WO2017071382A1 - 对位标记搜寻方法、显示基板和显示装置 - Google Patents

对位标记搜寻方法、显示基板和显示装置 Download PDF

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Publication number
WO2017071382A1
WO2017071382A1 PCT/CN2016/096183 CN2016096183W WO2017071382A1 WO 2017071382 A1 WO2017071382 A1 WO 2017071382A1 CN 2016096183 W CN2016096183 W CN 2016096183W WO 2017071382 A1 WO2017071382 A1 WO 2017071382A1
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Prior art keywords
line segment
positioning line
alignment mark
detection system
field
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PCT/CN2016/096183
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English (en)
French (fr)
Inventor
路朝华
王永亮
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京东方科技集团股份有限公司
北京京东方显示技术有限公司
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Application filed by 京东方科技集团股份有限公司, 北京京东方显示技术有限公司 filed Critical 京东方科技集团股份有限公司
Priority to US15/505,193 priority Critical patent/US10429751B2/en
Publication of WO2017071382A1 publication Critical patent/WO2017071382A1/zh

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7076—Mark details, e.g. phase grating mark, temporary mark
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7084—Position of mark on substrate, i.e. position in (x, y, z) of mark, e.g. buried or resist covered mark, mark on rearside, at the substrate edge, in the circuit area, latent image mark, marks in plural levels
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
    • G06V10/00—Arrangements for image or video recognition or understanding
    • G06V10/20—Image preprocessing
    • G06V10/24—Aligning, centring, orientation detection or correction of the image
    • G06V10/245—Aligning, centring, orientation detection or correction of the image by locating a pattern; Special marks for positioning

Definitions

  • Embodiments of the present invention relate to a registration mark search method, a display substrate, and a display device.
  • the photoresist When performing the patterning process, it is usually necessary to expose the photoresist using an exposure machine. When performing exposure, it is necessary to align the mask with the substrate by a glazing mark located on a dummy region on the base substrate to ensure accuracy in exposure.
  • the alignment mark can be rectangular or circular.
  • a method for searching for a bit mark for searching for an alignment mark on a substrate, and a virtual line on the base substrate is formed with a positioning line segment, where the positioning line segment is located a straight line penetrating the alignment mark, the method comprising: acquiring theoretical coordinates of the alignment mark; moving the detection system field of view to the target position with the theoretical coordinate as a target; and perpendicular to the direction of the first positioning line segment Moving the detection system field of view from the target position to the first positioning line segment to appear in the field of view of the detection system; moving the first positioning line segment from the first positioning line segment in the length direction of the first positioning line segment The field of view is detected until the alignment mark appears in the field of view of the detection system.
  • the straight line of the first positioning line segment runs through the center of the alignment mark, and the direction of the detection system is moved from the target position to the first positioning in a direction perpendicular to the first positioning line segment.
  • the method further includes: moving the detection system field of view such that a center of the detection system field of view is located on the first positioning line segment.
  • a distance between the first positioning line segment and the alignment mark in a length direction of the first positioning line segment is smaller than a width of the detection system field in a length direction of the first positioning line segment.
  • a second positioning line segment is further formed on the virtual area of the base substrate, and the lines where the first positioning line segment and the second positioning line segment are coincident are located on both sides of the alignment mark.
  • the detection system has a rectangular field of view, and a distance between the first positioning line segment and the second positioning line segment is greater than or equal to the detection system field of view in the first positioning line segment and the second positioning.
  • the length in either length of the line segment.
  • the first positioning line segment and the alignment mark are formed in a patterning process.
  • the base substrate includes: a base substrate in the array substrate or a base substrate in the color filter substrate.
  • the method is used in a patterning process of the base substrate.
  • a display substrate includes a base substrate, a first positioning line segment is formed on a virtual area of the base substrate, and a straight line of the first positioning line segment runs through the alignment mark.
  • a straight line of the first positioning line segment runs through the center of the alignment mark.
  • a distance between the first positioning line segment and the alignment mark in a length direction of the first positioning line segment is smaller than a width of the detection system field in a length direction of the first positioning line segment.
  • a second positioning line segment is further formed on the virtual area of the base substrate, and the lines where the first positioning line segment and the second positioning line segment are coincident are located on both sides of the alignment mark.
  • the distance between the first positioning line segment and the second positioning line segment is greater than or equal to the detection system field of view in the length direction of any of the first positioning line segment and the second positioning line segment. length.
  • the first positioning line segment and the alignment mark are formed in a patterning process.
  • the display substrate includes an array substrate or a color filter substrate.
  • a display device comprising the display substrate of any of the above.
  • FIG. 1 is a flowchart of a method for searching for a registration mark according to an embodiment of the present invention
  • FIG. 2-2 to 2-6 are schematic views of the virtual area of the substrate in the display substrate in the embodiment shown in FIG. 2-1;
  • 3-1 is a schematic diagram of a virtual area of a substrate in a display substrate according to an embodiment of the invention.
  • FIG. 3-2 is a schematic view showing another virtual area of a base substrate in a display substrate according to an embodiment of the present invention.
  • 3-3 is a schematic diagram of another virtual area of a substrate substrate in a display substrate according to an embodiment of the invention.
