WO2016206131A1 - 用于制造液晶面板的方法 - Google Patents

用于制造液晶面板的方法 Download PDF

Info

Publication number
WO2016206131A1
WO2016206131A1 PCT/CN2015/083136 CN2015083136W WO2016206131A1 WO 2016206131 A1 WO2016206131 A1 WO 2016206131A1 CN 2015083136 W CN2015083136 W CN 2015083136W WO 2016206131 A1 WO2016206131 A1 WO 2016206131A1
Authority
WO
WIPO (PCT)
Prior art keywords
spacer
substrate
liquid crystal
height
reticle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/CN2015/083136
Other languages
English (en)
French (fr)
Inventor
张俊骁
李得俊
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Wuhan China Star Optoelectronics Technology Co Ltd
TCL China Star Optoelectronics Technology Co Ltd
Original Assignee
Shenzhen China Star Optoelectronics Technology Co Ltd
Wuhan China Star Optoelectronics Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shenzhen China Star Optoelectronics Technology Co Ltd, Wuhan China Star Optoelectronics Technology Co Ltd filed Critical Shenzhen China Star Optoelectronics Technology Co Ltd
Priority to US14/778,248 priority Critical patent/US20170261795A1/en
Publication of WO2016206131A1 publication Critical patent/WO2016206131A1/zh
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/1368—Active matrix addressed cells in which the switching element is a three-electrode device
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13396—Spacers having different sizes
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13398—Spacer materials; Spacer properties

