (not shown), and the two second leads are respectively disposed on the side of the fourth base 51 facing away from the third window 53 and located at the third window 53. On both sides. It should be noted that the fourth base portion 51 cannot block the transmission hole 44.
- the silicon substrate 1, the first base portion 21, the second base portion 31, the third base portion 41, and the fourth base portion 51 are correspondingly disposed to form a base structure; the first cantilever 22, the second cantilever 32, the third cantilever 42 and the fourth cantilever 52 correspondingly set to form a cantilever structure;
- the gas sensing material 6 is composed of a metal oxide semiconductor material at a nanometer scale, such as tin dioxide, zinc oxide or other oxides.
- the gas sensing material 6 is disposed on the end of the fourth cantilever 52 away from the base structure such that the gas sensing material 6 is electrically connected to the detecting electrode 5.
- the gas sensitive material 6 adsorbs a specific gas molecule, its resistivity changes, thereby achieving the purpose of detecting the gas.
- the core portion of the gas sensor is a cantilever structure for loading the active area of the gas sensitive material only at the end of the cantilever structure away from the base mechanism.
- the heat loss caused by heat convection and heat radiation is reduced by reducing the area of the effective area, and on the other hand, the cantilever structure is thin and long, and the heat loss during heat conduction can be greatly reduced, so that the sensor has extremely low power consumption. .
- the base structure is rectangular and the cantilever structure is disposed at the middle of the long side of the rectangular base structure, but this is not a strict regulation.
- the basic structure of the base structure And the setting position of the cantilever structure is set as needed.
- the first cantilever 22, the second cantilever 32, the third cantilever 42 and the fourth cantilever 52 have a rectangular outer shape.
- the first cantilever 22, the second cantilever 32, the third cantilever 42 and the fourth cantilever 52 have an isosceles trapezoidal shape and are away from the base structure.
- the widths of the first cantilever 22, the second cantilever 32, the third cantilever 42 and the fourth cantilever 52 are gradually increased.
- the first cantilever 22 is provided with a first hole 23 extending in the opposite direction along the length of the first cantilever 22; the third cantilever 42 is provided with a second hole 43 extending along the longitudinal direction of the third cantilever 42.
- a hole 23 is provided corresponding to the second hole 43. The heat loss during heat conduction is further reduced by providing the elongated first hole 23 and the second hole 43.
- the length of the long side of the fourth base 51 is shorter than the length of the side of the first window 33 away from the second cantilever 32.
- the length of the side of the third window 53 facing away from the third cantilever 52 is greater than the length of the long side of the second base 21.
- the support film 2 is a composite film formed by a single silicon oxide layer and a single silicon nitride layer.
- the silicon oxide layer and the silicon nitride layer are sequentially disposed on the silicon substrate 1, and the thickness of the silicon nitride layer is larger than that of the silicon oxide layer.
- the separator 4 is a silicon oxide film or a silicon nitride film.
- the first window 33 may be a symmetrical structure, and the heating resistor 3 is formed into a symmetrical structure by providing the first window 33 and the second window 34; the third window 53 is a symmetrical structure, and passes through the third window 53 and the fourth The window 54 divides the detecting electrode 5 into two parts which are symmetrical.
- the first window 33 and the third window 53 may also have an asymmetrical structure, and the heating resistor 3 and the detecting electrode 5 are also asymmetric structures.
- the single cantilever sensor provided in this embodiment is easy to realize integration of a plurality of sensors to form a sensor array due to its unique structure.
- the embodiment further provides a sensor array which is formed by tiling the above-mentioned single cantilever sensor, wherein the cantilever structures of the respective sensors are located on the same side of the base structure.
- the cantilever structure of each sensor can also be distributed on both sides of the base structure or in other arrangements as needed.
- the preparation method of the single cantilever gas sensor described in this embodiment is more convenient than the conventional multi-cantilever sensor preparation method, and has the characteristics of simple positioning and simple process. The details will be described below by way of specific examples.
- a method for preparing a single cantilever gas sensor comprises the following steps:
- a detecting electrode 5 made of platinum is formed by a lift-off process, and the thickness is
- a method for preparing a single cantilever gas sensor comprises the following steps:
- the resistivity is 3-8 ⁇ cm
- the thickness of the silicon wafer is 350 ⁇ 10 ⁇ m
- the angular error of the trimming is ⁇ 1%
- a detecting electrode 5 made of platinum is formed by a lift-off process, and the thickness is
- a method for preparing a single cantilever gas sensor comprises the following steps:
- the resistivity is 3-8 ⁇ cm
- the thickness of the silicon wafer is 350 ⁇ 10 ⁇ m
- the angular error of the trimming is ⁇ 1%
- a detecting electrode 5 made of platinum is formed by a lift-off process, and the thickness is
- the method for preparing the single cantilever gas sensor array into a single cantilever gas sensor array is basically the same as the preparation process of the single cantilever gas sensor described above, and only needs to be in step (6), by setting etching conditions, so that a plurality of substrates are formed after releasing the film.
