WO2017054417A1 - 蒸镀坩埚和蒸镀系统 - Google Patents

蒸镀坩埚和蒸镀系统 Download PDF

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Publication number
WO2017054417A1
WO2017054417A1 PCT/CN2016/075964 CN2016075964W WO2017054417A1 WO 2017054417 A1 WO2017054417 A1 WO 2017054417A1 CN 2016075964 W CN2016075964 W CN 2016075964W WO 2017054417 A1 WO2017054417 A1 WO 2017054417A1
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Prior art keywords
crucible
vapor deposition
deposition system
wall
evaporation
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PCT/CN2016/075964
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English (en)
French (fr)
Inventor
金龙
黄俊杰
杨文斌
唐富强
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BOE Technology Group Co Ltd
Ordos Yuansheng Optoelectronics Co Ltd
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BOE Technology Group Co Ltd
Ordos Yuansheng Optoelectronics Co Ltd
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Priority to US15/501,566 priority Critical patent/US20170226627A1/en
Publication of WO2017054417A1 publication Critical patent/WO2017054417A1/zh
Anticipated expiration legal-status Critical
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment

Definitions

  • Embodiments of the present invention relate to an evaporation crucible and an evaporation system, and in particular to an evaporation crucible and an evaporation system for use in fabricating an OLED display.
  • OLED Organic Light-Emitting Diode
  • the OLED display includes a PMOLED (Passive-Matrix Organic Light Emitting Diode) display and an AMOLED (Active-Matrix Organic Light Emitting Diode) display, wherein the AMOLED display is implemented.
  • LTPS Low temperature Poly-silicon
  • FMM fine metal mask
  • WOLED oxide
  • the former is mainly used for small-sized panels, corresponding to mobile phones and mobile applications; the latter is mainly used for large-sized panels, corresponding to applications such as monitors and televisions.
  • the LTPS backplane + FMM Mask has matured and achieved mass production.
  • the OLED evaporation material is vapor-deposited onto the LTPS backplane in a predetermined order by vapor deposition, and the red, green and blue devices are formed by using the pattern on the FMM.
  • Evaporation is carried out in a vacuum chamber, a linear evaporation source is used in mass production, and a linear crucible is used. Due to the traditional use of titanium (Ti) material, the conductivity of heat inside the Ti material is relatively poor, and the internal structure of the crucible is a hollow structure. Therefore, the overall temperature uniformity of the crucible is poor, and the vapor deposition material in the crucible does not evaporate. Another part of the evaporation material may be excessively heated and denatured. The non-uniformity of evaporation ultimately leads to the inability to obtain qualified OLED panels.
  • Ti titanium
  • Fig. 1 is a schematic view showing the structure of an evaporating crucible in the prior art.
  • the crucible 100 vapor-deposited on the OLED substrate includes, for example, a pot body 1 formed of a Ti material and a plurality of nozzles 2 on the top surface of the pot body 1. The spacing between the individual nozzles 2 is A.
  • the crucible 100 shown in Fig. 1 has a substantially rectangular parallelepiped shape, and a heating tube 3 is provided on the side surface and the bottom surface thereof for evaporating the organic vapor deposition material inside the crucible to perform coating on the OLED substrate.
  • the crucible 100 shown in Fig. 1 evaporates the evaporation material, it may happen that the material in contact with the sidewall and the bottom wall of the crucible first evaporates, while the evaporation rate of the middle material is relatively slow, thereby affecting the whole. Evaporation uniformity of the evaporation source. Also, if the thermal stability of the material is not particularly good, then when the middle material reaches the desired evaporation rate, the material that is in contact with the sidewall of the crucible may have been denatured, resulting in wasted material.
  • Embodiments of the present invention are directed to provide an evaporation crucible and an evaporation system capable of solving the problem of evaporation unevenness of an evaporation material in the prior art, thereby achieving uniform coating of an OLED substrate.
  • an evaporation crucible comprising: a pot body and at least one nozzle on a top surface of the pot body, wherein the pot body comprises an inner wall and an outer wall joined to each other, the inner wall being first The material is formed, the outer wall being formed of a second material, the first material having a thermal conductivity greater than a thermal conductivity of the second material.
