WO2018149151A1 - 彩膜基板及其制备方法、显示装置和涂胶系统 - Google Patents

彩膜基板及其制备方法、显示装置和涂胶系统 Download PDF

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Publication number
WO2018149151A1
WO2018149151A1 PCT/CN2017/104811 CN2017104811W WO2018149151A1 WO 2018149151 A1 WO2018149151 A1 WO 2018149151A1 CN 2017104811 W CN2017104811 W CN 2017104811W WO 2018149151 A1 WO2018149151 A1 WO 2018149151A1
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Prior art keywords
substrate
thickness
transparent insulating
insulating layer
metal film
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PCT/CN2017/104811
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English (en)
French (fr)
Inventor
卢彦春
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BOE Technology Group Co Ltd
Hefei Xinsheng Optoelectronics Technology Co Ltd
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BOE Technology Group Co Ltd
Hefei Xinsheng Optoelectronics Technology Co Ltd
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Priority to US15/781,753 priority Critical patent/US10884284B2/en
Publication of WO2018149151A1 publication Critical patent/WO2018149151A1/zh
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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133345—Insulating layers
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133354—Arrangements for aligning or assembling substrates
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133368—Cells having two substrates with different characteristics, e.g. different thickness or material
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2202/00—Materials and properties
    • G02F2202/28—Adhesive materials or arrangements

Definitions

  • the present invention relates to the field of display technology. Specifically, the present invention relates to a color film substrate, a preparation method thereof, a display device, and a glue application system. More specifically, it relates to a method of preparing a color filter substrate, a color filter substrate, a display device, and a gumming system.
  • the picture quality of the display is increasing.
  • the Cell Gap liquid crystal cell box thickness
  • the Process of forming a film including forming an alignment film, dropping liquid crystal, and a pair of boxes. It will lead to uneven brightness of the indicator during power-on use, which will further cause various defects, that is, Target (Mura) brightness problem, which is easy to cause the secondary product rate of the manufactured display. high.
  • the current manufacturing method of the TFT-LCD display panel needs to be improved.
  • the present invention aims to solve at least one of the technical problems in the related art to some extent.
  • the specific structure of the TFT-LCD display panel mainly includes a CF (Color Film) substrate, a TFT (Thin Film Transistor) substrate, and a liquid crystal filled therebetween.
  • the lower diagram is a schematic diagram of the structure of the array substrate
  • the upper diagram is a result of measuring the thickness of the metal film layer on the array substrate by the four-probe method, and the darker the color, the larger the thickness of the film layer), because on the TFT substrate 200
  • the plurality of targets 210 arranged in parallel in the surface are easily formed in the middle of the single target film with a relatively high film thickness (dark color), and the film thickness of the two target gaps is relatively thin (lighter color) ).
  • the CF substrate generally includes a substrate, a black matrix layer and a color filter layer spaced apart from each other on the lower surface of the substrate, and a transparent insulating layer covering the black matrix layer and the color filter layer, wherein the lower surface of the transparent insulating layer is flat In the plane, and since the alignment film is a film layer having a uniform thickness, the difference in thickness of the surface of the array substrate cannot be compensated, whereby the height difference caused by sputtering film formation on the array substrate, the lower surface of the paired CF substrate and the TFT
  • the Cell Gap between the upper surfaces of the substrate has a problem of poor uniformity, so that the Mura phenomenon is likely to occur during use of the display.
  • the inventors of the present invention have found through intensive research that in the preparation process of the CF substrate, the thickness of the transparent insulating layer of the CF substrate is adjusted according to the Array feedback information on the surface of the TFT substrate, so that the thickness of the CF substrate can be realized.
  • the modulating property compensates for the difference in thickness of the Array on the surface of the TFT substrate, further improves the uniformity of the Cell Gap after filling the liquid crystal in the Cell segment, and effectively solves the problem of Mura, etc. due to the difference in thickness of the sputtering film on the surface of the TFT substrate. Picture quality issues.
  • an object of the present invention is to provide a method for preparing a color filter substrate by improving Cell Gap uniformity after filling a liquid crystal in a Cell segment.
  • the invention provides a method of preparing a color filter substrate.
  • a method of preparing a color filter substrate includes: forming a transparent insulating layer, wherein a thickness of the transparent insulating layer is determined according to a thickness of a metal film layer on an array substrate paired with the color filter substrate.
  • the method for preparing a color filter substrate according to the embodiment of the present invention adjusts the thickness of the transparent insulating layer of the CF substrate according to the thickness information of the metal film layer on the array substrate having the difference in surface height, and can be used according to actual use. It is required to meet specific requirements between the array substrate and the color filter substrate to improve the use effect thereof.
  • the thickness of the transparent insulating layer can be compensated for the difference in thickness of the upper surface of the array substrate, thereby effectively improving the uniformity of the Cell Gap after filling the liquid crystal in the Cell segment, and effectively solving the sputtering on the upper surface of the TFT substrate.
  • Image quality problems such as Mura caused by differences in film thickness.
  • the method for preparing a color filter substrate according to the above embodiment of the present invention may further have the following additional technical features:
  • the transparent insulating layer is formed by gluing
  • the step of forming a transparent insulating layer comprises: acquiring film forming data of a metal film layer on the array substrate paired with the color film substrate Determining a thickness of the metal film layer according to the film formation data; determining a thickness of the transparent insulating layer according to a thickness of the metal film layer; determining a pressure time of applying the glue according to a thickness of the transparent insulating layer a curve; applying a glue according to a pressure time curve of the glue to form the transparent insulating layer.
  • the film formation data comprises a sheet resistance of the metal film layer.
  • the transparent insulating layer faces the maximum value of the vertical distance from any point on the surface of the array substrate to the surface of the metal film layer facing the color filter substrate.
  • the difference between the small values does not exceed 2% of the maximum value.
  • the display device including the color filter substrate has an excellent display effect, and the image quality problem such as Mura is remarkably improved.
  • the invention proposes a color film substrate.
  • the color filter substrate is prepared by the above method.
  • the color film substrate of the embodiment of the present invention can be improved by adjusting the thickness of the transparent insulating layer on the lower surface thereof according to the surface thickness information of the TFT substrate (ie, the array substrate) paired with the TFT substrate (ie, the array substrate).
  • the uniformity of the Cell Gap after the liquid crystal is filled in the segment and effectively solves the problem of picture quality such as Mura due to the difference in film thickness of the upper surface of the TFT substrate.
  • the invention proposes a display device.
  • the display device comprises: an array substrate, a color filter substrate and a liquid crystal layer.
  • the color filter substrate and the array substrate are disposed opposite to each other; the liquid crystal layer is disposed between the array substrate and the color filter substrate; wherein the array substrate is provided with a metal on a side of the color filter substrate a film layer, a side of the color film substrate adjacent to the array substrate is provided with a transparent insulating layer, and a thickness of the transparent insulating layer is determined according to a thickness of the metal film layer.
  • the inventors have unexpectedly discovered that the display device of the embodiment of the present invention can effectively solve the picture quality problem of Mura and the like because of the better uniformity of the Cell Gap.
  • the display device according to the above embodiment of the present invention may further have the following additional technical features:
  • the color filter substrate further comprises: a substrate, a black matrix layer, and color filter.
