WO2017140043A1 - 彩膜基板及其制作方法、显示面板、显示装置 - Google Patents

彩膜基板及其制作方法、显示面板、显示装置 Download PDF

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Publication number
WO2017140043A1
WO2017140043A1 PCT/CN2016/081672 CN2016081672W WO2017140043A1 WO 2017140043 A1 WO2017140043 A1 WO 2017140043A1 CN 2016081672 W CN2016081672 W CN 2016081672W WO 2017140043 A1 WO2017140043 A1 WO 2017140043A1
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Prior art keywords
color filter
layer
light shielding
filter substrate
substrate according
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PCT/CN2016/081672
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English (en)
French (fr)
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李宁
刘晓那
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京东方科技集团股份有限公司
北京京东方显示技术有限公司
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Priority to US15/527,911 priority Critical patent/US10203543B2/en
Publication of WO2017140043A1 publication Critical patent/WO2017140043A1/zh

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2201/00—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
    • G02F2201/50—Protective arrangements
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2202/00—Materials and properties
    • G02F2202/02—Materials and properties organic material

Definitions

  • Embodiments of the present invention relate to a liquid crystal display technology, and in particular to a color filter substrate capable of suppressing light leakage and a method of fabricating the same, and a display panel including the color filter substrate and a display device including the display panel.
  • the display panel includes a color filter substrate and a thin film transistor (TFT) cell aligned with the color filter substrate.
  • the color filter substrate generally comprises a base substrate, a black matrix, a color filter layer, a protective layer, etc., and the manufacturing process comprises the steps of: forming a black matrix on the base substrate, and then forming a translucent red, green, and black matrix. The color filter layer of the blue primary color is then coated with a smooth protective layer on the color filter layer.
  • the main function of the black matrix is to prevent light leakage between pixels and to increase the contrast of colors.
  • the materials constituting the black matrix are generally classified into two types, a thin metal layer (for example, an oxide layer) and a thin resin layer (for example, a black photoresist thin layer, with carbon black as a main material).
  • the step of forming a black matrix on the base substrate requires a complicated process, and the process control is complicated, which is disadvantageous for the improvement of the yield of the liquid crystal panel.
  • the industry has tried to solve this problem through various methods, it has not achieved much, and it has also led to a significant increase in manufacturing costs. Therefore, how to eliminate or suppress the light leakage of the display panel at a low cost has become a difficult problem that plagues the industry.
  • An object of an embodiment of the present invention is to provide a color filter substrate which has the advantages of good light leakage suppression effect and low manufacturing cost.
  • a light shielding layer formed on the alignment layer at a position corresponding to a peripheral region of the filter.
  • the light shielding layers corresponding to the peripheral regions of the adjacent filters are integrally formed.
  • the material for forming the light shielding layer includes a liquid crystal host, a monomer, and a photoinitiator.
  • the monomer includes a mixture of hexadecyl methacrylate and methyl methacrylate in a molar ratio of 1:1.
  • the photoinitiator is azobisisobutyronitrile.
  • Another object of the embodiments of the present invention is to provide a liquid crystal display panel which has the advantages of good light leakage suppression effect and low manufacturing cost.
  • Still another object of an embodiment of the present invention is to provide a display device having advantages of suppressing light leakage effect and manufacturing cost.
  • a display device includes the liquid crystal display panel as described above.
  • Still another object of the embodiments of the present invention is to provide a method for fabricating a color filter substrate, which has the advantages of good light leakage suppression effect and low manufacturing cost.
  • a light shielding layer is formed at a position of the alignment layer corresponding to a peripheral region of the filter.
  • the light shielding layer corresponding to the peripheral region of the adjacent filter is integrally formed.
  • the step of forming the light shielding layer on the alignment layer comprises:
  • the masking plate Covering a masking plate on the light shielding material, the masking plate having a pattern corresponding to a peripheral region of the filter;
  • the uncured material of the opaque material is removed.