  • the outer wall is formed of a Ti material formed of one of Cu, Ag, and Al or a combination thereof.
  • the evaporating crucible is provided with one or two nozzles.
  • the vapor deposition crucible further includes a heating device disposed outside the pan body for heating the crucible.
  • an evaporation system comprising a plurality of crucibles arranged in a regular arrangement for vapor deposition of a target substrate, the crucible being the vapor deposition crucible of the above embodiment.
  • the plurality of turns are arranged such that the spacing between two adjacent nozzles is the same.
  • the plurality of turns are arranged as linear evaporation sources.
  • the plurality of turns are arranged as a surface evaporation source.
  • the evaporation system comprises a plurality of crucible moving devices, each of which is adapted to independently move the respective crucibles to form a predetermined chirp arrangement.
  • the cymbal moving device comprises a guide rail and a servo motor, the servo motor driving the corresponding cymbal to move on the guide rail.
  • each crucible is equipped with a heating device.
  • each crucible is provided with a separating device for controlling the respective heating device to be close to or separated from the crucible.
  • each crucible is equipped with a temperature measuring device for measuring the temperature of the crucible, respectively.
  • the evaporation system comprises a control device associated with the mobile device, the heating device, the separation device and the temperature measuring device for controlling the mobile device, the heating device, the separating device And the operation of the temperature measuring device.
  • the pot body includes an inner wall and an outer wall which are combined with each other, the inner wall is made of a first material, and the outer wall is made of a second material, and the first material has a thermal conductivity greater than that of the first The thermal conductivity of the two materials.
  • a plurality of small crucibles are formed into one evaporation system to replace the large-sized crucible in the prior art, and evaporation of the evaporation material in the middle of the large-sized crucible can be prevented from being insufficiently heated. Insufficient, thereby improving the uniformity of the coating.
  • FIG. 1 is a schematic view showing the structure of an evaporating crucible in the prior art.
  • FIG. 2 is a schematic view showing the structure of an evaporation system composed of a plurality of crucibles according to an embodiment of the present invention.
  • Figure 3a is a schematic plan view of an evaporating crucible constituting a point evaporation source, in accordance with one embodiment of the present invention.
  • Figure 3b is a schematic plan view of an evaporation system constituting a linear evaporation source, in accordance with one embodiment of the present invention.
  • Figure 3c is a schematic plan view of an evaporation system that constitutes a surface evaporation source, in accordance with one embodiment of the present invention.
  • FIG. 4a is a perspective schematic view of an evaporation system including a crucible, a mobile device for the crucible, and a control device, in accordance with an exemplary embodiment of the present invention.
  • FIG. 4b is a perspective schematic view of an evaporation system including a plurality of crucibles constituting a linear evaporation source, a plurality of moving devices for the plurality of crucibles, and a total, in accordance with an exemplary embodiment of the present invention. Control device.
  • FIG. 4c is a perspective schematic view of an evaporation system including a plurality of crucibles constituting a surface evaporation source, a plurality of moving devices for the plurality of crucibles, and a total in accordance with an exemplary embodiment of the present invention. Control device.
  • FIG. 5 is a block diagram of an evaporation system in accordance with one embodiment of the present invention.
  • the evaporation system includes a plurality of crucibles 10 arranged in a regular manner, and the plurality of crucibles 10 as a whole A body for coating a target substrate such as an OLED substrate.
  • the plurality of crucibles 10 may be arranged in accordance with the shape of the substrate to be coated.
  • a plurality of crucibles 10 in the vapor deposition system shown in Fig. 2 can be used in place of one crucible 100 having a corresponding size as shown in Fig. 1 for coating a target substrate.
  • the vapor deposition system shown in Fig. 2 uses a plurality of independent small-sized crucibles 10, each of which is independently heated by a heating device 13 disposed outside the crucible body.
  • the heating degree of each crucible 10 is the same, and the spacing between the nozzles of each crucible in the entire vapor deposition system is also A. Therefore, the vapor deposition system shown in FIG. 2 avoids the defect of insufficient evaporation caused by insufficient heating of the vapor deposition material in the middle of the large-sized crucible 100 as shown in FIG. 1, thereby improving the uniformity of coating of the substrate.
