WO2018008420A1 - 流量制御機器、流量制御機器の流量校正方法、流量測定機器および流量測定機器を用いた流量測定方法 - Google Patents
流量制御機器、流量制御機器の流量校正方法、流量測定機器および流量測定機器を用いた流量測定方法 Download PDFInfo
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
- G01F15/00—Details of, or accessories for, apparatus of groups G01F1/00 - G01F13/00 insofar as such details or appliances are not adapted to particular types of such apparatus
- G01F15/005—Valves
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
- G01F1/00—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow
- G01F1/05—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by using mechanical effects
- G01F1/34—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by using mechanical effects by measuring pressure or differential pressure
- G01F1/36—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by using mechanical effects by measuring pressure or differential pressure the pressure or differential pressure being created by the use of flow constriction
- G01F1/40—Details of construction of the flow constriction devices
- G01F1/42—Orifices or nozzles
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
- G01F1/00—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow
- G01F1/05—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by using mechanical effects
- G01F1/34—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by using mechanical effects by measuring pressure or differential pressure
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
- G01F25/00—Testing or calibration of apparatus for measuring volume, volume flow or liquid level or for metering by volume
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
- G01F25/00—Testing or calibration of apparatus for measuring volume, volume flow or liquid level or for metering by volume
- G01F25/0084—Testing or calibration of apparatus for measuring volume, volume flow or liquid level or for metering by volume for measuring volume
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
- G01F25/00—Testing or calibration of apparatus for measuring volume, volume flow or liquid level or for metering by volume
- G01F25/10—Testing or calibration of apparatus for measuring volume, volume flow or liquid level or for metering by volume of flowmeters
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
- G01F25/00—Testing or calibration of apparatus for measuring volume, volume flow or liquid level or for metering by volume
- G01F25/10—Testing or calibration of apparatus for measuring volume, volume flow or liquid level or for metering by volume of flowmeters
- G01F25/13—Testing or calibration of apparatus for measuring volume, volume flow or liquid level or for metering by volume of flowmeters using a reference counter
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
- G01F25/00—Testing or calibration of apparatus for measuring volume, volume flow or liquid level or for metering by volume
- G01F25/10—Testing or calibration of apparatus for measuring volume, volume flow or liquid level or for metering by volume of flowmeters
- G01F25/15—Testing or calibration of apparatus for measuring volume, volume flow or liquid level or for metering by volume of flowmeters specially adapted for gas meters
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- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D7/00—Control of flow
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
- G01F1/00—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow
- G01F1/05—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by using mechanical effects
- G01F1/34—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by using mechanical effects by measuring pressure or differential pressure
- G01F1/36—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by using mechanical effects by measuring pressure or differential pressure the pressure or differential pressure being created by the use of flow constriction
- G01F1/363—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by using mechanical effects by measuring pressure or differential pressure the pressure or differential pressure being created by the use of flow constriction with electrical or electro-mechanical indication
Definitions
- the present invention relates to a flow rate control device, a flow rate calibration method for the flow rate control device, a flow rate measurement device, and a flow rate measurement method using the flow rate measurement device.
- a gas supply system provided in a semiconductor manufacturing apparatus or the like generally supplies gas by switching to a gas use target such as a process chamber by a flow rate control device provided with various types of gas for each supply gas type. It is configured.
- a pressure flow rate control device or a thermal flow rate control device (MFC) calibrated to a predetermined accuracy is used to control the gas flow rate.
- the flow control device is "set point (SP) XX%” with respect to the standard flow rate specified by each manufacturer (can control a flow rate with an error within ⁇ XX% with respect to the flow rate setting)
- the accuracy is determined as “full scale (FS) XX%” (the flow rate can be controlled within ⁇ % of the maximum flow rate with respect to the flow rate setting).
- each of the above flow rate control devices it is desired to check the flow rate accuracy and perform flow rate calibration at any time.
- the rate of rise (ROR) method has a high flow rate accuracy. Confirmation or flow rate calibration may be used.
- Patent Document 1 describes an example of a flow rate measurement method by the ROR method.
