WO2018079678A1 - 積層体および電子部品の製造方法 - Google Patents
積層体および電子部品の製造方法 Download PDFInfo
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- WO2018079678A1 WO2018079678A1 PCT/JP2017/038775 JP2017038775W WO2018079678A1 WO 2018079678 A1 WO2018079678 A1 WO 2018079678A1 JP 2017038775 W JP2017038775 W JP 2017038775W WO 2018079678 A1 WO2018079678 A1 WO 2018079678A1
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- WO
- WIPO (PCT)
- Prior art keywords
- curing
- silicone gel
- electronic component
- group
- reaction
- Prior art date
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Definitions
- the present invention provides a curing reactive silicone gel whose physical properties change from a gel layer excellent in retention of soft and electronic parts to a hard cured layer by a curing reaction, and laminated on the gel via an adhesive layer
- a laminate including a sheet-like member formed on a substrate and a method for producing an electronic component using the same.
- Silicone gel can be obtained by curing reaction of organopolysiloxane having a reactive functional group so as to have a low crosslinking density, and has excellent heat resistance, weather resistance, oil resistance, cold resistance, electrical insulation, etc., and Unlike ordinary elastomer products, it is gel-like and has a low elastic modulus, low stress, and excellent stress buffering properties, so it is widely used for protection of damping materials for optical applications, automotive electronic components, consumer electronic components, etc. (For example, Patent Documents 1 to 7).
- silicone gel is soft and easily deformed and can be arranged according to the unevenness of the substrate surface. And has the advantage of being less likely to cause a discrepancy.
- silicone gels are “gelled”, they are vulnerable to external stress due to vibration and deformation due to internal stress due to expansion / contraction due to temperature changes, and the gel is destroyed, protected, and bonded.
- adhesive deposits remain on the target, or the gel aggregates on the substrate. There is a case where it cannot be easily removed from the substrate or the electronic component due to destruction.
- Such gel deposits are not preferable because they can cause defects in electronic components and the like, as well as obstructions during mounting of semiconductors and the like and cause defective products.
- Patent Document 8 shows a tackiness required in the dicing process by the first-stage curing by a two-stage curing reaction, and shows a strong adhesiveness by the second-stage curing, which is suitable for a dicing die bond adhesive sheet.
- a thermosetting composition for use in is disclosed.
- the present applicants have proposed a curable silicone composition in Patent Document 9 that is excellent in initial curability and maintains high physical strength even when exposed to a high temperature of 250 ° C. or higher. .
- the present applicants have proposed a curing reactive silicone gel that can solve the above-described problems, a laminate using the same, a method for manufacturing an electronic component, and the like (Patent Documents 10 and 11).
- a laminate using the curing reactive silicone gel is extremely useful for solving the above problems.
- the curing reactive silicone gel is capable of selectively protecting electronic components against various treatments, and is very useful for manufacturing electronic components because it is difficult to cause defects during processing or dicing of electronic components. Therefore, it can be easily separated from the electronic component as a base material, and the problem of adhesive residue does not occur.
- the silicone gel is pinpointed to the electronic component, the adhesion area of the gel is relatively small, so that it may be difficult to peel off depending on the applied manufacturing apparatus when separating from the base material. Or the surroundings of the hardened layer may be unintentionally damaged, and it is expected that a method that can separate the hardened layer more easily, quickly and reliably will be required, especially in large-scale industrial production processes. Is done.
- the present invention is more suitable for industrial production processes, can protect the substrate from various treatments before curing, has excellent heat resistance, etc., and has low elastic modulus, low stress, excellent stress buffering properties and flexibility. It has a gel layer with excellent softness and retainability such as electronic parts, and after curing, the gel layer has a higher shape retention than before curing and changes to a hard cured layer with excellent releasability. And even if the said hardened layer is local, it aims at providing the laminated body which can be isolate
- the present invention is less likely to cause problems such as adhesion of the silicone gel or cured product thereof to the base material or electronic component by using the laminate, and the cured product can be separated easily, quickly and reliably.
- An object of the present invention is to provide a method of manufacturing an electronic component that is less likely to cause defects in electronic components and defective products.
- the present inventors have found a sheet in which a curing reactive silicone gel is laminated on at least one type of substrate, and is laminated on the curing reactive silicone gel via an adhesive layer. It has been found that the above-mentioned problems can be solved by a laminated body provided with a shaped member, and the present invention has been achieved.
- the present inventors have made the curing reaction after the substrate is an electronic component (including a precursor thereof) and an arbitrary treatment is performed on the electronic component protected by the curing reactive silicone gel. It has been found that the above problems can be solved by a method for producing an electronic component having a step of curing a functional silicone gel and separating a cured product of a sheet-like member and a curing reactive silicone gel from the electronic component substantially simultaneously.
- the invention has been reached.
- the sheet-like member is substantially integrated with the cured product of the cured reactive silicone gel, and by removing the sheet-like member, the cured product that follows it is almost simultaneously on the electronic component. Separated from.
- the present invention is suitable for industrial production processes, can protect the substrate from various treatments before curing, has excellent heat resistance, etc., and has low elastic modulus, low stress, and excellent stress buffering and flexibility. And it has a gel layer with excellent holding properties such as electronic parts, and after curing, the gel layer has a higher shape retention than before curing, and changes to a hard cured layer with excellent releasability, and Even when the cured layer is local, a laminate that can be easily and simply separated from the substrate can be provided. Furthermore, by using the laminate, it is difficult to cause problems such as adhesion of the silicone gel or cured product thereof to the base material or electronic component, and the cured product can be separated easily, quickly and reliably. In addition, it is possible to provide a method for manufacturing an electronic component that does not easily cause a problem of defective products.
- This laminate includes a sheet-like member having a curing reactive silicone gel on at least one type of substrate and laminated on the curing reactive silicone gel via an adhesive layer. Is the body. Details will be described below.
- the laminate is characterized by comprising a curing reactive silicone gel.
- the silicone gel can protect a substrate such as an electronic component from various treatments, exhibits a non-flowable gel, and causes a curing reaction in response to heating, irradiation with high energy rays, and the like. It changes to a hardened layer with higher mold retention than before and excellent releasability.
- the shape of the silicone gel layer is not particularly limited as long as it is a layer, but it is preferably a substantially flat silicone gel when used for the production of electronic components described later.
- the thickness of the silicone gel layer is not particularly limited, but the average thickness may be in the range of 10 to 500 ⁇ m, in the range of 25 to 300 ⁇ m, or in the range of 30 to 200 ⁇ m. When the average thickness is less than 10 ⁇ m, gaps due to unevenness of the electronic component as a base material are difficult to be filled, and when it exceeds 500 ⁇ m, in the electronic component manufacturing application, for the purpose of placement of the electronic component temporarily / processed When a silicone gel layer is used, it may be uneconomical.
- the appearance of the curing reactive silicone gel is not particularly limited, but it is preferably transparent or translucent when performing electronic component processing or dicing (dividing into individual pieces). The gel forms a substantially transparent or translucent gel and cured product unless a coloring material or the like is added.
- the silicone gel is an organopolysiloxane crosslinked product having a relatively low crosslinking density.
- the loss factor tan ⁇ of the silicone gel layer (viscoelasticity measurement) (Measured at a frequency of 0.1 Hz from the apparatus) is preferably in the range of 0.005 to 1.00 or 0.01 to 1.00 at 23 ° C. to 100 ° C., and at 23 ° C. A range of 0.01 to 0.95, or 0.03 to 0.95, and 0.10 to 0.90 is more preferable.
- the curing reaction hardly proceeds rapidly at 50 ° C. or lower, preferably 80 ° C.
- the coefficient tan ⁇ satisfies the above range.
- the loss factor tan ⁇ of the silicone gel layer is determined by separating the silicone gel layer from the substrate or by first curing the curable organopolysiloxane composition as a raw material on the peelable substrate. It can be easily measured by isolating the layer (sheet).
- the silicone gel has a curing reactivity, and is characterized by changing from the gel-like properties and physical properties to a hard cured layer having higher shape retention and excellent releasability. More specifically, the storage elastic modulus G ′ cured of the cured silicone gel obtained by the curing reaction may be increased by 25% or more compared to the storage elastic modulus G ′ gel of the silicone gel before curing. %, Preferably 100% or more, 150% or more, 200% or more, or 300% or more. That is, as G ′ cured / G ′ gel shows a larger value, it means that the soft and flexible gel-like product changes to a hard cured product with higher shape retention. In addition, when the silicone gel before hardening exhibits a comparatively hard physical property, the displacement of the storage elastic modulus before and after hardening may be relatively small.
- the curing reaction mechanism of the silicone gel is not particularly limited, for example, hydrosilylation reaction curing type by alkenyl group and silicon atom-bonded hydrogen atom; dehydration condensation reaction curing by silanol group and / or silicon atom-bonded alkoxy group Type, dealcoholization condensation curing type; peroxide curing reaction type by use of organic peroxide; and radical reaction curing type by irradiation of high energy rays for mercapto groups, etc. Since the reaction can be easily controlled, a hydrosilylation reaction curing type, a peroxide curing reaction type, a radical reaction curing type, and a combination thereof are desirable. These curing reactions proceed upon heating, irradiation with high energy rays, or a combination thereof.
- the silicone gel When the silicone gel is cured by heating, the whole is cured by a curing reaction by heating at a temperature exceeding 100 ° C., preferably exceeding 120 ° C., more preferably 150 ° C. or more, and most preferably 170 ° C. or more. Including at least a step. Heating at 150 ° C. or more is particularly preferably employed when the silicone gel curing reaction mechanism is a peroxide curing reaction type mechanism or a curing reaction mechanism including an encapsulated hydrosilylation reaction catalyst. Is done. Practically, a range of 120 ° C. to 200 ° C. or 150 to 180 ° C. is preferably selected. Although it is possible to heat and cure at a relatively low temperature of 50 ° C. to 100 ° C., the silicone gel layer according to the laminate of the present invention preferably maintains a gel state at a low temperature. It is preferable that the curing reaction does not proceed substantially by heating, that is, the gel state is maintained.
- high energy rays examples include ultraviolet rays, electron beams, and radiation, but ultraviolet rays are preferable in terms of practicality.
- ultraviolet ray generation source a high-pressure mercury lamp, a medium-pressure mercury lamp, a Xe—Hg lamp, a deep UV lamp, or the like is preferable.
- irradiation with ultraviolet rays having a wavelength of 280 to 400 nm, preferably 350 to 400 nm is preferable.