  • each of the crucibles 10 in the evaporation system of Fig. 2 includes a pot body 11 and at least one nozzle 12 on the top surface of the pot body, and the pot body 11 includes inner walls joined to each other. And an outer wall, the inner wall being formed of a first material, the outer wall being formed of a second material, the first material having a thermal conductivity greater than a thermal conductivity of the second material.
  • the outer wall may be formed of a Ti material, which may be formed of one of copper (Cu), silver (Ag), and aluminum (Al) or a combination thereof.
  • the outer wall formed of Ti can satisfy the strength requirement of the crucible, so that the crucible does not deform at a high temperature; and the inner wall formed of a material having good thermal conductivity such as Cu, Ag or Al can ensure that heat is quickly transferred, so that heat can be It is rapidly conducted from one area to the other area, thereby ensuring temperature uniformity of the entire inner wall of the crucible, so that the vapor deposition material in contact with the inner wall can be uniformly evaporated.
  • the selection of the inner wall material is premised on not reacting with the evaporating material.
  • each crucible 10 has two nozzles. According to other embodiments, each crucible 10 may have only one nozzle. When the number of nozzles is small, the crucible 10 can have a small size to prevent uneven heating of the evaporating material in a single crucible.
  • FIG. 2 shows that a plurality of crucibles 10 are combined to form an evaporation system for use.
  • each crucible 10 can be used alone, for example, when manufacturing a small display panel (for example, for a portable mobile device such as a mobile phone), the coating can be performed using a single crucible.
  • the crucible 10 may have a rectangular parallelepiped shape, and the size of the crucible may be in the range of 100*100*200 mm to 150*100*250 mm in terms of length*width*height.
  • the crucible can be of a smaller size for fabrication of smaller display devices such as mobile handsets. The smaller crucible size prevents the evaporation material in the middle of the crucible from being sufficiently heated to prevent coating defects caused by uneven evaporation of the material.
  • an evaporation system composed of a plurality of crucibles 10 as shown in Fig. 2 can be employed.
  • a plurality of crucibles 10 are evenly arranged as a linear evaporation source (Fig. 3b) or a surface evaporation source (Fig. 3c).
  • the respective nozzles 12 of the plurality of crucibles 10 may be arranged at equal intervals (FIG. 2) to facilitate uniform evaporation of vapor deposition throughout the entire evaporation system. The material is thus uniformly applied to the coating.
  • Figure 3a is a schematic plan view of an evaporating crucible constituting a point evaporation source, in accordance with one embodiment of the present invention.
  • Figure 3b is a schematic plan view of an evaporation system constituting a linear evaporation source, in accordance with one embodiment of the present invention.
  • Figure 3c is a schematic plan view of an evaporation system that constitutes a surface evaporation source, in accordance with one embodiment of the present invention.
  • the vapor deposition ruthenium can be formed into a line evaporation source or a surface evaporation source of any size as needed, thereby facilitating flexible vapor deposition processing on various types of substrates.
  • the number of nozzles and the position of the nozzle on the top surface of the pot body can be set according to actual needs, and the distance between the respective crucibles can be adjusted as needed, so that any two of the surface evaporation sources composed of a plurality of crucibles The distance between adjacent nozzles is the same.
  • the evaporation system may include a plurality of crucible moving devices, each for individually moving a respective one. ⁇ 10.
  • 4a is a perspective schematic view of an evaporation system including a crucible, a mobile device for the crucible, and a control device, in accordance with an exemplary embodiment of the present invention.
  • 4b is a perspective schematic view of an evaporation system including a plurality of (three shown) ⁇ constituting a linear evaporation source for the plurality of rafts, in accordance with an exemplary embodiment of the present invention. Multiple mobile devices and one total control device.
  • FIG. 4c is a perspective schematic view of an evaporation system including a plurality of evaporation sources constituting a surface evaporation source, in accordance with an exemplary embodiment of the present invention. (9 are shown) ⁇ , a plurality of mobile devices for the plurality of ports, and a total control device.
