WO2018068495A1 - 用于制造量子点显示器件的方法以及对应的量子点显示器件 - Google Patents

用于制造量子点显示器件的方法以及对应的量子点显示器件 Download PDF

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Publication number
WO2018068495A1
WO2018068495A1 PCT/CN2017/081561 CN2017081561W WO2018068495A1 WO 2018068495 A1 WO2018068495 A1 WO 2018068495A1 CN 2017081561 W CN2017081561 W CN 2017081561W WO 2018068495 A1 WO2018068495 A1 WO 2018068495A1
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Prior art keywords
array substrate
quantum dot
printing
display device
relief
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Ceased
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PCT/CN2017/081561
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English (en)
French (fr)
Inventor
邢伟强
王永茂
邓金阳
毛振华
游洪超
罗明
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BOE Technology Group Co Ltd
Chengdu BOE Optoelectronics Technology Co Ltd
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BOE Technology Group Co Ltd
Chengdu BOE Optoelectronics Technology Co Ltd
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Priority to US15/569,082 priority Critical patent/US10303004B2/en
Publication of WO2018068495A1 publication Critical patent/WO2018068495A1/zh
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/133711—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by organic films, e.g. polymeric films
    • G02F1/133723—Polyimide, polyamide-imide
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41F—PRINTING MACHINES OR PRESSES
    • B41F3/00—Cylinder presses, i.e. presses essentially comprising at least one cylinder co-operating with at least one flat type-bed
    • B41F3/18—Cylinder presses, i.e. presses essentially comprising at least one cylinder co-operating with at least one flat type-bed of special construction or for particular purposes
    • B41F3/28—Proof-print presses for relief printing, lithography or intaglio printing, i.e. presses for checking accuracy of printing surfaces
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133382—Heating or cooling of liquid crystal cells other than for activation, e.g. circuits or arrangements for temperature control, stabilisation or uniform distribution over the cell
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/1336—Illuminating devices
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/1336—Illuminating devices
    • G02F1/133617—Illumination with ultraviolet light; Luminescent elements or materials associated to the cell
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/1336—Illuminating devices
    • G02F1/133614—Illuminating devices using photoluminescence, e.g. phosphors illuminated by UV or blue light
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2202/00—Materials and properties
    • G02F2202/10—Materials and properties semiconductor
    • G02F2202/108—Materials and properties semiconductor quantum wells
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2202/00—Materials and properties
    • G02F2202/36—Micro- or nanomaterials

Definitions

  • the present disclosure relates to the technical field of quantum dot display, and in particular to a method for fabricating a quantum dot display device and a corresponding quantum dot display device.
  • quantum dot display technology With the rapid development of the display field, quantum dot display technology has received more and more attention due to its unique luminescent properties, excellent stability, wider color gamut coverage and relatively low cost.
  • the quantum dot material is typically excited by the blue light emitted by the backlight to emit red and green light to provide a color display.
  • quantum dot display devices are devices that achieve color display by virtue of the photoluminescence effect of the backlight and quantum dot material.
  • the quantum dot material is usually formed into a quantum dot film mainly by a lithography technique, an epitaxial growth technique or the like. After that, such a quantum dot film is implanted between the backlight and the display screen (specifically, the array substrate), thereby obtaining a quantum dot display device.
  • the above conventional methods due to the large specific surface area of the quantum dot material and the high surface energy, the above conventional methods generally cannot avoid the agglomeration and the like which occur during the processing of the quantum dot material.
  • embodiments of the present disclosure provide methods for fabricating quantum dot display devices and corresponding quantum dot display devices in order to alleviate or eliminate one or more of the disadvantages or deficiencies noted above.
  • embodiments of the present disclosure provide a method for fabricating a quantum dot display device.
  • the method comprises: providing an array substrate and a matching substrate opposite to each other; printing an alignment solution containing the quantum dot material onto a side of the array substrate facing the opposite substrate; and removing the printing onto the side of the array substrate facing the opposite substrate a solvent in the alignment solution; heating the array substrate after removing the solvent; and providing a backlight on a side of the array substrate facing away from the mating substrate.
  • the quantum dot material is directly built in the alignment film, and the alignment film is formed directly on the surface of the array substrate.
  • an alignment film containing a quantum dot material is formed directly on the surface of the array substrate.
  • the quantum dot material is built into the interior of the display panel, thereby avoiding the special packaging requirements for it and ensuring its relative independence.
  • the printing of the alignment solution is accomplished by a relief printing process.
  • a relief printing process comprises: dropping the alignment solution onto the Anilox roller by a dispenser; dropping onto the anilox roller by rotation of the anilox roller and the printing roller on which the printing relief is mounted The alignment solution is transferred onto the printing relief, wherein the printing roller and the anilox roller are rotated in opposite directions and the linear velocity ratio is within a certain range, and wherein the printing relief is at least partially in contact with the anilox roller during rotation with the printing roller Contacting and squeezing; and transferring the alignment solution transferred onto the printing relief onto the array substrate by rotation of the printing relief and translation of the array substrate, wherein the printing relief and the array substrate are circumscribed and linearly accelerated during the transfer process equal.
  • the ratio of the rotational linear velocity of the printing roller and the anilox roller is 1.05 to 0.09.
  • the alignment solution containing the quantum dot material can be more uniformly transferred onto the array substrate by the relief printing process provided by the embodiments of the present disclosure than conventional lithographic techniques. Moreover, such a relief printing process also helps to prevent degradation of the quantum dot material, such as agglomeration, thereby improving the effectiveness of the quantum dot material, and Ensure the display quality of the quantum dot display device.
  • a method for fabricating a quantum dot display device further includes: providing a liquid crystal cell sandwiched between the array substrate and the counter substrate, wherein the printed pattern of the printed relief corresponds to The pattern of the liquid crystal cell. Further, there is also a void region between the printed patterns of the printing relief. Since the printing pattern of the printing relief directly determines the pattern distribution of the alignment film (including the quantum dot material) finally printed on the array substrate, the correspondence between the printing pattern of the printing relief and the pattern of the liquid crystal cell is ensured for each liquid crystal.