- the irradiation dose at this time is preferably 100 to 10,000 mJ / cm 2.
- a selective hardening reaction is possible irrespective of said temperature conditions.
- a preferable curing operation, a curing reaction mechanism and conditions for curing the curing reactive silicone gel of the present invention are as follows.
- the heating time or the irradiation amount of ultraviolet rays can be appropriately selected according to the thickness of the silicone gel, the desired physical properties after curing, and the like.
- the curing reactive silicone gel is obtained as a gel-like cured product (primary curing reaction) of the curable silicone composition.
- unreacted curing-reactive functional groups or unreacted organic peroxides are present in the silicone cross-linked product constituting the silicone gel layer.
- the next curing reaction proceeds to form a hard cured product with a higher crosslinking density.
- a curable silicone composition is used as a starting material
- a curing-reactive silicone gel which is a constituent of the present invention, is obtained by a primary curing reaction, and the silicone gel is hardened by a secondary curing reaction. It changes into a thing.
- the silicone gel can be cured even with a functional group that is not curing reactive by another curing reaction mechanism, such as an alkyl group.
- the primary curing reaction mechanism for forming the silicone gel from the curable silicone composition is not particularly limited.
- hydrosilylation reaction curing type by alkenyl group and silicon atom-bonded hydrogen atom; silanol group and / or silicon atom bond
- Dehydration condensation reaction curing type by alkoxy group or dealcoholization condensation reaction curing type
- peroxide curing reaction type by use of organic peroxide
- radical reaction curing type by irradiation of high energy rays for mercapto groups, etc .
- photoactive platinum complex The hydrosilylation reaction hardening type by high energy ray irradiation using a curing catalyst etc. is mentioned.
- the (secondary) curing reaction mechanism of the silicone gel and the mechanism of the primary curing reaction when forming the silicone gel may be the same or different.
- the silicone gel layer is heated at a high temperature to form a silicone gel layer. It may be cured.
- the curable silicone composition It is necessary that unreacted curable reactive groups and a curing agent remain in the silicone gel obtained by first curing the product.
- the silicone gel since the silicone gel is curing reactive, it preferably contains one or more curing agents selected from hydrosilylation reaction catalysts, organic peroxides, and photopolymerization initiators. These curing agents may be encapsulated.
- an encapsulated curing agent particularly a hydrosilylation reaction catalyst, is preferably used.
- a hydrosilylation reaction catalyst such as a photoactive platinum complex curing catalyst that accelerates the hydrosilylation reaction by irradiation with high energy rays such as ultraviolet rays may be used.
- These curing agents are designed in such a way that when a curing-reactive silicone gel is formed by primary curing of the curable silicone composition, it remains in the silicone gel as a curing agent after the primary curing. Or, select the conditions so that the primary curing reaction and the secondary curing reaction after the formation of the silicone gel are different, and add a curing agent corresponding to each, so that there is no reaction in the silicone gel. It can be left in the state.
- Examples of the hydrosilylation reaction catalyst include a platinum-based catalyst, a rhodium-based catalyst, and a palladium-based catalyst, and a platinum-based catalyst is preferable because curing of the composition can be significantly accelerated.
- Examples of the platinum catalyst include fine platinum powder, chloroplatinic acid, an alcohol solution of chloroplatinic acid, a platinum-alkenylsiloxane complex, a platinum-olefin complex, a platinum-carbonyl complex, and a platinum resin such as silicone resin, polycarbonate
- Examples thereof include catalysts dispersed or encapsulated with thermoplastic resins such as resins and acrylic resins, and platinum-alkenylsiloxane complexes are particularly preferred.
- alkenylsiloxane examples include 1,3-divinyl-1,1,3,3-tetramethyldisiloxane, 1,3,5,7-tetramethyl-1,3,5,7-tetravinylcyclotetrasiloxane, Examples thereof include alkenyl siloxanes in which part of the methyl groups of these alkenyl siloxanes are substituted with ethyl groups, phenyl groups, and the like, and alkenyl siloxanes in which the vinyl groups of these alkenyl siloxanes are substituted with allyl groups, hexenyl groups, and the like.
- 1,3-divinyl-1,1,3,3-tetramethyldisiloxane is preferred because the platinum-alkenylsiloxane complex has good stability.
- stimulates hydrosilylation reaction you may use non-platinum type metal catalysts, such as iron, ruthenium, and iron / cobalt.
- the curing reactive silicone gel of the present invention may use a particulate platinum-containing hydrosilylation reaction catalyst dispersed or encapsulated with a thermoplastic resin.
- a particulate platinum-containing hydrosilylation reaction catalyst dispersed or encapsulated with a thermoplastic resin.
- the storage stability of the curing reactive silicone gel is improved and the temperature of the curing reaction is controlled.
- the advantage is obtained. That is, at the time of forming the silicone gel by the primary curing reaction, the encapsulated curing agent is selected by selecting a temperature condition in which the thermoplastic resin such as wax forming the capsule (the capsule wall material containing the curing agent) does not melt. It can remain in the silicone gel in an unreacted and inert state.
- curing agent can be expected. Furthermore, in the curing reaction (secondary curing reaction) of the silicone gel, by selecting high temperature conditions that exceed the melting temperature of the thermoplastic resin that forms the capsule, the reaction activity of the curing agent in the capsule can be controlled only under specific high temperature conditions. It can be expressed selectively. Thereby, it is possible to easily control the curing reaction of the silicone gel.
- a thermoplastic resin such as wax (a capsule wall material containing a curing agent) is appropriately selected according to the temperature conditions for forming the silicone gel and the temperature conditions for curing the curing reactive silicone gel.
- the curing agent is not limited to a platinum-containing hydrosilylation reaction catalyst.
- a hydrosilylation reaction catalyst such as a photoactive platinum complex curing catalyst that accelerates the hydrosilylation reaction by irradiation with high energy rays such as ultraviolet rays may be used in addition to heating.
- Such hydrosilylation reaction catalyst is preferably exemplified by a ⁇ -diketone platinum complex or a platinum complex having a cyclic diene compound as a ligand, such as trimethyl (acetylacetonato) platinum complex, trimethyl (2,4-pentanedionate).
- the silicone gel is formed by the primary curing reaction or the silicone by the secondary curing using the curable silicone composition as a raw material without performing a heating operation.
- the curing reaction of the gel can be advanced.
- the content of the catalyst for hydrosilylation reaction is such that when the entire silicone gel is 100 parts by mass, the amount of metal atoms is in the range of 0.01 to 500 ppm by mass, and the amount is in the range of 0.01 to 100 ppm. Alternatively, the amount is preferably in the range of 0.01 to 50 ppm.
- the organic peroxide examples include alkyl peroxides, diacyl peroxides, peroxide esters, and carbonates.
- the 10-hour half-life temperature of the organic peroxide is preferably 70 ° C. or higher, and may be 90 ° C. or higher.
- the primary curing reaction that forms the silicone gel when high energy ray irradiation is selected, it is preferable to select an organic peroxide that is not deactivated by the primary curing.
- alkyl peroxides examples include dicumyl peroxide, di-tert-butyl peroxide, di-tert-butylcumyl peroxide, 2,5-dimethyl-2,5-di (tert-butylperoxy) hexane, , 5-dimethyl-2,5-di (tert-butylperoxy) hexyne-3, tert-butylcumyl, 1,3-bis (tert-butylperoxyisopropyl) benzene, 3,6,9-triethyl-3, An example is 6,9-trimethyl-1,4,7-triperoxonane.
- diacyl peroxides examples include benzoyl peroxide such as p-methylbenzoyl peroxide, lauroyl peroxide, and decanoyl peroxide.
- Peroxyesters include 1,1,3,3-tetramethylbutylperoxyneodecanoate, ⁇ -cumylperoxyneodecanoate, tert-butylperoxyneodecanoate, tert-butylperoxy Neoheptanoate, tert-butylperoxypivalate, tert-hexylperoxypivalate, 1,1,3,3-tetramethylbutylperoxy-2-ethylhexanoate, tert-amylperoxyl-2- Ethylhexanoate, tert-butylperoxy-2-ethylhexanoate, tert-butylperoxyisobutyrate, di-tert-butylperoxyhexahydroterephthalate, tert-amylperoxy-3,5,5- Trimethylhexanoate, tert-butylperoxy-3,5,5 Trimethyl hexanoate, tert
- peroxide carbonates examples include di-3-methoxybutyl peroxydicarbonate, di (2-ethylhexyl) peroxydicarbonate, diisopropyl peroxycarbonate, tert-butylperoxyisopropyl carbonate, and di (4-tert-butylcyclohexyl).
- Peroxydicarbonate, dicetyl peroxydicarbonate, and dimyristyl peroxydicarbonate are exemplified.
- This organic peroxide preferably has a half-life of 10 hours and a temperature of 70 ° C. or higher, and may be 90 ° C. or higher or 95 ° C. or higher.
- Such organic peroxides include p-methylbenzoyl peroxide, dicumyl peroxide, di-t-butyl peroxide, di-t-hexyl peroxide, t-butylcumyl peroxide, 2,5- Dimethyl-2,5-di (tert-butylperoxy) hexane, 1,3-bis (tert-butylperoxyisopropyl) benzene, di- (2-tert-butylperoxyisopropyl) benzene, 3,6,9- An example is triethyl-3,6,9-trimethyl-1,4,7-triperoxonan.
- the content of the organic peroxide is not limited, but it should be in the range of 0.05 to 10 parts by mass, or in the range of 0.10 to 5.0 parts by mass when the entire silicone gel is 100 parts by mass. Is preferred.
- the photopolymerization initiator is a component that generates radicals upon irradiation with high energy rays such as ultraviolet rays and electron beams.
- acetophenone, dichloroacetophenone, trichloroacetophenone, tert-butyltrichloroacetophenone, 2,2-diethoxyacetophenone, p- Acetophenone such as dimethylaminoacetophenone and derivatives thereof; benzoin and derivatives thereof such as benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin butyl ether, benzoin n-butyl ether; benzophenone, 2-chlorobenzophenone, p, p′-dichlorobenzophenone, p Benzophenones and derivatives thereof, such as, p'-bisdiethylaminobenzophenone; p-dimethylaminopropiophenone, Michler's ketone, be
- the blending amount of the photopolymerization initiator is not particularly limited, but is preferably in the range of 0.1 to 10 parts by mass with respect to 100 parts by mass of the whole silicone gel.
