WO2016177242A1 - 触控显示面板及其制备方法、触控显示装置 - Google Patents

触控显示面板及其制备方法、触控显示装置 Download PDF

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Publication number
WO2016177242A1
WO2016177242A1 PCT/CN2016/078551 CN2016078551W WO2016177242A1 WO 2016177242 A1 WO2016177242 A1 WO 2016177242A1 CN 2016078551 W CN2016078551 W CN 2016078551W WO 2016177242 A1 WO2016177242 A1 WO 2016177242A1
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Prior art keywords
touch
conductive film
layer
display panel
transparent conductive
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PCT/CN2016/078551
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English (en)
French (fr)
Inventor
李金钰
刘英明
蔡佩芝
曹雪
Original Assignee
京东方科技集团股份有限公司
北京京东方光电科技有限公司
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Application filed by 京东方科技集团股份有限公司, 北京京东方光电科技有限公司 filed Critical 京东方科技集团股份有限公司
Priority to US15/327,293 priority Critical patent/US10203789B2/en
Publication of WO2016177242A1 publication Critical patent/WO2016177242A1/zh

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/13338—Input devices, e.g. touch panels
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/0412—Digitisers structurally integrated in a display
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133345—Insulating layers
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133502—Antiglare, refractive index matching layers
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133528—Polarisers
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1343—Electrodes
    • G02F1/134309—Electrodes characterised by their geometrical arrangement
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1343—Electrodes
    • G02F1/13439—Electrodes characterised by their electrical, optical, physical properties; materials therefor; method of making
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices

