WO2017154286A1 - Élément, cellule et dispositif de génération d'énergie - Google Patents

Élément, cellule et dispositif de génération d'énergie Download PDF

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Publication number
WO2017154286A1
WO2017154286A1 PCT/JP2016/085401 JP2016085401W WO2017154286A1 WO 2017154286 A1 WO2017154286 A1 WO 2017154286A1 JP 2016085401 W JP2016085401 W JP 2016085401W WO 2017154286 A1 WO2017154286 A1 WO 2017154286A1
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Prior art keywords
intermediate layer
rubber
electrode
electrodes
pair
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PCT/JP2016/085401
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English (en)
Japanese (ja)
Inventor
菅原　智明
近藤　玄章
夕子 有住
名取　潤一郎
瑞樹 小田切
荒海　麻由佳
恵 北村
崇尋 今井
牧人 中島
秀之 宮澤
Original Assignee
株式会社リコー
菅原　智明
近藤　玄章
夕子 有住
名取　潤一郎
瑞樹 小田切
荒海　麻由佳
恵 北村
崇尋 今井
牧人 中島
秀之 宮澤
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Application filed by 株式会社リコー, 菅原　智明, 近藤　玄章, 夕子 有住, 名取　潤一郎, 瑞樹 小田切, 荒海　麻由佳, 恵 北村, 崇尋 今井, 牧人 中島, 秀之 宮澤 filed Critical 株式会社リコー
Priority to CN201680083253.7A priority Critical patent/CN108702108B/zh
Priority to EP16893610.2A priority patent/EP3429075B1/fr
Priority to US16/080,993 priority patent/US11189778B2/en
Priority to JP2018504001A priority patent/JP6658864B2/ja
Priority to KR1020187024752A priority patent/KR102115870B1/ko
Publication of WO2017154286A1 publication Critical patent/WO2017154286A1/fr

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00—Piezoelectric or electrostrictive devices
    • H10N30/30—Piezoelectric or electrostrictive devices with mechanical input and electrical output, e.g. functioning as generators or sensors
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02N—ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
    • H02N1/00—Electrostatic generators or motors using a solid moving electrostatic charge carrier
    • H02N1/04—Friction generators
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02N—ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
    • H02N11/00—Generators or motors not provided for elsewhere; Alleged perpetua mobilia obtained by electric or magnetic means
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00—Piezoelectric or electrostrictive devices
    • H10N30/50—Piezoelectric or electrostrictive devices having a stacked or multilayer structure
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00—Piezoelectric or electrostrictive devices
    • H10N30/80—Constructional details
    • H10N30/85—Piezoelectric or electrostrictive active materials
    • H10N30/857—Macromolecular compositions
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00—Piezoelectric or electrostrictive devices
    • H10N30/80—Constructional details
    • H10N30/87—Electrodes or interconnections, e.g. leads or terminals

