WO2018205664A1 - 精细掩膜板支撑框架、精细掩膜板及其制备方法 - Google Patents

精细掩膜板支撑框架、精细掩膜板及其制备方法 Download PDF

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Publication number
WO2018205664A1
WO2018205664A1 PCT/CN2018/071600 CN2018071600W WO2018205664A1 WO 2018205664 A1 WO2018205664 A1 WO 2018205664A1 CN 2018071600 W CN2018071600 W CN 2018071600W WO 2018205664 A1 WO2018205664 A1 WO 2018205664A1
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WO
WIPO (PCT)
Prior art keywords
side wall
mask
adjustment
fine mask
fine
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/CN2018/071600
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English (en)
French (fr)
Inventor
林治明
李宝军
张健
孙朴
黄俊杰
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BOE Technology Group Co Ltd
Ordos Yuansheng Optoelectronics Co Ltd
Original Assignee
BOE Technology Group Co Ltd
Ordos Yuansheng Optoelectronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by BOE Technology Group Co Ltd, Ordos Yuansheng Optoelectronics Co Ltd filed Critical BOE Technology Group Co Ltd
Priority to US16/301,650 priority Critical patent/US10961616B2/en
Publication of WO2018205664A1 publication Critical patent/WO2018205664A1/zh
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K99/00—Subject matter not provided for in other groups of this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask

Definitions

  • the present disclosure relates to the field of display preparation technologies, and in particular, to a fine mask support frame, a fine mask, and a preparation method thereof.
  • an organic light-emitting layer is prepared by an OLED (Organic Light-Emitting Diode) using a vacuum evaporation technique.
  • OLED Organic Light-Emitting Diode
  • the organic material is deposited on the substrate above the evaporation source by high-temperature evaporation.
  • a high-precision mask is required under the substrate, that is, fine
  • the mask has a pre-designed effective opening area on the fine mask, through which the organic material is deposited onto the backing plate to form a predetermined pattern. The change in the size and position of the effective opening area on the fine mask directly affects the precision of the coating.
  • the fabrication of the fine mask is to solder the mask strip on the mask frame.
  • an external force is required to make the size and position of the opening on the mask strip to an appropriate precision, and accordingly, That is, it is required to use a pressing force on the mask frame, so that the mask strip can still be subjected to the same tensile force as before the welding (the tensile force is generated when the mask frame is restored and deformed) Force) to ensure that the effective opening area is unchanged before and after welding of the mask strip, but the pressing force on the mask frame set in the actual production is always fluctuating too much or too small, resulting in a mask The positional accuracy of the effective opening area before and after welding is different.
  • the effective opening area after welding is sometimes inwardly contracted (the pressing force is set too small), and sometimes it is outwardly expanded (the pressing force is set too). Big).
  • the longer the use of the fine mask the more slack the mask strip that has been soldered, and the larger the effective opening area of the fine mask, the lower the precision of the film formed by the fine mask.
  • An embodiment of the present disclosure provides a fine mask support frame, comprising: a plurality of frames, a plurality of the frames surrounding the mask area, and at least one pair of oppositely disposed two frames are provided with adjustment openings, each of which is provided The adjustment opening is provided with at least one adjusting member for adjusting the shape of the corresponding adjusting opening to adjust the deformation of the mask region.
  • each of the adjusting members includes: a screw and a lock nut, wherein two ends of the screw are respectively connected to the first side wall and the second side wall of the adjusting opening, a lock nut is disposed in the adjustment opening and is disposed on the screw, wherein the first side wall is provided with a threaded hole, and the second side wall is provided with a hole, the first side wall is longitudinally The length direction of the second side wall is the same as the length direction of the adjustment opening.
  • each of the adjusting members includes: a screw and two lock nuts, and two ends of the screw are respectively connected to the first side wall and the second side wall of the adjusting opening, two The locking nut is disposed in the adjusting opening and is disposed on the screw, wherein the first side wall and the second side wall are respectively provided with holes, and the length direction of the first side wall The length direction of the second side wall is the same as the length direction of the adjustment opening.
  • each of the adjustment members includes: a screw that passes through a first sidewall of the adjustment opening and a second sidewall of the adjustment opening, wherein the first a threaded hole is formed on the side wall, and the length direction of the first side wall and the length direction of the second side wall are the same as the length direction of the adjusting opening, the first side wall The second sidewall is away from the mask region.
  • the first side wall and the second side wall can be concave or outward by rotating the screw, and the adjustment is convenient.
  • each of the adjusting members includes: a screw that is inserted through a first side wall of the adjusting opening and a second side wall of the adjusting opening, wherein the a threaded hole is formed on the first side wall, and the second side wall is provided with a blind hole.
  • the length direction of the first side wall and the length direction of the second side wall are both The length direction of the adjustment opening is the same, and the first sidewall is away from the mask region with respect to the second sidewall.
  • the first side wall and the second side wall can be concave or outward by rotating the screw, and the adjustment is convenient.
  • each of the adjusting members includes: a screw threadedly connected to a second side wall of the adjusting opening through a first side wall of the adjusting opening, wherein the a sidewall is provided with a through hole for engaging with the screw, and the second sidewall is provided with a threaded hole, and a length direction of the first sidewall and a length direction of the second sidewall are both
  • the length direction of the adjustment opening is the same, and the first side wall is away from the mask area with respect to the second side wall.
  • the first side wall and the second side wall can be concave or outward by rotating the screw, and the adjustment is convenient.
  • the length of each of the adjustment openings is greater than or equal to one-half of the length of the frame on which it is located and less than or equal to seven-seventh the length of the frame on which it is located.