  • the surface of the alignment layer is subjected to a rubbing treatment before the light shielding material is applied to the alignment layer.
  • the irradiation time of the ultraviolet rays is 30 minutes, and the light intensity is 4 mW/cm 2 .
  • FIG. 1 is a schematic view of a color filter substrate in accordance with one embodiment of the present invention.
  • FIG. 2 is a flow chart of a method for fabricating a color filter substrate in accordance with another embodiment of the present invention.
  • Fig. 3 is a perspective view and a cross-sectional view showing a base substrate on which an ITO film is formed on the surface.
  • FIGS. 4A-4F are schematic views showing a color filter layer forming step, in which FIGS. 4A and 4B show the formation process of the red color filter, and FIGS. 4C and 4D show the formation process of the green color filter, and FIG. 4E and 4F show the formation process of the blue filter.
  • Fig. 5 exemplarily shows a protective layer formed on a color filter layer.
  • 6A and 6B exemplarily show the steps of forming the light shielding layer.
  • Figure 7 is a schematic illustration of a spacer.
  • Figure 8 is a schematic view of a liquid crystal display panel in accordance with another embodiment of the present invention.
  • FIG. 1 is a schematic view of a color filter substrate in accordance with one embodiment of the present invention.
  • the color filter substrate 10 shown in FIG. 1 includes a base substrate 110, a color filter layer 120, a protective layer 130, an alignment layer 140, a light shielding layer 150, and an indium tin oxide (ITO) layer 160.
  • ITO indium tin oxide
  • a color filter layer 120 and an ITO layer 160 are formed on two opposite surfaces of the base substrate 110, respectively.
  • the formed ITO layer 160 serves to shield the electromagnetic radiation from interference with the color filter substrate 10.
  • the color filter layer 120 includes a plurality of sets of filters, each set of filters corresponding to one pixel and comprising red, green, and blue primary color filters having light transmissivity (exemplarily three hatched lines in FIG. 1) Rectangular box representation). In this embodiment, color filters are disposed adjacent to each other.
  • a protective layer 130 and an alignment layer 140 are sequentially formed on the color filter layer 120.
  • the patterned light shielding layer 150 is formed on the alignment layer 140 at a position corresponding to the peripheral region of the filter, thereby being capable of blocking light from leaking from between the filters.
  • the light shielding layers corresponding to the peripheral regions of adjacent filters are integrally formed.
  • peripheral region of the above filter is located in the filter region, that is, the edge region of the filter, not the region adjacent to the filter region.
  • the material from which the light shielding layer is formed includes a liquid crystal host, a monomer, and a photoinitiator.
  • the liquid crystal body is made of the same material as the liquid crystal layer, for example, to improve the compatibility of the process.
  • the monomer comprises, for example, a mixture of cetyl methacrylate and methyl methacrylate (MMA) in a molar ratio of 1:1.
  • MMA methyl methacrylate
  • AIBN azobisisobutyronitrile
  • the color film substrate according to the embodiment adopts a light shielding layer formed above the color filter layer instead of the black matrix. Since the above-mentioned light shielding layer is relatively simple in process and more controllable in process, the product yield is maintained at a relatively high level at a low manufacturing cost.
  • FIG. 2 is a flow chart of a method for fabricating a color filter substrate in accordance with another embodiment of the present invention.
  • step S210 shown in FIG. 2 formation is performed on one surface of the base substrate 110.
  • the ITO film 160 is as shown in FIG.
  • the preparation method of the ITO thin film includes, for example, but not limited to, a low voltage sputtering process, a DC magnetron sputtering process, a high density arc plasma (HDAP) method, and the like.
  • step S220 a color filter layer is formed on the surface of the base substrate opposite to the ITO film.
  • FIGS. 4A-4F are schematic views showing a color filter layer forming step, in which FIGS. 4A and 4B show the formation process of the red color filter, and FIGS. 4C and 4D show the formation process of the green color filter, and FIG. 4E and 4F show the formation process of the blue filter.
