WO2017161644A1 - 掩模板及光配向方法 - Google Patents

掩模板及光配向方法 Download PDF

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Publication number
WO2017161644A1
WO2017161644A1 PCT/CN2016/081104 CN2016081104W WO2017161644A1 WO 2017161644 A1 WO2017161644 A1 WO 2017161644A1 CN 2016081104 W CN2016081104 W CN 2016081104W WO 2017161644 A1 WO2017161644 A1 WO 2017161644A1
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WO
WIPO (PCT)
Prior art keywords
baffle
light
mask
alignment
moving member
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PCT/CN2016/081104
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English (en)
French (fr)
Inventor
马国靖
徐长健
王丹
Original Assignee
京东方科技集团股份有限公司
北京京东方显示技术有限公司
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Application filed by 京东方科技集团股份有限公司, 北京京东方显示技术有限公司 filed Critical 京东方科技集团股份有限公司
Priority to US15/534,055 priority Critical patent/US10197863B2/en
Publication of WO2017161644A1 publication Critical patent/WO2017161644A1/zh

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/133753—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers with different alignment orientations or pretilt angles on a same surface, e.g. for grey scale or improved viewing angle
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
    • G02F1/133788—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by light irradiation, e.g. linearly polarised light photo-polymerisation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/14—Measuring arrangements characterised by the use of optical techniques for measuring distance or clearance between spaced objects or spaced apertures
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/42—Alignment or registration features, e.g. alignment marks on the mask substrates
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0002—Apparatus or processes for manufacturing printed circuits for manufacturing artworks for printed circuits

Definitions

  • the present invention relates to optical alignment techniques, and more particularly to a reticle and a photoalignment method.
  • liquid crystal display technology has been widely used by people, and plays a vital role in industrial production and people's lives.
  • Conventional methods for making the liquid crystal on the liquid crystal display panel have a pretilt angle include a contact type rubbing orientation method and a non-contact type photo alignment method.
  • the rubbing orientation method is to rub the surface of the film to be aligned with a flannel roller, and the molecules to be aligned to the surface layer of the film are arranged in a specific direction by applying physical pressure.
  • the roller rubs against the film to be aligned it is easy to cause dust particles and static electricity residue and other frictional defects, which affect the product yield. Therefore, more production lines currently use the optical alignment orientation method to align the alignment film.
  • the alignment film on the substrate is irradiated with polarized light obtained by passing ultraviolet light through the polarizing plate, and the alignment film is aligned so that the surface of the alignment film has optical anisotropy.
  • the optical alignment orientation method can effectively improve the product yield and the stability of the production equipment.
  • the mask is the carrier of the original pattern during the exposure process, and is a tool for transferring the fine pattern, which is used for mass reproduction of the product and plays a key role in production.
  • one substrate corresponds to one product, and different products correspond to different patterns, and different masks are needed.
  • a Multi Model Group (MMG) technology in which a plurality of products are simultaneously fabricated on the same substrate has appeared.
  • MMG Multi Model Group
  • the same substrate contains a plurality of products of different patterns, which can reduce the number of substrates Quantity, but also makes the mask more complicated.
  • the reticle is expensive and requires high precision, and the cost of designing, manufacturing, transporting, storing, and replacing the installation is high, which imposes a large burden on both the designer and the producer. How to reduce the number of masks and reduce the probability of damage becomes the key to reducing costs.
  • Embodiments of the present invention provide a reticle that can correspond to different products.
  • a mask comprising a plurality of baffles, a frame and a light transmissive region.
  • a support member and a moving member are provided on the frame.
  • the baffle is configured to block the light transmissive area.
  • the support member is configured to support a baffle that blocks the light transmissive region.
  • the moving member is configured to move the shutter to a position that blocks the light transmitting region.
  • the reticle further includes a damper storage bin configured to store the baffle.
  • the support member is a columnar structure that is fixed in position.
  • the moving part is a columnar structure in which the position can be varied.
  • the moving member moves in parallel between the first position and the second position, and performs a rising and falling action.
  • the moving member supports the baffle as it ascends and leaves the baffle away from the support of the support member, the moving member exiting the baffle as it descends and the baffle being supported by the support member.