- the silicone gel contains a photopolymerization initiator as a curing agent
- other optional components such as n-butylamine, di-n-butylamine, tri-n-butylphosphine, allylthio are included in the silicone gel.
- It may contain a photosensitizer such as urea, s-benzylisothiuronium-p-toluenesulfinate, triethylamine, diethylaminoethyl methacrylate, and the like.
- the silicone gel layer is not particularly limited by the composition and primary curing conditions of the curable silicone composition that is the raw material. After forming, it has good storage stability at room temperature to 100 ° C. and maintains a gel state, and is irradiated with high energy rays or heated at 100 ° C. or higher, preferably 120 ° C. or higher, more preferably 150 ° C. or higher. It is preferable that the secondary curing reaction proceeds selectively and the control thereof is easy.
- the curable silicone composition as a raw material is gelled in a temperature range of room temperature to 100 ° C., ie, at a relatively low temperature. It is preferable to be cured.
- a curing mechanism including a hydrosilylation curing reaction or a curing reaction with an organic peroxide is selected as a secondary curing reaction after the formation of the silicone gel, these curing reactions proceed sufficiently at a low temperature of 100 ° C. or lower.
- a curing reactive functional group or curing agent remains unreacted in the silicone gel formed by the primary curing reaction in the above temperature range, and a curing reactive silicone gel layer that can be selectively cured at a high temperature can be easily obtained. There are benefits to be gained.
- Such a curing reactive silicone gel layer is obtained by curing a curable silicone composition containing at least a resinous or branched organopolysiloxane in a gel state, particularly when a hydrosilylation reaction is selected as a primary curing reaction.
- a curable silicone composition containing a resinous organopolysiloxane having at least two alkenyl groups in one molecule is preferably cured in a gel form.
- the resin-like or branched-chain curing-reactive organopolysiloxane is composed of a tetrafunctional siloxy unit represented by SiO 4/2 or RSiO 3/2 (R is a monovalent organic group or hydroxyl group).
- the substrate on which the silicone gel layer is laminated may have irregularities, and it is particularly preferable that the irregularities are filled or followed without gaps by the silicone gel layer to form a flat silicone gel layer. Since the curing reactive silicone gel layer of the present invention is flexible and has excellent deformability and followability, it is less likely to cause gaps even on uneven substrates, and problems such as separation and deformation of the silicone gel surface are less likely to occur. There is.
- the purpose of laminating the silicone gel layer is not particularly limited, but when the base material is an electronic component, the laminating portion of the silicone gel layer can be selectively protected from various treatments, and a flexible silicone gel layer can be used. It may be possible to protect against physical shock and vibration.
- the base material used in the present invention is not particularly limited, and a desired base material may be appropriately selected.
- an electronic component or a precursor thereof is particularly preferable.
- the material is, for example, an adherend made of glass, ceramic, mortar, concrete, wood, aluminum, copper, brass, zinc, silver, stainless steel, iron, tin, tinplate, nickel-plated surface, epoxy resin, phenol resin, etc.
- a base is illustrated.
- examples include an adherend or a substrate made of a thermoplastic resin such as polycarbonate resin, polyester resin, ABS resin, nylon resin, polyvinyl chloride resin, polyphenylene sulfide resin, polyphenylene ether resin, polybutylene terephthalate resin. These may be rigid plate shapes or flexible sheet shapes. Further, it may be an extensible film-like or sheet-like substrate used for a substrate such as a dicing tape.
- the base material used in the present invention may be subjected to surface treatment such as primer treatment, corona treatment, etching treatment, plasma treatment or the like for the purpose of improving the adhesion and adhesion to the curing reactive silicone gel layer.
- surface treatment such as primer treatment, corona treatment, etching treatment, plasma treatment or the like for the purpose of improving the adhesion and adhesion to the curing reactive silicone gel layer.
- the cured reactive silicone gel layer is cured to form a cured product layer excellent in mold retention and releasability, and even after low adhesion, the cured product layer and the base material It becomes possible to keep the adhesive force sufficiently high and to more easily separate the electronic components and the like disposed on the cured layer.
- a base material is an electronic component or its precursor.
- semiconductor elements there are semiconductor elements, pedestals on which electronic components are at least temporarily arranged in the manufacturing process, semiconductor wafers for lamination, ceramic elements (including ceramic capacitors), base materials that can be used as substrates for electronic circuits, etc. These may be exemplified, and these may be separated by dicing later.
- a base material usable as a semiconductor element, a pedestal for processing electronic components, a circuit board, a semiconductor substrate, or a semiconductor wafer is preferable.
- the material of these base materials is not particularly limited, but as a member suitably used as a circuit board or the like, an organic resin such as a glass epoxy resin, a bakelite resin or a phenol resin; a ceramic such as alumina; a copper or aluminum Examples of such materials include metals such as silicon wafers and semiconductor wafers. Furthermore, when the base material is used as an electronic component, particularly a semiconductor element or a circuit board, a conductive wire made of a material such as copper, silver or palladium may be printed on the surface thereof.
- the curing reactive silicone gel of the present invention has an advantage that a flat silicone gel surface can be formed by filling or following the irregularities on the surface of these semiconductor elements and circuit boards without gaps. Further, the surface on which the silicone gel is formed can be selectively protected from physical impact and various treatments.
- the laminate of the present invention preferably has one or more electronic components as a substrate.
- electronic components there are no particular restrictions on the type of electronic component, but examples include semiconductor wafers, ceramic elements (including ceramic capacitors), semiconductor chips, and light-emitting semiconductor chips, which are the same as or different from each other.
- a curing reactive silicone gel layer may be disposed on the electronic component.
- the curing-reactive silicone gel layer in the laminate of the present invention is gel-like and the curing conditions can be selected, so that even when handled in a temperature range where the temperature is somewhat high, the curing reaction hardly proceeds.
- it since it is reasonably flexible and has excellent followability and deformability, it can form a stable and flat surface.
- the silicone gel selectively protects the laminated surface from various treatments, and the manufacturing process of electronic components
- the electronic component laminated with the silicone gel is stably held in place, and processing such as various pattern formation and dicing is performed on the electronic component.
- processing defects of the electronic component are hardly generated due to surface unevenness of the base material, positional displacement of the electronic component, and vibration displacement (damping).
- maintenance of the electronic component etc. by a gel originates in the viscoelasticity of a gel, and includes both by the weak adhesive force of the gel itself, and carrying
- These electronic components may be subjected to chemical or physical treatment before forming a laminate, or may be subjected to the above treatment after laminating a silicone gel on the electronic component.
- the portion where the silicone gel is laminated can be selectively protected from these treatments, so that a desired chemical or physical treatment can be applied only to a specific portion of the electronic component.
- the present invention is particularly useful for selective protection of electronic components because the cured product can be efficiently separated even if the silicone gel is local or pinpoint.
- the processing on these electronic components includes, but is not limited to, forming at least partially an electronic circuit or an electrode pattern, a conductive film, an insulating film, and the like.
- conventionally known means can be used without any particular limitation, and formed by vacuum deposition, sputtering, electroplating, chemical plating (including electroless plating), etching, printing, or lift-off. May be.
- the laminate of the present invention is used for the production of an electronic component, it is particularly preferable to form an electronic circuit, an electrode pattern, a conductive film, an insulating film, etc. of the electronic component after laminating a curing reactive silicone gel. You may divide the said laminated body into pieces (dicing). As described above, processing defects of these electronic components are suppressed by using the silicone gel layer.
- the top / bottom / left / right relationship between the electronic component as the substrate and the silicone gel layer can be selected as desired.
- the above silicone gel forms a cured layer with excellent shape retention, hardness and surface releasability by curing, the cured layer can be easily removed from the electronic component in a laminate based on the above electronic component.
- foreign matter such as a residue (glue residue) derived from silicone gel is difficult to adhere to an electronic component and a defective product is hardly generated.
- the formation of a joined body with the sheet-like substrate described below enables quick, simple and reliable separation of the cured product.
- the sheet-like member is at least partially provided with an adhesive layer, and is laminated on the curing reactive silicone gel via the adhesive layer.
- the sheet-like member and the cured product form a joined body and are substantially integrated. It can be separated from the substrate.
- the cured product obtained by curing the curing reactive silicone gel may cause problems such as breakage and complication of the peeling process depending on the type of machine used for separation, but it is integrated with the sheet-like member.
- the cured silicone gel can be easily separated even locally or pinpointed, and can be easily, quickly and reliably separated from the substrate. Especially in industrial production processes, Realize significant advantages of shortening and man-hour reduction.
- a so-called “adhesive film” or a member called “adhesive sheet” can be used without any particular limitation, and is substantially flat and suitable for the use of tape, film, etc.
- a substrate having a width and thickness can be used without any particular limitation. Specifically, paper, synthetic resin film, cloth, synthetic fiber, metal foil (aluminum foil, copper foil, etc.), glass fiber, and a composite sheet formed by laminating a plurality of these sheet-like substrates.
- a base material is mentioned. In particular, it is preferably a synthetic resin film.
- polyester polytetrafluoroethylene
- polyimide polyphenylene sulfide
- polyamide polycarbonate
- polystyrene polypropylene
- polyethylene polyvinyl chloride
- polyvinylidene chloride polycarbonate
- polyethylene terephthalate nylon
- a resin film can be illustrated.
- the thickness is not particularly limited, but is usually about 5 to 300 ⁇ m.
- the synthetic resin film or the like may be subjected to surface treatment such as primer treatment, corona treatment, etching treatment, plasma treatment or the like. Thereby, the adhesiveness and integrity of the adhesive layer and the sheet-like member described below are improved.
- the adhesive layer of the sheet-like member is not particularly limited in its type, but it is intended to form a bonded body with a cured product of a curing reactive silicone gel and separate it as a single unit.
- it is preferable to form a strong bond that causes the failure mode of the adhesive layer to be cohesive failure, and is a stronger adhesive material than a sticky substance that causes interfacial debonding at the so-called adhesion surface Is preferred.
- Such adhesive substances include isocyanate, polyvinyl alcohol, gelatin, vinyl latex, water-based polyester, natural rubber, synthetic rubber, acrylic resin, silicone, urethane, and vinyl.
- Adhesive polymers such as alkyl ethers, polyvinyl alcohols, polyvinyl pyrrolidones, polyacrylamides, and celluloses can be used. These adhesives adhere firmly to the cured product of the curing reactive silicone gel under specific adhesion conditions, and form a joined body of the sheet-like base material and the cured product.