  • the embodiment of the present disclosure further provides a fine mask, comprising: the fine mask support frame according to any one of the above, and a mask strip covering the mask area of the fine mask support frame The mask strip is relatively fixed to the fine mask support frame.
  • the length direction of the adjustment opening is perpendicular to the length direction of the mask strip. This adjustment effect is more obvious, and the adjustment is more convenient.
  • the number of the adjusting members provided on each of the adjusting openings is the same as the number of the mask strips.
  • the embodiment of the present disclosure further provides a method for preparing a fine mask, comprising:
  • the adjustment member is adjusted to adjust the shape of the corresponding adjustment opening such that the tension applied to the mask strip before and after being fixed is the same.
  • the method further includes:
  • a pressing force is applied to the side wall of the adjustment opening adjacent to the mask area by the adjusting member.
  • FIG. 1 is a first structural schematic view of a fine mask support frame according to an embodiment of the present disclosure
  • FIG. 2a is a schematic view showing a state of a second structure of a fine mask support frame according to an embodiment of the present disclosure
  • 2b is another schematic diagram of a second structure of a fine mask support frame according to an embodiment of the present disclosure
  • 3a is a schematic view showing a state of a third structure of a fine mask support frame according to an embodiment of the present disclosure
  • FIG. 3b is another schematic diagram of a third structure of a fine mask support frame according to an embodiment of the present disclosure.
  • FIG. 4a is a schematic view showing a state of a fourth structure of a fine mask supporting frame according to an embodiment of the present disclosure
  • 4b is another schematic diagram of a fourth structure of a fine mask support frame according to an embodiment of the present disclosure.
  • FIG. 5 is a schematic diagram of a state of a fifth structure of a fine mask support frame according to an embodiment of the present disclosure
  • FIG. 5b is another schematic diagram of a fifth structure of a fine mask support frame according to an embodiment of the present disclosure.
  • FIG. 6 is a schematic structural diagram of a fine mask according to an embodiment of the present disclosure.
  • FIG. 7 is a flow chart of preparing a fine mask according to an embodiment of the present disclosure.
  • an embodiment of the present disclosure provides a fine mask support frame 1 , including: a plurality of frames 11 , a plurality of frames 11 enclosing a mask region 12 , and at least one pair of oppositely disposed two frames 11 .
  • Adjusting openings 13 are provided, and each adjusting opening 13 is provided with at least one adjusting member 14 for adjusting the shape of the corresponding adjusting opening 13 to adjust the deformation of the mask region 12.
  • the fine mask support frame 1 provided by the present disclosure can change the deformation of the adjustment opening 13 by providing the adjustment opening 13 and the adjustment member 14, and the deformation of the mask region 12 can be adjusted by changing the shape of the adjustment opening 13.
  • the mask strip is subjected to a pulling force before being placed on the fine mask supporting frame 1. After the mask strip is fixed on the mask supporting frame 1, it can still receive the same pulling force as before being fixed. A pressing force is applied to the mask supporting frame 1 so that the pulling force received before and after the fixing of the mask strip is constant. During the process of soldering the mask strip, as the pressing force of the fine mask is gradually reduced, the mask supporting frame 1 will be restored and deformed, and the mask supporting frame 1 will be welded thereon.
  • the strip applies a pulling force, and when the pulling force of the mask supporting frame 1 to the mask strip and the tension of the mask strip before being fixed are unbalanced, the deformation of the mask region 12 can be adjusted by changing the shape of the adjusting opening 13, and then Adjusting the tension applied to the mask strip fixed on the mask support frame 1 so that the tension of the mask strip before and after being fixed is equal, thereby ensuring the positional accuracy of the opening on the mask strip in the soldering
  • the front and the same after soldering improve the positional accuracy of the opening area of the mask, and the mask precision can be improved.
  • the specific structure of the above adjustment member can be various:
  • each adjusting member comprises: a screw 141 and a lock nut 142, the two ends of the screw 141 and the first side wall 111 of the adjusting opening 13 respectively
  • the second side wall 112 is connected, and the lock nut 142 is disposed in the adjusting opening 13 and is disposed on the screw 141.
  • the first side wall 111 is provided with a threaded hole, and the second side wall 112 is provided with a hole.
  • the second side wall 112 is provided with a threaded hole, and the first side wall 111 is provided with a hole; the longitudinal direction of the first side wall 111 and the longitudinal direction of the second side wall 112 are both the same as the longitudinal direction of the adjustment opening 13.
  • a side wall of the first sidewall 111 and the second sidewall 112 adjacent to the mask region 12 may be concave or outwardly formed by rotating the nut 142 to realize The change of the tension applied to the covered mask strip is convenient to adjust.
  • each adjusting member comprises: a screw 141 and two lock nuts 142, and the two ends of the screw 141 and the first side wall 111 of the adjusting opening respectively
  • the second side wall 112 is connected to the second side wall 112.
  • the two locking nuts 142 are disposed in the adjusting opening and are disposed on the screw 141.
  • the first side wall 111 and the second side wall 112 are respectively provided with holes, and the length direction of the first side wall 111 is Both the longitudinal direction of the second side wall 112 and the longitudinal direction of the adjustment opening 13 are the same.
  • the lock nut 142 narrows the width of the adjustment opening 13 such that both sides of the mask region 12 adjacent to the adjustment opening 13 (ie, the left and right sides of the illustrated orientation) are outwardly expanded, and the upper and lower sides are contracted inwardly.
  • the fine mask support frame will give an outward pulling force to the fixed mask strip (the direction of the pulling force is as indicated by the arrow in Fig. 3a), so that the tension applied before the mask strip is fixed and after being fixed The tension is the same.
