WO2018076646A1 - 一种冷却装置及其制造方法 - Google Patents
一种冷却装置及其制造方法 Download PDFInfo
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- WO2018076646A1 WO2018076646A1 PCT/CN2017/082333 CN2017082333W WO2018076646A1 WO 2018076646 A1 WO2018076646 A1 WO 2018076646A1 CN 2017082333 W CN2017082333 W CN 2017082333W WO 2018076646 A1 WO2018076646 A1 WO 2018076646A1
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- Prior art keywords
- heat generating
- generating component
- metal substrate
- heating element
- cooling device
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- 238000001816 cooling Methods 0.000 title claims abstract description 61
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 8
- 229910052751 metal Inorganic materials 0.000 claims abstract description 126
- 239000002184 metal Substances 0.000 claims abstract description 126
- 239000000758 substrate Substances 0.000 claims abstract description 75
- 238000010438 heat treatment Methods 0.000 claims abstract description 35
- 239000007788 liquid Substances 0.000 claims abstract description 22
- 238000007654 immersion Methods 0.000 claims abstract description 6
- 239000011247 coating layer Substances 0.000 claims description 23
- 239000000843 powder Substances 0.000 claims description 23
- 239000010410 layer Substances 0.000 claims description 22
- 238000005245 sintering Methods 0.000 claims description 14
- 239000000463 material Substances 0.000 claims description 10
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical group [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 9
- 229910052802 copper Inorganic materials 0.000 claims description 8
- 239000010949 copper Substances 0.000 claims description 8
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 5
- 239000004020 conductor Substances 0.000 claims description 5
- 229910000640 Fe alloy Inorganic materials 0.000 claims description 3
- 229910001200 Ferrotitanium Inorganic materials 0.000 claims description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 3
- 229910052738 indium Inorganic materials 0.000 claims description 3
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims description 3
- 238000000034 method Methods 0.000 claims description 3
- 239000010935 stainless steel Substances 0.000 claims description 3
- 229910001220 stainless steel Inorganic materials 0.000 claims description 3
- 239000010936 titanium Substances 0.000 claims description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 2
- 229910052742 iron Inorganic materials 0.000 claims description 2
- 229910052709 silver Inorganic materials 0.000 claims description 2
- 239000004332 silver Substances 0.000 claims description 2
- 238000009835 boiling Methods 0.000 abstract description 16
- 238000009834 vaporization Methods 0.000 abstract description 10
- 230000008016 vaporization Effects 0.000 abstract description 10
- 230000000694 effects Effects 0.000 abstract description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- 239000011230 binding agent Substances 0.000 description 4
- 230000017525 heat dissipation Effects 0.000 description 4
- 230000001965 increasing effect Effects 0.000 description 4
- 239000012530 fluid Substances 0.000 description 3
- -1 polypropylene Polymers 0.000 description 3
- 230000003746 surface roughness Effects 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- 230000002708 enhancing effect Effects 0.000 description 2
- 239000004519 grease Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 239000003507 refrigerant Substances 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 229920002845 Poly(methacrylic acid) Polymers 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 229910002065 alloy metal Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000002826 coolant Substances 0.000 description 1
- YCKOAAUKSGOOJH-UHFFFAOYSA-N copper silver Chemical compound [Cu].[Ag].[Ag] YCKOAAUKSGOOJH-UHFFFAOYSA-N 0.000 description 1
- 229910021389 graphene Inorganic materials 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Images
Classifications
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K7/00—Constructional details common to different types of electric apparatus
- H05K7/20—Modifications to facilitate cooling, ventilating, or heating
- H05K7/2029—Modifications to facilitate cooling, ventilating, or heating using a liquid coolant with phase change in electronic enclosures
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K7/00—Constructional details common to different types of electric apparatus
- H05K7/20—Modifications to facilitate cooling, ventilating, or heating
- H05K7/20218—Modifications to facilitate cooling, ventilating, or heating using a liquid coolant without phase change in electronic enclosures
- H05K7/20236—Modifications to facilitate cooling, ventilating, or heating using a liquid coolant without phase change in electronic enclosures by immersion
