WO2017002316A1 - 磁気記録媒体の製造方法及びその製造方法により製造される磁気記録媒体 - Google Patents
磁気記録媒体の製造方法及びその製造方法により製造される磁気記録媒体 Download PDFInfo
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- WO2017002316A1 WO2017002316A1 PCT/JP2016/002901 JP2016002901W WO2017002316A1 WO 2017002316 A1 WO2017002316 A1 WO 2017002316A1 JP 2016002901 W JP2016002901 W JP 2016002901W WO 2017002316 A1 WO2017002316 A1 WO 2017002316A1
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- magnetic recording
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
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- C—CHEMISTRY; METALLURGY
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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- G11B2005/0002—Special dispositions or recording techniques
- G11B2005/0005—Arrangements, methods or circuits
- G11B2005/0021—Thermally assisted recording using an auxiliary energy source for heating the recording layer locally to assist the magnetization reversal
Definitions
- the present invention relates to a method for manufacturing a magnetic recording medium and a magnetic recording medium manufactured by the manufacturing method.
- the perpendicular magnetic recording medium includes at least a nonmagnetic substrate and a magnetic recording layer formed of a hard magnetic material.
- the perpendicular magnetic recording medium is optionally formed of a soft magnetic material, and a soft magnetic backing layer that plays a role of concentrating the magnetic flux generated by the magnetic head on the magnetic recording layer, and a hard magnetic material of the magnetic recording layer. It may further include a base layer for orientation in the direction, a protective film for protecting the surface of the magnetic recording layer, and the like.
- a magnetic recording layer made of a material having high magnetic anisotropy such as FePt is required in order to obtain high thermal stability.
- FePt has a high coercivity at room temperature, and a normal recording head does not have enough magnetic field to perform recording. Therefore, a heat-assisted magnetic recording method has been proposed.
- the heat-assisted magnetic recording method is a recording method in which the magnetic recording layer is irradiated with a laser or the like to reduce the coercive force, and in that state, a recording magnetic field is applied to reverse the magnetization.
- recording is performed by heating to the vicinity of the Curie temperature of the magnetic material.
- the Curie temperature of FePt is about 470 ° C.
- recording at a high temperature causes deterioration of the carbon protective film for protecting the magnetic recording layer and the lubricant on the protective film, and also causes deterioration of the recording head itself. It becomes a factor to decrease. Therefore, it is desired to perform recording at as low a temperature as possible.
- Non-Patent Document 1 discloses thermal stability by a magnetic recording layer in which Ku is inclined, in which a lower layer having high magnetic anisotropy (Ku), a middle layer having medium Ku, and an upper layer having low Ku are stacked in this order. It is reported that the recording magnetic field (coercivity) can be reduced while maintaining the above. Further, Non-Patent Document 2, (FePt) 100-x Cu x has a magnetic layer made of an alloy, monotonically decreases with an upper layer content x of Cu from the lower layer, the recording magnetic field by ramping the Ku It has been reported that (coercivity) can be reduced.
- Non-Patent Document 2 a magnetic recording layer is formed by a co-sputtering method using Fe, Pt, and Cu targets, and the Cu sputtering power varies with time in order to incline the Cu content in the film thickness direction. It is done by letting.
- the co-sputtering method is difficult to control the component ratio and is difficult to produce stably.
- a throughput such as arranging a plurality of film forming chambers and forming each layer of the magnetic recording medium one by one in each film forming chamber while moving the substrate.
- An enhanced film formation method is employed.
- a mass production process for example, when forming an FePtCu film, a magnetic recording layer is formed using an FePtCu alloy target in an FePtCu film forming chamber. In this case, it is very difficult to provide a gradient in the composition of Cu in the formed magnetic recording layer by changing only the composition of Cu.
- a method of manufacturing a magnetic recording medium includes a substrate and at least a magnetic recording layer, the magnetic recording layer includes Fe, Pt, and Rh, and the composition of Rh of the magnetic recording layer is that of the magnetic recording layer.
- a method of manufacturing a magnetic recording medium that has changed in the film thickness direction wherein (1) a first film forming step of forming a first magnetic layer containing Fe and Pt or Fe, Pt, and Rh; and (2) A second film forming step of forming a second magnetic layer containing Fe, Pt, and Rh, wherein when the first magnetic layer contains Rh, the concentration of Rh is higher than that of the first magnetic layer; A step of forming a second magnetic layer; and (3) a step of heating the substrate on which the first and second magnetic layers are formed following the first film-forming step and the second film-forming step.
- the heating temperature in the heating step (3) is preferably 400 ° C. or higher.
- a method of manufacturing a magnetic recording medium includes a substrate and at least a magnetic recording layer, the magnetic recording layer includes Fe, Pt, and Rh, and the composition of Rh of the magnetic recording layer is that of the magnetic recording layer.
- a method of manufacturing a magnetic recording medium that has changed in a film thickness direction comprising: (i) a heating step of heating the substrate; and (ii) a first magnetic layer containing Fe and Pt or Fe, Pt, and Rh. A first film-forming step to be formed; and (iii) a second film-forming step of forming a second magnetic layer containing Fe, Pt, and Rh, where the first magnetic layer contains Rh.
- the substrate heating temperature in the heating step (i) is preferably 400 ° C. or higher.