  • the width of the adjustment opening 13 is widened, so that the two sides of the mask region 12 adjacent to the adjustment opening 13 (ie, the left and right sides of the illustrated orientation) are contracted inwardly, and the upper and lower sides are outwardly Expansion, at this time, the fine mask support frame will give an inward relaxation force to the fixed mask strip (the direction of the relaxation force is as indicated by the arrow in Fig. 2b), so that the left and right sides of the mask strip shrink.
  • the mask strip is relaxed such that the tension applied to the mask strip before it is fixed is the same as the tension applied after being fixed.
  • each adjusting member comprises: a screw 143 passing through the first side wall 111 of the adjusting opening 13 and the second side wall of the adjusting opening 13 112, wherein the first side wall 111 is provided with a threaded hole that cooperates with the screw 143, and the longitudinal direction of the first side wall 111 and the longitudinal direction of the second side wall 112 are the same as the length direction of the adjustment opening 13, the first side The wall 111 is away from the mask region 12 with respect to the second side wall 112.
  • the screw can be loosened 143, the force of the screw 143 abutting against the second side wall 112 is reduced, thereby causing the second side wall 112 to expand outward, so that the mask area 12 and the adjustment opening 13 are adjacent to each other (ie, the orientation of the figure The left and right sides are outwardly expanded, and the upper and lower sides are contracted inwardly.
  • the fine mask supporting frame will give a pulling force to the fixed mask strip (the direction of the pulling force is as shown by the arrow in FIG. 4a). Direction), so that the pressure before the mask strip is fixed is the same as the pressure after being fixed.
  • the mask strip is shrunk and the mask strip is relaxed, so that the tension applied before the mask strip is fixed is the same as the tension applied after being fixed.
  • each of the adjusting members includes: a screw 143 that is inserted through the first side wall 111 of the adjusting opening 13 and the second side wall 112 of the adjusting opening 13 is inserted, wherein the first side The wall 111 is provided with a threaded hole for engaging with the screw 143, and the second side wall 112 is provided with a blind hole.
  • the longitudinal direction of the first side wall 111 and the longitudinal direction of the second side wall 112 are the same as the length direction of the adjustment opening 13.
  • the first sidewall 111 is away from the mask region 12 with respect to the second sidewall 112.
  • the screw can be loosened 143, the screw 143 will give an outward pulling force to the second side wall 112, so that the second side wall 112 is outwardly expanded, thereby making the mask area 12 and the two sides adjacent to the adjustment opening 13 (ie, the left and right sides of the illustrated orientation) The side is outwardly expanded, and the upper and lower sides are contracted inwardly.
  • the fine mask supporting frame will give a pulling force to the fixed mask strip (the direction of the pulling force is as indicated by the arrow in FIG. 5a).
  • the tensile force to which the mask strip is fixed is the same as the tensile force after being fixed.
  • the fixed mask strip is in the stretched state, that is, the pulling force before the mask strip is fixed is less than the pulling force of the mask strip when the fine mask supporting frame is deformed, as shown in FIG. 5b
  • the second side wall 112 is inflated by tightening the screw 143 so that the second side wall 112 is inwardly expanded, so that the two sides of the mask area 12 adjacent to the adjustment opening 13 (ie, the left and right sides of the illustrated orientation) are inward. Shrink, and the upper and lower sides expand outward.
  • the fine mask support frame will give an inward relaxation force to the fixed mask strip (the direction of the relaxation force is as indicated by the arrow in Figure 5b), so that the mask is hidden.
  • the strip shrinks so that the tension applied to the mask strip before it is fixed is the same as the tension applied after being fixed.
  • each adjusting member comprises: a screw 143 through which the first side wall 111 of the adjusting opening 13 is screwed with the second side wall 112 of the adjusting opening 13 , wherein the first side wall The through hole is matched with the screw 143, and the second side wall 112 is provided with a threaded hole.
  • the longitudinal direction of the first side wall 111 and the longitudinal direction of the second side wall 112 are the same as the length direction of the adjustment opening 13.
  • the first sidewall 111 is away from the mask region 12 with respect to the second sidewall 112.
  • the specific adjustment process is as described in the above embodiment.
  • the first side wall 111 and the second side wall 112 can be concave or outward by rotating the screw 143, and the adjustment is convenient.
  • the adjusting member when the adjusting member is adjusted, only one side wall of the first sidewall 111 and the second sidewall 112 adjacent to the mask region 12 may be deformed, and away from the side of the mask region 12 .
  • the wall does not deform.
  • a certain force can be applied to the adjustment member in advance, so that the effect can be better achieved by the increase and decrease of the force.
  • the lengthwise direction of the two adjustment openings 13 is perpendicular to the longitudinal direction of the mask strip fixed on the fine mask support frame.
  • each adjustment opening 13 is the same as the number of mask strips.
  • each adjustment opening 13 is greater than or equal to one-half of the length of the bezel 11 in which it is located and less than or equal to seven-sevenths of the length of the bezel 11 in which it is located.
  • the adjustment convenience of the fine mask support frame can be improved while ensuring the support strength of the fine mask support frame.
  • the width of the two adjustment openings 13 along the direction in which they are arranged may be set as needed.
  • the width is relatively small, and the adjustment member includes a nut. 142, the width of the adjustment opening 13 is set to accommodate the nut 142 and to reserve some of the clearance required for the adjustment of the nut 142.
  • the present disclosure further provides a fine mask comprising: the fine mask support frame according to any one of the above, and covering the mask region 12 of the fine mask support frame.
  • the mask strip 4, the mask strip 4 and the fine mask support frame are relatively fixed. Since the fine mask support frame can improve the positional accuracy of the open area of the mask, the fine mask provided by the embodiment of the present disclosure has higher mask precision.
