WO2019035220A1 - 被覆切削工具 - Google Patents
被覆切削工具 Download PDFInfo
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- WO2019035220A1 WO2019035220A1 PCT/JP2017/043030 JP2017043030W WO2019035220A1 WO 2019035220 A1 WO2019035220 A1 WO 2019035220A1 JP 2017043030 W JP2017043030 W JP 2017043030W WO 2019035220 A1 WO2019035220 A1 WO 2019035220A1
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B27/00—Tools for turning or boring machines; Tools of a similar kind in general; Accessories therefor
- B23B27/14—Cutting tools of which the bits or tips or cutting inserts are of special material
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
- C23C30/005—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process on hard metal substrates
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23C—MILLING
- B23C5/00—Milling-cutters
- B23C5/16—Milling-cutters characterised by physical features other than shape
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23D—PLANING; SLOTTING; SHEARING; BROACHING; SAWING; FILING; SCRAPING; LIKE OPERATIONS FOR WORKING METAL BY REMOVING MATERIAL, NOT OTHERWISE PROVIDED FOR
- B23D43/00—Broaching tools
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23D—PLANING; SLOTTING; SHEARING; BROACHING; SAWING; FILING; SCRAPING; LIKE OPERATIONS FOR WORKING METAL BY REMOVING MATERIAL, NOT OTHERWISE PROVIDED FOR
- B23D77/00—Reaming tools
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23F—MAKING GEARS OR TOOTHED RACKS
- B23F21/00—Tools specially adapted for use in machines for manufacturing gear teeth
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3464—Sputtering using more than one target
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3485—Sputtering using pulsed power to the target
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3492—Variation of parameters during sputtering
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B2224/00—Materials of tools or workpieces composed of a compound including a metal
- B23B2224/08—Aluminium nitride
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B2224/00—Materials of tools or workpieces composed of a compound including a metal
- B23B2224/36—Titanium nitride
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B2228/00—Properties of materials of tools or workpieces, materials of tools or workpieces applied in a specific manner
- B23B2228/08—Properties of materials of tools or workpieces, materials of tools or workpieces applied in a specific manner applied by physical vapour deposition [PVD]
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B2228/00—Properties of materials of tools or workpieces, materials of tools or workpieces applied in a specific manner
- B23B2228/24—Hard, i.e. after being hardened
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B51/00—Tools for drilling machines
Definitions
- the present invention relates to a coated cutting tool having a hard coating on the surface of a substrate.
- Priority is claimed on Japanese Patent Application No. 2017-156734, filed Aug. 15, 2017, the content of which is incorporated herein by reference.
- a nitride film of Al and Ti (hereinafter referred to as AlTiN) is a film type excellent in wear resistance and heat resistance, and is widely applied to coated cutting tools.
- AlTiN AlTiN of hexagonal close-packed structure
- Patent Document 1 discloses AlTiN in which the content ratio of Al is changed, and it is shown that AlTiN having a large content ratio of Al and having a hcp structure reduces the film hardness and the tool performance. ing.
- Patent Document 2 discloses a coated cutting tool in which a hard coating containing Cr and containing a CrTiN base on AlTiN having a wurtzite crystal structure (hcp structure) is provided on an upper layer of a laminated film of nitride.
- the arc ion plating method is applied also in physical vapor deposition.
- Physical vapor deposition is mainly applied to coated cutting tools that perform milling, in order to impart a residual compressive stress to the hard coating to enhance fracture resistance.
- the arc ion plating method is widely used because a hard coating having a high ionization rate of the target and excellent adhesion to the substrate can be obtained.
- the hard coating inevitably contains a large number of droplets of several micrometers because the target component is evaporated by arc discharge and coated.
- JP-A-8-209333 International Publication Number WO2014 / 002948 JP, 2011-189419, A JP, 2013-202700, A
- the present invention aims to provide a coated cutting tool having enhanced durability and enhanced durability of Al and Ti-based nitrides containing AlN of hcp structure.
- a coated cutting tool having a hard coating on the surface of the tool, the tool comprising:
- the hard film is a nitride and contains aluminum (Al) at 70 atomic% to 80 atomic% with respect to the total amount of metal (including metalloid) elements, and 20 atomic% of titanium (Ti) More than 30 at% or less, containing 0.50 at% or less of argon (Ar) based on the total amount of metal elements (including semimetals) and non-metal elements
- the hard film has a face-centered cubic lattice structure of TiN (111), TiN (200), TiN (220), hexagonal close-packed AlN (100), AlN (002) in X-ray diffraction.
- the peak intensity attributable to the TiN (200) face of the face-centered cubic lattice structure shows the maximum intensity, and then the peak intensity attributable to the TiN (111) face of the face-centered cubic structure is large.
- the hard coating is preferably provided on the outermost layer of the tool in contact with the workpiece.
- the content of nitrogen in the hard coating is preferably 51 atomic% or more, when the ratio of content of metal (including metalloid) element, nitrogen, oxygen, carbon, and argon is 100 atomic%.
- FIG. 1 It is a cross-sectional observation photograph by the electron microscope of the present Example 1.
- FIG. It is the X-ray-diffraction result of the present Example 1.
- FIG. 1 It is a cross-sectional observation photograph by the electron microscope of the present Example 1.
- the inventors of the present invention have controlled the film structure and crystal structure of Al nitride and Ti nitride containing AlN having a large Al content ratio and a hexagonal close-packed structure (hcp structure), and the defects contained in the film interior It was found that the durability of coated cutting tools tends to be improved by reducing the Hereinafter, the details of the embodiment of the present invention will be described.
- the cutting tool of the present embodiment is a coated cutting tool having a hard film containing nitride of Al and Ti on the surface of the tool.
- the coated cutting tool of the present embodiment can be used in the form of a ball end mill, square end mill, radius end mill, multi-edge end mill, insert, drill, cutter, broach, reamer, hob, router and the like.
- the coated cutting tool of the present embodiment can be used, for example, for cutting high hardness steel, stainless steel, heat resistant steel, cast steel, carbon steel. Although the details will be described in the later examples, the coated cutting tool of the present embodiment exhibits particularly excellent durability in cutting of stainless steel.