- a method of manufacturing a magnetic recording medium includes a substrate and at least a magnetic recording layer, the magnetic recording layer includes Fe, Pt, and Rh, and the composition of Rh of the magnetic recording layer is a magnetic recording layer.
- a second film forming process for forming a second magnetic layer containing Fe, Pt, and Rh while heating the substrate from the back surface, wherein the first magnetic layer contains Rh. Includes a step of forming the second magnetic layer so as to contain a higher concentration of Rh than the first magnetic layer.
- substrate of a process (A) and a process (B) is 400 degreeC or more.
- the magnetic recording medium is a magnetic recording medium manufactured by the above three manufacturing methods.
- a magnetic recording medium in which the composition of the components of the magnetic recording medium changes monotonously in the film thickness direction can be mass-produced and manufactured.
- FIG. 1 It is sectional drawing which shows one structural example of a magnetic recording medium. It is the schematic which shows the change of the state of the magnetic-recording layer of a magnetic-recording medium. It is the schematic which shows one example of the manufacturing method of the magnetic-recording layer of a magnetic-recording medium. It is the schematic which shows one example of the manufacturing method of the magnetic-recording layer of a magnetic-recording medium. It is a graph which shows the relationship between the addition amount of X and Ku at 230 degreeC in the magnetic recording layer using FePtX (X is Rh, Cu, or Ru). It is a figure for demonstrating the procedure in the case of measuring the density
- a method of manufacturing a magnetic recording medium includes a substrate and at least a magnetic recording layer, the magnetic recording layer includes Fe, Pt, and Rh, and a composition of Rh of the magnetic recording layer changes in a film thickness direction of the magnetic recording layer.
- a method of manufacturing a magnetic recording medium includes a substrate and at least a magnetic recording layer, the magnetic recording layer includes Fe, Pt, and Rh, and a composition of Rh of the magnetic recording layer changes in a film thickness direction of the magnetic recording layer.
- the magnetic recording medium manufactured by the above manufacturing method includes at least a substrate and a magnetic recording layer, and an adhesion layer, a soft magnetic backing layer, a heat sink layer, an underlayer and / or a seed layer are interposed between these layers. Further layers known in the art such as In addition, the magnetic recording medium may further include a layer known in the art such as a protective layer and / or a liquid lubricant layer on the magnetic recording layer.
- FIG. 1 shows one configuration example of a magnetic recording medium 100 including a substrate 10, an adhesion layer 20, an underlayer 30, a seed layer 40, a magnetic recording layer 50, and a protective layer 60.
- the magnetic recording layer 50 of the magnetic recording medium 100 contains Fe, Pt, and Rh, and the Rh composition of the magnetic recording layer changes in the thickness direction of the magnetic recording layer.
- the magnetic recording medium has a magnetic recording layer having a concentration gradient such that the concentration of Rh increases from the substrate 10 side of the magnetic recording layer 50 toward the protective layer 60 side.
- the magnetic recording medium is manufactured by forming a first magnetic layer 52 and a second magnetic layer 54 on a substrate 10 and diffusing predetermined elements in the magnetic layer into the first magnetic layer.
- the composition of the predetermined element is given a gradient in the film thickness direction of the magnetic recording layer 50.
- the method of manufacturing a magnetic recording medium includes (1) a first film forming step of forming a first magnetic layer containing Fe and Pt or Fe, Pt and Rh on the substrate; and (2) the first magnetic layer.
- the second film forming step of forming a second magnetic layer containing Fe, Pt, and Rh on the layer when the first magnetic layer contains Rh, the concentration of Rh is higher than that of the first magnetic layer.
- tilt means the composition of an element (for example, Rh, Cu, Ru, etc.) that is the object of the magnetic recording layer, or the magnetic anisotropy (Ku) of the magnetic recording layer. ) Indicates a monotonous change in the thickness direction of the magnetic recording layer.
- a magnetic recording layer in which the composition of the target element monotonously changes from the substrate side to the protective layer side of the magnetic recording layer is referred to as a magnetic recording layer in which the target element is “tilted”.
- a magnetic recording layer whose Rh composition monotonously increases in the film thickness direction of the magnetic recording layer is referred to as a “Rh composition gradient” magnetic recording layer or the like.
- a magnetic recording layer in which Ku monotonously changes from the substrate side to the protective layer side of the magnetic recording layer is referred to as a “Ku tilted” magnetic recording layer or the like.
- step (1) as shown in FIGS. 3A and 3B, a substrate 10 is prepared, and a magnetic layer made of FePt or FePtRh is formed on the substrate 10 as a first magnetic layer 52. To do.
- the substrate 10 may be various substrates having a smooth surface.
- the substrate 10 can be formed using a material generally used for magnetic recording media. Materials that can be used include NiP plated Al alloy, MgO single crystal, MgAl 2 O 4 , SrTiO 3 , tempered glass, crystallized glass, Si / SiO 2 and the like.
- the first magnetic layer 52 of the magnetic recording layer 50 is formed by depositing Fe and Pt, which are constituent elements of an ordered alloy, and optional Rh by sputtering.
- the first magnetic layer 52 can be formed by sputtering Fe and Pt or Fe, Pt and Rh constituting the ordered alloy.
- sputtering means only a step of ejecting atoms, clusters or ions from a target by collision of high energy ions, and all of the elements contained in the ejected atoms, clusters or ions are covered. It does not mean that it is fixed on the film formation substrate. In other words, the thin film obtained in the “sputtering” step in this specification does not necessarily contain the element that has reached the deposition target substrate in a ratio of the amount reached.