  • each cassette 10 is equipped with a moving device comprising a guide rail 14 and a servo motor 15.
  • the servo motor 15 drives the respective crucible 10 to move on the guide rail 14.
  • each servo motor 15 is connected to a control device 16, such as a PC, by wires, so that the drive of each servo motor 15 can be controlled by the control device 16.
  • FIG. 5 shows a block diagram of an evaporation system in accordance with one embodiment of the present invention.
  • an evaporation system may include 1 to n crucibles, and each crucible is equipped with a heating device, a crucible moving device, and a separation device for separating the heating device from the crucible. And temperature measuring device.
  • the heating device 13 may be constructed as part of a crucible since the individual crucibles are used alone. Whereas, when a plurality of crucibles constitute an evaporation system, the heating device 13 may be formed as a different component from the crucible 10 since it may be necessary to perform separate operations for each crucible.
  • the entire evaporation system is equipped with a control unit.
  • a heating device is used to heat the corresponding crucible to facilitate evaporation of the vapor deposition material within the crucible.
  • Mobile devices for example including the guide rails and servo motors shown in Figures 4a-4c, for moving the respective turns.
  • the separation device is used to control the proximity or separation between the respective heating device and the respective crucible, thereby allowing independent heating of the individual crucibles.
  • Each temperature measuring device is used to measure the temperature of the respective crucible to control the heating or cooling of the crucible according to the temperature of the crucible.
