WO2019017425A1 - 放射線イメージング装置用光学素子、放射線イメージング装置及びｘ線イメージング装置 - Google Patents

放射線イメージング装置用光学素子、放射線イメージング装置及びｘ線イメージング装置 Download PDF

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Publication number
WO2019017425A1
WO2019017425A1 PCT/JP2018/027073 JP2018027073W WO2019017425A1 WO 2019017425 A1 WO2019017425 A1 WO 2019017425A1 JP 2018027073 W JP2018027073 W JP 2018027073W WO 2019017425 A1 WO2019017425 A1 WO 2019017425A1
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WIPO (PCT)
Prior art keywords
lens
substrate
imaging apparatus
fluorescence
scintillator
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PCT/JP2018/027073
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English (en)
French (fr)
Japanese (ja)
Inventor
敬 亀島
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RIKEN
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RIKEN
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Priority to DE112018003696.0T priority Critical patent/DE112018003696B4/de
Priority to US16/630,555 priority patent/US11137503B2/en
Publication of WO2019017425A1 publication Critical patent/WO2019017425A1/ja
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01T—MEASUREMENT OF NUCLEAR OR X-RADIATION
    • G01T1/00—Measuring X-radiation, gamma radiation, corpuscular radiation, or cosmic radiation
    • G01T1/16—Measuring radiation intensity
    • G01T1/20—Measuring radiation intensity with scintillation detectors
    • G01T1/2002—Optical details, e.g. reflecting or diffusing layers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01T—MEASUREMENT OF NUCLEAR OR X-RADIATION
    • G01T1/00—Measuring X-radiation, gamma radiation, corpuscular radiation, or cosmic radiation
    • G01T1/16—Measuring radiation intensity
    • G01T1/20—Measuring radiation intensity with scintillation detectors
    • G01T1/2018—Scintillation-photodiode combinations

Definitions

  • the present invention relates to, for example, an optical element for a radiation imaging apparatus applied in a radiation facility, a radiation imaging apparatus, and an X-ray imaging apparatus.
  • the radiation facility is an ultra-large X-ray source that generates high directivity and high brightness X-rays, and is used as a powerful observation and analysis tool in a wide range of fields from material science and life science to basic physics.
  • an X-ray detection apparatus that has high measurement accuracy and operates at high speed is required.
  • an X-ray imaging apparatus capable of measuring a wide range of X-ray signals simultaneously is used as a versatile tool.
  • Spatial resolution is one of the performance requirements for x-ray imaging devices.
  • the spatial resolution of the X-ray imaging apparatus is an important parameter that determines the measurement limit, data quality and apparatus size, and the refinement leads to an improvement in measurement accuracy.
  • an X-ray imaging apparatus having a spatial resolution of 10 micrometers or less
  • an apparatus comprising a scintillator, an imaging optical system and an image sensor is known.
  • FIG. 19 shows a schematic configuration of an X-ray imaging apparatus using a scintillator.
  • radiation as X-rays is irradiated to the sample 910, and radiation which has passed through the sample 910 or scattered by the sample 910 enters the scintillator 901.
  • the scintillator 901 converts X-rays, which are incident light, into fluorescence of a long wavelength that can be refracted by an optical lens.
  • the image by the fluorescence from the scintillator 901 is magnified by the imaging optical system 902 and then (possibly reduced) projected on the image sensor 903 so that the structural information of the sample 910 is obtained at a predetermined spatial resolution. You can get
  • the theoretical limit value of the spatial resolution is expressed by Rayleigh's resolution as in the case of the optical microscope.
  • ⁇ represents the wavelength of fluorescence by the scintillator.
  • n the refractive index of the medium between the objective lens and the scintillator.
  • ⁇ is the aperture angle, and represents the maximum angle of the light beam incident on the objective lens from the sample to be observed (here, the scintillator) to the optical axis.
  • FIG. 20 shows a comparison of a dry objective and an immersion objective that can be applied to the X-ray imaging apparatus of FIG.
  • the medium between the objective lens and the scintillator is a gas (mainly air) or a vacuum between the objective lens and the scintillator is made.
  • the refractive index n is approximately "1.0".
  • the aperture angle ⁇ is actually about 72 ° at maximum. Therefore, in the case of using a dry objective, the numerical aperture NA is about 0.95 corresponding to “1 ⁇ sin 72 °” at maximum, and assuming that the fluorescence wavelength of the scintillator is 550 nm (nanometer), the spatial resolution ⁇ Since “0.61 ⁇ 550 ⁇ 10 ⁇ 9 /0.95 ⁇ 353 ⁇ 10 ⁇ 9 ”, the limit value is 353 nm.
  • the medium between the objective lens and the scintillator is an oil having a refractive index of about 1.52 or water having a refractive index of about 1.33.
  • the maximum value of the opening angle ⁇ is about 72 °.
  • the immersion type objective lens when used, if the numerical aperture NA is maximum at about 1.44 corresponding to “1.52 ⁇ sin 72 °” and the fluorescence wavelength of the scintillator is 550 nm (nanometer), The spatial resolution ⁇ has a limit of 233 nm according to “0.61 ⁇ 550 ⁇ 10 ⁇ 9 /1.4 4 ⁇ 233 ⁇ 10 ⁇ 9 ”.
  • the spatial resolution ⁇ can be increased in the case of using the immersion type objective lens than in the case of using the drying type objective lens.