  • a red color filter material coating 121' is first coated on a surface of the base substrate 110 opposite to the ITO film, and then covered, exposed, and developed by a mask.
  • a similar process step as described above is also applied to the green and blue filters to finally form a color filter layer 120 in which the red, green, and blue filters are alternately disposed as shown in FIG. 4F on the base substrate 110.
  • a protective layer is formed on the color filter layer 120 shown in FIG. 4F.
  • Fig. 5 exemplarily shows a protective layer formed on a color filter layer.
  • the protective layer is formed by first applying a protective film material on the color filter layer 120, and then curing the protective film material to form a protective layer 130 as shown in FIG.
  • step S240 to form an alignment layer on the protective layer 130 shown in FIG. Due to the optical anisotropy of the liquid crystal material, for example, a rubbing process is also applied to the surface of the formed alignment layer to ensure that the cured liquid crystal layer has a desired initial alignment, thereby obtaining a better shading effect.
  • a rubbing process is also applied to the surface of the formed alignment layer to ensure that the cured liquid crystal layer has a desired initial alignment, thereby obtaining a better shading effect.
  • a light shielding layer is formed on the alignment layer at a position corresponding to the peripheral region of the filter.
  • 6A and 6B exemplarily show the steps of forming the light shielding layer.
  • a droplet-shaped light-shielding material mixture 150' is first coated on the alignment layer 140, the mixture comprising a liquid crystal host, a monomer and a photoinitiator in a mass ratio of 90:8:2 and heated to liquid crystal clear. Highlight temperature.
  • the liquid crystal host in the mixture is made of the same material as the liquid crystal layer, and the monomer comprises a mixture of hexadecyl methacrylate and methyl methacrylate (MMA) in a molar ratio of 1:1, and the photoinitiator comprises Azobisisobutyronitrile (AIBN).
  • MMA hexadecyl methacrylate and methyl methacrylate
  • AIBN Azobisisobutyronitrile
  • the droplet-like mixture will form a coating on the alignment layer 140 due to fluidity factors.
  • the light shielding layer is formed by a step of mask covering, exposure, and development.
  • the mask covering the mixture has a pattern corresponding to the peripheral region of the filter.
  • the mask sheet 151 is irradiated with ultraviolet rays (indicated by arrows in the drawing) so that the mixture at a position corresponding to the peripheral region of the filter is cured.
  • the irradiation time of the ultraviolet rays is 30 minutes, and the light intensity is 4 mW/cm 2 .
  • the uncured mixture is removed.
  • step S260 a spacer is formed on the color filter substrate processed in the previous step to better align the color film substrate and the thin film transistor (TFT) cell.
  • FIG. 7B is a schematic illustration of a spacer.
  • the spacer 170 as shown in FIG. 7B is formed by coating a spacer material coating on the color filter substrate and then covering, exposing, and developing the mask.
  • Figure 8 is a schematic illustration of a display panel in accordance with another embodiment of the present invention.
  • the display panel 1 includes a color filter substrate 10, a liquid crystal layer 20, and an array substrate 30.
  • the color filter substrate 10 employs the structure of the embodiment described above with reference to the drawings.
  • the liquid crystal layer is the main body of the LCD display panel and is located between the color filter substrate 10 and the array substrate 30.
  • the role of the array substrate 30 is to establish a certain driving condition by adjusting a series of parameters such as voltage, phase, frequency, peak value, effective value, timing, duty ratio, etc. applied to the pixel electrode, thereby achieving a desired display.
  • an embodiment of the present invention further provides a display device including the above display panel.
  • the display device provided by the embodiment of the present invention is any product or component having a display function, such as a notebook computer display, a liquid crystal display, a liquid crystal television, a mobile phone, a tablet computer, and the like.