- the flow path from the on-off valve on the downstream side of the flow rate control device connected to each gas supply line to the on-off valve provided in the common gas supply path is used as a reference capacity.
- the flow rate is measured based on the pressure increase rate in the flow path.
- the volume of the reference capacity used in the ROR method varies depending on the piping design and manufacturing tolerances
- the volume of the reference capacity is set by using the flow rate setting set in the flow rate calibrated device for each gas supply system. Will be calculated.
- the flow rate control device has been calibrated, there is an error in a predetermined allowable range between the flow rate setting set in the flow rate control device and the control flow rate controlled in response to the flow rate setting.
- the flow rate includes the predetermined tolerance of the flow control device. That is, since the volume of the reference volume used in the calculation formula of the flow rate Q includes the error, there remains a problem that the flow rate cannot be accurately measured as a result.
- the error in the predetermined allowable range of the flow rate setting and the control flow rate can be reduced by repeatedly performing calibration, but realistic drawing is performed in consideration of the time and cost required for calibration. Yes.
- the present invention has been made in view of the above problems, and is a flow rate calibration of a flow rate control device for realizing a highly accurate flow rate measurement method using a flow rate measurement device in a relatively short time while suppressing costs. Its main purpose is to provide a method.
- a flow rate control device calibration method is a flow rate control device calibration method for performing flow rate calibration based on a comparison with a flow rate measured by a flow rate reference device.
- a predetermined allowable error range is set, and an allowable error range of at least one specific flow rate setting among the plurality of flow rate settings is set smaller than the predetermined allowable error range.
- a flow control device is a flow control device calibrated by the flow rate calibration method.
- the flow control device has a storage device, and information for identifying the at least one specific flow rate setting is stored in the storage device.
- the flow control device is used to measure the volume of a reference capacity connected downstream of the flow control device.
- a flow measurement device is a flow measurement device that is connected to the downstream side of the flow control device and measures the flow rate of gas flowing into the reference capacity, and measures the pressure of the reference capacity.
- a pressure sensor, and a temperature sensor that measures the temperature of the reference capacity, the volume of the reference capacity measured by flowing gas from the flow control device to the reference capacity at the at least one specific flow rate setting; The flow rate is measured based on the pressure change rate in the reference capacity and the temperature of the reference capacity.
- a flow rate measurement method includes a flow rate control device, a reference capacity provided on the downstream side of the flow rate control device, and a flow rate measurement device that measures a flow rate of gas flowing into the reference capacity.
- a flow rate measurement method performed in a supply system the step of calibrating the flow rate of the flow rate control device based on a comparison with a flow rate measured by a flow rate reference device, wherein a predetermined tolerance is set for a plurality of flow rate settings.
- An error range is set, and an allowable error range of at least one specific flow rate setting among the plurality of flow rate settings is set to be smaller than the predetermined allowable error range; and at the at least one specific flow rate setting, the step Measuring a volume of the reference capacity by flowing a gas from a flow control device to the reference capacity; and Including a pressure change rate of the reference capacity when allowed to flow into the scan, and the temperature of the reference capacitance, and measuring the flow rate based on the volume of the measured reference capacitance.
- a flow rate measurement method includes a plurality of gas supply lines connected to a plurality of gas supply sources, a plurality of flow rate control devices respectively provided in the plurality of gas supply lines, and the plurality of gases.
- a plurality of first valves respectively provided in the supply line; a common gas supply line commonly connected to the plurality of gas supply lines on the downstream side of the plurality of first valves; and the common gas supply line.
- a second valve a pressure sensor for measuring a pressure in a flow path between the plurality of first valves and the second valve, and a flow path between the plurality of first valves and the second valve.
- a flow path between the plurality of first valves and the second valve is used as a reference capacity, and the second valve is closed before the second valve is closed.
- a flow rate measurement for measuring a gas flow rate based on a pressure change indicated by the pressure sensor and a temperature indicated by the temperature sensor when the gas is supplied to the reference capacity via any one of a plurality of flow rate control devices.
- a method is provided wherein at least one flow control device of the plurality of flow control devices is subjected to flow calibration based on a comparison with a flow measured by a flow reference device before being incorporated into the flow control system.