Definitions

  • Embodiments of the present invention relate to a touch display panel, a method of fabricating the same, and a touch display device having the touch display panel.
  • a single-layer On-Cell touch solution in which a touch panel having a touch panel function is embedded between a liquid crystal display substrate and an upper polarizer has advantages such as simple process and low manufacturing cost, and is received by people. extensive attention.
  • a touch electrode is deposited on the surface of the color filter substrate, and a specific pattern having a touch function is etched on the touch electrode through a mask process.
  • a touch display panel includes a display substrate, a touch electrode layer, and an insulating layer between the display substrate and the touch electrode layer.
  • the touch electrode layer includes a touch pattern with a trench; the touch display panel further includes a transparent conductive film layer, and the transparent conductive film layer passes through the insulating layer and the touch
  • the control electrode layer is insulated.
  • the transparent conductive film layer comprises a conductive film pattern complementary to the touch pattern.
  • the insulating layer covers the conductive film pattern of the transparent conductive film layer in a region corresponding to the trench, and is disposed on the display substrate in other regions.
  • the insulating layer is entirely disposed on the transparent conductive film layer.
  • the touch electrode layer is made of the same material as the transparent conductive film layer.
  • the touch display panel further includes a polarizer, and the polarizer is disposed on the touch electrode layer.
  • a touch display device including the above touch display panel is disclosed.
  • a method for fabricating a touch display panel comprising:
  • a touch electrode layer is formed on the insulating layer, and a touch pattern is formed in the touch electrode layer, wherein the transparent conductive film layer is insulated from the touch electrode layer by the insulating layer.
  • the method further comprises:
  • a conductive film pattern complementary to the touch pattern is formed in the transparent conductive film layer.
  • the method further comprises:
  • a polarizer is attached to the touch electrode layer.
  • the embodiment of the invention discloses a touch display panel, a preparation method thereof and a touch display device having the touch display panel.
  • the embodiment of the present invention provides a transparent conductive film layer, and the transparent conductive film layer is insulated from the touch electrode layer by an insulating layer.
  • the design is such that light irradiated on the trench of the touch electrode layer is irradiated through the insulating layer.
  • the upper surface of the transparent conductive film layer realizes the reflection of the light, compensates for the light ray difference caused by the groove not reflecting the light, and solves the problem that the reflected light is uneven due to the groove of the touch electrode layer, and the phenomenon of the shadow is serious. Improved display The display quality of the screen.
  • FIG. 1 is a schematic structural view of an On-Cell touch display panel in the prior art
  • FIG. 2 is a top plan view of a prior art On-Cell touch display panel
  • FIG. 3 is a schematic structural diagram of a touch display panel according to an embodiment of the invention.
  • FIG. 4 is a top plan view of a touch display panel according to an embodiment of the invention.
  • FIG. 5 is a schematic structural diagram of a touch display panel according to another embodiment of the present invention.
  • FIG. 6 is a flow chart of a method of fabricating a touch display panel according to an embodiment of the invention.
  • the line with the downward arrow is the incident light
  • the line with the upward arrow is the reflected light
  • the touch display panel includes a display substrate, a touch electrode layer 006, and an insulating layer 005 between the display substrate and the touch electrode layer 006, wherein the touch electrode layer 006 includes The touch pattern of the trench 008, the display substrate includes a lower polarizer 001, a TFT (Thin Film Transistor thin film transistor) substrate 002, and a color filter substrate 003 from bottom to top, and is in touch An upper polarizer 007 is disposed on the electrode layer 006.
  • TFT Thin Film Transistor thin film transistor
  • the different signal traces of the touch electrode layer 006 of the existing On-Cell touch display panel are etched to form a trench 008, as shown in FIG. 2 . Since the groove 008 can not reflect the light, forming a ray step difference, the step difference causes a significant shadow in the state where the display is not powered or in a low gray level state, that is, the display panel is not lit and the low gray scale is lit. There is a phenomenon that the reflected light is uneven, as shown by the reflection of the light in Fig. 1. This produces a serious shadowing phenomenon and reduces the display quality.
  • the touch display panel includes a display substrate, a touch electrode layer, and between the display substrate and the touch electrode layer, in order to solve or solve the above problems.
  • the insulating layer wherein the touch electrode layer comprises a touch pattern with a trench.
  • the touch display panel further includes a transparent conductive film layer, and the transparent conductive film layer is insulated from the touch electrode layer by the insulating layer.
  • the display substrate of the touch display panel includes a lower polarizer, a TFT substrate, and a color filter substrate in this order from bottom to top.
  • the touch display panel of the present invention provides a transparent conductive film layer between the insulating layer and the display substrate, so that the light irradiated on the groove of the touch electrode layer is irradiated to the upper surface of the transparent conductive film layer through the insulating layer.
  • the reflection of light compensates for the difference in light ray caused by the inability of the groove to reflect light, and the touch display panel can reflect uniform light and avoid the phenomenon of shadow elimination.
  • the display substrate may be a single substrate, such as a color film substrate; or a combination of substrates, such as a display panel formed by a color film substrate and an array substrate; or may be attached to a polarizer or the like.
  • the structure "formation” includes, for example, setting a material layer by a process such as sputtering, deposition, or the like, and/or constructing a pattern on the material layer by a patterning process such as etching.
  • Embodiment 1 is a diagrammatic representation of Embodiment 1:
  • FIG. 3 is a schematic structural diagram of a touch display panel according to an embodiment of the present invention.
  • the touch display panel of the present embodiment prepares a TFT substrate 002 by an Array process (array manufacturing process), and a color filter substrate is prepared on the TFT substrate 002.
  • the touch electrode layer 006 and the transparent conductive film layer 004 are prepared, specifically: depositing a transparent conductive film layer 004 on the upper surface of the color film substrate 003, and A specific pattern complementary to the touch pattern of the touch electrode layer 006 is etched on the transparent conductive film layer 004 through a mask process, That is, the conductive film pattern, the width of the pattern of the conductive film pattern can be adjusted according to the process capability; after the etching is completed, an insulating layer 005 is further deposited for insulating the transparent conductive film layer 004 and the touch electrode layer 006, and the insulating layer The thickness of 005 can be as thin as possible according to the process capability; then the touch electrode layer 006 is deposited, and the desired touch pattern is etched through a mask process to form a trench 008, as shown in FIG.