  • the control device is configured to be associated with the mobile device, the heating device, the separating device, and the temperature measuring device for controlling the operation of the moving device, the heating device, the separating device, and the temperature measuring device, thereby implementing automatic control of the vapor deposition system.
  • the temperature signal may be output to the control device, and the control device controls the separating device to separate the heating device (for example, the heating wire) from the crucible to realize the temperature. control.
  • the control device can additionally or alternatively control the respective heating devices according to the temperature signals input by the respective temperature measuring devices, so as to individually heat each of the crucibles, thus The temperature of each crucible can be independently controlled to achieve uniformity of all crucible temperatures.
  • the crucible Since the evaporation system uses a plurality of small crucibles, the crucible has a high heating speed, high temperature transfer efficiency, uniform heat, and the inner wall of the crucible is made of a material having a high thermal conductivity such as Cu/Ag, so that the temperature can be quickly transferred to the evaporation.
  • the material thus ensures uniformity of the overall evaporation temperature and the rate of evaporation can be well controlled.

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  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
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Abstract

一种蒸镀坩埚(10)，包括锅体(11)和位于锅体(11)顶面上的至少一个喷嘴(12)，其中，锅体(11)包括相互结合的内壁和外壁，内壁由第一材料形成，外壁由第二材料形成，第一材料的导热率大于第二材料的导热率。以及一种包括规则排列的多个坩埚(10)的蒸镀系统。

Description

蒸镀坩埚和蒸镀系统 技术领域
本发明的实施例涉及一种蒸镀坩埚和蒸镀系统，尤其设计一种在制造OLED显示器中使用的蒸镀坩埚和蒸镀系统。
背景技术
OLED(Organic Light-Emitting Diode)显示器由于具有轻薄、低功耗、高对比度、高色域、可以实现柔性显示等优点，在当前的平板显示器市场中占据了越来越重要的地位，代表下一代显示器的发展趋势。
OLED显示器包括PMOLED(Passive-matrix organic light emitting diode，被动矩阵有机发光二极体)显示器和AMOLED(Active-matrix organic light emitting diode，主动矩阵有机发光二极体)显示器，其中AMOLED显示的实现方式有LTPS(Low temperature Poly-silicon，低温多晶)背板+精细金属掩膜(FMM)方式，和氧化物(Oxide)背板+白光OLED(WOLED)+彩膜的方式。前者主要应用于小尺寸面板，对应手机和移动应用；后者主要应用于大尺寸面板，对应监视器和电视等应用。现在LTPS背板+FMM Mask的方式已经初步成熟，实现了量产。