  • a method for searching for a registration mark firstly obtains the theoretical coordinates of the alignment mark, and then moves the detection field of view according to the theoretical coordinate (the exposure machine searches for the window of the alignment mark, the window can observe the entire alignment mark, and the alignment mark appears In this window, the exposure machine finds the alignment mark). Due to the mechanical error of the exposure machine, there is a certain error between the actual coordinate and the theoretical coordinate on the substrate after the detection field is moved. Therefore, it is necessary to move the detection field view in various directions around the actual coordinate of the detection field of view to search for the pair. Bit mark.
  • FIG. 1 is a flow chart of a method for searching for a registration mark according to an embodiment of the present invention.
  • This embodiment uses the alignment mark search method to search for an alignment mark on a substrate to illustrate the virtual basis of the substrate. A positioning line segment is formed on the area.
  • the alignment mark search method may include the following steps:
  • step 101 theoretical coordinates are obtained.
  • step 102 the field of view of the detection system is moved to the target position with the theoretical coordinates as the target.
  • step 103 moving the detection system field of view from the target position to the positioning line segment in a direction perpendicular to the positioning line segment occurs in the field of view of the detection system.
  • step 104 the detection field field is moved from the positioning line segment to the alignment mark in the length direction of the positioning line segment to appear in the field of view of the detection system.
  • the aligning mark searching method finds a positioning line segment in the virtual area of the base substrate, and searches for the aligning mark along the length direction of the positioning line segment, wherein the straight line where the positioning line segment is located runs through the aligning mark.
  • the method overcomes the need to move the detection to all directions of the actual coordinates in the foregoing method.
  • the view field can find the alignment mark, so that the search process is more complicated and the search time is longer; the effect of finding the alignment mark can be easily and quickly found.
  • the aligning mark searching method is applied to find a aligning mark on a substrate on a display substrate.
  • a positioning line segment is formed on the virtual area of the base substrate.
  • the alignment mark search method may include the following steps:
  • step 201 theoretical coordinates are obtained.
  • the theoretical coordinate may be first acquired, where the theoretical coordinate is a coordinate of the alignment mark on the base substrate, and the theoretical coordinate may be known in advance, for example, on the base substrate. Determined during the design process.
  • step 202 the field of view of the detection system is moved to the target position with the theoretical coordinates as the target.
  • the detection system field of the exposure machine can be moved to the target position with the theoretical coordinate as the target, and after the detection field field is moved to the target position, the machine is For reasons such as errors, there is a certain error between the position of the field of view of the detection system and the position of the alignment mark, that is, the alignment mark may not appear in the field of view of the detection system.
  • the theoretical coordinate of the alignment mark 32 is (10, 10), and the detection field view 33 is initially located at the coordinates (0, 0), and the target movement detection is performed with (10, 10).
  • the field of view 33 is taken out, the field of view of the detection system can be shifted up by 10 unit lengths and then shifted to the right by 10 unit lengths.
  • the actual moving distance of the right and left movement of the detection system may not be 10 unit lengths.
  • the actual coordinate of the target position after the movement of the detection system field of view 33 may be (12, 11), and the alignment mark 32 is not found by the detection system field of view 33.
  • the line segment 31 in Fig. 2-2 is a positioning line segment.
  • the embodiment in the figure has a positioning line segment (first positioning line segment).
  • first positioning line segment In the comparison method, in this case, since it is not clear where the position of the detection system is in the alignment mark, it is necessary to move the detection field view in various directions when searching for the alignment mark, and the search process is complicated, and It takes a long time.
  • the detection system has a rectangular field of view, and the rectangle is larger than the alignment mark, and the alignment mark can appear entirely in the field of view of the detection system.
  • the display substrate according to the embodiment of the present invention may be an array substrate or a color filter substrate.
  • the alignment mark searching method provided by the embodiment of the present invention is generally applied to a color filter substrate.
  • the coordinates of the view field of the detection system in the embodiment of the present invention may refer to the coordinates of a point on the field of view of the detection system. If the field of view of the detection system is a rectangle, the coordinates of one vertex of the rectangle may be used as the coordinates of the vertex of the rectangle. Find the coordinates of the field of view, or you can use the coordinates of the center of the rectangle as the field of view of the detection system. Coordinates, the coordinates of the alignment mark are similar to the coordinates of the field of view of the detection system, and are not limited in the embodiment of the present invention.
  • step 203 moving the detection system field of view from the target position to the positioning line segment in a direction perpendicular to the positioning line segment occurs in the field of view of the detection system.
  • the detection system field of view After moving the detection system field of view to the target position, the detection system field of view can be moved from the target position to the positioning line segment in the direction perpendicular to the positioning line segment to appear in the field of view of the detection system. Since the positioning line segment is disposed on the base substrate in the embodiment of the present invention, after moving the detection system field of view to the target position, the positioning line segment can be searched by moving the detection system field of view in a direction perpendicular to the positioning line segment, such as As shown in FIG. 2-3, the positioning line segment 31 can be searched by moving the detection system field of view 33 in a direction a perpendicular to the positioning line segment, and the positioning line segment 31 can be found only by moving the detection system field of view 33 in two directions. The process is quick and easy.