  • the box accordingly has a quantum dot material portion. Further, the void area between the printed patterns of the printing relief allows the relative independence between the respective liquid crystal cells, thereby preventing an adverse effect such as display crosstalk.
  • the relief printing of the alignment solution further comprises: smearing the alignment solution dripping onto the anilox roll with a doctor blade before transferring the alignment solution dripping onto the anilox roll onto the printing relief deal with.
  • a doctor blade By means of such a doctor blade, the alignment solution dripped onto the anilox roll can be distributed more uniformly, thereby facilitating further uniform transfer onto the printing relief and an increase in the display effect of the quantum dot display device.
  • the removal of the solvent in the alignment solution used by the above manufacturing method includes removal by a freeze-drying treatment.
  • freeze-drying treatment comprises: placing an array substrate printed with an alignment solution into a freeze-drying apparatus; freezing the array substrate in the freeze-drying apparatus; vacuuming the freeze-drying apparatus after freezing; and after evacuating The array substrate is heated in a freeze drying apparatus.
  • the solvent is removed by sublimation under high vacuum.
  • the freeze-drying process according to this embodiment can reduce the surface energy of the quantum dot material, thereby avoiding degradation of the quantum dot material during a process as much as possible.
  • the heating of the array substrate after removal of the solvent comprises microwave heating.
  • microwave heating includes: placing the array substrate after removing the solvent into the microwave heating device; and heating the array substrate by a microwave process.
  • the microwave heating further comprises: maintaining the array substrate at a constant temperature after heating the array substrate by a microwave process.
  • the alignment function of the alignment material it is generally required to heat it.
  • the quantum dot material is contained in the alignment film at this time in addition to the alignment material, and the surface activity of the quantum dot material is relatively high, the conventional heating method inevitably leads to deterioration of the quantum dot material agglomeration.
  • the microwave heating technique according to an embodiment of the present disclosure has advantages of fast temperature rise, relatively short heating and holding time, and uniform heat.
  • the alignment material in the alignment solution used above comprises a polyimide (PI) material.
  • PI polyimide
  • other equivalent alignment materials can be readily obtained by those skilled in the art, with the benefit of the teachings of the present disclosure, and the present disclosure is not limited only to the polyimide materials listed as examples.
  • the above solvent used in the alignment solution includes: an organic solvent.
  • an organic solvent may include an aromatic solvent benzene.
  • organic solvents in accordance with the teachings of the present disclosure.
  • those skilled in the art will be able to select an appropriate organic solvent according to the specific practical needs and corresponding alignment materials, and the disclosure is not limited in this respect.
  • embodiments of the present disclosure also provide a quantum dot display device.
  • a quantum dot display device is produced by the method for fabricating a quantum dot display device described in any of the above embodiments.
  • Embodiments of the present disclosure disclose methods for fabricating quantum dot display devices and corresponding quantum dot display devices. Specifically, in the manufacturing method for a quantum dot display device, the quantum dot material is first dissolved in the alignment solution. Thus, after the alignment film is formed by the printing process of the alignment solution, the quantum material can be directly contained in such an alignment film. In such cases, direct contact of the quantum dot material with air and possibly liquid crystal material is effectively prevented, thereby avoiding contamination thereof and ensuring its effectiveness. In addition, since the alignment film containing the quantum dot material is directly formed on the surface of the array substrate, the quantum dot material is completely built in the inside of the display panel.
  • FIG. 1 is a schematic flowchart showing a method for fabricating a quantum dot display device according to an embodiment of the present disclosure
  • FIG. 2 is a schematic cross-sectional view showing a quantum dot display device in accordance with an embodiment of the present disclosure
  • FIG. 3 is a schematic structural view showing a relief printing apparatus used in a relief printing process according to an embodiment of the present disclosure
  • FIG. 4 is a schematic cross-sectional view showing another quantum dot display device according to an embodiment of the present disclosure.
  • FIG. 1 is a schematic flow chart showing such a manufacturing method
  • FIG. 2 is a schematic view showing a quantum dot display device produced by such a manufacturing method. Section view.
  • the method 100 may include: providing an array substrate 21 and a matching substrate 22 opposite to each other with S1; and printing an alignment solution containing the quantum dot material S2 to a side of the array substrate 21 facing the opposite substrate 22 (illustrated in FIG. 2) Ground, upper side).
  • the alignment solution preferably needs to be used as soon as possible after the formulation is completed to avoid precipitation of the quantum dot material in the alignment solution due to agglomeration due to excessive standing time.
  • the alignment solution printed on the upper side of the array substrate 21 can form the alignment film 24 as shown in FIG.
  • the alignment film 24 at this time exhibits only a near liquid form like a water film.
  • the method 100 for fabricating the quantum dot display device 20 may further include removing the alignment of the S3 printed onto the side of the array substrate 21 facing the opposite substrate 22 (schematically, the upper side in FIG. 2).
  • the manufacturing method 100 of the embodiment of the present disclosure further includes a heating process for the array substrate 21.
  • a heating S4 process serves two purposes: on the one hand, the alignment solution printed on the array substrate 21 is cured by heating into an alignment film 24 having a fixed form factor; on the other hand, the alignment film is heated by means of heating.
  • the alignment material exemplarily, polyimide
  • the manufacturing method 100 of the embodiment may further include providing an S5 backlight 23 on a side of the array substrate 21 facing away from the mating substrate 22 (in the schematic, lower side in FIG. 2).
  • the illumination of quantum dot materials needs to be achieved by excitation of other light sources.
  • the method 100 for fabricating the quantum dot display device 20 further includes the step of providing the backlight 23 described above.