  • the baffle includes a first baffle having a longitudinal direction along the first direction and a second baffle, the second baffle having a lengthwise direction along the second direction.
  • the first direction is perpendicular to the second direction.
  • adjacent baffles partially overlap when the baffle blocks the light transmissive region.
  • a photoalignment method using the above mask comprising: determining a desired number of alignments according to a position of a product arranged on a substrate; and permeable of the mask at each alignment The area on the light area that needs to be occluded. The number and position of the required baffles are determined based on the area of the light-transmissive area of the mask that needs to be blocked at each alignment. And the number and position of the baffles required for the current alignment during each alignment, the movement The board reaches a corresponding position to block at least a portion of the light transmissive area of the mask, and then aligns the alignment light to the substrate via the mask.
  • a mask can be applied to produce different MMG products.
  • the mask can be irradiated without replacement, and the mask is within its normal service life. No need to uninstall, optimize the production process, and effectively reduce costs.
  • Figure 1 is a schematic plan view of a substrate of an MMG product
  • Figure 2 is a schematic plan view of a mask according to a first embodiment of the present invention.
  • Figure 3 is a schematic cross-sectional view of the frame of the mask of the embodiment shown in Figure 2;
  • Figure 4 is a schematic view showing the operation of the moving member in the mask of the embodiment shown in Figure 2;
  • Figure 5 is a schematic flow chart of a photo-alignment method according to a second embodiment of the present invention.
  • Figure 6 is a schematic view showing the optical alignment of the product 2 on the substrate 3 of Figure 1;
  • FIG. 7 is a schematic view showing the substrate rotation of the product 1 on the substrate 3 of FIG. 1;
  • Figure 8 is a schematic view showing the optical alignment of the first product 1 on the substrate 3 of Figure 1;
  • Figure 9 is a schematic view showing the shielding of the first column of products 2 on the substrate 3 of Figure 1;
  • Figure 10 is a schematic view showing the optical alignment of the second column of products 1 on the substrate 3 of Figure 1;
  • Figure 11 is a schematic illustration of the occlusion of the second column of products 2 on the substrate 3 of Figure 1.
  • FIG. 1 is a schematic top plan view of a substrate of an MMG product. As shown in FIG. 1, a plurality of products are arranged on the same substrate. In this example, two rows of product 1 and two products 2 are arranged on the substrate 3, and in the row direction, the product 1 and the product 2 are arranged at intervals.
  • the liquid crystal molecular orientations of Product 1 and Product 2, respectively, are indicated by the arrows indicated on Product 1 and Product 2 in Figure 1, requiring different alignment light for illumination. Therefore, in the prior art, it is necessary to continuously replace the mask during the processing to perform light alignment of all products. Both of these methods make the mask difficult to manufacture and costly.
  • the mask 4 includes a plurality of baffles 5, a frame 6 and a light transmitting region 7.
  • a support member 8 and a moving member 9 are provided on the frame.
  • the baffle 5 is configured to block the light transmissive region 7.
  • the support member 8 is configured to support the baffle 5 that blocks the light-transmitting region 7.
  • the moving part 9 is configured to move the shutter 5 to a position blocking the light transmitting area 7.
  • the mask 4 may further include a shutter storage box 10 configured to store the shutter 5.
  • the baffle storage box 10 may be attached to the frame 6, or may have a recessed structure on the frame 6 to be directly formed.
  • the mask 4 can block the light-transmitting region 7 by using the plurality of baffles 5 to form different light-transmitting patterns, so that the mask 4 can be applied to the production of different products. Moreover, in the production process of different products, it is not necessary to perform unloading and loading work on the mask 4, which reduces the use cost and can be well applied to the production of the MMG product.
  • the specific light transmission pattern can be manually specified by the control system or automatically generated by the control program of the control system.
  • the baffle 5 may further include a first baffle having a longitudinal direction along the first direction and a second baffle, the second baffle having a longitudinal direction along the second direction.
  • a first baffle having a longitudinal direction along the first direction and a second baffle
  • the second baffle having a longitudinal direction along the second direction.
  • the adjacent baffles 5 partially overlap. In this way, it is possible to ensure that no light is leaked between the baffles 5.