  • the detection system field of view 33 When the detection system field of view 33 is moved in a direction a perpendicular to the positioning line segment, it is conceivable to detect the maximum error of the target position of the system field of view 33 and the alignment mark 32 in the direction a.
  • the maximum error is 3 unit lengths.
  • the detection system may be moved from the target position by one unit length in a direction perpendicular to the positioning line segment. If the positioning line segment is not found, the detection position field is searched for the positioning line segment from the target position in another direction perpendicular to the positioning line segment. .
  • positioning line segment and the alignment mark may be formed in one patterning process.
  • two positioning line segments may be set, where the two positioning line segments are coincident and the two positioning line segments are located on opposite sides of the alignment mark.
  • the positioning line segment can be found when moving in the direction perpendicular to the positioning line segment, which improves the pair provided by the embodiment of the present invention.
  • the distance between the two positioning line segments is greater than or equal to the length of the detection system field of view in the longitudinal direction of any positioning line segment. This is to ensure that the alignment mark can be separately displayed in the field of view of the detection system when the detection field of view is moved in the longitudinal direction of the positioning line segment to prevent the positioning line segment from interfering with the identification of the alignment mark.
  • the distance between the positioning line segment and the alignment mark in the longitudinal direction of the positioning line segment may be smaller than the width of the detection system field of view in the longitudinal direction of the positioning line segment. In this way, when the field of view of the detection system is moved in the longitudinal direction of the positioning line segment, the positioning line segment and the alignment mark disappear simultaneously from the field of view of the detection system, and the exposure machine recognizes the alignment mark.
  • step 204 the field of view of the detection system is moved such that the center of the field of view of the detection system is located on the positioning line segment.
  • the field of view of the detection system can be moved, so that the center of the field of view of the detection system is located on the positioning line segment. Since the detection system field of view wants to search and accurately identify the alignment mark, If the alignment mark is completely present in the field of view of the detection system, and the center of the field of view of the detection system is located on the positioning line segment, it is convenient to detect the alignment mark of the field of view afterwards. Similarly, when the positioning line segment is set, it can also be set such that the extension line of the positioning line segment runs through the center of the alignment mark to match the search of the field of view of the detection system.
  • step 205 the detection field view is moved from the positioning line segment to the alignment mark in the length direction of the positioning line segment to appear in the field of view of the detection system.
  • the field of view of the detection system can be moved in the longitudinal direction of the positioning line segment until the alignment mark appears in the field of view of the detection system. Since the straight line of the positioning line segment runs through the alignment mark, the detection field of view is larger than the alignment mark and the center is located on the positioning line segment, so that the detection field view can be found when moving in the length direction of the positioning line segment.
  • the detection field of view can be identified by image analysis or the like (such as analyzing the contrast of the image, etc.), and the alignment mark is recognized when the alignment mark appears in the field of view of the detection system.
  • the detection system field of view 33 moves the detection system field of view 33 in the longitudinal direction b of the positioning line segment 31, and the alignment mark 32 appears in the detection system field of view 33.
  • the detection field view can be moved in both directions of the longitudinal direction of the positioning line segment.
  • the detection system field of view 33 moves the search alignment mark 32 in the longitudinal direction of the positioning line segment 31.
  • the registration mark 32 may not be completely present in the field of view 33 of the detection system, which may have an effect on the identification of the alignment mark.
  • the virtual area may include three alignment marks 32a, 32b, and 32c arranged at equal intervals to
  • the detection system field of view 33 is moved from the left side of the alignment mark 32a to the right to find the registration mark. For example, after detecting the alignment mark 32a, the detection field view 33 continues to move to the right, and the alignment marks 32b and 32c can be found one after another. .
  • the mask can be aligned with the substrate according to the alignment mark, and the photoresist on the substrate substrate can be exposed, etc.
  • the alignment mark searching method provided by the embodiment of the invention can be applied to the patterning process and becomes a patterning process. portion.
  • aligning mark searching method provided by the embodiment of the present invention can also be applied to searching for the aligning mark in other devices, and is not limited to searching for the aligning mark in the display panel.
  • the alignment mark searching method moves the center of the field of view of the detection system to the positioning line segment after finding the positioning line segment in the field of view of the detection system, thereby achieving convenient detection of the field of view recognition.
  • the effect of the alignment mark is the alignment mark searching method.
  • the aligning mark searching method searches for a positioning line segment in the virtual area of the base substrate, and searches for the aligning mark along the length direction of the positioning line segment, wherein the straight line through which the positioning line segment is located.
  • 3-1 is a schematic diagram of a virtual area of a substrate substrate in a display substrate according to an embodiment of the invention.
  • the virtual area of the substrate substrate may include a positioning line segment 31 and an alignment mark 32. After the straight line (not shown in FIG. 3-1) where the positioning line segment 31 is extended, the alignment mark 32 can be penetrated.
  • the straight line of the positioning line segment 31 may extend to penetrate the center of the alignment mark 32.
  • FIG. 3-2 there are two positioning line segments 31 of the alignment mark 32, which are a first positioning line segment 31-1 and a second positioning line segment 31-2, and a line where the two positioning line segments 31 are located.