- a silicone-based adhesive layer from the viewpoint of forming a bonded body with a cured product of a curing reactive silicone gel.
- the silicone-based adhesive layer may be curable by the same or different curing mechanism as the above-described curing reactive silicone gel.
- a peroxide curing reactive silicone gel may be used as a peroxide curing reactive silicone.
- the above-mentioned sheet-like member is laminated through a system adhesive layer, and the two are integrally heated to promote a peroxide curing reaction, and the cured product of the silicone gel and the adhesive layer are firmly bonded, and the sheet-like member and the silicone are bonded.
- a cured reaction product in which the cured product of the gel is integrated can be obtained.
- the reaction mechanism of both can be suitably selected according to the processing method of the desired laminated body thru
- Particularly preferable examples include hydrosilylation reaction curable silicone adhesives, peroxide curable silicone adhesives, and high energy ray curable silicone adhesives. It may be a silicone-based adhesive that is cured by a curing mechanism.
- the laminate of the present invention is obtained by laminating a sheet-like member on a base material with a silicone gel and an adhesive layer interposed therebetween.
- the laminate is a curable silicone composition that is a raw material composition of a silicone gel. It can be manufactured by applying onto a substrate to be cured and gelling. Similarly, the silicone gel is formed on a sheet-like substrate provided with a desired release layer, the silicone gel layer is separated from the release layer, transferred onto another substrate, and further the sheet is passed through the adhesive layer. It can also be manufactured by laminating the shaped members.
- the silicone gel can be laminated on the entire surface of the substrate or locally, and the substrate can be protected at a pinpoint.
- a step (A-1) of applying a curable silicone composition capable of forming a silicone gel layer by a primary curing reaction on at least one type of substrate And a step (A-2) of forming a curing reactive silicone gel layer by first curing the curable silicone composition in a gel form on a substrate, and an adhesive layer on the curing reactive silicone gel layer Step of laminating sheet-like members (A-3) It can obtain by the manufacturing method which has this.
- the laminate of the present invention is a process in which a curable silicone composition capable of forming a silicone gel layer by a primary curing reaction is applied onto a release layer of a sheet-like substrate (base R) provided with a release layer.
- the surface of the laminated silicone gel layer which is different from the base material R and faces at least one kind of base material, is used for the purpose of improving its adhesion and adhesiveness.
- Surface treatment such as primer treatment, corona treatment, etching treatment, and plasma treatment may be preferably performed on the surface of the silicone gel facing the material.
- the improvement in the adhesion has an advantage that the substrate R can be easily separated.
- a curing-reactive silicone gel layer is formed on a sheet-like base material (base material R) provided with the release layer, and then separated from the release layer and handled as a sheet-like member, the following method is used to obtain a uniform A silicone gel layer having a surface may be formed.
- the curing reactive silicone gel layer is substantially flat.
- the curable silicone composition as a raw material is applied onto a substrate having a release layer by a usual method, the cured silicone is particularly cured.
- the thickness of the gel layer is 50 ⁇ m or more, the surface of the resulting silicone gel layer may be non-uniform by forming a non-uniform surface with a concave coating surface.
- a base material having a release layer is applied to the curable silicone composition and the silicone gel layer, and an uncured coated surface is provided with each release layer (the above-mentioned base material R; separator) ) To form a flattened layer that is physically uniformized to obtain a flattened curing-reactive silicone gel layer.
- a laminate in which an uncured curable silicone composition is applied between separators having a release layer is rolled using a known rolling method such as roll rolling. It is preferable.
- the curing reactive silicone gel layer constituting the laminate of the present invention is obtained by first curing a curable silicone composition in a gel form.
- the primary curing reaction for forming the silicone gel layer may be a curing reaction mechanism different from the secondary curing reaction of the silicone gel itself, or may be the same curing reaction mechanism.
- the curable silicone composition is cured in a gel form in a temperature range of room temperature to 100 ° C.
- Such a curable silicone composition preferably contains (A) an organopolysiloxane having at least two curing reactive groups and (C) a curing agent in one molecule, and optionally (B ) Contains organohydrogenpolysiloxane.
- the above component (A) contains (A-1) at least two curing reactive groups in one molecule.
- A-2) a mixture of a resinous or branched organopolysiloxane having at least two curing reactive groups in one molecule
- B) Organohydrogenpolysiloxane and (C) a curing agent.
- the curing reactive group is not particularly limited, and examples thereof include a photopolymerizable functional group such as an alkenyl group or a mercapto group.
- the curable silicone composition described above is a hydrosilylation reaction curing type using an alkenyl group and a silicon atom-bonded hydrogen atom; a dehydration condensation reaction using a silicon atom-bonded alkoxy group such as a silanol group and / or an alkoxysilyl group.
- Curing type or dealcoholization condensation reaction curing type peroxide curing reaction type by using organic peroxides; and radical reaction curing type by irradiation of high energy rays for mercapto groups, etc .; photoactive platinum complex curing catalyst, etc.
- a curing reactive silicone gel is formed by a curing reaction such as a hydrosilylation reaction curing type by high energy ray irradiation.
- the peroxide curing reaction when selected, it may be a gel-like functional group that is a functional group that is not curing reactive by another curing reaction mechanism, such as an alkyl group.
- the above-described curing reactive group includes at least an alkenyl group, and particularly includes an alkenyl group having 2 to 10 carbon atoms.
- the alkenyl group having 2 to 10 carbon atoms include a vinyl group, an allyl group, a butenyl group, and a hexenyl group.
- the alkenyl group having 2 to 10 carbon atoms is a vinyl group.
- the curable silicone composition preferably contains an organohydrogenpolysiloxane having two or more Si—H bonds in the molecule as a crosslinking agent.
- the alkenyl group of the organopolysiloxane can undergo a hydrosilylation reaction with the silicon atom-bonded hydrogen atom of the organohydrogenpolysiloxane to form a curing reactive silicone gel layer.
- the primary curing reaction of the present invention is preferably performed at 100 ° C. or lower, preferably 80 ° C. or lower.
- the primary curing reaction is a hydrosilylation curing reaction
- high energy beam irradiation using a photoactive platinum complex curing catalyst or the like may be performed, and the curing reaction does not proceed sufficiently at low temperature, and the gel has a low crosslinking density.
- a cured product may be formed
- the above-mentioned curing reactive group is a silanol group (Si—OH) or a silicon atom-bonded alkoxy group
- the alkoxy group includes a methoxy group, an ethoxy group, and a propoxy group.
- Preferable examples include alkoxy groups having 1 to 10 carbon atoms such as groups.
- the alkoxy group may be bonded to the side chain or terminal of the organopolysiloxane, may be in the form of an alkylalkoxysilyl group or an alkoxysilyl group-containing group bonded to a silicon atom via another functional group, And preferred.
- the organopolysiloxane having a curing reactive group has a functional group of a dehydration condensation reaction curing type or a dealcoholization condensation reaction curing type, and has a curing reactive group by another curing mechanism in the same molecule. Also good.
- a hydrosilylation reactive functional group or a photopolymerizable functional group may be present in the same molecule.
- a curing reactive functional group is not particularly required. Therefore, a dehydration condensation reaction curing type or dealcoholization condensation reaction curing type curable silicone composition containing an organic peroxide is used.
- a gel-like cured layer is formed by a condensation reaction, and then the gel layer is secondarily cured with an organic peroxide by heating or the like.
- the curing reactive group has the general formula of silicon atom bond:
- An alkoxysilyl group-containing group represented by the formula is suitably exemplified.
- R 1 is the same or different monovalent hydrocarbon group having no aliphatic unsaturated bond, and is preferably a methyl group or a phenyl group.
- R 2 is an alkyl group, and is preferably a methyl group, an ethyl group or a propyl group in order to constitute a dealcohol-condensation reactive alkoxy group.
- R 3 is an alkylene group bonded to a silicon atom, preferably an alkylene group having 2 to 8 carbon atoms.
- a is an integer of 0 to 2
- p is an integer of 1 to 50. From the standpoint of dealcohol condensation reactivity, most preferably, a is 0, and it is preferably a trialkoxysilyl group-containing group.
- a hydrosilylation reactive functional group or a photopolymerization reactive functional group may be included in the same molecule.
- the primary curing reaction is a dehydration condensation reaction curing type or a dealcoholization condensation reaction curing type
- the above-mentioned crosslinking agent is not necessary, but an organohydrogenpolysiloxane may be included to advance the secondary curing reaction. .
- a condensation reaction catalyst is not particularly limited, and examples thereof include organic tin compounds such as dibutyltin dilaurate, dibutyltin diacetate, tin octenoate, dibutyltin dioctate, and tin laurate; tetrabutyl titanate, tetrapropyl Organic titanium compounds such as titanate and dibutoxybis (ethylacetoacetate); other acidic compounds such as hydrochloric acid, sulfuric acid and dodecylbenzenesulfonic acid; alkaline compounds such as ammonia and sodium hydroxide; 1,8-diazabicyclo [5.4.0] Examples include amine compounds such as undecene (DBU) and 1,4-diazabicyclo [2.2.2] octane (DABCO).
- DBU undecene
- DABCO 1,4-diazabicyclo [2.2.2] octane
- the curing reactive group may be a radical reactive functional group by peroxide, such as an alkyl group, an alkenyl group, an acrylic group, a hydroxyl group, etc.
- Peroxide curing reactive functional groups can be used without limitation. However, as described above, since the peroxide curing reaction generally proceeds at a high temperature of 150 ° C. or higher, in the laminate of the present invention, the peroxide curing reaction is a curing of the silicone gel layer, that is, a secondary curing reaction. Preferably it is selected.
- the curing reaction with most of the curing reactive functional groups is completely terminated, and a gel-like cured product layer is obtained. This is because it may not be possible.
- some organic peroxides may be deactivated by high energy ray irradiation, it is preferable to appropriately select the type and amount of the organic peroxide according to the primary curing reaction.
- the curing reactive functional group is a photopolymerizable functional group, a mercaptoalkyl group such as a 3-mercaptopropyl group, and an alkenyl group similar to the above, or Acrylamide groups such as N-methylacrylamidepropyl.
- the conditions for irradiating the high energy beam irradiation are not particularly limited.
- the composition is cooled at room temperature or cooled in air, in an inert gas such as nitrogen gas, argon gas, helium gas or in vacuum. A method of irradiating while heating to ⁇ 150 ° C.
- the curable silicone composition may be coated.