- a target containing Fe and Pt at a predetermined ratio can be used.
- an Fe target and a Pt target may be used.
- a target containing Fe, Pt, and Rh at a predetermined ratio can be used.
- a target containing Fe and Pt and an Rh target may be used.
- Fe, Pt, and Rh targets may be used.
- the composition ratio can be controlled by adjusting the power applied to each target.
- Step (2) forms a second magnetic layer 54 on the first magnetic layer 52 formed on the substrate 10 as shown in FIG.
- a magnetic layer made of FePtRh is formed as the second magnetic layer.
- the second magnetic layer uses FePtRh having a higher Rh content than the Rh content of FePtRh used in the first magnetic layer.
- the second magnetic layer can be formed by the same method as that for forming the first magnetic layer using FePtRh.
- step (1) and step (2) the components of the materials of the first magnetic layer 52 and the second magnetic layer 54 and the parameters of the film thickness are as follows.
- the thickness of the first magnetic layer is t1
- the atomic percentage of each component of FePt or FePtRh in the first magnetic layer is Fe: x1 atomic%, Pt: y1 atomic%, Rh: z1 atomic%
- the film thickness is t2
- the atomic% of each component of FePtRh of the second magnetic layer is Fe: x2 atomic%, Pt: y2 atomic%, Rh: z2 atomic%
- the concentration of Rh is preferably z2: 3 atomic% to 15 atomic% and z1: 0 atomic% to 12 atomic% (provided that z2> z1).
- the film thicknesses of the first magnetic layer 52 and the second magnetic layer 54 are preferably t1: 0.5 nm to 10 nm and t2: 0.5 nm to 10 nm. As will be described later, the order of the first magnetic layer and the second magnetic layer may be reversed.
- step (3) as shown in FIG. 3 (d), the substrate on which the first magnetic layer and the second magnetic layer are formed is heated to diffuse Rh from the second magnetic layer to the first magnetic layer.
- a slope of the Rh component is created in the layer 50.
- the heating temperature of the substrate is 400 ° C. or higher, preferably 400 ° C. to 700 ° C.
- the heating time depends on the desired degree of inclination of the component, but is, for example, 1 sec to 20 sec, preferably 2 sec to 10 sec.
- the substrate can be heated by a conventional method performed with a lamp heater or the like in a heating chamber.
- Rh diffuses into the first magnetic layer and creates a slope of the Rh component, the Ku value changes in the film thickness direction of the magnetic recording layer due to the Rh concentration gradient. For this reason, Ku inclination can be realized. Also, Rh is a suitable additive material for creating a component gradient because of rapid diffusion in FePt.
- Another manufacturing method of the magnetic recording medium includes a substrate and at least a magnetic recording layer, the magnetic recording layer includes Fe, Pt, and Rh, and the composition of Rh of the magnetic recording layer is in a film thickness direction of the magnetic recording layer.
- a method of manufacturing a magnetic recording medium comprising: (i) a heating step of heating the substrate; and (ii) a first magnetic material containing Fe and Pt or Fe, Pt and Rh on the heated substrate.
- step (i) the substrate 10 is heated as shown in FIG.
- the upper limit of the heating temperature of the substrate is mainly limited by the heat-resistant temperature of the substrate, but is 400 ° C. or higher, preferably 400 ° C. to 1000 ° C.
- the heating time is not particularly limited as long as the temperature can be achieved.
- the substrate can be heated by a conventional method performed with a lamp heater or the like in a heating chamber.
- a film forming apparatus for mass production of magnetic recording media has a configuration in which a plurality of vacuum film forming chambers are arranged.
- the film is formed, the substrate is moved to the next chamber, the next layer is formed, and the substrate is moved to the next chamber.
- the thin film having a multilayer structure is efficiently formed by repeating the steps of film formation and substrate movement at a constant timing.
- each film forming chamber has a structure in which the cathodes are opposed to each other, and the both sides of the substrate are formed simultaneously. Therefore, it is difficult to perform heating and film formation at the same time.
- the substrate is heated by a lamp heater in a chamber immediately before the layer to be heated and film formation is performed in the next chamber using the heat.
- step (i) first, the substrate 10 is heated to a predetermined temperature in a heating chamber.
- a first magnetic layer is formed on a substrate heated to a predetermined temperature.
- the first magnetic layer is formed by depositing Fe and Pt, which are constituent elements of the ordered alloy, and optional Rh by a sputtering method.
- the first magnetic layer 52 can be formed by sputtering Fe and Pt or Fe, Pt, and Rh. Film formation is performed before the heated temperature falls below a certain temperature, preferably below 420 ° C.
- the conditions for forming the first magnetic layer, such as the target, film thickness, and the like, and the film forming procedure are the same as those described above.
- a second magnetic layer is formed on the first magnetic layer of the substrate on which the first magnetic layer is formed.
- Film formation is performed before the heated temperature falls below a certain temperature, preferably below 400 ° C.
- the second magnetic layer 54 can be formed by sputtering Fe, Pt, and Rh.
- FePtRh is used as the material for the first magnetic layer in the step (ii)
- the second magnetic layer uses FePtRh having a higher Rh content than the Rh content of FePtRh used in the first magnetic layer.