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F1/00—Details not covered by groups G06F3/00 - G06F13/00 and G06F21/00
- G06F1/16—Constructional details or arrangements
- G06F1/20—Cooling means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
- H01L21/4814—Conductive parts
- H01L21/4871—Bases, plates or heatsinks
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
- H01L23/36—Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
- H01L23/373—Cooling facilitated by selection of materials for the device or materials for thermal expansion adaptation, e.g. carbon
- H01L23/3736—Metallic materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
- H01L23/44—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements the complete device being wholly immersed in a fluid other than air
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K7/00—Constructional details common to different types of electric apparatus
- H05K7/20—Modifications to facilitate cooling, ventilating, or heating
- H05K7/20218—Modifications to facilitate cooling, ventilating, or heating using a liquid coolant without phase change in electronic enclosures
- H05K7/20254—Cold plates transferring heat from heat source to coolant
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K7/00—Constructional details common to different types of electric apparatus
- H05K7/20—Modifications to facilitate cooling, ventilating, or heating
- H05K7/2029—Modifications to facilitate cooling, ventilating, or heating using a liquid coolant with phase change in electronic enclosures
- H05K7/203—Modifications to facilitate cooling, ventilating, or heating using a liquid coolant with phase change in electronic enclosures by immersion
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K7/00—Constructional details common to different types of electric apparatus
- H05K7/20—Modifications to facilitate cooling, ventilating, or heating
- H05K7/2029—Modifications to facilitate cooling, ventilating, or heating using a liquid coolant with phase change in electronic enclosures
- H05K7/20309—Evaporators
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K7/00—Constructional details common to different types of electric apparatus
- H05K7/20—Modifications to facilitate cooling, ventilating, or heating
- H05K7/20709—Modifications to facilitate cooling, ventilating, or heating for server racks or cabinets; for data centers, e.g. 19-inch computer racks
- H05K7/208—Liquid cooling with phase change
- H05K7/20809—Liquid cooling with phase change within server blades for removing heat from heat source
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F2200/00—Indexing scheme relating to G06F1/04 - G06F1/32
- G06F2200/20—Indexing scheme relating to G06F1/20
- G06F2200/201—Cooling arrangements using cooling fluid
Definitions
- the present invention relates to the field of computer technology, and in particular to a cooling device for a heat generating component of a submerged liquid cooling server and a method of manufacturing the cooling device.
- Evaporative cooling is a thermal cooling method that utilizes the heat of vaporization in the submerged zone when the fluid is boiling. Since the latent heat of vaporization of the fluid is much larger than the specific heat of the fluid, the cooling effect of evaporative cooling is more significant.
- the heat sinks such as fins and fans required for the air-cooling and cooling method are eliminated, and only the phase change of the refrigerant is used for heat exchange to cool the CPU.
- the processing method, surface roughness, material properties and the degree of old and new heat transfer surfaces can affect the strength of boiling heat transfer.
- the CPU cover is made of copper and is coated with a layer of nickel on the surface.
- the surface of the copper-plated nickel material is a smooth surface, which is not conducive to vaporization.
- the same liquid has a lower heat transfer coefficient when boiling heat transfer on a smooth surface than when boiling heat is transferred on a rough surface, mainly due to less vaporized core on a smooth surface. Therefore, after the power is turned on, the temperature of the CPU rises rapidly, the steady-state temperature is high, and it is easy to reach the limit temperature of the CPU, which makes most server manufacturers deterred from the immersion liquid cooling technology.
- the surface of the heating element such as the CPU has few core vaporization cores and poor boiling performance, and no effective solution has been proposed yet.
- the present invention provides a cooling device and a manufacturing method thereof, which can increase the vaporization core on the surface of the heat generating component and enhance the boiling performance of the heat generating component. Reduce the core temperature of the heating element.