  • the black matrix layer is disposed on a lower surface of the substrate and has a plurality of openings; the color filter layer is disposed on a side of the substrate facing the array substrate, and in the black matrix layer
  • the transparent insulating layer is disposed on a side of the color filter layer and the black matrix layer away from the substrate; wherein the transparent insulating layer faces the surface of the array substrate
  • the difference between the maximum value and the minimum value of the vertical distance to the surface of the metal film layer facing the color filter substrate is not more than 2% of the maximum value.
  • the specific kind of the display device is not particularly limited as long as it is a device having a display function.
  • the display device may be any product that can realize display, such as a restriction panel, a mobile phone, a tablet computer, a game machine, a wearable device, a home appliance, and the like.
  • the invention provides a gumming system.
  • the glue application system includes: an information acquisition module for acquiring a thickness of a metal film layer; and a transparent insulation layer thickness determining module for determining a thickness of the transparent insulation layer according to a thickness of the metal film layer a glue coating module for coating a rubber according to a thickness of the transparent insulating layer, wherein the transparent insulating layer is disposed on one side of the color filter substrate, and the metal film layer is disposed on the color film substrate One side of the array substrate, and the transparent insulating layer is disposed opposite to the metal film layer.
  • the coating system of the embodiment of the present invention can flexibly adjust the thickness of the transparent insulating layer according to the thickness information of the metal film layer, so that the transparent insulating layer and the metal film layer meet specific use requirements, for example, The vertical distance from any point on the lower surface of the transparent insulating layer to the metal film layer can be made more uniform.
  • the thickness of the transparent insulating layer may be adjusted such that the difference between the maximum value and the minimum value of the vertical distance of the transparent insulating layer toward the vertical distance of the metal film layer from any point on the surface of the array substrate does not exceed the maximum value. 2%.
  • the display device formed of the color filter substrate and the array substrate has an excellent display effect, and the picture quality problem such as Mura is remarkably improved.
  • glue application system may further have the following additional technical features:
  • the information acquisition module further includes: a film formation data acquisition unit, configured to acquire film formation data of the metal film layer; and a metal film layer thickness determining unit, configured to determine, according to the film formation data The thickness of the metal film layer.
  • the glue application module further includes: a time pressure curve determining unit, configured to determine a time pressure curve of the glue according to a thickness of the transparent insulating layer; and a glue processing unit for The time pressure curve is used to perform the coating.
  • the film formation data includes a sheet resistance of the metal film layer.
  • FIG. 1 is a plan view and a corresponding side view of a TFT substrate according to an embodiment of the present invention.
  • FIG. 2 is a schematic structural view of a display panel according to an embodiment of the present invention.
  • FIG. 3 is a schematic view showing the internal structure of a color filter substrate according to an embodiment of the present invention.
  • FIG. 4 is a schematic view showing the composition of a gumming system according to an embodiment of the present invention.
  • Figure 5 is a schematic view of a gumming process in accordance with one embodiment of the present invention.
  • the invention provides a method of making a color film substrate.
  • a method of preparing a color filter substrate includes: forming a transparent insulating layer on one side of the color filter substrate body, wherein the metal film on the array substrate is paired with the color filter substrate The thickness of the layer determines the thickness of the transparent insulating layer.
  • the method for preparing the color filter substrate is not limited to the step of forming a transparent insulating layer, and may further include other necessary preparation steps, for example, a surface treatment step of the substrate, a formation step of the black matrix layer, and The filling step of the color filter layer, and the like can be carried out according to the conventional operations in the art, and no further description is made here.
  • the description of the "array substrate paired with the color filter substrate” as used herein refers to an array substrate in which the color filter substrate is used to form a display panel with the color filter substrate.
  • the description "the metal film layer on the array substrate” used herein refers to at least one plating film formed by sputtering in the process of preparing a TFT.
  • the transparent insulating layer is an existing structure in a color film substrate, and may be, for example, a flat layer.
  • the thickness of the transparent insulating layer of the CF substrate is adjusted according to the thickness information of the metal film layer on the surface of the TFT substrate, so that the thickness of the CF substrate can be realized. Adjustability, thereby compensating for the difference in thickness of the metal film layer on the surface of the TFT substrate, further improving the uniformity of the Cell Gap after filling the liquid crystal in the Cell segment, and effectively solving the difference in thickness of the sputtering film on the surface of the TFT substrate Mura and other picture quality issues.
  • the specific formation manner of the transparent insulating layer is not particularly limited, and any method known in the art for forming a transparent insulating layer on the surface of the color filter substrate may be employed.
  • the transparent insulating layer is formed by gluing.
  • the step of forming a transparent insulating layer further includes: acquiring film formation data of the metal film layer on the array substrate paired with the color filter substrate; determining a thickness of the metal film layer according to the film formation data; The thickness of the layer determines the thickness of the transparent insulating layer; the pressure time curve of the glue is determined according to the thickness of the transparent insulating layer; and the pressure is applied according to the pressure time curve of the glue to form the transparent insulating layer.
  • the thickness of the transparent insulating layer of the CF substrate can be flexibly adjusted according to the film formation data of the metal film layer on the surface of the TFT substrate, so as to better meet the use requirements and improve the display panel using the color film substrate.
  • the thickness of the transparent insulating layer can be adjusted to compensate for the difference in thickness of the metal film layer on the surface of the TFT substrate, and the uniformity of the Cell Gap after filling the liquid crystal in the Cell segment is further improved, thereby avoiding uneven brightness.
  • the inventors of the present invention have found through long-term research that according to the obtained film formation data of the metal film layer on the array substrate matched with the color film substrate, the thickness data of the metal film layer can be converted, and the corresponding transparent insulating layer can be calculated. The required thickness is then further designed according to the thickness, and the pressure time curve in the glue coating process is further adjusted to adjust the thickness of the transparent insulating layer formed on the surface of the color filter substrate during the coating process, thereby obtaining an array according to the pairing with the color filter substrate.
  • the film formation data of the metal film layer on the substrate is designed to compensate for the difference in thickness of the surface of the array substrate.
  • the specific type of film formation data is not particularly limited, and any data type known in the art may be employed as long as the data can effectively reflect the metal film on the array substrate paired with the color filter substrate.
  • the thickness information of the layer can be used.
  • the film forming data includes a sheet resistance of the metal film layer. In this way, by using the data of the above-mentioned sheet resistance, the thickness information of the metal film layer on the array substrate can be more sensitively and quickly reflected, the effect of adjusting the thickness of the transparent insulating layer of the color filter substrate is further improved, and the Cell segment filling is further improved.
  • the uniformity of Cell Gap after liquid crystal can more effectively solve the problem of picture quality such as Mura caused by the difference in film thickness of the upper surface of the TFT substrate.
  • the sheet resistance can be obtained directly from the manufacturer of the array substrate, and does not need to be separately measured, and the operation steps are simple, convenient and rapid.
  • the thickness of the transparent insulating layer is adjusted according to the thickness of the metal film layer on the array substrate, so that the transparent insulating layer faces any point on the surface of the array substrate to the color film substrate of the metal film layer on the array substrate.
  • the difference between the maximum value and the minimum value of the vertical distance of the face is not more than 2% of the maximum value.
  • the thickness of the metal film layer 220 on the array substrate 200 is thin, the thickness of the transparent insulating layer 140 at the corresponding position is relatively large.
  • the thickness of the metal film layer 220 on the array substrate 200 is thick, The thickness of the transparent insulating layer 140 at the corresponding position is small, thereby adjusting the thickness of the transparent insulating layer according to the thickness of the metal film layer on the array substrate, thereby effectively ensuring the metal on the lower surface of the transparent insulating layer to the array substrate at any point.