精细金属掩膜(FMM)模式，是通过蒸镀方式将OLED蒸镀材料按照预定顺序蒸镀到LTPS背板上，利用FMM上的图形，形成红绿蓝器件。蒸镀是在真空腔体中进行，量产中使用线性蒸发源，坩埚使用线性坩埚。由于传统坩埚多使用钛(Ti)材质，热量在Ti材料内部的传导性比较差，并且坩埚内部结构是中空结构，因此，坩埚整体温度均匀性差，导致坩埚内的部分蒸镀材料没有蒸发，而另一部分蒸镀材料可能会过度受热而变性。蒸发的不均匀性最终导致不能获得合格的OLED面板。
图1显示了现有技术中的一种蒸镀坩埚的结构示意图。如图1所示，用于 OLED基板蒸镀的坩埚100包括例如由Ti材料形成的锅体1和位于锅体1的顶面上的多个喷嘴2。各个喷嘴2之间的间距为A。图1所示的坩埚100具有大致长方体形状，在其侧面和底面上设置有加热管3，用于对坩埚内部的有机蒸镀材料进行蒸发，从而在OLED基板上进行镀膜。
如图1所示的坩埚100在对蒸镀材料进行蒸发时，可能出现的情况是：与坩埚侧壁和底壁接触的材料最先蒸发，而中部材料蒸发速率相对较慢，从而影响了整个蒸发源的蒸发均匀性。并且，如果材料热稳定性不是特别好，那么当中部材料达到要求的蒸发速率时，边缘与坩埚侧壁接触的材料可能已经发生变性，导致材料浪费。
发明内容
本发明的实施例旨在提供一种蒸镀坩埚和蒸镀系统，其能够解决现有技术中的蒸镀材料蒸发不均匀的问题，从而实现OLED基板的均匀镀膜。
根据本发明的一个方面，提供一种蒸镀坩埚，包括：锅体和位于锅体顶面上的至少一个喷嘴，其中，所述锅体包括相互结合的内壁和外壁，所述内壁由第一材料形成，所述外壁由第二材料形成，所述第一材料的导热率大于所述第二材料的导热率。
根据本发明的一个实施例，所述外壁由Ti材料形成，所述内壁由Cu、Ag和Al中的一种材料或它们的组合形成。
根据本发明的一个实施例，所述蒸镀坩埚设置有一或两个喷嘴。
根据本发明的一个实施例，所述蒸镀坩埚还包括设置在所述锅体外部的加热装置，用于加热坩埚。
根据本发明的另一个方面，提供一种蒸镀系统，包括规则排列的多个坩埚，用于对一个对象基板进行蒸镀，所述坩埚为上述实施例的蒸镀坩埚。
根据本发明的一个实施例，所述多个坩埚布置成使得两个相邻喷嘴之间的间距相同。
根据本发明的一个实施例，所述多个坩埚布置为线性蒸发源。
根据本发明的一个实施例，所述多个坩埚布置为面蒸发源。
根据本发明的一个实施例，所述蒸镀系统包括多个坩埚移动装置，每个坩埚移动装置分别用于独立地移动相应的坩埚，以形成预定的坩埚排列。
根据本发明的一个实施例，所述坩埚移动装置包括导轨和伺服电机，所述伺服电机驱动相应的坩埚在导轨上移动。
根据本发明的一个实施例，每个坩埚配备有加热装置。
根据本发明的一个实施例，每个坩埚配备有分离装置，所述分离装置用于控制相应的加热装置与该坩埚接近或分离。
根据本发明的一个实施例，每个坩埚配备有测温装置，用于分别测量该坩埚的温度。
根据本发明的一个实施例，所述蒸镀系统包括控制装置，所述控制装置连与述移动装置、加热装置、分离装置和测温装置相关联，用于控制移动装置、加热装置、分离装置和测温装置的操作。
根据本发明实施例的蒸镀坩埚，所述锅体包括相互结合的内壁和外壁，所述内壁采用第一材质，所述外壁采用第二材质，所述第一材质的导热率大于所述第二材质的导热率。从而，当对坩埚进行加热时，热量能够在内壁材料中快速传导，使得与蒸镀材料接触的内壁的温度均匀化，从而能够均匀地加热和蒸发蒸镀材料，获得均匀的镀膜。
根据本发明实施例的蒸镀系统，将多个小坩埚组成一个蒸镀系统，以代替现有技术中的大尺寸坩埚，能够避免大尺寸坩埚中部的蒸镀材料得不到充分加热导致的蒸发不足，从而改善镀膜的均匀性。
为了使本发明的目的、特征及优点能更加明显易懂，下面结合附图和具体实施例对本发明作进一步说明。
附图说明
图1是现有技术中的一个蒸镀坩埚的结构示意图。
图2是根据本发明的一个实施例的由多个坩埚组成的蒸镀系统的结构示意图。
图3a是根据本发明的一个实施例的构成点蒸发源的一个蒸镀坩埚的平面示意图。
图3b是根据本发明的一个实施例的构成线性蒸发源的蒸镀系统的平面示意图。
图3c是根据本发明的一个实施例的组成面蒸发源的蒸镀系统的平面示意图。
图4a是根据本发明的一个示例性实施例的蒸镀系统的立体示意图，该蒸镀系统包括一个坩埚、用于该坩埚的移动装置和控制装置。
图4b是根据本发明的一个示例性实施例的蒸镀系统的立体示意图，该蒸镀系统包括构成线性蒸发源的多个坩埚、用于所述多个坩埚的多个移动装置和一个总的控制装置。