  • Figure 3 is a schematic cross-sectional view of the frame of the mask of the embodiment shown in Figure 2.
  • the support member 8 is a columnar structure that is fixed in position and is configured to support the shutter 5 that blocks the light-transmitting region 7.
  • the moving member 9 is a columnar structure whose position can be changed, and is configured to move the shutter 5.
  • the moving member 9 moves in parallel between the first position and the second position, and is capable of ascending and descending, the moving member 9 supports the shutter 5 when it ascends and causes the shutter 5 to move away from the support of the support member 8, and when the moving member 9 is lowered
  • the baffle 5 is separated and the baffle 5 is supported by the support member 8.
  • the first position and the second position refer to two different positions in the moving direction of the shutter 5.
  • any of the mechanical or electromechanical controls can be used to cause the moving member 9 to perform the above described motion.
  • a system composed of a computer, a programmable logic controller (PLC), and an actuator is used for control, and the position of the shutter 5 is set and transported by program editing.
  • PLC programmable logic controller
  • the use of a computer and PLC enables more precise and complex control of the position of the baffle 5, extending the range of application of the reticle and increasing efficiency.
  • PLC programmable logic controller
  • FIG. 3 is for illustration only, not for the present. Limitation of the invention.
  • Figure 4 is a schematic illustration of the workflow of the moving parts in the mask of the embodiment of Figure 2.
  • the moving member 9 in the first step, the moving member 9 is in the lowered state and moved to the first position, and the shutter 5 is supported by the support member 8.
  • the moving member 9 is raised to support the baffle and the baffle 5 is moved away from the support of the support member 8.
  • the moving member 9 is kept in the rising state and moved to the second position, and the shutter 5 is also moved.
  • the moving member 9 is lowered at the second position to leave the shutter 5, and the shutter 5 is supported by the support member 8. Thus, one movement of the shutter 5 is achieved.
  • the movement of the baffle 5 to any position of the light-transmitting region 7 can be achieved by the mutual cooperation of the plurality of moving members 9.
  • One movement of the moving part 9 The range can be set between 0 and 50 mm to achieve precise control of the position of the baffle 5.
  • FIG. 5 is a schematic flow chart of a photo-alignment method in accordance with a second embodiment of the present invention.
  • a photo-alignment method using the mask in the first embodiment comprising: determining a required number of alignments according to product positions arranged on the substrate And a region on the light-transmitting region 7 of the mask 4 at each alignment that needs to be blocked.
  • the number and position of the required baffles 5 are determined based on the areas of the light-transmissive areas 7 of the mask 4 that need to be blocked at each alignment.
  • the baffle 5 is moved to a corresponding position to block at least a portion of the light-transmitting region 7 of the mask 4 according to the number and position of the baffles 5 required for the current alignment. Then, the substrate 3 is irradiated with the aligning light via the mask 4 .
  • the photo-alignment method in this example it is not necessary to replace the mask 4 for the alignment of different products, and only the state of the shutter 5 needs to be changed, and the alignment for various products can be realized in a simple procedure.
  • Figure 6 is a schematic illustration of the optical alignment of the product 2 on the substrate 3 of Figure 1.
  • the substrate 3 moves upward from the lower direction in the drawing to enter the area covered by the mask 4.
  • the alignment light causes the liquid crystal molecules on the surface of the product to be aligned in the left-right direction (ie, the direction indicated on the product 2) in the figure, and the product 2 can directly perform the light alignment.
  • the products 2 are continuously arranged, and when the substrate 3 is aligned from the bottom to the top through the mask 4, it is not necessary to adjust the blocking position of the shutter 5.
  • the position of the shutter 5 is set as shown in FIG. 6, and only the longitudinal direction is used in the up and down direction.
  • the baffle 5 blocks the position of the product 1.
  • FIG. 7 is a schematic view showing the substrate rotation of the product 1 on the substrate 3 of FIG.
  • the substrate 3 is first rotated so that the alignment direction of the liquid crystal molecules required for the product 1 is the same as the direction in which the alignment light can be generated.
  • the substrate 3 enters the region covered by the mask 4 again from bottom to top.