- the hard film according to the present embodiment is a nitride, and contains aluminum (Al) at 70 atomic% to 80 atomic% with respect to the total amount of metal (including metalloid) elements, and titanium (Ti (titanium) And 20 atomic percent or more and 30 atomic percent or less.
- Nitride mainly composed of Al and Ti is a film type excellent in the balance between wear resistance and heat resistance, and also excellent in adhesion to the substrate, and in particular, the heat resistance of the hard film by increasing the content ratio of Al. Improve more. Further, by increasing the content ratio of Al, the oxidation protective film is easily formed on the surface of the tool, and the structure of the film becomes fine, so that the wear of the hard film due to welding is easily suppressed.
- the hard film according to the present embodiment is a metal (including a metalloid.
- the content ratio of Al is 70. At least atomic percent.
- the content ratio of Al is set to 80 atomic% or less, when the entire metal element is 100 atomic%.
- the content ratio of Ti is set to 20 atomic% or more, when the entire metal element is 100 atomic%. Thereby, excellent abrasion resistance can be imparted to the hard coating.
- the content ratio of Ti contained in the hard film becomes too large, it is difficult to obtain the effect by increasing the above-mentioned content ratio of Al. Therefore, in the hard film according to the present embodiment, the content ratio of Ti is set to 30 atomic% or less, when the entire metal element is 100 atomic%.
- the hard coating according to the present embodiment has a total content ratio of Al and Ti of 90 atomic% or more, where the entire metal element is 100 atomic%. Is preferred.
- the hard film according to the present embodiment may be a nitride of Al and Ti.
- the content ratio of the metal element of the hard film according to the present embodiment can be measured using an electron probe microanalyzer (EPMA) for the mirror-processed hard film. In this case, for example, after mirror-finishing of the hard coating surface, it can be obtained from an average of five analysis points having a diameter of about 1 ⁇ m.
- EPMA electron probe microanalyzer
- the hard coating according to the present embodiment has a large Al content, and has diffraction peaks of a face-centered cubic lattice structure (fcc structure) and a hexagonal close-packed structure (hcp structure) in X-ray diffraction. Specifically, it has diffraction peaks derived from TiN (111) plane, TiN (200) plane, TiN (220) plane, AlN (100) plane of hcp structure, and AlN (002) plane of fcc structure.
- fcc structure face-centered cubic lattice structure
- hcp structure hexagonal close-packed structure
- the diffraction peak attributable to the TiN (200) plane of the fcc structure shows the maximum intensity, and then the diffraction peak attributable to the TiN (111) plane of the fcc structure is large. That is, the hard film according to the present embodiment has a crystal structure mainly based on the fcc structure, and partially contains AlN having the hcp structure.
- a hard film having no hcp structure diffraction peaks other than the hcp structure AlN (100) surface and the AlN (002) surface is used.
- the sum of the peak intensities of diffraction peaks attributed to the AlN (100) surface of the hcp structure and the AlN (002) surface is Ih, the TiN (111) surface of the fcc structure, TiN (200) Assuming that the sum of peak intensities of diffraction peaks attributed to the surface and the TiN (220) surface is If, it is preferable that Ih / If be 0.8 or less. Ih / If may be 0.3 or more. Furthermore, Ih / If may be 0.5 or more.
- the average crystal grain size of the hard film is 3 nm or more and 50 nm or less.
- the average grain size of the hard coating is 3 nm or more.
- the average grain size of the hard coating is more preferably 5 nm or more.
- the microstructure of the hard coating becomes too coarse, the toughness is lowered, and the damage unit of the hard coating is increased, so that the damage to the tool is increased.
- the average grain size of the hard coating is set to 50 nm or less. More preferably, the average grain size of the hard film is 40 nm or less. More preferably, the average grain size of the hard film is 30 nm or less.
- the average crystal grain size of the hard film according to the present embodiment is measured from the half value width of the diffraction peak attributed to the TiN (200) plane of the fcc structure exhibiting the maximum strength by X-ray diffraction.
- the number of droplets having a circle equivalent diameter of 1 ⁇ m or more is 5 or less per 100 ⁇ m 2 in cross-sectional observation.
- the film structure is refined to further increase the toughness of the hard film, and physical defects included in the hard film are reduced.
- droplets can be a major physical defect.
- coarse droplets having a circle equivalent diameter of 1 ⁇ m or more can be a starting point of breakage in the hard coating, so the toughness of the hard coating can be enhanced by reducing the frequency of occurrence.
- droplets having an equivalent circle diameter of 1 ⁇ m or more are 5 per 100 ⁇ m 2. Less than or equal to More preferably, it is 3 or less per 100 ⁇ m 2 . More preferably, it is 1 or less per 100 ⁇ m 2 . Furthermore, it is preferable not to contain droplets having an equivalent circle diameter of 5 ⁇ m or more. Further, it is preferable that the number of droplets having a circle equivalent diameter of 1 ⁇ m or more is 5 or less per 100 ⁇ m 2 also on the surface of the hard film. More preferably, the number of droplets on the surface of the hard coating is 3 or less per 100 ⁇ m 2 . More preferably, the number of droplets on the surface of the hard coating is 1 or less per 100 ⁇ m 2 .
- the hard film is mirror-processed and then processed by a focused ion beam method, and the surface mirror-processed by a transmission electron microscope is 5,000 to 10,000 Observe multiple views in magnification. Further, the number of droplets on the surface of the hard coating can be determined by observing the surface of the hard coating using a scanning electron microscope (SEM) or the like.
- SEM scanning electron microscope
- the hard film according to the present embodiment contains argon (Ar) at 0.50 atomic% or less based on the total amount of the metal element and the nonmetal element.
- the frequency of occurrence of droplets that cause defects in hard films can be reduced by applying a sputtering method.
- the sputtering method since the target component is sputtered using argon ions, the hard film coated by the sputtering method contains a small amount of argon.
- argon tends to be concentrated at grain boundaries, and when the crystal grain size becomes fine, the content ratio of argon tends to increase.
- the content ratio of argon increases, the bonding strength between particles decreases at grain boundaries.
- the hard film according to the present embodiment in the nitride mainly composed of Al and Ti containing AlN of hcp structure, the argon contained in excessive amount may become a defect, so the content ratio thereof should be made constant or less Is valid.
- the hard film according to the present embodiment contains argon at 0.50 atomic% or less based on the total amount of the metal element and the nonmetal element. More preferably, the hard film of the present embodiment contains argon at 0.40 atomic% or less.