Definitions

  • the present invention relates to an element, a cell, and a power generation device.
  • vibration of structures such as roads, bridges, buildings, etc.
  • vibrations of moving bodies such as automobiles and railway vehicles
  • vibrations caused by human movements and wave energy and vibration energy generated by wind power are converted into electrical energy for effective use.
  • Techniques to do this have been proposed.
  • a piezoelectric element that can take out electricity with a relatively small external force such as rubbing the surface with a finger or the like has been disclosed (see, for example, Patent Documents 1 to 4).
  • This piezoelectric element utilizes a phenomenon that charges are induced on the surface of the piezoelectric element when the piezoelectric element is strained by an external force such as vibration.
  • the conventional piezoelectric element is hard, and a rigid structure is required to efficiently transmit force to the element.
  • the present invention has been made in view of such a current situation, and its main object is to provide a novel element having a deformability for converting external force into electric energy.
  • an element of the present invention includes a pair of electrodes, and a deformable intermediate layer that is disposed between the pair of electrodes and includes a silicon compound having an unpaired electron as a material.
  • FIG. 7 It is a figure which shows an example of the whole structure of the element concerning the 1st Example of this invention. It is sectional drawing which shows an example of a structure when the element shown in FIG. 7 is made into a cell form. It is a figure which shows an example of the state which connected and arrange
  • FIG. 1 is a schematic cross section of an element according to this embodiment.
  • the element 1 includes a first electrode 2 and a second electrode 3 that face each other, and an intermediate layer 4 that is disposed between the first and second electrodes 2 and 3 and formed of rubber or a rubber composition. is doing.
  • first electrode and second electrode There is no restriction
  • the material, shape, size, and structure may be the same or different, but are preferably the same.
  • the material of the first electrode 2 and the second electrode 3 include metals, carbon-based conductive materials, conductive rubber compositions, conductive polymers, and oxides.
  • Examples of the metal include gold, silver, copper, aluminum, stainless steel, tantalum, nickel, and phosphor bronze.
  • Examples of the carbon-based conductive material include carbon nanotubes, carbon fibers, and graphite.
  • Examples of the conductive rubber composition include a composition containing a conductive filler and rubber.
  • Examples of the conductive polymer include polyethylene dioxythiophene (PEDOT), polypyrrole, polyaniline, and the like.
  • Examples of the oxide include indium tin oxide (ITO), indium oxide / zinc oxide (IZO), and zinc oxide.
  • Examples of the conductive filler include carbon materials (for example, ketjen black, acetylene black, graphite, carbon fiber, carbon fiber (CF), carbon nanofiber (CNF), carbon nanotube (CNT), graphene, etc.), metal Filler (gold, silver, platinum, copper, aluminum, nickel, etc.), conductive polymer material (polythiophene, polyacetylene, polyaniline, polypyrrole, polyparaphenylene, and polyparaphenylene vinylene derivatives, or derivatives thereof) And the like, and ionic liquids. These may be used individually by 1 type and may use 2 or more types together.
  • carbon materials for example, ketjen black, acetylene black, graphite, carbon fiber, carbon fiber (CF), carbon nanofiber (CNF), carbon nanotube (CNT), graphene, etc.
  • metal Filler gold, silver, platinum, copper, aluminum, nickel, etc.
  • conductive polymer material polythiophene, polyacetylene, polyaniline, polypyr
  • Examples of the rubber include silicone rubber, modified silicone rubber, acrylic rubber, chloroprene rubber, polysulfide rubber, urethane rubber, butyl rubber, fluorosilicone rubber, natural rubber, ethylene / propylene rubber, nitrile rubber, fluorine rubber, isoprene rubber, Examples thereof include butadiene rubber, styrene / butadiene rubber, acrylonitrile / butadiene rubber, ethylene / propylene / diene rubber, chlorosulfonated polyethylene rubber, polyisobutylene, and modified silicone. These may be used individually by 1 type and may use 2 or more types together.
  • Examples of the shape of the first electrode 2 and the shape of the second electrode 3 include a thin film.
  • the structure of the first electrode 2 and the structure of the second electrode 3 may be, for example, a woven fabric, a nonwoven fabric, a knitted fabric, a mesh, a sponge, or a nonwoven fabric formed by overlapping fibrous carbon
  • the average thickness of the electrode is not particularly limited and may be appropriately selected depending on the intended purpose, but is preferably 0.01 ⁇ m to 1 mm, more preferably 0.1 ⁇ m to 500 ⁇ m from the viewpoint of conductivity and flexibility. .
  • the average thickness is 0.01 ⁇ m or more, the mechanical strength is appropriate and the conductivity is improved. Further, when the average thickness is 1 mm or less, the element can be deformed and the power generation performance is good.
  • the intermediate layer 4 has flexibility.
  • the intermediate layer 4 satisfies at least one of the following conditions (1) and (2).
  • Condition (1) When the intermediate layer 4 is pressed from the direction orthogonal to the surface of the intermediate layer 4, the deformation amount of the intermediate layer 4 on the first electrode 2 side (one side), and the intermediate layer 4 The amount of deformation on the second electrode 3 side (the other side) is different.
  • Condition (2) Universal hardness (H1) at the time of 10 ⁇ m indentation on the first electrode 2 side of the intermediate layer 4 and universal hardness (H2) at the time of 10 ⁇ m indentation on the second electrode 3 side of the intermediate layer 4 Different.
  • the deformation amount is the maximum indentation depth of the indenter when the intermediate layer 4 is pressed under the following conditions.
  • Measuring machine Microhardness tester WIN-HUD manufactured by Fischer Indenter: Square pyramid diamond indenter with a face angle of 136 °
  • Initial load 0.02 mN
  • Maximum load 1mN Load increase time from initial load to maximum load: 10 seconds
  • the ratio (H1 / H2) of universal hardness (H1) to universal hardness (H2) is preferably 1.01 or more, more preferably 1.07 or more, and particularly preferably 1.13 or more.
  • the upper limit of the ratio (H1 / H2) is not particularly limited, and is appropriately selected depending on, for example, the degree of flexibility required in the use state, the load in the use state, etc., but is preferably 1.70 or less.
  • H1 is the universal hardness of the relatively hard surface
  • H2 is the universal hardness of the relatively soft surface.
  • middle layer 4 there is no restriction
  • gum, a rubber composition, etc. are mentioned.
  • rubber include silicone rubber, modified silicone rubber, acrylic rubber, chloroprene rubber, polysulfide rubber, urethane rubber, butyl rubber, fluorosilicone rubber, natural rubber, ethylene / propylene rubber, nitrile rubber, fluorine rubber, isoprene rubber, and butadiene.
  • Examples thereof include rubber, styrene / butadiene rubber, acrylonitrile / butadiene rubber, ethylene / propylene / diene rubber, chlorosulfonated polyethylene rubber, polyisobutylene, and modified silicone. These may be used individually by 1 type and may use 2 or more types together. Among these, silicone rubber is preferable.
  • the silicone rubber is not particularly limited as long as it is a rubber having a siloxane bond, and can be appropriately selected according to the purpose.
  • the silicone rubber include dimethyl silicone rubber, methylphenyl silicone rubber, fluorosilicone rubber, and modified silicone rubber (for example, acrylic modification, alkyd modification, ester modification, and epoxy modification). These may be used individually by 1 type and may use 2 or more types together.
  • the rubber composition include a composition containing a filler and the rubber. Among these, the silicone rubber composition containing the silicone rubber is preferable because of its high power generation performance.
  • the filler examples include organic fillers, inorganic fillers, and organic-inorganic composite fillers.
  • the organic filler is not particularly limited as long as it is an organic compound, and can be appropriately selected according to the purpose.
  • examples of the organic filler include acrylic fine particles, polystyrene fine particles, melamine fine particles, fluororesin fine particles such as polytetrafluoroethylene, silicone powder (silicone resin powder, silicone rubber powder, silicone composite powder), rubber powder, wood powder, and pulp. And starch.
  • silicone powder silicon resin powder, silicone rubber powder, silicone composite powder
