WO2019080253A1 - 一种显影机及其传动装置 - Google Patents

一种显影机及其传动装置

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Publication number
WO2019080253A1
WO2019080253A1 PCT/CN2017/113527 CN2017113527W WO2019080253A1 WO 2019080253 A1 WO2019080253 A1 WO 2019080253A1 CN 2017113527 W CN2017113527 W CN 2017113527W WO 2019080253 A1 WO2019080253 A1 WO 2019080253A1
Authority
WO
WIPO (PCT)
Prior art keywords
transmission
developing machine
transmission units
machine according
units
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/CN2017/113527
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English (en)
French (fr)
Inventor
齐鹏博
陈叶凯
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Wuhan China Star Optoelectronics Technology Co Ltd
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Wuhan China Star Optoelectronics Technology Co Ltd
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Filing date
Publication date
Application filed by Wuhan China Star Optoelectronics Technology Co Ltd filed Critical Wuhan China Star Optoelectronics Technology Co Ltd
Priority to US15/740,753 priority Critical patent/US20190382225A1/en
Publication of WO2019080253A1 publication Critical patent/WO2019080253A1/zh
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/30—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
    • H10P72/32—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations between different workstations
    • H10P72/3202—Mechanical details, e.g. rollers or belts
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
    • B65H5/00—Feeding articles separated from piles; Feeding articles to machines
    • B65H5/06—Feeding articles separated from piles; Feeding articles to machines by rollers or balls, e.g. between rollers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
    • B65H27/00—Special constructions, e.g. surface features, of feed or guide rollers for webs
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
    • B65H3/00—Separating articles from piles
    • B65H3/02—Separating articles from piles using friction forces between articles and separator
    • B65H3/06—Rollers or like rotary separators
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
    • B65H5/00—Feeding articles separated from piles; Feeding articles to machines
    • B65H5/06—Feeding articles separated from piles; Feeding articles to machines by rollers or balls, e.g. between rollers
    • B65H5/066—Feeding articles separated from piles; Feeding articles to machines by rollers or balls, e.g. between rollers the articles resting on rollers or balls
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
    • G03F7/3064—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations characterised by the transport means or means for confining the different units, e.g. to avoid the overflow
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
    • B65H2404/00—Parts for transporting or guiding the handled material
    • B65H2404/10—Rollers
    • B65H2404/15—Roller assembly, particular roller arrangement
    • B65H2404/152—Arrangement of roller on a movable frame
    • B65H2404/1521—Arrangement of roller on a movable frame rotating, pivoting or oscillating around an axis, e.g. parallel to the roller axis
    • B65H2404/15212—Arrangement of roller on a movable frame rotating, pivoting or oscillating around an axis, e.g. parallel to the roller axis rotating, pivoting or oscillating around an axis perpendicular to the roller axis
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
    • B65H2404/00—Parts for transporting or guiding the handled material
    • B65H2404/10—Rollers
    • B65H2404/15—Roller assembly, particular roller arrangement
    • B65H2404/154—Rollers conveyor
    • B65H2404/1542—Details of pattern of rollers