  • the layer is made of transparent insulating material, such as silicon oxide and silicon nitride, and its light reflectivity is much lower than that of the conductive material (approx. metal) of the touch electrode layer and the transparent conductive film layer, so it does not help to eliminate the shadow phenomenon.
  • the trench 008 of the touch electrode layer is in a complementary relationship with the conductive film pattern of the transparent conductive film layer 004, and the size of the trench 008 can also be adjusted according to process capability and design requirements.
  • the transparent conductive film pattern is complementary to the touch pattern. Therefore, a transparent conductive film layer 004 is disposed under the trench 008 of the touch electrode layer 006, which compensates for the light ray difference caused by the groove 008 not reflecting light. . As shown in the light reflection condition shown in FIG. 3, the added transparent conductive film layer 004 can well achieve the effect of the image reduction and improve the quality of the display.
  • the insulating layer 005 is overlaid on the conductive film pattern of the transparent conductive film layer 004 in a region corresponding to the trench 008, and is disposed on the color filter substrate 003 of the display substrate in other regions.
  • the design is equivalent to the same layer of the insulating layer 005 and the transparent conductive film layer 004, which is beneficial to reducing the thickness of the touch display panel.
  • the material of the touch electrode layer 006 is the same as that of the transparent conductive film layer 004. Therefore, the reflectivity of the two is the same for the light, which is favorable for forming uniform reflected light.
  • the same material is, for example, a transparent conductive material such as indium tin oxide.
  • the upper polarizer 007 is disposed above the touch electrode layer 006 to protect and polarize.
  • Embodiment 2 is a diagrammatic representation of Embodiment 1:
  • FIG. 5 is a schematic structural diagram of a touch display panel according to another embodiment of the present invention.
  • the touch display panel of the present embodiment prepares the TFT substrate 002 by an Array process, prepares the color filter substrate 003 on the TFT substrate 002, and prepares the touch electrode after the ODF (liquid crystal dropping) process is completed.
  • the layer 006 and the transparent conductive film layer 004 are specifically: a transparent conductive film layer 004 is deposited on the upper surface of the color filter substrate 003, and the deposition is continued without a mask process.
  • the insulating layer 005 is used to block the transparent conductive film layer 004 and the touch electrode layer 006.
  • the thickness of the insulating layer 005 can be as thin as possible according to the process capability; then the touch electrode layer 006 is deposited and etched by a mask process.
  • the desired touch pattern is formed to form a trench 008, and the size of the trench 008 can be adjusted according to process capability and design requirements.
  • the transparent conductive film layer 004 is an entire layer which is not processed by a patterning process.
  • the entire layer of the insulating layer 005 is disposed on the transparent conductive film layer 004, and the trench 008 of the touch electrode layer 006 is transparently conductive.
  • the film layer 004 is present, so that the light irradiated on the trench 008 of the touch electrode layer 006 is irradiated to the upper surface of the transparent conductive film layer 004 through the insulating layer 005 to realize the reflection of the light, as shown in FIG.
  • the difference in the ray length caused by the inability of the groove 008 to reflect the light is compensated, so that the increased transparent conductive film layer 004 can well achieve the effect of the smearing and improve the quality of the display.
  • the transparent conductive layer is not required to be etched, the mask process can be reduced, the production efficiency is improved, and the insulating layer is flattened.
  • the material of the touch electrode layer 006 is the same as that of the transparent conductive film layer 004. Therefore, the reflectivity of the two is the same for the light, which is favorable for forming uniform reflected light.
  • the same material is, for example, a transparent conductive material such as indium tin oxide.
  • the upper polarizer 007 is disposed above the touch electrode layer 006 to protect and polarize.
  • the present invention also provides a touch display device comprising the above touch display panel.
  • the touch display device is, for example, a product or a component having a touch and display function, such as a tablet computer, a mobile phone, a television, a navigator, a video camera, a camera, and a digital photo frame.
  • the present invention further provides a method for preparing a touch display panel. As shown in FIG. 6, the method includes the following steps:
  • Touch display panel prepared by the method for preparing a touch display panel of the present invention, the touch The control pattern has a groove, and a transparent conductive film layer is formed between the insulating layer and the display substrate, so that the light irradiated on the groove of the touch electrode layer is irradiated to the upper surface of the transparent conductive film layer through the insulating layer to realize the light.
  • the reflection enables the touch display panel to reflect uniform light and avoid the phenomenon of shadowing.
  • the display substrate includes a lower polarizer, an array substrate, and a color filter substrate from bottom to top.
  • the method of the present invention further includes the step of attaching the polarizer on the touch electrode layer to protect and polarize.
  • the display substrate can be any other suitable existing or future display substrate.
  • the method of the embodiment of the present invention further includes forming a conductive film pattern complementary to the touch pattern in the transparent conductive film layer, the insulating layer corresponding to the trench The region is covered on the conductive film pattern of the transparent conductive film layer, and is disposed on the display substrate in other regions.
  • the design is provided with a transparent conductive film pattern complementary to the touch pattern, and a transparent conductive film layer is disposed in a region corresponding to the groove of the touch electrode layer, thereby compensating for a light ray difference caused by the groove not reflecting light, and the structure is Corresponding to the same layer of the insulating layer and the transparent conductive film layer, thereby reducing the thickness of the panel.
  • the transparent conductive film layer prepared by the method of the embodiment of the present invention is an entire layer which is not processed by a patterning process, and the insulating layer is entirely disposed on the transparent conductive film. On the layer, this design does not need to etch the transparent conductive film layer, which reduces the process and makes the insulating layer flat.
  • the material of the touch electrode layer formed by the method of the embodiment of the present invention is the same as the material of the transparent conductive film layer, so that the reflectance of the light is the same, which is favorable for forming uniform reflected light.
  • the same material is, for example, a transparent conductive material such as indium tin oxide.