  • the vertical distance L uniformity of the upper surface of the film layer is preferred.
  • the transparent insulating layer can be oriented at any point on the face of the array substrate to the maximum vertical distance of the surface of the metal film layer facing the color filter substrate.
  • the difference between the value and the minimum value does not exceed 2% of the maximum value.
  • the difference between the maximum and minimum values of the vertical distance of the transparent insulating layer toward the vertical distance of the surface of the metal film layer facing the color filter substrate The value does not exceed 1% of the maximum value.
  • the transparent insulating layer is equal to a maximum value and a minimum value of a vertical distance from a point on the surface of the array substrate to a surface of the metal film layer facing the color filter substrate.
  • the direction “upper” described in the present invention refers to the direction of the color film substrate toward the user in actual use, and the “lower” refers to the direction of the color film substrate facing away from the user during actual use.
  • the present invention provides a method for preparing a color filter substrate, which adjusts the thickness of the transparent insulating layer of the CF substrate according to the thickness information of the TFT substrate having a difference in surface height, thereby
  • the vertical distance from any point on the lower surface of the CF substrate to the upper surface of the TFT substrate is more uniform, and the uniformity of the Cell Gap after filling the liquid crystal in the Cell segment is improved, and the difference in film thickness of the upper surface of the TFT substrate is effectively solved.
  • Bringing picture quality problems such as Mura.
  • the invention provides a color film substrate.
  • a color filter substrate is prepared by the above method. Since the thickness of the transparent insulating layer on the surface is adjusted according to the thickness information of the metal film layer on the TFT substrate, the specific requirements of the color film substrate and the array substrate can be satisfied according to actual needs, thereby improving The effect of the display panel composed of it. For example, the vertical distance between the color filter substrate and the array substrate can be more uniform by adjusting the thickness of the transparent insulating layer, thereby improving the uniformity of the Cell Gap after the Cell segment is filled with the liquid crystal, and effectively solving the surface splash due to the TFT substrate. Screen quality problems such as Mura caused by differences in film thickness.
  • Those skilled in the art can understand that the features and advantages described above for the method for preparing a color filter substrate are still applicable to the color filter substrate, and details are not described herein again.
  • the invention provides a method of making a display panel.
  • the method for preparing a display panel comprises: providing an array substrate and a color filter substrate, wherein the color filter substrate is prepared by the foregoing method; and the array substrate and the color filter substrate are The board is placed on the box.
  • the method for preparing the color filter substrate may further include other necessary preparation steps, for example, on the upper surface of the array substrate and the color film.
  • the step of forming an alignment film on the lower surface of the substrate, the step of pouring the liquid crystal, the step of attaching the polarizer, and the like, and the description thereof will not be repeated here.
  • a color filter substrate prepared by compensating for the difference in surface thickness of the array substrate according to the thickness of the metal film layer on the array substrate paired therewith can be subjected to the box processing with the array substrate, and the Cell Gap can be obtained.
  • a display panel with high uniformity, thereby improving the picture quality of the TFT-LCD, and the method of preparing the display panel can reduce the secondary yield of the display.
  • the “box-to-box” processing refers to accurately combining the paired color film substrate and the array substrate into a single body, and then performing the steps of preparing the edge seal on the sides of the two substrates to obtain the display. panel.
  • the present invention provides a method for preparing a display panel, in which the vertical distance from any point on the lower surface of the color filter substrate to the upper surface of the TFT substrate is more uniform, thereby improving the Cell.
  • the uniformity of the Cell Gap after the liquid crystal is filled in the segment and effectively solves the problem of picture quality such as Mura due to the difference in film thickness of the upper surface of the TFT substrate.
  • the invention provides a display panel.
  • the display panel is prepared by the aforementioned method.
  • the thickness of the transparent insulating layer on the lower surface of the color filter substrate is determined by the thickness of the metal film layer on the array substrate, so that the specific use requirements can be satisfied between the color film substrate and the array substrate according to actual needs.
  • the vertical distance of the metal film layer from any point on the lower surface of the color filter substrate to the upper surface of the TFT substrate is more uniform, thereby improving the uniformity of the Cell Gap after the Cell segment is filled with the liquid crystal, and effectively solving The picture quality problem such as Mura caused by the difference in film thickness on the upper surface of the TFT substrate.
  • the invention provides a display device.
  • the display device of the present invention will be described in detail with reference to Figs. 2 to 3.
  • the display device includes: an opposite array substrate (TFT) 200 and a color filter substrate (CF) 100, and a liquid crystal layer disposed between the array substrate 200 and the color filter substrate 100.
  • a metal film layer 220 is disposed on a side of the array substrate 200 adjacent to the color filter substrate 100, and the color filter substrate 100 is adjacent to the array substrate 200.
  • One side is provided with a transparent insulating layer 140, and the thickness of the transparent insulating layer 140 is determined according to the thickness of the metal film layer 220.
  • the display device may include other necessary components, such as an alignment film, a polarizing plate or a frame sealant, etc., and no further description is made herein.
  • the color filter substrate further includes: a substrate 110, a black matrix layer 120, and a color filter layer 130.
  • the black matrix layer 120 and the color filter layer 130 are both disposed on the lower surface of the substrate 110, and the black matrix layer 120 has a plurality of openings, and the color filter layer 130 is disposed in the plurality of openings of the black matrix layer 120.
  • the transparent insulating layer 140 is disposed on the lower surfaces of the color filter layer 130 and the black matrix layer 120. As can be seen from the figure, the left side shows that the thickness L1 of the position transparent insulating layer 140 is relatively thin, and the right side shows that the thickness L2 of the position transparent photoresist 140 is relatively thick.
  • the transparent insulating layer 140 faces the arbitrary point of the surface of the array substrate, and the difference between the maximum value and the minimum value of the vertical distance to the surface of the metal film layer facing the color filter substrate on the array substrate is not more than 2% of the maximum value.
  • the thickness of the color filter substrate can effectively compensate the difference in height of the upper surface of the TFT substrate, and the vertical distance from any point on the lower surface of the CF substrate of the display panel to the upper metal film layer of the TFT substrate. It is more uniform, thereby improving the uniformity of Cell Gap after filling the liquid crystal in the Cell segment, and effectively solving the picture quality problem such as Mura caused by the difference in film thickness of the surface of the TFT substrate.
  • a difference between a maximum value and a minimum value of a vertical distance from a transparent insulating layer toward a surface of the array substrate to a surface of the metal film layer facing the color filter substrate Not more than 1% of the maximum value.
  • the transparent insulating layer is equal to a maximum value and a minimum value of a vertical distance from an arbitrary point on the surface of the array substrate to a surface of the metal film layer facing the color filter substrate.
  • the present invention provides a display device capable of effectively solving a picture quality problem such as Mura because of the better uniformity of Cell Gap.
  • the invention provides a gumming system.
  • the glue application of the present invention will be described in detail with reference to FIG.
  • the glue application system includes three main modules: an information acquisition module 300, a transparent insulation layer thickness determination module 400, and a glue application module 500.
  • the information acquiring module 300 is configured to obtain thickness information of the metal film layer;
  • the transparent insulating layer thickness determining module 400 is configured to determine the thickness of the transparent insulating layer according to the thickness information of the metal film layer;
  • the block 500 is used for applying a glue according to the thickness of the transparent insulating layer, wherein the transparent insulating layer is disposed on one side of the color filter substrate, and the metal film layer is disposed on one side of the array substrate paired with the color film substrate And the transparent insulating layer is disposed opposite to the metal film layer.