  • rubber powder wood powder, and pulp.
  • starch There is no restriction
  • examples of the inorganic filler include oxides, hydroxides, carbonates, sulfates, silicates, nitrides, carbons, metals, and other compounds.
  • Examples of the oxide include silica, diatomaceous earth, alumina, zinc oxide, titanium oxide, iron oxide, and magnesium oxide.
  • Examples of the hydroxide include aluminum hydroxide, calcium hydroxide, and magnesium hydroxide.
  • Examples of the carbonate include calcium carbonate, magnesium carbonate, barium carbonate, and hydrotalcite.
  • Examples of the sulfate include aluminum sulfate, calcium sulfate, and barium sulfate.
  • Examples of the silicate include calcium silicate (wollastonite, zonotlite), zircon silicate, kaolin, talc, mica, zeolite, perlite, bentonite, montmoronite, sericite, activated clay, glass, hollow glass. Examples include beads.
  • Examples of the nitride include aluminum nitride, silicon nitride, and boron nitride.
  • Examples of the carbons include ketjen black, acetylene black, graphite, carbon fiber, carbon fiber, carbon nanofiber, carbon nanotube, fullerene (including derivatives), graphene, and the like.
  • Examples of the metal include gold, silver, platinum, copper, iron, aluminum, and nickel.
  • Examples of the other compounds include potassium titanate, barium titanate, strontium titanate, lead zirconate titanate, silicon carbide, molybdenum sulfide, and the like.
  • the inorganic filler may be surface treated.
  • the organic-inorganic composite filler can be used without particular limitation as long as it is a compound in which an organic compound and an inorganic compound are combined at a molecular level.
  • examples of the organic / inorganic composite filler include silica / acryl composite fine particles and silsesquioxane.
  • the average particle size of the filler is not particularly limited and may be appropriately selected depending on the intended purpose, but is preferably 0.01 ⁇ m to 30 ⁇ m, more preferably 0.1 ⁇ m to 10 ⁇ m. When the average particle size is 0.01 ⁇ m or more, the power generation performance may be improved.
  • middle layer 4 can deform
  • the average particle size can be measured according to a known method using a known particle size distribution measuring device such as Microtrac HRA (manufactured by Nikkiso Co., Ltd.).
  • the content of the filler is preferably 0.1 to 100 parts by mass, more preferably 1 to 50 parts by mass with respect to 100 parts by mass of rubber. When the content is 0.1 parts by mass or more, power generation performance may be improved.
  • middle layer 4 can deform
  • limiting in particular as said other component According to the objective, it can select suitably, For example, an additive etc. are mentioned. Content of the said other component can be suitably selected in the grade which does not impair the objective of this invention.
  • the additive examples include a crosslinking agent, a reaction control agent, a filler, a reinforcing material, an anti-aging agent, a conductivity control agent, a colorant, a plasticizer, a processing aid, a flame retardant, an ultraviolet absorber, and a tackifier. And thixotropic agent.
  • a crosslinking agent a reaction control agent
  • a filler a reinforcing material
  • an anti-aging agent a conductivity control agent
  • thixotropic agent There is no restriction
  • the rubber composition can be prepared by mixing and kneading and dispersing the rubber, the filler, and, if necessary, the other components.
  • the average thickness of the intermediate layer 4 is not particularly limited and may be appropriately selected depending on the intended purpose, but is preferably 1 ⁇ m to 10 mm, more preferably 20 ⁇ m to 1 mm from the viewpoint of deformation followability. In addition, when the average thickness is within a preferable range, film formability can be ensured and deformation is not hindered, so that good power generation can be performed.
  • the intermediate layer 4 is preferably insulating.
  • the insulating property preferably has a volume resistivity of 10 8 ⁇ cm or more, and more preferably has a volume resistivity of 10 10 ⁇ cm or more.
  • the intermediate layer 4 may have a multilayer structure.
  • Examples of the method for varying the deformation amount or hardness on both surfaces of the intermediate layer 4 include surface modification treatment and inactivation treatment. Both of these processes may be performed, or only one of them may be performed.
  • ⁇ Surface modification treatment> Examples of the surface modification treatment include plasma treatment, corona discharge treatment, electron beam irradiation treatment, ultraviolet ray irradiation treatment, ozone treatment, radiation (X-ray, ⁇ -ray, ⁇ -ray, ⁇ -ray, neutron ray) irradiation treatment and the like. It is done. Among these treatments, plasma treatment, corona discharge treatment, and electron beam irradiation treatment are preferable from the viewpoint of processing speed, but are not limited to these as long as they have a certain amount of irradiation energy and can modify the material. .
  • ⁇ Plasma treatment In the case of plasma processing, as the plasma generator, for example, a parallel plate type, a capacitive coupling type, an inductive coupling type, or an atmospheric pressure plasma apparatus can be used. From the viewpoint of durability, reduced pressure plasma treatment is preferred.
  • the reaction pressure in the plasma treatment is not particularly limited and may be appropriately selected depending on the intended purpose, but is preferably 0.05 Pa to 100 Pa, more preferably 1 Pa to 20 Pa.
  • the reaction atmosphere in the plasma treatment is not particularly limited and can be appropriately selected according to the purpose. For example, an inert gas, a rare gas, oxygen or the like is effective, but argon is effective in sustaining the effect. preferable.
  • the oxygen partial pressure is preferably 5,000 ppm or less.
  • production of ozone can be suppressed as the oxygen partial pressure in reaction atmosphere is 5,000 ppm or less, and use of an ozone treatment apparatus can be refrained.
  • the irradiation power amount in the plasma processing is defined by (output ⁇ irradiation time).
  • the irradiation power amount is preferably 5 Wh to 200 Wh, and more preferably 10 Wh to 50 Wh.
  • the intermediate layer 4 can be provided with a power generation function, and durability is not reduced by excessive irradiation.
  • corona discharge treatment The applied energy in corona discharge treatment (cumulative energy), preferably 6J / cm 2 ⁇ 300J / cm 2, 12J / cm 2 ⁇ 60J / cm 2 is more preferable.
  • the intermediate layer 4 can be provided with a power generation function, and the durability is not reduced by excessive irradiation.
  • the dose in the electron beam irradiation treatment is preferably 1 kGy or more, more preferably 300 kGy to 10 MGy.
  • the intermediate layer 4 can be provided with a power generation function, and durability is not reduced by excessive irradiation.
  • limiting in particular as reaction atmosphere in an electron beam irradiation process Although it can select suitably according to the objective, It fills with inert gas, such as argon, neon, helium, nitrogen, and oxygen partial pressure is 5,000 ppm or less. It is preferable that Generation
  • the ultraviolet ray in the ultraviolet irradiation treatment is preferably 200 nm or more at a wavelength of 365 nm or less, and more preferably 240 nm or more at a wavelength of 320 nm or less.
  • the integrated light intensity in the ultraviolet irradiation treatment preferably 5J / cm 2 ⁇ 500J / cm 2, 50J / cm 2 ⁇ 400J / cm 2 is more preferable. If the integrated light quantity is within a preferable range, the intermediate layer 4 can be provided with a power generation function, and durability is not reduced by excessive irradiation.
  • reaction atmosphere in an ultraviolet irradiation process there is no restriction
  • production of ozone can be suppressed as the oxygen partial pressure in reaction atmosphere is 5,000 ppm or less, and use of an ozone treatment apparatus can be refrained.
  • an active group is formed by excitation or oxidation by plasma treatment, corona discharge treatment, ultraviolet irradiation treatment, electron beam irradiation treatment, etc., and the interlayer adhesion is increased.
  • the technique is limited to application between layers, and application to the outermost surface has been found to be unfavorable because it rather reduces mold release.
  • the reaction is performed in an oxygen-rich state, and a reactive group (hydroxyl group) is effectively introduced. Therefore, such a conventional technique is different from the surface modification treatment of the present invention.
  • the surface modification treatment of the present invention promotes re-crosslinking and bonding of the surface because of treatment in a reaction environment with low oxygen and reduced pressure (for example, plasma treatment), for example, “Si—O bond with high binding energy”. Durability is improved due to "increase”. In addition, it is considered that the releasability is improved due to “densification by improving crosslinking density”.