  • the fine mask further comprises: a shielding strip 2 and a vertical supporting strip 3 respectively welded in the lateral direction of the fine mask supporting frame, and the shielding strip 2 functions to block the gap between the mask strips 4,
  • the support strip 3 mainly serves to support the mask strip 4.
  • a plurality of openings 5 are provided in the mask strip 4.
  • the welding of the shielding strip 2 and the support strip 3 is completed before the mask strip 4 is welded, and it is not necessary to use a pressing force for the fine mask supporting frame when welding them, but when welding the mask strip 4, it is required
  • the external force is used to achieve the appropriate precision of the opening 5 on the mask strip 4, and the corresponding pressing force is required to act on the fine mask supporting frame, so that the mask strip 4 can still receive the same tensile force as before welding (
  • the pulling force is the force generated by the mask strip 4 on which the fine mask support frame is deformed when it is deformed to ensure that the effective opening area of the mask strip 4 before and after the soldering is unchanged.
  • the lengthwise direction of the two adjustment openings 13 is perpendicular to the longitudinal direction of the mask strip 4.
  • each adjustment opening 13 is the same as the number of mask strips 4.
  • the present disclosure also provides a method for preparing a fine mask, comprising:
  • Step S801 providing a fine mask supporting frame, wherein the fine mask supporting frame adopts the fine mask supporting frame according to any one of the above.
  • Step S802 applying a force to the fine mask support frame
  • Step S803 fixing the mask strip to which the first pulling force is applied to the fine mask supporting frame
  • Step S804 adjusting the adjusting member to adjust the shape of the corresponding adjusting opening so that the pulling force received before and after the fixing of the mask strip is the same.
  • the force may be a pressing force or a pulling force.
  • the external force applying device applies a force on the side wall of the adjusting opening away from the mask area.
  • the pulling force is applied, the external force applying device acts as a force.
  • On the side wall of the adjustment opening close to the mask area.
  • the adjustment member When the adjustment member is adjusted, the adjustment member may be adjusted after the mask strips are fixed, or may be adjusted once for each mask strip.