  • the focus is easily shifted due to the change of the refractive index of the liquid portion depending on the temperature change, the liquid tends to be opaque due to the turbidity of the liquid due to radiation, and the application of arranging the objective lens horizontally
  • the application range is limited for reasons such as difficulty in holding, and in the radiation imaging apparatus etc.
  • the spatial resolution is substantially limited to 353 nm in the dry objective lens.
  • An object of the present invention is to provide an optical element for a radiation imaging apparatus, a radiation imaging apparatus, and an X-ray imaging apparatus that contribute to improvement of spatial resolution.
  • An optical element for a radiation imaging apparatus has an objective lens, and in the optical element for a radiation imaging apparatus receiving an incidence of radiation, the scintillator for receiving the radiation and emitting fluorescence having a longer wavelength than the radiation It is characterized in that it is provided integrally with the objective lens on the incident side of the objective lens.
  • a radiation imaging apparatus includes an image sensor and the optical element for the radiation imaging apparatus.
  • An X-ray imaging apparatus includes: the optical element for a radiation imaging apparatus; and an X-ray generator for generating X-rays as the radiation to the optical element for a radiation imaging apparatus. .
  • an optical element for a radiation imaging apparatus, a radiation imaging apparatus, and an X-ray imaging apparatus that contribute to the improvement of spatial resolution.
  • FIG. 1 is a diagram conceptually showing the entire configuration of an imaging apparatus according to an embodiment of the present invention.
  • FIG. 1 is a configuration explanatory view of an image forming optical system according to an embodiment of the present invention.
  • (A) And (b) is respectively a perspective view and a side view of the lead lens which constitutes an objective lens.
  • (A) to (d) are diagrams for explaining a method of manufacturing a lead lens constituting an objective lens.
  • (A) to (c) are explanatory views of the working distance of the objective lens.
  • FIGS. 7A to 7G are diagrams showing various modified shapes of the lead lens according to the first embodiment of the present invention. These are figures which show a mode that the head lens is formed as a cemented lens according to 1st Example of this invention.
  • FIG. 1 is a schematic block diagram of an X-ray imaging apparatus using a scintillator according to the prior art.
  • FIG. 1 relates to the prior art, and is a contrast diagram of a drying objective lens and an immersion objective lens.
  • FIG. 1 is a diagram conceptually showing the entire configuration of an imaging apparatus 1 according to an embodiment of the present invention.
  • the imaging apparatus 1 includes an objective lens 10, an imaging lens 20, an image sensor 30, a sensor drive / signal processing unit 40, a lens support 50, and an imaging lens drive unit 60.
  • 100 represents an incident beam to the imaging device 1.
  • the objective lens 10 and the imaging lens 20 form an imaging optical system.
  • the incident light beam 100 first enters the objective lens 10 among the lenses forming the imaging optical system.
  • the imaging optical system forms an image based on the incident light beam 100 on the imaging surface of the image sensor 30.
  • the image sensor 30 is a solid-state imaging device including a CCD (Charge Coupled Device) or a CMOS (Complementary Metal Oxide Semiconductor) image sensor, etc., and generates an image signal indicating an image (optical image) formed on an imaging surface as a sensor control signal. It is possible to output in response to the input of.
  • CCD Charge Coupled Device
  • CMOS Complementary Metal Oxide Semiconductor
  • the sensor drive / signal processing unit 40 supplies a sensor control signal for driving and controlling the image sensor 30 to the image sensor 30, thereby acquiring the imaging signal from the image sensor 30.
  • the lens support 50 is a lens barrel which supports each lens constituting an imaging optical system including the objective lens 10 and the imaging lens 20 at a predetermined position.
  • the lens support 50 is composed of a plurality of lens supports Also good.
  • the lens support 50 may be configured to include an objective lens support for supporting the objective lens 10 and an imaging lens support for supporting the imaging lens 20.
  • the objective lens support and the imaging The lens support may be a separate support.
  • a housing (not shown) supporting the imaging optical system and the image sensor 30 may be provided in the imaging apparatus 1.
  • the imaging lens drive unit 60 is a drive mechanism for moving the imaging lens 20 on the optical path of fluorescence described later.
  • a sample irradiation beam such as an X-ray is irradiated to the sample SS, and the sample irradiation beam transmitted through the sample SS and the sample irradiation beam scattered by the sample SS enter the objective lens 10 as an incident beam 100.
  • the sample irradiation beam transmitted through the sample SS refers to the sample irradiation beam transmitted through the sample irradiation beam without being scattered by the sample SS.
  • a three-dimensional orthogonal coordinate system consisting of mutually orthogonal X, Y, and Z axes is assumed.
  • the traveling direction of the sample irradiation beam irradiated to the sample SS is parallel to the Z axis, and therefore, the traveling direction of the sample irradiation beam transmitted through the sample SS is also parallel to the Z axis.
  • a plane parallel to the X and Y axes is referred to as an XY plane
  • a plane parallel to the Y and Z axes is referred to as a YZ plane
  • a plane parallel to the Z and X axes is referred to as a ZX plane.
  • the objective lens 10 is configured to include a lead lens 11 and a non-lead lens 12 different from the lead lens 11.
  • the objective lens 10 is composed of a plurality of lenses in order to reduce the overall aberration of the objective lens 10 to a small one, among the plurality of lenses constituting the objective lens 10, the leading lens 11 is the most incident ray 100. It is located on the incident side (so it is located closest to the sample SS). That is, the front lens 11 is disposed closer to the incident light beam 100 than the non-head lens 12, and the incident light beam 100 enters the front lens 11.