- the present invention adopts a technical solution to provide a cooling device for a heat generating component of a submerged liquid cooling server, comprising: disposed above the heating element and covering the heating element a metal substrate; the metal substrate is adjacent to a surface of the heat generating component; and a surface of the metal substrate away from the heat generating component includes: a porous metal cover layer overlying the heat generating component and covering The heating element.
- the porous metal coating layer is formed by powder sintering a corresponding region of the metal substrate away from the surface of the heat generating component.
- the metal substrate further includes a convex portion covering a surface of the heat generating component, and the metal substrate is adjacent to a surface of the heat generating component by the convex portion.
- a flexible high thermal conductive material layer is further disposed between the surface of the heat generating component and the metal substrate and covering the surface of the heat generating component.
- the metal substrate further includes a mounting structure for fixing the metal substrate.
- the material of the metal substrate is copper, titanium or stainless steel; the material of the sintered metal powder used for sintering the powder is copper, copper-plated silver, iron or iron alloy powder.
- the layer of flexible high thermal conductivity material is an indium metal sheet.
- the porous metal coating layer has a thickness of less than 3 mm; and the porous metal coating layer has a porosity of between 40% and 95%.
- the heating element comprises a CPU or a GPU.
- the present invention provides a method of manufacturing a cooling device for a submerged liquid cooling server, comprising: providing a metal substrate; forming a porous metal coating layer in a region of the metal substrate corresponding to the heat generating component; The metal substrate is disposed above the heating element and covers the heating element, Wherein the porous metal coating layer is located above the heating element and covers the heat generating component; wherein, in the step of forming a porous metal coating layer in a region of the metal substrate corresponding to the heat generating component, the step of removing the metal substrate from the metal substrate A corresponding region of the surface of the heat generating component is subjected to powder sintering to form the porous metal coating layer.
- the invention provides a vaporization core by adding a metal substrate having a porous metal coating layer on the surface of the heat generating component, improves the boiling performance of the heat generating component, and realizes an efficient heat dissipation effect on the surface temperature of the heat generating component.
- FIG. 1 is a cross-sectional view showing a mounting structure of a CPU of an embodiment of the present invention.
- Figure 2 shows a bottom view of a metal substrate in accordance with an embodiment of the present invention.
- Figure 3 shows a cross-sectional view of a metal substrate in accordance with an embodiment of the present invention.
- Fig. 4 is a view showing the structure of a porous metal coating layer according to an embodiment of the present invention.
- Fig. 5 is a flow chart showing a method of manufacturing a cooling device according to an embodiment of the present invention.
- a cooling device for a heat generating component of a submerged liquid cooling server is provided.
- the heat generating component may also include other components that are prone to heat, such as a memory, a CPU, or a GPU chip, depending on the actual situation of the server type, etc., and the present invention does not specifically limit the heat generating component.
- the CPU 2 of the liquid-cooled server is usually installed with a CPU 2, and the CPU 2 is covered with a CPU cover 3, and the following are all heating elements.
- the CPU is described as an example.
- a cooling device includes: a metal substrate 4 disposed above a heat generating component and covering a heat generating component (not shown); a metal substrate 4 adjacent to a surface of the heat generating component; and a metal substrate 4 remote from the heat generating component
- the first surface 7 comprises a porous metal cover layer 71 above the heating element and covering the heating element.
- the porous metal coating layer 71 is formed by powder sintering a corresponding region of the first surface 7 of the metal substrate 4 remote from the heat generating component.
- the material of the metal substrate 4 is copper, and other metal or alloy metal having good thermal conductivity such as copper, copper silver plating, titanium or stainless steel may be used.
- the powder sintering comprises the steps of: removing the rust and grease stain on the surface 7 of the metal substrate 4 away from the heat generating component, and then applying a binder solution including polypropylene, polyethylene, polystyrene. Polyethylene terephthalate, polymethacrylic acid, acetone or xylene, etc., uniformly coating the sintered metal powder on the first surface 7 of the metal substrate 4 away from the heating element, the metal powder including copper powder, Iron powder or iron alloy powder, etc., the weight ratio of the metal powder to the binder is 10: (2 to 5). After the binder solution is air-dried, the metal substrate 4 is placed in a sintering furnace under hydrogen protection.