  • the two positioning line segments 31 are respectively located on opposite sides of the alignment mark 32. It should be noted that the two positioning line segments 31 may also be in a parallel relationship.
  • the distance x between the two positioning line segments 31 is greater than or equal to the length y of the detection system field of view 33 in the length direction a of any of the positioning line segments.
  • the alignment mark 32 can be separately present in the detection system field of view 33 to prevent the positioning line segment 31 from being aligned.
  • the bit mark 32 appears simultaneously in the detection system field of view 33, interfering with the exposure machine identification registration mark 32.
  • FIG. 3-3 is a schematic diagram of another virtual area of a substrate substrate in a display substrate according to an embodiment of the present invention.
  • any of the positioning line segments 31 and the alignment mark 32 are located on the positioning line segment 31.
  • the distance l in the longitudinal direction is smaller than the width y of the detection system field of view 33 in the longitudinal direction of the positioning line segment 31. In this way, when the detection field of view is prevented from moving in the longitudinal direction of the positioning line segment 31, the positioning line segment 31 and the alignment mark 32 simultaneously disappear from the detection system field of view 33, and the exposure machine recognizes the registration mark 32.
  • y is checked out The length of the field of view 33 in the length direction of the positioning line segment 31.
  • the positioning line segment 31 and the alignment mark 32 are formed in a patterning process.
  • the one-time patterning process forms the positioning line segment 31 and the alignment mark 32 to add the positioning line segment 31 in the virtual area without increasing the number of patterning processes.
  • the display substrate according to the embodiment of the invention may be an array substrate or a color filter substrate.
  • the array substrate may be an array substrate for a liquid crystal display device (LCD) or an organic light emitting diode (OLED) display device.
  • LCD liquid crystal display device
  • OLED organic light emitting diode
  • the display substrate provided by the embodiment of the present invention is exemplified by a rectangular mark in a virtual area of the base substrate, and the alignment mark may be a circular shape or the like, which is not limited in the embodiment of the present invention.