- ultraviolet rays having a wavelength of 280 to 450 nm, preferably 350 to 400 nm are used, and the curable silicone composition is first cured in a gel state at room temperature, the cured reactive silicone gel layer is subjected to other heating.
- the curing reactive silicone gel layer comprises (A) an organopolysiloxane having a curing reactive group as described above, and (B) an organohydrogenpolysiloxane and (C) a curing agent containing a curing agent depending on the curing reaction.
- the curable silicone composition comprises (A-1) a linear organopolysiloxane having at least two curing reactive groups in one molecule, and (A-2) at least two in one molecule. It is preferable to include a resinous or branched organopolysiloxane having a curing reactive group.
- the component (A-1) is a linear organopolysiloxane having at least two curing reactive groups in one molecule.
- the property at room temperature of the component (A-1) may be oily or raw rubber, and the viscosity of the component (A-1) is preferably 50 mPa ⁇ s or more, particularly 100 mPa ⁇ s or more at 25 ° C.
- the component (A-1) preferably has a viscosity of 100,000 mPa ⁇ s or more at 25 ° C. or a raw rubber having a plasticity. .
- the component (A-1) having a lower viscosity can be used.
- the component (A-2) is a resinous or branched organopolysiloxane having at least two curing reactive groups in one molecule, and in particular, at least two curing reactions in one molecule.
- the use of a resinous curing reactive organopolysiloxane (organopolysiloxane resin) having a functional group is particularly preferred.
- the component (A-2) is, for example, an R 2 SiO 2/2 unit (D unit) and an RSiO 3/2 unit (T unit) (wherein R is independently of each other a monovalent organic group or a hydroxyl group).
- a resin also referred to as MQ resin
- MQ resin comprising R3SiO1 / 2 units (M units) and SiO4 / 2 units (Q units) and having at least two curing reactive groups, hydroxyl groups or hydrolyzable groups in the molecule. It is preferable to use it.
- the hydroxyl group or hydrolyzable group is directly bonded to silicon such as T unit or Q unit in the resin, and is a group generated as a result of silane-derived or silane hydrolysis as a
- the curing reactive functional groups of the component (A-1) and the component (A-2) may be functional groups related to the same curing reaction mechanism, or may be related to different curing reaction mechanisms. Further, the curing reactive functional groups of the component (A-1) and the component (A-2) may be functional groups related to two or more different curing reaction mechanisms in the same molecule.
- the component (A-1) or the component (A-2) is an organopolysiloxane having a photopolymerizable functional group and / or a hydrosilylation reactive functional group and a condensation reactive functional group in the same molecule.
- the structure may be linear in the component (A-1) and resinous or branched in the component (A-2).
- the component (A-2) is preferably included, but as described above, the component (A-2) includes two or more different types. It may be and is preferably a resinous or branched organopolysiloxane having a functional group related to the curing reaction mechanism.
- Component (B) is an organohydrogenpolysiloxane, which is an optional crosslinking component or molecular chain extension component, particularly when the curing reactive functional group is an alkenyl group and the curing agent includes a hydrosilylation reaction catalyst. It is preferable to contain.
- the component (B) is an organohydrogenpolysiloxane having two or more Si—H bonds in the molecule.
- Component (C) is a curing agent, and is one or more curing agents selected from the above hydrosilylation reaction catalyst, organic peroxide and photopolymerization initiator.
- said curable silicone composition can contain components other than the said component.
- curing retarder for example, curing retarder; adhesion-imparting agent; non-reactive organopolysiloxane such as polydimethylsiloxane or polydimethyldiphenylsiloxane; phenol, quinone, amine, phosphorus, phosphite, sulfur, or thioether Antioxidants such as triazoles or benzophenones; flame retardants such as phosphate esters, halogens, phosphorus, or antimony; cationic surfactants, anionic surfactants, or non One or more kinds of antistatic agents composed of ionic surfactants, dyes, pigments, reinforcing fillers, thermally conductive fillers, dielectric fillers, electrically conductive fillers, releasable components, and the like can be included.
- the visibility of the cured reactive silicone gel or its cured product can be included.
- the reinforcing filler is a component that imparts mechanical strength to the silicone gel and improves thixotropy, and the silicone gel layer softens against heating when the silicone gel layer undergoes a secondary curing reaction.
- deterioration or deformation of the shape retention can be suppressed.
- the mechanical strength, shape retention, and surface release properties of the cured product after the secondary curing reaction may be further improved by blending the reinforcing filler.
- reinforcing filler examples include fumed silica fine powder, precipitated silica fine powder, calcined silica fine powder, fumed titanium dioxide fine powder, quartz fine powder, calcium carbonate fine powder, diatomaceous earth fine powder, oxidation
- inorganic fillers such as aluminum fine powder, aluminum hydroxide fine powder, zinc oxide fine powder, and zinc carbonate fine powder, and these inorganic fillers include organoalkoxysilanes such as methyltrimethoxysilane and trimethylchlorosilane.
- Siloxanes such as organosilazanes such as organohalosilanes, hexamethyldisilazanes, ⁇ , ⁇ -silanol-capped dimethylsiloxane oligomers, ⁇ , ⁇ -silanol-capped methylphenylsiloxane oligomers, ⁇ , ⁇ -silanol-capped methylvinylsiloxane oligomers
- the surface-treated inorganic filler may be contained.
- a hydrosilylation reaction inhibitor should be added as a curing retarder. Is preferred.
- the content of the curing retarder is not limited, but is preferably in the range of 10 to 10000 ppm by mass with respect to the cur
- an organosilicon compound having at least one alkoxy group bonded to a silicon atom in one molecule is preferable.
- the alkoxy group include a methoxy group, an ethoxy group, a propoxy group, a butoxy group, and a methoxyethoxy group, and a methoxy group is particularly preferable.
- a halogen-substituted or unsubstituted monovalent hydrocarbon group such as an alkyl group, an alkenyl group, an aryl group, an aralkyl group, and a halogenated alkyl group
- Glycidoxyalkyl groups such as 3-glycidoxypropyl group and 4-glycidoxybutyl group
- Examples include epoxycyclohexylalkyl groups; epoxyalkyl groups such as 3,4-epoxybutyl groups and 7,8-epoxyoctyl groups; acrylic group-containing monovalent organic groups such as 3-methacryloxypropyl groups; and hydrogen atoms.
- This organosilicon compound preferably has an alkenyl group or a group capable of reacting with a silicon atom-bonded hydrogen atom in the composition, and specifically, preferably has a silicon atom-bonded hydrogen atom or an alkenyl group. Moreover, since it can provide favorable adhesiveness to various types of substrates, the organosilicon compound preferably has at least one epoxy group-containing monovalent organic group in one molecule. Examples of such organosilicon compounds include organosilane compounds, organosiloxane oligomers, and alkyl silicates.
- organosiloxane oligomer or alkyl silicate examples include linear, partially branched linear, branched, cyclic, and network, particularly linear, branched, and network.
- organosilicon compounds include silane compounds such as 3-glycidoxypropyltrimethoxysilane, 2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, and 3-methacryloxypropyltrimethoxysilane; silicon atoms in one molecule Siloxane compound having at least one bonded alkenyl group or silicon atom bonded hydrogen atom, and silicon atom bonded alkoxy group, silane compound or siloxane compound having at least one silicon atom bonded alkoxy group and silicon atom bonded hydroxy in one molecule Examples thereof include a mixture of a group and a siloxane compound each having at least one silicon-bonded alkenyl group, methyl polysilicate,
- This adhesion-imparting agent is preferably a low-viscosity liquid, and the viscosity is not limited, but it is preferably in the range of 1 to 500 mPa ⁇ s at 25 ° C. Further, the content of the adhesion-imparting agent is not limited, but is preferably in the range of 0.01 to 10 parts by mass with respect to 100 parts by mass in total of the curable silicone composition.
- the laminate of the present invention has an alkenyl group or a photopolymerizable functional group as a curing reactive group in either the primary curing reaction of the curable silicone composition or the secondary curing reaction of the silicone gel layer.
- organohydrogenpolysiloxane is included as a cross-linking agent and cured by a hydrosilylation reaction catalyst. That is, the silicone gel layer according to the present invention is preferably a linear organopolysiloxane having at least two alkenyl groups or photopolymerizable functional groups in one molecule as the component (A-1).
- Component (A-2) is a resinous or branched organopolysiloxane having at least two alkenyl groups or photopolymerizable functional groups in one molecule, and component (B) is at least in one molecule.
- a curable silicone composition containing an organohydrogenpolysiloxane having two silicon-bonded hydrogen atoms and a curing reaction catalyst containing a hydrosilylation reaction catalyst as the component (C) is cured in a gel form.
- the component (C) may further contain an organic peroxide, and even if the above-mentioned curing reactive functional group is consumed during the gel formation in the primary curing reaction, the secondary curing is performed by heating. The reaction proceeds.
- the content of each component in the composition is such that the curable silicone composition can be primarily cured in a gel state, and the silicone gel layer after the primary curing reaction can be subjected to a secondary curing reaction. It is.
- the primary curing reaction is a hydrosilylation curing reaction
- the silicon-bonded hydrogen atoms in the component (B) are 0.25 mol or more. It is preferable that it is 0.26 mol or more.
- the preferred component (A-1) is a trimethylsiloxy group-capped dimethylsiloxane / methylvinylsiloxane copolymer with both ends of the molecular chain, a trimethylsiloxy group-capped dimethylsiloxane / methylvinylsiloxane / methylphenylsiloxane copolymer with both ends of the molecular chain.
- Polymer molecular chain both ends dimethylvinylsiloxy group-blocked dimethylpolysiloxane, molecular chain both ends dimethylvinylsiloxy group-blocked methylphenylpolysiloxane, molecular chain both ends dimethylvinylsiloxy group-blocked dimethylsiloxane / methylvinylsiloxane copolymer, molecule Examples thereof include dimethylsiloxane / methylvinylsiloxane copolymer blocked with both ends of the chain dimethylphenylsiloxy group and dimethylpolysiloxane blocked with molecular chain at both ends of the methylvinylphenylsiloxy group.
- a suitable component (A-2) is a resinous organopolysiloxane having a hydrosilylation reactive group and / or a radical reactive group when heated in the presence of high energy beam irradiation or an organic peroxide.
- triorganosiloxy unit (M unit) organo group is only methyl group, methyl group and vinyl group or phenyl group
- diorganosiloxy unit (D unit) organo group is only methyl group, methyl group and A vinyl group or a phenyl group.