- the conditions for forming the second magnetic layer, such as the target, film thickness, and the like, and the film forming procedure are the same as those described above.
- the substrate is at a predetermined temperature, so that Rh diffuses from the second magnetic layer to the first magnetic layer, and the Rh component slopes in the magnetic recording layer 50. Is formed.
- the temperature of the substrate is maintained for a predetermined time or the cooling rate of the substrate is adjusted as necessary so that a desired slope of the Rh component can be obtained.
- the adjustment of the cooling rate can be carried out by adjusting the temperature in the cooling chamber by flowing an inert gas such as Ar or N 2 in the cooling chamber.
- Still another manufacturing method of the magnetic recording medium includes a substrate and at least a magnetic recording layer, the magnetic recording layer includes Fe, Pt, and Rh, and a composition of Rh of the magnetic recording layer is a film thickness direction of the magnetic recording layer.
- the method of manufacturing a magnetic recording medium changed to (1), wherein (A) a first film forming step of forming a first magnetic layer containing Fe and Pt or Fe, Pt and Rh while heating the substrate from the back surface And (B) a second film forming step of forming a second magnetic layer containing Fe, Pt and Rh while heating the substrate obtained in the first film forming step from the back surface, wherein the first magnetic layer Includes a step of forming the second magnetic layer so as to contain a higher concentration of Rh than the first magnetic layer.
- the “rear surface” refers to a surface on which two layers on a substrate are not formed when a thin film such as a magnetic layer is formed on one of the two surfaces.
- Step (A) First, one of the substrates 10, for example, the back surface is heated.
- the upper limit of the heating temperature of the substrate is mainly limited by the heat-resistant temperature of the substrate, but is 400 ° C. or higher, preferably 400 ° C. to 1000 ° C.
- the substrate can be heated by a conventional method performed with a lamp heater or the like in a heating chamber.
- the first magnetic layer is formed by depositing Fe and Pt, which are constituent elements of the ordered alloy, and optional Rh by a sputtering method.
- the first magnetic layer 52 can be formed by sputtering Fe and Pt or Fe, Pt, and Rh. Since the film formation is performed while heating the substrate, the film formation is performed from the direction in which the substrate is not heated.
- the conditions for forming the first magnetic layer, such as the target, film thickness, and the like, and the film forming procedure are the same as those described above.
- a second magnetic layer is formed on the first magnetic layer of the substrate on which the first magnetic layer is formed.
- the film formation can be performed while the substrate on which the first magnetic layer is formed is heated.
- the second magnetic layer 54 can be formed on the first magnetic layer by sputtering Fe, Pt, and Rh while heating the substrate.
- FePtRh is used as the material of the first magnetic layer in the step (A)
- the second magnetic layer uses FePtRh having a higher Rh content than that of FePtRh used in the first magnetic layer.
- the conditions for forming the second magnetic layer, such as the target, film thickness, and the like, and the film forming procedure are the same as those described above.
- the substrate is heated to a predetermined temperature. Therefore, when the second magnetic layer is formed, the second magnetic layer is formed. Rh diffuses from the magnetic layer to the first magnetic layer, and a gradient of the Rh component is formed in the magnetic recording layer 50. If necessary, after forming the second magnetic layer, the temperature of the substrate is maintained for a predetermined time or the cooling rate of the substrate is adjusted so that a desired gradient of the Rh component can be obtained. The adjustment of the cooling rate can be carried out by adjusting the temperature in the cooling chamber by flowing an inert gas such as Ar or N 2 in the cooling chamber.
- the second magnetic layer of FePtRh is stacked on the first magnetic layer of FePt or FePtRh, and then the substrate is heated after the first magnetic layer and the second magnetic layer are formed
- the slope of the Rh component can be formed in the magnetic recording layer 50 by forming the first magnetic layer and the second magnetic layer on a substrate that has been heated to a predetermined temperature in advance.
- the concentration of Rh in the second magnetic layer is higher than that of the first magnetic layer. .
- the first magnetic layer 52 and the second magnetic layer 54 are formed in this order.
- the second magnetic layer 54 and the first magnetic layer 52 may be formed in this order.
- the magnetic recording layer 50 having a concentration gradient in which the concentration of Rh monotonously decreases from the substrate 10 side to the protective layer 60 side of the magnetic recording layer 50 can be formed.
- Rh concentration gradient it is also possible to make various changes within a range that does not interfere with the formation of the Rh concentration gradient.
- other elements can be added to Fe, Pt, and Rh to adjust the magnetic characteristics to desired characteristics.
- Cu, Ag, Au, Mn, etc. can be further added for the purpose of adjusting the Curie temperature Tc.
- the magnetic recording layer 50 may have a granular structure, carbides, oxides, nitrides or the like constituting the grain boundaries may be further added.
- the magnetic recording layer 50 may further include one or more additional magnetic layers in addition to the first magnetic layer 52 and the second magnetic layer 54.
- Each of the one or more additional magnetic layers may have either a granular structure or a non-granular structure.
- ECC Exchange-Coupled Composite
- a magnetic layer that does not include a granular structure may be provided on the upper part of the laminated structure including the first magnetic layer 52 and the second magnetic layer 54.
- the continuous layer includes a so-called CAP layer.
- the magnetic recording medium may optionally include various layers other than the magnetic recording layer. These layers are described below. In addition, the reference number quoted in the following description is shown in FIG.