  • the coating system can be directly used in the preparation process of the color film substrate and the display panel described above, thereby obtaining a transparent photoresist layer on the CF substrate capable of compensating for the metal film layer on the TFT substrate having the difference in surface height, so that the CF substrate is under the CF substrate.
  • the vertical distance from any point on the surface to the upper metal film layer of the TFT substrate is more uniform, and the uniformity of Cell Gap after filling the liquid crystal in the Cell segment is improved, and Mura, etc. due to the difference in film thickness of the upper surface of the TFT substrate is effectively solved. Picture quality issues.
  • the information acquisition module 300 further includes: a film formation data acquisition unit and a metal film layer thickness determination unit.
  • the film formation data acquisition unit is configured to acquire film formation data of the metal film layer; and the metal film layer thickness determination unit is configured to determine the thickness of the metal film layer according to the film formation data.
  • the film formation data acquisition unit is configured to acquire film formation data of the metal film layer; and the metal film layer thickness determination unit is configured to determine the thickness of the metal film layer according to the film formation data.
  • the specific type of film formation data is not particularly limited, and any data type known in the art may be used as long as the data can effectively reflect the thickness information of the metal film layer.
  • the film forming data includes the sheet resistance of the metal film layer.
  • the gumming module 500 further includes: a time pressure curve determining unit and a gumming processing unit.
  • the time pressure curve determining unit is configured to determine a time pressure curve of the glue according to the thickness of the transparent insulating layer; and the glue processing unit is configured to apply the glue according to the time pressure curve.
  • the glue coating processing unit includes a nozzle 510 for coating the transparent insulating layer 140 on one side of the color filter substrate 100.
  • the time and pressure curve required for the glue application is determined, and then the glue coating process is performed on the surface of the CF substrate, and the compensation can be obtained.
  • the thickness of the transparent insulating layer is determined according to the thickness of the metal film layer, and the transparent insulating layer may be oriented to any point on the surface of the array substrate to the vertical direction of the surface of the metal film layer facing the color filter substrate.
  • the difference between the maximum and minimum values of the distance does not exceed 2% of the maximum value.
  • the difference between the maximum value and the minimum value of the vertical distance from the transparent insulating layer toward the surface of the array substrate toward the surface of the metal film layer facing the color filter substrate is not Exceeding 1% of the maximum value.
  • the transparent insulating layer is equal to a maximum value and a minimum value of a vertical distance from a point on the surface of the array substrate to a surface of the metal film layer facing the color filter substrate.