  • Figure 8 is a schematic illustration of the optical alignment of the first column of products 1 on the substrate 3 of Figure 1.
  • the product 2 is interposed between the products 1 in the up and down direction, and at this time, the product 2 is not capable of receiving the irradiation of the aligning light. Therefore, the light alignment of the product 1 cannot be continuously performed, and it is necessary to carry out stepwise, and it is necessary to adjust the position of the shutter 5 accordingly.
  • the first column of products 1 (i.e., the first row shown in Fig. 8 after the substrate 3 is rotated) enters the light-transmitting region 7 and is optically aligned.
  • the baffle 5 since the product 2 has not entered the light transmitting region 7, the baffle 5 may not be used.
  • Figure 9 is a schematic illustration of the occlusion of the first column of products 2 on the substrate 3 of Figure 1. As shown in FIG. 9, as the substrate 3 moves further upward, the first row of products 2 enters the light-transmitting region 7, and therefore, the baffle 5 is completely shielded from the light-transmitting region 7.
  • Figure 10 is a schematic illustration of the optical alignment of the second column of products 1 on the substrate 3 of Figure 1.
  • the baffle 5 is used to partially block the light-transmitting region 7, so that the product 1 can receive the irradiation of the aligning light, and the product 2 does not receive the illuminating light.
  • Figure 11 is a schematic illustration of the occlusion of the second column of products 2 on the substrate 3 of Figure 1.
  • the second row of products 2 enters the light-transmitting region 7, and since the product 1 has completed the light alignment at this time, it is not necessary to irradiate the incident light, and therefore, the baffle 5 is used.
  • the light-transmitting region 7 is completely blocked. At this time, the light alignment of all the products on the substrate 3 is completed, and the substrate 3 continues to move to other processes.
