Classifications

• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
  • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
  • C23C14/067—Borides
• • C—CHEMISTRY; METALLURGY
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  • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
  • C04B35/515—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics
  • C04B35/58—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides
  • C04B35/5805—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides based on borides
  • C04B35/58064—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides based on borides based on refractory borides
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  • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
  • C04B35/515—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics
  • C04B35/58—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides
  • C04B35/5805—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides based on borides
  • C04B35/58064—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides based on borides based on refractory borides
  • C04B35/58071—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides based on borides based on refractory borides based on titanium borides
• • C—CHEMISTRY; METALLURGY
  • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
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  • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
  • C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
  • C04B35/64—Burning or sintering processes
  • C04B35/645—Pressure sintering
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  • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
  • C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
  • C04B35/64—Burning or sintering processes
  • C04B35/645—Pressure sintering
  • C04B35/6455—Hot isostatic pressing
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
  • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
  • C23C14/34—Sputtering
  • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
  • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
  • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
  • H01J37/32—Gas-filled discharge tubes
  • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
  • H01J37/3411—Constructional aspects of the reactor
  • H01J37/3414—Targets
  • H01J37/3426—Material
  • H01J37/3429—Plural materials
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
  • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
  • H01J37/32—Gas-filled discharge tubes
  • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
  • H01J37/3488—Constructional details of particle beam apparatus not otherwise provided for, e.g. arrangement, mounting, housing, environment; special provisions for cleaning or maintenance of the apparatus
  • H01J37/3491—Manufacturing of targets
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  • C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
  • C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
  • C04B2235/30—Constituents and secondary phases not being of a fibrous nature
  • C04B2235/38—Non-oxide ceramic constituents or additives
  • C04B2235/3804—Borides
  • C04B2235/3813—Refractory metal borides
• • C—CHEMISTRY; METALLURGY
  • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
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  • C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
  • C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
  • C04B2235/30—Constituents and secondary phases not being of a fibrous nature
  • C04B2235/42—Non metallic elements added as constituents or additives, e.g. sulfur, phosphor, selenium or tellurium
  • C04B2235/422—Carbon
  • C04B2235/425—Graphite
• • C—CHEMISTRY; METALLURGY
  • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
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  • C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
  • C04B2235/65—Aspects relating to heat treatments of ceramic bodies such as green ceramics or pre-sintered ceramics, e.g. burning, sintering or melting processes
  • C04B2235/66—Specific sintering techniques, e.g. centrifugal sintering
  • C04B2235/666—Applying a current during sintering, e.g. plasma sintering [SPS], electrical resistance heating or pulse electric current sintering [PECS]
• • C—CHEMISTRY; METALLURGY
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  • C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
  • C04B2235/70—Aspects relating to sintered or melt-casted ceramic products
  • C04B2235/72—Products characterised by the absence or the low content of specific components, e.g. alkali metal free alumina ceramics
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  • C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
  • C04B2235/70—Aspects relating to sintered or melt-casted ceramic products
  • C04B2235/74—Physical characteristics
  • C04B2235/77—Density
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  • C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
  • C04B2235/70—Aspects relating to sintered or melt-casted ceramic products
  • C04B2235/74—Physical characteristics
  • C04B2235/78—Grain sizes and shapes, product microstructures, e.g. acicular grains, equiaxed grains, platelet-structures
  • C04B2235/786—Micrometer sized grains, i.e. from 1 to 100 micron
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  • C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
  • C04B2235/70—Aspects relating to sintered or melt-casted ceramic products
  • C04B2235/80—Phases present in the sintered or melt-cast ceramic products other than the main phase
• • C—CHEMISTRY; METALLURGY
  • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
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  • C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
  • C04B2235/70—Aspects relating to sintered or melt-casted ceramic products
  • C04B2235/96—Properties of ceramic products, e.g. mechanical properties such as strength, toughness, wear resistance