- the adhesion layer 20 that may be optionally provided is used for enhancing adhesion between a layer formed on the adhesion layer 20 and a layer formed under the adhesion layer 20.
- the layer formed under the adhesion layer 20 includes the substrate 10.
- the material for forming the adhesion layer 20 includes metals such as Ni, W, Ta, Cr, and Ru, and alloys including the above-described metals.
- the adhesion layer 20 may be a single layer or may have a stacked structure of a plurality of layers.
- the adhesion layer can be formed using any method known in the art such as sputtering and vacuum deposition.
- a soft magnetic backing layer (not shown) that may be optionally provided controls the magnetic flux from the magnetic head to improve the recording / reproducing characteristics of the magnetic recording medium.
- Materials for forming the soft magnetic backing layer include NiFe alloys, Sendust (FeSiAl) alloys, crystalline materials such as CoFe alloys, microcrystalline materials such as FeTaC, CoFeNi, CoNiP, and Co alloys such as CoZrNb and CoTaZr. Includes amorphous material.
- the optimum value of the thickness of the soft magnetic underlayer depends on the structure and characteristics of the magnetic head used for magnetic recording.
- the soft magnetic backing layer When the soft magnetic backing layer is formed by continuous film formation with other layers, it is preferable that the soft magnetic backing layer has a thickness in the range of 10 nm to 500 nm (including both ends) from the viewpoint of productivity.
- the soft magnetic backing layer can be formed using any method known in the art such as sputtering or vacuum deposition.
- a heat sink layer (not shown) may be provided.
- the heat sink layer is a layer for effectively absorbing excess heat of the magnetic recording layer 50 generated during the heat-assisted magnetic recording.
- the heat sink layer can be formed using a material having high thermal conductivity and specific heat capacity.
- a material includes Cu simple substance, Ag simple substance, Au simple substance, or an alloy material mainly composed of them.
- “mainly” means that the content of the material is 50 wt% or more.
- the heat sink layer can be formed using an Al—Si alloy, a Cu—B alloy, or the like.
- the heat sink layer can be formed using Sendust (FeSiAl) alloy, soft magnetic CoFe alloy, or the like.
- Sendust FeSiAl
- soft magnetic material By using a soft magnetic material, the function of concentrating the perpendicular magnetic field generated by the head on the magnetic recording layer 50 can be imparted to the heat sink layer, and the function of the soft magnetic backing layer can be supplemented.
- the optimum value of the heat sink layer thickness varies depending on the amount of heat and heat distribution during heat-assisted magnetic recording, the layer configuration of the magnetic recording medium, and the thickness of each component layer. In the case of forming by continuous film formation with other constituent layers, the film thickness of the heat sink layer is preferably 10 nm or more and 100 nm or less in consideration of productivity.
- the heat sink layer can be formed using any method known in the art, such as a sputtering method or a vacuum evaporation method. Usually, the heat sink layer is formed using a sputtering method.
- the heat sink layer can be provided between the substrate 10 and the adhesion layer 20, between the adhesion layer 20 and the underlayer 30, in consideration of characteristics required for the magnetic recording medium.
- the underlayer 30 is a layer for controlling the crystallinity and / or crystal orientation of the seed layer 40 formed above.
- the underlayer 30 may be a single layer or a multilayer.
- the underlayer 30 is preferably nonmagnetic.
- the nonmagnetic material used for forming the underlayer 30 is at least one selected from the group consisting of Pt metal, Cr metal, or Cr, which is the main component, Mo, W, Ti, V, Mn, Ta, and Zr. Including alloys with the addition of metals.
- the underlayer 30 can be formed using any method known in the art such as sputtering.
- the function of the seed layer 40 is to control the grain size and crystal orientation of the magnetic crystal grains in the upper magnetic recording layer 50.
- the seed layer 40 may have a function of ensuring adhesion between the layer under the seed layer 40 and the magnetic recording layer 50. Further, another layer such as an intermediate layer may be disposed between the seed layer 40 and the magnetic recording layer 50. When an intermediate layer or the like is disposed, the function of controlling the grain size and crystal orientation of the magnetic recording layer 50 is controlled by controlling the grain size and crystal orientation of the crystal grain of the intermediate layer and the like.
- the seed layer 40 is preferably nonmagnetic. The material of the seed layer 40 is appropriately selected according to the material of the magnetic recording layer 50.
- the material of the seed layer 40 is selected according to the material of the magnetic crystal grains of the magnetic recording layer.
- the magnetic crystal grains in the magnetic recording layer 50 is formed by L1 0 type ordered alloy, it is preferable to form the seed layer 40 by using a NaCl-type compounds.
- the seed layer 40 is formed using an oxide such as MgO or SrTiO 3 or a nitride such as TiN.
- the seed layer 40 can also be formed by stacking a plurality of layers made of the above materials.
- the seed layer 40 preferably has a thickness of 1 nm to 60 nm, preferably 1 nm to 20 nm.
- the seed layer 40 can be formed using any method known in the art such as sputtering.
- the film may be formed before the film formation step of the first magnetic layer.
- the protective layer 60 can be formed using a material conventionally used in the field of magnetic recording media. Specifically, the protective layer 60 can be formed using a nonmagnetic metal such as Pt, a carbon-based material such as diamond-like carbon, or a silicon-based material such as silicon nitride.