  • a fluorescent film 13 as a scintillator is provided on the surface of the front lens 11 on the incident side of the incident light beam 100.
  • the fluorescent film 13 spreads in the direction orthogonal to the Z axis. That is, the fluorescent film 13 is a film which spreads on the XY plane, and is a flat film having a thickness in the Z-axis direction.
  • the thickness of the scintillator formed on the surface of the front lens 11 is so thin that it can be called a film, so the scintillator is referred to as a fluorescent film, but the thickness of the scintillator is arbitrary. May be referred to as a phosphor.
  • the portion of the front lens 11 where the fluorescent film 13 is not formed is referred to as a lens-like substrate 14. There is no gap between the lens-like substrate 14 and the fluorescent film 13. It is also possible to think that the fluorescent film 13 is formed on the surface of the lens-like substrate 14 and the incident light beam 100 is received by the fluorescent film 13.
  • the sample irradiation beam and the incident beam 100 are beams having a predetermined wavelength WL1 and are, for example, gamma rays, X rays or ultraviolet rays (especially, for example, extreme ultraviolet rays).
  • the fluorescent film 13 is made of a scintillator material which receives the incident light beam 100 and emits fluorescence.
  • the wavelength WL2 of the fluorescence is longer than the wavelength WL1, and the fluorescence may typically be visible light. However, the fluorescence emitted from the fluorescent film 13 may be light in the ultraviolet region.
  • fluorescence when simply referring to fluorescence, it refers to the fluorescence generated in the fluorescent film 13.
  • the fluorescence generated in the fluorescent film 13 travels in various directions starting from the generation position of the fluorescence, but at least a part of the fluorescence generated in the fluorescent film 13 passes through the lens-like substrate 14 of the lead lens 11 And enters the non-leading lens 12.
  • the non-leading lens 12 is composed of one or more lenses.
  • the non-leading lens 12 cooperates with the lens-like substrate 14 of the leading lens 11 to make the fluorescence from the fluorescent film 13 enter the imaging lens 20 as parallel light.
  • the imaging lens 20 forms an image of fluorescence from the objective lens 10 on the imaging surface of the image sensor 30.
  • the imaging lens 20 is shown as a single lens in FIG. 2, the imaging lens 20 may also be composed of a plurality of lenses as in the objective lens 10.
  • aberration correction can be performed in the non-leading lens 12, if the aberration correction is sufficient with only the leading lens 11 and the imaging lens 20, the non-leading lens 12 can be omitted from the imaging optical system. .
  • photoelectric conversion pixels for photoelectrically converting an image formed of fluorescent light are two-dimensionally arrayed, and an imaging signal which is an electric signal is generated by the photoelectric conversion.
  • the image formed on the image sensor 30 is an image according to the light emission position and the light emission intensity of the fluorescence in the phosphor film 13, and the light emission position and the light emission intensity of the fluorescence in the phosphor film 13 It depends on the incident position and the incident intensity. Therefore, an image by fluorescence according to the incident position and incident intensity of the incident light beam 100 to the fluorescent film 13 is formed by the image sensor 30.
  • an imaging optical system configured to include the objective lens 10 and the imaging lens 20 enlarges (in some cases, reduces) an image due to the fluorescence generated in the fluorescent film 13 to capture an image of the image sensor 30. It can be projected on a plane.
  • the image formed on the image sensor 30 is structural information of the sample SS (ie, information representing the external shape and internal structure of the sample SS)
  • the image formed on the image sensor 30 is structural information of the sample SS It is a photographed image of the sample SS contained.
  • an X-ray roentgen image of the sample SS is imaged by the image sensor 30.
  • the front lens 11 including the lens-like substrate 14 and the fluorescent film 13 is formed of a material that transmits fluorescence but does not transmit incident light 100 or has a characteristic of transmitting less than that of fluorescence. That is, the front lens 11 including the lens-like substrate 14 and the fluorescent film 13 is formed of a substance transparent to fluorescence, and the transmittance of the incident light beam 100 in the substance is lower than the transmittance of the fluorescence. As long as it has this feature, the type of constituent material of the front lens 11 is arbitrary, but here, the lens-like substrate 14 is formed of LuAG. LuAG is an abbreviation of Lu 3 Al 5 O 12 (lutetium aluminum garnet).
  • the fluorescent film 13 is obtained by adding an additive at a predetermined ratio to the same substance as the constituent material of the lens-like substrate 14 (that is, the material of the lens-like substrate 14).
  • the fluorescent film 13 is made of Pr: LuAG.
  • Pr: LuAG is obtained by adding praseodymium as an additive to LuAG.
  • the fluorescent film 13 receives the incident light beam 100 and emits fluorescence of 305 nm.
  • the concentration of the additive is, for example, about 0.5%.
  • the lens-like substrate 14 is made to have a thickness that can sufficiently attenuate the incident light beam 100 transmitted through the fluorescent film 13.
  • the thickness of the fluorescent film 13 is thinner than the thickness of the lens-like substrate 14, for example, in the range of 100 nm to 2 mm.
  • the thickness of the fluorescent film 13 it is possible to suppress the variation in the light emission point of the fluorescence in the traveling direction of the incident light beam 100, and as a result, the spatial resolution of the imaging device 1 is improved.
  • the thickness of the fluorescent film 13 is increased, an increase in the amount of fluorescence can be expected.