- a monoorganosiloxy unit (T unit) (the organo group is a methyl group, a vinyl group, or a phenyl group) and an MQ resin comprising any combination of a siloxy unit (Q unit).
- MDQ resin, MTQ resin, MDTQ resin, TD resin, TQ resin, and TDQ resin are examples of a siloxy unit
- the preferred component (B) is a dimethylhydrogensiloxy group-capped methylphenyl polysiloxane having both molecular chain ends, a dimethylhydrogensiloxy group-capped dimethylsiloxane / methylphenylsiloxane copolymer having both molecular chain terminals, and both molecular chain both ends.
- Illustrative are siloxy group-blocked methylhydrogensiloxane / dimethylsiloxane copolymers and mixtures of two or more of these organopolysiloxanes.
- the component (B) is exemplified by a methylhydrogensiloxane / dimethylsiloxane copolymer blocked with a trimethylsiloxy group-blocked trimethylsiloxy group having a viscosity at 25 ° C. of 1 to 500 mPa ⁇ s.
- a suitable component (C) contains the hydrosilylation reaction catalyst described above, and one or more curing agents selected from organic peroxides and photopolymerization initiators, depending on the choice of primary curing reaction or secondary curing reaction. It is preferable to contain.
- a roll coat using a gravure coat, offset coat, offset gravure, offset transfer roll coater, reverse roll coat, air knife coat, curtain A curtain coat using a flow coater or the like, a comma coat, a Meyer bar, or other methods used for the purpose of forming a known hardened layer can be used without limitation.
- the silicone gel layer according to the present invention is obtained by forming a curable silicone composition into a gel by a hydrosilylation reaction curing type, a dehydration condensation reaction curing type, a dealcoholization condensation reaction curing type or a radical reaction curing type by high energy ray irradiation. Preferably it is cured.
- a hydrosilylation reaction curable type at a low temperature of 100 ° C. or less, a radical reaction curable type by high energy ray irradiation at room temperature, or a hydrosilylation reaction curable type by high energy ray irradiation is suitable.
- the secondary curing reaction of the silicone gel layer is preferably a curing reaction that proceeds at a high temperature exceeding 100 degrees, and is preferably a hydrosilylation reaction curing type or a peroxide curing reaction type. As described above, by using an encapsulated hydrosilylation reaction catalyst, it is also preferable to control the reaction so that secondary curing is performed under a temperature condition higher than the melting temperature of the thermoplastic resin that is the capsule wall material.
- the laminate of the present invention is useful for the production of electronic components, and forms a silicone gel on an electronic component as a base material, and is a stable and flat surface for placing electronic components with excellent stress relaxation properties. Even when chemical or physical treatment is subsequently performed on the electronic component, the portion on which the silicone gel is laminated is selectively protected from various treatments, and It is possible to realize the advantage that processing defects of the electronic component are less likely to occur due to surface unevenness of the base material, positional displacement of the electronic component, and vibration displacement (damping) during the manufacture of the component.
- the sheet-like member and the cured silicone gel are joined and integrated, and only the silicone gel is cured. Can be easily, quickly and reliably peeled off from an electronic component even at a local location where it is difficult to remove the cured product efficiently. There is an advantage that a defective product derived from an object (residue residue) hardly occurs.
- the method for manufacturing an electronic component of the present invention includes: Step (I): Creating a laminate having a sheet-like member having an electronic component, a curing reactive silicone gel and an adhesive layer, Step (II): After step (I), one or more types of chemical or physical treatment (selected from electronic circuit formation, electrode pattern formation, conductive film formation, and insulation film formation) for electronic components Including, but not limited to, one or more types of treatments, Step (III): Step of curing the curing reactive silicone gel after step (II), Step (IV): After the step (III), the sheet-like member and the cured product of the curing reactive silicone gel are separated from the electronic component substantially simultaneously.
- the formation process of the laminated body in process (I) is arbitrary, and it may apply
- Step (I ′) a step of laminating a curing reactive silicone gel on an electronic component
- Step (II ′) After step (I ′), one or more types of chemical or physical treatment (formation of an electronic circuit, formation of an electrode pattern, formation of a conductive film, and formation of an insulating film) for an electronic component
- Step (III ′) After step (II ′), a step of laminating a sheet-like member having an adhesive layer on the curing reactive silicone gel.
- the electronic component is as described in the section of [Laminated body including electronic component], and in the method of manufacturing an electronic component of the present invention, an electronic circuit, an electrode pattern, A step of forming a conductive film, an insulating film, and the like may be included and is preferable.
- the laminate or electronic component may be singulated (diced).
- the step of curing part or all of the silicone gel layer is a step of secondarily curing the curable silicone gel layer.
- the silicone gel layer has a higher shape retention than before the curing reaction, and has excellent mold release properties. Changes to a hardened layer. Thereby, in the subsequent process, the electronic component arranged on the silicone gel layer is easily separated and hardly causes problems such as adhesion of the silicone gel or its cured product to the base material or the electronic component. .
- the cut electronic component can efficiently treat the entire surface other than the adhesion surface of the silicone gel, and then the cured silicone gel By separating the components, etc., there is an advantage that the electronic parts can be separated into pieces in a processed and cut state.
- Component (D1) Hexamethyldisilazane-treated silica fine particles (manufactured by Nippon Aerosil Co., Ltd., trade name “Aerosil 200V”) ⁇ Curing agent>
- Example 1 Component A1-1 (9.76 wt%), A1-2 (5.93 wt%), A1-3 (60.42 wt%), A2 (6.61 wt%), B1 (13.02 wt%) ), C1 (0.10% by weight), D1 (2.08% by weight), E1 (0.07% by weight) and E2 (2.00% by weight) are uniformly mixed to obtain a curable liquid silicone composition.
- a product was prepared. At that time, the amount of silicon atom-bonded hydrogen atoms (Si—H) of component (B1) was 0.85 mol per mol of vinyl group.
- an appropriate amount of coloring material was used for the purpose of facilitating confirmation of peelability.
- Example 1 The storage elastic modulus at 0.1 Hz was 6.1 ⁇ 10 4 Pa, and the loss tangent (loss elastic modulus / storage elastic modulus) was 0.03.
- Example 2 The storage elastic modulus at 0.1 Hz was 3.9 ⁇ 10 4 Pa, and the loss tangent (loss elastic modulus / storage elastic modulus) was 0.05.
- a curing reactive silicone gel was prepared using an aluminum container. Further, a secondary cured product was obtained by curing under the above production conditions. A test body was cut out from the obtained secondary cured product so as to have a diameter of 8 mm and used. Using MCR302 (manufactured by Anton Paar), a sample cut into a parallel plate having a diameter of 8 mm was attached and measured. At 23 ° C., the frequency was 0.01 to 10 Hz and the strain was 0.1%.
- Example 1 The storage elastic modulus at 0.1 Hz was 1.0 ⁇ 10 5 Pa.
- Example 2 The storage elastic modulus at 0.1 Hz was 8.4 ⁇ 10 4 Pa.
- Adhesion test with pressure-sensitive adhesive sheet Primers X and Y (both manufactured by Dow Corning) were applied in a thin film on an aluminum substrate. On top of that, the pre-curing liquid silicone composition described in Example 2 was applied to a thickness of about 230 ⁇ m and cured in the same manner as above to obtain an elastomer. Furthermore, a pressure-sensitive adhesive tape (no. 336, manufactured by Nitto Denko Corporation) was laminated on the obtained elastomer, and the reaction with the pressure-sensitive adhesive layer was performed by heating at 150 ° C. for 1 hour in a nitrogen atmosphere.