Definitions

  • the present invention relates to the field of liquid crystal display technologies, and in particular, to a method for manufacturing a liquid crystal panel.
  • the manufactured liquid crystal panel includes a first substrate, a second substrate, and a liquid crystal interlayer disposed between the first substrate and the second substrate, the liquid crystal facing the liquid crystal in the first substrate
  • a thin film transistor (TFT) array and a corresponding color resistive module are disposed from the inside to the outside, and a black matrix is disposed on a side of the second substrate facing the liquid crystal interlayer.
  • the black matrix is used to block light leakage.
  • an alignment film is provided on the outermost side of the first substrate and the second substrate facing the liquid crystal interlayer, respectively. The alignment film is used to determine the liquid crystal pretilt angle in the liquid crystal interlayer.
  • the purpose of the invention is to reduce the thickness of the air layer between the surface of the liquid crystal layer and the substrate existing in the prior art, and finally greatly improve the optical index of the liquid crystal display (LCD).
  • the present invention provides a method for manufacturing a liquid crystal panel, the liquid crystal panel including a first substrate, a second substrate, and a liquid crystal interlayer disposed between the first substrate and the second substrate, a thin film transistor array and a corresponding color resistive module disposed on the side of the substrate facing the liquid crystal interlayer from the inside to the outside, the method comprising: a first step, in the first substrate and the second substrate Before the pressing, a first spacer having a higher height and a second spacer having a lower height are disposed therebetween, wherein a height of the second spacer is the same as a thickness of the liquid crystal interlayer; and a second step After the first substrate and the second substrate are pressed together, the heights of the first spacer and the second spacer are equal to the thickness of the liquid crystal interlayer.
  • the above method reduces the thickness of the first spacer pillar and the second spacer pillar by the thickness of the liquid crystal interlayer by setting the first spacer pillar and the second spacer pillar having different heights, and after compression.
  • the thickness of the air layer formed by the height of the spacer and the thickness of the liquid crystal layer during the formation of the package improves the display quality.
  • the first spacer or the second spacer is disposed in a color resist gap between adjacent color resist modules.
  • the spacer does not affect the display effect (such as color and grayscale) of the display area of the liquid crystal panel.
  • the first spacer or the second spacer is disposed in a contact hole of the integrated circuit of the first substrate.
  • the hollow region of the contact hole can be effectively utilized, and the spacer does not interfere with the circuit trace and electric field distribution.
  • the first substrate is photolithographically patterned by a spacer photomask to produce the first spacer pillar and the second spacer pillar, wherein the pattern of the spacer pillar mask comprises completely transparent, partially Light transmissive and completely opaque three light transmittance gears.
  • the first spacer and the second spacer are formed on the first substrate instead of generating the first on the second substrate.
  • the spacer column and the second spacer column greatly reduce the difficulty of the entire liquid crystal panel process. It is not necessary to perform photolithography on the second substrate.
  • the completely transparent position of the spacer reticle corresponds to the first spacer on the first substrate a portion of the light-shielding gear of the spacer reticle corresponds to a second spacer on the first substrate, and a completely opaque gear of the spacer reticle corresponds to a non-setting on the first substrate A portion of the first spacer and the second spacer.
  • the completely light-transmitting gear of the spacer reticle is configured as a first reticle hole, and a part of the light-transmitting gear of the spacer reticle is configured as a second reticle hole, wherein the first reticle
  • the size of the aperture is larger than the second mask aperture. This may result in the height or cross-sectional dimension of the first spacer being greater than the second spacer.
  • the height of the first spacer is in a range of 3 ⁇ m to 3.4 ⁇ m, and the height of the second spacer is in a range of 2.4 ⁇ m to 2.8. Within the range of ⁇ m.
  • the height of the first spacer is 3.2 ⁇ m, and the height of the second spacer is 2.6 ⁇ m.
  • a black matrix is disposed on a side of the second substrate facing the liquid crystal interlayer.
  • the black matrix blocks light leakage from the LCD panel and ensures a good display.
  • an alignment film is disposed on the outermost side of the first substrate and the second substrate facing the liquid crystal interlayer, respectively.
  • the alignment film determines the pretilt angle of the liquid crystal in the liquid crystal interlayer.
  • the method according to the invention brings about significant progress.
  • spacers PS, photo spacers
  • the heights of all the spacers are the same as the thickness of the liquid crystal interlayer, and the air between the liquid crystal interlayer and the substrate is reduced.
  • the thickness of the layer ultimately greatly increases the optical index of the liquid crystal display (LCD).
  • the spacer (PS) is disposed at the color resist gap or the contact hole on the first substrate side, which reduces the difficulty required for the process. It is not necessary to perform photolithography on the second substrate.
  • Figure 1 shows a first step of a method for manufacturing a liquid crystal panel according to the present invention
  • Fig. 2 shows a second step of the method for manufacturing a liquid crystal panel according to the present invention.
  • the present invention proposes a method for manufacturing a liquid crystal panel.
  • the method of the present invention is based on a process (COA, color filter on array) in which a color filter is placed on an array substrate.