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Optics & Photonics (AREA)
  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Human Computer Interaction (AREA)
  • Geometry (AREA)
  • Position Input By Displaying (AREA)
  • Push-Button Switches (AREA)

Abstract

一种触控显示面板、其制备方法及具有触控显示面板的触控显示装置。在绝缘层（005）和显示基板之间设置透明导电膜层（004），使得照射在触控电极层（006）沟槽（008）处的光线透过绝缘层（005）照射到透明导电膜层（004）的上表面，实现光线的反射，补偿了由于沟槽（008）不能反射光线而造成的光线段差，使触控显示面板能够反射出均匀的光线，避免了消影现象。

Description

触控显示面板及其制备方法、触控显示装置
本申请要求申请日为2015年5月6日的中国专利申请第201510226990.5号的优先权，在此全文引用上述中国专利申请公开的内容以作为本申请的一部分。
技术领域
本发明的实施例涉及一种触控显示面板、其制备方法及具有该触控显示面板的触控显示装置。
背景技术
为了实现触控面板的薄型化和轻量化，将触控面板和显示基板一体化的研究日渐盛行。例如，将具有触控面板功能的触控电极嵌入到液晶显示基板和上偏光片之间的单层On-Cell(盒上)触控方案，具有工艺简单、制造成本低等优点而受到人们的广泛关注。在上述On-Cell触控方案中，对盒完成后，在彩膜基板上表面沉积一层触控电极，并经过一次掩膜工艺在触控电极上刻蚀出具有触控功能的特定图形。
然而，在触控图形的刻蚀过程中，触控图形的不同走线之间会被刻蚀出沟槽。因为受到触控电极层的材料、厚度及产线工艺能力等因素的影响，这些沟槽的宽度大致在5-15um的范围内。显示基板在不点亮或者低灰阶点亮时，在反射光照射下，走线之间的沟槽清晰可见。由于沟槽不能反射光线，导致显示面板的反射光线不均匀，从而产生严重的消影现象，而上述的消影现象很难通过刻蚀工艺的调整来彻底解决，从而严重影响产品的显示品质。
发明内容
根据本发明的第一方面，公开了一种触控显示面板，所述触控显示面板包括显示基板、触控电极层以及位于所述显示基板和所述触控电极层之间的绝缘层，其中所述触控电极层包括带有沟槽的触控图形；所述触控显示面板还包括透明导电膜层，所述透明导电膜层通过所述绝缘层与所述触 控电极层绝缘。
根据本发明的实施例，所述透明导电膜层包括与所述触控图形互补的导电膜图案。
根据本发明的实施例，所述绝缘层在所述沟槽对应的区域覆盖在所述透明导电膜层的导电膜图案上，在其他区域设置在所述显示基板上。
根据本发明的实施例，所述绝缘层整层设置在所述透明导电膜层上。
根据本发明的实施例，所述触控电极层与所述透明导电膜层材质相同。
根据本发明的实施例，所述触控显示面板还包括偏光片，所述偏光片设置在所述触控电极层上。
根据本发明的第二方面，公开了一种触控显示装置，包括上述触控显示面板。
根据本发明的第三方面，公开了一种触控显示面板的制备方法，所述方法包括：
提供显示基板；
在所述显示基板的上表面上形成透明导电膜层；
形成绝缘层；
在所述绝缘层上形成触控电极层，并在所述触控电极层中形成触控图形，其中所述透明导电膜层通过所述绝缘层与所述触控电极层绝缘。
根据本发明的实施例，所述方法还包括：
在所述透明导电膜层中形成与所述触控图形互补的导电膜图案。
根据本发明的实施例，所述方法还包括：
在所述触控电极层上贴合偏光片。
本发明的实施例公开了一种触控显示面板、其制备方法及具有该触控显示面板的触控显示装置。本发明的实施例设置了透明导电膜层，并且所述透明导电膜层通过绝缘层与触控电极层绝缘，此种设计使得照射在触控电极层沟槽处的光线透过绝缘层照射到透明导电膜层的上表面，实现光线的反射，补偿了由于沟槽不能反射光线而造成的光线段差，解决了由于触控电极层沟槽导致的反射光线不均匀，消影现象严重的问题，提高了显示 屏的显示品质。
附图说明
为了更清楚地说明本发明实施例的技术方案，下面将对实施例的附图作简单地介绍。显而易见地，下面描述中的附图仅仅涉及本发明的一些实施例，而非对本发明的限制。
图1是现有技术中On-Cell触控显示面板的结构示意图；