Definitions

  • the present invention relates to the field of display panel manufacturing, and more particularly to a developing machine and a transmission thereof.
  • the glass substrate is cleaned, coated with photoresist, dried under reduced pressure and soft baked, and then enters the exposure machine, and the photoresist is defined on the glass substrate by MASK; then the development process is performed.
  • the graphic is displayed, and finally, after hard baking, the photoresist is shaped to produce a glass substrate.
  • the developer liquid nozzle is fixed on the machine table to discharge the developer liquid, and the substrate is transported through the transmission device from below the developer liquid nozzle. At this time, the developer liquid discharged from the developer liquid nozzle is entirely coated on the substrate, and the substrate is coated on the substrate.
  • the photoresist is immersed in the developing solution to achieve the purpose of development.
  • the transmission device of the existing developing machine is unreasonable in structural design, and has the following defects: when the developing liquid nozzle discharges the developing liquid, the developing liquid is easily formed between the developing liquid nozzle and the beam of the transmission below it due to the liquid surface tension. Water film. When the substrate passes under the developer nozzle, the water film easily covers the substrate. When the air between the substrate and the water film is not smoothly removed, it is easy to form a developing liquid bubble on the substrate, and finally the bubble photoresist development is uneven, and a large photoresist residual defect is formed.
  • the technical problem to be solved by the present invention is to provide a developing machine and a transmission thereof, which reduce the contact area between the developer liquid nozzle and the transmission unit below it, and reduce the probability of formation of water film to improve the problem of uneven development.
  • inventions of the present invention provide a transmission for a developing machine
  • the device comprises: a plurality of transmission units, wherein the bearing points of the plurality of transmission units are disposed on the same plane to form a bearing surface for driving the substrate;
  • the transmission unit comprises: a supporting rotating shaft and a roller connected to the supporting rotating shaft, the supporting rotating shaft has a center Rotate the axis.
  • any one of the transmission units drives the roller on it separately.
  • the plurality of transmission units are arranged in a plurality of columns, and the central rotation axes of the plurality of transmission units on any one of the columns are arranged on the same straight line.
  • the plurality of transmission units are arranged in a plurality of columns and the columns are arranged equidistantly between the columns.
  • a plurality of transmission units on any one of the columns are evenly arranged.
  • At least one of the plurality of transmission units arranged in a plurality of columns is disposed directly below the developer nozzle.
  • the distance between the developer nozzle and the central axis of rotation of the transmission unit directly below it is 0.3 mm.
  • the section supporting the rotating shaft has an n-shape.
  • the present invention also discloses a transmission device for a developing machine, comprising: a plurality of transmission units, wherein the bearing points of the plurality of transmission units are disposed on the same plane to form a substrate for transmission a bearing surface;
  • the transmission unit includes: a supporting rotating shaft and a roller connected to the supporting rotating shaft, the supporting rotating shaft has a central rotating axis; any one of the plurality of transmission units separately drives the roller thereon
  • the plurality of transmission units are arranged in a plurality of rows, and the central rotation axes of the plurality of transmission units on any one of the columns are disposed on the same straight line.
  • the plurality of transmission units are arranged in a plurality of columns and the columns are arranged equidistantly between the columns.
  • the plurality of transmission units are arranged in at least one of a plurality of columns disposed directly below the developer nozzle.
  • the distance between the developer nozzle and the central axis of rotation of the transmission unit directly below it is 0.3 mm.
  • the support shaft has a cross section of an n-shape.
  • the present invention also discloses a developing machine having the above-described transmission device for a developing machine.
  • the developing machine and the transmission device provided by the invention have the following beneficial effects, and are used for display
  • the transmission device of the camera comprises: a plurality of transmission units, wherein the bearing points of the plurality of transmission units are disposed on the same plane to form a bearing surface for driving the substrate;
  • the transmission unit comprises: a supporting rotating shaft and a roller connected to the supporting rotating shaft, and supporting The shaft has a central axis of rotation.
  • any of the transmission units independently drives the rollers thereon, so that no additional transmission members are required between the transmission unit and the transmission unit, thereby reducing the contact area between the developer liquid nozzle and the independently driven transmission unit, and reducing water film formation. Probability to improve the problem of uneven development.
  • Figure 1 is a schematic view showing the structure of a transmission unit for a transmission of a developing machine according to an embodiment of the present invention.
  • Fig. 2 is a cross-sectional structural view showing a transmission device for a developing machine in accordance with an embodiment of the present invention.
  • FIG. 1-2 there is shown a first embodiment of a transmission for a developing machine of the present invention.
  • the transmission device for the developing machine in this embodiment includes: a plurality of transmission units 1 , and the bearing points 12 a of the plurality of transmission units are disposed on the same plane to form a bearing surface for driving the substrate, wherein the plurality of transmission units 1 row is arranged in multiple columns.
  • the transmission comprises a plurality of columns, each column being composed of a plurality of uniformly arranged transmission units 1.
  • the number of columns provided by the transmission device and the number of the transmission units 1 disposed in each column are not limited, and the distance between the adjacent transmission unit 1 and the transmission unit 1 in each column may be set to be equidistant. Set to not equidistant.
  • the uniform arrangement of the plurality of transmission units 1 facilitates the transmission to provide a uniform bearing capacity.
  • the transmission device comprises a plurality of columns arranged equidistantly, and each of the columns is uniformly arranged with five transmission units 1 as shown in FIG. 2, wherein each of the transmission units 1 is independently driven. In a dynamic manner, the transmission between the transmission unit and the transmission unit can be omitted.
  • the transmission unit 1 includes a support shaft 11 and a roller 12 connected to the support shaft 11.
  • the support shaft 11 has a central rotation axis 11a, and the top end of the roller 12 is a bearing point 12a of the transmission unit 1.
  • Such a structural arrangement enables a control mode in which each of the transmission units 1 can individually drive the rollers 11 on the transmission unit 1. .
  • the support shaft 11 has an n-shaped cross section, so that the volume is reduced, and the contact area between the developer nozzle and the independently driven transmission unit is reduced.
  • At least one of the plurality of transmission units 1 arranged in a plurality of rows is disposed directly below the developer nozzle N.
  • the distance between the developing solution nozzle N and the central rotational axis 11a of the transmission unit 1 directly below it is 0.3 mm.
  • the central rotational axes 11a of the plurality of transmission units arranged in the same row are disposed on the same straight line, but there is no contact between the transmission unit 1 and the transmission unit 1. In this way, it is ensured that the bearing points 12a of the plurality of transmission units 1 are on the same plane to form a bearing surface for driving the substrate.
  • the position of the central rotation axis 11a can be controlled by controlling the height of the support shaft 11 to realize multiple positions.
  • the bearing points 12a of the transmission unit 1 are on the same plane, so that the structural arrangement of the transmission can be made more flexible.
  • each of the transmission units 1 to be individually driven by the rollers is that no additional need is required between the transmission unit 1 and the transmission unit 1 in each column of the transmission without affecting the transmission effect of the transmission on the substrate.
  • the transmission member reduces the contact area between the developer nozzle and the independently driven transmission unit, and reduces the probability of formation of water film to improve the problem of uneven development.
  • the present invention also discloses a developing machine including the above-described transmission device for a developing machine, and the embodiment of the developing machine is the same as the above-described embodiment of the transmission device for the developing machine, and will not be described again.
  • the transmission device for the developing machine comprises: a plurality of transmission units, wherein the bearing points of the plurality of transmission units are disposed on the same plane to form a substrate for transmission
  • the bearing surface comprises: a supporting rotating shaft and a roller connected to the supporting rotating shaft, wherein the supporting rotating shaft has a central rotating axis.
  • any of the transmission units independently drives the rollers thereon, so that no additional transmission members are required between the transmission unit and the transmission unit, thereby The contact area between the developer nozzle and the independently driven transmission unit is reduced, and the probability of formation of a water film is reduced to improve the problem of uneven development.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Gear Transmission (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