  • COA color filter on array
  • the manufactured liquid crystal panel includes a first substrate 2, a second substrate 1, and a liquid crystal interlayer 5 disposed between the first substrate 2 and the second substrate 1.
  • a thin film transistor array (not shown in the drawing) and a color resisting module 6 corresponding thereto are disposed from the inside to the outside.
  • the color resistance module 6 is a color filter of three primary colors of red, green and blue, each color resistance module 6 is a filter of one of the three primary colors, and one color resistance module 6 is for a thin film transistor (TFT, thin film transistor) A sub-pixel in the array, the filters of the three colors are alternately arranged to control the color of the final display picture together with the deflected liquid crystal.
  • a black matrix is disposed on a side of the second substrate 1 facing the liquid crystal interlayer 5 for blocking light leakage.
  • an alignment film is provided on the outermost side for determining the pretilt angle of the liquid crystal in the liquid crystal interlayer 3.
  • the method for manufacturing a liquid crystal panel according to the present invention includes at least a first step and a second step.
  • Figure 1 shows the first step of a method for manufacturing a liquid crystal panel according to the present invention.
  • a main spacer having a higher height is disposed between the first substrate 2 and the second substrate 1 (main PS) 3 (also referred to herein as a first spacer) and a lower height secondary spacer (sub PS) 4 (also referred to herein as a second spacer).
  • the height of the auxiliary spacer 4 is the same as the thickness of the liquid crystal interlayer 5.
  • the formation of the spacers can be carried out in the following manner.
  • the first substrate 2 may be photolithographically etched through a spacer reticle to produce a main spacer 3 and a secondary spacer 4.
  • a spacer having a half-difference (HTM) is used to obtain a spacer column having a different step.
  • the pattern of the spacer reticle used includes three transmittance positions of complete light transmission, partial light transmission, and complete opacity.
  • the completely transparent position of the HTM spacer reticle described above corresponds to the main spacer 3 on the first substrate 2, which A part of the light transmission position of the HTM spacer reticle corresponds to the auxiliary spacer 4 on the first substrate 2, and the completely opaque position of the HTM spacer reticle corresponds to the main spacer 3 on the first substrate 2.
  • the portion of the auxiliary spacer 4. In the negative lithography process, the light passes through the completely transparent position of the HTM spacer reticle, thereby almost completely retaining the layer to be etched on the first substrate 2 corresponding to the fully transparent position.
  • the light partially passes through a part of the light transmission position of the HTM spacer reticle, thereby etching away the first substrate 2 corresponding to the partial light transmission position by a certain ratio Etching layer to form a shorter height auxiliary spacer 4; no light passes through the HTM spacer
  • the completely opaque gear position of the reticle is almost completely lost to the layer to be etched on the first substrate 2 corresponding to the completely opaque gear position, and the main spacer column 3 and the auxiliary substrate are formed on the first substrate 2 Part of the spacer 4 (the main body of the plane).
  • two spacers having different heights and/or cross-sectional dimensions can be produced by two reticle apertures of different sizes on the HTM spacer reticle.
  • the full light transmission position of the HTM spacer reticle is configured as a first reticle hole
  • a part of the light transmission position of the HTM spacer reticle is configured as a second reticle hole
  • the first reticle The size of the aperture is larger than the second mask aperture.
  • the main spacer 3 formed by the above-described HTM lithography process has a high height and a large cross-sectional area
  • the auxiliary spacer 4 formed by the above-described HTM lithography process has a small height.
  • the cross sectional area is small.
  • the present invention also proposes the following preferred technical solutions.
  • the main spacer 3 or the auxiliary spacer 4 may be disposed in a color hole located between adjacent color resist modules 6.
  • the main spacer 3 or the auxiliary spacer 4 may also be provided in a contact hole of the integrated circuit of the first substrate 2.
  • the heights of the generated main spacer 3 and the auxiliary spacer 4 can be made to satisfy the following relationship.
  • the height of the main spacer 3 is made to be in the range of 3 ⁇ m to 3.4 ⁇ m, and the height of the auxiliary spacer 4 is in the range of 2.4 ⁇ m to 2.8 ⁇ m.
  • the height of the main spacer 3 is 3.2 ⁇ m, and the height of the auxiliary spacer 4 is 2.6 ⁇ m (substantially the same as the thickness of the liquid crystal interlayer 5) .
  • the method for manufacturing a liquid crystal panel according to the present invention further includes a second step.
  • Fig. 2 shows a second step of the method for manufacturing a liquid crystal panel according to the present invention.
  • a method for manufacturing a liquid crystal panel according to the present invention on the one hand, by setting a main spacer 3 (main PS) 3 and a sub spacer (sub PS) 4 having different heights, and making the main spacer 3 (main PS) 3 after compression
  • the height and the height of the sub-spacer (sub-PS) 4 are the same as the thickness of the liquid crystal interlayer 5, which reduces the thickness of the air layer formed by the height of the spacer column and the thickness of the liquid crystal layer during the boxing, thereby improving the display quality;
  • a main spacer 3 (main PS) 3 and a secondary spacer (sub PS) are formed on the first substrate 2, for example, by photolithography. 4, instead of creating a spacer on the second substrate 1, which greatly reduces the difficulty of the entire liquid crystal panel process, because there is no need to The second substrate 1 is photolithographically processed.