  • step S802 applying a force to the fine mask support frame, further comprising:
  • a pressing force is applied to the side wall of the adjustment opening near the mask area by the adjusting member.
  • the pre-applied pressing force can cause the fine mask supporting frame to be deformed in advance, so that when the tension of the mask strip needs to be reduced or increased, the deformation of the fine mask supporting frame can be easily adjusted, and the adjustment is convenient. Sex.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
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Abstract

一种精细掩膜板支撑框架（1），包括：多个边框（11），多个边框(11)围成掩膜区域（12），其中，至少一对相对设置的两个边框（11）上设有调节开口（13），每个调节开口（13）上设有至少一个调节件（14），调节件（14）用于调节对应的调节开口（13）的形状、以调节掩膜区域（12）的形变。还公开了一种精细掩膜板及其制备方法。

Description

精细掩膜板支撑框架、精细掩膜板及其制备方法
本公开要求在2017年05月12日提交中国专利局、申请号为201710333242.6、发明名称为“精细掩膜板支撑框架、精细掩膜板及其制备方法”的中国专利申请的优先权，该申请的全部内容通过引用结合在本公开中。
技术领域
本公开涉及显示器制备技术领域，尤其涉及一种精细掩膜板支撑框架、精细掩膜板及其制备方法。
背景技术
目前OLED(Organic Light-Emitting Diode，有机发光二极管)采用真空蒸镀技术制备有机发光层。在器件制备过程中，有机材料通过高温蒸镀淀积在位于蒸发源上方的基板上，为使有机材料按照设计蒸镀到特定的位置上，在基板下方需使用高精度掩膜板、即精细掩膜板，精细掩膜板上留有预先设计好的有效开口区域，通过该有效开口区域，有机材料沉积到背板上面，形成预设图形。精细掩膜板上有效开口区域的尺寸、位置的变化会直接影响镀膜的精度。
目前精细掩膜板的制作是在掩膜板框架上焊接掩膜条，但是，在焊接掩膜条的时候，需要用外力使得掩膜条上的开口尺寸和位置达到合适的精度，相应地，即需要使用挤压力作用在掩膜板框架上，使得掩膜条焊接后仍然可以受到与焊接前相同的拉力(该拉力为掩膜板框架恢复形变时对其上焊接的掩膜条所产生的力)，以保证掩膜条焊接之前和焊接之后有效开口区域不变，但是实际生产中设定的对掩膜板框架的挤压力总是在过大或者过小中波动，导致掩膜条在焊接之前和焊接之后的有效开口区域位置精度不同，焊接之后的有效开口区域有时候向内缩(挤压力设定的过小)，也有时候向外扩张(挤压力设定的过大)。同时随着精细掩膜板使用时间越长，已经焊接成型的掩膜条 越松弛，精细掩膜板的有效开口区域变形越大，导致采用该精细掩膜板形成的膜层精度较低。
发明内容
本公开实施例提供了一种精细掩膜板支撑框架，包括：多个边框，多个所述边框围成掩膜区域，至少一对相对设置的两个边框上设有调节开口，每个所述调节开口上设有至少一个调节件，所述调节件用于调节对应的所述调节开口的形状、以调节所述掩膜区域的形变。
本公开的某一实施例中，每个所述调节件包括：螺杆和一个锁紧螺母，所述螺杆的两端分别与所述调节开口的第一侧壁和第二侧壁连接，所述锁紧螺母在所述调节开口内且套装于所述螺杆，其中所述第一侧壁上设有螺纹孔、所述第二侧壁上设有孔，所述第一侧壁的长度方向、所述第二侧壁的长度方向均与所述调节开口的长度方向相同。通过旋转螺母可以实现第一侧壁和第二侧壁中靠近掩膜区域的一侧壁内凹或外张，以实现其上覆盖的掩膜条所受的拉力，调节起来较方便。
本公开的某一实施例中，每个所述调节件包括：螺杆和两个锁紧螺母，所述螺杆的两端分别与所述调节开口的第一侧壁和第二侧壁连接，两个所述锁紧螺母在所述调节开口内且套装于所述螺杆，其中所述第一侧壁和所述第二侧壁上均设有孔，所述第一侧壁的长度方向、所述第二侧壁的长度方向均与所述调节开口的长度方向相同。通过旋转两个螺母可以实现第一侧壁和第二侧壁中靠近掩膜区域的一侧壁内凹或外张，以实现其上覆盖的掩膜条所受的拉力，调节起来较方便。
本公开的某一实施例中，每个所述调节件包括：螺钉，所述螺钉穿过所述调节开口的第一侧壁与所述调节开口的第二侧壁相抵，其中所述第一侧壁上设有与所述螺钉配合的螺纹孔，所述第一侧壁的长度方向、所述第二侧壁的长度方向均与所述调节开口的长度方向相同，所述第一侧壁相对所述第二侧壁远离所述掩膜区域。通过旋转螺钉可以实现第一侧壁和第二侧壁内凹或 外张，调节较方便。
本公开的某一实施例中，每个所述调节件包括：螺钉，所述螺钉穿过所述调节开口的第一侧壁与所述调节开口的第二侧壁插合连接，其中所述第一侧壁上设有与所述螺钉配合的螺纹孔，所述第二侧壁上设有盲孔，所述第一侧壁的长度方向、所述第二侧壁的长度方向均与所述调节开口的长度方向相同，所述第一侧壁相对所述第二侧壁远离所述掩膜区域。通过旋转螺钉可以实现第一侧壁和第二侧壁内凹或外张，调节较方便。
本公开的某一实施例中，每个所述调节件包括：螺钉，所述螺钉穿过所述调节开口的第一侧壁与所述调节开口的第二侧壁螺纹连接，其中所述第一侧壁上设有与所述螺钉配合的通孔，所述第二侧壁上设有螺纹孔，所述第一侧壁的长度方向、所述第二侧壁的长度方向均与所述调节开口的长度方向相同，所述第一侧壁相对所述第二侧壁远离所述掩膜区域。通过旋转螺钉可以实现第一侧壁和第二侧壁内凹或外张，调节较方便。