Definitions

• the present invention relates to a target (a coating source) for the physical vapor deposition having the features of the preamble of claim 1 and a method for producing a target having the features of claim 9.
• a target is suitable for use in a PVD (Physical Vapor Deposition) process for depositing layers onto a dedicated substrate material.
• PVD Physical Vapor Deposition
• target sputtering targets or Are cathodes are to be understood.
• the targets are produced by different technologies depending on the material. In principle, one can distinguish between powder and melt metallurgical processes. There are many different possibilities in powder metallurgy technologies, which must be chosen according to the composition of the target taking into account the properties of the integrated elements. By way of example, pressing, sintering, hot isostatic pressing (HIP), forging, rolling, hot pressing (HP) or spark plasma sintering (SPS) can also be mentioned in combination.
• HIP hot isostatic pressing
• HP hot isostatic pressing
• SPS spark plasma sintering
• JP55128560 describes the preparation of a sintered body with at least two different diborides, whereby metals such as nickel, iron and cobalt are used in the form of borides as binders and sintering aids to compensate for the disadvantage of the low porosity of the preparation at relatively low sintering temperatures.
• the disadvantage is that these metals impair the purity of the deposited layers when using a sintered body as a target.
• the object of the invention is to provide a generic target and a generic method for producing a target, which has a high density, with which high-purity, chemically homogeneous layers can be produced and which has a fine-grained and isotropic microstructure.
• the invention avoids this coarsening by using a powder of at least two different phases, namely titanium diboride (TiB 2 ), vanadium diboride (VB 2 ), and optionally carbon, preferably graphite (if the carbon is not in the form of an impurity of one or both of the phases Titandiborid (TiB 2 ) or vanadium diboride (VB 2 ) is present) is used.
• TiB 2 titanium diboride
• VB 2 vanadium diboride
• carbon preferably graphite (if the carbon is not in the form of an impurity of one or both of the phases Titandiborid (TiB 2 ) or vanadium diboride (VB 2 ) is present) is used.
• This ensures the maintenance of a fine-grained microstructure despite the relatively high compression temperature.
• the sum of the mixture of at least two of the following compounds is titanium diboride (TiB 2 ) and / or vanadium diboride (VB 2 ) and / or the mixed phases ((Ti, V) B 2 ) of titanium diboride (TiB 2 ) and vanadium diboride (VB 2 ) and the carbon (C) at least 99.8 mol%. It is the metallic purity without consideration of such elements as oxygen (O), nitrogen (N) or hydrogen (H).
• a powder batch which can be used for the process according to the invention consists of:
• TiB 2 titanium diboride
• VB 2 vanadium diboride
• titanium diboride (TiB 2 ) and / or vanadium diboride (VB 2 ) Due to impurities of titanium diboride (TiB 2 ) and / or vanadium diboride (VB 2 ), other borides than titanium diboride (TiB 2 ) and vanadium diboride (VB 2 ) may be detectable in the targets of the invention (less than 0.01 mol%).
• the carbon (C) is in the form of graphite.
• the powders were mixed in a ratio of TiB 2 A / B 2 / C of 74/24/2 mol% and ground in a grinding unit with grinding balls.
• the finished powder mixture was compacted by means of wet pressing at a pressure of 30 MPa and a temperature of 2000 ° C.
• the titanium diboride (TiB 2 ) and the vanadium diboride (VB 2 ) are distributed homogeneously in the target such that, when at least five square or circular different measuring ranges with a size of at least 1 mm 2 are selected average chemical composition determined on the surface of the respective measuring range does not deviate more than 20%, preferably not more than 10%, from an average chemical composition calculated from all selected measuring ranges.
• Measuring ranges, deviates.
• an isotropic structure in an X-ray examination of the target, can be seen without preferential crystallographic grain alignment, wherein an aspect ratio of
• hot pressing or spark plasma sintering (SPS) is carried out at a pressure of at least 20 MPa, preferably at least 30 MPa.
• the achieved density of the plate is 4.54 g / cm 3 and thus about 97.8% of the theoretical density for this material of 4.64 g / cm 3 , calculated on the mixing rule for 75 mol% TiB 2 with the theoretical Density of 4.5 g / cm 3 and 25 mol% VB 2 with the theoretical density of 5.1 g / cm 3 .
• the hot pressing or spark plasma sintering takes place in a vacuum or in an inert protective gas atmosphere.
• the microstructure of the target of TiB 2 / VB 2 mixtures described in this disclosure is transferable to the person skilled in the art both in terms of grain size, density, doping, purity and the production process via hot pressing or SPS to other combinations of borides, in particular combinations Borides TiB 2 , VB 2 , CrB 2 , ZrB 2 , NbB 2 , MoB 2 , MoB, HfB 2 , TaB 2 , WB 2 , W 2 B 5 .