  • the quantum dot material is built in the alignment film while the alignment film is formed directly on the surface of the array substrate.
  • the alignment film containing the quantum dot material is built in the inside of the display panel, that is, on the side of the array substrate facing the opposite substrate, thereby avoiding special packaging requirements for the quantum dot material and ensuring quantum The relative independence of the point materials.
  • the printing S2 of the alignment solution can be accomplished by letterpress printing.
  • a relief printing process will be described in detail below with reference to FIGS. 1 and 3, which is a schematic structural view showing a relief printing apparatus 30 used in a relief printing process according to an embodiment of the present disclosure.
  • FIG. 3 is a schematic structural view showing a relief printing apparatus 30 used in a relief printing process according to an embodiment of the present disclosure.
  • a relief printing process may include the following steps: first, the alignment solution is dropped by the dispenser 31 onto the anilox roller 33; and then, through the anilox roller 33 and the printing relief 35 is mounted.
  • the printing roller 34 rotates to transfer the alignment solution dropped onto the anilox roller 33 to the printing relief 35.
  • the printing roller 34 and the anilox roller 33 are rotated in opposite directions, see the clockwise and counterclockwise directions of rotation as shown in FIG.
  • the printing relief 35 is at least partially in contact with the anilox roller 33 during rotation with the printing roller 34, and is pressed against each other, thereby enabling the alignment solution to be transferred onto the printing relief 35.
  • the ratio of the linear velocity of the anilox roller 33 and the printing roller 34 is generally controlled within a certain range. As an example, the ratio of such linear velocity magnitudes can be maintained from 1.05 to 0.95.
  • the transfer of the alignment solution is achieved by the relative rotation of the above two rolls (the anilox roll 33 and the print roll 34).
  • the relief printing process may further include: by rotation of the printing relief 35 (schematically rotated in FIG. 3, clockwise) and translation of the array substrate 37 (schematically translated to the left in FIG. 3)
  • the alignment solution transferred to the printing relief 35 is transferred onto the array substrate 37 by the transfer solution S24.
  • the transfer solution S24 process the printing relief 35 and the array substrate 37 are always kept circumscribed.
  • the array substrate 37 is transferred during the transfer process.
  • the translational linear velocity generally needs to be the same as the rotational linear velocity of the printing roller 34.
  • the array substrate 37 may first be placed on the printing table 36 prior to the transfer S24 process described above, and then both of them 36, 37 are translated together to the left.
  • the transfer S24 of the alignment solution is completed by the corresponding rotation (shown schematically in FIG. 3, clockwise rotation) with the printing roller 34 (and the printing relief 35 thereon).
  • the alignment solution containing the quantum dot material can be more uniformly transferred onto the array substrate by the relief printing process provided by the embodiments of the present disclosure compared to conventional lithographic techniques. Moreover, such a relief printing process also helps to prevent degradation of quantum dot materials such as agglomeration, thereby improving the effectiveness of the quantum dot material and ensuring the display quality of the quantum dot display device.
  • a method for fabricating a quantum dot display device may further include a process of providing a liquid crystal cell.
  • FIG. 4 is a schematic cross-sectional view showing another quantum dot display device in accordance with an embodiment of the present disclosure.
  • the quantum dot display device 40 shown in FIG. 4 is substantially identical to the quantum dot display device 20 shown in FIG. 2, that is, includes an array substrate 41, a counter substrate 42, and a backlight 43.
  • Such a quantum dot display device 40 can be obtained by setting the printing pattern of the printing relief 35 to correspond to the pattern of the liquid crystal cell 25, and providing a void region between the printing patterns of the printing relief 35.
  • a quantum dot display device 40 can be obtained by setting the printing pattern of the printing relief 35 to correspond to the pattern of the liquid crystal cell 25, and providing a void region between the printing patterns of the printing relief 35.
  • the alignment solution is transferred to have a corresponding pattern distribution on the array substrate 37 by the printing pattern of the printing relief 35.
  • the printed pattern of the printing relief directly determines the pattern distribution of the alignment film finally printed on the array substrate. That is, the pattern distribution of the alignment film as shown in FIG. 4 directly reflects the printed pattern distribution of the printing relief. Therefore, by the correspondence between the printed pattern of the printing relief and the pattern of the liquid crystal cell, it is ensured that there is a corresponding alignment film portion, that is, a corresponding quantum dot material portion, for each liquid crystal cell. In addition, the void area between the printed patterns of the printing relief allows for relative independence between the respective liquid crystal cells, thereby preventing display crosstalk and the like from being disadvantageous. effect.
  • the relief printing process of the alignment solution may further comprise: dropping onto the anilox roll 33 by means of a doctor blade 32 before transferring the alignment solution dripping onto the anilox roll 33 onto the printing relief 35
  • the alignment solution is smoothed.
  • the removal of the solvent in the alignment solution S3 may comprise: removal by a freeze drying process.
  • Freeze drying can also be referred to as sublimation drying, which refers to a drying process that freezes the aqueous material below freezing point, converts the water to ice, and then converts the ice to steam for removal under higher vacuum.
  • sublimation drying refers to a drying process that freezes the aqueous material below freezing point, converts the water to ice, and then converts the ice to steam for removal under higher vacuum.
  • the water vapor generated by the sublimation action can be removed by means of a condenser. A specific implementation of such a freeze-drying process is described in further detail with reference to FIG.
  • the array substrate printed with the alignment solution is placed in S31 to the freeze-drying apparatus; secondly, the S32 array substrate is frozen in the freeze-drying apparatus; after freezing, the freeze-drying apparatus is evacuated S33; finally, after the vacuum is frozen
  • the S34 array substrate is heated in a drying apparatus.
  • the array substrate can be quickly frozen to between minus 40 ° C and minus 50 ° C, and then vacuuming is initiated to remove excess solvent and possible moisture using sublimation.
  • the solvent can be removed by sublimation under high vacuum.