图4c是根据本发明的一个示例性实施例的蒸镀系统的立体示意图，该蒸镀系统包括构成面蒸发源的的多个坩埚、用于所述多个坩埚的多个移动装置和一个总的控制装置。
图5是根据本发明的一个实施例的蒸镀系统的方块图。
具体实施方式
在下面的详细描述中，为便于解释，阐述了许多具体的细节以提供对本披露实施例的全面理解。然而明显地，一个或多个实施例在没有这些具体细节的情况下也可以被实施。在其他情况下，公知的结构和装置被省略以简化附图。并且，在所有附图中，相同的附图标记用于表示相同的部件。
图2是根据本发明的一个实施例的由多个坩埚组成的蒸镀系统的结构示意图。所述蒸镀系统包括规则排列的多个坩埚10，所述多个坩埚10作为一个整 体，用于对一个对象基板例如OLED基板进行镀膜。所述多个坩埚10可以按照待镀膜的基板的形状进行排列。
图2所示的蒸镀系统中的多个坩埚10可以用于代替图1所示的具有对应尺寸的一个坩埚100，用于对一个对象基板实施镀膜。与图1所示的坩埚100相比，图2所示的蒸镀系统使用多个独立的小尺寸坩埚10，每个小尺寸坩埚10通过设置在坩埚锅体外部的加热装置13进行独立地加热，各个坩埚10的加热程度相同，并且，整个蒸镀系统中各个坩埚的喷嘴之间的间距也为A。因而，图2所示的蒸镀系统避免了如图1所示的大尺寸坩埚100中部的蒸镀材料得不到充分加热导致的蒸发不足的缺陷，从而改善了对基板镀膜的均匀性。
根据本发明的一个实施例，在图2的蒸镀系统中的每个坩埚10包括锅体11和位于锅体顶面上的至少一个喷嘴12，并且，所述锅体11包括相互结合的内壁和外壁，所述内壁由第一材料形成，所述外壁由第二材料形成，所述第一材料的导热率大于所述第二材料的导热率。
具体地，所述外壁可以由Ti材料形成，所述内壁可以由铜(Cu)、银(Ag)和铝(Al)中的一种材料或它们的组合形成。这样，由Ti形成的外壁可以满足坩埚的强度要求，使得坩埚在高温下不变形；而由Cu、Ag或Al等导热性好的材料形成的内壁则可以保证热量被快速地传递，使得热量可以从一个区域迅速地传导到其他区域，从而保证了整个坩埚内壁的温度均匀性，使得与内壁接触的蒸镀材料可以被均匀地蒸发。此外，内壁材料的选择以不和蒸发材料反应为前提。
图2示出了每个坩埚10具有两个喷嘴。根据其它的实施例，每个坩埚10可以只具有一个喷嘴。当喷嘴的个数较少时，坩埚10可以具有较小的尺寸，防止在单个坩埚中蒸发材料受热不均匀。
另外，虽然图2示出了多个坩埚10组成一个蒸镀系统来使用。但是，当基板的尺寸较小时，每个坩埚10可以单独使用，例如，当制造小型显示面板(例如，用于诸如手机的便携式移动装置)时，可以使用单个坩埚实施镀膜。
根据一个实施例，坩埚10可以具有长方体形状，坩埚的尺寸用长*宽*高表示可以在100*100*200mm～150*100*250mm的范围内。或者，坩埚可以为较小的尺寸以适于移动手机等较小显示装置的制作。较小的坩埚尺寸可以防止坩埚中部的蒸镀材料得不到充分加热，防止材料蒸发不均匀导致的镀膜缺陷。
当制造诸如电脑监视器、电视屏幕等较大尺寸的显示装置时，可以采用如图2所示的由多个坩埚10构成的蒸镀系统。在所述蒸镀系统中，多个坩埚10均匀地排列成线性蒸发源(图3b)或面蒸发源(图3c)。在多个坩埚10均匀地排列成线性蒸发源的情况下，可以将多个坩埚10的各个喷嘴12等间距地排列(图2)，以便于在整个蒸镀系统的范围内均匀地蒸发蒸镀材料，从而均匀地实施镀膜。
图3a是根据本发明的一个实施例的构成点蒸发源的一个蒸镀坩埚的平面示意图。图3b是根据本发明的一个实施例的构成线性蒸发源的蒸镀系统的平面示意图。图3c是根据本发明的一个实施例的组成面蒸发源的蒸镀系统的平面示意图。实践中，可以根据需要将蒸镀坩埚组成任意尺寸的线蒸发源或面蒸发源，便于灵活地对各种类型的基板进行蒸镀加工。此外，可以根据实际需要设定喷嘴的数目以及喷嘴在锅体顶面上的位置，以及跟实际需要调整各个坩埚之间的距离，使得由多个坩埚组成的面蒸发源中的任意两个相邻喷嘴之间的距离相同。
为了便于调整每个坩埚10的位置，以形成预定的坩埚排列，根据本发明进一步的实施例，蒸镀系统可包括多个坩埚移动装置，每个坩埚移动装置分别用于独立地移动一个相应的坩埚10。图4a是根据本发明的一个示例性实施例的蒸镀系统的立体示意图，该蒸镀系统包括一个坩埚、用于该坩埚的移动装置和控制装置。图4b是根据本发明的一个示例性实施例的蒸镀系统的立体示意图，该蒸镀系统包括构成线性蒸发源的多个(图中示出3个)坩埚、用于所述多个坩埚的多个移动装置和一个总的控制装置。图4c是根据本发明的一个示例性实施例的蒸镀系统的立体示意图，该蒸镀系统包括构成面蒸发源的的多个 (图中示出9个)坩埚、用于所述多个坩埚的多个移动装置和一个总的控制装置。