- a binder solution including polypropylene, polyethylene, polystyrene. Polyethylene terephthalate, polymethacrylic acid, acetone or xylene, etc.
- Heating to the surface of the sintered metal powder has a tendency to melt. After the temperature is about 20 minutes, the binder is dispersed and volatilized, and the metal powder is sintered and integrated into the first surface 7 of the metal substrate 4 away from the heat generating component, so that the metal substrate 4 is A porous metal cover layer 71 is formed on the first surface 7 away from the heat generating component.
- the thickness of the porous metal coating layer 71 is generally less than 3 mm, and the porosity of the porous metal coating layer 71 is between 40% and 95%.
- the porous metal coating layer 71 is formed by powder sintering the corresponding region of the first surface 7 of the metal substrate 4 away from the heat generating component, which increases the surface roughness, increases the minute gap and the bubble generation point, and effectively strengthens the boiling. performance.
- the CPU cover 3 since the CPU cover 3 is not easily removed, and the CPU chip 2 is not resistant to high temperatures, it cannot be directly processed on its surface. Therefore, a surface of a thin copper sheet having the same shape and size as that of the CPU 2 can be subjected to powder sintering treatment to form the cooling device of the present invention, and then passed through a low temperature. The welding method welds the cooling device to the CPU cover 3 to achieve an effect of enhancing boiling heat exchange.
- the metal substrate 4 further includes a mounting structure for fixing the metal substrate 4.
- the mounting structure may be other structures for fixing the metal substrate 4 depending on actual needs of the heat generating component or the like. Referring specifically to FIGS.
- the mounting structure is a mounting hole 6, and the metal substrate 4 is fastened to the corresponding threaded hole on the main board 1 through the mounting hole 6 with the fastening screw, so that the metal substrate 4 is pressed directly above the CPU 2; wherein, the CPU or the GPU At the time of shipment, there is a maximum pressure that the chip can withstand.
- the fastening force of the fastening screw should be calculated according to the weight of the metal substrate 4 itself to ensure that the chip is not crushed.
- the main body Since the fan and the fin are mounted on the upper side of the CPU 2 when the air cooling method is used, the main body has a screw hole for fixing the fan and the fin. Therefore, the position of the mounting hole 6 of the metal substrate 4 is fixed to the original for the convenience of installation.
- the positions of the threaded holes of the fan and the fins are corresponding, and no additional modification or structural deformation of the main board 1 is required, which improves the applicability of the cooling device.
- the metal substrate 4 further includes a convex portion 5 covering the surface of the heat generating component, the convex portion 5 being located on a side of the metal substrate 4 adjacent to the heat generating component, and the metal substrate 4 passing through the convex portion 5 and The surface of the heating element is in contact.
- the cooling device of the heat generating component of the present invention further includes: in order to reduce the contact thermal resistance between the metal substrate 4 and the CPU 2, a flexible high heat conductive material layer is disposed therebetween, which is high in flexibility
- the heat conductive material layer is a metal layer, a special rubber, a special plastic or graphene, and is disposed between the surface of the heat generating component and the metal substrate 4 and covers the surface of the heat generating component. Since the thermal grease can not be used in the immersion liquid cooling system, when a metal layer is used as the flexible high thermal conductive material layer, the metal layer is a soft metal thin metal sheet to avoid hard contact between the metal substrate 4 and the CPU 2 Fill the gap between the two to reduce the contact resistance.
- the material of the metal layer may be indium metal or the like.
- the present invention provides a porous metal covering on the surface of the heat generating component
- the metal substrate 4 of the layer 71 has an increased vaporization core, which improves the boiling performance of the heating element, and achieves an efficient heat dissipation effect on the surface temperature of the heating element.
- a method of manufacturing a cooling device for a submerged liquid cooling server comprising the steps of:
- Step S401 providing a metal substrate 4
- Step S403 forming a porous metal coating layer 71 on a region of the metal substrate 4 corresponding to the heat generating component;
- step S405 the metal substrate 4 is disposed above the heat generating component and covers the heat generating component, wherein the porous metal cover layer 71 is located above the heat generating component and covers the heat generating component.