  • a part of the active group is also formed, but the active group is inactivated by a coupling agent or air drying treatment described later.
  • the surface of the intermediate layer 4 may be appropriately deactivated using various materials.
  • the inactivation treatment is not particularly limited as long as the surface of the intermediate layer 4 is inactivated, and can be appropriately selected according to the purpose.
  • an inactivation agent is added to the intermediate layer 4.
  • a treatment applied to the surface is mentioned.
  • Inactivation means that the surface of the intermediate layer 4 is changed to a property that hardly causes a chemical reaction. This change is caused by reacting an active group (for example, —OH) generated by excitation or oxidation caused by plasma treatment, corona discharge treatment, ultraviolet irradiation treatment, electron beam irradiation treatment, etc. with an inactivating agent. It is obtained by reducing the surface activity.
  • an active group for example, —OH
  • Examples of the deactivator include an amorphous resin and a coupling agent.
  • Examples of the amorphous resin include a resin having a perfluoropolyether structure in the main chain.
  • Examples of the coupling agent include metal alkoxides and solutions containing metal alkoxides.
  • Examples of the metal alkoxide include a compound represented by the following general formula (1), a partially hydrolyzed polycondensate having a polymerization degree of about 2 to 10, or a mixture thereof.
  • R 1 (4-n) Si (OR 2 ) n General formula (1)
  • R 1 and R 2 each independently represents any of a linear or branched alkyl group having 1 to 10 carbon atoms, an alkyl polyether chain, and an aryl group.
  • . n represents an integer of 2 to 4.
  • the inactivation treatment may be performed, for example, by impregnating the surface of the intermediate layer precursor with an inactivating agent by coating or dipping after the surface modification treatment is performed on the intermediate layer precursor such as rubber. it can.
  • an inactivating agent such as silicone rubber
  • after the surface modification treatment it may be deactivated by standing in the air and air drying.
  • the oxygen concentration profile in the thickness direction of the intermediate layer 4 preferably has a maximum value.
  • the carbon concentration profile in the thickness direction of the intermediate layer 4 preferably has a minimum value.
  • the oxygen concentration profile and the carbon concentration profile can be obtained by X-ray photoelectron spectroscopy (XPS). Examples of the measurement method include the following methods.
  • Measuring apparatus Ulvac-PHI Quantera SXM, manufactured by ULVAC-PHI Co., Ltd.
  • Measuring light source Al (mono) Measurement output: 100 ⁇ m ⁇ , 25.1 W Measurement area: 500 ⁇ m ⁇ 300 ⁇ m Pass energy: 55 eV (narrow scan) Energy step: 0.1 eV (narrow scan)
  • Relative sensitivity coefficient PHI relative sensitivity coefficient used
  • XPS by capturing the electrons popping out by the photoelectron effect, it is possible to know the concentration ratio of atoms in the measurement object and the bonding state.
  • Silicone rubber has a siloxane bond, and the main components are Si, O, and C. Therefore, when silicone rubber is used as the material in the intermediate layer 4, a wide scan spectrum of XPS is measured, and from the relative peak intensity ratio of each element, the existing concentration in the depth direction of each atom existing inside from the surface layer The ratio can be determined. An example is shown in FIG. Here, each atom is Si, O, and C, and the existence concentration ratio is (atomic%).
  • FIG. 2 is a sample of the intermediate layer 4 obtained by using silicone rubber and further performing the surface modification treatment (plasma treatment) and the inert treatment. In FIG. 2, the horizontal axis represents the analysis depth from the surface to the inside, and the vertical axis represents the concentration ratio.
  • the element bonded to silicon and the bonding state can be known by measuring the energy at which the electrons of the 2p orbit of Si jump out. Therefore, peak separation was performed from the narrow scan spectrum in the Si2p orbital indicating the Si bonding state to obtain the chemical bonding state.
  • FIG. 3 is the sample used for the measurement in FIG.
  • the horizontal axis is the binding energy
  • the vertical axis is the intensity ratio.
  • the measurement spectrum in the depth direction is shown from the bottom to the top.
  • the amount of peak shift depends on the bonding state, and in the case of silicone rubber related to the present case, the peak shift to the high energy side in the Si2p orbit means that the number of oxygen bonded to Si. Indicates an increase.
  • oxygen increases from the surface layer toward the inside to have a maximum value, and carbon decreases to have a minimum value. Further analysis in the depth direction causes oxygen to decrease and carbon to increase, resulting in an atomic concentration equivalent to that of untreated silicone rubber. Further, the maximum value of oxygen detected at the position of ⁇ in FIG. 2 coincides with the shift of the Si2p bond energy shift to the higher energy side (position of ⁇ in FIG. 3), and the increase in oxygen was bonded to Si. It has been shown to be due to the number of oxygen.
  • FIG. 4 The results of the same analysis on the untreated silicone rubber are shown in FIG. 4 and FIG. FIG. 4 does not show the maximum value of oxygen concentration and the minimum value of carbon concentration as seen in FIG. Further, from FIG. 5, it was confirmed that the number of oxygen bonded to Si did not change because the Si2p bond energy shift did not shift to the high energy side.
  • the inactivating agent soaks into the intermediate layer 4 by applying or dipping the inactivating agent such as a coupling agent to the surface of the intermediate layer 4 and allowing it to penetrate.
  • the coupling agent is a compound represented by the general formula (1)
  • the polyorganosiloxane is present in the intermediate layer 4 with a concentration distribution, and this distribution indicates that oxygen atoms contained in the polyorganosiloxane are present.
  • the distribution has a maximum value in the depth direction.
  • the intermediate layer 4 contains a polyorganosiloxane having silicon atoms bonded to 3 to 4 oxygen atoms.
  • the inactivation treatment method is not limited to the dipping method.
  • the intermediate layer 4 does not need to have an initial surface potential in a stationary state.
  • the initial surface potential in the stationary state can be measured under the following measurement conditions.
  • having no initial surface potential means ⁇ 10 V or less when measured under the following measurement conditions.
  • the element 1 of the present embodiment charging by a mechanism similar to frictional charging and generation of a surface potential difference due to internal charge retention are static due to a difference in deformation based on a difference in hardness between both surfaces of the intermediate layer 4. By creating a bias in the capacitance, it is assumed that the charge moves to generate electricity.
  • the element 1 preferably has a space between the intermediate layer 4 and at least one of the first electrode 2 and the second electrode 3. By doing so, the amount of power generation can be increased.
  • the method of providing the space is not particularly limited and may be appropriately selected depending on the purpose. For example, a spacer is provided between the intermediate layer 4 and at least one of the first electrode 2 and the second electrode 3. And a method of arranging these.
  • the material of the spacer include a polymer material, rubber, metal, a conductive polymer material, and a conductive rubber composition.
  • the polymer material include polyethylene, polypropylene, polyethylene terephthalate, polyvinyl chloride, polyimide resin, fluorine resin, and acrylic resin.
  • the rubber examples include silicone rubber, modified silicone rubber, acrylic rubber, chloroprene rubber, polysulfide rubber, urethane rubber, butyl rubber, fluorosilicone rubber, natural rubber, ethylene / propylene rubber, nitrile rubber, fluorine rubber, isoprene rubber, Examples thereof include butadiene rubber, styrene / butadiene rubber, acrylonitrile / butadiene rubber, ethylene / propylene / diene rubber, chlorosulfonated polyethylene rubber, polyisobutylene, and modified silicone.
  • Examples of the metal include gold, silver, copper, aluminum, stainless steel, tantalum, nickel, and phosphor bronze.
  • Examples of the conductive polymer material include polythiophene, polyacetylene, polyaniline, and the like.
  • Examples of the conductive rubber composition include a composition containing a conductive filler and rubber.