  • the mask 4 can be applied to the production of different products, and in the production process of different products, the unloading and loading work for the mask 4 is not required, the use cost is lowered, and the application can be well applied. Production of MMG products.
  • the photo-alignment is performed using the mask 4, it is only necessary to change the state of the shutter 5 for the alignment of different products, and the alignment for various products can be realized in a simple procedure.
  • the terms “mounted,” “connected,” and “connected” are used in a broad sense, and may be, for example, a fixed connection, a detachable connection, or an integral connection; it may be a mechanical connection, It can also be an electrical connection; it can be directly connected, or it can be connected indirectly through an intermediate medium, which can be the internal connection of two components.
  • the specific meanings of the above terms in the present invention can be understood on a case-by-case basis.

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Abstract

一种掩模板(4)，包括多个挡板(5)、框体(6)和透光区域(7)。在框体(6)上设置有支撑部件(8)和移动部件(9)。挡板(5)被配置为用于遮挡透光区域(7)。支撑部件(8)被配置为支撑遮挡透光区域(7)的挡板(5)。移动部件(9)被配置为将挡板(5)移动到遮挡透光区域(7)的位置。采用该掩模板(4)，使得一块掩模板(4)可以应用于生产不同MMG产品，生产过程中，该掩模板(4)不需要更换即可进行照射取向，并且掩模板(4)在其正常使用寿命范围之内时也不需卸载，优化了生产工艺，有效的降低了成本。

Description

掩模板及光配向方法
本申请要求2016年3月24日递交的中国专利申请第201610171864.9号的优先权，在此全文引用上述中国专利申请所公开的内容以作为本申请的一部分。
技术领域
本发明涉及光配向技术，尤其涉及掩模板及光配向方法。
背景技术
随着显示技术的发展和社会的进步，液晶显示技术已经越来越广泛的被人们所应用，并且在工业生产、人民生活中起着至关重要的作用。
使液晶显示面板上的液晶具有预倾斜角的常规方法包括接触型的摩擦(Rubbing)定向法和非接触型的光配向(Photo Alignment)定向法。摩擦定向法是利用绒布滚轮摩擦待配向膜的表面，通过施加物理压力使得待配向膜表层的分子按照特定方向排列。当滚轮摩擦待配向膜时，易造成粉尘颗粒与静电残留及其他摩擦不良，影响产品良率。所以目前更多的生产线采用光配向定向法对配向膜进行配向。
光配向定向法是利用使紫外光通过偏振片后得到的偏振光照射基板上的配向膜，对配向膜进行配向，使得配向膜表层具有光学异向性。与摩擦定向法相比，光配向定向法能够有效地提升产品良率与生产设备的稳定度。在光配向定向法中，掩模板是曝光过程中原始图形的载体，是转移微细图形的工具，用于产品的批量复制生产，在生产中具有关键作用。