- step S403 includes powder sintering the corresponding region of the metal substrate 4 away from the surface of the heat generating component to form the porous metal cap layer 71.
- the vaporization core is increased, the boiling performance of the heat generating component is improved, and the surface temperature of the heat generating component is realized.
- Efficient heat dissipation effect forming a porous metal coating layer by powder sintering the corresponding areas of the metal substrate and the heating element, increasing surface roughness, increasing minute gaps and bubble generation points, effectively enhancing boiling performance;
- the raised layer strengthens the heat conduction and contact between the metal substrate and the heat generating component, and provides a softer metal layer between the metal substrate and the heat generating component, thereby reducing the contact thermal resistance of the two.
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- General Physics & Mathematics (AREA)
- Theoretical Computer Science (AREA)
- Computer Hardware Design (AREA)
- General Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Power Engineering (AREA)
- Human Computer Interaction (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
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Abstract
一种用于浸没式液冷服务器的发热元件的冷却装置及其制造方法,该冷却装置包括:设置于所述发热元件的上方且覆盖所述发热元件的金属基板;所述金属基板与发热元件的表面相邻近;以及所述金属基板远离所述发热元件的表面包括:多孔金属覆盖层,所述多孔金属覆盖层位于所述发热元件的上方且覆盖所述发热元件。通过在发热元件的表面设置具有多孔金属覆盖层的金属基板,增加了汽化核心,提高了发热元件的沸腾性能,实现了对发热元件表面温度高效的散热效果。
Description
本发明涉及计算机技术领域,具体来说,涉及一种用于浸没式液冷服务器的发热元件的冷却装置及冷却装置的制造方法。
除了常见的依靠冷空气给计算机散热的风冷降温方法以外,还有液冷降温方法,该方法把冷却剂直接导向热源,而风冷降温方法则是间接制冷;液冷降温方法的每单位体积所传输的热量即散热效率可以达到风冷降温方法的3500倍。液冷散热器在2008年左右就在市场出现,惠普、IBM等服务器厂商和其他一些专注数据中心技术的公司都先后推出过液冷散热产品。