  • the present invention provides a rubber coating system capable of adjusting the thickness of a transparent insulating layer according to thickness information of a metal film layer having a difference in surface height, thereby making the transparent insulating layer
  • the vertical distance from any point on the surface to the upper surface of the metal film layer is more uniform, which is advantageous for improving the display effect of the display panel and improving the picture quality problem such as Mura.
  • connection may be disassembled or integrated; it may be a mechanical connection or an electrical connection; it may be directly connected or indirectly connected through an intermediate medium, and may be an internal connection of two elements or an interaction relationship of two elements.
  • connection may be disassembled or integrated; it may be a mechanical connection or an electrical connection; it may be directly connected or indirectly connected through an intermediate medium, and may be an internal connection of two elements or an interaction relationship of two elements.
  • specific meanings of the above terms in the present invention can be understood on a case-by-case basis.

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Abstract

彩膜基板（100）及其制备方法、显示装置和涂胶系统。制备彩膜基板（100）的方法包括：形成透明绝缘层（140），其中，根据与彩膜基板（100）配对的阵列基板（200）上的金属膜层（220）的厚度，确定透明绝缘层（140）的厚度。制备彩膜基板（100）的方法，根据TFT基板（200）上金属膜层（220）的厚度信息，调节CF基板（100）的透明绝缘层（140）的形成厚度，从而使对盒处理后CF基板（100）透明绝缘层（140）上任一点到TFT基板（200）上金属膜层（220）的垂直距离更均匀，提高Cell段填充液晶后的Cell Gap的均一性，有效地解决由于TFT基板（200）上表面溅射成膜厚度差异所带来的Mura等画面品质问题。

Description

彩膜基板及其制备方法、显示装置和涂胶系统 技术领域
本发明涉及显示技术领域，具体的，本发明涉及彩膜基板及其制备方法、显示装置和涂胶系统。更具体的，涉及制备彩膜基板的方法、彩膜基板、显示装置和涂胶系统。
背景技术
随着TFT-LCD(薄膜晶体管-液晶显示器)的技术发展，对该显示器的画面品质的要求日益增高。目前，现有的制造工艺中最终在Cell段(即成盒工艺，包括形成配向膜、滴液晶、对盒等操作)填充液晶后，获得的Cell Gap(液晶单元盒厚)的均一性不高，就会导致在通电使用过程中指示器亮度的不均匀，进一步造成出现各种瑕疵，即出现Target(靶材)Mura(亮度不均匀)问题，如此容易造成制造的显示器的次级品率较高。
所以，现阶段TFT-LCD显示面板的制造方法有待改进。
发明内容
本发明旨在至少在一定程度上解决相关技术中的技术问题之一。
本发明是基于发明人的下列发现而完成的：
本发明人在研究过程中发现，TFT-LCD显示面板的具体结构主要包括CF(Color Film，彩膜)基板、TFT(Thin Film Transistor，薄膜晶体管)基板和填充其间的液晶。参照图1(其中，下图为阵列基板结构示意图，上图为四探针法测定阵列基板上金属膜层厚度的结果图，颜色越深表示膜层厚度越大)，由于，TFT基板200上表面的平行排列的多根靶材210在镀膜过程中，容易形成单根靶材中间的膜厚偏高(颜色较深)，而两根靶材间隙的成膜厚度相对较薄(颜色较浅)。发明人还发现TFT基板上表面的厚度差在
Figure PCTCN2017104811-appb-000001
左右。而CF基板通常包括衬底、间隔设置在衬底下表面的黑矩阵层和彩色滤光层，以及覆盖黑矩阵层和彩色滤光层的透明绝缘层，其中，透明绝缘层的下表面是平整的平面，且由于配向膜为厚度均匀的膜层，无法对阵列基板表面的厚度差异进行补偿，由此，由于阵列基板上溅射成膜导致的高度差，配对后的CF基板的下表面与TFT基板上表面 之间的Cell Gap就会存在均一性差的问题，从而在显示器使用过程中容易出现Mura现象。
本发明的发明人经过深入研究发现，在CF基板的制备过程中，根据TFT基板表面的Array(阵列)反馈信息对CF基板的透明绝缘层厚度进行相应的调节，如此可实现CF基板厚度的可调节性，从而对TFT基板表面的Array的厚度差异进行补偿，进一步提高Cell段填充液晶后的Cell Gap的均一性，有效地解决由于TFT基板上表面溅射成膜厚度差异所带来的Mura等画面品质问题。
有鉴于此，本发明的一个目的在于提出一种提高Cell段填充液晶后Cell Gap均一性的制备彩膜基板的方法。
在本发明的第一方面，本发明提出了一种制备彩膜基板的方法。
根据本发明的实施例，制备彩膜基板的方法包括：形成透明绝缘层，其中，根据与所述彩膜基板配对的阵列基板上的金属膜层的厚度，确定所述透明绝缘层的厚度。
发明人意外地发现，采用本发明实施例的制备彩膜基板的方法，根据存在表面高度差异的阵列基板上金属膜层的厚度信息，调节CF基板的透明绝缘层的形成厚度，可以根据实际使用需要，使得阵列基板和彩膜基板之间满足特定的要求，以提高其使用效果。在本发明的一些实施例中，可以使得透明绝缘层的厚度补偿阵列基板上表面的厚度差异，进而有效提高Cell段填充液晶后的Cell Gap的均一性，有效地解决由于TFT基板上表面溅射成膜厚度差异所带来的Mura等画面品质问题。
另外，根据本发明上述实施例的制备彩膜基板的方法，还可以具有如下附加的技术特征：
根据本发明的实施例，所述透明绝缘层是通过涂胶形成的，且所述形成透明绝缘层的步骤包括：获取与所述彩膜基板配对的阵列基板上的金属膜层的成膜数据；根据所述成膜数据，确定所述金属膜层的厚度；根据所述金属膜层的厚度，确定所述透明绝缘层的厚度；根据所述透明绝缘层的厚度，确定涂胶的压力时间曲线；根据所述涂胶的压力时间曲线进行涂胶，以形成所述透明绝缘层。
根据本发明的实施例，所述成膜数据包括金属膜层的方块电阻。
根据本发明的实施例，所述透明绝缘层朝向所述阵列基板的面上任意一点到所述金属膜层的朝向所述彩膜基板的面的垂直距离的最大值与最 小值的差值不超过所述最大值的2％。由此，该含有该彩膜基板的显示装置的显示效果理想，Mura等画面品质问题得到明显改善。
在本发明的第二方面，本发明提出了一种彩膜基板。
根据本发明的实施例，所述彩膜基板是通过上述的方法制备的。