  • the thickness of the fluorescent film 13 may be determined in consideration of the trade-off between the spatial resolution and the light quantity.
  • the fluorescent film 13 is bonded to the lens-like substrate 14 while maintaining the continuity of the refractive index.
  • to be bonded while maintaining the continuity of the refractive index means that the refractive index structure of the bonding interface between the fluorescent film 13 and the lens-like substrate 14 is substantially uniform.
  • the difference between the refractive index of the lens-like substrate 14 and the refractive index of the fluorescent film 13 is 0.1% or less or 0.1% in terms of the refractive index of the lens-like substrate 14. It can be said that the refractive index structure of the bonding interface between the lens and the lens-like substrate 14 is uniform, so that the scattering, refraction and reflection of the fluorescence at the bonding interface can be suppressed.
  • FIGS. 3A and 3B are a perspective view and a side view of the front lens 11, respectively.
  • an anti-reflection film 15 is disposed on the surface of the lens-like substrate 14 not in contact with the fluorescent film 13 in the front lens 11.
  • An anti-reflection film 16 is disposed on the side of the fluorescent film 13 not in contact with the lens-like substrate 14. That is, when the front lens 11 is viewed along the traveling direction of the incident light beam 100 (however, ignoring the scattering in the sample SS), the order of the antireflective film 16, the fluorescent film 13, the lens substrate 14, and the antireflective film 15 Lined up.
  • the antireflective film 15 is, for example, a thin film having a thickness corresponding to 1 ⁇ 4 of the wavelength of fluorescence.
  • the reflection preventing film 15 is a reflection light generated by the reflection of fluorescence on the surface of the reflection preventing film 15 and a reflection light generated by the reflection of the fluorescence on the interface between the lens-like substrate 14 and the reflection preventing film 15. By canceling out, the reflection of fluorescence is prevented.
  • the configuration of the antireflective film 16 is the same as the configuration of the antireflective film 15.
  • the antireflective film 16 is a reflected light generated by reflecting the fluorescent light at the interface between the fluorescent film 13 and the antireflective film 16, and a reflected light generated by reflecting the fluorescent light at the surface of the antireflective film 16. By canceling out, the reflection of fluorescence is prevented.
  • the surface SF1 on which the fluorescent film 13 is formed is a plane parallel to the XY plane, and the external shape of the plane on the XY plane is a circle. However, the outer shape may be other than a circle.
  • the lens-like substrate 14 functions as a plano-convex lens, and the surface of the lens-like substrate 14 opposite to the surface SF1 is a convex surface SF2.
  • a phosphor plate 13S which is a source of the phosphor film 13 and a lens-like substrate 14 are prepared.
  • the fluorescent plate 13S is a plate-like member having the same shape as the surface SF1 of the lens-like substrate 14 on the XY plane, and the constituent material of the fluorescent plate 13S is the same as that of the fluorescent film 13. Since the lens-like substrate 14 functions as one of the constituent lenses of the objective lens 10, it has a thickness, a curvature, etc. according to the optical design of the objective lens 10, but the thickness of the phosphor 13S is easy to handle etc. It may be determined arbitrarily taking into consideration.
  • the surface SF1 of the lens-like substrate 14 and one surface of the fluorescent plate 13S are bonded by solid phase diffusion. Thereafter, the fluorescent plate 13S is polished and thinned from the surface on which the lens-like substrate 14 is not bonded.
  • the fluorescent plate 13S after the thinning is the fluorescent film 13 (see FIG. 4C).
  • the thinning step of the fluorescent plate 13S is unnecessary.
  • the antireflective film 15 is formed on the surface of the lens-like substrate 14 not in contact with the fluorescent film 13 by vacuum evaporation, for example, and the lens shape of the fluorescent film 13 is formed.
  • An anti-reflection film 16 is formed on the side not in contact with the substrate 14.
  • the bonding method by solid phase diffusion is the same as the bonding method between the substrate and the fluorescent plate disclosed in the above-mentioned Patent Document 1 (Japanese Patent Laid-Open No. 2016-45183), and the lens-like substrate 14 and the fluorescent plate can be performed before bonding.
  • the pretreatment (grinding, washing, etc.) to 13S and the method of thinning the fluorescent plate 13S are also as shown in Patent Document 1.
  • the manufacturing method of the front lens 11 shown in FIGS. 4A to 4D is only an example, and the manufacturing method can be variously modified. For example, the order of steps may be arbitrarily changed from the above-described one. You may.
  • the fluorescent plate 13S and the substrate which is the base of the lens-like substrate 14 are bonded by solid phase diffusion
  • the fluorescent plate 13S is thinned to form the fluorescent film 13;
  • the original substrate may be processed into a lens shape.
  • the original substrate after this processing becomes the lens-like substrate 14.
  • the method for bonding the lens-like substrate 14 and the fluorescent plate 13S having the same base material by solid phase diffusion without using an impurity such as an adhesive has been described, but the lens-like substrate 14 and the fluorescent plate 13S are made of an adhesive May be joined (the process after joining is the same as that described above). Alternatively, the lens-like substrate 14 and the fluorescent plate 13S may be joined with different base materials.
  • the bonding method is not limited to these, as long as the fluorescent film 13 can be bonded on the surface SF1 of the lens-like substrate 14, for example, the fluorescent film 13 is formed on the surface SF1 of the lens-like substrate 14 A substance (here, Pr: LuAG) may be laminated.