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Liquid Crystal (AREA)

Abstract

提出了一种用于制造液晶面板的方法，包括：第一步骤，在第一基板（2）和第二基板（1）压合之前，在二者之间设置高度较高的第一间隔柱（3）和高度较低的第二间隔柱（4），其中第二间隔柱（4）的高度与液晶夹层（5）的厚度相同；第二步骤，在第一基板（2）和第二基板（1）压合之后，第一间隔柱（3）和第二间隔柱（4）的高度均等同于液晶夹层（5）的厚度。因此，减小了成盒时由于间隔柱高度与液晶夹层（5）厚度不一致而形成的空气层厚度，提升了显示品质。

Description

用于制造液晶面板的方法
相关申请的交叉引用
本申请要求享有于2015年6月24日提交的名称为“用于制造液晶面板的方法”的中国专利申请CN201510351119.8的优先权，该申请的全部内容通过引用并入本文中。
技术领域
本发明涉及液晶显示技术领域，尤其涉及一种用于制造液晶面板的方法。
背景技术
在液晶显示器制造工艺中，存在一种将色阻模块(即红、绿、蓝三原色的彩色滤光片)设置在阵列基板上的工艺，即彩色滤光片位于阵列基板上的工艺，国际上称之为COA(color filter on array)工艺。在这种工艺中，所制造的液晶面板包括第一基板、第二基板以及设置在所述第一基板和所述第二基板之间的液晶夹层，在所述第一基板的朝向所述液晶夹层的一侧上由内至外设置有薄膜晶体管(TFT,thin film transistor)阵列和与其对应的色阻模块，而在所述第二基板的朝向所述液晶夹层的一侧上设置有黑色矩阵。黑色矩阵用于阻挡漏光。另外，在所述第一基板和所述第二基板的朝向所述液晶夹层的一侧上分别在最外侧设置有配向膜。配向膜用于决定液晶夹层中的液晶预倾角。
在现有技术中，在这一类型的液晶显示面板的成盒制程中，一般需要先在第二基板侧的像素边缘区域设置略高于盒厚的间隔柱(PS,photo spacer)。间隔柱(PS,photo spacer)的作用是保持第一基板和第二基板之间的距离。当滴落液晶后，将第二基板与第一基板压合。该压合步骤会使得间隔柱(PS,photo spacer)的高度压缩至一定值；当压缩后间隔柱(PS,photo spacer)的高度值高于液晶层的厚度时，在液晶层表面与基板之间会存在一定厚度的空气层。该空气层的存在会影响液晶显示器(LCD,liquid crystal display)的光学指标。
发明内容
本发明的目的是减小现有技术中所存在的液晶层表面与基板之间的空气层厚度，最终大幅度地提高液晶显示器(LCD,liquid crystal display)的光学指标
本发明提出了一种用于制造液晶面板的方法，所述液晶面板包括第一基板、第二基板以及设置在所述第一基板和所述第二基板之间的液晶夹层，在所述第一基板的朝向所述液晶夹层的一侧上由内至外设置有薄膜晶体管阵列和与其对应的色阻模块，所述方法包括：第一步骤，在所述第一基板和所述第二基板压合之前，在二者之间设置高度较高的第一间隔柱和高度较低的第二间隔柱，其中所述第二间隔柱的高度与所述液晶夹层的厚度相同；第二步骤，在所述第一基板和所述第二基板压合之后，所述第一间隔柱和所述第二间隔柱的高度均等同于所述液晶夹层的厚度。上述方法通过设置高度不同的第一间隔柱和第二间隔柱，并在压缩后使得所述第一间隔柱和所述第二间隔柱的高度均等同于所述液晶夹层的厚度，减小了成盒时由于间隔柱高度与液晶层厚度不一致而形成的空气层厚度，提升了显示品质。
优选地，在位于相邻的色阻模块之间的色阻间隙中设置所述第一间隔柱或所述第二间隔柱。如此，间隔柱不会影响液晶面板的显示区域的显示效果(例如颜色和灰度)。
优选地，在所述第一基板的集成电路的接触孔中设置所述第一间隔柱或所述第二间隔柱。如此，可有效利用接触孔的中空区域，且间隔柱不会干扰电路走线和电场分布。
优选地，通过间隔柱光罩来对所述第一基板进行光刻，以产生所述第一间隔柱和所述第二间隔柱，其中所述间隔柱光罩的图案包括完全透光、部分透光和完全不透光三种透光率档位。如此地，区别于现有技术，在根据本发明的用于制造液晶面板的方法中，在第一基板、上生成第一间隔柱和第二间隔柱，而不是在第二基板上生成第一间隔柱和第二间隔柱，这很大程度上降低了整个液晶面板制程的难度。不需要再对第二基板进行光刻。
优选地，在进行负性光刻以产生所述第一间隔柱和所述第二间隔柱时，所述间隔柱光罩的完全透光档位对应所述第一基板上的第一间隔柱，所述间隔柱光罩的部分透光档位对应所述第一基板上的第二间隔柱，而所述间隔柱光罩的完全不透光档位对应所述第一基板上的不设置第一间隔柱和第二间隔柱的部分。
优选地，所述间隔柱光罩的完全透光档位构造为第一光罩孔，所述间隔柱光罩的部分透光档位构造为第二光罩孔，其中所述第一光罩孔的尺寸大于所述第二光罩孔。如此可使得第一间隔柱的高度或横截面尺寸大于第二间隔柱。
优选地，在所述第一基板和所述第二基板压合之前，所述第一间隔柱的高度位于3μm-3.4μm的范围内，而所述第二间隔柱的高度位于2.4μm-2.8μm的范围内。
优选地，在所述第一基板和所述第二基板压合之前，所述第一间隔柱的高度为3.2μm，而所述第二间隔柱的高度为2.6μm。
优选地，在所述第二基板的朝向所述液晶夹层的一侧上设置有黑色矩阵。黑色矩阵可阻挡液晶面板的漏光，保证良好的显示效果。
优选地，在所述第一基板和所述第二基板的朝向所述液晶夹层的一侧上分别在最外侧设置有配向膜。配向膜可决定液晶夹层中液晶的预倾角。
根据本发明的方法带来了显著的进步。
一方面，在本发明中，设置了不同高度的间隔柱(PS,photo spacer)，并在压缩后使得所有间隔柱的高度与液晶夹层的厚度相同，减小了液晶夹层和基板之间的空气层的厚度，最终大幅度地提高了液晶显示器(LCD,liquid crystal display)的光学指标。
另一方面，本发明将间隔柱(PS,photo spacer)设置于第一基板侧的色阻间隙处或者接触孔处，降低了制程所需难度。不需要再对第二基板进行光刻。