本发明公开了一种用于显影机的传动装置，包括：多个传动单元，多个传动单元的承载点设在同一平面上以形成用以传动基板的承载面；传动单元包括：支撑转轴和连接在支撑转轴上的滚轮，支撑转轴具有中心转动轴线。本发明还公开了一种显影机。实施本发明的显影机及其传动装置，减小显影液喷嘴与其下方的传动单元之间的接触面积，降低水膜形成的概率以改善显影不均的问题。

Description

一种显影机及其传动装置
本申请要求于2017年10月25日提交中国专利局、申请号为201711009366.5、发明名称为“一种显影机及其传动装置”的中国专利申请的优先权，上述专利的全部内容通过引用结合在本申请中。
技术领域
本发明涉及显示面板制造领域，尤其涉及一种显影机及其传动装置。
背景技术
TFT曝光工艺的生产过程中，玻璃基板完成清洗，涂布上光阻后，经过减压干燥和软烤，再进入曝光机，利用MASK在玻璃基板上对光阻定义图形；然后再经过显影制程显示图形，最后经过硬烤，对光阻进行定型后产出玻璃基板。
现有技术中：光阻涂布曝光完成后会进行显影制程，被曝光过的光阻会被显影掉，未被曝光的光阻留在基板上，形成工艺需要的图案。TFT显影的方式，显影液喷嘴固定在机台上方吐出显影液，基板经传动装置的传送从显影液喷嘴下方流过，此时显影液喷嘴吐出的显影液全部涂覆在基板上，基板上的光阻经显影液浸泡后达到显影的目的。
现有显影机的传动装置因结构设计不合理，存在如下缺陷：显影液喷嘴吐出显影液时，由于液面张力的作用，显影液容易在显影液喷嘴和其下方的传动装置的横梁之间形成水膜。当基板从显影液喷嘴下经过时，水膜很容易覆盖到基板上。当基板与水膜间的空气排除不顺畅时，就容易在基板上形成显影液气泡，最终导致气泡光阻显影不均匀，形成大颗光阻残留缺陷。
发明内容
本发明所要解决的技术问题在于，提供一种显影机及其传动装置，减小显影液喷嘴与其下方的传动单元之间的接触面积，降低水膜形成的概率以改善显影不均的问题。
为了解决上述技术问题，本发明的实施例提供了一种用于显影机的传动 装置，包括：多个传动单元，多个传动单元的承载点设在同一平面上以形成用以传动基板的承载面；传动单元包括：支撑转轴和连接在支撑转轴上的滚轮，支撑转轴具有中心转动轴线。
其中，任一个传动单元对其上的滚轮进行单独驱动。
其中，多个传动单元排布成多列，任一列上的多个传动单元的中心转动轴线设置在同一直线上。
其中，多个传动单元排布成多列的列与列之间等距布置。
其中，任一列上的多个传动单元均匀排布。
其中，多个传动单元排布成多列中的至少一列设置在显影液喷嘴的正下方。
其中，显影液喷嘴与其正下方的传动单元的中心转动轴线的距离为0.3mm。
其中，支撑转轴的断面呈n字形。
为解决上述技术问题，本发明还公开了一种用于显影机的传动装置，其中，包括：多个传动单元，所述多个传动单元的承载点设在同一平面上以形成用以传动基板的承载面；所述传动单元包括：支撑转轴和连接在所述支撑转轴上的滚轮，所述支撑转轴具有中心转动轴线；任一所述多个传动单元对其上的所述滚轮进行单独驱动，所述多个传动单元排布成多列，任一列上的所述多个传动单元的中心转动轴线设置在同一直线上。
其中，所述多个传动单元排布成多列的列与列之间等距布置。
其中，任一列上的所述多个传动单元均匀排布。
其中，所述多个传动单元排布成多列中的至少一列设置在显影液喷嘴的正下方。
其中，显影液喷嘴与其正下方的传动单元的中心转动轴线的距离为0.3mm。
其中，所述支撑转轴的断面呈n字形。
为解决上述技术问题，本发明还公开了一种具有上述用于显影机的传动装置的显影机。
实施本发明所提供的显影机及其传动装置，具有如下有益效果，用于显 影机的传动装置包括：多个传动单元，多个传动单元的承载点设在同一平面上以形成用以传动基板的承载面；传动单元包括：支撑转轴和连接在支撑转轴上的滚轮，支撑转轴具有中心转动轴线。其中，任一传动单元对其上的滚轮进行单独驱动，使得传动单元与传动单元之间无需额外的传动构件，从而减少显影液喷嘴与独立驱动的传动单元之间的接触面积，降低水膜形成的概率以改善显影不均的问题。