- a predetermined allowable error range is set for a plurality of flow rate settings, and an allowable error range of at least one specific flow rate setting among the plurality of flow rate settings is set to be smaller than the predetermined allowable error range.
- the base is provided by flowing gas at the at least one specific flow setting. Perform the measurement of the volume of the capacity to measure the flow rate using the measured volume.
- a flow rate measurement method includes a plurality of gas supply lines connected to a plurality of gas supply sources, a plurality of flow rate control devices respectively provided in the plurality of gas supply lines, and the plurality of gases.
- a plurality of first valves respectively provided in the supply line; a common gas supply line commonly connected to the plurality of gas supply lines on the downstream side of the plurality of first valves; and the common gas supply line.
- a second valve a pressure sensor for measuring a pressure in a flow path between the plurality of first valves and the second valve, and a flow path between the plurality of first valves and the second valve.
- a flow path between the plurality of first valves and the second valve is used as a reference capacity, and the second valve is closed before the second valve is closed.
- at least one of the plurality of flow control devices is subjected to flow calibration based on a comparison with the flow measured by the flow reference device before being incorporated into the flow control system.
- a predetermined permissible error range is set for a plurality of flow rate settings, and at least one specific flow rate setting among the plurality of flow rate settings, the flow rate measured by the flow rate reference device is the at least one specific flow rate setting.
- the volume of the reference capacity is measured by flowing gas at at least one specific flow rate setting, the reference capacity is measured using the flow rate measured by the flow rate reference device stored in the storage device of the flow rate control device. Is measured, and the flow rate is measured using the measured volume.
- FIG. 1 shows a gas supply system 1 according to an embodiment of the present invention configured to supply gases from a plurality of gas supply sources 4 to a process chamber 2 of a semiconductor manufacturing apparatus via a flow rate control device 10. Show.
- the gas supply system 1 includes a plurality of gas supply lines L1 to which a plurality of gas supply sources 4 can be connected, a plurality of flow rate control devices 10 respectively interposed in the plurality of gas supply lines L1, and the plurality of flow rate controls.
- a first valve 21 installed on the downstream side of the device 10, a common gas supply line L2 joined by the gas supply line L1, a second valve 22 installed in the common gas supply line L2, and a first valve 21
- a pressure sensor 23 and a temperature sensor 24 for measuring the pressure and temperature of the flow path between the pressure sensor 23 and the second valve 22, and an arithmetic control device 25 that receives outputs from the pressure sensor 23 and the temperature sensor 24.
- the downstream side of the gas supply system 1 is connected to the process chamber 2 that consumes the gas via the valve 22 so that the gas can be supplied.
- a vacuum pump 3 is connected to the process chamber 2, and the process chamber 2, the gas supply paths L1, L2, and the like can be evacuated as necessary.
- the gas supply line L1 and the common gas supply line may be provided with another gas line branched to another and a valve for realizing the function.
- a valve for realizing the function for example, a fluid operation valve such as AOV, or an electric operation valve such as an electromagnetic valve or an electric valve is preferably used.
- the first valve 21 may be an on-off valve built in the flow control device 10.
- the arithmetic control device 25 may be an external processing device such as a computer, or a flow rate measuring device 30 that is integrally provided with a pressure sensor 23 and a temperature sensor 24 (and a second valve 22) as shown in the figure. It may be a processing device provided (a control circuit including a processor and a memory).
- FIG. 2 is a diagram illustrating a configuration example of a pressure type flow rate control device 10a used as an example of the flow rate control device 10 of the present embodiment.
- the pressure type flow control device 10a includes a throttle part (for example, an orifice plate) 11 having a fine opening (orifice), a control valve 14 provided on the upstream side of the throttle part 11, a drive part 15 of the control valve 14, and a throttle part. 11 and a control valve 14, a pressure sensor 12 and a temperature sensor 13 are provided.
- the pressure type flow rate control device 10a described above is configured to control the flow rate by measuring and controlling the upstream pressure P1, but the type used as the flow rate control device 10 is such a pressure type.
- the flow rate control device is not limited, and for example, a thermal flow rate control device (MFC) or other flow rate control device may be used.