图2是现有技术中On-Cell触控显示面板的俯视图；
图3是根据本发明的一个实施例的触控显示面板的结构示意图；
图4是根据本发明的一个实施例的触控显示面板的俯视图；
图5是根据本发明的另一个实施例的触控显示面板的结构示意图；
图6是根据本发明的实施例的触控显示面板的制备方法流程图。
注意在图中，带向下箭头的线条为入射光线，带向上箭头的线条为反射光线。
具体实施方式
为使本发明实施例的目的、技术方案和优点更加清楚，下面将结合本发明实施例中的附图，对本发明实施例中的技术方案进行清楚、完整的描述。显然，所描述的实施例是本发明一部分实施例，而不是全部的实施例。基于本发明中的实施例，本领域普通技术人员在没有作出创造性劳动前提下所获得的所有其他实施例，都属于本发明保护的范围。
需要注意的是，虽然下文中主要在On-Cell触控显示面板的上下文中来描述本发明的各种实施例，但是本领域的技术人员应当了解的是，本发明的实施例还可以应用于任何其它合适的触控显示面板，而并不是仅局限于On-Cell触控显示面板。
图1是现有技术中On-Cell触控显示面板的结构示意图。从图1可以看到，触控显示面板包括显示基板、触控电极层006以及位于所述显示基板和所述触控电极层006之间的绝缘层005，其中触控电极层006包括带有沟槽008的触控图形，显示基板从下到上包括下偏光片001、TFT(Thin Film Transistor薄膜晶体管)基板002以及彩膜基板003，并且在触控 电极层006上设置有上偏光片007。现有的On-Cell触控显示面板的触控电极层006的不同信号走线之间经过刻蚀形成沟槽008，如图2所示。由于沟槽008不能反射光线，形成光线段差，这种段差会造成在显示屏不加电或者低灰阶状态下明显的暗影，即导致显示面板在不点亮和低灰阶点亮的情况下出现反射光线不均匀的现象，如图1中光线的反射情况所示。从而产生了严重消影现象，降低了显示品质。
为了至少解决或减轻上述技术问题，本发明的实施例公开了一种触控显示面板，触控显示面板包括显示基板、触控电极层以及位于所述显示基板和所述触控电极层之间的绝缘层，其中所述触控电极层包括带有沟槽的触控图形。触控显示面板还包括透明导电膜层，透明导电膜层通过所述绝缘层与所述触控电极层绝缘。触控显示面板的显示基板从下到上依次包括下偏光片、TFT基板以及彩膜基板。本发明的触控显示面板通过在绝缘层和显示基板之间设置透明导电膜层，使得照射在触控电极层的沟槽处的光线透过绝缘层照射到透明导电膜层的上表面，实现光线的反射，补偿了由于沟槽不能反射光线而造成的光线段差，触控显示面板能够反射出均匀的光线，避免了消影现象。
应该理解，在本公开中，显示基板可以为单一的基板，例如为彩膜基板；也可以为基板的组合，例如彩膜基板和阵列基板对盒形成的显示面板；还可以包括偏光片等附属结构；“形成”例如包括通过溅射、沉积等工艺设置材料层和/或通过刻蚀等构图工艺在材料层上构造图形。
下面通过实施例一和实施例二来具体说明本发明的方案。
实施例一：
图3是根据本发明的实施例的触控显示面板的结构示意图，本实施例的触控显示面板通过Array工艺(阵列制造工艺)制备TFT基板002，在所述TFT基板002上制备彩膜基板003，并在ODF工艺(液晶滴下工艺)对盒完成后，制备触控电极层006以及透明导电膜层004，具体为：在彩膜基板003的上表面沉积一层透明导电膜层004，并经过一次掩膜工艺在透明导电膜层004上刻蚀出与触控电极层006的触控图形互补的特定图形， 即导电膜图案，导电膜图案的图形的宽度可根据工艺能力进行调节；刻蚀完成后，继续沉积一层绝缘层005，用于使透明导电膜层004和触控电极层006绝缘，绝缘层005的厚度可根据工艺能力尽可能地做薄；紧接着沉积触控电极层006，并经过掩膜工艺蚀刻出需要的触控图形，形成沟槽008，如图4所示，应该理解，绝缘层为透明绝缘材质，例如为氧化硅和氮化硅，其光线反射率远比导电材质(近似金属)的触控电极层和透明导电膜层要低，因此无助于消除暗影现象。此触控电极层的沟槽008处与透明导电膜层004的导电膜图案正好为互补关系，沟槽008的尺寸也可根据工艺能力和设计需要进行调节。
本实施例公开了透明导电膜图案与触控图形互补，因此在触控电极层006的沟槽008处下方设有透明导电膜层004，补偿了由于沟槽008不能反射光线而造成的光线段差。如图3示出的光线反射情况所示，增加的透明导电膜层004可以很好地达到消影的效果，提高显示屏的品质。