- the sputtering method if the content ratio of argon contained in the hard coating is made as close to 0 atomic% as possible, the flow rate of argon becomes too small and sputtering is not stable. In addition, even if the content ratio of argon approaches 0 atomic%, the basic properties as a hard film applied to a cutting tool, such as toughness, heat resistance, and wear resistance, may be impaired.
- the lower limit of the content ratio of argon in the hard coating according to the present embodiment is not particularly limited, but in order to stabilize the sputtering method and secure basic film characteristics as a hard coating applied to a cutting tool, argon is used. It is preferable to contain by 0.10 atomic% or more. More preferably, argon is contained in the hard coating at 0.15 atomic% or more.
- the content ratio of argon in the hard film according to the present embodiment can be measured using an electron probe microanalyzer (EPMA) for the mirror-processed hard film, as in the measurement of the content ratio of the metal element described above. . Similar to the measurement of the content ratio of the metal element described above, after mirror-finishing, an analysis range of about 1 ⁇ m in diameter can be obtained from an average of five points analyzed.
- EPMA electron probe microanalyzer
- an analysis range of about 1 ⁇ m in diameter can be obtained from an average of five points analyzed.
- a trace amount of argon, oxygen and carbon may be contained as the nonmetal element in addition to nitrogen.
- the content ratio of argon in the hard coating can be determined as the content ratio of metal (including metalloid) elements to nitrogen, oxygen, carbon, and argon as 100 atomic percent.
- the content ratio of metal (including semimetal) element to nitrogen, oxygen, carbon, and argon is 100 atomic%
- the content ratio of nitrogen is 51 atomic% or more. Is preferred.
- the nitride is sufficiently formed on the hard coating, and the durability tends to be excellent.
- the content ratio of nitrogen is preferably 52% or less.
- what is necessary is just to round down and obtain the value after a decimal point in evaluation.
- the hard film according to the present embodiment may contain metal elements other than Al and Ti.
- the hard film according to the present embodiment is an element selected from the group 4a, 5a, 6a elements of the periodic table and Si, B, Y for the purpose of improving wear resistance, heat resistance, etc.
- two or more elements can be contained. These elements are generally contained to improve the film properties of the hard film, and can be added within a range that does not significantly reduce the durability of the coated cutting tool.
- the hard film according to the present embodiment is a nitride, but may contain a slight amount of oxygen and carbon in addition to the above-described argon. These elements form a trace amount of oxides and carbides in the nitride, which can lower the toughness of the hard coating. If the oxygen and carbon which are inevitably contained in the hard coating can be reduced in the film thickness direction, the toughness of the nitride mainly composed of Al and Ti containing AlN of hcp structure can be enhanced. In the hard film according to the present embodiment, oxygen tends to be larger than carbon as an unavoidable impurity.
- the oxygen content ratio in order to minimize the fine oxide contained in the hard film, it is preferable to set the oxygen content ratio to 5.0 atomic% or less in the film thickness direction. More preferably, the content ratio of oxygen is 4.0 atomic% or less. Further, in order to minimize fine carbides contained in the hard film, it is preferable to set the carbon content ratio to 3.0 atomic% or less in the film thickness direction. More preferably, the content ratio of carbon is 1.5 atomic% or less.
- the content ratio of oxygen and carbon in the film thickness direction can be determined using a scanning X-ray photoelectron spectrometer. Then, the contents of oxygen and carbon may be determined with the total content ratio of carbon, nitrogen, oxygen, and metal (including metalloid) elements as 100 atomic%. At the outermost surface of the hard coating, oxygen and carbon, which are unavoidable impurities due to adhesion from the atmosphere, are detected in a large amount, so analysis is performed in the film thickness direction from a position 50 nm deep from the surface of the coating.
- the hard film according to the present embodiment may also contain a rare gas other than argon if sputtering is performed using a mixed gas containing another noble gas in addition to argon.
- an intermediate layer may be separately provided between the base of the tool and the hard coating, if necessary.
- a layer made of metal, nitride, carbonitride or carbide may be provided between the base of the tool and the hard coating.
- a hard film having a different component ratio or a different composition from the hard film according to the present embodiment may be separately formed.
- the hard coating according to the present embodiment and the hard coating having a different composition ratio or different composition from the hard coating according to the present embodiment may be mutually laminated.
- the hard coating according to the present embodiment By providing the hard coating according to the present embodiment on the outermost surface of the tool in contact with the workpiece, a sufficient amount of the oxidation protective coating is formed on the tool surface, and the effect of suppressing welding is sufficiently exerted. preferable.
- the maximum power density of the power pulse is preferably 1.0 kW / cm 2 or more.
- the maximum power density of the power pulse is preferably 3.0 kW / cm 2 or less, and more preferably, the maximum power density of the power pulse is 2.0 kW / cm 2 or less.
- the time during which the power is applied simultaneously to both the alloy target where the application of the power is finished and the alloy target where the application of the power is started is 5 microseconds or more and 20 microseconds or less. It is preferable to enhance basic properties and reduce droplets.
- the composition is WC (bal.) - Co ( 11.5 wt%) - TaC (2.0 wt%) - Cr 3 C 2 ( 0.7 wt%), the hardness 89.5HRA (Rockwell hardness A cutting edge-changing tool (made by Mitsubishi Hitachi Tool Co., Ltd.) made of cemented carbide made of values measured according to JIS G 0202) was prepared.
- Example 1 and Comparative Example 1 a sputtering apparatus capable of carrying six sputter evaporation sources was used. Among these deposition sources, three AlTi-based alloy targets were installed in the apparatus as deposition sources. A target with a size of ⁇ ⁇ 16 cm and a thickness of 12 mm was used. In Example 1 and Comparative Example 1, the composition of the AlTi-based alloy target to be used was changed.
- the tool was secured to the sample holder in the sputtering apparatus and a bias power supply was connected to the tool.
- the bias power supply has a structure in which a negative bias voltage is applied to the tool independently of the target.
- the tool rotates at 2 revolutions per minute and revolves via the fixture and the sample holder. The distance between the tool and the target surface was 100 mm.
- the introduced gas was introduced from a gas supply port provided in the sputtering apparatus using Ar and N 2 .
