WO2018030410A1 - Film de polyimide, stratifié, et matériau de surface pour affichage - Google Patents

Film de polyimide, stratifié, et matériau de surface pour affichage Download PDF

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Publication number
WO2018030410A1
WO2018030410A1 PCT/JP2017/028783 JP2017028783W WO2018030410A1 WO 2018030410 A1 WO2018030410 A1 WO 2018030410A1 JP 2017028783 W JP2017028783 W JP 2017028783W WO 2018030410 A1 WO2018030410 A1 WO 2018030410A1
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Prior art keywords
polyimide
residue
group
film
polyimide film
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PCT/JP2017/028783
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English (en)
Japanese (ja)
Inventor
勝哉 坂寄
滉大 岡田
綾子 古瀬
敬輔 脇田
小林　義弘
綾 高尾
前田　高徳
奈保美 金澤
太田　貴之
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大日本印刷株式会社
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Priority claimed from JP2017152198A external-priority patent/JP6939225B2/ja
Application filed by 大日本印刷株式会社 filed Critical 大日本印刷株式会社
Priority to CN201780062133.3A priority Critical patent/CN109843989A/zh
Priority to KR1020197006183A priority patent/KR102434812B1/ko
Priority to US16/323,485 priority patent/US11566108B2/en
Publication of WO2018030410A1 publication Critical patent/WO2018030410A1/fr

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00—Layered products comprising a layer of synthetic resin
    • B32B27/30—Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00—Layered products comprising a layer of synthetic resin
    • B32B27/34—Layered products comprising a layer of synthetic resin comprising polyamides
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00—Layered products comprising a layer of synthetic resin
    • B32B27/38—Layered products comprising a layer of synthetic resin comprising epoxy resins
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18—Manufacture of films or sheets

Definitions

  • Embodiment of this indication is related with a polyimide film, a layered product, and a surface material for displays.
  • a polyimide resin is a highly heat-resistant resin obtained by subjecting a polyamic acid obtained by a condensation reaction of an aromatic tetracarboxylic acid anhydride and an aromatic diamine to a dehydration ring-closing reaction.
  • polyimide resins generally show yellow or brown coloration, it has been difficult to use them in fields that require transparency, such as display applications and optical applications. Therefore, it has been studied to apply a polyimide having improved transparency to a display member.
  • Patent Document 1 discloses 1,2,4,5-cyclohexanetetracarboxylic acid, 1,2,4,5-cyclohexanetetracarboxylic acid dicarboxylic acid as polyimide resins having high heat resistance, high transparency, and low water absorption.
  • a polyimide resin obtained by reacting with an imino forming compound is disclosed, and is described as being suitable for a substrate material such as a flat panel display or a mobile phone device.
  • Patent Document 2 includes a unit structure derived from aromatic dianhydride and aromatic diamine, and includes an additive for improving tear strength, or a functional group selected from the group consisting of a hexafluoro group, a sulfone group, and an oxy group.
  • a transparent polyimide film is further disclosed that further includes a unit structure derived from the monomer it has.
  • Patent Document 3 discloses a polyimide film having a peak peak in a tan ⁇ curve, which is a value obtained by dividing a loss elastic modulus by a storage elastic modulus, as a polyimide film having excellent transparency and heat resistance. ing.
  • Patent Document 4 obtains a polyimide film that is colorless and transparent as a polyimide film used for a substrate of a flexible device, has a low residual stress generated between the inorganic film, and has excellent mechanical and thermal properties.
  • a polyimide film obtained by imidizing a polyimide precursor using a specific fluorine-based aromatic diamine and a silicone compound having a siloxane skeleton having 3 to 200 silicon atoms as a monomer component is disclosed.
  • a polyimide film with an inorganic film (SiN film) is formed using the polyimide precursor, cracks and peeling are not observed after a bending test in which bending is repeated 10 times ( ⁇ ). Observed ( ⁇ ).
  • Patent Document 5 describes that a polyimide having a low refractive index and high folding resistance contains silicone diamine having 2 to 21 silicon atoms in an amount of 10% by weight or more of the diamine raw material weight.
  • the present disclosure has been made in view of the above problems, and a main object thereof is to provide a resin film in which a decrease in surface hardness is suppressed while improving bending resistance. Moreover, this indication aims at providing the surface material for displays which is the laminated body which has the said resin film, and the said resin film or the said laminated body.
  • 1 embodiment of this indication contains the polyimide which has a structure denoted by the following general formula (1),
  • the total light transmittance measured in accordance with JIS K7361-1 is 85% or more
  • the yellowness calculated in accordance with JIS K7373-2006 is 30 or less, Having a glass transition temperature in a temperature range of 150 ° C. or more and 400 ° C. or less
  • R 1 represents a tetravalent group which is a tetracarboxylic acid residue having an aromatic ring or an aliphatic ring
  • R 2 represents a divalent group which is a diamine residue, 50 mol% 10 mol% or more of the total amount of R 2 or less is a main one silicon atom in a chain or two with diamine residue, at least 50 mol% 90 mol% or less, having no silicon atom
  • N represents the number of repeating units.
  • a polyimide film having a birefringence in the thickness direction at a wavelength of 590 nm of 0.020 or less is provided.
  • a polyimide film having an inner angle measured by the test of 120 ° or more is provided.
  • Static bending test method A polyimide film test piece cut out to 15 mm ⁇ 40 mm is bent at a position of half of the long side, and both ends of the long side of the test piece sandwich a metal piece (100 mm ⁇ 30 mm ⁇ 6 mm) having a thickness of 6 mm from the upper and lower surfaces. Placed between glass plates (100 mm x 100 mm x 0.7 mm) from above and below with the tape fixed so that the overlap between the top and bottom surfaces of the test piece and the metal piece is 10 mm each.
  • the test piece is fixed in a bent state with an inner diameter of 6 mm. At that time, a dummy test piece is sandwiched between the metal piece and the glass plate where there is no test piece, and is fixed with tape so that the glass plate is parallel.
  • the test piece fixed in a bent state in this way was allowed to stand for 24 hours in an environment of 60 ⁇ 2 ° C. and 93 ⁇ 2% relative humidity (RH), and then the glass plate and the fixing tape were removed, Release the force on the specimen. Thereafter, one end of the test piece is fixed, and the internal angle of the test piece 30 minutes after the force applied to the test piece is released is measured.
  • the polyimide having the structure represented by the general formula (1) includes an aromatic ring, and (i) a fluorine atom, (ii) an aliphatic ring, and (iii) Provided is a polyimide film comprising at least one selected from the group consisting of aromatic rings connected to each other by a sulfonyl group or an alkylene group optionally substituted with fluorine.
  • R 1 in the general formula (1) is a cyclohexanetetracarboxylic dianhydride residue, cyclopentanetetra Carboxylic dianhydride residue, dicyclohexane-3,4,3 ′, 4′-tetracarboxylic dianhydride residue, cyclobutanetetracarboxylic dianhydride residue, pyromellitic dianhydride residue, 3 , 3 ′, 4,4′-biphenyltetracarboxylic dianhydride residue, 2,2 ′, 3,3′-biphenyltetracarboxylic dianhydride residue, 4,4 ′-(hexafluoroisopropylidene) Diphthalic anhydride residue, 3,4 '-(hexafluoroisopropylidene) diphthalic anhydride residue, 3,3'-(hexafluoroisopropylidene) diphthalic anhydride residue, 3,3'-(hexafluorois
  • an aromatic ring or an aliphatic group having no silicon atom in R 2 in the general formula (1) A diamine residue having a ring is trans-cyclohexanediamine residue, trans-1,4-bismethylenecyclohexanediamine residue, 4,4′-diaminodiphenylsulfone residue, 3,4′-diaminodiphenylsulfone residue, A group consisting of a 2,2-bis (4-aminophenyl) propane residue, a 2,2-bis (4-aminophenyl) hexafluoropropane residue, and a divalent group represented by the following general formula (2)
  • the polyimide film which is at least 1 sort (s) of bivalent group chosen from these is provided.
  • R 3 and R 4 each independently represents a hydrogen atom, an alkyl group, or a perfluoroalkyl group.
  • One embodiment of the present disclosure is a laminate in which the polyimide film of the one embodiment of the present disclosure and a hard coat layer containing at least one polymer of a radical polymerizable compound and a cationic polymerizable compound are adjacent to each other. Provide the body.
  • the radical polymerizable compound is a compound having two or more (meth) acryloyl groups in one molecule
  • the cationic polymerizable compound includes at least one of an epoxy group and an oxetanyl group.
  • a laminate which is a compound having two or more molecules.
  • a polyimide film according to one embodiment of the present disclosure or a surface material for display which is a laminate according to one embodiment of the present disclosure is provided.
  • a polyimide film according to one embodiment of the present disclosure or a surface material for a flexible display which is a laminate according to one embodiment of the present disclosure is provided.
  • this indication can provide the surface material for displays which is the laminated body which has the said resin film, and the said resin film or the said laminated body.
  • the polyimide film of one embodiment of the present disclosure contains a polyimide having a structure represented by the following general formula (1),
  • the total light transmittance measured in accordance with JIS K7361-1 is 85% or more
  • the yellowness calculated in accordance with JIS K7373-2006 is 30 or less, Having a glass transition temperature in a temperature range of 150 ° C. or more and 400 ° C. or less,
  • a 15 mm ⁇ 40 mm test piece is compliant with JIS K7127
  • the tensile modulus at 25 ° C. measured at a pulling speed of 10 mm / min and a distance between chucks of 20 mm is 1.8 GPa or more.
  • R 1 represents a tetravalent group which is a tetracarboxylic acid residue having an aromatic ring or an aliphatic ring
  • R 2 represents a divalent group which is a diamine residue, 50 mol% 10 mol% or more of the total amount of R 2 or less is a main one silicon atom in a chain or two with diamine residue, at least 50 mol% 90 mol% or less, having no silicon atom
  • N represents the number of repeating units.
  • the polyimide contained in the polyimide film has a tetracarboxylic acid residue having an aromatic ring or an aliphatic ring, and a diamine residue having one or two silicon atoms in the main chain Having a specific structure containing 10 mol% or more and 50 mol% or less of a residue and containing 50 mol% or more and 90 mol% or less of a diamine residue having no silicon atom and having an aromatic ring or an aliphatic ring;
  • the polyimide film having the total light transmittance, the specific yellowness, the specific glass transition temperature, and the specific tensile elastic modulus improves the bending resistance and has a sufficient surface hardness as a protective film.
  • a resin film can be provided. About this reason, it estimates as follows.
  • Polyimide is known to have excellent heat resistance due to its chemical structure.
  • Polyimide film is also known to form an ordered structure with a constant arrangement of molecular chains inside, which makes it possible to restore the flatness and the bent state at a constant cycle at room temperature. It is considered that good results are shown in FIG.
  • the conventional resin film using transparent polyimide even if it shows a good result in a test in which the flat state and the bent state are repeated at a constant cycle, if the bent state continues for a long time, the crease will be Therefore, there is a problem that it is difficult to return to a flat surface and inferior in static bending resistance.
  • E Elastic modulus y: Maximum value of distance from neutral axis (axis that becomes the center when bending) (in FIG. 1, half of film thickness d) ⁇ : curvature (test width) d: Film thickness
  • the maximum stress ( ⁇ ) is proportional to the elastic modulus and film thickness of the film and inversely proportional to the value obtained by subtracting the film thickness from the curvature, as shown in the equation (1). Therefore, when the elastic modulus of the film is increased, the stress applied to the film at the time of bending increases, which causes deformation. Also in the resin film, when the elastic modulus is increased, the restoring property after the bent state is deteriorated, and the bending resistance tends to be insufficient. On the other hand, the surface hardness tends to be improved by increasing the elastic modulus of the resin film. Actually, as shown in Comparative Example 3 to be described later, the polyimide film having a large elastic modulus has improved surface hardness but deteriorated bending resistance.
  • the bending resistance and surface hardness of the resin film are contradictory properties.
  • Substrates and surface materials for flexible displays are required not only to withstand repeated bending, but also to prevent damage to the surface, as well as to prevent damage to the touch sensor and display panel located underneath.
  • the surface material is made of a material having a higher elastic modulus, such as glass, the impact from the surface of the display can be diffused in the surface direction and the local impact can be reduced. As a display panel can be prevented from being damaged.
  • a higher elastic modulus of the surface material works more advantageously.
  • the modulus of elasticity when the modulus of elasticity is low, the surface material itself may be deformed, so that the impact can be mitigated. It is easily damaged.
  • the introduction of a silicone component containing three or more silicon atoms has a glass transition temperature below the freezing point and the residual stress generated between the inorganic film is reduced.
  • the polyimide film introduced with a silicone component containing three or more silicon atoms has a low glass transition temperature, so that the elastic modulus is insufficient at room temperature, and the surface hardness is low. There is a problem that the film is easily damaged or an impact is transmitted to the light-emitting panel or the circuit, and the function as a protective film is insufficient.
  • the polyimide film described in Patent Document 5 is described as having high folding resistance.
  • the polyimide film introduced with silicone diamine (containing about 9 to 10 silicon atoms) corresponding to the example of Patent Document 5 has insufficient elasticity at room temperature, There was a problem that the surface hardness was low, the film was easily damaged, and the function as a protective film was insufficient. From the above, there has been a demand for a resin film that has both bending resistance and sufficient surface hardness as a protective film. However, as described above, it is considered that the bending resistance and the surface hardness of the resin film are contradictory properties, and it is difficult to maintain the surface hardness while improving the bending resistance. The stress generated on the film surface can be relaxed by introducing a silicone component, but if the silicone with a high molecular weight is used, the overall film becomes too flexible and stress balance is achieved. Was difficult.