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Abstract
Description
を有する電子部品の製造方法により、上記課題を解決できる事を見出し、本発明に到達した。この場合、シート状部材は硬化反応性シリコーンゲルの硬化物と接合体を形成して実質的に一体化しており、シート状部材を剥離することによって、それに追従する硬化物もほぼ同時に電子部品上から分離される。
本積層体は硬化反応性のシリコーンゲルを備えることを特徴とする。当該、シリコーンゲルは、電子部品等の基材を各種処理から保護することができ、非流動性のゲル状を呈し、加熱、高エネルギー線の照射等に応答して硬化反応を起こし、硬化反応前よりも保型性が高く、離型性に優れたハードな硬化層に変化する。シリコーンゲル層は、層状であれば、とくにその形状は限定されないが、後述する電子部品の製造用途に用いる場合、実質的に平坦なシリコーンゲルであることが好ましい。シリコーンゲル層の厚みについても特に限定されるものではないが、平均厚みが10~500μmの範囲、25~300μmの範囲または30~200μmの範囲であってよい。平均厚みが10μm未満では基材である電子部品等の凹凸に由来する間隙(ギャップ)が埋まりにくく、500μmを超えると、特に電子部品製造用途において、電子部品の仮留/加工時の配置目的でシリコーンゲル層を使用する場合には、不経済となることがある。また、当該硬化反応性シリコーンゲルの外観は特に制限されるものではないが、電子部品の処理やダイシング(個片化)を行う場合には、透明乃至半透明であることが好ましく、後述するシリコーンゲルは色材等を添加しない限り、ほぼ透明乃至半透明なゲルおよび硬化物を形成する。
(i)120~200℃でのシリコーンゲルの加熱操作:ヒドロシリル化反応硬化型、過酸化物硬化反応型、またはそれらの組み合わせ
(ii)シリコーンゲルへの紫外線の照射操作:高エネルギー線照射によるラジカル反応硬化型、光活性型白金錯体硬化触媒を用いたヒドロシリル化反応硬化型、またはそれらの組み合わせ
(iii)上記の(i)および(ii)の硬化操作、硬化機構および条件の組み合わせ、特に同時または時差をおいての硬化操作の組み合わせを含む。
シリコーンゲル層を積層する基材は凹凸があってよく、シリコーンゲル層により当該凹凸が隙間なく充填乃至追従され、平坦なシリコーンゲル層を形成していることが特に好ましい。本発明の硬化反応性シリコーンゲル層は柔軟で変形性、追従性に優れるため、凹凸のある基材に対しても間隙を生じにくく、乖離やシリコーンゲル表面の変形などの問題を生じにくいという利点がある。シリコーンゲル層を積層する目的は特に制限されるものではないが、基材が電子部品である場合、当該シリコーンゲル層の積層箇所を各種処理から選択的に保護できるほか、柔軟なシリコーンゲル層により物理的な衝撃・振動からの保護等を図ってもよい。
本発明の積層体は、上記の通り、基材として1個以上の電子部品を有することが好ましい。電子部品は、特にその種類は制限されるものではないが、半導体チップの素体となる半導体ウェハ、セラミックス素子(セラミックコンデンサ含む)、半導体チップおよび発光半導体チップが例示され、同一または異なる2個以上の電子部品の上に硬化反応性のシリコーンゲル層が配置されたものであってもよい。本発明の積層体における硬化反応性シリコーンゲル層は、ゲル状であり、かつ、硬化条件を選択可能なので、ある程度高温となる温度領域で取り扱った場合であっても、硬化反応が殆ど進行せず、適度に柔軟かつ追従性・変形性に優れるため、安定かつ平坦な面を形成することができ、さらに、当該シリコーンゲルが積層面を各種処理から選択的に保護するほか、電子部品の製造工程における振動や衝撃を緩和するため、当該シリコーンゲルを積層した電子部品を定位置に安定的に保持し、電子部品に対して各種パターン形成等の処理およびダイシング等の加工処理を行った場合であっても、基材の表面凹凸や電子部品の位置ずれ、振動変位(ダンピング)に伴う電子部品の加工不良が発生しにくいという利点を有する。なお、ゲルによる電子部品等の保持は、ゲルの粘弾性に由来するものであり、ゲル自体の弱い粘着力によるものと、ゲルの変形による電子部品の担持の両方を含む。
これらの電子部品は、積層体を形成する前に化学的または物理的な処理が行われていてもよく、電子部品にシリコーンゲルを積層した後に、上記処理を行うものであっても良い。電子部品のうち、シリコーンゲルを積層した箇所は、これらの処理から選択的に保護されうるため、所望とする化学的または物理的処理を、電子部品の特定箇所のみに施すことが可能である。特に、本発明では、シリコーンゲルが局所的、ピンポイントであっても、効率よくその硬化物を分離できるため、電子部品の選択的な保護に特に有用である。これらの電子部品への処理は、少なくとも部分的に電子回路または電極パターン、導電膜、絶縁膜等を形成する事が含まれるが、これらに限定されるものではない。上記処理にあたっては、従来公知の手段を特に制限なく用いることができ、真空蒸着法、スパッタ法、電気めっき法、化学めっき法(無電解めっき法含む)、エッチング法、印刷工法またはリフトオフ法に形成されていてもよい。本発明の積層体を電子部品の製造に用いる場合、硬化反応性シリコーンゲルを積層した上で、電子部品の電子回路、電極パターン、導電膜、絶縁膜等を形成することが特に好ましく、任意で当該積層体を個片化(ダイシング)してもよい。上記のとおり、シリコーンゲル層を用いることで、これらの電子部品の加工不良が抑制される。なお、処理に当たっては、基材である電子部品とシリコーンゲル層の上下左右関係は所望により選択することができる。
シート状部材は、少なくとも部分的に接着層を備えており、前記の硬化反応性シリコーンゲル上に、接着層を介して積層されることを特徴とする。当該接着層を介してシリコーンゲルと密着していることで、特に硬化反応性シリコーンゲルが硬化物を形成する際に、シート状部材と当該硬化物は接合体を形成し、実質的に一体として基材上から分離することができる。硬化反応性シリコーンゲルを硬化してなる硬化物は、分離に用いる機械装置の種類により、破損の問題や剥離工程の複雑化といった問題の原因になりうるものであるが、シート状部材と一体化したシリコーンゲルの硬化物は、局所的乃至ピンポイントであっても容易に分離でき、かつ、簡便、迅速かつ確実に基材上から分離することができ、特に工業的生産工程において、作業時間の短縮および工数の削減という著しい優位性を実現する。
本発明の積層体は、基材上にシリコーンゲル、および接着層を介してシート状部材を積層してなるものであり、所望により、シリコーンゲルの原料組成物である硬化性シリコーン組成物を目的となる基材上に塗布してゲル状に硬化させることで製造可能である。同様に、シリコーンゲルは、所望の剥離層を備えたシート状基材上に形成させ、剥離層からシリコーンゲル層を分離し、他の基材上に転写し、さらに、接着層を介してシート状部材を積層することによっても製造可能である。シリコーンゲルの積層は、基材の全面でも局所的であっても行うことができ、ピンポイントでの基材保護も可能である。
および、基材上で当該硬化性シリコーン組成物をゲル状に一次硬化させることにより、硬化反応性シリコーンゲル層を形成する工程(A-2)、および
硬化反応性シリコーンゲル層に接着層を介してシート状部材を積層する工程(A-3)
を有する製造方法により得ることができる。
剥離層上で当該硬化性シリコーン組成物をゲル状に一次硬化させることにより、硬化反応性シリコーンゲル層を形成する工程(B-2)、
前記工程で得た積層体のシリコーンゲル層を、上記の基材Rとは異なる、少なくとも1種類の基材上に配置し、基材Rのみを除去する工程(B-3)、および
硬化反応性シリコーンゲル層に接着層を介してシート状部材を積層する工程(B-4)
を有する製造方法により得ることができる。なお、この場合、積層体のシリコーンゲル層であって、上記の基材Rとは異なる、少なくとも1種類の基材に対向する面には、その密着性及び接着性を改善する目的で、基材と対向するシリコーンゲル面に、プライマー処理、コロナ処理、エッチング処理、プラズマ処理等の表面処理がなされていてもよく、かつ好ましい。当該密着性の改善により、基材Rを容易に分離できる利点がある。
硬化反応性のシリコーンゲル層は実質的に平坦であることが好ましいが、その原料となる硬化性シリコーン組成物を、通常の方法で剥離層を有する基材上に塗布すると、特に硬化後のシリコーンゲル層の厚みが50μm以上となる場合には、その塗布面が凹んだ不均一な表面を形成して、得られるシリコーンゲル層表面が不均一となる場合がある。しかしながら、当該硬化性シリコーン組成物およびシリコーンゲル層に対して剥離層を有する基材を適用し、未硬化の塗布面を各々の剥離層を備えたシート状基材(上記の基材R;セパレータ)で挟み込み、物理的に均一化された平坦化層を形成することで、平坦化された硬化反応性のシリコーンゲル層を得ることができる。なお、上記の平坦化層の形成にあたっては、剥離層を有するセパレータ間に未硬化の硬化性シリコーン組成物が塗布されてなる積層体を、ロール圧延等の公知の圧延方法を用いて圧延加工することが好ましい。
本発明の積層体を構成する硬化反応性シリコーンゲル層は、硬化性シリコーン組成物をゲル状に一次硬化させてなるものである。上記のとおり、シリコーンゲル層を形成するための一次硬化反応は、シリコーンゲル自体の二次硬化反応と異なる硬化反応機構であってもよく、同一の硬化反応機構であってもよい。一方、100℃以下でのシリコーンゲル層の安定性の見地から、硬化性シリコーン組成物を室温~100℃の温度範囲においてゲル状に硬化させることが好ましい。
上式中、R1は同じかまたは異なる、脂肪族不飽和結合を有さない一価炭化水素基であり、メチル基またはフェニル基が好ましい。R2はアルキル基であり、脱アルコール縮合反応性のアルコキシ基を構成するため、メチル基、エチル基またはプロピル基であることが好ましい。R3はケイ素原子に結合するアルキレン基であり、炭素原子数2~8のアルキレン基が好ましい。aは0~2の整数であり、pは1~50の整数である。脱アルコール縮合反応性の見地から、最も好適には、aは0であり、トリアルコキシシリル基含有基であることが好ましい。なお、上記のアルコキシシリル基含有基に加えて、ヒドロシリル化反応性の官能基または光重合反応性の官能基を同一分子内に有してもよい。
本発明に係るシリコーンゲル層は、硬化性シリコーン組成物をヒドロシリル化反応硬化型、脱水縮合反応硬化型、脱アルコール縮合反応硬化型または高エネルギー線照射によるラジカル反応硬化型の硬化機構によりゲル状に硬化されていることが好ましい。特に、100℃以下の低温下でヒドロシリル化反応硬化型または室温下での高エネルギー線照射によるラジカル反応硬化型または高エネルギー線照射によるヒドロシリル化反応硬化型が好適である。
上記のとおり、本発明の積層体は電子部品の製造に有用であり、基材である電子部品上にシリコーンゲルを形成して、安定かつ平坦で、応力緩和性に優れた電子部品の配置面を形成することにより、その後に当該電子部品に対して化学的乃至物理的処理を行った場合であっても、当該シリコーンゲルを積層した部分は、各種処理から選択的に保護され、かつ、電子部品の製造時における基材の表面凹凸や電子部品の位置ずれ、振動変位(ダンピング)に伴う電子部品の加工不良が発生しにくいという利益を実現しうる。また、前記のシート状部材が接着層を介して積層されたシリコーンゲルを硬化させることにより、当該シート状部材とシリコーンゲルの硬化物が接合して一体化し、シリコーンゲルのみを硬化させた場合には硬化物の効率的な剥離が難しいような局所的な配置であっても、両者をほぼ同時に、簡便、迅速、かつ、確実に電子部品上から剥離することができ、しかもシリコーンゲル等の残留物(糊残り)に由来する不良品が発生しにくいという利点を有する。