- the tool was bombarded according to the following procedure. Heating was performed for 30 minutes in a state where the temperature in the furnace reached 430 ° C. by the heater in the sputtering apparatus. Thereafter, the inside of the furnace of the sputtering apparatus was evacuated to a pressure of 5.0 ⁇ 10 ⁇ 3 Pa or less. Then, Ar gas was introduced into the furnace of the sputtering apparatus, and the pressure in the furnace was adjusted to 0.8 Pa. Then, a DC bias voltage of -170 V was applied to the tool, and the tool was cleaned (bombarded) with Ar ions.
- nitrides of Al and Ti were coated on the tool in the following procedure. While keeping the temperature in the furnace at 430 ° C., Ar gas was introduced at 160 sccm into the furnace of the sputtering apparatus, and then N 2 gas was introduced at 120 sccm to set the pressure in the furnace to 0.60 Pa.
- the alloy target is applied with a DC bias voltage of -60 V to the tool, and the discharge time per cycle of the power applied to the Al and Ti containing alloy target is 4.0 milliseconds, and the power is applied. When switching, the power is being applied simultaneously to both the alloy target which ends the application of power and the alloy target which starts the application of power.
- the time is applied for 10 microseconds at the same time to three AlTi based alloy targets.
- Power was applied to coat the surface of the tool with a hard coating of about 3.0 ⁇ m.
- the maximum power density of the power pulses 1.5 kW / cm 2
- the average power density was 0.37 kW / cm 2.
- Comparative Examples 2 to 4 an arc ion plating apparatus was used.
- An AlTi-based alloy target was placed in the apparatus as a deposition source.
- a target with a size of ⁇ ⁇ 16 cm and a thickness of 12 mm was used.
- the composition of the AlTi-based alloy target used was changed.
- cleaning (bombardment processing) of the tool with Ar ions was performed.
- the pressure in the furnace of the arc ion plating apparatus is evacuated to 5.0 ⁇ 10 -3 Pa or less, the temperature in the furnace is set to 500 ° C., and the N 2 gas is made to have a pressure in the furnace of 3.2 Pa. Introduced.
- a DC bias voltage of -120 V was applied to the tool, and a current of 200 A was applied to the AlTi alloy target to coat the surface of the tool with a hard coating of about 3.0 ⁇ m.
- ⁇ Film composition> The film composition of the hard film was measured by using an electron probe microanalyzer (JXA-8500F manufactured by JEOL CO., LTD.), And the film composition of the hard film was measured by the attached wavelength dispersive electron probe microanalysis (WDS-EPMA). Mirror finish of ball end mill for property evaluation, acceleration voltage 10kV, irradiation current 5 ⁇ 10 -8 A, take-in time 10 seconds, measurement range of diameter 5 ⁇ m is measured at 5 points and hard film is average value The content ratio of Ar and the content ratio of Ar in the sum of the metal component and the nonmetal component were determined.
- JXA-8500F manufactured by JEOL CO., LTD.
- WDS-EPMA wavelength dispersive electron probe microanalysis
- EMPYREA X-ray diffractometer
- ⁇ Coating hardness and elastic modulus> The film hardness and elastic modulus of the hard film were analyzed using a nanoindentation tester (ENT-2100 manufactured by Elionix Co., Ltd.). In the analysis, after mirror-polishing a cross section of the film in which the test piece is inclined 5 degrees with respect to the outermost surface of the film, a region where the maximum indentation depth is less than about 1/10 of the film thickness in the polished surface of the film was selected. Ten points were measured under measurement conditions of a pressing load of 49 mN / sec, and the average value of six points excluding two points on the large value side and two points on the small value side was removed.
- Example 1 has a smaller maximum wear width and shows excellent durability as compared with Comparative Example 2 coated by the arc ion plating method.
- the X-ray-diffraction measurement result of the present Example 1 is shown in FIG. It is confirmed that Example 1 has peak intensities on the AlN (100) plane and the AlN (002) plane of the hcp structure.
- Comparative Example 2 is a conventional nitride of Al and Ti having an fcc structure, but in Example 1, the maximum wear width was suppressed to 100 ⁇ m or more as compared with Comparative Example 2.
- Example 1 since there are few defects such as droplets and argon contained in the hard coating, the durability is high even if the hard coating partially has the hcp structure, and the Al content ratio is It is estimated that a large effect has been achieved.
- Comparative Examples 3 and 4 were coated by the arc ion plating method, since they had the peak intensity of the hcp structure, film peeling occurred early.
- the cross-sectional observation photograph of the present Example 1 is shown in FIG. It is confirmed that the hard film according to the present invention is extremely smooth.
- the number of droplets having an equivalent circle diameter of 1.0 ⁇ m or more was 1 or less per 100 ⁇ m 2 in the cross-sectional observation. Moreover, the droplet whose circle equivalent diameter is 5.0 micrometers or more was not confirmed.
- the droplet whose circle equivalent diameter is 5.0 micrometers or more was also confirmed.
- Comparative Example 1 has few defects such as droplets and argon as in the invention example, but the toughness of the hard coating is lowered because the (101) plane of the hcp structure shows the maximum strength, and the peeling is caused early. It is presumed that it occurred.
- Micro analysis was performed on the hard film according to the first embodiment.
- oxygen is 1.5 to 3.0 atomic% in the film thickness direction in the range of 50 nm or more from the outermost surface in analysis using a scanning X-ray photoelectron spectrometer. It was confirmed that carbon was 1.0 atomic% or less and contained a slight amount of oxygen and carbon.
- the structure was observed with a transmission electron microscope, it was confirmed that within a range of 50 nm ⁇ 50 nm, there were not more than 1 voids having a major axis of 10 nm or more, and the microstructure was fine at the micro level.
- Example 2 it evaluated using a 4-flute carbide square end mill.
- Three types of Example 20, Example 21 and Comparative Example 20 were used for evaluation.
- the hard film was coated by the same film forming method as in Example 1 and Comparative Example 2 in Example 1.
- Example 21 is carried out except that Ar gas is introduced at 160 sccm into the furnace of the sputtering apparatus and then N 2 gas is introduced at 160 sccm to make the pressure in the furnace 0.68 Pa in the coating of the hard film.
- the hard film was coated under the same conditions as in Example 1.
- the cutting conditions are as follows.