上述技术特征可以各种适合的方式组合或由等效的技术特征来替代，只要能够达到本发明的目的。
附图说明
在下文中将基于实施例并参考附图来对本发明进行更详细的描述。其中：
图1显示了根据本发明的用于制造液晶面板的方法的第一步骤；
图2显示了根据本发明的用于制造液晶面板的方法的第二步骤。
在附图中，相同的部件使用相同的附图标记。附图并未按照实际的比例。
具体实施方式
下面将结合附图对本发明作进一步说明。
本发明提出了一种用于制造液晶面板的方法。
本发明的方法基于彩色滤光片位于阵列基板上的工艺(COA,color filter on array)。参照图1，可清楚地看到，在这种工艺中，所制造的液晶面板包括第一基板2、第二基板1以及设置在第一基板2和第二基板1之间的液晶夹层5。在第一基板2的朝向液晶夹层5的一侧上由内至外设置有薄膜晶体管阵列(附图中未示出)和与其对应的色阻模块6。色阻模块6即红、绿、蓝三原色的彩色滤光片，每一个色阻模块6为三原色中的一种颜色的滤光片，且一个色阻模块6针对薄膜晶体管(TFT,thin film transistor)阵列中的一个子像素，三种颜色的滤光片交替排列，以结合偏转的液晶一起控制最终的显示画面的颜色。另外，在第二基板1的朝向液晶夹层5的一侧上设置有黑色矩阵，以用于阻挡漏光。在第一基板2和第二基板1的朝向液晶夹层5的一侧上分别在最外侧设置有配向膜，用于决定液晶夹层3中的液晶的预倾角。
根据本发明的用于制造液晶面板的方法至少包括第一步骤和第二步骤。
图1显示了根据本发明的用于制造液晶面板的方法的第一步骤。再次参照图1可看出，在第一步骤，在第一基板2和第二基板1压合之前，在第一基板2和第二基板1之间设置高度较高的主间隔柱(main PS)3(本文中也称之为第一间隔柱)和高度较低的辅间隔柱(sub PS)4(本文中也称之为第二间隔柱)。其中辅间隔柱4的高度与液晶夹层5的厚度相同。
关于间隔柱的形成，可以如下所述的方式来进行。可通过间隔柱光罩来对所述第一基板2进行光刻，以产生主间隔柱3和辅间隔柱4。在光刻工艺中，使用部分透光性(HTM,half tone method)的光罩，可获得相异段差的间隔柱。具体而言，在HTM光刻工艺过程中，所使用的间隔柱光罩的图案包括完全透光、部分透光和完全不透光三种透光率档位。进行负性光刻以产生主间隔柱3和辅间隔柱4，光刻过程中，上面所介绍的HTM间隔柱光罩的完全透光档位对应第一基板2上的主间隔柱3，该HTM间隔柱光罩的部分透光档位对应第一基板2上的辅间隔柱4，而该HTM间隔柱光罩的完全不透光档位对应第一基板2上的不设置主间隔柱3和辅间隔柱4的部分。在负性光刻工艺中，光线全部透过HTM间隔柱光罩的完全透光档位，从而近乎完全地保留住与完全透光档位相对应的第一基板2上的待刻蚀层，形成了高度最高的主间隔柱3；光线部分地透过HTM间隔柱光罩的部分透光档位，从而以一定比例刻蚀掉与部分透光档位相对应的第一基板2上的待刻蚀层，形成了高度较矮的辅间隔柱4；没有任何光线透过HTM间隔柱 光罩的完全不透光档位，与完全不透光档位所对应的第一基板2上的待刻蚀层几乎全部流失，形成了第一基板2上的不设置主间隔柱3和辅间隔柱4的部分(平面的主体部分)。
另一方面，可以通过HTM间隔柱光罩上的大小不同的两种光罩孔来产生两种高度和/或横截面尺寸不同的间隔柱(PS,photo spacer)。具体地，将该HTM间隔柱光罩的完全透光档位构造为第一光罩孔，将该HTM间隔柱光罩的部分透光档位构造为第二光罩孔，且第一光罩孔的尺寸大于所述第二光罩孔。以此方式，相比之下，通过上述HTM光刻工艺所形成的主间隔柱3高度较高、横截面积较大，而通过上述HTM光刻工艺所形成的辅间隔柱4高度较小、横截面积较小。
关于主间隔柱3和辅间隔柱4的具体性质，本发明还提出了以下优选的技术方案。在位置方面，如图1和图2所示，可以在位于相邻的色阻模块6之间的色阻间隙(color hole)中设置主间隔柱3或辅间隔柱4。在备选的实施方案中，也可以在第一基板2的集成电路的接触孔(contact hole)中设置主间隔柱3或辅间隔柱4。
在高度方面，可以使得所产生的主间隔柱3和辅间隔柱4的高度满足如下关系。在第一基板2和第二基板1压合之前，使得主间隔柱3的高度位于3μm-3.4μm的范围内，而辅间隔柱4的高度位于2.4μm-2.8μm的范围内。尤其优选地，在第一基板2和第二基板1压合之前，使得主间隔柱3的高度为3.2μm，而使得辅间隔柱4的高度为2.6μm(与液晶夹层5的厚度基本相同)。
根据本发明的用于制造液晶面板的方法还包括第二步骤。图2显示了根据本发明的用于制造液晶面板的方法的第二步骤。
参照图2，可以看出，当第一基板2和第二基板1压合时，较高的主间隔柱(main PS)3被压缩，其被压缩后高度与较低的辅间隔柱(sub PS)4的高度相同，同时两者的高度也与液晶夹层5的高度基本相同。
根据本发明的用于制造液晶面板的方法，一方面通过设置高度不同的主间隔柱(main PS)3和辅间隔柱(sub PS)4，并在压缩后使得主间隔柱(main PS)3的高度和辅间隔柱(sub PS)4的高度均与液晶夹层5的厚度相同，减小了成盒时由于间隔柱高度与液晶层厚度不一致而形成的空气层厚度，提升了显示品质；另一方面，区别于现有技术，在根据本发明的用于制造液晶面板的方法中，在第一基板2上例如通过光刻生成主间隔柱(main PS)3和辅间隔柱(sub PS)4，而不是在第二基板1上生成间隔柱，这很大程度上降低了整个液晶面板制程的难度，因为不需要再对 第二基板1进行光刻。
虽然在本文中参照了特定的实施方式来描述本发明，但是应该理解的是，这些实施例仅仅是本发明的原理和应用的示例。因此应该理解的是，可以对示例性的实施例进行许多修改，并且可以设计出其他的布置，只要不偏离所附权利要求所限定的本发明的精神和范围。应该理解的是，可以通过不同于原始权利要求所描述的方式来结合不同的从属权利要求和本文中所述的特征。还可以理解的是，结合单独实施例所描述的特征可以使用在其他所述实施例中。