  • the present inventors introduced a specific amount of a flexible molecular skeleton having a small molecular weight having one or two silicon atoms in the main chain between the molecular skeletons containing an aromatic ring or an aliphatic ring.
  • polyimide When polyimide was used, it discovered that the polyimide film which can adjust a glass transition temperature was maintainable, maintaining the elasticity modulus derived from the molecular skeleton containing an aromatic ring or an aliphatic ring.
  • the polyimide film of the present disclosure can be used as a protective film by introducing a specific amount of a flexible molecular skeleton having one or two silicon atoms in the main chain between molecular skeletons containing an aromatic ring or an aliphatic ring. While maintaining sufficient surface hardness, the bending resistance is improved, as shown by the results of the dynamic bending test and static bending test in the examples described later, after the film was repeatedly bent Not only the resilience, that is, the dynamic bending resistance, but also the restorability after the film is bent for a long time, that is, the static bending resistance is improved.
  • the bending resistance is improved in this way because a specific amount of the flexible molecular skeleton having a short specific main chain is introduced into the rigid molecular skeleton, thereby enabling stress relaxation by molecular motion. This is presumably because the stress applied to the film during bending can be reduced. In addition, it is limited to diamine residues having one or two silicon atoms so that the flexible part of the main chain is shortened, and a specific amount of a flexible molecular skeleton having a short main chain is introduced into the rigid molecular skeleton.
  • the polyimide film of the present disclosure can suppress a decrease in elastic modulus at room temperature and can maintain sufficient surface hardness as a protective film even at room temperature.
  • the polyimide film which concerns on this indication contains the polyimide which has a structure represented by the said General formula (1), and has the said specific characteristic. As long as the effects of the present disclosure are not impaired, other components may be contained or other configurations may be included.
  • Polyimide is obtained by reacting a tetracarboxylic acid component and a diamine component. It is preferable to obtain imidization by obtaining a polyamic acid by polymerization of a tetracarboxylic acid component and a diamine component. The imidization may be performed by thermal imidization or chemical imidization. Moreover, it can also manufacture by the method which used thermal imidation and chemical imidization together.
  • the polyimide used in the present disclosure contains a polyimide having a structure represented by the following general formula (1).
  • R 1 represents a tetravalent group which is a tetracarboxylic acid residue having an aromatic ring or an aliphatic ring
  • R 2 represents a divalent group which is a diamine residue, 50 mol% 10 mol% or more of the total amount of R 2 or less is a main one silicon atom in a chain or two with diamine residue, at least 50 mol% 90 mol% or less, having no silicon atom
  • N represents the number of repeating units.
  • the tetracarboxylic acid residue means a residue obtained by removing four carboxyl groups from tetracarboxylic acid, and represents the same structure as a residue obtained by removing acid dianhydride structure from tetracarboxylic dianhydride.
  • a diamine residue means the residue remove
  • the tetracarboxylic acid residue in R 1 of the general formula (1) is a residue obtained by removing an acid dianhydride structure from a tetracarboxylic dianhydride having an aromatic ring, or a tetracarboxylic acid having an aliphatic ring. It can be a residue obtained by removing the acid dianhydride structure from the dianhydride.
  • the tetracarboxylic dianhydride having an aromatic ring include pyromellitic dianhydride, 3,3 ′, 4,4′-benzophenone tetracarboxylic dianhydride, 2,2 ′, 3,3 ′.
  • tetracarboxylic dianhydride having an aliphatic ring examples include cyclohexanetetracarboxylic dianhydride, cyclopentanetetracarboxylic dianhydride, dicyclohexane-3,4,3 ′, 4′-tetracarboxylic acid dianhydride.
  • An anhydride, cyclobutane tetracarboxylic dianhydride, etc. are mentioned. These may be used alone or in combination of two or more.
  • the diamine residue having one or two silicon atoms in the main chain is the residue obtained by removing two amino groups from the diamine having one or two silicon atoms in the main chain. It can be based.
  • the polyimide film of the present disclosure introduces a specific amount of a flexible molecular skeleton having one or two silicon atoms in the main chain between molecular skeletons containing an aromatic ring or an aliphatic ring as a main component, As described above, not only the compatibility between the bending resistance and the surface hardness is improved, but also the orientation is easily suppressed, and the birefringence is easily reduced as described above.
  • diamine having one silicon atom in the main chain examples include diamines represented by the following general formula (A). Moreover, as a diamine which has two silicon atoms in a principal chain, the diamine represented by the following general formula (B) is mentioned, for example.
  • each L is independently a direct bond or —O— bond
  • each R 10 may independently have a substituent
  • oxygen represents a monovalent hydrocarbon group having 1 to 20 carbon atoms which may contain an atom or a nitrogen atom
  • each R 11 may independently have a substituent, and represents an oxygen atom or a nitrogen atom.
  • Examples of the monovalent hydrocarbon group represented by R 10 include an alkyl group having 1 to 20 carbon atoms, an aryl group, and combinations thereof.
  • the alkyl group may be linear, branched or cyclic, and may be linear or a combination of branched and cyclic.
  • the alkyl group having 1 to 20 carbon atoms is preferably an alkyl group having 1 to 10 carbon atoms. Specifically, a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, Examples thereof include t-butyl group, pentyl group, hexyl group and the like.
  • the cyclic alkyl group is preferably a cycloalkyl group having 3 to 10 carbon atoms, and specific examples include a cyclopentyl group and a cyclohexyl group.
  • the aryl group is preferably an aryl group having 6 to 12 carbon atoms, and specific examples include a phenyl group, a tolyl group, and a naphthyl group.
  • the monovalent hydrocarbon group represented by R 10 may be an aralkyl group, and examples thereof include a benzyl group, a phenylethyl group, and a phenylpropyl group.
  • Examples of the hydrocarbon group that may contain an oxygen atom or a nitrogen atom include an ether bond, a carbonyl bond, an ester bond, an amide bond, and an imino bond between a divalent hydrocarbon group described later and the monovalent hydrocarbon group. And a group bonded with at least one bond (—NH—).
  • the substituent that the monovalent hydrocarbon group represented by R 10 may have is not particularly limited as long as the effects of the present disclosure are not impaired. For example, a halogen atom such as a fluorine atom or a chlorine atom And a hydroxyl group.
  • the monovalent hydrocarbon group represented by R 10 is an alkyl group having 1 to 3 carbon atoms or an aryl group having 6 to 10 carbon atoms from the viewpoint of compatibility between improvement in bending resistance and surface hardness.
  • the alkyl group having 1 to 3 carbon atoms is more preferably a methyl group
  • the aryl group having 6 to 10 carbon atoms is more preferably a phenyl group.
  • Examples of the divalent hydrocarbon group represented by R 11 include an alkylene group having 1 to 20 carbon atoms, an arylene group, and a combination thereof.
  • the alkylene group may be linear, branched or cyclic, and may be linear or a combination of branched and cyclic.
  • the alkylene group having 1 to 20 carbon atoms is preferably an alkylene group having 1 to 10 carbon atoms.
  • a linear chain such as a methylene group, an ethylene group, various propylene groups, various butylene groups, or a cyclohexylene group.
  • a combination of a linear or branched alkylene group and a cyclic alkylene group are examples of the divalent hydrocarbon group represented by R 11.
  • the arylene group is preferably an arylene group having 6 to 12 carbon atoms, and examples of the arylene group include a phenylene group, a biphenylene group, a naphthylene group, and the like. May be.
  • the divalent hydrocarbon group which may contain an oxygen atom or a nitrogen atom the divalent hydrocarbon groups may be ether bonds, carbonyl bonds, ester bonds, amide bonds, and imino bonds (—NH—).
  • a group bonded with at least one is exemplified.
  • the substituent that the divalent hydrocarbon group represented by R 11 may have is the same as the substituent that the monovalent hydrocarbon group represented by R 10 may have. Good.
  • the divalent hydrocarbon group represented by R 11 is an alkylene group having 1 to 6 carbon atoms or an arylene group having 6 to 10 carbon atoms from the viewpoint of compatibility between improvement in bending resistance and surface hardness. Preferably, it is more preferably an alkylene group having 2 to 4 carbon atoms.
  • the molecular weight of the diamine residue having one or two silicon atoms in the main chain is preferably 1000 or less, more preferably 800 or less, More preferably, it is 500 or less, and particularly preferably 300 or less.
  • the diamine residues having one or two silicon atoms in the main chain can be used alone or in combination of two or more.
  • the diamine residue having no aromatic ring and having no silicon atom is a residue obtained by removing two amino groups from a diamine having no silicon atom and having an aromatic ring; can do.
  • the diamine having an aromatic ring include p-phenylene diamine, m-phenylene diamine, o-phenylene diamine, 3,3′-diaminodiphenyl ether, 3,4′-diaminodiphenyl ether, and 4,4′-diaminodiphenyl ether.
  • the diamine residue which does not have a silicon atom and has an aliphatic ring in R 2 of the general formula (1) can be a residue obtained by removing two amino groups from a diamine having an aliphatic ring.
  • the diamine having an aliphatic ring include trans-cyclohexanediamine, trans-1,4-bismethylenecyclohexanediamine, 2,6-bis (aminomethyl) bicyclo [2,2,1] heptane, 2,5 -Bis (aminomethyl) bicyclo [2,2,1] heptane and the like. These may be used alone or in combination of two or more.
  • R 2 of the general formula (1) 10 mol% or more and 50 mol% or less of the total amount of R 2 is a diamine residue having one or two silicon atoms in the main chain.
  • 50 mol% or more and 90 mol% or less of the total amount of R 2 is a diamine residue having no silicon atom and having an aromatic ring or an aliphatic ring, the bending resistance is improved, and the protective film Can have a sufficient surface hardness.
  • R 2 in the general formula (1) has one silicon atom in the main chain from the viewpoint of improving the adhesion with an organic film when producing a laminate with an organic film such as a hard coat layer described later.
  • the diamine residue which has two is 15 mol% or more of the total amount of R2, and also it is preferable that it is 20 mol% or more.
  • R 2 in the general formula (1) is such that the diamine residue having one or two silicon atoms in the main chain is 45 mol% of the total amount of R 2 from the viewpoint of improving the surface hardness and light transmittance. Or less, more preferably 40 mol% or less.
  • mol% 10 mol% or more of the total amount of R 2 or less a diamine residue having one or two silicon atoms in the main chain, 90 mol% 50 mol% or more of the total amount of R 2 or less, A diamine having one or two silicon atoms in the main chain in R 2 of the general formula (1) as long as it is a diamine residue having no silicon atom and having an aromatic ring or an aliphatic ring It does not preclude inclusion of other diamine residues that are different from diamine residues having no residue and no silicon atom and having an aromatic ring or an aliphatic ring.
  • the other diamine residue is preferably 10 mol% or less of the total amount of R 2 , more preferably 5 mol% or less, still more preferably 3 mol% or less, particularly 1 mol%.
  • the following is preferable.
  • Examples of the other diamine residue include a diamine residue that does not have a silicon atom and does not have an aromatic ring or an aliphatic ring. From the viewpoint of increasing the tensile modulus and improving the surface hardness, it is preferable not to include a diamine residue having 3 or more silicon atoms in the main chain.
  • 50 mole% 10 mole% or more of the total amount of R 2 or less is a main one silicon atom in a chain or two with diamine residue, of the total amount of R 2 (100 mol%), the main chain 50 mol% or more and 99 mol% or less of the remainder (100% ⁇ x%) of the mol% (x mol%) of the diamine residue having one or two silicon atoms in A diamine residue having an aromatic ring or an aliphatic ring is preferred.
  • the polyimide having the structure represented by the general formula (1) includes an aromatic ring, and (i) a fluorine atom, in terms of improving light transmittance and improving surface hardness. It is a polyimide containing at least one selected from the group consisting of (ii) an aliphatic ring and (iii) a structure in which aromatic rings are connected to each other by a sulfonyl group or an alkylene group which may be substituted with fluorine. Is preferred.
  • the polyimide having the structure represented by the general formula (1) includes at least one selected from a tetracarboxylic acid residue having an aromatic ring and a diamine residue having an aromatic ring, so that the molecular skeleton becomes rigid.
  • the rigid aromatic ring skeleton tends to increase the absorption wavelength to a long wavelength, and tends to decrease the transmittance in the visible light region.
  • a fluorine atom is contained in the polyimide
  • the light transmission is improved because the electronic state in the polyimide skeleton can be hardly transferred.
  • an aliphatic ring is included in the polyimide, light transmittance is improved because the transfer of charges in the skeleton can be inhibited by breaking the ⁇ -electron conjugation in the polyimide skeleton.
  • a polyimide containing a fluorine atom is preferably used from the viewpoint of improving light transmittance and improving surface hardness.
  • the fluorine atom content ratio is preferably such that the ratio (F / C) of the number of fluorine atoms (F) and the number of carbon atoms (C) measured on the polyimide surface by X-ray photoelectron spectroscopy is 0.01 or more, Further, it is preferably 0.05 or more.
  • the ratio (F / C) of the number of fluorine atoms (F) to the number of carbon atoms (C) is 1 or less. Preferably, it is preferably 0.8 or less.