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Abstract

一种能够抑制漏光的彩膜基板（10）及其制作方法，以及包含上述彩膜基板（10）的显示面板（1）和包含该显示面板的显示装置。彩膜基板（10）包括：衬底基板（110）；形成于所述衬底基板（110）上的彩色滤光层（120），其包含多个相邻设置的滤光片；形成于所述彩色滤光层（120）上的保护层（130）；形成于所述保护层（130）上的取向层（140），其中，进一步包括遮光层（150），其形成于所述取向层（140）上的对应于所述滤光片的周边区域的位置。

Description

彩膜基板及其制作方法、显示面板、显示装置 技术领域
本发明实施例涉及液晶显示技术，具体而言，涉及一种能够抑制漏光的彩膜基板及其制作方法，以及包含上述彩膜基板的显示面板和包含该显示面板的显示装置。
背景技术
由于具有平面超薄、节能、低辐射和画面柔和等优点，液晶显示器目前已经成为一种主流的显示设备。作为液晶显示器的核心部件，显示面板包括彩膜基板和与彩膜基板对准接合在一起的薄膜晶体管(TFT)盒。彩膜基板一般包含衬底基板、黑色矩阵、彩色滤光层和保护层等，其制作工序是先在衬底基板上制作黑色矩阵，再于黑色矩阵上制作具有透光性的红、绿、蓝三原色的彩色滤光层，然后在彩色滤光层上涂布一层平滑的保护层。
黑色矩阵的主要作用是防止像素间的漏光以及增加色彩的对比性。构成黑色矩阵的材料通常分为两种，分别为金属薄层(例如氧化层)和树脂薄层(例如黑色光阻薄层，以碳黑为主要材料)。
但是在衬底基板上形成黑色矩阵的步骤需要繁杂的工序，工艺控制复杂，从而不利于液晶面板良率的提升。虽然业界已经尝试通过各种方法来解决这个问题，但是成效不大，而且还导致制造成本的明显上升。因此如何低成本地消除或抑制显示面板的漏光已经成为一个困扰业界的棘手难题。
发明内容
本发明实施例的一个目的是提供一种彩膜基板，其具有抑制漏光效果好和制造成本低等优点。
按照本发明一实施例的彩膜基板包括：
衬底基板；
形成于所述衬底基板上的彩色滤光层，其包含多个相邻设置的滤光片；
形成于所述彩色滤光层上的保护层；
形成于所述保护层上的取向层，
其中，还包括遮光层，其形成于所述取向层上的对应于所述滤光片周边区域的位置。
例如，在上述彩膜基板中，在对应于相邻所述滤光片的周边区域的遮光层是一体化形成的。
例如，在上述彩膜基板中，制作所述遮光层的材料包括液晶主体、单体和光引发剂。
例如，在上述彩膜基板中，所述单体包括摩尔比为1∶1的甲基丙烯酸十六烷基酯和甲基丙烯酸甲酯的混合物。
例如，在上述彩膜基板中，所述光引发剂为偶氮二异丁腈。
本发明实施例的另一个目的是提供一种液晶显示面板，其具有抑制漏光效果好和制造成本低等优点。
按照本发明一实施例的液晶显示面板包括：
如上所述的彩膜基板。
本发明实施例的还有一个目的是提供一种显示装置，其具有抑制漏光效果好和制造成本低等优点。
按照本发明一实施例的显示装置包括如上所述的液晶显示面板。
本发明实施例的还有一个目的是提供一种彩膜基板的制作方法，其具有抑制漏光效果好和制造成本低等优点。
按照本发明一实施例的彩膜基板的制作方法包含下列步骤：
在衬底基板上形成包含多个滤光片的彩色滤光层；
在所述彩色滤光层上形成保护层；
在所述保护层上形成取向层；
在所述取向层的对应于所述滤光片周边区域的位置上形成遮光层。