工程(I):電子部品、硬化反応性シリコーンゲルおよび接着層を有するシート状部材を有する積層体を作成する 工程、
工程(II):工程(I)の後、電子部品に対して、1種類以上の化学的乃至物理的処理(電子回路の形成、電極パターンの形成、導電膜の形成 および絶縁膜の形成から選ばれる1種類以上の処理を含むが、これらに限定されない)を行う工程、
工程(III):工程(II)の後、硬化反応性シリコーンゲルを硬化する工程、
工程(IV):工程(III)の後、シート状部材および硬化反応性シリコーンゲルの硬化物を、実質的に同時に電子部品から分離する工程
を有するものである。なお、工程(I)における積層体の形成工程は任意であり、硬化性シリコーン組成物を基材である電子部品上に塗布してゲル状に一次硬化させてもよく、別途形成した硬化反応性シリコーンゲルを基材である電子部品上に転写しても良い。
工程(I’):電子部品上に硬化反応性シリコーンゲルを積層する工程、
工程(II’):工程(I’)の後、電子部品に対して、1種類以上の化学的乃至物理的処理(電子回路の形成、電極パターンの形成、導電膜の形成 および絶縁膜の形成から選ばれる1種類以上の処理を含むが、これらに限定されない)を行う工程、
工程(III’):工程(II’)の後、硬化反応性シリコーンゲル上に接着層を有するシート状部材を積層する工程 、
工程(IV’):工程(III’)の後、硬化反応性シリコーンゲルを硬化する工程、
工程(V’):工程(IV’)の後、シート状部材および硬化反応性シリコーンゲルの硬化物を、実質的に同時に電子部品から分離する工程。
・成分(A1-2):両末端ビニルジメチルシロキシ基封鎖、ジメチルシロキサンポリマー(シロキサン重合度:約315,ビニル基の含有量:約0.22重量%)
・・成分(A1-3):両末端トリメチルシロキシ基封鎖、ジメチルシロキサン-ビニルメチルシロキサンコポリマー (シロキサン重合度:約816,ビニル基の含有量: 約0.29重量%)
・成分(A2):ビニルジメチルシロキシ基封鎖Q単位からなる樹脂状オルガノポリシロキサン (ビニル基の含有量: 約4.1重量%)
・成分(B1):両末端ハイドロジェンジメチルシロキシ基封鎖ジメチルシロキサンポリマー(シロキサン重合度:約20,ケイ素結合水素基の含有量: 0.12重量%)
<ヒドロシリル化反応抑制剤>
・成分(C1):1,3,5,7-テトラメチル-1,3,5,7-テトラビニル-シクロテトラシロキサン(ビニル基の含有量:30.2重量%)。
<フィラー>
・成分(D1):ヘキサメチルジシラザン処理シリカ微粒子(日本アエロジル製、商品名「アエロジル200V」)
<硬化剤>
・成分(E1):白金-ジビニルテトラメチルジシロキサン錯体のビニルシロキサン溶液(白金金属濃度で約0.6重量%)
・成分(E2):2,5-ジメチル-2,5-ジ(t-ブチルパーオキシ)ヘキサン-両末端トリメチルシロキシ基封鎖シロキサンポリマー混合物(2,5-ジメチル-2,5-ジ(t-ブチルパーオキシ)ヘキサン濃度で約50重量%)
成分A1-1(9.76重量%)、A1-2(5.93重量%)、A1-3(60.42重量%)、A2(6.61重量%)、B1(13.02重量%)、C1(0.10重量%)、D1(2.08重量%)、E1(0.07重量%)およびE2(2.00重量%)を均一に混合することにより、硬化性液状シリコーン組成物を調製した。その際、ビニル基1モル当たり、成分(B1)のケイ素原子結合水素原子(Si-H)が0.85モルとなる量とした。なお、本実施例では上記成分に加え、剥離性確認を容易にする目的で適当量の着色材を使用した。
<組成:実施例2>
成分A1-1(9.87重量%)、A1-3(66.27重量%)、A2(6.69重量%)、B1(8.74重量%)、C1(0.10重量%)、D1(6.25重量%)、E1(0.07重量%)およびE2(2.00重量%)を均一に混合することにより、硬化性液状シリコーン組成物を調製した。その際、ビニル基1モル当たり、成分(B1)のケイ素原子結合水素原子(Si-H)が0.56モルとなる量とした。なお、本実施例では上記成分に加え、剥離性確認を容易にする目的で適当量の着色材を使用した。
硬化前液状シリコーン組成物を80℃で2時間かけて加熱することにより、ヒドロシリル化反応を進行させてゲル状物を得た。得られた硬化反応性シリコーンゲルは着色材を欠いた状態では透明であった。
上記で作製した硬化反応性シリコーンゲルをさらに窒素中150℃(実施例2)もしくは170℃(実施例1)で1時間かけて二次硬化させることで二次硬化物を得た。
硬化反応性シリコーンゲル
アルミニウム製容器(直径50mm)に、硬化前液状シリコーン組成物を厚さ約1.5mmとなるように投入し、上記条件にて得られた硬化反応性シリコーンゲルから直径8mmとなるように試験体を切り出し使用した。MCR302粘弾性測定装置(Anton Paar社製)を用い、直径8mmのパラレルプレートに切り出したサンプルを貼り付け測定を行った。23℃にて、周波数0.01~10Hzの範囲で、ひずみ0.5%の条件で行った。
実施例1:0.1Hzでの貯蔵弾性率は6.1×104Pa、損失正接(損失弾性率/貯蔵弾性率)は0.03であった。
実施例2:0.1Hzでの貯蔵弾性率は3.9×104Pa、損失正接(損失弾性率/貯蔵弾性率)は0.05であった。
上記同様、アルミニウム製容器を用い、硬化反応性シリコーンゲルを作製した。さらに上記作製条件にて硬化させることで二次硬化物が得られた。得られた二次硬化物から直径8mmとなるように試験体を切り出し使用した。MCR302(アントンパール社製)を用い、直径8mmのパラレルプレートに切り出したサンプルを貼り付け測定を行った。23℃にて、周波数0.01~10Hzまで、ひずみ0.1%の条件で行った。
実施例1:0.1Hzでの貯蔵弾性率は1.0×105Paであった。
実施例2:0.1Hzでの貯蔵弾性率は8.4×104Paであった。
硬化前液状シリコーン組成物を基板上に室温にてスピンコートし、上記条件にて基板上に硬化性ゲル層を作製した。
得られた硬化性ゲル層に粘着テープ(日東電工社製、ニトフロン No.903UL)を貼り付け、窒素中150℃もしくは170℃で1時間かけて硬化反応性シリコーンゲルを二次硬化させた。
上記で作製した二次硬化物を含む基板上から粘着テープを剥がし、二次硬化物が粘着テープ側へ転写されることを目視で確認した。
粘着テープを用いない他は、上記同様の条件で、硬化前液状シリコーン組成物を基板上に室温にてスピンコートし、基板上に硬化性ゲル層を作製し、窒素中150℃もしくは170℃で1時間かけて硬化反応性シリコーンゲルを二次硬化させた。しかしながら、粘着テープがない場合、二次硬化物を効率的に基材から剥がす(=分離する)ことができなかった。
アルミ基板上にプライマーXおよびY(共にダウコーニング社製)を薄膜塗布した。その上に実施例2に記載の硬化前液状シリコーン組成物を約230μmとなるように塗布し、上記同様に硬化させエラストマーを得た。さらに、得られたエラストマー上に粘着テープ(no. 336、日東電工社製)を張り合わせ、窒素雰囲気下150℃で1時間かけて加熱することにより粘着層との反応を行った。30分保存後、RTC1210(オリエンテック社製)を用いて、23℃、相対湿度50%の条件で、300mm/minの速度で180度ピール試験を行った。ピール強度は165N/mで、剥離モードが凝集破壊であった。一方、窒素雰囲気下150℃で1時間かけて加熱後、上記同様に粘着テープを張り合わせた場合、ピール強度は135N/mで、剥離モードが界面剥離であった。従って、上記の二次硬化反応により、硬化反応性エラストマーと粘着テープ界面で強固な結合が形成されていることが確認された。このような結合体は、粘着テープと一体として基材上から除去可能である。
Claims (10)
- (L1)基材、
(L2)前記基材上に積層された硬化反応性シリコーンゲル、および
(L3)前記硬化反応性シリコーンゲル上に、接着層を介して積層されたシート状部材
を含有する積層体。 - 上記(L1)基材が、(L1-E)電子部品である、請求項1に記載の積層体。
- 上記(L1)基材が、1種類以上の化学的乃至物理的処理が施されている(L1-E)電子部品である、請求項1または請求項2に記載の積層体。
- 上記(L2)の硬化反応性シリコーンゲルの損失係数tanδが、23℃~100℃において、0.01~1.00の範囲にあることを特徴とする、請求項1~請求項3のいずれか1項に記載の積層体。
- 上記(L2)の硬化反応性シリコーンゲルを硬化反応させて得られる硬化反応性シリコーンゲルの硬化物の貯蔵弾性率G’curedが、硬化前のシリコーンゲルの貯蔵弾性率G’gelに比べて50%以上上昇することを特徴とする、請求項1~請求項4のいずれか1項に記載の積層体。
- 上記(L3)のシート状部材が、シリコーン系の接着層を備えてなる接着フィルムである、請求項1~請求項5のいずれか1項に記載の積層体。
- 上記(L3)のシート状部材が、上記(L2)の硬化反応性シリコーンゲルの硬化反応により、硬化反応性シリコーンゲルの硬化物と接合物を形成することを特徴とする、請求項1~請求項6のいずれか1項に記載の積層体。
- 以下の工程(I)~(IV)を備える、電子部品の製造方法。
工程(I):(L1-E)電子部品、硬化反応性シリコーンゲルおよび接着層を有するシート状部材を有する積層体を作成する工程、
工程(II):工程(I)の後、(L1-E)電子部品に対して、1種類以上の化学的乃至物理的処理を行う工程、
工程(III):工程(II)の後、硬化反応性シリコーンゲルを硬化する工程、
工程(IV):工程(III)の後、シート状部材および硬化反応性シリコーンゲルの硬化物を、実質的に同時に(L1-E)電子部品から分離する工程。 - 以下の工程(I’)~(V’)を備える、電子部品の製造方法。
工程(I’):(L1-E)電子部品上に硬化反応性シリコーンゲルを積層する工程、
工程(II’):工程(I’)の後、(L1-E)電子部品に対して、1種類以上の化学的乃至物理的処理を行う工程、
工程(III’):工程(II’)の後、硬化反応性シリコーンゲル上に接着層を有するシート状部材を積層する工程、
工程(IV’):工程(III’)の後、硬化反応性シリコーンゲルを硬化する工程、
工程(V’):工程(IV’)の後、シート状部材および硬化反応性シリコーンゲルの硬化物を、実質的に同時に(L1-E)電子部品から分離する工程。 - さらに、(L1-E)電子部品上に硬化反応性シリコーンゲルを積層した後に、シリコーンゲルと電子部品を一体の状態でダイシングする工程を有する請求項8または請求項9の電子部品の製造方法。
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US10961419B2 (en) | 2021-03-30 |
KR20190080912A (ko) | 2019-07-08 |
EP3533606A1 (en) | 2019-09-04 |
JP7411014B2 (ja) | 2024-01-10 |
CN110072697A (zh) | 2019-07-30 |
EP3533606A4 (en) | 2020-06-24 |
TW201829189A (zh) | 2018-08-16 |
US20190300767A1 (en) | 2019-10-03 |
EP3533606B1 (en) | 2021-09-01 |
JPWO2018079678A1 (ja) | 2019-09-19 |
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