附图说明
为了更清楚地说明本发明实施例或现有技术中的技术方案，下面将对实施例或现有技术描述中所需要使用的附图作简单地介绍，显而易见地，下面描述中的附图仅仅是本发明的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他的附图。
图1是本发明实施例用于显影机的传动装置的传动单元的结构示意图。
图2是本发明实施例用于显影机的传动装置的断面结构示意图。
具体实施方式
下面将结合本发明实施例中的附图，对本发明实施例中的技术方案进行清楚、完整地描述，显然，所描述的实施例仅仅是本发明一部分实施例，而不是全部的实施例。基于本发明中的实施例，本领域普通技术人员在没有作出创造性劳动前提下所获得的所有其他实施例，都属于本发明保护的范围。
结合参见图1-图2所示，为本发明用于显影机的传动装置的实施例一。
本实施例中的用于显影机的传动装置，包括：多个传动单元1，多个传动单元的承载点12a设在同一平面上以形成用以传动基板的承载面，其中，多个传动单元1排布成多列。
具体实施时，传动装置包含有若干列，每一列均由多个均匀排布的传动单元1组成。其它实施方式中，传动装置设置的列数以及每一列中设置传动单元1的个数并不限定，每一列中相邻的传动单元1与传动单元1之间的距离可以设置为等距也可以设为不等距。当然，多个传动单元1均匀排布利于传动装置能够提供均匀的承载力。
本实施例中，传动装置包含的多个列之间等距布置，每一列上等均均匀布置如图2所示的5个传动单元1，其中，每一个传动单元1均采用独立驱 动的方式，如此能够省去传动单元与传动单元之间的传动件。
进一步的，传动单元1包括：支撑转轴11和连接在支撑转轴11上的滚轮12，支撑转轴11具有中心转动轴线11a，滚轮12的顶端为传动单元1的承载点12a。如此的结构设置能够实现每一个传动单元1都能够对传动单元1上的滚轮11进行单独驱动的控制方式。.
优选的，支撑转轴11的断面呈n字形，如此减小体积，减少显影液喷嘴与独立驱动的传动单元之间的接触面积。
进一步的，多个传动单元1排布成多列中的至少一列设置在显影液喷嘴N的正下方。本实施例中，显影液喷嘴N与其正下方的传动单元1的中心转动轴线11a的距离为0.3mm。
本实施例中，排布为同一列上的多个传动单元的中心转动轴线11a设置在同一直线上，但传动单元1与传动单元1之间并无接触。如此以保证多个传动单元1的承载点12a在同一平面上以形成用以传动基板的承载面。当然，其它实施方式中，当同一列上的传动单元1之间的多个滚轮12的直径大小不同时，可以通过控制支撑转轴11的高度控制中心转动轴线11a所处的位置，进而实现多个传动单元1的承载点12a在同一平面上，如此，可使传动装置的结构设置更为灵活。
每一个传动单元1均能够对其上的滚轮进行单独驱动的作用是：在不影响传动装置对基板传动效果的基础上，使得传动装置每一列中传动单元1与传动单元1之间无需额外的传动构件，从而减少显影液喷嘴与独立驱动的传动单元之间的接触面积，降低水膜形成的概率以改善显影不均的问题。
进一步的，本发明还公开了一种包含上述用于显影机的传动装置的显影机，该显影机的实施方式与上述用于显影机的传动装置的实施方式相同，不再赘述。
实施本发明所提供的显影机及其传动装置，具有如下有益效果，用于显影机的传动装置包括：多个传动单元，多个传动单元的承载点设在同一平面上以形成用以传动基板的承载面；传动单元包括：支撑转轴和连接在支撑转轴上的滚轮，支撑转轴具有中心转动轴线。其中，任一传动单元对其上的滚轮进行单独驱动，使得传动单元与传动单元之间无需额外的传动构件，从而 减少显影液喷嘴与独立驱动的传动单元之间的接触面积，降低水膜形成的概率以改善显影不均的问题。