• the mixtures are systems of at least two borides, eg. B. binary systems of two borides or systems of three, four or more Boriden simultaneously in a mixture. Embodiments of the invention will be discussed with reference to the figures. Showing:
• FIG. 4 A SEM photograph of a TiB 2 A / B 2 target according to the invention
• FIG. 5 SEM of a TiB 2 A target according to the invention
• FIG. B 2 FIG. 6 shows an SEM image of a TiB 2 A / B 2 target according to the invention.
• Fig. 7a, b is a radiographic image (XRD) of an inventive
• Fig. 9 is a photograph of the result of a hardness test in a
• Fig. 10 is a photograph of the result of a hardness test in a
• Figures 1 and 2 show examples of a microstructure of pure TiB 2 material that has been densified at different temperatures to achieve a correspondingly high density.
• the magnification in both figures has been chosen to be identical. If the temperature is too high, there is already a strong grain coarsening.
• Fig. 1 shows pure TiB 2 , hot-pressed at 1650 ° C. The microstructure is still relatively fine-grained with an estimated mean particle size of 2 pm. The density of the material is 4.43 g / cm 3 and thus about 98% of the theoretical density of 4.52 g / cm 3 for TiB 2 .
• Fig. 2 shows pure TiB 2 , hot-pressed at 1700 ° C.
• the microstructure is already partially coarsely coarsened with individual grains larger than 10 pm.
• the density of the material is about 98.5% of the theoretical density of TiB 2 .
• FIGS. 3 to 5 show examples of targets according to the invention in which the molecular ratio of titanium (Ti) to vanadium (V) in the mixture of titanium diboride (TiB 2 ) and / or vanadium diboride (VB 2 ) and / or mixed phases ((Ti , V) B 2 ) of titanium diboride (TiB 2 ) and vanadium diboride (VB 2 ) in a range of 1:99 to 99: 1, preferably in a range of 10:90 to 90:10.
• the microstructure of the TiB 2 A / B 2 materials in FIGS. 3 to 5 shows no texturing and an isotropic microstructure with an aspect ratio of the grains substantially of 1.
• 3a shows a detail of a target of a TiB 2 / VB 2 75/25 mol% material, compressed via SPS at 1900 ° C.
• the density of the material is 4.19 g / cm 3 and thus about 90% of the theoretical density for this material of 4.64 g / cm 3 , calculated on the mixing rule for 75 mol% TiB 2 with the theoretical density of 4, 5 g / cm 3 and 25 mol% VB 2 with the theoretical density of 5.1 g / cm 3 .
• FIG. 3b shows a detail of a target of a TiB 2 A / B 2 75/25 mol% material, compressed via SPS at 2000 ° C.
• the density of the material is 4.49 g / cm 3 and thus about 97% of the theoretical density for this material of 4.64 g / cm 3 , calculated on the mixing rule for 75 mol% TiB 2 with the theoretical density of 4, 5 g / cm 3 and 25 mol% VB 2 with the theoretical density of 5.1 g / cm 3 .
• FIG. 4 shows a detail of a target made of a TiB 2 / VB 2 87.5 / 12.5 mol% material, compressed via SPS at 2000 ° C.
• the density of the material is 4.52 g / cm 3 and thus about 99% of the theoretical density for this material of 4.57 g / cm 3 , calculated on the mixing rule for 87.5 mol% TiB 2 with the theoretical density of 4.5 g / cm 3 and 12.5 mol% VB 2 with the theoretical density of 5.1 g / cm 3 .
• FIG. 5 shows a TiB 2 A / B 2 93.75 / 6.25 mol% material compressed via SPS at 2000 ° C.
• the density of the material is 4.46 g / cm 3 and thus about 98% of the theoretical density for this material of 4.53 g / cm 3 , calculated on the mixing rule for 93.75 mol% TiB 2 with the theoretical density of 4.5 g / cm 3 and 6.25 mol% VB 2 with the theoretical density of 5.1 g / cm 3 .
• inventive targets were prepared by the SPS method, which was carried out in each case under vacuum.
• Fig. 6 shows for comparison a microstructure with still high porosity because compacted at the lowest acceptable temperature, namely a TiB 2 / VB 2 75/25 mol% material densified by SPS at 1750 ° C.
• the density of the material is 4.01 g / cm 3 and thus about 86% of the theoretical density for this material of 4.64 g / cm 3 , calculated on the mixing rule for 75 mol% TiB 2 with the theoretical density of 4, 5 g / cm 3 and 25 mol% VB 2 with the theoretical density of 5.1 g / cm 3 .
• FIGS. 7a and 7b a spectrum determined by X-ray analysis for phase analysis can be seen on the target with the composition according to FIG. 3b.
• Of particular interest are reflections characteristic of the phases TiB 2 , (Ti, V) B 2 and VB 2 .
• These three phases TiB 2 , (Ti, V) B 2 and VB 2 are mainly attributable to this spectrum by a person skilled in the art.
• FIGS. 8 to 10 each show, by way of example, a FIV30 tint impression, measured on the TiB 2 / VB 2 mixing targets. For a representative statement on hardness, three FIV30 tint impressions were used.
• Fig. 8 shows one of three HV30 hardness impressions for a target of TiB 2 A / B 2 75/25 mol%.
• Figure 9 shows one of three FIV30 tinting impressions for a TiB 2 / VB 2 87.5 / 12.5 mol% target.
• Figure 10 shows one of three FIV30 tints on a TiB 2 / VB 2 target of 93.75 / 6.25 mole%.

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• Physical Vapour Deposition (AREA)

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• 2018
  • 2018-04-20 AT ATGM50075/2018U patent/AT16481U1/de not_active IP Right Cessation
• 2019
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