本实施例中所述绝缘层005在所述沟槽008对应的区域覆盖在所述透明导电膜层004的导电膜图案上，在其他区域设置在所述显示基板的彩膜基板003上，此种设计相当于绝缘层005和透明导电膜层004同层，有利于降低触控显示面板的厚度。
在一个实施例中，触控电极层006的材质与透明导电膜层004的材质相同，因此两者对光线的反射率相同，有利于形成均匀的反射光线。相同的材质例如为氧化铟锡等透明导电材料。
在一个实施例中，在触控电极层006的上方设置上偏光片007，起到保护和偏光的作用。
实施例二：
图5是根据本发明的另一个实施例的触控显示面板的结构示意图。本实施例的触控显示面板通过Array(阵列)工艺制备TFT基板002，在所述TFT基板002上制备彩膜基板003，并在ODF(液晶滴注)工艺对盒完成后，制备触控电极层006以及透明导电膜层004，具体为：在彩膜基板003的上表面沉积一层透明导电膜层004，不经过掩膜工艺，继续沉积一 层绝缘层005，用于阻绝透明导电膜层004和触控电极层006，绝缘层005的厚度可根据工艺能力尽可能地做薄；紧接着沉积触控电极层006，并经过掩膜工艺蚀刻出需要的触控图形，形成沟槽008，沟槽008的尺寸可根据工艺能力和设计需要进行调节。
本实施例公开了透明导电膜层004为未经构图工艺处理的整层，绝缘层005整层设置在所述透明导电膜层004上，触控电极层006的沟槽008处都会有透明导电膜层004的存在，使得照射在触控电极层006的沟槽008处的光线透过绝缘层005照射到透明导电膜层004的上表面，实现光线的反射，如图5示出的光线反射情况所示，补偿了由于沟槽008不能反射光线而造成的光线段差，所以增加的透明导电膜层004可以很好地达到消影的效果，提高显示屏的品质。另外，本实施例不需要刻蚀透明导电层，可以减少一道掩膜工艺，提高了生产效率，同时使绝缘层平整。
在一个实施例中，触控电极层006的材质与透明导电膜层004的材质相同，因此两者对光线的反射率相同，有利于形成均匀的反射光线。相同的材质例如为氧化铟锡等透明导电材料。
在一个实施例中，在触控电极层006的上方设置上偏光片007，起到保护和偏光的作用。
本发明还提供了一种触控显示装置，包括上述触控显示面板。触控显示装置例如为平板电脑、手机、电视机、导航仪、摄像机、照相机、数码相框等具有触控和显示功能的产品或部件。
本发明另外还提供了一种触控显示面板的制备方法，如图6所示，所述方法包括以下步骤：
S1、提供显示基板；
S2、在所述显示基板的上表面上形成透明导电膜层；
S3、形成绝缘层；
S4、在所述绝缘层上形成触控电极层，并在所述触控电极层中形成触控图形，其中所述透明导电膜层通过所述绝缘层与所述触控电极层绝缘。
利用本发明的触控显示面板的制备方法制备的触控显示面板，所述触 控图形具有沟槽，通过在绝缘层和显示基板之间形成透明导电膜层，使得照射在触控电极层的沟槽处的光线透过绝缘层照射到透明导电膜层的上表面，实现光线的反射，使触控显示面板能够反射出均匀的光线，避免了消影现象。
在一个实施例中，显示基板从下到上包括下偏光片、阵列基板以及彩膜基板。本发明的方法还包括在触控电极层上贴合上偏光片的步骤，起到保护和偏光的作用。此外，在其它实施例中，显示基板可以是任何其它合适的现有的或将来的显示基板。
在一个实施例中，为了形成实施例一的产品结构，本发明的实施例的方法还包括在透明导电膜层中形成与所述触控图形互补的导电膜图案，绝缘层在沟槽对应的区域覆盖在透明导电膜层的导电膜图案上，在其他区域设置在所述显示基板上。此设计通过设置透明导电膜图案与触控图形互补，在触控电极层的沟槽对应的区域设有透明导电膜层，补偿了由于沟槽不能反射光线而造成的光线段差，同时此种结构相当于绝缘层和透明导电膜层同层，从而降低面板厚度。
在一个实施例中，为了形成实施例二的产品结构，利用本发明的实施例的方法制备的透明导电膜层为未经构图工艺处理的整层，绝缘层整层设置在所述透明导电膜层上，此种设计不需刻蚀透明导电膜层，减少了工艺，同时使绝缘层平整。
在一个实施例中，利用本发明的实施例的方法形成的触控电极层的材质与透明导电膜层的材质相同，因此两者对光线的反射率相同，有利于形成均匀的反射光。相同的材质例如为氧化铟锡等透明导电材料。
以上实施方式仅用于说明本发明，而非对本发明的限制。尽管参照实施例对本发明进行了详细说明，本领域的普通技术人员应当理解，在不脱离本发明技术方案的精神和范围的情况下，可以对本发明的技术方案进行各种组合、修改或者等同替换。