例如，在上述方法中，在形成所述遮光层的步骤中，对应于相邻所述滤光片的周边区域的遮光层一体化形成。
例如，在上述方法中，在所述取向层上形成所述遮光层的步骤包括：
在所述取向层上涂覆遮光材料；
在所述遮光材料上覆盖掩模板，该掩模板具有与所述滤光片周边区域相对应的图案；
利用紫外线照射所述掩模板，从而使得在对应于所述滤光片周边区域的位置上的所述遮光材料固化；以及
去除未固化的所述遮光材料。
例如，在上述方法中，在所述遮光材料涂覆到所述取向层之前，对所述取向层表面作摩擦处理。
例如，在上述方法中，在利用紫外线照射所述掩模板的步骤中，紫外线的照射时间为30分钟，光强为4mw/cm2。
附图说明
本发明的上述和/或其它方面和优点将通过以下结合附图的各个方面的描述变得更加清晰和更容易理解，附图中相同或相似的单元采用相同的标号表示，附图包括：
图1为按照本发明一个实施例的彩膜基板的示意图。
图2为按照本发明另一个实施例的用于制作彩膜基板的方法的流程图。
图3示出了表面形成ITO薄膜的衬底基板的透视图和剖面图示意图。
图4A-4F示出了彩色滤光层形成步骤的示意图，其中，图4A和4B示出了红色滤光片的形成过程，图4C和4D示出了绿色滤光片的形成过程，而图4E和4F示出了蓝色滤光片的形成过程。
图5示例性地示出了形成于彩色滤光层上的保护层。
图6A和6B示例性地示出了遮光层的形成步骤。
图7为隔垫物的示意图。
图8为按照本发明另一个实施例的液晶显示面板的示意图。
具体实施方式
下面参照其中图示了本发明示意性实施例的附图更为全面地说明本发明。但本发明可以按不同形式来实现，而不应解读为仅限于本文给出的各实施例。给出的上述各实施例旨在使本文的披露全面完整，以将本发明的保护范围更为全面地传达给本领域技术人员。
诸如“包含”和“包括”之类的用语表示除了具有在说明书和权利要求书中有直接和明确表述的单元和步骤以外，本发明的技术方案也不 排除具有未被直接或明确表述的其它单元和步骤的情形。
诸如“第一”和“第二”之类的用语并不表示单元在时间、空间、大小等方面的顺序而仅仅是作区分各单元之用。
诸如“其中一个单元在另一单元之上”或“其中一个单元在另一单元上方”之类的用语应该广义地理解前一单元直接位于后一单元的上面或前一单元经第三单元而位于后一单元的上面。
以下借助附图描述实现本发明的实施例。
图1为按照本发明一个实施例的彩膜基板的示意图。图1所示的彩膜基板10包括衬底基板110、彩色滤光层120、保护层130、取向层140、遮光层150和氧化铟锡(ITO)层160。
如图1所示，彩色滤光层120和ITO层160分别形成于衬底基板110的两个相对的表面。所形成的ITO层160用于屏蔽电磁辐射对彩膜基板10的干扰。彩色滤光层120包含多组滤光片，每组滤光片对应于一个像素并且包含具有透光性的红、绿、蓝三原色滤光片(图1中示例性地以三个带阴影线的矩形框表示)。在本实施例中，彩色滤光片相邻设置。在彩色滤光层120上依次形成保护层130和取向层140。在本实施例中，图案化的遮光层150形成于取向层140上对应于滤光片周边区域的位置，从而能够阻挡光线从滤光片之间泄漏出来。例如，对应于相邻滤光片的周边区域的遮光层是一体化形成的。
需要说明的是，上述滤光片的周边区域位于滤光片区域内，即滤光片的边缘区域，而非与滤光片区域相邻的区域。
制作遮光层的材料包含液晶主体、单体和光引发剂。在本实施例中，液晶主体例如采用与液晶层相同的材料以提高制程的可共用性。单体例如包含摩尔比为1∶1的甲基丙烯酸十六烷基酯和甲基丙烯酸甲酯(MMA)的混合物。对于光引发剂，其例如包含偶氮二异丁腈(AIBN)。