  • Examples of the conductive filler include carbon materials (eg, ketjen black, acetylene black, graphite, carbon fiber, carbon fiber, carbon nanofiber, carbon nanotube, graphene, etc.), metal (eg, gold, silver, platinum, Conductive polymer materials such as copper, iron, aluminum, nickel (eg, polythiophene, polyacetylene, polyaniline, polypyrrole, polyparaphenylene, and polyparaphenylene vinylene derivatives, or their derivatives represented by anions or cations) And the like, and ionic liquids.
  • carbon materials eg, ketjen black, acetylene black, graphite, carbon fiber, carbon fiber, carbon nanofiber, carbon nanotube, graphene, etc.
  • metal eg, gold, silver, platinum
  • Conductive polymer materials such as copper, iron, aluminum, nickel (eg, polythiophene, polyacetylene, polyaniline, polypyrrole, polyparaphenylene, and polyparaphenylene
  • Examples of the rubber include silicone rubber, modified silicone rubber, acrylic rubber, chloroprene rubber, polysulfide rubber, urethane rubber, butyl rubber, fluorosilicone rubber, natural rubber, ethylene / propylene rubber, nitrile rubber, fluorine rubber, isoprene rubber, Examples thereof include butadiene rubber, styrene / butadiene rubber, acrylonitrile / butadiene rubber, ethylene / propylene / diene rubber, chlorosulfonated polyethylene rubber, polyisobutylene, and modified silicone.
  • Examples of the form of the spacer include a sheet, a film, a woven fabric, a nonwoven fabric, a mesh, and a sponge. The shape, size, thickness, and installation location of the spacer can be appropriately selected according to the structure of the element.
  • the surface modification treatment or inactivation treatment is performed on the first electrode a side of the intermediate layer b. Is performed, the first electrode a side of the intermediate layer b becomes harder than the second electrode c side. Accordingly, the universal hardness is H1> H2.
  • the element 1 is disposed between the first and second electrodes 2 and 3 as a pair of electrodes, and the first electrode 2 and the second electrode 3, and has deformability.
  • the intermediate layer 4, the LED 30 as detection means for operation confirmation, and the rectifier circuit 40 are included.
  • the element 1 also has a PET film 50 which is an exterior member formed so as to cover the first electrode 2, the second electrode 3, and the intermediate layer 4.
  • the intermediate layer 4 is a rubber or rubber composition formed by subjecting a silicone rubber member to surface modification treatment by corona discharge.
  • the silicone rubber member used for the intermediate layer 4 is made of silicone rubber (manufactured by Shin-Etsu Chemical Co., KE-1603) and has a film thickness of about 100 ⁇ 10 ⁇ m. That is, the intermediate layer 4 contains a silicon compound as a material. Silicone rubber members are blade-coated with silicone rubber as a material, fired at 120 ° C. for 30 minutes at high temperature, and then subjected to corona discharge treatment at an applied voltage of 100 V and an accumulated energy of 500 J / cm 2 to obtain a rectangular shape having a length of 20 mm and a width of 50 mm. It is processed into a shape.
  • the intermediate layer 4 is a rubber or a rubber composition containing a silicon compound as a material.
  • the intermediate layer 4 is not limited to such a configuration, and may be any material that includes a silicon compound as a material and has deformability. good.
  • deformability includes flexibility and rubber elasticity, and more specifically indicates deformability to the extent that it is deformed by an external force applied by the user.
  • the first electrode 2 is patterned so as to be placed on the silicone rubber member.
  • the LED 30 is connected to the rectifier circuit 40 as shown in FIG.
  • a voltmeter such as an oscilloscope may be disposed at the position where the LED 30 is connected.
  • the first electrode 2, the second electrode 3, and the intermediate layer 4 are all covered with a PET film 50 as an exterior member and sealed with a sealing portion 51 as shown in FIG. 8A. .
  • a pair of electrodes 2 and 3 and the intermediate layer 4 are covered with the exterior member and packaged, and the word “cellular” is particularly used.
  • the element 1 has a function as a cell in which the element 1 and the rectifier circuit 40 are integrally formed when held in the mode shown in FIG. Further, the elements 1 may be connected and arranged side by side as shown in FIG. 8B to form one power generation element.
  • Alpet 9-100 manufactured by Panac, aluminum foil thickness 9 ⁇ m, PET film thickness 100 ⁇ m
  • the second electrode 3 is a continuous belt-like electrode and is disposed in contact with the intermediate layer 4.
  • a spacer or the like may be disposed between the first electrode 2 or the second electrode 3 and the intermediate layer 4. According to such a configuration, the intermediate layer 4 is likely to be peeled off as described later, so that the piezoelectric effect of the element 1 is improved.
  • Example 2 In place of the plasma treatment in Example 1, a UV irradiation lamp (VL-215.C manufactured by Vilver Lumat) was used, under a nitrogen atmosphere having a wavelength of 254 nm, an integrated light quantity of 300 J / cm 2 , and an oxygen partial pressure of 5000 ppm or less. Irradiation treatment was performed under conditions, and an element was produced in the same manner as in Example 1.
  • VL-215.C manufactured by Vilver Lumat a UV irradiation lamp
  • Example 3 Instead of the plasma treatment in Example 1, an electron beam irradiation (a line irradiation type low energy electron beam irradiation source manufactured by Hamamatsu Photonics) was used, and the irradiation treatment was performed under conditions of a nitrogen atmosphere with an irradiation dose of 1 MGy and an oxygen partial pressure of 5000 ppm or less. A device was fabricated in the same manner as in Example 1.
  • an electron beam irradiation a line irradiation type low energy electron beam irradiation source manufactured by Hamamatsu Photonics
  • Example 4 Regarding the fixing structure of the first electrode 2 and the second electrode 3, as shown in FIGS. 9A and 9B, the fixing layer 70 is located between the first electrode 2 and the second electrode 3, The first electrode 2 and the second electrode 3 are bonded to each other. With this configuration, when the element 1 is bent, the first electrode 2 or the second electrode 3 and the intermediate layer 4 slide relative to each other, in other words, slide.
  • the first electrode 2 and the PET film 50 and the adhering respectively similarly to adhere the second electrode 3 and the PET film 50, the difference moving distance d 1 by the curvature of the flexion 10A and 10B may be configured to slide and move.
  • Example 5 A rubber (Dow Corning DY35-2147 manufactured by Toray Industries, Inc.) is used as the silicone rubber member of the intermediate layer 4.
  • the rubber contains iron oxide as a material, and therefore has unpaired electrons derived from iron oxide in the structure in addition to unpaired electrons derived from the silicon compound generated by the surface treatment.
  • Example 1 A metal-coated piezo film sheet (200 ⁇ 280 ⁇ 110 CuNi manufactured by Tokyo Sensor) was cut into a length of 20 mm and a width of 50 mm, the metal portions of the first electrode 2 and the second electrode 3 in Example 1 were all removed by etching, and the upper and lower electrodes Were connected as shown in FIG. 8A and FIG. 8B to produce an element. That is, in this embodiment, a CuNi film covered with a piezo film sheet is used as an electrode.
  • Comparative Example 2 The same metal-coated piezo film sheet as in Comparative Example 1 was etched both vertically and with a ferric chloride aqueous solution (H-200A manufactured by Sanhayato). This was put in place of the silicone rubber member of Example 1 to produce an element.
  • H-200A ferric chloride aqueous solution manufactured by Sanhayato
  • FIG. 4 About the structure similar to Example 1, the member which carried out the charging process of the polypropylene (PP) film substantially uniformly by corona discharge was cut into 20 mm length and 50 mm width, and was used as the intermediate
  • FIG. The corona charger has a corona needle and electrode facing each other, can be discharged by a DC high-voltage power supply (HAR-20R5; manufactured by Matsusada Precision), and a grid is placed between the corona needle and the electrode. Yes. A voltage can be applied to the grid from a grid power supply different from the DC high-voltage power supply device.
  • An element was fabricated using a thin film charged (electretized) under the discharge conditions shown below as the intermediate layer 4. [Charging conditions] Corona needle voltage: -10 kV Grid voltage: -1 kV The potential difference between both surfaces of the intermediate layer 4 using polypropylene was about 200V.