- the protective layer 60 may be a single layer or may have a laminated structure.
- the protective layer 60 having a laminated structure may be, for example, a laminated structure of two types of carbon materials having different characteristics, a laminated structure of a metal and a carbon material, or a laminated structure of a metal oxide film and a carbon material. Good.
- the protective layer 60 can be formed using any method known in the art, such as CVD, sputtering (including DC magnetron sputtering), and vacuum deposition.
- the magnetic recording medium of the present invention may further include a liquid lubricant layer (not shown) provided on the protective layer 60.
- the liquid lubricant layer can be formed using a material conventionally used in the field of magnetic recording media.
- the material of the liquid lubricant layer includes, for example, a perfluoropolyether lubricant.
- the liquid lubricant layer can be formed using, for example, a coating method such as a dip coating method or a spin coating method.
- Layers known in the art such as a protective layer and / or a liquid lubricant layer formed on the magnetic recording layer 50 are used in the magnetic recording medium manufacturing method.
- the film may be formed later, that is, after the steps (1) to (3) or the steps (i) to (iii).
- the magnetic recording medium includes at least a substrate and a magnetic recording layer, the magnetic recording layer includes Fe, Pt, and Rh, and the composition of Rh of the magnetic recording layer changes in the film thickness direction of the magnetic recording layer. .
- Such a magnetic recording medium can be manufactured in a process capable of mass production by the above-described method for manufacturing a magnetic recording medium.
- Example 1 In Example 1, the relationship between X concentration and Ku in FePtX (X is Rh, Cu or Ru) was examined.
- a chemically strengthened glass substrate (N-10 glass substrate manufactured by HOYA) having a smooth surface was washed to prepare a substrate 10.
- the substrate 10 after cleaning was introduced into an in-line type sputtering apparatus.
- a Ta adhesion layer 20 having a thickness of 5 nm was formed by DC magnetron sputtering using a pure Ta target in Ar gas at a pressure of 0.5 Pa.
- the substrate temperature when forming the Ta adhesion layer was room temperature (25 ° C.).
- the sputtering power when forming the Ta adhesion layer was 100 W.
- a Cr underlayer 30 with a thickness of 20 nm was obtained by DC magnetron sputtering using a pure Cr target in Ar gas at a pressure of 0.5 Pa.
- the substrate temperature when forming the Cr underlayer 30 was room temperature (25 ° C.).
- the sputtering power when forming the Cr underlayer 30 was 300 W.
- an MgO seed layer 40 having a film thickness of 5 nm was formed by RF magnetron sputtering using an MgO target in Ar gas at a pressure of 0.1 Pa.
- the substrate temperature when forming the MgO seed layer 40 was room temperature (25 ° C.).
- the sputtering power when forming the MgO seed layer 40 was 200 W.
- the stacked body on which the MgO seed layer 40 is formed is heated to 430 ° C., and FePtX (X is Rh, Ru, or Cu) by DC magnetron sputtering using an FePt target in Ar gas at a pressure of 0.6 Pa. ) was formed.
- the film thickness of the magnetic recording layer was 10 nm.
- the electric power applied to the FePt target when forming the magnetic recording layer was 300 W.
- the power applied to the Rh, Ru, and Cu targets was as shown in Tables 1 to 3.
- the contents of component X of the produced magnetic recording medium are shown in Tables 1 to 3 below. Further, when the addition amount of X is 0, the Fe and Pt contents are 55 atomic% for Fe and 45 atomic% for Pt.
- a Pt protective layer 60 having a thickness of 5 nm was formed by DC sputtering using a Pt target in Ar gas at a pressure of 0.5 Pa to obtain a magnetic recording medium.
- the substrate temperature at the time of forming the protective layer was room temperature (25 ° C.).
- the sputtering power when forming the Pt protective layer 60 was 50 W.
- FIG. 5 is a graph showing a part of the above results.
- the graph of FIG. 5 shows the relationship between the addition concentration when adding Rh, Cu or Ru to FePt and Ku (230 ° C.).
- the magnetic characteristics that affect the recording process are those during heating. Therefore, as an example, data at 230 ° C. is compared. From the graph, it can be said that the FePt magnetic recording layer to which Rh or Ru is added as compared with Cu is a material in which the Ku decreases greatly as the added amount increases and the Ku is easily inclined.
- Example 2 In Example 2, the relationship between the heat deposition time of FePtX (X is Rh or Ru), the diffusion distance of the component X, and the diffusion coefficient was examined.
- Example 2 corresponds to an example of a method for manufacturing a magnetic recording medium in which the first magnetic layer and the second magnetic layer are formed and then heated.
- X of FePtX is Rh and Ru.
- the Fe and Pt contents of FePtX are 50 atomic% Fe and 40 atomic% Pt.
- the addition amounts of Rh and Ru are each 10 atomic% (the addition amount of each element is based on all atoms).
- the concentration, diffusion distance, and diffusion coefficient of additive material X were determined by the following procedure.
- the FePt film and FePtX film formed at room temperature were etched from the substrate side, and the concentration profile of the additive element X in the thickness direction was measured.
- the concentration profiles of Fe and Pt are also measured, the interface between the SiO 2 and FePt films is identified, and the thickness at that point is set to zero.
- the X concentration profile after heating is measured in the same manner as above.