  • the freeze-drying treatment according to this specific embodiment can reduce the surface activity of the quantum dot material, thereby avoiding deterioration of the quantum dot material during a process as much as possible.
  • the heating S4 of the array substrate after removal of the solvent comprises microwave heating.
  • Microwave heating can also be referred to as microwave sintering, which is based on the principle that the interaction of the material with the electromagnetic field produces a heating effect.
  • the basic fine structure of the material is coupled to an electromagnetic field of a specific frequency, the internal microscopic particles will oscillate in response to the electromagnetic field, thereby aggravating the thermal motion.
  • the microwave energy is absorbed and converted into thermal energy. Referring to FIG. 1, such a microwave heating process may specifically include: placing the array substrate after removing the solvent into the microwave heating apparatus; and heating the S42 array substrate by a microwave process.
  • the microwave heating process may further include: after heating the array substrate by the microwave process, maintaining the array substrate at a constant temperature of S43.
  • the alignment film at this time also contains a quantum dot material, the large surface energy of the quantum dot material makes it difficult After a long period of heating, the conventional heating method will inevitably lead to deterioration of quantum dot material agglomeration.
  • microwave heating techniques in accordance with embodiments of the present disclosure heat up faster, heat and hold time is shorter, and heat is more uniform.
  • the alignment material in the alignment solution used above may comprise a polyimide (PI) material.
  • PI polyimide
  • the present disclosure is not limited to this.
  • the above solvent used in the alignment solution may include an organic solvent.
  • such an organic solvent may include an aromatic solvent benzene.
  • those skilled in the art will be able to select an appropriate organic solvent based on the particular practice needs and the corresponding alignment materials, and the disclosure is not limited in this respect.
  • embodiments of the present disclosure also provide a quantum dot display device.
  • the quantum dot display device shown in FIGS. 2 and 4 can be referred to.
  • Such a quantum dot display device can be produced by the method for fabricating a quantum dot display device described in any of the above embodiments.
  • Embodiments of the present disclosure disclose methods for fabricating quantum dot display devices and corresponding quantum dot display devices.