  • Comparative Example 5 The whole polypropylene (PP) film having a thickness of 100 ⁇ m was subjected to charging treatment substantially uniformly by corona discharge in the same manner as in Comparative Example 4. Note that the potential difference between both surfaces of the intermediate layer 4 was about 200 V as in Comparative Example 4. As in Comparative Example 4, the length is set to 20 mm and the width is set to 50 mm. Instead of the silicone rubber member of Example 1, a mask pattern is used on the surface in contact with the first electrode 2 at an equal interval of about 10 mm. Then, the first electrode 2 and the intermediate layer 4 were partially point-bonded by arranging and applying in a dot shape having a diameter of about 1 mm and a thickness of 100 ⁇ m.
  • Example 1 Each of the elements prepared as described above was evaluated as follows, and the results shown in Table 1 were obtained. From the results shown in Table 1, when Examples 1, 2, 3, 4, 5 and Comparative Example 2 are compared, those using the material and configuration of the present invention have high power generation performance and do not break down due to the occurrence of discharge. I can say that. In terms of durability, when Examples 1, 2, 3, 4, 5 and Comparative Example 5 are compared, those having a point adhesion structure have a low fracture durability. When Example 3 and Comparative Example 3 are compared, it can be seen that even if the same silicone rubber has no unpaired electrons, the power generation performance is not good. That is, it is considered that by treating the surface of the silicone rubber member, unpaired electrons are stably maintained as will be described later, thereby contributing to improvement in power generation performance.
  • the power generation performance of the element 1 is measured using a vibration evaluator shown in FIG.
  • the vibration evaluation machine is configured by combining a function generator SG-4105 (manufactured by Iwasaki Tsushinsha) and a vibration tester MES151 (manufactured by Mitsutoyo), so that both sides of the element 1 when the vibration head unit 500 moves up and down are arranged. Evaluate by voltage waveform.
  • the power generating element 1 formed in a cell shape was fixed horizontally on the vibration head unit 500, and was vibrated at a vibration width of 5 mm and a vibration frequency of 10 Hz.
  • the voltage waveform measured when the power generating element 1 is vibrated in this way is the voltage between the first electrode 2 and the second electrode 3, and the maximum value and the minimum value pp of the voltage are applied.
  • the values are shown in Table 1.
  • the pp value of the voltage of Comparative Example 1 measured in the same manner was normalized as 1, and a value of 5 times or more was determined to be a good result, and indicated in the determination column with a circle.
  • the endurance test of 10,000 round trips was performed, and about the comparative example 2 with a large reduction rate, let the frequency
  • ESR Electron Spin Resonance
  • the g value which is a function of the magnetic field strength, is displayed on the horizontal axis, and the first derivative waveform of the absorption spectrum is displayed on the vertical axis.
  • the g value is a value specific to each ESR signal determined by the frequency ( ⁇ ) of the microwave applied to the sample and the strength (H) of the resonance magnetic field.
  • the ESR signal and the lattice defect are identified by the g value.
  • the ESR signal is used to observe a resonance phenomenon caused by absorption of microwaves (electromagnetic wave having a frequency of about 9.4 GHz and a wavelength of about 3 cm: X band) associated with a transition of spins of unpaired electrons. Means that there are unpaired electrons in the sample. In other words, the detection of the peak of the measured waveform when taking the horizontal axis g value is equivalent to the detection of unpaired electrons.
  • FIG. 13A shows the ESR signal of the intermediate layer 4 described in the third embodiment
  • FIG. 13B shows the ESR signal of the intermediate layer 4 of the comparative example 3. From comparison between FIG. 13A and FIG. 13B, it is clear that the intermediate layer 4 in this embodiment has unpaired electrons.
  • FIG. 13A The way of viewing FIG. 13A will be described in more detail.
  • the ESR signal intensity is substantially symmetric with respect to the inversion position.
  • the waveform shown in FIG. 13A is asymmetric with respect to the inversion position Q in both T1 and T2
  • the intermediate layer 4 is anisotropic in structure.
  • the peak value g C of the ESR signal is detected between the g values 2.070 to 2.001.
  • the influence of electron thermal motion and relaxation time is reduced, so that the sensitivity of the ESR signal is improved and an ESR signal that is difficult to see in a room temperature environment is measured.
  • the peak value g C not detected in the measurement result T1 is considered to indicate a peroxide radical.
  • the intermediate layer 4 in the present embodiment has “at least one peak between g values of 2.004 and 1.998 when measured using an electron spin resonance apparatus”. Further, as is apparent from the measurement result T2, the intermediate layer 4 in this embodiment is “at least between g values 2.070 to 2.001 when measured at ⁇ 150 ° C. using an electron spin resonance apparatus. It has one peak ".
  • ⁇ is 80% or more, ⁇ is about 30%, and no peak was detected. Those are shown in Table 1 as x.
  • FIG. 10A is a schematic diagram illustrating an operation when the element 1 illustrated in FIG. 1 is bent by an external force. Due to the deformation of the element 1, the first electrode 2 or the second electrode 3 abuts on the surface of the intermediate layer 4 and moves away from or slides on the surface of the intermediate layer 4. Electron movement occurs due to work function difference.
  • V represents an electromotive force generated between the first electrode 2 and the second electrode 3
  • ⁇ represents a dielectric constant
  • A represents an area of the element 1
  • ⁇ d represents a displacement amount.
  • the intermediate layer 4 may be provided with a void portion separated from one of the first electrode 2 or the second electrode 3 on the surface containing a silicon compound having unpaired electrons as a material.
  • one of the first electrode 2 or the second electrode 3 and the intermediate layer 4 are likely to be deformed so as to be separated from each other, and the power generation efficiency of the element 1 is improved.
  • such a deformation is not only a displacement of the element 1 in the thickness direction but also a deformation in which one of the first electrode 2 or the second electrode 3 and the intermediate layer 4 slide. May be. That is, when the element 1 is bent by an external force, the deformation may be such that at least one of the pair of electrodes and the intermediate layer 4 slide due to the difference in the moving distance d 1 caused by the curvature.
  • the fixed layer 70 is fixed with insulation between the first electrode 2 and the second electrode 3, and the movement distance d caused by the curvature when the element 1 is bent by an external force. Due to the difference in 1 , at least one of the pair of electrodes and the intermediate layer 4 are fixed so as to slide. With this configuration, even when the element 1 is bent by an external force, the element 1 functions as a power generation element that converts deformation due to the external force into electrical energy.
  • Example 4 at least a part of the PET film 50 and the first electrode 2 or the second electrode 3 is fixed, and due to the difference in the movement distance d 1 caused by the curvature when the element 1 is bent by an external force, At least one of the first electrode 2 or the second electrode 3 and the intermediate layer 4 slide. With this configuration, even when the element 1 is bent by an external force, the element 1 functions as a power generation element that converts deformation due to the external force into electrical energy.
  • the element 1 shown in the first to fifth embodiments and the rectifier circuit 40 may be used as a power generator having the element 1 shown in the first to fifth embodiments and the rectifier circuit 40 and having a restoring force against an external force.
  • the element 1 even when the element 1 is bent by an external force, the element 1 repeatedly converts deformation due to the external force into electrical energy, and thus has a function as a power generator capable of generating power continuously.
  • the element shown in the above embodiment may be used not only as a power generation element but also as a sensor as a detection element that detects contact as an electric signal. Further, any other element may be used as long as it is converted from external force to electric energy.
  • the effects described in the embodiments of the present invention are merely examples of the most preferable effects resulting from the present invention, and the effects of the present invention are not limited to those described in the embodiments of the present invention. .