- MFC thermal flow rate control device
- the flow path between the first valve 21 and the second valve 22 (the portion indicated by the thick line in FIG. 1) is used as the reference capacity 20 (volume Vs), and ROR
- the flow rate can be measured by the method. Specifically, after the inside of the flow path is evacuated, the first valve 21 corresponding to any one of the plurality of flow rate control devices 10 is opened to flow gas to the reference capacity 20 and the second valve 22.
- the volume Vs of the reference capacity 20 is obtained by an appropriate method after the gas supply system 1 is constructed by connecting a plurality of flow rate control devices 10 by piping or the like.
- R is a gas constant
- T is a gas temperature.
- the volume Vs of the reference capacity 20 is obtained based on the flow rate setting Qs set in the flow rate control device 10 and ⁇ P / ⁇ t generated by the flow rate control device controlled by the flow rate setting Qs.
- the obtained volume Vs of the reference capacity also includes an error.
- the flow rate control device 10 measures the control flow rate controlled according to the flow rate setting Qs with the flow rate reference device before being incorporated in the gas supply system 1, and the difference between the flow rate indicated by the flow rate reference device and the flow rate setting Qs. Is calibrated to be within tolerance.
- the flow rate standard used for calibration is prepared in advance so that an accurate flow rate can be shown with very high accuracy.
- the flow rate reference device for example, an arbitrary flow rate sensor such as a mole block (manufactured by DH Instruments) or a mass flow meter in which flow rate calibration is strictly performed based on the actual flow rate can be used.
- the flow rate control device 10 measures the flow rate setting Qs and the control flow rate controlled by receiving the flow rate setting Qs with the flow rate reference device, and compares it with the flow rate measured by the flow rate reference device. Calibration is performed at a plurality of flow rate settings.
- the plurality of flow rate settings correspond to, for example, a flow rate of 0 to 100% when the maximum flow rate setting is 100% flow rate.
- the flow rate setting for calibration may be a discrete flow rate setting every 10%, such as 10% flow rate, 20% flow rate,..., 90% flow rate, 100% flow rate, or continuous.
- the flow rate may be set.
- FIG. 3 shows a predetermined allowable error range R1 (specification range) provided for the entire flow rate setting Qs.
- R1 specification range
- a specific flow rate setting Qs0 for example, 50 sccm
- a flow rate reference for example, a flow rate setting of the plurality of flow rate settings described above
- the above calibration operation is performed until the difference from the reference flow rate indicated by the vessel satisfies a reference that is smaller than the predetermined allowable error range R1 (specification range).
- R1 predetermined allowable error range
- the specific flow rate setting Qs0 may be an arbitrary flow rate setting and may be appropriately selected by the user.
- the specific flow rate setting Qs0 may be stored in a storage device (memory) included in the flow control device 10 as a flow rate setting in which an error from the reference flow rate is reduced.
- the allowable error range from the reference flow rate is set to be smaller than the allowable error range in other flow rate settings in one or more specific flow rate settings Qs0.
- the set point is ⁇ 1% or less
- the full scale is ⁇ 0.1% or less.
- the specific flow rate setting Qs is 10% or less of the maximum flow rate
- the error is less than full scale ⁇ 0.1% (for example, full scale ⁇ 0.05% or less). It is set within the range.
- the measurement of the volume Vs of the reference capacity can be performed by, for example, the flow measuring device 30 provided with the arithmetic control device 25 shown in FIG.
- Information for identifying the flow control device 10 on which the calibration operation has been performed and information for identifying the specific flow rate setting Qs0 in the flow control device 10 are input to the flow measurement device 30.
- Information for identifying the specific flow rate setting Qs0 may be input in advance to the flow measurement device 30 and stored in the memory of the arithmetic control device 25, or read from the memory of the flow control device 10 when measuring the volume Vs. May be.
- step S1 evacuation is performed by the vacuum pump 3 with all the first valves 21 closed and the second valves 22 opened in the gas supply system 1, and the reference capacity 20 is exhausted. Is done.
- step S2 the flow rate is set to the specific flow rate setting Qs0 by the flow rate control device 10 that has been subjected to the flow rate calibration described above.