  • the quantum dot material is first dissolved into the alignment solution. After the alignment film is formed on the array substrate by the printing process of the alignment solution, the quantum dot material is directly contained in such an alignment film. In this way, direct contact of the quantum dot material with air and possibly liquid crystal material is effectively prevented, thereby avoiding contamination thereof and ensuring its effectiveness.
  • the alignment film containing the quantum dot material is directly formed on the surface of the array substrate, the quantum dot material is completely built in the inside of the display panel.

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
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Abstract

一种用于制造量子点显示器件（20）的方法以及对应的量子点显示器件（20）。用于制造量子点显示器件（20）的方法包括：提供彼此相对的阵列基板（21）和对合基板（22）（S1）；将含有量子点材料的配向溶液印刷到阵列基板（21）面向对合基板（22）的一侧上（S2）；移除印刷到阵列基板（21）面向对合基板（22）的一侧上的配向溶液中的溶剂（S3）；在移除溶剂之后，加热阵列基板（21）（S4）；以及在阵列基板（21）背离对合基板（22）的一侧上提供背光源（23）（S5）。借助于用于制造量子点显示器件（20）的方法，极大地提升了所制得的量子点显示器件（20）的显示质量，并且降低了相关的制造成本和工艺难度。

Description

用于制造量子点显示器件的方法以及对应的量子点显示器件
优先权声明
本申请要求2016年10月11日提交的中国专利申请No.201610886181.1的优先权，该中国专利申请以其整体通过引用并入本文。
技术领域
本公开涉及量子点显示的技术领域，并且具体地涉及用于制造量子点显示器件的方法以及对应的量子点显示器件。
背景技术
随着显示领域的快速发展，量子点显示技术凭借其独特的发光性质、优异的稳定性、更宽的色域覆盖性以及相对低廉的成本等优势而受到越来越多的关注。目前，在利用量子点显示技术的显示器件中，通常通过背光源发出的蓝光来激发量子点材料发出红光和绿光，从而提供彩色显示。本质上，量子点显示器件是借助于背光源及量子点材料的光致发光效应而实现彩色显示的器件。
在现有量子点显示器件中，通常主要通过平板印刷技术、外延生长技术等将量子点材料制成一层量子点薄膜。在此之后，再将这样的量子点薄膜植入到背光源与显示屏(具体地，阵列基板)之间，由此得到量子点显示器件。然而，由于量子点材料的比表面积较大并且表面能较高，所以以上几种常规方法通常都无法避免量子点材料在处理过程中出现的团聚等劣化现象。另外，不管采用哪种技术，都需要首先产生量子点薄膜，并且然后再将其植入到背光源与阵列基板之间。由此可见，这势必会导致量子点材料与空气的潜在接触。对此，在现有技术中，一般要求对量子点薄膜进行特殊封装，以阻止空气与量子点材料的直接接触，从而保证其不会发生降级。然而，这样的特殊封装必然会增大量子点薄膜的生产成本以及相应的工艺难度。此外，外延技术一般还要求比较昂贵的设备，并且工艺过程也相对比较复杂，因此不适于大规模的产业化生产。概括起来，现有技术中对量子点材料的处理方法，一方面容易引起量子点材料的团聚等劣化现象，而另 一方面还伴随有特殊的封装工艺。这二者不仅不利于量子点显示器件的显示质量的提升，而且还加大了相关的制造成本和工艺难度。
发明内容
鉴于以上所述，本公开的实施例提供了用于制造量子点显示器件的方法以及对应的量子点显示器件，以便缓解或消除以上所指出的缺点或不足中的一个或多个。
根据一个方面，本公开的实施例提供了一种用于制造量子点显示器件的方法。该方法包括：提供彼此相对的阵列基板和对合基板；将含有量子点材料的配向溶液印刷到阵列基板面向对合基板的一侧上；移除印刷到阵列基板面向对合基板的一侧上的配向溶液中的溶剂；在移除溶剂之后，加热阵列基板；以及在阵列基板背离对合基板的一侧上提供背光源。在根据本公开的这一方面的制造方法中，量子点材料直接内置在配向膜中，而配向膜又直接形成在阵列基板的表面上。以这样的方式，有效地阻止了量子点材料与空气以及可能的液晶材料的直接接触，从而避免了量子点材料可能受到的污染，并且确保了它的有效性。另外，包含量子点材料的配向膜直接形成在阵列基板的表面上。在这样的情况下，量子点材料内置在显示面板的内部，从而避免了针对它的特殊封装要求，并且保证了它的相对独立性。
根据具体实施例，配向溶液的印刷通过凸版印刷(relief printing)过程完成。进一步地，这样的凸版印刷过程包括：通过分配器将配向溶液滴落到网纹(Anilox)辊上；通过网纹辊和安装有印刷凸版的印刷辊的旋转而将滴落到网纹辊上的配向溶液转移到印刷凸版上，其中印刷辊和网纹辊的旋转方向相反并且线速度之比在一定范围内，并且其中印刷凸版在随印刷辊而旋转的过程中至少部分地与网纹辊接触和挤压；以及通过印刷凸版的旋转和阵列基板的平移而将转移到印刷凸版上的配向溶液转印到阵列基板上，其中在转印过程中，印刷凸版与阵列基板外切并且线速度相等。进一步地，印刷辊和网纹辊的旋转线速度之比为1.05～0.09。相比于常规的平版印刷技术，通过本公开的实施例提供的凸版印刷过程，使得含有量子点材料的配向溶液能够更加均匀地转印到阵列基板上。而且，这样的凸版印刷过程还有助于阻止量子点材料出现团聚等劣化现象，从而提高量子点材料的有效性，并且 保证量子点显示器件的显示质量。