Claims (12)

  1. 一种用于制造液晶面板的方法，其中，
    所述液晶面板包括第一基板、第二基板以及设置在所述第一基板和所述第二基板之间的液晶夹层，在所述第一基板的朝向所述液晶夹层的一侧上由内至外设置有薄膜晶体管阵列和与其对应的色阻模块，
    所述方法包括：
    第一步骤，在所述第一基板和所述第二基板压合之前，在二者之间设置高度较高的第一间隔柱和高度较低的第二间隔柱，其中所述第二间隔柱的高度与所述液晶夹层的厚度相同；
    第二步骤，在所述第一基板和所述第二基板压合之后，所述第一间隔柱和所述第二间隔柱的高度均等同于所述液晶夹层的厚度。
  2. 根据权利要求1所述的方法，其中，在位于相邻的色阻模块之间的色阻间隙中设置所述第一间隔柱或所述第二间隔柱。
  3. 根据权利要求1所述的方法，其中，在所述第一基板的集成电路的接触孔中设置所述第一间隔柱或所述第二间隔柱。
  4. 根据权利要求1所述的方法，其中，通过间隔柱光罩来对所述第一基板进行光刻，以产生所述第一间隔柱和所述第二间隔柱，其中所述间隔柱光罩的图案包括完全透光、部分透光和完全不透光三种透光率档位。
  5. 根据权利要求4所述的方法，其中，进行负性光刻以产生所述第一间隔柱和所述第二间隔柱，所述间隔柱光罩的完全透光档位对应所述第一基板上的第一间隔柱，所述间隔柱光罩的部分透光档位对应所述第一基板上的第二间隔柱，而所述间隔柱光罩的完全不透光档位对应所述第一基板上的不设置第一间隔柱和第二间隔柱的部分。
  6. 根据权利要求5所述的方法，其中，所述间隔柱光罩的完全透光档位构造为第一光罩孔，所述间隔柱光罩的部分透光档位构造为第二光罩孔，其中所述第一光罩孔的尺寸大于所述第二光罩孔。
  7. 根据权利要求1到6中任一项所述的方法，其中，在所述第一基板和所述第二基板压合之前，所述第一间隔柱的高度位于3μm-3.4μm的范围内，而所述第二间隔柱的高度位于2.4μm-2.8μm的范围内。
  8. 根据权利要求7所述的方法，其中，在所述第一基板和所述第二基板压合之前，所述第一间隔柱的高度为3.2μm，而所述第二间隔柱的高度为2.6μm。
  9. 根据权利要求1所述的方法，其中，在所述第二基板的朝向所述液晶夹层的一侧上设置有黑色矩阵。
  10. 根据权利要求7所述的方法，其中，在所述第二基板的朝向所述液晶夹层的一侧上设置有黑色矩阵。
  11. 根据权利要求1所述的方法，其中，在所述第一基板和所述第二基板的朝向所述液晶夹层的一侧上分别在最外侧设置有配向膜。
  12. 根据权利要求7所述的方法，其中，在所述第一基板和所述第二基板的朝向所述液晶夹层的一侧上分别在最外侧设置有配向膜。
PCT/CN2015/083136 2015-06-24 2015-07-02 用于制造液晶面板的方法 Ceased WO2016206131A1 (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US14/778,248 US20170261795A1 (en) 2015-06-24 2015-07-02 Method for manufacturing liquid crystal display panel