  • the substrate shown in FIG. 3-1 may also be a substrate provided with an alignment mark in other devices, which is not limited in the embodiment of the present invention.
  • the display substrate provided by the embodiment of the present invention, by making the distance between the positioning line segment and the alignment mark smaller than the width of the field of view of the detection system, it is possible to avoid the positioning line segment and the alignment mark simultaneously from the field of view of the detection system. Disappears, affecting the effect of the exposure machine identifying the registration mark.
  • the display substrate provided by the embodiment of the present invention achieves the avoidance of the positioning line segment by setting the distance between the two positioning line segments to be greater than or equal to the length of the detection system field of view in the longitudinal direction of any positioning line segment.
  • the interference exposure machine recognizes the effect of the registration mark.
  • the display substrate provided by the embodiment of the present invention provides a positioning line segment in a virtual area of the base substrate, and the straight line of the positioning line segment runs through the alignment mark, so that the alignment mark can be used to find the alignment mark, thereby solving the correlation.
  • the problem that the alignment mark of the base substrate of the display substrate in the technology is difficult to find; the effect of being able to easily and quickly find the alignment mark on the base substrate is achieved.
  • an embodiment of the present invention further provides a display device, which may include the display substrate shown in FIG. 3-1, the display substrate shown in FIG. 3-2, or the display substrate shown in FIG. 3-3.

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Abstract

一种用于搜寻衬底基板上的对位标记的搜寻方法，其中，衬底基板的虚拟区上形成有第一定位线段（31），第一定位线段所在直线贯穿对位标记（32），这种搜寻方法包括：获取对位标记的理论坐标；以理论坐标为目标移动检出系视野（33）至目标位置；以垂直于第一定位线段的方向从目标位置移动检出系视野至第一定位线段出现在检出系视野中；以第一定位线段的长度方向从第一定位线段处移动检出系视野至对位标记出现在检出系视野中。这种方法达到了能够简便快速的找到对位标记的效果。还公开了一种显示基板和显示装置。

Description

对位标记搜寻方法、显示基板和显示装置 技术领域
本发明的实施例涉及一种对位标记搜寻方法、显示基板和显示装置。
背景技术
在进行构图工艺时，通常需要使用曝光机对光刻胶进行曝光。进行曝光时，需要通过位于衬底基板上虚拟(dummy)区的对位标记(Glass Mark)将掩膜版与衬底基板进行对位，以确保曝光时的精确度。对位标记可以为矩形或者圆形。
发明内容
根据本发明实施例的第一方面，提供一种对位标记搜寻方法，用于搜寻衬底基板上的对位标记，所述衬底基板的虚拟区上形成有定位线段，所述定位线段所在直线贯穿所述对位标记，所述方法包括：获取所述对位标记的理论坐标；以所述理论坐标为目标移动检出系视野至目标位置；以垂直于所述第一定位线段的方向从所述目标位置移动所述检出系视野至所述第一定位线段出现在所述检出系视野中；以所述第一定位线段的长度方向从所述第一定位线段处移动所述检出系视野至所述对位标记出现在所述检出系视野中。
例如，所述第一定位线段所在直线贯穿所述对位标记的中心，所述以垂直于所述第一定位线段的方向从所述目标位置移动所述检出系视野至所述第一定位线段出现在所述检出系视野中之后，所述方法还包括：移动所述检出系视野，使所述检出系视野的中心位于所述第一定位线段上。
例如，所述第一定位线段与所述对位标记在所述第一定位线段的长度方向上的距离小于所述检出系视野在所述第一定位线段的长度方向上的宽度。