Claims (10)

  1. 一种触控显示面板，包括显示基板、触控电极层以及位于所述显示基板和所述触控电极层之间的绝缘层，其中所述触控电极层包括带有沟槽的触控图形；所述触控显示面板还包括透明导电膜层，所述透明导电膜层通过所述绝缘层与所述触控电极层绝缘。
  2. 根据权利要求1所述的触控显示面板，其中，所述透明导电膜层包括与所述触控图形互补的导电膜图案。
  3. 根据权利要求2所述的触控显示面板，其中，所述绝缘层在所述沟槽对应的区域覆盖在所述透明导电膜层的导电膜图案上，在其他区域设置在所述显示基板上。
  4. 根据权利要求1所述的触控显示面板，其中，所述绝缘层整层设置在所述透明导电膜层上。
  5. 根据权利要求1至4任一项所述的触控显示面板，其中，所述触控电极层与所述透明导电膜层材质相同。
  6. 根据权利要求1至5任一项所述的触控显示面板，其中，所述触控显示面板还包括偏光片，所述偏光片设置在所述触控电极层上。
  7. 一种触控显示装置，包括权利要求1-6任一项所述的触控显示面板。
  8. 一种触控显示面板的制备方法，所述方法包括：
    提供显示基板；
    在所述显示基板的上表面上形成透明导电膜层；
    形成绝缘层；
    在所述绝缘层上形成触控电极层，并在所述触控电极层中形成触控图形，其中所述透明导电膜层通过所述绝缘层与所述触控电极层绝缘。
  9. 根据权利要求8所述的方法，所述方法还包括：
    在所述透明导电膜层中形成与所述触控图形互补的导电膜图案。
  10. 根据权利要求8或9所述的方法，所述方法还包括：
    在所述触控电极层上贴合偏光片。
PCT/CN2016/078551 2015-05-06 2016-04-06 触控显示面板及其制备方法、触控显示装置 WO2016177242A1 (zh)