  • the said ratio by the measurement of X-ray photoelectron spectroscopy (XPS) can be calculated
  • the polyimide having the structure represented by the general formula (1) from the viewpoint of improving the surface hardness, the sum of R 1 and R 2 is 100 mole% in the general formula (1), an aromatic
  • the total of the tetracarboxylic acid residue having an aromatic ring and the diamine residue having an aromatic ring is preferably 50 mol% or more, more preferably 60 mol% or more, and 75 mol% or more. Even more preferred.
  • the polyimide having the structure represented by the general formula (1) from the viewpoint of improving the surface hardness and optical transparency, no tetracarboxylic acid residue of R 1, and a silicon atom of R 2 aromatic It is preferable that at least one of the diamine residues having an aromatic ring or an aliphatic ring includes an aromatic ring and a fluorine atom, and further does not have a tetracarboxylic acid residue of R 1 and a silicon atom of R 2. Both of the diamine residues having an aromatic ring or an aliphatic ring preferably contain an aromatic ring and a fluorine atom.
  • the total of R 1 and R 2 in the general formula (1) is 100 mol%.
  • the total of the tetracarboxylic acid residue having an aromatic ring and a fluorine atom and the diamine residue having an aromatic ring and a fluorine atom is preferably 50 mol% or more, more preferably 60 mol% or more, More preferably, it is 75 mol% or more.
  • the polyimide having the structure represented by the general formula (1) is a polyimide in which 50% or more of the hydrogen atoms bonded to the carbon atoms contained in the polyimide are hydrogen atoms directly bonded to the aromatic ring. However, it is preferably used from the viewpoints of improving light transmittance and improving surface hardness.
  • the proportion of hydrogen atoms (number) directly bonded to the aromatic ring in the total hydrogen atoms (number) bonded to carbon atoms contained in the polyimide is preferably 60% or more, and more preferably 70% or more.
  • the film is stretched at, for example, 200 ° C. or higher even after a heating step in the atmosphere. Is preferable from the viewpoint of little change in optical characteristics, particularly total light transmittance and yellowness YI value.
  • polyimide is a polyimide in which 50% or more of the hydrogen atoms bonded to the carbon atoms contained in the polyimide are hydrogen atoms directly bonded to the aromatic ring, the chemical structure of the polyimide changes due to low reactivity with oxygen. It is estimated that it is difficult.
  • Polyimide film uses its high heat resistance and is often used in devices that require processing steps involving heating, but more than 50% of the hydrogen atoms bonded to the carbon atoms contained in the polyimide are in the aromatic ring.
  • polyimide which is a hydrogen atom that is directly bonded
  • the ratio of the hydrogen atoms (number) directly bonded to the aromatic ring in the total hydrogen atoms (number) bonded to the carbon atoms contained in the polyimide is determined by high-performance liquid chromatography or gas chromatography mass of the polyimide decomposition product.
  • the sample is decomposed with an alkaline aqueous solution or supercritical methanol, and the resulting decomposition product is separated by high performance liquid chromatography, and a qualitative analysis of each separated peak is performed by a gas chromatograph mass spectrometer, NMR, etc.
  • the ratio of hydrogen atoms (numbers) directly bonded to the aromatic ring in the total hydrogen atoms (numbers) contained in the polyimide can be determined by performing determination using high performance liquid chromatography.
  • the polyimide which has a structure represented by the said General formula (1) has the content rate (mass%) of the silicon atom in a polyimide from the point of a bending resistance and surface hardness 0.7 mass% or more and 6.5 mass. % Is preferably 0.7% by mass or more and 5.5% by mass or less, more preferably 0.7% by mass or more and 4.2% by mass or less.
  • the content ratio (mass%) of the silicon atom in the polyimide can be determined from the molecular weight of the charge at the time of polyimide production.
  • the content rate (mass%) of the silicon atom in a polyimide is the high-performance liquid chromatography, gas chromatograph mass spectrometer, NMR, elemental analysis, XPS / ESCA, and TOF about the decomposition product of the polyimide obtained similarly to the above.
  • -It can be determined using SIMS.
  • R 1 in the general formula (1) is a cyclohexanetetracarboxylic acid dibenzoate from the viewpoint of light transmittance, bending resistance and surface hardness.
  • R 1 these suitable residues are preferably contained in a total amount of 50 mol% or more, more preferably 70 mol% or more, and still more preferably 90 mol% or more.
  • R 1 in the general formula (1) is 4,4 ′-(hexafluoroisopropylidene) diphthalic anhydride residue, 3,4 ′-() because of a good balance between light transmittance and surface hardness.
  • Hexafluoroisopropylidene) diphthalic anhydride residue 3,3 ′-(hexafluoroisopropylidene) diphthalic anhydride residue, 4,4′-oxydiphthalic anhydride residue, and 3,4′-oxydiphthalate More preferably, it is at least one tetravalent group selected from the group consisting of acid anhydride residues.
  • R 1 in the general formula (1) includes pyromellitic dianhydride residue, 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride residue, and 2,2 ′, 3, A tetracarboxylic acid residue group (group A) suitable for improving rigidity such as at least one selected from the group consisting of 3′-biphenyltetracarboxylic dianhydride residues, Anhydride residue, cyclopentanetetracarboxylic dianhydride residue, dicyclohexane-3,4,3 ′, 4′-tetracarboxylic dianhydride residue, cyclobutanetetracarboxylic dianhydride residue, 4, 4 '-(hexafluoroisopropylidene) diphthalic anhydride residue, 3,4'-(hexafluoroisopropylidene) diphthalic anhydride residue, 3,3 '-(hexafluoroisopropylidene) diphthal
  • the content ratio of the tetracarboxylic acid residue group (group A) suitable for improving the rigidity and the tetracarboxylic acid residue group (group B) suitable for improving light transmittance is , 1 mol of tetracarboxylic acid residue group (group B) suitable for improving light transmittance is 0.4% of tetracarboxylic acid residue group (group A) suitable for improving rigidity. It is preferably from 05 mol to 9 mol, more preferably from 0.1 mol to 5 mol, and still more preferably from 0.3 mol to 4 mol.
  • the group B includes 4,4 ′-(hexafluoroisopropylidene) diphthalic anhydride residues and 3,4 ′-(hexafluoroisopropylidene) diphthalic anhydride residues containing fluorine atoms. It is preferable to use at least one kind from the viewpoint of improving surface hardness and light transmittance.
  • the diamine residue having no silicon atom and having an aromatic ring or an aliphatic ring in R 2 in the general formula (1) is trans- Cyclohexanediamine residue, trans-1,4-bismethylenecyclohexanediamine residue, 4,4′-diaminodiphenylsulfone residue, 3,4′-diaminodiphenylsulfone residue, 2,2-bis (4-aminophenyl) )
  • Residue 3,4'-diaminodiphenylsulfone residue, 2,2-bis (4-aminophenyl) propane, 2,2-bis (4-aminophenyl) hexafluoropropane residue, the following general formula It is preferably at least one divalent group selected from the group consisting of divalent groups represented by (2).
  • R 3 and R 4 are more preferably perfluoroalkyl groups.
  • R 3 and R 4 each independently represents a hydrogen atom, an alkyl group, or a perfluoroalkyl group.
  • the diamine residue having one or two silicon atoms in the main chain of R 2 in the general formula (1) has 2 silicon atoms. It is preferable that it is a diamine residue having one from the viewpoint of light transmittance, bending resistance and surface hardness, and moreover, 1,3-bis (3-aminopropyl) tetramethyldisiloxane residue, 1,3 -Bis (4-aminobutyl) tetramethyldisiloxane, 1,3-bis (5-aminopentyl) tetramethyldisiloxane, and the like are preferable from the viewpoints of availability and compatibility between light transmittance and surface hardness.
  • n represents the number of repeating units and is 1 or more.
  • the number of repeating units n in the polyimide is not particularly limited as long as it is appropriately selected according to the structure so as to exhibit a preferable glass transition temperature to be described later.
  • the average number of repeating units is usually 10 to 2000, and more preferably 15 to 1000.
  • the polyimide used for this indication can contain 1 type, or 2 or more types of polyimide which has a structure represented by the said General formula (1). Moreover, as long as the effect of this indication is not impaired, the polyimide used for this indication may have a structure different from the structure represented by the said General formula (1) in the one part.
  • the structure represented by the general formula (1) is preferably 95% or more of the total number of repeating units of the polyimide, more preferably 98% or more, and 100%. Even more preferably.
  • Examples of the structure different from the structure represented by the general formula (1) include a case where a tetracarboxylic acid residue having no aromatic ring or aliphatic ring is included, and a polyamide structure.
  • polyamide structure examples include a polyamideimide structure containing a tricarboxylic acid residue such as trimellitic anhydride and a polyamide structure containing a dicarboxylic acid residue such as terephthalic acid.
  • the polyimide used in the present disclosure has a glass transition temperature in a temperature range of 150 ° C. or higher and 400 ° C. or lower.
  • the glass transition temperature is 150 ° C. or higher, it is excellent in heat resistance and is preferably 200 ° C. or higher.
  • the baking temperature can be reduced, and is preferably 380 ° C. or lower.
  • the polyimide used in the present disclosure preferably does not have a tan ⁇ curve peak in a temperature range of ⁇ 150 ° C. or more and 0 ° C. or less, which can improve the surface hardness of the polyimide film at room temperature.
  • the polyimide used in the present disclosure may further have a tan ⁇ curve peak in a temperature range of more than 0 ° C. and less than 150 ° C.
  • the glass transition temperature of the polyimide used in the present disclosure can be measured in the same manner as the glass transition temperature of the polyimide film described later.
  • the polyimide film of the present disclosure may further contain additives as necessary in addition to the polyimide.
  • additives include inorganic particles for reducing optical distortion of the polyimide film, silica filler for smooth winding, and surfactants for improving film forming properties and defoaming properties. It is done.
  • the polyimide film of the present disclosure has the specific total light transmittance, yellowness, glass transition temperature, and tensile elastic modulus. It is preferable that the polyimide film of this indication has the characteristic further mentioned later.
  • the polyimide film of the present disclosure has a total light transmittance of 85% or more as measured in accordance with JIS K7361-1.
  • the total light transmittance of the polyimide film of the present disclosure measured according to JIS K7361-1 is preferably 88% or more, more preferably 89% or more, particularly 90% or more. It is preferable.
  • the polyimide film of the present disclosure has a thickness of 5 ⁇ m or more and 100 ⁇ m or less, and the total light transmittance measured in accordance with JIS K7361-1 is preferably 85% or more, and more preferably 88% or more.
  • the polyimide film of the present disclosure has a thickness of 50 ⁇ m ⁇ 5 ⁇ m, and the total light transmittance measured in accordance with JIS K7361-1 is preferably 85% or more, and more preferably 88% or more. Further, it is preferably 89% or more, and particularly preferably 90% or more.
  • the total light transmittance measured according to JIS K7361-1 can be measured by, for example, a haze meter (for example, HM150 manufactured by Murakami Color Research Laboratory).
  • the converted value of the total light transmittance of different thickness can be obtained by Lambert Beer's law and can be used.
  • the polyimide film of the present disclosure has a yellowness (YI value) calculated in accordance with JIS K7373-2006 of 30 or less.
  • the yellowness (YI value) calculated in accordance with JIS K7373-2006 is preferably 20 or less, more preferably 15 or less, and even more preferably 10 or less.
  • the polyimide film of the present disclosure has a thickness of 5 ⁇ m or more and 100 ⁇ m or less, and the yellowness (YI value) calculated based on JIS K7373-2006 is preferably 30 or less, more preferably 20 or less, More preferably, it is 15 or less, and it is preferable that it is 10 or less.
  • the polyimide film of the present disclosure has a thickness of 50 ⁇ m ⁇ 5 ⁇ m, and the yellowness (YI value) calculated in accordance with JIS K7373-2006 is preferably 10 or less, and more preferably 7 or less. Preferably, it is 5 or less and still more preferable.
  • the yellowness is measured using a UV-Vis near-infrared spectrophotometer (for example, JASCO Corporation V-7100) in accordance with JIS K7373-2006. It can be calculated based on the transmittance measured by the color method. It should be noted that, from the measurement value of yellowness of a certain thickness, the yellowness of different thicknesses is calculated for each transmittance at each wavelength measured at 5 nm intervals between 380 nm and 780 nm of a sample with a specific thickness. Similarly to the light transmittance, a converted value of each transmittance at each wavelength of different thickness can be obtained according to Lambert Beer's law, and can be calculated and used based on it.
  • a converted value of each transmittance at each wavelength of different thickness can be obtained according to Lambert Beer's law, and can be calculated and used based on it.
  • the polyimide film of this indication has a glass transition temperature in the temperature range of 150 degreeC or more and 400 degrees C or less.
  • the temperature region having the glass transition temperature is preferably 200 ° C. or higher from the viewpoint of excellent heat resistance, and preferably 380 ° C. or lower from the viewpoint that the baking temperature can be reduced.
  • the glass transition temperature of the polyimide film refers to the temperature of the peak where the maximum value of the peak is maximum when there are a plurality of peaks of the tan ⁇ curve.
  • the dynamic viscoelasticity measurement for example, with a dynamic viscoelasticity measuring device RSA III (TA Instruments Japan Co., Ltd.), the measurement range is set to ⁇ 150 ° C. to 400 ° C., the frequency is 1 Hz, and the temperature is increased. This can be done at a rate of 5 ° C./min. Further, the measurement can be performed with a sample width of 5 mm and a distance between chucks of 20 mm.