  • the fluorescent film 13 is integrated with the objective lens 10 (here, the front lens 11) on the incident side of the objective lens 10 (specifically, on the side of the objective lens 10 on which the incident light beam 100 is incident). Provided as.
  • a reflection film that reflects fluorescence may be provided on the surface of the fluorescent film 13 which is not in contact with the lens-like substrate 14.
  • the fluorescence generated in the fluorescent film 13 travels in various directions starting from the position where the fluorescence is generated, but the reflection film reflects the fluorescence traveling toward the reflection film to direct it to the non-leading lens 12.
  • the amount of fluorescence reaching the image sensor 30 can be increased, and unnecessary stray light (such as visible light) different from the fluorescence can be prevented from passing through the lead lens 11. , The spatial resolution goes down.
  • the case of providing the reflective film with respect to the light amount of fluorescence In terms of spatial resolution, the case of providing the anti-reflection film 16 is more advantageous. Even in the case where the reflective film is provided, if the thickness of the fluorescent film 13 is made sufficiently thin, it is possible to eliminate the deterioration of the spatial resolution to a negligible level. Conversely, in the case where the antireflective film 16 is provided, it can be said that it is not necessary to make the thickness of the fluorescent film 13 so thin.
  • the medium between the lens and the scintillator is a gas or a liquid, or the vacuum between the lens and the scintillator is made
  • the lens and A medium between the scintillators is a lens-like substrate 14 which is a solid transparent to fluorescence. That is, in the present embodiment, the medium between the lens and the scintillator is filled with the substrate (here, the lens-like substrate 14) by giving the lens shape to the substrate necessary for attenuating the incident light beam 100 such as radiation.
  • the refractive index n of the medium can be made relatively higher than that of the conventional dry objective lens or immersion objective lens.
  • the numerical aperture of the objective lens and the spatial resolution of the imaging optical system can be dramatically improved as compared with the related art.
  • a solid is used as the medium, a drastic improvement in temperature stability can be expected compared to the immersion objective lens.
  • solids do not flow and do not evaporate, so long-term mechanical stability can be achieved.
  • the lens in this case, the lens-like substrate 14 integrally provided with the fluorescent film 13 included in the objective lens 10 is a solid having a refractive index difference between the lens and the fluorescent film 13 of not more than a predetermined value.
  • a predetermined value may be another value near 0.1%.
  • a surface on which a sample as an imaging target is located is referred to as a sample surface, and a distance from the tip of the objective lens to the sample surface when focusing on the sample surface (in other words, to the sample)
  • the distance from the tip of the objective lens to the sample when focusing is called the working distance.
  • the fluorescent film 13 corresponds to a sample (the fluorescent film 13 is a light source as an imaging target).
  • the imaging optical system is designed such that the sample surface is set to the fluorescent film 13 and the focusing position is fixed to the fluorescent film 13 as the sample surface.
  • the working distance is zero or negative.
  • the imaging optical system is designed such that the fluorescence emitted from a certain light emitting point in the scintillator (here, the fluorescent film 13) forms an image at one point on the image sensor 30.
  • the fluorescent film 13 is contained within the depth of field in the imaging optical system.
  • the working distance of the objective lens 10 will be supplemented. Since the fluorescent film 13 has a finite thickness t in the Z-axis direction, the working distance is (-t / 2) when the in-focus position is aligned with the center of the fluorescent film 13. That is, it can be said that the working distance is negative.
  • the direction from the sample surface to the tip of the objective lens coincides with the direction of light from the sample surface to be incident on the imaging optical system.
  • the working distance has a positive value.
  • FIG. 5B when the direction from the sample surface to the tip of the objective lens and the direction of the light from the sample surface to be incident on the imaging optical system are opposite to each other, The working distance has a negative value.
  • the imaging apparatus 1 when the in-focus position is aligned with the center of the fluorescent film 13, a plane parallel to the XY plane passing through the center of the fluorescent film 13 is the sample surface, as shown in FIG.
  • the direction from the sample surface to the tip of the objective lens and the direction of the fluorescence from the sample surface to be incident on the imaging optical system are opposite to each other, and the working distance has a negative value “( ⁇ t / 2)”.
  • the tip of the objective lens is the portion of the front lens 11 located most on the negative side of the Z axis (in other words, the fluorescent film Of the 13 points, it refers to the portion located on the negative side of the Z axis).
  • the working distance when the position of the tip of the objective lens coincides with the position of the sample surface, the working distance is zero.
  • the imaging lens 20 is inserted between the objective lens 10 and the image sensor 30 in the light path from the fluorescent scintillator (here, the fluorescent film 13) to the image sensor 30, and
  • the imaging lens drive unit 60 is used to adjust the position of the imaging lens 20 on the optical axis. Then, the fluorescence image is focused on the imaging surface of the image sensor 30 (that is, the fluorescent film 13 is in focus, in other words, the fluorescence image is focused on the image sensor 30).
  • the position of the imaging lens 20 may be adjusted and determined.
  • the optical path from the fluorescent scintillator (here, the fluorescent film 13) to the image sensor 30 is a straight optical path
  • the optical path is a broken optical path using a reflection optical system As well.
  • the imaging optical system it is preferable to correct the aberration (spherical aberration, chromatic aberration, etc.) of the imaging optical system by the objective lens 10.
  • the head lens 11 is made to function as a plano-convex lens by giving the shape of a plano-convex lens to the lens-like substrate 14, but according to the design of the objective lens 10, the shape of the lens-like substrate 14, thus the head
  • the shape of the lens 11 can be arbitrarily changed.