本公开的某一实施例中，每个所述调节开口的长度大于等于其所在的边框的长度的二分之一且小于等于其所在的边框的长度的九分之七。
本公开实施例还提供了一种精细掩膜板，包括：上述任一项所述的精细掩膜板支撑框架，以及覆盖于所述精细掩膜板支撑框架的掩膜区域上的掩膜条，所述掩膜条与所述精细掩膜板支撑框架相对固定。
本公开的某一实施例中，所述调节开口的长度方向与所述掩膜条的长度方向垂直。这样调节起来效果较明显，调节较方便。
本公开的某一实施例中，每个所述调节开口上设有的所述调节件的个数与所述掩膜条的个数相同。
本公开实施例还提供了一种精细掩膜板的制备方法，包括：
提供一如上述任一项所述的精细掩膜板支撑框架；
对所述精细掩膜板支撑框架施加作用力；
将施加有第一拉力的掩膜条固定于所述精细掩膜板支撑框架；
调节所述调节件以调节对应的所述调节开口的形状，以使所述掩膜条被 固定前和固定后所受到的拉力相同。
本公开的某一实施例中，在所述提供一上述任一项所述的精细掩膜板支撑框架和所述对所述精细掩膜板支撑框架施加作用力之间，还包括：
通过所述调节件对所述调节开口靠近所述掩膜区域的侧壁施加挤压力。
附图说明
图1为本公开实施例提供的精细掩膜板支撑框架的第一种结构示意图；
图2a为本公开实施例提供的精细掩膜板支撑框架的第二种结构的一种状态示意图；
图2b为本公开实施例提供的精细掩膜板支撑框架的第二种结构的另一种状态示意图；
图3a为本公开实施例提供的精细掩膜板支撑框架的第三种结构的一种状态示意图；
图3b为本公开实施例提供的精细掩膜板支撑框架的第三种结构的另一种状态示意图；
图4a为本公开实施例提供的精细掩膜板支撑框架的第四种结构的一种状态示意图；
图4b为本公开实施例提供的精细掩膜板支撑框架的第四种结构的另一种状态示意图；
图5a为本公开实施例提供的精细掩膜板支撑框架的第五种结构的一种状态示意图；
图5b为本公开实施例提供的精细掩膜板支撑框架的第五种结构的另一种状态示意图；
图6为本公开实施例提供的精细掩膜板的结构示意图；
图7为本公开实施例提供的精细掩膜板的制备流程图。
附图标记：
1-掩膜板支撑框架                 11-边框
111-第一侧壁                     112-第二侧壁
12-掩膜区域                      13-调节开口
14-调节件                        141-螺杆
142-螺母                         143-螺钉
2-遮挡条                         3-支撑条
4-掩膜条                         5-开口
具体实施方式
下面将结合本公开实施例中的附图，对本公开实施例中的技术方案进行清楚、完整地描述，显然，所描述的实施例仅仅是本公开一部分实施例，而不是全部的实施例。基于本公开中的实施例，本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例，都属于本公开专利保护的范围。
如图1所示，本公开实施例提供了一种精细掩膜板支撑框架1，包括：多个边框11，多个边框11围成掩膜区域12，至少一对相对设置的两个边框11上设有调节开口13，每个调节开口13上设有至少一个调节件14，调节件14用于调节对应的调节开口13的形状以调节掩膜区域12的形变。
本公开提供的精细掩膜板支撑框架1，通过设置的调节开口13和调节件14可以改变调节开口13的形变，通过改变调节开口13的形状可以调节掩膜区域12的形变。掩膜条在放置在精细掩膜板支撑框架1上之前会受到一个拉力，为了使得掩膜条被固定在掩膜板支撑框架1上后，仍可以受到与其被固定前一样的拉力，会预先给掩膜板支撑框架1一个挤压力，使得掩膜条固定前和固定后受到的拉力不变。在焊接掩膜条过程中，随着精细掩膜板所受的挤压力逐渐减小，掩膜板支撑框架1将恢复形变，此时掩膜板支撑框架1会对其上焊接的掩膜条施加拉力，当掩膜板支撑框架1给掩膜条的拉力与掩膜条在被固定前受到的拉力不平衡时，通过改变调节开口13的形状可以调节掩膜区域12的形变，进而可以调节固定在掩膜板支撑框架1上的掩膜条所受到 的拉力，使得掩膜条在被固定前和固定后所受的拉力相等，进而可以保证掩膜条上的开口的位置精度在焊接前和焊接后相同，提高掩膜板的开口区域的位置精度，进而可以提高掩膜精度。
上述调节件的具体结构可以有多种：
一种可选的实施方式中，如图2a和图2b所示，每个调节件包括：螺杆141和一个锁紧螺母142，螺杆141的两端分别与调节开口13的第一侧壁111和第二侧壁112连接，锁紧螺母142在调节开口13内且套装于螺杆141，其中第一侧壁111上设有螺纹孔、第二侧壁112上设有孔，或者，也可以是，第二侧壁112上设有螺纹孔、第一侧壁111上设有孔；第一侧壁111的长度方向和第二侧壁112的长度方向均与调节开口13的长度方向相同。具体地，通过旋转螺母142可以实现第一侧壁111和第二侧壁112中靠近掩膜区域12的一侧壁(如图中的第二侧壁112)内凹或外张，以实现其上覆盖的掩膜条所受的拉力的改变，调节起来较方便。
另一种可选的实施方式中，如图3a和图3b所示，每个调节件包括：螺杆141和两个锁紧螺母142，螺杆141的两端分别与调节开口的第一侧壁111和第二侧壁112连接，两个锁紧螺母142在调节开口内且套装于螺杆141，其中第一侧壁111和第二侧壁112上均设有孔，第一侧壁111的长度方向和第二侧壁112的长度方向均与调节开口13的长度方向相同。当固定后的掩膜条处于收缩状态时，即掩膜条被固定前的拉力大于精细掩膜板支撑框架恢复形变时给掩膜条的拉力时，如图3a所示，可以通过调节两个锁紧螺母142使得调节开口13宽度变窄，使得掩膜区域12与调节开口13相邻的两侧(即图示方位的左右两侧)向外扩张、而上下两侧向内收缩，此时精细掩膜板支撑框架会给其上固定的掩膜条一个向外拉的拉力(拉力的方向如图3a中箭头所示方向)，使得掩膜条被固定前所受到的拉力和被固定后所受的拉力相同。相反的，当固定后的掩膜条处于拉伸状态时，即掩膜条被固定前的拉力小于精细掩膜板支撑框架恢复形变时给掩膜条的拉力时，如图3b所示，可以通过调节两个锁紧螺母142使得调节开口13宽度变宽，使得掩膜区域12与调节开口 13相邻的两侧(即图示方位的左右两侧)向内收缩、而上下两侧向外扩张，此时精细掩膜板支撑框架会给其上固定的掩膜条一个向内的松弛力(松弛力的方向如图2b中箭头所示方向)，使得掩膜条的左右两侧收缩，掩膜条松弛，使得掩膜条被固定前所受到的拉力和被固定后所受的拉力相同。通过上述调节可以提高掩膜板的开口区域的位置精度，进而可以提高掩膜精度。