- the structure is sequentially connected, and each of the base structures has a sensor array with a cantilever structure; then, differently formulated tin dioxide gas sensing materials are respectively taken at the ends of each of the cantilever structures to form a single cantilever gas sensor array.
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Claims (10)
- 一种单悬梁气体传感器,其特征在于,具有基体结构和悬梁结构,其包括依次层叠设置的如下部分:硅衬底;支撑膜,包括第一基部和第一悬臂,所述第一悬臂与第一基部的一侧连接;加热电阻,包括第二基部和第二悬臂,所述第二悬臂与第二基部的一侧连接;第二基部相对于第二悬臂的一侧开设有第一窗口,所述第二悬臂上设有沿第二悬臂长度方向延伸的第二窗口,所述第二窗口与第一窗口连通;第二基部位于第二窗口两侧的位置上分别设有第一引线;隔离膜,包括第三基部和第三悬臂,所述第三悬臂与第三基部的一侧连接;所述第三基部上对应于第一引线的位置设有透过孔,所述第一引线穿过相应透过孔暴露在外;所述隔离膜的厚度大于加热电阻的厚度;检测电极,包括第四基部和第四悬臂,所述第四悬臂与第四基部的一侧连接;第四基部背离第四悬臂的一侧设有第三窗口,第四悬臂上设有沿第四悬臂长度方向延伸,并将第四悬臂分割的第四窗口,所述第四窗口与第三窗口连通,并将检测电极分割为两部分;检测电极不覆盖所述透过孔;所述检测电极位于第三窗口两侧的位置上设有第二引线;所述硅衬底、第一基部、第二基部、第三基部和第四基部对应设置形成所述基体结构;所述第一悬臂、第二悬臂、第三悬臂和第四悬臂对应设置形成所述悬梁结构;所述第四悬臂远离基体结构的一端上设有气敏材料。
- 根据权利要求1所述的一种单悬梁气体传感器,其特征在于,所述第一悬臂、第二悬臂、第三悬臂及第四悬臂的外形均呈矩形。
- 根据权利要求1所述的一种单悬梁气体传感器,其特征在于,所述第一悬臂、第二悬臂、第三悬臂及第四悬臂的外形均呈等腰梯形,且沿远离基体结构的方向,所述第一悬臂、第二悬臂、第三悬臂及第四悬臂的宽度均逐渐增大。
- 根据权利要求1-3任一项所述的一种单悬梁气体传感器,其特征在于,所述第一悬臂上设有沿第一悬臂长度方向延伸的第一孔。
- 根据权利要求4所述的一种单悬梁气体传感器,其特征在于,所述第三悬臂上设有第二孔,所述第二孔沿第三悬臂的长度方向延伸,并与第一孔对应设置。
- 根据权利要求4所述的一种单悬梁气体传感器,其特征在于,所述硅衬底、第一基部、第二基部、第三基部及第四基部均为矩形;所述第四基部设有第四悬臂的侧边的长度短于第一窗口远离第二悬臂的侧边的长度;或第三窗口远离第四悬臂的侧边的长度长于第二基部设有第二悬臂的侧边的长度。
- 根据权利要求1所述的一种单悬梁气体传感器,其特征在于,所述支撑膜为单层氧化硅层与单层氮化硅层形成的复合膜,氧化硅层与氮化硅层依次设置在硅衬底上,且氮化硅层的厚度大于氧化硅层的厚度;所述隔离膜为氧化硅膜或氮化硅膜。
- 一种传感器阵列,其特征在于,由多个如权利要求1-7任一项所述的单悬梁气体传感器组成。
- 一种传感器的制备方法,其用以制备如权利要求1-7任一项所述的一种单悬梁气体传感器,包括以下步骤:(1)选择硅衬底:当释放薄膜采用各向同性的干法刻蚀或湿法腐蚀时,对硅衬底的金相无要求;当释放薄膜采用各向异性湿法腐蚀时,选择<100>晶向的 硅片;(2)制作支撑膜:在硅衬底上采用热氧化和低压化学气相沉积法制备;(3)制作加热电阻:采用剥离工艺制备;(4)制作隔离膜:先采用等离子增强化学气相沉积制备,再利用反应离子刻蚀或离子束刻蚀该隔离膜,形成透过孔露出加热电阻;(5)制作检测电极:采用剥离工艺制备;(6)释放薄膜:首先利用反应离子刻蚀或离子束刻蚀彻底刻蚀暴露支撑膜,露出硅衬底形成薄膜释放窗口,然后采用四甲基氢氧化铵或氢氧化钾各向异性湿法腐蚀液,或采用各向同性湿法腐蚀液,或XeF 2各向同性干法腐蚀气体来掏空支撑膜下面的硅衬底即可释放出薄膜结构;(7)气敏材料的加载:在所述悬梁结构的端部沾取气敏材料,经烧结完成气敏材料的加载。
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CN109164157B (zh) * | 2018-10-26 | 2020-12-25 | 浙江师范大学 | 用于生化检测的检测系统 |
CN111272828B (zh) * | 2020-03-26 | 2022-04-12 | 微纳感知(合肥)技术有限公司 | 一种mems气体传感器及其阵列、制备方法 |
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