根据另外的具体实施例，由本公开的这一方面提供的用于制造量子点显示器件的方法还包括：提供夹在阵列基板和对合基板之间的液晶盒，其中印刷凸版的印刷图案对应于液晶盒的图案。进一步地，印刷凸版的印刷图案之间还存在空隙区。由于印刷凸版的印刷图案直接决定着最终印刷到阵列基板上的配向膜(包含量子点材料)的图案分布，所以通过印刷凸版的印刷图案与液晶盒的图案的对应关系，保证了针对每一个液晶盒都相应地存在一个量子点材料部分。此外，印刷凸版的印刷图案之间的空隙区还允许各个液晶盒之间的相对独立性，从而防止显示串扰等不利效果。
根据另外的具体实施例，配向溶液的凸版印刷还包括：在将滴落到网纹辊上的配向溶液转移到印刷凸版上之前，利用刮刀对滴落到网纹辊上的配向溶液进行抹平处理。借助于这样的刮刀，滴落到网纹辊上的配向溶液能够分布得更加均匀，从而有利于向印刷凸版上的进一步均匀转印，以及量子点显示器件的显示效果的提升。
根据具体实施例，由以上制造方法所使用的配向溶液中的溶剂的移除包括：通过冷冻干燥(freeze-drying)处理的移除。进一步地，这样的冷冻干燥处理包括：将印刷有配向溶液的阵列基板放置到冷冻干燥设备中；在冷冻干燥设备中冷冻阵列基板；在冷冻之后，对冷冻干燥设备抽真空；以及在抽真空后的冷冻干燥设备中加热阵列基板。在这样的冷冻干燥过程中，通过高真空度下的升华作用而移除溶剂。相比于传统的溶剂挥发技术，根据这一具体实施例的冷冻干燥处理可以降低量子点材料的表面能，从而尽可能地避免量子点材料在工艺处理期间出现团聚等劣化现象。
根据具体实施例，在移除溶剂之后对阵列基板的加热包括微波加热。进一步地，这样的微波加热包括：将移除溶剂后的阵列基板放置到微波加热设备中；以及通过微波过程加热阵列基板。进一步地，微波加热还包括：在通过微波过程加热阵列基板之后，使阵列基板保持在恒定的温度下。考虑到配向材料的配向功能，一般需要对其进行加热处理。然而，由于除了配向材料之外，此时的配向膜中还包含量子点材料，而量子点材料的表面活性又比较高，所以传统的加热方式必然会导致量子点材料团聚等劣化现象。相比于常规的电阻性加热方式， 根据本公开的实施例的微波加热技术具有升温快、加热及保温时间相对较短、以及受热均匀等优点。
根据具体实施例，以上所使用的配向溶液中的配向材料包括：聚酰亚胺(PI)材料。当然，在获益于本公开的教导的情况下，本领域技术人员能够容易地获得其它等同的配向材料，并且本公开不仅仅限于作为示例而列出的聚酰亚胺材料。
根据具体实施例，在配向溶液中使用的以上溶剂包括：有机溶剂。具体地，这样的有机溶剂可以包括芳香族溶剂苯。同样地，根据本公开的教导，本领域技术人员能够容易地领会到其它可替换的有机溶剂。示例性地，本领域技术人员能够根据具体实践需要以及对应的配向材料而选择适当的有机溶剂，本公开在这一方面不做限制。
根据另一方面，本公开的实施例还提供了一种量子点显示器件。这样的量子点显示器件通过以上任一个实施例所述的用于制造量子点显示器件的方法而制得。
本公开的实施例公开了用于制造量子点显示器件的方法以及对应的量子点显示器件。具体地，在针对量子点显示器件的制造方法中，量子点材料首先溶解到配向溶液中。这样，在通过配向溶液的印刷过程而形成配向膜之后，量子材料就能够直接包含在这样的配向膜中。在这样的情况下，量子点材料与空气以及可能的液晶材料的直接接触得到有效地阻止，从而避免了对它的污染，并且确保了它的有效性。另外，由于包含量子点材料的配向膜直接形成在阵列基板的表面上，所以对应地，量子点材料就完全内置于显示面板内部。以这样的方式，避免了针对量子点材料的特殊封装要求，并且保证了量子点材料的相对独立性以及发光效果。因此，借助于上述制造过程，极大地提升了所制得的量子点显示器件的显示效果，降低了相关的制造成本，并且简化了制造工艺和封装过程。
附图说明
图1是示出了根据本公开的实施例的用于制造量子点显示器件的方法的示意性流程图；
图2是示出了根据本公开的实施例的量子点显示器件的示意性截面视图；
图3是示出了在根据本公开的实施例的凸版印刷过程使用的凸版印刷装置的结构示意图；以及
图4是示出了根据本公开的实施例的另一量子点显示器件的示意性截面视图。
具体实施方式
下面结合附图对本公开实施例所提供的量子点显示器件及其制造方法进行详细说明。需要指出的是，附图未必按照比例绘制，相反一般将重点放在说明本公开的原理上。因此，在附图中示出的各个元件、膜层等的尺寸、位置等都不代表真实的尺寸、位置等，其目的仅仅用于促进对本公开的实现和原理的理解。
根据一个方面，本公开的实施例提供了一种用于制造量子点显示器件的方法。具体地，参照图1和2，其中图1是示出了这样的制造方法的示意性流程图，并且图2是示出了借助于这样的制造方法所制得的量子点显示器件的示意性截面视图。该方法100可以包括：提供S1彼此相对的阵列基板21和对合基板22；并且将含有量子点材料的配向溶液印刷S2到阵列基板21面向对合基板22的一侧(在图2中示意性地，上侧)上。如本领域技术人员所公知的，配向溶液优选地需要在配制完成之后尽快使用，以避免由于放置时间过长而导致配向溶液中的量子点材料因团聚而发生沉淀的现象。由此可见，印刷到阵列基板21的上侧的配向溶液可以形成如图2中所示的配向膜24。当然，通过以上描述可知，此时的配向膜24仅仅呈现像水膜那样的近乎液体形式。在此之后，用于制造量子点显示器件20的方法100还可以包括：移除S3印刷到阵列基板21面向对合基板22的一侧(在图2中示意性地，上侧)上的配向溶液(即，配向膜24)中的溶剂；以及在移除溶剂之后，加热S4阵列基板21。如上文所述，包含量子点的配向溶剂在印刷之后像水膜那样形成于阵列基板21上，当然这在实际中是容易出问题的。鉴于此，本公开的实施例的制造方法100还包括对阵列基板21的加热过程。这样的加热S4过程起到两个方面的作用：一方面，通过加热使印刷在阵列基板21上的配向溶液固化成为具有固定形状因子的配向膜24；另一方面，借助于加热使配向膜中的配向材料(示例性地，聚酰亚胺)亚胺化，从而实现配向功能。进一步地，根据本公开的实 施例的制造方法100还可以包括：在阵列基板21背离对合基板22的一侧(在图2中示意性地，下侧)上提供S5背光源23。如本领域技术人员所容易理解的，量子点材料的发光需要借助于其它光源的激发而实现。因此，根据本公开的实施例，用于制造量子点显示器件20的方法100还包括以上所述的背光源23的提供步骤。