传统生产工艺过程中，一个基板对应一个产品，不同产品对应的图形不同，需要使用不同的掩模板。随后，为了提升基板、掩模板以及光配向设备的利用率，出现了在同一张基板上同时制作多种产品的多模型组(Multi Model Group,MMG)技术。现有的多模型组(Multi Model Group,MMG)技术中，同一基板包含多个不同图形的产品，这能够减少基板数 量，但是也使得掩模板更为复杂。掩模板价格昂贵且对于精度要求很高，设计、制作、运输、保存以及更换安装等过程的成本均较高，给设计者和生产者均带来较大的负担。如何减少掩模板的数量以及减小损坏概率，便成为降低成本的关键。
发明内容
本发明的实施例提供了一种掩模板，能够对应于不同的产品。
根据本发明的第一个方面，提供了一种掩模板，包括多个挡板、框体和透光区域。在框体上设置有支撑部件和移动部件。挡板被配置为遮挡透光区域。支撑部件被配置为支撑遮挡透光区域的挡板。移动部件被配置为用于将挡板移动到遮挡透光区域的位置。
在本发明的实施例中，掩模板还包括挡板存放箱，挡板存放箱被配置为存放挡板。
在本发明的实施例中，支撑部件是位置固定的柱状结构。
在本发明的实施例中，移动部件是位置能够变化的柱状结构。移动部件在第一位置和第二位置之间平行移动，并且进行上升、下降动作。移动部件在上升时支撑挡板并且使挡板离开支撑部件的支撑，移动部件在下降时离开挡板并且使挡板由支撑部件支撑。
在本发明的实施例中，挡板包括第一挡板和第二挡板，第一挡板的长度方向沿第一方向，第二挡板的长度方向沿第二方向。
在本发明的实施例中，第一方向与第二方向垂直。
在本发明的实施例中，在挡板遮挡透光区域时，相邻的挡板之间部分重叠。
根据本发明的第二个方面，提供了一种使用上述掩模板的光配向方法，包括：根据在基板上排列的产品的位置，确定所需的配向次数以及在每次配向时掩模板的透光区域上需要被遮挡的区域。根据每次配向时掩模板的透光区域上需要被遮挡的区域，确定所需要的挡板的数量以及位置。以及在进行每次配向时，根据当前配向所需要的挡板的数量以及位置，移动挡 板到达对应的位置，以遮挡掩模板的至少一部分透光区域，然后隔着掩模板向基板照射配向光。
采用本发明的实施例的掩模板，使得一块掩模板可以应用于生产不同MMG产品，生产过程中，换掩模板不需要更换即可进行照射取向，并且掩模板在其正常使用寿命范围之内时也不需卸载，优化了生产工艺，有效的降低了成本。
附图说明
为了更清楚地说明本发明的实施例的技术方案，下面将对实施例的附图进行简要说明，应当知道，以下描述的附图仅仅涉及本发明的一些实施例，而非对本发明的限制，其中：
图1是MMG产品的基板的示意性的俯视图；
图2是根据本发明的第一实施例的掩模板的示意性的俯视图；
图3是图2所示实施例的掩模板的框体的示意性的剖视图；
图4是图2所示实施例的掩模板中移动部件的工作流程的示意图；
图5是根据本发明的第二实施例的光配向方法的示意性的流程图；
图6是对于图1中基板3上的产品2进行光配向的示意图；
图7是对于图1中基板3上的产品1进行光配向前进行基板旋转的示意图；
图8是对于图1中基板3上的第一列产品1进行光配向的示意图；
图9是对于图1中基板3上的第一列产品2进行遮挡的示意图；
图10是对于图1中基板3上的第二列产品1进行光配向的示意图；
图11是对于图1中基板3上的第二列产品2进行遮挡的示意图。
具体实施方式
为了使本发明的实施例的目的、技术方案和优点更加清楚，下面将结合附图，对本发明的实施例的技术方案进行清楚、完整的描述。显然，所描述的实施例是本发明的一部分实施例，而不是全部的实施例。基于所描 述的本发明的实施例，本领域技术人员在无需创造性劳动的前提下所获得的所有其他实施例，也都属于本发明保护的范围。
图1是MMG产品的基板的示意性的俯视图。如图1所示，在同一基板上排列了多个产品。在本例中，在基板3上排列了2列产品1和2列产品2，并且在行方向上，产品1和产品2间隔排列。产品1和产品2的液晶分子取向分别如图1中产品1和产品2上标注的箭头所示，需要不同的配向光进行照射。因此，在现有技术中，需要在加工过程中不断更换掩模板来进行所有产品的光配向。这两种方式都会使得掩模板不易制造，成本较高。
图2是本发明的第一实施例提供的掩模板的示意性的俯视图。如图2所示，掩模板4包括多个挡板5、框体6和透光区域7。在框体上设置有支撑部件8和移动部件9。挡板5被配置为遮挡透光区域7。支撑部件8被配置为支撑遮挡透光区域7的挡板5。移动部件9被配置为用于将挡板5移动到遮挡透光区域7的位置。
图中各个部件的形状以及位置仅用于示意性的说明。例如，支撑部件8和移动部件9在图中使用了不同的形状表示，这是为了对于两者进行区分，并不意味对其形状进行限定。
此外，掩模板4还可以包括挡板存放箱10，挡板存放箱10被配置为存放挡板5。挡板存放箱10可以附加在框体6上，也可以使得框体6上具有凹陷结构而直接形成。
根据本实施例，掩模板4可以通过使用多个挡板5对于透光区域7进行遮挡，形成不同的透光图案，使得掩模板4可以应用于不同产品的生产。并且，在不同产品的生产过程中，无需对于掩模板4进行卸载和加载工作，降低了使用成本，能够很好的应用于MMG产品的生产。具体透光图案可以通过控制系统人为指定，也可以通过控制系统的控制程序自动生成。