  • the peak of the tan ⁇ curve refers to a peak having an inflection point that is a maximum value and a peak width that is between 3 ° C. or more between peaks and valleys, and is derived from measurement such as noise. The fine vertical fluctuation is not interpreted as the peak.
  • the polyimide film of the present disclosure preferably has no tan ⁇ curve peak in a temperature range of ⁇ 150 ° C. or higher and 0 ° C. or lower.
  • the main chain has a diamine residue having a long siloxane bond, it has a peak of the tan ⁇ curve in such a low temperature region, but the polyimide film of the present disclosure has a short bond of one or two silicon atoms. Therefore, the tan ⁇ curve does not normally have a peak in such a low temperature region.
  • the decrease in tensile elastic modulus at room temperature is suppressed.
  • the surface hardness sufficient as a protective film can be maintained.
  • the polyimide film of the present disclosure has a tensile elastic modulus at 25 ° C. of 1.8 GPa or more when a 15 mm ⁇ 40 mm test piece is measured according to JIS K7127, the tensile speed is 10 mm / min, and the distance between chucks is 20 mm. is there.
  • the tensile elastic modulus at 25 ° C. room temperature
  • the tensile elastic modulus is preferably 2.0 GPa or more, and more preferably 2.4 GPa or more.
  • the tensile elastic modulus is preferably 5.2 GPa or less from the viewpoint of improving bending resistance. From the viewpoint of improving bending resistance, the tensile elastic modulus may be 4.0 GPa or less, or 3.5 GPa or less.
  • the tensile elastic modulus was determined by cutting a test piece having a width of 15 mm ⁇ a length of 40 mm from a polyimide film using a tensile tester (for example, Shimadzu Corporation: Autograph AG-X 1N, load cell: SBL-1KN) at 25 ° C.
  • the tensile speed can be 10 mm / min, and the distance between chucks can be 20 mm.
  • the polyimide film for obtaining the tensile modulus of elasticity preferably has a thickness of 50 ⁇ m ⁇ 5 ⁇ m.
  • the polyimide film of this indication that the birefringence of the thickness direction in wavelength 590nm is 0.020 or less from the point which reduces an optical distortion.
  • the birefringence in the thickness direction at the wavelength of 590 nm is preferably smaller, preferably 0.015 or less, more preferably 0.010 or less, and even more preferably less than 0.008.
  • the birefringence of the thickness direction in the said wavelength 590nm of the polyimide film of this indication can be calculated
  • the thickness direction retardation value (Rth) of the polyimide film is measured with a light of 25 ° C. and a wavelength of 590 nm using a phase difference measuring apparatus (for example, product name “KOBRA-WR” manufactured by Oji Scientific Instruments). To do.
  • a phase difference value at 0 degree incidence and a phase difference value at an incidence angle of 40 degrees are measured, and the thickness direction retardation value Rth is calculated from these phase difference values.
  • the retardation value at an oblique incidence of 40 degrees is measured by making light having a wavelength of 590 nm incident on the retardation film from a direction inclined by 40 degrees from the normal line of the retardation film.
  • the birefringence in the thickness direction of the polyimide film can be determined by substituting it into the formula: Rth / d.
  • Said d represents the film thickness (nm) of a polyimide film.
  • the thickness direction retardation value is nx the refractive index in the slow axis direction in the in-plane direction of the film (the direction in which the refractive index in the film in-plane direction is maximum), and the fast axis direction in the film plane (film surface).
  • Rth [nm] ⁇ (nx + ny) / 2 ⁇ nz ⁇ ⁇ d, where ny is the refractive index in the direction in which the refractive index in the inner direction is the minimum) and nz is the refractive index in the thickness direction of the film.
  • the pencil hardness is preferably 2B or more, more preferably B or more, and even more preferably HB or more.
  • the pencil hardness of the polyimide film is determined by JIS K5600-5-4 using a test pencil specified by JIS-S-6006 after conditioning the sample for 2 hours at a temperature of 25 ° C. and a relative humidity of 60%. (1999), a pencil hardness test (0.98 N load) is performed on the film surface, and the highest pencil hardness that does not cause scratches can be evaluated.
  • a pencil scratch coating film hardness tester manufactured by Toyo Seiki Co., Ltd. can be used.
  • the haze value of the polyimide film of the present disclosure is preferably 10 or less, more preferably 8 or less, and still more preferably 5 or less, from the viewpoint of light transmittance. It is preferable that the haze value can be achieved when the thickness of the polyimide film is 5 ⁇ m or more and 100 ⁇ m or less.
  • the haze value can be measured by a method according to JIS K-7105, for example, a haze meter HM150 manufactured by Murakami Color Research Laboratory.
  • the internal angle measured in the test is preferably 120 ° or more, More preferably, it is 125 ° or more.
  • Static bending test method A polyimide film test piece cut out to 15 mm ⁇ 40 mm is bent at a position of half of the long side, and both ends of the long side of the test piece sandwich a metal piece (100 mm ⁇ 30 mm ⁇ 6 mm) having a thickness of 6 mm from the upper and lower surfaces.
  • test piece Placed between glass plates (100 mm x 100 mm x 0.7 mm) from above and below with the tape fixed so that the overlap between the top and bottom surfaces of the test piece and the metal piece is 10 mm each.
  • the test piece is fixed in a bent state with an inner diameter of 6 mm.
  • a dummy test piece is sandwiched between the metal piece and the glass plate where there is no test piece, and is fixed with tape so that the glass plate is parallel.
  • the test piece fixed in a bent state in this way was allowed to stand for 24 hours in an environment of 60 ⁇ 2 ° C. and 93 ⁇ 2% relative humidity (RH), and then the glass plate and the fixing tape were removed, Release the force on the specimen. Thereafter, one end of the test piece is fixed, and the internal angle of the test piece 30 minutes after the force applied to the test piece is released is measured.
  • the internal angle of a test piece is 155 degrees or more, when a dynamic bending test is performed according to the following dynamic bending test method from the point which is excellent in bending resistance, 160 It is more preferable that the angle is greater than or equal to °.
  • a dynamic bending test method A test piece of polyimide film cut out to a size of 20 mm ⁇ 100 mm was fixed with a tape on a constant temperature and humidity chamber endurance test system (manufactured by Yuasa System Equipment Co., Ltd., planar surface unloaded U-shaped expansion / contraction test jig DMX-FS). .
  • the test piece was set in the same bent state as in the static bending test, that is, the distance between both ends of the long side of the bent test piece was set to 6 mm (fixed in a bent state with an inner diameter of 6 mm). Thereafter, bending was repeated 200,000 times with 90 times of bending per minute in an environment of 60 ⁇ 2 ° C. and 93 ⁇ 2% relative humidity (RH). Thereafter, the test piece was removed, one end of the obtained test piece was fixed, and the internal angle of the test piece 30 minutes after the bending was repeated 200,000 times was measured.
  • the Young's modulus measured by the following measuring method is 2.3 Gpa or more from the point which is excellent in surface hardness, and it is more preferable that it is 2.4 Gpa or more.
  • the Young's modulus is measured using a nanoindentation method in accordance with ISO14577 at a temperature of 25 ° C.
  • the measuring device uses PICODETOR HM500 manufactured by Fisher Instruments Co., Ltd., and a Vickers indenter as a measurement indenter.
  • a value obtained by measuring 8 arbitrary points on the surface of the polyimide film and averaging the points is defined as Young's modulus.
  • the measurement conditions are the maximum indentation depth: 1000 nm, weighted time: 20 seconds, and creep time: 5 seconds.
  • the atomic% of silicon atoms (Si) on the film surface as measured by X-ray photoelectron spectroscopy of the polyimide film is preferably from 0.1 to 10, more preferably from 0.2 to 5.
  • the said ratio by the measurement of X-ray photoelectron spectroscopy (XPS) can be calculated
  • the ratio (F / C) of the number of fluorine atoms (F) and the number of carbon atoms (C) on the film surface, measured by X-ray photoelectron spectroscopy of a polyimide film is 0.01 or more and 1 or less. It is preferable that it is 0.05 or more and 0.8 or less.
  • the ratio (F / N) of the number of fluorine atoms (F) and the number of nitrogen atoms (N) on the film surface, measured by X-ray photoelectron spectroscopy of the polyimide film is preferably 0.1 or more and 20 or less. Further, it is preferably 0.5 or more and 15 or less.
  • the ratio (F / Si) of the number of fluorine atoms (F) and the number of silicon atoms (Si) on the film surface, measured by X-ray photoelectron spectroscopy of the polyimide film is preferably 1 or more and 50 or less. It is preferably 3 or more and 30 or less.
  • the peeling of the coating film does not occur, the adhesion point between the polyimide film and the hard coat layer, and the polyimide This is preferable from the viewpoint of the surface hardness of a laminate in which a hard coat layer is laminated adjacent to the film.
  • Resin composition for adhesion evaluation prepared by adding 10 parts by mass of 1-hydroxy-cyclohexyl-phenyl-ketone to 100 parts by mass of pentaerythritol triacrylate in a 40% by mass methyl isobutyl ketone solution of pentaerythritol triacrylate Is applied on a test piece of polyimide film cut out to 10 cm ⁇ 10 cm, and cured by irradiating ultraviolet rays with an exposure amount of 200 mJ / cm 2 under a nitrogen stream, thereby forming a cured film having a thickness of 10 ⁇ m.
  • the cured film is subjected to a cross-cut test in accordance with JIS K 5600-5-6, and after repeated peeling operations with a tape 5 times, the presence or absence of peeling of the coating film is observed.
  • the thickness of the polyimide film of the present disclosure may be appropriately selected depending on the use, but is preferably 1 ⁇ m or more, more preferably 5 ⁇ m or more, and even more preferably 10 ⁇ m or more. . On the other hand, it is preferably 200 ⁇ m or less, more preferably 150 ⁇ m or less, and even more preferably 100 ⁇ m or less. If the thickness is thin, the strength is reduced and breakage is liable to occur. If the thickness is thick, the difference between the inner diameter and the outer diameter at the time of bending is increased, and the load on the film is increased.
  • the polyimide film of the present disclosure may be subjected to a surface treatment such as a saponification treatment, a glow discharge treatment, a corona discharge treatment, an ultraviolet treatment, or a flame treatment.
  • a surface treatment such as a saponification treatment, a glow discharge treatment, a corona discharge treatment, an ultraviolet treatment, or a flame treatment.
  • a step of preparing a polyimide precursor resin composition containing a polyimide precursor having a structure represented by the following general formula (1 ′) and an organic solvent (hereinafter referred to as a polyimide precursor resin composition preparation step); Applying the polyimide precursor resin composition to a support to form a polyimide precursor resin coating film (hereinafter referred to as a polyimide precursor resin coating film forming process); The process of imidating the said polyimide precursor by heating (henceforth an imidation process) and the manufacturing method of the polyimide film containing are mentioned.
  • the stretching step the step of stretching at least one of the polyimide precursor resin coating film and the imidized coating film obtained by imidizing the polyimide precursor resin coating film (hereinafter referred to as the stretching step).
  • the stretching step the step of stretching at least one of the polyimide precursor resin coating film and the imidized coating film obtained by imidizing the polyimide precursor resin coating film.
  • the polyimide precursor resin composition prepared in the first production method contains a polyimide precursor represented by the general formula (1 ') and an organic solvent. In addition, additives and the like may be contained as necessary.
  • the polyimide precursor represented by the general formula (1 ′) includes a tetracarboxylic acid component that becomes a tetracarboxylic acid residue in R 1 of the general formula (1 ′), and R 2 of the general formula (1 ′).
  • the number average molecular weight and the weight average molecular weight is preferably 10,000 or more from the viewpoint of strength when used as a film, and more preferably 20,000.
  • the above is preferable.
  • the average molecular weight is too large, the viscosity becomes high and the workability such as filtration may be reduced, and therefore it is preferably 10000000 or less, and more preferably 500000 or less.
  • the number average molecular weight of the polyimide precursor can be determined by NMR (for example, AVANCE III manufactured by BRUKER). For example, a polyimide precursor solution is applied to a glass plate and dried at 100 ° C.
  • the number average molecular weight can be calculated from the peak intensity ratio of hydrogen atoms.
  • the weight average molecular weight of the polyimide precursor can be measured by gel permeation chromatography (GPC).
  • the polyimide precursor is an N-methylpyrrolidone (NMP) solution having a concentration of 0.5% by weight
  • the developing solvent is a 10 mmol% LiBr-NMP solution having a water content of 500 ppm or less
  • a Tosoh GPC apparatus (HLC-8120, used) Column: GPC LF-804) manufactured by SHODEX, and measurement is performed under the conditions of a sample injection amount of 50 ⁇ L, a solvent flow rate of 0.5 mL / min, and 40 ° C.
  • the weight average molecular weight is determined based on a polystyrene standard sample having the same concentration as the sample.
  • the polyimide precursor solution is obtained by reacting the above tetracarboxylic dianhydride and the above diamine in a solvent.
  • the solvent used for the synthesis of the polyimide precursor is not particularly limited as long as it can dissolve the above-described tetracarboxylic dianhydride and diamine.
  • an aprotic polar solvent or a water-soluble alcohol solvent is used.
  • an organic solvent containing a nitrogen atom of ⁇ -butyrolactone or the like it is preferable to use an organic solvent containing a nitrogen atom of ⁇ -butyrolactone or the like.