通过本公开的实施例的上述制造方法，使量子点材料内置于配向膜中，而同时配向膜又直接形成在阵列基板的表面上。以这样的方式，有效地阻止了量子点材料与空气以及可能的液晶材料的直接接触，从而避免了量子点材料可能受到的污染，并且确保了它的有效性。在这样的情况下，包含量子点材料的配向膜内置在显示面板的内部，即形成在阵列基板面向对合基板的一侧上，从而避免了针对量子点材料的特殊封装要求，并且保证了量子点材料的相对独立性。
根据具体实施例，配向溶液的印刷S2可以通过凸版印刷而完成。下面将参照图1和3详细地描述这样的凸版印刷过程的一个具体示例，其中图3是示出了在根据本公开的实施例的凸版印刷过程中使用的凸版印刷装置30的结构示意图。具体地，参照图3，这样的凸版印刷过程可以包括以下步骤：首先，通过分配器31将配向溶液滴落S21到网纹辊33上；并且然后，通过网纹辊33和安装有印刷凸版35的印刷辊34的旋转而将滴落到网纹辊33上的配向溶液转移S23到印刷凸版35上。在以上过程期间，印刷辊34和网纹辊33的旋转方向相反，参见如图3中所示的顺时针和逆时针旋转方向。另外，印刷凸版35在随印刷辊34而旋转的过程中至少部分地与网纹辊33接触，并且与之相互挤压，从而使配向溶液能够转移到印刷凸版35上。而且，如本领域技术人员所公知的，网纹辊33和印刷辊34的线速度大小之比一般控制在一定的范围内。作为示例，这样的线速度大小之比可以保持为1.05～0.95。如本领域技术人员所容易领会到的，通过以上两个辊(网纹辊33和印刷辊34)的相对旋转，实现了配向溶液的转移。进一步地，凸版印刷过程还可以包括：通过印刷凸版35的旋转(在图3中示意性地，顺时针旋转)和阵列基板37的平移(在图3中示意性地，向左平移)而将转移到印刷凸版35上的配向溶液转印S24到阵列基板37上。在这样的转印S24过程期间，印刷凸版35与阵列基板37始终保持外切。而且，如本领域技术人员所公知的，在转印过程中，阵列基板37 的平移线速度一般需要与印刷辊34的旋转线速度保持相同。当然，作为一种具体实践，在以上所述的转印S24过程之前，可以首先将阵列基板37放置在印刷台面36上，并且然后使它们二者36，37一起向左平移。这样，通过与印刷辊34(以及其上的印刷凸版35)的对应旋转(在图3中示意性地，顺时针旋转)结合，完成了配向溶液的转印S24。
相比于常见的平版印刷技术，通过本公开的实施例提供的凸版印刷过程，使得含有量子点材料的配向溶液能够更加均匀地转印到阵列基板上。而且，这样的凸版印刷过程还有助于阻止量子点材料出现团聚等劣化现象，从而提高量子点材料的有效性，并且保证量子点显示器件的显示质量。
根据另外的具体实施例，由本公开的实施例所提供的用于制造量子点显示器件的方法还可以包括提供液晶盒的过程。具体地，参照图4，其是示出了根据本公开的实施例的另一量子点显示器件的示意性截面视图。在图4中示出的量子点显示器件40与在图2中示出的量子点显示器件20大体相同，即包括阵列基板41、对合基板42和背光源43。但是，此时在图4中，还存在夹于阵列基板41和对合基板42之间的液晶盒45，而且这样的液晶盒45和配向膜44具有对应的图案分布。另外，在相邻的液晶盒45图案之间，以及在相邻的配向膜44图案之间，还存在相应的空隙区。通过将印刷凸版35的印刷图案设置成对应于液晶盒25的图案，并且在印刷凸版35的印刷图案之间设置空隙区，可以获得这样的量子点显示器件40。作为示例，进一步参照图3，当印刷辊34上的印刷凸版35和阵列基板37相互接触时，在压入量为0.1mm±0.05mm的压力下(具体地，辊的压线(nip)维持在10±2mm，而版的压线维持在15±2mm)，通过印刷凸版35的印刷图案将配向溶液转印成在阵列基板37上具有对应的图案分布。
具体地，通过以上所述具体印刷过程S21、S23和S24可见，印刷凸版的印刷图案直接决定着最终印刷在阵列基板上的配向膜的图案分布。也就是说，如图4中所示的配向膜的图案分布直接反映着印刷凸版的印刷图案分布。因此，通过印刷凸版的印刷图案与液晶盒的图案的对应关系，保证了针对每一个液晶盒都相应地存在一个配向膜部分，即对应的一个量子点材料部分。另外，印刷凸版的印刷图案之间的空隙区还允许各个液晶盒之间的相对独立性，从而防止显示串扰等不利 效果。
根据另外的具体实施例，配向溶液的凸版印刷过程还可以包括：在将滴落到网纹辊33上的配向溶液转移到印刷凸版35上之前，利用刮刀32对滴落到网纹辊33上的配向溶液进行抹平处理。借助于这样的刮刀32，滴落到网纹辊33上的配向溶液能够分布得更加均匀，从而有利于向印刷凸版35上的进一步均匀转印，以及量子点显示器件的显示效果的提升。
根据具体实施例，配向溶液中的溶剂的移除S3可以包括：通过冷冻干燥处理的移除。冷冻干燥还可以称为升华干燥，其是指将含水的物料冷冻到冰点以下，使水转变为冰，并且然后在较高真空下将冰再转变为蒸汽从而去除的干燥方法。具体地，通过升华作用而生成的水蒸气可以借助于冷凝器而去除。参照图1，进一步详细地描述这样的冷冻干燥处理的具体实现。首先，将印刷有配向溶液的阵列基板放置S31到冷冻干燥设备中；其次，在冷冻干燥设备中冷冻S32阵列基板；在冷冻之后，对冷冻干燥设备抽真空S33；最后，在抽真空后的冷冻干燥设备中加热S34阵列基板。作为示例，可以使阵列基板快速冷冻到零下40℃至零下50℃，并且然后开始抽真空，以便利用升华作用而移除多余的溶剂以及可能的水分。在这样的冷冻干燥过程中，可以通过高真空度下的升华作用而移除溶剂。相比于传统的溶剂挥发技术，根据这一具体实施例的冷冻干燥处理可以降低量子点材料的表面活性，从而尽可能地避免量子点材料在工艺处理期间出现团聚等劣化现象。
根据具体实施例，在移除溶剂之后对阵列基板的加热S4包括微波加热。微波加热还可以称为微波烧结，其是基于物料与电磁场的相互作用而产生加热效应的原理。当材料的基本细微结构与特定频率的电磁场耦合时，内部微观粒子将响应于电磁场而震荡，从而使得热运动加剧。进一步地，当材料发生介质损耗时，将会吸收微波能，从而转换成热能。参照图1，这样的微波加热过程具体地可以包括：将移除溶剂后的阵列基板放置S41到微波加热设备中；以及通过微波过程加热S42阵列基板。进一步地，微波加热过程还可以包括：在通过微波过程加热阵列基板之后，使阵列基板保持S43在恒定的温度下。考虑到配向材料的配向功能，一般需要对其进行加热处理。然而，由于此时的配向膜中还包含量子点材料，而量子点材料较大的表面能致使其不易 经历较长时间的加热，所以传统的加热方式必然将容易导致量子点材料团聚等劣化现象。相比于常规的电阻性加热方式，根据本公开的实施例的微波加热技术升温更快、加热及保温时间更短并且受热更为均匀。