- step S3 the first valve 21 on the downstream side of the flow rate control device 10 is opened, and the gas is caused to flow to the reference capacity 20 with the specific flow rate setting Qs0. Then, after a predetermined time when the gas flow is stabilized, the second valve 22 is closed as shown in step S4. Thereby, the pressure in the reference capacity 20 starts to rise.
- the time ⁇ t can be counted from the sampling period of the pressure sensor 23, for example.
- the volume Vs can be calculated.
- the volume Vs of the reference capacity 20 obtained in this way is obtained using the flow rate setting Qs0 with a small error that has been subjected to high-precision calibration, and thus has high accuracy.
- the flow rate can be measured in the same steps as those described above by the ROR method using the volume Vs of the reference capacity obtained as described above.
- the reference capacity 20 is evacuated by the vacuum pump 3 with all the first valves 21 closed and the second valves 22 opened. And the 1st valve 21 provided in the downstream of any one arbitrary flow controller 10 is opened, and gas is flowed by arbitrary flow setting Qs via the flow controller 10.
- the second valve 22 is closed after a lapse of a predetermined time when the gas flow is stable.
- the flow rate Q measured as described above may be used for comparison and verification with the flow rate setting Qs of the flow control device 10, and based on the flow rate Q obtained by the ROR method described above,
- the flow rate setting Qs can also be calibrated.
- gas is flowed at the specific flow rate setting Qs0 for which a particularly strict calibration operation has been performed in advance, and the volume Vs of the reference capacity 20 is measured using the specific flow rate setting Qs0 at that time.
- the flow rate Qs0 ′ indicated by the flow rate reference device in the specific flow rate setting Qs0 is stored in a memory or the like in association with the specific flow rate setting Qs0, and the flow rate Qs0 ′ is used as a reference instead. You may make it use when calculating
- the flow rate indicated by the flow rate reference unit in the calibration operation may be 49.9 sccm.
- Volume Vs is obtained from Vs / RT.
- the flow rate control device to which the flow rate calibration method according to the embodiment of the present invention is applied is used, the flow rate can be accurately measured even after being incorporated into the gas supply system.
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Abstract
Description
2 プロセスチャンバ
3 真空ポンプ
4 ガス供給源