  • the polyimide precursor solution polyamic acid solution
  • the polyimide precursor resin composition contains inorganic particles described later, the dissolution of the inorganic particles is suppressed. Therefore, it is preferable to use an organic solvent containing a nitrogen atom, and among these, N, N-dimethylacetamide, N-methyl-2-pyrrolidone or a combination thereof is preferably used.
  • the organic solvent is a solvent containing carbon atoms.
  • the polyimide precursor solution is prepared by combining at least two kinds of diamines.
  • An acid dianhydride may be added to a mixed solution of at least two kinds of diamines to synthesize polyamic acid, or at least Two kinds of diamine components may be added to the reaction solution step by step at an appropriate molar ratio, and the sequence in which each raw material is incorporated into the polymer chain may be controlled to some extent.
  • an acid dianhydride having a molar ratio of 0.5 equivalent of a diamine having one or two silicon atoms in the main chain Is added and reacted to synthesize an amic acid in which a diamine having one or two silicon atoms in the main chain is reacted at both ends of the acid dianhydride, and all or part of the remaining diamine is added thereto.
  • acid dianhydride may be added to polymerize the polyamic acid.
  • a diamine having one or two silicon atoms in the main chain is introduced into the polyamic acid in a linked form via one acid dianhydride.
  • the positional relationship of amic acid having one or two silicon atoms in the main chain is specified to some extent, and it is easy to obtain a film having excellent flexibility while maintaining the surface hardness. It is preferable from the point.
  • Y / X may be 0.9 or more and 1.1 or less. Preferably, it is 0.95 or more and 1.05 or less, more preferably 0.97 or more and 1.03 or less, and particularly preferably 0.99 or more and 1.01 or less. By setting it as such a range, the molecular weight (polymerization degree) of the polyamic acid obtained can be adjusted moderately.
  • the procedure of the polymerization reaction can be appropriately selected from known methods and is not particularly limited.
  • the polyimide precursor solution obtained by the synthesis reaction may be used as it is, and other components may be mixed there if necessary.
  • the solvent of the polyimide precursor solution is dried and dissolved in another solvent. It may be used.
  • the viscosity of the polyimide precursor solution at 25 ° C. is preferably 500 cps or more and 200,000 cps or less from the viewpoint of forming a uniform coating film and a polyimide film.
  • the viscosity of the polyimide precursor solution can be measured at 25 ° C. using a viscometer (for example, TVE-22HT, Toki Sangyo Co., Ltd.).
  • the polyimide precursor resin composition may contain an additive as necessary.
  • the additive include inorganic particles for reducing optical distortion of the polyimide film, silica filler for smooth winding, and surfactants for improving film forming property and defoaming property.
  • the same materials as those described in the above polyimide film can be used.
  • the organic solvent used in the polyimide precursor resin composition is not particularly limited as long as the polyimide precursor can be dissolved.
  • nitrogen atoms such as N-methyl-2-pyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, dimethylsulfoxide, hexamethylphosphoramide, 1,3-dimethyl-2-imidazolidinone
  • Organic solvent: ⁇ -butyrolactone or the like can be used, and among them, it is preferable to use an organic solvent containing a nitrogen atom for the reasons described above.
  • Content of the said polyimide precursor in the said polyimide precursor resin composition is 50 mass% or more in solid content of a resin composition from the point which forms the polyimide film which has a uniform coating film and the intensity
  • it is preferably 60% by mass or more, and the upper limit may be appropriately adjusted depending on the components contained.
  • the content of the inorganic particles is appropriately set according to the optical characteristics to be obtained.
  • the solid content of the resin composition It is preferably 0.01% by mass or more, more preferably 0.05% by mass or more, more preferably 50% by mass or less, and preferably 40% by mass or less.
  • the organic solvent in the polyimide precursor resin composition is preferably 40% by mass or more and more preferably 50% by mass or more in the resin composition from the viewpoint of forming a uniform coating film and a polyimide film. Preferably, it is 99% by mass or less.
  • the polyimide precursor resin composition preferably has a moisture content of 1000 ppm or less from the viewpoint of improving the storage stability of the polyimide precursor resin composition and improving the productivity. If the polyimide precursor resin composition contains a large amount of moisture, the polyimide precursor is easily decomposed, and when the polyimide precursor resin composition contains the inorganic particles, the inorganic particles are dissolved and the refractive index is reduced. May not function as a component to adjust
  • the water content of the polyimide precursor resin composition can be determined using a Karl Fischer moisture meter (for example, a trace moisture measuring device CA-200, manufactured by Mitsubishi Chemical Corporation).
  • the method for preparing the polyimide precursor resin composition is not particularly limited, but when the polyimide precursor resin composition contains the inorganic particles, for example, 1) the inorganic particles are dispersed in the polyimide precursor solution. 2) A method of mixing and homogenizing a polyimide precursor solution and an organic solvent in which the inorganic particles are dispersed. 3) A polyimide precursor in an organic solvent in which the inorganic particles are dispersed. The method of making it melt
  • dissolve and equalizing etc. is mentioned. As described above, in order to make the water content 1000 ppm or less, the inorganic particles are used after being dried in advance, the organic solvent to be used is dehydrated, or the water content is controlled, and the humidity is 5 It is preferable to handle in an environment of less than 10%.
  • a method for dispersing the inorganic particles in an organic solvent known methods such as stirring and ultrasonic irradiation can be used.
  • stirring and ultrasonic irradiation can be used.
  • a dispersion method that does not use a medium such as inorganic beads is preferable, and a dispersion method using ultrasonic irradiation or vibration is preferably used.
  • the viscosity at 25 ° C. with a solid content of 15% by weight of the polyimide precursor resin composition is preferably 500 cps or more and 100,000 cps or less from the viewpoint of forming a uniform coating film and polyimide film.
  • the viscosity of the polyimide precursor resin composition can be measured using a viscometer (eg, TVE-22HT, Toki Sangyo Co., Ltd.) at 25 ° C. and a sample amount of 0.8 ml.
  • the support used has a smooth surface and heat resistance.
  • the material is not particularly limited as long as the material is resistant and solvent resistant.
  • an inorganic material such as a glass plate, a metal plate having a mirror-finished surface, and the like can be given.
  • the shape of the support is selected depending on the coating method, and may be, for example, a plate shape, a drum shape, a belt shape, a sheet shape that can be wound around a roll, or the like.
  • the application means is not particularly limited as long as it can be applied at a desired film thickness, and for example, a known one such as a die coater, comma coater, roll coater, gravure coater, curtain coater, spray coater, lip coater or the like can be used. . Application may be performed by a single-wafer coating apparatus or a roll-to-roll coating apparatus.
  • the solvent in the coating film is dried at a temperature of 150 ° C. or lower, preferably 30 ° C. or higher and 120 ° C. or lower until the coating film is tack-free.
  • the drying time may be appropriately adjusted according to the film thickness of the polyimide precursor resin coating film, the type of solvent, the drying temperature, etc., but is usually 1 minute to 60 minutes, preferably 2 minutes to 30 minutes. Is preferred. When exceeding an upper limit, it is unpreferable from the surface of the production efficiency of a polyimide film. On the other hand, when the value is below the lower limit, the appearance of the resulting polyimide film may be affected by rapid solvent drying.
  • the method for drying the solvent is not particularly limited as long as the solvent can be dried at the above temperature.
  • an oven, a drying furnace, a hot plate, infrared heating, or the like can be used.
  • the atmosphere during drying of the solvent is preferably an inert gas atmosphere.
  • the inert gas atmosphere is preferably a nitrogen atmosphere, the oxygen concentration is preferably 100 ppm or less, and more preferably 50 ppm or less.
  • heat treatment is performed in the atmosphere, the film may be oxidized and colored, or the performance may deteriorate.
  • the said polyimide precursor is imidized by heating.
  • an imidation process may be performed with respect to the polyimide precursor in the said polyimide precursor resin coating film before an extending process, and the said polyimide precursor resin after an extending process
  • the imidization temperature may be appropriately selected according to the structure of the polyimide precursor.
  • the temperature rise start temperature is preferably 30 ° C. or higher, more preferably 100 ° C. or higher.
  • the temperature rise end temperature is preferably 250 ° C. or higher.
  • the rate of temperature increase is preferably selected as appropriate depending on the film thickness of the polyimide film to be obtained.
  • the film thickness of the polyimide film is thick, it is preferable to decrease the temperature increase rate. From the viewpoint of the production efficiency of the polyimide film, it is preferably 5 ° C./min or more, more preferably 10 ° C./min or more.
  • the upper limit of the heating rate is usually 50 ° C./min, preferably 40 ° C./min or less, more preferably 30 ° C./min or less. It is preferable to set the temperature increase rate from the viewpoint that the appearance defect and strength reduction of the film can be suppressed, and the whitening associated with the imidization reaction can be controlled, and the light transmittance is improved.
  • the temperature increase may be continuous or stepwise, but it is preferable to make it continuous from the viewpoint of controlling the appearance of the film, suppressing the strength reduction, and controlling the whitening associated with the imidization reaction. Moreover, in the above-mentioned whole temperature range, the temperature rising rate may be constant or may be changed in the middle.
  • the atmosphere at the time of temperature increase in imidation is preferably an inert gas atmosphere.
  • the inert gas atmosphere is preferably a nitrogen atmosphere, the oxygen concentration is preferably 500 ppm or less, more preferably 200 ppm or less, and even more preferably 100 ppm or less.
  • the film may be oxidized and colored, or the performance may deteriorate.
  • 50% or more of the hydrogen atoms bonded to the carbon atoms contained in the polyimide are hydrogen atoms directly bonded to the aromatic ring, there is little influence of oxygen on the optical properties, and an inert gas atmosphere is not used.
  • a polyimide having a high light transmittance can be obtained.
  • the heating method for imidation is not particularly limited as long as the temperature can be raised at the above temperature.
  • an oven, a heating furnace, infrared heating, electromagnetic induction heating, or the like can be used.
  • the imidation ratio of a polyimide precursor shall be 50% or more before an extending process. Even if the imidization rate is 50% or more before the stretching step, the film is stretched after the step, and then heated at a higher temperature for a certain period of time to perform imidization. Whitening is suppressed.
  • the imidization rate is 80% or more in the imidization step before the stretching step, and the reaction is allowed to proceed to 90% or more, and further to 100%. Is preferred.
  • the imidation rate can be measured by analyzing the spectrum by infrared measurement (IR).
  • reaction In order to obtain a final polyimide film, it is preferable to proceed the reaction to 90% or more, further 95% or more, and further 100%. In order to allow the reaction to proceed to 90% or more, more preferably 100%, it is preferable to hold at a temperature rising end temperature for a certain period of time. Minutes are preferred.
  • the first production method includes a stretching process of stretching at least one of the polyimide precursor resin coating film and a post-imidation coating film obtained by imidizing the polyimide precursor resin coating film. It may be. When it has the said extending
  • the heating temperature during stretching is preferably in the range of glass transition temperature ⁇ 50 ° C. of the polyimide or polyimide precursor, and preferably in the range of glass transition temperature ⁇ 40 ° C. If the stretching temperature is too low, the film may not be deformed and the orientation may not be sufficiently induced. On the other hand, if the stretching temperature is too high, the orientation obtained by stretching is relaxed by the temperature, and there is a possibility that sufficient orientation cannot be obtained.
  • the stretching step may be performed simultaneously with the imidization step. Stretching the film after imidization after imidation rate of 80% or more, further 90% or more, even more 95% or more, and particularly substantially 100% imidation improves the surface hardness of the polyimide film. It is preferable from the point.
  • the draw ratio of the polyimide film is preferably from 101% to 10,000%, more preferably from 101% to 500%. By stretching in the above range, the surface hardness of the obtained polyimide film can be further improved.
  • the method for fixing the polyimide film during stretching is not particularly limited, and is selected according to the type of stretching apparatus. Moreover, there is no restriction
  • the polyimide film may be stretched only in one direction (longitudinal stretching or lateral stretching), or may be stretched in two directions by simultaneous biaxial stretching, sequential biaxial stretching, oblique stretching, or the like.
  • a step of preparing a polyimide resin composition containing a polyimide having a structure represented by the general formula (1) and an organic solvent (hereinafter referred to as a polyimide resin composition preparation step);
  • the polyimide resin composition is applied to a support, the solvent is dried, and a polyimide resin coating film is formed (hereinafter referred to as a polyimide resin coating film forming process).
  • the polyimide having the structure represented by the general formula (1) dissolves well in an organic solvent, the polyimide is not dissolved in the polyimide precursor resin composition, and the additive is added as necessary.
  • a polyimide resin composition containing bismuth can also be suitably used.
  • the production method can be suitably used.
  • the polyimide having the structure represented by the general formula (1) is selected from the polyimides having the solvent solubility described above from the same polyimides described in the polyimide film. Can be used.
  • a method for imidization it is preferable to use chemical imidation using a chemical imidizing agent instead of heat dehydration for the dehydration ring-closing reaction of the polyimide precursor.
  • known compounds such as amines such as pyridine and ⁇ -picolinic acid, carbodiimides such as dicyclohexylcarbodiimide, and acid anhydrides such as acetic anhydride may be used as a dehydration catalyst.
  • Examples of the acid anhydride are not limited to acetic anhydride, and propionic acid anhydride, n-butyric acid anhydride, benzoic acid anhydride, trifluoroacetic acid anhydride, and the like, but are not particularly limited.
  • a tertiary amine such as pyridine or ⁇ -picolinic acid may be used in combination.
  • the optical properties particularly the yellowness (YI value) are reduced.