  • the top lens 11 functions as a plano-concave lens, a biconvex lens, a biconcave lens, a meniscus lens, an achromatic lens or a cemented lens, or as a lens array of these
  • the lens-like substrate 14 is shaped good.
  • the shape of these lenses is not limited to the spherical shape, and may be an aspherical shape.
  • the entrance surface is a flat surface and the emission surface is a convex surface
  • any of the front lenses 11a to 11g as shown in FIGS. May be used as the lead lens 11.
  • 13a to 13g denote the fluorescent film 13 in the front lenses 11a to 11g
  • 14a to 14g denote the lenticular substrate 14 in the front lenses 11a to 11g, respectively.
  • the incident surface means a surface disposed on the incident side of the incident light beam 100 among the surfaces of the front lens (ie, incident light A surface that receives 100, and indicates a fluorescence incident surface for the lens-like substrate, and an emission surface is a surface opposite to the surface disposed on the incident side of the incident light beam 100 (fluorescent for the lens-like substrate) Point at the exit surface of
  • the entrance surface is flat and the exit surface is concave.
  • the entrance surface is concave and the exit surface is flat.
  • the entrance surface is concave and the exit surface is concave.
  • the entrance surface is concave and the exit surface is convex.
  • the entrance surface is convex and the exit surface is flat.
  • the foremost lens 11 f the entrance surface is convex and the exit surface is concave.
  • the entrance surface is convex and the exit surface is convex.
  • the concave or convex incident surface means that the incident surface has a concave or convex surface. It is also possible that there is a portion which is flat on a part of the incident surface.
  • having the exit surface be concave or convex means that the exit surface has a concave or convex surface. There is also a possibility that there is a portion which is flat on a part of the exit surface.
  • the optional first lens described in the basic embodiment and the first embodiment and each embodiment described later when it has a concave surface or a convex surface in the incident surface, fluorescence obtained by receiving the incident light beam 100 with the fluorescent film of the first lens
  • the image by the image temporarily becomes an image on a curved surface, but the image on the curved surface is converted into an image on a plane in the objective lens 10 consisting of a plurality of lenses, and the image on the plane is an imaging lens
  • An image is formed on the imaging surface of the image sensor 30 through 20.
  • the image by the fluorescence from the fluorescent film is formed on the imaging surface of the image sensor 30 as a planar image.
  • An imaging optical system is formed to be imaged.
  • the projection method of the image by fluorescence onto the image sensor 30 is any of equidistant projection, isostatic projection, stereo projection and orthographic projection Also good.
  • a lens design method for converting an image on a curved surface formed by using a concave surface or a convex surface to an image on a plane is well known, and thus detailed description will be omitted.
  • the projection method of the image by fluorescence onto the image sensor 30 is central projection.
  • any leading lens described in the basic embodiment, the first embodiment and each embodiment described later may be formed as a cemented lens.
  • FIG. 7 shows a side view of the front lens 11 when the front lens 11 in the basic embodiment is formed as a cemented lens.
  • To form the front lens 11 as a cemented lens means that the lens-like substrate 14 in the front lens 11 is formed by bonding a plurality of lenses.
  • the lens-like substrate 14 is configured by bonding two lenses, but three or more lenses may be bonded to configure the lens-like substrate 14. The same applies to the case where the front lens other than the front lens 11 of the basic embodiment is formed as a cemented lens.
  • an angle formed by a vector indicating the traveling direction of the sample irradiation light beam before diffraction and a vector indicating the traveling direction of the sample irradiation light beam after diffraction is It is defined as an angle ⁇ .
  • the light image by diffraction contains the structural information of the sample SS, and the structural information with higher spatial resolution is included at the wider angle side (that is, as the diffraction angle ⁇ is larger). That is, it is necessary to achieve high resolution by observing the diffraction component on the wider angle side.
  • FIG. 9A shows a cross-sectional view of the lenticular substrate 14A with an arbitrary cross section orthogonal to the Z-axis.
  • the lenticular substrate 14A has two faces SF1A and SF2A facing each other, and the faces SF1A and SF2A correspond to the faces SF1 and SF2 in the basic embodiment, respectively (see FIG. 4A). That is, of the surfaces SF1A and SF2A, the surface SF1A corresponds to the incident surface, and the surface SF2A corresponds to the output surface.
  • the surface SF1A is concave and the surface SF2A is convex.
  • the front lens 11A is formed by bonding a fluorescent film 13A as a scintillator to the concave surface SF1A of the lens-like substrate 14A. That is, in the second embodiment, the front lens 11A, the fluorescent film 13A and the lens-like substrate 14A are used as the front lens 11, the fluorescent film 13 and the lens-like substrate 14.
  • the concave surface SF1A corresponds to half of a spherical surface (hereinafter may be referred to as a hemispherical surface), and in FIG. 10, the center of the spherical surface is represented by SO.
  • the concave surface SF1A is provided on the lens-like substrate 14A, but if attention is focused on the entire front lens 11A, it can be considered that the concave surface SF1A is an incident surface of the front lens 11A.
  • the sample SS can be disposed at the center of the above-mentioned spherical surface, and at this time, all incident light rays 100 having a diffraction angle ⁇ of 90 ° or less are incident on the fluorescent film 13A having the shape of concave SF1A It contributes to light emission.