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201510351119.8A CN104898329A (zh) 2015-06-24 2015-06-24 用于制造液晶面板的方法
CN201510351119.8 2015-06-24

Publications (1)

Publication Number Publication Date
WO2016206131A1 true WO2016206131A1 (zh) 2016-12-29

Family

ID=54031073

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2015/083136 Ceased WO2016206131A1 (zh) 2015-06-24 2015-07-02 用于制造液晶面板的方法

Country Status (3)

Country Link
US (1) US20170261795A1 (zh)
CN (1) CN104898329A (zh)
WO (1) WO2016206131A1 (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105807478A (zh) * 2016-05-20 2016-07-27 深圳市华星光电技术有限公司 液晶显示面板及其制作方法
CN111338130B (zh) * 2020-04-13 2023-03-17 Tcl华星光电技术有限公司 显示面板

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003121857A (ja) * 2001-10-10 2003-04-23 Toppan Printing Co Ltd 柱状スペーサーを設けた液晶表示装置用カラーフィルタ
TW200921217A (en) * 2007-11-05 2009-05-16 Au Optronics Corp Liquid crystal display panel and manufacturing method of opposite substrate thereof
CN102073171A (zh) * 2009-11-23 2011-05-25 三星电子株式会社 液晶显示器
CN102804046A (zh) * 2009-06-16 2012-11-28 夏普株式会社 液晶显示元件及其制造方法
JP2013003243A (ja) * 2011-06-14 2013-01-07 Toppan Printing Co Ltd アレイ基板及びそれを用いた液晶表示装置

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6888608B2 (en) * 1995-09-06 2005-05-03 Kabushiki Kaisha Toshiba Liquid crystal display device
JP3976544B2 (ja) * 2001-10-29 2007-09-19 Ｎｅｃ液晶テクノロジー株式会社 液晶表示装置及びその製造方法
KR100685948B1 (ko) * 2001-12-14 2007-02-23 엘지.필립스 엘시디 주식회사 액정표시소자 및 그 제조방법
US7253868B2 (en) * 2002-08-21 2007-08-07 Samsung Electronics Co., Ltd. Liquid crystal display device comprising a plurality of spacers having compression ratios gradually increasing as advancing from a center to left and right edges of display region
CN100476551C (zh) * 2003-10-16 2009-04-08 夏普株式会社 基板、面板及其制造方法、和液晶显示面板及其制造方法
EP2031438B1 (en) * 2003-10-16 2010-10-06 Sharp Kabushiki Kaisha Substrate with spacer, panel, and method for producing panel
JP2005258290A (ja) * 2004-03-15 2005-09-22 Seiko Epson Corp 電気光学装置及びその製造方法並びに電子機器
JP4143571B2 (ja) * 2004-06-15 2008-09-03 Ｎｅｃ液晶テクノロジー株式会社 液晶表示装置
WO2007105567A1 (ja) * 2006-03-10 2007-09-20 Toppan Printing Co., Ltd. カラーフィルタおよびその製造に用いるフォトマスク
US8134652B2 (en) * 2008-01-16 2012-03-13 Samsung Electronics Co., Ltd. Liquid crystal display having sensor and spacer arrangement and and method of manufacturing the same
JP4683090B2 (ja) * 2008-08-06 2011-05-11 ソニー株式会社 液晶表示装置、及びその製造方法
KR101790060B1 (ko) * 2011-04-21 2017-10-25 엘지디스플레이 주식회사 액정표시장치
WO2013047455A1 (ja) * 2011-09-27 2013-04-04 シャープ株式会社 液晶パネル
US9612470B2 (en) * 2014-01-10 2017-04-04 Apple Inc. Display with column spacer structures
US9507222B2 (en) * 2014-03-14 2016-11-29 Innolux Corporation Display device
TWI537656B (zh) * 2014-03-14 2016-06-11 群創光電股份有限公司 顯示裝置
CN104483773B (zh) * 2014-12-12 2017-09-19 深圳市华星光电技术有限公司 一种曲面液晶显示面板及其制作方法
KR102259230B1 (ko) * 2014-12-19 2021-06-01 삼성디스플레이 주식회사 표시 장치 및 그 제조 방법