  • reaction liquid reacted from the precursor to the polyimide is not cast as it is, It is preferable to form the film after purification by reprecipitation or the like, and removing components other than polyimide to 100 ppm or less of the total weight of the polyimide.
  • the same organic solvent as described in the polyimide precursor resin composition preparation step in the first production method can be used.
  • the polyimide resin composition may contain an additive as necessary.
  • the additive the thing similar to what was demonstrated in the said polyimide precursor resin composition preparation process in a said 1st manufacturing method can be used.
  • the polyimide precursor resin in the first manufacturing method may be used as a method of setting the moisture content of the polyimide resin composition to 1000 ppm or less and a method of dispersing the inorganic particles in an organic solvent.
  • a method similar to the method described in the composition preparation step can be used.
  • the support and the coating method are the same as those described in the polyimide precursor resin coating film forming step of the first manufacturing method. be able to.
  • the drying temperature is preferably 80 ° C. or higher and 150 ° C. or lower under normal pressure. It is preferable that the pressure be in the range of 10 ° C. to 100 ° C. under reduced pressure.
  • the second manufacturing method may have a stretching process of stretching the polyimide resin coating film after the polyimide resin coating film forming process.
  • the said extending process can be made to be the same as that of the extending process in the said 1st manufacturing method.
  • polyimide film of the present disclosure is not particularly limited, and can be used as a member such as a base material or a surface material for which a glass product such as a thin plate glass has been conventionally used. Since the polyimide film of the present disclosure has improved bending resistance, has sufficient surface hardness as a protective film, and has reduced optical distortion, it can be suitably used as a display surface material that can handle curved surfaces. Can do.
  • the polyimide film of the present disclosure is, for example, a thin and bent flexible organic EL display, a mobile terminal such as a smartphone or a wristwatch type terminal, a display device inside an automobile, a flexible panel used for a wristwatch, or the like.
  • the polyimide film of the present disclosure includes a member for an image display device such as a liquid crystal display device and an organic EL display device, a member for a touch panel, a flexible printed circuit board, a surface protection film and a substrate material for a solar cell panel, an optical waveguide, etc.
  • the present invention can also be applied to other members, other semiconductor-related members and the like.
  • Laminate The laminate of one embodiment of the present disclosure includes the polyimide film of one embodiment of the present disclosure described above and a hard coat layer containing at least one polymer of a radical polymerizable compound and a cationic polymerizable compound. It is a laminated body located adjacently.
  • the laminate of the present disclosure uses the polyimide film of the present disclosure described above, it has improved bending resistance, and further has a hard coat layer, and adhesion between the polyimide film and the hard coat layer.
  • the surface hardness is further improved due to its excellent properties.
  • the adhesion between the polyimide film and the hard coat layer is excellent because the polyimide having the structure represented by the general formula (1) contained in the polyimide film contains 1 silicon atom in the main chain. By containing a specific amount of diamine residues having one or two, it is presumed that the mixing with the specific hard coat layer is excellent.
  • the laminated body of this indication uses the polyimide film of this indication, optical distortion is reduced. Therefore, when the laminated body of this indication is used as a surface material for a display, it is possible to suppress a decrease in display quality of the display.
  • Hard coat layer used in the laminate of the present disclosure contains at least one polymer of a radical polymerizable compound and a cationic polymerizable compound.
  • the radical polymerizable compound is a compound having a radical polymerizable group.
  • the radical polymerizable group possessed by the radical polymerizable compound is not particularly limited as long as it is a functional group capable of causing a radical polymerization reaction, and examples thereof include a group containing a carbon-carbon unsaturated double bond. Specific examples include a vinyl group and a (meth) acryloyl group.
  • these radical polymerizable groups may be the same or different from each other.
  • the number of radical polymerizable groups contained in one molecule of the radical polymerizable compound is preferably 2 or more, and more preferably 3 or more from the viewpoint of improving the hardness of the hard coat layer.
  • a compound having a (meth) acryloyl group is preferable from the viewpoint of high reactivity, and a polyfunctional acrylate monomer having 2 to 6 (meth) acryloyl groups in one molecule;
  • (meth) acryloyl represents each of acryloyl and methacryloyl
  • (meth) acrylate represents each of acrylate and methacrylate.
  • radical polymerizable compound examples include vinyl compounds such as divinylbenzene; ethylene glycol di (meth) acrylate, bisphenol A epoxy di (meth) acrylate, 9,9-bis [4- (2- ( Meth) acryloyloxyethoxy) phenyl] fluorene, alkylene oxide modified bisphenol A di (meth) acrylate (eg ethoxylated (ethylene oxide modified) bisphenol A di (meth) acrylate), trimethylolpropane tri (meth) acrylate, tri Methylolethane tri (meth) acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol tri (meth) acrylate, dipentaeryth Polyol polyacrylates such as lithol tetra (meth) acrylate, dipentaerythritol penta (meth)
  • the cationic polymerizable compound is a compound having a cationic polymerizable group.
  • the cationic polymerizable group possessed by the cationic polymerizable compound is not particularly limited as long as it is a functional group capable of causing a cationic polymerization reaction, and examples thereof include an epoxy group, an oxetanyl group, and a vinyl ether group.
  • these cationic polymerizable groups may be the same or different from each other.
  • the number of cationically polymerizable groups contained in one molecule of the cationically polymerizable compound is preferably 2 or more, and more preferably 3 or more from the viewpoint of improving the hardness of the hard coat layer.
  • the cationic polymerizable compound is preferably a compound having at least one of an epoxy group and an oxetanyl group as a cationic polymerizable group. Cyclic ether groups such as epoxy groups and oxetanyl groups are preferred from the viewpoint of small shrinkage accompanying the polymerization reaction.
  • compounds having an epoxy group among the cyclic ether groups are easily available as compounds having various structures, do not adversely affect the durability of the obtained hard coat layer, and easily control the compatibility with the radical polymerizable compound.
  • the oxetanyl group has a high degree of polymerization and low toxicity compared to the epoxy group.
  • a cationically polymerizable compound having an epoxy group for example, a polyglycidyl ether of a polyhydric alcohol having an alicyclic ring, a cyclohexene ring or a cyclopentene ring-containing compound may be used with an appropriate oxidizing agent such as hydrogen peroxide or peracid.
  • Alicyclic epoxy resin obtained by epoxidation polyglycidyl ether of aliphatic polyhydric alcohol or alkylene oxide adduct thereof, polyglycidyl ester of aliphatic long-chain polybasic acid, homopolymer of glycidyl (meth) acrylate, Aliphatic epoxy resins such as copolymers; glycidyl produced by reaction of bisphenols such as bisphenol A, bisphenol F and hydrogenated bisphenol A, or derivatives thereof such as alkylene oxide adducts and caprolactone adducts, and epichlorohydrin Ether, and novolac epoxy resins such as a and glycidyl ether type epoxy resins derived from bisphenols are exemplified.
  • alicyclic epoxy resin examples include 3,4-epoxycyclohexylmethyl-3,4-epoxycyclohexanecarboxylate (UVR-6105, UVR-6107, UVR-6110), bis-3,4-epoxycyclohexylmethyl adipate. (UVR-6128) (The product names in parentheses are manufactured by Dow Chemical.)
  • Examples of the glycidyl ether type epoxy resin include sorbitol polyglycidyl ether (Denacol EX-611, Denacol EX-612, Denacol EX-614, Denacol EX-614B, Denacol EX-622), Polyglycerol polyglycidyl ether (Denacol EX).
  • epoxy resins include trade names such as Epicoat 825, Epicoat 827, Epicoat 828, Epicoat 828EL, Epicoat 828XA, Epicoat 834, Epicoat 801, Epicoat 801P, Epicoat 802, Epicoat 815, Epicoat 815XA, Epicoat 816A, Epicoat 819, Epicoat 834X90, Epicoat 1001B80, Epicoat 1001X70, Epicoat 1001X75, Epicoat 1001T75, Epicoat 806, Epicoat 806P, Epicoat 807, Epicoat 152, Epicoat 154, Epicoat 871, Epicoat 191P, Epicoat YX310, Epicoat DX255, Epicoat YX8000, Etc. (above product name, di Bread epoxy resin) and the like.
  • Examples of the cationically polymerizable compound having an oxetanyl group include 3-ethyl-3-hydroxymethyloxetane (OXT-101) and 1,4-bis-3-ethyloxetane-3-ylmethoxymethylbenzene (OXT-121).
  • the radical polymerizable compound is a compound having two or more (meth) acryloyl groups in one molecule, and the cationic polymerizable compound has at least one epoxy group or oxetanyl group in two molecules. It is preferable that it is a compound from the point of the adhesiveness of a polyimide film and a hard-coat layer, and the point of light transmittance and surface hardness.
  • At least one polymer of the radical polymerizable compound and the cationic polymerizable compound contained in the hard coat layer used in the present disclosure is, for example, the radical polymerizable compound or the cationic polymerizable compound. It can be obtained by adding a polymerization initiator to at least one kind, if necessary, and carrying out a polymerization reaction by a known method.
  • a radical polymerization initiator a cationic polymerization initiator, a radical, a cationic polymerization initiator, and the like can be appropriately selected and used.
  • These polymerization initiators are decomposed by at least one of light irradiation and heating to generate radicals or cations to advance radical polymerization and cationic polymerization.
  • the radical polymerization initiator may be any substance that can release a substance that initiates radical polymerization by light irradiation and / or heating.
  • photo radical polymerization initiators include imidazole derivatives, bisimidazole derivatives, N-aryl glycine derivatives, organic azide compounds, titanocenes, aluminate complexes, organic peroxides, N-alkoxypyridinium salts, thioxanthone derivatives, and the like.
  • Irgacure 907 Irgacure 379, Irgacure 819, Irgacure 127, Irgacure 500, Irgacure 754, Irgacure 250, Irgacure 1800, Irgacure 1870 manufactured by Ciba Japan Co., Ltd. , Irgacure OXE01, DAROCUR TPO, DAROCUR1173, Japan Siber Hegner Co., Ltd.
  • the cationic polymerization initiator should just be able to discharge
  • the cationic polymerization initiator include sulfonic acid ester, imide sulfonate, dialkyl-4-hydroxysulfonium salt, arylsulfonic acid-p-nitrobenzyl ester, silanol-aluminum complex, ( ⁇ 6 -benzene) ( ⁇ 5 -cyclopentadidiene).
  • Enyl) iron (II) and the like and more specific examples include, but are not limited to, benzoin tosylate, 2,5-dinitrobenzyl tosylate, N-tosiphthalimide and the like.
  • radical polymerization initiators that can be used as cationic polymerization initiators include aromatic iodonium salts, aromatic sulfonium salts, aromatic diazonium salts, aromatic phosphonium salts, triazine compounds, iron arene complexes, and the like.
  • iodonium chloride such as diphenyliodonium, ditolyliodonium, bis (p-tert-butylphenyl) iodonium, bis (p-chlorophenyl) iodonium, bromide, borofluoride, hexafluorophosphate salt, hexafluoro Iodonium salts such as antimonate salts, chlorides of sulfonium such as triphenylsulfonium, 4-tert-butyltriphenylsulfonium, tris (4-methylphenyl) sulfonium, bromide, borofluoride, hexa Sulfonium salts such as fluorophosphate salts and hexafluoroantimonate salts, 2,4,6-tris (trichloromethyl) -1,3,5-triazine, 2-phenyl-4,6-bis (trichloromethyl) -1, 2,4,6-sub
  • the hard coat layer used in the present disclosure is, if necessary, an antistatic agent, an antiglare agent, an antifouling agent, inorganic or organic fine particles for improving hardness, You may contain additives, such as a leveling agent and various sensitizers.
  • the laminate of the present disclosure is not particularly limited as long as the polyimide film and the hard coat layer are positioned adjacent to each other, and the hard coat layer is provided on one surface of the polyimide film.
  • the hard coat layer may be laminated adjacently, or the hard coat layer may be laminated adjacent to both surfaces of the polyimide film.
  • the laminated body of the present disclosure is obtained by laminating other layers such as a gel containing urethane and acrylic resin in addition to the polyimide film and the hard coat layer as long as the effects of the present disclosure are not impaired. It may be.
  • the total thickness of the laminate of the present disclosure may be appropriately selected depending on the application, but is preferably 10 ⁇ m or more, and more preferably 40 ⁇ m or more from the viewpoint of strength. On the other hand, from the viewpoint of bending resistance, it is preferably 300 ⁇ m or less, and more preferably 250 ⁇ m or less.
  • the thickness of each hard coat layer may be appropriately selected depending on the application, but is preferably 2 ⁇ m or more and 80 ⁇ m or less, and more preferably 3 ⁇ m or more and 50 ⁇ m or less.
  • the pencil hardness on the hard coat layer side surface is preferably H or more, more preferably 2H or more, and even more preferably 3H or more.
  • the pencil hardness of the laminate of the present disclosure can be measured in the same manner as the pencil hardness of the polyimide film.
  • the total light transmittance measured in accordance with JIS K7361-1 is preferably 85% or more, more preferably 88% or more, and still more preferably 90% or more. Is preferred.
  • the total light transmittance of the laminate of the present disclosure can be measured in the same manner as the total light transmittance of the polyimide film measured according to JIS K7361-1.
  • the yellowness (YI value) calculated in accordance with JIS K7373-2006 is preferably 30 or less, more preferably 20 or less, and more preferably 15 or less. More preferred is 10 or less.