例如，所述衬底基板的虚拟区上还形成有第二定位线段，所述第一定位线段和所述第二定位线段所在的直线重合且分别位于所述对位标记的两侧。
例如，所述检出系视野为矩形，所述第一定位线段和所述第二定位线段之间的距离大于或等于所述检出系视野在所述第一定位线段和所述第二定位线段中任一的长度方向上的长度。
例如，所述第一定位线段与所述对位标记是在一次构图工艺中形成的。
例如，所述衬底基板包括：阵列基板中的衬底基板或彩膜基板中的衬底基板。
例如，所述方法用于对所述衬底基板的构图工艺中。
根据本发明的第二方面，提供一种显示基板，所述显示基板包括衬底基板，所述衬底基板的虚拟区上形成有第一定位线段，所述第一定位线段所在直线贯穿对位标记。
例如，所述第一定位线段所在直线贯穿所述对位标记的中心。
例如，所述第一定位线段与所述对位标记在所述第一定位线段的长度方向上的距离小于所述检出系视野在所述第一定位线段的长度方向上的宽度。
例如，所述衬底基板的虚拟区上还形成有第二定位线段，所述第一定位线段和第二定位线段所在的直线重合且分别位于所述对位标记的两侧。
例如，所述第一定位线段和所述第二定位线段之间的距离大于或等于所述检出系视野在所述第一定位线段和所述第二定位线段中任一的长度方向上的长度。
例如，所述第一定位线段与所述对位标记是在一次构图工艺中形成的。
例如，所述显示基板包括：阵列基板或彩膜基板。
根据本发明的第三方面，提供一种显示装置，所述显示装置包括上述任一的显示基板。
应当理解的是，以上的一般描述和后文的细节描述仅是示例性和解释性的，并不能限制本发明。
附图说明
为了更清楚地说明本发明实施例的技术方案，下面将对实施例的附图作简单地介绍，显而易见地，下面描述中的附图仅仅涉及本发明的一些实施例，而非对本发明的限制。
图1是本发明实施例示出的一种对位标记搜寻方法的流程图；
图2-1是本发明实施例示出的另一种对位标记搜寻方法的流程图；
图2-2至图2-6是图2-1所示实施例中显示基板中衬底基板的虚拟区的示意图；
图3-1是本发明实施例示出的一种显示基板中衬底基板的虚拟区的示意图；
图3-2是本发明实施例示出的另一种显示基板中衬底基板的虚拟区的示意 图；
图3-3是本发明实施例示出的另一种显示基板中衬底基板的虚拟区的示意图。
具体实施方式
这里将详细地对示例性实施例进行说明，其示例表示在附图中。下面的描述涉及附图时，除非另有表示，不同附图中的相同数字表示相同或相似的要素。以下示例性实施例中所描述的实施方式并不代表与本发明相一致的所有实施方式。相反，它们仅是与如所附权利要求书中所详述的、本发明的一些方面相一致的装置和方法的例子。
一种对位标记搜寻方法，首先获取对位标记的理论坐标，之后根据理论坐标移动检出系视野(曝光机搜寻对位标记的视窗，该视窗能够观测到整个对位标记，对位标记出现在该视窗中时说明曝光机找到对位标记)。由于曝光机的机械误差，检出系视野移动后在基板上的实际坐标与理论坐标之间存在一定的误差，因而需要向检出系视野的实际坐标周围各个方向移动检出系视野以搜寻对位标记。
发明人在研究过程中发现，上述对位标记搜寻方法至少存在如下缺陷：上述方式需要向实际坐标的各个方向移动检出系视野才能找到对位标记，查找过程较为复杂，查找时间较长。
图1是本发明实施例示出的一种对位标记搜寻方法的流程图，本实施例以该对位标记搜寻方法应用于寻找衬底基板上的对位标记来举例说明，衬底基板的虚拟区上形成有定位线段。该对位标记搜寻方法可以包括如下几个步骤：
在步骤101中，获取理论坐标。
在步骤102中，以理论坐标为目标移动检出系视野至目标位置。
在步骤103中，以垂直于定位线段的方向从目标位置移动检出系视野至定位线段出现在检出系视野中。
在步骤104中，以定位线段的长度方向从定位线段处移动检出系视野至对位标记出现在检出系视野中。
本发明实施例提供的对位标记搜寻方法，通过在衬底基板的虚拟区寻找定位线段，并沿定位线段的长度方向来寻找对位标记，其中定位线段所在的直线贯穿对位标记。该方法克服了前述方法中需要向实际坐标的各个方向移动检出 系视野才能找到对位标记，以致查找过程较复杂，查找时间较长的问题；达到了能够简便快速的找到对位标记的效果。
图2-1是本发明实施例示出的另一种对位标记搜寻方法的流程图，本实施例以该对位标记搜寻方法应用于寻找显示基板上衬底基板上的对位标记来举例说明，其中衬底基板的虚拟区上形成有定位线段。该对位标记搜寻方法可以包括如下几个步骤：
在步骤201中，获取理论坐标。
在通过本发明实施例提供的对位标记搜寻方法时，可以首先获取理论坐标，该理论坐标为对位标记在衬底基板上的坐标，该理论坐标可以预先得知，例如在衬底基板的设计过程中确定。
在步骤202中，以理论坐标为目标移动检出系视野至目标位置。
在得知了对位标记在衬底基板上的理论坐标后，可以以该理论坐标为目标移动曝光机的检出系视野至目标位置，在检出系视野移动至目标位置后，会由于机械误差等原因，使检出系视野的位置与对位标记的位置存在一定的误差，即对位标记可能并未出现在检出系视野中。
示例性的，如图2-2所示，对位标记32的理论坐标为(10，10)，检出系视野33初始位于坐标(0，0)，以(10，10)为目标移动检出系视野33时，可以首先将检出系视野上移10个单位长度，再右移10个单位长度。但是，由于机械误差等因素，检出系视野右移和上移的实际移动距离可能并不是10个单位长度。比如，检出系视野33移动后的目标位置的实际坐标可能为(12，11)，检出系视野33并未发现对位标记32。图2-2中的线段31为定位线段。图中的实施例具有一条定位线段(第一定位线段)。在比较方法中，在这种情况下，由于不清楚检出系视野处于对位标记的什么位置，因而在搜寻对位标记时需要向各个方向移动检出系视野，搜寻的过程较为复杂，且耗时较长。
可选的，检出系视野为矩形，且该矩形大于对位标记，对位标记能够整个出现在检出系视野中。需要说明的是，本发明实施例涉及的显示基板可以为阵列基板或彩膜基板，本发明实施例提供的对位标记搜寻方法通常应用于彩膜基板中。
需要说明的是，本发明实施例中所涉及的检出系视野的坐标可以是指检出系视野上一点的坐标，如检出系视野为矩形时，可以将该矩形的一个顶点的坐标作为检出系视野的坐标，或者可以将该矩形的中心的坐标作为检出系视野的 坐标，对位标记的坐标与检出系视野的坐标类似，本发明实施例不作限制。