蒸发冷却从热学原理上是利用流体沸腾时的汽化潜热带走热量的冷却方式。由于流体的汽化潜热要比流体的比热大很多,所以蒸发冷却的冷却效果更为显著。在浸没式液冷服务器中,即使用制冷剂进行浸泡式冷却时,取消了风冷降温方法所需要的翅片和风扇等散热装置,只用制冷剂的相变进行换热来冷却CPU。而换热面的加工方法、表面粗糙度、材料特性以及新旧程度都能影响沸腾传热的强弱。
目前市面上现有CPU的外罩表面光滑,不易产生气泡,沸腾性能不够好。CPU外罩的材质是铜并在表面镀有一层镍,而这种铜镀镍材质形成的表面为光洁表面,不利于汽化。同一液体,在光洁表面上沸腾传热时的传热系数比在粗糙面上沸腾传热时的传热系数低,这主要是由于光滑表面上汽化核心较少的缘故。因此在开机后CPU的温度上升很快,稳态温度较高,很容易达到CPU的极限温度,使得大多数服务器厂家对于浸没式液冷技术望而却步。
针对相关技术中CPU等发热元件的表面汽化核心少、沸腾性能不好的问题,目前尚未提出有效的解决方案。
发明内容
针对相关技术中CPU等发热元件的表面汽化核心少、沸腾性能不好的问题,本发明提出一种冷却装置及其制造方法,能够增加发热元器件表面的汽化核心,强化发热元件的沸腾性能,降低发热元件的核心温度。
为实现本发明的目的,本发明采用的技术方案是:提供了一种用于浸没式液冷服务器的发热元件的冷却装置,包括:设置于所述发热元件的上方且覆盖所述发热元件的金属基板;所述金属基板与发热元件的表面相邻近;以及所述金属基板远离所述发热元件的表面包括:多孔金属覆盖层,所述多孔金属覆盖层位于所述发热元件的上方且覆盖所述发热元件。
优选地,所述多孔金属覆盖层通过对所述金属基板远离所述发热元件的表面的对应区域进行粉末烧结而形成。
优选地,所述金属基板还包括覆盖于所述发热元件的表面的凸起部,所述金属基板通过所述凸起部与所述发热元件的表面相邻接。
优选地,还包括柔性高导热材料层,设置于所述发热元件的表面与所述金属基板之间且覆盖所述发热元件的表面。
优选地,所述金属基板还包括安装结构,所述安装结构用于固定所述金属基板。
优选地,所述金属基板的材料为铜、钛或不锈钢;所述粉末烧结采用的烧结金属粉末的材料为铜、铜镀银、铁或铁合金粉。
优选地,所述柔性高导热材料层为铟金属片。
优选地,多孔金属覆盖层的厚度小于3mm;以及多孔金属覆盖层的孔隙率在40%至95%之间。
优选地,所述发热元件包括CPU或GPU。
此外,本发明还提供了一种用于浸没式液冷服务器的冷却装置的制造方法,包括:提供金属基板;在所述金属基板相应于发热元件的区域形成多孔金属覆盖层;以及将所述金属基板设置于发热元件的上方并覆盖所述发热元件,
其中所述多孔金属覆盖层位于所述发热元件的上方且覆盖所述发热元件;其中,在所述金属基板相应于发热元件的区域形成多孔金属覆盖层的步骤中包括对所述金属基板远离所述发热元件的表面的对应区域进行粉末烧结以形成所述多孔金属覆盖层。
本发明通过在发热元件的表面设置具有多孔金属覆盖层的金属基板,增加了汽化核心,提高了发热元件的沸腾性能,实现了对发热元件表面温度高效的散热效果。
图1显示了本发明实施例CPU安装结构剖视图。
图2显示了本发明实施例金属基体仰视图。
图3显示了本发明实施例金属基体剖视图。
图4显示了本发明实施例多孔金属覆盖层的结构示意图。
图5显示了本发明实施例冷却装置的制造方法的流程图。
附图标记的说明:1—主板、2—CPU、3—CPU外罩、4—金属基板、5—凸台部、6—安装孔、7—第一表面、71—多孔金属覆盖层、8—第二表面。
为使本发明的目的、技术方案和优点更加清楚明白,下文中将结合附图对本发明的实施例进行详细说明。需要说明的是,在不冲突的情况下,本申请中的实施例及实施例中的特征可以相互任意组合。
根据本发明的实施例,提供了一种用于浸没式液冷服务器的发热元件的冷却装置。
根据服务器类型等实际情况,发热元件也可以包括例如内存、CPU或GPU芯片等其它易于发热的元件,本发明不对发热元件作具体限定。液冷服务器的主板1上通常安装有CPU2,CPU2上罩有CPU外罩3,以下均以发热元件为