- Example 21 in which the gas flow rate of nitrogen at the time of film formation was increased, the content ratio of nitrogen was 51% when the content ratio of the metal element and nitrogen, oxygen, carbon, and argon was 100 atomic%, The nitrogen content ratio was higher than the sample. It is estimated that the present Example 21 has a high content ratio of nitrogen, and the maximum wear width is further suppressed because the nitride is sufficiently formed in the microstructure.
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Abstract
Description
本願は、2017年8月15日に、日本に出願された特願2017-156734号に基づき優先権を主張し、その内容をここに援用する。
近年では、特許文献3、4にあるようなターゲットに印加する電力を瞬間的に高くした高出力スパッタリング法が適用され始めている。
前記硬質皮膜は窒化物であり、金属(半金属を含む)元素の総量に対して、アルミニウム(Al)を70原子%以上80原子%以下で含有しており、チタン(Ti)を20原子%以上30原子%以下で含有しており、金属元素(半金属を含む)と非金属元素の総量に対して、アルゴン(Ar)を0.50原子%以下で含有しており、
前記硬質皮膜はX線回折において、面心立方格子構造のTiN(111)面、TiN(200)面、TiN(220)面、六方最密充填構造のAlN(100)面、AlN(002)面にピーク強度を有し、かつ、面心立方格子構造のTiN(200)面に起因するピーク強度が最大強度を示し、次いで、面心立方構造のTiN(111)面に起因するピーク強度が大きく、
平均結晶粒径が3nm以上50nm以下であり、
前記硬質皮膜の断面観察において、円相当径が1.0μm以上のドロップレットが100μm2当たり5個以下である被覆切削工具が提供される。
前記硬質皮膜は、金属(半金属を含む)元素と窒素、酸素、炭素、アルゴンの含有比率を100原子%とした場合、窒素の含有比率が51原子%以上であることが好ましい。
本実施形態の切削工具は、工具の表面にAlとTiの窒化物を含む硬質皮膜を有する被覆切削工具である。本実施形態の被覆切削工具は、ボールエンドミル、スクエアエンドミル、ラジアスエンドミル、多刃エンドミル、インサート、ドリル、カッター、ブローチ、リーマ、ホブ、ルーター等の態様で使用することができる。
本実施形態の被覆切削工具は、例えば、高硬度鋼、ステンレス鋼、耐熱鋼、鋳鋼、炭素鋼の切削加工用に用いることができる。詳細は後段の実施例に記載するが、本実施形態の被覆切削工具は、ステンレス鋼の切削加工において、特に優れた耐久性を発揮する。
本実施形態に係る硬質皮膜は、窒化物であり、金属(半金属を含む)元素の総量に対して、アルミニウム(Al)を70原子%以上80原子%以下で含有しており、チタン(Ti)を20原子%以上30原子%以下で含有している。AlとTiを主体とする窒化物は耐摩耗性と耐熱性のバランスに優れる膜種であり、基材との密着性にも優れ、特にAlの含有比率を大きくすることで硬質皮膜の耐熱性がより向上する。また、Alの含有比率を大きくすることで、工具表面に酸化保護皮膜が形成され易くなるとともに、皮膜組織が微細になるため、溶着による硬質皮膜の摩耗が抑制され易くなる。
本実施形態に係る硬質皮膜の金属元素の含有比率は、鏡面加工した硬質皮膜について、電子プローブマイクロアナライザー装置(EPMA)を用いて測定することができる。この場合、例えば、硬質皮膜表面の鏡面加工後、直径が約1μmの分析範囲を5点分析した平均から求めることができる。
本実施形態に係る硬質皮膜は、Alの含有比率が大きく、X線回折において、面心立方格子構造(fcc構造)と六方最密充填構造(hcp構造)の回折ピークを有する。具体的には、fcc構造のTiN(111)面、TiN(200)面、TiN(220)面、hcp構造のAlN(100)面、AlN(002)面に起因する回折ピークを有する。そして、fcc構造のTiN(200)面に起因する回折ピークが最大強度を示し、次いで、fcc構造のTiN(111)面に起因する回折ピークが大きくなっている。つまり、本実施形態に係る硬質皮膜は、fcc構造が主体の結晶構造であり、一部にhcp構造のAlNを含有している。
本実施形態に係る硬質皮膜は、硬質皮膜の平均結晶粒径が3nm以上50nm以下である。硬質皮膜のミクロ組織が微細になり過ぎると、硬質皮膜の組織が非晶質に近くなるため靭性が著しく低下する。硬質皮膜の結晶性を高めて脆弱な非晶質相を低減するには、硬質皮膜の平均結晶粒径を3nm以上とする。硬質皮膜の平均結晶粒径は、より好ましくは、5nm以上である。また、硬質皮膜のミクロ組織が粗大になり過ぎると靭性が低下するとともに、硬質皮膜の破壊単位が大きくなるため工具の損傷が大きくなる。硬質皮膜の靭性を高め、かつ、破壊単位を小さくして工具損傷を抑制するには、硬質皮膜の平均結晶粒径を50nm以下とする。より好ましくは、硬質皮膜の平均結晶粒径は40nm以下である。更に好ましくは、硬質皮膜の平均結晶粒径は30nm以下である。
本実施形態に係る硬質皮膜の平均結晶粒径は、X線回折で最大強度を示すfcc構造のTiN(200)面に起因する回折ピークの半価幅から測定する。
本実施形態に係る硬質皮膜は、断面観察において円相当径が1μm以上のドロップレットが100μm2当たり5個以下である。本実施形態では、硬質皮膜の靭性をより高めるために皮膜組織を微細化した上で、硬質皮膜の内部に含まれる物理的な欠陥を低減する。物理蒸着法で被覆する硬質皮膜では、ドロップレットが主な物理的な欠陥となりうる。とりわけ、円相当径が1μm以上の粗大なドロップレットは硬質皮膜の内部で破壊の起点となりうるため、その発生頻度を低減することで、硬質皮膜の靭性を高めることができる。hcp構造のAlNを含有するAlとTiを主体とする窒化物の靭性を高めるために、本実施形態においては、硬質皮膜の断面観察において、円相当径が1μm以上のドロップレットを100μm2当たり5個以下にする。より好ましくは、100μm2当たり3個以下である。更に好ましくは、100μm2当たり1個以下である。更には、円相当径が5μm以上のドロップレットを含有しないことが好ましい。
また、硬質皮膜の表面についても、円相当径が1μm以上のドロップレットが、100μm2当たり5個以下であることが好ましい。より好ましくは、硬質皮膜の表面のドロップレットは100μm2当たり3個以下である。更に好ましくは、硬質皮膜の表面のドロップレットは100μm2当たり1個以下である。