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Laminated Bodies (AREA)
  • Electrostatic Charge, Transfer And Separation In Electrography (AREA)
  • General Electrical Machinery Utilizing Piezoelectricity, Electrostriction Or Magnetostriction (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)

Abstract

L'invention concerne un élément (1) qui a : une paire d'électrodes (2 et 3) ; et une couche intermédiaire déformable (4) qui est disposée entre la paire d'électrodes (2 et 3), et contient un composé de silicium ayant des électrons non appariés comme matériau de ce dernier. La couche intermédiaire (4) peut contenir des particules ayant des électrons non appariés. La couche intermédiaire (4) peut avoir une élasticité de caoutchouc. La couche intermédiaire (4) peut avoir au moins une crête entre une valeur g de 2,070 à 2,001 lorsqu'elle est mesurée dans une température ambiante de -150°C à l'aide d'un dispositif de résonance paramagnétique électronique (ESR). La couche intermédiaire (4) peut avoir au moins une crête entre une valeur g de 2,070 à 2,001 lorsqu'elle est mesurée dans une température ambiante de -150°C à l'aide d'un dispositif de résonance paramagnétique électronique (ESR).
PCT/JP2016/085401 2016-03-07 2016-11-29 Élément, cellule et dispositif de génération d'énergie WO2017154286A1 (fr)

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EP16893610.2A EP3429075B1 (fr) 2016-03-07 2016-11-29 Élément, cellule et dispositif de génération d'énergie
US16/080,993 US11189778B2 (en) 2016-03-07 2016-11-29 Element, cell, and power generation device
JP2018504001A JP6658864B2 (ja) 2016-03-07 2016-11-29 素子、セル及び発電装置
KR1020187024752A KR102115870B1 (ko) 2016-03-07 2016-11-29 소자, 셀, 및 발전 디바이스

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7491013B2 (ja) 2020-03-26 2024-05-28 三菱ケミカル株式会社 積層圧電シート

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6870200B2 (ja) * 2014-11-13 2021-05-12 株式会社リコー 素子、及び発電装置
CN108885146B (zh) * 2016-01-29 2020-12-18 株式会社理光 压敏传感器，抓取装置和机器人
US11176918B2 (en) * 2016-11-30 2021-11-16 Yupo Corporation Piezoelectric element and musical instrument
GB201707486D0 (en) * 2017-05-10 2017-06-21 Univ Bristol Radiation powered devices comprising diamond material
DE102018221053A1 (de) * 2018-04-05 2019-10-10 Continental Reifen Deutschland Gmbh Vorrichtung zum Messen einer mechanischen Kraft, umfassend eine erste, zweite, dritte, vierte und fünfte Schicht sowie die Verwendungen der Vorrichtung und Reifen oder technischer Gummiartikel umfassend die Vorrichtung
KR102143112B1 (ko) * 2018-09-04 2020-08-10 한국과학기술연구원 복합체 액추에이터 장치
JP2021064690A (ja) * 2019-10-11 2021-04-22 株式会社リコー 素子および素子の製造方法
US20220020253A1 (en) * 2020-07-15 2022-01-20 Palo Alto Research Center Incorporated Systems and methods for improved object placement sensing for point-of-purchase sales
CN112928944B (zh) * 2021-01-25 2022-09-16 江苏大学 一种基于摩擦纳米发电机的波浪能发电装置
US12009159B2 (en) 2021-04-13 2024-06-11 Xerox Corporation Membrane switches configured to sense pressure applied from compliant and rigid objects