- the thickness at which X is detected before the heat treatment is used as a reference for the diffusion distance L, and the difference between the reference thickness and the thickness at which X is detected after the heat treatment is used as the diffusion distance L. Since the relationship between the diffusion distance L and the diffusion coefficient D is expressed by the following equation, D was calculated from L and t obtained experimentally.
- the element X In the sample formed at room temperature, the element X is not diffused. On the other hand, in the sample after heating, the element X is diffused toward the first magnetic layer, so that the element X is compared with the sample formed at room temperature. The distance at which is detected moves to the substrate side. The difference in distance at which this element X was detected was defined as the diffusion distance L (FIG. 6B).
- the concentration profile of the element X in the depth direction was evaluated by secondary ion mass spectrometry (SIMS), the diffusion distance was determined according to the above procedure, and the diffusion coefficient was calculated. The results are shown in Table 4 and Table 5 together.
- Rh is an element that easily diffuses into FePt compared to Ru.
- the graph of FIG. 7 is a graph showing the relationship between the heating time t and the diffusion distance L calculated from the diffusion coefficient D. It can be seen that Ru hardly diffuses and that Rh can be diffused by 6 nm or more at 500 ° C. for 5 sec.
- Example 3 is an example of a method for manufacturing a magnetic recording medium in which a first magnetic layer and a second magnetic layer are formed after heating a substrate.
- a substrate on which a seed layer is formed in the same manner as in Example 1 is manufactured.
- the substrate formed up to the seed layer in a heating chamber is heated to a predetermined temperature.
- the predetermined temperature is a numerical value determined experimentally from the temperature to be maintained during film formation.
- 2 nm of FePt Fe addition amount: 55 atom%, Pt addition amount: 45 atom% (the addition amount of each element is based on all atoms) is formed in the next deposition chamber.
- FePtRh Fe addition amount: 50 atomic%, Pt addition amount: 40 atomic%, Rh addition amount: 10 atomic% (the addition amount of each element is based on all atoms)
- the substrate temperature is 400 ° C.
- the time required for Rh to diffuse 2 nm or more is about 2 seconds. Therefore, the conditions for forming FePtRh (deposition time)
- the heating temperature in the heating chamber and the cooling rate in the film formation chamber are adjusted so that the state of 400 ° C. or higher after the film formation can be maintained for 2 seconds or more.
- the method for adjusting the cooling rate can be performed by flowing an inert gas such as Ar or N 2 in the cooling chamber and changing the temperature in the chamber.
- an inert gas such as Ar or N 2
- the holding temperature and time after forming the FePtRh film can be arbitrarily adjusted.
- a carbon protective film is formed.
- the substrate temperature is high, the characteristics of the carbon protective film deteriorate. For this reason, the temperature of the substrate was lowered in the cooling chamber to form a carbon protective layer. Further, if necessary, a lubricating layer is formed.
- Example 4 is an example in which heating and film formation of a substrate are performed simultaneously.
- a chemically strengthened glass substrate (N-10 glass substrate manufactured by HOYA) having a smooth surface was washed to prepare a nonmagnetic substrate.
- the nonmagnetic substrate after cleaning was introduced into the sputtering apparatus.
- a Ta adhesion layer having a film thickness of 5 nm was formed by DC magnetron sputtering using a Ta target placed at a position 120 mm from the substrate in Ar gas at a pressure of 0.50 Pa. The power applied to the target was 100W.
- a Cr underlayer having a thickness of 20 nm was formed by DC magnetron sputtering using a Cr target placed at a position 120 mm from the substrate in Ar gas at a pressure of 0.28 Pa to obtain a substrate.
- the power applied to the target was 300W.
- an MgO seed with a film thickness of 5 nm is formed on the laminate on which the Cr underlayer is formed by RF magnetron sputtering using an MgO target placed at a position of 165 mm from the substrate in Ar gas at a pressure of 0.1 Pa. A layer was formed. The power applied to the target was 200W. Further, the temperature of the substrate at this time was room temperature (25 ° C.).
- the stacked body on which the seed layer is formed is heated to 430 ° C., and the FePt target placed at a position of 165 mm from the substrate in Ar gas at a pressure of 1.00 Pa while maintaining the substrate temperature of 430 ° C.
- a 2 nm thick FePt magnetic recording layer was formed by magnetron sputtering.
- An FePtRh magnetic recording layer having a thickness of 5 nm was formed on the upper layer by DC magnetron sputtering using an FePt target and an Rh target at a substrate temperature of 430 ° C.
- the power input to the FePt target was 300 W
- the power input to the Rh target was 100 W.
- the film formation time of the FePtRh layer at this time was 60 sec.
- the substrate was heated by a lamp heater from the back surface opposite to the surface on which the magnetic layer was formed.
- a protective layer that is a laminate of a Pt film having a thickness of 5 nm and a Ta film having a thickness of 5 nm is formed by a DC magnetron sputtering method using a Pt target and a Ta target.
- a magnetic recording medium was obtained.
- the substrate temperature when forming the protective layer was room temperature (25 ° C.).
- the sputtering power when forming the Pt film and the Ta film was 100 W.
- Rh concentration gradient can be obtained by diffusing the upper layer Rh to the lower layer.