10 流量制御機器
11 絞り部
12 圧力センサ
13 温度センサ
14 制御バルブ
15 駆動部
16 制御回路
20 基準容量
21 第1バルブ
22 第2バルブ
23 圧力センサ
24 温度センサ
25 演算制御装置
30 流量測定機器
Claims (8)
- 流量基準器により計測された流量との比較のもとに流量校正を行う流量制御機器の校正方法であって、複数の流量設定に対して所定許容誤差範囲が設定され、前記複数の流量設定のうちの少なくとも1つの特定流量設定の許容誤差範囲が、前記所定許容誤差範囲よりも小さく設定される、流量制御機器の流量校正方法。
- 請求項1に記載の流量校正方法によって校正された流量制御機器。
- 記憶装置を有し、前記少なくとも1つの特定流量設定を識別する情報が前記記憶装置に格納されている、請求項2に記載の流量制御機器。
- 前記流量制御機器の下流側に接続された基準容量の体積を測定するために用いられる、請求項2または3に記載の流量制御機器。
- 請求項4に記載の流量制御機器の下流側に接続され、前記基準容量に流入するガスの流量を測定する流量測定機器であって、
前記基準容量の圧力を測定する圧力センサと、前記基準容量の温度を測定する温度センサとを備え、
前記流量制御機器から前記少なくとも1つの特定流量設定で前記基準容量にガスを流すことによって測定された前記基準容量の体積と、前記基準容量における圧力変化率と、前記基準容量の温度とに基づいて流量を測定するように構成されている、流量測定機器。 - 流量制御機器と、前記流量制御機器の下流側に設けられた基準容量と、前記基準容量に流入するガスの流量を測定する流量測定機器とを備えるガス供給システムにおいて行われる流量測定方法であって、
流量基準器により計測された流量との比較のもとに前記流量制御機器の流量校正を行うステップであって、複数の流量設定に対して所定許容誤差範囲が設定され、前記複数の流量設定のうちの少なくとも1つの特定流量設定の許容誤差範囲が、前記所定許容誤差範囲よりも小さく設定される、ステップと、
前記少なくとも1つの特定流量設定で前記流量制御機器から前記基準容量にガスを流すことによって前記基準容量の体積を測定するステップと、
前記流量測定機器において、前記基準容量にガスを流入させた時の前記基準容量の圧力変化率と、前記基準容量の温度と、前記測定された基準容量の体積とに基づいて流量を測定するステップと
を包含する流量測定方法。 - 複数のガス供給源にそれぞれ接続された複数のガス供給ラインと、
前記複数のガス供給ラインにそれぞれ設けられた複数の流量制御機器と、
前記複数のガス供給ラインにそれぞれ設けられた複数の第1バルブと、
前記複数の第1バルブの下流側において前記複数のガス供給ラインに共通に接続された共通ガス供給ラインと、
前記共通ガス供給ラインに設けられた第2バルブと、
前記複数の第1バルブと前記第2バルブとの間の流路の圧力を測定する圧力センサと、
前記複数の第1バルブと前記第2バルブとの間の流路の温度を測定する温度センサとを備えるガス供給システムにおいて、
前記複数の第1バルブと前記第2バルブとの間の流路を基準容量として用い、前記第2バルブを閉じた状態で前記複数の流量制御機器のうちのいずれか1つを介して前記基準容量にガスを流したときの前記圧力センサが示す圧力変化および前記温度センサが示す温度に基づいてガスの流量を測定する流量測定方法であって、
前記複数の流量制御機器のうちの少なくとも1つの流量制御機器は、前記流量制御システムに組み込まれる前に、流量基準器により計測された流量との比較のもとに流量校正が行われており、複数の流量設定に対して所定許容誤差範囲が設定され、前記複数の流量設定のうちの少なくとも1つの特定流量設定の許容誤差範囲が、前記所定許容誤差範囲よりも小さく設定されており、
前記少なくとも1つの流量制御機器が前記流量制御システムに組み込まれた後、前記少なくとも1つの特定流量設定でガスを流すことによって前記基準容量の体積の計測を行い、前記計測された体積を用いて流量を測定する、流量測定方法。 - 複数のガス供給源にそれぞれ接続された複数のガス供給ラインと、
前記複数のガス供給ラインにそれぞれ設けられた複数の流量制御機器と、
前記複数のガス供給ラインにそれぞれ設けられた複数の第1バルブと、
前記複数の第1バルブの下流側において前記複数のガス供給ラインに共通に接続された共通ガス供給ラインと、
前記共通ガス供給ラインに設けられた第2バルブと、
前記複数の第1バルブと前記第2バルブとの間の流路の圧力を測定する圧力センサと、
前記複数の第1バルブと前記第2バルブとの間の流路の温度を測定する温度センサとを備えるガス供給システムにおいて、
前記複数の第1バルブと前記第2バルブとの間の流路を基準容量として用い、前記第2バルブを閉じた状態で前記複数の流量制御機器のうちのいずれか1つを介して前記基準容量にガスを流したときの前記圧力センサが示す圧力変化および前記温度センサが示す温度に基づいてガスの流量を測定する方法であって、
前記複数の流量制御機器のうちの少なくとも1つの流量制御機器は、前記流量制御システムに組み込まれる前に、流量基準器により計測された流量との比較のもとに流量校正が行われており、複数の流量設定に対して所定許容誤差範囲が設定され、前記複数の流量設定のうちの少なくとも1つの特定流量設定において、前記流量基準器により計測された流量が、前記少なくとも1つの特定流量設定に関連付けて前記流量制御機器の記憶装置に記憶されており、
前記少なくとも1つの流量制御機器が前記流量制御システムに組み込まれた後、前記少なくとも1つの特定流量設定でガスを流すことによって前記基準容量の体積の計測を行うとき、前記流量制御機器の記憶装置に記憶された前記流量基準器により計測された流量を用いて前記基準容量の体積の計測を行い、前記計測された体積を用いて流量を測定する、流量測定方法。
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