  • the yellowness (YI value) of the laminate of the present disclosure can be measured in the same manner as the yellowness (YI value) calculated based on JIS K7373-2006 of the polyimide film.
  • the haze value of the laminate of the present disclosure is preferably 10 or less, more preferably 8 or less, and even more preferably 5 or less from the viewpoint of light transmittance.
  • the haze value of the laminate of the present disclosure can be measured in the same manner as the haze value of the polyimide film.
  • the birefringence in the thickness direction at a wavelength of 590 nm of the laminate of the present disclosure is preferably 0.020 or less, preferably 0.015 or less, more preferably 0.010 or less, and still more. Preferably it is less than 0.008.
  • the birefringence of the laminate of the present disclosure can be measured in the same manner as the birefringence in the thickness direction at a wavelength of 590 nm of the polyimide film.
  • Manufacturing method of laminated body As a manufacturing method of the laminated body of the present disclosure, for example, Forming a coating film of a hard coat layer forming composition containing at least one of a radical polymerizable compound and a cationic polymerizable compound on at least one surface of the polyimide film of the present disclosure; And a step of curing the coating film.
  • the composition for forming a hard coat layer contains at least one of a radically polymerizable compound and a cationically polymerizable compound, and may further contain a polymerization initiator, a solvent, an additive, and the like as necessary.
  • a polymerization initiator e.g., a polymerization initiator, a solvent, an additive, and the like.
  • the radical polymerizable compound, cationic polymerizable compound, polymerization initiator and additive contained in the hard coat layer forming composition can be the same as those described in the hard coat layer.
  • the solvent can be appropriately selected from known solvents.
  • the hard coat layer forming composition is publicly known on at least one surface of the polyimide film.
  • coating means is mentioned.
  • the application means is not particularly limited as long as it is a method that can be applied with a target film thickness, and examples thereof include the same means as the means for applying the polyimide precursor resin composition to a support.
  • the solvent is removed by drying the coating film of the curable resin composition for a hard coat layer as necessary.
  • drying method include reduced-pressure drying or heat drying, and a method combining these drying methods.
  • ultraviolet rays For light irradiation, ultraviolet rays, visible light, electron beams, ionizing radiation, etc. are mainly used.
  • ultraviolet curing ultraviolet rays emitted from light such as an ultra-high pressure mercury lamp, a high pressure mercury lamp, a low pressure mercury lamp, a carbon arc, a xenon arc, and a metal halide lamp are used.
  • the irradiation amount of the energy ray source is about 50 to 5000 mJ / cm 2 as an integrated exposure amount at an ultraviolet wavelength of 365 nm.
  • the treatment When heating, the treatment is usually performed at a temperature of 40 ° C. or higher and 120 ° C. or lower. Moreover, you may react by leaving it to stand for 24 hours or more at room temperature (25 degreeC).
  • the surface material for display of one embodiment of this indication is a polyimide film of one embodiment of this indication mentioned above, or a layered product of one embodiment of this indication.
  • the display surface material of the present disclosure is arranged and used so as to be positioned on the surface of various displays.
  • the display surface material of the present disclosure is particularly suitable for a flexible display because it has improved bending resistance and sufficient surface hardness as a protective film, like the polyimide film of the present disclosure and the laminate of the present disclosure described above. Can be used.
  • the display surface material of the present disclosure like the polyimide film of the present disclosure and the laminated body of the present disclosure described above, has a reduced optical distortion, and therefore suppresses a decrease in display quality of the display. it can.
  • the display surface material of the present disclosure can be used for various known displays and is not particularly limited.
  • the display surface material can be used for the display described in the application of the polyimide film of the present disclosure.
  • the surface that becomes the outermost surface after the laminate is disposed on the surface of the display may be a polyimide film side surface, It may be the surface on the hard coat layer side. Especially, it is preferable to arrange
  • the method for disposing the display surface material of the present disclosure on the surface of the display is not particularly limited, and examples thereof include a method through an adhesive layer.
  • the adhesive layer a conventionally known adhesive layer that can be used for adhesion of a display surface material can be used.
  • the weight average molecular weight of the polyimide precursor was determined using GPC by using a polyimide precursor as an N-methylpyrrolidone (NMP) solution with a concentration of 0.5% by weight and using a 10 mmol% LiBr-NMP solution with a water content of 500 ppm or less as a developing solvent.
  • NMP N-methylpyrrolidone
  • Using an apparatus manufactured by Tosoh Corporation, HLC-8120, column used: GPC LF-804, manufactured by SHODEX
  • measurement was performed under the conditions of a sample injection amount of 50 ⁇ L, a solvent flow rate of 0.4 mL / min, and 40 ° C.
  • the weight average molecular weight of the polyimide precursor was determined based on a polystyrene standard sample having the same concentration as the sample.
  • ⁇ Viscosity of polyimide precursor solution The viscosity of the polyimide precursor solution was measured using a viscometer (for example, TVE-22HT, Toki Sangyo Co., Ltd.) at 25 ° C. and a sample amount of 0.8 ml.
  • the weight average molecular weight of polyimide was determined by using a GPC apparatus (manufactured by Tosoh Corporation) using polyimide as an N-methylpyrrolidone (NMP) solution having a concentration of 0.2% by weight and using as a developing solvent a 30 mmol% LiBr-NMP solution having a water content of 500 ppm or less.
  • NMP N-methylpyrrolidone
  • measurement was performed under the conditions of a sample injection amount of 50 ⁇ L, a solvent flow rate of 0.4 mL / min, and 40 ° C.
  • the weight average molecular weight of the polyimide was determined based on a polystyrene standard sample having the same concentration as the sample.
  • 2,2′-bis as the diamine component with respect to 1 mol of 4,4 ′-(hexafluoroisopropylidene) diphthalic anhydride (6FDA) as the acid dianhydride component When 0.9 mol of (trifluoromethyl) benzidine (TFMB) and 0.1 mol of 1,3-bis (3-aminopropyl) tetramethyldisiloxane (AprTMOS) are used, it can be calculated as follows. .
  • the both-end amine-modified diphenyl silicone oil of Comparative Example 3 manufactured by Shin-Etsu Chemical Co., Ltd .: X22-1660B-3, side chain phenyl type, number average molecular weight 4400
  • an amino group via — (CH 2 ) 3 — As a result, it is calculated that the number of repeating units of diphenylsiloxane is 19.7 on average from the number average molecular weight 4400, and an average of 21.7 silicon atoms are contained in one molecule.
  • the YI value is a transmittance measured by a spectrocolorimetric method stipulated in JIS Z8720 using an ultraviolet-visible near-infrared spectrophotometer (JASCO Corporation V-7100) in accordance with JIS K7373-2006. And calculated. Further, for example, the YI value at a thickness of 100 ⁇ m is the same as the Lambert for each transmittance at each wavelength measured at 5 nm intervals between 380 nm and 780 nm of a sample having a specific thickness. A converted value of each transmittance at each wavelength of different thickness can be obtained according to Beer's law, and calculated and used based on that.
  • the thickness direction retardation value (Rth) of the polyimide film was measured with a light of 25 ° C. and a wavelength of 590 nm using a phase difference measuring apparatus (product name “KOBRA-WR” manufactured by Oji Scientific Instruments).
  • a phase difference value at 0 ° incidence and a phase difference value at an incidence angle of 40 ° were measured, and a thickness direction retardation value Rth was calculated from these retardation values.
  • the retardation value at an oblique incidence of 40 degrees was measured by making light having a wavelength of 590 nm incident on the retardation film from a direction inclined by 40 degrees from the normal line of the retardation film.
  • the birefringence of the polyimide film was determined by substituting it into the formula: Rth / d (polyimide film thickness (nm)).
  • RSA III TA Instruments Japan Co., Ltd.
  • ⁇ Tensile modulus> A polyimide film test piece cut out to 15 mm ⁇ 40 mm was conditioned for 2 hours under the conditions of a temperature of 25 ° C. and a relative humidity of 60%, and in accordance with JIS K7127, the tensile speed was 10 mm / min and the distance between chucks was 20 mm. The tensile elastic modulus at 25 ° C. was measured. A tensile tester (manufactured by Shimadzu Corporation: Autograph AG-X 1N, load cell: SBL-1KN) was used.
  • Young's modulus of the surface of a test piece of polyimide film cut out to 15 mm ⁇ 15 mm was measured at a temperature of 25 ° C. according to ISO14577 using a nanoindentation method. Specifically, a PICODERTOR HM500 manufactured by Fisher Instruments Co., Ltd. was used as a measuring device, and a Vickers indenter was used as a measurement indenter. On the surface of the test piece, a value obtained by measuring eight arbitrary points and averaging the points was defined as Young's modulus. Measurement conditions were as follows: maximum indentation depth: 1000 nm, weighted time: 20 seconds, creep time: 5 seconds.
  • the metal piece 2 on which the test piece 1 was fixed was sandwiched between glass plates (100 mm ⁇ 100 mm ⁇ 0.7 mm) 3a and 3b from above and below, and the test piece 1 was fixed in a state of being bent with an inner diameter of 6 mm.
  • dummy test pieces 4a and 4b were sandwiched between portions of the metal piece 2 where the test piece 1 was not provided, and fixed with tape so that the glass plates 3a and 3b were parallel.
  • the glass plate and the test piece fixing tape are removed.
  • the force applied to the test piece was released. Thereafter, one end of the test piece was fixed, and the internal angle of the test piece was measured 30 minutes after releasing the force applied to the test piece.
  • the inner angle is 180 °.
  • ⁇ Dynamic bending test> A test piece of polyimide film cut out to a size of 20 mm ⁇ 100 mm was fixed with a tape on a constant temperature and humidity chamber endurance test system (manufactured by Yuasa System Equipment Co., Ltd., planar surface unloaded U-shaped expansion / contraction test jig DMX-FS). . After setting the test piece to be in the same folded state as in the static bending test, that is, the distance between both ends of the long side of the test piece in the folded state is 6 mm, it is 93 at 60 ⁇ 2 ° C.
  • Bending was repeated 200,000 times with 90 bendings per minute in an environment of ⁇ 2% relative humidity (RH) or 50 ⁇ 10% relative humidity (RH) at 25 ° C. ⁇ 2 ° C. Thereafter, 30 minutes after removing the test piece, one end of the obtained test piece was fixed, and the inner angle of the test piece was measured. In addition, when the film returns completely without being affected by the dynamic bending test, the inner angle becomes 180 °.
  • Pencil hardness is determined by adjusting the measured sample for 2 hours under the conditions of a temperature of 25 ° C. and a relative humidity of 60%, and then using a test pencil specified by JIS-S-6006. A pencil hardness test (0.98 N load) specified in JIS K5600-5-4 (1999) was performed on the film surface using a thickness tester, and the highest pencil hardness without scratches was evaluated.
  • a resin composition for a hard coat layer was prepared for property evaluation.
  • the hard coat layer resin composition is applied on a test piece of polyimide film cut out to 10 cm ⁇ 10 cm, and cured by irradiation with ultraviolet rays at an exposure amount of 200 mJ / cm 2 in a nitrogen stream to form a cured film having a thickness of 10 ⁇ m. And the laminated body was manufactured.
  • the cured film was subjected to a cross-cut test in accordance with JIS K 5600-5-6, and after repeated peeling operations with a tape 5 times, the presence or absence of peeling of the coating film was observed and evaluated according to the following evaluation criteria.
  • C After performing peeling operation with a tape once, the coating film peeled entirely along the edge of the cut.
  • Comparative polyimide precursor solution 1 (solid content 40 wt%) in which comparative polyimide precursor 1 was dissolved was synthesized.
  • the viscosity at 25 ° C. of the comparative polyimide precursor solution 1 (solid content 40% by weight) was 3900 cps, and the weight average molecular weight of the comparative polyimide precursor 1 measured by GPC was 42,000.
  • TFMB 2,2′-bis (trifluoromethyl) benzidine
  • PrMOS 1,3-bis (3-aminopropyl) tetramethyldisiloxane
  • BAPS-M bis [4- (3-aminophenoxy) phenyl] sulfone 6FDA: 4,4 '-(Hexafluoroisopropylidene) diphthalic anhydride
  • PMDA pyromellitic anhydride sBPDA: 3,3', 3,4'-biphenyltetracarboxylic dianhydride
  • Examples 1 to 6, Comparative Example 1 By using the polyimide precursor solutions 1 to 6 and the comparative polyimide precursor solution 1, the following steps (1) to (3) were performed to prepare polyimide films each having a thickness of 50 ⁇ m ⁇ 5 ⁇ m.
  • Each polyimide precursor solution was applied on glass and dried in a circulating oven at 120 ° C. for 10 minutes.
  • the temperature was raised to 350 ° C. at a temperature rising rate of 10 ° C./min, held at 300 ° C. for 1 hour, and then cooled to room temperature.
  • Synthesis Example 7 In Synthesis Example 1, instead of 2,2′-bis (trifluoromethyl) benzidine (TFMB), an equimolar amount of bis [4- (3-aminophenoxy) phenyl] sulfone (BAPS-M) was used. A polyimide precursor solution 7 was synthesized in the same manner as in Synthesis Example 1 except that the solid content concentration was 30% by weight. The viscosity at 25 ° C. of the obtained polyimide precursor solution and the weight average molecular weight of the polyimide precursor are also shown in Table 3.
  • TFMB 2,2′-bis (trifluoromethyl) benzidine
  • BAPS-M bis [4- (3-aminophenoxy) phenyl] sulfone
  • Synthesis Example 8 Synthesis Example 6 except that instead of 4,4 ′-(hexafluoroisopropylidene) diphthalic anhydride (6FDA), an equimolar amount of the acid dianhydride component shown in Table 4 was used in Synthesis Example 6.