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Abstract
Description
実施例1では、FePtX(XはRh、Cu又はRuである)におけるXの濃度とKuの関係を検討した。
実施例2では、FePtX(XはRh又はRu)の加熱成膜時間と、成分Xの拡散距離及び拡散係数の関係を検討した。なお、実施例2は、第1磁性層及び第2磁性層を成膜した後に加熱する、磁気記録媒体の製造方法の例に相当する。
実施例3は、基板を加熱した後、第1磁性層及び第2磁性層を成膜する、磁気記録媒体の製造方法の例である。
実施例4は、基板の加熱と成膜を同時に行う場合の例である。
20 密着層
30 下地層
40 シード層
50 磁気記録層
52 第1磁性層
54 第2磁性層
60 保護層
Claims (9)
- 基板と、磁気記録層を少なくとも含み、前記磁気記録層がFe、Pt及びRhを含み、前記磁気記録層のRhの組成が磁気記録層の膜厚方向に変化した、磁気記録媒体の製造方法であって、
(1)Fe及びPt、又は、Fe、Pt及びRhを含む第1磁性層を形成する第1成膜工程と、
(2)Fe、Pt及びRhを含む第2磁性層を形成する第2成膜工程であって、前記第1磁性層がRhを含む場合は、当該第1磁性層よりも高い濃度のRhを含むように第2磁性層を形成する工程と、
(3)第1成膜工程及び第2成膜工程に続いて、第1及び第2磁性層を形成した基板を加熱する工程
を含むことを特徴とする製造方法。 - 前記(3)の加熱工程における加熱温度が400℃以上であることを特徴とする請求項1に記載の磁気記録媒体の製造方法。
- 請求項1又は請求項2に記載の製造方法により製造された磁気記録媒体。
- 基板と、磁気記録層を少なくとも含み、前記磁気記録層がFe、Pt及びRhを含み、前記磁気記録層のRhの組成が磁気記録層の膜厚方向に変化した、磁気記録媒体の製造方法であって、
(i)前記基板を加熱する加熱工程と
(ii)Fe及びPt、又は、Fe、Pt及びRhを含む第1磁性層を形成する第1成膜工程と、
(iii)Fe、Pt及びRhを含む第2磁性層を形成する第2成膜工程であって、前記第1磁性層がRhを含む場合は、当該第1磁性層よりも高い濃度のRhを含むように第2磁性層を形成する工程、
を含み、第1成膜工程及び第2成膜工程に先立って加熱工程を行うことを特徴とする製造方法。 - 前記(i)の加熱工程における基板を加熱する温度が400℃以上であることを特徴とする請求項4に記載の磁気記録媒体の製造方法。
- 請求項4又は5に記載の磁気記録媒体の製造方法により製造された磁気記録媒体。
- 基板と、磁気記録層を少なくとも含み、前記磁気記録層がFe、Pt及びRhを含み、前記磁気記録層のRhの組成が磁気記録層の膜厚方向に変化した、磁気記録媒体の製造方法であって、
(A)基板を裏面から加熱しながら、Fe及びPt、又は、Fe、Pt及びRhを含む第1磁性層を形成する第1成膜工程と、
(B)裏面から加熱しながら、Fe、Pt及びRhを含む第2磁性層を形成する第2成膜工程であって、前記第1磁性層がRhを含む場合は、当該第1磁性層よりも高い濃度のRhを含むように第2磁性層を形成する工程
を含むことを特徴とする製造方法。 - 前記(A)及び(B)の基板の加熱の温度が400℃以上であることを特徴とする請求項7に記載の磁気記録媒体の製造方法。
- 請求項7又は8に記載の磁気記録媒体の製造方法により製造された磁気記録媒体。
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JP2013239618A (ja) * | 2012-05-16 | 2013-11-28 | Kyocera Corp | 光電変換装置の製造方法 |
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US20150107991A1 (en) * | 2012-10-25 | 2015-04-23 | Jx Nippon Mining & Metals Corporation | Fe-Pt-Based Sputtering Target Having Nonmagnetic Substance Dispersed Therein |
CN104318932A (zh) * | 2014-10-29 | 2015-01-28 | 西南大学 | 相变温度和矫顽力都可调的磁存储介质薄膜及其制作方法 |
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JPH08221744A (ja) * | 1995-02-16 | 1996-08-30 | Matsushita Electric Ind Co Ltd | 磁気記録媒体およびその製造方法 |
JP2003101202A (ja) * | 2001-09-25 | 2003-04-04 | Kyocera Corp | 配線基板及びその製造方法 |
JP2006073193A (ja) * | 2003-03-20 | 2006-03-16 | Hitachi Maxell Ltd | 磁気記録媒体及びその記録方法、並びに磁気記録装置 |
JP2005129788A (ja) * | 2003-10-24 | 2005-05-19 | Sumitomo Mitsubishi Silicon Corp | 半導体基板の製造方法、及び半導体装置の製造方法 |
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US10741207B2 (en) | 2015-08-24 | 2020-08-11 | Fuji Electric Co., Ltd. | Magnetic recording medium having an FePtRh magnetic layer |
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MY172588A (en) | 2019-12-04 |
SG11201705369SA (en) | 2017-08-30 |
US20170301368A1 (en) | 2017-10-19 |
JP6318333B2 (ja) | 2018-05-09 |
JPWO2017002316A1 (ja) | 2017-09-21 |
CN107112032B (zh) | 2019-01-01 |
CN107112032A (zh) | 2017-08-29 |
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