与现有技术相比，按照本实施例的彩膜基板采用在彩色滤光层上方形成遮光层代替黑色矩阵。由于上述遮光层的制程较为简单并且工艺过程可控性更高，因此以较低的制造成本将产品良率维持在较高的水平上。
图2为按照本发明另一个实施例的用于制作彩膜基板的方法的流程图。
在图2所示的步骤S210中，在衬底基板110的其中一个表面形成 ITO薄膜160，如图3所示。在本实施例中，ITO薄膜的制备方法例如包括但不限于低电压溅射工艺、直流磁控溅射工艺、高密度电弧等离子体(HDAP)方法等。
随后在步骤S220中，在衬底基板的与形成ITO薄膜相对的表面上形成彩色滤光层。图4A-4F示出了彩色滤光层形成步骤的示意图，其中，图4A和4B示出了红色滤光片的形成过程，图4C和4D示出了绿色滤光片的形成过程，而图4E和4F示出了蓝色滤光片的形成过程。
以红色滤光片为例，如图4A所示，先在衬底基板110的与形成ITO薄膜相对的表面上涂覆红色滤光片材料涂层121’，随后通过掩膜覆盖、曝光和显影等步骤形成如图4B所示的红色滤光片图案121，其中两列红色滤光片之间的区域用于容纳后面将要形成的绿色和蓝色滤光片。对于绿色和蓝色滤光片也应用上述类似的工艺步骤，从而在衬底基板110上最终形成如图4F所示的红色、绿色和蓝色滤光片交错设置的彩色滤光层120。
需要指出的是，上述三种颜色的滤光片的形成顺序仅仅是示例性的而非限定性的。
接着在步骤S230中，在图4F所示的彩色滤光层120上形成保护层。图5示例性地示出了形成于彩色滤光层上的保护层。保护层的形成过程为，先在彩色滤光层120上涂覆保护膜材料，随后通过加热该保护膜材料以固化形成如图5所示的保护层130。
随后进入步骤S240，在图5所示的保护层130上形成取向层。由于液晶材料的光学各向异性，因此，例如，还对所形成的取向层的表面应用摩擦制程，以确保固化液晶层具有所需的初始配向，从而获得更好的遮光效果。
接着在步骤S250中，在取向层上的对应于滤光片周边区域的位置上形成遮光层。图6A和6B示例性地示出了遮光层的形成步骤。如图6A所示，先在取向层140上涂覆液滴状的遮光材料混合物150′，该混合物包含质量比为90∶8∶2的液晶主体、单体和光引发剂并且被加热到液晶清亮点温度。例如，混合物中的液晶主体采用与液晶层相同的材料，单体包含摩尔比为1∶1的甲基丙烯酸十六烷基酯和甲基丙烯酸甲酯(MMA)的混合物，并且光引发剂包含偶氮二异丁腈(AIBN)。由于流动性因素，液滴状的混合物将在取向层140上形成一层涂层。随后 通过掩膜覆盖、曝光和显影等步骤形成遮光层。
覆盖在混合物上的掩模板具有与滤光片周边区域相对应的图案。在曝光步骤中，如图6B所示，利用紫外线(图中以箭头表示)照射掩模板151，从而使得在对应于滤光片周边区域的位置上的混合物被固化。例如，在曝光步骤中，紫外线的照射时间为30分钟，光强为4mw/cm2。在显影步骤中，未固化的混合物被去除。
随后在步骤S260中，在经上一步骤处理后的彩膜基板上形成隔垫物，以使彩膜基板与薄膜晶体管(TFT)盒更好地对准接合。图7为隔垫物的示意图。例如，通过在彩膜基板上涂覆垫隔材料涂层并且随后通过掩膜覆盖、曝光和显影等步骤形成如图7B所示的隔垫物170。
图8为按照本发明另一个实施例的显示面板的示意图。