  • the polyimide precursor solution 8 was synthesized by the same method as in FIG. Table 4 shows the viscosity at 25 ° C. of the obtained polyimide precursor solution 8 (solid content 30% by weight) and the weight average molecular weight of the polyimide precursor 8 together.
  • polyimide precursor solution 9 solid content 30 wt% in which the polyimide precursor 9 was dissolved was added. Synthesized. The molar ratio of TFMB used for polyimide precursor 9 to AprTMOS was 50:50. The viscosity of the polyimide precursor solution 9 at 25 ° C. was 5380 cps, and the weight average molecular weight of the polyimide precursor 9 measured by GPC was 62000.
  • Example 7 Using polyimide precursor solutions 7 to 9, polyimide films were produced in the same manner as in Example 1, and the obtained polyimide films were evaluated using the evaluation methods described above. The evaluation results are shown in Table 5.
  • the polyimide film of Example 8 had another small tan ⁇ peak at around 250 ° C. in the glass transition temperature measurement.
  • Comparative Synthesis Example 3 A solution in which 169.5 g of dehydrated dimethylacetamide and 32.0 g (100 mmol) of 2,2′-bis (trifluoromethyl) benzidine (TFMB) were dissolved in a 500 ml separable flask at a liquid temperature of 30 ° C. To the controlled place, 21.7 g (99.5 mmol) of pyromellitic dianhydride (PMDA) was gradually added in several times so that the temperature rise was 2 ° C. or less.
  • Comparative polyimide precursor 3 A comparative polyimide precursor solution 3 (solid content 20% by weight) was dissolved. The viscosity of the comparative polyimide precursor solution 3 at 25 ° C. was 23400 cps, and the weight average molecular weight of the comparative polyimide precursor 3 measured by GPC was 82800.
  • Comparative Examples 2-3 Using comparative polyimide precursor solutions 2 to 3, polyimide films were produced in the same manner as in Example 1, and the obtained polyimide films were evaluated using the evaluation methods described above. Table 7 shows the evaluation results.
  • the polyimide films of Examples 1 to 9 corresponding to the polyimide film of the present disclosure were able to suppress the decrease in surface hardness while improving the bending resistance, particularly the static bending resistance. It was shown to be a resin film.
  • the polyimide films of Examples 1 to 9 were excellent in adhesion to the hard coat layer.
  • the polyimide film of Comparative Example 1 has a static bending test result of 0 degree, and the bending resistance is inferior and the pencil hardness is greatly inferior to the extent that the film does not return to the folded state of the static bending test. It was.
  • the polyimide film of Comparative Example 2 was inferior in static bending resistance, greatly inferior in pencil hardness, and further poor in adhesion with the hard coat layer. Furthermore, although the polyimide film of Comparative Example 3 had a large elastic modulus and good surface hardness, it was inferior in bending resistance and poor in adhesion to the hard coat layer.
  • Example 10 Preparation of polyimide (chemical imidization) A solution in which dehydrated dimethylacetamide (300.0 g) and 1,3-bis (3-aminopropyl) tetramethyldisiloxane (AprTMOS) (3.83 g, 15 mmol) are dissolved in a 500 mL separable flask To the place where the liquid temperature was controlled at 30 ° C., 4,4 ′-(hexafluoroisopropylidene) diphthalic anhydride (6FDA) (3.42 g, 7.7 mmol) was added so that the temperature rise would be 2 ° C. or less. The mixture was gradually added to and stirred with a mechanical stirrer for 1 hour.
  • AprTMOS 1,3-bis (3-aminopropyl) tetramethyldisiloxane
  • the weight average molecular weight of the polyimide measured by GPC was 125000.
  • (2) Production of polyimide film Polyimide 1 was dissolved in a mixed solvent of butyl acetate and PGMEA (8: 2, volume ratio) to prepare a polyimide solution 1 having a solid content of 25% by mass. The viscosity of the polyimide solution 1 (solid content: 25% by weight) at 25 ° C. was 21630 cps. Using the polyimide solution 1 obtained as described above, the following steps (i) to (iii) were carried out to produce a polyimide film having a thickness of 50 ⁇ m ⁇ 5 ⁇ m. (I) The polyimide solution 1 was applied on glass and dried in a circulating oven at 120 ° C.
  • Example 11 to 12 (1) Preparation of polyimide (chemical imidization) The procedure of synthesizing the polyimide of Example 10 was carried out by adjusting the diamine ratios shown in Table 8 to obtain polyimides 2 to 3. (2) Manufacture of polyimide film In Example 10, instead of polyimide 1, polyimide 2 or polyimide 3 was used, except that the solid content concentration shown in Table 8 was adjusted. Polyimide solutions 2 to 3 shown in Table 8 were obtained. In Example 10, polyimide films of Examples 11 to 12 were obtained in the same manner as Example 10 except that polyimide solutions 2 to 3 were used instead of polyimide solution 1.
  • Comparative Example 4 (1) Preparation of comparative polyimide 1 (chemical imidization) Into a 500 ml separable flask was added dehydrated dimethylformamide (144.0 g) and 2,2-bis- [4- (4-aminophenoxy) phenyl] -1,1,1,3,3,3-hexafluoro. Propane (HFBAPP) (31.2 g, 60 mmol) was added and stirred until completely dissolved. The solution was cooled to 0 ° C., and 4,4 ′-(hexafluoroisopropylidene) diphthalic anhydride (6FDA) (39.9 g, 90 mmol) was gradually added and stirred until dissolved.
  • HFBAPP 2,2-bis- [4- (4-aminophenoxy) phenyl] -1,1,1,3,3,3-hexafluoro.
  • HFBAPP 2,2-bis- [4- (4-aminophenoxy) phenyl] -1,1,1,3,3,3
  • silicone diamine KF-8010 (trade name, manufactured by Shin-Etsu Silicone, molecular weight 860) was added and stirred for 4 hours to obtain a polyamic acid solution.
  • ⁇ picoline as a catalyst (8.4 g, 90 mmol) and acetic anhydride (55.2 g, 540 mmol) are added to the above solution and stirred in an oil bath at 100 ° C. for 1 hour to obtain a polyimide solution. It was.
  • the obtained polyimide solution was dropped into a large amount of isopropyl alcohol (IPA) to precipitate the polyimide.
  • IPA isopropyl alcohol
  • the polyimide obtained by filtration extraction was stirred and washed in IPA. After filtration again, the polyimide was sufficiently dried at 80 ° C. under reduced pressure to obtain comparative polyimide 1.
  • the weight average molecular weight of the comparative polyimide 1 measured by GPC was 199000.
  • Comparative polyimide 1 was dissolved in dimethylformamide (DMF) to prepare comparative polyimide solution 1 having a solid content of 30% by mass.
  • the viscosity of the comparative polyimide solution 1 (solid content 30% by weight) at 25 ° C. was 48630 cps.
  • a polyimide film having a thickness of 50 ⁇ m ⁇ 5 ⁇ m was prepared by blending the chemical imidization solution 4 so as to have a solid content of 33.3 wt% and performing the following procedures (iv) to (v).
  • (Iv) Comparative polyimide solution 1 was applied on glass, dried in a circulating oven at 80 ° C. for 15 minutes, and then dried at 250 ° C. for 5 minutes.
  • the polyimide films of Examples 10 to 12 corresponding to the polyimide film of the present disclosure were resin films in which the decrease in surface hardness was suppressed while improving the bending resistance.
  • the polyimide film of Comparative Example 4 had good bending resistance but was inferior in pencil hardness and easily damaged on the surface.

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Abstract

L'invention concerne un film de polyimide contenant un polyimide dans lequel a été introduite une quantité spécifique d'un squelette moléculaire ayant un ou deux atomes de silicium dans sa chaîne principale; présentant un facteur de transmission lumineuse total de 85 % ou plus, tel que mesuré selon JIS K7373-1; présentant un indice de jaunissement de 30 ou moins, tel que calculé selon JIS K7373-2006; présentant une température de transition vitreuse comprise dans la plage de températures de 150 à 400°C; et présentant un module d'élasticité en traction à 25°C de 1,8 GPa ou plus, tel que mesuré selon JIS K7127, le module d'élasticité en traction étant mesuré par utilisation d'une éprouvette de 15 mm × 40 mm pour une vitesse de traction de 10 mm/min et une distance entre mâchoires de 20 mm.
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Cited By (4)

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Publication number Priority date Publication date Assignee Title
WO2019013169A1 (fr) * 2017-07-12 2019-01-17 大日本印刷株式会社 Film de polyimide, stratifié, matériau pour surface d'affichage, élément à ecran tactile, dispositif d'affichage à cristaux liquides et dispositif d'affichage électroluminescent organique
WO2020004293A1 (fr) * 2018-06-25 2020-01-02 大日本印刷株式会社 Film de polyimide, matériau de polyimide, corps stratifié, élément destiné à un afficheur, élément de panneau tactile, dispositif d'affichage à cristaux liquides et dispositif d'affichage électroluminescent organique
JP2020002353A (ja) * 2018-06-25 2020-01-09 大日本印刷株式会社 ポリイミドフィルム、ポリイミド材料、積層体、ディスプレイ用部材、タッチパネル部材、液晶表示装置、及び有機エレクトロルミネッセンス表示装置
JP2023503481A (ja) * 2019-11-29 2023-01-30 ピーアイ・アドバンスド・マテリアルズ・カンパニー・リミテッド ポリイミドフィルムおよびその製造方法

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JPH05341291A (ja) * 1992-06-04 1993-12-24 Sumitomo Bakelite Co Ltd 液晶表示素子用配向膜
JPH10114824A (ja) * 1996-07-18 1998-05-06 Reitetsuku Kk ポリイミド類の製造方法、組成物およびその製品
JP2000017072A (ja) * 1998-06-30 2000-01-18 Nitto Denko Corp 熱融着性ポリイミド樹脂フィルムおよびこれを用いた半導体装置ならびにその製法、それに用いる半導体装置用テープキャリア
JP2000026602A (ja) * 1998-07-07 2000-01-25 Nitto Denko Corp 熱融着性ポリイミド樹脂フィルムおよびこれを用いた半導体装置ならびに多層配線板
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WO2005084948A1 (fr) * 2004-03-04 2005-09-15 Toray Industries, Inc. Film laminé en résine thermo-résistante, film multicouches avec couche métallique et dispositif semi-conducteur
JP2006253185A (ja) * 2005-03-08 2006-09-21 Toray Ind Inc ポリイミドフィルム、及びこれを用いた耐熱性樹脂積層フィルム、金属層付き積層フィルム
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JPH05341291A (ja) * 1992-06-04 1993-12-24 Sumitomo Bakelite Co Ltd 液晶表示素子用配向膜
JPH10114824A (ja) * 1996-07-18 1998-05-06 Reitetsuku Kk ポリイミド類の製造方法、組成物およびその製品
JP2000017072A (ja) * 1998-06-30 2000-01-18 Nitto Denko Corp 熱融着性ポリイミド樹脂フィルムおよびこれを用いた半導体装置ならびにその製法、それに用いる半導体装置用テープキャリア
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JP2000160007A (ja) * 1998-11-30 2000-06-13 Nitto Denko Corp 熱融着性ポリイミド樹脂フィルム及びこれを用いた半導体装置並びに多層配線板。
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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019013169A1 (fr) * 2017-07-12 2019-01-17 大日本印刷株式会社 Film de polyimide, stratifié, matériau pour surface d'affichage, élément à ecran tactile, dispositif d'affichage à cristaux liquides et dispositif d'affichage électroluminescent organique
JPWO2019013169A1 (ja) * 2017-07-12 2020-05-07 大日本印刷株式会社 ポリイミドフィルム、積層体、ディスプレイ用表面材、タッチパネル部材、液晶表示装置、及び有機エレクトロルミネッセンス表示装置
JP7226312B2 (ja) 2017-07-12 2023-02-21 大日本印刷株式会社 ポリイミドフィルム、積層体、ディスプレイ用表面材、タッチパネル部材、液晶表示装置、及び有機エレクトロルミネッセンス表示装置
WO2020004293A1 (fr) * 2018-06-25 2020-01-02 大日本印刷株式会社 Film de polyimide, matériau de polyimide, corps stratifié, élément destiné à un afficheur, élément de panneau tactile, dispositif d'affichage à cristaux liquides et dispositif d'affichage électroluminescent organique
JP2020002353A (ja) * 2018-06-25 2020-01-09 大日本印刷株式会社 ポリイミドフィルム、ポリイミド材料、積層体、ディスプレイ用部材、タッチパネル部材、液晶表示装置、及び有機エレクトロルミネッセンス表示装置
JP7388011B2 (ja) 2018-06-25 2023-11-29 大日本印刷株式会社 ポリイミドフィルム、ポリイミド材料、積層体、ディスプレイ用部材、タッチパネル部材、液晶表示装置、及び有機エレクトロルミネッセンス表示装置
JP2023503481A (ja) * 2019-11-29 2023-01-30 ピーアイ・アドバンスド・マテリアルズ・カンパニー・リミテッド ポリイミドフィルムおよびその製造方法
JP7382505B2 (ja) 2019-11-29 2023-11-16 ピーアイ・アドバンスド・マテリアルズ・カンパニー・リミテッド ポリイミドフィルムおよびその製造方法

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