  • reference numeral 18 conceptually denotes the rear stage component of the front lens 11A, and does not represent the shape of an actual rear stage component of the front lens 11 (in FIGS. 13 and 14 described later) The same is true).
  • the front lens 11A and the rear part components 18 shown in FIG. 11 correspond to cross sectional views of them, in FIG. 11 those parts are not hatched for the purpose of preventing complication of illustration (the like) The same applies to FIGS. 13 and 14 described later).
  • the fluorescent film 13A Based on the incidence of the incident light beam 100, the fluorescent film 13A acquires a spherical image by fluorescence. After an image by fluorescence from the fluorescent film 13A is converted from a spherical image (image on the spherical surface) to a planar image (image on the plane) by equal distance projection in the objective lens 10, it is imaged on the imaging sensor 30. Be done.
  • FIG. 12 shows a conceptual diagram of equidistant projection. As apparent from the comparison between FIG. 8 as a reference drawing and FIG. 11, according to the second embodiment, it is possible to observe the diffraction component on the wide angle side sufficiently with space saving (up to super wide angle) Diffraction signals of the incident light beam 100 can be acquired), and high spatial resolution can be obtained.
  • the concave surface SF1A may not be a spherical surface but an ellipsoidal surface. That is, for example, the concave surface SF1A may be half of an ellipsoidal surface (hereinafter, may be referred to as a semi-elliptic surface).
  • the sample SS can be placed at the center of the spherical or ellipsoidal surface, taking into account the acquisition maximization of the diffraction component on the wide-angle side, the symmetry of the image obtained, etc., but placing the sample SS at other positions Is also possible.
  • the acquisition range of the diffraction component on the wide-angle side narrows, if space is required due to the installation of the sample SS, etc.
  • the sample SS is located far from the concave surface SF1A compared to the center of the spherical or ellipsoidal surface. It is also possible to arrange. More specifically, for example, as shown in FIG.
  • the sample SS may be disposed at a position shifted from the center of the spherical or ellipsoidal surface by a predetermined distance in the direction opposite to the traveling direction of the sample irradiation beam.
  • the position of the sample SS can be considered to indicate the barycentric position or the center position of the sample SS.
  • reference numeral 70 denotes a sample supply device for supplying the sample SS to the shifted position. It is also possible to place the sample SS at a position closer to the concave surface SF1A than the center of the spherical or ellipsoidal surface.
  • the concave surface SF1A can be half of a spherical surface (hemispherical surface), it is also possible to make the concave surface SF1A part of a hemispherical surface. That is, even if concave surface SF1A has the shape of the smaller partial sphere of the two partial spheres (spherical crowns) formed when the entire spherical surface is divided by a plane not passing through the center of the spherical surface good. This can be particularly useful, for example, when space is required due to the installation of the sample SS. That is, in the case of adopting the arrangement example as shown in FIG. 13, it is also possible to make the concave surface SF1A part of the hemispherical surface as shown in FIG. Similarly, it is also possible to make concave SF1A part of a semi-elliptical surface.
  • the top lenses 11a to 11g are shown as modifications of the top lens 11 in the basic embodiment (see FIGS. 6A to 6G), the top lens of the second embodiment 11A is also an example of the front lens 11d of the first embodiment.
  • the shape of the lens-like substrate 14A may be modified such that the exit surface of the front lens 11A is flat or concave.
  • a convex lens array may be formed on the exit surface of the front lens 11 while the entrance surface of the front lens 11 is flat, concave or convex, or the entrance surface of the front lens 11 is flat, concave or convex
  • a concave lens array may be formed on the exit surface of the lens 11.
  • FIGS. 15 and 16 show a top lens 11P and a top lens 11Q as an example of the top lens 11 to which the lens array is applied.
  • the incident surface is flat and the convex lens array is formed on the exit surface.
  • the entrance surface is flat and the concave lens array is formed on the exit surface.
  • 13P and 13Q represent the fluorescent film 13 in the front lenses 11P and 11Q, respectively
  • 14P and 14Q represent the lenticular substrate 14 in the front lenses 11P and 11Q, respectively.
  • a plurality of convex surfaces are arranged in each of the X-axis direction and the Y-axis direction to form a convex lens array of the plurality of convex surfaces.
  • the plurality of convex surfaces may be arranged only in one of the X-axis direction and the Y-axis direction.
  • a plurality of concave surfaces are arranged in each of the X-axis direction and the Y-axis direction, whereby a concave lens array of a plurality of concave surfaces is formed.
  • the plurality of concave surfaces may be arranged only in one of the X-axis direction and the Y-axis direction.
  • FIG. 17 schematically shows the optical path of the fluorescence from the fluorescent film 13P when the front lens 11P is used.
  • the imaging lens 20 is not shown.
  • the fluorescence generated at a specific point on the fluorescent film 13P is condensed on a position on the image sensor 30 corresponding to the position of the specific point via any convex surface forming the convex lens array.
  • the front lens 11P is used, the non-front lens 12 can be unnecessary.
  • an optical system for imaging is separately required, such as disposing a convex lens array at a position facing the emission surface of the foremost lens 11Q.
  • the spatial resolution of the imaging apparatus 1 can not be made higher than that of the basic embodiment etc. However, it becomes possible to improve the light collection efficiency when using a large area scintillator.
  • ⁇ 4th Example A fourth embodiment will be described.
  • the front lens, the fluorescent film, and the lens-like substrate are the same as those described in any of the above-described basic embodiment and the first to third embodiments. It refers to a lens, a fluorescent film, and a lens-like substrate.