根据具体实施例，以上所使用的配向溶液中的配向材料可以包括聚酰亚胺(PI)材料。当然，本公开不仅仅限于此。进一步地，在配向溶液中使用的以上溶剂可以包括有机溶剂。具体地，这样的有机溶剂可以包括芳香族溶剂苯。同样地，本领域技术人员能够根据具体实践需要以及对应的配向材料而选择适当的有机溶剂，本公开在这一方面不做限制。
根据另一方面，本公开的实施例还提供了一种量子点显示器件。具体地，可以参照图2和4所示的量子点显示器件。这样的量子点显示器件可以通过以上任一个实施例所述的用于制造量子点显示器件的方法而制得。
本公开的实施例公开了用于制造量子点显示器件的方法以及对应的量子点显示器件。在针对量子点显示器件的制造方法中，量子点材料首先溶解到配向溶液中。在通过配向溶液的印刷过程而在阵列基板上形成配向膜之后，量子点材料直接包含在这样的配向膜中。以这样的方式，量子点材料与空气以及可能的液晶材料的直接接触得到有效地阻止，从而避免了对它的污染，并且确保了它的有效性。另外，由于包含量子点材料的配向膜直接形成在阵列基板的表面上，所以对应地，量子点材料就完全内置于显示面板内部。因此，避免了针对量子点材料的特殊封装要求，并且保证了量子点材料的相对独立性以及光致发光效果。总之，借助于上述制造过程，极大地提升了所制得的量子点显示器件的显示效果，降低了相关的制造成本，并且简化了制造工艺和封装过程。
需要指出的是，在本公开的具体描述中，诸如“中心”、“上”、“下”、“前”、“后”、“左”、“右”、“竖直”、“水平”、“顶”、“底”、“内”、“外”等等之类的指示方位或位置关系的术语是基于附图所示的方位或位置关系，其目的仅仅是便于简化本公开的描述，而不是暗示着所涉及的装置或元件必须具有的特定方位，或者必须以特定的方位构造和操作。因此，所有这样的术语以及具有 等同含义的术语都不应理解为对本公开的限制。
还需要指出的是，在本公开的具体描述中，诸如“第一”、“第二”等等之类的术语仅仅用于描述性目的，而不应理解为暗示着相对重要性，或者隐含着所指示的技术特征的数量。由此，借助于“第一”、“第二”等术语限定的特征可以明确地或者隐含地包括一个或者多个这样的特征。除非另有说明，否则在本公开的描述中，“多个”的含义是两个或两个以上。
需要进一步说明的是，在本公开的描述中，除非另有明确的规定和限定，否则诸如“安装”、“相连”、“连接”等等之类的术语应当以广义含义来理解。例如，它可以是固定连接，可拆卸连接，或者甚至是一体式连接。同样地，它可以是直接相连，通过中间媒介的间接相连，或者甚至可以是两个元件内部的连通。对于本领域的普通技术人员而言，可以依照具体情况而理解到上述术语在本公开中的具体含义。
还需要指明的是，在本说明书的描述中，具体特征、结构、材料或者特点可以在任何的一个或多个实施例或示例中以任何合适的方式组合。
以上公开内容仅仅是本公开的具体实施方式，但是本公开的保护范围并不局限于此。任何熟悉本技术领域的技术人员在本公开揭露的技术范围内可以容易地设想到各种变化或替换，其都应当涵盖在本公开的保护范围之内。因此，本公开的保护范围应以以下权利要求的保护范围为准。

Claims (15)

  1. 一种用于制造量子点显示器件的方法，包括：
    提供彼此相对的阵列基板和对合基板；
    将含有量子点材料的配向溶液印刷到所述阵列基板面向所述对合基板的一侧上；
    移除印刷到所述阵列基板面向所述对合基板的一侧上的所述配向溶液中的溶剂；
    在移除所述溶剂之后，加热所述阵列基板；以及
    在所述阵列基板背离所述对合基板的一侧上提供背光源。
  2. 根据权利要求1所述的方法，其中，所述印刷包括：凸版印刷。
  3. 根据权利要求2所述的方法，其中，所述凸版印刷包括：
    通过分配器将所述配向溶液滴落到网纹辊上；
    通过所述网纹辊和安装有印刷凸版的印刷辊的旋转而将滴落到所述网纹辊上的所述配向溶液转移到所述印刷凸版上，其中所述印刷辊和所述网纹辊的旋转方向相反并且线速度之比在一定范围内，并且其中所述印刷凸版在随所述印刷辊而旋转的过程中至少部分地与所述网纹辊接触和挤压；以及
    通过所述印刷凸版的旋转和所述阵列基板的平移而将转移到所述印刷凸版上的所述配向溶液转印到所述阵列基板上，其中在转印过程中，所述印刷凸版与所述阵列基板外切并且线速度相等。
  4. 根据权利要求3所述的方法，其中，所述印刷辊和所述网纹辊的旋转线速度之比为1.05～0.09。
  5. 根据权利要求3所述的方法，还包括：
    提供夹在所述阵列基板和所述对合基板之间的液晶盒，其中所述印刷凸版的印刷图案对应于所述液晶盒的图案。
  6. 根据权利要求5所述的方法，其中，所述印刷凸版的印刷图案之间还存在空隙区。
  7. 根据权利要求3所述的方法，其中，所述凸版印刷还包括：
    在将滴落到所述网纹辊上的所述配向溶液转移到所述印刷凸版上之前，利用刮刀对滴落到所述网纹辊上的所述配向溶液进行抹平处理。
  8. 根据权利要求1所述的方法，其中，所述移除包括：通过冷冻 干燥处理的移除。
  9. 根据权利要求8所述的方法，其中，所述冷冻干燥处理包括：
    将印刷有所述配向溶液的阵列基板放置到冷冻干燥设备中；
    在所述冷冻干燥设备中冷冻所述阵列基板；
    在冷冻之后，对所述冷冻干燥设备抽真空；以及
    在抽真空后的所述冷冻干燥设备中加热所述阵列基板。
  10. 根据权利要求1所述的方法，其中，所述加热包括：微波加热。
  11. 根据权利要求10所述的方法，其中，所述微波加热包括：
    将移除所述溶剂后的所述阵列基板放置到微波加热设备中；以及
    通过微波过程加热所述阵列基板。
  12. 根据权利要求11所述的方法，其中，所述微波加热还包括：
    在通过微波过程加热所述阵列基板之后，使所述阵列基板保持在恒定的温度下。
  13. 根据权利要求1所述的方法，其中，所述配向溶液中的配向材料包括：聚酰亚胺材料。
  14. 根据权利要求1所述的方法，其中，所述溶剂包括：有机溶剂。
  15. 一种量子点显示器件，其中，所述量子点显示器件通过权利要求1-14中任一项所述的方法制得。
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