发明人意外地发现，本发明实施例的彩膜基板，由于其下表面的透明绝缘层的厚度是根据与之配对的TFT基板(即阵列基板)的表面厚度信息进行调整的，从而可以提高Cell段填充液晶后的Cell Gap的均一性，并有效地解决由于TFT基板上表面溅射成膜厚度差异所带来的Mura等画面品质问题。本领域技术人员能够理解的是，前面针对制备彩膜基板的方法所描述的特征和优点，仍适用于该彩膜基板，在此不再赘述。
在本发明的第三方面，本发明提出了一种显示装置。
根据本发明的实施例，所述显示装置包括：阵列基板、彩膜基板及液晶层。所述彩膜基板和所述阵列基板是相对设置的；所述液晶层设置于所述阵列基板和彩膜基板之间；其中，所述阵列基板靠近所述彩膜基板的一侧设置有金属膜层，所述彩膜基板靠近所述阵列基板的一侧设置有透明绝缘层，且所述透明绝缘层的厚度是根据所述金属膜层的厚度确定的。
发明人意外地发现，本发明实施例的显示装置，由于其Cell Gap的均一性更好，而能有效地解决Mura等画面品质问题。
另外，根据本发明上述实施例的显示装置，还可以具有如下附加的技术特征：
根据本发明的实施例，所述彩膜基板还包括：衬底、黑矩阵层及彩色滤光。所述黑矩阵层设置在所述衬底的下表面，且具有多个开口；所述彩色滤光层设置在所述衬底朝向所述阵列基板的一侧，且在所述黑矩阵层的所述多个开口中；所述透明绝缘层设置在所述彩色滤光层和所述黑矩阵层远离所述衬底的一侧；其中，所述透明绝缘层朝向所述阵列基板的面上任意一点到所述金属膜层的朝向所述彩膜基板的面的垂直距离的最大值与最小值的差值不超过所述最大值的2％。由此，该显示装置的显示效果理想，Mura等画面品质问题得到明显改善。
根据本发明的实施例，该显示装置的具体种类不受特别限制，只要是具有显示功能的装置即可。在本发明的一些实施例中，该显示装置可以为限制面板、手机、平板电脑、游戏机、可穿戴设备、家用电器等任何可以实现显示的产品。
在本发明的第四方面，本发明提出了一种涂胶系统。
根据本发明的实施例，所述涂胶系统包括：信息获取模块，用于获取金属膜层的厚度；透明绝缘层厚度确定模块，用于根据所述金属膜层的厚度确定透明绝缘层的厚度；涂胶模块，用于根据所述透明绝缘层的厚度进行涂胶，其中，所述透明绝缘层设置在彩膜基板的一侧，所述金属膜层设置在与所述彩膜基板配对的阵列基板的一侧，且所述透明绝缘层与所述金属膜层相对设置。
发明人意外地发现，采用本发明实施例的涂胶系统，能根据金属膜层的厚度信息，灵活调节透明绝缘层的形成厚度，从而使透明绝缘层和金属膜层满足特定的使用要求，例如可以使得透明绝缘层下表面上任一点到金属膜层的垂直距离更均匀。
根据本发明的实施例，可以通过调整透明绝缘层的厚度使得透明绝缘层朝向阵列基板的面上任意一点到金属膜层的垂直距离的最大值与最小值的差值不超过所述最大值的2％。由此，有该彩膜基板和阵列基板形成的显示装置的显示效果理想，Mura等画面品质问题得到明显改善。
另外，根据本发明上述实施例的涂胶系统，还可以具有如下附加的技术特征：
根据本发明的实施例，所述信息获取模块进一步包括：成膜数据获取单元，用于获取所述金属膜层的成膜数据；金属膜层厚度确定单元，用于根据所述成膜数据确定所述金属膜层的厚度。
根据本发明的实施例，所述涂胶模块进一步包括：时间压力曲线确定单元，用于根据所述透明绝缘层的厚度确定所述涂胶的时间压力曲线；涂胶处理单元，用于根据所述时间压力曲线进行所述涂胶。根据本发明的实施例，所述成膜数据包括所述金属膜层的方块电阻。
本发明的附加方面和优点将在下面的描述中部分给出，部分将从下面的描述中变得明显，或通过本发明的实践了解到。
附图说明
本发明的上述和/或附加的方面和优点从结合下面附图对实施例的描述中将变得明显和容易理解，其中：
图1是本发明一个实施例的TFT基板的俯视图和对应的侧视结构示意 图；
图2是本发明一个实施例的显示面板的结构示意图；
图3是本发明一个实施例的彩膜基板的内部结构示意图；
图4是本发明一个实施例的涂胶系统的组成示意图；
图5是本发明一个实施例的涂胶处理示意图。
附图标记
100 彩膜基板
110 衬底
120 黑矩阵层
130 彩色滤光层
140 透明绝缘层
200 阵列基板
210 靶材
220 金属膜层
300 信息获取模块
400 透明绝缘层厚度确定模块
500 涂胶模块
510 喷嘴
具体实施方式
下面详细描述本发明的实施例，本技术领域人员会理解，下面实施例旨在用于解释本发明，而不应视为对本发明的限制。除非特别说明，在下面实施例中没有明确描述具体技术或条件的，本领域技术人员可以按照本领域内的常用的技术或条件或按照产品说明书进行。所用试剂或仪器未注明生产厂商者，均为可通过市购到的常规产品。
在本发明的一个方面，本发明提出了一种制备彩膜基板的方法。
根据本发明的实施例，制备彩膜基板的方法包括：在彩膜基板本体的一侧形成透明绝缘层，其中，根据与彩膜基板配对的阵列基板上的金属膜 层的厚度，确定透明绝缘层的厚度。本领域技术人员可以理解的是，该制备彩膜基板的方法不仅限于形成透明绝缘层的步骤，还可以包括其他必要的制备步骤，例如，衬底的表面处理步骤、黑矩阵层的形成步骤和彩色滤光层的填充步骤，等等，均可按照本领域常规操作进行，在此不再进行过多赘述。
需要说明的是，本文中所采用的描述方式“与彩膜基板配对的阵列基板”是指将彩膜基板用于制备显示面板时，与该彩膜基板进行对盒的阵列基板。本文中所采用的描述方式“阵列基板上的金属膜层”是指制备TFT过程中通过溅射形成的至少一层镀膜。透明绝缘层为彩膜基板中的现有结构，例如可以为平坦层。
本发明的发明人经过研究发现，在CF基板的制备过程中，预先根据TFT基板表面的金属膜层的厚度信息，对CF基板的透明绝缘层厚度进行相应的调节，如此可实现CF基板厚度的可调节性，从而实现对TFT基板表面的金属膜层厚度差异进行补偿，进一步提高Cell段填充液晶后的Cell Gap的均一性，有效地解决由于TFT基板上表面溅射成膜厚度差异所带来的Mura等画面品质问题。
根据本发明的实施例，透明绝缘层的具体形成方式不受特殊的限制，可采用本领域内任何已知的在彩膜基板表面形成透明绝缘层的方法。在本发明的一些实施例中，透明绝缘层是通过涂胶形成的。如此，由于涂胶工艺具有更高的可控性，在透明绝缘层的形成过程中，根据阵列基板上的金属膜层的厚度，调控涂胶过程中的工艺参数，即可实现对CF基板表面透明绝缘层厚度的更高调节性。
根据本发明的实施例，形成透明绝缘层的步骤进一步包括：获取与彩膜基板配对的阵列基板上的金属膜层的成膜数据；根据成膜数据，确定金属膜层的厚度；根据金属膜层的厚度，确定透明绝缘层的厚度；根据透明绝缘层的厚度，确定涂胶的压力时间曲线；根据涂胶的压力时间曲线进行涂胶，以形成所述透明绝缘层。如此，可以根据实际使用要求，根据TFT基板表面的金属膜层的成膜数据，对CF基板的透明绝缘层厚度进行灵活调整，以更好的满足使用要求，提高采用该彩膜基板的显示面板的显示效果。例如可以调节透明绝缘层的厚度实现对TFT基板表面的金属膜层厚度差异进行补偿，进一步提高Cell段填充液晶后的Cell Gap的均一性，从而避免亮度不均匀等现象。
本发明的发明人经过长期的研究发现，根据获取的与彩膜基板配对的阵列基板上金属膜层的成膜数据，可进行换算成金属膜层的厚度数据，再计算出对应的透明绝缘层所需的厚度，然后根据该厚度，进一步设计出涂胶工艺中的压力时间曲线，来调控涂胶过程中彩膜基板表面形成的透明绝缘层的厚度，从而获得根据与彩膜基板配对的阵列基板上金属膜层的成膜数据，所设计出的能补偿阵列基板表面厚度差异的透明绝缘层。
根据本发明的实施例，成膜数据的具体类型不受特别限制，可采用本领域内任何已知的数据类型，只要该数据能有效地反映出与彩膜基板配对的阵列基板上的金属膜层的厚度信息即可。在本发明的一些实施例中，该成膜数据包括金属膜层的方块电阻。如此，采用上述的方块电阻的数据，可以更灵敏、快速地反映出阵列基板上的金属膜层的厚度信息，进一步提高对彩膜基板的透明绝缘层厚度的调节效果，更进一步提高Cell段填充液晶后的Cell Gap的均一性，更有效地解决由于TFT基板上表面溅射成膜厚度差异所带来的Mura等画面品质问题。而且，方块电阻可以直接从制备阵列基板的厂家获得，不需要单独测量，操作步骤简单、方便快速。