如图8所示，显示面板1包括彩膜基板10、液晶层20和阵列基板30。在本实施例中，彩膜基板10采用上面借助附图描述的实施例的结构。液晶层是LCD显示屏的主体，其位于彩膜基板10与阵列基板30之间。阵列基板30的作用是通过调整施加到像素电极上的电压、相位、频率、峰值、有效值、时序、占空比等一系列参数来建立一定的驱动条件，从而实现所需的显示。
此外，本发明实施例还提供了一种显示装置，包括上述的显示面板。例如，本发明实施例提供的显示装置是笔记本电脑显示器、液晶显示器、液晶电视、手机、平板电脑等任何具备显示功能的产品或组件。
虽然已经示出并说明了各个示例性实施例，但本领域普通技术人员应当理解的是，可以对这些示例性实施例在形式和细节方面做出各种改变而不背离由所附权利要求书限定的本发明构思的精神和范围。

Claims (15)

  1. 一种彩膜基板，包括：
    衬底基板；
    形成于所述衬底基板上的彩色滤光层，其包含多个相邻设置的滤光片；
    形成于所述彩色滤光层上的保护层；
    形成于所述保护层上的取向层，
    该彩膜基板还包括遮光层，其形成于所述取向层上的对应于所述滤光片周边区域的位置。
  2. 如权利要求1所述的彩膜基板，其中对应于相邻所述滤光片的周边区域的遮光层是一体化形成的。
  3. 如权利要求1所述的彩膜基板，其中所述遮光层的材料包括液晶主体、单体和光引发剂。
  4. 如权利要求3所述的彩膜基板，其中所述单体包括摩尔比为1∶1的甲基丙烯酸十六烷基酯和甲基丙烯酸甲酯的混合物。
  5. 如权利要求3所述的彩膜基板，其中，所述光引发剂为偶氮二异丁腈。
  6. 一种显示面板，包括：
    权利要求1-5中任一项所述的彩膜基板。
  7. 一种显示装置，包含如权利要求6所述的显示面板。
  8. 一种彩膜基板的制作方法，包含下列步骤：
    在衬底基板上形成包含多个滤光片的彩色滤光层；
    在所述彩色滤光层上形成保护层；
    在所述保护层上形成取向层；
    在所述取向层的对应于所述滤光片周边区域的位置上形成遮光层。
  9. 如权利要求8所述的彩膜基板的制作方法，其中，在形成所述遮光层的步骤中，对应于相邻所述滤光片的周边区域的遮光层一体化形成。
  10. 如权利要求8所述的彩膜基板的制作方法，其中，在所述取向层的对应于所述滤光片周边区域的位置上形成所述遮光层的步骤包 括：
    在所述取向层上涂覆遮光材料；
    在所述遮光材料上覆盖掩模板，该掩模板具有与所述滤光片周边区域相对应的图案；
    利用紫外线照射所述掩模板，从而使得在对应于所述滤光片周边区域的位置上的所述遮光材料固化；以及
    去除未固化的所述遮光材料。
  11. 如权利要求10所述的彩膜基板的制作方法，其中，所述遮光材料包括液晶主体、单体和光引发剂。
  12. 如权利要求11所述的彩膜基板的制作方法，其中，所述单体包括摩尔比为1∶1的甲基丙烯酸十六烷基酯和甲基丙烯酸甲酯的混合物。
  13. 如权利要求11所述的彩膜基板的制作方法，其中，所述光引发剂为偶氮二异丁腈。
  14. 如权利要求10所述的彩膜基板的制作方法，其中，在所述遮光材料涂覆到所述取向层之前，对所述取向层表面作摩擦处理。
  15. 如权利要求10所述的彩膜基板的制作方法，其中，在利用紫外线照射所述掩模板的步骤中，紫外线的照射时间为30分钟，光强为4mw/cm2。
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