  • the fluorescent film functions as a scintillator, while the lenticular substrate does not function as a scintillator. That is, even if the incident light beam 100 is incident on the lens-like substrate, fluorescence is not generated in the lens-like substrate. However, when the incident light beam 100 is incident on the lens-like substrate, slight fluorescence may be generated in the lens-like substrate.
  • the material of the lens-like substrate (that is, the constituent material of the lens-like substrate) is the matrix of the scintillator.
  • the material of the lens-like substrate is not limited to this, and various solid optical materials can be adopted as the material of the lens-like substrate.
  • a lens-like substrate material solid optical material
  • the fluorescent film is formed of a material obtained by adding a predetermined additive to the material of the lens-like substrate, but the additive is not limited to the above-described one, and the fluorescent film functions as a scintillator.
  • the type of additive may be determined in consideration of the desired wavelength of fluorescence and the like. Also, the concentration of the additive in the fluorescent film can be arbitrarily determined.
  • the fluorescence emitted from the fluorescent film may be light classified as ultraviolet light or visible light, for example, in the range of 200 nm to 700 nm It has an inner wavelength.
  • the sample illumination beam and the incident beam 100 are radiation, so that the imaging device 1 can be referred to as a radiation imaging device.
  • Gamma rays, X-rays or UV radiation (especially for example extreme UV radiation) belong to radiation.
  • the imaging apparatus 1 can be used for X-ray imaging, X-ray CT, X-ray topography, X-ray imaging microscope, and the like.
  • an X-ray imaging apparatus can be configured that includes an X-ray generator 2 that generates X-rays and an imaging apparatus 1. The X-ray generated by the X-ray generator 2 is used as a sample irradiation beam.
  • the top lens is formed mainly including the lens-like substrate and the fluorescent film, but it is also possible to consider that the fluorescent film is not a component of the top lens. That is, it may be considered that the front lens is formed of a lens-like substrate, and a fluorescent film which is not a component of the front lens is bonded to the lens-like substrate.
  • the imaging device 1 as a radiation imaging device includes an optical element for a radiation imaging device.
  • the optical element for a radiation imaging apparatus includes at least an objective lens 10. It may be considered that the entire imaging optical system configured to include the objective lens 10 corresponds to an optical element for a radiation imaging apparatus.
  • the optical element for a radiation imaging apparatus converts incident light beam 100 having a relatively short wavelength WL1 into fluorescence having a relatively long wavelength WL2 with a scintillator (fluorescent film), and enlarges or reduces the image by the fluorescence as necessary. To form an image on the imaging surface of the image sensor 30.
  • the optical element W 1 for a radiation imaging apparatus has an objective lens (for example, 10), and in the optical element for a radiation imaging apparatus receiving an incidence of radiation, it receives the radiation and is longer than the radiation
  • a scintillator (for example, 13) which emits fluorescence of a wavelength is provided integrally with the objective lens on the incident side of the objective lens.
  • a lens for example 11 integrally provided with the scintillator, which is included in the objective lens, has a refractive index between the lens and the scintillator It is good to comprise with a solid optical material from which a difference becomes less than predetermined value.
  • an imaging optical system for forming an image by the fluorescence from the scintillator to the image sensor (e.g. 30), it may preferably provided in the radiation imaging apparatus for an optical element W 1.
  • an image with high spatial resolution can be acquired by the image sensor.
  • the objective lens has a curved surface with a concave surface or a convex surface on the incident side of the radiation, and a curved surface image by the fluorescence from the scintillator is formed on the curved surface.
  • the image optical system may form the curved surface image on a plane and form an image on the image sensor.
  • the imaging optical system is provided with the objective lens and an imaging lens, and in the optical path from the scintillator of the fluorescence to the image sensor, the imaging lens is Preferably, the position adjustment is disposed between the objective lens and the image sensor, and the image formed by the fluorescence is focused on the image sensor through the position adjustment of the imaging lens.
  • the working distance of the objective lens may be set to zero or minus by setting a sample surface in the scintillator.
  • the radiation imaging apparatus W 2 in accordance with one aspect of the present invention is characterized by comprising an image sensor, an optical element W 1 radiation imaging apparatus.
  • X-ray imaging apparatus W 3 an image sensor, an optical element W 1 radiation imaging apparatus, X-ray generation for generating X-rays as the radiation to the radiation imaging apparatus for an optical element W 1 And a device (for example, 2).
  • the configuration in which the scintillator is provided integrally with the objective lens on the incident side of the objective lens corresponds to a state in which the medium between the lens and the scintillator is filled with the lens constituent material. That is, the above-described configuration of the optical element W 1 for radiation imaging apparatus is configured by “having a scintillator that receives incident radiation and emits fluorescence having a wavelength longer than that of the radiation, and an objective lens disposed downstream of the scintillator An optical element for a radiation imaging apparatus, wherein the scintillator and the objective lens are filled with a solid optical material having a difference in refractive index between the scintillator and the objective lens equal to or less than a predetermined value (for example, 0.1%). Nevertheless, such a configuration should also be understood to belong to the optical element W 1 for a radiation imaging apparatus.

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PCT/JP2018/027073 2017-07-20 2018-07-19 放射線イメージング装置用光学素子、放射線イメージング装置及びｘ線イメージング装置 Ceased WO2019017425A1 (ja)

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US11137503B2 (en) 2021-10-05
DE112018003696B4 (de) 2025-12-04

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