在步骤203中，以垂直于定位线段的方向从目标位置移动检出系视野至定位线段出现在检出系视野中。
在将检出系视野移动至目标位置后，可以以垂直于定位线段的方向从目标位置移动检出系视野至定位线段出现在检出系视野中。由于本发明实施例中的衬底基板上设置有定位线段，因此在将检出系视野移动至目标位置后，只要沿垂直于定位线段的方向移动检出系视野就能够搜寻到定位线段，如图2-3所示，沿垂直于定位线段的方向a移动检出系视野33就可以搜寻到定位线段31，最多只需要向两个方向移动检出系视野33就可以找到定位线段31，搜寻过程简单快捷。而在以垂直于定位线段的方向a移动检出系视野33时，可以考虑检出系视野33的目标位置与对位标记32在方向a上的最大误差。示例性的，该最大误差为3个单位长度。可以先从目标位置以垂直于定位线段的一个方向移动检出系视野3个单位长度，若未找到定位线段，再从目标位置以垂直于定位线段的另一个方向移动检出系视野搜寻定位线段。
此外，定位线段与对位标记可以是在一次构图工艺中形成的。
可选的，可以设置两条定位线段，该两条定位线段所在的直线重合且两条定位线段位于对位标记的两侧。这样可以确保检出系视野移动到目标位置后，不论偏向对位标记的左侧还是右侧，均能够在以垂直于定位线段的方向移动时找到定位线段，提高了本发明实施例提供的对位标记搜寻方法的适用性。
需要说明的是，在对位标记的两边各有一条定位线段时，两条定位线段之间的距离大于或等于检出系视野在任一定位线段的长度方向上的长度。这是为了使检出系视野在以定位线段的长度方向移动寻找对位标记时，能够保证对位标记可以单独出现在检出系视野中，以防止定位线段对对位标记的识别产生干扰。
还需要说明的是，定位线段与对位标记在定位线段的长度方向上的距离可以小于检出系视野在定位线段的长度方向上的宽度。这样可以避免检出系视野在以定位线段的长度方向移动时，定位线段和对位标记同时从检出系视野中消失，对曝光机识别对位标记产生影响。
在步骤204中，移动检出系视野，使检出系视野的中心位于定位线段上。
在定位线段出现在检出系视野中后，可以移动检出系视野，使检出系视野的中心位于定位线段上。由于检出系视野想要搜寻并准确识别到对位标记，需 要对位标记完整的出现在检出系视野中，而将检出系视野的中心位于定位线段上，能够方便之后检出系视野识别对位标记。同样的，定位线段在设置时，也可以设置为使定位线段的延长线贯穿对位标记的中心，以配合检出系视野的搜寻。
在步骤205中，以定位线段的长度方向从定位线段处移动检出系视野至对位标记出现在检出系视野中。
在使检出系视野的中心位于定位线段上之后，可以以定位线段的长度方向移动检出系视野至对位标记出现在检出系视野中。由于定位线段所在直线贯穿对位标记，检出系视野大于对位标记且中心位于定位线段上，因而检出系视野在以定位线段的长度方向移动时，可以找到对位标记。检出系视野可以通过图像分析等方法(如分析图像的对比度等)，在对位标记出现在检出系视野中时，识别出对位标记。
示例性的，如图2-4所示，检出系视野33以定位线段31的长度方向b移动检出系视野33，对位标记32会出现在检出系视野33中。在移动检出系视野时，由于可能不确定对位标记与检出系视野的位置关系，因而可以在定位线段长度方向的两个方向移动检出系视野。在移动时，可以考虑检出系视野与对位标记之间位置在定位线段的长度方向上的最大偏差，示例性的，最大偏差为5个单位长度，则可以首先在定位线段的长度的一个方向由起始位置移动检出系视野5个单位长度。若未搜寻到对位标记，再由起始位置向定位线段的长度的另一个方向移动检出系视野来继续搜寻对位标记。
需要说明的是，如图2-5所示，若检出系视野33的中心未移动到定位线段31上，检出系视野33在以定位线段31的长度方向移动搜寻对位标记32时，对位标记32可能无法完全出现在检出系视野33中，这可能会对对位标记的识别造成一定的影响。
需要说明的是，虚拟区的对位标记可能有多个，示例性的，如图2-6所示，虚拟区中可能包含有等间距排列的三个对位标记32a、32b和32c，以检出系视野33从对位标记32a左侧向右移动寻找对位标记为例，检出系视野33在找到对位标记32a后，继续向右移动，即可陆续找到对位标记32b和32c。
需要说明的是，在检出系视野找到对位标记后，可以根据对位标记将掩膜版与衬底基板进行对位，并对衬底基板上的光刻胶进行曝光等工序，即本发明实施例提供的对位标记搜寻方法，可以应用于构图工艺中，并成为构图工艺的 一部分。
需要说明的是，本发明实施例提供的对位标记搜寻方法，还可以应用于搜寻其它装置中的对位标记，而不限于搜寻显示面板中的对位标记。
需要补充说明的是，本发明实施例提供的对位标记搜寻方法，通过在检出系视野找到定位线段之后，将检出系视野的中心移动至定位线段上，达到了方便检出系视野识别对位标记的效果。
综上所述，本发明实施例提供的对位标记搜寻方法，通过在衬底基板的虚拟区寻找定位线段，并沿定位线段的长度方向来寻找对位标记，其中定位线段所在的直线贯穿对位标记，解决了相关技术中需要向实际坐标的各个方向移动检出系视野才能找到对位标记，查找过程较为复杂，查找时间较长的问题；达到了能够简便快速的找到对位标记的效果。
图3-1是本发明实施例示出的一种显示基板中衬底基板的虚拟区的示意图，该衬底基板的虚拟区可以包括定位线段31和对位标记32。定位线段31所在直线(图3-1中未示出)延伸后，可贯穿对位标记32。
可选的，定位线段31所在直线可以延伸以贯穿对位标记32的中心。
可选的，如图3-2所示，对位标记32的定位线段31有两条，分别为第一定位线段31-1和第二定位线段31-2，两条定位线段31所在的直线彼此重合，且两条定位线段31分别位于对位标记32的两侧。需要说明的是，两条定位线段31也可以是平行的关系。
可选的，两条定位线段31之间的距离x大于或等于检出系视野33在任一定位线段的长度方向a上的长度y。这是为了使检出系视野33在以定位线段的31长度方向a移动寻找对位标记32时，能够保证对位标记32可以单独出现在检出系视野33中，以防止定位线段31与对位标记32同时出现在检出系视野33中，对曝光机识别对位标记32产生干扰。