又一种可选的实施方式中，如图4a和图4b所示，每个调节件包括：螺钉143，螺钉143穿过调节开口13的第一侧壁111与调节开口13的第二侧壁112相抵，其中第一侧壁111上设有与螺钉143配合的螺纹孔，第一侧壁111的长度方向和第二侧壁112的长度方向均与调节开口13的长度方向相同，第一侧壁111相对第二侧壁112远离掩膜区域12。当固定后的掩膜条处于收缩状态时，即掩膜条被固定前的拉力大于精细掩膜板支撑框架恢复形变时给掩膜条的拉力时，如图4a所示，可以通过旋松螺钉143，使得螺钉143与第二侧壁112相抵的作用力减小，进而使得第二侧壁112向外扩张，从而使掩膜区域12与调节开口13相邻的两侧(即图示方位的左右两侧)向外扩张、而上下两侧向内收缩，此时精细掩膜板支撑框架会给其上固定的掩膜条一个向外拉的拉力(拉力的方向如图4a中箭头所示方向)，使得掩膜条被固定前所受到的压力和被固定后所受的压力相同。相反的，当固定后的掩膜条处于拉伸状态时，即掩膜条被固定前的拉力小于精细掩膜板支撑框架恢复形变时给掩膜条的拉力时，如图4b所示，可以通过旋紧螺钉143，使得螺钉143对第二侧壁112的作用力增大，进而使得第二侧壁112向内扩张，掩膜区域12与调节开口13相邻的两侧(即图示方位的左右两侧)向内收缩、而上下两侧向外扩张，此时精细掩膜板支撑框架会给其上固定的掩膜条一个向内的松弛力(松弛力的方向如图4b中箭头所示方向)，使得掩膜条收缩，掩膜条松弛，使得掩膜条被固定前所受到的拉力和被固定后所受的拉力相同。通过上述调节可以提高掩膜板的开口区域的位置精度，进而可以提高掩膜精度。
又一种可选的实施方式中，每个调节件包括：螺钉143，螺钉143穿过调节开口13的第一侧壁111与调节开口13的第二侧壁112插合连接，其中第一 侧壁111上设有与螺钉143配合的螺纹孔，第二侧壁112上设有盲孔，第一侧壁111的长度方向和第二侧壁112的长度方向均与调节开口13的长度方向相同，第一侧壁111相对第二侧壁112远离掩膜区域12。当固定后的掩膜条处于收缩状态时，即掩膜条被固定前的拉力大于精细掩膜板支撑框架恢复形变时给掩膜条的拉力时，如图5a所示，可以通过旋松螺钉143，螺钉143会给第二侧壁112一个向外的拉力，使得第二侧壁112向外扩张，进而使得掩膜区域12与调节开口13相邻的两侧(即图示方位的左右两侧)向外扩张、而上下两侧向内收缩，此时精细掩膜板支撑框架会给其上固定的掩膜条一个向外拉的拉力(拉力的方向如图5a中箭头所示方向)，使得掩膜条被固定所受到的拉力和被固定后所受的拉力相同。相反的，当固定后的掩膜条处于拉伸状态时，即掩膜条被固定前的拉力小于精细掩膜板支撑框架恢复形变时给掩膜条的拉力时，如图5b所示，可以通过旋紧螺钉143挤压第二侧壁112，使得第二侧壁112向内扩张，进而使得掩膜区域12与调节开口13相邻的两侧(即图示方位的左右两侧)向内收缩、而上下两侧向外扩张，此时精细掩膜板支撑框架会给其上固定的掩膜条一个向内的松弛力(松弛力的方向如图5b中箭头所示方向)，使得掩膜条收缩，从而使得掩膜条被固定前所受到的拉力和被固定后所受的拉力相同。通过上述调节可以提高掩膜板的开口区域的位置精度，进而可以提高掩膜精度。
再一种可选的实施方式中，每个调节件包括：螺钉143，螺钉143穿过调节开口13的第一侧壁111与调节开口13的第二侧壁112螺纹连接，其中第一侧壁111上设有与螺钉143配合的通孔，第二侧壁112上设有螺纹孔，第一侧壁111的长度方向和第二侧壁112的长度方向均与调节开口13的长度方向相同，第一侧壁111相对第二侧壁112远离掩膜区域12。具体的调节过程如上一实施方式中所述的过程，通过旋转螺钉143可以实现第一侧壁111和第二侧壁112内凹或外张，调节较方便。
上述任一实施方式中，调节件在调节时，也可以只让第一侧壁111和第二侧壁112中靠近掩膜区域12的一侧壁发生形变，而远离掩膜区域12的一 侧壁不产生形变。
为了使得调节开口13实现更好的调节作用，可以预先给调节件施加一定的作用力，这样可以通过作用力的增加和减小来更好的达到效果。
为了使得调节时掩膜区域12形变明显些，两个调节开口13的长度方向与精细掩膜板支撑框架上固定的掩膜条的长度方向垂直。
为了便于调节，每个调节开口13上设有的调节件的个数与掩膜条的个数相同。
可选的，每个调节开口13的长度大于等于其所在的边框11的长度的二分之一且小于等于其所在的边框11的长度的九分之七。可以在保证精细掩膜板支撑框架的支撑强度的同时，提高精细掩膜板支撑框架的调节方便性。
需要说明的是，两个调节开口13沿其排列方向上的宽度可以根据需要设定，为了保证精细掩膜板支撑框架的支撑强度，该宽度设置的相对小一些较好，若调节件包括螺母142，调节开口13的宽度设置可以容纳螺母142并预留一些螺母142调节时需要的间隙即可。
如图6所示，本公开还提供了一种精细掩膜板，包括：上述任一项所述的精细掩膜板支撑框架，以及覆盖于精细掩膜板支撑框架的掩膜区域12上的掩膜条4，掩膜条4与精细掩膜板支撑框架相对固定。由于上述精细掩膜板支撑框架可以提高掩膜板的开口区域的位置精度，故本公开实施例提供的精细掩膜板具有较高的掩膜精度。