本実施形態に係る硬質皮膜は、金属元素と非金属元素の総量に対して、アルゴン(Ar)を0.50原子%以下で含有する。
硬質皮膜の欠陥となるドロップレットは、スパッタリング法を適用することで発生頻度を低減させることができる。一方、スパッタリング法ではアルゴンイオンを用いてターゲット成分をスパッタリングするため、スパッタリング法で被覆した硬質皮膜はアルゴンを少なからず含有する。とりわけ、アルゴンは結晶粒界に濃化し易く、結晶粒径が微粒になるとアルゴンの含有比率が大きくなる傾向になる。但し、アルゴンの含有比率が大きくなると、結晶粒界において粒子同士の結合力が低下する。本実施形態に係る硬質皮膜のように、hcp構造のAlNを含有するAlとTiを主体とする窒化物においては、過多に含まれるアルゴンは欠陥となりうるため、その含有比率を一定以下にすることが有効である。具体的には、本実施形態に係る硬質皮膜は、金属元素と非金属元素の総量に対して、アルゴンを0.50原子%以下で含有する。より好ましくは、本実施形態の硬質皮膜は、アルゴンを0.40原子%以下で含有する。
本実施形態に係る硬質皮膜においては、非金属元素としては窒素以外に微量のアルゴン、酸素、炭素が含まれうる。硬質皮膜におけるアルゴンの含有比率は、金属(半金属を含む)元素と窒素、酸素、炭素、アルゴンの含有比率を100原子%として求めることができる。
また、本実施形態に係る硬質皮膜は、金属(半金属を含む)元素と窒素、酸素、炭素、アルゴンの含有比率を100原子%とした場合、窒素の含有比率が51原子%以上であることが好ましい。これにより、硬質皮膜に窒化物が十分に形成されて耐久性が優れる傾向にある。但し、窒素の含有比率が高くなり過ぎると、硬質皮膜が自己破壊を起こし易くなるので、52%以下にすることが好ましい。なお、評価においては小数点以下の値は切り捨てて求めればよい。
本実施形態に係る硬質皮膜には、AlとTi以外の金属元素を含有しても良い。例えば、本実施形態に係る硬質皮膜は、耐摩耗性や耐熱性などの向上を目的として、周期律表の4a族、5a族、6a族の元素およびSi、B、Yから選択される1種または2種以上の元素を含有することもできる。これらの元素は硬質皮膜の皮膜特性を向上させるために一般的に含有されるものであり、被覆切削工具の耐久性を著しく低下させない範囲で添加可能である。
本実施形態に係る硬質皮膜は窒化物であるが、上述したアルゴン以外にも微量の酸素と炭素を含有しうる。これらの元素は窒化物の中に微量な酸化物や炭化物を形成するため、硬質皮膜の靭性を低下させうる。硬質皮膜に不可避的に含有される酸素と炭素を膜厚方向にわたって低減することができれば、hcp構造のAlNを含有するAlとTiを主体とする窒化物の靭性を高めることができる。なお、本実施形態に係る硬質皮膜では、不可避不純物として酸素の方が炭素よりも多い傾向にある。
また、本実施形態に係る硬質皮膜は、アルゴン以外に他の希ガスを含有した混合ガスを用いてスパッタリングすれば、アルゴン以外の希ガスも含有しうる。
工具として、組成がWC(bal.)-Co(11.5質量%)-TaC(2.0質量%)-Cr3C2(0.7質量%)、硬度89.5HRA(ロックウェル硬さ、JIS G 0202に準じて測定した値)からなる超硬合金製の刃先交換式工具(三菱日立ツール株式会社製)を準備した。
工具をスパッタリング装置内のサンプルホルダーに固定し、工具にバイアス電源を接続した。なお、バイアス電源は、ターゲットとは独立して工具に負のバイアス電圧を印加する構造となっている。工具は、毎分2回転で自転しかつ、固定治具とサンプルホルダーを介して公転する。工具とターゲット表面との間の距離は100mmとした。
導入ガスは、Ar、およびN2を用い、スパッタリング装置に設けられたガス供給ポートから導入した。
まず工具に硬質皮膜を被覆する前に、以下の手順で工具にボンバード処理を行った。スパッタリング装置内のヒーターにより炉内温度が430℃になった状態で30分間の加熱を行った。その後、スパッタリング装置の炉内を真空排気し、炉内圧力を5.0×10-3Pa以下とした。そして、Arガスをスパッタリング装置の炉内に導入し、炉内圧力を0.8Paに調整した。そして、工具に-170Vの直流バイアス電圧を印加して、Arイオンによる工具のクリーニング(ボンバード処理)を実施した。
次いで、以下の手順でAlとTiの窒化物を工具上に被覆した。
炉内温度を430℃に保持したまま、そして、スパッタリング装置の炉内にArガスを160sccmで導入し、その後、N2ガスを120sccmで導入して炉内圧力を0.60Paとした。工具に-60Vの直流バイアス電圧を印加して、そして、AlとTiを含有する合金ターゲットに印加される電力の1周期当りの放電時間を4.0ミリ秒、電力が印加される合金ターゲットが切り替わる際に、電力の印加が終了する合金ターゲットと電力の印加を開始する合金ターゲットの両方の合金ターゲットに同時に電力が印加されている時間を10マイクロ秒として、3個のAlTi系合金ターゲットに連続的に電力を印加して、工具の表面に約3.0μmの硬質皮膜を被覆した。このとき、電力パルスの最大電力密度は、1.5kW/cm2、平均電力密度は0.37kW/cm2とした。
硬質皮膜の皮膜組成は、電子プローブマイクロアナライザー装置(株式会社日本電子製 JXA-8500F)を用いて、付属の波長分散型電子プローブ微小分析(WDS-EPMA)で硬質皮膜の皮膜組成を測定した。物性評価用のボールエンドミルを鏡面加工して、加速電圧10kV、照射電流5×10-8A、取り込み時間10秒とし、分析領域が直径1μmの範囲を5点測定してその平均値から硬質皮膜の金属含有比率および金属成分と非金属成分の合計におけるArの含有比率を求めた。
硬質皮膜の結晶構造は、X線回折装置(株式会社PaNalytical製 EMPYREA)を用い、管電圧45kV、管電流40mA、X線源Cukα(λ=0.15405nm)、2θが20~80度の測定条件で確認を行った。また、最大強度を示す回折ピークの半価幅から、硬質皮膜の平均結晶粒径を算出した。
硬質皮膜の皮膜硬さおよび弾性係数は、ナノインデンテーションテスター(エリオニクス(株)製ENT-2100)を用いて分析した。分析は、皮膜の最表面に対し試験片を5度傾けた皮膜断面を鏡面研磨後、皮膜の研磨面内で最大押し込み深さが膜厚の略1/10未満となる領域を選定した。押し込み荷重49mN/秒の測定条件で10点測定し、値の大きい側の2点と値の小さい側の2点を除いた6点の平均値から求めた。
作製した被覆切削工具を用いて切削試験を行った。表1に分析結果および切削試験結果を示す。切削条件は以下の通りである。
(条件)乾式加工
・工具:インサート式ラジアスエンドミル
・カッター型番:RV4B050R-5
・インサート型番:RPHT1204M0EN-C8
・切削方法:底面切削
・被削材:SUS630(35HRC)
・切り込み:軸方向、1.0mm、径方向、30.0mm
・切削速度:300.0m/min