在本发明的实施例中，挡板5还可以包括第一挡板和第二挡板，第一挡板的长度方向沿第一方向，第二挡板的长度方向沿第二方向。设置两种挡板，并且，使得两种挡板的长度方向不相同，这样在减少挡板类型、降 低使用成本的同时，能够保证透光图案的适应性。进一步的，如图2所示，第一方向与第二方向可以垂直。这样可以在保证透光图案的适应性的同时使得挡板5的移动、支撑以及存放机构得到进一步的简化。
在本发明的实施例中，在挡板5遮挡透光区域7时，相邻的挡板5之间部分重叠。这样，能够保证挡板5之间不漏光。
图3是图2所示实施例的掩模板的框体的示意性的剖视图。如图3所示，支撑部件8是位置固定的柱状结构，被配置为支撑遮挡透光区域7的所述挡板5。移动部件9是位置能够变化的柱状结构，被配置为移动挡板5。移动部件9在第一位置和第二位置之间平行移动，并且能够上升和下降，移动部件9在上升时支撑挡板5并且使挡板5离开支撑部件8的支撑，移动部件9在下降时离开挡板5并且使挡板5由支撑部件8支撑。第一位置和第二位置指挡板5移动方向上的两个不同位置。
可以使用任何机械的或者机电的控制方式来使移动部件9完成上述运动。在图3中，使用了电脑、可编程逻辑控制器(Programmable Logic Controller，PLC)以及执行机构组成的系统来进行控制，通过程序编辑，进行挡板5位置的设置及搬运。使用电脑和PLC能够对于挡板5的位置进行更加精确和复杂的控制，扩展了掩模板的应用范围，并且提高了效率。但是，应当知道的是，在例如实验性的应用中，由技术人员通过机械结构直接控制移动部件9进行简单的操作也是可以的，所以，图3中的示例仅仅用于说明，并不是对于本发明的限定。
图4是图2所示实施例的掩模板中移动部件的工作流程的示意图。如图4所示，在第一步骤中，移动部件9处于下降状态，并且移动到第一位置，挡板5由支撑部件8支撑。在第二步骤中，移动部件9上升以支撑挡板，并且使挡板5离开支撑部件8的支撑。在第三步骤中，移动部件9在保持上升状态，并且移动到第二位置，挡板5也随之移动。在第四步骤中，移动部件9在第二位置处下降以离开挡板5，挡板5由支撑部件8支撑。如此，就实现了挡板5的一次移动。通过多个移动部件9的相互配合，就可以实现挡板5到透光区域7的任意位置的移动。移动部件9的一次移动 范围可以设定为0～50mm之间，以实现挡板5的位置的精确控制。
图5是根据本发明的第二实施例的光配向方法的示意性的流程图。如图5所示，根据本发明的第二实施例，提供了一种使用第一实施例中的掩模板的光配向方法，包括：根据在基板上排列的产品位置，确定所需的配向次数以及每次配向时掩模板4的透光区域7上需要被遮挡的区域。根据每次配向时掩模板4的透光区域7上需要被遮挡的区域，确定所需要的挡板5的数量以及位置。以及在进行每次配向时，根据当前配向时所需要的挡板5的数量以及位置，移动挡板5到达对应的位置，以遮挡掩模板4的至少一部分透光区域7。然后隔着掩模板4向基板3照射配向光。
根据本例中的光配向方法，对于不同的产品的配向，无需更换掩模板4，仅仅需要改变挡板5的状态，能够以简单的步骤实现对于各种不同产品的配向。
图6是对于图1中基板3上的产品2进行光配向的示意图。在具体的光配向过程中，基板3从图中的下方向上方运动，进入掩模板4覆盖的区域。在本例中，配向光会使得产品表面的液晶分子按照图中左右方向(即产品2上标示的方向)排列，产品2可以直接进行光配向。并且，在上下方向上，产品2连续排列，基板3在由下至上通过掩模板4进行配向时，不需要调整挡板5的遮挡位置。因此，在本例中，设定了首先对于产品2进行光配向，并且，在产品2的光配向过程中，挡板5的位置设置为图6中所示，仅仅使用长度方向沿着上下方向的挡板5对于产品1的位置进行遮挡。
图7是对于图1中基板3上的产品1进行光配向前进行基板旋转的示意图。如图7所示，在完成了产品2的光配向之后，需要对于产品1进行光配向。因为产品1需要的液晶分子排列方向与配向光能够产生的方向垂直，所以首先对于基板3进行了旋转，使得产品1需要的液晶分子排列方向与配向光能够产生的方向相同。同样地，在对于产品1进行光配向的过程中，基板3再次由下至上地进入掩模板4覆盖的区域。
图8是对于图1中基板3上的第一列产品1进行光配向的示意图。如 图8所示，基板3经过旋转后，在上下方向上，产品1之间间隔有产品2，而此时，产品2是不能够接受配向光的照射。因此，对于产品1的光配向不能够连续进行，需要逐步进行，并且，需要对于挡板5的位置进行相应的调整。
如图8所示，首先，使得第一列产品1(即基板3旋转后，图8中示出的第一行)进入透光区域7并进行光配向。此时，由于产品2还没有进入透光区域7，所以，可以不使用挡板5。