可选的，图3-3为本发明实施例提供的另一种显示基板中衬底基板的虚拟区的示意图，在该图中，任一定位线段31与对位标记32在定位线段31的长度方向上的距离l小于检出系视野33在定位线段31的长度方向上的宽度y。这样可以避免检出系视野在以定位线段31的长度方向移动时，定位线段31和对位标记32同时从检出系视野33中消失，对曝光机识别对位标记32产生影响。
可选的，对位标记32两侧的定位线段31与对位标记32的距离相等，均为l，且l+d＝y，其中d为对位标记32在定位线段31长度方向上的长度，y为检出 系视野33在定位线段31长度方向上的长度。检出系视野33在定位线段31上移动时，定位线段31和对位标记32不会均从检出系视野33中消失。这样可以避免定位线段与对位标记间的距离过远而增加对位标记的搜寻难度，且能够在定位线段从检出系视野中消失时，对位标记同时会完整的出现在检出系视野中，增加了对位标记的搜寻速度。
可选的，定位线段31与对位标记32是在一次构图工艺中形成的。一次构图工艺形成定位线段31和对位标记32能够在不增加构图工艺次数的基础上，在虚拟区添加定位线段31。
可选的，本发明实施例涉及的显示基板可以为阵列基板或彩膜基板。该阵列基板可以是用于液晶显示装置(LCD)或有机发光二极管(OLED)显示装置的阵列基板。
需要说明的是，本发明实施例提供的显示基板是以衬底基板的虚拟区域中对位标记为矩形为例，对位标记还可以是圆形等其它形状，本发明实施例不作出限制。
需要说明的是，图3-1所示的衬底基板还可以是其它装置中设置有对位标记的基板，本发明实施例不作限制。
需要补充说明的是，本发明实施例提供的显示基板，通过使定位线段与对位标记间的距离小于检出系视野的宽度，达到了避免定位线段和对位标记同时从检出系视野中消失，影响曝光机识别对位标记的效果。
需要补充说明的是，本发明实施例提供的显示基板，通过将两条定位线段之间的距离设置为大于或等于检出系视野在任一定位线段的长度方向上的长度，达到了避免定位线段干扰曝光机识别对位标记的效果。
综上所述，本发明实施例提供的显示基板，通过在衬底基板的虚拟区设置定位线段，该定位线段所在直线贯穿对位标记，使得可以通过定位标记来寻找对位标记，解决了相关技术中的显示基板的衬底基板的对位标记难以寻找的问题；达到了能够简便快速的找到衬底基板上的对位标记的效果。
此外，本发明实施例还提供一种显示装置，该显示装置可以包括图3-1所示的显示基板、图3-2所示的显示基板或图3-3所示的显示基板。
以上所述仅为本发明的较佳实施例，并不用以限制本发明，凡在本发明的精神和原则之内，所作的任何修改、等同替换、改进等，均应包含在本发明的保护范围之内。
本申请要求于2015年10月30日递交的中国专利申请第201510725969.X号的优先权，在此全文引用上述中国专利申请公开的内容以作为本申请的一部分。

Claims (16)

  1. 一种对位标记搜寻方法，用于搜寻衬底基板上的对位标记，所述衬底基板的虚拟区上形成有第一定位线段，所述第一定位线段所在直线贯穿所述对位标记，所述方法包括：
    获取所述对位标记的理论坐标；
    以所述理论坐标为目标移动检出系视野至目标位置；
    以垂直于所述第一定位线段的方向从所述目标位置移动所述检出系视野至所述第一定位线段出现在所述检出系视野中；
    以所述第一定位线段的长度方向从所述第一定位线段处移动所述检出系视野至所述对位标记出现在所述检出系视野中。
  2. 根据权利要求1所述的方法，其中，所述第一定位线段所在直线贯穿所述对位标记的中心，所述以垂直于所述第一定位线段的方向从所述目标位置移动所述检出系视野至所述第一定位线段出现在所述检出系视野中之后，所述方法还包括：
    移动所述检出系视野，使所述检出系视野的中心位于所述第一定位线段上。
  3. 根据权利要求1所述的方法，其中，
    所述第一定位线段与所述对位标记在所述第一定位线段的长度方向上的距离小于所述检出系视野在所述第一定位线段的长度方向上的宽度。
  4. 根据权利要求1所述的方法，其中，
    所述衬底基板的虚拟区上还形成有第二定位线段，所述第一定位线段和所述第二定位线段所在的直线重合且分别位于所述对位标记的两侧。
  5. 根据权利要求4所述的方法，其中，所述检出系视野为矩形，
    所述第一定位线段和所述第二定位线段之间的距离大于或等于所述检出系视野在所述第一定位线段和所述第二定位线段中任一的长度方向上的长度。
  6. 根据权利要求1至5任一所述的方法，其中，
    所述第一定位线段与所述对位标记是在一次构图工艺中形成的。
  7. 根据权利要求1至6任一所述的方法，其中，所述衬底基板包括：
    阵列基板中的衬底基板或彩膜基板中的衬底基板。
  8. 根据权利要求1至7任一所述的方法，其中，所述方法用于对所述衬底基板的构图工艺中。
  9. 一种显示基板，包括衬底基板，其中，所述衬底基板的虚拟区上形成有第一定位线段，所述第一定位线段所在直线贯穿对位标记。
  10. 根据权利要求9所述的显示基板，其中，所述第一定位线段所在直线贯穿所述对位标记的中心。
  11. 根据权利要求9所述的显示基板，其中，
    所述第一定位线段与所述对位标记在所述第一定位线段的长度方向上的距离小于所述检出系视野在所述第一定位线段的长度方向上的宽度。
  12. 根据权利要求9所述的显示基板，其中，
    所述衬底基板的虚拟区上还形成有第二定位线段，所述第一定位线段和第二定位线段所在的直线重合且分别位于所述对位标记的两侧。
  13. 根据权利要求12所述的显示基板，其中，
    所述第一定位线段和所述第二定位线段之间的距离大于或等于所述检出系视野在所述第一定位线段和所述第二定位线段中任一的长度方向上的长度。
  14. 根据权利要求9至13任一所述的显示基板，其中，
    所述第一定位线段与所述对位标记是在一次构图工艺中形成的。
  15. 根据权利要求9至14任一所述的显示基板，其中，所述显示基板包括：
    阵列基板或彩膜基板。
  16. 一种显示装置，包括权利要求9至15任一所述的显示基板。
PCT/CN2016/096183 2015-10-30 2016-08-22 对位标记搜寻方法、显示基板和显示装置 WO2017071382A1 (zh)

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