本领域技术人员可以理解，将彩膜基板与阵列基板制备显示面板时，需要将二者对位贴合，或者说进行对盒处理，如果采用传统的下表面平坦的彩膜基板，对盒处理后，由于平面靶材自身的镀膜原理造成的阵列基板上表面金属膜层的厚度差异，不同位置对应的液晶单元盒厚存在一定差异，金属膜层厚度较大的位置，液晶单元盒厚相应较小，金属膜层厚度较小的位置，液晶单元盒厚相应较大，这种cell gap不均匀会容易导致画面亮度显示不均匀。而根据本发明的实施例，根据阵列基板上金属膜层的厚度调整透明绝缘层的厚度，可以使得透明绝缘层朝向阵列基板的面上任意一点到阵列基板上金属膜层的朝向彩膜基板的面的垂直距离的最大值与最小值的差值不大于所述最大值的2％。具体的，参见图2，如果阵列基板200上金属膜层220的厚度较薄，则相应位置的透明绝缘层140的厚度则较大，如果阵列基板200上金属膜层220的厚度较厚，则相应位置的透明绝缘层140的厚度则较小，由此，根据阵列基板上金属膜层的厚度调节透明绝缘层的厚度，可以有效保证任意一点上，透明绝缘层下表面到阵列基板上的金属膜层的上表面的垂直距离L均一性较佳。如此，制备出的符合上述标准的彩膜基板表面的透明绝缘层，能够更进一步提高Cell段填充液晶后的Cell Gap的均一性，更有效地解决由于TFT基板上表面溅射成膜厚度差异 所带来的Mura等画面品质问题。
根据本发明的实施例，通过调节透明绝缘层的厚度，可以使得透明绝缘层朝向所述阵列基板的面上任意一点到所述金属膜层的朝向所述彩膜基板的面的垂直距离的最大值与最小值的差值不超过所述最大值的2％。例如，在本发明的一些实施例中，透明绝缘层朝向所述阵列基板的面上任意一点到所述金属膜层的朝向所述彩膜基板的面的垂直距离的最大值与最小值的差值不超过所述最大值的1％。在本发明的另一些实施例中，透明绝缘层朝向所述阵列基板的面上任意一点到所述金属膜层的朝向所述彩膜基板的面的垂直距离的最大值与最小值相等。由此，该含有该彩膜基板的显示装置的显示效果理想，Mura等画面品质问题得到明显改善。
需要说明的是，本发明中描述的方向“上”是指彩膜基板在实际使用过程中朝向用户的方向，而“下”是指彩膜基板在实际使用过程中背向用户的方向。
综上所述，根据本发明的实施例，本发明提出了一种制备彩膜基板的方法，根据存在表面高度差异的TFT基板的厚度信息，调节CF基板的透明绝缘层的形成厚度，从而使对盒处理后CF基板下表面上任一点到TFT基板的上表面的垂直距离更均匀，提高Cell段填充液晶后的Cell Gap的均一性，有效地解决由于TFT基板上表面溅射成膜厚度差异所带来的Mura等画面品质问题。
在本发明的另一个方面，本发明提出了一种彩膜基板。根据本发明的实施例，彩膜基板是通过上述的方法制备的。由于其表面的透明绝缘层的厚度是根据与之配对的TFT基板上金属膜层的厚度信息进行调整的，可以根据实际需要使得彩膜基板和阵列基板之间满足特定的使用要求，从而提高由其组成的显示面板的使用效果。例如，可以通过调整透明绝缘层的厚度使得彩膜基板和阵列基板之间的垂直距离更均一，从而可以提高Cell段填充液晶后的Cell Gap的均一性，并有效地解决由于TFT基板上表面溅射成膜厚度差异所带来的Mura等画面品质问题。本领域技术人员能够理解的是，前面针对制备彩膜基板的方法所描述的特征和优点，仍适用于该彩膜基板，在此不再赘述。
在本发明的另一个方面，本发明提出了一种制备显示面板的方法。
据本发明的实施例，该制备显示面板的方法包括：提供阵列基板和彩膜基板，其中，彩膜基板是通过前述的方法制备的；将阵列基板和彩膜基 板进行对盒。本领域技术人员可以理解的是，不仅限于提供阵列基板和彩膜基板、对盒处理的步骤，制备彩膜基板的方法还可以包括其他必要的制备步骤，例如，在阵列基板上表面和彩膜基板下表面形成配向膜的步骤、灌入液晶的步骤、贴上偏光片的步骤，等等，在此不再进行过多赘述。
本发明的发明人经过研究发现，将根据与其配对的阵列基板上的金属膜层的厚度制备出的能补偿阵列基板表面厚度差异的彩膜基板，与阵列基板进行对盒处理，能够获得Cell Gap均一性高的显示面板，从而提高TFT-LCD的画面品质，且该制备显示面板的方法能降低显示器的次级品率。需要说明的是，“对盒”处理是指将配对的彩膜基板和阵列基板进行精准地位置配对并组合成一体，然后在两块基板的四周侧边进行封边的制备步骤，以便获得显示面板。
综上所述，根据本发明的实施例，本发明提出了一种制备显示面板的方法，获得的显示面板中彩膜基板下表面上任一点到TFT基板上表面的垂直距离更均匀，从而提高Cell段填充液晶后的Cell Gap的均一性，并有效地解决由于TFT基板上表面溅射成膜厚度差异所带来的Mura等画面品质问题。本领域技术人员能够理解的是，前面针对制备彩膜基板的方法所描述的特征和优点，仍适用于该制备显示面板的方法，在此不再赘述。
在本发明的另一个方面，本发明提出了一种显示面板。根据本发明的实施例，该显示面板是通过前述的方法制备的。其中彩膜基板下表面的透明绝缘层的厚度是通过阵列基板上金属膜层的厚度确定的，由此可以根据实际需要使得彩膜基板和阵列基板之间满足特定的使用要求。在本发明的一些实施例中，彩膜基板下表面上任一点到TFT基板上表面的金属膜层的垂直距离更均匀，从而提高Cell段填充液晶后的Cell Gap的均一性，并有效地解决由于TFT基板上表面溅射成膜厚度差异所带来的Mura等画面品质问题。本领域技术人员能够理解的是，前面针对制备彩膜基板的方法、彩膜基板所描述的特征和优点，仍适用于该显示面板，在此不再赘述。
在本发明的另一个方面，本发明提出了一种显示装置。参照图2～3，对本发明的显示装置进行详细的描述。
根据本发明的实施例，参照图2，该显示装置包括：相对设置的阵列基板(TFT)200和彩膜基板(CF)100，以及设置在阵列基板200和彩膜基板100之间的液晶层300；其中，所述阵列基板200靠近所述彩膜基板100的一侧设置有金属膜层220，所述彩膜基板100靠近所述阵列基板200 的一侧设置有透明绝缘层140，且所述透明绝缘层140的厚度是根据所述金属膜层220的厚度确定的。本领域技术人员可以理解的是，不仅限于阵列基板和彩膜基板，显示装置还可以包括其他必要的部件，例如，配向膜、偏光板或封框胶等，在此不再进行过多赘述。
根据本发明的实施例，参照图3，该彩膜基板还包括：衬底110、黑矩阵层120及彩色滤光层130。其中，黑矩阵层120和彩色滤光层130都设置在衬底110的下表面，且黑矩阵层120有多个开口，彩色滤光层130就设置在黑矩阵层120的多个开口中，而透明绝缘层140设置在彩色滤光层130和黑矩阵层120的下表面。由图中可以看出，左侧示出位置透明绝缘层140的厚度L1相对较薄，右侧示出位置透明光刻胶140的厚度L2相对较厚。
另外，根据本发明的实施例，透明绝缘层140朝向阵列基板的面上任意一点，到阵列基板上金属膜层的朝向彩膜基板的面的垂直距离的最大值与最小值的差值不大于所述最大值的2％。如此，采用上述标准的透明绝缘层，能使彩膜基板的厚度有效地补偿TFT基板的上表面的高度差异，使显示面板的CF基板下表面上任一点到TFT基板的上金属膜层的垂直距离更均匀，从而提高Cell段填充液晶后的Cell Gap的均一性，有效地解决由于TFT基板上表面溅射成膜厚度差异所带来的Mura等画面品质问题。
具体的，在本发明的一些实施例中，透明绝缘层朝向所述阵列基板的面上任意一点到所述金属膜层的朝向彩膜基板的面的垂直距离的最大值与最小值的差值不超过所述最大值的1％。在本发明的另一些实施例中，透明绝缘层朝向所述阵列基板的面上任意一点到所述金属膜层的朝向彩膜基板的面的垂直距离的最大值与最小值相等。由此，该含有该彩膜基板的显示装置的显示效果理想，Mura等画面品质问题得到明显改善。
综上所述，根据本发明的实施例，本发明提出了一种显示装置，由于其Cell Gap的均一性更好，而能有效地解决Mura等画面品质问题。
在本发明的另一个方面，本发明提出了一种涂胶系统。参照图4，对本发明的涂胶进行详细的描述。