CPU为例进行说明。
根据本发明实施例的冷却装置包括:设置于发热元件的上方且覆盖发热元件(未示出)的金属基板4;金属基板4与发热元件的表面相邻近;以及金属基板4远离发热元件的第一表面7包括:多孔金属覆盖层71,多孔金属覆盖层71位于发热元件的上方且覆盖发热元件。
其中,在一个实施例中,多孔金属覆盖层71通过对金属基板4的远离发热元件的第一表面7的对应区域进行粉末烧结而形成。金属基板4的材料为铜,也可以采用其它导热性能良好的金属或合金金属,如铜、铜镀银、钛或不锈钢等。
具体地,粉末烧结包括以下步骤:先将金属基板4的远离发热元件的表面7去除锈和油垢,然后涂上一层粘结剂溶液,粘结剂包括聚丙烯、聚乙烯、聚苯乙烯、聚对苯二甲酸乙二醇酯、聚甲基丙烯酸、丙酮或二甲苯等,将烧结金属粉末均匀地涂粘在金属基板4远离发热元件的第一表面7上,金属粉末包括铜粉、铁粉或铁合金粉等,所述的金属粉末和粘结剂的重量比为10∶(2~5),当粘结剂溶液风干后,将金属基板4放置于烧结炉内,在氢气保护下加热至烧结金属粉末表面有熔化趋势,恒温约20min后,使粘结剂分散挥发,金属粉末烧结成一体并烧结在金属基板4的远离发热元件的第一表面7上,这样就在金属基板4的远离发热元件的第一表面7上形成了多孔金属覆盖层71。多孔金属覆盖层71的厚度一般小于3mm,多孔金属覆盖层71的孔隙率在40%至95%之间。
如图2,通过对金属基板4远离发热元件的第一表面7的对应区域进行粉末烧结而形成多孔金属覆盖层71,增加了表面粗糙度,增加了微小缝隙及气泡生成点,可有效强化沸腾性能。
在一个实施例中由于CPU外罩3不易拆除,而且CPU芯片2不耐高温,因此无法在其表面直接进行处理。因此可以对一块与CPU2表面形状、大小相同的薄铜片的表面进行粉末烧结处理以形成本发明的冷却装置,然后通过低温
焊接方法将该冷却装置焊接在CPU外罩3上,实现强化沸腾换热的效果。
在一个实施例中,由于焊接件难以移除,会影响CPU2的后继保修事宜,优选的是金属基板4还包括安装结构,安装结构用于固定金属基板4。根据发热元件等实际需求的不同,安装结构也可以是其它用于固定金属基板4的结构。具体地参考图2和图3,在金属基板4远离发热元件的第一表面7对应于CPU2的位置,做粉末烧结处理以强化沸腾性能,然后在金属基板4的四角留有安装孔6,即安装结构为安装孔6,将金属基板4用紧固螺钉穿过所述安装孔6紧固在主板1上对应的螺纹孔,使得金属基板4压合在CPU2的正上方;其中,CPU或GPU在出厂时,会有芯片能承受的最大压强,应根据金属基板4本身的重量核算紧固螺钉的紧固力,以确保不会压坏芯片。由于CPU2上方在原本采用风冷降温方法时安装有风扇和翅片,主板上原本就有固定风扇和翅片的螺纹孔,因此为了方便安装将金属基板4的安装孔6的位置与原本的固定风扇和翅片的螺纹孔的位置相对应即可,不需要对主板1进行额外的改造或是结构上的变形,提高了冷却装置的适用性。
同样参考图2和图3,金属基板4还包括覆盖于发热元件的表面的凸起部5,凸起部5位于金属基板4靠近发热元件的一侧上,金属基板4通过凸起部5与发热元件的表面接触。通过设置凸起部5,能够强化金属基板4与CPU2的导热和接触。
在一个实施例中,本发明的发热元件的冷却装置还包括:为了减小金属基板4和CPU2之间的接触热阻,因此在二者之间设置了柔性高导热材料层,所述柔性高导热材料层为金属层、特种橡胶、特种塑料或是石墨烯等,设置于发热元件的表面与金属基板4之间且覆盖发热元件的表面。由于浸没式液冷系统中不能使用导热硅脂,当使用金属层作为所述柔性高导热材料层时,所述金属层为质地较软的薄金属片以避免金属基体4和CPU2两者硬接触,填满两者之间的空隙,减小接触热阻。金属层的材料可以采用铟金属等。
上述技术方案中,本发明通过在发热元件的表面上设置具有多孔金属覆盖
层71的金属基板4,增加了汽化核心,提高了发热元件的沸腾性能,实现了对发热元件表面温度高效的散热效果。
根据本发明的实施例,还提供了一种用于浸没式液冷服务器的冷却装置的制造方法,包括以下步骤:
步骤S401,提供金属基板4;