・一刃送り量:0.15m/刃
・刃数:1
・切削距離:2m
・評価方法:切削加工後、工具顕微鏡を用いて倍率10倍で観察し、工具と被削材が擦過した幅を測定し、そのうちの擦過幅が最も大きかった部分を最大摩耗幅とした。
各試料について、皮膜特性および皮膜組織を観察した。皮膜特性および切削評価の結果を表1に示す。
比較例3、4はアークイオンプレーティング法で被覆しているがhcp構造のピーク強度を有しているため、早期に皮膜剥離が発生した。
比較例1は、本発明例と同様にドロップレットやアルゴン等の欠陥は少ないが、hcp構造の(101)面が最大強度を示したので硬質皮膜の靭性が低下しており、早期に剥離が発生したと推定される。
また、透過型電子顕微鏡で組織観察した場合、50nm×50nmの範囲内で、長径が10nm以上になる空隙は1個以下であり、ミクロレベルで緻密になっていることが確認された。
本実施例20と比較例20は、実施例1における本実施例1と比較例2と同様の成膜方法で硬質皮膜を被覆した。本実施例21は、硬質皮膜の被覆において、スパッタリング装置の炉内にArガスを160sccmで導入し、その後、N2ガスを160sccmで導入して炉内圧力を0.68Paとした以外は、実施例1と同様の条件で硬質皮膜を被覆した。切削条件は以下の通りである。
<切削試験>
(条件)湿式加工
・工具:4枚刃超硬スクエアエンドミル
・型番:EPP4060、工具半径3.0mm
・切削方法:底面切削
・被削材:SUS304
・切り込み:軸方向、6.0mm、径方向、0.2mm
・切削速度:60.0m/min
・一刃送り量:0.04mm/刃
・切削距離:50m
・評価方法:切削加工後、工具顕微鏡を用いて倍率50倍で観察し、工具と被削材が擦過した幅を測定し、そのうちの擦過幅が最も大きかった部分を最大摩耗幅とした。各試料について、皮膜特性および皮膜組織を観察した。皮膜特性および切削評価の結果を表2に示す。
成膜時の窒素のガス流量を高めた本実施例21は、金属元素と、窒素、酸素、炭素、アルゴンの含有比率を100原子%とした場合の窒素の含有比率が51%となり、他の試料よりも窒素の含有比率が高くなった。本実施例21は窒素の含有比率が高く、ミクロ組織に窒化物が十分に形成されたため最大摩耗幅がより抑制されたと推定される。
Claims (3)
- 工具の表面に硬質皮膜を有する被覆切削工具であって、
前記硬質皮膜は窒化物であり、金属(半金属を含む)元素の総量に対して、アルミニウム(Al)を70原子%以上80原子%以下で含有しており、チタン(Ti)を20原子%以上30原子%以下で含有しており、金属元素(半金属を含む)と非金属元素の総量に対して、アルゴン(Ar)を0.50原子%以下で含有しており、
前記硬質皮膜は、X線回折において、面心立方格子構造のTiN(111)面、TiN(200)面、TiN(220)面、六方最密充填構造のAlN(100)面、AlN(002)面にそれぞれ起因する回折ピークを有し、かつ、面心立方格子構造のTiN(200)面に起因する回折ピークが最大強度を示し、次いで、面心立方格子構造のTiN(111)面に起因する回折ピークの強度が大きく、
平均結晶粒径が3nm以上50nm以下であり、
前記硬質皮膜の断面観察において、円相当径が1.0μm以上のドロップレットが100μm2当たり5個以下であることを特徴とする被覆切削工具。 - 前記硬質皮膜は、被加工材と接触する工具の最表層に設けられていることを特徴とする請求項1に記載の被覆切削工具。
- 前記硬質皮膜は、金属(半金属を含む)元素と窒素、酸素、炭素、アルゴンの含有比率を100原子%とした場合、窒素の含有比率が51原子%以上であることを特徴とする請求項1または2に記載の被覆切削工具。
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Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
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EP3943222A4 (en) * | 2019-03-22 | 2022-08-03 | MOLDINO Tool Engineering, Ltd. | COATED CUTTING TOOL |
WO2022176057A1 (ja) * | 2021-02-17 | 2022-08-25 | 住友電工ハードメタル株式会社 | 切削工具 |
US20230201930A1 (en) * | 2021-02-17 | 2023-06-29 | Sumitomo Electric Hardmetal Corp. | Cutting tool |
JP7410383B2 (ja) | 2019-12-27 | 2024-01-10 | 株式会社Moldino | 被覆切削工具 |
EP4108366A4 (en) * | 2020-02-21 | 2024-04-03 | MOLDINO Tool Engineering, Ltd. | COATED TOOL |
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Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08209333A (ja) | 1988-03-24 | 1996-08-13 | Kobe Steel Ltd | 耐摩耗性皮膜被覆部材 |
JP2005344148A (ja) * | 2004-06-01 | 2005-12-15 | Sumitomo Electric Ind Ltd | 耐摩耗性被膜およびこれを用いた表面被覆切削工具 |
JP2008545063A (ja) * | 2005-07-04 | 2008-12-11 | フラウンホーファー−ゲゼルシャフト ツル フェルデルング デル アンゲヴァンテン フォルシュング エー ファウ | 硬質膜被覆された物体およびその製造方法 |
JP2011189419A (ja) | 2010-03-12 | 2011-09-29 | Hitachi Metals Ltd | 耐摩耗性に優れた被覆工具 |
JP2013202700A (ja) | 2012-03-27 | 2013-10-07 | Hitachi Tool Engineering Ltd | 耐久性に優れる被覆工具およびその製造方法 |
WO2014002948A1 (ja) | 2012-06-29 | 2014-01-03 | 住友電工ハードメタル株式会社 | 表面被覆切削工具 |
WO2015186413A1 (ja) * | 2014-06-02 | 2015-12-10 | 三菱日立ツール株式会社 | 硬質皮膜、硬質皮膜被覆部材、それらの製造方法、及び硬質皮膜の製造に用いるターゲット |
JP2017156734A (ja) | 2016-03-04 | 2017-09-07 | 高橋 晃世 | 聖域表示具 |