如图4a-4c所示，每个坩埚10配备有移动装置，所述移动装置包括导轨14和伺服电机15。所述伺服电机15驱动相应的坩埚10在导轨14上移动。从而，根据该实施例，便于根据需要移动各个坩埚，并且有利于形成预定的线蒸发源或面蒸发源。并且，每个伺服电机15通过导线连接到控制装置16，如PC机，从而，可以通过控制装置16来控制每个伺服电机15的驱动。
图5示出了根据本发明的一个实施例的蒸镀系统的方块图。如图5所示，根据本发明的一个实施例的蒸镀系统可以包括1至n个坩埚，并且，每个坩埚配备有加热装置、坩埚移动装置、用于使加热装置与坩埚分离的分离装置和测温装置。
需要说明的是，例如，在图3a和图4a所述的实施例中，由于单个坩埚单独使用，因此加热装置13可以被构造成坩埚的一部分。而当多个坩埚组成蒸镀系统时，由于可能需要对每个坩埚进行单独操作，因此，加热装置13可与坩埚10形成为不同的部件。
整个蒸镀系统配备有控制装置。加热装置用于加热相应的坩埚以便于蒸发坩埚内的蒸镀材料。坩埚移动装置，例如包括图4a-4c所示的导轨和伺服电机，用于移动相应的坩埚。分离装置用于控制相应的加热装置与相应的坩埚之间的接近或分离，从而允许独立地控制各个坩埚的加热。每个测温装置用于测量相应坩埚的温度，以便根据该坩埚的温度控制该坩埚的加热或冷却。所述控制装置构造为与移动装置、加热装置、分离装置和测温装置关联，用于控制移动装置、加热装置、分离装置和测温装置的操作，从而实现蒸镀系统的自动控制。
具体地，当测温装置测量得知某个坩埚的温度过高时，可以将温度信号输出给控制装置，控制装置则控制分离装置将加热装置(例如加热丝)与该坩埚分离，实现对温度的控制。并且，控制装置可以额外地或替换性地根据各个测温装置输入的温度信号控制各个加热装置，以便单独加热每个坩埚，这样同样 可以独立地控制每个坩埚的温度，实现所有坩埚温度的一致性。由于蒸镀系统采用多个小坩埚，小坩埚加热的速度快、温度传递效率高、受热均匀，并且坩埚的内壁采用高热导率的Cu/Ag等材质，可以使温度很快地传递给蒸镀材料，这样就保证了整体蒸发温度的均匀性，蒸镀的速率也可以进行很好的控制。
上述实施例仅示例性的说明了本发明的原理及构造，而非用于限制本发明，本领域的技术人员应明白，在不偏离本发明的总体构思的情况下，对本发明所作的任何改变和改进都在本发明的范围内。本发明的保护范围，应如本申请的权利要求书所界定的范围为准。应注意，措词“包括”不排除其它元件或步骤，措词“一”或“一个”不排除多个。另外，权利要求的任何元件标号不应理解为限制本发明的范围。

Claims (14)

  1. 一种蒸镀坩埚，包括：锅体和位于锅体顶面上的至少一个喷嘴，其中，
    所述锅体包括相互结合的内壁和外壁，所述内壁由第一材料形成，所述外壁由第二材料形成，所述第一材料的导热率大于所述第二材料的导热率。
  2. 根据权利要求1所述的蒸镀坩埚，其中，所述外壁由Ti材料形成，所述内壁由Cu、Ag和Al中的一种材料或它们的组合物形成。
  3. 根据权利要求1所述的蒸镀坩埚，其中，所述蒸镀坩埚包括一或两个喷嘴。
  4. 根据权利要求1所述的蒸镀坩埚，其中，所述蒸镀坩埚还包括设置在所述锅体外部的加热装置，用于加热坩埚。
  5. 一种蒸镀系统，包括规则排列的多个坩埚，用于对一个对象基板进行蒸镀，所述坩埚为如权利要求1-3中任一项所述的蒸镀坩埚。
  6. 根据权利要求5所述的蒸镀系统，其中，所述多个坩埚布置成使得两个相邻喷嘴之间的间距相同。
  7. 根据权利要求5所述的蒸镀系统，其中，所述多个坩埚布置为线性蒸发源。
  8. 根据权利要求5所述的蒸镀系统，其中，所述多个坩埚布置为面蒸发源。
  9. 根据权利要求5所述的蒸镀系统，其中，所述蒸镀系统包括多个坩埚移动装置，每个坩埚移动装置分别用于独立地移动相应的坩埚。
  10. 根据权利要求9所述的蒸镀系统，其中，所述坩埚移动装置包括导轨和伺服电机，所述伺服电机驱动相应的坩埚在导轨上移动。
  11. 根据权利要求9所述的蒸镀系统，其中，每个坩埚配备有加热装置。
  12. 根据权利要求11所述的蒸镀系统，其中，每个坩埚配备有分离装置，所述分离装置用于控制相应的加热装置与该坩埚接近或分离。
  13. 根据权利要求12所述的蒸镀系统，其中，每个坩埚配备有测温装置， 用于分别测量该坩埚的温度。
  14. 根据权利要求13所述的蒸镀系统，其中，所述蒸镀系统包括控制装置，所述控制装置与所述移动装置、加热装置、分离装置和测温装置相关联，用于控制移动装置、加热装置、分离装置和测温装置的操作。
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