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Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104765181A (zh) * 2015-05-06 2015-07-08 京东方科技集团股份有限公司 触控显示面板及其制备方法、触控显示装置
CN105068295B (zh) * 2015-09-11 2018-02-16 京东方科技集团股份有限公司 一种触控显示面板及其制作方法、触控显示装置
CN105739155B (zh) 2016-04-29 2019-03-12 京东方科技集团股份有限公司 触控基板和触控液晶显示面板
CN106775167B (zh) * 2017-01-13 2020-12-18 京东方科技集团股份有限公司 触控基板及其制备方法、显示装置
CN108874213B (zh) * 2018-06-01 2020-02-11 武汉华星光电半导体显示技术有限公司 触控显示面板及电子设备
CN111638811B (zh) * 2020-05-29 2023-09-01 京东方科技集团股份有限公司 触控面板及其制备方法、显示装置
CN114284320A (zh) * 2021-12-16 2022-04-05 合肥维信诺科技有限公司 显示面板以及显示装置

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101286106A (zh) * 2007-04-11 2008-10-15 松下电器产业株式会社 触摸面板
JP2013069033A (ja) * 2011-09-21 2013-04-18 Toppan Printing Co Ltd 透明導電性積層体及びその製造方法
CN103543544A (zh) * 2012-07-16 2014-01-29 瀚宇彩晶股份有限公司 触控及液晶透镜模块以及具有所述触控及液晶透镜模块的显示装置
JP2014075017A (ja) * 2012-10-04 2014-04-24 Fujikura Ltd タッチパネル
CN203930729U (zh) * 2014-04-29 2014-11-05 宸鸿科技(厦门)有限公司 触控显示面板
CN104536620A (zh) * 2015-01-26 2015-04-22 京东方科技集团股份有限公司 触摸显示面板和触摸显示装置
CN204302619U (zh) * 2014-11-24 2015-04-29 上海天马微电子有限公司 一种触摸显示面板和电子设备
CN104765181A (zh) * 2015-05-06 2015-07-08 京东方科技集团股份有限公司 触控显示面板及其制备方法、触控显示装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4968414B2 (ja) * 2010-07-05 2012-07-04 Ｄｉｃ株式会社 透明導電層付き基体及びその製造方法、並びにタッチパネル用透明導電膜積層体、タッチパネル
TWI526889B (zh) * 2012-02-15 2016-03-21 富士通電子零件有限公司 觸控面板及位置檢測方法
CN204009807U (zh) * 2014-06-13 2014-12-10 上海中航光电子有限公司 一种触控面板、显示面板及显示装置

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101286106A (zh) * 2007-04-11 2008-10-15 松下电器产业株式会社 触摸面板
JP2013069033A (ja) * 2011-09-21 2013-04-18 Toppan Printing Co Ltd 透明導電性積層体及びその製造方法
CN103543544A (zh) * 2012-07-16 2014-01-29 瀚宇彩晶股份有限公司 触控及液晶透镜模块以及具有所述触控及液晶透镜模块的显示装置
JP2014075017A (ja) * 2012-10-04 2014-04-24 Fujikura Ltd タッチパネル
CN203930729U (zh) * 2014-04-29 2014-11-05 宸鸿科技(厦门)有限公司 触控显示面板
CN204302619U (zh) * 2014-11-24 2015-04-29 上海天马微电子有限公司 一种触摸显示面板和电子设备
CN104536620A (zh) * 2015-01-26 2015-04-22 京东方科技集团股份有限公司 触摸显示面板和触摸显示装置
CN104765181A (zh) * 2015-05-06 2015-07-08 京东方科技集团股份有限公司 触控显示面板及其制备方法、触控显示装置

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