步骤S403,在金属基板4相应于发热元件的区域形成多孔金属覆盖层71;以及
步骤S405,将金属基板4设置于发热元件的上方并覆盖发热元件,其中多孔金属覆盖层71位于发热元件的上方且覆盖发热元件。
进一步地,步骤S403包括:对金属基板4远离发热元件的表面的对应区域进行粉末烧结以形成多孔金属覆盖层71。
综上所述,借助于本发明的上述技术方案,通过在发热元件的表面设置具有多孔金属覆盖层的金属基板,增加了汽化核心,提高了发热元件的沸腾性能,实现了对发热元件表面温度高效的散热效果;又通过对金属基板与发热元件的对应区域进行粉末烧结而形成多孔金属覆盖层,增加了表面粗糙度,增加了微小缝隙及气泡生成点,有效强化了沸腾性能;还通过设置凸起层,强化了金属基板与发热元件的导热和接触,并在金属基板与发热元件之间设置了质地较软的金属层,减小了二者的接触热阻。
虽然本发明所揭露的实施方式如上,但所述的内容只是为了便于理解本发明而采用的实施方式,并非用以限定本发明。任何本发明所属技术领域内的技术人员,在不脱离本发明所揭露的精神和范围的前提下,可以在实施的形式上及细节上作任何的修改与变化,但都应落在本申请的保护范围内。
Claims (10)
- 一种用于浸没式液冷服务器的发热元件的冷却装置,其特征在于,包括:设置于所述发热元件的上方且覆盖所述发热元件的金属基板;所述金属基板与发热元件的表面相邻近;以及所述金属基板远离所述发热元件的表面包括:多孔金属覆盖层,所述多孔金属覆盖层位于所述发热元件的上方且覆盖所述发热元件。
- 根据权利要求1所述的用于浸没式液冷服务器的发热元件的冷却装置,其特征在于,所述多孔金属覆盖层通过对所述金属基板远离所述发热元件的表面的对应区域进行粉末烧结而形成。
- 根据权利要求1-2任一项所述的用于浸没式液冷服务器的发热元件的冷却装置,其特征在于,所述金属基板还包括覆盖于所述发热元件的表面的凸起部,所述金属基板通过所述凸起部与所述发热元件的表面相邻接。
- 根据权利要求1-3任一项所述的用于浸没式液冷服务器的发热元件的冷却装置,其特征在于,还包括:柔性高导热材料层,设置于所述发热元件的表面与所述金属基板之间且覆盖所述发热元件的表面。
- 根据权利要求1-4任一项所述的用于浸没式液冷服务器的发热元件的冷却装置,其特征在于,所述金属基板还包括安装结构,所述安装结构用于固定所述金属基板。
- 根据权利要求2-5任一项所述的用于浸没式液冷服务器的发热元件的冷却装置,其特征在于,所述金属基板的材料为铜、钛或不锈钢;所述粉末烧结采用的烧结金属粉末的材料为铜、铜镀银、铁或铁合金 粉。
- 根据权利要求4-6任一项所述的用于浸没式液冷服务器的发热元件的冷却装置,其特征在于,所述柔性高导热材料层为铟金属片。
- 根据权利要求1-7任一项所述的用于浸没式液冷服务器的发热元件的冷却装置,其特征在于,多孔金属覆盖层的厚度小于3mm;以及多孔金属覆盖层的孔隙率在40%至95%之间。
- 根据权利要求1所述的用于浸没式液冷服务器的发热元件的冷却装置,其特征在于,所述发热元件包括CPU或GPU。
- 一种用于浸没式液冷服务器的冷却装置的制造方法,其特征在于,包括:提供金属基板;在所述金属基板相应于发热元件的区域形成多孔金属覆盖层;以及将所述金属基板设置于发热元件的上方并覆盖所述发热元件,其中所述多孔金属覆盖层位于所述发热元件的上方且覆盖所述发热元件;其中,在所述金属基板相应于发热元件的区域形成多孔金属覆盖层的步骤中包括对所述金属基板远离所述发热元件的表面的对应区域进行粉末烧结以形成所述多孔金属覆盖层。
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US20190246518A1 (en) | 2019-08-08 |
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US10945352B2 (en) | 2021-03-09 |
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