Claims (16)

  1. 一种用于显影机的传动装置，其中，包括：
    多个传动单元，所述多个传动单元的承载点设在同一平面上以形成用以传动基板的承载面；
    所述传动单元包括：支撑转轴和连接在所述支撑转轴上的滚轮，所述支撑转轴具有中心转动轴线。
  2. 如权利要求1所述的用于显影机的传动装置，其中，任一所述多个传动单元对其上的所述滚轮进行单独驱动。
  3. 如权利要求1所述的用于显影机的传动装置，其中，所述多个传动单元排布成多列，任一列上的所述多个传动单元的中心转动轴线设置在同一直线上。
  4. 如权利要求2所述的用于显影机的传动装置，其中，所述多个传动单元排布成多列，任一列上的所述多个传动单元的中心转动轴线设置在同一直线上。
  5. 如权利要求3所述的用于显影机的传动装置，其中，所述多个传动单元排布成多列的列与列之间等距布置。
  6. 如权利要求3所述的用于显影机的传动装置，其中，任一列上的所述多个传动单元均匀排布。
  7. 如权利要求3所述的用于显影机的传动装置，其中，所述多个传动单元排布成多列中的至少一列设置在显影液喷嘴的正下方。
  8. 如权利要求7所述的用于显影机的传动装置，其中，显影液喷嘴与其正下方的传动单元的中心转动轴线的距离为0.3mm。
  9. 如权利要求1所述的用于显影机的传动装置，其中，所述支撑转轴的断面呈n字形。
  10. 一种用于显影机的传动装置，其中，包括：多个传动单元，所述多个传动单元的承载点设在同一平面上以形成用以传动基板的承载面；
    所述传动单元包括：支撑转轴和连接在所述支撑转轴上的滚轮，所述支撑转轴具有中心转动轴线；
    任一所述多个传动单元对其上的所述滚轮进行单独驱动，所述多个传动 单元排布成多列，任一列上的所述多个传动单元的中心转动轴线设置在同一直线上。
  11. 如权利要求10所述的用于显影机的传动装置，其中，所述多个传动单元排布成多列的列与列之间等距布置。
  12. 如权利要求10所述的用于显影机的传动装置，其中，任一列上的所述多个传动单元均匀排布。
  13. 如权利要求10所述的用于显影机的传动装置，其中，所述多个传动单元排布成多列中的至少一列设置在显影液喷嘴的正下方。
  14. 如权利要求13所述的用于显影机的传动装置，其中，显影液喷嘴与其正下方的传动单元的中心转动轴线的距离为0.3mm。
  15. 如权利要求10所述的用于显影机的传动装置，其中，所述支撑转轴的断面呈n字形。
  16. 一种显影机，其中，所述显影机包括如权利要求10所述的用于显影机的传动装置。
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Families Citing this family (1)