根据本发明的实施例，参照图4，该涂胶系统包括三个主要模块：信息获取模块300、透明绝缘层厚度确定模块400和涂胶模块500。其中，信息获取模块300用于获取金属膜层的厚度信息；透明绝缘层厚度确定模块400用于根据金属膜层的厚度信息确定出透明绝缘层的厚度；而涂胶模 块500用于根据透明绝缘层的厚度进行涂胶，其中，所述透明绝缘层设置在彩膜基板的一侧，所述金属膜层设置在与所述彩膜基板配对的阵列基板的一侧，且所述透明绝缘层与所述金属膜层相对设置。该涂胶系统可直接用于上述的彩膜基板、显示面板的制备过程中，从而获得能够补偿存在表面高度差异的TFT基板上金属膜层的CF基板上透明光刻胶层，使CF基板下表面上任一点到TFT基板的上金属膜层的垂直距离更均匀，提高Cell段填充液晶后的Cell Gap的均一性，有效地解决由于TFT基板上表面溅射成膜厚度差异所带来的Mura等画面品质问题。
另外，根据本发明的实施例，信息获取模块300进一步包括：成膜数据获取单元和金属膜层厚度确定单元。其中，成膜数据获取单元用于获取金属膜层的成膜数据；而金属膜层厚度确定单元用于根据成膜数据确定出金属膜层的厚度。如此，将获取到的金属膜层的成膜数据，换算出金属膜层的厚度信息，可以更简便、快捷地获得金属膜层的厚度信息。
具体的，根据本发明的实施例，成膜数据的具体类型不受特殊的限制，可采用本领域内任何已知的数据类型，只要该数据能有效地反映出金属膜层的厚度信息即可。在本发明的一些实施例中，成膜数据包括金属膜层的方块电阻。如此，采用上述的方块电阻的数据，可以更灵敏、快速地反映出金属膜层的厚度信息。
另外，根据本发明的实施例，所述涂胶模块500进一步包括：时间压力曲线确定单元和涂胶处理单元。其中，时间压力曲线确定单元用于根据透明绝缘层的厚度确定出涂胶的时间压力曲线；而涂胶处理单元用于根据时间压力曲线进行涂胶。涂胶示意图可参考图5，其中，涂胶处理单元包括喷嘴510，其用于将透明绝缘层140涂布在彩膜基板100的一侧。如此，在根据金属膜层的厚度信息确定出透明绝缘层的厚度的基础上，确定出涂胶时所需的时间压力曲线，再在CF基板的表面上进行涂胶工艺，可以获得能够补偿存在表面高度差异的预设膜层的透明绝缘层。
根据本发明的实施例，根据金属膜层的厚度确定透明绝缘层的厚度，可以使得透明绝缘层朝向所述阵列基板的面上任意一点到所述金属膜层的朝向彩膜基板的面的垂直距离的最大值与最小值的差值不超过所述最大值的2％。例如，在本发明的一些实施例中，透明绝缘层朝向所述阵列基板的面上任意一点到所述金属膜层的朝向彩膜基板的面的垂直距离的最大值与最小值的差值不超过所述最大值的1％。在本发明的另一些实施 例中，透明绝缘层朝向所述阵列基板的面上任意一点到所述金属膜层的朝向彩膜基板的面的垂直距离的最大值与最小值相等。由此，该含有该彩膜基板的显示装置的显示效果理想，Mura等画面品质问题得到明显改善。综上所述，根据本发明的实施例，本发明提出了一种涂胶系统，能根据存在表面高度差异的金属膜层的厚度信息，调节透明绝缘层的形成厚度，从而使透明绝缘层下表面上任一点到金属膜层的上表面的垂直距离更均匀，有利于提高显示面板的显示效果，改善Mura等画面品质问题。
在本发明的描述中，需要理解的是，术语“中心”、“纵向”、“横向”、“长度”、“宽度”、“厚度”、“上”、“下”、“前”、“后”、“左”、“右”、“竖直”、“水平”、“顶”、“底”、“内”、“外”、“顺时针”、“逆时针”、“轴向”、“径向”、“周向”等指示的方位或位置关系为基于附图所示的方位或位置关系，仅是为了便于描述本发明和简化描述，而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作，因此不能理解为对本发明的限制。
在本发明的描述中，除非另有明确的规定和限定，术语“安装”、“相连”、“连接”、“固定”等术语应做广义理解，例如，可以是固定连接，也可以是可拆卸连接，或成一体；可以是机械连接，也可以是电连接；可以是直接相连，也可以通过中间媒介间接相连，可以是两个元件内部的连通或两个元件的相互作用关系。对于本领域的普通技术人员而言，可以根据具体情况理解上述术语在本发明中的具体含义。
在本说明书的描述中，参考术语“一个实施例”、“一些实施例”、“示例”、“具体示例”、或“一些示例”等的描述意指结合该实施例或示例描述的具体特征、结构、材料或者特点包含于本发明的至少一个实施例或示例中。在本说明书中，对上述术语的示意性表述不必须针对的是相同的实施例或示例。而且，描述的具体特征、结构、材料或者特点可以在任一个或多个实施例或示例中以合适的方式结合。此外，在不相互矛盾的情况下，本领域的技术人员可以将本说明书中描述的不同实施例或示例以及不同实施例或示例的特征进行结合和组合。
尽管上面已经示出和描述了本发明的实施例，可以理解的是，上述实施例是示例性的，不能理解为对本发明的限制，本领域的普通技术人员在本发明的范围内可以对上述实施例进行变化、修改、替换和变型。

Claims (11)

  1. 一种制备彩膜基板的方法，其特征在于，包括：形成透明绝缘层，其中，根据与所述彩膜基板配对的阵列基板上的金属膜层的厚度，确定所述透明绝缘层的厚度。
  2. 根据权利要求1所述的方法，其特征在于，所述透明绝缘层是通过涂胶形成的，且所述形成透明绝缘层的步骤包括：
    获取与所述彩膜基板配对的阵列基板上的金属膜层的成膜数据；
    根据所述成膜数据，确定所述金属膜层的厚度；
    根据所述金属膜层的厚度，确定所述透明绝缘层的厚度；
    根据所述透明绝缘层的厚度，确定涂胶的压力时间曲线；
    根据所述涂胶的压力时间曲线进行涂胶，以形成所述透明绝缘层。
  3. 根据权利要求2所述的方法，其特征在于，所述成膜数据包括所述金属膜层的方块电阻。
  4. 根据权利要求1-3中任一项所述的方法，其特征在于，所述透明绝缘层朝向所述阵列基板的面上任意一点到所述金属膜层的朝向所述彩膜基板的面的垂直距离的最大值与最小值的差值不超过所述最大值的2％。
  5. 一种彩膜基板，其特征在于，所述彩膜基板是通过权利要求1～4中任一项所述的方法制备的。
  6. 一种显示装置，其特征在于，包括：
    阵列基板；
    彩膜基板，所述彩膜基板和所述阵列基板是相对设置的；及
    液晶层，所述液晶层设置于所述阵列基板和所述彩膜基板之间；
    其中，所述阵列基板靠近所述彩膜基板的一侧设置有金属膜层，所述彩膜基板靠近所述阵列基板的一侧设置有透明绝缘层，且所述透明绝缘层的厚度是根据所述金属膜层的厚度确定的。
  7. 根据权利要求6所述的显示装置，其特征在于，所述彩膜基板还包括：
    衬底；
    黑矩阵层，所述黑矩阵层设置在所述衬底朝向所述阵列基板的一侧，且具有多个开口；及
    彩色滤光层，所述彩色滤光层设置在所述衬底朝向所述阵列基板的一 侧，且在所述黑矩阵层的所述多个开口中；
    所述透明绝缘层设置在所述彩色滤光层和所述黑矩阵层远离所述衬底的一侧；
    其中，所述透明绝缘层朝向所述阵列基板的面上任意一点到所述金属膜层的朝向所述彩膜基板的面的垂直距离的最大值与最小值的差值不超过所述最大值的2％。
  8. 一种涂胶系统，其特征在于，包括：
    信息获取模块，用于获取金属膜层的厚度；
    透明绝缘层厚度确定模块，用于根据所述金属膜层的厚度确定透明绝缘层的厚度；
    涂胶模块，用于根据所述透明绝缘层的厚度进行涂胶，
    其中，所述透明绝缘层设置在彩膜基板的一侧，所述金属膜层设置在与所述彩膜基板配对的阵列基板的一侧，且所述透明绝缘层与所述金属膜层相对设置。
  9. 根据权利要求8所述的涂胶系统，其特征在于，所述信息获取模块进一步包括：
    成膜数据获取单元，用于获取所述金属膜层的成膜数据；
    金属膜层厚度确定单元，用于根据所述成膜数据确定所述金属膜层的厚度。
  10. 根据权利要求9所述的涂胶系统，其特征在于，所述涂胶模块进一步包括：
    时间压力曲线确定单元，用于根据所述透明绝缘层的厚度确定所述涂胶的时间压力曲线；
    涂胶处理单元，用于根据所述时间压力曲线进行所述涂胶。
  11. 根据权利要求9所述的涂胶系统，其特征在于，所述成膜数据包括所述金属膜层的方块电阻。
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