上述精细掩膜板一般还包括：分别焊接在精细掩膜板支撑框架的横向上的遮挡条2和竖向的支撑条3，遮挡条2的作用是遮挡各个掩膜条4之间的缝隙，支撑条3主要起支撑掩膜条4的作用。掩膜条4上设有多个开口5。遮挡条2和支撑条3的焊接都是在掩膜条4焊接之前完成的，并且焊接它们时不需要对精细掩膜板支撑框架使用挤压力，但是在焊接掩膜条4的时候，需要用外力使得掩膜条4上的开口5达到合适的精度，相应的需要使用挤压力作用在精细掩膜板支撑框架上，使得掩膜条4焊接后仍然可以受到与焊接前相同的拉力(该拉力为精细掩膜板支撑框架恢复形变时对其上焊接的掩膜条4 所产生的力)，以保证掩膜条4焊接之前和焊接之后有效开口区域不变。
为了使得调节时掩膜区域12形变明显些，两个调节开口13的长度方向与掩膜条4的长度方向垂直。
为了便于调节，每个调节开口13上设有的调节件的个数与掩膜条4的个数相同。
如图7所示，本公开还提供了一种精细掩膜板的制备方法，包括：
步骤S801：提供一精细掩膜板支撑框架，该精细掩膜板支撑框架采用上述任一项所述的精细掩膜板支撑框架。
步骤S802：对精细掩膜板支撑框架施加作用力；
步骤S803：将施加有第一拉力的掩膜条固定于精细掩膜板支撑框架；
步骤S804：调节调节件以调节对应的调节开口的形状，以使掩膜条被固定前和固定后所受到的拉力相同。
上述作用力可以为挤压力也可以为拉力，当为挤压力时，外界施力装置将力作用在调节开口远离掩膜区域的侧壁上，当为拉力时，外界施力装置将力作用在调节开口靠近掩膜区域的侧壁上。
上述调节件在调节调节开口时，可以是在所用掩膜条均固定后再调节，也可以每固定一掩膜条便调节一次。
进一步的，在步骤S801提供一如上述任一项所述的精细掩膜板支撑框架和步骤S802对所述精细掩膜板支撑框架施加作用力之间，还包括：
通过调节件对调节开口靠近掩膜区域的侧壁施加挤压力。通过预先施加的挤压力可以使得精细掩膜板支撑框架预先产生一个形变，使得当需要减小或增大掩膜条所受拉力时，便于调节精细掩膜板支撑框架的形变，提高调节方便性。
显然，本领域的技术人员可以对本公开进行各种改动和变型而不脱离本公开的精神和范围。这样，倘若本公开的这些修改和变型属于本公开权利要求及其等同技术的范围之内，则本公开也意图包含这些改动和变型在内。

Claims (12)

  1. 一种精细掩膜板支撑框架，包括：多个边框，多个所述边框围成掩膜区域，其中，至少一对相对设置的两个边框上设有调节开口，每个所述调节开口上设有至少一个调节件，所述调节件用于调节对应的所述调节开口的形状、以调节所述掩膜区域的形变。
  2. 根据权利要求1所述的精细掩膜板支撑框架，其中，每个所述调节件包括：螺杆和一个锁紧螺母，所述螺杆的两端分别与所述调节开口的第一侧壁和第二侧壁连接，所述锁紧螺母在所述调节开口内且套装于所述螺杆，其中所述第一侧壁上设有螺纹孔、所述第二侧壁上设有孔，所述第一侧壁的长度方向、所述第二侧壁的长度方向均与所述调节开口的长度方向相同。
  3. 根据权利要求1所述的精细掩膜板支撑框架，其中，每个所述调节件包括：螺杆和两个锁紧螺母，所述螺杆的两端分别与所述调节开口的第一侧壁和第二侧壁连接，两个所述锁紧螺母在所述调节开口内且套装于所述螺杆，其中所述第一侧壁和所述第二侧壁上均设有孔，所述第一侧壁的长度方向、所述第二侧壁的长度方向均与所述调节开口的长度方向相同。
  4. 根据权利要求1所述的精细掩膜板支撑框架，其中，每个所述调节件包括：螺钉，所述螺钉穿过所述调节开口的第一侧壁与所述调节开口的第二侧壁相抵，其中所述第一侧壁上设有与所述螺钉配合的螺纹孔，所述第一侧壁的长度方向、所述第二侧壁的长度方向均与所述调节开口的长度方向相同，所述第一侧壁相对所述第二侧壁远离所述掩膜区域。
  5. 根据权利要求1所述的精细掩膜板支撑框架，其中，每个所述调节件包括：螺钉，所述螺钉穿过所述调节开口的第一侧壁与所述调节开口的第二侧壁插合连接，其中所述第一侧壁上设有与所述螺钉配合的螺纹孔，所述第二侧壁上设有盲孔，所述第一侧壁的长度方向、所述第二侧壁的长度方向均与所述调节开口的长度方向相同，所述第一侧壁相对所述第二侧壁远离所述掩膜区域。
  6. 根据权利要求1所述的精细掩膜板支撑框架，其中，每个所述调节件包括：螺钉，所述螺钉穿过所述调节开口的第一侧壁与所述调节开口的第二侧壁螺纹连接，其中所述第一侧壁上设有与所述螺钉配合的通孔，所述第二侧壁上设有螺纹孔，所述第一侧壁的长度方向、所述第二侧壁的长度方向均与所述调节开口的长度方向相同，所述第一侧壁相对所述第二侧壁远离所述掩膜区域。
  7. 根据权利要求1～6任一项所述的精细掩膜板支撑框架，其中，每个所述调节开口的长度大于等于其所在的边框的长度的二分之一且小于等于其所在的边框的长度的九分之七。
  8. 一种精细掩膜板，包括：如权利要求1～7任一项所述的精细掩膜板支撑框架，以及覆盖于所述精细掩膜板支撑框架的掩膜区域上的掩膜条，所述掩膜条与所述精细掩膜板支撑框架相对固定。
  9. 根据权利要求8所述的精细掩膜板，其中，所述调节开口的长度方向与所述掩膜条的长度方向垂直。
  10. 根据权利要求8所述的精细掩膜板，其中，每个所述调节开口上设有的所述调节件的个数与所述掩膜条的个数相同。
  11. 一种精细掩膜板的制备方法，包括：
    提供一如权利要求1～7任一项所述的精细掩膜板支撑框架；
    对所述精细掩膜板支撑框架施加作用力；
    将施加有第一拉力的掩膜条固定于所述精细掩膜板支撑框架；
    调节所述调节件以调节对应的所述调节开口的形状，以使所述掩膜条被固定前和固定后所受到的拉力相同。
  12. 根据权利要求11所述的精细掩膜板的制备方法，其中，在所述提供一如权利要求1～7任一项所述的精细掩膜板支撑框架和所述对精细掩膜板支撑框架施加作用力之间，还包括：
    通过所述调节件对所述调节开口靠近所述掩膜区域的侧壁施加挤压力。
PCT/CN2018/071600 2017-05-12 2018-01-05 精细掩膜板支撑框架、精细掩膜板及其制备方法 Ceased WO2018205664A1 (zh)

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