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Publication number Priority date Publication date Assignee Title
CN108732875A (zh) * 2018-05-25 2018-11-02 深圳市华星光电技术有限公司 传送装置及显影机

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN2680627Y (zh) * 2003-02-10 2005-02-23 扬博科技股份有限公司 硬质电路板输送装置
US7792467B2 (en) * 2007-09-14 2010-09-07 Eastman Kodak Company Dual channel apparatus for transporting powder in an electrostatographic printer
CN102023497A (zh) * 2009-09-16 2011-04-20 上海广电电子股份有限公司 一种有机电致发光显示面板显影设备及其方法
CN202794852U (zh) * 2012-09-27 2013-03-13 京东方科技集团股份有限公司 显影机传动装置及显影机

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1455977A (en) * 1920-01-06 1923-05-22 Jere L Wentz Conveyer
US3586142A (en) * 1969-05-01 1971-06-22 Rapistan Inc Rail for racks and the like
US4681203A (en) * 1985-11-22 1987-07-21 Omniquest, Inc. Multi-track gravity conveyor
US5242047A (en) * 1992-01-10 1993-09-07 United Parcel Of America Inc. Easy maintenance high speed endless belt conveyor
US5232501A (en) * 1992-02-21 1993-08-03 Advanced Systems Incorporated Apparatus for processing printed circuit board substrates
US5288323A (en) * 1993-02-19 1994-02-22 Pender Don S Apparatus with a shunt system for processing printed circuit board substrates
JP3275202B2 (ja) * 1996-08-30 2002-04-15 東京エレクトロン株式会社 薄膜形成装置
US5762177A (en) * 1997-01-14 1998-06-09 International Business Machines Corporation Method and apparatus to convey flat products of different widths
US6007627A (en) * 1997-11-13 1999-12-28 The Proceter & Gamble Company Method and apparatus for processing a discontinuous coating on a substrate
US6073743A (en) * 1999-02-02 2000-06-13 Frazier Industrial Company Case flow system
JP2001171816A (ja) * 1999-12-17 2001-06-26 Hirata Corp ローラ式コンベア
TWI245578B (en) * 2001-12-31 2005-12-11 Ritdisplay Corp Developing apparatus and method for developing organic electroluminescent display panels
KR100862987B1 (ko) * 2008-01-28 2008-10-13 주식회사 디엠에스 기판 반송장치
EP2143668A1 (de) * 2008-07-09 2010-01-13 Interrroll Holding AG Rollenbahn mit Profilschiene
KR101494924B1 (ko) * 2009-10-16 2015-02-23 도쿄엘렉트론가부시키가이샤 감압건조장치 및 감압건조방법
CN106773559A (zh) * 2017-01-05 2017-05-31 京东方科技集团股份有限公司 一种传输装置、显影系统及显影方法
KR102435194B1 (ko) * 2017-11-17 2022-08-24 삼성디스플레이 주식회사 기판 처리 장치 및 기판 처리 방법

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN2680627Y (zh) * 2003-02-10 2005-02-23 扬博科技股份有限公司 硬质电路板输送装置
US7792467B2 (en) * 2007-09-14 2010-09-07 Eastman Kodak Company Dual channel apparatus for transporting powder in an electrostatographic printer
CN102023497A (zh) * 2009-09-16 2011-04-20 上海广电电子股份有限公司 一种有机电致发光显示面板显影设备及其方法
CN202794852U (zh) * 2012-09-27 2013-03-13 京东方科技集团股份有限公司 显影机传动装置及显影机

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