WO2017170536A1 (ja) * | 2016-03-30 | 2017-10-05 | 三菱日立ツール株式会社 | 被覆切削工具 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19547305A1 (de) * | 1995-12-18 | 1997-06-19 | Univ Sheffield | Verfahren zum Beschichten von metallischen Substraten |
WO1998010120A1 (de) * | 1996-09-03 | 1998-03-12 | Balzers Aktiengesellschaft | Verschleissschutz-beschichtetes werkstück |
SE0402180D0 (sv) | 2004-09-10 | 2004-09-10 | Sandvik Ab | Deposition of Ti1-xAlxN using Bipolar Pulsed Dual Magnetron Sputtering |
US8409702B2 (en) * | 2011-02-07 | 2013-04-02 | Kennametal Inc. | Cubic aluminum titanium nitride coating and method of making same |
WO2014157688A1 (ja) | 2013-03-28 | 2014-10-02 | 日立ツール株式会社 | 被覆切削工具及びその製造方法 |
EP2860285B1 (en) * | 2013-10-14 | 2016-09-14 | Rigas Tehniska universitate | Method for increasing heat resistance of metallic articles |
JP6555796B2 (ja) | 2014-09-26 | 2019-08-07 | 日立金属株式会社 | 被覆切削工具 |
JP6463078B2 (ja) | 2014-10-24 | 2019-01-30 | 日立金属株式会社 | 被覆工具の製造方法 |
CN105908126B (zh) | 2016-07-12 | 2018-04-03 | 天津职业技术师范大学 | 一种高Al含量的AlTiN复合涂层及制备方法 |
-
2017
- 2017-11-30 JP JP2019536412A patent/JP6844705B2/ja active Active
- 2017-11-30 KR KR1020197033955A patent/KR102167200B1/ko active IP Right Grant
- 2017-11-30 EP EP17921503.3A patent/EP3670042A4/en active Pending
- 2017-11-30 CN CN201780091160.3A patent/CN110691662B/zh active Active
- 2017-11-30 WO PCT/JP2017/043030 patent/WO2019035220A1/ja unknown
- 2017-11-30 US US16/612,801 patent/US10974323B2/en active Active
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08209333A (ja) | 1988-03-24 | 1996-08-13 | Kobe Steel Ltd | 耐摩耗性皮膜被覆部材 |
JP2005344148A (ja) * | 2004-06-01 | 2005-12-15 | Sumitomo Electric Ind Ltd | 耐摩耗性被膜およびこれを用いた表面被覆切削工具 |
JP2008545063A (ja) * | 2005-07-04 | 2008-12-11 | フラウンホーファー−ゲゼルシャフト ツル フェルデルング デル アンゲヴァンテン フォルシュング エー ファウ | 硬質膜被覆された物体およびその製造方法 |
JP2011189419A (ja) | 2010-03-12 | 2011-09-29 | Hitachi Metals Ltd | 耐摩耗性に優れた被覆工具 |
JP2013202700A (ja) | 2012-03-27 | 2013-10-07 | Hitachi Tool Engineering Ltd | 耐久性に優れる被覆工具およびその製造方法 |
WO2014002948A1 (ja) | 2012-06-29 | 2014-01-03 | 住友電工ハードメタル株式会社 | 表面被覆切削工具 |
WO2015186413A1 (ja) * | 2014-06-02 | 2015-12-10 | 三菱日立ツール株式会社 | 硬質皮膜、硬質皮膜被覆部材、それらの製造方法、及び硬質皮膜の製造に用いるターゲット |
JP2017156734A (ja) | 2016-03-04 | 2017-09-07 | 高橋 晃世 | 聖域表示具 |
WO2017170536A1 (ja) * | 2016-03-30 | 2017-10-05 | 三菱日立ツール株式会社 | 被覆切削工具 |
Non-Patent Citations (1)
Title |
---|
See also references of EP3670042A4 * |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP3943222A4 (en) * | 2019-03-22 | 2022-08-03 | MOLDINO Tool Engineering, Ltd. | COATED CUTTING TOOL |
JP7410383B2 (ja) | 2019-12-27 | 2024-01-10 | 株式会社Moldino | 被覆切削工具 |
EP4108366A4 (en) * | 2020-02-21 | 2024-04-03 | MOLDINO Tool Engineering, Ltd. | COATED TOOL |
WO2022176057A1 (ja) * | 2021-02-17 | 2022-08-25 | 住友電工ハードメタル株式会社 | 切削工具 |
JPWO2022176057A1 (ja) * | 2021-02-17 | 2022-08-25 | ||
JP7226688B2 (ja) | 2021-02-17 | 2023-02-21 | 住友電工ハードメタル株式会社 | 切削工具 |
US20230201930A1 (en) * | 2021-02-17 | 2023-06-29 | Sumitomo Electric Hardmetal Corp. | Cutting tool |
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