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003121857A (ja) * 2001-10-10 2003-04-23 Toppan Printing Co Ltd 柱状スペーサーを設けた液晶表示装置用カラーフィルタ
TW200921217A (en) * 2007-11-05 2009-05-16 Au Optronics Corp Liquid crystal display panel and manufacturing method of opposite substrate thereof
CN102804046A (zh) * 2009-06-16 2012-11-28 夏普株式会社 液晶显示元件及其制造方法
CN102073171A (zh) * 2009-11-23 2011-05-25 三星电子株式会社 液晶显示器
JP2013003243A (ja) * 2011-06-14 2013-01-07 Toppan Printing Co Ltd アレイ基板及びそれを用いた液晶表示装置

Also Published As

Publication number Publication date
US20170261795A1 (en) 2017-09-14
CN104898329A (zh) 2015-09-09

Similar Documents

Publication Publication Date Title
US10073313B2 (en) Display device and manufacturing method thereof
WO2017008369A1 (zh) Coa型液晶显示面板及其制作方法
US20170299773A1 (en) Substrate and Manufacturing Method Therefor, Display Panel and Display Device
WO2014134886A1 (zh) 彩膜基板及其制作方法、液晶显示屏
WO2019047369A1 (zh) 阵列基板及其制作方法
US20160320663A1 (en) Color filter substrate, manufacturing method thereof, method for manufacturing spacers, and display device
WO2018176629A1 (zh) 显示面板及其制造方法
CN105655290A (zh) 液晶显示面板、阵列基板及其制造方法
CN107255896A (zh) 一种显示面板、阵列基板及其制造方法
JP6232769B2 (ja) 表示装置用基板の製造方法及び表示装置用基板、表示装置
JP2006030319A (ja) グレートーンマスク及びグレートーンマスクの製造方法
CN105789223A (zh) 一种阵列基板及其制作方法、显示面板、显示装置
JP2003156751A (ja) 液晶表示装置用基板及びその製造方法及びそれを備えた液晶表示装置
JP2006030320A (ja) グレートーンマスク及びグレートーンマスクの製造方法
WO2016206131A1 (zh) 用于制造液晶面板的方法
TW202131091A (zh) 光罩、光罩之製造方法、顯示裝置用元件之製造方法
KR102493944B1 (ko) 포토마스크, 근접 노광용 포토마스크의 제조 방법 및 표시 장치의 제조 방법
JP2011145376A (ja) フォトマスク、カラーフィルタ基板、画素電極基板、液晶表示装置、カラーフィルタ基板の製造方法及び画素電極基板の製造方法
JP5376393B2 (ja) カラーフィルターの製造方法、フォトマスクセット
JP6682759B2 (ja) カラーフィルタ基板の製造方法
JP2011145377A (ja) フォトマスク、カラーフィルタ基板、画素電極基板、液晶表示装置、カラーフィルタ基板の製造方法及び画素電極基板の製造方法
KR102481787B1 (ko) 액정표시장치 및 그 제조방법
JP2007240711A (ja) 液晶表示装置用カラーフィルタの製造方法及び液晶表示装置用カラーフィルタ
WO2020107537A1 (zh) 显示面板及其制造方法和显示装置
WO2017024655A1 (zh) 彩色滤光片基板及其制作方法、液晶面板

Legal Events

Date Code Title Description
WWE Wipo information: entry into national phase

Ref document number: 14778248

Country of ref document: US

121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 15896026

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 15896026

Country of ref document: EP

Kind code of ref document: A1