图9是对于图1中基板3上的第一列产品2进行遮挡的示意图。如图9所示，随着基板3进一步向上方运动，第一列产品2进入了透光区域7，因此，使用挡板5对于透光区域7进行了全部遮挡。
图10是对于图1中基板3上的第二列产品1进行光配向的示意图。如图9所示，随着基板3进一步向上方运动，第二列产品1进入了透光区域7，此时，透光区域中仍然有产品2。因此，使用挡板5对于透光区域7进行部分遮挡，使得产品1能够接受配向光的照射，而产品2接受不到配向光的照射。
图11是对于图1中基板3上的第二列产品2进行遮挡的示意图。如图9所示，随着基板3进一步向上方运动，第二列产品2进入透光区域7，由于此时产品1已经完成光配向，不需要进行配射光的照射，因此，使用挡板5对于透光区域7进行完全遮挡。此时，完成了基板3上所有产品的光配向，并且，基板3继续运动，进入其它工序。
根据本发明的实施例，掩模板4可以应用于不同产品的生产，并且，在不同产品的生产过程中，无需对于掩模板4进行卸载和加载工作，降低了使用成本，能够很好的应用于MMG产品的生产。使用掩模板4进行光配向时，对于不同的产品的配向，仅仅需要改变挡板5的状态，能够以简单的步骤实现对于各种不同产品的配向。
在本发明的描述中需要说明的是，术语“上”、“下”等指示的方位或位置关系为基于附图所示的方位或位置关系，仅是为了便于描述本发明和简化描述，而不是指示或暗示所指的装置或元件必须具有特定的方位、以 特定的方位构造和操作，因此不能理解为对本发明的限制。除非另有明确的规定和限定，术语“安装”、“相连”、“连接”应做广义理解，例如，可以是固定连接，也可以是可拆卸连接，或一体地连接；可以是机械连接，也可以是电连接；可以是直接相连，也可以通过中间媒介间接相连，可以是两个元件内部的连通。对于本领域的普通技术人员而言，可以根据具体情况理解上述术语在本发明中的具体含义。
还需要说明的是，在本文中，诸如第一和第二等之类的关系术语仅仅用来将一个实体或者操作与另一个实体或操作区分开来，而不一定要求或者暗示这些实体或操作之间存在任何这种实际的关系或者顺序。而且，术语“包括”、“包含”或者其任何其他变体意在涵盖非排他性的包含，从而使得包括一系列要素的过程、方法、物品或者设备不仅包括那些要素，而且还包括没有明确列出的其他要素，或者是还包括为这种过程、方法、物品或者设备所固有的要素。在没有更多限制的情况下，由语句“包括一个……”限定的要素，并不排除在包括所述要素的过程、方法、物品或者设备中还存在另外的相同要素。
可以理解的是，以上实施方式仅仅是为了说明本发明的原理而采用的示例性实施方式，然而本发明并不局限于此。对于本领域内的普通技术人员而言，在不脱离本发明的精神和实质的情况下，可以做出各种变型和改进，这些变型和改进也视为本发明的保护范围。

Claims (8)

  1. 一种掩模板，包括多个挡板、框体和透光区域；
    在所述框体上设置有支撑部件和移动部件；
    所述挡板被配置为遮挡所述透光区域；
    所述支撑部件被配置为支撑遮挡所述透光区域的所述挡板；
    所述移动部件被配置为用于将所述挡板移动到遮挡所述透光区域的位置。
  2. 根据权利要求1所述的掩模板，其中，所述掩模板还包括挡板存放箱，所述挡板存放箱被配置为存放所述挡板。
  3. 根据权利要求1所述的掩模板，其中，所述支撑部件是位置固定的柱状结构。
  4. 根据权利要求1所述的掩模板，其中，所述移动部件是位置能够变化的柱状结构；所述移动部件在第一位置和第二位置之间平行移动，并且进行上升、下降动作；所述移动部件在上升时支撑所述挡板并且使所述挡板离开支撑部件的支撑，所述移动部件在下降时离开所述挡板并且使所述挡板由支撑部件支撑。
  5. 根据权利要求1所述的掩模板，其中，所述挡板包括第一挡板和第二挡板，所述第一挡板的长度方向沿第一方向，所述第二挡板的长度方向沿第二方向。
  6. 根据权利要求5所述的掩模板，其中，所述第一方向与所述第二方向垂直。
  7. 根据权利要求1至6中任一项所述的掩模板，其中，在所述挡板遮挡所述透光区域时，相邻的所述挡板之间部分重叠。
  8. 一种使用根据权利要求1所述的掩模板的光配向方法，包括：
    根据在基板上排列的产品的位置，确定所需的配向次数以及在每次配向时掩模板的透光区域上需要被遮挡的区域；
    根据每次配向时掩模板的透光区域上需要被遮挡的区域，确定所需要的挡板的数量以及位置；以及
    在进行每次配向时，根据当前配向所需要的挡板的数量以及位置，移动挡板到达对应的位置，以遮挡掩模板的至少一部分透光区域，然后隔着掩模板向基板照射配向光。
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