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004120809A (ja) * 2002-09-24 2004-04-15 Ricoh Co Ltd 無機エレクトレットアクチュエータ及びその製造方法、液滴吐出ヘッド、光学デバイス、圧力センサ、発振器、モータ
WO2013157643A1 (fr) * 2012-04-20 2013-10-24 旭化成イーマテリアルズ株式会社 Composition de polysiloxane ayant un groupe réticulable par voie radicalaire
JP2014220949A (ja) * 2013-05-09 2014-11-20 バンドー化学株式会社 アクチュエータ素子、アクチュエータ、可撓性シート及びアクチュエータ素子の製造方法
JP5699641B2 (ja) * 2011-01-31 2015-04-15 大日本印刷株式会社 積層体およびその製造方法
JP2015122922A (ja) * 2013-12-25 2015-07-02 株式会社ビスキャス 振動発電体

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SE347356B (fr) 1970-03-20 1972-07-31 Essem Metotest Ab
US5376590A (en) * 1992-01-20 1994-12-27 Nippon Telegraph And Telephone Corporation Semiconductor device and method of fabricating the same
US5699641A (en) 1996-02-23 1997-12-23 Usg Interiors, Inc. Suspension ceiling with integrated openings
JP2002075987A (ja) 2000-08-25 2002-03-15 Toyota Central Res & Dev Lab Inc 半導体装置の製造方法
JP3694740B2 (ja) 2001-03-08 2005-09-14 独立行政法人産業技術総合研究所 薄型圧力センサ及びそれを用いた人体情報計測装置
US6823739B2 (en) 2001-12-20 2004-11-30 National Institute Of Advanced Industrial Science And Technology Thin pressure sensor and biological information measuring device using same, and biological information measuring method
JP2006278583A (ja) * 2005-03-28 2006-10-12 Dainippon Printing Co Ltd 有機薄膜太陽電池
JP2009232677A (ja) 2008-02-25 2009-10-08 Nsk Ltd エラストマートランスデューサーおよび誘電性ゴム組成物ならびに発電素子
JP2011049073A (ja) 2009-08-27 2011-03-10 Nsk Ltd 発電素子
TWI538218B (zh) * 2010-09-14 2016-06-11 半導體能源研究所股份有限公司 薄膜電晶體
GB201016193D0 (en) * 2010-09-27 2010-11-10 Univ Bolton Hybrid energy conversion device
WO2012046560A1 (fr) * 2010-10-04 2012-04-12 Semiconductor Energy Laboratory Co., Ltd. Matériau composite, élément électroluminescent, dispositif électroluminescent, dispositif électronique et dispositif d'éclairage
CN103339715B (zh) * 2010-12-03 2016-01-13 株式会社半导体能源研究所 氧化物半导体膜以及半导体装置
JP5691080B2 (ja) 2012-07-25 2015-04-01 株式会社ビスキャス 振動発電体およびその製造方法と発電方法
WO2014105959A1 (fr) * 2012-12-28 2014-07-03 Dow Corning Corporation Composition durcissable d'organopolysiloxane pour transducteurs et applications de cette composition durcissable de silicone pour des transducteurs
CN103368453B (zh) 2013-03-12 2016-04-13 北京纳米能源与系统研究所 一种滑动摩擦纳米发电机及发电方法
CN103354429B (zh) 2013-03-12 2015-09-16 北京纳米能源与系统研究所 一种滑动摩擦纳米发电机及发电方法
CN104135186A (zh) 2013-05-03 2014-11-05 纳米新能源（唐山）有限责任公司 悬臂梁结构式摩擦发电机和发电机组
CN104283453B (zh) 2013-07-11 2017-02-15 北京纳米能源与系统研究所 滑动摩擦发电机、发电方法以及矢量位移传感器
CN104426414B (zh) 2013-08-23 2016-08-10 纳米新能源（唐山）有限责任公司 发电效果改善的摩擦发电机及其制备方法
JP2015198154A (ja) 2014-04-01 2015-11-09 帝人株式会社 圧電素子
US20160088696A1 (en) 2014-09-19 2016-03-24 Osamu Kizaki System for controlling control target units, method of controlling control target units, and recording medium
US20160088706A1 (en) 2014-09-19 2016-03-24 Osamu Kizaki Detection device, detection method, and recording medium storing a detection program
JP6699119B2 (ja) 2015-01-22 2020-05-27 株式会社リコー 素子及び発電装置
JP6618035B2 (ja) 2015-03-09 2019-12-11 株式会社リコー 素子、及び発電装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004120809A (ja) * 2002-09-24 2004-04-15 Ricoh Co Ltd 無機エレクトレットアクチュエータ及びその製造方法、液滴吐出ヘッド、光学デバイス、圧力センサ、発振器、モータ
JP5699641B2 (ja) * 2011-01-31 2015-04-15 大日本印刷株式会社 積層体およびその製造方法
WO2013157643A1 (fr) * 2012-04-20 2013-10-24 旭化成イーマテリアルズ株式会社 Composition de polysiloxane ayant un groupe réticulable par voie radicalaire
JP2014220949A (ja) * 2013-05-09 2014-11-20 バンドー化学株式会社 アクチュエータ素子、アクチュエータ、可撓性シート及びアクチュエータ素子の製造方法
JP2015122922A (ja) * 2013-12-25 2015-07-02 株式会社ビスキャス 振動発電体

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of EP3429075A4 *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7491013B2 (ja) 2020-03-26 2024-05-28 三菱ケミカル株式会社 積層圧電シート

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US20190103548A1 (en) 2019-04-04
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JP6658864B2 (ja) 2020-03-04
EP3429075A1 (fr) 2019-01-16
CN108702108A (zh) 2018-10-23
KR102115870B1 (ko) 2020-05-28
EP3429075B1 (fr) 2020-10-28
JPWO2017154286A1 (ja) 2018-10-04
CN108702108B (zh) 2020-04-14

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